WO2016058551A9 - Photosensitive resin composition, method for manufacturing colour filter, colour filter and liquid crystal display device - Google Patents

Photosensitive resin composition, method for manufacturing colour filter, colour filter and liquid crystal display device Download PDF

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Publication number
WO2016058551A9
WO2016058551A9 PCT/CN2015/092029 CN2015092029W WO2016058551A9 WO 2016058551 A9 WO2016058551 A9 WO 2016058551A9 CN 2015092029 W CN2015092029 W CN 2015092029W WO 2016058551 A9 WO2016058551 A9 WO 2016058551A9
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group
alkyl
substituted
phenyl
formula
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PCT/CN2015/092029
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French (fr)
Chinese (zh)
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WO2016058551A1 (en
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王端志
谢栢源
许荣宾
许承昌
何维凯
郭怡嘉
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奇美实业股份有限公司
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Priority to CN201580055678.2A priority Critical patent/CN107003604B/en
Publication of WO2016058551A1 publication Critical patent/WO2016058551A1/en
Publication of WO2016058551A9 publication Critical patent/WO2016058551A9/en

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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D209/00Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/56Ring systems containing three or more rings
    • C07D209/80[b, c]- or [b, d]-condensed
    • C07D209/82Carbazoles; Hydrogenated carbazoles
    • C07D209/86Carbazoles; Hydrogenated carbazoles with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the ring system
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D405/00Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
    • C07D405/02Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings
    • C07D405/12Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings linked by a chain containing hetero atoms as chain links
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D409/00Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms
    • C07D409/02Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings
    • C07D409/06Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings linked by a carbon chain containing only aliphatic carbon atoms
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D409/00Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms
    • C07D409/02Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings
    • C07D409/12Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings linked by a chain containing hetero atoms as chain links
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Definitions

  • X represents CO or a direct bond
  • R 16 represents a C 2 -C 12 alkyl group in which one or more O, S or NR 26 are heterogeneous; or R 16 represents (CH 2 CH 2 O) n+1 H, (CH 2 CH 2 O) n ( CO)-(C 1 -C 8 alkyl), C 2 -C 12 alkenyl or C 3 -C 8 cycloalkyl;
  • R 17 represents hydrogen, phenyl-C 1 -C 3 alkyl, C 1 -C 20 alkyl, which is unsubstituted or substituted with one or more of the following groups: halogen, OH, SH, CN, C 3 -C 6 alkenyloxy, OCH 2 CH 2 CN, OCH 2 CH 2 (CO)O(C 1 -C 4 alkyl), O(CO)-(C 1 -C 4 alkyl), O(CO) -(C 2 -C 4 )alkenyl, O(CO)-phenyl, (CO)OH, (CO)O(C 1 -C 4 alkyl), C 3 -C 20 cycloalkyl, SO 2 - (C 1- C 4 haloalkyl), O(C 1 -C 4 haloalkyl) or a C 3 -C 20 cycloalkyl having one or more O;
  • R 17 represents C 2 -C 20 alkyl, in which one or more O, S or NR 26 are heterogeneous;
  • R 18 represents a benzoyl group which is unsubstituted or substituted with one or more of the following groups: C 1 -C 6 alkyl, halogen, OH, C 1 -C 4 alkoxy or C 1 -C 4 Alkylthio group;
  • R 25 represents COOR 17 , CONR 19 R 20 , (CO)R 17 ; or R 25 has one of the meanings given for R 17 ;
  • R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 are each independently a group represented by the formula (5) ;
  • R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 is determined by the formula (5). a group represented;
  • R 13 represents a phenyl or naphthyl group, and the two are unsubstituted or substituted by COR 16 or substituted by one or more groups represented by formula (7);
  • R - 14 represents a C 1 -C 20 alkyl group, a phenyl group or a C 1 -C 8 alkoxy group
  • R 15 represents a phenyl group, a naphthyl group, a C 3 -C 20 heteroaryl group, each of which is unsubstituted or substituted with one or more of the following groups: phenyl, halogen, C 1 -C 4 haloalkyl, OR 17 An SR 18 or C 2 -C 20 alkyl group having one or more O or S hetero; or each of which is substituted by one or more C 1 -C 20 alkyl groups, the C 1 -C 20 alkyl group being unsubstituted Substituted or substituted with one or more of the following groups: halogen, COOR 17 , CONR 19 R 20 , phenyl, C 3 -C 8 cycloalkyl, C 3 -C 20 heteroaryl, C 6 -C 20 aryloxy Alkylcarbonyl, C 4 -C 20 heteroaryloxycarbonyl, OR 17 , SR 18 , NR 19 R 20 or PO(OC
  • R 16 represents C 1 -C 20 alkyl, which is unsubstituted or substituted by halogen, phenyl, OH, SH, CN, C 3 -C 6 alkenyloxy, OCH 2 CH 2 (CO O(C 1 -C 4 alkyl), O(CO)-(C 1 -C 4 alkyl) or (CO)O(C 1 -C 4 alkyl);
  • R 17 represents a C 2 -C 20 alkyl group, in which one or more O;
  • R 19 and R 20 are each independently hydrogen, phenyl, C 1 -C 20 alkyl, C 1 -C 8 alkanoyl or C 1 -C 8 alkanoyloxy;
  • R 19 and R 20 together with the N atom to which they are attached form a heteroaromatic ring system which is unsubstituted or substituted via a group represented by formula (7);
  • R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 and R 8 is independently hydrogen, or R 1 and R 2 , R 3 and R 4 or R 5 and R 6 are each independently a group represented by the formula (5);
  • R 2 represents COR 16, NO 2 or by formula (2) or a group represented by the formula (3) a group represented by;
  • R 7 represents COR 16 or a group represented by formula (2)
  • R 9 , R 11 and R 12 represent hydrogen
  • X represents CO or a direct bond
  • R 13 represents a C 2 -C 20 alkyl group, in which one or more O;
  • R 14 represents a C 1 -C 20 alkyl group or a thienyl group
  • R 15 represents a thiophene group, hydrogen, C 1 -C 20 alkyl, C 1 -C 20 alkyl which is unsubstituted or substituted with one or more of the following groups: OR 17, SR 18, C 3 -C 8 -cycloalkyl, NR 19 R 20 or COOR 17 ;
  • R 16 represents a thienyl group
  • R 17 represents a C 2 -C 20 alkyl group, in which one or more O;
  • R 18 represents a phenyl group which is unsubstituted or substituted with one or more halogens
  • R 19 and R 20 attached thereto together form a N atoms interrupted by O 5-membered or 6-membered saturated ring;
  • the compound (B) having an ethylenically unsaturated group includes the first compound (B-1), wherein the first compound (B-1) has a urethane group With at least 7 acryloyl groups.
  • the dye (F) comprises a dye (F-1) represented by the formula (f-1),
  • J 1 , J 2 , J 3 and J 4 each independently represent a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, a substituted alkyl group having 1 to 8 carbon atoms, and a cycloalkyl group having 3 to 8 carbon atoms. a substituted cycloalkyl group having 3 to 8 carbon atoms, a phenyl group or a substituted phenyl group;
  • J 7 represents a group having a polymerizable unsaturated group
  • the compound represented by the formula (f-1) includes a compound represented by the formula (f-2),
  • J 1 , J 2 , J 3 and J 4 each independently represent a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, a substituted alkyl group having 1 to 8 carbon atoms, and a cycloalkyl group having 3 to 8 carbon atoms. a substituted cycloalkyl group having 3 to 8 carbon atoms, a phenyl group or a substituted phenyl group;
  • J 5 and J 6 each independently represent a hydrogen atom, an alkyl group having 1 to 8 carbon atoms or a chlorine atom;
  • J 8 represents a group having a polymerizable unsaturated group.
  • the above J 8 is a group represented by the formula (f-3) or a group represented by the formula (f-4),
  • Q 2 represents a divalent alicyclic hydrocarbon group
  • the ethylenically unsaturated group-containing compound (B) is used in an amount ranging from 20 parts by weight to 200 parts by weight based on 100 parts by weight of the total amount of the alkali-soluble resin (A).
  • the photoinitiator (C) is used in an amount ranging from 10 parts by weight to 100 parts by weight;
  • the solvent (D) is used in an amount ranging from 500 parts by weight to 5000 parts by weight;
  • the pigment (E) The amount used is in the range of 30 parts by weight to 300 parts by weight.
  • the dye (F) is used in an amount ranging from 5 parts by weight to 90 parts by weight based on 100 parts by weight of the total amount of the alkali-soluble resin (A).
  • the amount of the alicyclic hydrocarbon group-containing unsaturated compound (a-2-2) is from 10 parts by weight to 50 parts by weight in an amount of 100 parts by weight.
  • the first compound (B-1) is used in an amount ranging from 5 parts by weight to 100 parts by weight based on 100 parts by weight of the total amount of the alkali-soluble resin (A).
  • the photoinitiator (C-1) is used in an amount ranging from 5 parts by weight to 100 parts by weight based on 100 parts by weight of the total amount of the alkali-soluble resin (A) used. .
  • the dye (F-1) is used in an amount ranging from 3 parts by weight to 90 parts by weight based on 100 parts by weight of the total amount of the alkali-soluble resin (A).
  • a color filter of the present invention is produced by the above method.
  • a liquid crystal display device of the present invention includes the above-described color filter.
  • the photosensitive resin composition of the present invention comprises an alkali-soluble resin (A-1), an alkali-soluble resin (A-2), a first compound (B-1), and a photoinitiator (C-1). Therefore, problems such as poor linearity of the high-definition pattern, poor pattern smoothness, and high outgassing property can be improved, and the color filter and the liquid crystal display device can be applied.
  • the present invention provides a photosensitive resin composition
  • a photosensitive resin composition comprising an alkali-soluble resin (A), a compound (B) having an ethylenically unsaturated group, a photoinitiator (C), a solvent (D), and a pigment (E).
  • the photosensitive resin composition may further include a dye (F) and an additive (G).
  • acrylic acid and/or methacrylic acid is represented by (meth)acrylic acid
  • acrylate and/or methacrylate is represented by (meth) acrylate
  • (meth) The acryloyl group means an acryloyl group and/or a methacryloyl group.
  • the alkali-soluble resin (A) includes an alkali-soluble resin (A-1) and an alkali-soluble resin (A-2).
  • Alkali soluble resin (A-1) Alkali soluble resin (A-1)
  • W 1 , W 2 , W 3 and W 4 are each the same or different and independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 5 carbon atoms, and a carbon number of 1 to 5.
  • the alkoxy group is an aryl group having 6 to 12 carbon atoms or an aralkyl group having 6 to 12 carbon atoms.
  • the epoxy compound (a-1-1) having at least two epoxy groups of the above formula (aI-1) may include a reaction of bisphenol fluorene with epihalohydrin.
  • bisphenol quinoid type compound examples include 9,9-bis(4-hydroxyphenyl)fluorene, 9,9-bis(4-hydroxyl group).
  • -3-methylphenyl)fluorene [9,9-bis(4-hydroxy-3-methylphenyl)fluorene], 9,9-bis(4-hydroxy-3-chlorophenyl)indole [9,9-bis(4-hydroxy-3-chlorophenyl)fluorene], 9,9-bis(4-hydroxy-3-bromophenyl)fluorene [9,9-bis(4-hydroxy-3-bromophenyl) Fluorene], 9,9-bis(4-hydroxy-3-fluorophenyl)fluorene, 9,9-bis(4-hydroxy-3- 9,9-bis(4-hydroxy-3-methoxyphenyl)fluorene, 9,9-bis(4-hydroxy-3,5-dimethylphenyl)anthracene [9,9 -bis(4-hydroxy-3,
  • epihalohydrin may include, but is not limited to, 3-chloro-1,2-epoxyhydrin or 3-bromo-1,2-propylene oxide (epibromohydrin).
  • the epoxy group-containing bisphenol quinoid compound obtained by reacting the bisphenol quinoid compound with the halogenated propylene oxide includes, but is not limited to: (1) a product manufactured by Nippon Steel Chemical Co., Ltd. : for example, ESF-300, etc.; (2) goods manufactured by Osaka Gas Co., Ltd.: for example, PG-100, EG-210, etc.; (3) manufactured by SMS Technology Co., Ltd. Goods such as SMS-F9PhPG, SMS-F9CrG, SMS-F914PG, etc.
  • W 5 to W 18 are each the same or different and independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 8 carbon atoms or an aromatic group having 6 to 15 carbon atoms, and s represents An integer from 0 to 10.
  • the epoxy compound (a-1-1) having at least two epoxy groups of the above formula (aI-2) is, for example, in the presence of an acid catalyst, and has a structure having the following formula (aI-2-2). After the compound is subjected to a condensation reaction with a phenol, a compound having the structure of the formula (aI-2-1) is formed. Next, a dehydrohalogenation reaction is carried out by adding an excess of halogenated propylene oxide to obtain an epoxy compound (a-1-1) having at least two epoxy groups as shown in the formula (aI-2):
  • W 19 and W 20 are the same or different hydrogen atom, a halogen atom, an alkyl group having 1 to 8 carbon atoms or an aromatic group having 6 to 15 carbon atoms; 1 and M 2 are each the same or different halogen atom, an alkyl group having 1 to 6 carbon atoms or an alkoxy group having 1 to 6 carbon atoms.
  • the above halogen atom may be, for example, chlorine or bromine
  • the above alkyl group may be, for example, a methyl group, an ethyl group or a third butyl group
  • the above alkoxy group may be, for example, a methoxy group or an ethoxy group.
  • phenols include phenol, cresol, ethylphenol, n-propylphenol, isobutylphenol, and t-butyl phenol.
  • t-butylphenol octylphenol, nonylphenol, xylenol, methylbutylphenol, di-t-butylphenol, vinylphenol (vinylphenol), propenylphenol, ethinylphenol, cyclopentylphenol, cyclohexylphenol or cyclohexylcresol.
  • the above phenols can be generally used singly or in combination of two or more.
  • the amount of the acid catalyst used is not particularly limited, but based on the above formula (aI-2-2)
  • the compound of the structure is used in an amount of 100% by weight (wt%), and the acid catalyst is preferably used in an amount of from 0.1% by weight to 30% by weight.
  • the above condensation reaction can be carried out in the absence of a solvent or in the presence of an organic solvent.
  • organic solvent include toluene, xylene, and methyl isobutyl ketone.
  • the above organic solvents may be used singly or in combination of two or more.
  • the total amount of the compound and the phenol used based on the structure of the formula (aI-2-2) is 100% by weight, and the above organic solvent is used in an amount of 50% by weight to 300% by weight, preferably 100% by weight to 250% by weight. Further, the above condensation reaction has an operation temperature of 40 ° C to 180 ° C, and the operation time of the condensation reaction is 1 hour to 8 hours.
  • a neutralization treatment or a water washing treatment may be carried out.
  • the above neutralization treatment is to adjust the pH of the solution after the reaction to pH 3 to pH 7, preferably pH 5 to pH 7.
  • the water washing treatment may be carried out using a neutralizing agent, and the neutralizing agent is an alkaline substance, and specific examples thereof include alkali metal hydroxides such as sodium hydroxide and potassium hydroxide; and hydrogen; Alkaline earth metal hydroxides such as calcium hydroxide and magnesium hydroxide; diethylene triamine, triethylenetetramine, aniline, phenylenediamine (diethyltetramine) Organic amines such as phenylene diamine; and ammonia, sodium dihydrogen phosphate, and the like.
  • halogenated propylene oxide examples include 3-chloro-1,2-epoxypropane and 3-bromo-1,2-epoxypropane (3). -bromo-1, 2-epoxypropane) or any combination of the above.
  • An alkali metal hydroxide such as sodium hydroxide or potassium hydroxide may be added in advance or added during the reaction before the above dehydrohalogenation reaction.
  • the above dehydrohalogenation reaction has an operating temperature of from 20 ° C to 120 ° C and an operation time ranging from 1 hour to 10 hours.
  • an aqueous solution of the alkali metal hydroxide added to the dehydrohalogenation reaction may be used.
  • water and halogenated propylene oxide can be continuously distilled off under reduced pressure or normal pressure, thereby separating and removing water.
  • the halogenated propylene oxide can be continuously refluxed into the reaction system.
  • Tetramethyl ammonium may also be added before the above dehydrohalogenation reaction is carried out.
  • a quaternary ammonium salt such as chloride
  • tetramethyl ammonium bromide or trimethyl benzyl ammonium chloride as a catalyst, and reacted at 50 ° C to 150 ° C for 1 hour.
  • an alkali metal hydroxide or an aqueous solution thereof is further added, and the reaction is carried out at a temperature of from 20 ° C to 120 ° C for 1 hour to 10 hours to carry out a dehydrohalogenation reaction.
  • the halogenated propylene oxide may be used in an amount of from 1 equivalent to 20 equivalents, preferably from 2 equivalents to 10 equivalents, based on 1 equivalent of the total hydroxyl group in the compound having the structure of the formula (aI-2-1).
  • the alkali metal hydroxide added in the above dehydrohalogenation reaction may be used in an amount of from 0.8 equivalents to 15 equivalents, based on 0.9 equivalents, based on the total equivalent of the hydroxyl group in the compound having the structure of the formula (aI-2-1). Equivalent to 11 equivalents is preferred.
  • the total amount of the halogenated propylene oxide is 100% by weight, and the aprotic polar solvent may be used in an amount of 5 wt% to 100 wt%, wherein 10 wt% to 90 wt% % is better.
  • the dehydrohalogenated reaction solution may be added to a solvent such as toluene or methyl isobutyl ketone, and a base such as sodium hydroxide or potassium hydroxide may be added.
  • a base such as sodium hydroxide or potassium hydroxide may be added.
  • the metal hydroxide aqueous solution is again subjected to a dehydrohalogenation reaction.
  • the total equivalent weight of the hydroxyl group in the compound having the structure of the above formula (C-II-1) is 1 equivalent
  • the alkali metal hydroxide is used in an amount of 0.01 mol to 0.3 mol, wherein 0.05 mol is used. It is preferably 0.2 mole.
  • the above dehydrohalogenation reaction has an operating temperature in the range of 50 ° C to 120 ° C and an operation time ranging from 0.5 hour to 2 hours.
  • the tetracarboxylic acid or its acid dianhydride includes a tetracarboxylic acid containing a fluorine atom or an acid dianhydride thereof, and a tetracarboxylic acid other than the fluorine atom-containing tetracarboxylic acid or its acid dianhydride.
  • the tetracarboxylic acid containing a fluorine atom or an acid dianhydride thereof is selected from the group consisting of a fluorine atom represented by the formula (K-1) A group consisting of a carboxylic acid compound and a tetracarboxylic dianhydride compound containing a fluorine atom represented by the formula (K-2).
  • the fluorine atom-containing tetracarboxylic acid compound represented by the formula (K-1) and the fluorine atom-containing tetracarboxylic dianhydride compound represented by the formula (K-2) are as follows.
  • L 2 is a tetravalent aromatic group having fluorine, and preferably has a benzene ring. Specifically, it is preferably one selected from the group consisting of the formula (L-1) to the formula (L-6).
  • E each independently represents a fluorine atom or a trifluoromethyl group, and * represents a position bonded to a carbon atom.
  • tetracarboxylic acid or acid dianhydride containing a fluorine atom examples include 4,4'-hexafluoroisopropylidene diphthalic acid, 1,4-difluorobenzenetetracarboxylic acid, and 1- a fluorine-containing aromatic tetracarboxylic acid such as monofluorobenzenetetracarboxylic acid or 1,4-bis(trifluoromethyl)benzenetetracarboxylic acid, or a dianhydride compound of the above tetracarboxylic acid, or the above-mentioned Combination of compounds.
  • tetracarboxylic acid or the acid dianhydride containing a fluorine atom further include 3,3'-hexafluoroisopropylidene diphthalic acid, 5,5'-[2,2,2-trifluoro-1 -[3-(Trifluoromethyl)phenyl]ethylidene]diphthalic acid, 5,5'-[2,2,3,3,3-pentafluoro-1-(trifluoromethyl) Propylene]diphthalic acid, 5,5'-oxybis[4,6,7-trifluoro-pyromellitic acid], 3,6-bis(trifluoromethyl)benzenetetracarboxylic acid, a fluorine-containing tetracarboxylic acid such as 4-(trifluoromethyl)benzenetetracarboxylic acid or 1,4-bis(3,4-dicarboxylic acid trifluorophenoxy)tetrafluorobenzene, or a second of the above tetracar
  • the other tetracarboxylic acid or acid dianhydride thereof includes a saturated linear hydrocarbon tetracarboxylic acid, an alicyclic tetracarboxylic acid, an aromatic tetracarboxylic acid, or a dianhydride compound of the above tetracarboxylic acid, or a combination thereof.
  • saturated linear hydrocarbon tetracarboxylic acid examples include butane tetracarboxylic acid, pentanetetracarboxylic acid, hexanetetracarboxylic acid, or a combination of the above compounds.
  • the saturated linear hydrocarbon tetracarboxylic acid may also have a substituent.
  • alicyclic tetracarboxylic acid examples include cyclobutanetetracarboxylic acid, cyclopentanetetracarboxylic acid, cyclohexanetetracarboxylic acid, norbornanetetracarboxylic acid, or a combination of the above compounds.
  • the alicyclic tetracarboxylic acid may also have a substituent.
  • aromatic tetracarboxylic acid examples include pyromellitic acid, benzophenonetetracarboxylic acid, biphenyltetracarboxylic acid, diphenyl ether tetracarboxylic acid, diphenylsulfone tetracarboxylic acid, 1,2,3,6 - tetrahydrophthalic acid, or a combination of the above compounds.
  • the aromatic tetracarboxylic acid may also have a substituent.
  • the dicarboxylic acid or its anhydride (a-1-4) includes a dicarboxylic acid containing a fluorine atom or an anhydride thereof, a dicarboxylic acid other than the fluorine atom-containing dicarboxylic acid or an anhydride thereof, or an anhydride thereof or the above A combination of two.
  • the dicarboxylic acid containing a fluorine atom or an anhydride thereof is selected from the group consisting of a fluorine atom-containing dicarboxylic acid compound represented by the formula (M-1) and a fluorine atom-containing dicarboxylic anhydride compound represented by the formula (M-2). .
  • the fluorine atom-containing dicarboxylic acid compound represented by the formula (M-1) and the fluorine atom-containing dicarboxylic acid anhydride compound represented by the formula (M-2) are as follows.
  • G 1 represents an organic group of a fluorine atom having 1 to 100 carbon atoms.
  • dicarboxylic acid containing a fluorine atom or an anhydride thereof examples include 3-fluorophthalic acid and 4-fluoro-o-benzene.
