WO2009022559A1 - Composition de résine pouvant durcir et matière de couche dure antistatique hautement transparente utilisant celle-ci - Google Patents

Composition de résine pouvant durcir et matière de couche dure antistatique hautement transparente utilisant celle-ci Download PDF

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Publication number
WO2009022559A1
WO2009022559A1 PCT/JP2008/063886 JP2008063886W WO2009022559A1 WO 2009022559 A1 WO2009022559 A1 WO 2009022559A1 JP 2008063886 W JP2008063886 W JP 2008063886W WO 2009022559 A1 WO2009022559 A1 WO 2009022559A1
Authority
WO
WIPO (PCT)
Prior art keywords
resin composition
curable resin
same
hard coat
highly transparent
Prior art date
Application number
PCT/JP2008/063886
Other languages
English (en)
Japanese (ja)
Inventor
Fumiaki Kobayashi
Hiroto Matsumoto
Original Assignee
Soken Chemical & Engineering Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Soken Chemical & Engineering Co., Ltd. filed Critical Soken Chemical & Engineering Co., Ltd.
Publication of WO2009022559A1 publication Critical patent/WO2009022559A1/fr

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C08F220/1804—C4-(meth)acrylate, e.g. butyl (meth)acrylate, isobutyl (meth)acrylate or tert-butyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C09D4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/04—Acids; Metal salts or ammonium salts thereof
    • C08F220/06—Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/111—Anti-reflection coatings using layers comprising organic materials

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Laminated Bodies (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Paints Or Removers (AREA)
  • Polarising Elements (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Polymerisation Methods In General (AREA)
  • Graft Or Block Polymers (AREA)

Abstract

L'invention concerne une composition de résine qui permet de former un film de revêtement qui possède à la fois d'excellentes propriétés antistatiques et une haute transparence tout en ayant une dureté suffisante. De façon précise, l'invention porte sur une composition de résine pouvant durcir caractérisée par le fait qu'elle contient les composants (A) et (B) décrits ci-après, tout en ayant une valeur de compatibilité entre les composants (A) et (B) de 50 à 150. (A) un copolymère d'acide (méth)acrylique contenant un groupe ammonium quaternaire (B), un groupe multifonctionnel choisi parmi les oligomères de polyuréthane ayant un groupe vinyletrifonctionnel ou de fonctionnalité supérieure ou des monomères acryliques ayant un groupe bi- à hexa-fonctionnel.
PCT/JP2008/063886 2007-08-10 2008-08-01 Composition de résine pouvant durcir et matière de couche dure antistatique hautement transparente utilisant celle-ci WO2009022559A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-208772 2007-08-10
JP2007208772A JP2009040924A (ja) 2007-08-10 2007-08-10 硬化性樹脂組成物およびこれを利用する高透明性帯電防止ハードコート材

Publications (1)

Publication Number Publication Date
WO2009022559A1 true WO2009022559A1 (fr) 2009-02-19

Family

ID=40350614

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/063886 WO2009022559A1 (fr) 2007-08-10 2008-08-01 Composition de résine pouvant durcir et matière de couche dure antistatique hautement transparente utilisant celle-ci

Country Status (3)

Country Link
JP (1) JP2009040924A (fr)
TW (1) TW200927775A (fr)
WO (1) WO2009022559A1 (fr)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102129090A (zh) * 2010-11-30 2011-07-20 中国乐凯胶片集团公司 一种光学硬化膜
JP2012082287A (ja) * 2010-10-08 2012-04-26 Aica Kogyo Co Ltd 樹脂組成物および成型物
JP2013020111A (ja) * 2011-07-12 2013-01-31 Nof Corp 光学用フィルム
JP2014167104A (ja) * 2013-02-04 2014-09-11 Arakawa Chem Ind Co Ltd 活性エネルギー線硬化型樹脂組成物用帯電防止剤、活性エネルギー線硬化型樹脂組成物、硬化皮膜および帯電防止処理光学フィルム
WO2015157615A1 (fr) * 2014-04-10 2015-10-15 3M Innovative Properties Company Revêtement de promotion d'adhérence et/ou de suppression de poussière
US11813358B2 (en) 2019-06-07 2023-11-14 Regents Of The University Of Michigan Lipid nanodisc formation by polymers having a pendant hydrophobic group
US12050227B2 (en) 2018-04-17 2024-07-30 Nara Institute Of Science And Technology Lipid nanodisc formation by acryloyl-based copolymers

