WO2009069465A1 - 転写材料用硬化性組成物および該組成物を用いた微細パターン形成方法 - Google Patents

転写材料用硬化性組成物および該組成物を用いた微細パターン形成方法 Download PDF

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Publication number
WO2009069465A1
WO2009069465A1 PCT/JP2008/070519 JP2008070519W WO2009069465A1 WO 2009069465 A1 WO2009069465 A1 WO 2009069465A1 JP 2008070519 W JP2008070519 W JP 2008070519W WO 2009069465 A1 WO2009069465 A1 WO 2009069465A1
Authority
WO
WIPO (PCT)
Prior art keywords
curable composition
fine pattern
composition
transfer material
transfer materials
Prior art date
Application number
PCT/JP2008/070519
Other languages
English (en)
French (fr)
Inventor
Yoshikazu Arai
Hiroshi Uchida
Original Assignee
Showa Denko K.K.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Denko K.K. filed Critical Showa Denko K.K.
Priority to JP2009543748A priority Critical patent/JP5258788B2/ja
Priority to CN2008801174126A priority patent/CN101883797B/zh
Priority to US12/745,473 priority patent/US20110129689A2/en
Publication of WO2009069465A1 publication Critical patent/WO2009069465A1/ja
Priority to US13/872,384 priority patent/US20130307195A1/en

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D17/00—Producing carriers of records containing fine grooves or impressions, e.g. disc records for needle playback, cylinder records; Producing record discs from master stencils
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/045—Polysiloxanes containing less than 25 silicon atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/38—Polysiloxanes modified by chemical after-treatment
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/855—Coating only part of a support with a magnetic layer
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/40—Esters of unsaturated alcohols, e.g. allyl (meth)acrylate

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Silicon Polymers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Epoxy Resins (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Magnetic Record Carriers (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)

Abstract

　本発明は、高いスループットで微細パターンを形成することができる工法であるＵＶナノインプリント法に適用でき、また場合によっては熱ナノインプリント法にも適用でき、しかもフッ素系ガスと酸素ガスとのエッチング速度の選択性が高い微細パターンを形成することができる転写材料用硬化性組成物を提供することを目的とする。 　本発明の転写材料用硬化性組成物は、同一分子内に、特定のシルセスキオキサン骨格と、硬化性官能基とを有するシルセスキオキサン骨格含有化合物を含有することを特徴とする。
PCT/JP2008/070519 2007-11-30 2008-11-11 転写材料用硬化性組成物および該組成物を用いた微細パターン形成方法 WO2009069465A1 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2009543748A JP5258788B2 (ja) 2007-11-30 2008-11-11 転写材料用硬化性組成物および該組成物を用いた微細パターン形成方法
CN2008801174126A CN101883797B (zh) 2007-11-30 2008-11-11 转印材料用固化性组合物和使用该组合物的微细图案形成方法
US12/745,473 US20110129689A2 (en) 2007-11-30 2008-11-11 Curable composition for transfer materials and method for forming micropattern using the curable composition
US13/872,384 US20130307195A1 (en) 2007-11-30 2013-04-29 Curable composition for transfer materials and method for forming micropattern using the curable composition

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2007311446 2007-11-30
JP2007-311446 2007-11-30
JP2008-136664 2008-05-26
JP2008136664 2008-05-26

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US13/872,384 Division US20130307195A1 (en) 2007-11-30 2013-04-29 Curable composition for transfer materials and method for forming micropattern using the curable composition

Publications (1)

Publication Number Publication Date
WO2009069465A1 true WO2009069465A1 (ja) 2009-06-04

Family

ID=40678367

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/070519 WO2009069465A1 (ja) 2007-11-30 2008-11-11 転写材料用硬化性組成物および該組成物を用いた微細パターン形成方法

Country Status (5)

Country Link
US (2) US20110129689A2 (ja)
JP (1) JP5258788B2 (ja)
CN (1) CN101883797B (ja)
TW (1) TW200940567A (ja)
WO (1) WO2009069465A1 (ja)

Cited By (5)

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JP2011515513A (ja) * 2008-03-04 2011-05-19 エージェンシー フォー サイエンス，テクノロジー アンド リサーチ 低収縮多官能基化ｓｓｑ樹脂
JP2011202128A (ja) * 2010-03-26 2011-10-13 Nippon Steel Chem Co Ltd ポリエン／ポリチオール系感光性樹脂組成物
JP2013512994A (ja) * 2009-12-04 2013-04-18 ダウ コーニング コーポレーション シルセスキオキサン樹脂の安定化
EP2636706A4 (en) * 2010-11-04 2016-01-20 Daicel Corp CURABLE RESIN COMPOSITION AND CURED ARTICLE
KR20170046678A (ko) 2014-08-21 2017-05-02 닛산 가가쿠 고교 가부시키 가이샤 임프린트재료

