TWI620011B - Photosensitive resin composition, manufacturing method for color filter, color filter and liquid crystal display element using the same - Google Patents

Photosensitive resin composition, manufacturing method for color filter, color filter and liquid crystal display element using the same Download PDF

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TWI620011B
TWI620011B TW104133861A TW104133861A TWI620011B TW I620011 B TWI620011 B TW I620011B TW 104133861 A TW104133861 A TW 104133861A TW 104133861 A TW104133861 A TW 104133861A TW I620011 B TWI620011 B TW I620011B
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TW201614373A (en
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王端志
謝栢源
許榮賓
許承昌
何維凱
郭怡嘉
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奇美實業股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D209/00Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/56Ring systems containing three or more rings
    • C07D209/80[b, c]- or [b, d]-condensed
    • C07D209/82Carbazoles; Hydrogenated carbazoles
    • C07D209/86Carbazoles; Hydrogenated carbazoles with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the ring system
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D405/00Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
    • C07D405/02Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings
    • C07D405/12Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings linked by a chain containing hetero atoms as chain links
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D409/00Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms
    • C07D409/02Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings
    • C07D409/06Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings linked by a carbon chain containing only aliphatic carbon atoms
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D409/00Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms
    • C07D409/02Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings
    • C07D409/12Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings linked by a chain containing hetero atoms as chain links
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Abstract

一種感光性樹脂組成物,其包括鹼可溶性樹脂(A)、具有 乙烯性不飽和基之化合物(B)、光起始劑(C)、溶劑(D)以及顏料(E)。所述鹼可溶性樹脂(A)包括鹼可溶性樹脂(A-1)及鹼可溶性樹脂(A-2)。所述鹼可溶性樹脂(A-1)是由混合物反應而獲得,所述混合物包括具有至少二個環氧基的環氧化合物(a-1-1)、具有至少一個羧酸基及至少一個乙烯性不飽和基之化合物(a-1-2)、四羧酸或其酸二酐(a-1-3)以及二羧酸或其酸酐(a-1-4)。所述具有至少二個環氧基的環氧化合物(a-1-1)具有如下式(aI-1)或下式(aI-2)所示之結構。所述光起始劑(C)包括由式(1)表示的光起始劑(C-1)。 A photosensitive resin composition comprising an alkali-soluble resin (A) having The ethylenically unsaturated group compound (B), the photoinitiator (C), the solvent (D), and the pigment (E). The alkali-soluble resin (A) includes an alkali-soluble resin (A-1) and an alkali-soluble resin (A-2). The alkali-soluble resin (A-1) is obtained by reacting a mixture comprising an epoxy compound (a-1-1) having at least two epoxy groups, having at least one carboxylic acid group and at least one ethylene The compound (a-1-2), the tetracarboxylic acid or its acid dianhydride (a-1-3), and the dicarboxylic acid or its anhydride (a-1-4). The epoxy compound (a-1-1) having at least two epoxy groups has a structure represented by the following formula (aI-1) or the following formula (aI-2). The photoinitiator (C) includes a photoinitiator (C-1) represented by the formula (1).

Description

感光性樹脂組成物、彩色濾光片之製造方法、 彩色濾光片以及液晶顯示裝置 Photosensitive resin composition, method for producing color filter, Color filter and liquid crystal display device

本發明是有關於一種感光性樹脂組成物,與使用該感光性樹脂組成物所形成之彩色濾光片及液晶顯示裝置。特別是有關於一種具有高精細度的圖案直線性佳、低逸氣性和圖案平滑性佳的感光性樹脂組成物及使用該感光性樹脂組成物所形成之彩色濾光片及液晶顯示裝置。 The present invention relates to a photosensitive resin composition and a color filter and a liquid crystal display device formed using the photosensitive resin composition. In particular, there is a photosensitive resin composition having high linearity, high outgassing property, and good pattern smoothness, and a color filter and a liquid crystal display device formed using the photosensitive resin composition.

目前,彩色濾光片已被廣泛地應用在彩色液晶顯示器、彩色傳真機、彩色攝影機等辦公器材之領域。隨著市場需求日漸擴大,彩色濾光片之製作技術亦趨向多樣化,目前已開發染色法、印刷法、電鍍法以及分散法等製造方法,其中以分散法為主流製程。 At present, color filters have been widely used in the fields of color liquid crystal displays, color facsimile machines, color cameras and the like. As the market demand is expanding, the production technology of color filters is also diversified. At present, dyeing methods, printing methods, electroplating methods, and dispersion methods have been developed, among which the dispersion method is the mainstream process.

分散法之製程係先將著色顏料分散於感光性樹脂中,再 將該感光性樹脂塗佈於玻璃基板上,經過曝光、顯像等步驟,即可製得特定圖案。經重複三次操作,即可製得紅色(R),綠色(G)及藍色(B)之畫素著色層之圖案,之後視需要可於畫素著色層之圖案上施加保護膜。 The process of the dispersion method first disperses the colored pigment in the photosensitive resin, and then The photosensitive resin is applied onto a glass substrate, and a specific pattern can be obtained by exposure, development, and the like. After repeating the operation three times, a pattern of a red (R), green (G), and blue (B) pixel colored layer can be obtained, and then a protective film can be applied to the pattern of the pixel colored layer as needed.

用於分散法製程中之感光性樹脂如日本特開平6-95211號公報及特開平8-183819號公報所揭示者,例如以(甲基)丙烯酸為單體成分所聚合而成之共聚物,其係作為感光性樹脂之鹼可溶性樹脂。 For example, as disclosed in Japanese Laid-Open Patent Publication No. Hei. It is used as an alkali-soluble resin of a photosensitive resin.

然而,彩色濾光片之製造過程中,需經歷多次熱處理步驟,如紅色(R),綠色(G)及藍色(B)等畫素著色層圖案形成後之後烤(post-bake)步驟及透明導電膜(ITO膜)之形成步驟等,該等步驟一般皆需於200℃以上之高溫下操作,但上述習知之感光性樹脂若於180℃條件下加熱1小時左右的,卻於畫素著色層中易發生顏料凝集粒子之產生(一般顏料凝集粒子之粒徑介於1至10μm),且畫素著色層之耐熱性亦不佳。 However, in the manufacturing process of the color filter, it is necessary to undergo multiple heat treatment steps, such as red (R), green (G) and blue (B), and the like, after the formation of the colored layer pattern, post-bake step And a transparent conductive film (ITO film) forming step, etc., these steps generally need to be operated at a high temperature of 200 ° C or higher, but the above-mentioned photosensitive resin is heated at 180 ° C for about 1 hour, but painted The generation of pigment agglomerated particles tends to occur in the pigmented layer (generally, the pigment agglomerated particles have a particle diameter of 1 to 10 μm), and the heat resistance of the pixel colored layer is also poor.

為改善上述之問題,日本特開2001-075273中揭示之感光性樹脂組成物,其包含羧基之不飽和單體與含有環氧丙基之單體所聚合而得之聚合物作為感光性樹脂之鹼可溶性樹脂。然而,此習知技術之感光性樹脂組成物製得之彩色濾光片卻有高精細度的圖案直線性不佳、圖案平滑性不佳以及高逸氣性(outgassing)等問題。 In order to improve the above-mentioned problem, the photosensitive resin composition disclosed in Japanese Laid-Open Patent Publication No. 2001-075273, which comprises a polymer obtained by polymerizing an unsaturated monomer having a carboxyl group and a monomer containing a glycidyl group, is used as a photosensitive resin. Alkali soluble resin. However, the color filter prepared by the photosensitive resin composition of the prior art has problems such as poor linearity of high-definition pattern, poor pattern smoothness, and high outgassing.

因此,如何同時克服高精細度的圖案直線性不佳、圖案 平滑性不佳以及高逸氣性等問題以達到目前業界的要求,為本發明所屬技術領域中努力研究之目標。 Therefore, how to overcome the high-definition pattern at the same time, the linearity is poor, the pattern Problems such as poor smoothness and high outgassing to meet the requirements of the current industry are the goals of the research in the technical field to which the present invention pertains.

有鑑於此,本發明提供一種感光性樹脂組成物,且此感光性樹脂組成物之高精細度的圖案直線性佳、低逸氣性和圖案平滑性均佳。 In view of the above, the present invention provides a photosensitive resin composition, and the high-precision pattern of the photosensitive resin composition has good linearity, low outgassing property, and pattern smoothness.

本發明的感光性樹脂組成物包括鹼可溶性樹脂(A)、具有乙烯性不飽和基之化合物(B)、光起始劑(C)、溶劑(D)以及顏料(E)。其中,所述鹼可溶性樹脂(A)包括鹼可溶性樹脂(A-1)及鹼可溶性樹脂(A-2),其中,所述鹼可溶性樹脂(A-1)是由一混合物反應而獲得,且所述混合物包括具有至少二個環氧基的環氧化合物(a-1-1)、具有至少一個羧酸基及至少一個乙烯性不飽和基之化合物(a-1-2)、四羧酸或其酸二酐(a-1-3)以及二羧酸或其酸酐(a-1-4); 所述具有至少二個環氧基的環氧化合物(a-1-1)具有如下式(aI-1)或下式(aI-2)所示之結構: 式(aI-1)中,W1、W2、W3以及W4各自為相同或不同,且獨立 表示氫原子、鹵素原子、碳數為1至5的烷基、碳數為1至5的烷氧基、碳數為6至12的芳基或碳數為6至12的芳烷基, 式(aI-2)中,W5至W18各自為相同或不同,且獨立表示氫原子、鹵素原子、碳數為1至8的烷基或碳數為6至15的芳香基,s表示0至10的整數;所述鹼可溶性樹脂(A-1)的數量平均分子量為1000~8000;所述鹼可溶性樹脂(A-2)是由不飽和羧酸或不飽和羧酸酐化合物(a-2-1)、含脂環式碳氫基之不飽和化合物(a-2-2)及其它不飽和化合物(a-2-3)共聚合而得;所述鹼可溶性樹脂(A-2)的重量平均分子量為3000~30000;所述鹼可溶性樹脂(A-1)與所述鹼可溶性樹脂(A-2)的使用量之重量比值範圍(A-1)/(A-2)為5/95至95/5;所述光起始劑(C)包括由式(1)表示的光起始劑(C-1); The photosensitive resin composition of the present invention includes an alkali-soluble resin (A), a compound (B) having an ethylenically unsaturated group, a photoinitiator (C), a solvent (D), and a pigment (E). Wherein the alkali-soluble resin (A) includes an alkali-soluble resin (A-1) and an alkali-soluble resin (A-2), wherein the alkali-soluble resin (A-1) is obtained by reacting a mixture, and The mixture includes an epoxy compound (a-1-1) having at least two epoxy groups, a compound (a-1-2) having at least one carboxylic acid group and at least one ethylenically unsaturated group, and a tetracarboxylic acid Or an acid dianhydride (a-1-3) and a dicarboxylic acid or an anhydride thereof (a-1-4); the epoxy compound (a-1-1) having at least two epoxy groups having the following formula (aI-1) or the structure shown in the following formula (aI-2): In the formula (aI-1), W 1 , W 2 , W 3 and W 4 are each the same or different and independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 5 carbon atoms, and a carbon number of 1 to 5. Alkoxy group, aryl group having 6 to 12 carbon atoms or aralkyl group having 6 to 12 carbon atoms, In the formula (aI-2), W 5 to W 18 are each the same or different and independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 8 carbon atoms or an aromatic group having 6 to 15 carbon atoms, and s represents An integer of 0 to 10; the number average molecular weight of the alkali-soluble resin (A-1) is from 1,000 to 8,000; and the alkali-soluble resin (A-2) is an unsaturated carboxylic acid or an unsaturated carboxylic anhydride compound (a- 2-1) an alicyclic hydrocarbon group-containing unsaturated compound (a-2-2) and another unsaturated compound (a-2-3) obtained by copolymerization; the alkali-soluble resin (A-2) The weight average molecular weight is 3,000 to 30,000; the weight ratio range (A-1)/(A-2) of the alkali-soluble resin (A-1) to the alkali-soluble resin (A-2) is 5 /95 to 95/5; the photoinitiator (C) comprises a photoinitiator (C-1) represented by the formula (1);

其中R1、R2、R3、R4、R5、R6、R7及R8彼此獨立地為氫、C1-C20烷基、COR16、OR17、鹵素、NO2、由式(2)所表示的基團或是由式(3)所表示的基團、 或R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8彼此獨立地為經由式(4)所表示的基團取代之C2-C10烯基 或R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8彼此獨立地共同為-(CH2)p-Y-(CH2)q-;或R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或 R7及R8彼此獨立地共同為式(5)所表示的基團; 但條件為R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8中之至少一對是由式(5)所表示的基團,R9、R10、R11及R12彼此獨立地為氫、C1-C20烷基,該C1-C20烷基是未經取代或經一或多個以下基團取代:鹵素、苯基、CN、OH、SH、C1-C4-烷氧基、-(CO)OH或-(CO)O-(C1-C4烷基);或R9、R10、R11及R12彼此獨立地為未經取代之苯基或經一或多個以下基團取代之苯基:C1-C6烷基、鹵素、CN、OR17、SR18或NR19R20;或R9、R10、R11及R12彼此獨立地為鹵素、CN、OR17、SR18、SOR18、SO2R18或NR19R20,其中該等取代基OR17、SR18或NR19R20視情況經由該等基團R17、R18、R19及/或R20與萘基環中一個碳原子形成5員或6員環;或R9、R10、R11及R12彼此獨立地為COR16NO2或式(2)所表示的基團、 Y 表示O、S、NR26或直接鍵;p 表示整數0、1、2或3; q 表示整數1、2或3;X 表示CO或直接鍵;R13表示C1-C20烷基,其是未經取代或經一或多個以下基團取代:鹵素、R17、COOR17、OR17、SR18、CONR19R20、NR19R20、PO(OCkH2k+1)2或是式(6)所表示的基團; 或R13表示C2-C20烷基,其間雜有一或多個O、S、SO、SO2、NR26或CO,或是C2-C12烯基,其是未經間雜或間雜有一或多個O、CO或NR26,其中該經間雜之C2-C20烷基及該未經間雜或經間雜之C2-C12烯基是未經取代或經一或多個鹵素取代;或R13表示C4-C8環烯基、C2-C12炔基或未經間雜或間雜有一或多個O、S、CO或NR26之C3-C10環烷基;或R13表示苯基或萘基,其各為未經取代或經一或多個以下基團取代:OR17、SR18、NR19R20、COR16、CN、NO2、鹵素、C1-C20烷基、C1-C4鹵代烷基、間雜有一或多個O、S、CO或NR26之C2-C20烷基或式(7)表示的基團、 或其各經C3-C10環烷基或間雜有一或多個O、S、CO或NR26之C3-C10環烷基取代;k表示整數1至10; R14表示氫、C3-C8環烷基、C2-C5烯基、C1-C20烷氧基或C1-C20烷基,其是未經取代或經一或多個以下基團取代:鹵素、苯基、C1-C20烷基苯基或CN;或R14表示苯基或萘基,其各未經取代或經一或多個以下基團取代:C1-C6烷基、C1-C4鹵代烷基、鹵素、CN、OR17、SR18及/或NR19R20;或R14表示C3-C20雜芳基、C1-C8烷氧基、芾氧基或苯氧基,該苄氧基及苯氧基是未經取代或經一或多個以下基團取代:C1-C6烷基、C1-C4鹵代烷基及/或鹵素;R15表示C6-C20芳基或C3-C20雜芳基,其各是未經取代或經一或多個以下基團取代:苯基、鹵素、C1-C4鹵代烷基、CN、NO2、OR17、SR18、NR19R20、PO(OCkH2k+1)2、SO-C1-C10烷基、SO2-C1-C10烷基、間雜有一或多個O、S或NR26之C2-C20烷基;或其各經C1-C20烷基取代,該C1-C20烷基是未經取代或經一或多個以下基團取代:鹵素、COOR17、CONR19R20、苯基、C3-C8環烷基、C3-C20雜芳基、C6-C20芳氧基羰基、C3-C20雜芳氧基羰基、OR17、SR18或NR19R20;或R15表示氫、C2-C12烯基、未經間雜或間雜有一或多個O、CO或NR26之C3-C8環烷基;或R15表示C1-C20烷基,其是未經取代或經一或多個以下基團取代:鹵素、OR17、SR18、C3-C8環烷基、C3-C20雜芳基、C6-C20芳氧基羰基、C3-C20雜芳氧基羰基、NR19R20、COOR17、CONR19R20、PO(OCkH2k+1)2、苯基、式(6)所表示的基團 或式(8)所表示的基團、 或該C1-C20烷基是經苯基取代,該苯基是經鹵素、C1-C20烷基、C1-C4鹵代烷基、OR17、SR18或NR19R20取代;或R15表示C2-C20烷基,其間雜有一或多個O、SO或SO2,且該經間雜之C2-C20烷基是未經取代或經一或多個以下基團取代:鹵素、OR17、COOR17、CONR19R20、苯基或經OR17、SR18或NR19R20取代之苯基;或R15表示C2-C20烷醯基或苯甲醯基,其是未經取代或經一或多個以下基團取代:C1-C6烷基、鹵素、苯基、OR17、SR18或NR19R20;或R15表示未經取代或經一或多個OR17取代之萘甲醯基或是C3-C14雜芳基羰基;或R15表示C2-C12烷氧基羰基,其是未經間雜或間雜有一或多個O且該經間雜或未經間雜之C2-C12烷氧基羰基是未經取代或經一或多個羥基取代;或R15表示苯氧基羰基,其是未經取代或經一或多個以下基團取代:C1-C6烷基、鹵素、C1-C4鹵代烷基、苯基、OR17、SR18或NR19R20;或R15表示CN、CONR19R20、NO2、C1-C4鹵代烷基、S(O)m-C1-C6烷基、未經取代或經C1-C12烷基或SO2-C1-C6烷基取代之S(O)m-苯基; 或R15表示SO2O-苯基,其是未經取代或經C1-C12烷基取代;或是二苯基膦醯基或二-(C1-C4烷氧基)-膦醯基;m表示1或2;R'14具有針對R14所給出含義中之一者;R'15具有針對R15所給出含義中之一者;X1表示O、S、SO或SO2;X2表示O、CO、S或直接鍵;R16表示C6-C20芳基或C3-C20雜芳基,其各是未經取代或經一或多個以下基團取代:苯基、鹵素、C1-C4鹵代烷基、CN、NO2、OR17、SR18、NR19R20或間雜有一或多個O、S或NR26之C1-C20烷基;或其各經一或多個C1-C20烷基取代,該C1-C20烷基是未經取代或經一或多個以下基團取代:鹵素、COOR17、CONR19R20、苯基、C3-C8環烷基、C3-C20雜芳基、C6-C20芳氧基羰基、C3-C20雜芳氧基羰基、OR17、SR18或NR19R20;或R16表示氫、C1-C20烷基,該C1-C20烷基是未經取代或經一或多個以下基團取代:鹵素、苯基、OH、SH、CN、C3-C6烯氧基、OCH2CH2CN、OCH2CH2(CO)O(C1-C4)烷基、O(CO)-(C1-C4烷基)、O(CO)-苯基、(CO)OH或(CO)O(C1-C4烷基);或R16表示C2-C12烷基,其間雜有一或多個O、S或NR26;或R16表示(CH2CH2O)n+1H、(CH2CH2O)n(CO)-(C1-C8烷基)、C2-C12烯基或C3-C8環烷基;或R16表示經SR18取代之苯基,其中該基團R18表示鍵結至 該COR16基團所附接之該咔唑部分之該苯基或萘基環的直接鍵;n表示1至20;R17表示氫、苯基-C1-C3烷基、C1-C20烷基,其是未經取代或經一或多個以下基團取代:鹵素、OH、SH、CN、C3-C6烯氧基、OCH2CH2CN、OCH2CH2(CO)O(C1-C4烷基)、O(CO)-(C1-C4烷基)、O(CO)-(C2-C4)烯基、O(CO)-苯基、(CO)OH、(CO)O(C1-C4烷基)、C3-C20環烷基、SO2-(C1-C4鹵代烷基)、O(C1-C4鹵代烷基)或間雜有一或多個O之C3-C20環烷基;或R17表示C2-C20烷基,其間雜有一或多個O、S或NR26;或R17表示(CH2CH2O)n+1H、(CH2CH2O)n(CO)-(C1-C8烷基)、C1-C8烷醯基、C2-C12烯基、C3-C6烯醯基或未經間雜或間雜有一或多個O、S、CO或NR26之C3-C20環烷基;或R17表示C1-C8烷基-C3-C10環烷基,其是未經間雜或間雜有一或多個O;或R17表示苯甲醯基,其是未經取代或經一或多個C1-C6烷基、鹵素、OH或C1-C3烷氧基取代;或R17表示苯基、萘基或C3-C20雜芳基,其各是未經取代或經一或多個以下基團取代:鹵素、OH、C1-C12烷基、C1-C12烷氧基、CN、NO2、苯基-C1-C3烷氧基、苯氧基、C1-C12烷基硫基、苯基硫基、N(C1-C12烷基)2、二苯基-胺基或式(7)所表示的基團; 或R17形成鍵結至該具有由式(2)所表示的基團、或是式(7)所表示的基團所處之苯基或萘基環之其中一個碳原子的直接鍵、 R18表示氫、C2-C12烯基、C3-C20環烷基或苯基-C1-C3烷基,其中該C2-C12烯基、C3-C20環烷基或苯基-C1-C3烷基是未經間雜或間雜有一或多個O、S、CO、NR26或COOR17;或R18是C1-C20烷基,其是未經取代或經一或多個以下基團取代:OH、SH、CN、C3-C6烯氧基、OCH2CH2CN、OCH2CH2(CO)O(C1-C4烷基)、O(CO)-(C2-C4)烯基、O(CO)-(C1-C4烷基)、O(CO)-苯基或(CO)OR17;或R18表示C2-C20烷基,其間雜有一或多個O、S、CO、NR26或COOR17;或R18表示(CH2CH2O)nH、(CH2CH2O)n(CO)-(C1-C8烷基)、C2-C8烷醯基或C3-C6烯醯基;或R18表示苯甲醯基,其是未經取代或經一或多個以下基團取代:C1-C6烷基、鹵素、OH、C1-C4烷氧基或C1-C4烷基硫基;或R18表示苯基、萘基或C3-C20雜芳基,其各是未經取代或經一或多個以下基團取代:鹵素、C1-C12烷基、C1-C4鹵代烷基、C1-C12烷氧基、CN、NO2、苯基-C1-C3烷氧基、苯氧基、C1-C12 烷基硫基、苯基硫基、N(C1-C12烷基)2、二苯基胺基、(CO)O(C1-C8烷基)、(CO)-C1-C8烷基、(CO)N(C1-C8烷基)2或式(7)所表示的基團 R19及R20彼此獨立地為氫、C1-C20烷基、C2-C4羥基烷基、C2-C10烷氧基烷基、C2-C5烯基、C3-C20環烷基、苯基-C1-C3烷基、C1-C8烷醯基、C1-C8烷醯基氧基、C3-C12烯醯基、SO2-(C1-C4鹵代烷基)或苯甲醯基;或R19及R20表示苯基、萘基或C3-C20雜芳基,其各是未經取代或經一或多個以下基團取代:鹵素、C1-C4鹵代烷基、C1-C20烷氧基、C1-C12烷基、苯甲醯基或C1-C12烷氧基;或R19及R20與其所附接之N原子一起形成未經間雜或間雜有O、S或NR17之5員或6員飽和或不飽和環,且該5員或6員飽和或不飽和環是未經取代或經一或多個以下基團取代:C1-C20烷基、C1-C20烷氧基、=O、OR17、SR18、NR21R22、(CO)R23、NO2、鹵素、C1-C4-鹵代烷基、CN、苯基、未經間雜或間雜有一或多個O、S、CO或NR17之C3-C20環烷基、或式(7)表示的基團 或R19及R20與其所附接之N原子一起形成雜芳香族環系統,該環系統是未經取代或經一或多個以下基團取代:C1-C20烷基、C1-C4鹵代烷基、C1-C20烷氧基、=O、OR17、SR18、NR21R22、(CO)R23、 鹵素、NO2、CN、苯基或未經間雜或間雜有一或多個O、S、CO或NR17之C3-C20環烷基、或式(7)表示的基團 R21及R22彼此獨立地為氫、C1-C20烷基、C1-C4鹵代烷基、C3-C10環烷基或苯基;或R21及R22與其所附接之N原子一起形成未經間雜或間雜有O、S或NR26之5員或6員飽和或不飽和環,且該5員或6員飽和或不飽和環是未稠合或該5員或6員飽和或不飽和環與苯環稠合;R23表示氫、OH、C1-C20烷基、C1-C4鹵代烷基、間雜有一或多個O、CO或NR26之C2-C20烷基、未經間雜或間雜有O、S、CO或NR26之C3-C20環烷基,或R23表示苯基、萘基、苯基-C1-C4烷基、OR17、SR18或NR21R22;R24表示(CO)OR17、CONR19R20、(CO)R17;或R24具有針對R19及R20所給出含義中之一者;R25表示COOR17、CONR19R20、(CO)R17;或R25具有針對R17所給出含義中之一者;R26表示氫、C1-C20烷基、C1-C4鹵代烷基、C2-C20烷基,其間雜有一或多個O或CO;或是苯基-C1-C4烷基、C3-C8環烷基,其是未經間雜或間雜有一或多個O或CO;或是(CO)R19;或是苯基,其是未經取代或經一或多個以下基團取代:C1-C20烷基、鹵 素、C1-C4鹵代烷基、OR17、SR18、NR19R20或式(7)表示的基團 但條件為在該分子中存在至少一個式(2)或是式(7)所表示的基團 Wherein R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 and R 8 are each independently hydrogen, C 1 -C 20 alkyl, COR 16 , OR 17 , halogen, NO 2 , The group represented by the formula (2) is a group represented by the formula (3), Or R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 are each independently a group represented by the formula (4). Substituted C 2 -C 10 alkenyl Or R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 are each independently taken as -(CH 2 ) p -Y- (CH 2 ) q -; or R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 are independently of the formula ( 5) the group represented; However, the condition is that at least one of R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 is represented by the formula (5) The group represented, R 9 , R 10 , R 11 and R 12 are each independently hydrogen, C 1 -C 20 alkyl, the C 1 -C 20 alkyl group being unsubstituted or having one or more of the following groups Group substitution: halogen, phenyl, CN, OH, SH, C 1 -C 4 -alkoxy, -(CO)OH or -(CO)O-(C 1 -C 4 alkyl); or R 9 , R 10 , R 11 and R 12 are, independently of each other, an unsubstituted phenyl group or a phenyl group substituted with one or more of the following groups: C 1 -C 6 alkyl, halogen, CN, OR 17 , SR 18 or NR 19 R 20 ; or R 9 , R 10 , R 11 and R 12 are each independently halogen, CN, OR 17 , SR 18 , SOR 18 , SO 2 R 18 or NR 19 R 20 , wherein the substituents OR 17 , SR 18 or NR 19 R 20 optionally forms a 5- or 6-membered ring with one of the carbon atoms in the naphthyl ring via the groups R 17 , R 18 , R 19 and/or R 20 ; or R 9 , R 10 , R 11 and R 12 are each independently a group represented by COR 1 , 6 NO 2 or formula (2), Y represents O, S, NR 26 or a direct bond; p represents an integer of 0, 1, 2 or 3; q represents an integer 1, 2 or 3; X represents CO or a direct bond; R 13 represents a C 1 - C 20 alkyl group, It is unsubstituted or substituted with one or more of the following groups: halogen, R 17 , COOR 17 , OR 17 , SR 18 , CONR 19 R 20 , NR 19 R 20 , PO(OC k H 2k+1 ) 2 Or a group represented by the formula (6); Or R 13 represents a C 2 -C 20 alkyl group, interspersed with one or more of O, S, SO, SO 2 , NR 26 or CO, or a C 2 -C 12 alkenyl group which is unintercalated or heterozygous Or a plurality of O, CO or NR 26 , wherein the inter-hetero C 2 -C 20 alkyl group and the unmeta- or inter-hetero C 2 -C 12 alkenyl group are unsubstituted or substituted by one or more halogens Or R 13 represents a C 4 -C 8 cycloalkenyl group, a C 2 -C 12 alkynyl group or a C 3 -C 10 cycloalkyl group having one or more O, S, CO or NR 26 without inter or hetero-hetero; or R 13 represents a phenyl or naphthyl group, each of which is unsubstituted or substituted with one or more of the following groups: OR 17 , SR 18 , NR 19 R 20 , COR 16 , CN, NO 2 , halogen, C 1 - a C 20 alkyl group, a C 1 -C 4 haloalkyl group, a hetero group having one or more C 2 -C 20 alkyl groups of O, S, CO or NR 26 or a group represented by the formula (7), Each warp or C 3 -C 10 cycloalkyl, or interrupted by one or more O, S, CO or NR 26 of the C 3 -C 10 cycloalkyl; K represents integer of 1 to 10; R 14 represents hydrogen, C 3- C 8 cycloalkyl, C 2 -C 5 alkenyl, C 1 -C 20 alkoxy or C 1 -C 20 alkyl, which is unsubstituted or substituted with one or more of the following groups: halogen , phenyl, C 1 -C 20 alkylphenyl or CN; or R 14 represents phenyl or naphthyl, each unsubstituted or substituted by one or more of the following groups: C 1 -C 6 alkyl, C 1 -C 4 haloalkyl, halogen, CN, OR 17 , SR 18 and/or NR 19 R 20 ; or R 14 represents C 3 -C 20 heteroaryl, C 1 -C 8 alkoxy, decyloxy Or phenoxy, the benzyloxy and phenoxy are unsubstituted or substituted by one or more of the following groups: C 1 -C 6 alkyl, C 1 -C 4 haloalkyl and/or halogen; R 15 Represents a C 6 -C 20 aryl or C 3 -C 20 heteroaryl group, each of which is unsubstituted or substituted with one or more of the following groups: phenyl, halo, C 1 -C 4 haloalkyl, CN, NO 2 , OR 17 , SR 18 , NR 19 R 20 , PO(OC k H 2k+1 ) 2 , SO-C 1 -C 10 alkyl, SO 2 -C 1 -C 10 alkyl, one or more O, S or NR The 2 -C 20 C 26 alkyl group; or each warp substituted C 1 -C 20 alkyl, C 1 -C 20 alkyl which is unsubstituted or substituted with one or more of the following radicals: halogen, COOR 17 , CONR 19 R 20 , phenyl, C 3 -C 8 cycloalkyl, C 3 -C 20 heteroaryl, C 6 -C 20 aryloxycarbonyl, C 3 -C 20 heteroaryloxycarbonyl, OR 17 , SR 18 or NR 19 R 20 ; or R 15 represents hydrogen, C 2 -C 12 alkenyl, C 3 -C 8 cycloalkyl having no or hetero or one or more O, CO or NR 26 ; or R 15 represents a C 1 -C 20 alkyl group which is unsubstituted or substituted with one or more of the following groups: halogen, OR 17 , SR 18 , C 3 -C 8 cycloalkyl, C 3 -C 20 heteroaryl a C 6 -C 20 aryloxycarbonyl group, a C 3 -C 20 heteroaryloxycarbonyl group, NR 19 R 20 , COOR 17 , CONR 19 R 20 , PO(OC k H 2k+1 ) 2 , phenyl, a group represented by the formula (6) or a group represented by the formula (8), Or the C 1 -C 20 alkyl group is substituted by a phenyl group which is substituted by halogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, OR 17 , SR 18 or NR 19 R 20 ; Or R 15 represents a C 2 -C 20 alkyl group in which one or more O, SO or SO 2 are heterogeneous, and the interstitial C 2 -C 20 alkyl group is unsubstituted or has one or more of the following groups Substitution: halogen, OR 17 , COOR 17 , CONR 19 R 20 , phenyl or phenyl substituted with OR 17 , SR 18 or NR 19 R 20 ; or R 15 represents C 2 -C 20 alkanoyl or benzamidine a group which is unsubstituted or substituted with one or more of the following groups: C 1 -C 6 alkyl, halogen, phenyl, OR 17 , SR 18 or NR 19 R 20 ; or R 15 represents unsubstituted or a naphthylmethyl group substituted with one or more OR 17 or a C 3 -C 14 heteroarylcarbonyl group; or R 15 represents a C 2 -C 12 alkoxycarbonyl group which is one or more of unintermixed or heterozygous O and the interstitial or unintercalated C 2 -C 12 alkoxycarbonyl group is unsubstituted or substituted by one or more hydroxy groups; or R 15 represents a phenoxycarbonyl group which is unsubstituted or subjected to one or Substituted by a plurality of groups: C 1 -C 6 alkyl, halogen, C 1 -C 4 haloalkyl , phenyl, OR 17 , SR 18 or NR 19 R 20 ; or R 15 represents CN, CONR 19 R 20 , NO 2 , C 1 -C 4 haloalkyl, S(O) m -C 1 -C 6 alkyl , S(O) m -phenyl which is unsubstituted or substituted by C 1 -C 12 alkyl or SO 2 -C 1 -C 6 alkyl; or R 15 represents SO 2 O-phenyl, which is not Substituted or substituted by C 1 -C 12 alkyl; or diphenylphosphonium or di-(C 1 -C 4 alkoxy)-phosphonium; m represents 1 or 2; R' 14 has One of the meanings given by 14 ; R' 15 has one of the meanings given for R 15 ; X 1 represents O, S, SO or SO 2 ; X 2 represents O, CO, S or a direct bond; R 16 represents a C 6 -C 20 aryl group or a C 3 -C 20 heteroaryl group, each of which is unsubstituted or substituted with one or more of the following groups: phenyl, halogen, C 1 -C 4 haloalkyl, CN, NO 2 , OR 17 , SR 18 , NR 19 R 20 or a heterocyclic one or more C 1 -C 20 alkyl groups of O, S or NR 26 ; or each of one or more C 1 -C 20 alkanes Substituted, the C 1 -C 20 alkyl group is unsubstituted or substituted with one or more of the following groups: halogen, COOR 17 , CONR 19 R 20 , phenyl, C 3 -C 8 cycloalkyl, C 3 -C 20 heteroaryl, C 6 -C 2 0 aryloxycarbonyl, C 3 -C 20 heteroaryloxycarbonyl, OR 17 , SR 18 or NR 19 R 20 ; or R 16 represents hydrogen, C 1 -C 20 alkyl, the C 1 -C 20 alkyl group Is unsubstituted or substituted with one or more of the following groups: halogen, phenyl, OH, SH, CN, C 3 -C 6 alkenoxy, OCH 2 CH 2 CN, OCH 2 CH 2 (CO)O ( C 1 -C 4 )alkyl, O(CO)-(C 1 -C 4 alkyl), O(CO)-phenyl, (CO)OH or (CO)O(C 1 -C 4 alkyl) Or R 16 represents a C 2 -C 12 alkyl group with one or more O, S or NR 26 in between ; or R 16 represents (CH 2 CH 2 O) n+1 H, (CH 2 CH 2 O) n (CO)-(C 1 -C 8 alkyl), C 2 -C 12 alkenyl or C 3 -C 8 cycloalkyl; or R 16 represents a phenyl substituted with SR 18 wherein the group R 18 represents Bonding to the direct bond of the phenyl or naphthyl ring of the oxazole moiety to which the COR 16 group is attached; n represents 1 to 20; R 17 represents hydrogen, phenyl-C 1 -C 3 alkyl, C 1 -C 20 alkyl, which is unsubstituted or substituted with one or more of the following groups: halogen, OH, SH, CN, C 3 -C 6 alkenyloxy, OCH 2 CH 2 CN, OCH 2 CH 2 (CO)O(C 1 -C 4 alkyl), O(CO)-(C 1 -C 4 alkyl), O(CO)-(C 2 -C 4 )alkenyl, O(CO)- Phenyl, (C O) OH, (CO)O(C 1 -C 4 alkyl), C 3 -C 20 cycloalkyl, SO 2 -(C 1 -C 4 haloalkyl), O(C 1 -C 4 haloalkyl) Or a C 3 -C 20 cycloalkyl group having one or more O; or R 17 represents a C 2 -C 20 alkyl group, wherein one or more O, S or NR 26 are heterogeneous; or R 17 represents (CH 2 CH 2 O) n+1 H, (CH 2 CH 2 O) n (CO)-(C 1 -C 8 alkyl), C 1 -C 8 alkanoyl, C 2 -C 12 alkenyl, C 3 - acyl or C 6 alkenyl interrupted or not interrupted with one or more O, S, CO or NR 26 of the C 3 -C 20 cycloalkyl; or R 17 represents C 1 -C 8 alkyl -C 3 -C 10 a cycloalkyl group which has no or hetero or one or more O; or R 17 represents a benzhydryl group which is unsubstituted or has one or more C 1 -C 6 alkyl groups, halogen, OH or C 1 -C 3 alkoxy substituted; or R 17 represents phenyl, naphthyl or C 3 -C 20 heteroaryl, each of which is unsubstituted or substituted with one or more of the following groups: halogen, OH, C 1- C 12 alkyl, C 1 -C 12 alkoxy, CN, NO 2 , phenyl-C 1 -C 3 alkoxy, phenoxy, C 1 -C 12 alkylthio, phenyl sulfide a group, N(C 1 -C 12 alkyl) 2 , a diphenyl-amine group or a group represented by the formula (7); Or R 17 forms a direct bond bonded to one of the carbon atoms of the phenyl or naphthyl ring in which the group represented by the formula (2) or the group represented by the formula (7) is bonded, R 18 represents hydrogen, C 2 -C 12 alkenyl, C 3 -C 20 cycloalkyl or phenyl-C 1 -C 3 alkyl, wherein the C 2 -C 12 alkenyl, C 3 -C 20 naphthenic Or a phenyl-C 1 -C 3 alkyl group which has no or hetero or one or more O, S, CO, NR 26 or COOR 17 ; or R 18 is a C 1 -C 20 alkyl group which is not Substituted or substituted with one or more of the following groups: OH, SH, CN, C 3 -C 6 alkenyloxy, OCH 2 CH 2 CN, OCH 2 CH 2 (CO)O (C 1 -C 4 alkyl) , O(CO)-(C 2 -C 4 )alkenyl, O(CO)-(C 1 -C 4 alkyl), O(CO)-phenyl or (CO)OR 17 ; or R 18 represents C 2- C 20 alkyl group with one or more O, S, CO, NR 26 or COOR 17 in between ; or R 18 represents (CH 2 CH 2 O) n H, (CH 2 CH 2 O) n (CO) -(C 1 -C 8 alkyl), C 2 -C 8 alkanoyl or C 3 -C 6 alkenyl; or R 18 represents a benzinyl group which is unsubstituted or one or more of the following Group substitution: C 1 -C 6 alkyl, halogen, OH, C 1 -C 4 alkoxy or C 1 -C 4 alkylthio; or R 18 represents phenyl, naphthyl or C 3 -C 20 heteroaryl, each of which is unsubstituted or substituted with one or more of the following radicals: halogen, C 1 -C 12 alkyl, C 1 -C 4 haloalkyl, C 1 -C 12 Group, CN, NO 2, phenyl -C 1 -C 3 alkoxy, phenoxy, C 1 -C 12 alkylthio, phenylthio, N (C 1 -C 12 alkyl) 2 , diphenylamino, (CO)O(C 1 -C 8 alkyl), (CO)-C 1 -C 8 alkyl, (CO)N(C 1 -C 8 alkyl) 2 or formula ( 7) the indicated group R 19 and R 20 are each independently hydrogen, C 1 -C 20 alkyl, C 2 -C 4 hydroxyalkyl, C 2 -C 10 alkoxyalkyl, C 2 -C 5 alkenyl, C 3 - C 20 cycloalkyl, phenyl-C 1 -C 3 alkyl, C 1 -C 8 alkanoyl, C 1 -C 8 alkenyloxy, C 3 -C 12 alkenyl, SO 2 -( a C 1 -C 4 haloalkyl group or a benzylidene group; or R 19 and R 20 represent a phenyl group, a naphthyl group or a C 3 -C 20 heteroaryl group, each of which is unsubstituted or has one or more of the following groups; Group substitution: halogen, C 1 -C 4 haloalkyl, C 1 -C 20 alkoxy, C 1 -C 12 alkyl, benzhydryl or C 1 -C 12 alkoxy; or R 19 and R 20 Together with the N atom to which it is attached, it forms a 5- or 6-membered saturated or unsaturated ring which is not intermixed or intermixed with O, S or NR 17 , and the 5 or 6 member saturated or unsaturated ring is unsubstituted or Substituted by one or more of the following groups: C 1 -C 20 alkyl, C 1 -C 20 alkoxy, =0, OR 17 , SR 18 , NR 21 R 22 , (CO)R 23 , NO 2 , Halogen, C 1 -C 4 -haloalkyl, CN, phenyl, C 3 -C 20 cycloalkyl having one or more O, S, CO or NR 17 unintercalated or heterozygous, or represented by formula (7) Group Or R 19 and R 20 together with the N atom to which they are attached form a heteroaromatic ring system which is unsubstituted or substituted with one or more of the following groups: C 1 -C 20 alkyl, C 1 - C 4 haloalkyl, C 1 -C 20 alkoxy, =0, OR 17 , SR 18 , NR 21 R 22 , (CO)R 23 , halogen, NO 2 , CN, phenyl or uninter or hetero Or a plurality of C 3 -C 20 cycloalkyl groups of O, S, CO or NR 17 or a group represented by the formula (7) R 21 and R 22 are each independently hydrogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, C 3 -C 10 cycloalkyl or phenyl; or R 21 and R 22 are attached thereto The N atoms together form a 5- or 6-membered saturated or unsaturated ring without inter- or inter-organic O, S or NR 26 , and the 5- or 6-membered saturated or unsaturated ring is unfused or the 5 or 6 a saturated or unsaturated ring fused to a benzene ring; R 23 represents hydrogen, OH, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, hetero or one or more O, CO or C 2 of NR 26 a C 20 alkyl group, a C 3 -C 20 cycloalkyl group which is undoped or intermixed with O, S, CO or NR 26 or R 23 represents a phenyl group, a naphthyl group, a phenyl-C 1 -C 4 alkyl group, OR 17 , SR 18 or NR 21 R 22 ; R 24 represents (CO)OR 17 , CONR 19 R 20 , (CO)R 17 ; or R 24 has one of the meanings given for R 19 and R 20 ; R 25 represents COOR 17 , CONR 19 R 20 , (CO)R 17 ; or R 25 has one of the meanings given for R 17 ; R 26 represents hydrogen, C 1 -C 20 alkyl, C 1 -C a 4- haloalkyl group, a C 2 -C 20 alkyl group, optionally having one or more O or CO; or a phenyl-C 1 -C 4 alkyl group, a C 3 -C 8 cycloalkyl group, which is unintercalated or Miscellaneous with one or more O or CO; or (CO)R 19 ; or a phenyl group which is unsubstituted or substituted with one or more of the following groups: C 1 -C 20 alkyl, halogen, C 1 -C 4 haloalkyl, OR 17 , SR 18 , NR 19 R 20 or a group represented by the formula (7) However, the condition is that at least one group represented by formula (2) or formula (7) is present in the molecule.

在本發明的一實施例中,所述由式(1)表示的光起始劑(C-1)中,R1、R2、R3、R4、R5、R6、R7及R8彼此獨立地為氫、C1-C20烷基、COR16、NO2或由式(2)表示的基團; 或R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8彼此獨立地共同為式(5)所表示的基團; 但條件為R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8中之至少一對是由式(5)所表示的基團;X表示CO或直接鍵;R13表示C1-C20烷基,其是未經取代或經一或多個以下 基團取代:鹵素、OR17、SR18、COOR17、CONR19R20或PO(OCkH2k+1)2;或R13表示C2-C20烷基,其間雜有一或多個O、S、NR26或CO;或R13表示苯基或萘基,此二者是未經取代或經COR16取代或由一或多個式(7)表示的基團取代; R14表示C1-C20烷基、苯基或C1-C8烷氧基;R15表示苯基、萘基、C3-C20雜芳基,其各是未經取代或經一或多個以下基團取代:苯基、鹵素、C1-C4鹵代烷基、OR17、SR18或C2-C20烷基,其間雜有一或多個O或S;或其各經一或多個C1-C20烷基取代,該C1-C20烷基是未經取代或經一或多個以下基團取代:鹵素、COOR17、CONR19R20、苯基、C3-C8環烷基、C3-C20雜芳基、C6-C20芳氧基羰基、C4-C20雜芳氧基羰基、OR17、SR18、NR19R20或PO(OCkH2k+1)2;或R15表示C1-C20烷基,其是未經取代或經一或多個以下基團取代:OR17、SR18、C3-C8環烷基、C3-C20雜芳基、NR19R20、COOR17、CONR19R20或PO(OCkH2k+1)2;R'14具有針對R14所給出含義中之一者;R'15具有針對R15所給出含義中之一者; R16表示苯基,其是未經取代或經一或多個以下基團取代:OR17、SR18、NR19R20或間雜有一或多個O、S或NR26之C2-C20烷基;或R16表示苯基,其是經一或多個C1-C20烷基取代,該C1-C20烷基是未經取代或經一或多個以下基團取代:鹵素、COOR17、CONR19R20、苯基、C3-C8環烷基、C3-C20雜芳基、C6-C20芳氧基羰基、C4-C20雜芳氧基羰基、OR17、SR18或NR19R20;或R16表示C1-C20烷基,其是未經取代或經以下基團取代:鹵素、苯基、OH、SH、CN、C3-C6烯氧基、OCH2CH2(CO)O(C1-C4烷基)、O(CO)-(C1-C4烷基)或(CO)O(C1-C4烷基);R17表示C1-C20烷基,其是未經取代或經一或多個以下基團取代:鹵素、OCH2CH2(CO)O(C1-C4烷基)、O(C1-C4烷基)、(CO)O(C1-C4烷基)、C3-C20環烷基或間雜有一或多個O之C3-C20環烷基;或R17表示C2-C20烷基,其間雜有一或多個O;R18表示經COOR17取代之甲基;R19及R20彼此獨立地為氫、苯基、C1-C20烷基、C1-C8烷醯基或C1-C8烷醯基氧基;或R19及R20與其所附接之N原子一起形成雜芳香族環 系統,該環系統是未經取代或經由式(7)表示的基團取代; 但條件為在該分子中存在至少一個式(2)或是式(7)所表示的基團 In one embodiment of the present invention, in the photoinitiator (C-1) represented by the formula (1), R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 and R 8 is independently of each other hydrogen, C 1 -C 20 alkyl, COR 16 , NO 2 or a group represented by the formula (2); Or R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 are each independently a group represented by the formula (5) ; However, the condition is that at least one of R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 is represented by the formula (5) a group represented by X; X represents CO or a direct bond; R 13 represents a C 1 -C 20 alkyl group which is unsubstituted or substituted with one or more of the following groups: halogen, OR 17 , SR 18 , COOR 17 , CONR 19 R 20 or PO(OC k H 2k+1 ) 2 ; or R 13 represents a C 2 -C 20 alkyl group with one or more O, S, NR 26 or CO in between; or R 13 represents a phenyl group or Naphthyl, both of which are unsubstituted or substituted by COR 16 or substituted by one or more groups represented by formula (7); R 14 represents a C 1 -C 20 alkyl group, a phenyl group or a C 1 -C 8 alkoxy group; R 15 represents a phenyl group, a naphthyl group, a C 3 -C 20 heteroaryl group, each of which is unsubstituted or subjected to a Or substituted with a plurality of groups: phenyl, halogen, C 1 -C 4 haloalkyl, OR 17 , SR 18 or C 2 -C 20 alkyl, interspersed with one or more O or S; or more C 1 -C 20 alkyl, C 1 -C 20 alkyl which is unsubstituted or substituted with one or more of the following radicals: halogen, COOR 17, CONR 19 R 20 , phenyl, C 3 -C 8 cycloalkyl, C 3 -C 20 heteroaryl, C 6 -C 20 aryloxycarbonyl, C 4 -C 20 heteroaryloxycarbonyl, OR 17 , SR 18 , NR 19 R 20 or PO ( OC k H 2k+1 ) 2 ; or R 15 represents a C 1 -C 20 alkyl group which is unsubstituted or substituted with one or more of the following groups: OR 17 , SR 18 , C 3 -C 8 naphthenic a group, a C 3 -C 20 heteroaryl group, NR 19 R 20 , COOR 17 , CONR 19 R 20 or PO(OC k H 2k+1 ) 2 ; R' 14 has one of the meanings given for R 14 ; R '15 has the meanings for R 15 Suo one of those given; R 16 represents phenyl, which is unsubstituted or substituted with one or more of the following groups: oR 17, SR 18, NR 1 9 R 20 or a heterocyclic one or more C 2 -C 20 alkyl groups of O, S or NR 26 ; or R 16 represents a phenyl group which is substituted by one or more C 1 -C 20 alkyl groups, the C 1 -C 20 alkyl is unsubstituted or substituted with one or more of the following groups: halogen, COOR 17 , CONR 19 R 20 , phenyl, C 3 -C 8 cycloalkyl, C 3 -C 20 heteroaryl , C 6 -C 20 aryloxycarbonyl, C 4 -C 20 heteroaryloxycarbonyl, OR 17 , SR 18 or NR 19 R 20 ; or R 16 represents C 1 -C 20 alkyl, which is unsubstituted Or substituted by the following groups: halogen, phenyl, OH, SH, CN, C 3 -C 6 alkenyloxy, OCH 2 CH 2 (CO)O(C 1 -C 4 alkyl), O(CO)- (C 1 -C 4 alkyl) or (CO)O(C 1 -C 4 alkyl); R 17 represents C 1 -C 20 alkyl, which is unsubstituted or substituted with one or more of the following groups : halogen, OCH 2 CH 2 (CO)O(C 1 -C 4 alkyl), O(C 1 -C 4 alkyl), (CO)O(C 1 -C 4 alkyl), C 3 -C 20 cycloalkyl or interrupted by one or more O of C 3 -C 20 cycloalkyl; or R 17 represents C 2 -C 20 alkyl, heteroalkyl having one or more therebetween O; R 18 represents a substituted by COOR 17 a of R 19 and R 20 are each independently hydrogen, phenyl, C 1 -C 20 alkyl, C 1 -C 8 alkane An indenyl or C 1 -C 8 alkanoyloxy group; or R 19 and R 20 together with the N atom to which they are attached form a heteroaromatic ring system which is unsubstituted or represented by formula (7) Group substitution However, the condition is that at least one group represented by formula (2) or formula (7) is present in the molecule.

在本發明的一實施例中,所述由式(1)表示的光起始劑(C-1)中,R1、R2、R3、R4、R5、R6、R7及R8彼此獨立地為氫,或R1及R2、R3及R4或R5及R6彼此獨立地共同為式(5)所表示的基團; 但條件為R1及R2、R3及R4或R5及R6中之至少一對是由式(5)所表示的基團;或R2表示COR16、NO2或是由式(2)所表示的基團或是由式(3)所表示的基團; 或R7表示COR16或是由式(2)所表示的基團;R9、R11及R12表示氫;R10表示氫、OR17或COR16;X表示CO或直接鍵;R13表示C1-C20烷基,其是未經取代或經一或多個以下基團取代:鹵素、R17、OR17、SR18或PO(OCkH2k+1)2;或R13表示C2-C20烷基,其間雜有一或多個O;或R13表示苯基;k表示整數2;R14表示C1-C20烷基或噻吩基;R15表示苯基或萘基,其各是未經取代或經一或多個OR17或C1-C20烷基取代;或R15表示噻吩基、氫、C1-C20烷基,該C1-C20烷基是未經取代或經一或多個以下基團取代:OR17、SR18、C3-C8環烷基、NR19R20或COOR17; 或R15表示C2-C20烷基,其間雜有SO2;R16表示苯基或萘基,其各是未經取代或經一或多個以下基團取代:OR17、SR18、NR19R20或C1-C20烷基;或R16表示噻吩基;R17表示氫、C1-C8烷醯基、C1-C20烷基,該C1-C20烷基是未經取代或經一或多個以下基團取代:鹵素、O(CO)-(C1-C4烷基)、O(CO)-(C2-C4烯基)或間雜有一或多個O之C3-C20環烷基;或R17表示C2-C20烷基,其間雜有一或多個O;R18表示C3-C20環烷基、C1-C20烷基,其是未經取代或經一或多個OH、O(CO)-(C2-C4烯基)或(CO)OR17取代;或R18表示苯基,其是未經取代或經一或多個鹵素取代;R19及R20彼此獨立地為C1-C8烷醯基或C1-C8烷醯基氧基;或R19及R20與其所附接之N原子一起形成間雜有O之5員或6員飽和環;但條件為在該分子中存在至少一個由式(2)所表示的基團; In one embodiment of the present invention, in the photoinitiator (C-1) represented by the formula (1), R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 and R 8 is independently hydrogen, or R 1 and R 2 , R 3 and R 4 or R 5 and R 6 are each independently a group represented by the formula (5); However, the condition is that at least one of R 1 and R 2 , R 3 and R 4 or R 5 and R 6 is a group represented by the formula (5); or R 2 represents COR 16 , NO 2 or (2) the group represented by the group represented by the formula (3); Or R 7 represents COR 16 or a group represented by formula (2); R 9 , R 11 and R 12 represent hydrogen; R 10 represents hydrogen, OR 17 or COR 16 ; X represents CO or a direct bond; R 13 Represents a C 1 -C 20 alkyl group which is unsubstituted or substituted with one or more of the following groups: halogen, R 17 , OR 17 , SR 18 or PO(OC k H 2k+1 ) 2 ; or R 13 Represents a C 2 -C 20 alkyl group with one or more O in between; or R 13 represents a phenyl group; k represents an integer 2; R 14 represents a C 1 -C 20 alkyl group or a thienyl group; and R 15 represents a phenyl group or a naphthalene group. a group, each of which is unsubstituted or substituted with one or more OR 17 or C 1 -C 20 alkyl groups; or R 15 represents a thienyl group, hydrogen, C 1 -C 20 alkyl group, the C 1 -C 20 alkane The group is unsubstituted or substituted with one or more of the following groups: OR 17 , SR 18 , C 3 -C 8 cycloalkyl, NR 19 R 20 or COOR 17 ; or R 15 represents C 2 -C 20 alkyl therebetween contaminated with SO 2; R 16 represents a phenyl or naphthyl group, each of which is unsubstituted or substituted with one or more of the following groups: oR 17, SR 18, NR 19 R 20 or C 1 -C 20 alkyl group; or R 16 represents a thienyl group; R 17 represents hydrogen, C 1 -C 8 alkanoyl group, C 1 -C 20 alkyl, C 1 -C 20 alkyl group which is not A substituted or by one or more of the following groups: halo, O (CO) - (C 1 -C 4 alkyl), O (CO) - ( C 2 -C 4 alkenyl) or interrupted by one or more O the C 3 -C 20 cycloalkyl; or R 17 represents C 2 -C 20 alkyl, heteroalkyl having one or more therebetween O; R 18 represents a C 3 -C 20 cycloalkyl, C 1 -C 20 alkyl, It is unsubstituted or substituted by one or more OH, O(CO)-(C 2 -C 4 alkenyl) or (CO)OR 17 ; or R 18 represents a phenyl group which is unsubstituted or Or a plurality of halogen substitutions; R 19 and R 20 are each independently C 1 -C 8 alkanoyl or C 1 -C 8 alkenyloxy; or R 19 and R 20 are taken together with the N atom to which they are attached a 5- or 6-membered saturated ring of O; however, the condition is that at least one group represented by formula (2) is present in the molecule;

在本發明的一實施例中,所述含脂環式碳氫基之不飽和化合物(a-2-2)是選自為具有雙環戊基之不飽和化合物、具有雙環 戊烯基之不飽和化合物及其混合物所組成之群。 In an embodiment of the invention, the alicyclic hydrocarbon group-containing unsaturated compound (a-2-2) is selected from the group consisting of unsaturated compounds having a bicyclopentyl group and having a double ring. A group consisting of an unsaturated compound of a pentenyl group and a mixture thereof.

在本發明的一實施例中,所述含脂環式碳氫基之不飽和化合物(a-2-2)是選自由(甲基)丙烯酸雙環戊酯、(甲基)丙烯酸雙環戊烯酯、(甲基)丙烯酸雙環戊氧基乙酯、(甲基)丙烯酸雙環戊烯氧基乙酯及其混合物所組成之群。 In an embodiment of the invention, the alicyclic hydrocarbon group-containing unsaturated compound (a-2-2) is selected from the group consisting of dicyclopentanyl (meth)acrylate and biscyclopentenyl (meth)acrylate. a group consisting of dicyclopentyloxyethyl (meth)acrylate, dicyclopentenyloxyethyl (meth)acrylate, and mixtures thereof.

在本發明的一實施例中,所述具有乙烯性不飽和基之化合物(B)包括第一化合物(B-1),其中所述第一化合物(B-1)具有胺基甲酸酯基與至少7個丙烯醯基。 In an embodiment of the invention, the compound (B) having an ethylenically unsaturated group includes the first compound (B-1), wherein the first compound (B-1) has a urethane group With at least 7 propylene sulfhydryl groups.

在本發明的一實施例中,所述第一化合物(B-1)具有胺基甲酸酯基與至少10個丙烯醯基。 In an embodiment of the invention, the first compound (B-1) has a urethane group and at least 10 acryl groups.

在本發明的一實施例中,所述的感光性樹脂組成物,更包括染料(F)。 In an embodiment of the invention, the photosensitive resin composition further includes a dye (F).

在本發明的一實施例中,所述染料(F)包括由式(f-1)表示的染料(F-1), In an embodiment of the invention, the dye (F) comprises a dye (F-1) represented by the formula (f-1),

式(f-1)中,J1、J2、J3及J4各自獨立表示氫原子、碳數為1至8的烷基、經取代的碳數為1至8的烷基、碳數為3至8的環烷基、經取代 的碳數為3至8的環烷基、苯基或經取代的苯基;J5及J6各自獨立表示氫原子、碳數為1至8的烷基或氯原子;J7表示具有聚合性不飽合基的基;a表示1至5的整數。 In the formula (f-1), J 1 , J 2 , J 3 and J 4 each independently represent a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, a substituted alkyl group having 1 to 8 carbon atoms, and a carbon number. a cycloalkyl group of 3 to 8, a substituted cycloalkyl group having a carbon number of 3 to 8, a phenyl group or a substituted phenyl group; and J 5 and J 6 each independently represent a hydrogen atom and have a carbon number of 1 to 8. An alkyl group or a chlorine atom; J 7 represents a group having a polymerizable unsaturated group; and a represents an integer of 1 to 5.

在本發明的一實施例中,所述由式(f-1)表示的化合物包括由式(f-2)表示的化合物, In an embodiment of the invention, the compound represented by the formula (f-1) includes a compound represented by the formula (f-2),

式(f-2)中,J1、J2、J3及J4各自獨立表示氫原子、碳數為1至8的烷基、經取代的碳數為1至8的烷基、碳數為3至8的環烷基、經取代的碳數為3至8的環烷基、苯基或經取代的苯基;J5及J6各自獨立表示氫原子、碳數為1至8的烷基或氯原子;J8表示具有聚合性不飽合基的基。 In the formula (f-2), J 1 , J 2 , J 3 and J 4 each independently represent a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, a substituted alkyl group having 1 to 8 carbon atoms, and a carbon number. a cycloalkyl group of 3 to 8, a substituted cycloalkyl group having a carbon number of 3 to 8, a phenyl group or a substituted phenyl group; and J 5 and J 6 each independently represent a hydrogen atom and have a carbon number of 1 to 8. An alkyl group or a chlorine atom; and J 8 represents a group having a polymerizable unsaturated group.

在本發明的一實施例中,上述J8為由式(f-3)表示的基或由式(f-4)表示的基, In an embodiment of the invention, the above J 8 is a group represented by the formula (f-3) or a group represented by the formula (f-4),

式(f-3)及式(f-4)中,J9及J10各自獨立表示氫原子或甲基;V1、V2、V3及V4各自獨立表示經取代或未經取代的碳數為1至12的烷二基;Q1表示;Q2表示二價脂環式烴基;b表示0至12的整數;c及d各自獨立表示0至6的整數。 In the formulae (f-3) and (f-4), J 9 and J 10 each independently represent a hydrogen atom or a methyl group; and V 1 , V 2 , V 3 and V 4 each independently represent substituted or unsubstituted. An alkanediyl group having a carbon number of 1 to 12; Q 1 represents or ; Q 2 represents a divalent alicyclic hydrocarbon group; b represents an integer of 0 to 12; and c and d each independently represent an integer of 0 to 6.

在本發明的一實施例中,基於所述鹼可溶性樹脂(A)之使用量總和為100重量份,所述含乙烯性不飽和基之化合物(B)之使用量範圍為20重量份至200重量份;所述光起始劑(C)之使用量範圍為10重量份至100重量份;所述溶劑(D)之使用量範圍為500重量份至5000重量份;所述顏料(E)之使用量範圍為30重量份至300重量份。 In one embodiment of the present invention, the ethylenically unsaturated group-containing compound (B) is used in an amount ranging from 20 parts by weight to 200 parts by weight based on 100 parts by weight of the total amount of the alkali-soluble resin (A). The photoinitiator (C) is used in an amount ranging from 10 parts by weight to 100 parts by weight; the solvent (D) is used in an amount ranging from 500 parts by weight to 5000 parts by weight; the pigment (E) The amount used is in the range of 30 parts by weight to 300 parts by weight.

