WO2009057349A1 - 光学マスクおよび光源装置 - Google Patents

光学マスクおよび光源装置 Download PDF

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Publication number
WO2009057349A1
WO2009057349A1 PCT/JP2008/061655 JP2008061655W WO2009057349A1 WO 2009057349 A1 WO2009057349 A1 WO 2009057349A1 JP 2008061655 W JP2008061655 W JP 2008061655W WO 2009057349 A1 WO2009057349 A1 WO 2009057349A1
Authority
WO
WIPO (PCT)
Prior art keywords
optical mask
designates
light source
source device
region
Prior art date
Application number
PCT/JP2008/061655
Other languages
English (en)
French (fr)
Inventor
Taro Ando
Yoshiyuki Ohtake
Takashi Inoue
Naoya Matsumoto
Haruyoshi Toyoda
Original Assignee
Hamamatsu Photonics K.K.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hamamatsu Photonics K.K. filed Critical Hamamatsu Photonics K.K.
Priority to US12/680,783 priority Critical patent/US7982938B2/en
Priority to CN2008801139014A priority patent/CN101849199B/zh
Priority to DE112008002830.3T priority patent/DE112008002830B4/de
Publication of WO2009057349A1 publication Critical patent/WO2009057349A1/ja

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/005—Diaphragms
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/0988—Diaphragms, spatial filters, masks for removing or filtering a part of the beam

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Laser Beam Processing (AREA)
  • Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Liquid Crystal (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Optical Communication System (AREA)

Abstract

　この光学マスクは、入力される光のビーム断面において空間的に強度変調して当該変調後の光を出力する光学マスクであって、所定位置を中心とするｐ個の半径ｒ１～ｒｐ（ｐは偶数、ｒｐ＞ｒｐ－１＞…＞ｒ２＞ｒ１、かつ、ｒｐ－ｒｐ－１＞ｒｐ－１－ｒｐ－２＞…＞ｒ３－ｒ２＞ｒ２－ｒ１＞ｒ１）の各円周によって区分され内側から順に領域Ａ０～Ａｐを設定したときに、領域Ａｍ（ｍは０以上ｐ以下の偶数）が光透過領域であり、領域Ａｎ（ｎは０以上ｐ以下の奇数）が光遮断領域である。
PCT/JP2008/061655 2007-10-29 2008-06-26 光学マスクおよび光源装置 WO2009057349A1 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
US12/680,783 US7982938B2 (en) 2007-10-29 2008-06-26 Optical mask, and light source device
CN2008801139014A CN101849199B (zh) 2007-10-29 2008-06-26 光学掩模以及光源装置
DE112008002830.3T DE112008002830B4 (de) 2007-10-29 2008-06-26 Optische Maske und Lichtquellengerät

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-280845 2007-10-29
JP2007280845A JP5144212B2 (ja) 2007-10-29 2007-10-29 光学マスクおよび光源装置

Publications (1)

Publication Number Publication Date
WO2009057349A1 true WO2009057349A1 (ja) 2009-05-07

Family

ID=40590752

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/061655 WO2009057349A1 (ja) 2007-10-29 2008-06-26 光学マスクおよび光源装置

Country Status (5)

Country Link
US (1) US7982938B2 (ja)
JP (1) JP5144212B2 (ja)
CN (1) CN101849199B (ja)
DE (1) DE112008002830B4 (ja)
WO (1) WO2009057349A1 (ja)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016531651A (ja) 2013-07-11 2016-10-13 コーニンクレッカ フィリップス エヌ ヴェＫｏｎｉｎｋｌｉｊｋｅ Ｐｈｉｌｉｐｓ Ｎ．Ｖ． レーザ光を用いた皮膚の非侵襲性処置のための装置及び方法
US20160331457A1 (en) 2014-01-21 2016-11-17 Koninklijke Philips N.V. Device and method for non-invasive treatemnt of skin using laser light
CN103887157B (zh) * 2014-03-12 2021-08-27 京东方科技集团股份有限公司 光学掩膜板和激光剥离装置
KR101407994B1 (ko) 2014-04-24 2014-06-19 주식회사 엘티에스 베셀빔 성형렌즈와 이를 이용하는 기판 절단방법
JP6506974B2 (ja) * 2015-01-22 2019-04-24 浜松ホトニクス株式会社 光照射装置
FR3045825B1 (fr) * 2015-12-17 2018-02-02 Areva Np Systeme et procede de detection optique d'objets dans un fluide
CN109530913B (zh) * 2018-12-25 2021-07-23 武汉华工激光工程有限责任公司 一种贝塞尔光束的激光加工优化方法及系统
DE102020105540A1 (de) * 2019-10-11 2021-04-15 Trumpf Laser- Und Systemtechnik Gmbh Optisches Stanzen von Mikrolöchern in Dünnglas
CN113156557B (zh) * 2021-04-30 2023-02-21 浙江光珀智能科技有限公司 一种光学面罩及光学系统
JP2023065883A (ja) * 2021-10-28 2023-05-15 浜松ホトニクス株式会社 光照射装置、顕微鏡装置、光照射方法、及び画像取得方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH052152A (ja) * 1990-12-19 1993-01-08 Hitachi Ltd 光ビーム作成方法、装置、それを用いた寸法測定方法、外観検査方法、高さ測定方法、露光方法および半導体集積回路装置の製造方法
JPH06148573A (ja) * 1992-11-09 1994-05-27 Olympus Optical Co Ltd 瞳変調光学系
JPH1058743A (ja) * 1996-08-22 1998-03-03 Fuji Xerox Co Ltd アレイ状光源を備えたスキャナー装置および画像記録装置
JP2003043347A (ja) * 2001-07-26 2003-02-13 Communication Research Laboratory 高分解能光学装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2725895B2 (ja) * 1991-02-18 1998-03-11 シャープ株式会社 露光機構
JP3708246B2 (ja) * 1996-09-19 2005-10-19 オリンパス株式会社 光制御部材を有する光学顕微鏡
GB9922082D0 (en) * 1999-09-17 1999-11-17 Isis Innovation Laser apparatus for use in material processing
JP4645595B2 (ja) * 2004-09-10 2011-03-09 住友電気工業株式会社 透光型表示パネルとその製造方法
CN100345008C (zh) * 2005-06-29 2007-10-24 浙江工业大学 一种超分辨微结构衍射光学元件的制作方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH052152A (ja) * 1990-12-19 1993-01-08 Hitachi Ltd 光ビーム作成方法、装置、それを用いた寸法測定方法、外観検査方法、高さ測定方法、露光方法および半導体集積回路装置の製造方法
JPH06148573A (ja) * 1992-11-09 1994-05-27 Olympus Optical Co Ltd 瞳変調光学系
JPH1058743A (ja) * 1996-08-22 1998-03-03 Fuji Xerox Co Ltd アレイ状光源を備えたスキャナー装置および画像記録装置
JP2003043347A (ja) * 2001-07-26 2003-02-13 Communication Research Laboratory 高分解能光学装置

Also Published As

Publication number Publication date
DE112008002830T5 (de) 2011-01-27
CN101849199B (zh) 2011-07-20
US20100214640A1 (en) 2010-08-26
JP2009109672A (ja) 2009-05-21
DE112008002830B4 (de) 2020-11-12
CN101849199A (zh) 2010-09-29
US7982938B2 (en) 2011-07-19
JP5144212B2 (ja) 2013-02-13

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