  • saturated linear hydrocarbon dicarboxylic acid examples include succinic acid, acetyl succinic acid, adipic acid, sebacic acid, citramalic acid, malonic acid, glutaric acid, citric acid, tartaric acid, oxopentane Acid, pimelic acid, sebacic acid, suberic acid, diglycolic acid, or a combination of the above compounds. Hydrocarbyl groups in saturated linear hydrocarbon dicarboxylic acids can also be substituted.
  • unsaturated dicarboxylic acid examples include maleic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, methyl bridgedmethylenetetrahydrophthalic acid, chlorinic acid, and trimellitic acid. , or a combination of the above compounds.
  • dicarboxylic acids or anhydrides thereof include trimethoxysilylpropyl succinic anhydride, triethoxysilyl propyl succinic anhydride, methyldimethoxysilyl propyl succinic anhydride, and methyl group.
  • a dicarboxylic acid anhydride such as phenyl succinic anhydride or a dicarboxylic acid compound of the above dicarboxylic anhydr
  • the method for synthesizing the alkali-soluble resin (A-1) is not particularly limited as long as the epoxy compound (a-1-1) having at least two epoxy groups, at least one carboxylic acid group, and at least one ethylenic unsaturated group are used.
  • the compound (a-1-2), the tetracarboxylic acid or its acid dianhydride (a-1-3), and the dicarboxylic anhydride or its anhydride (a-1-4) are obtained by reaction.
  • the alkali-soluble resin (A-1) is used in an amount of 5 to 95 parts by weight, preferably 10 parts by weight to 90 parts by weight, based on 100 parts by weight of the alkali-soluble resin (A), and more preferably 15 parts by weight. Parts by weight to 85 parts by weight.
  • the photosensitive resin composition has a problem that the outgassing performance is poor.
  • the alkali-soluble resin (A-2) is composed of an unsaturated carboxylic acid or an unsaturated carboxylic anhydride compound (a-2-1), an alicyclic hydrocarbon group-containing unsaturated compound (a-2-2), and other unsaturated groups.
  • the compound (a-2-3) is obtained by copolymerization.
  • the solvent used to prepare the alkali-soluble resin (A-2) may include, but is not limited to, ethylene glycol methyl ether, ethylene glycol diethyl ether, diethylene glycol methyl ether, diethylene glycol ethyl ether, diethylene glycol n-propyl ether, diethylene glycol Butyl ether, triethylene glycol methyl ether, triethylene glycol ethyl ether, propylene glycol methyl ether, propylene glycol ethyl ether, dipropylene glycol methyl ether, dipropylene glycol diethyl ether, dipropylene glycol n-propyl ether, dipropylene glycol n-butyl ether, a (poly)alkylene glycol monoalkyl ether solvent such as tripropylene glycol mono methyl ether or tripropylene glycol mono ethyl ether; ethylene glycol methyl ether acetate; a (poly)alky
  • the solvent used to prepare the alkali-soluble resin (A-2) is selected from the group consisting of propylene glycol methyl ether acetate Ester, ethyl 3-ethoxypropionate or cyclohexanone.
  • the initiator for preparing the alkali-soluble resin (A-2) is generally a radical polymerization initiator, and the initiator may include, but is not limited to, 2,2'-azobisisobutyronitrile (2, 2'-azobisisobutyronitrile, 2,2'-azobis(2,4-dimethylvaleronitrile), 2,2'-azobis (2-methoxy-2,4-dimethylvaleronitrile), 2,2'-azobis-2-methyl An azo compound such as 2,2'-azobis-2-methyl butyronitrile; a peroxy compound such as benzoylperoxide.
  • the unsaturated carboxylic acid or unsaturated carboxylic anhydride compound (a-2-1) based on the alkali-soluble resin (A-2), the alicyclic hydrocarbon group-containing unsaturated compound (a-2- 2) and the total amount of the other unsaturated compound (a-2-3) is 100 parts by weight, and the unsaturated carboxylic acid or unsaturated carboxylic anhydride compound (a-2-1) is used in an amount of 20 parts by weight.
  • the portion is 40 parts by weight; preferably 23 parts by weight to 38 parts by weight; more preferably 25 parts by weight to 35 parts by weight.
  • the unsaturated compound having a bicyclopentyl group has a structure represented by the following formula (aII-1):
  • U 1 represents a hydrogen atom or a methyl group
  • the dicyclopentenyl-containing unsaturated compound has a structure represented by the following formula (aII-2):
  • U 2 represents a hydrogen atom or a methyl group
  • the alicyclic hydrocarbon group-containing unsaturated compound (a-2-2) is selected from the group consisting of dicyclopentanyl (meth)acrylate and biscyclopentenyl (meth)acrylate. a group consisting of dicyclopentyloxyethyl (meth)acrylate, dicyclopentenyloxyethyl (meth)acrylate, and mixtures thereof.
  • the unsaturated carboxylic acid or unsaturated carboxylic anhydride compound (a-2-1) based on the alkali-soluble resin (A-2), the alicyclic hydrocarbon group-containing unsaturated compound (a-2- 2) and the total amount of the other unsaturated compound (a-2-3) is 100 parts by weight, and the alicyclic hydrocarbon group-containing unsaturated compound (a-2-2) is used in an amount of 10 parts.
  • the alkali-soluble resin (A-2) may include other unsaturated compounds (a-2-3).
  • the other unsaturated compound (a-2-3) are styrene, ⁇ -methylstyrene, vinyltoluene, p-chlorostyrene, divinylbenzene, benzyl methacrylate, benzyl.
  • the third unsaturated single system is styrene, ⁇ -methylstyrene, phenyl methacrylate, phenyl acrylate, N-phenylmaleimide (PMI), N-ortho -hydroxyphenylmaleimide, N-m-hydroxyphenylmaleimide, N-p-hydroxyphenylmaleimide, glycidyl methacrylate, methyl methacrylate Monomer, methyl acrylate monomer, 2-methylglycidyl methacrylate (MGMA), benzyl methacrylate (BzMA) or a mixture thereof.
  • PMI N-phenylmaleimide
  • PMI N-ortho -hydroxyphenylmaleimide
  • N-m-hydroxyphenylmaleimide N-p-hydroxyphenylmaleimide
  • glycidyl methacrylate methyl methacrylate Monomer, methyl acrylate monomer, 2-methylglycidyl methacrylate (MGMA),
  • the unsaturated carboxylic acid or unsaturated carboxylic anhydride compound (a-2-1) based on the alkali-soluble resin (A-2), the alicyclic hydrocarbon group-containing unsaturated compound (a-2- 2) and the total amount of the other unsaturated compound (a-2-3) is 100 parts by weight, and the other unsaturated compound (a-2-3) is used in an amount ranging from 10 parts by weight to 70 parts by weight; It is preferably from 17 parts by weight to 62 parts by weight; more preferably from 25 parts by weight to 55 parts by weight.
  • the polystyrene-equivalent weight average molecular weight of the above alkali-soluble resin (A-2) measured by Gel Permeation Chromatography (GPC) is generally from 3,000 to 30,000, preferably from 5,000 to 25,000, more preferably 7000 to 20,000.
  • the alkali-soluble resin (A-2) is used in an amount of 5 to 95 parts by weight, preferably 10 parts by weight to 90 parts by weight, based on 100 parts by weight of the alkali-soluble resin (A), and more preferably 15 parts by weight. Parts by weight to 85 parts by weight.
  • the photosensitive resin composition has a problem that the high-definition pattern has poor linearity.
  • the photosensitive resin composition has a problem that the pattern linearity of high-definition is poor.
  • the weight ratio range (A-1) / (A-2) of the amount of the alkali-soluble resin (A-1) to the alkali-soluble resin (A-2) is 5/95 to 95/5.
  • the photosensitive resin composition has a problem that the outgassing performance is poor and the high definition pattern linearity is poor.
  • the ethylenically unsaturated group-containing compound (B) includes the first compound (B-1) and the second compound (B-2).
  • the first compound (B-1) may have a urethane group and at least 7 acryloyl groups.
  • the first compound (B-1) may have a urethane group and at least 10 acryl groups.
  • the preparation method of the first compound (B-1) is, for example but not limited to, a condensation reaction of a polyisocyanate compound and a polyol compound, wherein at least one of the polyisocyanate compound and the polyol compound has an acryloyl group, and the polyisocyanate
  • the total number of acryloyl groups contained in the compound and the polyol compound is preferably at least 7, and more preferably at least 10.
  • the resulting photosensitive resin composition has better pattern smoothness.
  • the first compound (B-1) may be commercially available products, for example, those manufactured by Nippon Synthetic Chemical Co., Ltd., and may be of a type of UV1700B (weight average molecular weight of 2000 and having 10 acryloyl groups) ), UV6300B (having 7 acryloyl groups) or UV7640B (having 7 acryloyl groups), etc.; a product manufactured by Nippon Kayaku Co., Ltd., and its model number is DPHA40H (weight average molecular weight is 7000 and it has 10 acryloyl groups) Or UX5001T (with 8 acryloyl groups), etc.; a product manufactured by Gensei Industrial Co., Ltd., and its model can be UN3320HS (weight average molecular weight is 5000 and it has 15 acryloyl groups), UN904 (weight average molecular weight is 4900 and It has 10 acryloyl groups, UN3320HC (weight average molecular weight 1500 and 10 acryloyl
  • the first compound (B-1) can be used singly or in combination of plural kinds.
  • the aforementioned first compound (B-1) may be any combination of UV6300B, UX5001T, DPHA40H, UN3320HS, U15HA or the above-mentioned commercially available products.
  • the first compound (B-1) may be used in an amount of 5 parts by weight to 100 parts by weight, preferably 10 parts by weight to 95 parts by weight, based on 100 parts by weight of the total amount of the alkali-soluble resin (A). More preferably, it may be 15 parts by weight to 90 parts by weight.
  • the resulting photosensitive resin composition preferably has a pattern smoothness.
  • the second compound (B-2) may include diol diacrylate, ethylene glycol dimethacrylate, 1,4-butanediol diacrylate, and 1,4-butanediol dimethacrylate. Ester, 1,6-hexanediol diacrylate, 1,6-hexanediol dimethacrylate, 1,9-nonanediol diacrylate, 1,9-nonanediol dimethacrylate, Dicyclopentenyl (meth)acrylate, triethylene glycol di(meth)acrylate, tetraethylene glycol di(meth)acrylate, tris(2-hydroxyethyl)isocyanate di(a) Acrylate, tris(2-hydroxyethyl)isocyanate tri(meth)acrylate, caprolactone modified tris(2-hydroxyethyl)isocyanate tri(meth)acrylate, three Trimethylolpropyl (meth)acrylate, trimethyl
  • the second compound (B-2) may be caprolactone-modified dipentaerythritol hexa(meth) acrylate, ethylene oxide (EO)-modified tris(meth)acrylic acid III. Hydroxymethyl propyl ester, dipentaerythritol hexa (meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol tetra (meth) acrylate or any combination of the above.
  • EO ethylene oxide
  • the second compound (B-2) may be used in an amount of 15 parts by weight to 100 parts by weight, preferably 20 parts by weight to 95 parts by weight, based on 100 parts by weight of the total amount of the alkali-soluble resin (A). More preferably, it may be 25 parts by weight to 90 parts by weight.
  • the compound (B) having an ethylenically unsaturated group may be used in an amount of 20 parts by weight to 200 parts by weight, preferably 30 parts by weight.
  • the portion is 190 parts by weight, and more preferably 40 parts by weight to 180 parts by weight.
  • the photoinitiator (C) includes a photoinitiator (C-1) and other photoinitiators (C-2).
  • the photoinitiator (C) includes a photoinitiator (C-1) represented by the formula (1).
  • R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 and R 8 are each independently hydrogen, C 1 -C 20 alkyl, COR 16 , OR 17 , halogen, NO 2 ,
  • the group represented by the formula (2) is a group represented by the formula (3),
  • R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 are each independently a group represented by the formula (4). Substituted C 2 -C 10 alkenyl,
  • R 18 represents hydrogen, C 2 -C 12 alkenyl, C 3 -C 20 cycloalkyl or phenyl-C 1 -C 3 alkyl, wherein the C 2 -C 12 alkenyl, C 3 -C 20 naphthenic Or a phenyl-C 1 -C 3 alkyl group which has no or hetero or one or more O, S, CO, NR 26 or COOR 17 ; or R 18 is a C 1 -C 20 alkyl group which is not Substituted or substituted with one or more of the following groups: OH, SH, CN, C 3 -C 6 alkenyloxy, OCH 2 CH 2 CN, OCH 2 CH 2 (CO)O (C 1 -C 4 alkyl) , O(CO)-(C 2 -C 4 )alkenyl, O(CO)-(C 1 -C 4 alkyl), O(CO)-phenyl or (CO)OR 17 ;
  • R 21 and R 22 are each independently hydrogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, C 3 -C 10 cycloalkyl or phenyl;
  • R 25 represents COOR 17 , CONR 19 R 20 , (CO)R 17 ; or R 25 has one of the meanings given for R 17 ;
  • R 26 represents hydrogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, C 2 -C 20 alkyl with one or more O or CO in between; or phenyl-C 1 -C 4 alkane a C 3 -C 8 cycloalkyl group which is undoped or heterozygous with one or more O or CO; or (CO)R 19 ; or a phenyl group which is unsubstituted or one or more Substituted by: C 1 -C 20 alkyl, halogen, C 1 -C 4 haloalkyl, OR 17 , SR 18 , NR 19 R 20 or a group represented by formula (7);
  • the compound of formula (1) is characterized in that it comprises one or more annelated unsaturated rings on the carbazole moiety.
  • at least one of R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 is represented by the formula (5).
  • C 1 -C 20 alkyl is straight or branched and is, for example, C 1 -C 18 -, C 1 -C 4 -, C 1 -C 12 -, C 1 -C 8 -, C 1 -C 8- or C 1 -C 4 alkyl or C 4 -C 12 - or C 4 -C 8 alkyl.
  • the two O atoms are separated by at least one methylene group, preferably at least two methylene groups (i.e., exoethyl groups).
  • the alkyl groups are straight or branched.
  • the C 3 -C 20 cycloalkyl group interspersed with O, S, CO, NR 26 has the meaning given above wherein at least one CH 2 - group in the alkyl group is replaced by O, S, CO or NR 26 .
  • An example is something like
  • a C 1 -C 8 alkyl-C 3 -C 10 cycloalkyl group interspersed with one or more O is an O-interstitial C 3 - as defined above substituted with one or more alkyl groups having up to 8 carbon atoms C 10 cycloalkyl.
  • An example is:
  • C 1 -C 12 alkoxy is O-substituted by a C 1 -C 12 alkyl.
  • the C 1 -C 12 alkyl group has the same meaning as given above for the C 1 -C 20 alkyl group and has the highest corresponding number of C atoms.
  • C 1 -C 4 alkoxy is straight or branched, such as methoxy, ethoxy, propoxy, isopropoxy, n-butoxy, second butoxy, isobutoxy or Tributoxy.
  • the C 1 -C 8 alkoxy group and the C 1 -C 4 -alkoxy group have the same meanings as described above and have the highest corresponding number of C atoms.
  • C 1 -C 12 alkylthio is S atom substituted by a C 1 -C 12 alkyl.
  • the C 1 -C 20 alkyl group has the same meaning as given above for the C 1 -C 20 alkyl group and has the highest corresponding number of C atoms.
  • C 1 -C 4 alkylthio is straight-chain or branched, such as methylthio, ethylthio, propylthio, isopropylthio, n-butylthio, second butylthio , isobutylthio group, tert-butylthio group.
  • Phenyl-C 1 -C 3 alkyl is, for example, benzyl, phenylethyl, ⁇ -methylbenzyl or ⁇ , ⁇ -dimethyl-benzyl, especially benzyl.
  • C 2 -C 12 alkenyl is mono- or polyunsaturated and is, for example, C 2 -C 10 -, C 2 -C 8 -, C 2 -C 5 -alkenyl, such as vinyl, allyl, Methyl allyl, 1,1-dimethylallyl, 1-butenyl, 3-butenyl, 2-butenyl, 1,3-pentadienyl, 5-hexenyl, 7-Octyl or dodecenyl, especially allyl.
  • the C 2 -C 5 alkenyl group has the same meaning as given above for the C 2 -C 12 alkenyl group and has the highest corresponding number of C atoms.
  • a C 2 -C 12 alkenyl group having one or more O, CO or NR 26 interspersed with O, S, NR 26 or CO, for example 1 to 9 times, 1 to 5 times, 1 to 3 times or 1 time or 2 times. If more than one meta-group is present, it is the same species or different.
  • the two O atoms are separated by at least one methylene group, preferably at least two methylene groups (i.e., exoethyl groups).
  • the C 4 -C 8 cycloalkenyl group has one or more double bonds and is, for example, a C 4 -C 6 -cycloalkenyl group or a C 6 -C 8 -cycloalkenyl group.
  • Examples are cyclobutenyl, cyclopentenyl, cyclohexenyl or cyclooctenyl, especially cyclopentenyl and cyclohexenyl, preferably cyclohexenyl.
  • the C 3 -C 6 alkenyloxy group is mono- or polyunsaturated and has one of the meanings given above for an alkenyl group, and the attached oxy group has the highest corresponding number of C atoms. Examples are allyloxy, methylallyloxy, butenyloxy, pentenyloxy, 1,3-pentadienyloxy, 5-hexenyloxy.
  • the C 2 -C 20 alkanoyl group is straight or branched and is, for example, C 2 -C 18 -, C 2 -C 14 -, C 2 -C 12 -, C 2 -C 8 -, C 2 -C 6- or C 2 -C 4 alkanoyl or C 4 -C 12 - or C 4 -C 8 alkanoyl.
  • Examples are acetyl, propionyl, butyryl, isobutyryl, valeryl, hexanoyl, heptanoyl, octanoyl, decanoyl, decanoyl, dodecanoyl, tetradecanoyl, pentadecanoyl, hexadecanoyl, ten
  • the octayl group, the icosyl group is preferably an acetyl group.
  • the C 1 -C 8 alkanoyl group has the same meaning as given above for the C 2 -C 20 alkanoyl group and has the highest corresponding number of C atoms.
  • C 2 -C 12 alkoxycarbonyl is straight-chain or branched and is, for example, methoxycarbonyl, ethoxycarbonyl, propoxycarbonyl, n-butoxycarbonyl, isobutoxycarbonyl, 1,1 - dimethylpropoxycarbonyl, pentyloxycarbonyl, hexyloxycarbonyl, heptyloxycarbonyl, octyloxycarbonyl, decyloxycarbonyl, decyloxycarbonyl or dodecyloxycarbonyl, especially methoxy A carbonyl group, an ethoxycarbonyl group, a propoxycarbonyl group, a n-butoxycarbonyl group or an isobutoxycarbonyl group is preferably a methoxycarbonyl group.
  • the C 2 -C 12 alkoxycarbonyl group having one or more O interstitials is linear or branched.
  • the two O atoms are separated by at least two methylene groups (ie, an extended ethyl group).
  • the meta-heteroalkoxycarbonyl group is unsubstituted or substituted with one or more hydroxyl groups.
  • the C 5 -C 20 heteroaryloxycarbonyl group is a C 5 -C 20 heteroaryl-O-CO- group.
  • the C 3 -C 10 cycloalkoxycarbonyl group is C 3 -C 10 cycloalkyl-O-(CO)-, wherein the cycloalkyl group has one of the meanings indicated above and has the highest corresponding number of C atoms.
  • the C 3 -C 10 cycloalkoxycarbonyl group having one or more O, S, CO, NR 26 inter-heterocycloalkyl-O-(CO)-, wherein the inter-heterocycloalkyl group is as described above Defined.
  • the C 1 -C 20 alkylphenyl group means a phenyl group substituted by one or more alkyl groups, wherein the sum of the C atoms is at most 20.
  • C 6 -C 20 aryl is, for example, phenyl, naphthyl, anthracenyl, phenanthryl, anthracenyl, fluorenyl, tetracylphenyl, bistriphenyl, etc., especially phenyl or naphthyl, Good is phenyl.
  • the naphthyl group is 1-naphthyl or 2-naphthyl.
  • C 3 -C 20 heteroaryl is intended to include monocyclic or polycyclic systems, such as fused ring systems.
  • Examples are thienyl, benzo[b]thienyl, naphtho[2,3-b]thienyl, thioxyl, furyl, dibenzofuranyl, xanthenyl, thioxanthyl, phenothiphenyl , pyrrolyl, imidazolyl, pyrazolyl, pyrazinyl, pyrimidinyl, pyridazinyl, mesoindolyl, isodecyl, decyl, oxazolyl, fluorenyl, quinazolyl, isoquinoline , quinolyl, pyridazinyl, naphthyridinyl, quinoxalinyl, quinazolinyl, porphyrinyl, acridinyl, oxazoly
  • a C 4 -C 20 heteroarylcarbonyl group is a C 3 -C 20 heteroaryl group as defined above attached to the remainder of the molecule via a CO group.
  • Substituted aryl is 1 to 7 times, 1 to 6 times or 1 to 4 times, especially 1 time, respectively , 2 or 3 substitutions. It will be apparent that the defined aryl group cannot have more substituents than the free position at the aryl ring.
  • the substituent on the phenyl ring is preferably in position 4 on the phenyl ring or in the 3,4-, 3,4,5-, 2,6-, 2,4- or 2,4,6-configuration .
  • Intermixed with one or more interstitial hetero groups for example) 1 to 19 times, 1 to 15 times, 1 to 12 times, 1 to 9 times, 1 to 7 times, 1 to 5 times, 1 to 4 times, 1 to 3 times or 1 or 2 times (obviously, the number of heteroatoms depends on the number of C atoms to be inter-hetero).
  • the substituted group substituted by one or more times has, for example, 1 to 7, 1 to 5, 1 to 4, 1 to 3 or 1 or 2 identical or different substituents.
  • a group substituted with one or more substituents as defined is intended to have one substituent or a plurality of substituents as defined or differently given.
  • Halogen is fluorine, chlorine, bromine and iodine, especially fluorine, chlorine and bromine, preferably fluorine and chlorine.
  • the compound of formula (1) is characterized in that at least one phenyl ring is partially fused to the carbazole to form a "naphthyl" ring. That is, one of the above structures is given by the formula (1).