在本發明的一實施例中,基於所述鹼可溶性樹脂(A)之使用量總和為100重量份,所述染料(F)之使用量範圍為5重量份至90重量份。 In an embodiment of the invention, the dye (F) is used in an amount ranging from 5 parts by weight to 90 parts by weight based on 100 parts by weight of the total amount of the alkali-soluble resin (A).

在本發明的一實施例中,基於所述鹼可溶性樹脂(A-2)之所述不飽和羧酸或不飽和羧酸酐化合物(a-2-1)、所述含脂環式碳 氫基之不飽和化合物(a-2-2)及所述其它不飽和化合物(a-2-3)之合計量為100重量份,所述含脂環式碳氫基之不飽和化合物(a-2-2)之使用量範圍為10重量份至50重量份。 In one embodiment of the present invention, the unsaturated carboxylic acid or unsaturated carboxylic anhydride compound (a-2-1), the alicyclic carbon-containing carbon based on the alkali-soluble resin (A-2) The total amount of the hydrogen group-containing unsaturated compound (a-2-2) and the other unsaturated compound (a-2-3) is 100 parts by weight, and the alicyclic hydrocarbon group-containing unsaturated compound (a) -2-2) is used in an amount ranging from 10 parts by weight to 50 parts by weight.

在本發明的一實施例中,基於所述鹼可溶性樹脂(A)之使用量總和為100重量份,所述第一化合物(B-1)之使用量範圍為5重量份至100重量份。 In one embodiment of the present invention, the first compound (B-1) is used in an amount ranging from 5 parts by weight to 100 parts by weight based on 100 parts by weight of the total amount of the alkali-soluble resin (A).

在本發明的一實施例中,基於所述鹼可溶性樹脂(A)之使用量總和為100重量份,所述光起始劑(C-1)之使用量範圍為5重量份至100重量份。 In one embodiment of the present invention, the photoinitiator (C-1) is used in an amount ranging from 5 parts by weight to 100 parts by weight based on 100 parts by weight of the total amount of the alkali-soluble resin (A). .

在本發明的一實施例中,基於所述鹼可溶性樹脂(A)之使用量總和為100重量份,所述染料(F-1)之使用量範圍為3重量份至90重量份。 In an embodiment of the invention, the dye (F-1) is used in an amount ranging from 3 parts by weight to 90 parts by weight based on 100 parts by weight of the total amount of the alkali-soluble resin (A).

本發明的一種彩色濾光片之製造方法,其是使用上述的感光性樹脂組成物而形成一畫素層。 A method of producing a color filter according to the present invention is to form a pixel layer using the above-described photosensitive resin composition.

本發明的一種彩色濾光片,其是藉由上述之方法所製得。 A color filter of the present invention is produced by the above method.

本發明的一種液晶顯示裝置,包括上述的彩色濾光片。 A liquid crystal display device of the present invention includes the above-described color filter.

基於上述,本發明的感光性樹脂組成物包括有鹼可溶性樹脂(A-1)、鹼可溶性樹脂(A-2)、第一化合物(B-1)以及光起始劑(C-1),因此可以改善高精細度的圖案直線性不佳、圖案平滑性不佳以及高逸氣性等問題,進而適用於彩色濾光片以及液晶顯示裝置。 Based on the above, the photosensitive resin composition of the present invention comprises an alkali-soluble resin (A-1), an alkali-soluble resin (A-2), a first compound (B-1), and a photoinitiator (C-1). Therefore, problems such as poor linearity of the high-definition pattern, poor pattern smoothness, and high outgassing property can be improved, and the color filter and the liquid crystal display device can be applied.

為讓本發明的上述特徵和優點能更明顯易懂,下文特舉 實施例,並配合所附圖式作詳細說明如下。 In order to make the above features and advantages of the present invention more apparent, the following is a special The embodiments are described in detail below in conjunction with the drawings.

<感光性樹脂組成物><Photosensitive resin composition>

本發明提供一種感光性樹脂組成物,其包括鹼可溶性樹脂(A)、具有乙烯性不飽和基之化合物(B)、光起始劑(C)、溶劑(D)以及顏料(E)。此外,感光性樹脂組成物可進一步包括染料(F)以及添加劑(G)。以下將詳細說明用於本發明的感光性樹脂組成物的各個成分:在此說明的是,以下是以(甲基)丙烯酸表示丙烯酸及/或甲基丙烯酸,並以(甲基)丙烯酸酯表示丙烯酸酯及/或甲基丙烯酸酯;同樣地,以(甲基)丙烯醯基表示丙烯醯基及/或甲基丙烯醯基。 The present invention provides a photosensitive resin composition comprising an alkali-soluble resin (A), a compound (B) having an ethylenically unsaturated group, a photoinitiator (C), a solvent (D), and a pigment (E). Further, the photosensitive resin composition may further include a dye (F) and an additive (G). Hereinafter, each component of the photosensitive resin composition used in the present invention will be described in detail. Here, the following description means that acrylic acid and/or methacrylic acid is represented by (meth)acrylic acid, and is represented by (meth) acrylate. Acrylate and/or methacrylate; similarly, the (meth)acrylonitrile group represents an acryloyl group and/or a methacryl group.

鹼可溶性樹脂(A):Alkali soluble resin (A):

鹼可溶性樹脂(A)包括鹼可溶性樹脂(A-1)以及鹼可溶性樹脂(A-2)。 The alkali-soluble resin (A) includes an alkali-soluble resin (A-1) and an alkali-soluble resin (A-2).

鹼可溶性樹脂(A-1)Alkali soluble resin (A-1)

鹼可溶性樹脂(A-1)是由一混合物反應而獲得,且所述混 合物包括具有至少二個環氧基的環氧化合物(a-1-1)、具有至少一個羧酸基及至少一個乙烯性不飽和基之化合物(a-1-2)、四羧酸或其酸二酐(a-1-3)以及二羧酸或其酸酐(a-1-4) The alkali-soluble resin (A-1) is obtained by reacting a mixture, and the mixing The compound includes an epoxy compound (a-1-1) having at least two epoxy groups, a compound (a-1-2) having at least one carboxylic acid group and at least one ethylenically unsaturated group, a tetracarboxylic acid or Its acid dianhydride (a-1-3) and dicarboxylic acid or its anhydride (a-1-4)

具有至少二個環氧基的環氧化合物(a-1-1)Epoxy compound having at least two epoxy groups (a-1-1)

本發明之具有至少二個環氧基的環氧化合物(a-1-1)可具有如下式(aI-1)或下式(aI-2)所示之結構。在此處,「環氧化合物(a-1-1)可具有如下式(aI-1)或下式(aI-2)所示之結構」的敘述亦涵蓋了具有如下式(aI-1)所示之結構的化合物及具有如下式(aI-2)所示之結構的化合物同時存在而作為環氧化合物(a-1-1)的情形。具體而言,前述具有至少二個環氧基的環氧化合物(a-1-1)例如是具有如下式(aI-1)所示之結構: 式(aI-1)中,W1、W2、W3以及W4各自為相同或不同,且獨立表示氫原子、鹵素原子、碳數為1至5的烷基、碳數為1至5的烷氧基、碳數為6至12的芳基或碳數為6至12的芳烷基。 The epoxy compound (a-1-1) having at least two epoxy groups of the present invention may have a structure represented by the following formula (aI-1) or the following formula (aI-2). Here, the description that the epoxy compound (a-1-1) may have a structure represented by the following formula (aI-1) or the following formula (aI-2)" also encompasses the following formula (aI-1) The compound having the structure shown and the compound having the structure represented by the following formula (aI-2) exist simultaneously as the epoxy compound (a-1-1). Specifically, the epoxy compound (a-1-1) having at least two epoxy groups as described above has, for example, a structure represented by the following formula (aI-1): In the formula (aI-1), W 1 , W 2 , W 3 and W 4 are each the same or different and independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 5 carbon atoms, and a carbon number of 1 to 5. The alkoxy group is an aryl group having 6 to 12 carbon atoms or an aralkyl group having 6 to 12 carbon atoms.

前述式(aI-1)之具有至少二個環氧基的環氧化合物(a-1-1)可包括由雙酚芴型化合物(bisphenol fluorene)與鹵化環氧丙烷 (epihalohydrin)反應而得之含環氧基之雙酚芴型化合物,但並不限於此。 The epoxy compound (a-1-1) having at least two epoxy groups of the above formula (aI-1) may include a bisphenol fluorene and a halogenated propylene oxide. (epihalohydrin) The epoxy group-containing bisphenol quinone type compound obtained by the reaction, but is not limited thereto.

作為上述雙酚芴型化合物的具體例,可列舉:9,9-雙(4-羥基苯基)芴[9,9-bis(4-hydroxyphenyl)fluorene]、9,9-雙(4-羥基-3-甲基苯基)芴[9,9-bis(4-hydroxy-3-methylphenyl)fluorene]、9,9-雙(4-羥基-3-氯苯基)芴[9,9-bis(4-hydroxy-3-chlorophenyl)fluorene]、9,9-雙(4-羥基-3-溴苯基)芴[9,9-bis(4-hydroxy-3-bromophenyl)fluorene]、9,9-雙(4-羥基-3-氟苯基)芴[9,9-bis(4-hydroxy-3-fluorophenyl)fluorene]、9,9-雙(4-羥基-3-甲氧基苯基)芴[9,9-bis(4-hydroxy-3-methoxyphenyl)fluorene]、9,9-雙(4-羥基-3,5-二甲基苯基)芴[9,9-bis(4-hydroxy-3,5-dimethylphenyl)fluorene]、9,9-雙(4-羥基-3,5-二氯苯基)芴[9,9-bis(4-hydroxy-3,5-dichlorophenyl)fluorene]、9,9-雙(4-羥基-3,5-二溴苯基)芴[9,9-bis(4-hydroxy-3,5-dibromophenyl)fluorene]等化合物。 Specific examples of the above bisphenol quinoid type compound include 9,9-bis(4-hydroxyphenyl)fluorene, 9,9-bis(4-hydroxyl group). -3-methylphenyl)fluorene [9,9-bis(4-hydroxy-3-methylphenyl)fluorene], 9,9-bis(4-hydroxy-3-chlorophenyl)fluorene [9,9-bis (4-hydroxy-3-chlorophenyl)fluorene], 9,9-bis(4-hydroxy-3-bromophenyl)fluorene, 9,9 - bis(4-hydroxy-3-fluorophenyl)fluorene, 9,9-bis(4-hydroxy-3-methoxyphenyl) [9,9-bis(4-hydroxy-3-methoxyphenyl)fluorene], 9,9-bis(4-hydroxy-3,5-dimethylphenyl)anthracene [9,9-bis(4-hydroxy) -3,5-dimethylphenyl)fluorene], 9,9-bis(4-hydroxy-3,5-dichlorophenyl)fluorene, a compound such as 9,9-bis(4-hydroxy-3,5-dibromophenyl)fluorene.

上述鹵化環氧丙烷(epihalohydrin)可包括但不限於3-氯-1,2-環氧丙烷(epichlorohydrin)或3-溴-1,2-環氧丙烷(epibromohydrin)等。 The above-mentioned epihalohydrin may include, but is not limited to, 3-chloro-1,2-epoxyhydrin or 3-bromo-1,2-propylene oxide (epibromohydrin).

上述由雙酚芴型化合物與鹵化環氧丙烷反應所得之含環氧基之雙酚芴型化合物包含但不限於:(1)新日鐵化學(Nippon Steel Chemical Co.,Ltd)所製造之商品:例如ESF-300等;(2)大阪瓦斯(Osaka Gas Co.,Ltd)所製造之商品:例如PG-100、EG-210等;(3)短信科技(S.M.S Technology Co.,Ltd)所製造之商品:例如 SMS-F9PhPG、SMS-F9CrG、SMS-F914PG等。 The epoxy group-containing bisphenol quinone type compound obtained by reacting the bisphenol quinoid compound with the halogenated propylene oxide includes, but is not limited to: (1) a product manufactured by Nippon Steel Chemical Co., Ltd. : for example, ESF-300, etc.; (2) goods manufactured by Osaka Gas Co., Ltd.: for example, PG-100, EG-210, etc.; (3) manufactured by SMS Technology Co., Ltd. Goods: for example SMS-F9PhPG, SMS-F9CrG, SMS-F914PG, etc.

另外,上述具有至少二個環氧基的環氧化合物(a-1-1)亦可具有如下式(aI-2)所示之結構: 式(aI-2)中,W5至W18各自為相同或不同,且獨立表示氫原子、鹵素原子、碳數為1至8的烷基或碳數為6至15的芳香基,s表示0至10的整數。 Further, the epoxy compound (a-1-1) having at least two epoxy groups may have a structure represented by the following formula (aI-2): In the formula (aI-2), W 5 to W 18 are each the same or different and independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 8 carbon atoms or an aromatic group having 6 to 15 carbon atoms, and s represents An integer from 0 to 10.

含有式(aI-2)所表示的結構的具有至少二個環氧基的環氧化合物(a-1-1)可包括在鹼金屬氫氧化物存在下,使具有下式(aI-2-1)結構的化合物與鹵化環氧丙烷進行反應而得。 The epoxy compound (a-1-1) having at least two epoxy groups having the structure represented by the formula (aI-2) may be included in the presence of an alkali metal hydroxide to have the following formula (aI-2- 1) A compound of the structure is obtained by reacting a halogenated propylene oxide.

在上式(aI-2-1)中,W5至W18以及s的定義是分別與式(aI-2)中的W5至W18以及s的定義相同,在此不另贅述。 In the above formula (aI-2-1), and are respectively of formula (aI-2) W 5, and to the same definition of W, and W 18 s is defined to 5 W 18 s, and this is not described herein.

再者,前述式(aI-2)之具有至少二個環氧基的環氧化合物(a-1-1)例如是在酸觸媒存在下,使用具有下式(aI-2-2)結構之化合物與酚(phenol)類進行縮合反應後,形成具有式(aI-2-1)結構之化合物。接著,藉由加入過量的鹵化環氧丙烷進行脫鹵化氫反應(dehydrohalogenation),而獲得如式(aI-2)所示之具有至少二個環氧 基的環氧化合物(a-1-1): Further, the epoxy compound (a-1-1) having at least two epoxy groups of the above formula (aI-2) is, for example, in the presence of an acid catalyst, and has a structure of the following formula (aI-2-2). The compound is subjected to a condensation reaction with a phenol to form a compound having the structure of the formula (aI-2-1). Next, an dehydrohalogenation reaction is carried out by adding an excess of halogenated propylene oxide to obtain an epoxy compound (a-1-1) having at least two epoxy groups as shown in the formula (aI-2). :

在上式(aI-2-2)中,W19與W20分別為相同或不同之氫原子、鹵素原子、碳數為1至8的烷基或碳數為6至15的芳香基;M1及M2分別為相同或不同之鹵素原子、碳數為1至6的烷基或碳數為1至6的烷氧基。較佳地,上述鹵素原子可例如氯或溴,上述烷基可例如甲基、乙基或第三丁基,上述烷氧基可例如甲氧基或乙氧基。 In the above formula (aI-2-2), W 19 and W 20 are the same or different hydrogen atom, a halogen atom, an alkyl group having 1 to 8 carbon atoms or an aromatic group having 6 to 15 carbon atoms; 1 and M 2 are each the same or different halogen atom, an alkyl group having 1 to 6 carbon atoms or an alkoxy group having 1 to 6 carbon atoms. Preferably, the above halogen atom may be, for example, chlorine or bromine, and the above alkyl group may be, for example, a methyl group, an ethyl group or a third butyl group, and the above alkoxy group may be, for example, a methoxy group or an ethoxy group.

作為上述酚類的具體例,可列舉如:酚(phenol)、甲酚(cresol)、乙酚(ethylphenol)、n-丙酚(n-propylphenol)、異丁酚(isobutylphenol)、t-丁酚(t-butylphenol)、辛酚(octylphenol)、壬基苯酚(nonylphenol)、茬酚(xylenol)、甲基丁基苯酚(methylbutylphenol)、二第三丁基酚(di-t-butylphenol)、乙烯苯酚(vinylphenol)、丙烯苯酚(propenylphenol)、乙炔苯酚(ethinylphenol)、環戊苯酚(cyclopentylphenol)、環己基酚(cyclohexylphenol)或環己基甲酚(cyclohexylcresol)等。上述酚類一般可單獨或混合多種使用。 Specific examples of the phenols include phenol, cresol, ethylphenol, n-propylphenol, isobutylphenol, and t-butyl phenol. (t-butylphenol), octylphenol, nonylphenol, xylenol, methylbutylphenol, di-t-butylphenol, vinylphenol (vinylphenol), propenylphenol, ethinylphenol, cyclopentylphenol, cyclohexylphenol or cyclohexylcresol. The above phenols can be generally used singly or in combination of two or more.

基於上述具有式(aI-2-2)結構之化合物的使用量為1莫耳,酚類的使用量為0.5莫耳至20莫耳,較佳為2莫耳至15莫耳。 The compound having the structure of the above formula (aI-2-2) is used in an amount of 1 mol, and the phenol is used in an amount of 0.5 mol to 20 mol, preferably 2 mol to 15 mol.

作為上述酸觸媒的具體例,可列舉:鹽酸、硫酸、對甲苯磺酸(p-toluenesulfonic acid)、草酸(oxalic acid)、三氟化硼(boron trifluoride)、無水氯化鋁(aluminium chloride anhydrous)、氯化鋅(zinc chloride)等,其中以對甲苯磺酸、硫酸或鹽酸較佳。上述酸觸媒可單獨或混合多種使用。 Specific examples of the acid catalyst include hydrochloric acid, sulfuric acid, p-toluenesulfonic acid, oxalic acid, and boron trifluoride (boron). Trifluoride), aluminum chloride anhydrous, zinc chloride, etc., of which p-toluenesulfonic acid, sulfuric acid or hydrochloric acid is preferred. The above acid catalysts may be used singly or in combination of two or more.

另外,上述酸觸媒之使用量雖無特別之限制,但基於上述具有式(aI-2-2)結構之化合物的使用量為100重量百分比(wt%),酸觸媒的使用量較佳為0.1wt%至30wt%。 Further, although the amount of the acid catalyst used is not particularly limited, the amount of the acid catalyst used is preferably based on 100 parts by weight (wt%) of the compound having the structure of the formula (aI-2-2). It is from 0.1 wt% to 30 wt%.

上述縮合反應可在無溶劑或是在有機溶劑存在下進行。其次,上述有機溶劑的具體例可列舉:甲苯(toluene)、二甲苯(xylene)或甲基異丁基酮(methyl isobutyl ketone)等。上述有機溶劑可單獨或混合多種使用。 The above condensation reaction can be carried out in the absence of a solvent or in the presence of an organic solvent. Specific examples of the organic solvent include toluene, xylene, and methyl isobutyl ketone. The above organic solvents may be used singly or in combination of two or more.

基於具有式(aI-2-2)結構之化合物及酚類的使用量總和為100wt%,上述有機溶劑的使用量為50wt%至300wt%,其中以100wt%至250wt%較佳。另外,上述縮合反應的操作溫度為40℃至180℃,且縮合反應的操作時間為1小時至8小時。 The above organic solvent is used in an amount of from 50% by weight to 300% by weight based on the total amount of the compound having the structure of the formula (aI-2-2) and the phenol, and is preferably from 100% by weight to 250% by weight. Further, the above condensation reaction has an operation temperature of 40 ° C to 180 ° C, and the operation time of the condensation reaction is 1 hour to 8 hours.

在完成上述縮合反應後,可進行中和處理或水洗處理。上述中和處理是將反應後的溶液之pH值調整為pH 3至pH 7,其中以pH 5至pH 7較佳。上述水洗處理可使用中和劑來進行,此中和劑為鹼性物質,且其具體例可列舉:氫氧化鈉(sodium hydroxide)、氫氧化鉀(potassium hydroxide)等鹼金屬氫氧化物;氫氧化鈣(calcium hydroxide)、氫氧化鎂(magnesium hydroxide)等鹼土類金屬氫氧化物;二伸乙三胺(diethylene triamine)、三伸乙四胺(triethylenetetramine)、苯胺(aniline)、苯二胺(phenylene diamine) 等有機胺;以及氨(ammonia)、磷酸二氫鈉(sodium dihydrogen phosphate)等。上述水洗處理可採用習知方法進行,例如,在反應後的溶液中,加入含中和劑的水溶液,反覆進行萃取即可。經中和處理或水洗處理後,經減壓加熱處理,將未反應的酚類及溶劑予以餾除,並進行濃縮,即可獲得具有式(aI-2-1)結構之化合物。 After completion of the above condensation reaction, a neutralization treatment or a water washing treatment may be carried out. The above neutralization treatment is to adjust the pH of the solution after the reaction to pH 3 to pH 7, preferably pH 5 to pH 7. The water washing treatment may be carried out using a neutralizing agent, and the neutralizing agent is an alkaline substance, and specific examples thereof include alkali metal hydroxides such as sodium hydroxide and potassium hydroxide; and hydrogen; Alkaline earth metal hydroxides such as calcium hydroxide and magnesium hydroxide; diethylene triamine, triethylenetetramine, aniline, phenylenediamine (diethyltetramine) Phenylene diamine) Such as organic amines; and ammonia, sodium dihydrogen phosphate and the like. The above washing treatment can be carried out by a conventional method. For example, an aqueous solution containing a neutralizing agent is added to the solution after the reaction, and extraction can be carried out repeatedly. After the neutralization treatment or the water washing treatment, the unreacted phenols and the solvent are distilled off by heat treatment under reduced pressure, and concentrated to obtain a compound having the structure of the formula (aI-2-1).

作為上述鹵化環氧丙烷的具體例,可例舉:3-氯-1,2-環氧丙烷(3-chloro-1,2-epoxypropane)、3-溴-1,2-環氧丙烷(3-bromo-1,2-epoxypropane)或上述任意組合。在進行上述脫鹵化氫反應之前,可預先添加或於反應過程中添加氫氧化鈉、氫氧化鉀等鹼金屬氫氧化物。上述脫鹵化氫反應的操作溫度為20℃至120℃,其操作時間範圍為1小時至10小時。 Specific examples of the above halogenated propylene oxide include 3-chloro-1,2-epoxypropane and 3-bromo-1,2-epoxypropane (3). -bromo-1, 2-epoxypropane) or any combination of the above. An alkali metal hydroxide such as sodium hydroxide or potassium hydroxide may be added in advance or added to the reaction before the dehydrohalogenation reaction. The above dehydrohalogenation reaction has an operating temperature of from 20 ° C to 120 ° C and an operation time ranging from 1 hour to 10 hours.

於本發明之具體例中,上述脫鹵化氫反應中所添加之鹼金屬氫氧化物亦可使用其水溶液。在此具體例中,將上述鹼金屬氫氧化物水溶液連續添加至脫鹵化氫反應系統內的同時,可於減壓或常壓下,連續蒸餾出水及鹵化環氧丙烷,藉此分離並除去水,同時可將鹵化環氧丙烷連續地回流至反應系統內。 In a specific example of the present invention, an aqueous solution of the alkali metal hydroxide added to the dehydrohalogenation reaction may be used. In this specific example, while the aqueous alkali metal hydroxide solution is continuously added to the dehydrohalogenation reaction system, water and halogenated propylene oxide can be continuously distilled off under reduced pressure or normal pressure, thereby separating and removing water. At the same time, the halogenated propylene oxide can be continuously refluxed into the reaction system.

上述脫鹵化氫反應進行前,亦可添加氯化四甲銨(tetramethyl ammonium chloride)、溴化四甲銨(tetramethyl ammonium bromide)、三甲基苄基氯化銨(trimethyl benzyl ammonium chloride)等的四級銨鹽作為觸媒,並在50℃至150℃下,反應1小時至5小時,再加入鹼金屬氫氧化物或其水溶液,於20℃至120℃的溫度下,使其反應1小時至10小時,以進行脫 鹵化氫反應。 Before the dehydrohalogenation reaction is carried out, tetramethyl ammonium chloride, tetramethyl ammonium bromide, trimethyl benzyl ammonium chloride or the like may be added. The ammonium salt is used as a catalyst, and reacted at 50 ° C to 150 ° C for 1 hour to 5 hours, and then an alkali metal hydroxide or an aqueous solution thereof is added thereto, and the reaction is carried out at a temperature of 20 ° C to 120 ° C for 1 hour. 10 hours to take off Hydrogen halide reaction.

基於上述具有式(aI-2-1)結構之化合物中的羥基總當量為1當量,上述鹵化環氧丙烷的使用量可為1當量至20當量,其中以2當量至10當量較佳。基於上述具有式(aI-2-1)結構之化合物中的羥基總當量為1當量,上述脫鹵化氫反應中添加的鹼金屬氫氧化物的使用量可為0.8當量至15當量,其中以0.9當量至11當量較佳。 The halogenated propylene oxide may be used in an amount of from 1 equivalent to 20 equivalents, preferably from 2 equivalents to 10 equivalents, based on 1 equivalent of the total hydroxyl group in the compound having the structure of the formula (aI-2-1). The alkali metal hydroxide added in the above dehydrohalogenation reaction may be used in an amount of from 0.8 equivalents to 15 equivalents, based on 0.9 equivalents, based on the total equivalent of the hydroxyl group in the compound having the structure of the formula (aI-2-1). Equivalent to 11 equivalents is preferred.

此外,為了使上述脫鹵化氫反應順利進行,除了可添加甲醇、乙醇等醇類之外,亦可添加二甲碸(dimethyl sulfone)、二甲亞碸(dimethyl sulfoxide)等非質子性(aprotic)的極性溶媒等來進行反應。在使用醇類的情況下,基於上述鹵化環氧丙烷的總量為100wt%,醇類的使用量可為2wt%至20wt%,較佳為4wt%至15wt%。在使用非質子性的極性溶媒的例子中,基於鹵化環氧丙烷的總量為100wt%,非質子性的極性溶媒的使用量可為5wt%至100wt%,其中,以10wt%至90wt%較佳。 Further, in order to smoothly carry out the above-described dehydrohalogenation reaction, an aprotic such as dimethyl sulfone or dimethyl sulfoxide may be added in addition to an alcohol such as methanol or ethanol. A polar solvent or the like is used to carry out the reaction. In the case of using an alcohol, the alcohol may be used in an amount of 2% by weight to 20% by weight, preferably 4% by weight to 15% by weight based on the total amount of the above-mentioned halogenated propylene oxide being 100% by weight. In the case of using an aprotic polar solvent, the total amount of the aprotic polar solvent may be from 5 wt% to 100 wt%, wherein 10 wt% to 90 wt%, based on the total amount of the halogenated propylene oxide, is 100 wt%. good.

在完成脫鹵化氫反應後,可選擇性地進行水洗處理。之後,利用加熱減壓的方式除去鹵化環氧丙烷、醇類及非質子性的極性溶媒等。上述加熱減壓例如是於溫度為110℃至250℃,且壓力為1.3kPa(10mmHg)以下的環境下進行。 After completion of the dehydrohalogenation reaction, a water washing treatment can be selectively performed. Thereafter, the halogenated propylene oxide, the alcohol, and the aprotic polar solvent are removed by heating and decompression. The heating and depressing is performed, for example, in an environment having a temperature of 110 ° C to 250 ° C and a pressure of 1.3 kPa (10 mmHg) or less.

為了避免形成之環氧樹脂含有加水分解性鹵素,可將脫鹵化氫反應後的溶液加入甲苯、甲基異丁基酮(methyl isobutyl ketone)等溶劑,並加入氫氧化鈉、氫氧化鉀等鹼金屬氫氧化物水 溶液,再次進行脫鹵化氫反應。在脫鹵化氫反應中,基於上述具有式(C-II-1)結構之化合物中的羥基總當量為1當量,鹼金屬氫氧化物的使用量為0.01莫耳至0.3莫耳,其中,以0.05莫耳至0.2莫耳較佳。另外,上述脫鹵化氫反應的操作溫度範圍為50℃至120℃,且其操作時間範圍為0.5小時至2小時。 In order to prevent the formed epoxy resin from containing a hydrolyzable halogen, the solution after the dehydrohalogenation reaction may be added to a solvent such as toluene or methyl isobutyl ketone, and a base such as sodium hydroxide or potassium hydroxide may be added. Metal hydroxide water The solution is again subjected to a dehydrohalogenation reaction. In the dehydrohalogenation reaction, the total equivalent weight of the hydroxyl group in the compound having the structure of the above formula (C-II-1) is 1 equivalent, and the alkali metal hydroxide is used in an amount of 0.01 mol to 0.3 mol, wherein 0.05 moles to 0.2 moles are preferred. Further, the above dehydrohalogenation reaction has an operating temperature in the range of 50 ° C to 120 ° C and an operation time ranging from 0.5 hour to 2 hours.

在完成脫鹵化氫反應後,藉由過濾及水洗等步驟去除鹽類。此外,亦可利用加熱減壓的方式,將甲苯、甲基異丁基酮等溶劑予以餾除,而可獲得如式(C-II)所示之具有至少二個環氧基的環氧化合物(i)。上述式(C-II)之具有至少二個環氧基的環氧化合物(i)可包含但不限於如商品名為NC-3000、NC-3000H、NC-3000S及NC-3000P等日本化藥(Nippon Kayaku Co.Ltd.)所製造之商品。 After completion of the dehydrohalogenation reaction, the salts are removed by filtration, washing, and the like. Further, a solvent such as toluene or methyl isobutyl ketone may be distilled off by heating and pressure reduction to obtain an epoxy compound having at least two epoxy groups as shown in the formula (C-II). (i). The epoxy compound (i) having at least two epoxy groups of the above formula (C-II) may include, but is not limited to, a Japanese chemical such as NC-3000, NC-3000H, NC-3000S, and NC-3000P. (Nippon Kayaku Co. Ltd.) manufactured goods.

具有至少一個羧酸基及至少一個乙烯性不飽和基之化合物(a-1-2)a compound having at least one carboxylic acid group and at least one ethylenically unsaturated group (a-1-2)

所述具有至少一個羧酸基及至少一個乙烯性不飽和基之化合物(a-1-2)例如是選自於由以下(1)至(3)所組成之群組:(1)丙烯酸、甲基丙烯酸、2-甲基丙烯醯氧乙基丁二酸(2-methacryloyloxy ethylbutanedioic acid)、2-甲基丙烯醯氧丁基丁二酸、2-甲基丙烯醯氧乙基己二酸、2-甲基丙烯醯氧丁基己二酸、2-甲基丙烯醯氧乙基六氫鄰苯二甲酸、2-甲基丙烯醯氧乙基馬來酸、2-甲基丙烯醯氧丙基馬來酸、2-甲基丙烯醯氧丁基馬來酸、2-甲基丙烯醯氧丙基丁二酸、2-甲基丙烯醯氧丙基己二酸、2-甲基丙烯醯氧丙基四氫鄰苯二甲酸、2-甲基丙烯醯氧丙基鄰苯二甲酸、2-甲基丙烯醯氧丁基鄰 苯二甲酸、或2-甲基丙烯醯氧丁基氫鄰苯二甲酸;(2)由含羥基之(甲基)丙烯酸酯與二元羧酸化合物反應而得之化合物,其中二元羧酸化合物包含但不限於己二酸、丁二酸、馬來酸、鄰苯二甲酸;(3)由含羥基之(甲基)丙烯酸酯與羧酸酐化合物反應而得之半酯化合物,其中含羥基之(甲基)丙烯酸酯包含但不限於2-羥基乙基丙烯酸酯[(2-hydroxyethyl)acrylate]、2-羥基乙基甲基丙烯酸酯[(2-hydroxyethyl)methacrylate]、2-羥基丙基丙烯酸酯[(2-hydroxypropyl)acrylate]、2-羥基丙基甲基丙烯酸酯[(2-hydroxypropyl)methacrylate]、4-羥基丁基丙烯酸酯[(4-hydroxybutyl)acrylate]、4-羥基丁基甲基丙烯酸酯[(4-hydroxybutyl)methacrylate]、或季戊四醇三甲基丙烯酸酯等。另外,此處所述的羧酸酐化合物與以下所述之四羧酸二酐或二羧酸酐相同,在此不另贅述。 The compound (a-1-2) having at least one carboxylic acid group and at least one ethylenically unsaturated group is, for example, selected from the group consisting of (1) to (3): (1) acrylic acid, 2-methacryloyloxyethylbutanedioic acid, 2-methacryloyloxybutyl succinic acid, 2-methylpropenyl ethoxide, adipic acid 2-methylpropenyloxybutyl adipate, 2-methylpropenyloxyethylhexahydrophthalic acid, 2-methylpropenyloxyethyl maleic acid, 2-methylpropenyloxypropane Kamalyx, 2-methylpropenyloxybutyl maleic acid, 2-methylpropenyloxypropyl succinic acid, 2-methylpropenyloxypropyl adipate, 2-methylpropene oxime Oxypropyl propyl tetrahydrophthalic acid, 2-methyl propylene oxypropyl phthalic acid, 2-methyl propylene oxybutyl butyl Terephthalic acid, or 2-methylpropenyloxybutyl phthalic acid; (2) a compound obtained by reacting a hydroxyl group-containing (meth) acrylate with a dicarboxylic acid compound, wherein the dicarboxylic acid The compound includes, but is not limited to, adipic acid, succinic acid, maleic acid, phthalic acid; (3) a half ester compound obtained by reacting a hydroxyl group-containing (meth) acrylate with a carboxylic anhydride compound, wherein the hydroxyl group The (meth) acrylate includes, but is not limited to, 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl Acrylate [(2-hydroxypropyl)acrylate], 2-hydroxypropyl methacrylate, 4-hydroxybutyl acrylate, 4-hydroxybutylmethyl Acrylate [(4-hydroxybutyl)methacrylate], pentaerythritol trimethacrylate, and the like. Further, the carboxylic anhydride compound described herein is the same as the tetracarboxylic dianhydride or the dicarboxylic acid anhydride described below, and will not be further described herein.

四羧酸或其酸二酐(a-1-3)Tetracarboxylic acid or its acid dianhydride (a-1-3)

四羧酸或其酸二酐(a-1-3)包括含有氟原子的四羧酸或其酸二酐、除了所述含有氟原子的四羧酸或其酸二酐之外的其它四羧酸或其酸二酐或上述兩者的組合。 The tetracarboxylic acid or its acid dianhydride (a-1-3) includes a tetracarboxylic acid containing a fluorine atom or an acid dianhydride thereof, and a tetracarboxylic acid other than the fluorine atom-containing tetracarboxylic acid or its acid dianhydride. An acid or its acid dianhydride or a combination of the two.

含有氟原子的四羧酸或其酸二酐選自由式(K-1)表示的含有氟原子的四羧酸化合物以及由式(K-2)表示的含有氟原子的四羧酸二酐化合物所組成的族群。具體而言,由式(K-1)表示的含有氟原子的四羧酸化合物以及由式(K-2)表示的含有氟原子的四羧酸二 酐化合物如下。 The tetracarboxylic acid containing a fluorine atom or an acid dianhydride thereof is selected from the group consisting of a fluorine atom-containing tetracarboxylic acid compound represented by formula (K-1) and a fluorine atom-containing tetracarboxylic dianhydride compound represented by formula (K-2). The group of people formed. Specifically, a fluorine-containing tetracarboxylic acid compound represented by formula (K-1) and a fluorine atom-containing tetracarboxylic acid represented by formula (K-2) The anhydride compound is as follows.

式(K-1)與式(K-2)中,L2為具有氟的四價芳香族基團,且較佳為具有苯環。具體而言,較佳為選自由式(L-1)至式(L-6)表示的基團中的其中一者。 In the formula (K-1) and the formula (K-2), L 2 is a tetravalent aromatic group having fluorine, and preferably has a benzene ring. Specifically, it is preferably one selected from the group consisting of the formula (L-1) to the formula (L-6).

式(L-1)至式(L-6)中,E各自獨立表示氟原子或三氟甲基,*表示與碳原子鍵結的位置。 In the formulae (L-1) to (L-6), E each independently represents a fluorine atom or a trifluoromethyl group, and * represents a position bonded to a carbon atom.

詳言之,含有氟原子的四羧酸或其酸二酐的具體例包括4,4'-六氟亞異丙基二鄰苯二甲酸、1,4-二氟均苯四甲酸、1-單氟均 苯四甲酸、1,4-二(三氟甲基)均苯四甲酸等含氟的芳香族四羧酸,或上述四羧酸之二酐化合物,或上述化合物的組合。 More specifically, specific examples of the tetracarboxylic acid or acid dianhydride containing a fluorine atom include 4,4'-hexafluoroisopropylidene diphthalic acid, 1,4-difluorobenzenetetracarboxylic acid, and 1- Monofluorocarbon A fluorine-containing aromatic tetracarboxylic acid such as pyromellitic acid or 1,4-bis(trifluoromethyl)benzenetetracarboxylic acid, or a dianhydride compound of the above tetracarboxylic acid, or a combination of the above compounds.

含有氟原子的四羧酸或其酸二酐的具體例還包括3,3'-六氟亞異丙基二鄰苯二甲酸、5,5'-[2,2,2-三氟-1-[3-(三氟甲基)苯基]亞乙基]二鄰苯二甲酸、5,5'-[2,2,3,3,3-五氟-1-(三氟甲基)亞丙基]二鄰苯二甲酸、5,5'-氧基雙[4,6,7-三氟-均苯四甲酸]、3,6-雙(三氟甲基)均苯四甲酸、4-(三氟甲基)均苯四甲酸、1,4-雙(3,4-二羧酸三氟苯氧基)四氟苯等含氟的四羧酸,或上述四羧酸之二酐化合物,或上述化合物的組合。 Specific examples of the tetracarboxylic acid or the acid dianhydride containing a fluorine atom further include 3,3'-hexafluoroisopropylidene diphthalic acid, 5,5'-[2,2,2-trifluoro-1 -[3-(Trifluoromethyl)phenyl]ethylidene]diphthalic acid, 5,5'-[2,2,3,3,3-pentafluoro-1-(trifluoromethyl) Propylene]diphthalic acid, 5,5'-oxybis[4,6,7-trifluoro-pyromellitic acid], 3,6-bis(trifluoromethyl)benzenetetracarboxylic acid, a fluorine-containing tetracarboxylic acid such as 4-(trifluoromethyl)benzenedicarboxylic acid or 1,4-bis(3,4-dicarboxylic acid trifluorophenoxy)tetrafluorobenzene, or the above tetracarboxylic acid An anhydride compound, or a combination of the above compounds.

其它四羧酸或其酸二酐包括飽和直鏈烴四羧酸、脂環式四羧酸、芳香族四羧酸,或上述四羧酸之二酐化合物,或其組合。 The other tetracarboxylic acid or acid dianhydride thereof includes a saturated linear hydrocarbon tetracarboxylic acid, an alicyclic tetracarboxylic acid, an aromatic tetracarboxylic acid, or a dianhydride compound of the above tetracarboxylic acid, or a combination thereof.

飽和直鏈烴四羧酸的具體例包括丁烷四羧酸、戊烷四羧酸、己烷四羧酸,或上述化合物的組合。飽和直鏈烴四羧酸亦可具有取代基。 Specific examples of the saturated linear hydrocarbon tetracarboxylic acid include butane tetracarboxylic acid, pentanetetracarboxylic acid, hexanetetracarboxylic acid, or a combination of the above compounds. The saturated linear hydrocarbon tetracarboxylic acid may also have a substituent.

脂環式四羧酸的具體例包括環丁烷四羧酸、環戊烷四羧酸、環已烷四羧酸,降冰片烷四羧酸,或上述化合物的組合。脂環式四羧酸亦可具有取代基。 Specific examples of the alicyclic tetracarboxylic acid include cyclobutanetetracarboxylic acid, cyclopentanetetracarboxylic acid, cyclohexanetetracarboxylic acid, norbornanetetracarboxylic acid, or a combination of the above compounds. The alicyclic tetracarboxylic acid may also have a substituent.

芳香族四羧酸的具體例包括均苯四甲酸、二苯甲酮四羧酸、聯苯四羧酸、聯苯醚四羧酸、二苯基碸四羧酸、1,2,3,6-四氫鄰苯二甲酸,或上述化合物的組合。芳香族四羧酸亦可具有取代基。 Specific examples of the aromatic tetracarboxylic acid include pyromellitic acid, benzophenonetetracarboxylic acid, biphenyltetracarboxylic acid, diphenyl ether tetracarboxylic acid, diphenylphosphonium tetracarboxylic acid, 1,2,3,6 - tetrahydrophthalic acid, or a combination of the above compounds. The aromatic tetracarboxylic acid may also have a substituent.

二羧酸或其酸酐(a-1-4)Dicarboxylic acid or its anhydride (a-1-4)

二羧酸或其酸酐(a-1-4)包括含有氟原子的二羧酸或其酸酐、除了所述含有氟原子的二羧酸或其酸酐之外的其它二羧酸或其酸酐或上述兩者的組合。 The dicarboxylic acid or its anhydride (a-1-4) includes a dicarboxylic acid containing a fluorine atom or an anhydride thereof, a dicarboxylic acid other than the fluorine atom-containing dicarboxylic acid or an anhydride thereof, or an anhydride thereof or the above a combination of the two.

含有氟原子的二羧酸或其酸酐選自由式(M-1)表示的含有氟原子的二羧酸化合物以及由式(M-2)表示的含有氟原子的二羧酸酐化合物所組成的族群。具體而言,由式(M-1)表示的含有氟原子的二羧酸化合物以及由式(M-2)表示的含有氟原子的二羧酸酐化合物如下。 The dicarboxylic acid containing a fluorine atom or an anhydride thereof is selected from the group consisting of a fluorine atom-containing dicarboxylic acid compound represented by the formula (M-1) and a fluorine atom-containing dicarboxylic anhydride compound represented by the formula (M-2). . Specifically, the fluorine atom-containing dicarboxylic acid compound represented by the formula (M-1) and the fluorine atom-containing dicarboxylic acid anhydride compound represented by the formula (M-2) are as follows.

式(M-1)與式(M-2)中,G1表示碳數為1至100的含氟原子的有機基。 In the formula (M-1) and the formula (M-2), G 1 represents an organic group of a fluorine atom having 1 to 100 carbon atoms.

含有氟原子的二羧酸或其酸酐的具體例包括3-氟鄰苯二甲酸、4-氟鄰苯二甲酸、四氟鄰苯二甲酸、3,6-二氟鄰苯二甲酸、四氟琥珀酸,或上述二羧酸之酸酐化合物,或上述化合物的組合。 Specific examples of the fluorine-containing dicarboxylic acid or its anhydride include 3-fluorophthalic acid, 4-fluorophthalic acid, tetrafluorophthalic acid, 3,6-difluorophthalic acid, and tetrafluoroethylene. Succinic acid, or an acid anhydride compound of the above dicarboxylic acid, or a combination of the above compounds.

其它二羧酸或其酸酐的具體例包括飽和直鏈烴二羧酸、飽和環狀烴二羧酸、不飽和二羧酸,或上述二羧酸化合物之酸酐,或上述化合物的組合。 Specific examples of the other dicarboxylic acid or its anhydride include a saturated linear hydrocarbon dicarboxylic acid, a saturated cyclic hydrocarbon dicarboxylic acid, an unsaturated dicarboxylic acid, or an acid anhydride of the above dicarboxylic acid compound, or a combination of the above compounds.

飽和直鏈烴二羧酸的具體例包括丁二酸、乙醯基丁二酸、己二酸、壬二酸、檸蘋酸、丙二酸、戊二酸、檸檬酸、酒石 酸、氧代戊二酸、庚二酸、癸二酸、辛二酸、二甘醇酸,或上述化合物的組合。飽和直鏈烴二羧酸中的烴基亦可被取代。 Specific examples of the saturated linear hydrocarbon dicarboxylic acid include succinic acid, acetyl succinic acid, adipic acid, sebacic acid, citramalic acid, malonic acid, glutaric acid, citric acid, and tartar. Acid, oxoglutaric acid, pimelic acid, sebacic acid, suberic acid, diglycolic acid, or a combination of the above compounds. The hydrocarbon group in the saturated linear hydrocarbon dicarboxylic acid may also be substituted.

飽和環狀烴二羧酸的具體例包括六氫鄰苯二甲酸、環丁烷二羧酸、環戊烷二羧酸、降冰片烷二羧酸、六氫偏苯三酸,或上述化合物的組合。飽和環狀烴二羧酸亦可為飽和烴經取代的脂環式二羧酸。 Specific examples of the saturated cyclic hydrocarbon dicarboxylic acid include hexahydrophthalic acid, cyclobutanedicarboxylic acid, cyclopentanedicarboxylic acid, norbornanedicarboxylic acid, hexahydrotrimellitic acid, or the like combination. The saturated cyclic hydrocarbon dicarboxylic acid may also be a saturated hydrocarbon-substituted alicyclic dicarboxylic acid.

不飽和二羧酸的具體例包括馬來酸、衣康酸、鄰苯二甲酸、四氫鄰苯二甲酸、甲基橋亞甲基四氫鄰苯二甲酸、氯茵酸、偏苯三酸,或上述化合物的組合。 Specific examples of the unsaturated dicarboxylic acid include maleic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, methyl bridgedmethylenetetrahydrophthalic acid, chlorinic acid, and trimellitic acid. , or a combination of the above compounds.

其它二羧酸或其酸酐的具體例包括三甲氧基矽烷基丙基丁二酸酐、三乙氧基矽烷基丙基丁二酸酐、甲基二甲氧基矽烷基丙基丁二酸酐、甲基二乙氧基矽烷基丙基丁二酸酐、三甲氧基矽烷基丁基丁二酸酐、三乙氧基矽烷基丁基丁二酸酐、甲基二乙氧基矽烷基丁基丁二酸酐、對(三甲氧基矽烷基)苯基丁二酸酐、對(三乙氧基矽烷基)苯基丁二酸酐、對(甲基二甲氧基矽烷基)苯基丁二酸酐、對(甲基二乙氧基矽烷基)苯基丁二酸酐、間(三甲氧基矽烷基)苯基丁二酸酐、間(三乙氧基矽烷基)苯基丁二酸酐、間(甲基二乙氧基矽烷基)苯基丁二酸酐等二羧酸酐,或上述二羧酸酐之二羧酸化合物,或上述化合物的組合。 Specific examples of other dicarboxylic acids or anhydrides thereof include trimethoxydecyl propyl succinic anhydride, triethoxy decyl propyl succinic anhydride, methyl dimethoxy decyl succinic anhydride, and methyl group. Diethoxydecyl propyl succinic anhydride, trimethoxy decyl butyl succinic anhydride, triethoxy decyl butyl succinic anhydride, methyl diethoxy decyl butyl succinic anhydride, (trimethoxydecyl)phenyl succinic anhydride, p-(triethoxydecyl)phenyl succinic anhydride, p-(methyldimethoxydecyl)phenyl succinic anhydride, p-methyl Ethoxy decyl)phenyl succinic anhydride, m-(trimethoxydecyl)phenyl succinic anhydride, m-(triethoxydecyl)phenyl succinic anhydride, m-(dimethoxy decane) A dicarboxylic acid anhydride such as phenyl succinic anhydride or a dicarboxylic acid compound of the above dicarboxylic anhydride or a combination of the above compounds.

鹼可溶性樹脂(A-1)的合成方法並無特別限制,只要將具有至少二個環氧基的環氧化合物(a-1-1)、具有至少一個羧酸基及至少一個乙烯性不飽和基之化合物(a-1-2)、四羧酸或其酸二酐 (a-1-3)以及二羧酸酐或其酸酐(a-1-4)反應即可獲得。 The method for synthesizing the alkali-soluble resin (A-1) is not particularly limited as long as the epoxy compound (a-1-1) having at least two epoxy groups, at least one carboxylic acid group, and at least one ethylenic unsaturated group are used. Compound (a-1-2), tetracarboxylic acid or acid dianhydride thereof (a-1-3) and a dicarboxylic anhydride or its anhydride (a-1-4) can be obtained by reaction.

鹼可溶性樹脂(A-1)的數量平均分子量一般為1000至8000,較佳為1500至7500,更佳為2000至7000。上述鹼可溶性樹脂(A-1)藉由膠體滲透層析儀(Gel Permeation Chromatography,GPC)測定之聚苯乙烯來換算數量平均分子量。 The number average molecular weight of the alkali-soluble resin (A-1) is usually from 1,000 to 8,000, preferably from 1,500 to 7,500, more preferably from 2,000 to 7,000. The above alkali-soluble resin (A-1) was converted into a number average molecular weight by polystyrene measured by a gel permeation chromatography (GPC).

基於所述鹼可溶性樹脂(A)為100重量份,所述鹼可溶性樹脂(A-1)的使用量為5至95重量份,較佳為10重量份至90重量份,且更佳為15重量份至85重量份。當未使用鹼可溶性樹脂(A-1)時,該感光性樹脂組成物會有逸氣性表現不佳的問題。 The alkali-soluble resin (A-1) is used in an amount of 5 to 95 parts by weight, preferably 10 parts by weight to 90 parts by weight, based on 100 parts by weight of the alkali-soluble resin (A), and more preferably 15 parts by weight. Parts by weight to 85 parts by weight. When the alkali-soluble resin (A-1) is not used, the photosensitive resin composition has a problem that the outgassing performance is poor.

當鹼可溶性樹脂(A-1)的數量平均分子量不在1000至8000範圍時,該感光性樹脂組成物會有逸氣性表現不佳的問題。 When the number average molecular weight of the alkali-soluble resin (A-1) is not in the range of from 1,000 to 8,000, the photosensitive resin composition may have a problem that the outgassing performance is poor.

鹼可溶性樹脂(A-2)Alkali soluble resin (A-2)

鹼可溶性樹脂(A-2)是由不飽和羧酸或不飽和羧酸酐化合物(a-2-1)、含脂環式碳氫基之不飽和化合物(a-2-2)及其它不飽和化合物(a-2-3)共聚合而得。 The alkali-soluble resin (A-2) is an unsaturated carboxylic acid or unsaturated carboxylic anhydride compound (a-2-1), an alicyclic hydrocarbon-containing unsaturated compound (a-2-2), and other unsaturated The compound (a-2-3) is obtained by copolymerization.

用以製備該鹼可溶性樹脂(A-2)之溶劑可包含但不限於乙二醇甲醚、乙二醇乙醚、二甘醇甲醚、二甘醇乙醚、二甘醇正丙醚、二甘醇正丁醚、三甘醇甲醚、三甘醇乙醚、丙二醇甲醚、丙二醇乙醚、一縮二丙二醇甲醚、一縮二丙二醇乙醚、一縮二丙二醇正丙醚、一縮二丙二醇正丁醚、二縮三丙二醇甲醚(tripropylene glycol mono methyl ether)、二縮三丙二醇乙醚(tripropylene glycol mono ethyl ether)等之(聚)亞烷基二醇單烷醚類溶劑;乙二醇甲醚醋酸酯、乙二醇乙醚醋酸酯、丙二醇甲醚醋酸酯、丙二醇乙醚醋酸酯等之(聚)亞烷基二醇單烷醚醋酸酯類溶劑;二甘醇二甲醚、二甘醇甲乙醚、二甘醇二乙醚、四氫呋喃等之其他醚類溶劑;甲乙烷酮、環己酮、2-庚酮、3-庚酮等之酮類溶劑;2-羥基丙酸甲酯、2-羥基丙酸乙酯等之乳酸烷酯類溶劑;2-羥基-2-甲基丙酸甲酯、2-羥基-2-甲基丙酸乙酯、3-甲氧基丙酸甲酯、3-甲氧基丙酸乙酯、3-乙氧基丙酸甲酯、3-乙氧基丙酸乙酯、乙氧基乙酸乙酯、羥基乙酸乙酯、2-羥基-3-甲基丁酸甲酯、3-甲基-3-甲氧基丁基乙酸酯、3-甲基-3-甲氧基丁基丙酸酯、乙酸乙酯、乙酸正丙酯、乙酸異丙酯、乙酸正丁酯、乙酸異丁酯、乙酸正戊酯、乙酸異戊酯、丙酸正丁酯、丁酸乙酯、丁酸正丙酯、丁酸異丙酯、丁酸正丁酯、丙酮酸甲酯、丙酮酸乙酯、丙酮酸正丙酯、乙醯乙酸甲酯、乙醯乙酸乙酯、2-氧基丁酸乙酯等之其他酯類溶劑;甲苯、二甲苯等之芳香族碳氫化合物溶劑;N-甲基吡咯烷酮、N,N-二甲基甲醯胺、N,N-二甲基乙醯胺等之羧酸醯胺溶劑。上述之溶劑可單獨一種或混合複數種使用。 The solvent used to prepare the alkali-soluble resin (A-2) may include, but is not limited to, ethylene glycol methyl ether, ethylene glycol ethyl ether, diethylene glycol methyl ether, diethylene glycol ethyl ether, diethylene glycol n-propyl ether, diethylene glycol Butyl ether, triethylene glycol methyl ether, triethylene glycol ethyl ether, propylene glycol methyl ether, propylene glycol ethyl ether, dipropylene glycol methyl ether, dipropylene glycol diethyl ether, dipropylene glycol n-propyl ether, dipropylene glycol n-butyl ether, Tripropylene glycol mono methyl ether, tripropylene glycol Monoethyl ether) (poly)alkylene glycol monoalkyl ether solvent; ethylene glycol methyl ether acetate, ethylene glycol ethyl ether acetate, propylene glycol methyl ether acetate, propylene glycol ethyl ether acetate, etc. Alkylene glycol monoalkyl ether acetate solvent; diglyme, diethylene glycol methyl ether, diethylene glycol diethyl ether, tetrahydrofuran and other ether solvents; methyl ethyl ketone, cyclohexanone, 2 a ketone solvent such as heptanone or 3-heptanone; an alkyl lactate solvent such as methyl 2-hydroxypropionate or ethyl 2-hydroxypropionate; methyl 2-hydroxy-2-methylpropionate; Ethyl 2-hydroxy-2-methylpropanoate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, 3-ethoxypropionic acid Ethyl ester, ethyl ethoxyacetate, ethyl hydroxyacetate, methyl 2-hydroxy-3-methylbutanoate, 3-methyl-3-methoxybutyl acetate, 3-methyl-3 -methoxybutyl propionate, ethyl acetate, n-propyl acetate, isopropyl acetate, n-butyl acetate, isobutyl acetate, n-amyl acetate, isoamyl acetate, n-butyl propionate, Ethyl butyrate, n-propyl butyrate, isopropyl butyrate, n-butyl butyrate, Other ester solvents such as methyl ketone, ethyl pyruvate, n-propyl pyruvate, methyl acetate, ethyl acetate, ethyl 2-oxybutyrate; aromatics such as toluene and xylene Group hydrocarbon solvent; carboxylic acid guanamine solvent such as N-methylpyrrolidone, N,N-dimethylformamide, N,N-dimethylacetamide. The above solvents may be used singly or in combination of plural kinds.

較佳地,用以製備該鹼可溶性樹脂(A-2)之溶劑係選自於丙二醇甲醚醋酸酯、3-乙氧基丙酸乙酯或環己酮。 Preferably, the solvent used to prepare the alkali-soluble resin (A-2) is selected from the group consisting of propylene glycol methyl ether acetate, ethyl 3-ethoxypropionate or cyclohexanone.

用以製備該鹼可溶性樹脂(A-2)之起始劑一般為自由基型聚合起始劑,且該起始劑可包含但不限於2,2’-偶氮雙異丁腈(2,2’-azobisisobutyronitrile)、2,2’-偶氮雙(2,4-二甲基戊腈) [2,2’-azobis-(2,4-dimethylvaleronitrile)]、2,2’-偶氮雙(4-甲氧基-2,4-二甲基戊腈)[2,2’-azobis-(4-methoxy-2,4-dimethylvalero nitrile)]、2,2’-偶氮雙-2-甲基丁腈(2,2’-azobis-2-methyl butyro nitrile)等之偶氮(azo)化合物;過氧化二苯甲醯(benzoylperoxide)等之過氧化合物。 The initiator for preparing the alkali-soluble resin (A-2) is generally a radical type polymerization initiator, and the initiator may include, but is not limited to, 2,2'-azobisisobutyronitrile (2, 2'-azobisisobutyronitrile), 2,2'-azobis(2,4-dimethylvaleronitrile) [2,2'-azobis-(2,4-dimethylvaleronitrile)], 2,2'-azobis(4-methoxy-2,4-dimethylvaleronitrile) [2,2'-azobis- (4-methoxy-2,4-dimethylvalero nitrile)], 2,2'-azobis-2-methylbutyronitrile (2,2'-azobis-2-methyl butyro nitrile), etc. a compound; a peroxy compound such as benzoylperoxide.

不飽和羧酸或不飽和羧酸酐化合物(a-2-1)Unsaturated carboxylic acid or unsaturated carboxylic anhydride compound (a-2-1)

不飽和羧酸或不飽和羧酸酐化合物(a-2-1)之構造並無特別限制。於本發明之具體例中,該不飽和羧酸或不飽和羧酸酐化合物(a-2-1)包括丙烯酸(AA)、甲基丙烯酸(MAA)、2-甲基丙烯醯乙氧基丁二酸酯(HOMS)、丁烯酸、α-氯丙烯酸、乙基丙烯酸、肉桂酸、馬來酸、馬來酸酐、富馬酸、衣康酸、衣康酸酐、檸康酸、檸康酸酐或上述之酸酐或其混合物。較佳地,不飽和羧酸或不飽和羧酸酐化合物(a-2-1)為丙烯酸、甲基丙烯酸、2-甲基丙烯醯乙氧基丁二酸酯或上述之酸酐或其混合物。 The structure of the unsaturated carboxylic acid or unsaturated carboxylic anhydride compound (a-2-1) is not particularly limited. In a specific example of the present invention, the unsaturated carboxylic acid or unsaturated carboxylic anhydride compound (a-2-1) comprises acrylic acid (AA), methacrylic acid (MAA), 2-methylpropenyl ethoxylated butyl Acid ester (HOMS), crotonic acid, α -chloroacrylic acid, ethacrylic acid, cinnamic acid, maleic acid, maleic anhydride, fumaric acid, itaconic acid, itaconic anhydride, citraconic acid, citraconic anhydride or The above anhydride or a mixture thereof. Preferably, the unsaturated carboxylic acid or unsaturated carboxylic anhydride compound (a-2-1) is acrylic acid, methacrylic acid, 2-methylpropenyl ethoxy succinate or the above anhydride or a mixture thereof.

基於所述鹼可溶性樹脂(A-2)之所述不飽和羧酸或不飽和羧酸酐化合物(a-2-1)、所述含脂環式碳氫基之不飽和化合物(a-2-2)及所述其它不飽和化合物(a-2-3)之合計量為100重量份,所述不飽和羧酸或不飽和羧酸酐化合物(a-2-1)之使用量範圍為20重量份至40重量份;較佳為23重量份至38重量份;更佳為25重量份至35重量份。 The unsaturated carboxylic acid or unsaturated carboxylic anhydride compound (a-2-1), the alicyclic hydrocarbon group-containing unsaturated compound (a-2-) based on the alkali-soluble resin (A-2) 2) and the total amount of the other unsaturated compound (a-2-3) is 100 parts by weight, and the unsaturated carboxylic acid or unsaturated carboxylic anhydride compound (a-2-1) is used in an amount of 20 parts by weight. The portion is 40 parts by weight; preferably 23 parts by weight to 38 parts by weight; more preferably 25 parts by weight to 35 parts by weight.

含脂環式碳氫基之不飽和化合物(a-2-2)Alicyclic compound containing an alicyclic hydrocarbon group (a-2-2)

含脂環式碳氫基之不飽和化合物(a-2-2)之構造並無特別限制,於本發明之具體例中,含脂環式碳氫基之不飽和化合物(a-2-2)是選自為具有雙環戊基之不飽和化合物、具有雙環戊烯基之不飽和化合物及其混合物所組成之群組。 The structure of the alicyclic hydrocarbon group-containing unsaturated compound (a-2-2) is not particularly limited, and in the specific example of the present invention, an alicyclic hydrocarbon group-containing unsaturated compound (a-2-2) It is selected from the group consisting of unsaturated compounds having a bicyclopentyl group, unsaturated compounds having a dicyclopentenyl group, and mixtures thereof.

於本發明之一具體例中,該具雙環戊基之不飽和化合物具有下式(aII-1)所示之結構: 其中:U1表示氫原子或甲烷基;及u表示為0至2之整數。 In one embodiment of the present invention, the dicyclopentyl group-unsaturated compound has a structure represented by the following formula (aII-1): Wherein: U 1 represents a hydrogen atom or a methyl group; and u represents an integer of 0 to 2.

另一方面,於本發明之一具體例中,該具雙環戊烯基之不飽和化合物具有下式(aII-2)所示之結構: 其中:U2表示氫原子或甲烷基;及v表示為0至2之整數。 On the other hand, in one embodiment of the present invention, the dicyclopentenyl unsaturated compound has a structure represented by the following formula (aII-2): Wherein: U 2 represents a hydrogen atom or a methyl group; and v represents an integer of 0 to 2.

