WO2009057632A1 - 用力供給部材の接続装置、ステージ装置、投影光学系の支持装置及び露光装置 - Google Patents

用力供給部材の接続装置、ステージ装置、投影光学系の支持装置及び露光装置 Download PDF

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Publication number
WO2009057632A1
WO2009057632A1 PCT/JP2008/069636 JP2008069636W WO2009057632A1 WO 2009057632 A1 WO2009057632 A1 WO 2009057632A1 JP 2008069636 W JP2008069636 W JP 2008069636W WO 2009057632 A1 WO2009057632 A1 WO 2009057632A1
Authority
WO
WIPO (PCT)
Prior art keywords
medium supply
supply member
holding section
optical system
projection optical
Prior art date
Application number
PCT/JP2008/069636
Other languages
English (en)
French (fr)
Inventor
Dai Arai
Original Assignee
Nikon Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corporation filed Critical Nikon Corporation
Publication of WO2009057632A1 publication Critical patent/WO2009057632A1/ja

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
    • F16F7/00—Vibration-dampers; Shock-absorbers
    • F16F7/10—Vibration-dampers; Shock-absorbers using inertia effect
    • F16F7/104—Vibration-dampers; Shock-absorbers using inertia effect the inertia member being resiliently mounted
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70991—Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Engineering & Computer Science (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Theoretical Computer Science (AREA)
  • Atmospheric Sciences (AREA)
  • Mathematical Physics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Toxicology (AREA)
  • Mechanical Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

　用力供給部材の接続装置は、保持部（４１）と、駆動装置（４３）と、計測装置（４７）と、制御装置とを備える。保持部（４１）は、第１部材（ＣＬ）に相対移動自在に支持され、第１部材（ＣＬ）と第２部材（１５）との間で接続される用力供給部材（ＴＢ）の一部を保持する。駆動装置（４３）は、保持部（４１）を第１部材（ＣＬ）に対して相対移動させる。計測装置（４７）は、保持部（４１）と第２部材（１５）との相対位置に関する情報を得る。制御装置は、計測装置（４７）の計測結果に基づいて、駆動装置（４３）を制御する。
PCT/JP2008/069636 2007-10-29 2008-10-29 用力供給部材の接続装置、ステージ装置、投影光学系の支持装置及び露光装置 WO2009057632A1 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-280623 2007-10-29
JP2007280623 2007-10-29

Publications (1)

Publication Number Publication Date
WO2009057632A1 true WO2009057632A1 (ja) 2009-05-07

Family

ID=40591021

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/069636 WO2009057632A1 (ja) 2007-10-29 2008-10-29 用力供給部材の接続装置、ステージ装置、投影光学系の支持装置及び露光装置

Country Status (3)

Country Link
US (1) US20090201484A1 (ja)
TW (1) TW200928609A (ja)
WO (1) WO2009057632A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103322104A (zh) * 2013-05-16 2013-09-25 安徽微威胶件集团有限公司 悬臂式阻尼隔振器

Families Citing this family (11)

