WO2009022559A1 - Curable resin composition and highly transparent antistatic hard coat material using the same - Google Patents

Curable resin composition and highly transparent antistatic hard coat material using the same Download PDF

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Publication number
WO2009022559A1
WO2009022559A1 PCT/JP2008/063886 JP2008063886W WO2009022559A1 WO 2009022559 A1 WO2009022559 A1 WO 2009022559A1 JP 2008063886 W JP2008063886 W JP 2008063886W WO 2009022559 A1 WO2009022559 A1 WO 2009022559A1
Authority
WO
WIPO (PCT)
Prior art keywords
resin composition
curable resin
same
hard coat
highly transparent
Prior art date
Application number
PCT/JP2008/063886
Other languages
French (fr)
Japanese (ja)
Inventor
Fumiaki Kobayashi
Hiroto Matsumoto
Original Assignee
Soken Chemical & Engineering Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Soken Chemical & Engineering Co., Ltd. filed Critical Soken Chemical & Engineering Co., Ltd.
Publication of WO2009022559A1 publication Critical patent/WO2009022559A1/en

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C08F220/1804—C4-(meth)acrylate, e.g. butyl (meth)acrylate, isobutyl (meth)acrylate or tert-butyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C09D4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/04—Acids; Metal salts or ammonium salts thereof
    • C08F220/06—Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/111—Anti-reflection coatings using layers comprising organic materials

Abstract

Disclosed is a resin composition which enables to form a coating film that has both excellent antistatic properties and high transparency, while having sufficient hardness. Specifically disclosed is a curable resin composition characterized by containing the components (A) and (B) described below, while having a compatibility value between the components (A) and (B) of 50-150. (A) a (meth)acrylic copolymer containing a quaternary ammonium group (B) a multifunctional compound selected from polyurethane oligomers having a tri- or higher functional vinyl group or acrylic monomers having a bi- to hexa- functional vinyl group
PCT/JP2008/063886 2007-08-10 2008-08-01 Curable resin composition and highly transparent antistatic hard coat material using the same WO2009022559A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007208772A JP2009040924A (en) 2007-08-10 2007-08-10 Curable resin composition and high transparency antistatic hard coat material using the same
JP2007-208772 2007-08-10

Publications (1)

Publication Number Publication Date
WO2009022559A1 true WO2009022559A1 (en) 2009-02-19

Family

ID=40350614

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/063886 WO2009022559A1 (en) 2007-08-10 2008-08-01 Curable resin composition and highly transparent antistatic hard coat material using the same

Country Status (3)

Country Link
JP (1) JP2009040924A (en)
TW (1) TW200927775A (en)
WO (1) WO2009022559A1 (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102129090A (en) * 2010-11-30 2011-07-20 中国乐凯胶片集团公司 Optical hardening film
JP2012082287A (en) * 2010-10-08 2012-04-26 Aica Kogyo Co Ltd Resin composition and molding
JP2013020111A (en) * 2011-07-12 2013-01-31 Nof Corp Optical film
JP2014167104A (en) * 2013-02-04 2014-09-11 Arakawa Chem Ind Co Ltd Antistatic for active energy ray-curable resin composition, active energy ray-curable resin composition, cured film and optical film with antistatic treatment
WO2015157615A1 (en) * 2014-04-10 2015-10-15 3M Innovative Properties Company Adhesion promoting and/or dust suppression coating
US11813358B2 (en) 2019-06-07 2023-11-14 Regents Of The University Of Michigan Lipid nanodisc formation by polymers having a pendant hydrophobic group

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010243879A (en) * 2009-04-08 2010-10-28 Toppan Printing Co Ltd Antireflection film
CN102574951B (en) * 2009-10-22 2015-06-17 电气化学工业株式会社 (meth)Acrylic resin composition
JP5638250B2 (en) * 2010-01-28 2014-12-10 Ｋｊケミカルズ株式会社 Antistatic agent and antistatic composition comprising unsaturated quaternary ammonium salt compound
JP2015189799A (en) * 2014-03-27 2015-11-02 三菱化学株式会社 Curable resin composition, hard coat material and cured product
TWI646185B (en) * 2017-10-13 2019-01-01 住華科技股份有限公司 Antistatic agent, adhesive composition using the same, display device, and polarizing plate
TWI737949B (en) * 2017-12-22 2021-09-01 日商荒川化學工業股份有限公司 Antistatic agent for active energy ray curable resin composition, active energy ray curable resin composition, cured product and film

