WO2009069211A1 - プラズマプロセス用電極及びプラズマプロセス装置 - Google Patents

プラズマプロセス用電極及びプラズマプロセス装置 Download PDF

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Publication number
WO2009069211A1
WO2009069211A1 PCT/JP2007/073061 JP2007073061W WO2009069211A1 WO 2009069211 A1 WO2009069211 A1 WO 2009069211A1 JP 2007073061 W JP2007073061 W JP 2007073061W WO 2009069211 A1 WO2009069211 A1 WO 2009069211A1
Authority
WO
WIPO (PCT)
Prior art keywords
plasma process
grooves
main face
electrode
plasma
Prior art date
Application number
PCT/JP2007/073061
Other languages
English (en)
French (fr)
Inventor
Sumito Sakaguchi
Original Assignee
Shimadzu Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corporation filed Critical Shimadzu Corporation
Priority to JP2009543615A priority Critical patent/JP5035352B2/ja
Priority to PCT/JP2007/073061 priority patent/WO2009069211A1/ja
Priority to TW097123371A priority patent/TWI367522B/zh
Publication of WO2009069211A1 publication Critical patent/WO2009069211A1/ja

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H01J37/32449—Gas control, e.g. control of the gas flow
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32541—Shape

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Cleaning In General (AREA)
  • Gas-Filled Discharge Tubes (AREA)
  • Drying Of Semiconductors (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

　プラズマにより処理される基板を載置する陽極と、プラズマが生成される空間を挟んで基板と対向し、複数の第１溝（４）が設けられた第１主面（１４）、第１主面（１４）に対向し、複数の第１溝（４）と交差する、複数の第１溝（４）より狭い幅の複数の第２溝（６）が設けられた第２主面（１６）を有する陰極１０とを備える。第１溝（４）と第２溝（６）との交点に第１主面（１４）から第２主面（１６）に貫通する貫通孔（８）が設けられる。
PCT/JP2007/073061 2007-11-29 2007-11-29 プラズマプロセス用電極及びプラズマプロセス装置 WO2009069211A1 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2009543615A JP5035352B2 (ja) 2007-11-29 2007-11-29 プラズマプロセス用電極及びプラズマプロセス装置
PCT/JP2007/073061 WO2009069211A1 (ja) 2007-11-29 2007-11-29 プラズマプロセス用電極及びプラズマプロセス装置
TW097123371A TWI367522B (en) 2007-11-29 2008-06-23 Plasma process electrode and plasma process device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2007/073061 WO2009069211A1 (ja) 2007-11-29 2007-11-29 プラズマプロセス用電極及びプラズマプロセス装置

Publications (1)

Publication Number Publication Date
WO2009069211A1 true WO2009069211A1 (ja) 2009-06-04

Family

ID=40678127

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2007/073061 WO2009069211A1 (ja) 2007-11-29 2007-11-29 プラズマプロセス用電極及びプラズマプロセス装置

Country Status (3)

Country Link
JP (1) JP5035352B2 (ja)
TW (1) TWI367522B (ja)
WO (1) WO2009069211A1 (ja)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010171244A (ja) * 2009-01-23 2010-08-05 Fuji Electric Holdings Co Ltd プラズマ処理装置
US20110214812A1 (en) * 2010-03-08 2011-09-08 Jusung Engineering Co., Ltd. Gas distributing means and substrate processing apparatus including the same
WO2013008344A1 (ja) * 2011-07-14 2013-01-17 株式会社島津製作所 プラズマ処理装置
JP2013030478A (ja) * 2011-06-24 2013-02-07 Saga Univ プラズマ処理装置
JP2014227606A (ja) * 2013-05-24 2014-12-08 上海和輝光電有限公司Ｅｖｅｒｄｉｓｐｌａｙ Ｏｐｔｒｏｎｉｃｓ （Ｓｈａｎｇｈａｉ） Ｌｉｍｉｔｅｄ 分散板

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04375A (ja) * 1990-04-16 1992-01-06 Mitsubishi Heavy Ind Ltd プラスチック基板表面の硬化保護膜製造方法
JPH0922798A (ja) * 1995-07-03 1997-01-21 Anelva Corp 高周波放電用電極及び高周波プラズマ基板処理装置
JP2005150317A (ja) * 2003-11-14 2005-06-09 Mitsubishi Heavy Ind Ltd プラズマｃｖｄ装置および光電変換装置の製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04375A (ja) * 1990-04-16 1992-01-06 Mitsubishi Heavy Ind Ltd プラスチック基板表面の硬化保護膜製造方法
JPH0922798A (ja) * 1995-07-03 1997-01-21 Anelva Corp 高周波放電用電極及び高周波プラズマ基板処理装置
JP2005150317A (ja) * 2003-11-14 2005-06-09 Mitsubishi Heavy Ind Ltd プラズマｃｖｄ装置および光電変換装置の製造方法

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010171244A (ja) * 2009-01-23 2010-08-05 Fuji Electric Holdings Co Ltd プラズマ処理装置
US20110214812A1 (en) * 2010-03-08 2011-09-08 Jusung Engineering Co., Ltd. Gas distributing means and substrate processing apparatus including the same
JP2013030478A (ja) * 2011-06-24 2013-02-07 Saga Univ プラズマ処理装置
WO2013008344A1 (ja) * 2011-07-14 2013-01-17 株式会社島津製作所 プラズマ処理装置
CN103493602A (zh) * 2011-07-14 2014-01-01 株式会社岛津制作所 等离子体处理装置
KR101485140B1 (ko) 2011-07-14 2015-01-22 시마쯔 코포레이션 플라즈마 처리 장치
JPWO2013008344A1 (ja) * 2011-07-14 2015-02-23 株式会社島津製作所 プラズマ処理装置
CN103493602B (zh) * 2011-07-14 2016-06-08 株式会社岛津制作所 等离子体处理装置
JP2014227606A (ja) * 2013-05-24 2014-12-08 上海和輝光電有限公司Ｅｖｅｒｄｉｓｐｌａｙ Ｏｐｔｒｏｎｉｃｓ （Ｓｈａｎｇｈａｉ） Ｌｉｍｉｔｅｄ 分散板

Also Published As

Publication number Publication date
JPWO2009069211A1 (ja) 2011-04-07
TW200924026A (en) 2009-06-01
TWI367522B (en) 2012-07-01
JP5035352B2 (ja) 2012-09-26

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