於本發明之一較佳具體例中,含脂環式碳氫基之不飽和化合物(a-2-2)是選自由(甲基)丙烯酸雙環戊酯、(甲基)丙烯酸雙 環戊烯酯、(甲基)丙烯酸雙環戊氧基乙酯、(甲基)丙烯酸雙環戊烯氧基乙酯及其混合物所組成之群組。 In a preferred embodiment of the present invention, the alicyclic hydrocarbon group-containing unsaturated compound (a-2-2) is selected from the group consisting of dicyclopentanyl (meth)acrylate and (meth)acrylic acid. A group consisting of cyclopentenyl ester, dicyclopentyloxyethyl (meth)acrylate, dicyclopentenyloxyethyl (meth)acrylate, and mixtures thereof.

基於所述鹼可溶性樹脂(A-2)之所述不飽和羧酸或不飽和羧酸酐化合物(a-2-1)、所述含脂環式碳氫基之不飽和化合物(a-2-2)及所述其它不飽和化合物(a-2-3)之合計量為100重量份,所述含脂環式碳氫基之不飽和化合物(a-2-2)之使用量範圍為10重量份至50重量份;較佳為15重量份至45重量份;更佳為20重量份至40重量份。。 The unsaturated carboxylic acid or unsaturated carboxylic anhydride compound (a-2-1), the alicyclic hydrocarbon group-containing unsaturated compound (a-2-) based on the alkali-soluble resin (A-2) 2) and the total amount of the other unsaturated compound (a-2-3) is 100 parts by weight, and the alicyclic hydrocarbon group-containing unsaturated compound (a-2-2) is used in an amount of 10 parts by weight. The parts by weight to 50 parts by weight; preferably 15 parts by weight to 45 parts by weight; more preferably 20 parts by weight to 40 parts by weight. .

其它不飽和化合物(a-2-3)Other unsaturated compounds (a-2-3)

於本發明之一較佳具體例中,鹼可溶性樹脂(A-2)可包括其它不飽和化合物(a-2-3)。其它不飽和化合物(a-2-3)之具體例為苯乙烯、α-甲基苯乙烯、乙烯基甲苯、對氯苯乙烯、二乙烯基苯、苯甲基甲基丙烯酸酯、苯甲基丙烯酸酯、苯基甲基丙烯酸酯、苯基丙烯酸酯、2-硝基苯基丙烯酸酯、4-硝基苯基丙烯酸酯、2-硝基苯甲基丙烯酸酯、2-硝基苯甲基甲基丙烯酸酯、2-硝基苯基甲基丙烯酸酯、2-氯苯基甲基丙烯酸酯、4-氯苯基甲基丙烯酸酯、2-氯苯基丙烯酸酯、4-氯苯基丙烯酸酯、苯氧基乙基甲基丙烯酸酯、苯氧基聚乙二醇丙烯酸酯、苯氧基聚乙二醇甲基丙烯酸酯、壬基苯氧基聚乙二醇丙烯酸酯、壬基苯氧基聚乙二醇甲基丙烯酸酯、N-苯基馬來醯亞胺、N-鄰-羥基苯基馬來醯亞胺、N-間-羥基苯基馬來醯亞胺、N-對-羥基苯基馬來醯亞胺、N-鄰-甲基苯基馬來醯亞胺、 N-間-甲基苯基馬來醯亞胺、N-對-甲基苯基馬來醯亞胺、N-鄰-甲氧基苯基馬來醯亞胺、N-間-甲氧基苯基馬來醯亞胺、N-對-甲氧基苯基馬來醯亞胺、鄰-乙烯基苯酚、間-乙烯基苯酚、對-乙烯基苯酚、2-甲基-4-乙烯基苯酚、3-甲基-4-乙烯基苯酚、鄰-異丙烯基苯酚、間-異丙烯基苯酚、對-異丙烯基苯酚、2-乙烯基-1-萘酚、3-乙烯基-1-萘酚、1-乙烯基-2-萘酚、3-乙烯基-2-萘酚、2-異丙烯基-1-萘酚、3-異丙烯基-1-萘酚、鄰-甲氧基苯乙烯、間-甲氧基苯乙烯、對-甲氧基苯乙烯、鄰-甲氧基甲基苯乙烯、間-甲氧基甲基苯乙烯、對-甲氧基甲基苯乙烯、鄰-(乙烯基苯甲基)環氧丙基醚、間-(乙烯基苯甲基)環氧丙基醚、對-(乙烯基苯甲基)環氧丙基醚、茚、乙醯基萘、N-環己基馬來醯亞胺、丙烯酸甲酯(MA)、丙烯酸乙酯、丙烯酸正丙酯、丙烯酸異丙酯、丙烯酸正丁酯、丙烯酸異丁酯、丙烯酸第二丁酯、丙烯酸第三丁酯、丙烯酸2-羥基乙酯、丙烯酸2-羥基丙酯、丙烯酸3-羥基丙酯、丙烯酸2-羥基丁酯、丙烯酸3-羥基丁酯、丙烯酸4-羥基丁酯、丙烯酸烯丙酯、丙烯酸三乙二醇甲氧酯、N,N-二甲基胺基丙烯酸乙酯、N,N-二乙基胺基丙烯酸丙酯、N,N-二丁基胺基丙烯酸丙酯、丙烯酸環氧丙基酯、甲基丙烯酸甲酯(MMA)、甲基丙烯酸乙酯、甲基丙烯酸正丙酯、甲基丙烯酸異丙酯、甲基丙烯酸正丁酯、甲基丙烯酸異丁酯、甲基丙烯酸第二丁酯、甲基丙烯酸第三丁酯、甲基丙烯酸2-羥基乙酯、甲基丙烯酸2-羥基丙酯、甲基丙烯酸3-羥基丙酯、甲基丙烯酸2-羥基丁酯、甲基丙烯酸3-羥基丁酯、甲基丙烯酸4-羥基丁酯、甲基丙 烯酸烯丙酯、甲基丙烯酸三乙二醇甲氧酯、甲基丙烯酸十二烷基酯、甲基丙烯酸十四烷基酯、甲基丙烯酸十六烷基酯、甲基丙烯酸十八烷基酯、甲基丙烯酸二十烷基酯、甲基丙烯酸二十二烷基酯、甲基丙烯酸N,N-二甲基胺基乙酯、N,N-二甲基胺基甲基丙烯酸丙酯、N-異-丁基胺基甲基丙烯酸乙酯、甲基丙烯酸環氧丙基酯(GMA)、乙酸乙烯酯、丙酸乙烯酯、丁酸乙烯酯、乙烯基甲醚、乙烯基乙醚、烯丙基環氧丙基醚、甲代烯丙基環氧丙基醚(methallyl glycidyl ether)、丙烯腈、甲基丙烯腈、α-氯丙烯腈、氰化亞乙烯、丙烯醯胺、甲基丙烯醯胺、α-氯丙烯醯胺、N-羥乙基丙烯醯胺、N-羥乙基甲基丙烯醯胺、1,3-丁二烯、異戊烯、氯化丁二烯或其混合物;較佳地,該第三不飽和單體係為丙烯酸甲酯、丙烯酸乙酯、丙烯酸正丙酯、丙烯酸異丙酯、丙烯酸正丁酯、丙烯酸異丁酯、丙烯酸第二丁酯、丙烯酸第三丁酯、丙烯酸2-羥基乙酯、丙烯酸2-羥基丙酯、甲基丙烯酸甲酯、甲基丙烯酸乙酯、甲基丙烯酸正丙酯、甲基丙烯酸異丙酯、甲基丙烯酸正丁酯、甲基丙烯酸異丁酯、甲基丙烯酸第二丁酯、甲基丙烯酸第三丁酯、甲基丙烯酸2-羥基乙酯、甲基丙烯酸2-羥基丙酯、甲基丙烯酸環氧丙基酯、乙酸乙烯酯、丙烯腈、甲基丙烯腈、1,3-丁二烯、異戊烯或其混合物。較佳地,該第三不飽和單體係為苯乙烯、α-甲基苯乙烯、苯基甲基丙烯酸酯、苯基丙烯酸酯、N-苯基馬來醯亞胺(PMI)、N-鄰-羥基苯基馬來醯亞胺、N-間-羥基苯基馬來醯亞胺、N-對-羥基苯基馬來醯亞胺、甲基丙烯酸環氧丙基酯、甲基丙烯酸甲酯單體、丙烯 酸甲酯單體、甲基丙烯酸2-甲基環氧丙酯(MGMA)、甲基丙烯酸苯甲酯(BzMA)或其混合物。 In a preferred embodiment of the invention, the alkali-soluble resin (A-2) may include other unsaturated compounds (a-2-3). Specific examples of the other unsaturated compound (a-2-3) are styrene, α-methylstyrene, vinyltoluene, p-chlorostyrene, divinylbenzene, benzyl methacrylate, benzyl. Acrylate, phenyl methacrylate, phenyl acrylate, 2-nitrophenyl acrylate, 4-nitrophenyl acrylate, 2-nitrophenyl methacrylate, 2-nitrobenzyl Methacrylate, 2-nitrophenyl methacrylate, 2-chlorophenyl methacrylate, 4-chlorophenyl methacrylate, 2-chlorophenyl acrylate, 4-chlorophenyl acrylate Ester, phenoxyethyl methacrylate, phenoxy polyethylene glycol acrylate, phenoxy polyethylene glycol methacrylate, nonylphenoxy polyethylene glycol acrylate, nonyl phenoxy Polyethylene glycol methacrylate, N-phenyl maleimide, N-o-hydroxyphenyl maleimide, N-m-hydroxyphenyl maleimide, N-pair Hydroxyphenyl maleimide, N-o-methylphenyl maleimide, N-m-methylphenylmaleimide, N-p-methylphenylmaleimide, N-o-methoxyphenylmaleimide, N-m-methoxy Phenylmaleimide, N-p-methoxyphenylmaleimide, o-vinylphenol, m-vinylphenol, p-vinylphenol, 2-methyl-4-vinyl Phenol, 3-methyl-4-vinylphenol, o-isopropenylphenol, m-isopropenylphenol, p-isopropenylphenol, 2-vinyl-1-naphthol, 3-vinyl-1 -naphthol, 1-vinyl-2-naphthol, 3-vinyl-2-naphthol, 2-isopropenyl-1-naphthol, 3-isopropenyl-1-naphthol, o-methoxy Styrene, m-methoxystyrene, p-methoxystyrene, o-methoxymethylstyrene, m-methoxymethylstyrene, p-methoxymethylstyrene, O-(Vinylbenzyl)epoxypropyl ether, m-(vinylbenzyl)epoxypropyl ether, p-(vinylbenzyl)epoxypropyl ether, hydrazine, ethyl hydrazino Naphthalene, N-cyclohexylmaleimide, methyl acrylate (MA), ethyl acrylate, n-propyl acrylate, isopropyl acrylate, n-butyl acrylate, isobutyl acrylate, Second butyl acrylate, tert-butyl acrylate, 2-hydroxyethyl acrylate, 2-hydroxypropyl acrylate, 3-hydroxypropyl acrylate, 2-hydroxybutyl acrylate, 3-hydroxybutyl acrylate, acrylic acid 4- Hydroxybutyl ester, allyl acrylate, triethylene glycol methacrylate, ethyl N,N-dimethylaminoacrylate, N,N-diethyl propyl acrylate, N,N-dibutyl Propyl propyl acrylate, glycidyl acrylate, methyl methacrylate (MMA), ethyl methacrylate, n-propyl methacrylate, isopropyl methacrylate, n-butyl methacrylate, Isobutyl methacrylate, second butyl methacrylate, tert-butyl methacrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl methacrylate, 3-hydroxypropyl methacrylate, 2-hydroxybutyl methacrylate, 3-hydroxybutyl methacrylate, 4-hydroxybutyl methacrylate, methyl propyl Allyl olefinate, triethylene glycol methacrylate methacrylate, dodecyl methacrylate, tetradecyl methacrylate, cetyl methacrylate, octadecyl methacrylate Base ester, eicosyl methacrylate, behenyl methacrylate, N,N-dimethylaminoethyl methacrylate, N,N-dimethylamino methacrylate Ester, N-iso-butylaminoethyl methacrylate, glycidyl methacrylate (GMA), vinyl acetate, vinyl propionate, vinyl butyrate, vinyl methyl ether, vinyl ether , allylepoxypropyl ether, methallyl glycidyl ether, acrylonitrile, methacrylonitrile, alpha-chloroacrylonitrile, vinyl cyanide, acrylamide, A Acrylamide, α-chloropropenylamine, N-hydroxyethyl acrylamide, N-hydroxyethyl methacrylamide, 1,3-butadiene, isoamylene, chlorobutadiene or a mixture thereof; preferably, the third unsaturated single system is methyl acrylate, ethyl acrylate, n-propyl acrylate, isopropyl acrylate, n-butyl acrylate, isobutyl acrylate , second butyl acrylate, tert-butyl acrylate, 2-hydroxyethyl acrylate, 2-hydroxypropyl acrylate, methyl methacrylate, ethyl methacrylate, n-propyl methacrylate, methacrylic acid Propyl ester, n-butyl methacrylate, isobutyl methacrylate, second butyl methacrylate, third butyl methacrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl methacrylate , glycidyl methacrylate, vinyl acetate, acrylonitrile, methacrylonitrile, 1,3-butadiene, isoamylene or a mixture thereof. Preferably, the third unsaturated single system is styrene, α-methylstyrene, phenyl methacrylate, phenyl acrylate, N-phenyl maleimide (PMI), N- o-Hydroxyphenylmaleimide, N-m-hydroxyphenylmaleimide, N-p-hydroxyphenylmaleimide, glycidyl methacrylate, methacrylic acid Ester monomer, propylene A methyl ester monomer, 2-methylglycidyl methacrylate (MGMA), benzyl methacrylate (BzMA) or a mixture thereof.

基於所述鹼可溶性樹脂(A-2)之所述不飽和羧酸或不飽和羧酸酐化合物(a-2-1)、所述含脂環式碳氫基之不飽和化合物(a-2-2)及所述其它不飽和化合物(a-2-3)之合計量為100重量份,所述其它不飽和化合物(a-2-3)之使用量範圍為10重量份至70重量份;較佳為17重量份至62重量份;更佳為25重量份至55重量份。 The unsaturated carboxylic acid or unsaturated carboxylic anhydride compound (a-2-1), the alicyclic hydrocarbon group-containing unsaturated compound (a-2-) based on the alkali-soluble resin (A-2) 2) and the total amount of the other unsaturated compound (a-2-3) is 100 parts by weight, and the other unsaturated compound (a-2-3) is used in an amount ranging from 10 parts by weight to 70 parts by weight; It is preferably from 17 parts by weight to 62 parts by weight; more preferably from 25 parts by weight to 55 parts by weight.

上述鹼可溶性樹脂(A-2)藉由膠體滲透層析儀(Gel Permeation Chromatography;GPC)所測定之聚苯乙烯換算的重量平均分子量一般為3000至30000,較佳為5000至25000,更佳為7000至20000。 The polystyrene-equivalent weight average molecular weight of the above alkali-soluble resin (A-2) as measured by Gel Permeation Chromatography (GPC) is generally from 3,000 to 30,000, preferably from 5,000 to 25,000, more preferably 7000 to 20,000.

基於所述鹼可溶性樹脂(A)為100重量份,所述鹼可溶性樹脂(A-2)的使用量為5至95重量份,較佳為10重量份至90重量份,且更佳為15重量份至85重量份。當未使用鹼可溶性樹脂(A-2)時,該感光性樹脂組成物會有高精細度的圖案直線性不佳的問題。 The alkali-soluble resin (A-2) is used in an amount of 5 to 95 parts by weight, preferably 10 parts by weight to 90 parts by weight, based on 100 parts by weight of the alkali-soluble resin (A), and more preferably 15 parts by weight. Parts by weight to 85 parts by weight. When the alkali-soluble resin (A-2) is not used, the photosensitive resin composition has a problem that the high-definition pattern has poor linearity.

當鹼可溶性樹脂(A-2)的重量平均分子量不在3000至30000範圍時,該感光性樹脂組成物會有高精細度的圖案直線性不佳的問題。 When the weight average molecular weight of the alkali-soluble resin (A-2) is not in the range of 3,000 to 30,000, the photosensitive resin composition has a problem that the pattern linearity of high-definition is poor.

另外,鹼可溶性樹脂(A-1)與鹼可溶性樹脂(A-2)的使用量之重量比值範圍(A-1)/(A-2)為5/95至95/5。當重量比值範圍(A-1)/(A-2)未落入上述範圍內時,該感光性樹脂組成物會有逸氣性表現不佳及高精細度的圖案直線性不佳的問題。 Further, the weight ratio range (A-1) / (A-2) of the amount of the alkali-soluble resin (A-1) to the alkali-soluble resin (A-2) is 5/95 to 95/5. When the weight ratio range (A-1)/(A-2) does not fall within the above range, the photosensitive resin composition has a problem that the outgassing performance is poor and the high definition pattern linearity is poor.

乙烯性不飽和基之化合物(B)Ethylene unsaturated group compound (B)

乙烯性不飽和基之化合物(B)包括第一化合物(B-1)以及第二化合物(B-2)。 The ethylenically unsaturated group-containing compound (B) includes the first compound (B-1) and the second compound (B-2).

第一化合物(B-1)First compound (B-1)

第一化合物(B-1)可具有胺基甲酸酯基(urethane group)與至少7個丙烯醯基(acryloyl group)。較佳地,第一化合物(B-1)可具有胺基甲酸酯基與至少10個丙烯醯基。 The first compound (B-1) may have a urethane group and at least 7 acryloyl groups. Preferably, the first compound (B-1) may have a urethane group and at least 10 acryl groups.

第一化合物(B-1)之製備方法例如但不限於以多異氰酸酯化合物及多元醇化合物經縮合反應而製得,其中多異氰酸酯化合物及多元醇化合物中的至少一者具有丙烯醯基,且該多異氰酸酯化合物及多元醇化合物所含有的丙烯醯基的總數較佳至少為7個,且更佳為至少10個。 The preparation method of the first compound (B-1) is, for example but not limited to, a condensation reaction of a polyisocyanate compound and a polyol compound, wherein at least one of the polyisocyanate compound and the polyol compound has an acrylonitrile group, and the The total number of the acrylonitrile groups contained in the polyisocyanate compound and the polyol compound is preferably at least 7, and more preferably at least 10.

當第一化合物(B-1)具有胺基甲酸酯基及至少10個丙烯醯基時,所製得之感光性樹脂組成物的圖案平滑性更佳。 When the first compound (B-1) has a urethane group and at least 10 acryl groups, the resulting photosensitive resin composition has better pattern smoothness.

第一化合物(B-1)之具體例可為市售之商品,例如:日本合成化學工業股份有限公司製造之商品,且其型號可為UV1700B(重量平均分子量為2000且其具有10個丙烯醯基)、UV6300B(具有7個丙烯醯基)或UV7640B(具有7個丙烯醯基)等;日本化藥股份有限公司製造之商品,且其型號可為DPHA40H(重量平均分子量為7000且其具有10個丙烯醯基)或UX5001T(具有8 個丙烯醯基)等;根上工業股份有限公司製造之商品,且其型號可為UN3320HS(重量平均分子量為5000且其具有15個丙烯醯基)、UN904(重量平均分子量為4900且其具有10個丙烯醯基)、UN3320HC(重量平均分子量為1500且其具有10個丙烯醯基)等;或者新中村化學公司製造之商品,且其型號可為U15HA(重量平均分子量為2000且其具有15個丙烯醯基)、UA-33H(具有9個丙烯醯基)或UA-53H(具有15個丙烯醯基)等。 Specific examples of the first compound (B-1) may be commercially available products, for example, those manufactured by Nippon Synthetic Chemical Co., Ltd., and may be of a type of UV1700B (weight average molecular weight of 2000 and having 10 propylene oximes). Base), UV6300B (having 7 propylene fluorenyl groups) or UV7640B (having 7 propylene fluorenyl groups), etc.; manufactured by Nippon Kayaku Co., Ltd., and its model can be DPHA40H (weight average molecular weight is 7000 and it has 10 Acryl sulfhydryl) or UX5001T (with 8 A propylene sulfhydryl group; etc.; a product manufactured by Gensei Industrial Co., Ltd., and its model number can be UN3320HS (weight average molecular weight is 5000 and it has 15 propylene sulfhydryl groups), UN904 (weight average molecular weight is 4900 and it has 10 Acrylsulfonyl), UN3320HC (weight average molecular weight of 1500 and having 10 propylene fluorenyl groups), etc.; or a product manufactured by Shin-Nakamura Chemical Co., Ltd., and its model may be U15HA (weight average molecular weight 2000 and 15 propylene) Sulfhydryl), UA-33H (having 9 propylene groups) or UA-53H (having 15 propylene groups).

第一化合物(B-1)可單獨一種使用或混合複數種使用。 The first compound (B-1) can be used singly or in combination of plural kinds.

較佳地,前述之第一化合物(B-1)可為UV6300B、UX5001T、DPHA40H、UN3320HS、U15HA或上述市售商品之任意組合。 Preferably, the aforementioned first compound (B-1) may be UV6300B, UX5001T, DPHA40H, UN3320HS, U15HA or any combination of the above-mentioned commercially available products.

基於鹼可溶性樹脂(A)之總使用量為100重量份,第一化合物(B-1)之使用量為可為5重量份至100重量份,較佳可為10重量份至95重量份,且更佳可為15重量份至90重量份。 The first compound (B-1) may be used in an amount of 5 parts by weight to 100 parts by weight, preferably 10 parts by weight to 95 parts by weight, based on 100 parts by weight of the total amount of the alkali-soluble resin (A). More preferably, it may be 15 parts by weight to 90 parts by weight.

當本發明之乙烯性不飽和基之化合物(B)包含第一化合物(B-1)時,所製得之感光性樹脂組成物的圖案平滑性較佳。 When the compound (B) of the ethylenically unsaturated group of the present invention contains the first compound (B-1), the photosensitive resin composition obtained has a good pattern smoothness.

第二化合物(B-2)Second compound (B-2)

第二化合物(B-2)之具體例可包含二醇二丙烯酸酯、乙二醇二甲基丙烯酸酯、1,4-丁二醇二丙烯酸酯、1,4-丁二醇二甲基丙烯酸酯、1,6-己二醇二丙烯酸酯、1,6-己二醇二甲基丙烯酸酯、1,9-壬二醇二丙烯酸酯、1,9-壬二醇二甲基丙烯酸酯、二(甲基)丙烯酸 二環戊烯酯、三乙二醇二(甲基)丙烯酸酯、四乙二醇二(甲基)丙烯酸酯、三(2-羥基乙基)異氰酸二(甲基)丙烯酸酯、三(2-羥基乙基)異氰酸三(甲基)丙烯酸酯、己內酯改質的三(2-羥基乙基)異氰酸三(甲基)丙烯酸酯、三(甲基)丙烯酸三羥甲基丙酯、經環氧乙烷(簡稱EO)改質的三(甲基)丙烯酸三羥甲基丙酯、經環氧丙烷(簡稱PO)改質的三(甲基)丙烯酸三羥甲基丙酯、三丙二醇二(甲基)丙烯酸酯、新戊二醇二(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、季戊四醇四(甲基)丙烯酸酯、聚酯二(甲基)丙烯酸酯、聚乙二醇二(甲基)丙烯酸酯、二季戊四醇六(甲基)丙烯酸酯、二季戊四醇五(甲基)丙烯酸酯、二季戊四醇四(甲基)丙烯酸酯、經己內酯改質的二季戊四醇六(甲基)丙烯酸酯、經己內酯改質的二季戊四醇五(甲基)丙烯酸酯、四(甲基)丙烯酸二三羥甲基丙酯[di(trimethylolpropyl)tetra(meth)acrylate]、經EO改質的雙酚A二(甲基)丙烯酸酯、經PO改質的雙酚A二(甲基)丙烯酸酯、經EO改質的氫化雙酚A二(甲基)丙烯酸酯、經PO改質的氫化雙酚A二(甲基)丙烯酸酯、經PO改質的甘油三(甲基)丙烯酸酯、經EO改質的雙酚F二(甲基)丙烯酸酯、酚醛清漆聚縮水甘油醚(甲基)丙烯酸酯,或上述化合物之任意組合。 Specific examples of the second compound (B-2) may include diol diacrylate, ethylene glycol dimethacrylate, 1,4-butanediol diacrylate, and 1,4-butanediol dimethacrylate. Ester, 1,6-hexanediol diacrylate, 1,6-hexanediol dimethacrylate, 1,9-nonanediol diacrylate, 1,9-nonanediol dimethacrylate, Di(meth)acrylic acid Dicyclopentenyl ester, triethylene glycol di(meth) acrylate, tetraethylene glycol di(meth) acrylate, tris(2-hydroxyethyl)isocyanate di(meth) acrylate, three (2-hydroxyethyl) isocyanate tri(meth)acrylate, caprolactone modified tris(2-hydroxyethyl)isocyanate tri(meth)acrylate, tris(meth)acrylic acid Hydroxymethyl propyl ester, trimethylolpropyl tris(meth)acrylate modified with ethylene oxide (EO), tris(meth)acrylic acid modified with propylene oxide (PO) Methyl propyl ester, tripropylene glycol di(meth) acrylate, neopentyl glycol di (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, polyester di (a) Acrylate, polyethylene glycol di(meth)acrylate, dipentaerythritol hexa(meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol tetra(meth) acrylate, Ester-modified dipentaerythritol hexa(meth) acrylate, caprolactone-modified dipentaerythritol penta (meth) acrylate, di(trimethylolpropyl) tet tetrakis(meth)acrylate Ra(meth)acrylate], EO modified bisphenol A di(meth)acrylate, PO modified bisphenol A di(meth)acrylate, EO modified hydrogenated bisphenol A II Methyl) acrylate, PO modified hydrogenated bisphenol A di(meth) acrylate, PO modified glycerol tri(meth) acrylate, EO modified bisphenol F di(methyl) Acrylate, novolak polyglycidyl ether (meth) acrylate, or any combination of the above.

第二化合物(B-2)可單獨一種使用或混合複數種使用。 The second compound (B-2) can be used singly or in combination of plural kinds.

較佳地,第二化合物(B-2)可為經己內酯改質的二季戊四醇六(甲基)丙烯酸酯、經環氧乙烷(簡稱EO)改質的三(甲基)丙烯酸三羥甲基丙酯、二季戊四醇六(甲基)丙烯酸酯、二季戊四醇五(甲 基)丙烯酸酯、二季戊四醇四(甲基)丙烯酸酯或上述化合物之任意組合。 Preferably, the second compound (B-2) may be dipentaerythritol hexa(meth) acrylate modified by caprolactone, tris(meth) acrylate modified by ethylene oxide (EO). Hydroxymethyl propyl ester, dipentaerythritol hexa(meth) acrylate, dipentaerythritol five (a Acrylate, dipentaerythritol tetra(meth)acrylate or any combination of the above.

基於鹼可溶性樹脂(A)之總使用量為100重量份,第二化合物(B-2)之使用量為可為15重量份至100重量份,較佳可為20重量份至95重量份,且更佳可為25重量份至90重量份。 The second compound (B-2) may be used in an amount of 15 parts by weight to 100 parts by weight, preferably 20 parts by weight to 95 parts by weight, based on 100 parts by weight of the total amount of the alkali-soluble resin (A). More preferably, it may be 25 parts by weight to 90 parts by weight.

另外,基於鹼可溶性樹脂(A)之總使用量為100重量份時,具有乙烯性不飽和基之化合物(B)之使用量可為20重量份至200重量份,較佳可為30重量份至190重量份,且更佳可為40重量份至180重量份。 Further, when the total amount of the alkali-soluble resin (A) used is 100 parts by weight, the compound (B) having an ethylenically unsaturated group may be used in an amount of 20 parts by weight to 200 parts by weight, preferably 30 parts by weight. It is up to 190 parts by weight, and more preferably 40 parts by weight to 180 parts by weight.

光起始劑(C)Photoinitiator (C)

光起始劑(C)包括光起始劑(C-1)以及其它光起始劑(C-2)。 The photoinitiator (C) includes a photoinitiator (C-1) and other photoinitiators (C-2).

光起始劑(C-1)Photoinitiator (C-1)

光起始劑(C)包括由式(1)表示的光起始劑(C-1)。 The photoinitiator (C) includes a photoinitiator (C-1) represented by the formula (1).

其中R1、R2、R3、R4、R5、R6、R7及R8彼此獨立地為氫、C1-C20烷基、COR16、OR17、鹵素、NO2、由式(2)所表示的基團或是由式(3)所表示的基團、 或R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8彼此獨立地為經由式(4)所表示的基團取代之C2-C10烯基、 或R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8彼此獨立地共同為-(CH2)p-Y-(CH2)q-;或R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8彼此獨立地共同為式(5)所表示的基團; 但條件為R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8中之至少一對是由式(5)所表示的基團, R9、R10、R11及R12彼此獨立地為氫、C1-C20烷基,該C1-C20烷基是未經取代或經一或多個以下基團取代:鹵素、苯基、CN、OH、SH、C1-C4-烷氧基、-(CO)OH或-(CO)O-(C1-C4烷基);或R9、R10、R11及R12彼此獨立地為未經取代之苯基或經一或多個以下基團取代之苯基:C1-C6烷基、鹵素、CN、OR17、SR18或NR19R20;或R9、R10、R11及R12彼此獨立地為鹵素、CN、OR17、SR18、SOR18、SO2R18或NR19R20,其中該等取代基OR17、SR18或NR19R20視情況經由該等基團R17、R18、R19及/或R20與萘基環中一個碳原子形成5員或6員環;或R9、R10、R11及R12彼此獨立地為COR16、NO2或式(2)所表示的基團、 Y 表示O、S、NR26或直接鍵;p 表示0、1、2或3之整數;q 表示1、2或3之整數;X 表示CO或直接鍵;R13表示C1-C20烷基,其未經取代或經一或多個以下基團取代:鹵素、R17、COOR17、OR17、SR18、CONR19R20、NR19R20、PO(OCkH2k+1)2或是式(6)所表示的基團; 或R13表示C2-C20烷基,其間雜有一或多個O、S、SO、SO2、NR26或CO,或是C2-C12烯基,其未經間雜或間雜有一或多個O、CO或NR26,其中該經間雜之C2-C20烷基及該未經間雜或經間雜之C2-C12烯基是未經取代或經一或多個鹵素取代;或R13表示C4-C8環烯基、C2-C12炔基或未經間雜或間雜有一或多個O、S、CO或NR26之C3-C10環烷基;或R13表示苯基或萘基,其各為未經取代或經一或多個以下基團取代:OR17、SR18、NR19R20、COR16、CN、NO2、鹵素、C1-C20烷基、C1-C4鹵代烷基、間雜有一或多個O、S、CO或NR26之C2-C20烷基、或式(7)表示的基團、 或其各經C3-C10環烷基或間雜有一或多個O、S、CO或NR26之C3-C10環烷基取代;k表示1至10之整數;R14表示氫、C3-C8環烷基、C2-C5烯基、C1-C20烷氧基或C1-C20烷基,其是未經取代或經一或多個以下基團取代:鹵素、苯基、C1-C20烷基苯基或CN;或R14表示苯基或萘基,其各未經取代或經一或多個以下基團取代:C1-C6烷基、C1-C4鹵代烷基、鹵素、CN、OR17、SR18及 /或NR19R20;或R14表示C3-C20雜芳基、C1-C8烷氧基、苄氧基或苯氧基,該芾氧基及苯氧基是未經取代或經一或多個以下基團取代:C1-C6烷基、C1-C4鹵代烷基及/或鹵素;R15是C6-C20芳基或C3-C20雜芳基,其各是未經取代或經一或多個以下基團取代:苯基、鹵素、C1-C4鹵代烷基、CN、NO2、OR17、SR18、NR19R20、PO(OCkH2k+1)2、SO-C1-C10烷基、SO2-C1-C10烷基、間雜有一或多個O、S或NR26之C2-C20烷基;或其各經C1-C20烷基取代,該C1-C20烷基是未經取代或經一或多個以下基團取代:鹵素、COOR17、CONR19R20、苯基、C3-C8環烷基、C3-C20雜芳基、C6-C20芳氧基羰基、C3-C20雜芳氧基羰基、OR17、SR18或NR19R20;或R15表示氫、C2-C12烯基、未經間雜或間雜有一或多個O、CO或NR26之C3-C8環烷基;或R15是C1-C20烷基,其是未經取代或經一或多個以下基團取代:鹵素、OR17、SR18、C3-C8環烷基、C3-C20雜芳基、C6-C20芳氧基羰基、C3-C20雜芳氧基羰基、NR19R20、COOR17、CONR19R20、PO(OCkH2k+1)2、苯基、式(6)所表示的基團或式(8)所表示的基團、;或該C1-C20烷基是經苯基取代,該苯基是經鹵素、C1-C20烷基、C1-C4鹵代烷基、OR17、SR18或NR19R20取代;或R15表示C2-C20烷基,其間雜有一或多個O、SO或SO2, 且該經間雜之C2-C20烷基是未經取代或經一或多個以下基團取代:鹵素、OR17、COOR17、CONR19R20、苯基或經OR17、SR18或NR19R20取代之苯基;或R15表示C2-C20烷醯基或苯甲醯基,其是未經取代或經一或多個以下基團取代:C1-C6烷基、鹵素、苯基、OR17、SR18或NR19R20;或R15是未經取代或經一或多個OR17取代之萘甲醯基或是C3-C14雜芳基羰基;或R15表示C2-C12烷氧基羰基,其是未經間雜或間雜有一或多個O且該經間雜或未經間雜之C2-C12烷氧基羰基是未經取代或經一或多個羥基取代;或R15表示苯氧基羰基,其是未經取代或經一或多個以下基團取代:C1-C6烷基、鹵素、C1-C4鹵代烷基、苯基、OR17、SR18或NR19R20;或R15表示CN、CONR19R20、NO2、C1-C4鹵代烷基、S(O)m-C1-C6烷基、未經取代或經C1-C12烷基或SO2-C1-C6烷基取代之S(O)m-苯基;或R15表示SO2O-苯基,其是未經取代或經C1-C12烷基取代;或是二苯基膦醯基或二-(C1-C4烷氧基)-膦醯基;m表示1或2;R'14具有針對R14所給出含義中之一者;R'15具有針對R15所給出含義中之一者;X1表示O、S、SO或SO2; X2表示O、CO、S或直接鍵;R16表示C6-C20芳基或C3-C20雜芳基,其各是未經取代或經一或多個以下基團取代:苯基、鹵素、C1-C4鹵代烷基、CN、NO2、OR17、SR18、NR19R20或間雜有一或多個O、S或NR26之C1-C20烷基;或其各經一或多個C1-C20烷基取代,該C1-C20烷基是未經取代或經一或多個以下基團取代:鹵素、COOR17、CONR19R20、苯基、C3-C8環烷基、C3-C20雜芳基、C6-C20芳氧基羰基、C3-C20雜芳氧基羰基、OR17、SR18或NR19R20;或R16表示氫、C1-C20烷基,該C1-C20烷基是未經取代或經一或多個以下基團取代:鹵素、苯基、OH、SH、CN、C3-C6烯氧基、OCH2CH2CN、OCH2CH2(CO)O(C1-C4)烷基、O(CO)-(C1-C4烷基)、O(CO)-苯基、(CO)OH或(CO)O(C1-C4烷基);或R16表示C2-C12烷基,其間雜有一或多個O、S或NR26;或R16表示(CH2CH2O)n+1H、(CH2CH2O)n(CO)-(C1-C8烷基)、C2-C12烯基或C3-C8環烷基;或R16表示經SR18取代之苯基,其中該基團R18表示鍵結至該COR16基團所附接之該咔唑部分之該苯基或萘基環的直接鍵;n表示1至20;R17表示氫、苯基-C1-C3烷基、C1-C20烷基,其是未經取代或經一或多個以下基團取代:鹵素、OH、SH、CN、C3-C6烯氧基、OCH2CH2CN、OCH2CH2(CO)O(C1-C4烷基)、O(CO)-(C1-C4烷基)、O(CO)-(C2-C4)烯基、O(CO)-苯基、(CO)OH、(CO)O(C1-C4烷基)、 C3-C20環烷基、SO2-(C1-C4鹵代烷基)、O(C1-C4鹵代烷基)或間雜有一或多個O之C3-C20環烷基;或R17表示C2-C20烷基,其間雜有一或多個O、S或NR26;或R17表示(CH2CH2O)n+1H、(CH2CH2O)n(CO)-(C1-C8烷基)、C1-C8烷醯基、C2-C12烯基、C3-C6烯醯基或未經間雜或間雜有一或多個O、S、CO或NR26之C3-C20環烷基;或R17表示C1-C8烷基-C3-C10環烷基,其是未經間雜或間雜有一或多個O;或R17表示苯甲醯基,其是未經取代或經一或多個C1-C6烷基、鹵素、OH或C1-C3烷氧基取代;或R17表示苯基、萘基或C3-C20雜芳基,其各是未經取代或經一或多個以下基團取代:鹵素、OH、C1-C12烷基、C1-C12烷氧基、CN、NO2、苯基-C1-C3烷氧基、苯氧基、C1-C12烷基硫基、苯基硫基、N(C1-C12烷基)2、二苯基-胺基或式(7)所表示的基團; 或R17形成鍵結至該具有由式(2)所表示的基團、或是式(7)所表示的基團所處之苯基或萘基環之其中一個碳原子的直接鍵、 R18表示氫、C2-C12烯基、C3-C20環烷基或苯基-C1-C3烷基, 其中該C2-C12烯基、C3-C20環烷基或苯基-C1-C3烷基是未經間雜或間雜有一或多個O、S、CO、NR26或COOR17;或R18是C1-C20烷基,其是未經取代或經一或多個以下基團取代:OH、SH、CN、C3-C6烯氧基、OCH2CH2CN、OCH2CH2(CO)O(C1-C4烷基)、O(CO)-(C2-C4)烯基、O(CO)-(C1-C4烷基)、O(CO)-苯基或(CO)OR17;或R18表示C2-C20烷基,其間雜有一或多個O、S、CO、NR26或COOR17;或R18表示(CH2CH2O)nH、(CH2CH2O)n(CO)-(C1-C8烷基)、C2-C8烷醯基或C3-C6烯醯基;或R18表示苯甲醯基,其是未經取代或經一或多個以下基團取代:C1-C6烷基、鹵素、OH、C1-C4烷氧基或C1-C4烷基硫基;或R18表示苯基、萘基或C3-C20雜芳基,其各是未經取代或經一或多個以下基團取代:鹵素、C1-C12烷基、C1-C4鹵代烷基、C1-C12烷氧基、CN、NO2、苯基-C1-C3烷氧基、苯氧基、C1-C12烷基硫基、苯基硫基、N(C1-C12烷基)2、二苯基胺基、(CO)O(C1-C8烷基)、(CO)-C1-C8烷基、(CO)N(C1-C8烷基)2或式(7)所表示的基團、 R19及R20彼此獨立地為氫、C1-C20烷基、C2-C4羥基烷基、C2-C10烷氧基烷基、C2-C5烯基、C3-C20環烷基、苯基-C1-C3烷基、C1-C8烷醯基、C1-C8烷醯基氧基、C3-C12烯醯基、SO2-(C1-C4鹵代烷基)或苯甲醯基; 或R19及R20表示苯基、萘基或C3-C20雜芳基,其各是未經取代或經一或多個以下基團取代:鹵素、C1-C4鹵代烷基、C1-C20烷氧基、C1-C12烷基、苯甲醯基或C1-C12烷氧基;或R19及R20與其所附接之N原子一起形成未經間雜或間雜有O、S或NR17之5員或6員飽和或不飽和環,且該5員或6員飽和或不飽和環是未經取代或經一或多個以下基團取代:C1-C20烷基、C1-C20烷氧基、=O、OR17、SR18、NR21R22、(CO)R23、NO2、鹵素、C1-C4-鹵代烷基、CN、苯基、未經間雜或間雜有一或多個O、S、CO或NR17之C3-C20環烷基、或式(7)表示的基團、 或R19及R20與其所附接之N原子一起形成雜芳香族環系統,該環系統是未經取代或經一或多個以下基團取代:C1-C20烷基、C1-C4鹵代烷基、C1-C20烷氧基、=O、OR17、SR18、NR21R22、(CO)R23、鹵素、NO2、CN、苯基或未經間雜或間雜有一或多個O、S、CO或NR17之C3-C20環烷基、或式(7)表示的基團、 R21及R22彼此獨立地為氫、C1-C20烷基、C1-C4鹵代烷基、C3-C10環烷基或苯基;或R21及R22與其所附接之N原子一起形成未經間雜或間雜有O、S或NR26之5員或6員飽和或不飽和環,且該5員或6員 飽和或不飽和環是未稠合或該5員或6員飽和或不飽和環與苯環稠合;R23表示氫、OH、C1-C20烷基、C1-C4鹵代烷基、間雜有一或多個O、CO或NR26之C2-C20烷基、未經間雜或間雜有O、S、CO或NR26之C3-C20環烷基,或R23表示苯基、萘基、苯基-C1-C4烷基、OR17、SR18或NR21R22;R24表示(CO)OR17、CONR19R20、(CO)R17;或R24具有針對R19及R20所給出含義中之一者;R25表示COOR17、CONR19R20、(CO)R17;或R25具有針對R17所給出含義中之一者;R26表示氫、C1-C20烷基、C1-C4鹵代烷基、C2-C20烷基,其間雜有一或多個O或CO;或是苯基-C1-C4烷基、C3-C8環烷基,其是未經間雜或間雜有一或多個O或CO;或是(CO)R19;或是苯基,其是未經取代或經一或多個以下基團取代:C1-C20烷基、鹵素、C1-C4鹵代烷基、OR17、SR18、NR19R20或式(7)表示的基團; 但條件為在該分子中存在至少一個式(2)或是式(7)所表示的基團 Wherein R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 and R 8 are each independently hydrogen, C 1 -C 20 alkyl, COR 16 , OR 17 , halogen, NO 2 , The group represented by the formula (2) is a group represented by the formula (3), Or R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 are each independently a group represented by the formula (4). Substituted C 2 -C 10 alkenyl, Or R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 are each independently taken as -(CH 2 ) p -Y- (CH 2 ) q -; or R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 are independently of the formula ( 5) the group represented; However, the condition is that at least one of R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 is represented by the formula (5) The group represented, R 9 , R 10 , R 11 and R 12 are each independently hydrogen, C 1 -C 20 alkyl, the C 1 -C 20 alkyl group being unsubstituted or via one or more of the following groups Group substitution: halogen, phenyl, CN, OH, SH, C 1 -C 4 -alkoxy, -(CO)OH or -(CO)O-(C 1 -C 4 alkyl); or R 9 , R 10 , R 11 and R 12 are, independently of each other, an unsubstituted phenyl group or a phenyl group substituted with one or more of the following groups: C 1 -C 6 alkyl, halogen, CN, OR 17 , SR 18 or NR 19 R 20 ; or R 9 , R 10 , R 11 and R 12 are each independently halogen, CN, OR 17 , SR 18 , SOR 18 , SO 2 R 18 or NR 19 R 20 , wherein the substituents OR 17 , SR 18 or NR 19 R 20 optionally forms a 5- or 6-membered ring with one of the carbon atoms in the naphthyl ring via the groups R 17 , R 18 , R 19 and/or R 20 ; or R 9 , R 10 , R 11 and R 12 are each independently a group represented by COR 16 , NO 2 or formula (2), Y represents O, S, NR 26 or a direct bond; p represents an integer of 0, 1, 2 or 3; q represents an integer of 1, 2 or 3; X represents CO or a direct bond; and R 13 represents a C 1 - C 20 alkane a group which is unsubstituted or substituted with one or more of the following groups: halogen, R 17 , COOR 17 , OR 17 , SR 18 , CONR 19 R 20 , NR 19 R 20 , PO(OC k H 2k+1 ) 2 or a group represented by the formula (6); Or R 13 represents a C 2 -C 20 alkyl group, interspersed with one or more of O, S, SO, SO 2 , NR 26 or CO, or a C 2 -C 12 alkenyl group, which has no inter a plurality of O, CO or NR 26 , wherein the inter-hetero C 2 -C 20 alkyl group and the unmeta- or inter-hetero C 2 -C 12 alkenyl group are unsubstituted or substituted with one or more halogens; Or R 13 represents a C 4 -C 8 cycloalkenyl group, a C 2 -C 12 alkynyl group or a C 3 -C 10 cycloalkyl group having one or more O, S, CO or NR 26 without inter or hetero-hetero; or R 13 represents a phenyl or naphthyl group, each of which is unsubstituted or substituted with one or more of the following groups: OR 17 , SR 18 , NR 19 R 20 , COR 16 , CN, NO 2 , halogen, C 1 -C a 20 alkyl group, a C 1 -C 4 haloalkyl group, a heterocyclic one or more C 2 -C 20 alkyl groups of O, S, CO or NR 26 , or a group represented by the formula (7), Each warp or C 3 -C 10 cycloalkyl, or interrupted by one or more O, S, CO or NR 26 of the C 3 -C 10 cycloalkyl; K represents an integer of from 1 to 10; R 14 represents hydrogen, C 3 -C 8 cycloalkyl, C 2 -C 5 alkenyl, C 1 -C 20 alkoxy or C 1 -C 20 alkyl, which is unsubstituted or substituted with one or more of the following groups: Halogen, phenyl, C 1 -C 20 alkylphenyl or CN; or R 14 represents phenyl or naphthyl, each unsubstituted or substituted by one or more of the following groups: C 1 -C 6 alkyl , C 1 -C 4 haloalkyl, halogen, CN, OR 17 , SR 18 and/or NR 19 R 20 ; or R 14 represents C 3 -C 20 heteroaryl, C 1 -C 8 alkoxy, benzyloxy Or a phenoxy group, which is unsubstituted or substituted with one or more of the following groups: C 1 -C 6 alkyl, C 1 -C 4 haloalkyl and/or halogen; R 15 is C 6 -C 20 aryl or C 3 -C 20 heteroaryl, each of which is unsubstituted or substituted with one or more of the following groups: phenyl, halo, C 1 -C 4 haloalkyl, CN , NO 2 , OR 17 , SR 18 , NR 19 R 20 , PO(OC k H 2k+1 ) 2 , SO-C 1 -C 10 alkyl, SO 2 -C 1 -C 10 alkyl, interstitial or Multiple O, S or NR The 2 -C 20 C 26 alkyl group; or each warp substituted C 1 -C 20 alkyl, C 1 -C 20 alkyl which is unsubstituted or substituted with one or more of the following radicals: halogen, COOR 17 , CONR 19 R 20 , phenyl, C 3 -C 8 cycloalkyl, C 3 -C 20 heteroaryl, C 6 -C 20 aryloxycarbonyl, C 3 -C 20 heteroaryloxycarbonyl, OR 17 , SR 18 or NR 19 R 20 ; or R 15 represents hydrogen, C 2 -C 12 alkenyl, C 3 -C 8 cycloalkyl having no or hetero or one or more O, CO or NR 26 ; or R 15 is a C 1 -C 20 alkyl group which is unsubstituted or substituted with one or more of the following groups: halogen, OR 17 , SR 18 , C 3 -C 8 cycloalkyl, C 3 -C 20 heteroaryl a C 6 -C 20 aryloxycarbonyl group, a C 3 -C 20 heteroaryloxycarbonyl group, NR 19 R 20 , COOR 17 , CONR 19 R 20 , PO(OC k H 2k+1 ) 2 , phenyl, a group represented by the formula (6) or a group represented by the formula (8), Or the C 1 -C 20 alkyl group is substituted by a phenyl group which is substituted by halogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, OR 17 , SR 18 or NR 19 R 20 Or R 15 represents a C 2 -C 20 alkyl group in which one or more O, SO or SO 2 are heterogeneous, and the interstitial C 2 -C 20 alkyl group is unsubstituted or has one or more of the following groups Group substitution: halogen, OR 17 , COOR 17 , CONR 19 R 20 , phenyl or phenyl substituted by OR 17 , SR 18 or NR 19 R 20 ; or R 15 represents C 2 -C 20 alkanoyl or benzoyl A thiol group which is unsubstituted or substituted with one or more of the following groups: C 1 -C 6 alkyl, halogen, phenyl, OR 17 , SR 18 or NR 19 R 20 ; or R 15 is unsubstituted Or a naphthylmethyl group substituted by one or more OR 17 or a C 3 -C 14 heteroarylcarbonyl group; or R 15 represents a C 2 -C 12 alkoxycarbonyl group which is unintercalated or heterozygous one or more And the interstitial or unintercalated C 2 -C 12 alkoxycarbonyl group is unsubstituted or substituted with one or more hydroxyl groups; or R 15 represents a phenoxycarbonyl group which is unsubstituted or passed through a or more of the following groups: C 1 -C 6 alkyl, halogen, C 1 -C 4 haloalkoxy , Phenyl, OR 17, SR 18 or NR 19 R 20; or R 15 represents CN, CONR 19 R 20, NO 2, C 1 -C 4 haloalkyl, S (O) m -C 1 -C 6 alkyl , S(O) m -phenyl which is unsubstituted or substituted by C 1 -C 12 alkyl or SO 2 -C 1 -C 6 alkyl; or R 15 represents SO 2 O-phenyl, which is not Substituted or substituted by C 1 -C 12 alkyl; or diphenylphosphonium or di-(C 1 -C 4 alkoxy)-phosphonium; m represents 1 or 2; R' 14 has One of the meanings given by 14 ; R' 15 has one of the meanings given for R 15 ; X 1 represents O, S, SO or SO 2 ; X 2 represents O, CO, S or a direct bond; R 16 represents a C 6 -C 20 aryl group or a C 3 -C 20 heteroaryl group, each of which is unsubstituted or substituted with one or more of the following groups: phenyl, halogen, C 1 -C 4 haloalkyl, CN, NO 2 , OR 17 , SR 18 , NR 19 R 20 or a heterocyclic one or more C 1 -C 20 alkyl groups of O, S or NR 26 ; or each of one or more C 1 -C 20 alkanes Substituted, the C 1 -C 20 alkyl group is unsubstituted or substituted with one or more of the following groups: halogen, COOR 17 , CONR 19 R 20 , phenyl, C 3 -C 8 cycloalkyl, C 3 -C 20 heteroaryl, C 6 -C 20 aryloxycarbonyl, C 3 -C 20 heteroaryloxycarbonyl, OR 17 , SR 18 or NR 19 R 20 ; or R 16 represents hydrogen, C 1 -C 20 alkyl, the C 1 -C 20 alkyl group Is unsubstituted or substituted with one or more of the following groups: halogen, phenyl, OH, SH, CN, C 3 -C 6 alkenoxy, OCH 2 CH 2 CN, OCH 2 CH 2 (CO)O ( C 1 -C 4 )alkyl, O(CO)-(C 1 -C 4 alkyl), O(CO)-phenyl, (CO)OH or (CO)O(C 1 -C 4 alkyl) Or R 16 represents a C 2 -C 12 alkyl group with one or more O, S or NR 26 in between ; or R 16 represents (CH 2 CH 2 O) n+1 H, (CH 2 CH 2 O) n (CO)-(C 1 -C 8 alkyl), C 2 -C 12 alkenyl or C 3 -C 8 cycloalkyl; or R 16 represents a phenyl substituted with SR 18 wherein the group R 18 represents Bonding to the direct bond of the phenyl or naphthyl ring of the oxazole moiety to which the COR 16 group is attached; n represents 1 to 20; R 17 represents hydrogen, phenyl-C 1 -C 3 alkyl, C 1 -C 20 alkyl, which is unsubstituted or substituted with one or more of the following groups: halogen, OH, SH, CN, C 3 -C 6 alkenyloxy, OCH 2 CH 2 CN, OCH 2 CH 2 (CO)O(C 1 -C 4 alkyl), O(CO)-(C 1 -C 4 alkyl), O(CO)-(C 2 -C 4 )alkenyl, O(CO)- Phenyl, ( CO)OH, (CO)O(C 1 -C 4 alkyl), C 3 -C 20 cycloalkyl, SO 2 -(C 1 -C 4 haloalkyl), O(C 1 -C 4 haloalkyl) Or a C 3 -C 20 cycloalkyl group having one or more O; or R 17 represents a C 2 -C 20 alkyl group, wherein one or more O, S or NR 26 are heterogeneous; or R 17 represents (CH 2 CH 2 O) n+1 H, (CH 2 CH 2 O) n (CO)-(C 1 -C 8 alkyl), C 1 -C 8 alkanoyl, C 2 -C 12 alkenyl, C 3 - acyl or C 6 alkenyl interrupted or not interrupted with one or more O, S, CO or NR 26 of the C 3 -C 20 cycloalkyl; or R 17 represents C 1 -C 8 alkyl -C 3 -C 10 a cycloalkyl group which has no or hetero or one or more O; or R 17 represents a benzhydryl group which is unsubstituted or has one or more C 1 -C 6 alkyl groups, halogen, OH or C 1 -C 3 alkoxy substituted; or R 17 represents phenyl, naphthyl or C 3 -C 20 heteroaryl, each of which is unsubstituted or substituted with one or more of the following groups: halogen, OH, C 1- C 12 alkyl, C 1 -C 12 alkoxy, CN, NO 2 , phenyl-C 1 -C 3 alkoxy, phenoxy, C 1 -C 12 alkylthio, phenyl sulfide a group, N(C 1 -C 12 alkyl) 2 , a diphenyl-amine group or a group represented by the formula (7); Or R 17 forms a direct bond bonded to one of the carbon atoms of the phenyl or naphthyl ring in which the group represented by the formula (2) or the group represented by the formula (7) is bonded, R 18 represents hydrogen, C 2 -C 12 alkenyl, C 3 -C 20 cycloalkyl or phenyl-C 1 -C 3 alkyl, wherein the C 2 -C 12 alkenyl, C 3 -C 20 naphthenic Or a phenyl-C 1 -C 3 alkyl group which has no or hetero or one or more O, S, CO, NR 26 or COOR 17 ; or R 18 is a C 1 -C 20 alkyl group which is not Substituted or substituted with one or more of the following groups: OH, SH, CN, C 3 -C 6 alkenyloxy, OCH 2 CH 2 CN, OCH 2 CH 2 (CO)O (C 1 -C 4 alkyl) , O(CO)-(C 2 -C 4 )alkenyl, O(CO)-(C 1 -C 4 alkyl), O(CO)-phenyl or (CO)OR 17 ; or R 18 represents C 2- C 20 alkyl group with one or more O, S, CO, NR 26 or COOR 17 in between ; or R 18 represents (CH 2 CH 2 O) n H, (CH 2 CH 2 O) n (CO) -(C 1 -C 8 alkyl), C 2 -C 8 alkanoyl or C 3 -C 6 alkenyl; or R 18 represents a benzinyl group which is unsubstituted or one or more of the following Group substitution: C 1 -C 6 alkyl, halogen, OH, C 1 -C 4 alkoxy or C 1 -C 4 alkylthio; or R 18 represents phenyl, naphthyl or C 3 -C 20 a heteroaryl group, each of which is unsubstituted or substituted with one or more of the following groups: halogen, C 1 -C 12 alkyl, C 1 -C 4 haloalkyl, C 1 -C 12 Alkoxy, CN, NO 2 , phenyl-C 1 -C 3 alkoxy, phenoxy, C 1 -C 12 alkylthio, phenylthio, N(C 1 -C 12 alkyl) 2 , diphenylamino, (CO)O(C 1 -C 8 alkyl), (CO)-C 1 -C 8 alkyl, (CO)N(C 1 -C 8 alkyl) 2 or (7) the group represented, R 19 and R 20 are each independently hydrogen, C 1 -C 20 alkyl, C 2 -C 4 hydroxyalkyl, C 2 -C 10 alkoxyalkyl, C 2 -C 5 alkenyl, C 3 - C 20 cycloalkyl, phenyl-C 1 -C 3 alkyl, C 1 -C 8 alkanoyl, C 1 -C 8 alkenyloxy, C 3 -C 12 alkenyl, SO 2 -( a C 1 -C 4 haloalkyl group or a benzylidene group; or R 19 and R 20 represent a phenyl group, a naphthyl group or a C 3 -C 20 heteroaryl group, each of which is unsubstituted or has one or more of the following groups; Group substitution: halogen, C 1 -C 4 haloalkyl, C 1 -C 20 alkoxy, C 1 -C 12 alkyl, benzhydryl or C 1 -C 12 alkoxy; or R 19 and R 20 Together with the N atom to which it is attached, it forms a 5- or 6-membered saturated or unsaturated ring which is not intermixed or intermixed with O, S or NR 17 , and the 5 or 6 member saturated or unsaturated ring is unsubstituted or Substituted by one or more of the following groups: C 1 -C 20 alkyl, C 1 -C 20 alkoxy, =0, OR 17 , SR 18 , NR 21 R 22 , (CO)R 23 , NO 2 , Halogen, C 1 -C 4 -haloalkyl, CN, phenyl, C 3 -C 20 cycloalkyl having one or more O, S, CO or NR 17 unintercalated or heterozygous, or represented by formula (7) Group, Or R 19 and R 20 together with the N atom to which they are attached form a heteroaromatic ring system which is unsubstituted or substituted with one or more of the following groups: C 1 -C 20 alkyl, C 1 - C 4 haloalkyl, C 1 -C 20 alkoxy, =0, OR 17 , SR 18 , NR 21 R 22 , (CO)R 23 , halogen, NO 2 , CN, phenyl or uninter or hetero Or a plurality of C 3 -C 20 cycloalkyl groups of O, S, CO or NR 17 or a group represented by the formula (7), R 21 and R 22 are each independently hydrogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, C 3 -C 10 cycloalkyl or phenyl; or R 21 and R 22 are attached thereto The N atoms together form a 5- or 6-membered saturated or unsaturated ring without inter- or inter-organic O, S or NR 26 , and the 5- or 6-membered saturated or unsaturated ring is unfused or the 5 or 6 a saturated or unsaturated ring fused to a benzene ring; R 23 represents hydrogen, OH, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, hetero or one or more O, CO or C 2 of NR 26 a C 20 alkyl group, a C 3 -C 20 cycloalkyl group which is undoped or intermixed with O, S, CO or NR 26 or R 23 represents a phenyl group, a naphthyl group, a phenyl-C 1 -C 4 alkyl group, OR 17 , SR 18 or NR 21 R 22 ; R 24 represents (CO)OR 17 , CONR 19 R 20 , (CO)R 17 ; or R 24 has one of the meanings given for R 19 and R 20 ; R 25 represents COOR 17 , CONR 19 R 20 , (CO)R 17 ; or R 25 has one of the meanings given for R 17 ; R 26 represents hydrogen, C 1 -C 20 alkyl, C 1 -C a 4- haloalkyl group, a C 2 -C 20 alkyl group, optionally having one or more O or CO; or a phenyl-C 1 -C 4 alkyl group, a C 3 -C 8 cycloalkyl group, which is unintercalated or Miscellaneous with one or more O or CO; or (CO)R 19 ; or a phenyl group which is unsubstituted or substituted with one or more of the following groups: C 1 -C 20 alkyl, halogen, C 1 a -C 4 haloalkyl group, OR 17 , SR 18 , NR 19 R 20 or a group represented by the formula (7); However, the condition is that at least one group represented by formula (2) or formula (7) is present in the molecule.

式(1)化合物之特徵在於其在咔唑部分上包含一或多個成環(annelated)不飽和環。換言之,R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8中至少一對是由式(5)所表示的基團、 The compound of formula (1) is characterized in that it comprises one or more annelated unsaturated rings on the carbazole moiety. In other words, at least one of R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 is represented by the formula (5). Group,

C1-C20烷基是直鏈或支鏈且是(例如)C1-C18-、C1-C4-、C1-C12-、C1-C8-、C1-C8-或C1-C4烷基或C4-C12-或C4-C8烷基。實例是甲基、乙基、丙基、異丙基、正丁基、第二丁基、異丁基、第三丁基、戊基、己基、庚基、2,4,4-三甲基戊基、2-乙基己基、辛基、壬基、癸基、十二基、十四基、十五基、十六基、十八基及二十基。C1-C6烷基具有與上文針對C1-C20烷基所給出相同之含義且具有最高相應C原子數。 C 1 -C 20 alkyl is straight or branched and is, for example, C 1 -C 18 -, C 1 -C 4 -, C 1 -C 12 -, C 1 -C 8 -, C 1 -C 8- or C 1 -C 4 alkyl or C 4 -C 12 - or C 4 -C 8 alkyl. Examples are methyl, ethyl, propyl, isopropyl, n-butyl, t-butyl, isobutyl, tert-butyl, pentyl, hexyl, heptyl, 2,4,4-trimethyl Amyl, 2-ethylhexyl, octyl, decyl, decyl, dodecyl, tetradecyl, fifteen, hexadecyl, octadecyl and decyl. The C 1 -C 6 alkyl group has the same meaning as given above for the C 1 -C 20 alkyl group and has the highest corresponding number of C atoms.

含有一或多個C-C多重鍵之未經取代或經取代之C1-C20烷基是指如下文所解釋之烯基。 An unsubstituted or substituted C 1 -C 20 alkyl group containing one or more CC multiple bonds means an alkenyl group as explained below.