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010243879A (ja) * 2009-04-08 2010-10-28 Toppan Printing Co Ltd 反射防止フィルム
JP5812863B2 (ja) * 2009-10-22 2015-11-17 電気化学工業株式会社 接着体の使用方法
JP5638250B2 (ja) * 2010-01-28 2014-12-10 Ｋｊケミカルズ株式会社 不飽和第４級アンモニウム塩化合物からなる帯電防止剤及び帯電防止組成物
JP2015189799A (ja) * 2014-03-27 2015-11-02 三菱化学株式会社 硬化性樹脂組成物、ハードコート材及び硬化物
TWI646185B (zh) * 2017-10-13 2019-01-01 住華科技股份有限公司 抗靜電劑、應用其之黏著劑組成物、顯示裝置、及偏光板
TWI737949B (zh) * 2017-12-22 2021-09-01 日商荒川化學工業股份有限公司 活性能量線硬化性樹脂組成物用抗靜電劑、活性能量線硬化性樹脂組成物、硬化物及薄膜

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0598049A (ja) * 1991-10-04 1993-04-20 Teijin Ltd 帯電防止性合成樹脂成形品
JPH07316467A (ja) * 1994-05-27 1995-12-05 Nippon Oil & Fats Co Ltd 帯電防止コーティング樹脂組成物、帯電防止高分子フィルム及びその製造法
JP2000264939A (ja) * 1999-03-15 2000-09-26 Kyoeisha Chem Co Ltd ウレタン（メタ）アクリレートオリゴマーおよびそれを含有する帯電防止性コーティング剤組成物
JP2002121208A (ja) * 2000-08-11 2002-04-23 Mitsubishi Chemicals Corp 活性エネルギー線硬化性材料および帯電防止性トップコート剤
JP2003268316A (ja) * 2002-03-19 2003-09-25 Nippon Paper Industries Co Ltd ハードコート層形成用塗料組成物及びハードコートフィルム
JP2006045425A (ja) * 2004-08-06 2006-02-16 Dainippon Printing Co Ltd 帯電防止膜形成用の電離放射線硬化性組成物と帯電防止膜および帯電防止膜を備えた構造体

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002060526A (ja) * 2000-08-21 2002-02-26 Fuji Photo Film Co Ltd ハードコートフイルム及び機能性膜付きハードコートフイルム
JP4004214B2 (ja) * 2000-08-24 2007-11-07 ナガセケムテックス株式会社 帯電防止コーティング用組成物
JP4289605B2 (ja) * 2003-08-06 2009-07-01 日本合成化学工業株式会社 活性エネルギー線硬化型樹脂組成物
JP2005103922A (ja) * 2003-09-30 2005-04-21 Nippon Paper Industries Co Ltd ハードコートフィルム及びその製造方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0598049A (ja) * 1991-10-04 1993-04-20 Teijin Ltd 帯電防止性合成樹脂成形品
JPH07316467A (ja) * 1994-05-27 1995-12-05 Nippon Oil & Fats Co Ltd 帯電防止コーティング樹脂組成物、帯電防止高分子フィルム及びその製造法
JP2000264939A (ja) * 1999-03-15 2000-09-26 Kyoeisha Chem Co Ltd ウレタン（メタ）アクリレートオリゴマーおよびそれを含有する帯電防止性コーティング剤組成物
JP2002121208A (ja) * 2000-08-11 2002-04-23 Mitsubishi Chemicals Corp 活性エネルギー線硬化性材料および帯電防止性トップコート剤
JP2003268316A (ja) * 2002-03-19 2003-09-25 Nippon Paper Industries Co Ltd ハードコート層形成用塗料組成物及びハードコートフィルム
JP2006045425A (ja) * 2004-08-06 2006-02-16 Dainippon Printing Co Ltd 帯電防止膜形成用の電離放射線硬化性組成物と帯電防止膜および帯電防止膜を備えた構造体

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012082287A (ja) * 2010-10-08 2012-04-26 Aica Kogyo Co Ltd 樹脂組成物および成型物
CN102129090A (zh) * 2010-11-30 2011-07-20 中国乐凯胶片集团公司 一种光学硬化膜
CN102129090B (zh) * 2010-11-30 2012-07-25 中国乐凯胶片集团公司 一种光学硬化膜
JP2013020111A (ja) * 2011-07-12 2013-01-31 Nof Corp 光学用フィルム
JP2014167104A (ja) * 2013-02-04 2014-09-11 Arakawa Chem Ind Co Ltd 活性エネルギー線硬化型樹脂組成物用帯電防止剤、活性エネルギー線硬化型樹脂組成物、硬化皮膜および帯電防止処理光学フィルム
WO2015157615A1 (fr) * 2014-04-10 2015-10-15 3M Innovative Properties Company Revêtement de promotion d'adhérence et/ou de suppression de poussière
US10703927B2 (en) 2014-04-10 2020-07-07 3M Innovative Properties Company Adhesion promoting and/or dust suppression coating
US12050227B2 (en) 2018-04-17 2024-07-30 Nara Institute Of Science And Technology Lipid nanodisc formation by acryloyl-based copolymers
US11813358B2 (en) 2019-06-07 2023-11-14 Regents Of The University Of Michigan Lipid nanodisc formation by polymers having a pendant hydrophobic group

Also Published As

Publication number Publication date
TW200927775A (en) 2009-07-01
JP2009040924A (ja) 2009-02-26

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