  • R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 are each independently taken to be -(CH 2 ) P -Y- (CH 2 ) q -, forming, for example, such as:
  • R 17 forms a bond to have a group thereon
  • R 16 represents a phenyl group substituted by SR 18 , wherein the group R 19 represents a direct bond bonded to a phenyl or naphthyl ring to which a carbazole moiety of a COR 16 group is attached, for example, such as
  • R 21 and R 22 together with the N atom to which they are attached form a 5- or 6-membered saturated or unsaturated ring optionally mixed with O, S or NR 26 , and the benzene ring is optionally fused to the saturated or unsaturated ring.
  • a saturated or unsaturated ring such as aziridine, pyrrole, thiazole, pyrrolidine, oxazole, pyridine, 1,3-diazine, 1,2-diazine, hexahydropyridine or morpholine or corresponding ring
  • R 19 and R 20 together with the N atom to which they are attached form a heteroaromatic ring system the ring system is intended to contain more than one ring (eg 2 or 3 rings) and one or one from the same species or different species.
  • heteroatoms are, for example, N, S, O or P, especially N, S or O.
  • Examples are carbazole, anthracene, isoindole, carbazole, anthracene, isoquinoline, quinoline, porphyrin, phenothiazine and the like.
  • the term "at least" is intended to define one or more than one, for example one or two or three, preferably one or two.
  • interstitial means that the group to which it is referred is not miscellaneous or interstitial.
  • the oxime ester of formula (1) is prepared by the methods described in the literature, for example by reacting the corresponding hydrazine with an acid halide, especially a chloride or an acid anhydride, in an inert solvent (for example, tert-butyl methyl ether, tetrahydrofuran (THF) Or dimethylformamide) in the presence of a base such as triethylamine or pyridine or in a basic solvent such as pyridine.
  • an inert solvent for example, tert-butyl methyl ether, tetrahydrofuran (THF) Or dimethylformamide
  • THF tetrahydrofuran
  • dimethylformamide dimethylformamide
  • R 1 , R 2 , R 5 , R 6 , R 8 , R 13 , R 14 and R 15 are as defined above, and Hal means a halogen atom, especially Cl.
  • R 14 is preferably a methyl group.
  • Such reactions are well known to those skilled in the art and are typically carried out at a temperature of from -15 ° C to +50 ° C, preferably from 0 to 25 ° C.
  • the corresponding hydrazine is nitrosated by using an alkyl nitrite such as methyl nitrite, ethyl nitrite, propyl nitrite, butyl nitrite or isoamyl nitrite.
  • an alkyl nitrite such as methyl nitrite, ethyl nitrite, propyl nitrite, butyl nitrite or isoamyl nitrite.
  • Hal is halogen, especially C1, and R 14 is as defined above.
  • the desired hydrazine as a starting material can be passed through standard chemistry textbooks (eg J. March, Advanced Organic Chemistry, 4th edition, Wiley Interscience, 1992) or monographs (eg SRSandler & W. Karo, Organic functional group preparations, Vol. 3, Various methods are described in Academic Press).
  • One of the most convenient methods is to, for example, react an aldehyde or a ketone with hydroxylamine or a salt thereof in a polar solvent such as dimethylacetamide (DMA), aqueous DMA, ethanol or an aqueous ethanol solution.
  • a polar solvent such as dimethylacetamide (DMA), aqueous DMA, ethanol or an aqueous ethanol solution.
  • a base such as sodium acetate or pyridine is added to control the pH of the reaction mixture. It is well known that the reaction rate is pH dependent and the base can be added continuously at the beginning or during the reaction. Basic solvents such as pyridine can also be used as the base and/or solvent or cosolvent.
  • the reaction temperature is usually from room temperature to the reflux temperature of the mixture, and is usually from about 20 ° C to 120 ° C.
  • ketone intermediates are prepared, for example, by methods described in the literature (e.g., standard chemistry textbooks, e.g., J. March, Advanced Organic Chemistry, 4th Ed., Wiley Interscience, 1992).
  • the continuous Friedel-Crafts reaction can be effectively used to synthesize intermediates. These reactions are well known to those skilled in the art.
  • hydrazine is the nitrosation of "active" methylene groups with nitrous acid or alkyl nitrite.
  • Basic conditions as described, for example, in Organic Syntheses coll., Volume VI (J. Wiley & Sons, New York, 1988), pages 199 and 840) and acidic conditions (eg, for example, Organic Synthesis coll. V, pages 32 and 373, coll. Volume III, pages 191 and 513, coll. Volume II, pages 202, 204 and 363)
  • a ruthenium used as a starting material in the present invention is prepared.
  • Nitrous acid is generally produced from sodium nitrite.
  • the alkyl nitrite can be, for example, methyl nitrite, ethyl nitrite, propyl nitrite, butyl nitrite or isoamyl nitrite.
  • Another embodiment of the invention is a free (1A) hydrazine compound
  • R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 and R 8 are each independently hydrogen, C 1 -C 20 alkyl, COR 16 , OR 17 , halogen, NO 2 or a group represented by the formula (3),
  • R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 are each independently
  • R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 are each independently taken as —(CH 2 ) p —Y— (CH 2 ) q —;
  • R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 are each independently a group represented by the formula (5) ,
  • R 7 and R 8 are a group represented by the formula (5),
  • R 9, R 10, R 11 and R 12 are independently hydrogen, C 1 -C 20 alkyl, C 1 -C 20 alkyl which is unsubstituted or substituted with one or more of the following groups to one another: halo, Phenyl, CN, OH, SH, C 1 -C 4 -alkoxy, -(CO)OH or -(CO)O-(C 1 -C 4 alkyl);
  • R 9 , R 10 , R 11 and R 12 are, independently of each other, an unsubstituted phenyl group or a phenyl group substituted by one or more of the following groups: C 1 -C 6 alkyl, halogen, CN, OR 17 , SR 18 or NR 19 R 20 ;
  • R 9 , R 10 , R 11 and R 12 are, independently of each other, halogen, CN, OR 17 , SR 18 , SOR 18 , SO 2 R 18 or NR 19 R 20 , wherein the substituents OR 17 , SR 18 or NR 19 R 20 optionally forms a 5- or 6-membered ring via a carbon atom in the naphthyl ring via the groups R 17 , R 18 , R 19 and/or R 20 ;
  • R 9 , R 10 , R 11 and R 12 are independently of each other
  • R 17 represents hydrogen, phenyl-C 1 -C 3 alkyl, C 1 -C 20 alkyl, which is unsubstituted or substituted with one or more of the following groups: halogen, OH, SH, CN, C 3 -C 6 alkenyloxy, OCH 2 CH 2 CN, OCH 2 CH 2 (CO)O(C 1 -C 4 alkyl), O(CO)-(C 1 -C 4 alkyl), O(CO) -(C 2 -C 4 )alkenyl, O(CO)-phenyl, (CO)OH, (CO)O(C 1 -C 4 alkyl), C 3 -C 20 cycloalkyl, SO 2 - (C 1 -C 4 haloalkyl), O(C 1 -C 4 haloalkyl) or a C 3 -C 20 cycloalkyl group having one or more O;
  • R 13 represents a C 2 -C 20 alkyl group, interspersed with one or more O, S, NR 26 or CO;
  • R 15 represents a phenyl group, a naphthyl group, a C 3 -C 20 heteroaryl group, each of which is unsubstituted or substituted with one or more of the following groups: phenyl, halogen, C 1 -C 4 haloalkyl, OR 17 , a SR 18 or C 2 -C 20 alkyl group having one or more O or S hetero; or each substituted with one or more C 1 -C 20 alkyl groups, the C 1 -C 20 alkyl group being unsubstituted or Substituted by one or more of the following groups: halogen, COOR 17 , CONR 19 R 20 , phenyl, C 3 -C 8 cycloalkyl, C 3 -C 20 heteroaryl, C 6 -C 20 aryloxycarbonyl , C 4 -C 20 heteroaryloxycarbonyl, OR 17 , SR 18 , NR 19 R 20 or PO(OC k H 2k
  • R 1 , R 2 , R 5 , R 6 , R 7 and R 8 are each independently hydrogen, COR 16 NO 2 or a group represented by the formula (2) group,
  • R 9 , R 10 , R 11 and R 12 represent hydrogen
  • R 15 represents a C 1 -C 20 alkyl group or a phenyl group which is substituted with one or more OR 17 or C 1 -C 20 alkyl groups;
  • R 16 represents a phenyl group which is substituted with one or more C 1 -C 20 alkyl groups or OR 17 ;
  • R 17 represents an unsubstituted or substituted by one or more halogen C 1 -C 20 alkyl interrupted by one or more O or a C 2 -C 20 alkyl group.
  • a further object of the invention is a compound of formula (1) as defined above, wherein R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 and R 8 are each independently hydrogen,
  • R 2 is a group represented by the formula (2), COR 16 , NO 2 or a group represented by the formula (3),
  • R 10 represents hydrogen, OR 17 or COR 16 ;
  • R 13 represents a C 1 -C 20 alkyl group which is unsubstituted or substituted with one or more of the following groups: halogen, R 17 , OR 17 , SR 18 or PO(OC k H 2k+1 ) 2 ;
  • R 13 represents a phenyl group
  • k represents an integer of 2;
  • R 14 represents a C 1 -C 20 alkyl group or a thienyl group
  • R 15 represents a C 2 -C 20 alkyl group, interspersed with SO 2 ;
  • R 17 represents hydrogen, C 1 -C 8 alkanoyl, C 1 -C 20 alkyl, which is unsubstituted or has one or more of the following groups: halogen, O(CO)-(C 1 -C 4 alkyl Or O(CO)-(C 2 -C 4 )alkenyl or a C 3 -C 20 cycloalkyl group having one or more O;
  • R 17 represents a C 2 -C 20 alkyl group, in which one or more O;
  • R 18 represents C 3 -C 20 cycloalkyl, C 1 -C 20 alkyl, unsubstituted or via one or more OH, O(CO)-(C 2 -C 4 )alkenyl or (CO) Replaced by OR 17 ;
  • R 18 represents a phenyl group which is unsubstituted or substituted with one or more halogens
  • R 19 and R 20 are each independently a C 1 -C 8 alkanoyl group or a C 1 -C 8 alkanoyloxy group;
  • R 19 and R 20 attached thereto together form a N atoms interrupted by O 5-membered or 6-membered saturated ring;
  • condition is that at least one group represented by the formula (2) is present in the molecule.
  • An example of a compound of the invention is a compound of formula (Ia)-(Ig) as defined above.
  • Compounds of formula (Ia), (Ib), (Ic), especially formula (Ia) or (Ic), or formula (Ia), (Ic) or (Id), especially formula (Ia) are of interest.
  • R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 and R 8 are each independently hydrogen, COR 16 , a group represented by formula (2), or R 1 And R 2 , R 2 and R 3 , R 3 and R 4 or R 5 and R 6 , R 6 and R 7 , R 7 and R 8 are each independently a group represented by the formula (5),
  • R 3 and R 4 or R 1 and R 2 together are a group represented by the formula (5),
  • R 3 and R 4 and R 5 and R 6 together are a group represented by the formula (5),
  • R 3 and R 4 are in particular a group represented by the formula (5),
  • R 1 , R 5 , R 6 and R 8 represent hydrogen.
  • R 7 is especially a group represented by hydrogen COR 16 or formula (2),
  • R 7 is a group represented by COR 16 or formula (2), particularly a group represented by formula (2),
  • R 2 is especially a group represented by COR 16 , formula (2) or a group represented by formula (3),
  • R 2 together with R 1 is a group represented by the formula (5).
  • R 2 is especially COR 16 .
  • X is preferably a direct bond.
  • R 9 , R 10 , R 11 and R 12 are, independently of each other, hydrogen, C 1 -C 20 alkyl, unsubstituted phenyl or phenyl substituted with one or more of the following groups: C 1 -C 6 alkyl, halogen, OR 17 or SR 18 ; or R 9 , R 10 , R 11 and R 12 are each independently halogen, OR 17 , SR 18 or NR 19 R 20 wherein the substituent OR 17 SR 18 or NR 19 R 20 optionally via a group R 17, R 18, R 19 and / or R 20 and one carbon atom naphthyl ring form a 5-membered or 6-membered ring; or R 9, R 10, R 11 And R 12 are each independently a group represented by COR 16 or formula (2).
  • R 9 , R 10 , R 11 and R 12 are each independently hydrogen, C 1 -C 20 alkyl, unsubstituted phenyl or phenyl substituted with one or more of the following groups: C 1 -C 6 alkyl, halogen, OR 17 or SR 18 ; or R 9 , R 10 , R 11 and R 12 are, independently of each other, halogen, OR 17 , SR 18 or NR 19 R 20 ; or R 9 , R 10 R 11 and R 12 are each independently a group represented by COR 16 or formula (2).
  • R 9 , R 10 , R 11 and R 12 are, independently of each other, hydrogen, C 1 -C 20 alkyl, unsubstituted phenyl or substituted by one or more C 1 -C 6 alkyl groups.
  • Phenyl group; or R 9 , R 10 , R 11 and R 12 are each independently a group represented by COR 16 or formula (2),
  • R 9 , R 10 , R 11 and R 12 are, independently of each other, hydrogen, C 1 -C 20 alkyl, unsubstituted phenyl or one or more of the following groups a substituted phenyl group: C 1 -C 6 alkyl, halogen, OR 17 or SR 18 ; or R 9 , R 10 , R 11 and R 12 are each independently halogen, OR 17 , SR 18 or NR 19 R 20 Wherein the substituent OR 17 , SR 18 or NR 19 R 20 optionally forms a 5- or 6-membered ring with one carbon atom of the naphthyl ring via the radicals R 17 , R 18 , R 19 and/or R 20 .
  • R 9 , R 10 , R 11 and R 12 are each independently hydrogen, C 1 -C 20 alkyl, unsubstituted phenyl or phenyl substituted with one or more of the following groups C 1 -C 6 alkyl, halogen, OR 17 or SR 18 , or R 9 , R 10 , R 11 and R 12 are each independently halogen, OR 17 , SR 18 , NR 19 R 20 or COR 16 .
  • R 9 , R 10 , R 11 and R 12 are, independently of each other, hydrogen, C 1 -C 20 alkyl, unsubstituted phenyl or phenyl substituted with one or more of the following groups: C 1 -C 6 alkyl, halogen, OR 17 or SR 18 , or R 9 , R 10 , R 11 and R 12 are each independently halogen, OR 17 , COR 16 or NR 19 R 20 .
  • R 9 , R 11 and R 12 represent hydrogen and R 10 represents hydrogen, OR 17 or COR 16 .
  • R 13 represents, for example, a C 1 -C 20 alkyl group which is unsubstituted or substituted with one or more of the following groups: halogen, COOR 17 or CONR 19 R 20 ; or R 13 represents C 2 -C 20 alkyl In between, one or more of O, S, SO, SO2, NR 26 or CO, or a C 2 -C 12 alkenyl group, optionally having one or more O, CO or NR 26 or R 13 representing C 3 -C 10 cycloalkyl, which is optionally interrupted by one or more O, S, CO, NR 26 , or R 13 represents a phenyl or naphthyl group, which is unsubstituted or substituted with one two or more of the following groups Substitution: OR 17 , SR 18 , NR 19 R 20 , COR 16 , NO 2 , halogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, C 2 -C 20 alky
  • a C 1 -C 20 alkyl group which is unsubstituted or substituted with one or more of the following groups: halogen, R 17 , COOR 17 , OR 17 , SR 18 , CONR 19 R 20 or PO (OC k H 2k +1 ) 2 ; or a C 2 -C 20 alkyl group in which one or more O are heterogeneous.
  • R 13 represents, for example, C 1 -C 20 alkyl, which is unsubstituted or substituted with one or more of the following: halo, R 17 , OR 17 , SR 18 or PO (OC k H 2k+1 ) 2 ; or a C 2 -C 20 alkyl group in which one or more O is hetero; or a C 2 -C 12 alkenyl group, a C 3 -C 10 cycloalkyl group, a phenyl group or a naphthyl group; .
  • R 13 represents, for example, a C 1 -C 20 alkyl group, a C 2 -C 12 alkenyl group or a C 3 -C 10 cycloalkyl group.
  • R 13 represents a C 1 -C 20 alkyl group, especially a C 1 -C 8 alkyl group, such as 2-ethylhexyl.
  • R 14 represents C 1 -C 20 alkyl, which is unsubstituted or substituted with phenyl; or R 14 represents phenyl, which is unsubstituted or via one or more C 1 -C 6 Alkyl substitution.
  • R 14 represents C 1 -C 20 alkyl, C 3 -C 5 heteroaryl (such as thienyl), or phenyl, especially C 1 -C 20 alkyl or thienyl, especially C 1- C 8 alkyl.
  • R 15 represents, for example, a C 6 -C 20 aryl group or a C 5 -C 20 heteroaryl group, each of which is unsubstituted or substituted with one or more of the following groups: phenyl, halogen, C 1 -C 4 haloalkane a group, CN, NO 2 , OR 17 , SR 18 , NR 19 R 20 , C 1 -C 20 alkyl; or R 15 represents hydrogen, C 3 -C 8 cycloalkyl, the C 3 -C 8 cycloalkyl Depending on the case, one or more O, CO or NR 26 ; or R 15 represents a C 1 -C 20 alkyl group which is unsubstituted or substituted with one or more of the following groups: halogen, OR 17 , C 3 -C 8 -cycloalkyl, C 5 -C 20 heteroaryl, C 8 -C 20 phenoxycarbonyl, C 5 -C 20 heteroaryloxy
  • R 15 represents a C 2 -C 20 alkyl group in which one or more O, S or SO 2 are heterogeneous, or R 15 represents a C 2 -C 20 alkanoyl group, a benzoyl group, a C 2 -C 12 alkoxycarbonyl group. , phenoxycarbonyl, CONR 19 R 20 , NO 2 or C 1 -C 4 haloalkyl.
  • R 15 represents, for example, hydrogen, phenyl, naphthyl, each unsubstituted or substituted by C 1 -C 8 alkyl; or R 15 represents thienyl, C 1 - a C 20 alkyl group which is unsubstituted or substituted with one or more of the following groups: OR 17 , SR 17 , C 3 -C 8 -cycloalkyl, NR 19 R 20 or COOR 17 ; or R 15 represents C 2 a -C 20 alkyl group in which one or more O or SO 2 are heterogeneous.
  • R 15 is especially, for example, C 3 -C 8 cycloalkyl or C 1 -C 20 alkyl, especially C 1 -C 20 alkyl, especially C 1 -C 12 alkyl.
  • R' 14 and R' 15 are as given above for R 14 and R 15 respectively.
  • X 1 represents, for example, O, S or SO, such as O or S, especially O.
  • R 16 represents, for example, a C 6 -C 20 aryl group (especially phenyl or naphthyl, especially phenyl) or a C 5 -C 20 heteroaryl (especially thienyl), each unsubstituted or via one or more Substituted for: phenyl, halogen, C 1 -C 4 haloalkyl, CN, NO 2 , OR 17 , SR 18 , NR 19 R 20 or a C 1 -C 20 alkyl group having one or more O; or each with one or more C 1 -C 20 substituted alkyl, C 1 -C 20 alkyl which is unsubstituted or substituted with one or more of the following radicals: halogen, COOR 17, CONR 19 R 20 , benzyl , C 3 -C 8 cycloalkyl, C 5 -C 20 heteroaryl, C 6 -C 20 aryloxycarbonyl, C 5 -C 20 heteroaryloxy
  • R 16 represents, for example, phenyl or naphthyl, especially phenyl, thienyl or oxazole, each unsubstituted or substituted by one or more of the following groups: phenyl, halogen, C 1 -C a 4- haloalkyl group, OR 17 , SR 18 , NR 19 R 20 or C 1 -C 20 alkyl; or R 16 represents a C 1 -C 20 alkyl group which is unsubstituted or substituted with one or more of the following groups: Halogen, phenyl, OH, SH, C 3 -C 6 alkenyloxy, OCH 2 CH 2 (CO)O(C 1 -C 4 alkyl), O(CO)-(C 1 -C 4 alkyl) , O(CO)-phenyl, (CO)OH or (CO)O(C 1 -C 4 alkyl); or R 16 represents a C 2 -C 12 alkyl group, wherein one
  • R 16 represents, for example, phenyl or naphthyl, especially phenyl, each unsubstituted or substituted with one or more of the following groups: phenyl, halogen, C 1 -C 4 haloalkyl, OR 17 , SR 18 , NR 19 R 20 or C 1 -C 20 alkyl; or R 16 represents a C 3 -C 5 heteroaryl group, especially a thienyl group.
  • R 16 is especially, for example, phenyl which is unsubstituted or substituted by one or more of the following groups: OR 17 , SR 18 , NR 19 R 20 or C 1 -C 20 alkyl, or R 16 represents thienyl .
  • R 16 represents, for example, phenyl or naphthyl, each of which is unsubstituted or substituted with one or more C 1 -C 20 alkyl groups.
  • R 16 is especially phenyl which is substituted by one or more C 1 -C 20 alkyl groups.
  • R 17 represents, for example, hydrogen, phenyl-C 1 -C 3 alkyl, C 1 -C 20 alkyl, which is unsubstituted or substituted with one or more of the following groups: halogen, OH, OCH 2 CH 2 (CO)O(C 1 -C 4 alkyl), O(CO)-(C 1 -C 4 alkyl), O(CO)-(C 2 -C 4 )alkenyl, O(CO)-benzene group, (CO) OH, (CO ) O (C 1 -C 4 alkyl), C 3 -C 20 cycloalkyl interrupted by one or more O or a C 3 -C 20 cycloalkyl; or R 17 represents a C 2 -C 20 alkyl group having one or more O in between; (CH 2 CH 2 O) n+1 H, (CH 2 CH 2 O) n (CO)-(C 1 -C 8 alkyl) a C 1 -C 8 alkanoy
  • R 17 represents, for example, hydrogen, phenyl-C 1 -C 3 alkyl, C 1 -C 20 alkyl, which is unsubstituted or substituted with one or more of the following: halogen , O(CO)-(C 1 -C 4 alkyl), O(CO)-(C 2 -C 4 alkenyl) or a C 2 -C 20 alkyl group having one or more O; or C 1 a C 8 alkanoyl group, a C 2 -C 12 alkenyl group, a C 3 -C 6 alkenoyl group, a C 2 -C 20 alkyl group having one or more O interstitials, and optionally a C 3 -C having one or more O a 20 cycloalkyl group; or a benzoyl group which is unsubstituted or substituted with one or more of the following groups: C 1 -C 6 alkyl, halogen, OH or C 1 -C
  • R 17 is also, for example, hydrogen, phenyl-C 1 -C 3 alkyl, C 1 -C 8 alkanoyl, C 1 -C 20 alkyl, which is unsubstituted or substituted with one or more of the following groups : halogen, C 3 -C 20 cycloalkyl, O(CO)-(C 1 -C 4 alkyl), O(CO)-(C 2 -C 4 alkenyl) or inter-hetero C with one or more O 2 -C 20 alkyl group, or R 17 represents C 2 -C 20 alkyl, heteroalkyl having one or more therebetween O.