C1-C4鹵代烷基是如下文所定義經鹵素取代之如上文所定義C1-C4烷基。烷基基團是(例如)單-或多鹵化,直至所有H-原子替換為鹵素。其是(例如)CzHxHaly,其中x+y=2z+1且Hal是鹵素,較佳為F。具體實例是氯甲基、三氯甲基、三氟甲基或2-溴丙基,尤其為三氟甲基或三氯甲基。C2-C4羥基烷基意指經一或兩個O原子取代之C2-C4烷基。烷基基團是直鏈或支鏈。實例是2-羥基乙基、1-羥基乙基、1-羥基丙基、2-羥基丙基、3-羥基丙基、1-羥基丁基、4-羥基丁基、2-羥基丁基、3-羥基丁基、2,3-二羥基 丙基或2,4-二羥基丁基。C2-C10烷氧基烷基是間雜有一個O原子之C2-C10烷基。C2-C10烷基具有與上文針對C1-C20烷基所給出相同之含義且具有最高相應C原子數。實例是甲氧基甲基、甲氧基乙基、甲氧基丙基、乙氧基甲基、乙氧基乙基、乙氧基丙基、丙氧基甲基、丙氧基乙基、丙氧基丙基。 C 1 -C 4 haloalkyl with halogen substituted as hereinbefore defined C 1 -C 4 alkyl as defined below. The alkyl group is, for example, mono- or polyhalogenated until all H-atoms are replaced by halogen. It is, for example, C z H x Hal y , where x+y=2z+1 and Hal is halogen, preferably F. Specific examples are chloromethyl, trichloromethyl, trifluoromethyl or 2-bromopropyl, especially trifluoromethyl or trichloromethyl. C 2 -C 4 hydroxyalkyl means a C 2 -C 4 alkyl group substituted with one or two O atoms. The alkyl group is straight or branched. Examples are 2-hydroxyethyl, 1-hydroxyethyl, 1-hydroxypropyl, 2-hydroxypropyl, 3-hydroxypropyl, 1-hydroxybutyl, 4-hydroxybutyl, 2-hydroxybutyl, 3-hydroxybutyl, 2,3-dihydroxypropyl or 2,4-dihydroxybutyl. C 2 -C 10 alkoxyalkyl is interrupted by O atoms of a C 2 -C 10 alkyl. The C 2 -C 10 alkyl group has the same meaning as given above for the C 1 -C 20 alkyl group and has the highest corresponding number of C atoms. Examples are methoxymethyl, methoxyethyl, methoxypropyl, ethoxymethyl, ethoxyethyl, ethoxypropyl, propoxymethyl, propoxyethyl, Propoxypropyl.

間雜有一或多個O、S、NR26或CO之C2-C20烷基經O、S、NR26或CO間雜(例如)1至9次、1至5次、1至3次或1次或2次。若存在一個以上間雜基團,則其為相同種類或不同。兩個O原子由至少一個亞甲基、較佳至少兩個亞甲基(即伸乙基)隔開。該等烷基是直鏈或支鏈。舉例而言,將存在以下結構單元:-CH2-CH2-O-CH2CH3、-[CH2CH2O]y-CH3(其中y=1至9)、-(CH2-CH2O)7-CH2CH3、-CH2-CH(CH3)-O-CH2-CH2CH3、-CH2-CH(CH3)-O-CH2-CH3、-CH2-CH2-S-CH2CH3、-CH2-CH(CH3)-NW26-CH2-CH3、-CH2-CH2-COO-CH2CH3或-CH2-CH(CH3)-OCO-CH2-CH2CH3A C 2 -C 20 alkyl group having one or more O, S, NR 26 or CO intermixed with O, S, NR 26 or CO (for example) 1 to 9 times, 1 to 5 times, 1 to 3 times or 1 Times or 2 times. If more than one meta-group is present, it is the same species or different. The two O atoms are separated by at least one methylene group, preferably at least two methylene groups (i.e., exoethyl groups). The alkyl groups are straight or branched. For example, the following structural units will be present: -CH 2 -CH 2 -O-CH 2 CH 3 , -[CH 2 CH 2 O] y -CH 3 (where y = 1 to 9), -(CH 2 - CH 2 O) 7 -CH 2 CH 3 , -CH 2 -CH(CH 3 )-O-CH 2 -CH 2 CH 3 , -CH 2 -CH(CH 3 )-O-CH 2 -CH 3 ,- CH 2 -CH 2 -S-CH 2 CH 3 , -CH 2 -CH(CH 3 )-NW 26 -CH 2 -CH 3 , -CH 2 -CH 2 -COO-CH 2 CH 3 or -CH 2 - CH(CH 3 )-OCO-CH 2 -CH 2 CH 3 .

C3-C10環烷基、C3-C10環烷基及C3-C8環烷基在本申請案上下文中應理解為至少包含一個環之烷基。其是(例如)環丙基、環丁基、環戊基、環己基、環辛基、戊基環戊基及環己基。C3-C10環烷基在本發明上下文中亦意欲涵蓋二環,換言之,橋聯環,例如 以及相對應的環。其它實例是諸如 (例如)或是等結構、以及僑聯或稠合環系統,舉例而言,該術語亦意欲涵蓋:、等結構。 C 3 -C 10 cycloalkyl, C 3 -C 10 cycloalkyl and C 3 -C 8 cycloalkyl are understood in the context of the present application to mean an alkyl group containing at least one ring. It is, for example, cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cyclooctyl, pentylcyclopentyl and cyclohexyl. C 3 -C 10 cycloalkyl is also intended to encompass a bicyclic ring in the context of the present invention, in other words, a bridging ring, for example And the corresponding ring. Other examples are such as (E.g ) or The structure, as well as the Qiaolian or fused ring system, for example, the term is also intended to cover: , , and other structures.

間雜有O、S、CO、NR26之C3-C20環烷基具有上文給出之含義,其中烷基中至少一個CH2-基團替換為O、S、CO或NR26。實例是諸如(例如 、等結構。 The C 3 -C 20 cycloalkyl group interspersed with O, S, CO, NR 26 has the meaning given above wherein at least one CH 2 - group in the alkyl group is replaced by O, S, CO or NR 26 . An example is something like , , (E.g , , and other structures.

C1-C8烷基-C3-C10環烷基是經一或多個具有最多8個碳原子之烷基取代的如上文所定義之C3-C10環烷基。實例是:等。 C 1 -C 8 alkyl-C 3 -C 10 cycloalkyl is C 3 -C 10 cycloalkyl as defined above substituted with one or more alkyl groups having up to 8 carbon atoms. An example is: , Wait.

間雜有一或多個O之C1-C8烷基-C3-C10環烷基是經一或多個具有最多8個碳原子之烷基取代的如上文所定義之O間雜C3-C10環烷基。實例是:等。 A C 1 -C 8 alkyl-C 3 -C 10 cycloalkyl group having one or more O interstitials is an O-interstitial C 3 - as defined above, substituted with one or more alkyl groups having up to 8 carbon atoms C 10 cycloalkyl. An example is: , Wait.

C1-C12烷氧基是經一個O原子取代之C1-C12烷基。C1-C12烷基具有與上文針對C1-C20烷基所給出相同之含義且具有最高相應C原子數。C1-C4烷氧基是直鏈或支鏈,例如甲氧基、乙氧基、 丙氧基、異丙氧基、正丁氧基、第二丁氧基、異丁氧基或第三丁氧基。C1-C8烷氧基及C1-C4-烷氧基具有與上文所述相同之含義且具有最高相應C原子數。 C 1 -C 12 alkoxy is substituted by O atom of a C 1 -C 12 alkyl. The C 1 -C 12 alkyl group has the same meaning as given above for the C 1 -C 20 alkyl group and has the highest corresponding number of C atoms. C 1 -C 4 alkoxy is straight or branched, such as methoxy, ethoxy, propoxy, isopropoxy, n-butoxy, second butoxy, isobutoxy or Tributoxy. The C 1 -C 8 alkoxy group and the C 1 -C 4 -alkoxy group have the same meanings as described above and have the highest corresponding number of C atoms.

C1-C12烷基硫基是經一個S原子取代之C1-C12烷基。C1-C20烷基具有與上文針對C1-C20烷基所給出相同之含義且具有最高相應C原子數。C1-C4烷基硫基是直鏈或支鏈,例如甲基硫基、乙基硫基、丙基硫基、異丙基硫基、正丁基硫基、第二丁基硫基、異丁基硫基、第三丁基硫基。 C 1 -C 12 alkyl group is substituted by a S atom of the C 1 -C 12 alkyl. The C 1 -C 20 alkyl group has the same meaning as given above for the C 1 -C 20 alkyl group and has the highest corresponding number of C atoms. C 1 -C 4 alkylthio is straight-chain or branched, such as methylthio, ethylthio, propylthio, isopropylthio, n-butylthio, second butylthio , isobutylthio group, tert-butylthio group.

苯基-C1-C3烷基是(例如)苄基、苯基乙基、α-甲基苄基或α,α-二甲基-苄基,尤其為苄基。 Phenyl-C 1 -C 3 alkyl is, for example, benzyl, phenylethyl, α -methylbenzyl or α , α -dimethyl-benzyl, especially benzyl.

苯基-C1-C3烷氧基是(例如)苄氧基、苯基乙氧基、α-甲基苄氧基或α,α-二甲基苄氧基,尤其為苄氧基。 The phenyl-C 1 -C 3 alkoxy group is, for example, a benzyloxy group, a phenylethoxy group, an α -methylbenzyloxy group or an α , α -dimethylbenzyloxy group, especially a benzyloxy group.

C2-C12烯基是單-或多不飽和且是(例如)C2-C10-、C2-C8-、C2-C5-烯基,例如乙烯基、烯丙基、甲基烯丙基、1,1-二甲基烯丙基、1-丁烯基、3-丁烯基、2-丁烯基、1,3-戊二烯基、5-己烯基、7-辛烯基或十二烯基,尤其為烯丙基。C2-C5烯基具有與上文針對C2-C12烯基所給出相同之含義且具有最高相應C原子數。 C 2 -C 12 alkenyl is mono- or polyunsaturated and is, for example, C 2 -C 10 -, C 2 -C 8 -, C 2 -C 5 -alkenyl, such as vinyl, allyl, Methyl allyl, 1,1-dimethylallyl, 1-butenyl, 3-butenyl, 2-butenyl, 1,3-pentadienyl, 5-hexenyl, 7-Octyl or dodecenyl, especially allyl. The C 2 -C 5 alkenyl group has the same meaning as given above for the C 2 -C 12 alkenyl group and has the highest corresponding number of C atoms.

間雜有一或多個O、CO或NR26之C2-C12烯基經O、S、NR26或CO間雜(例如)1至9次、1至5次、1至3次或1次或2次。若存在一個以上間雜基團,則其為相同種類或不同。兩個O原子由至少一個亞甲基、較佳至少兩個亞甲基(即伸乙基)隔開。烯基是直鏈或支鏈且如上文所定義。舉例而言,可形成以下結構 單元:-CH=CH-O-CH2CH3、-CH=CH-O-CH=CH2等。 Miscible with one or more C 2 -C 12 alkenyl groups of O, CO or NR 26 via O, S, NR 26 or CO, for example, 1 to 9 times, 1 to 5 times, 1 to 3 times or 1 time or 2 times. If more than one meta-group is present, it is the same species or different. The two O atoms are separated by at least one methylene group, preferably at least two methylene groups (i.e., exoethyl groups). Alkenyl is straight or branched and is as defined above. For example, the following structural units can be formed: -CH=CH-O-CH 2 CH 3 , -CH=CH-O-CH=CH 2 and the like.

C4-C8環烯基具有一或多個雙鍵且是(例如)C4-C6-環烯基或C6-C8-環烯基。實例是環丁烯基、環戊烯基、環己烯基或環辛烯基,尤其為環戊烯基及環己烯基,較佳為環己烯基。 The C 4 -C 8 cycloalkenyl group has one or more double bonds and is, for example, a C 4 -C 6 -cycloalkenyl group or a C 6 -C 8 -cycloalkenyl group. Examples are cyclobutenyl, cyclopentenyl, cyclohexenyl or cyclooctenyl, especially cyclopentenyl and cyclohexenyl, preferably cyclohexenyl.

C3-C6烯氧基是單或多不飽和且具有上文針對烯基所給出含義中之一者,且附接氧基具有最高相應C原子數。實例是烯丙氧基、甲基烯丙氧基、丁烯氧基、戊烯氧基、1,3-戊二烯氧基、5-己烯氧基。 The C 3 -C 6 alkenyloxy group is mono- or polyunsaturated and has one of the meanings given above for an alkenyl group, and the attached oxy group has the highest corresponding number of C atoms. Examples are allyloxy, methylallyloxy, butenyloxy, pentenyloxy, 1,3-pentadienyloxy, 5-hexenyloxy.

C2-C12炔基是單或多不飽和直鏈或支鏈且是(例如)C2-C8-、C2-C6-或C2-C4炔基。實例是乙炔基、丙炔基、丁炔基、1-丁炔基、3-丁炔基、2-丁炔基、戊炔基己炔基、2-己炔基、5-己炔基、辛炔基等。 The C 2 -C 12 alkynyl group is a mono- or polyunsaturated straight or branched chain and is, for example, a C 2 -C 8 -, C 2 -C 6 - or C 2 -C 4 alkynyl group. Examples are ethynyl, propynyl, butynyl, 1-butynyl, 3-butynyl, 2-butynyl, pentynylhexynyl, 2-hexynyl, 5-hexynyl, Octyl group and the like.

C2-C20烷醯基是直鏈或支鏈且是(例如)C2-C18-、C2-C14-、C2-C12-、C2-C8-、C2-C6-或C2-C4烷醯基或C4-C12-或C4-C8烷醯基。實例是乙醯基、丙醯基、丁醯基、異丁醯基、戊醯基、己醯基、庚醯基、辛醯基、壬醯基、癸醯基、十二醯基、十四醯基、十五醯基、十六醯基、十八醯基、二十醯基,較佳為乙醯基。C1-C8烷醯基具有與上文針對C2-C20烷醯基所給出相同之含義且具有最高相應C原子數。 The C 2 -C 20 alkanoyl group is straight or branched and is, for example, C 2 -C 18 -, C 2 -C 14 -, C 2 -C 12 -, C 2 -C 8 -, C 2 - C 6 - or C 2 -C 4 alkanoyl or C 4 -C 12 - or C 4 -C 8 alkanoyl. Examples are ethyl, propyl, butyl, isobutyl, pentylene, hexyl, decyl, octyl, fluorenyl, fluorenyl, fluorenyl, tetradecyl, fifteen Base, hexadecanyl, octadecyl, and decyl, preferably acetyl. The C 1 -C 8 alkano group has the same meaning as given above for the C 2 -C 20 alkano group and has the highest corresponding number of C atoms.

C2-C12烷氧基羰基是直鏈或支鏈且是(例如)甲氧基羰基、乙氧基羰基、丙氧基羰基、正丁氧基羰基、異丁氧基羰基、1,1-二甲基丙氧基羰基、戊氧基羰基、己氧基羰基、庚氧基羰基、 辛氧基羰基、壬氧基羰基、癸氧基羰基或十二氧基羰基,尤其為甲氧基羰基、乙氧基羰基、丙氧基羰基、正丁氧基羰基或異丁氧基羰基,較佳為甲氧基羰基。 C 2 -C 12 alkoxycarbonyl is straight-chain or branched and is, for example, methoxycarbonyl, ethoxycarbonyl, propoxycarbonyl, n-butoxycarbonyl, isobutoxycarbonyl, 1,1 - dimethylpropoxycarbonyl, pentyloxycarbonyl, hexyloxycarbonyl, heptyloxycarbonyl, octyloxycarbonyl, decyloxycarbonyl, decyloxycarbonyl or dodecyloxycarbonyl, especially methoxy A carbonyl group, an ethoxycarbonyl group, a propoxycarbonyl group, a n-butoxycarbonyl group or an isobutoxycarbonyl group is preferably a methoxycarbonyl group.

間雜有一或多個O之C2-C12烷氧基羰基是直鏈或支鏈。兩個O原子由至少兩個亞甲基(即伸乙基)隔開。該經間雜之烷氧基羰基未經取代或經一或多個羥基取代。C6-C20芳氧基羰基是(例如)苯基氧基羰基[=苯基-O-(CO)-]、萘氧基羰基、蒽氧基羰基等。C5-C20雜芳氧基羰基是C5-C20雜芳基-O-CO-。 The C 2 -C 12 alkoxycarbonyl group having one or more O interstitials is linear or branched. The two O atoms are separated by at least two methylene groups (ie, an extended ethyl group). The meta-alkyloxycarbonyl group is unsubstituted or substituted with one or more hydroxyl groups. The C 6 -C 20 aryloxycarbonyl group is, for example, a phenyloxycarbonyl group [=phenyl-O-(CO)-], a naphthyloxycarbonyl group, a decyloxycarbonyl group or the like. The C 5 -C 20 heteroaryloxycarbonyl group is a C 5 -C 20 heteroaryl-O-CO- group.

C3-C10環烷基羰基是C3-C10環烷基-CO-,其中環烷基具有上文所示含義中之一者且具有最高相應C原子數。間雜有一或多個O、S、CO、NR26之C3-C10環烷基羰基是指經間雜環烷基-CO-,其中經間雜環烷基是如上文所述所定義。 The C 3 -C 10 cycloalkylcarbonyl group is a C 3 -C 10 cycloalkyl-CO- group, wherein the cycloalkyl group has one of the meanings indicated above and has the highest corresponding number of C atoms. The C 3 -C 10 cycloalkylcarbonyl group having one or more O, S, CO, NR 26 refers to a trans-heterocycloalkyl-CO- wherein the inter-heterocycloalkyl group is as defined above.

C3-C10環烷氧基羰基是C3-C10環烷基-O-(CO)-,其中環烷基具有上文所示含義中之一者且具有最高相應C原子數。間雜有一或多個O、S、CO、NR26之C3-C10環烷氧基羰基是指經間雜環烷基-O-(CO)-,其中經間雜環烷基是如上文所述所定義。 The C 3 -C 10 cycloalkoxycarbonyl group is C 3 -C 10 cycloalkyl-O-(CO)-, wherein the cycloalkyl group has one of the meanings indicated above and has the highest corresponding number of C atoms. The C 3 -C 10 cycloalkoxycarbonyl group having one or more O, S, CO, NR 26 refers to a transheterocycloalkyl-O-(CO)- group, wherein the interheterocycloalkyl group is as described above Defined.

C1-C20烷基苯基是指經一或多個烷基取代之苯基,其中C原子之總和最多為20。 The C 1 -C 20 alkylphenyl group means a phenyl group substituted by one or more alkyl groups, wherein the sum of the C atoms is at most 20.

C6-C20芳基是(例如)苯基、萘基、蒽基、菲基、芘基、屈基、并四苯基、聯伸三苯基等,尤其為苯基或萘基,較佳為苯基。萘基是1-萘基或2-萘基。 The C 6 -C 20 aryl group is, for example, phenyl, naphthyl, anthracenyl, phenanthryl, anthracenyl, fluorenyl, tetracylphenyl, tert-triphenyl, etc., especially phenyl or naphthyl, preferably Is a phenyl group. The naphthyl group is 1-naphthyl or 2-naphthyl.

在本發明上下文中,C3-C20雜芳基意欲包含單環或多環 系統,例如稠合環系統。實例是噻吩基、苯并[b]噻吩基、萘并[2,3-b]噻吩基、噻蒽基、呋喃基、二苯并呋喃基、呫噸基、噻噸基、啡噁噻基、吡咯基、咪唑基、吡唑基、吡嗪基、嘧啶基、噠嗪基、中氮茚基、異吲哚基、吲哚基、吲唑基、嘌呤基、喹嗪基、異喹啉基、喹啉基、酞嗪基、萘啶基、喹噁啉基、喹唑啉基、噌啉基、喋啶基、咔唑基、β-哢啉基、菲啶基、吖啶基、萘嵌間二氮苯基、菲咯啉基、吩嗪基、異噻唑基、吩噻嗪基、異噁唑基、呋呫基、吩噁基、7-菲基、蒽醌-2-基(=9,10-二側氧基-9,10-二氫蒽-2-基)、3-苯并[b]噻吩基、5-苯并[b]噻吩基、2-苯并[b]噻吩基、4-二苯并呋喃基、4,7-二苯并呋喃基、4-甲基-7-二苯并呋喃基、2-呫噸基、8-甲基-2-呫噸基、3-呫噸基、2-啡噁噻基、2,7-啡噁噻基、2-吡咯基、3-吡咯基、5-甲基-3-吡咯基、2-咪唑基、4-咪唑基、5-咪唑基、2-甲基-4-咪唑基、2-乙基-4-咪唑基、2-乙基-5-咪唑基、1H-四唑-5-基、3-吡唑基、1-甲基-3-吡唑基、1-丙基-4-吡唑基、2-吡嗪基、5,6-二甲基-2-吡嗪基、2-中氮茚基、2-甲基-3-異吲哚基、2-甲基-1-異吲哚基、1-甲基-2-吲哚基、1-甲基-3-吲哚基、1,5-二甲基-2-吲哚基、1-甲基-3-吲唑基、2,7-二甲基-8-嘌呤基、2-甲氧基-7-甲基-8-嘌呤基、2-喹嗪基、3-異喹啉基、6-異喹啉基、7-異喹啉基、3-甲氧基-6-異喹啉基、2-喹啉基、6-喹啉基、7-喹啉基、2-甲氧基-3-喹啉基、2-甲氧基-6-喹啉基、6-酞嗪基、7-酞嗪基、1-甲氧基-6-酞嗪基、1,4-二甲氧基-6-酞嗪基、1,8-萘啶-2-基、2-喹噁啉基、6-喹噁啉基、2,3-二甲基-6-喹噁啉基、2,3-二甲氧基-6-喹噁啉基、2- 喹唑啉基、7-喹唑啉基、2-二甲基胺基-6-喹唑啉基、3-噌啉基、6-噌啉基、7-噌啉基、3-甲氧基-7-噌啉基、2-喋啶基、6-喋啶基、7-喋啶基、6,7-二甲氧基-2-喋啶基、2-咔唑基、3-咔唑基、9-甲基-2-咔唑基、9-甲基-3-咔唑基、β-哢啉-3-基、1-甲基-β-哢啉-3-基、1-甲基-β-哢啉-6-基、3-菲啶基、2-吖啶基、3-吖啶基、2-萘嵌間二氮苯基、1-甲基-5-萘嵌間二氮苯基、5-菲咯啉基、6-菲咯啉基、1-吩嗪基、2-吩嗪基、3-異噻唑基、4-異噻唑基、5-異噻唑基、2-吩噻嗪基、3-吩噻嗪基、10-甲基-3-吩噻嗪基、3-異噁唑基、4-異噁唑基、5-異噁唑基、4-甲基-3-呋呫基、2-吩噁基、10-甲基-2-吩噁基等。 In the context of the present invention, C 3 -C 20 heteroaryl is intended to include monocyclic or polycyclic systems, such as fused ring systems. Examples are thienyl, benzo[b]thienyl, naphtho[2,3-b]thienyl, thioxyl, furyl, dibenzofuranyl, xanthenyl, thioxanthyl, phenothiphenyl , pyrrolyl, imidazolyl, pyrazolyl, pyrazinyl, pyrimidinyl, pyridazinyl, mesoindolyl, isodecyl, decyl, oxazolyl, fluorenyl, quinazolyl, isoquinoline , quinolyl, pyridazinyl, naphthyridinyl, quinoxalinyl, quinazolinyl, porphyrinyl, acridinyl, oxazolyl, β-carboline, phenanthryl, acridinyl, Naphthalene, diphenylphenyl, phenanthroline, phenazinyl, isothiazolyl, phenothiazine, isoxazolyl, furazinyl, oxo, 7-phenanthryl, indole-2-yl (=9,10-di-oxy-9,10-dihydroindol-2-yl), 3-benzo[b]thienyl, 5-benzo[b]thienyl, 2-benzo[b] Thienyl, 4-dibenzofuranyl, 4,7-dibenzofuranyl, 4-methyl-7-dibenzofuranyl, 2-indenyl, 8-methyl-2-indole Base, 3-xanthene, 2-morphothinyl, 2,7-morphothinyl, 2-pyrrolyl, 3-pyrrolyl, 5-methyl-3-pyrrolyl, 2-imidazolyl, 4 -Imidazolyl, 5-imidazolyl, 2-methyl-4-imidazolyl, 2- 4-imidazolyl, 2-ethyl-5-imidazolyl, 1H-tetrazol-5-yl, 3-pyrazolyl, 1-methyl-3-pyrazolyl, 1-propyl-4- Pyrazolyl, 2-pyrazinyl, 5,6-dimethyl-2-pyrazinyl, 2-indolizinyl, 2-methyl-3-isoindolyl, 2-methyl-1- Isoindolyl, 1-methyl-2-indolyl, 1-methyl-3-indolyl, 1,5-dimethyl-2-indenyl, 1-methyl-3-oxazole , 2,7-dimethyl-8-fluorenyl, 2-methoxy-7-methyl-8-fluorenyl, 2-quinazinyl, 3-isoquinolinyl, 6-isoquinolinyl , 7-isoquinolyl, 3-methoxy-6-isoquinolyl, 2-quinolyl, 6-quinolyl, 7-quinolinyl, 2-methoxy-3-quinolyl , 2-methoxy-6-quinolyl, 6-pyridazinyl, 7-pyridazinyl, 1-methoxy-6-pyridazinyl, 1,4-dimethoxy-6-pyridazine 1,1,8-naphthyridin-2-yl, 2-quinoxalinyl, 6-quinoxalinyl, 2,3-dimethyl-6-quinoxalinyl, 2,3-dimethoxy -6-quinoxaline, 2-quinazolinyl, 7-quinazolinyl, 2-dimethylamino-6-quinazolinyl, 3-carbolinyl, 6-carbolinyl, 7 - porphyrinyl, 3-methoxy-7-carbolinyl, 2-acridinyl, 6-acridinyl, 7-acridinyl, 6,7-dimethoxy-2-indolyl, 2-咔, 3-oxazolyl, 9-methyl-2-oxazolyl, 9-methyl-3-oxazolyl, β-carboline-3-yl, 1-methyl-β-carboline-3 -yl, 1-methyl-β-carboline-6-yl, 3-phenanthryl, 2-acridinyl, 3-acridinyl, 2-naphthyldiazophenyl, 1-methyl- 5-naphthyl-dinitrophenyl, 5-phenanol, 6-phenanol, 1-phenazinyl, 2-phenazinyl, 3-isothiazolyl, 4-isothiazolyl, 5- Isothiazolyl, 2-phenothiazine, 3-phenothiazine, 10-methyl-3-phenothiazine, 3-isoxazolyl, 4-isoxazolyl, 5-isoxazolyl , 4-methyl-3-furoyl, 2-phenoxy group, 10-methyl-2-phenoxy group, and the like.

C3-C20雜芳基尤其為噻吩基、苯并[b]噻吩基、噻蒽基、噻噸基、1-甲基-2-吲哚基或1-甲基-3-吲哚基;尤其為噻吩基。 The C 3 -C 20 heteroaryl group is especially thienyl, benzo[b]thienyl, thioxyl, thioxanthyl, 1-methyl-2-indenyl or 1-methyl-3-indolyl Especially tienyl.

C4-C20雜芳基羰基是經由CO基團連接至分子其餘部分之如上文所定義C3-C20雜芳基。 A C 4 -C 20 heteroarylcarbonyl group is a C 3 -C 20 heteroaryl group as defined above attached to the remainder of the molecule via a CO group.

經取代之芳基(苯基、萘基、C6-C20芳基或C5-C20雜芳基)是分別經1至7次、1至6次或1至4次、尤其1次、2次或3次取代。顯而易見,所定義芳基不能具有比芳基環處之自由位置為多之取代基。 Substituted aryl (phenyl, naphthyl, C 6 -C 20 aryl or C 5 -C 20 heteroaryl) is 1 to 7 times, 1 to 6 times or 1 to 4 times, especially 1 time, respectively , 2 or 3 substitutions. It will be apparent that the defined aryl group cannot have more substituents than the free position at the aryl ring.

苯基環上之取代基較佳在苯基環上之位置4中或呈3,4-、3,4,5-、2,6-、2,4-或2,4,6-組態。 The substituent on the phenyl ring is preferably in position 4 on the phenyl ring or in the 3,4-, 3,4,5-, 2,6-, 2,4- or 2,4,6-configuration .

間雜1次或多次之經間雜基團間雜(例如)1至19次、1至15次、1至12次、1至9次、1至7次、1至5次、1至4次、 1至3次或1次或2次(顯而易見,間雜原子數取決於擬間雜之C原子數)。經1次或多次取代之經取代基團具有(例如)1至7個、1至5個、1至4個、1至3個或1個或2個相同或不同取代基。 Intermixed with one or more interstitial hetero groups (for example) 1 to 19 times, 1 to 15 times, 1 to 12 times, 1 to 9 times, 1 to 7 times, 1 to 5 times, 1 to 4 times, 1 to 3 times or 1 or 2 times (obviously, the number of heteroatoms depends on the number of C atoms in the interstitial). The substituted group substituted by one or more times has, for example, 1 to 7, 1 to 5, 1 to 4, 1 to 3 or 1 or 2 identical or different substituents.

經一或多個所定義取代基取代之基團意欲具有一個取代基或多個如所給出相同或不同定義之取代基。鹵素是氟、氯、溴及碘,尤其為氟、氯及溴,較佳為氟及氯。若R1及R2、R2及R3、R3及R4或R5及R6、R6及R7、R7及R8彼此獨立地共同為由式(5)所表示的基團、,則形成例如以下(Ia)-(Ii)結構: A group substituted with one or more substituents as defined is intended to have one substituent or a plurality of substituents as defined or differently given. Halogen is fluorine, chlorine, bromine and iodine, especially fluorine, chlorine and bromine, preferably fluorine and chlorine. When R 1 and R 2 , R 2 and R 3 , R 3 and R 4 or R 5 and R 6 , R 6 and R 7 , R 7 and R 8 are each independently a group represented by the formula (5) group, , for example, the following (Ia)-(Ii) structure is formed:

較佳為結構(Ia)。 Preferred is structure (Ia).

式(1)化合物之特徵在於至少一個苯基環與咔唑部分稠合以形成「萘基」環。亦即上述結構中之一者是以式(1)給出。 The compound of formula (1) is characterized in that at least one phenyl ring is partially fused to the carbazole to form a "naphthyl" ring. That is, one of the above structures is given by the formula (1).

若R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8彼此獨立地共同為-(CH2)P-Y-(CH2)q-,則形成(例如)諸如: 等結構。 If R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 are each independently taken to be -(CH 2 ) P -Y- (CH 2 ) q -, forming, for example, such as: And other structures.

若苯基或萘基環上之取代基OR17、SR18、SOR18、SO2R18或NR19R20經由基團R17、R18、R19及/或R20與萘基環之一個碳原子形成5員或6員環,則獲得包含3個或更多個環(包括萘基環) 之結構。實例是: 等結構。 If the substituent OR 17 , SR 18 , SOR 18 , SO 2 R 18 or NR 19 R 20 on the phenyl or naphthyl ring is via the radicals R 17 , R 18 , R 19 and/or R 20 and the naphthyl ring When one carbon atom forms a 5- or 6-membered ring, a structure containing 3 or more rings including a naphthyl ring is obtained. An example is: And other structures.

若R17形成鍵結至其上具有基團 之苯基或萘基環之一個碳原子之直接鍵,則形成(例如)諸如 結構。 When R 17 is formed having bonded thereto a group a direct bond of a carbon atom of a phenyl or naphthyl ring, for example, such as structure.

若R16表示經SR18取代之苯基,其中基團R19表示鍵結至其中附接有COR16基團之咔唑部分之苯基或萘基環的直接鍵,則形成(例如)諸如 等結構。亦即,若R16是經SR18取代之苯基,其中基團R18表示鍵結至其中附接有COR16基團之咔唑部分之苯基或萘基環的直接鍵,則噻噸基部分與咔唑部分之一個苯基或萘基環一起形成。 If R 16 represents a phenyl group substituted by SR 18 , wherein the group R 19 represents a direct bond bonded to a phenyl or naphthyl ring to which a carbazole moiety of the COR 16 group is attached, for example, such as And other structures. That is, if R 16 is a phenyl group substituted by SR 18 , wherein the group R 18 represents a direct bond bonded to a phenyl or naphthyl ring to which a carbazole moiety of the COR 16 group is attached, the thioxanthene The base moiety is formed together with a phenyl or naphthyl ring of the carbazole moiety.

若R19及R20與其所附接之N原子一起形成視情況間雜有O、S或NR17之5員或6員飽和或不飽和環,則形成飽和或不飽和環,例如氮丙啶、吡咯、噻唑、吡咯啶、噁唑、吡啶、1,3-二嗪、1,2-二嗪、六氫吡啶或嗎啉。較佳地,若R19及R20與其所附接之N原子一起形成視情況間雜有O、S或NR17之5員或6員飽和或不飽和環,則形成未經間雜或間雜有O或NR17、尤其O之5員或6員飽和環。 If R 19 and R 20 together with the N atom to which they are attached form a 5- or 6-membered saturated or unsaturated ring, optionally mixed with O, S or NR 17 , a saturated or unsaturated ring, such as aziridine, is formed. Pyrrole, thiazole, pyrrolidine, oxazole, pyridine, 1,3-diazine, 1,2-diazine, hexahydropyridine or morpholine. Preferably, if R 19 and R 20 together with the N atom to which they are attached form a 5- or 6-membered saturated or unsaturated ring of O, S or NR 17 as appropriate, an inter- or inter-molecular O is formed. Or NR 17 , especially the 5- or 6-member saturated ring of O.

若R21及R22與其所附接之N原子一起形成視情況間雜有 O、S或NR26之5員或6員飽和或不飽和環,且苯環視情況與該飽和或不飽和環稠合,則形成飽和或不飽和環,例如氮丙啶、吡咯、噻唑、吡咯啶、噁唑、吡啶、1,3-二嗪、1,2-二嗪、六氫吡啶或嗎啉或相應成環,例如等。 If R 21 and R 22 together with the N atom to which they are attached form a 5- or 6-membered saturated or unsaturated ring, optionally mixed with O, S or NR 26 , and the benzene ring is optionally fused to the saturated or unsaturated ring. , forming a saturated or unsaturated ring, such as aziridine, pyrrole, thiazole, pyrrolidine, oxazole, pyridine, 1,3-diazine, 1,2-diazine, hexahydropyridine or morpholine or corresponding ring ,E.g Wait.

若R19及R20與其所附接之N原子一起形成雜芳香族環系統,則該環系統意欲包含一個以上環(例如2個或3個環)以及來自相同種類或不同種類之一個或一個以上雜原子。適宜雜原子是(例如)N、S、O或P、尤其N、S或O。實例是咔唑、吲哚、異吲哚、吲唑、嘌呤、異喹啉、喹啉、哢啉、吩噻嗪等。 If R 19 and R 20 together with the N atom to which they are attached form a heteroaromatic ring system, the ring system is intended to contain more than one ring (eg 2 or 3 rings) and one or one from the same or different species. Above heteroatoms. Suitable heteroatoms are, for example, N, S, O or P, especially N, S or O. Examples are carbazole, anthracene, isoindole, carbazole, anthracene, isoquinoline, quinoline, porphyrin, phenothiazine and the like.

術語「及/或」或「或/及」在本發明上下文中意欲表達不僅可存在所定義替代物(取代基)中之一者,而且可存在總共若干所定義替代物(取代基),即不同替代物(取代基)之混合物。 The term "and/or" or "or/and" is intended to mean in the context of the present invention that not only one of the defined substitutes (substituents) but also a plurality of defined substitutes (substituents) may be present, ie A mixture of different substitutes (substituents).

術語「至少」意欲定義一者或一者以上,例如一者或兩者或三者、較佳一者或兩者。 The term "at least" is intended to define one or more, such as one or both or three, preferably one or both.

術語「視情況經取代」意指其提及之基團未經取代或經取代。 The term "optionally substituted" means that the group to which it is referred is unsubstituted or substituted.

術語「視情況經間雜」意指其提及之基團未經雜或經間雜。 The term "as appropriate" means that the group to which it is referred is not miscellaneous or interstitial.

在整個本說明書及下文之申請專利範圍中,除非上下文另有要求,否則詞語「包含(comprise)」或變體(例如,「comprises」或「comprising」)應理解為暗指包括所述整數或步驟或整數群組或步驟群組,但並不排除任一其它整數或步驟或整數群組或步驟群組。術語「(甲基)丙烯酸酯」在本申請案上下文中意欲指丙烯酸酯以及相應甲基丙烯酸酯。 Throughout this specification and the claims below, the words "comprise" or variant (eg, "comprises" or "comprising") are understood to include the integer or A step or integer group or group of steps, but does not exclude any other integer or step or group of integers or groups of steps. The term "(meth)acrylate" is intended in the context of the present application to mean acrylate and the corresponding methacrylate.

式(1)肟酯是藉由文獻中所述方法來製備,例如藉由在以下條件下使相應肟與醯鹵、尤其氯化物或酸酐反應:在惰性溶劑(例如第三丁基甲基醚、四氫呋喃(THF)或二甲基甲醯胺)中,在鹼(例如三乙胺或吡啶)存在時,或在鹼性溶劑(例如吡啶)中。在下文中作為實例,闡述式Ia化合物之製備,其中R7表示肟酯基團且X表示直接鍵[自適當肟開始實施化合物(Ib)-(Ih)之反應]: The oxime ester of formula (1) is prepared by the methods described in the literature, for example by reacting the corresponding hydrazine with a hydrazine halide, especially a chloride or an anhydride, under the following conditions: in an inert solvent (eg, tert-butyl methyl ether, tetrahydrofuran) In (THF) or dimethylformamide, in the presence of a base such as triethylamine or pyridine, or in a basic solvent such as pyridine. The preparation of the compound of the formula Ia is illustrated below as an example, wherein R 7 represents a oxime ester group and X represents a direct bond [the reaction of the compound (Ib)-(Ih) is carried out starting from an appropriate hydrazine]:

R1、R2、R5、R6、R8、R13、R14及R15是如上文所定義,Hal意指鹵素原子、尤其為Cl。 R 1 , R 2 , R 5 , R 6 , R 8 , R 13 , R 14 and R 15 are as defined above, and Hal means a halogen atom, especially Cl.

R14較佳為甲基。 R 14 is preferably a methyl group.

此等反應為彼等熟習此項技術者所熟知,且通常在-15℃至+50℃、較佳0至25℃之溫度下實施。 Such reactions are well known to those skilled in the art and are typically carried out at a temperature of from -15 ° C to +50 ° C, preferably from 0 to 25 ° C.

當X表示CO時,相應肟是藉由用亞硝酸烷基酯(例如亞 硝酸甲酯、亞硝酸乙酯、亞硝酸丙酯、亞硝酸丁酯或亞硝酸異戊酯)將亞甲基亞硝化來合成。然後,酯化是在與上文所述相同之條件下實施: When X represents CO, the corresponding enthalpy is by using an alkyl nitrite (such as methyl nitrite, ethyl nitrite, propyl nitrite, butyl nitrite or isoamyl nitrite). Nitrification to synthesize. The esterification is then carried out under the same conditions as described above:

因此,本發明之標的亦是藉由在鹼或鹼之混合物存在下使相應肟化合物與式VI之醯鹵或式VII之酸酐反應來製備如上文所定義式(1)化合物之方法。 Thus, the subject matter of the invention is also a process for the preparation of a compound of formula (1) as defined above by reacting the corresponding hydrazine compound with a hydrazine halide of formula VI or an anhydride of formula VII in the presence of a mixture of bases or bases.

其中Hal是鹵素、尤其Cl,且R14是如上文所定義。 Wherein Hal is halogen, especially Cl, and R 14 is as defined above.

所需作為起始材料之肟可藉由標準化學教材(例如J.March,Advanced Organic Chemistry,第4版,Wiley Interscience,1992)或專著(例如S.R.Sandler & W.Karo,Organic functional group preparations,第3卷,Academic Press)中所述多種方法來獲得。 The desired starting material can be obtained by standard chemistry textbooks (eg J. March, Advanced Organic Chemistry, 4th edition, Wiley Interscience, 1992) or monographs (eg SRSandler & W. Karo, Organic functional group preparations, A variety of methods are described in Volume 3, Academic Press).

最便利的一種方法是(例如)在極性溶劑(例如二甲基乙醯胺(DMA)、DMA水溶液、乙醇或乙醇水溶液)中使醛或酮與羥胺或其鹽反應。在此情形下,添加諸如乙酸鈉或吡啶等鹼來控制反 應混合物之pH。眾所周知,反應速度具有pH依賴性,且可在開始時或在反應期間連續地添加鹼。亦可使用諸如吡啶等鹼性溶劑作為鹼及/或溶劑或共溶劑。反應溫度通常為室溫至混合物之回流溫度,一般為約20℃至120℃。 One of the most convenient methods is to, for example, react an aldehyde or a ketone with hydroxylamine or a salt thereof in a polar solvent such as dimethylacetamide (DMA), aqueous DMA, ethanol or an aqueous ethanol solution. In this case, add a base such as sodium acetate or pyridine to control the reaction. The pH of the mixture should be. It is well known that the reaction rate is pH dependent and the base can be added continuously at the beginning or during the reaction. An alkaline solvent such as pyridine can also be used as the base and/or solvent or co-solvent. The reaction temperature is usually from room temperature to the reflux temperature of the mixture, and is usually from about 20 ° C to 120 ° C.

相應酮中間體是(例如)藉由文獻(例如標準化學教材,例如J.March,Advanced Organic Chemistry,第4版,Wiley Interscience,1992)中所述方法來製備。另外,連續弗裏德-克拉夫茨反應(Friedel-Crafts reaction)可有效用於合成中間體。此等反應為彼等熟習此項技術者所熟知。 The corresponding ketone intermediates are prepared, for example, by methods described in the literature (e.g., standard chemistry textbooks, e.g., J. March, Advanced Organic Chemistry, 4th Ed., Wiley Interscience, 1992). In addition, the continuous Friedel-Crafts reaction can be effectively used to synthesize intermediates. Such reactions are well known to those skilled in the art.

肟之另一便利合成是用亞硝酸或亞硝酸烷基酯將「活性」亞甲基亞硝化。鹼性條件(如(例如)Organic Syntheses coll.第VI卷(J.Wiley & Sons,New York,1988),第199頁及第840頁中所述)與酸性條件(如(例如)Organic Synthesis coll.第V卷,第32頁及第373頁,coll.第III卷,第191頁及第513頁,coll.第II卷,第202頁、第204頁及第363頁中所述)二者適於製備在本發明中用作起始材料之肟。一般自亞硝酸鈉產生亞硝酸。亞硝酸烷基酯可為(例如)亞硝酸甲酯、亞硝酸乙酯、亞硝酸丙酯、亞硝酸丁酯或亞硝酸異戊酯。 Another convenient synthesis of hydrazine is the nitrosation of "active" methylene groups with nitrous acid or alkyl nitrite. Basic conditions (as described, for example, in Organic Syntheses coll., Volume VI (J. Wiley & Sons, New York, 1988), pages 199 and 840) and acidic conditions (eg, for example, Organic Synthesis coll Volume V, pages 32 and 373, coll. Volume III, pages 191 and 513, coll. Volume II, pages 202, 204 and 363) It is suitable for the preparation of hydrazine used as a starting material in the present invention. Nitrous acid is generally produced from sodium nitrite. The alkyl nitrite can be, for example, methyl nitrite, ethyl nitrite, propyl nitrite, butyl nitrite or isoamyl nitrite.

本發明另一實施例是游離式(1A)肟化合物 ,其中其中R1、R2、R3、R4、R5、R6、R7及R8彼此獨立地為氫、C1-C20烷基、、COR16、OR17、鹵素、NO2或是由式(3)所表示的基團、 或R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8彼此獨立地為經取代之C2-C10烯基;或R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8彼此獨立地共同為-(CH2)p-Y-(CH2)q-; 或R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8彼此獨立地共同為式(5)所表示的基團、 但條件為R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8中之至少一對是由式(5)所表示的基團、 R9、R10、R11及R12彼此獨立地為氫、C1-C20烷基,該C1-C20烷基是未經取代或經一或多個以下基團取代:鹵素、苯基、CN、OH、SH、C1-C4-烷氧基、-(CO)OH或-(CO)O-(C1-C4烷基);或R9、R10、R11及R12彼此獨立地為未經取代之苯基或經一或多個以下基團取代之苯基:C1-C6烷基、鹵素、CN、OR17、SR18或NR19R20;或R9、R10、R11及R12彼此獨立地為鹵素、CN、OR17、SR18、SOR18、SO2R18或NR19R20,其中該等取代基OR17、SR18或NR19R20視情況經由該等基團R17、R18、R19及/或R20與萘基環中一個碳原子形成5員或6員環;或R9、R10、R11及R12彼此獨立地為、COR16或NO2;Y 表示O、S、NR26或直接鍵; p 表示0、1、2或3之整數;q 表示1、2或3之整數;X 表示CO或直接鍵;R13表示C1-C20烷基,其是未經取代或經一或多個以下基團取代:鹵素、R17、COOR17、OR17、SR18、CONR19R20、NR19R20、PO(OCkH2k+1)2或是式(6)所表示的基團、 或R13表示C2-C20烷基,其間雜有一或多個O、S、SO、SO2、NR26或CO,或是C2-C12烯基,其是未經間雜或間雜有一或多個O、CO或NR26,其中該經間雜之C2-C20烷基及該未經間雜或經間雜之C2-C12烯基是未經取代或經一或多個鹵素取代;或R13表示C4-C8環烯基、C2-C12炔基或未經間雜或間雜有一或多個O、S、CO或NR26之C3-C10環烷基;或R13表示苯基或萘基,其各為未經取代或經一或多個以下基團取代:OR17、SR18、NR19R20、COR16、CN、NO2、鹵素、C1-C20烷基、C1-C4鹵代烷基、間雜有一或多個O、S、CO或NR26之C2-C20烷基;或其各經C3-C10環烷基或間雜有一或多個O、S、CO或NR26之C3-C10環烷基取代;k表示1至10之整數;R15表示C6-C20芳基或C3-C20雜芳基,其各是未經取代或經 一或多個以下基團取代:苯基、鹵素、C1-C4鹵代烷基、CN、NO2、OR17、SR18、NR19R20、PO(OCkH2k+1)2、SO-C1-C10烷基、SO2-C1-C10烷基、間雜有一或多個O、S或NR26之C2-C20烷基;或其各經C1-C20烷基取代,該C1-C20烷基是未經取代或經一或多個以下基團取代:鹵素、COOR17、CONR19R20、苯基、C3-C8環烷基、C3-C20雜芳基、C6-C20芳氧基羰基、C3-C20雜芳氧基羰基、OR17、SR18或NR19R20;或R15表示氫、C2-C12烯基、C3-C8環烷基,其未經間雜或間雜有一或多個O、CO或NR26;或R15表示C1-C20烷基,其是未經取代或經一或多個以下基團取代:鹵素、OR17、SR18、C3-C8環烷基、C3-C20雜芳基、C6-C20芳氧基羰基、C3-C20雜芳氧基羰基、NR19R20、COOR17、CONR19R20、PO(OCkH2k+1)2、苯基、或式(6)所表示的基團;或該C1-C20烷基是經苯基取代,該苯基是經鹵素、C1-C20烷基、C1-C4鹵代烷基、OR17、SR18或NR19R20取代;或R15表示C2-C20烷基,其間雜有一或多個O、SO或SO2,且該經間雜之C2-C20烷基是未經取代或經一或多個以下基團取代:鹵素、OR17、COOR17、CONR19R20、苯基或經OR17、SR18或NR19R20取代之苯基;或R15表示C2-C20烷醯基或苯甲醯基,其是未經取代或經一 或多個以下基團取代:C1-C6烷基、鹵素、苯基、OR17、SR18或NR19R20;或R15表示未經取代或經一或多個OR17取代之萘甲醯基或是C3-C14雜芳基羰基;或R15表示C2-C12烷氧基羰基,其是未經間雜或間雜有一或多個O且該經間雜或未經間雜之C2-C12烷氧基羰基是未經取代或經一或多個羥基取代;或R15表示苯氧基羰基,其是未經取代或經一或多個以下基團取代:C1-C6烷基、鹵素、C1-C4鹵代烷基、苯基、OR17、SR18或NR19R20;或R15表示CN、CONR19R20、NO2、C1-C4鹵代烷基、S(O)m-C1-C6烷基、未經取代或經C1-C12烷基或SO2-C1-C6烷基取代之S(O)m-苯基;或R15表示SO2O-苯基,其是未經取代或經C1-C12烷基取代;或是二苯基膦醯基或二-(C1-C4烷氧基)-膦醯基;m表示1或2;R'15具有針對R15所給出含義中之一者;X1表示O、S、SO或SO2;X2表示O、CO、S或直接鍵;R16表示C6-C20芳基或C3-C20雜芳基,其各是未經取代或經一或多個以下基團取代:苯基、鹵素、C1-C4鹵代烷基、CN、NO2、OR17、SR18、NR19R20或間雜有一或多個O、S或NR26之C1-C20 烷基;或其各經一或多個C1-C20烷基取代,該C1-C20烷基是未經取代或經一或多個以下基團取代:鹵素、COOR17、CONR19R20、苯基、C3-C8環烷基、C3-C20雜芳基、C6-C20芳氧基羰基、C3-C20雜芳氧基羰基、OR17、SR18或NR19R20;或R16表示氫、C1-C20烷基,該C1-C20烷基是未經取代或經一或多個以下基團取代:鹵素、苯基、OH、SH、CN、C3-C6烯氧基、OCH2CH2CN、OCH2CH2(CO)O(C1-C4)烷基、O(CO)-(C1-C4烷基)、O(CO)-苯基、(CO)OH或(CO)O(C1-C4烷基);或R16表示C2-C12烷基,其間雜有一或多個O、S或NR26;或R16表示(CH2CH2O)n+1H、(CH2CH2O)n(CO)-(C1-C8烷基)、C2-C12烯基或C3-C8環烷基;或R16表示經SR18取代之苯基,其中該基團R18表示鍵結至該COR16基團所附接之該咔唑部分之該苯基或萘基環的直接鍵;n表示1至20;R17表示氫、苯基-C1-C3烷基、C1-C20烷基,其是未經取代或經一或多個以下基團取代:鹵素、OH、SH、CN、C3-C6烯氧基、OCH2CH2CN、OCH2CH2(CO)O(C1-C4烷基)、O(CO)-(C1-C4烷基)、O(CO)-(C2-C4)烯基、O(CO)-苯基、(CO)OH、(CO)O(C1-C4烷基)、C3-C20環烷基、SO2-(C1-C4鹵代烷基)、O(C1-C4鹵代烷基)或間雜有一或多個O之C3-C20環烷基;或R17表示C2-C26烷基,其間雜有一或多個O、S或NR26;或R17表示(CH2CH2O)n+1H、(CH2CH2O)n(CO)-(C1-C8烷基)、 C1-C8烷醯基、C2-C12烯基、C3-C6烯醯基或未經間雜或間雜有一或多個O、S、CO或NR26之C3-C20環烷基;或R17表示C1-C8烷基-C3-C10環烷基,其是未經間雜或間雜有一或多個O;或R17表示苯甲醯基,其是未經取代或經一或多個C1-C6烷基、鹵素、OH或C1-C3烷氧基取代;或R17表示苯基、萘基或C3-C20雜芳基,其各是未經取代或經一或多個以下基團取代:鹵素、OH、C1-C12烷基、C1-C12烷氧基、CN、NO2、苯基-C1-C3烷氧基、苯氧基、C1-C12烷基硫基、苯基硫基、N(C1-C12烷基)2、二苯基-胺基或;或R17形成鍵結至其上具有基團、之苯基或萘基環之其中一個碳原子的直接鍵;R18表示氫、C2-C12烯基、C3-C20環烷基或苯基-C1-C3烷基,其中該C2-C12烯基、C3-C20環烷基或苯基-C1-C3烷基是未經間雜或間雜有一或多個O、S、CO、NR26或COOR17;或R18是C1-C20烷基,其是未經取代或經一或多個以下基團取代:OH、SH、CN、C3-C6烯氧基、OCH2CH2CN、OCH2CH2(CO)O(C1-C4烷基)、O(CO)-(C2-C4)烯基、O(CO)-(C1-C4烷基)、O(CO)-苯基或(CO)OR17; 或R18表示C2-C20烷基,其間雜有一或多個O、S、CO、NR26或COOR17;或R18表示(CH2CH2O)nH、(CH2CH2O)n(CO)-(C1-C8烷基)、C2-C8烷醯基或C3-C6烯醯基;或R18表示苯甲醯基,其是未經取代或經一或多個以下基團取代:C1-C6烷基、鹵素、OH、C1-C4烷氧基或C1-C4烷基硫基;或R18表示苯基、萘基或C3-C20雜芳基,其各是未經取代或經一或多個以下基團取代:鹵素、C1-C12烷基、C1-C4鹵代烷基、C1-C12烷氧基、CN、NO2、苯基-C1-C3烷氧基、苯氧基、C1-C12烷基硫基、苯基硫基、N(C1-C12烷基)2、二苯基胺基、(CO)O(C1-C8烷基)、(CO)-C1-C8烷基、(CO)N(C1-C8烷基)2;R19及R20彼此獨立地為氫、C1-C20烷基、C2-C4羥基烷基、C2-C10烷氧基烷基、C2-C5烯基、C3-C20環烷基、苯基-C1-C3烷基、C1-C8烷醯基、C1-C8烷醯基氧基、C3-C12烯醯基、SO2-(C1-C4鹵代烷基)或苯甲醯基;或R19及R20表示苯基、萘基或C3-C20雜芳基,其各是未經取代或經一或多個以下基團取代:鹵素、C1-C4鹵代烷基、C1-C20烷氧基、C1-C12烷基、苯甲醯基或C1-C12烷氧基;或R19及R20與其所附接之N原子一起形成未經間雜或間雜有O、S或NR17之5員或6員飽和或不飽和環,且該5員或6員飽和或不飽和環是未經取代或經一或多個以下基團取代:C1-C20 烷基、C1-C20烷氧基、=O、OR17、SR18、NR21R22、(CO)R23、NO2、鹵素、C1-C4-鹵代烷基、CN、苯基、或未經間雜或間雜有一或多個O、S、CO或NR17之C3-C20環烷基;或R19及R20與其所附接之N原子一起形成雜芳香族環系統,該環系統是未經取代或經一或多個以下基團取代:C1-C20烷基、C1-C4鹵代烷基、C1-C20烷氧基、=O、OR17、SR18、NR21R22、(CO)R23、鹵素、NO2、CN、苯基或未經間雜或間雜有一或多個O、S、CO或NR17之C3-C20環烷基;R21及R22彼此獨立地為氫、C1-C20烷基、C1-C4鹵代烷基、C3-C10環烷基或苯基;或R21及R22與其所附接之N原子一起形成未經間雜或間雜有O、S或NR26之5員或6員飽和或不飽和環,且該5員或6員飽和或不飽和環是未稠合或該5員或6員飽和或不飽和環與苯環稠合;R23表示氫、OH、C1-C20烷基、C1-C4鹵代烷基、間雜有一或多個O、CO或NR26之C2-C20烷基、未經間雜或間雜有O、S、CO或NR26之C3-C20環烷基;或R23表示苯基、萘基、苯基-C1-C4烷基、OR17、SR18或NR21R22;R24表示(CO)OR17、CONR19R20、(CO)R17;或R24具有針對 R19及R20所給出含義中之一者;R25表示COOR17、CONR19R20、(CO)R17;或R25具有針對R17所給出含義中之一者;R26表示氫、C1-C20烷基、C1-C4鹵代烷基、C2-C20烷基,其間雜有一或多個O或CO;或是苯基-C1-C4烷基、C3-C8環烷基,其是未經間雜或間雜有一或多個O或CO;或是(CO)R19;或是苯基,其是未經取代或經一或多個以下基團取代:C1-C20烷基、鹵素、C1-C4鹵代烷基、OR17、SR18、NR19R20 但條件為在該分子中存在至少一個基團 Another embodiment of the invention is a free (1A) hydrazine compound Wherein R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 and R 8 are each independently hydrogen, C 1 -C 20 alkyl, , COR 16 , OR 17 , halogen, NO 2 or a group represented by the formula (3), Or R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 are each independently Substituted C 2 -C 10 alkenyl; or R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 are independently of each other Is -(CH 2 ) p -Y-(CH 2 ) q -; or R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 And R 8 independently of each other are a group represented by the formula (5), However, the condition is that at least one of R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 is represented by the formula (5) Represented group, R 9, R 10, R 11 and R 12 are independently hydrogen, C 1 -C 20 alkyl, C 1 -C 20 alkyl which is unsubstituted or substituted with one or more of the following groups to one another: halo, Phenyl, CN, OH, SH, C 1 -C 4 -alkoxy, -(CO)OH or -(CO)O-(C 1 -C 4 alkyl); or R 9 , R 10 , R 11 And R 12 are, independently of each other, an unsubstituted phenyl group or a phenyl group substituted with one or more of the following groups: C 1 -C 6 alkyl, halogen, CN, OR 17 , SR 18 or NR 19 R 20 ; Or R 9 , R 10 , R 11 and R 12 are, independently of each other, halogen, CN, OR 17 , SR 18 , SOR 18 , SO 2 R 18 or NR 19 R 20 , wherein the substituents OR 17 , SR 18 or NR 19 R 20 optionally forms a 5- or 6-membered ring with one of the carbon atoms of the naphthyl ring via the groups R 17 , R 18 , R 19 and/or R 20 ; or R 9 , R 10 , R 11 and R 12 is independent of each other , COR 16 or NO 2 ; Y represents O, S, NR 26 or a direct bond; p represents an integer of 0, 1, 2 or 3; q represents an integer of 1, 2 or 3; X represents CO or a direct bond; R 13 Represents a C 1 -C 20 alkyl group which is unsubstituted or substituted with one or more of the following groups: halogen, R 17 , COOR 17 , OR 17 , SR 18 , CONR 19 R 20 , NR 19 R 20 , PO (OC k H 2k+1 ) 2 or a group represented by the formula (6), Or R 13 represents a C 2 -C 20 alkyl group, interspersed with one or more of O, S, SO, SO 2 , NR 26 or CO, or a C 2 -C 12 alkenyl group which is unintercalated or heterozygous Or a plurality of O, CO or NR 26 , wherein the inter-hetero C 2 -C 20 alkyl group and the unmeta- or inter-hetero C 2 -C 12 alkenyl group are unsubstituted or substituted by one or more halogens Or R 13 represents a C 4 -C 8 cycloalkenyl group, a C 2 -C 12 alkynyl group or a C 3 -C 10 cycloalkyl group having one or more O, S, CO or NR 26 without inter or hetero-hetero; or R 13 represents a phenyl or naphthyl group, each of which is unsubstituted or substituted with one or more of the following groups: OR 17 , SR 18 , NR 19 R 20 , , COR 16, CN, NO 2 , halogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, interrupted by one or more O, S, CO or NR C 26 of 2 -C 20 alkyl group; or via their respective C 3 -C 10 cycloalkyl, or interrupted by one or more O, S, CO or NR 26 of the C 3 -C 10 cycloalkyl; K represents an integer of from 1 to 10; R 15 represents a C 6 - a C 20 aryl or C 3 -C 20 heteroaryl group, each of which is unsubstituted or substituted with one or more of the following groups: phenyl, halo, C 1 -C 4 haloalkyl, CN, NO 2 , OR 17 , SR 18 , NR 19 R 20 , PO(OC k H 2k+1 ) 2 , SO-C 1 -C 10 alkyl, SO 2 -C 1 -C 10 alkyl, hetero or one or more O, S or NR C 26 of 2 -C 20 alkyl group; or each warp substituted C 1 -C 20 alkyl, C 1 -C 20 alkyl which is unsubstituted or substituted with one or more of the following groups: halo, COOR 17 , CONR 19 R 20 , phenyl, C 3 -C 8 cycloalkyl, C 3 -C 20 heteroaryl, C 6 -C 20 aryloxycarbonyl, C 3 -C 20 heteroaryloxycarbonyl, OR 17 , SR 18 or NR 19 R 20 ; or R 15 represents hydrogen, C 2 -C 12 alkenyl, C 3 -C 8 cycloalkyl, which has no or hetero or one or more O, CO or NR 26 ; or R 15 represents C 1 -C 20 Group, which is unsubstituted or substituted with one or more of the following groups: halo, OR 17, SR 18, C 3 -C 8 cycloalkyl, C 3 -C 20 heteroaryl, C 6 -C 20 aryl Oxycarbonyl, C 3 -C 20 heteroaryloxycarbonyl, NR 19 R 20 , COOR 17 , CONR 19 R 20 , PO(OC k H 2k+1 ) 2 , phenyl, Or a group represented by the formula (6) Or the C 1 -C 20 alkyl group is substituted by a phenyl group which is substituted by halogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, OR 17 , SR 18 or NR 19 R 20 Or R 15 represents a C 2 -C 20 alkyl group in which one or more O, SO or SO 2 are heterogeneous, and the interstitial C 2 -C 20 alkyl group is unsubstituted or has one or more of the following groups Group substitution: halogen, OR 17 , COOR 17 , CONR 19 R 20 , phenyl or phenyl substituted by OR 17 , SR 18 or NR 19 R 20 ; or R 15 represents C 2 -C 20 alkanoyl or benzoyl A thiol group which is unsubstituted or substituted with one or more of the following groups: C 1 -C 6 alkyl, halogen, phenyl, OR 17 , SR 18 or NR 19 R 20 ; or R 15 represents unsubstituted Or a naphthylmethyl group substituted by one or more OR 17 or a C 3 -C 14 heteroarylcarbonyl group; or R 15 represents a C 2 -C 12 alkoxycarbonyl group which is unintercalated or heterozygous one or more And the interstitial or unintercalated C 2 -C 12 alkoxycarbonyl group is unsubstituted or substituted with one or more hydroxyl groups; or R 15 represents a phenoxycarbonyl group which is unsubstituted or passed through a Or substituted by a plurality of groups: C 1 -C 6 alkyl, halogen, C 1 -C 4 haloalkane Base, phenyl, OR 17 , SR 18 or NR 19 R 20 ; or R 15 represents CN, CONR 19 R 20 , NO 2 , C 1 -C 4 haloalkyl, S(O) m -C 1 -C 6 alkane a S(O) m -phenyl group which is unsubstituted or substituted with a C 1 -C 12 alkyl group or a SO 2 -C 1 -C 6 alkyl group; or R 15 represents a SO 2 O-phenyl group which is not Substituted or substituted by C 1 -C 12 alkyl; or diphenylphosphinyl or bis-(C 1 -C 4 alkoxy)-phosphonium; m represents 1 or 2; R' 15 has One of the meanings given by R 15 ; X 1 represents O, S, SO or SO 2 ; X 2 represents O, CO, S or a direct bond; R 16 represents a C 6 - C 20 aryl group or C 3 - C a 20 heteroaryl group, each of which is unsubstituted or substituted with one or more of the following groups: phenyl, halo, C 1 -C 4 haloalkyl, CN, NO 2 , OR 17 , SR 18 , NR 19 R 20 Or interscribing with one or more C 1 -C 20 alkyl groups of O, S or NR 26 ; or each of them substituted by one or more C 1 -C 20 alkyl groups, the C 1 -C 20 alkyl group being unsubstituted Or substituted by one or more of the following groups: halogen, COOR 17 , CONR 19 R 20 , phenyl, C 3 -C 8 cycloalkyl, C 3 -C 20 heteroaryl, C 6 -C 20 aryloxy Carbonyl, C 3 -C 20 heteroaryloxycarbonyl, OR 17, SR 18 or NR 19 R 20; or R 16 represents hydrogen, C 1 -C 20 alkyl, C 1 -C 20 alkyl which is unsubstituted or substituted with one or more of the following groups: halo, Phenyl, OH, SH, CN, C 3 -C 6 alkenyloxy, OCH 2 CH 2 CN, OCH 2 CH 2 (CO)O(C 1 -C 4 )alkyl, O(CO)-(C 1 -C 4 alkyl), O(CO)-phenyl, (CO)OH or (CO)O(C 1 -C 4 alkyl); or R 16 represents C 2 -C 12 alkyl, with one or a plurality of O, S or NR 26 ; or R 16 represents (CH 2 CH 2 O) n+1 H, (CH 2 CH 2 O) n (CO)-(C 1 -C 8 alkyl), C 2 - a C 12 alkenyl or C 3 -C 8 cycloalkyl group; or R 16 represents a phenyl group substituted with SR 18 , wherein the group R 18 represents a bond to the carbazole moiety to which the COR 16 group is attached a direct bond of the phenyl or naphthyl ring; n represents 1 to 20; R 17 represents hydrogen, phenyl-C 1 -C 3 alkyl, C 1 -C 20 alkyl, which is unsubstituted or subjected to one or Substituted by a plurality of groups: halogen, OH, SH, CN, C 3 -C 6 alkenyloxy, OCH 2 CH 2 CN, OCH 2 CH 2 (CO)O(C 1 -C 4 alkyl), O ( CO)-(C 1 -C 4 alkyl), O(CO)-(C 2 -C 4 )alkenyl, O(CO)-phenyl, (CO)OH, (CO)O(C 1 -C 4 alkyl), C 3 -C 20 cycloalkyl , C 2 -(C 1 -C 4 haloalkyl), O(C 1 -C 4 haloalkyl) or a C 3 -C 20 cycloalkyl group having one or more O; or R 17 represents C 2 -C 26 An alkyl group having one or more O, S or NR 26 in between ; or R 17 represents (CH 2 CH 2 O) n+1 H, (CH 2 CH 2 O) n (CO)-(C 1 -C 8 alkyl), C 1 -C 8 alkanoyl group, C 2 -C 12 alkenyl, C 3 -C 6 alkenyl or acyl not interrupted or is interrupted by one or more O, S, CO or NR 26 C 3 of -C 20 cycloalkyl; or R 17 represents a C 1 -C 8 alkyl-C 3 -C 10 cycloalkyl group which is undoped or heterozygous with one or more O; or R 17 represents a benzamidine group, It is unsubstituted or substituted by one or more C 1 -C 6 alkyl, halogen, OH or C 1 -C 3 alkoxy; or R 17 represents phenyl, naphthyl or C 3 -C 20 heteroaryl a group, each of which is unsubstituted or substituted with one or more of the following groups: halogen, OH, C 1 -C 12 alkyl, C 1 -C 12 alkoxy, CN, NO 2 , phenyl-C 1 -C 3 alkoxy, phenoxy, C 1 -C 12 alkylthio, phenylthio, N(C 1 -C 12 alkyl) 2 , diphenyl-amine or Or R 17 forms a bond to have a group thereon, or a direct bond of one of the carbon atoms of the phenyl or naphthyl ring; R 18 represents hydrogen, C 2 -C 12 alkenyl, C 3 -C 20 cycloalkyl or phenyl-C 1 -C 3 alkyl, wherein The C 2 -C 12 alkenyl, C 3 -C 20 cycloalkyl or phenyl-C 1 -C 3 alkyl group is undoped or heterozygous with one or more O, S, CO, NR 26 or COOR 17 ; Or R 18 is C 1 -C 20 alkyl, which is unsubstituted or substituted with one or more of the following groups: OH, SH, CN, C 3 -C 6 alkenoxy, OCH 2 CH 2 CN, OCH 2 CH 2 (CO)O(C 1 -C 4 alkyl), O(CO)-(C 2 -C 4 )alkenyl, O(CO)-(C 1 -C 4 alkyl), O(CO -Phenyl or (CO)OR 17 ; or R 18 represents C 2 -C 20 alkyl with one or more O, S, CO, NR 26 or COOR 17 in between ; or R 18 represents (CH 2 CH 2 O) n H, (CH 2 CH 2 O) n (CO)-(C 1 -C 8 alkyl), C 2 -C 8 alkanoyl or C 3 -C 6 alkenyl; or R 18 represents benzene A fluorenyl group which is unsubstituted or substituted with one or more of the following groups: C 1 -C 6 alkyl, halogen, OH, C 1 -C 4 alkoxy or C 1 -C 4 alkylthio ; or R 18 represents phenyl, naphthyl or C 3 -C 20 heteroaryl, each of which is unsubstituted or substituted with one or more of the following groups Halogen, C 1 -C 12 alkyl, C 1 -C 4 haloalkyl, C 1 -C 12 alkoxy, CN, NO 2, phenyl -C 1 -C 3 alkoxy, phenoxy groups, C 1 -C 12 alkylthio, phenylthio, N(C 1 -C 12 alkyl) 2 , diphenylamino, (CO)O(C 1 -C 8 alkyl), (CO)-C 1 -C 8 alkyl, (CO)N(C 1 -C 8 alkyl) 2 or R 19 and R 20 are each independently hydrogen, C 1 -C 20 alkyl, C 2 -C 4 hydroxyalkyl, C 2 -C 10 alkoxyalkyl, C 2 -C 5 alkenyl, C 3 -C 20 cycloalkyl, phenyl-C 1 -C 3 alkyl, C 1 -C 8 alkanoyl, C 1 -C 8 alkenyloxy, C 3 -C 12 olefinyl, SO 2 - (C 1 -C 4 haloalkyl) or benzhydryl; or R 19 and R 20 represent phenyl, naphthyl or C 3 -C 20 heteroaryl, each of which is unsubstituted or one or more of the following Group substitution: halogen, C 1 -C 4 haloalkyl, C 1 -C 20 alkoxy, C 1 -C 12 alkyl, benzhydryl or C 1 -C 12 alkoxy; or R 19 and R 20 together with the N atom to which it is attached, forms a 5- or 6-membered saturated or unsaturated ring which is unintermixed or intermixed with O, S or NR 17 , and the 5 or 6 member saturated or unsaturated ring is unsubstituted Or substituted by one or more of the following groups: C 1 -C 20 alkyl, C 1 -C 20 alkoxy, =0, OR 17 , SR 18 , NR 21 R 22 , (CO)R 23 , NO 2 , halogen, C 1 -C 4 -haloalkyl, CN, phenyl, Or a C 3 -C 20 cycloalkyl group having one or more O, S, CO or NR 17 without intermixing or intermixing; or R 19 and R 20 together with the N atom to which they are attached form a heteroaromatic ring system, The ring system is unsubstituted or substituted with one or more of the following groups: C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, C 1 -C 20 alkoxy, =0, OR 17 , SR 18 , NR 21 R 22 , (CO)R 23 , , halogen, NO 2 , CN, phenyl or a C 3 -C 20 cycloalkyl group having one or more O, S, CO or NR 17 without inter or hetero or hetero; R 21 and R 22 are each independently hydrogen, C a 1- C 20 alkyl group, a C 1 -C 4 haloalkyl group, a C 3 -C 10 cycloalkyl group or a phenyl group; or R 21 and R 22 together with the N atom to which they are attached form an unintermixed or intervening O, S or NR 26 of 5 or 6 members of a saturated or unsaturated ring, and the 5 or 6 membered saturated or unsaturated ring is unfused or the 5 or 6 membered saturated or unsaturated ring is fused to the benzene ring; R 23 represents hydrogen, OH, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, hetero or one or more O, CO or C 2 -C 20 alkyl of NR 26 , uninter or hetero-O a C 3 -C 20 cycloalkyl group of S, CO or NR 26 ; or R 23 represents phenyl, naphthyl, phenyl-C 1 -C 4 alkyl, OR 17 , SR 18 or NR 21 R 22 ; 24 represents (CO)OR 17 , CONR 19 R 20 , (CO)R 17 ; or R 24 has one of the meanings given for R 19 and R 20 ; R 25 represents COOR 17 , CONR 19 R 20 , ( CO.'s) R 17; or R 25 R 17 Suo for having one of the meanings given by; R 26 represents hydrogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, C 2 -C 20 Group, a heteroaryl therebetween or more O or CO; or phenyl -C 1 -C 4 alkyl, C 3 -C 8 cycloalkyl which is interrupted or not interrupted by one or more O or CO; or Is (CO)R 19 ; or a phenyl group which is unsubstituted or substituted with one or more of the following groups: C 1 -C 20 alkyl, halogen, C 1 -C 4 haloalkyl, OR 17 , SR 18 , NR 19 R 20 , But the condition is that at least one group is present in the molecule

