WO2009022559A1 - Curable resin composition and highly transparent antistatic hard coat material using the same - Google Patents
Curable resin composition and highly transparent antistatic hard coat material using the same Download PDFInfo
- Publication number
- WO2009022559A1 WO2009022559A1 PCT/JP2008/063886 JP2008063886W WO2009022559A1 WO 2009022559 A1 WO2009022559 A1 WO 2009022559A1 JP 2008063886 W JP2008063886 W JP 2008063886W WO 2009022559 A1 WO2009022559 A1 WO 2009022559A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- resin composition
- curable resin
- same
- hard coat
- highly transparent
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
- C08F220/1804—C4-(meth)acrylate, e.g. butyl (meth)acrylate, isobutyl (meth)acrylate or tert-butyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
- C09D4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/04—Acids; Metal salts or ammonium salts thereof
- C08F220/06—Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/111—Anti-reflection coatings using layers comprising organic materials
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Laminated Bodies (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Paints Or Removers (AREA)
- Polarising Elements (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Polymerisation Methods In General (AREA)
- Graft Or Block Polymers (AREA)
Abstract
Disclosed is a resin composition which enables to form a coating film that has both excellent antistatic properties and high transparency, while having sufficient hardness. Specifically disclosed is a curable resin composition characterized by containing the components (A) and (B) described below, while having a compatibility value between the components (A) and (B) of 50-150. (A) a (meth)acrylic copolymer containing a quaternary ammonium group (B) a multifunctional compound selected from polyurethane oligomers having a tri- or higher functional vinyl group or acrylic monomers having a bi- to hexa- functional vinyl group
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007-208772 | 2007-08-10 | ||
JP2007208772A JP2009040924A (en) | 2007-08-10 | 2007-08-10 | Curable resin composition and high transparency antistatic hard coat material using the same |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2009022559A1 true WO2009022559A1 (en) | 2009-02-19 |
Family
ID=40350614
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2008/063886 WO2009022559A1 (en) | 2007-08-10 | 2008-08-01 | Curable resin composition and highly transparent antistatic hard coat material using the same |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP2009040924A (en) |
TW (1) | TW200927775A (en) |
WO (1) | WO2009022559A1 (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102129090A (en) * | 2010-11-30 | 2011-07-20 | 中国乐凯胶片集团公司 | Optical hardening film |
JP2012082287A (en) * | 2010-10-08 | 2012-04-26 | Aica Kogyo Co Ltd | Resin composition and molding |
JP2013020111A (en) * | 2011-07-12 | 2013-01-31 | Nof Corp | Optical film |
JP2014167104A (en) * | 2013-02-04 | 2014-09-11 | Arakawa Chem Ind Co Ltd | Antistatic for active energy ray-curable resin composition, active energy ray-curable resin composition, cured film and optical film with antistatic treatment |
WO2015157615A1 (en) * | 2014-04-10 | 2015-10-15 | 3M Innovative Properties Company | Adhesion promoting and/or dust suppression coating |
US11813358B2 (en) | 2019-06-07 | 2023-11-14 | Regents Of The University Of Michigan | Lipid nanodisc formation by polymers having a pendant hydrophobic group |
US12050227B2 (en) | 2018-04-17 | 2024-07-30 | Nara Institute Of Science And Technology | Lipid nanodisc formation by acryloyl-based copolymers |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010243879A (en) * | 2009-04-08 | 2010-10-28 | Toppan Printing Co Ltd | Antireflection film |
JP5812863B2 (en) * | 2009-10-22 | 2015-11-17 | 電気化学工業株式会社 | How to use the adhesive |
JP5638250B2 (en) * | 2010-01-28 | 2014-12-10 | Kjケミカルズ株式会社 | Antistatic agent and antistatic composition comprising unsaturated quaternary ammonium salt compound |
JP2015189799A (en) * | 2014-03-27 | 2015-11-02 | 三菱化学株式会社 | Curable resin composition, hard coat material and cured product |
TWI646185B (en) * | 2017-10-13 | 2019-01-01 | 住華科技股份有限公司 | Antistatic agent, adhesive composition using the same, display device, and polarizing plate |