  • R 18 represents, for example, C 3 -C 20 cycloalkyl, C 1 -C 20 alkyl, which is unsubstituted or substituted with one or more of the following groups: OH, O (CO )-(C 2 -C 4 )alkenyl, O(CO)-(C 1 -C 4 alkyl) or (CO)OR 17 ; or R 18 represents phenyl or naphthyl, each unsubstituted or via One or more halogen or C 1 -C 12 alkyl groups, especially halogen.
  • R 18 represents, for example, a C 1 -C 20 alkyl group, a C 2 -C 12 alkenyl group, a C 3 -C 20 cycloalkyl group, a phenyl-C 1 -C 3 alkyl group, a C 2 -C 8 alkanoyl group, Benzoyl, phenyl or naphthyl.
  • R 18 represents C 1 -C 20 alkyl substituted with one or more of the following groups: OH, O(CO)-(C 2 -C 4 )alkenyl, O(CO)-(C 1 -C 4 alkyl) or (CO)OR 17 , or R 18 represents a phenyl group which is substituted by one or more halogens.
  • R 18 represents C 1 -C 8 alkyl, which is substituted as defined above.
  • R 19 and R 20 are each independently hydrogen, C 1 -C 20 alkyl, C 2 -C 4 hydroxyalkyl, C 3 -C 20 cycloalkyl, phenyl-C 1 -C 3 alkane a phenyl or naphthyl group, a C 1 -C 8 alkanoyl group, a C 1 -C 8 alkanoyloxy group, a C 3 -C 12 alkenoyl group or a benzoyl group; or R 19 and R 20 attached thereto
  • the atoms together form a 5- or 6-membered saturated or unsaturated ring heterogeneously interspersed with O, S or NR 17 ; or R 19 and R 20 together with the N atom to which they are attached form a heteroaromatic ring system, the ring system is not Substituted or substituted with one or more of the following groups: a C 1 -C 20 alkyl group, a C 1 -C 4 haloalkyl
  • R 19 and R 20 are each independently hydrogen, C 1 -C 20 alkyl, C 2 -C 4 hydroxyalkyl, C 3 -C 20 cycloalkyl, phenyl-C 1 -C a 3- alkyl group, a C 1 -C 8 alkanoyl group, a C 1 -C 8 alkanoyloxy group, a C 3 -C 12 alkenoyl group or a benzoyl group; or R 19 and R 20 together with the N atom to which they are attached In the case of a 5- or 6-membered saturated ring of O or NR 17 ; or R 19 and R 20 together with the N atom to which they are attached form an indazole ring.
  • R 19 and R 20 are each independently hydrogen, C 1 -C 20 alkyl, C 2 -C 4 hydroxyalkyl, C 3 -C 20 cycloalkyl, phenyl-C 1 -C 3 alkane a C 1 -C 8 alkanoyl group, a C 1 -C 8 alkanoyloxy group, a C 3 -C 12 alkenoyl group or a benzoyl group; or R 19 and R 20 together with the N atom to which they are attached form a heterogeneous There is a 5- or 6-membered saturated ring of O or NR 17 .
  • R 19 and R 20 are, independently of each other, a C 1 -C 8 alkanoyl group, a C 1 -C 8 alkanoyloxy group; or R 19 and R 20 together with the N atom to which they are attached form a morpholine ring.
  • R 21 and R 22 are each independently hydrogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, C 3 -C 10 cycloalkyl or phenyl; or R 21 and R 22 The attached N atoms together form a morpholine ring.
  • R 21 and R 22 are, in particular, independently of one another hydrogen or C 1 -C 20 alkyl.
  • R 23 represents, for example, hydrogen, OH, phenyl or C 1 -C 20 alkyl. R 23 is especially hydrogen, OH or C 1 -C 4 alkyl.
  • R 24 is preferably as given for R 19 and R 20 .
  • R 25 is preferably as given for R 17 .
  • R 26 represents, for example, hydrogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, C 2 -C 20 alkyl, heterogeneously having one or more O or CO; or phenyl-C 1 - a C 4 alkyl group, a C 3 -C 8 cycloalkyl group optionally having one or more O or CO; or (CO)R 19 or a phenyl group which is unsubstituted or has one or more of the following groups Substitution: C 1 -C 20 alkyl, halogen, C 1 -C 4 haloalkyl, OR 17 , SR 18 , NR 19 R 20 .
  • R 26 represents, for example, hydrogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl; phenyl-C 1 -C 4 alkyl, C 3 -C 8 cycloalkyl, (CO)R 19 or a phenyl group which is unsubstituted or substituted by one or more C 1 -C 20 alkyl groups.
  • R 26 represents, for example, hydrogen or a C 1 -C 20 alkyl group, especially a C 1 -C 4 alkyl group.
  • Examples of the compound of the formula (1) of the invention include the following compounds represented by the formula (1-1) to the formula (1-84):
  • C-2 Specific examples of the other photoinitiator (C-2) include other oxy-acyl steroids (O-acyloxime) or non-oxy-acyl hydrazine-based photoinitiators.
  • O-acyloxime oxy-acyl steroids
  • non-oxy-acyl hydrazine-based photoinitiators include other oxy-acyl steroids (O-acyloxime) or non-oxy-acyl hydrazine-based photoinitiators.
  • oxy-acyl hydrazine compounds include 1-[4-(phenylthio)phenyl]-propane-3-cyclopentane-1,2-dione 2-(O-benzoyl group). ⁇ ), 1-[4-(phenylthio)phenyl]-heptane-1,2-dione 2-(O-benzoylhydrazine), 1-[4-(phenylthio)phenyl ]-octane-1,2-dione-2-(O-benzoylhydrazine), or a combination of the above compounds.
  • oxy-acyl hydrazine compounds include 1-[4-(benzoyl)phenyl]-heptane-1,2-dione-2-(O-benzoyl hydrazine), 1-[9 -ethyl-6-(2-methylbenzoyl)-9H-indazole-3-substituted]-ethanone-1-(O-acetyl oxime), 1-[9-ethyl-6- (3-methylbenzoyl)-9H-indazole-3-substituted]-ethanone-1-(O-acetylindole), 1-[9-ethyl-6-benzoyl-9H-indole Zyrid-3-yl]-ethane ketone-1-(O-acetyl oxime), ethane ketone-1-[9-ethyl-6-(2-methyl-4-tetrahydrofuranylbenzoyl)- 9H-carbazole-3-substi
  • oxy-acyl hydrazine compounds may be used singly or in combination of two or more.
  • non-oxy-acyl hydrazine photoinitiator examples include a triazabenzene compound, an acetophenone compound, a diimidazole compound, a benzophenone compound, an ⁇ -diketone compound, and an alcohol ketone.
  • triazabenzene compound examples include a vinyl-halomethyl-s-triazabenzene compound, 2-(naphtho-1-substituted)-4,6-di(halomethyl)- An s-triazabenzene compound, a 4-(p-aminophenyl)-2,6-di(halomethyl)-s-triazabenzene compound, or a combination of the above compounds.
  • vinyl-halogenomethyl-s-triazabenzene compound examples include 2,4-bis(trichloromethyl)-6-p-methoxystyryl-s-triazabenzene, 2 ,4-di(trichloromethyl)-3-(1-p-dimethylaminophenyl-1,3-butadienyl)-s-triazabenzene, 2-trichloromethyl- 3-Amino-6-p-methoxystyryl-s-triazabenzene, or a combination of the above compounds.
  • 2-(naphtho-1-substituted)-4,6-di(halomethyl)-s-triazabenzene compound examples include 2-(naphtho-1-substituted)-4,6 - bis(trichloromethyl)-s-triazabenzene, 2-(4-methoxy-naphtho-1-substituted)-4,6-di(trichloromethyl)-s-triazole Heterobenzene, 2-(4-ethoxy-naphtho-1-substituted)-4,6-bis(trichloromethyl)-s-triazabenzene, 2-(4-butoxy-naphthalene And-1-substituted)-4,6-bis(trichloromethyl)-s-triazabenzene, 2-[4-(2-methoxyethyl)-naphtho-1-yl] -4,6-bis(trichloromethyl)-s-triazabenz
  • 4-(p-aminophenyl)-2,6-bis(halomethyl)-s-triazabenzene compound examples include 4-[p-N,N-di(ethoxycarbonyl) Aminophenyl]-2,6-bis(trichloromethyl)-s-triazabenzene, 4-[o-methyl-p-N,N-di(ethoxycarbonylmethyl) Aminophenyl]-2,6-bis(trichloromethyl)-s-triazabenzene, 4-[p-N,N-bis(chloroethyl)aminophenyl]-2,6- Bis(trichloromethyl)-s-triazabenzene, 4-[o-methyl-p-N,N-di(chloroethyl)aminophenyl]-2,6-di(trichloromethane) -s-triazabenzene, 4-(p-N-chloroethylaminophenyl)-2,6--ch
  • acetophenone compound examples include p-dimethylacetonone, ⁇ , ⁇ '-dimethoxy oxy acetophenone, and 2,2'-dimethyl-2-phenylbenzene.
  • the acetophenone compounds may be used singly or in combination of two or more.
  • 2-Methyl-1-(4-methylthiophenyl)-2-morpholino-1-propanone may be a product of the model IRGACURE 907 manufactured by Ciba Specialty Chemicals Co., Ltd.
  • 2-Benzyl-2-N,N-dimethylamine-1-(4-morpholinophenyl)-1-butanone is commercially available from Ciba Specialty Chemicals, Inc. under the model number IRGACURE 369.
  • the acetophenone-based compound preferably includes 2-methyl-1-(4-methylthiophenyl)-2-morpholino-1-propanone, 2-benzyl-2-N,N-di Methylamine-1-(4-morpholinophenyl)-1-butanone, or a combination of the above compounds.
  • diimidazole compound examples include 2,2'-bis(o-chlorophenyl)-4,4',5,5'-tetraphenyldiimidazole, 2,2'-bis(o-fluorophenyl) -4,4',5,5'-tetraphenyldiimidazole, 2,2'-bis(o-methylphenyl)-4,4',5,5'-tetraphenyldiimidazole, 2 , 2'-bis(o-methoxyphenyl)-4,4',5,5'-tetraphenyldiimidazole, 2,2'-bis(o-ethylphenyl)-4,4' , 5,5'-tetraphenyldiimidazole, 2,2'-bis(p-methoxyphenyl)-4,4',5,5'-tetraphenyldiimidazole, 2,2'-double (2,2',4,4'-tetrameth
  • peroxide examples include di-tert-butyl peroxide and the like.
  • the peroxides may be used singly or in combination of two or more.
  • the pigment (E) may be an inorganic pigment, an organic pigment or a combination of these.
  • organic pigment examples include CI Pigment Red 1, 2, 3, 4, 5, 6, 7, 8, 9, 12, 14, 15, 16, 17, 21, 22, 23, 31, 32, 37, 41, 47, 48, 48:1, 48:2, 48:4, 49, 49:1, 49:2, 50:1, 52:1, 52:2, 53, 53:1, 53:2 53:3, 57, 57:1, 57:2, 58:4, 60, 63, 63:1, 63:2, 64, 64:1, 68, 69, 81, 81:1, 81:2 81:3, 81:4, 83, 88, 90:1, 101, 101:1, 104, 108, 108:1, 109, 112, 113, 114, 122, 123, 144, 146, 147, 149, 151, 166, 168, 169, 170, 172, 173, 174, 176, 177, 178, 179, 181, 184, 185, 187, 188, 190, 193, 194, 200, 202, 206, 207
  • an alkali metal salt of a brominated diketopyrrolopyrrole compound is protonated using water, an alcohol or an acid or the like to obtain a brominated diketopyrrolopyrrole pigment.
  • the size of the primary particle size can be controlled by the temperature of protonation, the water used, the ratio of alcohol to acid, and the amount of addition thereof.
  • the above synthesis method is merely illustrative, and the synthesis method of the brominated diketopyrrolopyrrole pigment is not limited thereto.
  • the dye (F) includes the dye (F-1) as well as other dyes (F-2).
  • J 1 , J 2 , J 3 and J 4 each independently represent a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, a substituted alkyl group having 1 to 8 carbon atoms, and a carbon number.
  • a cycloalkyl group of 3 to 8 a substituted cycloalkyl group having a carbon number of 3 to 8, a phenyl group or a substituted phenyl group;
  • J 5 and J 6 each independently represent a hydrogen atom and have a carbon number of 1 to 8.
  • J 7 represents a group having a polymerizable unsaturated group
  • a represents an integer of 1 to 5.
  • alkyl group having 1 to 8 carbon atoms in J 1 , J 2 , J 3 and J 4 include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, a second butyl group and a third butyl group.
  • Base isobutyl, pentyl, third amyl, hexyl, heptyl, octyl, isooctyl, trioctyl or 2-ethylhexyl, and the like.
  • J 1 , J 2 , J 3 and J 4 are preferably an alkyl group having 1 to 6 carbon atoms, and more preferably an alkyl group having 1 to 4 carbon atoms.
  • J 1 , J 2 , J 3 and J 4 include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group or a cyclooctyl group.
  • J 1 , J 2 , J 3 and J 4 are preferably a cycloalkyl group having a carbon number of 5 to 7, and more preferably a cyclohexyl group.
  • the alkyl group having 1 to 8 carbon atoms, the cycloalkyl group having 3 to 8 carbon atoms, and the phenyl group in J 1 , J 2 , J 3 and J 4 may have a substituent, and the substituent is preferably a halogen atom.
  • J b and J c each independently represent a linear or branched alkyl group having 1 to 10 carbon atoms, a cycloalkyl group having a carbon number of 3 to 30 (preferably 3 to 8) or -D, or A heterocyclic group having 2 to 10 carbon atoms formed by bonding J b and J c to each other.
  • T represents a sodium atom or a potassium atom.
  • D represents an aromatic hydrocarbon group having 6 to 10 carbon atoms or an aromatic heterocyclic group having 5 to 10 carbon atoms.
  • the saturated hydrocarbon group in J a may be any of a linear chain, a branched chain, and a cyclic chain as long as the carbon number is from 1 to 10, and may have a bridged structure.
  • R a may further include an anthracenyl group, a fluorenyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, Cyclooctyl or tricyclic fluorenyl.
  • specific examples of the group in which the methylene group contained in the saturated hydrocarbon group is substituted with an oxygen atom include a methoxypropyl group, an ethoxypropyl group, a 2-ethylhexyloxypropyl group or a methoxyhexyl group.
  • alkyl group, the cycloalkyl group and the substituent of the phenyl group -CO 2 R a in J 1 , J 2 , J 3 and J 4 include a methyloxycarbonyl group, an ethyloxycarbonyl group, and a methyloxycarbonyl group.
  • heterocyclic group in which J b and J c are bonded to each other include pyrrole, pyridine, indole, isoindole, quinoline, isoquinoline. (isoquinoline), carbazole, phenanthridine, acridine or phenothiazine.
  • aromatic hydrocarbon group in D examples include a phenyl group, a naphthyl group, an azulenyl group, and the like.
  • aromatic heterocyclic group examples include a furyl group, a thienyl group, a pyridyl group, a pyrrolyl group, an oxazolyl group, and an isoxazole.
  • alkyl group having 1 to 8 carbon atoms in J 5 and J 6 are the same as the specific examples of the alkyl group having 1 to 8 carbon atoms in J 1 , J 2 , J 3 and J 4 , and Will be described separately.
  • a represents an integer of 1 to 5, and when a is an integer of 2 or more, a plurality of J 7 may be the same or different, and a is preferably 1 or 2, more preferably 1.
  • the compound represented by the formula (f-1) preferably includes the compound represented by the formula (f-2). Further, the compound represented by the formula (f-2) is preferably a compound in which the -COOJ 8 group in the formula (f-2) is substituted at the ortho position on the benzene ring.
  • the polymerizable unsaturated group in J 7 and J 8 is preferably an acryloyl group or a methacryloyl group in view of easiness of the crosslinking reaction.
  • Specific examples of J 8 are preferably a group represented by the formula (f-3) or a group represented by the formula (f-4).
  • V 1 , V 2 , V 3 and V 4 are preferably an alkanediyl group having a carbon number of 2 to 8, and more preferably an alkanediyl group having a carbon number of 2 to 6.
  • the substituent of the alkanediyl group includes a hydroxyl group, a halogen atom, a (meth)acryloyloxy group or a phenoxy group, and the like, and is preferably a hydroxyl group.
  • the divalent alicyclic hydrocarbon group in Q 2 is preferably an alicyclic hydrocarbon group having 3 to 20 carbon atoms, more preferably an alicyclic hydrocarbon group having 3 to 12 carbon atoms. Further, the alicyclic hydrocarbon group may be a 2 to 4 ring crosslinked cyclic hydrocarbon group.
  • J 8 is preferably a (meth)acryloyloxyalkyl group. Further, the (meth)acryloyloxyalkyl group has a total carbon number of preferably 4 to 16, particularly preferably 4 to 10.
  • b is preferably an integer representing 0 to 3
  • c and d are preferably integers each independently representing 0 to 3.
  • J 1 , J 2 , J 3 and J 4 each independently represent a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, a substituted alkyl group having 1 to 8 carbon atoms, and a carbon number.
  • a cycloalkyl group of 3 to 8 a substituted cycloalkyl group having a carbon number of 3 to 8, a phenyl group or a substituted phenyl group; and J 5 and J 6 each independently represent a hydrogen atom and have a carbon number of 1 to 8.
  • An alkyl or chlorine atom; IN - represents an anion.
  • the compound having a hydroxyl group and a polymerizable unsaturated group may have one or more hydroxyl groups and a (meth)acryloyl group in the compound, and the number of bonds and bonding sites of the hydroxyl group and the (meth)acryloyl group.
  • the hydroxyl group any of an alcoholic hydroxyl group and a phenolic hydroxyl group can be used.
  • substituents are contained in addition to the hydroxyl group and the (meth)acryloyl group, the kind, the bonding position, and the number of bonds are not limited.
  • a specific example of the compound having a hydroxyl group and a (meth)acryloyl group is preferably a compound represented by the formula (f-3a) or (f-4a).
  • Specific examples of the compound having a hydroxyl group and a (meth)acryloyl group preferably include at least one of the compounds represented by the formula (f-2-1) to the formula (f-2-4).
  • J g represents a hydrogen atom or a methyl group
  • A represents a divalent group selected from the group consisting of the groups represented by the following formulas (fI) to (fIV);
  • n and q are each independently An integer representing 0 to 6.
  • Specific examples of the compound represented by the formula (f-2-1) include 2-hydroxyethyl (meth)acrylate, 1-methyl-2-hydroxyethyl (meth)acrylate, and (meth)acrylic acid 2- Methyl-2-hydroxyethyl ester, 3-hydroxypropyl (meth)acrylate, 1-glycerol (meth)acrylate, 4-hydroxybutyl (meth)acrylate, 5-hydroxypentyl (meth)acrylate, 6-hydroxyhexyl (meth)acrylate, 7-hydroxyheptyl (meth)acrylate, 8-hydroxyoctyl (meth)acrylate, (meth)acrylic acid 9 - Hydroxy decyl ester, 10-hydroxydecyl (meth) acrylate, 11-hydroxyundecyl (meth) acrylate or 12-hydroxydodecyl (meth) acrylate.
  • specific examples of the compound represented by the formula (f-2-2) include 2-(6-hydroxyhexanoyloxy)ethyl (meth)acrylate and 3-(6-hydroxyhexanoyl (meth)acrylate.
  • the compound having a hydroxyl group and a (meth)acryloyl group preferably includes 2-hydroxyethyl (meth)acrylate, 1-glyceryl (meth)acrylate, 6-hydroxyhexyl (meth)acrylate, (methyl) ) 2-(6-hydroxyhexanoyloxy)ethyl acrylate, 2-(3-hydroxy-2,2-dimethylpropoxycarbonyloxy)ethyl (meth)acrylate, (meth)acrylic acid (4-Hydroxymethylcyclohexyl)methyl ester or (3-hydroxymethyladamantan-1-yl)methyl (meth)acrylate.
  • the compound having a hydroxyl group and a (meth)acryloyl group may be used singly or in combination of two or more.
  • IN - include a halogen ion, a boron anion, a phosphate anion, a carboxylic acid anion, a sulfate anion, an organic sulfonate anion, a nitrogen anion or amethide anion.
  • Halogen ions include fluoride ions, chloride ions, bromide ions or iodide ions.