針對式(1A)化合物所定義基團之較佳者對應於如針對如上文所給出式(1)化合物給出者,只是每一所定義肟酯基團(例如)皆替換為相應游離肟基團Preferred for the group defined by the compound of formula (1A) corresponds to that given for the compound of formula (1) as given above, except for each of the defined oxime ester groups (eg Are replaced by corresponding free sulfonium groups .

每一肟酯基團可以兩種構型(Z)或(E)存在。可藉由習用方法來分離異構體,但亦可使用異構體混合物作為(例如)光起始物質。因此,本發明亦是關於式(1)化合物之構型異構體之混合物。 Each oxime ester group can exist in two configurations (Z) or (E). The isomers can be separated by conventional methods, but a mixture of isomers can also be used as, for example, a photoinitiator. Accordingly, the present invention is also directed to a mixture of configurational isomers of the compound of formula (1).

較佳者是如上文所定義之式(1)化合物,其中R1、R2、R3、R4、R5、R6、R7及R8彼此獨立地為氫、C1-C20烷基、COR16、NO2或式(2)所表示的基團 或R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8彼此獨立地共同為式(5)所表示的基團 但條件為R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8中之至少一對是由式(5)所表示的基團 X 表示CO或直接鍵;R13表示C1-C20烷基,其是未經取代或經一或多個以下基團取代:鹵素、COOR17、OR17、SR18、CONR19R20、PO(OCkH2k+1)2;或R13表示C2-C20烷基,其間雜有一或多個O、S、NR26或CO;或R13表示苯基或萘基,此二者未經取代或經一或多個COR16所取代;R14表示C1-C20烷基、苯基或C1-C8烷氧基;R15表示苯基、萘基、C3-C20雜芳基,其各未經取代或經一或 多個以下基團取代:苯基、鹵素、C1-C4鹵代烷基、OR17、SR18或C2-C20烷基,其間雜有一或多個O或S;或其各經一或多個C1-C20烷基取代,該C1-C20烷基未經取代或經一或多個以下基團取代:鹵素、COOR17、CONR19R20、苯基、C3-C8環烷基、C3-C20雜芳基、C6-C20芳氧基羰基、C4-C20雜芳氧基羰基、OR17、SR18、NR19R20或PO(OCkH2k+1)2;或R15表示C1-C20烷基,其未經取代或經一或多個以下基團取代:OR17、SR18、C3-C8環烷基、C3-C20雜芳基、NR19R20、COOR17、CONR19R20或PO(OCkH2k+1)2;R'14具有針對R14所給出含義中之一者;R'15具有針對R15所給出含義中之一者;R16表示苯基,其未經取代或經一或多個以下基團取代:OR17、SR18、NR19R20或間雜有一或多個O、S或NR26之C2-C20烷基,或R16表示苯基,其經一或多個C1-C20烷基取代,該C1-C20烷基未經取代或經一或多個以下基團取代:鹵素、COOR17、CONR19R20、苯基、C3-C8環烷基、C3-C20雜芳基、C6-C20芳氧基羰基、C4-C20雜芳氧基羰基、OR17、SR18或NR19R20;或R16表示C1-C20烷基,其未經取代或經以下基團取代:鹵素、苯基、OH、SH、CN、C3-C6烯氧基、OCH2CH2(CO)O(C1-C4烷基)、O(CO)-(C1-C4烷基)或(CO)O(C1-C4烷基);R17表示C1-C20烷基,其未經取代或經一或多個以下基團取代:鹵素、OCH2CH2(CO)O(C1-C4烷基)、O(C1-C4烷基)、(CO)O(C1-C4 烷基)、C3-C20環烷基或間雜有一或多個O之C3-C20環烷基;或R17表示C2-C20烷基,其間雜有一或多個O;R18表示經(CO)OR17取代之甲基;R19及R20彼此獨立地為氫、苯基、C1-C20烷基、C1-C8烷醯基或C1-C8烷醯基氧基;或R19及R20與其所附接之N原子一起形成雜芳香族環系統,該環系統未經取代或經取代;但條件為在該分子中存在至少一個式(2)所表示的基團或是式(7)所表示的基團、 Preferable is a compound of the formula (1) as defined above, wherein R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 and R 8 are each independently hydrogen, C 1 -C 20 Alkyl group, COR 16 , NO 2 or a group represented by formula (2) Or R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 are each independently a group represented by the formula (5) However, the condition is that at least one of R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 is represented by the formula (5) Represented group X represents CO or a direct bond; R 13 represents a C 1 -C 20 alkyl group which is unsubstituted or substituted with one or more of the following groups: halogen, COOR 17 , OR 17 , SR 18 , CONR 19 R 20 , PO(OC k H 2k+1 ) 2 ; or R 13 represents a C 2 -C 20 alkyl group with one or more of O, S, NR 26 or CO interposed therebetween; or R 13 represents a phenyl or naphthyl group, Unsubstituted or via one or more COR 16 or Substituted; R 14 represents C 1 -C 20 alkyl, phenyl or C 1 -C 8 alkoxy; R 15 represents phenyl, naphthyl, C 3 -C 20 heteroaryl, each unsubstituted or Substituted by one or more of the following groups: phenyl, halo, C 1 -C 4 haloalkyl, OR 17 , SR 18 or C 2 -C 20 alkyl, interspersed with one or more O or S; or each Substituted by one or more C 1 -C 20 alkyl groups, the C 1 -C 20 alkyl group is unsubstituted or substituted with one or more of the following groups: halogen, COOR 17 , CONR 19 R 20 , phenyl, C 3- C 8 cycloalkyl, C 3 -C 20 heteroaryl, C 6 -C 20 aryloxycarbonyl, C 4 -C 20 heteroaryloxycarbonyl, OR 17 , SR 18 , NR 19 R 20 or PO (OC k H 2k+1 ) 2 ; or R 15 represents a C 1 -C 20 alkyl group which is unsubstituted or substituted with one or more of the following groups: OR 17 , SR 18 , C 3 -C 8 naphthenic a group, a C 3 -C 20 heteroaryl group, NR 19 R 20 , COOR 17 , CONR 19 R 20 or PO(OC k H 2k+1 ) 2 ; R' 14 has one of the meanings given for R 14 ; R '15 has the meanings for R 15 Suo one of those given; R 16 represents phenyl, which is unsubstituted or substituted with one or more of the following groups: oR 17, SR 18, NR 19 R 20 or a heterocyclic one or more C 2 -C 20 alkyl groups of O, S or NR 26 or R 16 represents a phenyl group substituted by one or more C 1 -C 20 alkyl groups, the C 1 -C 20 alkyl is unsubstituted or substituted with one or more of the following groups: halogen, COOR 17 , CONR 19 R 20 , phenyl, C 3 -C 8 cycloalkyl, C 3 -C 20 heteroaryl, C 6 -C 20 aryloxycarbonyl, C 4 -C 20 heteroaryloxycarbonyl, OR 17 , SR 18 or NR 19 R 20 ; or R 16 represents C 1 -C 20 alkyl, unsubstituted or via Group substitution: halogen, phenyl, OH, SH, CN, C 3 -C 6 alkenyloxy, OCH 2 CH 2 (CO)O(C 1 -C 4 alkyl), O(CO)-(C 1 - C 4 alkyl) or (CO)O(C 1 -C 4 alkyl); R 17 represents C 1 -C 20 alkyl, which is unsubstituted or substituted with one or more of the following groups: halogen, OCH 2 CH 2 (CO)O(C 1 -C 4 alkyl), O(C 1 -C 4 alkyl), (CO)O(C 1 -C 4 alkyl), C 3 -C 20 cycloalkyl or a C 3 -C 20 cycloalkyl group having one or more O; or R 17 representing a C 2 -C 20 alkyl group having one or more O in between; R 18 representing a methyl group substituted with (CO)OR 17 ; R 19 and R 20 are each independently hydrogen, phenyl, C 1 -C 20 alkyl, C 1 -C 8 alkanoyl or C 1 -C 8 alkenyloxy; or R 19 and R 20 together with the N atom to which they are attached form a heteroaromatic ring system which is unsubstituted or Substituting; however, the condition is that at least one group represented by the formula (2) or a group represented by the formula (7) is present in the molecule,

必須重視如上文所定義之式(1)化合物,其中R1、R2、R5、R6、R7及R8彼此獨立地為氫、COR16NO2或式(2)所表示的基團、 R3及R4一起為式(5)所表示的基團 R9、R10、R11及R12表示氫 X表示直接鍵;R13表示C1-C20烷基;R14表示C1-C20烷基;R15表示C1-C20烷基或苯基,其經一或多個OR17或C1-C20烷基取代;R16表示苯基,其經一或多個C1-C20烷基或OR17取代;且R17表示未經取代或經一或多個鹵素取代之C1-C20烷基或是間雜有一或多個O之C2-C20烷基。 It is necessary to pay attention to the compound of the formula (1) as defined above, wherein R 1 , R 2 , R 5 , R 6 , R 7 and R 8 are each independently hydrogen, COR 16 NO 2 or a group represented by the formula (2) group, R 3 and R 4 together are a group represented by the formula (5) R 9 , R 10 , R 11 and R 12 represent hydrogen X represents a direct bond; R 13 represents a C 1 -C 20 alkyl group; R 14 represents a C 1 -C 20 alkyl group; and R 15 represents a C 1 -C 20 alkyl group. Or a phenyl group substituted with one or more OR 17 or C 1 -C 20 alkyl groups; R 16 represents a phenyl group substituted with one or more C 1 -C 20 alkyl groups or OR 17 ; and R 17 represents unsubstituted or substituted with one or more of halogen or C 1 -C 20 alkyl interrupted by one or more O of C 2 -C 20 alkyl group.

但條件為在該分子中存在至少一個由式(2)所表示的基團 Provided that at least one group represented by formula (2) is present in the molecule

本發明之標的進一步是如上文所定義之式(1)化合物,其中R1、R2、R3、R4、R5、R6、R7及R8彼此獨立地為氫,或R1及R2、R3及R4或R5及R6彼此獨立地共同為式(5)所表示的基團、 但條件為R1及R2、R3及R4或R5及R6中至少一對為式(5)所表示的基團、 或R2為式(2)所表示的基團、COR16、NO2或是由式(3)所表示 的基團、 或R7為COR16或式(2)所表示的基團、 R9、R11及R12表示氫;R10表示氫、OR17或COR16;X表示CO或直接鍵;R13表示C1-C20烷基,其未經取代或經一或多個以下基團取代:鹵素、R17、OR17、SR18或PO(OCkH2k+1)2;或R13表示C2-C20烷基,其間雜有一或多個O;或R13表示苯基; k表示2的整數;R14表示C1-C20烷基或噻吩基;R15表示苯基或萘基,其各未經取代或經一或多個OR17或C1-C20烷基取代;或R15表示噻吩基、氫、C1-C20烷基,該C1-C20烷基未經取代或經一或多個以下基團取代:OR17、SR18、C3-C8環烷基、NR19R20或COOR17;或R15表示C2-C20烷基,其間雜有SO2;R16表示苯基或萘基,其各未經取代或經一或多個以下基團取代:OR17、SR18、NR19R20或C1-C20烷基;或R16表示噻吩基;R17表示氫、C1-C8烷醯基、C1-C20烷基,其未經取代或經一或多個以下基團:鹵素、O(CO)-(C1-C4烷基)、O(CO)-(C2-C4)烯基或間雜有一或多個O之C3-C20環烷基;或R17表示C2-C20烷基,其間雜有一或多個O;R18表示C3-C20環烷基、C1-C20烷基,其未經取代或經一或多個OH、O(CO)-(C2-C4)烯基或(CO)OR17取代;或R18表示苯基,其未經取代或經一或多個鹵素取代;R19及R20彼此獨立地為C1-C8烷醯基或C1-C8烷醯基氧基;或R19及R20與其所附接之N原子一起形成間雜有O之5員或6員飽和環; 但條件為在該分子中存在至少一個式(2)所表示的基團 The subject matter of the invention is further a compound of formula (1) as defined above, wherein R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 and R 8 are each independently hydrogen, or R 1 And R 2 , R 3 and R 4 or R 5 and R 6 are each independently a group represented by the formula (5), However, the condition is that at least one of R 1 and R 2 , R 3 and R 4 or R 5 and R 6 is a group represented by the formula (5), Or R 2 is a group represented by the formula (2), COR 16 , NO 2 or a group represented by the formula (3), Or R 7 is a group represented by COR 16 or formula (2), R 9 , R 11 and R 12 represent hydrogen; R 10 represents hydrogen, OR 17 or COR 16 ; X represents CO or a direct bond; R 13 represents a C 1 -C 20 alkyl group which is unsubstituted or one or more Substituted by: halogen, R 17 , OR 17 , SR 18 or PO(OC k H 2k+1 ) 2 ; or R 13 represents C 2 -C 20 alkyl with one or more O; or R 13 Represents phenyl; k represents an integer of 2; R 14 represents C 1 -C 20 alkyl or thienyl; R 15 represents phenyl or naphthyl, each unsubstituted or via one or more OR 17 or C 1 - substituted C 20 alkyl group; or R 15 represents a thiophene group, hydrogen, C 1 -C 20 alkyl, C 1 -C 20 alkyl which is unsubstituted or substituted with one or more of the following groups: oR 17, SR 18 , C 3 -C 8 cycloalkyl, NR 19 R 20 or COOR 17 ; or R 15 represents C 2 -C 20 alkyl with intervening SO 2 ; R 16 represents phenyl or naphthyl, each unsubstituted Or substituted by one or more of the following groups: OR 17 , SR 18 , NR 19 R 20 or C 1 -C 20 alkyl; or R 16 represents thienyl; R 17 represents hydrogen, C 1 -C 8 alkanoyl a C 1 -C 20 alkyl group which is unsubstituted or has one or more of the following groups: halogen, O(CO)-(C 1 -C 4 alkyl), O(CO)-(C 2 -C 4 ) an alkenyl group or a C 3 -C 20 cycloalkyl group having one or more O; or R 17 represents a C 2 -C 20 alkyl group having one or more O in between; R 18 represents C 3 -C 20 cycloalkyl, C 1 -C 20 alkyl, unsubstituted or substituted by one or more OH, O(CO)-(C 2 -C 4 )alkenyl or (CO)OR 17 ; or R 18 a phenyl group which is unsubstituted or substituted by one or more halogens; R 19 and R 20 are each independently C 1 -C 8 alkanoyl or C 1 -C 8 alkenyloxy; or R 19 and R 20 together with the N atom to which it is attached forms a 5- or 6-membered saturated ring interspersed with O; provided that at least one group represented by formula (2) is present in the molecule

本發明化合物之實例是如上文所定義之式(Ia)-(Ig)化合物。式(Ia)、(Ib)、(Ic)、尤其式(Ia)或(Ic)、或式(Ia)、(Ic)或(Id)、尤其式(Ia)之化合物令人關注。 Examples of compounds of the invention are the compounds of formula (Ia)-(Ig) as defined above. Compounds of formula (Ia), (Ib), (Ic), especially formula (Ia) or (Ic), or formula (Ia), (Ic) or (Id), especially formula (Ia) are of interest.

舉例而言,R1、R2、R3、R4、R5、R6、R7及R8彼此獨立地為氫、COR16、由式(2)所表示的基團、或R1及R2、R2及R3、R3及R4或R5及R6、R6及R7、R7及R8彼此獨立地共同為式(5)所表示的基團、 For example, R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 and R 8 are each independently hydrogen, COR 16 , a group represented by formula (2), or R 1 And R 2 , R 2 and R 3 , R 3 and R 4 or R 5 and R 6 , R 6 and R 7 , R 7 and R 8 are each independently a group represented by the formula (5),

舉例而言,R3及R4或R1及R2共同為式(5)所表示的基團、 或R3及R4及R5及R6共同為式(5)所表示的基團、 R3及R4尤其共同為式(5)所表示的基團、 For example, R 3 and R 4 or R 1 and R 2 together are a group represented by the formula (5), Or R 3 and R 4 and R 5 and R 6 together are a group represented by the formula (5), R 3 and R 4 are in particular a group represented by the formula (5),

舉例而言,R1、R5、R6及R8表示氫。 For example, R 1 , R 5 , R 6 and R 8 represent hydrogen.

R7尤其為氫COR16或式(2)所表示的基團、 R 7 is especially a group represented by hydrogen COR 16 or formula (2),

或R7為COR16或式(2)所表示的基團,尤其為式(2)所表示的基團、 Or R 7 is a group represented by COR 16 or formula (2), particularly a group represented by formula (2),

R2尤其為COR16、式(2)所表示的基團或是由式(3)所表示的基團、 R 2 is especially a group represented by COR 16 , formula (2) or a group represented by formula (3),

或R2與R1一起為式(5)所表示的基團。R2尤其為COR16Or R 2 together with R 1 is a group represented by the formula (5). R 2 is especially COR 16 .

X較佳為直接鍵。 X is preferably a direct bond.

舉例而言,R9、R10、R11及R12彼此獨立地為氫、C1-C20烷基、未經取代之苯基或經一或多個以下基團取代之苯基:C1-C6烷基、鹵素、OR17或SR18;或R9、R10、R11及R12彼此獨立地為鹵素、OR17、SR18或NR19R20,其中取代基OR17、SR18或NR19R20視情況經由基團R17、R18、R19及/或R20與萘基環之一個碳原子形成5員或6員環;或R9、R10、R11及R12彼此獨立地為COR16或式(2)所表示的基團。 For example, R 9 , R 10 , R 11 and R 12 are, independently of each other, hydrogen, C 1 -C 20 alkyl, unsubstituted phenyl or phenyl substituted with one or more of the following groups: C 1 -C 6 alkyl, halogen, OR 17 or SR 18 ; or R 9 , R 10 , R 11 and R 12 are each independently halogen, OR 17 , SR 18 or NR 19 R 20 wherein the substituent OR 17 SR 18 or NR 19 R 20 optionally via a group R 17, R 18, R 19 and / or R 20 form a 5 or 6-membered ring with a carbon atom naphthyl ring; or R 9, R 10, R 11 And R 12 are each independently a group represented by COR 16 or formula (2).

具體而言,R9、R10、R11及R12彼此獨立地為氫、C1-C20烷基、未經取代之苯基或經一或多個以下基團取代之苯基:C1-C6烷基、鹵素、OR17或SR18;或R9、R10、R11 及R12彼此獨立地為鹵素、OR17、SR18或NR19R20;或R9、R10、R11及R12彼此獨立地為COR16或式(2)所表示的基團。 Specifically, R 9 , R 10 , R 11 and R 12 are each independently hydrogen, C 1 -C 20 alkyl, unsubstituted phenyl or phenyl substituted with one or more of the following groups: C 1 -C 6 alkyl, halogen, OR 17 or SR 18 ; or R 9 , R 10 , R 11 and R 12 are, independently of each other, halogen, OR 17 , SR 18 or NR 19 R 20 ; or R 9 , R 10 R 11 and R 12 are each independently a group represented by COR 16 or formula (2).

舉例而言,R9、R10、R11及R12彼此獨立地為氫、C1-C20烷基、未經取代之苯基或經一或多個C1-C6烷基取代之苯基;或R9、R10、R11及R12彼此獨立地為COR16或式(2)所表示的基團、 For example, R 9 , R 10 , R 11 and R 12 are, independently of each other, hydrogen, C 1 -C 20 alkyl, unsubstituted phenyl or substituted by one or more C 1 -C 6 alkyl groups. Phenyl group; or R 9 , R 10 , R 11 and R 12 are each independently a group represented by COR 16 or formula (2),

在另一實施例中,舉例而言,R9、R10、R11及R12彼此獨立地為氫、C1-C20烷基、未經取代之苯基或經一或多個以下基團取代之苯基:C1-C6烷基、鹵素、OR17或SR18;或R9、R10、R11及R12彼此獨立地為鹵素、OR17、SR18或NR19R20,其中取代基OR17、SR18或NR19R20視情況經由基團R17、R18、R19及/或R20與萘基環之一個碳原子形成5員或6員環。 In another embodiment, for example, R 9 , R 10 , R 11 and R 12 are, independently of each other, hydrogen, C 1 -C 20 alkyl, unsubstituted phenyl or one or more of the following groups a substituted phenyl group: C 1 -C 6 alkyl, halogen, OR 17 or SR 18 ; or R 9 , R 10 , R 11 and R 12 are each independently halogen, OR 17 , SR 18 or NR 19 R 20 Wherein the substituent OR 17 , SR 18 or NR 19 R 20 optionally forms a 5- or 6-membered ring via a group R 17 , R 18 , R 19 and/or R 20 with one carbon atom of the naphthyl ring.

此外,舉例而言,R9、R10、R11及R12彼此獨立地為氫、C1-C20烷基、未經取代之苯基或經一或多個以下基團取代之苯基:C1-C6烷基、鹵素、OR17或SR18,或R9、R10、 R11及R12彼此獨立地為鹵素、OR17、SR18、NR19R20或COR16Further, for example, R 9 , R 10 , R 11 and R 12 are each independently hydrogen, C 1 -C 20 alkyl, unsubstituted phenyl or phenyl substituted with one or more of the following groups :C 1 -C 6 alkyl, halogen, OR 17 or SR 18 , or R 9 , R 10 , R 11 and R 12 are, independently of each other, halogen, OR 17 , SR 18 , NR 19 R 20 or COR 16 .

或舉例而言,R9、R10、R11及R12彼此獨立地為氫、C1-C20烷基、未經取代之苯基或經一或多個以下基團取代之苯基:C1-C6烷基、鹵素、OR17或SR18,或R9、R10、R11及R12彼此獨立地為鹵素、OR17、COR16或NR19R20Or by way of example, R 9 , R 10 , R 11 and R 12 are, independently of each other, hydrogen, C 1 -C 20 alkyl, unsubstituted phenyl or phenyl substituted with one or more of the following groups: C 1 -C 6 alkyl, halogen, OR 17 or SR 18 , or R 9 , R 10 , R 11 and R 12 are each independently halogen, OR 17 , COR 16 or NR 19 R 20 .

較佳地,R9、R11及R12表示氫且R10表示氫、OR17或COR16Preferably, R 9 , R 11 and R 12 represent hydrogen and R 10 represents hydrogen, OR 17 or COR 16 .

R13表示(例如)C1-C20烷基,其未經取代或經一或多個以下基團取代:鹵素、COOR17或CONR19R20;或R13表示C2-C20烷基,其間雜有一或多個O、S、SO、SO2、NR26或CO,或是C2-C12烯基,其視情況間雜有一或多個O、CO或NR26,或R13表示C3-C10環烷基,其視情況間雜有一或多個O、S、CO、NR26,或R13表示苯基或萘基,此二者未經取代或經一或多個以下基團取代:OR17、SR18、NR19R20、COR16、NO2、鹵素、C1-C20烷基、C1-C4鹵代烷基、C2-C20烷基,其間雜有一或多個O、或式(7)表示的基團、 或是C1-C20烷基,其未經取代或經一或多個以下基團取代:鹵素、R17、COOR17、OR17、SR18、CONR19R20或PO(OCkH2k+1)2;或是C2-C20烷基,其間雜有一或多個O。 R 13 represents, for example, a C 1 -C 20 alkyl group which is unsubstituted or substituted with one or more of the following groups: halogen, COOR 17 or CONR 19 R 20 ; or R 13 represents C 2 -C 20 alkyl In the meantime, one or more of O, S, SO, SO2, NR 26 or CO, or a C 2 -C 12 alkenyl group, optionally having one or more O, CO or NR 26 or R 13 representing C 3 -C 10 cycloalkyl, which is optionally interrupted by one or more O, S, CO, NR 26 , or R 13 represents a phenyl or naphthyl group, both of which unsubstituted or substituted with one or more of the following groups Substitution: OR 17 , SR 18 , NR 19 R 20 , COR 16 , NO 2 , halogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, C 2 -C 20 alkyl, with one or more Or O, or a group represented by the formula (7), Or a C 1 -C 20 alkyl group which is unsubstituted or substituted with one or more of the following groups: halogen, R 17 , COOR 17 , OR 17 , SR 18 , CONR 19 R 20 or PO (OC k H 2k +1 ) 2 ; or a C 2 -C 20 alkyl group in which one or more O are heterogeneous.

此外,R13表示(例如)C1-C20烷基,其未經取代或 經一或多個以下基團取代:鹵素、R17、COOR17、OR17、SR18、CONR19R20或PO(OCkH2k+1)2;或是C2-C20烷基,其間雜有一或多個O;或是C2-C12烯基、C3-C10環烷基;或R13表示苯基或萘基,此二者未經取代或經一或多個以下基團取代:OR17、SR18、NR19R20、COR16、NO2、鹵素、C1-C20烷基、C1-C4鹵代烷基、C2-C20烷基,其間雜有一或多個O、或式(7)表示的基團、 Further, R 13 represents, for example, a C 1 -C 20 alkyl group which is unsubstituted or substituted with one or more of the following groups: halogen, R 17 , COOR 17 , OR 17 , SR 18 , CONR 19 R 20 or PO(OC k H 2k+1 ) 2 ; or a C 2 -C 20 alkyl group in which one or more O is hetero; or a C 2 -C 12 alkenyl group, a C 3 -C 10 cycloalkyl group; or R 13 represents a phenyl or naphthyl group which is unsubstituted or substituted with one or more of the following groups: OR 17 , SR 18 , NR 19 R 20 , COR 16 , NO 2 , halogen, C 1 -C 20 alkane a C 1 -C 4 haloalkyl group, a C 2 -C 20 alkyl group, having one or more O or a group represented by the formula (7)

在另一實施例中,R13表示(例如)C1-C20烷基,其未經取代或經一或多個以下基團取代:鹵素、R17、OR17、SR18或PO(OCkH2k+1)2;或是C2-C20烷基,其間雜有一或多個O;或是C2-C12烯基、C3-C10環烷基、苯基或萘基。 In another embodiment, R 13 represents, for example, C 1 -C 20 alkyl, which is unsubstituted or substituted with one or more of the following: halo, R 17 , OR 17 , SR 18 or PO (OC k H 2k+1 ) 2 ; or a C 2 -C 20 alkyl group in which one or more O is hetero; or a C 2 -C 12 alkenyl group, a C 3 -C 10 cycloalkyl group, a phenyl group or a naphthyl group; .

或R13表示(例如)C1-C20烷基,其未經取代或經一或多個以下基團取代:鹵素、R17、OR17、SR18或PO(OCkH2k+1)2;或是C2-C20烷基,其間雜有一或多個O;或是苯基、C2-C12烯基或C3-C10環烷基。 Or R 13 represents, for example, a C 1 -C 20 alkyl group which is unsubstituted or substituted with one or more of the following groups: halogen, R 17 , OR 17 , SR 18 or PO(OC k H 2k+1 ) 2 ; or a C 2 -C 20 alkyl group having one or more O; or a phenyl group, a C 2 -C 12 alkenyl group or a C 3 -C 10 cycloalkyl group.

或R13表示(例如)C1-C20烷基、苯基、C2-C12烯基或C3-C10環烷基。 Or R 13 represents, for example, a C 1 -C 20 alkyl group, a phenyl group, a C 2 -C 12 alkenyl group or a C 3 -C 10 cycloalkyl group.

或R13表示(例如)C1-C20烷基、C2-C12烯基或C3-C10環烷基。 Or R 13 represents, for example, a C 1 -C 20 alkyl group, a C 2 -C 12 alkenyl group or a C 3 -C 10 cycloalkyl group.

較佳地,R13表示C1-C20烷基,尤其為C1-C8烷基, 例如2-乙基己基。 Preferably, R 13 represents a C 1 -C 20 alkyl group, especially a C 1 -C 8 alkyl group, such as 2-ethylhexyl.

R14表示(例如)氫、C3-C8環烷基、C2-C5烯基、C1-C20烷氧基或C1-C20烷基,其未經取代或經一或多個鹵素或苯基取代;或R14表示苯基或萘基,此二者未經取代或經一或多個以下基團取代:C1-C6烷基、C1-C4鹵代烷基、鹵素、OR17、SR18及/或NR19R20;或R14表示C3-C5雜芳基,例如噻吩基,或是C1-C8烷氧基、苄氧基或苯氧基。 R 14 represents, for example, hydrogen, C 3 -C 8 cycloalkyl, C 2 -C 5 alkenyl, C 1 -C 20 alkoxy or C 1 -C 20 alkyl, which is unsubstituted or subjected to one or Multiple halogen or phenyl substituted; or R 14 represents phenyl or naphthyl, both unsubstituted or substituted by one or more of the following groups: C 1 -C 6 alkyl, C 1 -C 4 haloalkyl , halogen, OR 17 , SR 18 and/or NR 19 R 20 ; or R 14 represents a C 3 -C 5 heteroaryl group, for example a thienyl group, or a C 1 -C 8 alkoxy group, a benzyloxy group or a phenoxy group base.

或R14表示(例如)C1-C20烷基,其未經取代或經一或多個鹵素或苯基取代;或R14表示C3-C5雜芳基(例如噻吩基)或是未經取代或經取代一或多個以下基團取代之苯基:C1-C6烷基、C1-C4鹵代烷基、鹵素、OR17、SR18及/或NR19R20;或R14表示C1-C8烷氧基、苄氧基或苯氧基。 Or R 14 represents, for example, a C 1 -C 20 alkyl group which is unsubstituted or substituted with one or more halogen or phenyl groups; or R 14 represents a C 3 -C 5 heteroaryl group (e.g., thienyl) or a phenyl group which is unsubstituted or substituted with one or more of the following groups: C 1 -C 6 alkyl, C 1 -C 4 haloalkyl, halogen, OR 17 , SR 18 and/or NR 19 R 20 ; R 14 represents a C 1 -C 8 alkoxy group, a benzyloxy group or a phenoxy group.

在另一實施例中,R14表示C1-C20烷基,其未經取代或經苯基取代;或R14表示苯基,其未經取代或經一或多個C1-C6烷基取代。 In another embodiment, R 14 represents C 1 -C 20 alkyl, which is unsubstituted or substituted with phenyl; or R 14 represents phenyl, which is unsubstituted or via one or more C 1 -C 6 Alkyl substitution.

較佳地,R14表示C1-C20烷基、C3-C5雜芳基(例如噻吩基),或是苯基,尤其為C1-C20烷基或噻吩基,尤其為C1-C8烷基。 Preferably, R 14 represents C 1 -C 20 alkyl, C 3 -C 5 heteroaryl (such as thienyl), or phenyl, especially C 1 -C 20 alkyl or thienyl, especially C 1- C 8 alkyl.

R15表示(例如)C6-C20芳基或C5-C20雜芳基,其各未經取代或經一或多個以下基團取代:苯基、鹵素、C1-C4鹵代烷基、CN、NO2、OR17、SR18、NR19R20、C1-C20烷基;或R15表示氫、C3-C8環烷基,該C3-C8環烷基視情況間雜有 一或多個O、CO或NR26;或R15表示C1-C20烷基,其未經取代或經一或多個以下基團取代:鹵素、OR17、C3-C8環烷基、C5-C20雜芳基、C8-C20苯氧基羰基、C5-C20雜芳氧基-羰基、NR19R20、COOR17、CONR19R20、PO(OCkH2k+1)2、式(6)所表示的基團、苯基、或經以下基團取代之苯基:鹵素、C1-C20烷基、C1-C4鹵代烷基、OR17或NR19R20 或R15表示C2-C20烷基,其間雜有一或多個O、S或SO2,或R15表示C2-C20烷醯基、苯甲醯基、C2-C12烷氧基羰基、苯氧基羰基、CONR19R20、NO2或C1-C4鹵代烷基。 R 15 represents, for example, a C 6 -C 20 aryl group or a C 5 -C 20 heteroaryl group, each of which is unsubstituted or substituted with one or more of the following groups: phenyl, halogen, C 1 -C 4 haloalkane a group, CN, NO 2 , OR 17 , SR 18 , NR 19 R 20 , C 1 -C 20 alkyl; or R 15 represents hydrogen, C 3 -C 8 cycloalkyl, the C 3 -C 8 cycloalkyl Depending on the case, one or more O, CO or NR 26 ; or R 15 represents a C 1 -C 20 alkyl group which is unsubstituted or substituted with one or more of the following groups: halogen, OR 17 , C 3 -C 8 -cycloalkyl, C 5 -C 20 heteroaryl, C 8 -C 20 phenoxycarbonyl, C 5 -C 20 heteroaryloxy-carbonyl, NR 19 R 20 , COOR 17 , CONR 19 R 20 , PO (OC k H 2k+1 ) 2 , a group represented by the formula (6), a phenyl group, or a phenyl group substituted by a halogen group, a C 1 -C 20 alkyl group, a C 1 -C 4 haloalkyl group , OR 17 or NR 19 R 20 ; Or R 15 represents a C 2 -C 20 alkyl group in which one or more O, S or SO 2 are heterogeneous, or R 15 represents a C 2 -C 20 alkanoyl group, a benzamidine group, a C 2 -C 12 alkoxy group. Alkylcarbonyl, phenoxycarbonyl, CONR 19 R 20 , NO 2 or C 1 -C 4 haloalkyl.

此外,R15表示(例如)氫、C6-C20芳基,尤其為苯基或萘基,其各未經取代或經C1-C12烷基取代;或是C3-C5雜芳基,例如噻吩基;或是C3-C8環烷基、C1-C20烷基,其未經取代或經一或多個以下基團取代:OR17、SR17、C3-C8-環烷基、NR19R20或COOR17;或R15表示C2-C20烷基,其間雜有一或多個O或SO2Further, R 15 represents, for example, hydrogen, C 6 -C 20 aryl, especially phenyl or naphthyl, each unsubstituted or substituted by C 1 -C 12 alkyl; or C 3 -C 5 hetero An aryl group, such as a thienyl group; or a C 3 -C 8 cycloalkyl group, a C 1 -C 20 alkyl group, which is unsubstituted or substituted with one or more of the following groups: OR 17 , SR 17 , C 3 - C 8 -cycloalkyl, NR 19 R 20 or COOR 17 ; or R 15 represents C 2 -C 20 alkyl with one or more O or SO 2 heteromixed therebetween.

式(1)化合物令人關注,其中R15表示(例如)氫、苯基、萘基,其各未經取代或經C1-C8烷基取代;或R15表示噻吩基、C1-C20烷基,其未經取代或經一或多個以下基團取代:OR17、SR17、C3-C8-環烷基、NR19R20或COOR17;或R15表示C2-C20烷基,其間雜有一或多個O或SO2Compounds of formula (1) are of interest, wherein R 15 represents, for example, hydrogen, phenyl, naphthyl, each unsubstituted or substituted by C 1 -C 8 alkyl; or R 15 represents thienyl, C 1 - a C 20 alkyl group which is unsubstituted or substituted with one or more of the following groups: OR 17 , SR 17 , C 3 -C 8 -cycloalkyl, NR 19 R 20 or COOR 17 ; or R 15 represents C 2 a -C 20 alkyl group in which one or more O or SO 2 are heterogeneous.

R15尤其為(例如)C3-C8環烷基或C1-C20烷基,尤其為C1-C20烷基,尤其為C1-C12烷基。 R 15 is especially, for example, C 3 -C 8 cycloalkyl or C 1 -C 20 alkyl, especially C 1 -C 20 alkyl, especially C 1 -C 12 alkyl.

R'14及R'15之較佳者分別是如上文針對R14及R15所給出者。 The preferred of R' 14 and R' 15 are as given above for R 14 and R 15 , respectively.

X1表示(例如)O、S或SO,例如O或S,尤其為O。 X 1 represents, for example, O, S or SO, such as O or S, especially O.

R16表示(例如)C6-C20芳基(尤其苯基或萘基、尤其苯基)或C5-C20雜芳基(尤其噻吩基),其各未經取代或經一或多個以下基團取代:苯基、鹵素、C1-C4鹵代烷基、CN、NO2、OR17、SR18、NR19R20或間雜有一或多個O之C1-C20烷基;或其各經一或多個C1-C20烷基取代,該C1-C20烷基未經取代或經一或多個以下基團取代:鹵素、COOR17、CONR19R20、苯基、C3-C8環烷基、C5-C20雜芳基、C6-C20芳氧基羰基、C5-C20雜芳氧基羰基、OR17、SR18或NR19R20;或R16表示氫、C1-C20烷基,該C1-C20烷基未經取代或經一或多個以下基團取代:鹵素、苯基、OH、SH、C3-C6烯氧基、OCH2CH2(CO)O(C1-C4烷基)、O(CO)-(C1-C4烷基)、O(CO)-苯基、(CO)OH或(CO)O(C1-C4烷基);或R16表示C2-C12烷基,其間雜有一或多個O;或表示(CH2CH2O)n+1H、(CH2CH2O)n(CO)-(C1-C8烷基)、C2-C12烯基或C3-C8環烷基,且n是1至20,例如1至12或1至8,尤其為1或2。 R 16 represents, for example, a C 6 -C 20 aryl group (especially phenyl or naphthyl, especially phenyl) or a C 5 -C 20 heteroaryl (especially thienyl), each unsubstituted or via one or more Substituted for: phenyl, halogen, C 1 -C 4 haloalkyl, CN, NO 2 , OR 17 , SR 18 , NR 19 R 20 or a C 1 -C 20 alkyl group having one or more O; or each with one or more C 1 -C 20 substituted alkyl, C 1 -C 20 alkyl which is unsubstituted or substituted with one or more of the following radicals: halogen, COOR 17, CONR 19 R 20 , benzyl , C 3 -C 8 cycloalkyl, C 5 -C 20 heteroaryl, C 6 -C 20 aryloxycarbonyl, C 5 -C 20 heteroaryloxycarbonyl, OR 17 , SR 18 or NR 19 R 20; or R 16 represents hydrogen, C 1 -C 20 alkyl, C 1 -C 20 alkyl which is unsubstituted or substituted with one or more of the following groups: halogen, phenyl, OH, SH, C 3 - C 6 alkenyloxy, OCH 2 CH 2 (CO)O(C 1 -C 4 alkyl), O(CO)-(C 1 -C 4 alkyl), O(CO)-phenyl, (CO) OH or (CO)O(C 1 -C 4 alkyl); or R 16 represents a C 2 -C 12 alkyl group with one or more O in between; or (CH 2 CH 2 O) n+1 H, (CH 2 CH 2 O) n (CO)-(C 1 -C 8 alkyl), C 2 -C 12 alkenyl or C 3- C 8 cycloalkyl, and n is from 1 to 20, for example from 1 to 12 or from 1 to 8, especially 1 or 2.

此外,R16表示(例如)苯基或萘基,尤其為苯基、噻吩基或咔唑,其各未經取代或經一或多個以下基團取代:苯 基、鹵素、C1-C4鹵代烷基、OR17、SR18、NR19R20或C1-C20烷基;或R16表示C1-C20烷基,其未經取代或經一或多個以下基團取代:鹵素、苯基、OH、SH、C3-C6烯氧基、OCH2CH2(CO)O(C1-C4烷基)、O(CO)-(C1-C4烷基)、O(CO)-苯基、(CO)OH或(CO)O(C1-C4烷基);或R16表示C2-C12烷基,其間雜有一或多個O;或是(CH2CH2O)n+1H、(CH2CH2O)n(CO)-(C1-C8烷基)、C2-C12烯基或C3-C8環烷基,且n是1至20,例如1至12或1至8,尤其為1或2。 Furthermore, R 16 represents, for example, phenyl or naphthyl, especially phenyl, thienyl or oxazole, each unsubstituted or substituted by one or more of the following groups: phenyl, halogen, C 1 -C a 4- haloalkyl group, OR 17 , SR 18 , NR 19 R 20 or C 1 -C 20 alkyl; or R 16 represents a C 1 -C 20 alkyl group which is unsubstituted or substituted with one or more of the following groups: Halogen, phenyl, OH, SH, C 3 -C 6 alkenyloxy, OCH 2 CH 2 (CO)O(C 1 -C 4 alkyl), O(CO)-(C 1 -C 4 alkyl) , O(CO)-phenyl, (CO)OH or (CO)O(C 1 -C 4 alkyl); or R 16 represents a C 2 -C 12 alkyl group, wherein one or more O are heterogeneous; (CH 2 CH 2 O) n+1 H, (CH 2 CH 2 O) n (CO)-(C 1 -C 8 alkyl), C 2 -C 12 alkenyl or C 3 -C 8 cycloalkyl And n is from 1 to 20, such as from 1 to 12 or from 1 to 8, especially 1 or 2.

此外,R16表示(例如)苯基或萘基,尤其為苯基,其各未經取代或經一或多個以下基團取代:苯基、鹵素、C1-C4鹵代烷基、OR17、SR18、NR19R20或C1-C20烷基;或R16表示C3-C5雜芳基,尤其為噻吩基。 Further, R 16 represents, for example, phenyl or naphthyl, especially phenyl, each unsubstituted or substituted with one or more of the following groups: phenyl, halogen, C 1 -C 4 haloalkyl, OR 17 , SR 18 , NR 19 R 20 or C 1 -C 20 alkyl; or R 16 represents a C 3 -C 5 heteroaryl group, especially a thienyl group.

R16尤其為(例如)苯基,其未經取代或經一或多個以下基團取代:OR17、SR18、NR19R20或C1-C20烷基,或R16表示噻吩基。 R 16 is especially, for example, phenyl which is unsubstituted or substituted by one or more of the following groups: OR 17 , SR 18 , NR 19 R 20 or C 1 -C 20 alkyl, or R 16 represents thienyl .

較佳地,R16表示(例如)苯基或萘基,其各未經取代或經一或多個C1-C20烷基取代。 Preferably, R 16 represents, for example, phenyl or naphthyl, each of which is unsubstituted or substituted with one or more C 1 -C 20 alkyl groups.

R16尤其為苯基,其經一或多個C1-C20烷基取代。 R 16 is especially phenyl which is substituted by one or more C 1 -C 20 alkyl groups.

R17表示(例如)氫、苯基-C1-C3烷基、C1-C20烷基,其未經取代或經一或多個以下基團取代:鹵素、OH、OCH2CH2(CO)O(C1-C4烷基)、O(CO)-(C1-C4烷基)、O(CO)-(C2-C4)烯基、O(CO)-苯基、(CO)OH、(CO)O(C1-C4 烷基)、C3-C20環烷基或間雜有一或多個O之C3-C20環烷基;或R17表示C2-C20烷基,其間雜有一或多個O;是(CH2CH2O)n+1H、(CH2CH2O)n(CO)-(C1-C8烷基)、C1-C8烷醯基、C2-C12烯基、C3-C6烯醯基或C3-C20環烷基,其視情況間雜有一或多個O;或R17表示苯甲醯基,其未經取代或經一或多個C1-C6烷基、鹵素、OH或C1-C3烷氧基取代;或R17表示苯基、萘基或C5-C20雜芳基,其各未經取代或經一或多個以下基團取代:鹵素、OH、C1-C12烷基、C1-C12烷氧基、CN、NO2、苯基-C1-C3烷氧基、苯氧基、C1-C12烷基硫基、苯基硫基、N(C1-C12烷基)2、二苯基-胺基或式(7)表示的基團 R 17 represents, for example, hydrogen, phenyl-C 1 -C 3 alkyl, C 1 -C 20 alkyl, which is unsubstituted or substituted with one or more of the following groups: halogen, OH, OCH 2 CH 2 (CO)O(C 1 -C 4 alkyl), O(CO)-(C 1 -C 4 alkyl), O(CO)-(C 2 - C 4 )alkenyl, O(CO)-phenyl , (CO) OH, (CO ) O (C 1 -C 4 alkyl), C 3 -C 20 cycloalkyl interrupted by one or more O or of C 3 -C 20 cycloalkyl; or R 17 represents C a 2 -C 20 alkyl group having one or more O in between; (CH 2 CH 2 O) n+1 H, (CH 2 CH 2 O) n (CO)-(C 1 -C 8 alkyl), a C 1 -C 8 alkanoyl group, a C 2 -C 12 alkenyl group, a C 3 -C 6 olefin group or a C 3 -C 20 cycloalkyl group, optionally having one or more O; or R 17 representing benzene Mercapto, which is unsubstituted or substituted by one or more C 1 -C 6 alkyl, halogen, OH or C 1 -C 3 alkoxy; or R 17 represents phenyl, naphthyl or C 5 -C a 20 heteroaryl group, each of which is unsubstituted or substituted with one or more of the following groups: halogen, OH, C 1 -C 12 alkyl, C 1 -C 12 alkoxy, CN, NO 2 , phenyl- C 1 -C 3 alkoxy, phenoxy, C 1 -C 12 alkylthio, phenylthio, N(C 1 -C 12 alkyl) 2 , diphenyl-amine or formula (7) )table Group

在另一實施例中,R17表示(例如)氫、苯基-C1-C3烷基、C1-C20烷基,其未經取代或經一或多個以下基團取代:鹵素、O(CO)-(C1-C4烷基)、O(CO)-(C2-C4烯基)或間雜有一或多個O之C2-C20烷基;或是C1-C8烷醯基、C2-C12烯基、C3-C6烯醯基、間雜有一或多個O之C2-C20烷基、視情況間雜有一或多個O之C3-C20環烷基;或是苯甲醯基,其未經取代或經一或多個以下基團取代:C1-C6烷基、鹵素、OH或C1-C3烷氧基;或是苯基或萘基,其各未經取代或經一或多個以下基團取代:鹵素、C1-C12烷基或C1-C12烷氧基。 In another embodiment, R 17 represents, for example, hydrogen, phenyl-C 1 -C 3 alkyl, C 1 -C 20 alkyl, which is unsubstituted or substituted with one or more of the following: halogen , O(CO)-(C 1 -C 4 alkyl), O(CO)-(C 2 -C 4 alkenyl) or a C 2 -C 20 alkyl group having one or more O; or C 1 -C 8 alkyl fluorenyl, C 2 -C 12 alkenyl, C 3 -C 6 olefinic group, heterochromic one or more C 2 -C 20 alkyl groups, optionally with one or more C 3 a -C 20 cycloalkyl group; or a benzylidene group which is unsubstituted or substituted with one or more of the following groups: C 1 -C 6 alkyl, halogen, OH or C 1 -C 3 alkoxy; Or phenyl or naphthyl, each unsubstituted or substituted by one or more of the following: halo, C 1 -C 12 alkyl or C 1 -C 12 alkoxy.

R17亦為(例如)氫、苯基-C1-C3烷基、C1-C8烷醯基、C1-C20烷基,其未經取代或經一或多個以下基團取代:鹵素、C3-C20環烷基、O(CO)-(C1-C4烷基)、O(CO)-(C2-C4烯基)或間雜有一或多個O之C2-C20烷基,或R17表示C2-C20烷基,其間雜有一或多個O。 R 17 is also, for example, hydrogen, phenyl-C 1 -C 3 alkyl, C 1 -C 8 alkanoyl, C 1 -C 20 alkyl, unsubstituted or via one or more of the following groups Substitution: halogen, C 3 -C 20 cycloalkyl, O(CO)-(C 1 -C 4 alkyl), O(CO)-(C 2 -C 4 alkenyl) or miscellaneous one or more O C 2 -C 20 alkyl, or R 17 represents C 2 -C 20 alkyl with one or more O intervening.

R17尤其為氫、C1-C8烷醯基、C1-C20烷基,其未經取代或經一或多個以下基團取代:O(CO)-(C1-C4烷基)、O(CO)-(C2-C4烯基)或間雜有一或多個O之C2-C20烷基,或R17表示C2-C20烷基,其間雜有一或多個O。 R 17 is especially hydrogen, C 1 -C 8 alkanoyl, C 1 -C 20 alkyl, which is unsubstituted or substituted by one or more of the following groups: O(CO)-(C 1 -C 4 alkane a group of O(CO)-(C 2 -C 4 alkenyl) or a C 2 -C 20 alkyl group having one or more O, or R 17 representing a C 2 -C 20 alkyl group, wherein one or more O.

R18表示(例如)C3-C20環烷基,其未經間雜或間雜有一或多個O;或R18表示C1-C20烷基,其未經取代或經一或多個以下基團取代:OH、O(CO)-(C2-C4)烯基、O(CO)-(C1-C4烷基)或(CO)OR17;或R18表示C2-C20烷基,其間雜有一或多個O、S、CO、NR26或COOR17;或R18表示C2-C8烷醯基或C3-C6烯醯基、苯甲醯基;或R18表示苯基、萘基或C3-C20雜芳基,其各未經取代或經一或多個以下基團取代:鹵素、C1-C12烷基、C1-C4鹵代烷基、C1-C12烷氧基或NO2R 18 represents, for example, a C 3 -C 20 cycloalkyl group which has no or a hetero or one or more O; or R 18 represents a C 1 -C 20 alkyl group which is unsubstituted or one or more of the following Group substitution: OH, O(CO)-(C 2 -C 4 )alkenyl, O(CO)-(C 1 -C 4 alkyl) or (CO)OR 17 ; or R 18 represents C 2 -C a 20 alkyl group having one or more of O, S, CO, NR 26 or COOR 17 in between ; or R 18 represents a C 2 -C 8 alkanoyl group or a C 3 -C 6 alkenyl group, a benzamidine group; R 18 represents phenyl, naphthyl or C 3 -C 20 heteroaryl, each unsubstituted or substituted by one or more of the following groups: halogen, C 1 -C 12 alkyl, C 1 -C 4 haloalkane Base, C 1 -C 12 alkoxy or NO 2 .

在另一實施例中,R18表示(例如)C3-C20環烷基、C1-C20烷基,其未經取代或經一或多個以下基團取代:OH、O(CO)-(C2-C4)烯基、O(CO)-(C1-C4烷基)或(CO)OR17;或R18表示苯基或萘基,其各未經取代或經一或多個鹵素或C1-C12烷基、尤其鹵素取代。 In another embodiment, R 18 represents, for example, C 3 -C 20 cycloalkyl, C 1 -C 20 alkyl, which is unsubstituted or substituted with one or more of the following groups: OH, O (CO )-(C 2 -C 4 )alkenyl, O(CO)-(C 1 -C 4 alkyl) or (CO)OR 17 ; or R 18 represents phenyl or naphthyl, each unsubstituted or via One or more halogen or C 1 -C 12 alkyl groups, especially halogen.

