TW201614373A - Photosensitive resin composition, manufacturing method for color filter, color filter and liquid crystal display element using the same - Google Patents
Photosensitive resin composition, manufacturing method for color filter, color filter and liquid crystal display element using the sameInfo
- Publication number
- TW201614373A TW201614373A TW104133861A TW104133861A TW201614373A TW 201614373 A TW201614373 A TW 201614373A TW 104133861 A TW104133861 A TW 104133861A TW 104133861 A TW104133861 A TW 104133861A TW 201614373 A TW201614373 A TW 201614373A
- Authority
- TW
- Taiwan
- Prior art keywords
- color filter
- alkali
- resin composition
- photosensitive resin
- soluble resin
- Prior art date
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D209/56—Ring systems containing three or more rings
- C07D209/80—[b, c]- or [b, d]-condensed
- C07D209/82—Carbazoles; Hydrogenated carbazoles
- C07D209/86—Carbazoles; Hydrogenated carbazoles with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the ring system
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D405/00—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
- C07D405/02—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings
- C07D405/12—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings linked by a chain containing hetero atoms as chain links
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D409/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms
- C07D409/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings
- C07D409/06—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings linked by a carbon chain containing only aliphatic carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D409/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms
- C07D409/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings
- C07D409/12—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings linked by a chain containing hetero atoms as chain links
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Mathematical Physics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Optical Filters (AREA)
- Materials For Photolithography (AREA)
- Polymerisation Methods In General (AREA)
Abstract
A photosensitive resin composition including an alkali-soluble resin (A), a compound having an ethylenically unsaturated group (B), a photoinitiator (C), a solvent (D) and a pigment (E). The alkali-soluble resin (A) includes alkali-soluble resin (A-1) and alkali-soluble resin (A-2). The alkali-soluble resin (A-1) is obtained by reacting a mixture, wherein the mixture includes an epoxy compound having at least two epoxy groups (a-1-1), a compound having at least one carboxylic acid group and at least one ethylenically unsaturated group (a-1-2), tetracarboxylic acid or its dianhydride (a-1-3) and dicarboxylic acid or its anhydride (a-1-4). The epoxy compound having at least two epoxy groups (a-1-1) has a structure represented by formula (aI-1) or formula (aI-2). The photoinitiator (C) includes a photoinitiator (C-1) represented by formula (1).
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201462063969P | 2014-10-15 | 2014-10-15 | |
US62/063,969 | 2014-10-15 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201614373A true TW201614373A (en) | 2016-04-16 |
TWI620011B TWI620011B (en) | 2018-04-01 |
Family
ID=55746149
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW104133861A TWI620011B (en) | 2014-10-15 | 2015-10-15 | Photosensitive resin composition, manufacturing method for color filter, color filter and liquid crystal display element using the same |
Country Status (3)
Country | Link |
---|---|
CN (1) | CN107003604B (en) |
TW (1) | TWI620011B (en) |
WO (1) | WO2016058551A1 (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI665523B (en) * | 2016-05-20 | 2019-07-11 | 奇美實業股份有限公司 | Photosensitive resin composition for black matrix, black matrix, color filter, and liquid crystal display device |
TWI666518B (en) * | 2016-12-30 | 2019-07-21 | 奇美實業股份有限公司 | Photosensitive resin composition and uses thereof |
TWI669573B (en) * | 2016-10-21 | 2019-08-21 | 奇美實業股份有限公司 | Photosensitive resin composition and uses thereof |
TWI683181B (en) * | 2016-10-03 | 2020-01-21 | 奇美實業股份有限公司 | Photosensitive resin composition and uses thereof |
TWI705299B (en) * | 2016-08-01 | 2020-09-21 | 南韓商東友精細化工有限公司 | Colored photosensitive resin composition, color filter, and image display apparatus comprising the same |
TWI716262B (en) * | 2020-01-16 | 2021-01-11 | 新應材股份有限公司 | Resin composition, cured film and black matrix |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106125508A (en) * | 2015-05-06 | 2016-11-16 | 奇美实业股份有限公司 | Photosensitive resin composition for color filter and application thereof |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1566128A (en) * | 2003-07-03 | 2005-01-19 | 中国人民解放军军事医学科学院放射医学研究所 | Sugar charcoal glycoside isoflavone compound containing alkane amine group and alkoxy substitution, process and uses thereof |
CN101627339A (en) * | 2007-06-18 | 2010-01-13 | 旭化成电子材料株式会社 | Photosensitive resin composition, flexographic printing plate, and method for producing flexographic printing plate |
WO2012045736A1 (en) * | 2010-10-05 | 2012-04-12 | Basf Se | Oxime ester derivatives of benzocarbazole compounds and their use as photoinitiators in photopolymerizable compositions |
TWI420244B (en) * | 2011-04-08 | 2013-12-21 | Chi Mei Corp | Photosensitive resin composition, and color filter and liquid crystal display device made by using the composition |
JP5482878B2 (en) * | 2012-01-30 | 2014-05-07 | Jsr株式会社 | Colorant, coloring composition, color filter and display element |
JP2014005466A (en) * | 2012-06-25 | 2014-01-16 | Dongwoo Fine-Chem Co Ltd | Alkali-soluble resin, photosensitive resin composition containing the same, and color filter using the same |
TWI474112B (en) * | 2012-09-27 | 2015-02-21 | Chi Mei Corp | Photosensitive resin composition, protecting film, and a device containing the protecting film |
TWI479264B (en) * | 2012-12-20 | 2015-04-01 | Chi Mei Corp | Photosensitive resin composition, color filter and liquid crystal display device |
CN103969947B (en) * | 2013-01-31 | 2016-05-04 | 太阳油墨(苏州)有限公司 | Alkali development-type photosensitive resin composition, its dry film and solidfied material thereof and use it and the printed circuit board (PCB) that forms |
-
2015
- 2015-10-15 WO PCT/CN2015/092029 patent/WO2016058551A1/en active Application Filing
- 2015-10-15 CN CN201580055678.2A patent/CN107003604B/en active Active
- 2015-10-15 TW TW104133861A patent/TWI620011B/en active
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI665523B (en) * | 2016-05-20 | 2019-07-11 | 奇美實業股份有限公司 | Photosensitive resin composition for black matrix, black matrix, color filter, and liquid crystal display device |
TWI705299B (en) * | 2016-08-01 | 2020-09-21 | 南韓商東友精細化工有限公司 | Colored photosensitive resin composition, color filter, and image display apparatus comprising the same |
TWI683181B (en) * | 2016-10-03 | 2020-01-21 | 奇美實業股份有限公司 | Photosensitive resin composition and uses thereof |
TWI669573B (en) * | 2016-10-21 | 2019-08-21 | 奇美實業股份有限公司 | Photosensitive resin composition and uses thereof |
TWI666518B (en) * | 2016-12-30 | 2019-07-21 | 奇美實業股份有限公司 | Photosensitive resin composition and uses thereof |
TWI716262B (en) * | 2020-01-16 | 2021-01-11 | 新應材股份有限公司 | Resin composition, cured film and black matrix |
Also Published As
Publication number | Publication date |
---|---|
TWI620011B (en) | 2018-04-01 |
CN107003604A (en) | 2017-08-01 |
WO2016058551A1 (en) | 2016-04-21 |
CN107003604B (en) | 2020-08-11 |
WO2016058551A9 (en) | 2017-05-18 |
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