WO2009005061A1 - X線計測装置及びx線計測方法 - Google Patents
X線計測装置及びx線計測方法 Download PDFInfo
- Publication number
- WO2009005061A1 WO2009005061A1 PCT/JP2008/061906 JP2008061906W WO2009005061A1 WO 2009005061 A1 WO2009005061 A1 WO 2009005061A1 JP 2008061906 W JP2008061906 W JP 2008061906W WO 2009005061 A1 WO2009005061 A1 WO 2009005061A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- ray
- laser beam
- detected
- data
- ray metering
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- X-Ray Techniques (AREA)
- Measurement Of Radiation (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Abstract
X線検出データのうち、衝突点9においてX線4が発生している時に対応する検出データを有効化し、その他のデータを無効化して、X線波形を生成する。例えば、レーザ光3がパルスレーザ光であり、電子ビーム1が連続状又はパルスレーザ光のパルス幅と同じかそれより長いパルス幅をもつパルス状の電子ビームである場合は、レーザ光3を検出し、X線検出データとレーザ光検出データとを、衝突点9に関して時間軸を一致させて乗算して、X線波形を生成する。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/667,500 US8345824B2 (en) | 2007-07-04 | 2008-07-01 | X-ray metering apparatus, and X-ray metering method |
EP08790769A EP2164308B1 (en) | 2007-07-04 | 2008-07-01 | X-ray metering apparatus, and x-ray metering method |
AT08790769T ATE555638T1 (de) | 2007-07-04 | 2008-07-01 | Röntgenmessvorrichtung und röntgenmessverfahren |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007-175739 | 2007-07-04 | ||
JP2007175739A JP4879102B2 (ja) | 2007-07-04 | 2007-07-04 | X線計測装置及びx線計測方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2009005061A1 true WO2009005061A1 (ja) | 2009-01-08 |
Family
ID=40226106
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2008/061906 WO2009005061A1 (ja) | 2007-07-04 | 2008-07-01 | X線計測装置及びx線計測方法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US8345824B2 (ja) |
EP (1) | EP2164308B1 (ja) |
JP (1) | JP4879102B2 (ja) |
AT (1) | ATE555638T1 (ja) |
WO (1) | WO2009005061A1 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7421564B2 (ja) * | 2019-02-22 | 2024-01-24 | アリゾナ ボード オブ リージェンツ オン ビハーフ オブ アリゾナ ステート ユニバーシティ | 荷電粒子パルスを光パルスと同期させる方法および装置 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001338796A (ja) * | 2000-05-29 | 2001-12-07 | Sumitomo Heavy Ind Ltd | X線発生装置及び発生方法 |
JP2001345503A (ja) * | 2000-05-31 | 2001-12-14 | Toshiba Corp | レーザ逆コンプトン光生成装置 |
JP2006318745A (ja) | 2005-05-12 | 2006-11-24 | Ishikawajima Harima Heavy Ind Co Ltd | 診断・治療用x線切換え発生装置 |
JP2006344731A (ja) * | 2005-06-08 | 2006-12-21 | Ishikawajima Harima Heavy Ind Co Ltd | レーザー光周回装置及びレーザー光周回方法 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2528622B2 (ja) | 1993-08-19 | 1996-08-28 | 財団法人レーザー技術総合研究所 | 高輝度X線又はγ線の発生方法及び装置 |
JPH11142786A (ja) | 1997-11-13 | 1999-05-28 | Nippon Laser:Kk | レーザー光路分配装置 |
US6687333B2 (en) * | 1999-01-25 | 2004-02-03 | Vanderbilt University | System and method for producing pulsed monochromatic X-rays |
US6377651B1 (en) | 1999-10-11 | 2002-04-23 | University Of Central Florida | Laser plasma source for extreme ultraviolet lithography using a water droplet target |
JP2001176694A (ja) * | 1999-12-15 | 2001-06-29 | Sumitomo Heavy Ind Ltd | 光パルスビーム発生装置及びx線発生装置 |
JP3463281B2 (ja) | 2000-06-28 | 2003-11-05 | 住友重機械工業株式会社 | 多軸レーザ加工装置及びレーザ加工方法 |
US7372056B2 (en) | 2005-06-29 | 2008-05-13 | Cymer, Inc. | LPP EUV plasma source material target delivery system |
JP2004226271A (ja) | 2003-01-23 | 2004-08-12 | Sumitomo Heavy Ind Ltd | X線発生装置及び発生方法 |
JP4174331B2 (ja) | 2003-01-23 | 2008-10-29 | 住友重機械工業株式会社 | X線発生装置及び発生方法 |
US7016470B2 (en) | 2004-03-29 | 2006-03-21 | General Electric Company | System and method for X-ray generation |
US7277526B2 (en) * | 2004-04-09 | 2007-10-02 | Lyncean Technologies, Inc. | Apparatus, system, and method for high flux, compact compton x-ray source |
JP4674802B2 (ja) | 2005-05-12 | 2011-04-20 | 株式会社Ihi | 多色x線発生装置 |
US7382861B2 (en) | 2005-06-02 | 2008-06-03 | John M. J. Madey | High efficiency monochromatic X-ray source using an optical undulator |
JP4590653B2 (ja) * | 2007-03-23 | 2010-12-01 | 株式会社Ihi | 荷電粒子ビーム減速装置および方法とこれを用いたx線発生装置 |
-
2007
- 2007-07-04 JP JP2007175739A patent/JP4879102B2/ja not_active Expired - Fee Related
-
2008
- 2008-07-01 EP EP08790769A patent/EP2164308B1/en not_active Not-in-force
- 2008-07-01 WO PCT/JP2008/061906 patent/WO2009005061A1/ja active Application Filing
- 2008-07-01 AT AT08790769T patent/ATE555638T1/de active
- 2008-07-01 US US12/667,500 patent/US8345824B2/en not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001338796A (ja) * | 2000-05-29 | 2001-12-07 | Sumitomo Heavy Ind Ltd | X線発生装置及び発生方法 |
JP2001345503A (ja) * | 2000-05-31 | 2001-12-14 | Toshiba Corp | レーザ逆コンプトン光生成装置 |
JP2006318745A (ja) | 2005-05-12 | 2006-11-24 | Ishikawajima Harima Heavy Ind Co Ltd | 診断・治療用x線切換え発生装置 |
JP2006344731A (ja) * | 2005-06-08 | 2006-12-21 | Ishikawajima Harima Heavy Ind Co Ltd | レーザー光周回装置及びレーザー光周回方法 |
Also Published As
Publication number | Publication date |
---|---|
JP4879102B2 (ja) | 2012-02-22 |
EP2164308B1 (en) | 2012-04-25 |
EP2164308A4 (en) | 2011-10-05 |
US20110026679A1 (en) | 2011-02-03 |
US8345824B2 (en) | 2013-01-01 |
ATE555638T1 (de) | 2012-05-15 |
JP2009016147A (ja) | 2009-01-22 |
EP2164308A1 (en) | 2010-03-17 |
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