  • boron anion examples include inorganic boron anions such as BF 4 - ; (CF 3 ) 4 B - , (CF 3 ) 3 BF - , (CF 3 ) 2 BF 2 - , (CF 3 ) BF 3 - , ( C 2 F 5 ) 4 B - , (C 2 F 5 ) 3 BF-, (C 2 F 5 ) BF 3 - , (C 2 F 5 ) 2 BF 2 - , (CF 3 ) (C 2 F 5 ) 2 BF - , (C 6 F 5 ) 4 B - , [(CF 3 ) 2 C 6 H 3 ] 4 B - , (CF 3 C 6 H 4 ) 4 B - , (C 6 F 5 ) 2 BF 2 - , (C 6 F 5 )BF 3 - , (C 6 H 3 F 2 ) 4 B - , B(CN) 4 - , B(CN)F 3
  • phosphate anion examples include inorganic phosphate anions such as HPO 4 2- , PO 4 3- , PF 6 - ; (C 2 F 5 ) 2 PF 4 - , (C 2 F 5 ) 3 PF 3 - , [( CF 3 ) 2 CF] 2 PF 4 - , [(CF 3 ) 2 CF] 3 PF 3 , (nC 3 F 7 ) 2 PF 4 - , (nC 3 F 7 ) 3 PF 3 - , (nC 4 F 9 3 PF 3 - , (C 2 F 5 )(CF 3 ) 2 PF 3 - , [(CF 3 ) 2 CFCF 2 ] 2 PF 4 - , [(CF 3 ) 2 CFCF 2 ] 3 PF 3 - , ( nC 4 F 9 ) 2 PF 4 - , (nC 4 F 9 ) 3 PF 3 - , (C 2 F 4 H)(CF
  • organic sulfonic acid anion examples include an alkylsulfonic acid anion such as methanesulfonic acid, ethanesulfonic acid, trifluoromethanesulfonic acid or nonafluorobutanesulfonic acid; benzenesulfonic acid and benzenedisulfonate
  • An arylsulfonic acid anion such as ion, p-toluenesulfonic acid, p-trifluoromethanesulfonic acid, pentafluorobenzenesulfonic acid, naphthalenesulfonic acid or naphthalene disulfonate ion, in addition to 2-(methyl) Acryloxy-1,1,2,2-tetrafluoroethanesulfonic acid, 2-(4-vinylphenoxy)-1,1,2,2-tetrafluoroethanesulfonic acid, in International Publication No. 2011 An organic sulfonic acid anion described
  • nitrogen anion examples include [(CN) 2 N] - , [(FSO 2 ) 2 N] - , [(FSO 2 )N(CF 3 SO 2 )] - , [(CF 3 SO 2 ) 2 N] - , [(FSO 2 )N(CF 3 CF 2 SO 2 )] - , [(FSO 2 )N ⁇ (CF 3 ) 2 CFSO 2 ⁇ ] - , [(FSO 2 )N(CF 3 CF 2 CF 2 SO 2 )] - , [(FSO 2 )N(CF 3 CF 2 CF 2 SO 2 )] - , [(FSO 2 )N ⁇ (CF 3 ) 2 CFCF 2 SO 2 ⁇ ] - , [ (FSO 2 )N ⁇ CF 3 ) 2 CFCF 2 SO 2 ⁇ ] - , [ (FSO 2 )N ⁇ CF 3 CF 2 (CF 3 )CFSO 2 ⁇ ] - , [(FSO
  • methide anion examples include (CF 3 SO 2 ) 3 C - , (CF 3 CF 2 SO 2 ) 3 C - , [(CF 3 ) 2 CFSO 2 ] 3 C - , (CF 3 CF 2 CF 2 SO 2 ) 3 C - , (CF 3 CF 2 CF 2 SO 2 ) 3 C - , [(CF 3 ) 2 CFCF 2 SO 2 ] 3 C - , [CF 3 CF 2 (CF 3 ) CFSO 2 ] 3 C - , [(CF 3 ) 3 CSO 2 ] 3 C - , (FSO 2 ) 3 C - and the like, in addition to Japanese Patent Laid-Open No. 2011-145540, No. 5,554,664 The methide anion described in JP-A-2005-309657, JP-A-2004-085657, and JP-A-2010-505787.
  • the amount of the dye (F-1) used may be 3 based on the amount of the alkali-soluble resin (A) used in an amount of 100 parts by weight.
  • the parts by weight to 90 parts by weight preferably 5 parts by weight to 85 parts by weight, and more preferably 10 parts by weight to 80 parts by weight.
  • the resulting photosensitive resin composition preferably has a gassing property.
  • the dye (F) may include other dyes (F-2).
  • other dyes (F-2) include red dyes such as CI Solvent Red 45 and CI Solvent Red 49; blue solvents such as CI Solvent Blue 35, CI Solvent Blue 37, CI Solvent Blue 59, and CI Solvent Blue 67; Acid red dyes such as red 91, CI acid red 92, CI acid red 97, CI acid red 114, CI acid red 138, CI acid red 151, CI acid red 289; or CI acid blue 80, CI acid blue 83, CI acid Acidic blue dye such as blue 90.
  • red dyes such as CI Solvent Red 45 and CI Solvent Red 49
  • blue solvents such as CI Solvent Blue 35, CI Solvent Blue 37, CI Solvent Blue 59, and CI Solvent Blue 67
  • Acid red dyes such as red 91, CI acid red 92, CI acid red 97, CI acid red 114, CI acid red 138,
  • the other dye (F-2) may be used in an amount of from 0 part by weight to 87 parts by weight, preferably from 0 part by weight to 80 parts by weight, based on 100 parts by weight of the alkali-soluble resin (A), and more preferably 0 parts by weight to 70 parts by weight.
  • the additive (G) may include a filler, a polymer (refer to a polymer other than the above-described alkali-soluble resin (A)), an adhesion promoter, an antioxidant, an ultraviolet absorber, an anti-agglomerating agent, a thermal acid generator, and an oxygen-containing agent. a cyclobutane compound, an adamantyl ester compound or a glycoluril derivative or the like.
  • the filler include glass or aluminum and the like.
  • ultraviolet absorber examples include 2-(3-tert-butyl-5-methyl-2-hydroxyphenyl)-5-chlorophenyl azide, alkoxy phenone, and formula (g). -1) A compound represented or a combination of the above compounds.
  • anti-agglomerating agent examples include sodium polyacrylate and the like.
  • thermal acid generator examples include a thermal acid generator represented by the formula (g-2), Irgacure 250, Irgacure 261 (manufactured by Ciba Specialty Chemicals Co., Ltd.), or a combination of the above compounds.
  • Gx 2 and Gx 3 each independently represent a benzyl or alkyl having 1 to 4 group, Gx 2 is preferably any one or Gx 3 is alkyl having 1 to 4 (especially methyl) is another One is a benzyl group, wherein the benzyl group in Gx 2 and Gx 3 is substituted or unsubstituted;
  • An - represents BF 4 - , PF 6 - , AsF 6 - , SbF 6 - , trifluoromethanesulfonate anion or bis(trifluoromethanesulfonyl)amine anion;
  • Nx represents an integer from 0 to 5.
  • the thermal acid generator represented by the formula (g-2) may be a thermal acid generator represented by the formula (g-2-1).
  • thermal acid generator represented by the above formula (g-2) include a 4-acetoxyphenyldimethylhydrazine cation, a 4-hydroxyphenylbenzylmethylphosphonium cation, and a 4-acetoxy group.
  • Ga 2 represents an alkyl group having a carbon number of 1 to 6, gm.
  • An integer of 1 to 3 gn represents an integer of 0 to 4, and one of the carbon atoms in the adamantane skeleton is bonded to Ga 1 and Ga 2 or to two Ga 1 or two Ga 2 .
  • Gb represents a hydrogen atom, a substituted or unsubstituted hydrocarbon group having 1 to 20 carbon atoms and an acyl group; Gb may be the same or different; Gc is selected from a hydrogen atom, a substituted or unsubstituted group of hydrocarbon groups having 1 to 15 carbon atoms, an acyl group and a nitro group; Gc may be the same or different; s represents 0, 1 or 2;
  • Gd 1 means Wherein, Gd 2 represents a hydrogen atom or a carbon number of 1
  • the above-mentioned glycoluril derivative is characterized in that in the bicyclic system, at least two glycidyl groups are each in a nitrogen-substituted position in the ring system, wherein the substitution positions of the two glycidyl groups are as in the formula (g-4) As shown, the two glycidyl groups are each a nitrogen-substituted position (1,3-position) bonded to the same five-membered ring. Further, the compound having the structure of the formula (g-4) also contains two glycidyl groups each bonded to the nitrogen-substituted position (1,5-position or 1,7-position) of the two five-membered rings.
  • the compound having the structure of the formula (g-4) may also contain 3 glycidyl groups which are each bonded at the nitrogen-substituted position of the two five-membered rings (1, 3, 5- Bit or 1, 3, 7-bit). Further, the compound having the structure of the formula (g-4) may also contain 4 glycidyl groups each bonded to the nitrogen-substituted position of the two five-membered rings (1, 3, 5, 7-bit).
  • Gb is a group selected from a hydrogen atom, a substituted or unsubstituted hydrocarbon group having 1 to 20 carbon atoms, and an acyl group.
  • Gb has a carbon number of from 1 to 15; more preferably, the carbon number of Gb is 1 to 12.
  • the carbon number of Gb may be smaller than the above carbon number.
  • the carbon number of Gb is 10, 8, or 4.
  • the above values also apply to unsubstituted Gb.
  • the hydrocarbyl group also applies to the acyl group.
  • the hydrocarbon group of the above Gb may be a linear or/or branched alkyl group and an alkenyl group having the above carbon number of 1 to 20; and an aryl group may also be used.
  • the hydrocarbyl group may comprise a narrowly defined aromatic group, i.e. an alkaryl or aralkyl consisting solely of an aromatic ring system.
  • Gb represents an aryl group, an aralkyl group or an alkylaryl group, preferred examples thereof may include, but are not limited to, a phenyl group, a benzyl group, a tolyl group, a xylyl group or a homologous compound as described above.
  • the above Gb may also be a cycloalkyl group or a cycloalkenyl group, and the cycloalkyl group or cycloalkenyl group also has a substituted cycloalkyl group or a cycloalkenyl group.
  • Gb represents a saturated or partially saturated cyclic group
  • a cyclopentyl group, a cyclohexyl group and a derivative thereof are preferred.
  • Gb represents a heterocyclic group
  • a ring compound containing O, N and/or S is preferred.
  • the above ring system preferably has one, two or three heteroatoms or is a saturated, unsaturated or aromatic cyclic group.
  • the Gb may further have other substituents, preferably a halogen, an alkoxy group, an acyl group or an acyloxy group, wherein the halogen is preferably chlorine or/or bromine.
  • Gb further contains a hydrocarbyl substituent
  • the substituent has no more than 10 carbon atoms, more preferably no more than 8, more preferably no more than 6, and particularly preferably no more than 4.
  • the hydrocarbyl substituent includes, but is not limited to, an aryl group, an aralkyl group, an alkylaryl group, a cycloalkyl group, and/or an alkyl group having a substituent such as a halogen or an alkoxy group.
  • the above heterocyclic ring system is also contained, for example, a heterocyclic ring system having a hetero atom number of 1 to 3.
  • the total number of carbon atoms of Gb in the presence of the substituent is not more than 12; preferably not more than 10; more preferably not more than 8; Good for no more than 4 or 6.
  • the above numerical values of the number of carbon atoms are also applicable to Gb containing a substituent.
  • Gc is not a hydrogen atom, if desired, it may be the same or different hydrocarbon group.
  • the respective hydrocarbon groups have no more than 12 carbon atoms; more preferably no more than 10 or 8; more preferably no more than 6 or 4.
  • the description of Gb also applies to Gc.
  • the hydrocarbon group of Gc may be a linear or/or branched alkyl group and an alkenyl group having the above carbon number of 1 to 15, and the aryl group may be used.
  • the description about Gb also applies to Gc, so the aryl group also contains an alkaryl group or an aralkyl group, and the description about a cycloalkyl group, a cycloalkenyl group and a heterocyclic group in Gb also applies to Gc.
  • the substituent on the Gc is a halogen, a hydroxyl group, an amine group, an N-substituted amine group, a decyl group, an alkyl group, an aryl group, an alkoxy group, an aryloxy group and/or an acyloxy group.
  • the Gc can have the above one Or multiple substituents.
  • Gc has from 1 to 3 substituents; more preferably, Gc has a substituted or unsubstituted alkyl group, and a defined definition of this value in Gb is applicable to Gc.
  • the additive (G) is used in an amount of from 0.1 part by weight to 10 parts by weight, based on the amount of the alkali-soluble resin (A), preferably from 0.3 part by weight to 7 parts by weight, and more preferably from 0.5 part by weight to more preferably 0.5 part by weight. 4 parts by weight.
  • the photosensitive resin compositions of Examples 2 to 13 were prepared in the same manner as in Example 1, and were different in that the composition of the photosensitive resin composition and the amount thereof were changed (as shown in Table 3). ). The obtained film was evaluated in the following evaluation manners, and the results are shown in Table 3.
  • the photosensitive resin compositions obtained in Examples 1 to 13 and Comparative Examples 1 to 10 were applied by spin coating to a glass substrate of 100 mm ⁇ 100 mm, and dried under reduced pressure at a pressure of 100 mmHg and time 30. After a second, and then pre-baked at a temperature of 80 ° C for 3 minutes, a pre-baked film having a film thickness of 2.5 ⁇ m was formed. The prebaked coating film was exposed through a photomask having a strip pattern of 25 ⁇ m width (pitch 50 ⁇ m) by using 300 mJ/cm 2 of ultraviolet light (exposure model AG500-4N). Thereafter, the developer was immersed in a developing solution at 23° C. for 1 minute and 2 minutes, and then washed with pure water, and then baked at 200° C. for 80 minutes to form a photosensitive resin layer having a film thickness of 2.0 ⁇ m on the glass substrate.
  • the measurement area was 10 ⁇ m 2 .
  • the surface roughness was evaluated based on the following criteria. The smaller the measured surface roughness, the better the surface roughness of the cured product formed of the photosensitive resin composition is. That is, the lower the surface roughness, the better the pattern smoothness.
  • the rating of the evaluation is as follows:
  • the photosensitive resin compositions obtained in Examples 1 to 13 and Comparative Examples 1 to 10 were spin-coated, exposed, and developed in the same manner as described in the above evaluation method (a), and then, in a dust-free oven. Heat treatment was carried out for 1 hour in a clean oven at 230 ° C in a nitrogen atmosphere. After heating, it was heated at 220 ° C for 30 minutes using a thermal desorption spectrum analyzer (manufactured by Electronic Science Co., Ltd., WA1000S/W type), and the amount of outgas was calculated from the amount of the atomic weight 18 (water) which was separated.
  • the rating of the evaluation is as follows:
  • a photosensitive film containing no photoinitiator (C-1) was used as compared with a film formed using a photosensitive resin composition containing a photoinitiator (C-1) (Examples 1 to 13).
  • the film formed of the film (Comparative Examples 7, 9, 10) formed of the resin composition had poor pattern smoothness.
  • the formed film has a high-definition pattern with poor linearity and poor gassing properties.
  • the photosensitive resin composition of the present invention includes an alkali-soluble resin (A-1), an alkali-soluble resin (A-2), and a photoinitiator (C-1) having a specific structure, and an alkali-soluble resin.
  • the weight ratio range (A-1)/(A-2) of the use amount of (A-1) to the alkali-soluble resin (A-2) is between 5/95 and 95/5, so that high definition can be improved. Problems such as poor pattern linearity, poor pattern smoothness, and high outgassing are applicable to color filters and liquid crystal display devices.

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Abstract

A photosensitive resin composition, a method for manufacturing a colour filter, a colour filter and a liquid crystal display device. The photosensitive resin composition comprises an alkali-soluble resin (A), a compound having an ethylenically unsaturated group (B), a photoinitiator (C), a solvent (D) and a pigment (E). The alkali-soluble resin (A) comprises an alkali-soluble resin (A-1) and an alkali-soluble resin (A-2). The alkali-soluble resin (A-1) is obtained by reaction of a mixture. The mixture comprises an epoxy compound having at least two epoxy groups (a-1-1), a compound having at least one carboxylic group and at least one ethylenically unsaturated group (a-1-2), a tetracarboxylic acid or a dianhydride thereof (a-1-3) and a dicarboxylic acid or an anhydride thereof (a-1-4). The epoxy compound having at least two epoxy groups (a-1-1) has a structure as shown by the following formula (aI-1) or the following formula (aI-2). The photoinitiator (C) comprises a photoinitiator (C-1) represented by formula (1).

Description

感光性树脂组成物、彩色滤光片的制造方法、彩色滤光片以及液晶显示装置Photosensitive resin composition, method for producing color filter, color filter, and liquid crystal display device 技术领域Technical field
本发明涉及一种感光性树脂组成物,彩色滤光片的制造方法、彩色滤光片以及液晶显示装置。特别是涉及一种具有高精细度的图案直线性佳、低逸气性和图案平滑性佳的感光性树脂组成物及使用该感光性树脂组成物所形成的彩色滤光片及液晶显示装置。The present invention relates to a photosensitive resin composition, a method of producing a color filter, a color filter, and a liquid crystal display device. In particular, it relates to a photosensitive resin composition having high linearity, high outgassing property, and good pattern smoothness, and a color filter and a liquid crystal display device formed using the photosensitive resin composition.
背景技术Background technique
目前,彩色滤光片已被广泛地应用在彩色液晶显示器、彩色传真机、彩色摄影机等办公器材的领域。随着市场需求日渐扩大,彩色滤光片的制作技术也趋向多样化,目前已开发染色法、印刷法、电镀法以及分散法等制造方法,其中以分散法为主流制程。At present, color filters have been widely used in the fields of office equipment such as color liquid crystal displays, color facsimile machines, and color cameras. As the market demand is expanding, the production technology of color filters is also diversified. At present, dyeing methods, printing methods, electroplating methods, and dispersion methods have been developed, among which the dispersion method is the mainstream process.
分散法的制程是先将着色颜料分散在感光性树脂中,再将该感光性树脂涂布于玻璃基板上,经过曝光、显像等步骤,即可制得特定图案。经重复三次操作,即可制得红色(R),绿色(G)及蓝色(B)的像素着色层的图案,之后视需要可在像素着色层的图案上施加保护膜。In the dispersion method, the colored pigment is first dispersed in a photosensitive resin, and the photosensitive resin is applied onto a glass substrate, and a specific pattern is obtained by exposure, development, and the like. By repeating the operation three times, a pattern of red (R), green (G), and blue (B) pixel colored layers can be obtained, and then a protective film can be applied on the pattern of the pixel colored layer as needed.
用于分散法制程中的感光性树脂如日本特开平6-95211号公报及特开平8-183819号公报所揭示的,例如以(甲基)丙烯酸为单体成分所聚合而成的共聚物,其是作为感光性树脂的碱可溶性树脂。For example, a copolymer obtained by polymerizing (meth)acrylic acid as a monomer component, as disclosed in JP-A-6-95211, and JP-A-H08-183819, This is an alkali-soluble resin as a photosensitive resin.
然而,彩色滤光片的制造过程中,需经历多次热处理步骤,如红色(R),绿色(G)及蓝色(B)等像素着色层图案形成后的后烤(post-bake)步骤及透明导电膜(ITO膜)的形成步骤等,该等步骤一般皆需在200℃以上的高温下操作,但上述公知的感光性树脂若于180℃条件下加热1小时左右的,却在像素着色层中易发生颜料凝集粒子的产生(一般颜料凝集粒子的粒径介于1至10μm),且像素着色层的耐热性也不佳。However, in the manufacturing process of the color filter, it is necessary to undergo a plurality of heat treatment steps, such as red (R), green (G), and blue (B), and the post-bake step after the formation of the pixel colored layer pattern. And a step of forming a transparent conductive film (ITO film), etc., these steps generally need to be operated at a high temperature of 200 ° C or higher, but the above-mentioned known photosensitive resin is heated at 180 ° C for about 1 hour, but in the pixel The generation of pigment agglomerated particles tends to occur in the colored layer (generally, the particle diameter of the pigment agglomerated particles is from 1 to 10 μm), and the heat resistance of the pixel colored layer is also not good.
为改善上述的问题,日本特开2001-075273中揭示的感光性树脂组成物, 其包含羧基的不饱和单体与含有环氧丙基的单体所聚合而得的聚合物作为感光性树脂的碱可溶性树脂。然而,此公知技术的感光性树脂组成物制得的彩色滤光片却有高精细度的图案直线性不佳、图案平滑性不佳以及高逸气性(outgassing)等问题。In order to improve the above-mentioned problems, the photosensitive resin composition disclosed in Japanese Laid-Open Patent Publication No. 2001-075273, A polymer obtained by polymerizing a carboxyl group-containing unsaturated monomer and a glycidyl group-containing monomer is used as an alkali-soluble resin of a photosensitive resin. However, the color filter prepared by the photosensitive resin composition of the prior art has problems such as poor linearity of high-definition pattern, poor pattern smoothness, and high outgassing.
因此,如何同时克服高精细度的图案直线性不佳、图案平滑性不佳以及高逸气性等问题以达到目前业界的要求,为本发明所属技术领域中努力研究的目标。Therefore, how to overcome the problems of poor linearity of the high-definition pattern, poor pattern smoothness, and high outgassing at the same time to meet the requirements of the current industry is an object of diligent research in the technical field to which the present invention pertains.
发明内容Summary of the invention
有鉴于此,本发明提供一种感光性树脂组成物、彩色滤光片的制造方法、彩色滤光片以及液晶显示装置,且此感光性树脂组成物的高精细度的图案直线性佳、低逸气性和图案平滑性均佳。In view of the above, the present invention provides a photosensitive resin composition, a method of producing a color filter, a color filter, and a liquid crystal display device, and the high-definition pattern of the photosensitive resin composition has good linearity and low linearity. Both outgassing and pattern smoothness are good.