TWI737949B (en) * | 2017-12-22 | 2021-09-01 | 日商荒川化學工業股份有限公司 | Antistatic agent for active energy ray curable resin composition, active energy ray curable resin composition, cured product and film |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0598049A (en) * | 1991-10-04 | 1993-04-20 | Teijin Ltd | Antistatic synthetic resin molding |
JPH07316467A (en) * | 1994-05-27 | 1995-12-05 | Nippon Oil & Fats Co Ltd | Antistatic coating resin composition, antistatic polymer film and its production |
JP2000264939A (en) * | 1999-03-15 | 2000-09-26 | Kyoeisha Chem Co Ltd | Urethane (meth)acrylate oligomer and antistatic coating material composition containing the same |
JP2002121208A (en) * | 2000-08-11 | 2002-04-23 | Mitsubishi Chemicals Corp | Active energy ray-curable material and antistatic top- coating agent |
JP2003268316A (en) * | 2002-03-19 | 2003-09-25 | Nippon Paper Industries Co Ltd | Coating composition for forming hard coat layer, and hard coat film |
JP2006045425A (en) * | 2004-08-06 | 2006-02-16 | Dainippon Printing Co Ltd | Ionizing radiation curing composition for forming antistatic film and antistatic film and structure provided with antistatic film |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002060526A (en) * | 2000-08-21 | 2002-02-26 | Fuji Photo Film Co Ltd | Hard coated film and hard coated film with functional film |
JP4004214B2 (en) * | 2000-08-24 | 2007-11-07 | ナガセケムテックス株式会社 | Antistatic coating composition |
JP4289605B2 (en) * | 2003-08-06 | 2009-07-01 | 日本合成化学工業株式会社 | Active energy ray-curable resin composition |
JP2005103922A (en) * | 2003-09-30 | 2005-04-21 | Nippon Paper Industries Co Ltd | Hard coat film and its production method |
-
2007
- 2007-08-10 JP JP2007208772A patent/JP2009040924A/en active Pending
-
2008
- 2008-08-01 WO PCT/JP2008/063886 patent/WO2009022559A1/en active Application Filing
- 2008-08-08 TW TW097130179A patent/TW200927775A/en unknown
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0598049A (en) * | 1991-10-04 | 1993-04-20 | Teijin Ltd | Antistatic synthetic resin molding |
JPH07316467A (en) * | 1994-05-27 | 1995-12-05 | Nippon Oil & Fats Co Ltd | Antistatic coating resin composition, antistatic polymer film and its production |
JP2000264939A (en) * | 1999-03-15 | 2000-09-26 | Kyoeisha Chem Co Ltd | Urethane (meth)acrylate oligomer and antistatic coating material composition containing the same |
JP2002121208A (en) * | 2000-08-11 | 2002-04-23 | Mitsubishi Chemicals Corp | Active energy ray-curable material and antistatic top- coating agent |
JP2003268316A (en) * | 2002-03-19 | 2003-09-25 | Nippon Paper Industries Co Ltd | Coating composition for forming hard coat layer, and hard coat film |
JP2006045425A (en) * | 2004-08-06 | 2006-02-16 | Dainippon Printing Co Ltd | Ionizing radiation curing composition for forming antistatic film and antistatic film and structure provided with antistatic film |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012082287A (en) * | 2010-10-08 | 2012-04-26 | Aica Kogyo Co Ltd | Resin composition and molding |
CN102129090A (en) * | 2010-11-30 | 2011-07-20 | 中国乐凯胶片集团公司 | Optical hardening film |
CN102129090B (en) * | 2010-11-30 | 2012-07-25 | 中国乐凯胶片集团公司 | Optical hardening film |
JP2013020111A (en) * | 2011-07-12 | 2013-01-31 | Nof Corp | Optical film |
JP2014167104A (en) * | 2013-02-04 | 2014-09-11 | Arakawa Chem Ind Co Ltd | Antistatic for active energy ray-curable resin composition, active energy ray-curable resin composition, cured film and optical film with antistatic treatment |
WO2015157615A1 (en) * | 2014-04-10 | 2015-10-15 | 3M Innovative Properties Company | Adhesion promoting and/or dust suppression coating |
US10703927B2 (en) | 2014-04-10 | 2020-07-07 | 3M Innovative Properties Company | Adhesion promoting and/or dust suppression coating |
US12050227B2 (en) | 2018-04-17 | 2024-07-30 | Nara Institute Of Science And Technology | Lipid nanodisc formation by acryloyl-based copolymers |
US11813358B2 (en) | 2019-06-07 | 2023-11-14 | Regents Of The University Of Michigan | Lipid nanodisc formation by polymers having a pendant hydrophobic group |
Also Published As
Publication number | Publication date |
---|---|
TW200927775A (en) | 2009-07-01 |
JP2009040924A (en) | 2009-02-26 |
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