WO2008146918A1 - プラズマ処理装置用電極の製造方法および再生方法 - Google Patents
プラズマ処理装置用電極の製造方法および再生方法 Download PDFInfo
- Publication number
- WO2008146918A1 WO2008146918A1 PCT/JP2008/060043 JP2008060043W WO2008146918A1 WO 2008146918 A1 WO2008146918 A1 WO 2008146918A1 JP 2008060043 W JP2008060043 W JP 2008060043W WO 2008146918 A1 WO2008146918 A1 WO 2008146918A1
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- WIPO (PCT)
- Prior art keywords
- electrode
- reclaiming
- manufacturing
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- processing apparatus
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/3065—Plasma etching; Reactive-ion etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3244—Gas supply means
- H01J37/32449—Gas control, e.g. control of the gas flow
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
- C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32091—Radio frequency generated discharge the radio frequency energy being capacitively coupled to the plasma
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3244—Gas supply means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32541—Shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32559—Protection means, e.g. coatings
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49121—Beam lead frame or beam lead device
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49126—Assembling bases
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49128—Assembling formed circuit to base
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/4913—Assembling to base an electrical component, e.g., capacitor, etc.
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49155—Manufacturing circuit on or in base
- Y10T29/49165—Manufacturing circuit on or in base by forming conductive walled aperture in base
Abstract
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020097024294A KR101119797B1 (ko) | 2007-06-01 | 2008-05-30 | 플라즈마 처리 장치용 전극의 제조 방법 및 재생 방법 |
JP2008544683A JP4355023B2 (ja) | 2007-06-01 | 2008-05-30 | プラズマ処理装置用電極の製造方法および再生方法 |
US12/602,559 US8291581B2 (en) | 2007-06-01 | 2008-05-30 | Method for production of substrate electrode for plasma processing |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007-146782 | 2007-06-01 | ||
JP2007146782 | 2007-06-01 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2008146918A1 true WO2008146918A1 (ja) | 2008-12-04 |
Family
ID=40075148
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2008/060043 WO2008146918A1 (ja) | 2007-06-01 | 2008-05-30 | プラズマ処理装置用電極の製造方法および再生方法 |
Country Status (4)
Country | Link |
---|---|
US (1) | US8291581B2 (ja) |
JP (1) | JP4355023B2 (ja) |
KR (1) | KR101119797B1 (ja) |
WO (1) | WO2008146918A1 (ja) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011018894A (ja) * | 2009-06-12 | 2011-01-27 | Tokyo Electron Ltd | プラズマ処理装置用の消耗部品の再利用方法 |
WO2012026210A1 (ja) * | 2010-08-25 | 2012-03-01 | 三井造船株式会社 | 耐プラズマ部材およびその再生方法 |
JP2014143101A (ja) * | 2013-01-24 | 2014-08-07 | Tokyo Electron Ltd | プラズマ処理装置 |
JP2017212427A (ja) * | 2016-05-25 | 2017-11-30 | 韓國東海炭素株式會社 | 半導体製造用部品の再生方法、その再生装置及び再生部品 |
KR20190119038A (ko) | 2017-02-16 | 2019-10-21 | 미쓰비시 마테리알 가부시키가이샤 | 플라즈마 처리 장치용 전극판 및 플라즈마 처리 장치용 전극판의 재생 방법 |
WO2020003721A1 (ja) * | 2018-06-27 | 2020-01-02 | 株式会社アドマップ | SiC部材およびその製造方法 |
JP2022016604A (ja) * | 2014-12-26 | 2022-01-21 | エーサット株式会社 | プラズマエッチング装置用の電極 |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101160906B1 (ko) * | 2010-03-17 | 2012-06-28 | 최대규 | 용량 결합 플라즈마 반응기 |
KR101104638B1 (ko) * | 2010-07-16 | 2012-01-12 | 주식회사 테스 | 플라즈마 처리장치 |
KR101128826B1 (ko) * | 2010-08-06 | 2012-03-23 | 엔티엠 주식회사 | 무냉각식 상압 플라즈마 장치 |
US20120073752A1 (en) * | 2010-09-24 | 2012-03-29 | Memc Electronic Materials, Inc. | Adapter Ring For Silicon Electrode |
CN103250470A (zh) * | 2010-12-09 | 2013-08-14 | 韩国科学技术院 | 等离子体发生器 |
US20120255635A1 (en) * | 2011-04-11 | 2012-10-11 | Applied Materials, Inc. | Method and apparatus for refurbishing gas distribution plate surfaces |