本发明的感光性树脂组成物包括碱可溶性树脂(A)、具有乙烯性不饱和基的化合物(B)、光起始剂(C)、溶剂(D)以及颜料(E)。其中,所述碱可溶性树脂(A)包括碱可溶性树脂(A-1)及碱可溶性树脂(A-2),其中,所述碱可溶性树脂(A-1)是由一混合物反应而获得,且所述混合物包括具有至少二个环氧基的环氧化合物(a-1-1)、具有至少一个羧酸基及至少一个乙烯性不饱和基的化合物(a-1-2)、四羧酸或其酸二酐(a-1-3)以及二羧酸或其酸酐(a-1-4);The photosensitive resin composition of the present invention includes an alkali-soluble resin (A), a compound (B) having an ethylenically unsaturated group, a photoinitiator (C), a solvent (D), and a pigment (E). Wherein the alkali-soluble resin (A) includes an alkali-soluble resin (A-1) and an alkali-soluble resin (A-2), wherein the alkali-soluble resin (A-1) is obtained by reacting a mixture, and The mixture includes an epoxy compound (a-1-1) having at least two epoxy groups, a compound (a-1-2) having at least one carboxylic acid group and at least one ethylenically unsaturated group, and a tetracarboxylic acid Or its acid dianhydride (a-1-3) and dicarboxylic acid or its anhydride (a-1-4);
所述具有至少二个环氧基的环氧化合物(a-1-1)具有如下式(aI-1)或下式(aI-2)所示的结构:The epoxy compound (a-1-1) having at least two epoxy groups has a structure represented by the following formula (aI-1) or the following formula (aI-2):
Figure PCTCN2015092029-appb-000001
Figure PCTCN2015092029-appb-000001
式(aI-1)中,W1、W2、W3以及W4各自为相同或不同,且独立表示氢原子、卤素原子、碳数为1至5的烷基、碳数为1至5的烷氧基、碳数为6至12的芳基或碳数为6至12的芳烷基, In the formula (aI-1), W 1 , W 2 , W 3 and W 4 are each the same or different and independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 5 carbon atoms, and a carbon number of 1 to 5. Alkoxy group, aryl group having 6 to 12 carbon atoms or aralkyl group having 6 to 12 carbon atoms,
Figure PCTCN2015092029-appb-000002
Figure PCTCN2015092029-appb-000002
式(aI-2)中,W5至W18各自为相同或不同,且独立表示氢原子、卤素原子、碳数为1至8的烷基或碳数为6至15的芳香基,s表示0至10的整数;In the formula (aI-2), W 5 to W 18 are each the same or different and independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 8 carbon atoms or an aromatic group having 6 to 15 carbon atoms, and s represents An integer from 0 to 10;
所述碱可溶性树脂(A-1)的数量平均分子量为1000~8000;The number average molecular weight of the alkali-soluble resin (A-1) is from 1,000 to 8,000;
所述碱可溶性树脂(A-2)是由不饱和羧酸或不饱和羧酸酐化合物(a-2-1)、含脂环式碳氢基的不饱和化合物(a-2-2)及其它不饱和化合物(a-2-3)共聚合而得;The alkali-soluble resin (A-2) is an unsaturated carboxylic acid or unsaturated carboxylic anhydride compound (a-2-1), an alicyclic hydrocarbon group-containing unsaturated compound (a-2-2), and the like. Unsaturated compound (a-2-3) obtained by copolymerization;
所述碱可溶性树脂(A-2)的重量平均分子量为3000~30000;The alkali-soluble resin (A-2) has a weight average molecular weight of 3,000 to 30,000;
所述碱可溶性树脂(A-1)与所述碱可溶性树脂(A-2)的使用量的重量比值范围(A-1)/(A-2)为5/95至95/5;The weight ratio range (A-1) / (A-2) of the amount of the alkali-soluble resin (A-1) to the alkali-soluble resin (A-2) is 5/95 to 95/5;
所述光起始剂(C)包括由式(1)表示的光起始剂(C-1);The photoinitiator (C) comprises a photoinitiator (C-1) represented by formula (1);
Figure PCTCN2015092029-appb-000003
Figure PCTCN2015092029-appb-000003
其中R1、R2、R3、R4、R5、R6、R7及R8彼此独立地为氢、C1-C20烷基、COR16、OR17、卤素、NO2、由式(2)所表示的基团或是由式(3)所表示的基团、Wherein R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 and R 8 are each independently hydrogen, C 1 -C 20 alkyl, COR 16 , OR 17 , halogen, NO 2 , The group represented by the formula (2) is a group represented by the formula (3),
Figure PCTCN2015092029-appb-000004
Figure PCTCN2015092029-appb-000004
Figure PCTCN2015092029-appb-000005
Figure PCTCN2015092029-appb-000005
或R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8彼此独立地为经由式(4)所表示的基团取代的C2-C10烯基Or R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 are each independently a group represented by the formula (4). Substituted C 2 -C 10 alkenyl
Figure PCTCN2015092029-appb-000006
Figure PCTCN2015092029-appb-000006
或R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8彼此独立地共同为—(CH2)p—Y—(CH2)q—;Or R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 are each independently taken as —(CH 2 ) p —Y— (CH 2 ) q —;
或R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8彼此独立地共同为式(5)所表示的基团;Or R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 are each independently a group represented by the formula (5) ;
Figure PCTCN2015092029-appb-000007
Figure PCTCN2015092029-appb-000007
但条件为R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8中的至少一对是由式(5)所表示的基团,However, at least one of R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 is determined by the formula (5). The group represented,
R9、R10、R11及R12彼此独立地为氢、C1-C20烷基,该C1-C20烷基是未经取代或经一或多个以下基团取代:卤素、苯基、CN、OH、SH、C1-C4-烷氧基、-(CO)OH或-(CO)O-(C1-C4烷基);R 9, R 10, R 11 and R 12 are independently hydrogen, C 1 -C 20 alkyl, C 1 -C 20 alkyl which is unsubstituted or substituted with one or more of the following groups to one another: halo, Phenyl, CN, OH, SH, C 1 -C 4 -alkoxy, -(CO)OH or -(CO)O-(C 1 -C 4 alkyl);
或R9、R10、R11及R12彼此独立地为未经取代的苯基或经一或多个以下基团取代的苯基:C1-C6烷基、卤素、CN、OR17、SR18或NR19R20Or R 9 , R 10 , R 11 and R 12 are, independently of each other, an unsubstituted phenyl group or a phenyl group substituted by one or more of the following groups: C 1 -C 6 alkyl, halogen, CN, OR 17 , SR 18 or NR 19 R 20 ;
或R9、R10、R11及R12彼此独立地为卤素、CN、OR17、SR18、SOR18、SO2R18或NR19R20,其中该等取代基OR17、SR18或NR19R20视情况经由该等基团R17、R18、R19和/或R20与萘基环中一个碳原子形成5元或6元环; Or R 9 , R 10 , R 11 and R 12 are, independently of each other, halogen, CN, OR 17 , SR 18 , SOR 18 , SO 2 R 18 or NR 19 R 20 , wherein the substituents OR 17 , SR 18 or NR 19 R 20 optionally forms a 5- or 6-membered ring via a carbon atom in the naphthyl ring via the groups R 17 , R 18 , R 19 and/or R 20 ;
或R9、R10、R11及R12彼此独立地为COR16NO2或式(2)所表示的基团、Or R 9 , R 10 , R 11 and R 12 are each independently a group represented by COR 1 , 6 NO 2 or formula (2),
Figure PCTCN2015092029-appb-000008
Figure PCTCN2015092029-appb-000008
Y表示O、S、NR26或直接键;Y represents O, S, NR 26 or a direct bond;
p表示整数0、1、2或3;p represents an integer of 0, 1, 2 or 3;
q表示整数1、2或3;q represents an integer of 1, 2 or 3;
X表示CO或直接键;X represents CO or a direct bond;
R13表示C1-C20烷基,其是未经取代或经一或多个以下基团取代:卤素、R17、COOR17、OR17、SR18、CONR19R20、NR19R20、PO(OCkH2k+1)2或是式(6)所表示的基团;R 13 represents a C 1 -C 20 alkyl group which is unsubstituted or substituted with one or more of the following groups: halogen, R 17 , COOR 17 , OR 17 , SR 18 , CONR 19 R 20 , NR 19 R 20 , PO(OC k H 2k+1 ) 2 or a group represented by the formula (6);
Figure PCTCN2015092029-appb-000009
Figure PCTCN2015092029-appb-000009
或R13表示C2-C20烷基,其间杂有一或多个O、S、SO、SO2、NR26或CO,或是C2-C12烯基,其是未经间杂或间杂有一或多个O、CO或NR26,其中该经间杂的C2-C20烷基及该未经间杂或经间杂的C2-C12烯基是未经取代或经一或多个卤素取代;Or R 13 represents a C 2 -C 20 alkyl group, interspersed with one or more of O, S, SO, SO 2 , NR 26 or CO, or a C 2 -C 12 alkenyl group which is unintercalated or heterozygous Or a plurality of O, CO or NR 26 , wherein the meta-hetero C 2 -C 20 alkyl group and the unmeta- or inter-hetero C 2 -C 12 alkenyl group are unsubstituted or substituted by one or more halogens ;
或R13表示C4-C8环烯基、C2-C12炔基或未经间杂或间杂有一或多个O、S、CO或NR26的C3-C10环烷基;Or R 13 represents C 4 -C 8 cycloalkenyl, C 2 -C 12 alkynyl or C 3 -C 10 cycloalkyl having no or hetero or one or more O, S, CO or NR 26 ;
或R13表示苯基或萘基,其各为未经取代或经一或多个以下基团取代:OR17、SR18、NR19R20、COR16、CN、NO2、卤素、C1-C20烷基、C1-C4卤代烷基、间杂有一或多个O、S、CO或NR26的C2-C20烷基或式(7)表示的基团、Or R 13 represents phenyl or naphthyl, each of which is unsubstituted or substituted with one or more of the following groups: OR 17 , SR 18 , NR 19 R 20 , COR 16 , CN, NO 2 , halogen, C 1 a C 2 alkyl group, a C 1 -C 4 haloalkyl group, a C 2 -C 20 alkyl group having one or more O, S, CO or NR 26 or a group represented by the formula (7),
Figure PCTCN2015092029-appb-000010
Figure PCTCN2015092029-appb-000010
或其各经C3-C10环烷基或间杂有一或多个O、S、CO或NR26的C3-C10环烷基取代;Each warp or C 3 -C 10 cycloalkyl, or interrupted by one or more O, S, CO or NR C 3 26 -C 10 cyclic group is unsubstituted;
k表示整数1至10;k represents an integer of 1 to 10;
R14表示氢、C3-C8环烷基、C2-C5烯基、C1-C20烷氧基或C1-C20烷基, 其是未经取代或经一或多个以下基团取代:卤素、苯基、C1-C20烷基苯基或CN;R 14 represents hydrogen, C 3 -C 8 cycloalkyl, C 2 -C 5 alkenyl, C 1 -C 20 alkoxy or C 1 -C 20 alkyl, which is unsubstituted or one or more Substituted by: halogen, phenyl, C 1 -C 20 alkylphenyl or CN;
或R14表示苯基或萘基,其各未经取代或经一或多个以下基团取代:C1-C6烷基、C1-C4卤代烷基、卤素、CN、OR17、SR18和/或NR19R20Or R 14 represents phenyl or naphthyl, each of which is unsubstituted or substituted with one or more of the following groups: C 1 -C 6 alkyl, C 1 -C 4 haloalkyl, halogen, CN, OR 17 , SR 18 and / or NR 19 R 20 ;
或R14表示C3-C20杂芳基、C1-C8烷氧基、苄氧基或苯氧基,该苄氧基及苯氧基是未经取代或经一或多个以下基团取代:C1-C6烷基、C1-C4卤代烷基和/或卤素;Or R 14 represents a C 3 -C 20 heteroaryl group, a C 1 -C 8 alkoxy group, a benzyloxy group or a phenoxy group, the benzyloxy group and the phenoxy group being unsubstituted or having one or more of the following groups Group substituted: C 1 -C 6 alkyl, C 1 -C 4 haloalkyl and/or halogen;
R15表示C6-C20芳基或C3-C20杂芳基,其各是未经取代或经一或多个以下基团取代:苯基、卤素、C1-C4卤代烷基、CN、NO2、OR17、SR18、NR19R20、PO(OCkH2k+1)2、SO-C1-C10烷基、SO2-C1-C10烷基、间杂有一或多个O、S或NR26的C2-C20烷基;或其各经C1-C20烷基取代,该C1-C20烷基是未经取代或经一或多个以下基团取代:卤素、COOR17、CONR19R20、苯基、C3-C8环烷基、C3-C20杂芳基、C6-C20芳氧基羰基、C3-C20杂芳氧基羰基、OR17、SR18或NR19R20R 15 represents a C 6 -C 20 aryl group or a C 3 -C 20 heteroaryl group, each of which is unsubstituted or substituted with one or more of the following groups: phenyl, halogen, C 1 -C 4 haloalkyl, CN, NO 2 , OR 17 , SR 18 , NR 19 R 20 , PO(OC k H 2k+1 ) 2 , SO-C 1 -C 10 alkyl, SO 2 -C 1 -C 10 alkyl, heterogeneous C 2 -C 20 alkyl group or a plurality of O, S or NR 26; or a C 1 -C 20 via respective substituted alkyl, C 1 -C 20 alkyl which is unsubstituted or substituted with one or more of the following Group substitution: halogen, COOR 17 , CONR 19 R 20 , phenyl, C 3 -C 8 cycloalkyl, C 3 -C 20 heteroaryl, C 6 -C 20 aryloxycarbonyl, C 3 -C 20 Heteroaryloxycarbonyl, OR 17 , SR 18 or NR 19 R 20 ;
或R15表示氢、C2-C12烯基、未经间杂或间杂有一或多个O、CO或NR26的C3-C8环烷基;或R15表示C1-C20烷基,其是未经取代或经一或多个以下基团取代:卤素、OR17、SR18、C3-C8环烷基、C3-C20杂芳基、C6-C20芳氧基羰基、C3-C20杂芳氧基羰基、NR19R20、COOR17、CONR19R20、PO(OCkH2k+1)2、苯基、式(6)所表示的基团或式(8)所表示的基团、Or R 15 represents hydrogen, C 2 -C 12 alkenyl, C 3 -C 8 cycloalkyl having no or hetero or one or more O, CO or NR 26 ; or R 15 represents C 1 -C 20 alkyl , which is unsubstituted or substituted with one or more of the following groups: halogen, OR 17 , SR 18 , C 3 -C 8 cycloalkyl, C 3 -C 20 heteroaryl, C 6 -C 20 aryloxy a group represented by a carbonyl group, a C 3 -C 20 heteroaryloxycarbonyl group, NR 19 R 20 , COOR 17 , CONR 19 R 20 , PO(OC k H 2k+1 ) 2 , a phenyl group, and a formula (6) Or a group represented by the formula (8),
Figure PCTCN2015092029-appb-000011
Figure PCTCN2015092029-appb-000011
或该C1-C20烷基是经苯基取代,该苯基是经卤素、C1-C20烷基、C1-C4卤代烷基、OR17、SR18或NR19R20取代;Or the C 1 -C 20 alkyl group is substituted by a phenyl group which is substituted by halogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, OR 17 , SR 18 or NR 19 R 20 ;
或R15表示C2-C20烷基,其间杂有一或多个O、SO或SO2,且该经间杂的C2-C20烷基是未经取代或经一或多个以下基团取代:卤素、OR17、COOR17、CONR19R20、苯基或经OR17、SR18或NR19R20取代的苯基;Or R 15 represents a C 2 -C 20 alkyl group in which one or more O, SO or SO 2 are heterogeneous, and the inter-hetero C 2 -C 20 alkyl group is unsubstituted or has one or more of the following groups Substituted: halogen, OR 17 , COOR 17 , CONR 19 R 20 , phenyl or phenyl substituted by OR 17 , SR 18 or NR 19 R 20 ;
或R15表示C2-C20烷酰基或苯甲酰基,其是未经取代或经一或多个以下基团取代:C1-C6烷基、卤素、苯基、OR17、SR18或NR19R20;或R15表示未经取代或经一或多个OR17取代的萘甲酰基或是C3-C14杂芳基羰基;Or R 15 represents a C 2 -C 20 alkanoyl or benzoyl group which is unsubstituted or substituted with one or more of the following groups: C 1 -C 6 alkyl, halogen, phenyl, OR 17 , SR 18 Or NR 19 R 20 ; or R 15 represents a naphthoyl group which is unsubstituted or substituted with one or more OR 17 or a C 3 -C 14 heteroarylcarbonyl group;
或R15表示C2-C12烷氧基羰基,其是未经间杂或间杂有一或多个O且该经间杂或未经间杂的C2-C12烷氧基羰基是未经取代或经一或多个羟基取代; Or R 15 represents a C 2 -C 12 alkoxycarbonyl group which is undoped or inter-hetero-doped with one or more O and the inter- or un-doped C 2 -C 12 alkoxycarbonyl group is unsubstituted or One or more hydroxyl substitutions;
或R15表示苯氧基羰基,其是未经取代或经一或多个以下基团取代:C1-C6烷基、卤素、C1-C4卤代烷基、苯基、OR17、SR18或NR19R20Or R 15 represents a phenoxycarbonyl group which is unsubstituted or substituted with one or more of the following groups: C 1 -C 6 alkyl, halogen, C 1 -C 4 haloalkyl, phenyl, OR 17 , SR 18 or NR 19 R 20 ;
或R15表示CN、CONR19R20、NO2、C1-C4卤代烷基、S(O)m-C1-C6烷基、未经取代或经C1-C12烷基或SO2-C1-C6烷基取代的S(O)m-苯基;Or R 15 represents CN, CONR 19 R 20 , NO 2 , C 1 -C 4 haloalkyl, S(O) m -C 1 -C 6 alkyl, unsubstituted or C 1 -C 12 alkyl or SO 2- C 1 -C 6 alkyl-substituted S(O) m -phenyl;
或R15表示SO2O-苯基,其是未经取代或经C1-C12烷基取代;或是二苯基膦酰基或二-(C1-C4烷氧基)-膦酰基;Or R 15 represents an SO 2 O-phenyl group which is unsubstituted or substituted by a C 1 -C 12 alkyl group; or a diphenylphosphono group or a di-(C 1 -C 4 alkoxy)-phosphono group ;
m表示1或2;m represents 1 or 2;
R'14具有针对R14所给出含义中的一个;R' 14 has one of the meanings given for R 14 ;
R'15具有针对R15所给出含义中的一个;R' 15 has one of the meanings given for R 15 ;
X1表示O、S、SO或SO2X 1 represents O, S, SO or SO 2 ;
X2表示O、CO、S或直接键;X 2 represents O, CO, S or a direct bond;
R16表示C6-C20芳基或C3-C20杂芳基,其各是未经取代或经一或多个以下基团取代:苯基、卤素、C1-C4卤代烷基、CN、NO2、OR17、SR18、NR19R20或间杂有一或多个O、S或NR26的C1-C20烷基;或其各经一或多个C1-C20烷基取代,该C1-C20烷基是未经取代或经一或多个以下基团取代:卤素、COOR17、CONR19R20、苯基、C3-C8环烷基、C3-C20杂芳基、C6-C20芳氧基羰基、C3-C20杂芳氧基羰基、OR17、SR18或NR19R20R 16 represents a C 6 -C 20 aryl group or a C 3 -C 20 heteroaryl group, each of which is unsubstituted or substituted with one or more of the following groups: phenyl, halogen, C 1 -C 4 haloalkyl, CN, NO 2 , OR 17 , SR 18 , NR 19 R 20 or a C 1 -C 20 alkyl group having one or more O, S or NR 26 ; or each of one or more C 1 -C 20 alkane Substituted, the C 1 -C 20 alkyl group is unsubstituted or substituted with one or more of the following groups: halogen, COOR 17 , CONR 19 R 20 , phenyl, C 3 -C 8 cycloalkyl, C 3 -C 20 heteroaryl, C 6 -C 20 aryloxycarbonyl, C 3 -C 20 heteroaryloxycarbonyl, OR 17 , SR 18 or NR 19 R 20 ;
或R16表示氢、C1-C20烷基,该C1-C20烷基是未经取代或经一或多个以下基团取代:卤素、苯基、OH、SH、CN、C3-C6烯氧基、OCH2CH2CN、OCH2CH2(CO)O(C1-C4)烷基、O(CO)-(C1-C4烷基)、O(CO)-苯基、(CO)OH或(CO)O(C1-C4烷基);Or R 16 represents hydrogen, C 1 -C 20 alkyl, C 1 -C 20 alkyl which is unsubstituted or substituted with one or more of the following groups: halogen, phenyl, OH, SH, CN, C 3 -C 6 alkenyloxy, OCH 2 CH 2 CN, OCH 2 CH 2 (CO)O(C 1 -C 4 )alkyl, O(CO)-(C 1 -C 4 alkyl), O(CO) -phenyl, (CO)OH or (CO)O(C 1 -C 4 alkyl);
或R16表示C2-C12烷基,其间杂有一或多个O、S或NR26;或R16表示(CH2CH2O)n+1H、(CH2CH2O)n(CO)-(C1-C8烷基)、C2-C12烯基或C3-C8环烷基;Or R 16 represents a C 2 -C 12 alkyl group in which one or more O, S or NR 26 are heterogeneous; or R 16 represents (CH 2 CH 2 O) n+1 H, (CH 2 CH 2 O) n ( CO)-(C 1 -C 8 alkyl), C 2 -C 12 alkenyl or C 3 -C 8 cycloalkyl;
或R16表示经SR18取代的苯基,其中该基团R18表示键结至该COR16基团所附接的该咔唑部分的该苯基或萘基环的直接键;Or R 16 represents a phenyl substituted with SR 18 , wherein the group R 18 represents a direct bond to the phenyl or naphthyl ring of the oxazole moiety to which the COR 16 group is attached;
n表示1至20;n represents 1 to 20;
R17表示氢、苯基-C1-C3烷基、C1-C20烷基,其是未经取代或经一或多个以下基团取代:卤素、OH、SH、CN、C3-C6烯氧基、OCH2CH2CN、OCH2CH2(CO)O(C1-C4烷基)、O(CO)-(C1-C4烷基)、O(CO)-(C2-C4)烯基、O(CO)-苯基、(CO)OH、(CO)O(C1-C4烷基)、C3-C20环烷基、SO2-(C1-C4卤代烷基)、 O(C1-C4卤代烷基)或间杂有一或多个O的C3-C20环烷基;R 17 represents hydrogen, phenyl-C 1 -C 3 alkyl, C 1 -C 20 alkyl, which is unsubstituted or substituted with one or more of the following groups: halogen, OH, SH, CN, C 3 -C 6 alkenyloxy, OCH 2 CH 2 CN, OCH 2 CH 2 (CO)O(C 1 -C 4 alkyl), O(CO)-(C 1 -C 4 alkyl), O(CO) -(C 2 -C 4 )alkenyl, O(CO)-phenyl, (CO)OH, (CO)O(C 1 -C 4 alkyl), C 3 -C 20 cycloalkyl, SO 2 - (C 1- C 4 haloalkyl), O(C 1 -C 4 haloalkyl) or a C 3 -C 20 cycloalkyl having one or more O;
或R17表示C2-C20烷基,其间杂有一或多个O、S或NR26Or R 17 represents C 2 -C 20 alkyl, in which one or more O, S or NR 26 are heterogeneous;
或R17表示(CH2CH2O)n+1H、(CH2CH2O)n(CO)-(C1-C8烷基)、C1-C8烷酰基、C2-C12烯基、C3-C6烯酰基或未经间杂或间杂有一或多个O、S、CO或NR26的C3-C20环烷基;Or R 17 represents (CH 2 CH 2 O) n+1 H, (CH 2 CH 2 O) n (CO)-(C 1 -C 8 alkyl), C 1 -C 8 alkanoyl, C 2 -C a 12 -alkenyl, C 3 -C 6 enoyl group or a C 3 -C 20 cycloalkyl group having no or hetero or one or more O, S, CO or NR 26 ;
或R17表示C1-C8烷基-C3-C10环烷基,其是未经间杂或间杂有一或多个O;Or R 17 represents a C 1 -C 8 alkyl-C 3 -C 10 cycloalkyl group which is undoped or hetero-has one or more O;
或R17表示苯甲酰基,其是未经取代或经一或多个C1-C6烷基、卤素、OH或C1-C3烷氧基取代;Or R 17 represents a benzoyl group which is unsubstituted or substituted by one or more C 1 -C 6 alkyl groups, halogen, OH or C 1 -C 3 alkoxy groups;
或R17表示苯基、萘基或C3-C20杂芳基,其各是未经取代或经一或多个以下基团取代:卤素、OH、C1-C12烷基、C1-C12烷氧基、CN、NO2、苯基-C1-C3烷氧基、苯氧基、C1-C12烷基硫基、苯基硫基、N(C1-C12烷基)2、二苯基-胺基或式(7)所表示的基团;Or R 17 represents phenyl, naphthyl or C 3 -C 20 heteroaryl, each of which is unsubstituted or substituted with one or more of the following groups: halogen, OH, C 1 -C 12 alkyl, C 1 -C 12 alkoxy, CN, NO 2 , phenyl-C 1 -C 3 alkoxy, phenoxy, C 1 -C 12 alkylthio, phenylthio, N (C 1 -C 12 An alkyl) 2 , a diphenyl-amine group or a group represented by the formula (7);