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TWI384636B (zh) * 2009-12-31 2013-02-01 Nat Univ Tsing Hua 以液態或凝膠態前驅物形成圖案化金屬氧化物層或圖案化金屬層之製作方法
US9523020B2 (en) * 2011-09-22 2016-12-20 Nissan Chemical Industries, Ltd. Flattening film forming composition for hard disk
CN102591140B (zh) * 2011-12-30 2013-07-24 苏州锦元纳米科技有限公司 一种纳米压印方法
WO2014084798A1 (en) * 2012-11-29 2014-06-05 Agency For Science, Technology And Research Method of forming a film with a lenticular lens array
CN103279011B (zh) * 2013-06-14 2016-03-30 中国科学院光电技术研究所 一种巯基-烯紫外光固化纳米压印材料
US9341948B2 (en) * 2013-08-24 2016-05-17 Polyera Corporation Photopatternable materials and related electronic devices and methods
CN106054523B (zh) * 2016-05-24 2019-10-18 北京化工大学 一种双重响应型可降解光刻胶及其制备方法和使用方法
JP7328888B2 (ja) * 2017-03-08 2023-08-17 キヤノン株式会社 硬化物パターンの製造方法、光学部品、回路基板および石英モールドレプリカの製造方法、ならびにインプリント前処理コート用材料およびその硬化物
KR101996262B1 (ko) * 2017-09-01 2019-10-01 (주)휴넷플러스 차단성 수지 조성물, 광경화 차단막의 제조방법 및 전자소자
EP3702167B1 (en) * 2018-01-31 2023-03-29 Dai Nippon Printing Co., Ltd. Heat transfer sheet, coating liquid for release layer, and method for manufacturing heat transfer sheet
CN116679530B (zh) * 2023-05-31 2024-01-26 珦盛新材料(珠海)有限公司 感光性树脂组合物、环状硅氧烷化合物、元件、抗蚀剂图形的和印刷线路制造方法

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JP2005277280A (ja) * 2004-03-26 2005-10-06 Toshiba Corp ナノインプリント用組成物およびそれを用いたパタン形成方法
JP2006261265A (ja) * 2005-03-16 2006-09-28 Ricoh Opt Ind Co Ltd 位相シフター光学素子その製造方法及び得られる素子
JP2006285017A (ja) * 2005-04-01 2006-10-19 Seiko Epson Corp 微細パターンの形成方法及び偏光分離素子の製造方法
JP2007072374A (ja) * 2005-09-09 2007-03-22 Tokyo Ohka Kogyo Co Ltd ナノインプリント用の膜形成組成物およびパターン形成方法

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JP2005277280A (ja) * 2004-03-26 2005-10-06 Toshiba Corp ナノインプリント用組成物およびそれを用いたパタン形成方法
JP2006261265A (ja) * 2005-03-16 2006-09-28 Ricoh Opt Ind Co Ltd 位相シフター光学素子その製造方法及び得られる素子
JP2006285017A (ja) * 2005-04-01 2006-10-19 Seiko Epson Corp 微細パターンの形成方法及び偏光分離素子の製造方法
JP2007072374A (ja) * 2005-09-09 2007-03-22 Tokyo Ohka Kogyo Co Ltd ナノインプリント用の膜形成組成物およびパターン形成方法

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011515513A (ja) * 2008-03-04 2011-05-19 エージェンシー フォー サイエンス，テクノロジー アンド リサーチ 低収縮多官能基化ｓｓｑ樹脂
JP2013512994A (ja) * 2009-12-04 2013-04-18 ダウ コーニング コーポレーション シルセスキオキサン樹脂の安定化
JP2011202128A (ja) * 2010-03-26 2011-10-13 Nippon Steel Chem Co Ltd ポリエン／ポリチオール系感光性樹脂組成物
EP2636706A4 (en) * 2010-11-04 2016-01-20 Daicel Corp CURABLE RESIN COMPOSITION AND CURED ARTICLE
KR20170046678A (ko) 2014-08-21 2017-05-02 닛산 가가쿠 고교 가부시키 가이샤 임프린트재료
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Also Published As

Publication number Publication date
CN101883797B (zh) 2012-10-17
US20130307195A1 (en) 2013-11-21
JP5258788B2 (ja) 2013-08-07
TW200940567A (en) 2009-10-01
CN101883797A (zh) 2010-11-10
US20110129689A2 (en) 2011-06-02
US20100316889A1 (en) 2010-12-16
JPWO2009069465A1 (ja) 2011-04-14

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