R18表示(例如)C1-C20烷基、C2-C12烯基、C3-C20環烷基、苯基-C1-C3烷基、C2-C8烷醯基、苯甲醯基、苯基或萘基。 R 18 represents, for example, C 1 -C 20 alkyl, C 2 -C 12 alkenyl, C 3 -C 20 cycloalkyl, phenyl-C 1 -C 3 alkyl, C 2 -C 8 alkanoyl , benzylidene, phenyl or naphthyl.

舉例而言,R18表示C1-C20烷基,其經一或多個以下基團取代:OH、O(CO)-(C2-C4)烯基、O(CO)-(C1-C4烷基)或(CO)OR17,或R18表示苯基,其經一或多個鹵素取代。 For example, R 18 represents C 1 -C 20 alkyl substituted with one or more of the following groups: OH, O(CO)-(C 2 -C 4 )alkenyl, O(CO)-(C 1 -C 4 alkyl) or (CO)OR 17 , or R 18 represents a phenyl group which is substituted by one or more halogens.

較佳地,R18表示C1-C8烷基,其如上文所定義經取代。 Preferably, R 18 represents C 1 -C 8 alkyl, which is substituted as defined above.

舉例而言,R19及R20彼此獨立地為氫、C1-C20烷基、C2-C4羥基烷基、C3-C20環烷基、苯基-C1-C3烷基、苯基或萘基、C1-C8烷醯基、C1-C8烷醯基氧基、C3-C12烯醯基或苯甲醯基;或R19及R20與其所附接之N原子一起形成視情況間雜有O、S或NR17之5員或6員飽和或不飽和環;或R19及R20與其所附接之N原子一起形成雜芳香族環系統,該環系統未經取代或經一或多個以下基團取代:C1-C20烷基、C1-C4鹵代烷基、或式(7)表示的基團、 For example, R 19 and R 20 are each independently hydrogen, C 1 -C 20 alkyl, C 2 -C 4 hydroxyalkyl, C 3 -C 20 cycloalkyl, phenyl-C 1 -C 3 alkane a phenyl or naphthyl group, a C 1 -C 8 alkanoyl group, a C 1 -C 8 alkenyloxy group, a C 3 -C 12 alkenyl group or a benzhydryl group; or R 19 and R 20 The attached N atoms together form a 5- or 6-membered saturated or unsaturated ring heterogeneously interspersed with O, S or NR 17 ; or R 19 and R 20 together with the N atom to which they are attached form a heteroaromatic ring system, The ring system is unsubstituted or substituted with one or more of the following groups: a C 1 -C 20 alkyl group, a C 1 -C 4 haloalkyl group, or a group represented by the formula (7),

此外,舉例而言,R19及R20彼此獨立地為氫、C1-C20烷基、C2-C4羥基烷基、C3-C20環烷基、苯基-C1-C3烷基、C1-C8烷醯基、C1-C8烷醯基氧基、C3-C12烯醯基或苯甲醯基;或R19及R20與其所附接之N原子一起形成視情況間雜 有O或NR17之5員或6員飽和環;或R19及R20與其所附接之N原子一起形成咔唑環。 Further, for example, R 19 and R 20 are each independently hydrogen, C 1 -C 20 alkyl, C 2 -C 4 hydroxyalkyl, C 3 -C 20 cycloalkyl, phenyl-C 1 -C a 3 alkyl group, a C 1 -C 8 alkyl fluorenyl group, a C 1 -C 8 alkyl fluorenyloxy group, a C 3 -C 12 olefinic fluorenyl group or a benzhydryl group; or R 19 and R 20 are attached thereto The atoms together form a 5- or 6-membered saturated ring, optionally mixed with O or NR 17 ; or R 19 and R 20 together with the N atom to which they are attached form an indazole ring.

舉例而言,R19及R20彼此獨立地為氫、C1-C20烷基、C2-C4羥基烷基、C3-C20環烷基、苯基-C1-C3烷基、C1-C8烷醯基、C1-C8烷醯基氧基、C3-C12烯醯基或苯甲醯基;或R19及R20與其所附接之N原子一起形成視情況間雜有O或NR17之5員或6員飽和環。 For example, R 19 and R 20 are each independently hydrogen, C 1 -C 20 alkyl, C 2 -C 4 hydroxyalkyl, C 3 -C 20 cycloalkyl, phenyl-C 1 -C 3 alkane a C 1 -C 8 alkanoyl group, a C 1 -C 8 alkanoyloxy group, a C 3 -C 12 alkenyl group or a benzhydryl group; or R 19 and R 20 together with the N atom to which it is attached Form a 5- or 6-membered saturated ring with O or NR 17 as appropriate.

較佳地,R19及R20彼此獨立地為C1-C8烷醯基、C1-C8烷醯基氧基;或R19及R20與其所附接之N原子一起形成嗎啉環。 Preferably, R 19 and R 20 are, independently of each other, a C 1 -C 8 alkanoyl group, a C 1 -C 8 alkenyloxy group; or R 19 and R 20 together with the N atom to which they are attached form a morpholine ring.

舉例而言,R21及R22彼此獨立地為氫、C1-C20烷基、C1-C4鹵代烷基、C3-C10環烷基或苯基;或R21及R22與其所附接之N原子一起形成嗎啉環。R21及R22尤其彼此獨立地為氫或C1-C20烷基。 For example, R 21 and R 22 are each independently hydrogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, C 3 -C 10 cycloalkyl or phenyl; or R 21 and R 22 The attached N atoms together form a morpholine ring. R 21 and R 22 are, in particular, independently of one another hydrogen or C 1 -C 20 alkyl.

R23表示(例如)氫、OH、苯基或C1-C20烷基。R23尤其為氫、OH或C1-C4烷基。 R 23 represents, for example, hydrogen, OH, phenyl or C 1 -C 20 alkyl. R 23 is especially hydrogen, OH or C 1 -C 4 alkyl.

R24之較佳者是如針對R19及R20所給出。R25之較佳者是如針對R17所給出。 The preferred of R 24 is as given for R 19 and R 20 . The preferred of R 25 is as given for R 17 .

R26表示(例如)氫、C1-C20烷基、C1-C4鹵代烷基、C2-C20烷基,其間雜有一或多個O或CO;或是苯基-C1-C4烷基、C3-C8環烷基,其視情況間雜有一或多個O或CO;或是(CO)R19或苯基,其未經取代或經一或多個以下基團取 代:C1-C20烷基、鹵素、C1-C4鹵代烷基、OR17、SR18、NR19R20R 26 represents, for example, hydrogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, C 2 -C 20 alkyl, heterogeneously having one or more O or CO; or phenyl-C 1 - a C 4 alkyl group, a C 3 -C 8 cycloalkyl group optionally having one or more O or CO; or (CO)R 19 or a phenyl group which is unsubstituted or has one or more of the following groups Substitution: C 1 -C 20 alkyl, halogen, C 1 -C 4 haloalkyl, OR 17 , SR 18 , NR 19 R 20 .

或R26表示(例如)氫、C1-C20烷基、C1-C4鹵代烷基;是苯基-C1-C4烷基、C3-C8環烷基、(CO)R19或苯基,其未經取代或經一或多個C1-C20烷基取代。此外,R26表示(例如)氫或C1-C20烷基、尤其為C1-C4烷基。 Or R 26 represents, for example, hydrogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl; phenyl-C 1 -C 4 alkyl, C 3 -C 8 cycloalkyl, (CO)R 19 or a phenyl group which is unsubstituted or substituted by one or more C 1 -C 20 alkyl groups. Further, R 26 represents, for example, hydrogen or a C 1 -C 20 alkyl group, especially a C 1 -C 4 alkyl group.

發明式(1)化合物之實例包括下列由式(1-1)至式(1-84)所表示的化合物: Examples of the compound of the formula (1) of the invention include the following compounds represented by the formula (1-1) to the formula (1-84):

基於所述鹼可溶性樹脂(A)為100重量份,所述光起始劑(C-1)的使用量為5重量份至100重量份,較佳為10重量份至90重量份,更佳為15重量份至80重量份。 The photoinitiator (C-1) is used in an amount of 5 parts by weight to 100 parts by weight, preferably 10 parts by weight to 90 parts by weight, based on 100 parts by weight of the alkali-soluble resin (A), more preferably It is from 15 parts by weight to 80 parts by weight.

當感光性樹脂組成物不使用光起始劑(C-1)時,則感光性樹脂組成物的圖案平滑性不佳。 When the photosensitive resin composition does not use the photoinitiator (C-1), the pattern smoothness of the photosensitive resin composition is not good.

當光起始劑(C-1)的使用量為5重量份至100重量份範圍時,所製得之感光性樹脂組成物之高精細度的圖案直線性較佳。 When the photoinitiator (C-1) is used in an amount of from 5 parts by weight to 100 parts by weight, the high-definition pattern linearity of the obtained photosensitive resin composition is preferable.

其它光起始劑(C-2)Other photoinitiators (C-2)

其它光起始劑(C-2)的具體例包括其它氧-醯基肟類化合物(O-acyloxime)或非氧-醯基肟類光起始劑。 Specific examples of the other photoinitiator (C-2) include other O-acyloxime or non-oxo-indenyl quinone photoinitiators.

其它氧-醯基肟類化合物Other oxygen-indenyl steroids

其它氧-醯基肟類化合物的具體例包括具體例包括1-[4-(苯基硫代)苯基]-丙烷-3-環戊烷-1,2-二酮2-(O-苯醯基肟)、1-[4-(苯基硫代)苯基]-庚烷-1,2-二酮2-(O-苯醯基肟)、1-[4-(苯基硫代)苯基]-辛烷-1,2-二酮-2-(O-苯醯基肟),或上述化合物的組合。1-[4-(苯基硫代)苯基]-辛烷-1,2-二酮-2-(O-苯醯基肟)可為由汽巴精化(Ciba Specialty Chemicals)有限公司製造,型號為IRGACURE OXE-01的商品。 Specific examples of other oxy-indenyl steroids include 1-[4-(phenylthio)phenyl]-propane-3-cyclopentane-1,2-dione 2-(O-benzene).醯 肟), 1-[4-(phenylthio)phenyl]-heptane-1,2-dione 2-(O-phenylhydrazinium), 1-[4-(phenylthio) Phenyl]-octane-1,2-dione-2-(O-phenylhydrazinium), or a combination of the above compounds. 1-[4-(phenylthio)phenyl]-octane-1,2-dione-2-(O-phenylhydrazinium) may be manufactured by Ciba Specialty Chemicals Co., Ltd. The model number is IRGACURE OXE-01.

此外,其它氧-醯基肟類化合物的具體例包括1-[4-(苯醯 基)苯基]-庚烷-1,2-二酮-2-(O-苯醯基肟)、1-[9-乙基-6-(2-甲基苯醯基)-9H-咔唑-3-取代基]-乙烷酮-1-(O-乙醯基肟)、1-[9-乙基-6-(3-甲基苯醯基)-9H-咔唑-3-取代基]-乙烷酮-1-(O-乙醯基肟)、1-[9-乙基-6-苯醯基-9H-咔唑-3-取代基]-乙烷酮-1-(O-乙醯基肟)、乙烷酮-1-[9-乙基-6-(2-甲基-4-四氫呋喃基苯醯基)-9H-咔唑-3-取代基]-1-(O-乙醯基肟)、乙烷酮-1-[9-乙基-6-(2-甲基-4-四氫吡喃基苯醯基)-9H-咔唑-3-取代基]-1-(O-乙醯基肟)、乙烷酮-1-[9-乙基-6-(2-甲基-5-四氫呋喃基苯醯基)-9H-咔唑-3-取代基]-1-(O-乙醯基肟)、乙烷酮-1-[9-乙基-6-(2-甲基-5-四氫吡喃基苯醯基)-9H-咔唑-3-取代基]-1-(O-乙醯基肟)、乙烷酮-1-[9-乙基-6-(2-甲基-4-四氫呋喃基甲氧基苯醯基)-9H-咔唑-3-取代基]-1-(O-乙醯基肟)、乙烷酮-1-[9-乙基-6-(2-甲基-4-四氫吡喃基甲氧基苯醯基)-9H-咔唑-3-取代基]-1-(O-乙醯基肟)、乙烷酮-1-[9-乙基-6-(2-甲基-5-四氫呋喃基甲氧基苯醯基)-9H-咔唑-3-取代基]-1-(O-乙醯基肟)、乙烷酮-1-[9-乙基-6-(2-甲基-5-四氫吡喃基甲氧基苯醯基)-9H-咔唑-3-取代基]-1-(O-乙醯基肟)、乙烷酮-1-[9-乙基-6-{2-甲基-4-(2,2-二甲基-1,3-二氧雜戊環基)苯醯基}-9H-咔唑-3-取代基]-1-(O-乙醯基肟)、乙烷酮-1-[9-乙基-6-{2-甲基-4-(2,2-二甲基-1,3-二氧雜戊環基)甲氧基苯醯基}-9H-咔唑-3-取代基]-1-(O-乙醯基肟),或上述化合物的組合。1-[9-乙基-6-(2-甲基苯醯基)-9H-咔唑-3-取代基]-乙烷酮-1-(O-乙醯基肟)可為由汽巴精化有限公司製造,型號為IRGACURE OXE-02的商品。 Further, specific examples of other oxo-indenyl steroids include 1-[4-(benzoquinone) Phenyl]-heptane-1,2-dione-2-(O-phenylhydrazinyl), 1-[9-ethyl-6-(2-methylphenylindenyl)-9H-indole Zyridin-3-substituted]-ethanone-1-(O-ethylindenyl), 1-[9-ethyl-6-(3-methylphenylindenyl)-9H-indazole-3- Substituent]-ethanone-1-(O-acetamidoxime), 1-[9-ethyl-6-benzoin-9H-indazole-3-substituted]-ethanone-1- (O-Ethylhydrazine), Ethyl Ketone-1-[9-Ethyl-6-(2-methyl-4-tetrahydrofurylbenzoyl)-9H-indazole-3-Substituent]-1 -(O-acetylhydrazine), ketone-1-[9-ethyl-6-(2-methyl-4-tetrahydropyranylphenyl)-9H-carbazole-3-substituted ]]-1-(O-acetamidoxime), ketone-1-[9-ethyl-6-(2-methyl-5-tetrahydrofuranylphenyl)-9H-carbazole-3- Substituent]-1-(O-acetamidoxime), ketone-1-[9-ethyl-6-(2-methyl-5-tetrahydropyranylphenyl)-9H-oxime Zyridin-3-substituted]-1-(O-ethylindenyl), ethane ketone-1-[9-ethyl-6-(2-methyl-4-tetrahydrofurylmethoxyphenyl) -9H-carbazole-3-substituted]-1-(O-acetamidoxime), ketone-1-[9-ethyl-6-(2-methyl-4-tetrahydropyranyl) Methoxybenzoinyl)-9H-indazole-3-substituted]-1-(O-ethylindenyl), ethane ketone-1-[9-ethyl-6-(2-methyl- 5-four Furyl methoxyphenyl fluorenyl)-9H-carbazole-3-substituted]-1-(O-acetylindenyl), ethane ketone-1-[9-ethyl-6-(2-A 5--5-tetrahydropyranylmethoxyphenylhydrazinyl)-9H-indazole-3-substituted]-1-(O-ethenylhydrazine), ethanoketone-1-[9-ethyl -6-{2-methyl-4-(2,2-dimethyl-1,3-dioxolanyl)phenylhydrazino}-9H-indazole-3-substituted]-1-( O-acetyl hydrazine), ketone-1-[9-ethyl-6-{2-methyl-4-(2,2-dimethyl-1,3-dioxolanyl) Methoxybenzoquinone}-9H-indazole-3-substituted]-1-(O-ethylindenyl), or a combination of the above compounds. 1-[9-ethyl-6-(2-methylphenylhydrazino)-9H-indazole-3-substituted]-ethanone-1-(O-ethylindenyl) can be obtained from Ciba Made by Jinghua Co., Ltd., model IRGACURE OXE-02.

其它氧-醯基肟類化合物可單獨使用或組合多種來使用。 Other oxy-indenyl steroids may be used singly or in combination of two or more.

非氧-醯基肟類光起始劑Non-oxy-indenyl quinone photoinitiator

非氧-醯基肟類光起始劑的具體例包括三氮雜苯類化合物、苯乙烷酮類化合物、二咪唑類化合物、二苯甲酮類化合物、α-二酮類化合物、醇酮類化合物、醇酮醚類化合物、醯膦氧化物類化合物、醌類化合物、含鹵素類化合物、過氧化物,或上述化合物的組合。 Specific examples of the non-oxo-indenyl quinone photoinitiator include a triazabenzene compound, an acetophenone compound, a diimidazole compound, a benzophenone compound, an α -diketone compound, and an alcohol ketone. a compound, an alcohol ketone ether compound, a phosphonium oxide compound, an anthraquinone compound, a halogen-containing compound, a peroxide, or a combination of the above compounds.

三氮雜苯類化合物的具體例包括乙烯基-鹵代甲基-s-三氮雜苯化合物、2-(萘并-1-取代基)-4,6-二(鹵代甲基)-s-三氮雜苯化合物、4-(對-胺基苯基)-2,6-二(鹵代甲基)-s-三氮雜苯化合物,或上述化合物的組合。 Specific examples of the triazabenzene compound include a vinyl-halomethyl-s-triazabenzene compound, 2-(naphtho-1-substituted)-4,6-di(halomethyl)- An s-triazabenzene compound, a 4-(p-aminophenyl)-2,6-di(halomethyl)-s-triazabenzene compound, or a combination of the above compounds.

乙烯基-鹵代甲基-s-三氮雜苯化合物的具體例包括2,4-二(三氯甲基)-6-對-甲氧基苯乙烯基-s-三氮雜苯、2,4-二(三氯甲基)-3-(1-對-二甲基胺基苯基-1,3-丁二烯基)-s-三氮雜苯、2-三氯甲基-3-胺基-6-對-甲氧基苯乙烯基-s-三氮雜苯,或上述化合物的組合。 Specific examples of the vinyl-halogenomethyl-s-triazabenzene compound include 2,4-bis(trichloromethyl)-6-p-methoxystyryl-s-triazabenzene, 2 ,4-di(trichloromethyl)-3-(1-p-dimethylaminophenyl-1,3-butadienyl)-s-triazabenzene, 2-trichloromethyl- 3-Amino-6-p-methoxystyryl-s-triazabenzene, or a combination of the above compounds.

2-(萘并-1-取代基)-4,6-二(鹵代甲基)-s-三氮雜苯化合物的具體例包括2-(萘并-1-取代基)-4,6-二(三氯甲基)-s-三氮雜苯、2-(4-甲氧基-萘并-1-取代基)-4,6-二(三氯甲基)-s-三氮雜苯、2-(4-乙氧基-萘并-1-取代基)-4,6-二(三氯甲基)-s-三氮雜苯、2-(4-丁氧基-萘并-1-取代基)-4,6-二(三氯甲基)-s-三氮雜苯、2-[4-(2-甲氧基乙 基)-萘并-1-取代基]-4,6-二(三氯甲基)-s-三氮雜苯、2-[4-(2-乙氧基乙基)-萘并-1-取代基]-4,6-二(三氯甲基)-s-三氮雜苯、2-[4-(2-丁氧基乙基)-萘并-1-取代基]-4,6-二(三氯甲基)-s-三氮雜苯、2-(2-甲氧基-萘并-1-取代基)-4,6-二(三氯甲基)-s-三氮雜苯、2-(6-甲氧基-5-甲基-萘并-2-取代基)-4,6-二(三氯甲基)-s-三氮雜苯、2-(6-甲氧基-萘并-2-取代基)-4,6-二(三氯甲基)-s-三氮雜苯、2-(5-甲氧基-萘并-1-取代基)-4,6-二(三氯甲基)-s-三氮雜苯、2-(4,7-二甲氧基-萘并-1-取代基)-4,6-二(三氯甲基)-s-三氮雜苯、2-(6-乙氧基-萘并-2-取代基)-4,6-二(三氯甲基)-s-三氮雜苯、2-(4,5-二甲氧基-萘并-1-取代基)-4,6-二(三氯甲基)-s-三氮雜苯,或上述化合物的組合。 Specific examples of the 2-(naphtho-1-substituted)-4,6-di(halomethyl)-s-triazabenzene compound include 2-(naphtho-1-substituted)-4,6 - bis(trichloromethyl)-s-triazabenzene, 2-(4-methoxy-naphtho-1-substituted)-4,6-di(trichloromethyl)-s-triazole Heterobenzene, 2-(4-ethoxy-naphtho-1-substituted)-4,6-bis(trichloromethyl)-s-triazabenzene, 2-(4-butoxy-naphthalene And-1-substituted)-4,6-bis(trichloromethyl)-s-triazabenzene, 2-[4-(2-methoxy B -naphthyl-1-substituted]-4,6-bis(trichloromethyl)-s-triazabenzene, 2-[4-(2-ethoxyethyl)-naphtho-1 -Substituent]-4,6-bis(trichloromethyl)-s-triazabenzene, 2-[4-(2-butoxyethyl)-naphtho-1-yl]-4, 6-bis(trichloromethyl)-s-triazabenzene, 2-(2-methoxy-naphtho-1-substituted)-4,6-di(trichloromethyl)-s-three Azabenzene, 2-(6-methoxy-5-methyl-naphtho-2-substituted)-4,6-di(trichloromethyl)-s-triazabenzene, 2-(6 -methoxy-naphtho-2-substituted)-4,6-bis(trichloromethyl)-s-triazabenzene, 2-(5-methoxy-naphtho-1-enyl) -4,6-bis(trichloromethyl)-s-triazabenzene, 2-(4,7-dimethoxy-naphtho-1-substituted)-4,6-di(trichloromethane) -s-triazene, 2-(6-ethoxy-naphtho-2-substituted)-4,6-di(trichloromethyl)-s-triazabenzene, 2-( 4,5-Dimethoxy-naphtho-1-substituted)-4,6-bis(trichloromethyl)-s-triazabenzene, or a combination of the above compounds.

4-(對-胺基苯基)-2,6-二(鹵代甲基)-s-三氮雜苯化合物的具體例包括4-[對-N,N-二(乙氧基羰基甲基)胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、4-[鄰-甲基-對-N,N-二(乙氧基羰基甲基)胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、4-[對-N,N-二(氯乙基)胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、4-[鄰-甲基-對-N,N-二(氯乙基)胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、4-(對-N-氯乙基胺基苯基)-2,6-二(三氯甲基)-s-三氮雜苯、4-(對-N-乙氧基羰基甲基胺基苯基)-2,6-二(三氯甲基)-s-三氮雜苯、4-[對-N,N-二(苯基)胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、4-(對-N-氯乙基羰基胺基苯基)-2,6-二(三氯甲基)-s-三氮雜苯、4-[對-N-(對-甲氧基苯基)羰基胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、4-[間-N,N-二(乙氧基羰基甲基)胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、4-[間-溴-對-N,N- 二(乙氧基羰基甲基)胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、4-[間-氯-對-N,N-二(乙氧基羰基甲基)胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、4-[間-氟-對-N,N-二(乙氧基羰基甲基)胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、4-[鄰-溴-對-N,N-二(乙氧基羰基甲基)胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、4-[鄰-氯-對-N,N-二(乙氧基羰基甲基)胺基苯基-2,6-二(三氯甲基)-s-三氮雜苯、4-[鄰-氟-對-N,N-二(乙氧基羰基甲基)胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、4-[鄰-溴-對-N,N-二(氯乙基)胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、4-[鄰-氯-對-N,N-二(氯乙基)胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、4-[鄰-氟-對-N,N-二(氯乙基)胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、4-[間-溴-對-N,N-二(氯乙基)胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、4-[間-氯-對-N,N-二(氯乙基)胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、4-[間-氟-對-N,N-二(氯乙基)胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、4-(間-溴-對-N-乙氧基羰基甲基胺基苯基)-2,6-二(三氯甲基)-s-三氮雜苯、4-(間-氯-對-N-乙氧基羰基甲基胺基苯基)-2,6-二(三氯甲基)-s-三氮雜苯、4-(間-氟-對-N-乙氧基羰基甲基胺基苯基)-2,6-二(三氯甲基)-s-三氮雜苯、4-(鄰-溴-對-N-乙氧基羰基甲基胺基苯基)-2,6-二(三氯甲基)-s-三氮雜苯、4-(鄰-氯-對-N-乙氧基羰基甲基胺基苯基)-2,6-二(三氯甲基)-s-三氮雜苯、4-(鄰-氟-對-N-乙氧基羰基甲基胺基苯基)-2,6-二(三氯甲基)-s-三氮雜苯、4-(間-溴-對-N-氯乙基胺基苯基)-2,6-二(三氯甲基)-s-三氮雜苯、4-(間-氯-對-N-氯乙基胺基苯基)-2,6-二(三氯 甲基)-s-三氮雜苯、4-(間-氟-對-N-氯乙基胺基苯基)-2,6-二(三氯甲基)-s-三氮雜苯、4-(鄰-溴-對-N-氯乙基胺基苯基)-2,6-二(三氯甲基)-s-三氮雜苯、4-(鄰-氯-對-N-氯乙基胺基苯基)-2,6-二(三氯甲基)-s-三氮雜苯、4-(鄰-氟-對-N-氯乙基胺基苯基)-2,6-二(三氯甲基)-s-三氮雜苯、2,4-二(三氯甲基)-6-[3-溴-4-[N,N-雙(乙氧基羰基甲基)胺基]苯基]-1,3,5-三氮雜苯,或上述化合物的組合。三氮雜苯類化合物可單獨使用或組合多種來使用。 Specific examples of the 4-(p-aminophenyl)-2,6-bis(halomethyl)-s-triazabenzene compound include 4-[p-N,N-di(ethoxycarbonyl) Aminophenyl]-2,6-bis(trichloromethyl)-s-triazabenzene, 4-[o-methyl-p-N,N-di(ethoxycarbonylmethyl) Aminophenyl]-2,6-bis(trichloromethyl)-s-triazabenzene, 4-[p-N,N-bis(chloroethyl)aminophenyl]-2,6- Bis(trichloromethyl)-s-triazabenzene, 4-[o-methyl-p-N,N-di(chloroethyl)aminophenyl]-2,6-di(trichloromethane) -s-triazabenzene, 4-(p-N-chloroethylaminophenyl)-2,6-bis(trichloromethyl)-s-triazabenzene, 4-(p- N-ethoxycarbonylmethylaminophenyl)-2,6-bis(trichloromethyl)-s-triazabenzene, 4-[p-N,N-di(phenyl)aminobenzene 2,6-bis(trichloromethyl)-s-triazabenzene, 4-(p-N-chloroethylcarbonylaminophenyl)-2,6-di(trichloromethyl) -s-triazabenzene, 4-[p-N-(p-methoxyphenyl)carbonylaminophenyl]-2,6-di(trichloromethyl)-s-triazabenzene, 4-[Inter-N,N-bis(ethoxycarbonylmethyl)aminophenyl]-2,6-bis(trichloromethyl)-s-triazabenzene, 4-[m-bromo- For -N,N- Di(ethoxycarbonylmethyl)aminophenyl]-2,6-di(trichloromethyl)-s-triazabenzene, 4-[m-chloro-p-N,N-di(B Oxycarbonylmethyl)aminophenyl]-2,6-bis(trichloromethyl)-s-triazabenzene, 4-[m-fluoro-p-N,N-di(ethoxycarbonyl) Methyl)aminophenyl]-2,6-bis(trichloromethyl)-s-triazabenzene, 4-[o-bromo-p-N,N-di(ethoxycarbonylmethyl) Aminophenyl]-2,6-bis(trichloromethyl)-s-triazabenzene, 4-[o-chloro-p-N,N-di(ethoxycarbonylmethyl)aminobenzene -2,6-bis(trichloromethyl)-s-triazabenzene, 4-[o-fluoro-p-N,N-di(ethoxycarbonylmethyl)aminophenyl]-2 ,6-bis(trichloromethyl)-s-triazabenzene, 4-[o-bromo-p-N,N-di(chloroethyl)aminophenyl]-2,6-di(three Chloromethyl)-s-triazabenzene, 4-[o-chloro-p-N,N-bis(chloroethyl)aminophenyl]-2,6-di(trichloromethyl)-s -Triazabenzene, 4-[o-fluoro-p-N,N-bis(chloroethyl)aminophenyl]-2,6-di(trichloromethyl)-s-triazabenzene, 4-[Inter-bromo-p-N,N-bis(chloroethyl)aminophenyl]-2,6-bis(trichloromethyl)-s-triazabenzene, 4-[m-chloro -p-N,N-bis(chloroethyl)aminophenyl]-2,6-di(trichloromethyl)-s-triazabenzene, 4- [m-Fluoro-p-N,N-bis(chloroethyl)aminophenyl]-2,6-di(trichloromethyl)-s-triazabenzene, 4-(m-bromo-pair -N-ethoxycarbonylmethylaminophenyl)-2,6-bis(trichloromethyl)-s-triazabenzene, 4-(m-chloro-p-N-ethoxycarbonyl) Aminophenyl)-2,6-bis(trichloromethyl)-s-triazabenzene, 4-(m-fluoro-p-N-ethoxycarbonylmethylaminophenyl)-2 ,6-bis(trichloromethyl)-s-triazabenzene, 4-(o-bromo-p-N-ethoxycarbonylmethylaminophenyl)-2,6-di(trichloromethane) -s-triazene, 4-(o-chloro-p-N-ethoxycarbonylmethylaminophenyl)-2,6-di(trichloromethyl)-s-triaza Benzene, 4-(o-fluoro-p-N-ethoxycarbonylmethylaminophenyl)-2,6-bis(trichloromethyl)-s-triazabenzene, 4-(m-bromo) -p-N-chloroethylaminophenyl)-2,6-bis(trichloromethyl)-s-triazabenzene, 4-(m-chloro-p-N-chloroethylaminobenzene) Base)-2,6-di(trichloro) Methyl)-s-triazabenzene, 4-(m-fluoro-p-N-chloroethylaminophenyl)-2,6-di(trichloromethyl)-s-triazabenzene, 4-(o-bromo-p-N-chloroethylaminophenyl)-2,6-bis(trichloromethyl)-s-triazabenzene, 4-(o-chloro-p-N- Chloroethylaminophenyl)-2,6-bis(trichloromethyl)-s-triazabenzene, 4-(o-fluoro-p-N-chloroethylaminophenyl)-2, 6-bis(trichloromethyl)-s-triazabenzene, 2,4-bis(trichloromethyl)-6-[3-bromo-4-[N,N-bis(ethoxycarbonyl) Amino]phenyl]-1,3,5-triazabenzene, or a combination of the above compounds. The triazabenzene compounds may be used singly or in combination of two or more.

三氮雜苯類化合物較佳為包括4-[間-溴-對-N,N-二(乙氧基羰基甲基)胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、2,4-二(三氯甲基)-6-對-甲氧基苯乙烯基-s-三氮雜苯,或上述化合物的組合。 The triazabenzene compound preferably includes 4-[m-bromo-p-N,N-bis(ethoxycarbonylmethyl)aminophenyl]-2,6-di(trichloromethyl)- S-triazabenzene, 2,4-bis(trichloromethyl)-6-p-methoxystyryl-s-triazabenzene, or a combination of the above compounds.

苯乙烷酮類化合物的具體例包括對二甲胺苯乙烷酮、α,α’-二甲氧基氧化偶氮苯乙烷酮、2,2’-二甲基-2-苯基苯乙烷酮、對-甲氧基苯乙烷酮、2-甲基-1-(4-甲基硫代苯基)-2-嗎啉代-1-丙酮、2-苄基-2-N,N-二甲胺-1-(4-嗎啉代苯基)-1-丁酮,或上述化合物的組合。 Specific examples of the acetophenone compound include p-dimethylacetonone, α , α' -dimethoxy oxy acetophenone, 2,2'-dimethyl-2-phenylbenzene Ethyl ketone, p-methoxyacetophenone, 2-methyl-1-(4-methylthiophenyl)-2-morpholino-1-propanone, 2-benzyl-2-N N-dimethylamine-1-(4-morpholinophenyl)-1-butanone, or a combination of the above compounds.

苯乙烷酮類化合物可單獨使用或組合多種來使用。 The acetophenone compounds may be used singly or in combination of two or more.

2-甲基-1-(4-甲基硫代苯基)-2-嗎啉代-1-丙酮可為由汽巴精化有限公司製造,型號為IRGACURE 907的商品。2-苄基-2-N,N-二甲胺-1-(4-嗎啉代苯基)-1-丁酮可為由汽巴精化有限公司製造,型號為IRGACURE 369的商品。 2-Methyl-1-(4-methylthiophenyl)-2-morpholino-1-propanone may be a product of the model IRGACURE 907 manufactured by Ciba Specialty Chemicals Co., Ltd. 2-Benzyl-2-N,N-dimethylamine-1-(4-morpholinophenyl)-1-butanone is commercially available from Ciba Specialty Chemicals, Inc. under the model number IRGACURE 369.

苯乙烷酮類化合物較佳為包括2-甲基-1-(4-甲基硫代苯基)-2-嗎啉代-1-丙酮、2-苄基-2-N,N-二甲胺-1-(4-嗎啉代苯基)-1- 丁酮,或上述化合物的組合。 The acetophenone-based compound preferably includes 2-methyl-1-(4-methylthiophenyl)-2-morpholino-1-propanone, 2-benzyl-2-N,N-di Methylamine-1-(4-morpholinophenyl)-1- Butanone, or a combination of the above compounds.

二咪唑類化合物的具體例包括2,2’-雙(鄰-氯苯基)-4,4’,5,5’-四苯基二咪唑、2,2’-雙(鄰-氟苯基)-4,4’,5,5’-四苯基二咪唑、2,2’-雙(鄰-甲基苯基)-4,4’,5,5’-四苯基二咪唑、2,2’-雙(鄰-甲氧基苯基)-4,4’,5,5’-四苯基二咪唑、2,2’-雙(鄰-乙基苯基)-4,4’,5,5’-四苯基二咪唑、2,2’-雙(對-甲氧基苯基)-4,4’,5,5’-四苯基二咪唑、2,2’-雙(2,2’,4,4’-四甲氧基苯基)-4,4’,5,5’-四苯基二咪唑、2,2’-雙(2-氯苯基)-4,4’,5,5’-四苯基二咪唑、2,2’-雙(2,4-二氯苯基)-4,4’,5,5’-四苯基二咪唑,或上述化合物的組合。 Specific examples of the diimidazole compound include 2,2'-bis(o-chlorophenyl)-4,4',5,5'-tetraphenyldiimidazole, 2,2'-bis(o-fluorophenyl) -4,4',5,5'-tetraphenyldiimidazole, 2,2'-bis(o-methylphenyl)-4,4',5,5'-tetraphenyldiimidazole, 2 , 2'-bis(o-methoxyphenyl)-4,4',5,5'-tetraphenyldiimidazole, 2,2'-bis(o-ethylphenyl)-4,4' , 5,5'-tetraphenyldiimidazole, 2,2'-bis(p-methoxyphenyl)-4,4',5,5'-tetraphenyldiimidazole, 2,2'-double (2,2',4,4'-tetramethoxyphenyl)-4,4',5,5'-tetraphenyldiimidazole, 2,2'-bis(2-chlorophenyl)-4 , 4',5,5'-tetraphenyldiimidazole, 2,2'-bis(2,4-dichlorophenyl)-4,4',5,5'-tetraphenyldiimidazole, or the above A combination of compounds.

二咪唑類化合物可單獨使用或組合多種來使用。 The diimidazole compounds may be used singly or in combination of two or more.

二咪唑類化合物較佳為2,2’-雙(2,4-二氯苯基)-4,4’,5,5’-四苯基二咪唑。 The diimidazole compound is preferably 2,2'-bis(2,4-dichlorophenyl)-4,4',5,5'-tetraphenyldiimidazole.

二苯甲酮類化合物的具體例包括噻噸酮、2,4-二乙基噻噸酮、噻噸酮-4-碸、二苯甲酮、4,4’-雙(二甲胺)二苯甲酮、4,4’-雙(二乙胺)二苯甲酮,或上述化合物的組合。二苯甲酮類化合物可單獨或混合使用。二苯甲酮類化合物較佳為4,4’-雙(二乙胺)二苯甲酮。 Specific examples of the benzophenone compound include thioxanthone, 2,4-diethylthioxanthone, thioxanthone-4-anthracene, benzophenone, and 4,4'-bis(dimethylamine) Benzophenone, 4,4'-bis(diethylamine)benzophenone, or a combination of the above compounds. The benzophenone compounds can be used singly or in combination. The benzophenone compound is preferably 4,4'-bis(diethylamine)benzophenone.

α-二酮類化合物的具體例包括苯偶醯、雙乙醯,或上述化合物的組合。α-二酮類化合物可單獨使用或組合多種來使用。 Specific examples of the α -diketone compound include benzophenone, diacetyl or a combination of the above compounds. The α -diketone compounds may be used singly or in combination of two or more.

酮醇類化合物的具體例包括二苯乙醇酮。酮醇類化合物可單獨使用或組合多種來使用。 Specific examples of the ketol compound include benzoin. The ketol compounds may be used singly or in combination of two or more.

酮醇醚類化合物的具體例包括二苯乙醇酮甲醚、二苯乙醇酮乙醚、二苯乙醇酮異丙醚,或上述化合物的組合。酮醇醚類 化合物可單獨使用或組合多種來使用。 Specific examples of the ketol ether compound include diphenylethanol ketone methyl ether, benzophenone ethyl ether, diphenylethanol ketone isopropyl ether, or a combination of the above compounds. Ketoether ethers The compounds may be used singly or in combination of two or more.

醯膦氧化物類化合物的具體例包括2,4,6-三甲基苯醯基二苯基膦氧化物、雙(2,6-二甲氧基苯醯)-2,4,4-三甲基苯基膦氧化物,或上述化合物的組合。醯膦氧化物類化合物可單獨使用或組合多種來使用。 Specific examples of the phosphonium oxide compound include 2,4,6-trimethylphenylnonyldiphenylphosphine oxide, bis(2,6-dimethoxybenzoquinone)-2,4,4-tri Methylphenylphosphine oxide, or a combination of the above compounds. The phosphonium phosphide compounds may be used singly or in combination of two or more.

醌類化合物的具體例包括蒽醌、1,4-萘醌,或上述化合物的組合。醌類化合物可單獨使用或組合多種來使用。 Specific examples of the quinone compound include hydrazine, 1,4-naphthoquinone, or a combination of the above compounds. The terpenoids may be used singly or in combination of two or more.

含鹵素類化合物的具體例包括苯醯甲基氯、三溴甲基苯碸、三(三氯甲基)-s-三氮雜苯,或上述化合物的組合。含鹵素類化合物可單獨使用或組合多種來使用。 Specific examples of the halogen-containing compound include benzoquinone methyl chloride, tribromomethylphenylhydrazine, tris(trichloromethyl)-s-triazabenzene, or a combination of the above compounds. The halogen-containing compound may be used singly or in combination of two or more.

過氧化物的具體例包括二-第三丁基過氧化物等。過氧化物可單獨使用或組合多種來使用。 Specific examples of the peroxide include di-tert-butyl peroxide and the like. The peroxides may be used singly or in combination of two or more.

基於所述鹼可溶性樹脂(A)為100重量份,所述其它光起始劑(C-2)的使用量為0重量份至95重量份,較佳為0重量份至80重量份,更佳為0重量份至65重量份。 The other photoinitiator (C-2) is used in an amount of from 0 part by weight to 95 parts by weight, preferably from 0 part by weight to 80 parts by weight, based on 100 parts by weight of the alkali-soluble resin (A), more preferably It is preferably from 0 part by weight to 65 parts by weight.

另外,基於所述鹼可溶性樹脂(A)為100重量份,所述光起始劑(C)的使用量為10至100重量份,較佳為15重量份至90重量份,更佳為20重量份至80重量份。 Further, the photoinitiator (C) is used in an amount of 10 to 100 parts by weight, preferably 15 parts by weight to 90 parts by weight, more preferably 20 based on 100 parts by weight of the alkali-soluble resin (A). Parts by weight to 80 parts by weight.

溶劑(D):Solvent (D):

本發明之有機溶劑(D)需可溶解鹼可溶性樹脂(A)、具有乙烯性不飽和基之化合物(B)及光起始劑(C),且不與該等成份相互反 應,並具有適當的揮發性者。 The organic solvent (D) of the present invention is required to dissolve the alkali-soluble resin (A), the compound (B) having an ethylenically unsaturated group, and the photoinitiator (C), and is not opposite to the components. Should, and have the appropriate volatiles.

於本發明之一具體例中,有機溶劑(D)為乙二醇甲醚、乙二醇乙醚、二甘醇甲醚、二甘醇乙醚、二甘醇正丙醚、二甘醇正丁醚、三甘醇甲醚、三甘醇乙醚、丙二醇甲醚、丙二醇乙醚、一縮二丙二醇甲醚、一縮二丙二醇乙醚、一縮二丙二醇正丙醚、一縮二丙二醇正丁醚、二縮三丙二醇甲醚、二縮三丙二醇乙醚等之(聚)亞烷基二醇單烷醚類;乙二醇甲醚醋酸酯、乙二醇乙醚醋酸酯、丙二醇甲醚醋酸酯、丙二醇乙醚醋酸酯等(聚)亞烷基二醇單烷醚醋酸酯類;二甘醇二甲醚、二甘醇甲乙醚、二甘醇二乙醚、四氫呋喃等其它醚類;甲乙烷酮、環己酮、2-庚酮、3-庚酮等酮類;2-羥基丙酸甲酯、2-羥基丙酸乙酯等乳酸烷酯類;2-羥基-2-甲基丙酸甲酯、2-羥基-2-甲基丙酸乙酯、3-甲氧基丙酸甲酯、3-甲氧基丙酸乙酯、3-乙氧基丙酸甲酯、3-乙氧基丙酸乙酯(EEP)、乙氧基乙酸乙酯、羥基乙酸乙酯、2-羥基-3-甲基丁酸甲酯、3-甲基-3-甲氧基丁基乙酸酯、3-甲基-3-甲氧基丁基丙酸酯、乙酸乙酯、乙酸正丙酯、乙酸異丙酯、乙酸正丁酯、乙酸異丁酯、乙酸正戊酯、乙酸異戊酯、丙酸正丁酯、丁酸乙酯、丁酸正丙酯、丁酸異丙酯、丁酸正丁酯、丙酮酸甲酯、丙酮酸乙酯、丙酮酸正丙酯、乙醯乙酸甲酯、乙醯乙酸乙酯、2-氧基丁酸乙酯等其它酯類;甲苯、二甲苯等芳香族碳氫化合物類;N-甲基吡咯烷酮、N,N-二甲基甲醯胺、N,N-二甲基乙醯胺等羧酸醯胺類等溶劑,較佳地,溶劑是選自丙二醇甲醚醋酸酯、3-乙氧基丙酸乙酯,且前述溶劑可單獨一 種或混合複數種使用。 In one embodiment of the present invention, the organic solvent (D) is ethylene glycol methyl ether, ethylene glycol ethyl ether, diethylene glycol methyl ether, diethylene glycol ethyl ether, diethylene glycol n-propyl ether, diethylene glycol n-butyl ether, three Glycol methyl ether, triethylene glycol ethyl ether, propylene glycol methyl ether, propylene glycol ethyl ether, dipropylene glycol methyl ether, dipropylene glycol diethyl ether, dipropylene glycol n-propyl ether, dipropylene glycol n-butyl ether, tripropylene glycol (poly)alkylene glycol monoalkyl ethers such as methyl ether and tripropylene glycol ethyl ether; ethylene glycol methyl ether acetate, ethylene glycol ethyl ether acetate, propylene glycol methyl ether acetate, propylene glycol diethyl ether acetate, etc. Poly)alkylene glycol monoalkyl ether acetate; diglyme, diethylene glycol methyl ether, diethylene glycol diethyl ether, tetrahydrofuran and other ethers; methyl ethyl ketone, cyclohexanone, 2- Ketones such as heptanone and 3-heptanone; alkyl lactate such as methyl 2-hydroxypropionate or ethyl 2-hydroxypropionate; methyl 2-hydroxy-2-methylpropionate, 2-hydroxy-2 -ethyl methacrylate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate (EEP) Ethoxyacetic acid Ester, ethyl hydroxyacetate, methyl 2-hydroxy-3-methylbutanoate, 3-methyl-3-methoxybutyl acetate, 3-methyl-3-methoxybutylpropionic acid Ester, ethyl acetate, n-propyl acetate, isopropyl acetate, n-butyl acetate, isobutyl acetate, n-amyl acetate, isoamyl acetate, n-butyl propionate, ethyl butyrate, butyric acid Propyl ester, isopropyl butyrate, n-butyl butyrate, methyl pyruvate, ethyl pyruvate, n-propyl pyruvate, methyl acetate, ethyl acetate, ethyl 2-oxybutyrate Other esters such as esters; aromatic hydrocarbons such as toluene and xylene; carboxylic acid amides such as N-methylpyrrolidone, N,N-dimethylformamide, N,N-dimethylacetamide a solvent such as a solvent, preferably, the solvent is selected from the group consisting of propylene glycol methyl ether acetate and ethyl 3-ethoxypropionate, and the foregoing solvent may be used alone. Kind or mix a plurality of uses.

基於所述鹼可溶性樹脂(A)為100重量份,所述有機溶劑(D)之使用量為500重量份至5000重量份;較佳為800重量份至4500重量份;更佳為1000至4000重量份。 The organic solvent (D) is used in an amount of 500 parts by weight to 5000 parts by weight, based on 100 parts by weight of the alkali-soluble resin (A); preferably 800 parts by weight to 4,500 parts by weight; more preferably 1,000 to 4,000 parts by weight Parts by weight.

顏料(E):Pigment (E):

顏料(E)可為無機顏料、有機顏料或此等之一組合。 The pigment (E) may be an inorganic pigment, an organic pigment or a combination of these.

上述無機顏料的具體例包括硫酸鋇、氧化鋅、硫酸鉛、黃色鉛、鋅黃、氧化鐵紅[紅色氧化鐵(III)]、鎘紅、群青、低鐵氰化鐵、氧化鉻綠、鈷綠、琥珀、鈦黑、合成鐵黑、二氧化鈦或四氧化三鐵等的金屬氧化物粉末、金屬硫化物粉末或金屬粉末等。 Specific examples of the above inorganic pigment include barium sulfate, zinc oxide, lead sulfate, yellow lead, zinc yellow, iron oxide red [red iron oxide (III)], cadmium red, ultramarine blue, iron ferricyanide, chromium oxide green, cobalt. Metal oxide powder such as green, amber, titanium black, synthetic iron black, titanium dioxide or triiron tetroxide, metal sulfide powder or metal powder.

上述有機顏料的具體例包括C.I.顏料紅1、2、3、4、5、6、7、8、9、12、14、15、16、17、21、22、23、31、32、37、41、47、48、48:1、48:2、48:4、49、49:1、49:2、50:1、52:1、52:2、53、53:1、53:2、53:3、57、57:1、57:2、58:4、60、63、63:1、63:2、64、64:1、68、69、81、81:1、81:2、81:3、81:4、83、88、90:1、101、101:1、104、108、108:1、109、112、113、114、122、123、144、146、147、149、151、166、168、169、170、172、173、174、176、177、178、179、181、184、185、187、188、190、193、194、200、202、206、207、208、209、210、214、216、220、221、224、230、231、232、233、235、236、237、238、239、242、243、245、247、249、250、251、 253、254、255、256、257、258、259、260、262、263、264、265、266、267、268、269、270、271、272、273、274、275、276或式(e-1)表示的化合物等的紅色顏料;C.I.顏料黃1、1:1、2、3、4、5、6、9、10、12、13、14、16、17、24、31、32、34、35、35:1、36、36:1、37、37:1、40、41、42、43、48、53、55、61、62、62:1、63、65、73、74、75,81、83、87、93、94、95、97、100、101、104、105、108、109、110、111、116、117、119、120、126、127、127:1、129、133、134、136、138、139、142、147、148、150、151、153、154、155、157、158、159、160、161、162、163、164、165、166、167、168、169、170、172、173、174、175、176、180、181、182、183、184、185、188、189、190、191、191:1、192、193、194、195、196、197、198、199、200、202、203、204、205、206、207或208等的黃色顏料;C.I.顏料橙1、2、5、13、16、17、19、20、21、22、23、24、34、36、38、39、43、46、48、49、61、62、64、65、67、68、69、70、71、72、73、74、75、77、78或79等的橙色顏料;C.I.顏料紫1、14、19、23、29、32、33、36、37、38、39、40、50等的紫色顏料;C.I.顏料藍1、2、15、15:1、15:2、15:3、15:4、15:5、15:6、16、21、22、60、61、64、66等的藍色顏料;C.I.顏料綠7、36、37、42、58等的綠色顏料;C.I.顏料棕23、25、28等的棕色顏料;以及C.I.顏料黑1、7等的黑色顏料。該有機顏料可單獨一種或混合複數種使用。 Specific examples of the above organic pigment include CI Pigment Red 1, 2, 3, 4, 5, 6, 7, 8, 9, 12, 14, 15, 16, 17, 21, 22, 23, 31, 32, 37, 41, 47, 48, 48:1, 48:2, 48:4, 49, 49:1, 49:2, 50:1, 52:1, 52:2, 53, 53:1, 53:2 53:3, 57, 57:1, 57:2, 58:4, 60, 63, 63:1, 63:2, 64, 64:1, 68, 69, 81, 81:1, 81:2 81:3, 81:4, 83, 88, 90:1, 101, 101:1, 104, 108, 108:1, 109, 112, 113, 114, 122, 123, 144, 146, 147, 149, 151, 166, 168, 169, 170, 172, 173, 174, 176, 177, 178, 179, 181, 184, 185, 187, 188, 190, 193, 194, 200, 202, 206, 207, 208, 209, 210, 214, 216, 220, 221, 224, 230, 231, 232, 233, 235, 236, 237, 238, 239, 242, 243, 245, 247, 249, 250, 251, 253, 254, 255, 256, 257, 258, 259, 260, 262, 263, 264, 265, 266, 267, 268, 269, 270, 271, 272, 273, 274, 275, 276 or (e- 1) Red pigment of the compound or the like represented; CI Pigment Yellow 1, 1:1, 2, 3, 4, 5, 6, 9, 10, 12, 13, 14, 16, 17, 24, 31, 32, 34 , 35, 35: 1, 36, 36: 1, 37, 37: 1, 40, 41, 42, 43, 48, 53, 55, 61, 62, 62: 1, 63, 65, 73, 74, 75 , 81, 83, 87, 93, 94, 95, 97, 100, 101, 104, 105, 108, 109, 110, 111, 116, 117, 119, 120, 126, 127, 127: 1, 129, 133 , 134, 136, 138, 139, 142, 147, 148, 150, 151, 153, 154, 155, 157, 158, 159, 160, 161, 162, 163, 164, 165, 166, 167, 168, 169 170,172,173,174,175,176,180,181,182,183,184,185,188,189,190,191,191:1, 192, 193, 194 Yellow pigment of 199, 200, 202, 203, 204, 205, 206, 207 or 208; CI pigment orange 1, 2, 5, 13, 16, 17, 19, 20, 21, 22, 23, 24, 34, 36, 38 Orange pigment of 39, 43, 46, 48, 49, 61, 62, 64, 65, 67, 68, 69, 70, 71, 72, 73, 74, 75, 77, 78 or 79; CI Pigment Violet 1 , purple pigments of 14, 19, 23, 29, 32, 33, 36, 37, 38, 39, 40, 50, etc.; CI pigment blue 1, 2, 15, 15:1, 15:2, 15:3, Blue pigments such as 15:4, 15:5, 15:6, 16, 21, 22, 60, 61, 64, 66; green pigments of CI pigment green 7, 36, 37, 42, 58; CI pigment Brown pigments of 23, 25, 28, etc.; and black pigments of CI Pigment Black 1, 7, etc. The organic pigments may be used singly or in combination of plural kinds.

式(e-1)表示的化合物為溴化二酮吡咯並吡咯顏料,其可藉由習知的專利文獻(公開號:WO 2009/144115)所揭示的合成方法來製作。 The compound represented by the formula (e-1) is a brominated diketopyrrolopyrrole pigment, which can be produced by a synthesis method disclosed in a known patent document (Publication No. WO 2009/144115).

上述的合成方法例如是以琥珀酸二酯作為原料來合成溴化二酮吡咯並吡咯顏料的合成方法。具體而言,將2莫耳的4-溴苯腈及1莫耳的琥珀酸二酯加至惰性有機溶劑(例如:第三戊醇(tert-amylalcohol))中。接著,於鹼金屬或鹼金屬醇鹽的存在下及80℃至110℃的高溫下進行縮合反應,以生成溴化二酮吡咯並吡咯化合物的鹼金屬鹽。然後,使用水、醇類或酸等來質子化溴化二酮吡咯並吡咯化合物的鹼金屬鹽,以獲得溴化二酮吡咯並吡咯顏料。於質子化的階段,一次粒徑的尺寸可藉由質子化的溫度、所使用的水、醇類與酸的比例及其添加量來控制。上述的合成方法僅為舉例說明,且該溴化二酮吡咯並吡咯顏料的合成方法不限於此。 The above synthesis method is, for example, a method for synthesizing a brominated diketopyrrolopyrrole pigment using a succinic acid diester as a raw material. Specifically, 2 moles of 4-bromobenzonitrile and 1 mole of succinic acid diester are added to an inert organic solvent (for example, tert-amylalcohol). Next, a condensation reaction is carried out in the presence of an alkali metal or an alkali metal alkoxide and at a high temperature of from 80 ° C to 110 ° C to form an alkali metal salt of a brominated diketopyrrolopyrrole compound. Then, an alkali metal salt of a brominated diketopyrrolopyrrole compound is protonated using water, an alcohol or an acid or the like to obtain a brominated diketopyrrolopyrrole pigment. At the stage of protonation, the size of the primary particle size can be controlled by the temperature of protonation, the water used, the ratio of alcohol to acid, and the amount of addition. The above synthesis method is merely illustrative, and the synthesis method of the brominated diketopyrrolopyrrole pigment is not limited thereto.

基於鹼可溶性樹脂(A)的使用量為100重量份,顏料(E) 的使用量可為30重量份至300重量份,較佳為40重量份至250重量份,且更佳為50重量份至200重量份。 The amount of the alkali-soluble resin (A) used is 100 parts by weight, and the pigment (E) The amount may be used in an amount of from 30 parts by weight to 300 parts by weight, preferably from 40 parts by weight to 250 parts by weight, and more preferably from 50 parts by weight to 200 parts by weight.

染料(F)Dye (F)

染料(F)包括染料(F-1)以及其它染料(F-2)。 The dye (F) includes the dye (F-1) as well as other dyes (F-2).

染料(F-1)Dye (F-1)

染料(F-1)包括由式(f-1)表示的化合物。 The dye (F-1) includes a compound represented by the formula (f-1).

式(f-1)中,J1、J2、J3及J4各自獨立表示氫原子、碳數為1至8的烷基、經取代的碳數為1至8的烷基、碳數為3至8的環烷基、經取代的碳數為3至8的環烷基、苯基或經取代的苯基;J5及J6各自獨立表示氫原子、碳數為1至8的烷基或氯原子;J7表示具有聚合性不飽合基的基;a表示1至5的整數。 In the formula (f-1), J 1 , J 2 , J 3 and J 4 each independently represent a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, a substituted alkyl group having 1 to 8 carbon atoms, and a carbon number. a cycloalkyl group of 3 to 8, a substituted cycloalkyl group having a carbon number of 3 to 8, a phenyl group or a substituted phenyl group; and J 5 and J 6 each independently represent a hydrogen atom and have a carbon number of 1 to 8. An alkyl group or a chlorine atom; J 7 represents a group having a polymerizable unsaturated group; and a represents an integer of 1 to 5.

J1、J2、J3及J4中的碳數為1至8的烷基的具體例包括甲基、乙基、丙基、異丙基、丁基、第二丁基、第三丁基、異丁基、戊基、第三戊基、己基、庚基、辛基、異辛基、第三辛基或2-乙基己基等。J1、J2、J3及J4較佳為碳數為1至6的烷基,且更佳為碳數為1至4的烷基。 Specific examples of the alkyl group having 1 to 8 carbon atoms in J 1 , J 2 , J 3 and J 4 include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, a second butyl group and a third butyl group. Base, isobutyl, pentyl, third amyl, hexyl, heptyl, octyl, isooctyl, trioctyl or 2-ethylhexyl, and the like. J 1 , J 2 , J 3 and J 4 are preferably an alkyl group having 1 to 6 carbon atoms, and more preferably an alkyl group having 1 to 4 carbon atoms.

J1、J2、J3及J4中的碳數為3至8的環烷基的具體例包括環丙基、環丁基、環戊基、環己基、環庚基或環辛基。J1、J2、J3及J4較佳為碳數為5至7的環烷基,且更佳為環己基。 Specific examples of the cycloalkyl group having 3 to 8 carbon atoms in J 1 , J 2 , J 3 and J 4 include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group or a cyclooctyl group. J 1 , J 2 , J 3 and J 4 are preferably a cycloalkyl group having a carbon number of 5 to 7, and more preferably a cyclohexyl group.

J1、J2、J3及J4中的碳數為3至8的環烷基的具體例包括環丙基、環丁基、環戊基、環己基、環庚基或環辛基。J1、J2、J3及J4較佳為碳數為5至7的環烷基,且更佳為環己基。 Specific examples of the cycloalkyl group having 3 to 8 carbon atoms in J 1 , J 2 , J 3 and J 4 include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group or a cyclooctyl group. J 1 , J 2 , J 3 and J 4 are preferably a cycloalkyl group having a carbon number of 5 to 7, and more preferably a cyclohexyl group.

J1、J2、J3及J4中的碳數為1至8的烷基、碳數為3至8的環烷基及苯基可以具有取代基,該取代基較佳為鹵素原子、-Ja、-OH、-OJa、-SO3H、-SO3T、-CO2H、-CO2Ja、-SO3Ja、-SO2NHJb、-SO2NJbJc或-SO3 -The alkyl group having 1 to 8 carbon atoms, the cycloalkyl group having 3 to 8 carbon atoms, and the phenyl group in J 1 , J 2 , J 3 and J 4 may have a substituent, and the substituent is preferably a halogen atom. -J a , -OH, -OJ a , -SO 3 H, -SO 3 T, -CO 2 H, -CO 2 J a , -SO 3 J a , -SO 2 NHJ b , -SO 2 NJ b J c or -SO 3 - .

在此,Ja表示碳數為1至10的飽和烴基。其中,該飽和烴基中所含有的氫原子可以經鹵素原子取代,另外飽和烴基中含有的亞甲基可以經氧原子、羰基或-NJa-取代。 Here, J a represents a saturated hydrocarbon group having a carbon number of 1 to 10. Here, the hydrogen atom contained in the saturated hydrocarbon group may be substituted by a halogen atom, and the methylene group contained in the saturated hydrocarbon group may be substituted with an oxygen atom, a carbonyl group or -NJ a -.

Jb和Jc各自獨立表示碳數為1至10的直鏈狀或支鏈狀的烷基、碳數為3至30(較佳為3至8)的環烷基或-D,或表示Jb和Jc相互鍵結而形成的碳數為2至10的雜環基。其中,該烷基和環烷基所含有的氫原子可以經羥基、鹵素原子、-D、-CH=CH2或-CH=CHJa取代,另外該烷基和環烷基中含有的亞甲基可以經氧原子、羰基或-NJa-取代,該雜環基所含有的氫原子可以經-Ja、-OH或-D取代。 J b and J c each independently represent a linear or branched alkyl group having 1 to 10 carbon atoms, a cycloalkyl group having a carbon number of 3 to 30 (preferably 3 to 8) or -D, or A heterocyclic group having 2 to 10 carbon atoms formed by bonding J b and J c to each other. Wherein the hydrogen atom contained in the alkyl group and the cycloalkyl group may be substituted by a hydroxyl group, a halogen atom, -D, -CH=CH 2 or -CH=CHJ a , and the methylene group contained in the alkyl group and the cycloalkyl group The group may be substituted with an oxygen atom, a carbonyl group or -NJ a -, and the hydrogen atom contained in the heterocyclic group may be substituted with -J a , -OH or -D.

T表示鈉原子或鉀原子。 T represents a sodium atom or a potassium atom.

D表示碳數為6至10的芳香族烴基或碳數為5至10的 芳香族雜環基。其中,該芳香族烴基及芳香族雜環基所含有的氫原子可以經-OH、-Ja、-OJa、-NO2、-CH=CH2、-CH=CHJa或鹵素原子取代。 D represents an aromatic hydrocarbon group having 6 to 10 carbon atoms or an aromatic heterocyclic group having 5 to 10 carbon atoms. Here, the hydrogen atom contained in the aromatic hydrocarbon group and the aromatic heterocyclic group may be substituted with -OH, -J a , -OJ a , -NO 2 , -CH=CH 2 , -CH=CHJ a or a halogen atom.

