WO2009005061A1 - X線計測装置及びx線計測方法 - Google Patents

X線計測装置及びx線計測方法 Download PDF

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Publication number
WO2009005061A1
WO2009005061A1 PCT/JP2008/061906 JP2008061906W WO2009005061A1 WO 2009005061 A1 WO2009005061 A1 WO 2009005061A1 JP 2008061906 W JP2008061906 W JP 2008061906W WO 2009005061 A1 WO2009005061 A1 WO 2009005061A1
Authority
WO
WIPO (PCT)
Prior art keywords
ray
laser beam
detected
data
ray metering
Prior art date
Application number
PCT/JP2008/061906
Other languages
English (en)
French (fr)
Inventor
Hiroyuki Nose
Daisuke Ishida
Namio Kaneko
Yasuo Sakai
Mitsuru Uesaka
Fumito Sakamoto
Katsuhiro Dobashi
Original Assignee
Ihi Corporation
The University Of Tokyo
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ihi Corporation, The University Of Tokyo filed Critical Ihi Corporation
Priority to US12/667,500 priority Critical patent/US8345824B2/en
Priority to EP08790769A priority patent/EP2164308B1/en
Priority to AT08790769T priority patent/ATE555638T1/de
Publication of WO2009005061A1 publication Critical patent/WO2009005061A1/ja

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05GX-RAY TECHNIQUE
    • H05G2/00Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • X-Ray Techniques (AREA)
  • Measurement Of Radiation (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

 X線検出データのうち、衝突点9においてX線4が発生している時に対応する検出データを有効化し、その他のデータを無効化して、X線波形を生成する。例えば、レーザ光3がパルスレーザ光であり、電子ビーム1が連続状又はパルスレーザ光のパルス幅と同じかそれより長いパルス幅をもつパルス状の電子ビームである場合は、レーザ光3を検出し、X線検出データとレーザ光検出データとを、衝突点9に関して時間軸を一致させて乗算して、X線波形を生成する。
PCT/JP2008/061906 2007-07-04 2008-07-01 X線計測装置及びx線計測方法 WO2009005061A1 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
US12/667,500 US8345824B2 (en) 2007-07-04 2008-07-01 X-ray metering apparatus, and X-ray metering method
EP08790769A EP2164308B1 (en) 2007-07-04 2008-07-01 X-ray metering apparatus, and x-ray metering method
AT08790769T ATE555638T1 (de) 2007-07-04 2008-07-01 Röntgenmessvorrichtung und röntgenmessverfahren

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-175739 2007-07-04
JP2007175739A JP4879102B2 (ja) 2007-07-04 2007-07-04 X線計測装置及びx線計測方法

Publications (1)

Publication Number Publication Date
WO2009005061A1 true WO2009005061A1 (ja) 2009-01-08

Family

ID=40226106

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/061906 WO2009005061A1 (ja) 2007-07-04 2008-07-01 X線計測装置及びx線計測方法

Country Status (5)

Country Link
US (1) US8345824B2 (ja)
EP (1) EP2164308B1 (ja)
JP (1) JP4879102B2 (ja)
AT (1) ATE555638T1 (ja)
WO (1) WO2009005061A1 (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7421564B2 (ja) * 2019-02-22 2024-01-24 アリゾナ ボード オブ リージェンツ オン ビハーフ オブ アリゾナ ステート ユニバーシティ 荷電粒子パルスを光パルスと同期させる方法および装置

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001338796A (ja) * 2000-05-29 2001-12-07 Sumitomo Heavy Ind Ltd X線発生装置及び発生方法
JP2001345503A (ja) * 2000-05-31 2001-12-14 Toshiba Corp レーザ逆コンプトン光生成装置
JP2006318745A (ja) 2005-05-12 2006-11-24 Ishikawajima Harima Heavy Ind Co Ltd 診断・治療用x線切換え発生装置
JP2006344731A (ja) * 2005-06-08 2006-12-21 Ishikawajima Harima Heavy Ind Co Ltd レーザー光周回装置及びレーザー光周回方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2528622B2 (ja) 1993-08-19 1996-08-28 財団法人レーザー技術総合研究所 高輝度X線又はγ線の発生方法及び装置
JPH11142786A (ja) 1997-11-13 1999-05-28 Nippon Laser:Kk レーザー光路分配装置
US6687333B2 (en) * 1999-01-25 2004-02-03 Vanderbilt University System and method for producing pulsed monochromatic X-rays
US6377651B1 (en) 1999-10-11 2002-04-23 University Of Central Florida Laser plasma source for extreme ultraviolet lithography using a water droplet target
JP2001176694A (ja) * 1999-12-15 2001-06-29 Sumitomo Heavy Ind Ltd 光パルスビーム発生装置及びx線発生装置
JP3463281B2 (ja) 2000-06-28 2003-11-05 住友重機械工業株式会社 多軸レーザ加工装置及びレーザ加工方法
US7372056B2 (en) 2005-06-29 2008-05-13 Cymer, Inc. LPP EUV plasma source material target delivery system
JP2004226271A (ja) 2003-01-23 2004-08-12 Sumitomo Heavy Ind Ltd X線発生装置及び発生方法
JP4174331B2 (ja) 2003-01-23 2008-10-29 住友重機械工業株式会社 X線発生装置及び発生方法
US7016470B2 (en) 2004-03-29 2006-03-21 General Electric Company System and method for X-ray generation
US7277526B2 (en) * 2004-04-09 2007-10-02 Lyncean Technologies, Inc. Apparatus, system, and method for high flux, compact compton x-ray source
JP4674802B2 (ja) 2005-05-12 2011-04-20 株式会社Ihi 多色x線発生装置
US7382861B2 (en) 2005-06-02 2008-06-03 John M. J. Madey High efficiency monochromatic X-ray source using an optical undulator
JP4590653B2 (ja) * 2007-03-23 2010-12-01 株式会社Ihi 荷電粒子ビーム減速装置および方法とこれを用いたx線発生装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001338796A (ja) * 2000-05-29 2001-12-07 Sumitomo Heavy Ind Ltd X線発生装置及び発生方法
JP2001345503A (ja) * 2000-05-31 2001-12-14 Toshiba Corp レーザ逆コンプトン光生成装置
JP2006318745A (ja) 2005-05-12 2006-11-24 Ishikawajima Harima Heavy Ind Co Ltd 診断・治療用x線切換え発生装置
JP2006344731A (ja) * 2005-06-08 2006-12-21 Ishikawajima Harima Heavy Ind Co Ltd レーザー光周回装置及びレーザー光周回方法

Also Published As

Publication number Publication date
JP4879102B2 (ja) 2012-02-22
EP2164308B1 (en) 2012-04-25
EP2164308A4 (en) 2011-10-05
US20110026679A1 (en) 2011-02-03
US8345824B2 (en) 2013-01-01
ATE555638T1 (de) 2012-05-15
JP2009016147A (ja) 2009-01-22
EP2164308A1 (en) 2010-03-17

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