WO2008133080A9 - カラーフィルタ、液晶表示装置およびその製造に用いられる硬化性組成物 - Google Patents

カラーフィルタ、液晶表示装置およびその製造に用いられる硬化性組成物 Download PDF

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Publication number
WO2008133080A9
WO2008133080A9 PCT/JP2008/057269 JP2008057269W WO2008133080A9 WO 2008133080 A9 WO2008133080 A9 WO 2008133080A9 JP 2008057269 W JP2008057269 W JP 2008057269W WO 2008133080 A9 WO2008133080 A9 WO 2008133080A9
Authority
WO
WIPO (PCT)
Prior art keywords
color
color filter
hardening composition
production
liquid crystal
Prior art date
Application number
PCT/JP2008/057269
Other languages
English (en)
French (fr)
Other versions
WO2008133080A1 (ja
Inventor
Tsutomu Okita
Original Assignee
Fujifilm Corp
Tsutomu Okita
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2007108121A external-priority patent/JP2008134583A/ja
Application filed by Fujifilm Corp, Tsutomu Okita filed Critical Fujifilm Corp
Priority to CN2008800123786A priority Critical patent/CN101657739B/zh
Publication of WO2008133080A1 publication Critical patent/WO2008133080A1/ja
Publication of WO2008133080A9 publication Critical patent/WO2008133080A9/ja

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)

Abstract

　着色画素形成用硬化性組成物により形成され、ＣＩＥ表色系において、Ｃ光源での色純度がＮＴＳＣ方式の３原色色度点の面積（１００）に対して６５％以上である着色画素と、遮光部形成用硬化性組成物により形成され、光学濃度（ＯＤ値）が４．５以上であり、幅５～１５μｍの遮光部とを有し、カラーフィルタコントラスト比が５０００以上であるカラーフィルタ。
PCT/JP2008/057269 2007-04-17 2008-04-14 カラーフィルタ、液晶表示装置およびその製造に用いられる硬化性組成物 WO2008133080A1 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN2008800123786A CN101657739B (zh) 2007-04-17 2008-04-14 滤色器、液晶显示装置以及在其制造中使用的固化性组合物

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007108121A JP2008134583A (ja) 2006-10-30 2007-04-17 カラーフィルタ、液晶表示装置およびその製造に用いられる硬化性組成物
JP2007-108121 2007-04-17

Publications (2)

Publication Number Publication Date
WO2008133080A1 WO2008133080A1 (ja) 2008-11-06
WO2008133080A9 true WO2008133080A9 (ja) 2009-05-22

Family

ID=39925538

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/057269 WO2008133080A1 (ja) 2007-04-17 2008-04-14 カラーフィルタ、液晶表示装置およびその製造に用いられる硬化性組成物

Country Status (4)

Country Link
KR (1) KR20100016082A (ja)
CN (1) CN101657739B (ja)
TW (1) TW200905265A (ja)
WO (1) WO2008133080A1 (ja)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8982197B2 (en) 2009-02-03 2015-03-17 Lg Chem, Ltd. Optical filter
JP2010209160A (ja) * 2009-03-06 2010-09-24 Fujifilm Corp 顔料分散組成物
JP4596294B1 (ja) * 2009-04-27 2010-12-08 Ｄｉｃ株式会社 有機半導体素子遮光膜形成用インキ組成物、遮光膜形成方法及び遮光膜を有する有機トランジスタ素子
KR101791493B1 (ko) * 2009-12-11 2017-10-30 후지필름 가부시키가이샤 흑색 경화성 조성물, 차광성 컬러필터, 차광막 및 그 제조 방법, 웨이퍼 레벨 렌즈, 및 고체 촬상 소자
KR102240965B1 (ko) * 2013-11-13 2021-04-15 세키스이가가쿠 고교가부시키가이샤 액정 표시 소자용 시일제, 상하 도통 재료, 및 액정 표시 소자
KR20200130286A (ko) * 2018-03-07 2020-11-18 나가세케무텍쿠스가부시키가이샤 아크릴 수지 및 그 제조 방법과 금속 미립자 분산체

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3590481B2 (ja) * 1996-08-07 2004-11-17 サカタインクス株式会社 顔料分散物及びそれを用いた被覆剤組成物
JP3590279B2 (ja) * 1998-11-18 2004-11-17 富士フイルムアーチ株式会社 カラーフィルター用光重合性組成物
JP2004163902A (ja) * 2002-08-30 2004-06-10 Mitsubishi Chemicals Corp カラー液晶表示装置及び感光性着色樹脂組成物
JP4528548B2 (ja) * 2003-04-18 2010-08-18 富士フイルム株式会社 表示装置用遮光膜
JP2005240000A (ja) * 2003-06-23 2005-09-08 Nippon Shokubai Co Ltd 顔料分散組成物及び感光性樹脂組成物
JP4041814B2 (ja) * 2003-10-07 2008-02-06 シャープ株式会社 カラーフィルタ及びそれを備えた液晶表示装置
JP5030386B2 (ja) * 2005-03-03 2012-09-19 富士フイルム株式会社 表示装置用遮光膜、黒色材料用微粒子含有組成物、材料、遮光膜付き基板、カラーフィルタ、液晶表示素子、液晶表示装置、及び表示装置
JP2006322982A (ja) * 2005-05-17 2006-11-30 Hitachi Chem Co Ltd 着色組成物、感光性着色樹脂組成物、着色画像形成用感光液、着色画像の製造法、カラーフィルタの製造法及びカラーフィルタ
JP2007023216A (ja) * 2005-07-20 2007-02-01 Hitachi Chem Co Ltd 着色組成物、感光性着色樹脂組成物、着色画像形成用感光液、着色画像の製造法、カラーフィルタの製造法及びカラーフィルタ
JP2007071949A (ja) * 2005-09-05 2007-03-22 Toppan Printing Co Ltd 印刷物およびその製造方法
JP2007079094A (ja) * 2005-09-14 2007-03-29 Toyo Ink Mfg Co Ltd カラーフィルタ用赤色着色組成物およびカラーフィルタ

Also Published As

Publication number Publication date
KR20100016082A (ko) 2010-02-12
WO2008133080A1 (ja) 2008-11-06
CN101657739A (zh) 2010-02-24
TW200905265A (en) 2009-02-01
CN101657739B (zh) 2012-05-30

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