Ja中的飽和烴基只要碳數為1至10,則可以為直鏈狀、支鏈狀以及環狀中的任一種,並且也可以具有橋聯結構(bridged structure)。具體而言,除與上述J1、J2、J3及J4同樣的烷基之外,Ra的具體例還可以包括壬基、癸基、環戊基、環己基、環庚基、環辛基或三環癸基。另外,飽和烴基所含有的亞甲基經氧原子取代而成的基的具體例包括甲氧基丙基、乙氧基丙基、2-乙基己氧基丙基或甲氧基己基等。 The saturated hydrocarbon group in J a may be any of a linear chain, a branched chain, and a cyclic chain as long as the carbon number is from 1 to 10, and may have a bridged structure. Specifically, in addition to the alkyl group similar to the above J 1 , J 2 , J 3 and J 4 , specific examples of R a may further include an anthracenyl group, a fluorenyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, Cyclooctyl or tricyclic fluorenyl. Further, specific examples of the group in which the methylene group contained in the saturated hydrocarbon group is substituted with an oxygen atom include a methoxypropyl group, an ethoxypropyl group, a 2-ethylhexyloxypropyl group or a methoxyhexyl group.

另外,J1、J2、J3及J4中的烷基、環烷基以及苯基的取代基-CO2Ra的具體例包括甲氧羰基(methyloxycarbonyl)、乙氧羰基(ethyloxycarbonyl)、丙氧羰基(propyloxycarbonyl)、異丙氧羰基(isopropyloxycarbonyl)、丁氧羰基(butyloxycarbonyl)、環己氧羰基(cyclohexyloxycarbonyl)或甲氧基丙氧羰基(methoxy propyloxycarbonyl)。另外,-SO3Ja的具體例包括甲磺醯基(methanesulfonyl group)、乙磺醯基(ethanesulfonyl group)、己磺醯基(hexanesulfonyl group)或癸磺醯基(decanesulfonyl group)。 Further, specific examples of the alkyl group, the cycloalkyl group and the substituent of the phenyl group -CO 2 R a in J 1 , J 2 , J 3 and J 4 include a methyloxycarbonyl group, an ethyloxycarbonyl group, and a methyloxycarbonyl group. Propyloxycarbonyl, isopropyloxycarbonyl, butyloxycarbonyl, cyclohexyloxycarbonyl or methoxy propyloxycarbonyl. Further, specific examples of -SO 3 J a include a methanesulfonyl group, a ethanesulfonyl group, a hexanesulfonyl group, or a decanesulfonyl group.

Jb和Jc相互鍵結而形成的雜環基的具體例包括吡咯(pyrrole)、吡啶(pyridine)、吲哚(indole)、異吲哚(isoindole)、喹啉(quinoline)、異喹啉(isoquinoline)、咔唑(carbazole)、啡啶(phenanthridine)、吖啶(acridine)或啡噻嗪(phenothiazine)。 Specific examples of the heterocyclic group in which J b and J c are bonded to each other include pyrrole, pyridine, indole, isoindole, quinoline, isoquinoline. (isoquinoline), carbazole, phenanthridine, acridine or phenothiazine.

D中的芳香族烴基的具體例包括苯基、萘基、薁基(azulenyl)等。另外,芳香族雜環基的具體例包括呋喃基(furyl group)、噻吩基(thienyl group)、吡啶基(pyridyl group)、吡咯基(pyrrolyl group)、噁唑基(oxazolyl group)、異噁唑基(isothiazolyl group)、噻唑基(thiazolyl group)、異噻唑基(isothiazolyl group)、咪唑基(imidazolyl group)、吡唑基(pyrazolyl group)或嘧啶基(pyrimidyl group)。 Specific examples of the aromatic hydrocarbon group in D include a phenyl group, a naphthyl group, an azulenyl group, and the like. Further, specific examples of the aromatic heterocyclic group include a furyl group, a thienyl group, a pyridyl group, a pyrrolyl group, an oxazolyl group, and an isoxazole. An isothiazolyl group, a thiazolyl group, an isothiazolyl group, an imidazolyl group, a pyrazolyl group or a pyrimidyl group.

J5和J6中的碳數為1至8的烷基的具體例與J1、J2、J3及J4中的碳數為1至8的烷基的具體例相同,在此不另行贅述。 Specific examples of the alkyl group having 1 to 8 carbon atoms in J 5 and J 6 are the same as the specific examples of the alkyl group having 1 to 8 carbon atoms in J 1 , J 2 , J 3 and J 4 , and Will be described separately.

a表示1至5的整數,a為2以上的整數時,多個J7可以相同亦可不同,a較佳為1或2,更佳為1。 a represents an integer of 1 to 5, and when a is an integer of 2 or more, a plurality of J 7 may be the same or different, and a is preferably 1 or 2, more preferably 1.

由式(f-1)表示的化合物較佳為包括由式(f-2)表示的化合物。又,由式(f-2)表示的化合物較佳為式(f-2)中的-COOJ8基取代在苯環上的鄰位的化合物。 The compound represented by the formula (f-1) preferably includes the compound represented by the formula (f-2). Further, the compound represented by the formula (f-2) is preferably a compound in which the -COOJ 8 group in the formula (f-2) is substituted at the ortho position on the benzene ring.

式(f-2)中,J1、J2、J3及J4各自獨立表示氫原子、碳數為1至8的烷基、經取代的碳數為1至8的烷基、碳數為3至8的環烷基、經取代的碳數為3至8的環烷基、苯基或經取代的苯基; J5及J6各自獨立表示氫原子、碳數為1至8的烷基或氯原子;J8表示具有聚合性不飽合基的基。 In the formula (f-2), J 1 , J 2 , J 3 and J 4 each independently represent a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, a substituted alkyl group having 1 to 8 carbon atoms, and a carbon number. a cycloalkyl group of 3 to 8, a substituted cycloalkyl group having a carbon number of 3 to 8, a phenyl group or a substituted phenyl group; and J 5 and J 6 each independently represent a hydrogen atom and have a carbon number of 1 to 8. An alkyl group or a chlorine atom; and J 8 represents a group having a polymerizable unsaturated group.

就考慮交聯反應的容易性而言,J7及J8中的聚合性不飽和基較佳為丙烯醯基或甲基丙烯醯基。J8的具體例較佳為由式(f-3)表示的基或由式(f-4)表示的基。 The polymerizable unsaturated group in J 7 and J 8 is preferably an acryl fluorenyl group or a methacryl fluorenyl group in view of easiness of the crosslinking reaction. Specific examples of J 8 are preferably a group represented by the formula (f-3) or a group represented by the formula (f-4).

式(f-3)及式(f-4)中,J9及J10各自獨立表示氫原子或甲基;V1、V2、V3及V4各自獨立表示經取代或未經取代的碳數為1至12的烷二基;Q1表示;Q2表示二價脂環式烴基;b表示0至12的整數;c及d各自獨立表示0至6的整數。 In the formulae (f-3) and (f-4), J 9 and J 10 each independently represent a hydrogen atom or a methyl group; and V 1 , V 2 , V 3 and V 4 each independently represent substituted or unsubstituted. An alkanediyl group having a carbon number of 1 to 12; Q 1 represents or ; Q 2 represents a divalent alicyclic hydrocarbon group; b represents an integer of 0 to 12; and c and d each independently represent an integer of 0 to 6.

J9和J10較佳為甲基。 J 9 and J 10 are preferably a methyl group.

V1、V2、V3及V4中的碳數為1至12的烷二基的具體例包括亞甲基、伸乙基、乙烷-1,1-二基、丙烷-1,1-二基、丙烷-1,2-二基、丙烷-1,3-二基、丙烷-2,2-二基、丁烷-1,2-二基、丁烷-1,3-二基、丁烷-1,4-二基、戊烷-1,2-二基、戊烷-1,3-二基、戊烷-1,4-二基、戊烷-1,5-二基、己烷-1,5-二基、己烷-1,6-二基、辛烷-1,8-二基或癸烷-1,10-二基。V1、V2、V3及V4較佳為碳數為2至8的烷二基,且更佳為碳數為2至6的烷二基。 Specific examples of the alkanediyl group having 1 to 12 carbon atoms in V 1 , V 2 , V 3 and V 4 include a methylene group, an ethylidene group, an ethane-1,1-diyl group, and a propane-1,1. -diyl, propane-1,2-diyl, propane-1,3-diyl, propane-2,2-diyl, butane-1,2-diyl, butane-1,3-diyl Butane-1,4-diyl, pentane-1,2-diyl, pentane-1,3-diyl, pentane-1,4-diyl, pentane-1,5-diyl Hexane-1,5-diyl, hexane-1,6-diyl, octane-1,8-diyl or decane-1,10-diyl. V 1 , V 2 , V 3 and V 4 are preferably an alkanediyl group having a carbon number of 2 to 8, and more preferably an alkanediyl group having a carbon number of 2 to 6.

該烷二基的取代基包括羥基、鹵素原子、(甲基)丙烯醯氧基或苯氧基等,且較佳為羥基。 The substituent of the alkanediyl group includes a hydroxyl group, a halogen atom, a (meth)acryloxy group or a phenoxy group, and is preferably a hydroxyl group.

Q2中的二價脂環式烴基較佳為碳數為3至20的脂環式烴基,更佳為碳數為3至12的脂環式烴基。此外,該脂環式烴基可以為2至4環的交聯環式烴基。 The divalent alicyclic hydrocarbon group in Q 2 is preferably an alicyclic hydrocarbon group having 3 to 20 carbon atoms, more preferably an alicyclic hydrocarbon group having 3 to 12 carbon atoms. Further, the alicyclic hydrocarbon group may be a 2 to 4 ring crosslinked cyclic hydrocarbon group.

具體而言,J8較佳為(甲基)丙烯醯氧基烷基。另外,該(甲基)丙烯醯氧基烷基的總碳數較佳為4至16,特佳為4至10。 Specifically, J 8 is preferably a (meth) propylene decyloxyalkyl group. Further, the (meth) propylene decyloxyalkyl group has a total carbon number of preferably 4 to 16, particularly preferably 4 to 10.

b較佳為表示0至3的整數,另外c和d較佳為各自獨立表示0至3的整數。 b is preferably an integer representing 0 to 3, and c and d are preferably integers each independently representing 0 to 3.

由式(f-1)表示的化合物是由具有羥基及聚合性不飽和基的化合物與由式(f-5)表示的化合物反應而得,其中聚合性不飽合基為丙烯醯基或甲基丙烯醯基。該酯化反應可以使用周知的方法。又,式(f-5)中的-COOH基較佳為取代在苯環上的鄰位。 The compound represented by the formula (f-1) is obtained by reacting a compound having a hydroxyl group and a polymerizable unsaturated group with a compound represented by the formula (f-5), wherein the polymerizable unsaturated group is an acrylonitrile group or a group Acryl fluorenyl. A well-known method can be used for this esterification reaction. Further, the -COOH group in the formula (f-5) is preferably substituted with an ortho position on the benzene ring.

式(f-5)中,J1、J2、J3及J4各自獨立表示氫原子、碳數為1至8的烷基、經取代的碳數為1至8的烷基、碳數為3至8的環烷基、經取代的碳數為3至8的環烷基、苯基或經取代的苯基;J5及J6各自獨立表示氫原子、碳數為1至8的烷基或氯原子;IN- 表示陰離子。 In the formula (f-5), J 1 , J 2 , J 3 and J 4 each independently represent a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, a substituted alkyl group having 1 to 8 carbon atoms, and a carbon number. a cycloalkyl group of 3 to 8, a substituted cycloalkyl group having a carbon number of 3 to 8, a phenyl group or a substituted phenyl group; and J 5 and J 6 each independently represent a hydrogen atom and have a carbon number of 1 to 8. An alkyl or chlorine atom; IN - represents an anion.

上述具有羥基及聚合性不飽和基的化合物,只要在該化合物中分別具有1個以上的羥基及(甲基)丙烯醯基即可,羥基及(甲基)丙烯醯基的鍵結數、鍵結位置沒有特別的限制。另外,羥基可以使用醇性羥基、酚性羥基中的任一種。進而,除羥基及(甲基)丙烯醯基以外還具有其它取代基時,其種類、鍵結位置、鍵結數不受限制。 The compound having a hydroxyl group and a polymerizable unsaturated group may have one or more hydroxyl groups and a (meth) acrylonitrile group in the compound, and the number of bonds and bonds of the hydroxy group and the (meth) acryl fluorenyl group. The knot position is not particularly limited. Further, as the hydroxyl group, any of an alcoholic hydroxyl group and a phenolic hydroxyl group can be used. Further, when other substituents are contained in addition to the hydroxyl group and the (meth)acrylinyl group, the kind, the bonding position, and the number of bonds are not limited.

具有羥基及(甲基)丙烯醯基的化合物的具體例較佳為由式(f-3a)或(f-4a)表示的化合物。 A specific example of the compound having a hydroxyl group and a (meth)acrylinyl group is preferably a compound represented by the formula (f-3a) or (f-4a).

式(f-3a)及(f-4a)中,J9、J10、V1、V2、V3、V4、Q1、Q2、b、c以及d與式(f-3)及(f-4)中的J9、J10、V1、V2、V3、V4、Q1、Q2、b、c以及d同義,在此不另行贅述。 In the formulas (f-3a) and (f-4a), J 9 , J 10 , V 1 , V 2 , V 3 , V 4 , Q 1 , Q 2 , b, c and d and the formula (f-3) And J 9 , J 10 , V 1 , V 2 , V 3 , V 4 , Q 1 , Q 2 , b, c, and d in (f-4) are synonymous, and are not described herein.

具有羥基及(甲基)丙烯醯基的化合物的具體例較佳為包括由式(f-2-1)至式(f-2-4)表示的化合物中的至少一者。 Specific examples of the compound having a hydroxyl group and a (meth)acrylinyl group preferably include at least one of the compounds represented by the formula (f-2-1) to the formula (f-2-4).

式(f-2-1)中,Jd表示氫原子或甲基;f和g各自獨立表示0至 2的整數;h表示1至6的整數。其中,f和g中的至少1種為1以上的整數時,-CH(OH)-基、-CH(CH3)-基以及-CH2-基可以按任意的順序鍵結。 In the formula (f-2-1), J d represents a hydrogen atom or a methyl group; f and g each independently represent an integer of 0 to 2; and h represents an integer of 1 to 6. When at least one of f and g is an integer of 1 or more, the -CH(OH)- group, the -CH(CH 3 )- group, and the -CH 2 - group may be bonded in an arbitrary order.

式(f-2-2)中,Je表示氫原子或甲基;i和j各自獨立表示1至12的整數。 In the formula (f-2-2), J e represents a hydrogen atom or a methyl group; and i and j each independently represent an integer of 1 to 12.

式(f-2-3)中,Jf表示氫原子或甲基;k和mx各自獨立表示1至12的整數。 In the formula (f-2-3), J f represents a hydrogen atom or a methyl group; and k and mx each independently represent an integer of 1 to 12.

式(f-2-4)中,Jg表示氫原子或甲基;A表示選自以下述式(fI)至(fIV)表示的基的群組中的二價基;n及q各自獨立表示0至6的整數。 In the formula (f-2-4), J g represents a hydrogen atom or a methyl group; and A represents a divalent group selected from the group consisting of the groups represented by the following formulas (fI) to (fIV); n and q are each independently An integer representing 0 to 6.

由式(f-2-1)表示的化合物的具體例包括(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸1-甲基-2-羥基乙酯、(甲基)丙烯酸2-甲基-2-羥基乙酯、(甲基)丙烯酸3-羥基丙酯、(甲基)丙烯酸1-甘油酯(1-glycerol(meth)acrylate)、(甲基)丙烯酸4-羥基丁酯、(甲基)丙烯酸5-羥基戊酯、(甲基)丙烯酸6-羥基己酯、(甲基)丙烯酸7-羥基庚酯、(甲基)丙烯酸8-羥基辛酯、(甲基)丙烯酸9-羥基壬酯、(甲基)丙烯酸10-羥基癸酯、(甲基)丙烯酸11-羥基十一烷酯或(甲基)丙烯酸12-羥基十二烷酯。 Specific examples of the compound represented by the formula (f-2-1) include 2-hydroxyethyl (meth)acrylate, 1-methyl-2-hydroxyethyl (meth)acrylate, and (meth)acrylic acid 2- Methyl-2-hydroxyethyl ester, 3-hydroxypropyl (meth)acrylate, 1-glycerol (meth)acrylate, 4-hydroxybutyl (meth)acrylate, 5-hydroxypentyl (meth)acrylate, 6-hydroxyhexyl (meth)acrylate, 7-hydroxyheptyl (meth)acrylate, 8-hydroxyoctyl (meth)acrylate, (meth)acrylic acid 9 - Hydroxy decyl ester, 10-hydroxydecyl (meth) acrylate, 11-hydroxyundecyl (meth) acrylate or 12-hydroxydodecyl (meth) acrylate.

另外,由式(f-2-2)表示的化合物的具體例包括(甲基)丙烯酸2-(6-羥基己醯氧基)乙酯、(甲基)丙烯酸3-(6-羥基己醯氧基)丙酯、(甲基)丙烯酸4-(6-羥基己醯氧基)丁酯、(甲基)丙烯酸5-(6-羥基己醯氧基)戊酯或(甲基)丙烯酸6-(6-羥基己醯氧基)己酯等(甲基)丙烯酸(6-羥基己醯氧基)烷基酯類等;(甲基)丙烯酸(6-羥基己醯氧基)烷基酯類的市售品包括商品名為PLACCEL FM1D、PLACCEL FM2D(以上,大賽璐(DAICEL)化學工業(股)製)等。 Further, specific examples of the compound represented by the formula (f-2-2) include 2-(6-hydroxyhexyloxy)ethyl (meth)acrylate and 3-(6-hydroxyhexanyl)(meth)acrylate. Oxy)propyl ester, 4-(6-hydroxyhexyloxy)butyl (meth)acrylate, 5-(6-hydroxyhexyloxy)pentyl (meth)acrylate or (meth)acrylic acid 6 (6-hydroxyhexyloxy) hexyl ester (6-hydroxyhexyloxy) alkyl ester, etc.; (6-hydroxyhexyloxy) alkyl (meth)acrylate Commercial products of the class include the trade names PLACCEL FM1D, PLACCEL FM2D (above, DAICEL Chemical Industry Co., Ltd.) and the like.

另外,以式(f-2-3)表示的化合物的具體例包括(甲基)丙烯酸2-(3-羥基-2,2-二甲基丙氧基羰基氧基)乙酯、(甲基)丙烯酸3-(3-羥基-2,2-二甲基丙氧基羰基氧基)丙酯、(甲基)丙烯酸4-(3-羥基-2,2-二甲基丙氧基羰基氧基)丁酯、(甲基)丙烯酸5-(3-羥基-2,2-二甲基丙氧基羰基氧基)戊酯或(甲基)丙烯酸6-(3-羥基-2,2-二甲基丙氧基羰基氧基)己酯等(甲基)丙烯酸(3-羥基-2,2-二甲基丙氧基羰基氧基)烷基酯類等;(甲基)丙烯酸(3-羥基-2,2-二甲基丙氧基羰基氧基)烷基酯類的市售品包括商品名為HEMAC1(大賽璐(DAICEL)化學工業(股)製)等。 Further, specific examples of the compound represented by the formula (f-2-3) include 2-(3-hydroxy-2,2-dimethylpropoxycarbonyloxy)ethyl (meth)acrylate, (methyl) ) 3-(3-hydroxy-2,2-dimethylpropoxycarbonyloxy)propyl acrylate, 4-(3-hydroxy-2,2-dimethylpropoxycarbonyloxy)(meth)acrylate Butyl ester, 5-(3-hydroxy-2,2-dimethylpropoxycarbonyloxy)pentyl (meth)acrylate or 6-(3-hydroxy-2,2-(meth)acrylate (3-hydroxy-2,2-dimethylpropoxycarbonyloxy)alkyl (meth)acrylate, etc.; dimethyl oxycarbonyl oxy) hexyl ester; (meth)acrylic acid (3) Commercial products of -hydroxy-2,2-dimethylpropoxycarbonyloxy)alkyl esters include the trade name HEMAC1 (manufactured by DAICEL Chemical Industry Co., Ltd.) and the like.

另外,以式(f-2-4)表示的化合物的具體例包括(甲基)丙烯酸4-羥基環己酯、(甲基)丙烯酸(4-羥甲基環己基)甲酯、(甲基)丙烯酸2-[4-(2-羥乙基)環己基]乙酯、(甲基)丙烯酸3-羥基雙環[2.2.1]庚-5-烯-2-基酯、(甲基)丙烯酸(3-羥甲基雙環[2.2.1]庚-5-烯-2-基)甲酯、(甲基)丙烯酸2-[3-(2-羥乙基)雙環[2.2.1]庚-5-烯-2-基]乙酯、(甲基)丙烯酸8-羥基雙環[2.2.1]庚-5-烯-2-基酯、(甲基)丙烯酸2-羥基八氫-4,7-亞甲基茚-5-基酯((meth)acrylic acid 2-hydroxy octahydro-4,7-methanoindene-5-yl ester)、(甲基)丙烯酸(2-羥甲基八氫-4,7-亞甲基茚-5-基)甲酯、(甲基)丙烯酸2-[2-(2-羥乙基)八氫-4,7-亞甲基茚-5-基]乙酯、(甲基)丙烯酸3-羥基金剛烷-1-基酯、(甲基)丙烯酸(3-羥甲基金剛烷-1-基)甲酯或(甲基)丙烯酸2-[3-(2-羥乙基)金剛烷-1-基]乙酯等。 Further, specific examples of the compound represented by the formula (f-2-4) include 4-hydroxycyclohexyl (meth)acrylate, (4-hydroxymethylcyclohexyl)methyl (meth)acrylate, and (methyl) ) 2-[4-(2-hydroxyethyl)cyclohexyl]ethyl acrylate, 3-hydroxybicyclo[2.2.1]hept-5-en-2-yl (meth)acrylate, (meth)acrylic acid (3-Hydroxymethylbicyclo[2.2.1]hept-5-en-2-yl)methyl ester, 2-[3-(2-hydroxyethyl)bicyclo[2.2.1]heptyl-(meth)acrylate 5-en-2-yl]ethyl ester, 8-hydroxybicyclo[2.2.1]hept-5-en-2-yl (meth)acrylate, 2-hydroxyoctahydro-4,7 (meth)acrylate - (meth)acrylic acid 2-hydroxy octahydro-4,7-methanoindene-5-yl ester), (meth)acrylic acid (2-hydroxymethyl octahydro-4,7) -methylene hydrazin-5-yl)methyl ester, 2-[2-(2-hydroxyethyl) octahydro-4,7-methylene fluoren-5-yl]ethyl (meth)acrylate, ( 3-hydroxyadamantan-1-yl (meth)acrylate, (3-hydroxymethyladamantan-1-yl)methyl (meth)acrylate or 2-[3-(2-hydroxyl)(meth)acrylate Ethyl)adamantan-1-yl]ethyl ester and the like.

在這些具有羥基及(甲基)丙烯醯基的化合物中,從反應性 的觀點而言,較佳為下述化合物:式(f-2-1)中的f及g為0,且h為2至6的化合物;式(f-2-1)中的f為1,g為0,且h為1至5的化合物;式(f-2-2)中的i為2或3,且j為1的化合物;式(f-2-3)中的k為2或3,且m為1的化合物;式(f-2-4)中的n為1或2,或q為1或2,且A為由式(fI)或式(fIV)表示的基的化合物。 In these compounds having a hydroxyl group and a (meth)acrylinyl group, from reactivity From the viewpoint of the above, a compound wherein f and g in the formula (f-2-1) are 0 and h is 2 to 6; f in the formula (f-2-1) is 1 , g is 0, and h is a compound of 1 to 5; i in the formula (f-2-2) is 2 or 3, and j is a compound of 1; k in the formula (f-2-3) is 2 Or a compound in which m is 1; n in the formula (f-2-4) is 1 or 2, or q is 1 or 2, and A is a group represented by the formula (fI) or the formula (fIV) Compound.

具有羥基及(甲基)丙烯醯基的化合物較佳為包括(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸1-甘油酯、(甲基)丙烯酸6-羥基己酯、(甲基)丙烯酸2-(6-羥基己醯氧基)乙酯、(甲基)丙烯酸2-(3-羥基-2,2-二甲基丙氧基羰基氧基)乙酯、(甲基)丙烯酸(4-羥甲基環己基)甲酯或(甲基)丙烯酸(3-羥甲基金剛烷-1-基)甲酯。 The compound having a hydroxyl group and a (meth)acrylinyl group preferably includes 2-hydroxyethyl (meth)acrylate, 1-glyceryl (meth)acrylate, and 6-hydroxyhexyl (meth)acrylate. 2-(6-hydroxyhexyloxy)ethyl acrylate, 2-(3-hydroxy-2,2-dimethylpropoxycarbonyloxy)ethyl (meth)acrylate, (methyl) (4-Hydroxymethylcyclohexyl)methyl acrylate or (3-hydroxymethyladamantan-1-yl)methyl (meth) acrylate.

除了由式(f-2-1)至式(f-2-4)表示的化合物以外,具有羥基及(甲基)丙烯醯基的化合物的具體例包括4-羥基苯基(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯(pentaerythritol tri(meth)acrylate)、二季戊四醇五(甲基)丙烯酸酯、二甲基丙烯酸甘油酯、由式(f-2-5)表示的化合物或由式(f-2-6)表示的化合物。 Specific examples of the compound having a hydroxyl group and a (meth)acrylinyl group include 4-hydroxyphenyl (meth)acrylic acid, in addition to the compound represented by the formula (f-2-1) to the formula (f-2-4). Ester, pentaerythritol tri(meth)acrylate, dipentaerythritol penta (meth) acrylate, glyceryl dimethacrylate, compound represented by formula (f-2-5) or A compound represented by the formula (f-2-6).

在本發明中,具有羥基及(甲基)丙烯醯基的化合物可以單獨使用或組合兩種以上來使用。 In the present invention, the compound having a hydroxyl group and a (meth)acrylinyl group may be used singly or in combination of two or more.

接著,對上述式(f-5)中的IN-進行說明。 Next, IN - in the above formula (f-5) will be described.

IN-的具體例包括鹵素離子、硼陰離子、磷酸陰離子、羧酸陰離子、硫酸陰離子、有機磺酸陰離子、氮陰離子或甲基化物陰離子(methide anion)等。 Specific examples of IN - include a halogen ion, a boron anion, a phosphate anion, a carboxylic acid anion, a sulfate anion, an organic sulfonate anion, a nitrogen anion or amethide anion.

鹵素離子包括氟離子、氯離子、溴離子或碘離子等。 Halogen ions include fluoride ions, chloride ions, bromide ions or iodide ions.

另外,硼陰離子的具體例包括BF4 -等無機硼陰離子;(CF3)4B-、(CF3)3BF-、(CF3)2BF2 -、(CF3)BF3 -、(C2F5)4B-、(C2F5)3BF-、(C2F5)BF3 -、(C2F5)2BF2 -、(CF3)(C2F5)2BF-、(C6F5)4B-、[(CF3)2C6H3]4B-、(CF3C6H4)4B-、(C6F5)2BF2 -、(C6F5)BF3 -、(C6H3F2)4B-、B(CN)4 -、B(CN)F3 -、B(CN)2F2 -、B(CN)3F-、(CF3)3B(CN)-、(CF3)2B(CN)2 -、(C2F5)3B(CN)-、(C2F5)2B(CN)2 -、(n-C3F7)3B(CN)-、(n-C4F9)3B(CN)-、(n-C4F9)2B(CN)2 -、(n-C6F13)3B(CN)-、(CHF2)3B(CN)-、(CHF2)2B(CN)2 -、(CH2CF3)3B(CN)-、(CH2CF3)2B(CN)2 -、(CH2C2F5)3B(CN)-、(CH2C2F5)2B(CN)2 -、(CH2CH2C3F7)2B(CN)2 -、(n-C3F7CH2)2B(CN)2 -、(C6H5)3B(CN)-、四苯基硼酸鹽、四(單氟苯基)硼酸鹽、四(二氟苯基)硼酸鹽、四(三氟苯基)硼酸鹽、四(四氟苯基)硼酸鹽、四(五氟 苯基)硼酸鹽、四(四氟甲基苯基)硼酸鹽、四(甲苯基)硼酸鹽、四(二甲苯基)硼酸鹽、(三苯基,五氟苯基)硼酸鹽、[參(五氟苯基),苯基]硼酸鹽或十三氫化-7,8-二羰基十一硼酸鹽(tridecahydride-7,8-dicarbaundecaborate)等有機硼陰離子,除此之外,還可以舉出在日本特開平10-195119號公報、日本特開2010-094807號公報、日本特開2006-243594號公報、日本特開2002-341533號公報或日本特開平08-015521號公報等中記載的硼陰離子。 Further, specific examples of the boron anion include inorganic boron anions such as BF 4 - ; (CF 3 ) 4 B - , (CF 3 ) 3 BF - , (CF 3 ) 2 BF 2 - , (CF 3 ) BF 3 - , ( C 2 F 5 ) 4 B - , (C 2 F 5 ) 3 BF-, (C 2 F 5 ) BF 3 - , (C 2 F 5 ) 2 BF 2 - , (CF 3 ) (C 2 F 5 ) 2 BF - , (C 6 F 5 ) 4 B - , [(CF 3 ) 2 C 6 H 3 ] 4 B - , (CF 3 C 6 H 4 ) 4 B - , (C 6 F 5 ) 2 BF 2 - , (C 6 F 5 )BF 3 - , (C 6 H 3 F 2 ) 4 B - , B(CN) 4 - , B(CN)F 3 - , B(CN) 2 F 2 - , B( CN) 3 F - , (CF 3 ) 3 B(CN) - , (CF 3 ) 2 B(CN) 2 - , (C 2 F 5 ) 3 B(CN) - , (C 2 F 5 ) 2 B (CN) 2 - , (nC 3 F 7 ) 3 B(CN) - , (nC 4 F 9 ) 3 B(CN) - , (nC 4 F 9 ) 2 B(CN) 2 - , (nC 6 F 13 ) 3 B(CN) - , (CHF 2 ) 3 B(CN) - , (CHF 2 ) 2 B(CN) 2 - , (CH 2 CF 3 ) 3 B(CN) - , (CH 2 CF 3 2 B(CN) 2 - , (CH 2 C 2 F 5 ) 3 B(CN) - , (CH 2 C 2 F 5 ) 2 B(CN) 2 - , (CH 2 CH 2 C 3 F 7 ) 2 B(CN) 2 - , (nC 3 F 7 CH 2 ) 2 B(CN) 2 - , (C 6 H 5 ) 3 B(CN) - , tetraphenylborate, tetrakis(monofluorophenyl) Borate, tetrakis(difluorophenyl)borate, tetrakis(trifluorophenyl)boron Acid salt, tetrakis(tetrafluorophenyl)borate, tetrakis(pentafluorophenyl)borate, tetrakis(tetrafluoromethylphenyl)borate, tetrakis(tolyl)borate, tetrakis(dimethylphenyl)borate Salt, (triphenyl, pentafluorophenyl) borate, [e (pentafluorophenyl), phenyl] borate or tridecahydro-7,8-dicarbonyl undecanoate (tridecahydride-7,8) In addition to the organic-boron anion, it is also disclosed in Japanese Laid-Open Patent Publication No. Hei 10-195119, JP-A-2010-094807, JP-A-2006-243594, and JP-A-2002- A boron anion described in Japanese Laid-Open Patent Publication No. Hei. No. 041-533.

另外,磷酸陰離子的具體例包括HPO4 2-、PO4 3-、PF6 -等無機磷酸陰離子;(C2F5)2PF4 -、(C2F5)3PF3 -、[(CF3)2CF]2PF4 -、[(CF3)2CF]3PF3、(n-C3F7)2PF4 -、(n-C3F7)3PF3 -、(n-C4F9)3PF3 -、(C2F5)(CF3)2PF3 -、[(CF3)2CFCF2]2PF4 -、[(CF3)2CFCF2]3PF3 -、(n-C4F9)2PF4 -、(n-C4F9)3PF3 -、(C2F4H)(CF3)2PF3 -、(C2F3H2)3PF3 -、(C2F5)(CF3)2PF3 -、辛基磷酸陰離子、十二烷基磷酸陰離子、十八烷基磷酸陰離子、苯基磷酸陰離子或壬基苯基磷酸陰離子等有機磷酸陰離子。 Further, specific examples of the phosphate anion include inorganic phosphate anions such as HPO 4 2- , PO 4 3- , PF 6 - ; (C 2 F 5 ) 2 PF 4 - , (C 2 F 5 ) 3 PF 3 - , [( CF 3 ) 2 CF] 2 PF 4 - , [(CF 3 ) 2 CF] 3 PF 3 , (nC 3 F 7 ) 2 PF 4 - , (nC 3 F 7 ) 3 PF 3 - , (nC 4 F 9 3 PF 3 - , (C 2 F 5 )(CF 3 ) 2 PF 3 - , [(CF 3 ) 2 CFCF 2 ] 2 PF 4 - , [(CF 3 ) 2 CFCF 2 ] 3 PF 3 - , ( nC 4 F 9 ) 2 PF 4 - , (nC 4 F 9 ) 3 PF 3 - , (C 2 F 4 H)(CF 3 ) 2 PF 3 - , (C 2 F 3 H 2 ) 3 PF 3 - , (C 2 F 5 ) (CF 3 ) 2 PF 3 - , an octyl phosphate anion, a dodecyl phosphate anion, an octadecyl phosphate anion, a phenyl phosphate anion or a nonylphenyl phosphate anion.

另外,羧酸陰離子的具體例包括CH3COO-、C2H5COO-、C6H5COO-等,除此之外,還包括日本特開2009-265641號公報或日本特開2008-096680號公報記載的羧酸陰離子。 Further, specific examples of the carboxylic acid anion include CH 3 COO - , C 2 H 5 COO - , C 6 H 5 COO - and the like, and in addition to Japanese Patent Laid-Open Publication No. 2009-265641 or JP-A-2008- A carboxylic acid anion described in Japanese Patent No. 096680.

另外,硫酸陰離子的具體例包括硫酸陰離子、亞硫酸陰離子。 Further, specific examples of the sulfate anion include a sulfate anion and a sulfite anion.

有機磺酸陰離子的具體例包括甲磺酸(methanesulfonic acid)、乙磺酸(ethanesulfonic acid)、三氟甲磺酸、九氟丁磺酸等烷基磺酸陰離子;苯磺酸、苯二磺酸根離子、對甲苯磺酸、對三氟甲基磺酸、五氟苯磺酸、萘磺酸、萘二磺酸根離子等芳基磺酸陰離子,除此之外,還包括2-(甲基)丙烯醯氧基-1,1,2,2-四氟乙磺酸、2-(4-乙烯基苯氧基)-1,1,2,2-四氟乙磺酸,在國際公表第2011/037195號冊子、日本專利第3736221號說明書或日本特開2011-070172號公報中記載的有機磺酸陰離子。 Specific examples of the organic sulfonic acid anion include methanesulfonic acid (methanesulfonic) Acid), alkylsulfonate anion such as ethanesulfonic acid, trifluoromethanesulfonic acid or nonafluorobutanesulfonic acid; benzenesulfonic acid, benzenedisulfonate ion, p-toluenesulfonic acid, p-trifluoromethylsulfonate An arylsulfonic acid anion such as an acid, pentafluorobenzenesulfonic acid, naphthalenesulfonic acid or naphthalene disulfonate ion, in addition to 2-(meth)acryloxyloxy-1,1,2,2- Tetrafluoroethanesulfonic acid, 2-(4-vinylphenoxy)-1,1,2,2-tetrafluoroethanesulfonic acid, in International Publication No. 2011/037195, Japanese Patent No. 3372221, or Japan An organic sulfonic acid anion described in Japanese Laid-Open Patent Publication No. 2011-070172.

另外,氮陰離子的具體例包括[(CN)2N]-、[(FSO2)2N]-、[(FSO2)N(CF3SO2)]-、[(CF3SO2)2N]-、[(FSO2)N(CF3CF2SO2)]-、[(FSO2)N{(CF3)2CFSO2}]-、[(FSO2)N(CF3CF2CF2SO2)]-、[(FSO2)N(CF3CF2CF2CF2SO2)]-、[(FSO2)N{(CF3)2CFCF2SO2}]-、[(FSO2)N{CF3CF2(CF3)CFSO2}]-、[(FSO2)N{(CF3)3CSO2}]-等,除此之外,還包括在日本特開2011-133844號公報、日本特開2011-116803號公報、日本特開2010-090341號公報中記載的氮陰離子。 Further, specific examples of the nitrogen anion include [(CN) 2 N] - , [(FSO 2 ) 2 N] - , [(FSO 2 )N(CF 3 SO 2 )] - , [(CF 3 SO 2 ) 2 N] - , [(FSO 2 )N(CF 3 CF 2 SO 2 )] - , [(FSO 2 )N{(CF 3 ) 2 CFSO 2 }] - , [(FSO 2 )N(CF 3 CF 2 CF 2 SO 2 )] - , [(FSO 2 )N(CF 3 CF 2 CF 2 CF 2 SO 2 )] - , [(FSO 2 )N{(CF 3 ) 2 CFCF 2 SO 2 }] - , [ (FSO 2 )N{CF 3 CF 2 (CF 3 )CFSO 2 }] - , [(FSO 2 )N{(CF 3 ) 3 CSO 2 }] -, etc., in addition to The nitrogen anions described in JP-A-2010-090341, and JP-A-2010-090341.

另外,甲基化物陰離子的具體例包括(CF3SO2)3C-、(CF3CF2SO2)3C-、[(CF3)2CFSO2]3C-、(CF3CF2CF2SO2)3C-、(CF3CF2CF2CF2SO2)3C-、[(CF3)2CFCF2SO2]3C-、[CF3CF2(CF3)CFSO2]3C-、[(CF3)3CSO2]3C-、(FSO2)3C-等,除此之外,還包括在日本特開2011-145540號公報、美國專利第5,554,664號說明書、日本特開2005-309408號公報、日本特開2004-085657號公報或日本特表2010-505787號公報等中記載的甲基化物陰離子。 Further, specific examples of the methide anion include (CF 3 SO 2 ) 3 C - , (CF 3 CF 2 SO 2 ) 3 C - , [(CF 3 ) 2 CFSO 2 ] 3 C - , (CF 3 CF 2 CF 2 SO 2 ) 3 C - , (CF 3 CF 2 CF 2 CF 2 SO 2 ) 3 C - , [(CF 3 ) 2 CFCF 2 SO 2 ] 3 C - , [CF 3 CF 2 (CF 3 ) CFSO 2 ] 3 C - , [(CF 3 ) 3 CSO 2 ] 3 C - , (FSO 2 ) 3 C - and the like, in addition to Japanese Patent Laid-Open No. 2011-145540, No. 5,554,664 The methide anion described in JP-A-2005-309657, JP-A-2004-085657, and JP-A-2010-505787.

基於鹼可溶性樹脂(A)的使用量為100重量份,染料(F-1) 的使用量可為3重量份至90重量份,較佳為5重量份至85重量份,且更佳為10重量份至80重量份。 The amount of the alkali-soluble resin (A) used is 100 parts by weight, the dye (F-1) The amount may be used in an amount of from 3 parts by weight to 90 parts by weight, preferably from 5 parts by weight to 85 parts by weight, and more preferably from 10 parts by weight to 80 parts by weight.

當本發明之染料(F)包含染料(F-1)時,所製得之感光性樹脂組成物的逸氣性較佳。 When the dye (F) of the present invention contains the dye (F-1), the resulting photosensitive resin composition preferably has a gassing property.

其它染料(F-2)Other dyes (F-2)

染料(F)可包括其它染料(F-2)。其它染料(F-2)的具體例包括C.I.溶劑紅45、C.I.溶劑紅49等紅色染料;C.I.溶劑藍35、C.I.溶劑藍37、C.I.溶劑藍59、C.I.溶劑藍67等藍色染料;C.I.酸性紅91、C.I.酸性紅92、C.I.酸性紅97、C.I.酸性紅114、C.I.酸性紅138、C.I.酸性紅151、C.I.酸性紅289等酸性紅色染料;或C.I.酸性藍80、C.I.酸性藍83、C.I.酸性藍90等酸性藍色染料。 The dye (F) may include other dyes (F-2). Specific examples of other dyes (F-2) include red dyes such as CI Solvent Red 45 and CI Solvent Red 49; blue solvents such as CI Solvent Blue 35, CI Solvent Blue 37, CI Solvent Blue 59, and CI Solvent Blue 67; Acid red dyes such as red 91, CI acid red 92, CI acid red 97, CI acid red 114, CI acid red 138, CI acid red 151, CI acid red 289; or CI acid blue 80, CI acid blue 83, CI acid Acidic blue dye such as blue 90.

基於鹼可溶性樹脂(A)的使用量為100重量份,其它染料(F-2)的使用量可為0重量份至87重量份,較佳為0重量份至80重量份,且更佳為0重量份至70重量份。 The other dye (F-2) may be used in an amount of from 0 part by weight to 87 parts by weight, preferably from 0 part by weight to 80 parts by weight, based on 100 parts by weight of the alkali-soluble resin (A), and more preferably 0 parts by weight to 70 parts by weight.

另外,基於鹼可溶性樹脂(A)的使用量為100重量份,染料(F)的使用量可為5重量份至90重量份,較佳為10重量份至85重量份,且更佳為15重量份至80重量份。 Further, the dye (F) may be used in an amount of 5 parts by weight to 90 parts by weight, preferably 10 parts by weight to 85 parts by weight, based on the amount of the alkali-soluble resin (A) used in an amount of 100 parts by weight, and more preferably 15 parts by weight. Parts by weight to 80 parts by weight.

添加劑(G):Additive (G):

在不影響本發明功效的前提下,本發明的感光性樹脂組成物更可選擇性進一步添加添加劑(G)。 The photosensitive resin composition of the present invention can be further optionally further added with the additive (G) without affecting the efficacy of the present invention.

添加劑(G)可包括填充劑、聚合物(指上述的鹼可溶性樹脂(A)以外的聚合物)、密著促進劑、抗氧化劑、紫外線吸收劑、防凝集劑、熱酸發生劑、具有氧雜環丁烷基之化合物、金剛烷基酯化合物或甘脲(glycoluril)衍生物等。 The additive (G) may include a filler, a polymer (refer to a polymer other than the above-described alkali-soluble resin (A)), an adhesion promoter, an antioxidant, an ultraviolet absorber, an anti-agglomerating agent, a thermal acid generator, and oxygen. a compound of a heterocyclobutane group, an adamantyl ester compound or a glycoluril derivative or the like.

填充劑的具體例包括玻璃或鋁等。 Specific examples of the filler include glass or aluminum and the like.

聚合物的具體例包括聚乙烯醇、聚乙二醇單烷基醚、聚氟丙烯酸烷酯或上述聚合物的組合。 Specific examples of the polymer include polyvinyl alcohol, polyethylene glycol monoalkyl ether, polyfluoroalkyl acrylate or a combination of the above polymers.

密著促進劑的具體例包括乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、乙烯基三(2-甲氧乙氧基)矽烷、N-(2-胺基乙基)-3-胺基丙基甲基二甲氧基矽烷、N-(2-胺基乙基)-3-胺基丙基三甲氧基矽烷、3-胺基丙基三乙氧基矽烷、3-環氧丙醇丙基三甲氧基矽烷、3-環氧丙醇丙基甲基二甲氧基矽烷、2-(3,4-環氧環己基)乙基三甲氧基矽烷、3-氯丙基甲基二甲氧基矽烷、3-氯丙基三甲氧基矽烷、3-甲基丙烯氧基丙基三甲氧基矽烷、3-巰基丙基三甲氧基矽烷或上述化合物的組合。 Specific examples of the adhesion promoter include vinyltrimethoxydecane, vinyltriethoxydecane, vinyltris(2-methoxyethoxy)decane, and N-(2-aminoethyl)-3- Aminopropylmethyldimethoxydecane, N-(2-aminoethyl)-3-aminopropyltrimethoxydecane, 3-aminopropyltriethoxydecane, 3-epoxy Propyl propyl trimethoxy decane, 3-glycidyl propyl methyl dimethoxy decane, 2-(3,4-epoxycyclohexyl)ethyl trimethoxy decane, 3-chloropropyl group Dimethoxy decane, 3-chloropropyltrimethoxydecane, 3-methylpropoxypropyltrimethoxydecane, 3-mercaptopropyltrimethoxydecane or a combination of the above compounds.

抗氧化劑的具體例包括2,2-硫代雙(4-甲基-6-第三丁基苯酚)、2,6-二-第三丁基苯酚或上述化合物的組合。 Specific examples of the antioxidant include 2,2-thiobis(4-methyl-6-tert-butylphenol), 2,6-di-t-butylphenol or a combination of the above compounds.

紫外線吸收劑的具體例包括2-(3-第三丁基-5-甲基-2-羥基苯基)-5-氯苯基疊氮、烷氧基苯酮(alkoxy phenone)、式(g-1)所表示的化合物或上述化合物的組合。 Specific examples of the ultraviolet absorber include 2-(3-tert-butyl-5-methyl-2-hydroxyphenyl)-5-chlorophenyl azide, alkoxy phenone, and formula (g). -1) A compound represented or a combination of the above compounds.

在式(g-1)中,Gy表示-CH2CH2-或是-CH2CH(OH)CH2-,Gz表示氫原子或是CH3In the formula (g-1), Gy represents -CH 2 CH 2 - or -CH 2 CH(OH)CH 2 -, and Gz represents a hydrogen atom or CH 3 .

防凝集劑的具體例包括聚丙烯酸鈉(sodium polyacrylate)等。 Specific examples of the anti-agglomerating agent include sodium polyacrylate and the like.

熱酸發生劑的具體例包括式(g-2)所表示的熱酸發生劑、Irgacure 250、Irgacure 261(以上汽巴精化有限公司製造)或上述化合物的組合。 Specific examples of the thermal acid generator include a thermal acid generator represented by the formula (g-2), Irgacure 250, Irgacure 261 (manufactured by Ciba Specialty Chemicals Co., Ltd.), or a combination of the above compounds.

式(g-2)中,nx個Gx1各自獨立表示羥基、碳數為1至4的烷基、碳數為1至4的醯氧基、碳數為1至4的烷氧基羰基、碳數為7至10的芳烷氧基羰基,較佳為碳數為1至4的醯氧基(例如,乙醯氧基(CH3COO-))、碳數為1至4的烷氧基羰基(例如,甲氧基羰基(CH3O-C(=O)-O-))、或是碳數為7至10的芳烷氧基羰基(例如,芐氧羰基(PhCH2O-C(=O)-O-)),更佳為乙醯氧基;Gx2與Gx3各自獨立表示碳數為1至4的烷基或芣基、較佳為Gx2或Gx3任意其中一個是碳數為1至4的烷基(特別是甲基) 則另一個為芣基,其中Gx2與Gx3中的芐基是經取代或是未經取代;An-表示BF4 -、PF6 -、AsF6 -、SbF6 -、三氟甲磺酸陰離子或雙(三氟甲烷磺酰)胺陰離子;nx表示0至5的整數。 In the formula (g-2), nx each of Gx 1 independently represents a hydroxyl group, an alkyl group having 1 to 4 carbon atoms, a decyloxy group having 1 to 4 carbon atoms, an alkoxycarbonyl group having 1 to 4 carbon atoms, An aralkoxycarbonyl group having 7 to 10 carbon atoms, preferably a decyloxy group having 1 to 4 carbon atoms (for example, ethoxylated (CH 3 COO - )), an alkoxy group having 1 to 4 carbon atoms a carbonyl group (for example, a methoxycarbonyl group (CH 3 OC(=O)-O-)) or an aralkoxycarbonyl group having a carbon number of 7 to 10 (for example, a benzyloxycarbonyl group (PhCH 2 OC (=O) And -O-)), more preferably an ethoxy group; Gx 2 and Gx 3 each independently represent an alkyl group or a fluorenyl group having a carbon number of 1 to 4, preferably Gx 2 or Gx 3, any one of which is a carbon number The alkyl group (especially methyl) of 1 to 4 is the fluorenyl group, wherein the benzyl group in Gx 2 and Gx 3 is substituted or unsubstituted; An - represents BF 4 - , PF 6 - , AsF 6 - , SbF 6 - , trifluoromethanesulfonate anion or bis(trifluoromethanesulfonyl)amine anion; nx represents an integer from 0 to 5.

較佳的,式(g-2)所表示的熱酸發生劑可為式(g-2-1)所表示的熱酸發生劑。 Preferably, the thermal acid generator represented by the formula (g-2) may be a thermal acid generator represented by the formula (g-2-1).

式(g-2-1)中,Gx4表示碳數為1至4的烷基或是芐基,較佳為碳數為1至4的烷基且較佳為甲基,Gx5表示氫原子或是碳數為1至4的烷基,且較佳為氫原子,Gx6表示碳數為1至4的烷基或是芐基,且較佳為芐基,且Gx6表示芐基時,其可經取代或是未經取代,Gx7表示碳數為1至4的烷基,且較佳為甲基。 In the formula (g-2-1), Gx 4 represents an alkyl group having 1 to 4 carbon atoms or a benzyl group, preferably an alkyl group having 1 to 4 carbon atoms and preferably a methyl group, and Gx 5 represents hydrogen. The atom is preferably an alkyl group having 1 to 4 carbon atoms, and preferably a hydrogen atom, and Gx 6 represents an alkyl group having 1 to 4 carbon atoms or a benzyl group, and preferably a benzyl group, and Gx 6 represents a benzyl group. When it is substituted or unsubstituted, Gx 7 represents an alkyl group having 1 to 4 carbon atoms, and is preferably a methyl group.

上述式(g-2)所表示的熱酸發生劑的較佳具體例包括,4-乙醯氧基苯基二甲基鋶陽離子、4-羥基苯基芐基甲基鋶陽離子、4-乙醯氧基苯基芣基甲基鋶陽離子、4-甲氧基羰基苯基、芣基甲基鋶陽離子、4-羥基苯基二芣基鋶陽離子或4-乙醯氧基苯基二芐基鋶陽離子與PF6 -、SBF6 -、三氟甲磺酸陰離子或雙(三氟甲烷磺醯)胺陰離子所形成的鹽類;San-aid(註冊商標)SI-60L、SI-80L、SI-100L、SI-110L、SI-145、SI-150、SI160、SI180L以及SI-250(三 新化學工業製)、Adeka Optomer SP-170、SP-172(ADEKA製)。 Preferable specific examples of the thermal acid generator represented by the above formula (g-2) include 4-ethenyloxyphenyldimethylhydrazine cation, 4-hydroxyphenylbenzylmethylphosphonium cation, 4-ethylidene a decyloxyphenylmercaptomethyl sulfonium cation, a 4-methoxycarbonylphenyl group, a decylmethyl sulfonium cation, a 4-hydroxyphenyl fluorenyl sulfonium cation or a 4-ethoxy phenyl phenyl dibenzyl group Salts of phosphonium cations with PF 6 - , SBF 6 - , trifluoromethanesulfonate anions or bis(trifluoromethanesulfonate) anions; San-aid (registered trademark) SI-60L, SI-80L, SI -100L, SI-110L, SI-145, SI-150, SI160, SI180L, and SI-250 (manufactured by Sanshin Chemical Industry Co., Ltd.), Adeka Optomer SP-170, and SP-172 (manufactured by ADEKA).

具有氧雜環丁烷基之化合物的具體例包括商品名OXT-121、OXT-213、OXT-221、OXT-101、OXT-212(以上東亞合成有限公司製造)等。 Specific examples of the compound having an oxetane group include trade names OXT-121, OXT-213, OXT-221, OXT-101, OXT-212 (manufactured by Toagosei Co., Ltd.) and the like.

金剛烷基酯化合物具有(g-3)所表示的結構。 The adamantyl ester compound has a structure represented by (g-3).

式(g-3)中,Ga1表示-O-CO-CH=CH2或是-O-CO-C(CH3)=CH2、Ga2表示碳數為1至6的烷基、gm表示1至3的整數、gn表示0至4的整數,且上述金剛烷骨架中的其中一個碳原子與Ga1以及Ga2結合,或是與兩個Ga1或是兩個Ga2結合。 In the formula (g-3), Ga 1 represents -O-CO-CH=CH 2 or -O-CO-C(CH 3 )=CH 2 , and Ga 2 represents an alkyl group having a carbon number of 1 to 6, gm. An integer of 1 to 3, gn represents an integer of 0 to 4, and one of the carbon atoms in the adamantane skeleton is bonded to Ga 1 and Ga 2 or to two Ga 1 or two Ga 2 .

較佳地,所述金剛烷基酯化合物具有式(g-3-1)所表示的2-金剛烷基(甲基)丙烯酸酯或是具有式(g-3-2)所表示的1-金剛烷基(甲基)丙烯酸酯。 Preferably, the adamantyl ester compound has 2-adamantyl (meth) acrylate represented by formula (g-3-1) or 1- represented by formula (g-3-2) Adamantyl (meth) acrylate.

式(g-3-1)中,Ga3表示氫原子或甲基、Ga4表示氫原子或 碳數為1至6的烷基。 In the formula (g-3-1), Ga 3 represents a hydrogen atom or a methyl group, and Ga 4 represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms.

式(g-3-2)中,Ga5表示氫原子或甲基。 In the formula (g-3-2), Ga 5 represents a hydrogen atom or a methyl group.

金剛烷基酯化合物的具體例包括2-甲基-2-金剛烷基丙烯酸酯、2-乙基-2-金剛烷基丙烯酸酯、2-甲基-2-金剛烷基甲基丙烯酸酯、2-乙基-2-金剛烷基甲基丙烯酸酯、2-丙基-2-金剛烷基丙烯酸酯以及2-丁基-2-金剛烷基丙烯酸酯等化合物。 Specific examples of the adamantyl ester compound include 2-methyl-2-adamantyl acrylate, 2-ethyl-2-adamantyl acrylate, 2-methyl-2-adamantyl methacrylate, Compounds such as 2-ethyl-2-adamantyl methacrylate, 2-propyl-2-adamantyl acrylate, and 2-butyl-2-adamantyl acrylate.

甘脲(glycoluril)衍生物具有下式(g-4)所表示的結構。 The glycoluril derivative has a structure represented by the following formula (g-4).

於式(g-4)中:Gb表示氫原子、經取代或未經取代之碳數為1至20之烴基及醯基所組成之群;Gb可為相同或不同;Gc係選自由氫原子、經取代或未經取代之碳數為1至15之烴基、醯基及硝基所組成之群;Gc可為相同或不同;s表示0、1或2;以及 Gd1表示,其中,Gd2表示氫原子或碳數為1至4之烷基。 In the formula (g-4): Gb represents a hydrogen atom, a substituted or unsubstituted group of a hydrocarbon group having 1 to 20 carbon atoms and a mercapto group; Gb may be the same or different; and Gc is selected from a hydrogen atom. a substituted or unsubstituted group of hydrocarbon groups having 1 to 15 carbon atoms, an anthracenyl group and a nitro group; Gc may be the same or different; s represents 0, 1 or 2; and Gd 1 represents Wherein Gd 2 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms.

上述甘脲衍生物之特徵為在雙環系統中,至少2個縮水甘油基各別在環系統中之氮-取代位置上,其中,該2個縮水甘油基之取代位置如式(g-4)所示,亦即2個縮水甘油基是各別鍵結在同一五員環之氮-取代位置(1,3-位)。另外,具有式(g-4)結構之化合物亦包含2個縮水甘油基各別鍵結在兩個五員環之氮-取代位置(1,5-位或1,7-位)。且,具有式(g-4)結構之化合物也可包含具有3個縮水甘油基,該3個縮水甘油基各別鍵結在兩個五員環之氮-取代位置(1,3,5-位或1,3,7-位)。且,具有式(g-4)結構之化合物也可包含具有4個縮水甘油基,該4個縮水甘油基各別鍵結在兩個五員環之氮-取代位置(1,3,5,7-位)。 The above-mentioned glycoluril derivative is characterized in that in the bicyclic system, at least two glycidyl groups are each in a nitrogen-substituted position in the ring system, wherein the substitution positions of the two glycidyl groups are as in the formula (g-4) As shown, the two glycidyl groups are each bonded to the nitrogen-substituted position (1,3-position) of the same five-membered ring. Further, the compound having the structure of the formula (g-4) also contains two glycidyl groups each bonded to the nitrogen-substituted position (1,5-position or 1,7-position) of the two five-membered rings. Further, the compound having the structure of the formula (g-4) may also contain 3 glycidyl groups which are each bonded at the nitrogen-substituted position of the two five-membered rings (1, 3, 5- Bit or 1, 3, 7-bit). Further, the compound having the structure of the formula (g-4) may also contain 4 glycidyl groups each bonded to a nitrogen-substituted position of two five-membered rings (1, 3, 5, 7-bit).

式(g-4)中,Gb係選自由氫原子、經取代或未經取代之碳數1至20之烴基及醯基所組成之群。較佳地,Gb之碳數為1至15;更佳地,Gb之碳數為1至12。Gb之碳數小於上述碳數亦可,例如:Gb之碳數為10、8或4。上述數值亦適用於未經取代之Gb。當該上述烴基係經取代,則更多碳數可導入至Gb,其中針對上述烴基說明如下。此處針對烴基之說明亦適用於醯基。 In the formula (g-4), Gb is selected from the group consisting of a hydrogen atom, a substituted or unsubstituted hydrocarbon group having 1 to 20 carbon atoms, and a mercapto group. Preferably, Gb has a carbon number of from 1 to 15; more preferably, Gb has a carbon number of from 1 to 12. The carbon number of Gb may be smaller than the above carbon number, for example, the carbon number of Gb is 10, 8, or 4. The above values also apply to unsubstituted Gb. When the above hydrocarbon group is substituted, more carbon number can be introduced to Gb, wherein the above hydrocarbon group is explained below. The description herein for the hydrocarbyl group also applies to the mercapto group.

上述Gb之烴基可為包含上述碳數1至20之直鏈狀及/或分支狀烷基及烯基;芳基亦可。根據本發明之定義,烴基可包 含狹義之芳香基,亦即單獨由一芳香環系統構成的烷芳基(alkaryl)或芳烷基(aralkyl)。當Gb表示芳基、芳烷基或烷芳基時,其較佳具體例可包含但不限於苯基、芐基、甲苯基、二甲苯基或上述之同族化合物。 The hydrocarbon group of the above Gb may be a linear or/or branched alkyl group and an alkenyl group having the above carbon number of 1 to 20; and an aryl group may also be used. According to the definition of the invention, the hydrocarbon group can be packaged A narrowly defined aromatic group, that is, an alkaryl or aralkyl group composed solely of an aromatic ring system. When Gb represents an aryl group, an aralkyl group or an alkylaryl group, preferred examples thereof may include, but are not limited to, a phenyl group, a benzyl group, a tolyl group, a xylyl group or a homologous compound as described above.

此外,上述Gb亦可為環烷基或環烯基,該環烷基或環烯基亦包含具有經取代之環烷基或環烯基。另一方面,Gb表示飽和或部分飽和之環狀基時,較佳為環戊基、環己基及其衍生物。再一方面,Gb表示雜環狀基時,較佳為含有O、N及/或S之環化合物。上述之環系統較佳為具有1個、2個或3個雜原子,或為飽合、不飽合或芳香族之環狀基。 Further, the above Gb may also be a cycloalkyl group or a cycloalkenyl group, and the cycloalkyl group or cycloalkenyl group also has a substituted cycloalkyl group or a cycloalkenyl group. On the other hand, when Gb represents a saturated or partially saturated cyclic group, a cyclopentyl group, a cyclohexyl group and a derivative thereof are preferred. On the other hand, when Gb represents a heterocyclic group, a ring compound containing O, N and/or S is preferred. The above ring system preferably has one, two or three heteroatoms or is a saturated, unsaturated or aromatic cyclic group.

視需要,該Gb可進一步具有其它取代基,其較佳具體例為鹵素、烷氧基、醯基或醯氧基,其中,鹵素以氯及/或溴為較佳。 The Gb may further have other substituents, preferably a halogen, an alkoxy group, a decyl group or a decyloxy group, wherein the halogen is preferably chlorine or/or bromine.

當Gb進一步含有烴基取代基時,較佳地,該取代基之碳數不超過10個,更佳為不超過8個;尤佳為不超過6個;特佳為不超過4個。烴基取代基包含但不限於含鹵素、烷氧基等取代基之芳基、芳烷基、烷芳基、環烷基及/或烷基。另外也包含前述之雜環系,例如含雜原子數1至3的雜環系。 When Gb further contains a hydrocarbyl substituent, preferably, the substituent has no more than 10 carbon atoms, more preferably no more than 8, more preferably no more than 6, and particularly preferably no more than 4. The hydrocarbyl substituent includes, but is not limited to, an aryl group, an aralkyl group, an alkylaryl group, a cycloalkyl group, and/or an alkyl group having a substituent such as a halogen or an alkoxy group. Further, the above heterocyclic ring system is also contained, for example, a heterocyclic ring system having a hetero atom number of 1 to 3.