* Cited by examiner, † Cited by third party
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DE102009024870A1 (de) * 2008-06-10 2009-12-31 Carl Zeiss Smt Ag Optische Einrichtung mit einstellbarer Kraftwirkung auf ein optisches Modul
TWI393601B (zh) * 2009-12-18 2013-04-21 Excetek Technologies Co Ltd 線切割機自動尋找起割孔定位裝置
JP5641878B2 (ja) * 2010-10-29 2014-12-17 キヤノン株式会社 振動制御装置、リソグラフィー装置、および、物品の製造方法
JP2014513869A (ja) * 2011-04-22 2014-06-05 マッパー・リソグラフィー・アイピー・ビー．ブイ． ウェーハのようなターゲットを処理するためのリソグラフィシステム、及びウェーハのようなターゲットを処理するためのリソグラフィシステムを動作させる方法
JP5941705B2 (ja) * 2012-02-29 2016-06-29 ファスフォードテクノロジ株式会社 ２軸駆動機構及びダイボンダ
JP2015515758A (ja) * 2012-04-26 2015-05-28 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置及びデバイス製造方法
JP2014056979A (ja) * 2012-09-13 2014-03-27 Hitachi High-Tech Instruments Co Ltd 水平軸駆動機構、２軸駆動機構及びダイボンダ
JP6302305B2 (ja) * 2014-03-18 2018-03-28 キヤノン株式会社 振動低減装置、リソグラフィ装置、および物品の製造方法
WO2018153622A1 (en) * 2017-02-27 2018-08-30 Asml Netherlands B.V. Lithographic apparatus, lithographic projection apparatus and device manufacturing method
CN108508704B (zh) * 2017-02-28 2020-04-10 上海微电子装备（集团）股份有限公司 光刻机和光刻机中吊框面型补偿方法
DE112020005518T5 (de) * 2020-01-30 2022-09-01 Hitachi High-Tech Corporation Ladungsträgerstrahlvorrichtung und schwingungsunterdrückungsmechanismus

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JPH08233964A (ja) * 1994-10-19 1996-09-13 Nikon Corp 可動ステージ装置、該ステージ装置を搭載したマイクロリソグラフィ装置、及び流体冷却システム
JP2000173884A (ja) * 1998-12-02 2000-06-23 Canon Inc デバイス製造装置および方法ならびにデバイス製造装置の配線・配管実装方法
JP2001267227A (ja) * 2000-03-21 2001-09-28 Canon Inc 除振システム、露光装置およびデバイス製造方法
JP2002043213A (ja) * 2000-07-25 2002-02-08 Nikon Corp ステージ装置および露光装置
JP2004342987A (ja) * 2003-05-19 2004-12-02 Canon Inc ステージ装置
JP2005046941A (ja) * 2003-07-31 2005-02-24 Canon Inc ケーブル微動ユニット付きステージ装置
WO2006038952A2 (en) * 2004-09-30 2006-04-13 Nikon Corporation Projection optical device and exposure apparatus
JP2008042201A (ja) * 2006-08-08 2008-02-21 Asml Netherlands Bv ケーブル接続、ケーブル接続用の制御システム、およびケーブル接続を経て振動が第１の対象から第２の対象へと伝達されることを軽減する方法

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Publication number Priority date Publication date Assignee Title
JPH08233964A (ja) * 1994-10-19 1996-09-13 Nikon Corp 可動ステージ装置、該ステージ装置を搭載したマイクロリソグラフィ装置、及び流体冷却システム
JP2000173884A (ja) * 1998-12-02 2000-06-23 Canon Inc デバイス製造装置および方法ならびにデバイス製造装置の配線・配管実装方法
JP2001267227A (ja) * 2000-03-21 2001-09-28 Canon Inc 除振システム、露光装置およびデバイス製造方法
JP2002043213A (ja) * 2000-07-25 2002-02-08 Nikon Corp ステージ装置および露光装置
JP2004342987A (ja) * 2003-05-19 2004-12-02 Canon Inc ステージ装置
JP2005046941A (ja) * 2003-07-31 2005-02-24 Canon Inc ケーブル微動ユニット付きステージ装置
WO2006038952A2 (en) * 2004-09-30 2006-04-13 Nikon Corporation Projection optical device and exposure apparatus
JP2008042201A (ja) * 2006-08-08 2008-02-21 Asml Netherlands Bv ケーブル接続、ケーブル接続用の制御システム、およびケーブル接続を経て振動が第１の対象から第２の対象へと伝達されることを軽減する方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103322104A (zh) * 2013-05-16 2013-09-25 安徽微威胶件集团有限公司 悬臂式阻尼隔振器

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TW200928609A (en) 2009-07-01
US20090201484A1 (en) 2009-08-13

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