Figure PCTCN2015092029-appb-000012
Figure PCTCN2015092029-appb-000012
或R17形成键结至该具有由式(2)所表示的基团、或是式(7)所表示的基团所处的苯基或萘基环的其中一个碳原子的直接键、Or R 17 forms a direct bond bonded to one of the carbon atoms of the phenyl or naphthyl ring in which the group represented by the formula (2) or the group represented by the formula (7) is bonded,
Figure PCTCN2015092029-appb-000013
Figure PCTCN2015092029-appb-000013
R18表示氢、C2-C12烯基、C3-C20环烷基或苯基-C1-C3烷基,其中该C2-C12烯基、C3-C20环烷基或苯基-C1-C3烷基是未经间杂或间杂有一或多个O、S、CO、NR26或COOR17;或R18是C1-C20烷基,其是未经取代或经一或多个以下基团取代:OH、SH、CN、C3-C6烯氧基、OCH2CH2CN、OCH2CH2(CO)O(C1-C4烷基)、O(CO)-(C2-C4)烯基、O(CO)-(C1-C4烷基)、O(CO)-苯基或(CO)OR17R 18 represents hydrogen, C 2 -C 12 alkenyl, C 3 -C 20 cycloalkyl or phenyl-C 1 -C 3 alkyl, wherein the C 2 -C 12 alkenyl, C 3 -C 20 naphthenic Or a phenyl-C 1 -C 3 alkyl group which has no or hetero or one or more O, S, CO, NR 26 or COOR 17 ; or R 18 is a C 1 -C 20 alkyl group which is not Substituted or substituted with one or more of the following groups: OH, SH, CN, C 3 -C 6 alkenyloxy, OCH 2 CH 2 CN, OCH 2 CH 2 (CO)O (C 1 -C 4 alkyl) , O(CO)-(C 2 -C 4 )alkenyl, O(CO)-(C 1 -C 4 alkyl), O(CO)-phenyl or (CO)OR 17 ;
或R18表示C2-C20烷基,其间杂有一或多个O、S、CO、NR26或COOR17Or R 18 represents a C 2 -C 20 alkyl group with one or more O, S, CO, NR 26 or COOR 17 interspersed therebetween;
或R18表示(CH2CH2O)nH、(CH2CH2O)n(CO)-(C1-C8烷基)、C2-C8烷酰基或C3-C6烯酰基; Or R 18 represents (CH 2 CH 2 O) n H, (CH 2 CH 2 O) n (CO)-(C 1 -C 8 alkyl), C 2 -C 8 alkanoyl or C 3 -C 6 olefin Acyl group
或R18表示苯甲酰基,其是未经取代或经一或多个以下基团取代:C1-C6烷基、卤素、OH、C1-C4烷氧基或C1-C4烷基硫基;Or R 18 represents a benzoyl group which is unsubstituted or substituted with one or more of the following groups: C 1 -C 6 alkyl, halogen, OH, C 1 -C 4 alkoxy or C 1 -C 4 Alkylthio group;
或R18表示苯基、萘基或C3-C20杂芳基,其各是未经取代或经一或多个以下基团取代:卤素、C1-C12烷基、C1-C4卤代烷基、C1-C12烷氧基、CN、NO2、苯基-C1-C3烷氧基、苯氧基、C1-C12烷基硫基、苯基硫基、N(C1-C12烷基)2、二苯基胺基、(CO)O(C1-C8烷基)、(CO)-C1-C8烷基、(CO)N(C1-C8烷基)2或式(7)所表示的基团Or R 18 represents phenyl, naphthyl or C 3 -C 20 heteroaryl, each of which is unsubstituted or substituted with one or more of the following groups: halogen, C 1 -C 12 alkyl, C 1 -C 4- haloalkyl, C 1 -C 12 alkoxy, CN, NO 2 , phenyl-C 1 -C 3 alkoxy, phenoxy, C 1 -C 12 alkylthio, phenylthio, N (C 1 -C 12 alkyl) 2 , diphenylamino, (CO)O(C 1 -C 8 alkyl), (CO)-C 1 -C 8 alkyl, (CO)N (C 1 -C 8 alkyl) 2 or a group represented by the formula (7)
Figure PCTCN2015092029-appb-000014
Figure PCTCN2015092029-appb-000014
R19及R20彼此独立地为氢、C1-C20烷基、C2-C4羟基烷基、C2-C10烷氧基烷基、C2-C5烯基、C3-C20环烷基、苯基-C1-C3烷基、C1-C8烷酰基、C1-C8烷酰基氧基、C3-C12烯酰基、SO2-(C1-C4卤代烷基)或苯甲酰基;R 19 and R 20 are each independently hydrogen, C 1 -C 20 alkyl, C 2 -C 4 hydroxyalkyl, C 2 -C 10 alkoxyalkyl, C 2 -C 5 alkenyl, C 3 - C 20 cycloalkyl, phenyl-C 1 -C 3 alkyl, C 1 -C 8 alkanoyl, C 1 -C 8 alkanoyloxy, C 3 -C 12 alkenoyl, SO 2 -(C 1 - C 4 haloalkyl) or benzoyl;
或R19及R20表示苯基、萘基或C3-C20杂芳基,其各是未经取代或经一或多个以下基团取代:卤素、C1-C4卤代烷基、C1-C20烷氧基、C1-C12烷基、苯甲酰基或C1-C12烷氧基;Or R 19 and R 20 represent phenyl, naphthyl or C 3 -C 20 heteroaryl, each of which is unsubstituted or substituted with one or more of the following groups: halogen, C 1 -C 4 haloalkyl, C 1- C 20 alkoxy, C 1 -C 12 alkyl, benzoyl or C 1 -C 12 alkoxy;
或R19及R20与其所附接的N原子一起形成未经间杂或间杂有O、S或NR17的5元或6元饱和或不饱和环,且该5元或6元饱和或不饱和环是未经取代或经一或多个以下基团取代:C1-C20烷基、C1-C20烷氧基、=O、OR17、SR18、NR21R22、(CO)R23、NO2、卤素、C1-C4-卤代烷基、CN、苯基、未经间杂或间杂有一或多个O、S、CO或NR17的C3-C20环烷基、或式(7)表示的基团Or R 19 and R 20 together with the N atom to which they are attached form a 5- or 6-membered saturated or unsaturated ring which is unintermixed or interspersed with O, S or NR 17 and which is either 5- or 6-membered saturated or unsaturated The ring is unsubstituted or substituted with one or more of the following groups: C 1 -C 20 alkyl, C 1 -C 20 alkoxy, =0, OR 17 , SR 18 , NR 21 R 22 , (CO) R 23 , NO 2 , halogen, C 1 -C 4 -haloalkyl, CN, phenyl, C 3 -C 20 cycloalkyl having one or more O, S, CO or NR 17 undoped or inter-hetero, or a group represented by the formula (7)
Figure PCTCN2015092029-appb-000015
Figure PCTCN2015092029-appb-000015
或R19及R20与其所附接的N原子一起形成杂芳香族环系统,该环系统是未经取代或经一或多个以下基团取代:C1-C20烷基、C1-C4卤代烷基、C1-C20烷氧基、=O、OR17、SR18、NR21R22、(CO)R23、卤素、NO2、CN、苯基或未经间杂或间杂有一或多个O、S、CO或NR17的C3-C20环烷基、或式(7)表示的基团Or R 19 and R 20 together with the N atom to which they are attached form a heteroaromatic ring system which is unsubstituted or substituted with one or more of the following groups: C 1 -C 20 alkyl, C 1 - C 4 haloalkyl, C 1 -C 20 alkoxy, =0, OR 17 , SR 18 , NR 21 R 22 , (CO)R 23 , halogen, NO 2 , CN, phenyl or uninter or hetero Or a plurality of C 3 -C 20 cycloalkyl groups of O, S, CO or NR 17 or a group represented by the formula (7)
Figure PCTCN2015092029-appb-000016
Figure PCTCN2015092029-appb-000016
R21及R22彼此独立地为氢、C1-C20烷基、C1-C4卤代烷基、C3-C10环烷基或苯基;R 21 and R 22 are each independently hydrogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, C 3 -C 10 cycloalkyl or phenyl;
或R21及R22与其所附接的N原子一起形成未经间杂或间杂有O、S或NR26的5元或6元饱和或不饱和环,且该5元或6元饱和或不饱和环是未稠合或该5元或6元饱和或不饱和环与苯环稠合;Or R 21 and R 22 together with the N atom to which they are attached form a 5- or 6-membered saturated or unsaturated ring which is unintermixed or interspersed with O, S or NR 26 and which is either 5- or 6-membered saturated or unsaturated The ring is unfused or the 5- or 6-membered saturated or unsaturated ring is fused to the benzene ring;
R23表示氢、OH、C1-C20烷基、C1-C4卤代烷基、间杂有一或多个O、CO或NR26的C2-C20烷基、未经间杂或间杂有O、S、CO或NR26的C3-C20环烷基,或R23表示苯基、萘基、苯基-C1-C4烷基、OR17、SR18或NR21R22R 23 represents hydrogen, OH, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, intervening one or more O, CO or NR 26 C 2 -C 20 alkyl, uninter or hetero-O a C 3 -C 20 cycloalkyl group of S, CO or NR 26 , or R 23 represents phenyl, naphthyl, phenyl-C 1 -C 4 alkyl, OR 17 , SR 18 or NR 21 R 22 ;
R24表示(CO)OR17、CONR19R20、(CO)R17;或R24具有针对R19及R20所给出含义中的一个;R 24 represents (CO)OR 17 , CONR 19 R 20 , (CO)R 17 ; or R 24 has one of the meanings given for R 19 and R 20 ;
R25表示COOR17、CONR19R20、(CO)R17;或R25具有针对R17所给出含义中的一个;R 25 represents COOR 17 , CONR 19 R 20 , (CO)R 17 ; or R 25 has one of the meanings given for R 17 ;
R26表示氢、C1-C20烷基、C1-C4卤代烷基、C2-C20烷基,其间杂有一或多个O或CO;或是苯基-C1-C4烷基、C3-C8环烷基,其是未经间杂或间杂有一或多个O或CO;或是(CO)R19;或是苯基,其是未经取代或经一或多个以下基团取代:C1-C20烷基、卤素、C1-C4卤代烷基、OR17、SR18、NR19R20或式(7)表示的基团R 26 represents hydrogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, C 2 -C 20 alkyl with one or more O or CO in between; or phenyl-C 1 -C 4 alkane a C 3 -C 8 cycloalkyl group which is undoped or heterozygous with one or more O or CO; or (CO)R 19 ; or a phenyl group which is unsubstituted or one or more Substituted by: C 1 -C 20 alkyl, halogen, C 1 -C 4 haloalkyl, OR 17 , SR 18 , NR 19 R 20 or a group represented by formula (7)
Figure PCTCN2015092029-appb-000017
Figure PCTCN2015092029-appb-000017
但条件为在该分子中存在至少一个式(2)或是式(7)所表示的基团However, the condition is that at least one group represented by formula (2) or formula (7) is present in the molecule.
Figure PCTCN2015092029-appb-000018
Figure PCTCN2015092029-appb-000018
在本发明的一实施例中,所述由式(1)表示的光起始剂(C-1)中,R-1、R2、R3、R4、R5、R6、R7及R8彼此独立地为氢、C1-C20烷基、COR16、NO2或由式(2)表示的基团; In an embodiment of the invention, in the photoinitiator (C-1) represented by the formula (1), R -1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 And R 8 are each independently hydrogen, C 1 -C 20 alkyl, COR 16 , NO 2 or a group represented by formula (2);
Figure PCTCN2015092029-appb-000019
Figure PCTCN2015092029-appb-000019
或R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8彼此独立地共同为式(5)所表示的基团;Or R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 are each independently a group represented by the formula (5) ;
Figure PCTCN2015092029-appb-000020
Figure PCTCN2015092029-appb-000020
但条件为R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8中的至少一对是由式(5)所表示的基团;However, at least one of R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 is determined by the formula (5). a group represented;
X表示CO或直接键;X represents CO or a direct bond;
R-13表示C-1-C20烷基,其是未经取代或经一或多个以下基团取代:卤素、OR-17、SR18、COOR17、CONR19R20或PO(OCkH2k+1)2R -13 represents C -1 -C 20 alkyl which is unsubstituted or substituted with one or more of the following groups: halogen, OR- 17 , SR 18 , COOR 17 , CONR 19 R 20 or PO (OC k H 2k+1 ) 2 ;
或R13表示C2-C20烷基,其间杂有一或多个O、S、NR26或CO;Or R 13 represents a C 2 -C 20 alkyl group, interspersed with one or more O, S, NR 26 or CO;
或R13表示苯基或萘基,此二个是未经取代或经COR16取代或由一或多个式(7)表示的基团取代;Or R 13 represents a phenyl or naphthyl group, and the two are unsubstituted or substituted by COR 16 or substituted by one or more groups represented by formula (7);
Figure PCTCN2015092029-appb-000021
Figure PCTCN2015092029-appb-000021
R-14表示C1-C20烷基、苯基或C1-C8烷氧基;R - 14 represents a C 1 -C 20 alkyl group, a phenyl group or a C 1 -C 8 alkoxy group;
R15表示苯基、萘基、C3-C20杂芳基,其各是未经取代或经一或多个以下基团取代:苯基、卤素、C1-C4卤代烷基、OR17、SR18或C2-C20烷基,其间杂有一或多个O或S;或其各经一或多个C1-C20烷基取代,该C1-C20烷基是未经取代或经一或多个以下基团取代:卤素、COOR17、CONR19R20、苯基、C3-C8环烷基、C3-C20杂芳基、C6-C20芳氧基羰基、C4-C20杂芳氧基羰基、OR17、SR18、NR19R20或PO(OCkH2k+1)2R 15 represents a phenyl group, a naphthyl group, a C 3 -C 20 heteroaryl group, each of which is unsubstituted or substituted with one or more of the following groups: phenyl, halogen, C 1 -C 4 haloalkyl, OR 17 An SR 18 or C 2 -C 20 alkyl group having one or more O or S hetero; or each of which is substituted by one or more C 1 -C 20 alkyl groups, the C 1 -C 20 alkyl group being unsubstituted Substituted or substituted with one or more of the following groups: halogen, COOR 17 , CONR 19 R 20 , phenyl, C 3 -C 8 cycloalkyl, C 3 -C 20 heteroaryl, C 6 -C 20 aryloxy Alkylcarbonyl, C 4 -C 20 heteroaryloxycarbonyl, OR 17 , SR 18 , NR 19 R 20 or PO(OC k H 2k+1 ) 2 ;
或R15表示C1-C20烷基,其是未经取代或经一或多个以下基团取代:OR17、SR18、C3-C8环烷基、C3-C20杂芳基、NR19R20、COOR17、CONR19R20或PO(OCkH2k+1)2Or R 15 represents a C 1 -C 20 alkyl group which is unsubstituted or substituted with one or more of the following groups: OR 17 , SR 18 , C 3 -C 8 cycloalkyl, C 3 -C 20 heteroaryl Base, NR 19 R 20 , COOR 17 , CONR 19 R 20 or PO(OC k H 2k+1 ) 2 ;
R'14具有针对R14所给出含义中的一个; R' 14 has one of the meanings given for R 14 ;
R'15具有针对R15所给出含义中的一个;R' 15 has one of the meanings given for R 15 ;
R16表示苯基,其是未经取代或经一或多个以下基团取代:OR17、SR18、NR19R20或间杂有一或多个O、S或NR26的C2-C20烷基;R 16 represents a phenyl group which is unsubstituted or substituted with one or more of the following groups: OR 17 , SR 18 , NR 19 R 20 or a C 2 -C 20 having one or more O, S or NR 26 interstitial alkyl;
或R16表示苯基,其是经一或多个C1-C20烷基取代,该C1-C20烷基是未经取代或经一或多个以下基团取代:卤素、COOR17、CONR19R20、苯基、C3-C8环烷基、C3-C20杂芳基、C6-C20芳氧基羰基、C4-C20杂芳氧基羰基、OR17、SR18或NR19R20Or R 16 represents phenyl which is substituted with one or more C 1 -C 20 alkyl, C 1 -C 20 alkyl which is unsubstituted or is substituted with one or more of the following radicals: halogen, COOR 17 , CONR 19 R 20 , phenyl, C 3 -C 8 cycloalkyl, C 3 -C 20 heteroaryl, C 6 -C 20 aryloxycarbonyl, C 4 -C 20 heteroaryloxycarbonyl, OR 17 , SR 18 or NR 19 R 20 ;
或R16表示C1-C20烷基,其是未经取代或经以下基团取代:卤素、苯基、OH、SH、CN、C3-C6烯氧基、OCH2CH2(CO)O(C1-C4烷基)、O(CO)-(C1-C4烷基)或(CO)O(C1-C4烷基);Or R 16 represents C 1 -C 20 alkyl, which is unsubstituted or substituted by halogen, phenyl, OH, SH, CN, C 3 -C 6 alkenyloxy, OCH 2 CH 2 (CO O(C 1 -C 4 alkyl), O(CO)-(C 1 -C 4 alkyl) or (CO)O(C 1 -C 4 alkyl);
R-17表示C1-C20烷基,其是未经取代或经一或多个以下基团取代:卤素、OCH2CH2(CO)O(C1-C4烷基)、O(C1-C4烷基)、(CO)O(C1-C4烷基)、C3-C20环烷基或间杂有一或多个O的C3-C20环烷基;R -17 represents a C 1 -C 20 alkyl group which is unsubstituted or substituted with one or more of the following groups: halogen, OCH 2 CH 2 (CO)O(C 1 -C 4 alkyl), O ( C 1 -C 4 alkyl), (CO) O (C 1 -C 4 alkyl), C 3 -C 20 cycloalkyl interrupted by one or more O or a C 3 -C 20 cycloalkyl;
或R17表示C2-C20烷基,其间杂有一或多个O;Or R 17 represents a C 2 -C 20 alkyl group, in which one or more O;
R18表示经COOR17取代的甲基;R 18 represents a methyl group substituted by COOR 17 ;
R19及R20彼此独立地为氢、苯基、C1-C20烷基、C1-C8烷酰基或C1-C8烷酰基氧基;R 19 and R 20 are each independently hydrogen, phenyl, C 1 -C 20 alkyl, C 1 -C 8 alkanoyl or C 1 -C 8 alkanoyloxy;
或R19及R20与其所附接的N原子一起形成杂芳香族环系统,该环系统是未经取代或经由式(7)表示的基团取代;Or R 19 and R 20 together with the N atom to which they are attached form a heteroaromatic ring system which is unsubstituted or substituted via a group represented by formula (7);
Figure PCTCN2015092029-appb-000022
Figure PCTCN2015092029-appb-000022
但条件为在该分子中存在至少一个式(2)或是式(7)所表示的基团However, the condition is that at least one group represented by formula (2) or formula (7) is present in the molecule.
Figure PCTCN2015092029-appb-000023
Figure PCTCN2015092029-appb-000023
在本发明的一实施例中,所述由式(1)表示的光起始剂(C-1)中,R1、R2、R3、R4、R5、R6、R7及R8彼此独立地为氢,或R1及R2、R3及R4或R5 及R6彼此独立地共同为式(5)所表示的基团;In one embodiment of the present invention, in the photoinitiator (C-1) represented by the formula (1), R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 and R 8 is independently hydrogen, or R 1 and R 2 , R 3 and R 4 or R 5 and R 6 are each independently a group represented by the formula (5);
Figure PCTCN2015092029-appb-000024
Figure PCTCN2015092029-appb-000024
但条件为R1及R2、R3及R4或R5及R6中的至少一对是由式(5)所表示的基团;However, at least one of R 1 and R 2 , R 3 and R 4 or R 5 and R 6 is a group represented by the formula (5);
或R2表示COR16、NO2或是由式(2)所表示的基团或是由式(3)所表示的基团;Or R 2 represents COR 16, NO 2 or by formula (2) or a group represented by the formula (3) a group represented by;
Figure PCTCN2015092029-appb-000025
Figure PCTCN2015092029-appb-000025
或R7表示COR16或是由式(2)所表示的基团;Or R 7 represents COR 16 or a group represented by formula (2);
R9、R11及R12表示氢;R 9 , R 11 and R 12 represent hydrogen;
R-10表示氢、OR17或COR16R- 10 represents hydrogen, OR 17 or COR 16 ;
X表示CO或直接键;X represents CO or a direct bond;
R13表示C1-C20烷基,其是未经取代或经一或多个以下基团取代:卤素、R17、OR17、SR18或PO(OCkH2k+1)2R 13 represents a C 1 -C 20 alkyl group which is unsubstituted or substituted with one or more of the following groups: halogen, R 17 , OR 17 , SR 18 or PO(OC k H 2k+1 ) 2 ;
或R13表示C2-C20烷基,其间杂有一或多个O;Or R 13 represents a C 2 -C 20 alkyl group, in which one or more O;
或R13表示苯基;Or R 13 represents a phenyl group;
k表示整数2;k represents an integer 2;
R14表示C1-C20烷基或噻吩基; R 14 represents a C 1 -C 20 alkyl group or a thienyl group;
R15表示苯基或萘基,其各是未经取代或经一或多个OR17或C1-C20烷基取代;R 15 represents phenyl or naphthyl, each of which is unsubstituted or substituted with one or more OR 17 or C 1 -C 20 alkyl groups;
或R15表示噻吩基、氢、C1-C20烷基,该C1-C20烷基是未经取代或经一或多个以下基团取代:OR17、SR18、C3-C8环烷基、NR19R20或COOR17Or R 15 represents a thiophene group, hydrogen, C 1 -C 20 alkyl, C 1 -C 20 alkyl which is unsubstituted or substituted with one or more of the following groups: OR 17, SR 18, C 3 -C 8 -cycloalkyl, NR 19 R 20 or COOR 17 ;
或R15表示C2-C20烷基,其间杂有SO2Or R 15 represents a C 2 -C 20 alkyl group, interspersed with SO 2 ;
R16表示苯基或萘基,其各是未经取代或经一或多个以下基团取代:OR17、SR18、NR19R20或C1-C20烷基;R 16 represents a phenyl or naphthyl group, each of which is unsubstituted or substituted with one or more of the following groups: OR 17 , SR 18 , NR 19 R 20 or C 1 -C 20 alkyl;
或R16表示噻吩基;Or R 16 represents a thienyl group;
R17表示氢、C1-C8烷酰基、C1-C20烷基,该C1-C20烷基是未经取代或经一或多个以下基团取代:卤素、O(CO)-(C1-C4烷基)、O(CO)-(C2-C4烯基)或间杂有一或多个O的C3-C20环烷基;R 17 represents hydrogen, C 1 -C 8 alkanoyl, C 1 -C 20 alkyl, C 1 -C 20 alkyl which is unsubstituted or substituted with one or more of the following groups: halo, O (CO) -(C 1 -C 4 alkyl), O(CO)-(C 2 -C 4 alkenyl) or a C 3 -C 20 cycloalkyl group having one or more O;
或R17表示C2-C20烷基,其间杂有一或多个O;Or R 17 represents a C 2 -C 20 alkyl group, in which one or more O;
R18表示C3-C20环烷基、C1-C20烷基,其是未经取代或经一或多个OH、O(CO)-(C2-C4烯基)或(CO)OR17取代;R 18 represents a C 3 -C 20 cycloalkyl group, a C 1 -C 20 alkyl group which is unsubstituted or via one or more OH, O(CO)-(C 2 -C 4 alkenyl) or (CO) ) OR 17 replaced;
或R18表示苯基,其是未经取代或经一或多个卤素取代;Or R 18 represents a phenyl group which is unsubstituted or substituted with one or more halogens;
R19及R20彼此独立地为C1-C8烷酰基或C1-C8烷酰基氧基;R 19 and R 20 are each independently a C 1 -C 8 alkanoyl group or a C 1 -C 8 alkanoyloxy group;
或R19及R20与其所附接的N原子一起形成间杂有O的5元或6元饱和环;Or R 19 and R 20 attached thereto together form a N atoms interrupted by O 5-membered or 6-membered saturated ring;
但条件为在该分子中存在至少一个由式(2)所表示的基团;Provided that at least one group represented by formula (2) is present in the molecule;
Figure PCTCN2015092029-appb-000026
Figure PCTCN2015092029-appb-000026
在本发明的一实施例中,所述含脂环式碳氢基的不饱和化合物(a-2-2)是选自为具有双环戊基的不饱和化合物、具有双环戊烯基的不饱和化合物及其混合物所组成的群。In an embodiment of the invention, the alicyclic hydrocarbon group-containing unsaturated compound (a-2-2) is selected from the group consisting of an unsaturated compound having a biscyclopentyl group and an unsaturated group having a dicyclopentenyl group. a group of compounds and mixtures thereof.
