WO2008129986A1 - 着色樹脂組成物、カラーフィルタ、液晶表示装置、及び有機ｅｌディスプレイ - Google Patents

着色樹脂組成物、カラーフィルタ、液晶表示装置、及び有機ｅｌディスプレイ Download PDF

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Publication number
WO2008129986A1
WO2008129986A1 PCT/JP2008/057356 JP2008057356W WO2008129986A1 WO 2008129986 A1 WO2008129986 A1 WO 2008129986A1 JP 2008057356 W JP2008057356 W JP 2008057356W WO 2008129986 A1 WO2008129986 A1 WO 2008129986A1
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Prior art keywords
resin composition
colored resin
organic
liquid crystal
color filter
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PCT/JP2008/057356
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English (en)
French (fr)
Inventor
Toshiyuki Tanaka
Junji Mizukami
Tatsunori Tsuchiya
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Mitsubishi Chemical Corporation
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Publication date
Application filed by Mitsubishi Chemical Corporation filed Critical Mitsubishi Chemical Corporation
Priority to KR1020087029636A priority Critical patent/KR101434275B1/ko
Priority to CN200880000397.7A priority patent/CN101542393B/zh
Publication of WO2008129986A1 publication Critical patent/WO2008129986A1/ja

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • C08F283/10—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polymers containing more than one epoxy radical per molecule
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • C08G59/22—Di-epoxy compounds
    • C08G59/24—Di-epoxy compounds carbocyclic
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/42—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133502—Antiglare, refractive index matching layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Abstract

　色材の含有量が多い場合でも、画像形成性に優れる着色樹脂組成物と、この着色樹脂組成物を用いたカラーフィルタ、液晶表示装置及び有機ＥＬディスプレイを提供する。少なくとも（Ａ）色材、及び（Ｂ）有機結合剤を含有する着色樹脂組成物であって、（Ｂ）有機結合剤が、下記一般式（１）で表されるエポキシ化合物（ａ）と不飽和基含有カルボン酸（ｂ）との反応物を、多塩基酸無水物（ｄ）と反応させることにより得られる、酸価が１０ｍｇ－ＫＯＨ／ｇ以上のアルカリ可溶性不飽和樹脂を含有することを特徴とする着色樹脂組成物。 〔上記一般式（１）において、Ｘは特定の連結基。但し、分子構造中に一つ以上のアダマンタン構造を含む。ｌは、２又は３の整数を示す。〕
PCT/JP2008/057356 2007-04-20 2008-04-15 着色樹脂組成物、カラーフィルタ、液晶表示装置、及び有機ｅｌディスプレイ WO2008129986A1 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
KR1020087029636A KR101434275B1 (ko) 2007-04-20 2008-04-15 착색 수지 조성물, 컬러 필터, 액정 표시 장치, 및 유기 ｅｌ 디스플레이
CN200880000397.7A CN101542393B (zh) 2007-04-20 2008-04-15 着色树脂组合物、滤色器、液晶显示装置以及有机电致发光显示屏

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007111990 2007-04-20
JP2007-111990 2007-04-20

Publications (1)

Publication Number Publication Date
WO2008129986A1 true WO2008129986A1 (ja) 2008-10-30

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JP (1) JP5169422B2 (ja)
KR (1) KR101434275B1 (ja)
CN (1) CN101542393B (ja)
TW (1) TWI421634B (ja)
WO (1) WO2008129986A1 (ja)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011065342A1 (ja) * 2009-11-27 2011-06-03 Dic株式会社 凸版反転印刷用インキ組成物、印刷物、及びカラーフィルタ
KR101349622B1 (ko) * 2011-08-26 2014-01-10 롬엔드하스전자재료코리아유한회사 광중합성 불포화 수지, 이를 포함하는 감광성 수지 조성물 및 이로부터 형성되는 차광성 스페이서와 액정 디스플레이 장치
WO2013115268A1 (ja) * 2012-01-31 2013-08-08 三菱化学株式会社 着色感光性組成物、ブラックフォトスペーサー、及びカラーフィルター
CN102880002B (zh) * 2012-10-09 2015-09-23 京东方科技集团股份有限公司 一种黑色感光性树脂组合物、显示面板及液晶显示器
JP6205813B2 (ja) * 2013-04-15 2017-10-04 三菱ケミカル株式会社 Ｉｎ−Ｃｅｌｌ型偏光子のオーバーコート層形成用樹脂組成物、Ｉｎ−Ｃｅｌｌ型積層偏光子及びこれを備えてなる液晶表示素子
CN105556390B (zh) * 2013-09-25 2020-02-28 三菱化学株式会社 感光性着色组合物、黑色矩阵、着色间隔物、图像显示装置及颜料分散液
KR102305058B1 (ko) 2014-07-04 2021-09-24 미쯔비시 케미컬 주식회사 수지, 감광성 수지 조성물, 경화물, 컬러 필터 및 화상 표시 장치

Citations (3)

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Publication number Priority date Publication date Assignee Title
JPH10130371A (ja) * 1996-11-01 1998-05-19 Nippon Kayaku Co Ltd アダマンタン類、これらを含有する熱可塑性樹脂及びこれらを含有する熱硬化性樹脂組成物
JP2005126674A (ja) * 2003-09-30 2005-05-19 Mitsubishi Chemicals Corp 着色樹脂組成物、カラーフィルタ、及び液晶表示装置
WO2007029598A1 (ja) * 2005-09-05 2007-03-15 Idemitsu Kosan Co., Ltd. アダマンタン誘導体、エポキシ樹脂及びそれらを含む樹脂組成物を用いた光学電子部材

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JP4204391B2 (ja) * 2003-06-16 2009-01-07 株式会社トクヤマ 重合性アダマンタン化合物
CN1906536A (zh) * 2004-08-09 2007-01-31 三菱化学株式会社 感光性树脂组合物、滤色器和液晶显示器
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JP2007025275A (ja) * 2005-07-15 2007-02-01 Fujifilm Holdings Corp 感光性組成物及び感光性フィルム、並びに、永久パターン及びその形成方法
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JP5134233B2 (ja) * 2006-11-29 2013-01-30 出光興産株式会社 アダマンタン誘導体、その製造方法及びアダマンタン誘導体を含む樹脂組成物

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10130371A (ja) * 1996-11-01 1998-05-19 Nippon Kayaku Co Ltd アダマンタン類、これらを含有する熱可塑性樹脂及びこれらを含有する熱硬化性樹脂組成物
JP2005126674A (ja) * 2003-09-30 2005-05-19 Mitsubishi Chemicals Corp 着色樹脂組成物、カラーフィルタ、及び液晶表示装置
WO2007029598A1 (ja) * 2005-09-05 2007-03-15 Idemitsu Kosan Co., Ltd. アダマンタン誘導体、エポキシ樹脂及びそれらを含む樹脂組成物を用いた光学電子部材

Also Published As

Publication number Publication date
CN101542393A (zh) 2009-09-23
CN101542393B (zh) 2012-12-12
TWI421634B (zh) 2014-01-01
JP5169422B2 (ja) 2013-03-27
KR101434275B1 (ko) 2014-08-27
JP2008287246A (ja) 2008-11-27
KR20100014075A (ko) 2010-02-10
TW200900859A (en) 2009-01-01

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