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0598049A (en) * 1991-10-04 1993-04-20 Teijin Ltd Antistatic synthetic resin molding
JPH07316467A (en) * 1994-05-27 1995-12-05 Nippon Oil & Fats Co Ltd Antistatic coating resin composition, antistatic polymer film and its production
JP2000264939A (en) * 1999-03-15 2000-09-26 Kyoeisha Chem Co Ltd Urethane (meth)acrylate oligomer and antistatic coating material composition containing the same
JP2002121208A (en) * 2000-08-11 2002-04-23 Mitsubishi Chemicals Corp Active energy ray-curable material and antistatic top- coating agent
JP2003268316A (en) * 2002-03-19 2003-09-25 Nippon Paper Industries Co Ltd Coating composition for forming hard coat layer, and hard coat film
JP2006045425A (en) * 2004-08-06 2006-02-16 Dainippon Printing Co Ltd Ionizing radiation curing composition for forming antistatic film and antistatic film and structure provided with antistatic film

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002060526A (en) * 2000-08-21 2002-02-26 Fuji Photo Film Co Ltd Hard coated film and hard coated film with functional film
JP4004214B2 (en) * 2000-08-24 2007-11-07 ナガセケムテックス株式会社 Antistatic coating composition
JP4289605B2 (en) * 2003-08-06 2009-07-01 日本合成化学工業株式会社 Active energy ray-curable resin composition
JP2005103922A (en) * 2003-09-30 2005-04-21 Nippon Paper Industries Co Ltd Hard coat film and its production method

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0598049A (en) * 1991-10-04 1993-04-20 Teijin Ltd Antistatic synthetic resin molding
JPH07316467A (en) * 1994-05-27 1995-12-05 Nippon Oil & Fats Co Ltd Antistatic coating resin composition, antistatic polymer film and its production
JP2000264939A (en) * 1999-03-15 2000-09-26 Kyoeisha Chem Co Ltd Urethane (meth)acrylate oligomer and antistatic coating material composition containing the same
JP2002121208A (en) * 2000-08-11 2002-04-23 Mitsubishi Chemicals Corp Active energy ray-curable material and antistatic top- coating agent
JP2003268316A (en) * 2002-03-19 2003-09-25 Nippon Paper Industries Co Ltd Coating composition for forming hard coat layer, and hard coat film
JP2006045425A (en) * 2004-08-06 2006-02-16 Dainippon Printing Co Ltd Ionizing radiation curing composition for forming antistatic film and antistatic film and structure provided with antistatic film

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012082287A (en) * 2010-10-08 2012-04-26 Aica Kogyo Co Ltd Resin composition and molding
CN102129090A (en) * 2010-11-30 2011-07-20 中国乐凯胶片集团公司 Optical hardening film
CN102129090B (en) * 2010-11-30 2012-07-25 中国乐凯胶片集团公司 Optical hardening film
JP2013020111A (en) * 2011-07-12 2013-01-31 Nof Corp Optical film
JP2014167104A (en) * 2013-02-04 2014-09-11 Arakawa Chem Ind Co Ltd Antistatic for active energy ray-curable resin composition, active energy ray-curable resin composition, cured film and optical film with antistatic treatment
WO2015157615A1 (en) * 2014-04-10 2015-10-15 3M Innovative Properties Company Adhesion promoting and/or dust suppression coating
US10703927B2 (en) 2014-04-10 2020-07-07 3M Innovative Properties Company Adhesion promoting and/or dust suppression coating
US11813358B2 (en) 2019-06-07 2023-11-14 Regents Of The University Of Michigan Lipid nanodisc formation by polymers having a pendant hydrophobic group

Also Published As

Publication number Publication date
TW200927775A (en) 2009-07-01
JP2009040924A (en) 2009-02-26

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