具有式(g-4)結構之化合物中,Gb在不考慮取代基存在之情況下之全部碳原子數為不超過12個;較佳為不超過10個;更佳為不超過8個;尤佳為不超過4個或6個。上述全部碳原子數之數值亦適用於含有取代基之Gb。 In the compound having the structure of the formula (g-4), the total number of carbon atoms of Gb in the absence of the substituent is not more than 12; preferably not more than 10; more preferably not more than 8; Good for no more than 4 or 6. The above values for all carbon atoms also apply to the Gb containing a substituent.

視需要,Gc不為氫原子時,則可為相同或不同之烴基。較佳地,各別烴基之碳原子數不超過12個;更佳地為不超過10個或8個;尤佳為不超過6個或4個。有關Gb之敘述亦適用於Gc。 If Gc is not a hydrogen atom, if desired, it may be the same or different hydrocarbon group. Preferably, the respective hydrocarbon groups have no more than 12 carbon atoms; more preferably no more than 10 or 8; more preferably no more than 6 or 4. The description of Gb also applies to Gc.

根據Gc之烴基可為含有上述碳數1至15之直鏈狀及/或分支狀之烷基及烯基等;芳基亦可。有關Gb之敘述亦適用於Gc,故該芳基亦包含烷芳基或芳烷基而Gb中關於環烷基、環烯基及雜環基之敘述亦適用於Gc。 The hydrocarbon group according to Gc may be an alkyl group or an alkenyl group having a linear or/or branched carbon group having 1 to 15 carbon atoms; and an aryl group. The description of Gb also applies to Gc, so the aryl group also contains an alkaryl or aralkyl group and the description of the cycloalkyl, cycloalkenyl and heterocyclic groups in Gb also applies to Gc.

較佳地,該Gc上之取代基為鹵素、羥基、胺基、N-取代胺基、巰基、烷巰基、芳巰基、烷氧基、芳氧基及/或醯氧基等。該Gc上可具有上述一個或多個取代基。較佳地,Gc上具有1至3個取代基;更佳地,Gc具有經取代或未經取代之烷基,而Gb中關於該數值之限定的定義可適用於Gc。 Preferably, the substituent on the Gc is a halogen, a hydroxyl group, an amine group, an N-substituted amine group, a decyl group, an alkyl group, an aryl group, an alkoxy group, an aryloxy group and/or a decyloxy group. The Gc may have one or more substituents as described above. Preferably, Gc has 1 to 3 substituents; more preferably, Gc has a substituted or unsubstituted alkyl group, and the definition of the definition of this value in Gb is applicable to Gc.

甘脲衍生物之較佳具體例包含表1所示之N,N'-二縮水甘油基甘脲。 Preferred specific examples of the glycoluril derivative include N,N'-diglycidylglycolide shown in Table 1.

其中,-表示氫原子。 Wherein - represents a hydrogen atom.

基於鹼可溶性樹脂(A)的使用量為100重量份,添加劑(G)的使用量為0.1重量份至10重量份,較佳為0.3重量份至7重量份,且更佳為0.5重量份至4重量份。 The additive (G) is used in an amount of from 0.1 part by weight to 10 parts by weight, based on the amount of the alkali-soluble resin (A), preferably from 0.3 part by weight to 7 parts by weight, and more preferably from 0.5 part by weight to more preferably 0.5 part by weight. 4 parts by weight.

<感光性樹脂組成物的製備方法><Method for Preparing Photosensitive Resin Composition>

可用來製備感光性樹脂組成物的方法例如:將鹼可溶性 樹脂(A)、具有乙烯性不飽和基之化合物(B)、光起始劑(C)、溶劑(D)以及顏料(E)放置於攪拌器中攪拌,使其均勻混合成溶液狀態,必要時亦可添加染料(F)以及添加劑(G),予以均勻混合後,便可獲得溶液狀態的感光性樹脂組成物。 A method which can be used to prepare a photosensitive resin composition, for example, to dissolve an alkali The resin (A), the compound (B) having an ethylenically unsaturated group, the photoinitiator (C), the solvent (D), and the pigment (E) are placed in a stirrer and stirred to uniformly mix into a solution state. The dye (F) and the additive (G) may be added and uniformly mixed to obtain a photosensitive resin composition in a solution state.

又,感光性樹脂組成物的製備方法沒有特別的限制。感光性樹脂組成物的製備方法例如是先將一部分的鹼可溶性樹脂(A)及具有乙烯性不飽和基之化合物(B)分散於一部分的溶劑(D)中,以形成分散溶液;並且接著混合其餘的鹼可溶性樹脂(A)、具有乙烯性不飽和基之化合物(B)、光起始劑(C)、溶劑(D)、顏料(E)來製備。 Further, the method for preparing the photosensitive resin composition is not particularly limited. The photosensitive resin composition is prepared by, for example, dispersing a part of the alkali-soluble resin (A) and the compound (B) having an ethylenically unsaturated group in a part of the solvent (D) to form a dispersion solution; and then mixing The remaining alkali-soluble resin (A), the compound (B) having an ethylenically unsaturated group, the photoinitiator (C), the solvent (D), and the pigment (E) are prepared.

或者,感光性樹脂組成物也可以是由先將一部分的顏料(E)分散於一部分的溶劑(D),以形成顏料分散液後;並且混合其餘的顏料(E)、鹼可溶性樹脂(A)、具有乙烯性不飽和基之化合物(B)、光起始劑(C)、溶劑(D)來製備。又,上述顏料(E)的分散步驟可藉由例如珠磨機(beads mill)或輥磨機(roll mill)等混合器混合來進行。 Alternatively, the photosensitive resin composition may be obtained by dispersing a part of the pigment (E) in a part of the solvent (D) to form a pigment dispersion liquid; and mixing the remaining pigment (E) and the alkali-soluble resin (A). It is prepared by the compound (B) having an ethylenically unsaturated group, a photoinitiator (C), and a solvent (D). Further, the dispersion step of the above pigment (E) can be carried out by mixing with a mixer such as a beads mill or a roll mill.

<畫素層與彩色濾光片的製造方法><Method for Manufacturing Pixel Layer and Color Filter>

彩色濾光片是由感光性組成物依序在上面已形成黑色矩陣的基板上施予預烤、曝光、顯影及曝後烤處理而製得,其中黑色矩陣用以隔離各畫素層。以下詳述彩色濾光片的製備方法。 The color filter is prepared by sequentially pre-baking, exposing, developing, and post-baking the photosensitive composition on the substrate on which the black matrix has been formed, wherein the black matrix is used to isolate the pixel layers. The preparation method of the color filter will be described in detail below.

首先,藉由旋轉塗佈或流延塗佈或輥式塗佈等塗布方式,在基板上均勻地塗佈溶液狀態的彩色濾光片用感光性樹脂組 成物,以形成塗膜。上述基板例如是用於液晶顯示裝置的無鹼玻璃、鈉鈣玻璃、硬質玻璃(派勒斯玻璃)、石英玻璃,以及附著有透明導電膜的此等玻璃等;用於光電變換裝置(如固體攝影裝置)的基板(如:矽基板);或事先形成有能隔離紅、綠、藍等畫素層的遮光用黑色矩陣(black matrix)的基板。 First, a photosensitive resin group for a color filter in a solution state is uniformly applied onto a substrate by a coating method such as spin coating or cast coating or roll coating. The object is formed to form a coating film. The substrate is, for example, an alkali-free glass, a soda-lime glass, a hard glass (Pyles glass), a quartz glass, and the like to which a transparent conductive film is attached, which is used for a liquid crystal display device, and the like, and is used for a photoelectric conversion device (such as a solid). A substrate (for example, a germanium substrate) of the photographing device; or a substrate having a black matrix for shielding light from which a pixel layer such as red, green or blue is isolated.

形成塗膜之後,以減壓乾燥的方式去除大部分溶劑,然後以預烤方式將殘餘的溶劑完全去除,以形成預烤塗膜。值得注意的是,減壓乾燥及預烤的條件,依各成分的種類、比率而改變。一般而言,減壓乾燥是在0毫米汞柱至200毫米汞柱的壓力下進行1秒至60秒,並且預烤乃在70℃至110℃溫度下對塗膜進行1分鐘至15分鐘的加熱處理。 After the coating film is formed, most of the solvent is removed by drying under reduced pressure, and then the residual solvent is completely removed by pre-baking to form a pre-baked coating film. It is worth noting that the conditions of drying under reduced pressure and pre-baking vary depending on the type and ratio of each component. In general, the vacuum drying is performed at a pressure of 0 mmHg to 200 mmHg for 1 second to 60 seconds, and the prebaking is performed at a temperature of 70 ° C to 110 ° C for 1 minute to 15 minutes. Heat treatment.

接著,以具有特定圖案的光罩對上述預烤塗膜進行曝光。在曝光過程中所使用的光線例如是g線、h線或i線等的紫外線為佳,而紫外線照射裝置可為(超)高壓水銀燈或金屬鹵素燈。 Next, the prebaked coating film is exposed by a photomask having a specific pattern. The light used in the exposure process is preferably ultraviolet light such as g-line, h-line or i-line, and the ultraviolet irradiation device may be a (ultra) high-pressure mercury lamp or a metal halide lamp.

然後,在23±2℃的溫度下,將上述經曝光的預烤塗膜浸漬於顯影液中,以去除預烤塗膜的不需要的部分,藉此可在基板上形成特定的圖案。顯影液的具體例包括氫氧化鈉、氫氧化鉀、碳酸鈉、碳酸氫鈉、碳酸鉀、碳酸氫鉀、矽酸鈉、甲基矽酸鈉、氨水、乙胺、二乙胺、二甲基乙醇胺、氫氧化四甲銨、氫氧化四乙銨、膽鹼、吡咯、呱啶或1,8-二氮雜二環-(5.4.0)-7-十一烯等鹼性化合物的鹼性水溶液。顯影液的濃度為0.001重量%至10重量%,較佳為0.005重量%至5重量%,且更佳為0.01重量%至1重 量%。 Then, the exposed prebaked coating film is immersed in a developing solution at a temperature of 23 ± 2 ° C to remove an unnecessary portion of the prebaked coating film, whereby a specific pattern can be formed on the substrate. Specific examples of the developing solution include sodium hydroxide, potassium hydroxide, sodium carbonate, sodium hydrogencarbonate, potassium carbonate, potassium hydrogencarbonate, sodium citrate, sodium methyl citrate, aqueous ammonia, ethylamine, diethylamine, dimethyl Basicity of basic compounds such as ethanolamine, tetramethylammonium hydroxide, tetraethylammonium hydroxide, choline, pyrrole, acridine or 1,8-diazabicyclo-(5.4.0)-7-undecene Aqueous solution. The concentration of the developer is from 0.001% by weight to 10% by weight, preferably from 0.005% by weight to 5% by weight, and more preferably from 0.01% by weight to 1% by weight. the amount%.

在預烤塗膜經顯影之後,將具有特定的圖案的基板以水洗淨,再以壓縮空氣或壓縮氮氣將上述特定的圖案風乾。然後,以熱板或烘箱等加熱裝置進行後烤處理(post-bake)(亦即加熱處理)。後烤溫度為100℃至280℃,且加熱時間為1分鐘至15分鐘,以去除塗膜中的揮發成分並使未反應的乙烯性不飽和雙鍵進行熱硬化反應。經過上述的處理步驟後,即可在基板上固定特定的圖案,藉此形成畫素層。重覆上述步驟,依序在基板上成形紅、綠、藍等畫素層。 After the prebaked coating film is developed, the substrate having the specific pattern is washed with water, and the above specific pattern is air-dried with compressed air or compressed nitrogen. Then, post-bake (that is, heat treatment) is performed by a heating device such as a hot plate or an oven. The post-baking temperature is from 100 ° C to 280 ° C, and the heating time is from 1 minute to 15 minutes to remove volatile components in the coating film and to carry out a thermosetting reaction of the unreacted ethylenically unsaturated double bond. After the above-described processing steps, a specific pattern can be fixed on the substrate, thereby forming a pixel layer. Repeat the above steps to form red, green, blue and other pixel layers on the substrate in sequence.

最後,在溫度為220℃至250℃的真空環境下,藉由濺鍍在所述畫素層的表面上形成ITO(氧化銦錫)保護膜(蒸鍍膜)。必要時,對上述ITO保護膜施行蝕刻與佈線,並且在ITO保護膜表面塗佈液晶配向膜(液晶配向膜用聚醯亞胺),藉此形成具有畫素層的彩色濾光片。 Finally, an ITO (Indium Tin Oxide) protective film (evaporated film) was formed on the surface of the pixel layer by sputtering in a vacuum environment at a temperature of 220 ° C to 250 ° C. When necessary, the ITO protective film is etched and wired, and a liquid crystal alignment film (polyimine for liquid crystal alignment film) is applied onto the surface of the ITO protective film, thereby forming a color filter having a pixel layer.

<液晶顯示裝置的製造方法><Method of Manufacturing Liquid Crystal Display Device>

首先,將藉由上述彩色濾光片的形成方法所形成的彩色濾光片以及設置有薄膜電晶體(thin film transistor;TFT)的基板作對向配置,並且在上述兩者之間設置間隙(晶胞間隔,cell gap)。接著,以黏著劑貼合彩色濾光片與上述基板的周圍部分並且留下注入孔。然後,在基板表面以及黏著劑所分隔出的間隙內由注入孔注入液晶,並封住注入孔來形成液晶層。隨後,藉由在彩色濾 光片中接觸液晶層的另一側與基板中接觸液晶層的另一側提供偏光板,以形成液晶顯示元件。接著,在液晶顯示元件的一側設置面光源,以形成液晶顯示裝置。上述所使用的液晶,亦即液晶化合物或液晶組成物,此處並未特別限定,惟可使用任何一種液晶化合物及液晶組成物。 First, a color filter formed by the above-described method of forming a color filter and a substrate provided with a thin film transistor (TFT) are disposed oppositely, and a gap is provided between the two (crystal) Cell gap). Next, the color filter is attached to the peripheral portion of the above substrate with an adhesive and the injection hole is left. Then, liquid crystal is injected from the injection hole in the gap between the surface of the substrate and the adhesive, and the injection hole is sealed to form a liquid crystal layer. Subsequently, by color filtering The other side of the light sheet that contacts the liquid crystal layer and the other side of the substrate that contacts the liquid crystal layer provide a polarizing plate to form a liquid crystal display element. Next, a surface light source is provided on one side of the liquid crystal display element to form a liquid crystal display device. The liquid crystal used, that is, the liquid crystal compound or the liquid crystal composition, is not particularly limited herein, and any liquid crystal compound and liquid crystal composition can be used.

此外,於製作彩色濾光片中所使用的液晶配向膜是用來限制液晶分子的配向,並且沒有特別的限制,舉凡無機物或有機物任一者均可,並且本發明並不限於此。 Further, the liquid crystal alignment film used in the production of the color filter is used to restrict the alignment of the liquid crystal molecules, and is not particularly limited, and any of inorganic substances or organic substances may be used, and the present invention is not limited thereto.

鹼可溶性樹脂(A-1)的合成例Synthesis example of alkali-soluble resin (A-1)

以下說明鹼可溶性樹脂(A-1)的合成例A-1-1至合成例A-1-3: Synthesis Example A-1-1 to Synthesis Example A-1-3 of the alkali-soluble resin (A-1) will be described below:

合成例A-1-1Synthesis Example A-1-1

首先,將100重量份的茀環氧化合物(型號ESF-300,新日鐵化學製造;環氧當量231)、30重量份的丙烯酸、0.3重量份的氯化苄基三乙基銨、0.1重量份的2,6-二第三丁基對甲酚以及130重量份的丙二醇單甲醚醋酸酯以連續式添加方式加入至500毫升的四頸燒瓶中。入料速度控制在25重量份/分鐘,並且反應過程的溫度維持在100℃至110℃,反應15小時後,即可獲得固成分濃度為50重量%的淡黃色透明混合液。接著,使上述淡黃色透明混合液經受萃取、過濾及加熱烘乾的步驟,即可得固體成分含量為 99.9重量%的化合物(A-1-1-a)。 First, 100 parts by weight of a ruthenium epoxy compound (Model ESF-300, manufactured by Nippon Steel Chemical Co., Ltd.; epoxy equivalent 231), 30 parts by weight of acrylic acid, 0.3 parts by weight of benzyltriethylammonium chloride, 0.1 weight A portion of 2,6-di-t-butyl-p-cresol and 130 parts by weight of propylene glycol monomethyl ether acetate were added in a continuous manner to a 500 ml four-necked flask. The feed rate was controlled at 25 parts by weight/min, and the temperature of the reaction process was maintained at 100 ° C to 110 ° C. After 15 hours of reaction, a pale yellow transparent mixture having a solid concentration of 50% by weight was obtained. Then, the pale yellow transparent mixture is subjected to the steps of extraction, filtration, and heat drying to obtain a solid content of 99.9% by weight of the compound (A-1-1-a).

接著,將1.0莫耳的化合物(A-1-1-a)、0.1莫耳的聯苯四羧酸、1.4莫耳的馬來酸、1.9克的氯化苄基三乙基銨、0.6克的2,6-二第三丁基對甲酚、700克的丙二醇單甲醚醋酸酯以及100克的3-乙氧基丙酸乙酯以同時添加方式加入至500毫升的四頸燒瓶中,以形成反應溶液。。最後,將上述反應溶液加熱至110℃,並且反應2小時,即可得酸價為125毫克KOH/克,且數量平均分子量為1250的鹼可溶性樹脂(A-1-1)。 Next, 1.0 mol of compound (A-1-1-a), 0.1 mol of biphenyltetracarboxylic acid, 1.4 mol of maleic acid, 1.9 g of benzyltriethylammonium chloride, 0.6 g 2,6-di-t-butyl-p-cresol, 700 g of propylene glycol monomethyl ether acetate, and 100 g of ethyl 3-ethoxypropionate were added to a 500-ml four-necked flask at the same time. To form a reaction solution. . Finally, the above reaction solution was heated to 110 ° C, and reacted for 2 hours to obtain an alkali-soluble resin (A-1-1) having an acid value of 125 mg KOH/g and a number average molecular weight of 1,250.

合成例A-1-2Synthesis Example A-1-2

首先,將100重量份的茀環氧化合物(型號PG-100,大阪瓦斯製造;環氧當量259)、35重量份的甲基丙烯酸、0.3重量份的氯化苄基三乙基銨、0.1重量份的2,6-二第三丁基對甲酚以及135重量份的丙二醇單甲醚醋酸酯以連續添加方式加入至500毫升的四頸燒瓶中。入料速度控制在25重量份/分鐘,並且反應過程的溫度維持在100℃至110℃下,反應15小時後,即可獲得固體成分含量為50重量%的淡黃色透明混合液。使上述淡黃色透明混合液經受萃取、過濾及加熱烘乾的步驟,即可得固體成分含量為99.9重量%的化合物(A-1-2-a)。 First, 100 parts by weight of an oxime epoxy compound (Model PG-100, manufactured by Osaka Gas; epoxy equivalent 259), 35 parts by weight of methacrylic acid, 0.3 parts by weight of benzyltriethylammonium chloride, 0.1 weight A portion of 2,6-di-t-butyl-p-cresol and 135 parts by weight of propylene glycol monomethyl ether acetate were added in a continuous addition to a 500 ml four-necked flask. The feed rate was controlled at 25 parts by weight/min, and the temperature of the reaction process was maintained at 100 ° C to 110 ° C. After 15 hours of reaction, a pale yellow transparent mixture having a solid content of 50% by weight was obtained. The pale yellow transparent mixture is subjected to a step of extraction, filtration, and heat drying to obtain a compound (A-1-2-a) having a solid content of 99.9% by weight.

接著,將1.0莫耳的化合物(A-1-2-a)、2.9克的氯化苄基三乙基銨以及950克的丙二醇甲醚醋酸酯加入至500毫升的四頸燒瓶中,以形成反應溶液。添加0.8莫耳的二苯甲酮四羧酸二酐並 在90℃下反應2小時。然後,再添加0.8莫耳的四氫鄰苯二甲酸酐(tetrahydrophthalic anhydride),並在90℃下反應4小時。經上述合成步驟,可得酸價為92毫克KOH/克,且數量平均分子量為7860的鹼可溶性樹脂(A-1-2)。 Next, 1.0 mol of the compound (A-1-2-a), 2.9 g of benzyltriethylammonium chloride, and 950 g of propylene glycol methyl ether acetate were placed in a 500 ml four-necked flask to form Reaction solution. Add 0.8 moles of benzophenone tetracarboxylic dianhydride and The reaction was carried out at 90 ° C for 2 hours. Then, 0.8 mol of tetrahydrophthalic anhydride was further added and reacted at 90 ° C for 4 hours. Through the above synthesis step, an alkali-soluble resin (A-1-2) having an acid value of 92 mgKOH/g and a number average molecular weight of 7,860 can be obtained.

合成例A-1-3Synthesis Example A-1-3

將1.0莫耳的化合物(A-1-2-a)、2.5克的氯化芾基三乙基銨以及900克的丙二醇甲醚醋酸酯加入至500毫升的四頸燒瓶中,以形成反應溶液。添加0.5莫耳的二苯甲酮四羧酸二酐並在90℃下反應2小時。然後,再添加1.0莫耳的四氫鄰苯二甲酸酐(tetrahydrophthalic anhydride),並在90℃下反應4小時。經上述合成步驟,可得酸價為100毫克KOH/克,且數量平均分子量為4250的鹼可溶性樹脂(A-1-3)。 1.0 mol of the compound (A-1-2-a), 2.5 g of decyltriethylammonium chloride, and 900 g of propylene glycol methyl ether acetate were added to a 500 ml four-necked flask to form a reaction solution. . 0.5 mol of benzophenone tetracarboxylic dianhydride was added and reacted at 90 ° C for 2 hours. Then, 1.0 mol of tetrahydrophthalic anhydride was further added and reacted at 90 ° C for 4 hours. Through the above synthesis step, an alkali-soluble resin (A-1-3) having an acid value of 100 mgKOH/g and a number average molecular weight of 4,250 can be obtained.

鹼可溶性樹脂(A-2)的合成例及比較合成例Synthesis Example and Comparative Synthesis Example of Alkali Soluble Resin (A-2)

以下說明鹼可溶性樹脂(A-2)的合成例A-2-1至合成例A-2-7以及比較合成例A’-2-1至比較合成例A’-2-3: Synthesis Example A-2-1 to Synthesis Example A-2-7 and Comparative Synthesis Example A'-2-1 to Comparative Synthesis Example A'-2-3 of the alkali-soluble resin (A-2) will be described below:

合成例A-2-1Synthesis Example A-2-1

在一容積1000毫升之四頸錐瓶上設置氮氣導入口、攪拌器、加熱器、冷凝管及溫度計,並導入氮氣。然後,將20重量份的2-甲基丙烯醯乙氧基丁二酸酯(以下簡稱為HOMS)、50 重量份的丙烯酸雙環戊烯酯(dicyclopenteny acrylate,以下簡稱為FA-511A)、30重量份的甲基丙烯酸苯甲酯(以下簡稱為BzMA)溶解於100重量份的3-乙氧基丙酸乙酯(以下簡稱為EEP)中,其中單體混合物入料的方式為連續添加,並予攪拌均勻混合後,同時將該四頸錐瓶的油浴溫度提升至100℃,然後,將10重量份的聚合起始劑2,2’-偶氮雙-2-甲基丁腈(以下簡稱為AMBN)溶解於100重量份的EEP中,並分成二等份量,每間隔一小時添加一等份量到該四頸錐瓶中。整個聚合過程的反應溫度維持在100℃,聚合時間持續3小時,聚合完成後,將聚合產物自該四頸錐瓶中取出,並把溶劑脫揮,便可得該鹼可溶性樹脂(A-2-1)。 A nitrogen inlet, a stirrer, a heater, a condenser, and a thermometer were placed on a four-necked cone of 1000 ml volume, and nitrogen gas was introduced. Then, 20 parts by weight of 2-methylpropenyl ethoxy succinate (hereinafter abbreviated as HOMS), 50 Parts by weight of dicyclopenteny acrylate (hereinafter abbreviated as FA-511A), 30 parts by weight of benzyl methacrylate (hereinafter abbreviated as BzMA) are dissolved in 100 parts by weight of 3-ethoxypropionic acid In the ester (hereinafter referred to as EEP), the monomer mixture is fed continuously, and after mixing and mixing uniformly, the oil bath temperature of the four-necked flask is raised to 100 ° C, and then 10 parts by weight. The polymerization initiator 2,2'-azobis-2-methylbutyronitrile (hereinafter abbreviated as AMBN) is dissolved in 100 parts by weight of EEP and divided into two equal portions, and an aliquot is added every hour to The four-necked flask is in the bottle. The reaction temperature of the whole polymerization process is maintained at 100 ° C, and the polymerization time is maintained for 3 hours. After the polymerization is completed, the polymerization product is taken out from the four-necked flask, and the solvent is devolatilized to obtain the alkali-soluble resin (A-2). -1).

合成例A-2-2至合成例A-2-7以及比較合成例A’-2-1至比較合成例A’-2-3Synthesis Example A-2-2 to Synthesis Example A-2-7 and Comparative Synthesis Example A'-2-1 to Comparative Synthesis Example A'-2-3

合成例A-2-2至合成例A-2-7以及比較合成例A’-2-1至比較合成例A’-2-3的鹼可溶性樹脂是以與合成例A-2-1相同的步驟來製備,並且其不同處在於各合成例及比較合成例的成分種類及其使用量、反應時間、以及反應溫度,如表2所示。 The alkali-soluble resins of Synthesis Example A-2-2 to Synthesis Example A-2-7 and Comparative Synthesis Example A'-2-1 to Comparative Synthesis Example A'-2-3 were the same as Synthesis Example A-2-1. The steps were prepared, and the difference was in the composition types of the respective synthesis examples and comparative synthesis examples, the amounts thereof used, the reaction time, and the reaction temperature, as shown in Table 2.

表2中的簡稱所對應的化合物如下所示。 The compounds corresponding to the abbreviations in Table 2 are as follows.

染料(F-1)的合成例Synthesis example of dye (F-1)

以下說明染料(F-1)的合成例F-1-1至合成例F-1-3: The synthesis example F-1-1 of the dye (F-1) to the synthesis example F-1-3 will be described below:

合成例F-1-1Synthesis Example F-1-1

在18質量份的鹼性紫10(basic violet 10)中加入170質量份的無水氯仿、1.0質量份的樟腦磺酸、1.4質量份的4-(N,N-二甲基胺基)吡啶以及18質量份的甲基丙烯酸2-羥乙酯,並攪拌約30分鐘。其後,緩慢加入在10.5質量份的1-乙基-3-(3-二甲基胺基丙基)碳二醯亞胺鹽酸鹽中加入47質量份的無水氯仿並預先溶解而成的溶液後,在室溫攪拌約2小時。用150質量份的1N鹽酸水溶液進行2次分液操作之後,用150質量份的10%食鹽水清洗有機層2次。接著,加入43質量份的無水硫酸鎂攪拌約30分鐘後,過濾乾燥劑、餾去溶劑,即可獲得20.6質量份的由式(F-1-1)表示的化合物(以下簡稱為染料F-1-1)。 170 parts by mass of anhydrous chloroform, 1.0 part by mass of camphorsulfonic acid, 1.4 parts by mass of 4-(N,N-dimethylamino)pyridine, and 18 parts by mass of basic violet 10 were added. 18 parts by mass of 2-hydroxyethyl methacrylate and stirred for about 30 minutes. Thereafter, 47 parts by mass of anhydrous chloroform was added to 10.5 parts by mass of 1-ethyl-3-(3-dimethylaminopropyl)carbodiimide hydrochloride, and preliminarily dissolved. After the solution, it was stirred at room temperature for about 2 hours. After two times of liquid separation operation using 150 parts by mass of 1N aqueous hydrochloric acid solution, the organic layer was washed twice with 150 parts by mass of 10% saline. Then, after adding 43 parts by mass of anhydrous magnesium sulfate and stirring for about 30 minutes, the desiccant was filtered off and the solvent was distilled off to obtain 20.6 parts by mass of a compound represented by the formula (F-1-1) (hereinafter referred to simply as a dye F-). 1-1).

合成例F-1-2Synthesis Example F-1-2

在放入了攪拌子的500mL三角燒瓶中裝入20質量份的染 料F-1-1及14.5質量份的雙(三氟甲磺醯基)醯亞胺鋰、添加130質量份的氯仿和100質量份的離子交換水,接著在室溫攪拌約2小時。其後,分離除去水層,用200質量份的離子交換水清洗有機層2次。在減壓下將有機層濃縮後,在50℃對殘渣減壓乾燥12小時,即可獲得26.6質量份的由式(F-1-2)表示的化合物(以下簡稱為染料F-1-2)。 20 parts by mass of a 500 mL Erlenmeyer flask filled with a stir bar F-1-1 and 14.5 parts by mass of lithium bis(trifluoromethanesulfonyl) rutheide, 130 parts by mass of chloroform and 100 parts by mass of ion-exchanged water were added, followed by stirring at room temperature for about 2 hours. Thereafter, the aqueous layer was separated and removed, and the organic layer was washed twice with 200 parts by mass of ion-exchanged water. After concentrating the organic layer under reduced pressure, the residue was dried under reduced pressure at 50 ° C for 12 hours to obtain 26.6 parts by mass of a compound represented by formula (F-1-2) (hereinafter referred to as dye F-1-2). ).

合成例F-1-3Synthesis Example F-1-3

在合成例F-1-2中使用四氰基硼酸鉀代替雙(三氟甲磺醯基)醯亞胺鋰,除此之外,以與合成例F-1-2相同的方式合成染料F-1-3。 The dye F was synthesized in the same manner as in Synthesis Example F-1-2 except that potassium tetracyanoborate was used instead of lithium bis(trifluoromethanesulfonyl) ruthenium in Synthesis Example F-1-2. -1-3.

感光性樹脂組成物的實施例與比較例Example and Comparative Example of Photosensitive Resin Composition

以下說明感光性樹脂組成物及膜的實施例1至實施例13以及比較例1至比較例10: Hereinafter, Examples 1 to 13 and Comparative Examples 1 to 10 of the photosensitive resin composition and film will be described:

實施例1Example 1

將80重量份的鹼可溶性樹脂A-1-1、20重量份的鹼可溶性樹脂A-2-1、60重量份的二季戊四醇六丙烯酸酯(簡稱為B-2-1)、15重量份的由式(1-10)所表示的光起始劑(簡稱為C-1-2)、15重量份的1-[9-乙基-6-(2-甲基苯醯基)-9H-咔唑-3-取代基]-乙烷酮-1-(O-乙醯基肟)(簡稱為C-2-1)、50重量份的C.I.顏料紅254(C.I.Pigment R254)(簡稱為E-2)以及15重量份的CI酸性紅91(簡稱為F-2-2)加入800重量份的丙二醇甲醚醋酸酯(簡稱為D-1)中,並且以搖動式攪拌器攪拌均勻後,即可製得實施例1的感光性樹脂組成物。 80 parts by weight of the alkali-soluble resin A-1-1, 20 parts by weight of the alkali-soluble resin A-2-1, 60 parts by weight of dipentaerythritol hexaacrylate (abbreviated as B-2-1), and 15 parts by weight A photoinitiator represented by formula (1-10) (abbreviated as C-1-2), 15 parts by weight of 1-[9-ethyl-6-(2-methylbenzoinyl)-9H- Oxazol-3-substituted]-ethane ketone-1-(O-ethinyl hydrazine) (abbreviated as C-2-1), 50 parts by weight of CI Pigment Red 254 (CIPigment R254) (abbreviated as E -2) and 15 parts by weight of CI Acid Red 91 (abbreviated as F-2-2) were added to 800 parts by weight of propylene glycol methyl ether acetate (abbreviated as D-1), and after being uniformly stirred by a rocking stirrer, The photosensitive resin composition of Example 1 was obtained.

實施例2至實施例13Example 2 to Example 13

實施例2至實施例13的感光性樹脂組成物是以與實施例1相同的步驟來製備,並且其不同處在於:改變感光性樹脂組成物的成分種類及其使用量(如表3所示)。將所製得的膜以下列各評價方式進行評價,其結果如表3所示。 The photosensitive resin compositions of Examples 2 to 13 were prepared in the same manner as in Example 1, and were different in that the composition of the photosensitive resin composition and the amount thereof were changed (as shown in Table 3). ). The obtained film was evaluated in the following evaluation manners, and the results are shown in Table 3.

比較例1至比較例10Comparative Example 1 to Comparative Example 10

比較例1至比較例10的感光性樹脂組成物是以與實施例1相同的步驟來製備,並且其不同處在於:改變感光性樹脂組成物的成分種類及其使用量(如表4所示)。將所製得的膜以下列各評價方式進行評價,其結果如表4所示。 The photosensitive resin compositions of Comparative Examples 1 to 10 were prepared in the same manner as in Example 1, and were different in that the kinds of components of the photosensitive resin composition and the amounts thereof were changed (as shown in Table 4). ). The obtained film was evaluated in the following evaluation manners, and the results are shown in Table 4.

表3及表4中標號所對應的化合物如下所示。 The compounds corresponding to the labels in Tables 3 and 4 are as follows.

評價方式Evaluation method a. 高精細度的圖案直線性a. High definition pattern linearity

將實施例1至13以及比較例1至10所製得之感光性樹脂組成物以旋轉塗佈的方式,塗佈在100mm×100mm之玻璃基板上,先進行減壓乾燥,壓力100mmHg、時間30秒鐘,然後再進行預烤,溫度80℃、時間3分鐘,可形成膜厚2.5μm之預烤塗膜。將該預烤塗膜隔著具有25μm寬(間距(pitch)50μm)的條狀圖案的光罩,利用300mJ/cm2的紫外光(曝光機型號AG500-4N),藉此進行了曝光,之後浸漬於23℃之顯影液1分鐘及2分鐘兩種條件,之後以純水洗淨,再以200℃後烤80分鐘,即可在玻璃基板上形成膜厚2.0μm之感光性樹脂層。 The photosensitive resin compositions obtained in Examples 1 to 13 and Comparative Examples 1 to 10 were applied by spin coating to a glass substrate of 100 mm × 100 mm, and dried under reduced pressure at a pressure of 100 mmHg and time 30. After a second, and then pre-baked at a temperature of 80 ° C for 3 minutes, a pre-baked film having a film thickness of 2.5 μm can be formed. The prebaked coating film was exposed through a reticle having a strip pattern of 25 μm width (pitch 50 μm) by using 300 mJ/cm 2 of ultraviolet light (exposure model AG500-4N), and then exposed. The developer was immersed in a developing solution at 23 ° C for 1 minute and 2 minutes, and then washed with pure water, and baked at 200 ° C for 80 minutes to form a photosensitive resin layer having a film thickness of 2.0 μm on the glass substrate.

利用光學顯微鏡對所述方法所形成的條狀圖案進行觀察及評價。評價的等級如下所述:◎:1分鐘直線性良好、2分鐘直線性良好;○:1分鐘直線性良好、2分鐘部分直線性不良;△:1分鐘部分直線性不良、2分鐘直線性不良;×:1分鐘直線性不良、2分鐘直線性不良。 The strip pattern formed by the method was observed and evaluated by an optical microscope. The evaluation grades are as follows: ◎: good linearity in 1 minute, good linearity in 2 minutes; ○: good linearity in 1 minute, poor linearity in 2 minutes; △: poor linearity in 1 minute, poor linearity in 2 minutes ; ×: 1 minute of poor linearity, 2 minutes of poor linearity.

b. 圖案平滑性b. Pattern smoothness

使用曝光機(Canon製造,型號為PLA-501F)以100毫焦耳/平方公分(mJ/cm2)的紫外光照射上述評價方式(a)的膜 厚為2.5μm的預烤塗膜,再將該預烤塗膜浸漬於23℃的顯影液1分鐘,以純水洗淨。然後,再於235℃烘烤30分鐘,即可在玻璃基板上形成膜厚2.0μm的畫素層。使用原子力顯微鏡(Atomic Force Microscope,AFM)(Dimension3100,由威科儀器公司(Veeco Instruments Inc.)製造)測定畫素層的表面粗糙度以評價其圖案平滑性。測定面積為10μm2。表面粗糙度依據以下基準進行評價。所測得的表面粗糙度越小,表示感光性樹脂組成物所形成的硬化物的表面粗糙度較低而較佳。亦即,表面粗糙度越低圖案平滑性越佳。評價的等級如下所述: The pre-baked coating film of the above evaluation method (a) having a film thickness of 2.5 μm was irradiated with ultraviolet light of 100 mJ/cm 2 (mJ/cm 2 ) using an exposure machine (manufactured by Canon, model: PLA-501F), and then The prebaked coating film was immersed in a developing solution at 23 ° C for 1 minute, and washed with pure water. Then, by baking at 235 ° C for 30 minutes, a pixel layer having a film thickness of 2.0 μm was formed on the glass substrate. The surface roughness of the pixel layer was measured using an Atomic Force Microscope (AFM) (Dimension 3100, manufactured by Veeco Instruments Inc.) to evaluate its pattern smoothness. The measurement area was 10 μm 2 . The surface roughness was evaluated based on the following criteria. The smaller the measured surface roughness, the better the surface roughness of the cured product formed of the photosensitive resin composition is. That is, the lower the surface roughness, the better the pattern smoothness. The rating of the evaluation is as follows:

◎:表面粗糙度≦6nm ◎: Surface roughness ≦ 6nm

○:6nm<表面粗糙度≦8nm ○: 6 nm < surface roughness ≦ 8 nm

△:8nm<表面粗糙度≦10nm △: 8 nm < surface roughness ≦ 10 nm

×:10nm<表面粗糙度 ×: 10 nm < surface roughness

c. 逸氣性c. outgassing

將實施例1至13以及比較例1至10所製得之感光性樹脂組成物以與上述評價方式(a)中所述相同方式進行旋轉塗佈、曝光及顯影,接著,再於無塵烘箱(clean oven)中於230℃的氮氣環境下進行1小時的加熱處理。於加熱後使用熱脫附能譜分析儀(電子科學社製、WA1000S/W型)在220℃下加熱30分鐘,並從脫離出的原子量18(水)的成分量算出逸氣量。評價的等級如下所述: The photosensitive resin compositions obtained in Examples 1 to 13 and Comparative Examples 1 to 10 were spin-coated, exposed, and developed in the same manner as described in the above evaluation method (a), followed by a dust-free oven. Heat treatment was carried out for 1 hour in a clean oven at 230 ° C in a nitrogen atmosphere. After heating, it was heated at 220 ° C for 30 minutes using a thermal desorption spectrum analyzer (manufactured by Electronic Science Co., Ltd., WA1000S/W type), and the amount of outgas was calculated from the amount of the atomic weight 18 (water) which was separated. The rating of the evaluation is as follows:

◎:脫氣量<10ppm。 ◎: The amount of degassing is <10 ppm.

○:10ppm≦脫氣量<20ppm。 ○: 10 ppm ≦ degassing amount < 20 ppm.

△:20ppm≦脫氣量<30ppm。 △: 20 ppm of degassing amount <30 ppm.

×:脫氣量≧30ppm。 ×: The amount of degassing was ppm30 ppm.

<評價結果><evaluation result>

由表3以及表4得知,與使用鹼可溶性樹脂(A-1)的感光性樹脂組成物所形成的膜(實施例1至實施例13)相比,使用不含鹼可溶性樹脂(A-1)的感光性樹脂組成物(比較例4、8、10)所形成的膜的逸氣性不佳。 It is understood from Tables 3 and 4 that the alkali-free resin (A- is used as compared with the film formed of the photosensitive resin composition using the alkali-soluble resin (A-1) (Examples 1 to 13). The film formed of the photosensitive resin composition of 1) (Comparative Examples 4, 8, and 10) had poor gassing properties.

再者,與使用鹼可溶性樹脂(A-2)的感光性樹脂組成物所形成的膜(實施例1至實施例13)相比,使用不含鹼可溶性樹脂(A-2)的感光性樹脂組成物(比較例1~3及8~10)所形成的膜的高精細度的圖案直線性不佳。 Further, a photosensitive resin containing no alkali-soluble resin (A-2) is used as compared with a film formed of a photosensitive resin composition using an alkali-soluble resin (A-2) (Examples 1 to 13). The high-definition pattern of the film formed by the compositions (Comparative Examples 1 to 3 and 8 to 10) had poor linearity.

另外,與使用含有光起始劑(C-1)的感光性樹脂組成物所形成的膜(實施例1至實施例13)相比,使用不含有光起始劑(C-1)的感光性樹脂組成物所形成的膜(比較例7、9、10)所形成的膜的圖案平滑性不佳。 Further, a photosensitive film containing no photoinitiator (C-1) was used as compared with a film formed using a photosensitive resin composition containing a photoinitiator (C-1) (Examples 1 to 13). The film formed of the film (Comparative Examples 7, 9, 10) formed of the resin composition had poor pattern smoothness.

另外,當所述鹼可溶性樹脂(A-1)與所述鹼可溶性樹脂 (A-2)的使用量之重量比值範圍(A-1)/(A-2)在5/95至95/5的範圍外時(比較例5、6),所形成的膜的高精細度的圖案直線性不佳及逸氣性不佳。 In addition, when the alkali-soluble resin (A-1) and the alkali-soluble resin When the weight ratio range (A-1)/(A-2) of the use amount of (A-2) is outside the range of 5/95 to 95/5 (Comparative Examples 5 and 6), the film is formed with high fineness. The degree of pattern is not linear and the outgassing is poor.

綜上所述,本發明的感光性樹脂組成物由於包括鹼可溶性樹脂(A-1)、鹼可溶性樹脂(A-2)以及特定結構的光起始劑(C-1),且鹼可溶性樹脂(A-1)與鹼可溶性樹脂(A-2)的使用量之重量比值範圍(A-1)/(A-2)在5/95至95/5之間,因此可以改善高精細度的圖案直線性不佳、圖案平滑性不佳以及高逸氣性等問題,進而適用於彩色濾光片以及液晶顯示裝置。 As described above, the photosensitive resin composition of the present invention includes an alkali-soluble resin (A-1), an alkali-soluble resin (A-2), and a photoinitiator (C-1) having a specific structure, and an alkali-soluble resin. The weight ratio range of (A-1) to the amount of the alkali-soluble resin (A-2) used is (A-1) / (A-2) is between 5/95 and 95/5, so that high definition can be improved. Problems such as poor pattern linearity, poor pattern smoothness, and high outgassing are applicable to color filters and liquid crystal display devices.

雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明的精神和範圍內,當可作些許的更動與潤飾,故本發明的保護範圍當視後附的申請專利範圍所界定者為準。 Although the present invention has been disclosed in the above embodiments, it is not intended to limit the present invention, and any one of ordinary skill in the art can make some changes and refinements without departing from the spirit and scope of the present invention. The scope of the invention is defined by the scope of the appended claims.

Claims (18)

一種感光性樹脂組成物,其包括:鹼可溶性樹脂(A);具有乙烯性不飽和基之化合物(B);光起始劑(C);溶劑(D);及顏料(E);其中,所述鹼可溶性樹脂(A)包括鹼可溶性樹脂(A-1)及鹼可溶性樹脂(A-2),其中,所述鹼可溶性樹脂(A-1)是由一混合物反應而獲得,且所述混合物包括具有至少二個環氧基的環氧化合物(a-1-1)、具有至少一個羧酸基及至少一個乙烯性不飽和基之化合物(a-1-2)、四羧酸或其酸二酐(a-1-3)以及二羧酸或其酸酐(a-1-4);所述具有至少二個環氧基的環氧化合物(a-1-1)具有如下式(aI-1)或下式(aI-2)所示之結構: 式(aI-1)中,W1、W2、W3以及W4各自為相同或不同,且獨立表示氫原子、鹵素原子、碳數為1至5的烷基、碳數為1至5的烷氧基、碳數為6至12的芳基或碳數為6至12的芳烷基, 式(aI-2)中,W5至W18各自為相同或不同,且獨立表示氫原子、鹵素原子、碳數為1至8的烷基或碳數為6至15的芳香基,s表示0至10的整數;所述鹼可溶性樹脂(A-1)的數量平均分子量為1000~8000;所述鹼可溶性樹脂(A-2)是由不飽和羧酸或不飽和羧酸酐化合物(a-2-1)、含脂環式碳氫基之不飽和化合物(a-2-2)及其它不飽和化合物(a-2-3)共聚合而得;所述鹼可溶性樹脂(A-2)的重量平均分子量為3000~30000;所述鹼可溶性樹脂(A-1)與所述鹼可溶性樹脂(A-2)的使用量之重量比值範圍(A-1)/(A-2)為5/95至95/5;所述光起始劑(C)包括由式(1)表示的光起始劑(C-1); 其中R1、R2、R3、R4、R5、R6、R7及R8彼此獨立地為氫、COR16、NO2或由式(2)所表示的基團; 或R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8彼此獨立地共同為式(5)所表示的基團; 但條件為R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8中之至少一對是由式(5)所表示的基團,R9、R10、R11及R12彼此獨立地為氫;X表示直接鍵;R13表示C1-C20烷基;R14表示氫或C1-C20烷基;R15表示C6-C20芳基,其各是未經取代或經一或多個以下基團取代:OR17或C1-C20烷基取代;或R15表示C1-C20烷基;R16表示C6-C20芳基,其各是未經取代或經一或多個以下基團取代:其各經一或多個C1-C20烷基取代;R17表示C1-C20烷基,其是未經取代或經一或多個以下基團取代:鹵素;或R17表示C2-C20烷基,其間雜有一或多個O;但條件為在式(1)中存在至少一個式(2)所表示的基團; A photosensitive resin composition comprising: an alkali-soluble resin (A); a compound (B) having an ethylenically unsaturated group; a photoinitiator (C); a solvent (D); and a pigment (E); The alkali-soluble resin (A) includes an alkali-soluble resin (A-1) and an alkali-soluble resin (A-2), wherein the alkali-soluble resin (A-1) is obtained by reacting a mixture, and the The mixture includes an epoxy compound (a-1-1) having at least two epoxy groups, a compound (a-1-2) having at least one carboxylic acid group and at least one ethylenically unsaturated group, a tetracarboxylic acid or An acid dianhydride (a-1-3) and a dicarboxylic acid or an anhydride thereof (a-1-4); the epoxy compound (a-1-1) having at least two epoxy groups having the following formula (aI) -1) or the structure shown in the following formula (aI-2): In the formula (aI-1), W 1 , W 2 , W 3 and W 4 are each the same or different and independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 5 carbon atoms, and a carbon number of 1 to 5. Alkoxy group, aryl group having 6 to 12 carbon atoms or aralkyl group having 6 to 12 carbon atoms, In the formula (aI-2), W 5 to W 18 are each the same or different and independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 8 carbon atoms or an aromatic group having 6 to 15 carbon atoms, and s represents An integer of 0 to 10; the number average molecular weight of the alkali-soluble resin (A-1) is from 1,000 to 8,000; and the alkali-soluble resin (A-2) is an unsaturated carboxylic acid or an unsaturated carboxylic anhydride compound (a- 2-1) an alicyclic hydrocarbon group-containing unsaturated compound (a-2-2) and another unsaturated compound (a-2-3) obtained by copolymerization; the alkali-soluble resin (A-2) The weight average molecular weight is 3,000 to 30,000; the weight ratio range (A-1)/(A-2) of the alkali-soluble resin (A-1) to the alkali-soluble resin (A-2) is 5 /95 to 95/5; the photoinitiator (C) comprises a photoinitiator (C-1) represented by the formula (1); Wherein R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 and R 8 are each independently hydrogen, COR 16 , NO 2 or a group represented by the formula (2); Or R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 are each independently a group represented by the formula (5) ; However, the condition is that at least one of R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 is represented by the formula (5) The group represented, R 9 , R 10 , R 11 and R 12 are each independently hydrogen; X represents a direct bond; R 13 represents a C 1 -C 20 alkyl group; and R 14 represents a hydrogen or a C 1 -C 20 alkyl group. R 15 represents a C 6 -C 20 aryl group, each of which is unsubstituted or substituted with one or more of the following groups: OR 17 or C 1 -C 20 alkyl substituted; or R 15 represents C 1 -C 20 Alkyl; R 16 represents C 6 -C 20 aryl, each of which is unsubstituted or substituted with one or more of the following: each substituted with one or more C 1 -C 20 alkyl groups; R 17 represents a C 1 -C 20 alkyl group which is unsubstituted or substituted with one or more of the following groups: halogen; or R 17 represents a C 2 -C 20 alkyl group with one or more O intervening; provided that There is at least one group represented by the formula (2) in the formula (1); 如申請專利範圍第1項所述的感光性樹脂組成物,其中所述含脂環式碳氫基之不飽和化合物(a-2-2)是選自為具有雙環戊基之不飽和化合物、具有雙環戊烯基之不飽和化合物及其混合物所組成之群。 The photosensitive resin composition according to claim 1, wherein the alicyclic hydrocarbon group-containing unsaturated compound (a-2-2) is selected from the group consisting of unsaturated compounds having a bicyclopentyl group, A group consisting of an unsaturated compound having a dicyclopentenyl group and a mixture thereof. 如申請專利範圍第2項所述的感光性樹脂組成物,其中所述含脂環式碳氫基之不飽和化合物(a-2-2)是選自由(甲基)丙烯酸雙環戊酯、(甲基)丙烯酸雙環戊烯酯、(甲基)丙烯酸雙環戊氧基乙酯、(甲基)丙烯酸雙環戊烯氧基乙酯及其混合物所組成之群。 The photosensitive resin composition according to claim 2, wherein the alicyclic hydrocarbon group-containing unsaturated compound (a-2-2) is selected from the group consisting of dicyclopentanyl (meth)acrylate, A group consisting of dicyclopentenyl (meth)acrylate, dicyclopentyloxyethyl (meth)acrylate, dicyclopentenyloxyethyl (meth)acrylate, and mixtures thereof. 如申請專利範圍第1項所述的感光性樹脂組成物,其中所述具有乙烯性不飽和基之化合物(B)包括第一化合物(B-1),其中所述第一化合物(B-1)具有胺基甲酸酯基與至少7個丙烯醯基。 The photosensitive resin composition according to claim 1, wherein the compound (B) having an ethylenically unsaturated group includes a first compound (B-1), wherein the first compound (B-1) ) having a urethane group and at least 7 propylene groups. 如申請專利範圍第4項所述的感光性樹脂組成物,其中所述第一化合物(B-1)具有胺基甲酸酯基與至少10個丙烯醯基。 The photosensitive resin composition according to claim 4, wherein the first compound (B-1) has a urethane group and at least 10 acryl groups. 如申請專利範圍第1項所述的感光性樹脂組成物,更包括染料(F)。 The photosensitive resin composition according to claim 1, further comprising a dye (F). 如申請專利範圍第6項所述的感光性樹脂組成物,所述染料(F)包括由式(f-1)表示的染料(F-1), 式(f-1)中,J1、J2、J3及J4各自獨立表示氫原子、碳數為1至8的烷基、經取代的碳數為1至8的烷基、碳數為3至8的環烷基、經取代的碳數為3至8的環烷基、苯基或經取代的苯基;J5及J6各自獨立表示氫原子、碳數為1至8的烷基或氯原子;J7表示具有聚合性不飽合基的基;IN-表示陰離子;a表示1至5的整數。 The photosensitive resin composition according to claim 6, wherein the dye (F) comprises a dye (F-1) represented by the formula (f-1), In the formula (f-1), J 1 , J 2 , J 3 and J 4 each independently represent a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, a substituted alkyl group having 1 to 8 carbon atoms, and a carbon number. a cycloalkyl group of 3 to 8, a substituted cycloalkyl group having a carbon number of 3 to 8, a phenyl group or a substituted phenyl group; and J 5 and J 6 each independently represent a hydrogen atom and have a carbon number of 1 to 8. An alkyl group or a chlorine atom; J 7 represents a group having a polymerizable unsaturated group; IN - represents an anion; and a represents an integer of 1 to 5. 如申請專利範圍第7項所述的感光性樹脂組成物,其中所述由式(f-1)表示的化合物包括由式(f-2)表示的化合物, 式(f-2)中,J1、J2、J3及J4各自獨立表示氫原子、碳數為1至8的烷基、經取代的碳數為1至8的烷基、碳數為3至8的環烷基、經取代 的碳數為3至8的環烷基、苯基或經取代的苯基;J5及J6各自獨立表示氫原子、碳數為1至8的烷基或氯原子;J8表示具有聚合性不飽合基的基;IN-表示陰離子。 The photosensitive resin composition according to claim 7, wherein the compound represented by the formula (f-1) includes a compound represented by the formula (f-2), In the formula (f-2), J 1 , J 2 , J 3 and J 4 each independently represent a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, a substituted alkyl group having 1 to 8 carbon atoms, and a carbon number. a cycloalkyl group of 3 to 8, a substituted cycloalkyl group having a carbon number of 3 to 8, a phenyl group or a substituted phenyl group; and J 5 and J 6 each independently represent a hydrogen atom and have a carbon number of 1 to 8. An alkyl group or a chlorine atom; J 8 represents a group having a polymerizable unsaturated group; and IN - represents an anion. 如申請專利範圍第8項所述的感光性樹脂組成物,其中,J8為由式(f-3)表示的基或由式(f-4)表示的基, 式(f-3)及式(f-4)中,J9及J10各自獨立表示氫原子或甲基;V1、V2、V3及V4各自獨立表示經取代或未經取代的碳數為1至12的烷二基;Q1表示;Q2表示二價脂環式烴基;b表示0至12的整數;c及d各自獨立表示0至6的整數。 The photosensitive resin composition according to claim 8, wherein J 8 is a group represented by the formula (f-3) or a group represented by the formula (f-4). In the formulae (f-3) and (f-4), J 9 and J 10 each independently represent a hydrogen atom or a methyl group; and V 1 , V 2 , V 3 and V 4 each independently represent substituted or unsubstituted. An alkanediyl group having a carbon number of 1 to 12; Q 1 represents or ; Q 2 represents a divalent alicyclic hydrocarbon group; b represents an integer of 0 to 12; and c and d each independently represent an integer of 0 to 6. 如申請專利範圍第1項所述的感光性樹脂組成物,其中,基於所述鹼可溶性樹脂(A)之使用量總和為100重量份,所述含乙烯性不飽和基之化合物(B)之使用量範圍為20重量份至200重 量份;所述光起始劑(C)之使用量範圍為10重量份至100重量份;所述溶劑(D)之使用量範圍為500重量份至5000重量份;所述顏料(E)之使用量範圍為30重量份至300重量份。 The photosensitive resin composition according to the first aspect of the invention, wherein the ethylenically unsaturated group-containing compound (B) is based on 100 parts by weight of the total amount of the alkali-soluble resin (A) used. The amount used ranges from 20 parts by weight to 200 weights. The photoinitiator (C) is used in an amount ranging from 10 parts by weight to 100 parts by weight; the solvent (D) is used in an amount ranging from 500 parts by weight to 5000 parts by weight; the pigment (E) The amount used is in the range of 30 parts by weight to 300 parts by weight. 如申請專利範圍第6項所述的感光性樹脂組成物,其中,基於所述鹼可溶性樹脂(A)之使用量總和為100重量份,所述染料(F)之使用量範圍為5重量份至90重量份。 The photosensitive resin composition according to claim 6, wherein the dye (F) is used in an amount of 5 parts by weight based on 100 parts by weight of the total amount of the alkali-soluble resin (A) used. Up to 90 parts by weight. 如申請專利範圍第1項所述的感光性樹脂組成物,其中,基於所述鹼可溶性樹脂(A-2)之所述不飽和羧酸或不飽和羧酸酐化合物(a-2-1)、所述含脂環式碳氫基之不飽和化合物(a-2-2)及所述其它不飽和化合物(a-2-3)之合計量為100重量份,所述含脂環式碳氫基之不飽和化合物(a-2-2)之使用量範圍為10重量份至50重量份。 The photosensitive resin composition according to claim 1, wherein the unsaturated carboxylic acid or unsaturated carboxylic anhydride compound (a-2-1) based on the alkali-soluble resin (A-2), The total amount of the alicyclic hydrocarbon group-containing unsaturated compound (a-2-2) and the other unsaturated compound (a-2-3) is 100 parts by weight, and the alicyclic hydrocarbon-containing hydrocarbon The ethylenically unsaturated compound (a-2-2) is used in an amount ranging from 10 parts by weight to 50 parts by weight. 如申請專利範圍第4項所述的感光性樹脂組成物,其中,基於所述鹼可溶性樹脂(A)之使用量總和為100重量份,所述第一化合物(B-1)之使用量範圍為5重量份至100重量份。 The photosensitive resin composition according to claim 4, wherein the first compound (B-1) is used in an amount of 100 parts by weight based on the total amount of the alkali-soluble resin (A) used. It is 5 parts by weight to 100 parts by weight. 如申請專利範圍第1項所述的感光性樹脂組成物,其中,基於所述鹼可溶性樹脂(A)之使用量總和為100重量份,所述光起始劑(C-1)之使用量範圍為5重量份至100重量份。 The photosensitive resin composition according to the first aspect of the invention, wherein the total amount of the alkali-soluble resin (A) used is 100 parts by weight, and the amount of the photoinitiator (C-1) is used. The range is from 5 parts by weight to 100 parts by weight. 如申請專利範圍第7項所述的感光性樹脂組成物,其中,基於所述鹼可溶性樹脂(A)之使用量總和為100重量份,所述染料(F-1)之使用量範圍為3重量份至90重量份。 The photosensitive resin composition according to claim 7, wherein the dye (F-1) is used in an amount of 3 based on the total amount of the alkali-soluble resin (A) used in an amount of 100 parts by weight. Parts by weight to 90 parts by weight. 一種彩色濾光片之製造方法,其是使用如申請專利範圍第1項至第15項任一項之所述感光性樹脂組成物而形成一畫素層。 A method of producing a color filter, which comprises forming a pixel layer by using a photosensitive resin composition according to any one of claims 1 to 15. 一種彩色濾光片,其是藉由申請專利範圍第16項之方法所製得。 A color filter produced by the method of claim 16 of the patent application. 一種液晶顯示裝置,包括申請專利範圍第17項之彩色濾光片。 A liquid crystal display device comprising the color filter of claim 17 of the patent application.
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Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9939568B2 (en) * 2015-05-06 2018-04-10 Chi Mei Corporation Photosensitive resin composition for color filter and application of the same
TWI665523B (en) * 2016-05-20 2019-07-11 奇美實業股份有限公司 Photosensitive resin composition for black matrix, black matrix, color filter, and liquid crystal display device
KR102560329B1 (en) * 2016-08-01 2023-07-26 동우 화인켐 주식회사 Colored photosensitive resin composition, color filter, and image display apparatus comprising the same
TWI683181B (en) * 2016-10-03 2020-01-21 奇美實業股份有限公司 Photosensitive resin composition and uses thereof
TWI669573B (en) * 2016-10-21 2019-08-21 奇美實業股份有限公司 Photosensitive resin composition and uses thereof
TWI666518B (en) * 2016-12-30 2019-07-21 奇美實業股份有限公司 Photosensitive resin composition and uses thereof
TWI716262B (en) * 2020-01-16 2021-01-11 新應材股份有限公司 Resin composition, cured film and black matrix

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101627339A (en) * 2007-06-18 2010-01-13 旭化成电子材料株式会社 Photosensitive resin composition, flexographic printing plate, and method for producing flexographic printing plate
TW201226393A (en) * 2010-10-05 2012-07-01 Basf Se Oxime ester
TW201241561A (en) * 2011-04-08 2012-10-16 Chi Mei Corp Photosensitive resin composition, and color filter and liquid crystal display device made by using the composition
TW201335707A (en) * 2012-01-30 2013-09-01 Jsr Corp Colorant, coloring composition, color filter and display element
TW201426178A (en) * 2012-12-20 2014-07-01 Chi Mei Corp Photosensitive resin composition, color filter and liquid crystal display device

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1566128A (en) * 2003-07-03 2005-01-19 中国人民解放军军事医学科学院放射医学研究所 Sugar charcoal glycoside isoflavone compound containing alkane amine group and alkoxy substitution, process and uses thereof
JP2014005466A (en) * 2012-06-25 2014-01-16 Dongwoo Fine-Chem Co Ltd Alkali-soluble resin, photosensitive resin composition containing the same, and color filter using the same
TWI474112B (en) * 2012-09-27 2015-02-21 Chi Mei Corp Photosensitive resin composition, protecting film, and a device containing the protecting film
CN103969947B (en) * 2013-01-31 2016-05-04 太阳油墨(苏州)有限公司 Alkali development-type photosensitive resin composition, its dry film and solidfied material thereof and use it and the printed circuit board (PCB) that forms

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101627339A (en) * 2007-06-18 2010-01-13 旭化成电子材料株式会社 Photosensitive resin composition, flexographic printing plate, and method for producing flexographic printing plate
TW201226393A (en) * 2010-10-05 2012-07-01 Basf Se Oxime ester
TW201241561A (en) * 2011-04-08 2012-10-16 Chi Mei Corp Photosensitive resin composition, and color filter and liquid crystal display device made by using the composition
TW201335707A (en) * 2012-01-30 2013-09-01 Jsr Corp Colorant, coloring composition, color filter and display element
TW201426178A (en) * 2012-12-20 2014-07-01 Chi Mei Corp Photosensitive resin composition, color filter and liquid crystal display device

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