KR101241049B1 (ko) | 2011-08-01 | 2013-03-15 | 주식회사 플라즈마트 | 플라즈마 발생 장치 및 플라즈마 발생 방법 |
KR101246191B1 (ko) | 2011-10-13 | 2013-03-21 | 주식회사 윈텔 | 플라즈마 장치 및 기판 처리 장치 |
KR101332337B1 (ko) | 2012-06-29 | 2013-11-22 | 태원전기산업 (주) | 초고주파 발광 램프 장치 |
US11380557B2 (en) * | 2017-06-05 | 2022-07-05 | Applied Materials, Inc. | Apparatus and method for gas delivery in semiconductor process chambers |
KR20210007281A (ko) * | 2019-07-10 | 2021-01-20 | 주성엔지니어링(주) | 기판처리장치 |
WO2021026351A1 (en) * | 2019-08-07 | 2021-02-11 | Hubbell Incorporated | Inrush current protection circuit for solid state lighting fixtures |
KR102162480B1 (ko) * | 2020-07-01 | 2020-10-06 | 한국씰마스타주식회사 | 씰용 부재 및 그의 제조방법 |
KR102504152B1 (ko) * | 2021-02-15 | 2023-02-27 | (주)단단 | 마스킹 구조체 및 이를 이용한 플라즈마 에칭용 전극의 재생 방법 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2005285845A (ja) * | 2004-03-26 | 2005-10-13 | Ibiden Co Ltd | プラズマエッチング装置のガス吹き出し板 |
US20060141802A1 (en) * | 2004-12-23 | 2006-06-29 | Lam Research Corporation | Silicon electrode assembly surface decontamination by acidic solution |
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DE59407670D1 (de) * | 1993-04-16 | 1999-03-04 | Heinze Dyconex Patente | Kern für elektrische Verbindungssubstrate und elektrische Verbindungssubstrate mit Kern, sowie Verfahren zu deren Herstellung |
WO1995022142A1 (en) * | 1994-02-14 | 1995-08-17 | Philips Electronics N.V. | Method and recording device for recording signals on a record carrier |
US6188028B1 (en) * | 1997-06-09 | 2001-02-13 | Tessera, Inc. | Multilayer structure with interlocking protrusions |
JP2003059903A (ja) | 2001-08-10 | 2003-02-28 | Ibiden Co Ltd | プラズマエッチング装置のガス吹き出し板及びその製造方法 |
-
2008
- 2008-05-30 US US12/602,559 patent/US8291581B2/en active Active
- 2008-05-30 KR KR1020097024294A patent/KR101119797B1/ko active IP Right Grant
- 2008-05-30 WO PCT/JP2008/060043 patent/WO2008146918A1/ja active Application Filing
- 2008-05-30 JP JP2008544683A patent/JP4355023B2/ja active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005285845A (ja) * | 2004-03-26 | 2005-10-13 | Ibiden Co Ltd | プラズマエッチング装置のガス吹き出し板 |
US20060141802A1 (en) * | 2004-12-23 | 2006-06-29 | Lam Research Corporation | Silicon electrode assembly surface decontamination by acidic solution |
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011018894A (ja) * | 2009-06-12 | 2011-01-27 | Tokyo Electron Ltd | プラズマ処理装置用の消耗部品の再利用方法 |
KR101814201B1 (ko) * | 2009-06-12 | 2018-01-02 | 도쿄엘렉트론가부시키가이샤 | 플라즈마 처리장치용의 소모부품의 재이용 방법 |
WO2012026210A1 (ja) * | 2010-08-25 | 2012-03-01 | 三井造船株式会社 | 耐プラズマ部材およびその再生方法 |
JP2012049220A (ja) * | 2010-08-25 | 2012-03-08 | Mitsui Eng & Shipbuild Co Ltd | 耐プラズマ部材およびその再生方法 |
CN103189967A (zh) * | 2010-08-25 | 2013-07-03 | 三井造船株式会社 | 耐电浆构件及其再生方法 |
EP2610897A4 (en) * | 2010-08-25 | 2015-12-30 | Mitsui Shipbuilding Eng | PLASMA RESISTANT ELEMENT AND METHOD FOR REGENERATING THE ELEMENT |
JP2014143101A (ja) * | 2013-01-24 | 2014-08-07 | Tokyo Electron Ltd | プラズマ処理装置 |
JP2022016604A (ja) * | 2014-12-26 | 2022-01-21 | エーサット株式会社 | プラズマエッチング装置用の電極 |
JP2017212427A (ja) * | 2016-05-25 | 2017-11-30 | 韓國東海炭素株式會社 | 半導体製造用部品の再生方法、その再生装置及び再生部品 |
US11133156B2 (en) | 2017-02-16 | 2021-09-28 | Mitsubishi Materials Corporation | Electrode plate for plasma processing apparatus and method for regenerating electrode plate for plasma processing apparatus |
KR20190119038A (ko) | 2017-02-16 | 2019-10-21 | 미쓰비시 마테리알 가부시키가이샤 | 플라즈마 처리 장치용 전극판 및 플라즈마 처리 장치용 전극판의 재생 방법 |
WO2020003721A1 (ja) * | 2018-06-27 | 2020-01-02 | 株式会社アドマップ | SiC部材およびその製造方法 |
JP2020004810A (ja) * | 2018-06-27 | 2020-01-09 | 株式会社アドマップ | SiC部材およびその製造方法 |
Also Published As
Publication number | Publication date |
---|---|
KR20100002290A (ko) | 2010-01-06 |
US8291581B2 (en) | 2012-10-23 |
JP4355023B2 (ja) | 2009-10-28 |
JPWO2008146918A1 (ja) | 2010-08-19 |
US20100212148A1 (en) | 2010-08-26 |
KR101119797B1 (ko) | 2012-03-22 |
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