在本发明的一实施例中,所述含脂环式碳氢基的不饱和化合物(a-2-2)是选自由(甲基)丙烯酸双环戊酯、(甲基)丙烯酸双环戊烯酯、(甲基)丙烯酸双环戊氧基乙酯、(甲基)丙烯酸双环戊烯氧基乙酯及其混合物所组成的群。 In an embodiment of the invention, the alicyclic hydrocarbon group-containing unsaturated compound (a-2-2) is selected from the group consisting of dicyclopentanyl (meth)acrylate and dicyclopentenyl (meth)acrylate. a group consisting of dicyclopentyloxyethyl (meth)acrylate, dicyclopentenyloxyethyl (meth)acrylate, and mixtures thereof.
在本发明的一实施例中,所述具有乙烯性不饱和基的化合物(B)包括第一化合物(B-1),其中所述第一化合物(B-1)具有胺基甲酸酯基与至少7个丙烯酰基。In an embodiment of the invention, the compound (B) having an ethylenically unsaturated group includes the first compound (B-1), wherein the first compound (B-1) has a urethane group With at least 7 acryloyl groups.
在本发明的一实施例中,所述第一化合物(B-1)具有胺基甲酸脂基与至少10个丙烯酰基。In an embodiment of the invention, the first compound (B-1) has a urethane group and at least 10 acryl groups.
在本发明的一实施例中,所述的感光性树脂组成物,还包括染料(F)。In an embodiment of the invention, the photosensitive resin composition further includes a dye (F).
在本发明的一实施例中,所述染料(F)包括由式(f-1)表示的染料(F-1),In an embodiment of the invention, the dye (F) comprises a dye (F-1) represented by the formula (f-1),
Figure PCTCN2015092029-appb-000027
Figure PCTCN2015092029-appb-000027
式(f-1)中,In the formula (f-1),
J1、J2、J3及J4各自独立表示氢原子、碳数为1至8的烷基、经取代的碳数为1至8的烷基、碳数为3至8的环烷基、经取代的碳数为3至8的环烷基、苯基或经取代的苯基;J 1 , J 2 , J 3 and J 4 each independently represent a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, a substituted alkyl group having 1 to 8 carbon atoms, and a cycloalkyl group having 3 to 8 carbon atoms. a substituted cycloalkyl group having 3 to 8 carbon atoms, a phenyl group or a substituted phenyl group;
J5及J6各自独立表示氢原子、碳数为1至8的烷基或氯原子;J 5 and J 6 each independently represent a hydrogen atom, an alkyl group having 1 to 8 carbon atoms or a chlorine atom;
J7表示具有聚合性不饱合基的基;J 7 represents a group having a polymerizable unsaturated group;
a表示1至5的整數。a represents an integer from 1 to 5.
在本发明的一实施例中,所述由式(f-1)表示的化合物包括由式(f-2)表示的化合物,In an embodiment of the invention, the compound represented by the formula (f-1) includes a compound represented by the formula (f-2),
Figure PCTCN2015092029-appb-000028
Figure PCTCN2015092029-appb-000028
式(f-2)中, In the formula (f-2),
J1、J2、J3及J4各自独立表示氢原子、碳数为1至8的烷基、经取代的碳数为1至8的烷基、碳数为3至8的环烷基、经取代的碳数为3至8的环烷基、苯基或经取代的苯基;J 1 , J 2 , J 3 and J 4 each independently represent a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, a substituted alkyl group having 1 to 8 carbon atoms, and a cycloalkyl group having 3 to 8 carbon atoms. a substituted cycloalkyl group having 3 to 8 carbon atoms, a phenyl group or a substituted phenyl group;
J5及J6各自独立表示氢原子、碳数为1至8的烷基或氯原子;J 5 and J 6 each independently represent a hydrogen atom, an alkyl group having 1 to 8 carbon atoms or a chlorine atom;
J8表示具有聚合性不饱合基的基。J 8 represents a group having a polymerizable unsaturated group.
在本发明的一实施例中,上述J8为由式(f-3)表示的基或由式(f-4)表示的基,In an embodiment of the invention, the above J 8 is a group represented by the formula (f-3) or a group represented by the formula (f-4),
Figure PCTCN2015092029-appb-000029
Figure PCTCN2015092029-appb-000029
式(f-3)及式(f-4)中,In the formula (f-3) and the formula (f-4),
J9及J10各自独立表示氢原子或甲基;J 9 and J 10 each independently represent a hydrogen atom or a methyl group;
V1、V2、V3及V4各自独立表示经取代或未经取代的碳数为1至12的烷二基;V 1 , V 2 , V 3 and V 4 each independently represent a substituted or unsubstituted alkanediyl group having 1 to 12 carbon atoms;
Q1表示
Figure PCTCN2015092029-appb-000030
Q 1 indicates
Figure PCTCN2015092029-appb-000030
Q2表示二价脂环式烃基;Q 2 represents a divalent alicyclic hydrocarbon group;
b表示0至12的整数;b represents an integer from 0 to 12;
c及d各自独立表示0至6的整数。c and d each independently represent an integer from 0 to 6.
在本发明的一实施例中,基于所述碱可溶性树脂(A)的使用量总和为100重量份,所述含乙烯性不饱和基的化合物(B)的使用量范围为20重量份至200重量份;所述光起始剂(C)的使用量范围为10重量份至100重量份;所述溶剂(D)的使用量范围为500重量份至5000重量份;所述颜料(E)的使用量范围为30重量份至300重量份。In one embodiment of the present invention, the ethylenically unsaturated group-containing compound (B) is used in an amount ranging from 20 parts by weight to 200 parts by weight based on 100 parts by weight of the total amount of the alkali-soluble resin (A). The photoinitiator (C) is used in an amount ranging from 10 parts by weight to 100 parts by weight; the solvent (D) is used in an amount ranging from 500 parts by weight to 5000 parts by weight; the pigment (E) The amount used is in the range of 30 parts by weight to 300 parts by weight.
在本发明的一实施例中,基于所述碱可溶性树脂(A)的使用量总和为100重量份,所述染料(F)的使用量范围为5重量份至90重量份。In an embodiment of the invention, the dye (F) is used in an amount ranging from 5 parts by weight to 90 parts by weight based on 100 parts by weight of the total amount of the alkali-soluble resin (A).
在本发明的一实施例中,基于所述碱可溶性树脂(A-2)的所述不饱和羧酸 或不饱和羧酸酐化合物(a-2-1)、所述含脂环式碳氢基的不饱和化合物(a-2-2)及所述其它不饱和化合物(a-2-3)的合计量为100重量份,所述含脂环式碳氢基的不饱和化合物(a-2-2)的使用量范围为10重量份至50重量份。In an embodiment of the invention, the unsaturated carboxylic acid based on the alkali-soluble resin (A-2) Or the total of the unsaturated carboxylic anhydride compound (a-2-1), the alicyclic hydrocarbon group-containing unsaturated compound (a-2-2), and the other unsaturated compound (a-2-3) The amount of the alicyclic hydrocarbon group-containing unsaturated compound (a-2-2) is from 10 parts by weight to 50 parts by weight in an amount of 100 parts by weight.
在本发明的一实施例中,基于所述碱可溶性树脂(A)的使用量总和为100重量份,所述第一化合物(B-1)的使用量范围为5重量份至100重量份。In one embodiment of the present invention, the first compound (B-1) is used in an amount ranging from 5 parts by weight to 100 parts by weight based on 100 parts by weight of the total amount of the alkali-soluble resin (A).
在本发明的一实施例中,基于所述碱可溶性树脂(A)的使用量总和为100重量份,所述光起始剂(C-1)的使用量范围为5重量份至100重量份。In one embodiment of the present invention, the photoinitiator (C-1) is used in an amount ranging from 5 parts by weight to 100 parts by weight based on 100 parts by weight of the total amount of the alkali-soluble resin (A) used. .
在本发明的一实施例中,基于所述碱可溶性树脂(A)的使用量总和为100重量份,所述染料(F-1)的使用量范围为3重量份至90重量份。In an embodiment of the invention, the dye (F-1) is used in an amount ranging from 3 parts by weight to 90 parts by weight based on 100 parts by weight of the total amount of the alkali-soluble resin (A).
本发明的一种彩色滤光片的制造方法,其是使用上述的感光性树脂组成物而形成一像素层。A method of producing a color filter according to the present invention is to form a pixel layer using the above-described photosensitive resin composition.
本发明的一种彩色滤光片,其是通过上述的方法所制得。A color filter of the present invention is produced by the above method.
本发明的一种液晶显示装置,包括上述的彩色滤光片。A liquid crystal display device of the present invention includes the above-described color filter.
基于上述,本发明的感光性树脂组成物包括有碱可溶性树脂(A-1)、碱可溶性树脂(A-2)、第一化合物(B-1)以及光起始剂(C-1),因此可以改善高精细度的图案直线性不佳、图案平滑性不佳以及高逸气性等问题,进而适用于彩色滤光片以及液晶显示装置。Based on the above, the photosensitive resin composition of the present invention comprises an alkali-soluble resin (A-1), an alkali-soluble resin (A-2), a first compound (B-1), and a photoinitiator (C-1). Therefore, problems such as poor linearity of the high-definition pattern, poor pattern smoothness, and high outgassing property can be improved, and the color filter and the liquid crystal display device can be applied.
为让本发明的上述特点和优点能更明显易懂,下文特举实施例,并配合附图作详细说明如下。The above described features and advantages of the present invention will be more apparent from the following description.
具体实施方式detailed description
<感光性树脂组成物><Photosensitive resin composition>
本发明提供一种感光性树脂组成物,其包括碱可溶性树脂(A)、具有乙烯性不饱和基的化合物(B)、光起始剂(C)、溶剂(D)以及颜料(E)。此外,感光性树脂组成物可进一步包括染料(F)以及添加剂(G)。以下将详细说明用于本发明的感光性树脂组成物的各个成分:The present invention provides a photosensitive resin composition comprising an alkali-soluble resin (A), a compound (B) having an ethylenically unsaturated group, a photoinitiator (C), a solvent (D), and a pigment (E). Further, the photosensitive resin composition may further include a dye (F) and an additive (G). The respective components used in the photosensitive resin composition of the present invention will be described in detail below:
在此说明的是,以下是以(甲基)丙烯酸表示丙烯酸和/或甲基丙烯酸,并以(甲基)丙烯酸酯表示丙烯酸酯和/或甲基丙烯酸酯;同样地,以(甲基)丙烯酰基表示丙烯酰基和/或甲基丙烯酰基。 Here, it is explained that acrylic acid and/or methacrylic acid is represented by (meth)acrylic acid, and acrylate and/or methacrylate is represented by (meth) acrylate; similarly, (meth) The acryloyl group means an acryloyl group and/or a methacryloyl group.
碱可溶性树脂(A):Alkali soluble resin (A):
碱可溶性树脂(A)包括碱可溶性树脂(A-1)以及碱可溶性树脂(A-2)。The alkali-soluble resin (A) includes an alkali-soluble resin (A-1) and an alkali-soluble resin (A-2).
碱可溶性树脂(A-1)Alkali soluble resin (A-1)
碱可溶性树脂(A-1)是由一混合物反应而获得,且所述混合物包括具有至少二个环氧基的环氧化合物(a-1-1)、具有至少一个羧酸基及至少一个乙烯性不饱和基的化合物(a-1-2)、四羧酸或其酸二酐(a-1-3)以及二羧酸或其酸酐(a-1-4)The alkali-soluble resin (A-1) is obtained by reacting a mixture, and the mixture includes an epoxy compound (a-1-1) having at least two epoxy groups, having at least one carboxylic acid group and at least one ethylene a compound (a-1-2), a tetracarboxylic acid or its acid dianhydride (a-1-3), and a dicarboxylic acid or an anhydride thereof (a-1-4)
具有至少二个环氧基的环氧化合物(a-1-1)Epoxy compound having at least two epoxy groups (a-1-1)
本发明的具有至少二个环氧基的环氧化合物(a-1-1)可具有如下式(aI-1)或下式(aI-2)所示的结构。在此处,“环氧化合物(a-1-1)可具有如下式(aI-1)或下式(aI-2)所示的结构”的叙述也涵盖了具有如下式(aI-1)所示的结构的化合物及具有如下式(aI-2)所示的结构的化合物同时存在而作为环氧化合物(a-1-1)的情形。具体而言,前述具有至少二个环氧基的环氧化合物(a-1-1)例如是具有如下式(aI-1)所示的结构:The epoxy compound (a-1-1) having at least two epoxy groups of the present invention may have a structure represented by the following formula (aI-1) or the following formula (aI-2). Here, the description that the "epoxy compound (a-1-1) may have a structure represented by the following formula (aI-1) or the following formula (aI-2)" also encompasses the following formula (aI-1) The compound of the structure shown and the compound which has a structure represented by the following formula (aI-2) exist simultaneously as the epoxy compound (a-1-1). Specifically, the epoxy compound (a-1-1) having at least two epoxy groups described above has, for example, a structure represented by the following formula (aI-1):
Figure PCTCN2015092029-appb-000031
Figure PCTCN2015092029-appb-000031
式(aI-1)中,W1、W2、W3以及W4各自为相同或不同,且独立表示氢原子、卤素原子、碳数为1至5的烷基、碳数为1至5的烷氧基、碳数为6至12的芳基或碳数为6至12的芳烷基。In the formula (aI-1), W 1 , W 2 , W 3 and W 4 are each the same or different and independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 5 carbon atoms, and a carbon number of 1 to 5. The alkoxy group is an aryl group having 6 to 12 carbon atoms or an aralkyl group having 6 to 12 carbon atoms.
前述式(aI-1)的具有至少二个环氧基的环氧化合物(a-1-1)可包括由双酚芴型化合物(bisphenol fluorene)与卤化环氧丙烷(epihalohydrin)反应而得的含环氧基的双酚芴型化合物,但并不限于此。The epoxy compound (a-1-1) having at least two epoxy groups of the above formula (aI-1) may include a reaction of bisphenol fluorene with epihalohydrin. An epoxy group-containing bisphenol quinone type compound, but is not limited thereto.
作为上述双酚芴型化合物的具体例,可列举:9,9-双(4-羟基苯基)芴[9,9-bis(4-hydroxyphenyl)fluorene]、9,9-双(4-羟基-3-甲基苯基)芴[9,9-bis(4-hydroxy-3-methylphenyl)fluorene]、9,9-双(4-羟基-3-氯苯基)芴 [9,9-bis(4-hydroxy-3-chlorophenyl)fluorene]、9,9-双(4-羟基-3-溴苯基)芴[9,9-bis(4-hydroxy-3-bromophenyl)fluorene]、9,9-双(4-羟基-3-氟苯基)芴[9,9-bis(4-hydroxy-3-fluorophenyl)fluorene]、9,9-双(4-羟基-3-甲氧基苯基)芴[9,9-bis(4-hydroxy-3-methoxyphenyl)fluorene]、9,9-双(4-羟基-3,5-二甲基苯基)芴[9,9-bis(4-hydroxy-3,5-dimethylphenyl)fluorene]、9,9-双(4-羟基-3,5-二氯苯基)芴[9,9-bis(4-hydroxy-3,5-dichlorophenyl)fluorene]、9,9-双(4-羟基-3,5-二溴苯基)芴[9,9-bis(4-hydroxy-3,5-dibromophenyl)fluorene]等化合物。Specific examples of the above bisphenol quinoid type compound include 9,9-bis(4-hydroxyphenyl)fluorene, 9,9-bis(4-hydroxyl group). -3-methylphenyl)fluorene [9,9-bis(4-hydroxy-3-methylphenyl)fluorene], 9,9-bis(4-hydroxy-3-chlorophenyl)indole [9,9-bis(4-hydroxy-3-chlorophenyl)fluorene], 9,9-bis(4-hydroxy-3-bromophenyl)fluorene [9,9-bis(4-hydroxy-3-bromophenyl) Fluorene], 9,9-bis(4-hydroxy-3-fluorophenyl)fluorene, 9,9-bis(4-hydroxy-3- 9,9-bis(4-hydroxy-3-methoxyphenyl)fluorene, 9,9-bis(4-hydroxy-3,5-dimethylphenyl)anthracene [9,9 -bis(4-hydroxy-3,5-dimethylphenyl)fluorene],9,9-bis(4-hydroxy-3,5-dichlorophenyl)indole [9,9-bis(4-hydroxy-3,5) -dichlorophenyl)fluorene], a compound such as 9,9-bis(4-hydroxy-3,5-dibromophenyl)fluorene.
上述卤化环氧丙烷(epihalohydrin)可包括但不限于3-氯-1,2-环氧丙烷(epichlorohydrin)或3-溴-1,2-环氧丙烷(epibromohydrin)等。The above-mentioned epihalohydrin may include, but is not limited to, 3-chloro-1,2-epoxyhydrin or 3-bromo-1,2-propylene oxide (epibromohydrin).
上述由双酚芴型化合物与卤化环氧丙烷反应所得的含环氧基的双酚芴型化合物包含但不限于:(1)新日铁化学(Nippon Steel Chemical Co.,Ltd)所制造的商品:例如ESF-300等;(2)大阪瓦斯(Osaka Gas Co.,Ltd)所制造的商品:例如PG-100、EG-210等;(3)短信科技(S.M.S Technology Co.,Ltd)所制造的商品:例如SMS-F9PhPG、SMS-F9CrG、SMS-F914PG等。The epoxy group-containing bisphenol quinoid compound obtained by reacting the bisphenol quinoid compound with the halogenated propylene oxide includes, but is not limited to: (1) a product manufactured by Nippon Steel Chemical Co., Ltd. : for example, ESF-300, etc.; (2) goods manufactured by Osaka Gas Co., Ltd.: for example, PG-100, EG-210, etc.; (3) manufactured by SMS Technology Co., Ltd. Goods such as SMS-F9PhPG, SMS-F9CrG, SMS-F914PG, etc.
另外,上述具有至少二个环氧基的环氧化合物(a-1-1)也可具有如下式(aI-2)所示的结构:Further, the above epoxy compound (a-1-1) having at least two epoxy groups may have a structure represented by the following formula (aI-2):
Figure PCTCN2015092029-appb-000032
Figure PCTCN2015092029-appb-000032
式(aI-2)中,W5至W18各自为相同或不同,且独立表示氢原子、卤素原子、碳数为1至8的烷基或碳数为6至15的芳香基,s表示0至10的整数。In the formula (aI-2), W 5 to W 18 are each the same or different and independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 8 carbon atoms or an aromatic group having 6 to 15 carbon atoms, and s represents An integer from 0 to 10.
含有式(aI-2)所表示的结构的具有至少二个环氧基的环氧化合物(a-1-1)可包括在碱金属氢氧化物存在下,使具有下式(aI-2-1)结构的化合物与卤化环氧丙烷进行反应而得。The epoxy compound (a-1-1) having at least two epoxy groups having the structure represented by the formula (aI-2) may be included in the presence of an alkali metal hydroxide to have the following formula (aI-2- 1) A compound of the structure is obtained by reacting a halogenated propylene oxide.
Figure PCTCN2015092029-appb-000033
Figure PCTCN2015092029-appb-000033
在上式(aI-2-1)中,W5至W18以及s的定义是分别与式(aI-2)中的W5至 W18以及s的定义相同,在此不另赘述。In the above formula (aI-2-1), and are respectively of formula (aI-2) W 5, and to the same definition of W, and W 18 s is defined to 5 W 18 s, and this is not described herein.
再者,前述式(aI-2)的具有至少二个环氧基的环氧化合物(a-1-1)例如是在酸催化剂存在下,使用具有下式(aI-2-2)结构的化合物与酚(phenol)类进行缩合反应后,形成具有式(aI-2-1)结构的化合物。接着,通过加入过量的卤化环氧丙烷进行脱卤化氢反应(dehydrohalogenation),而获得如式(aI-2)所示的具有至少二个环氧基的环氧化合物(a-1-1):Further, the epoxy compound (a-1-1) having at least two epoxy groups of the above formula (aI-2) is, for example, in the presence of an acid catalyst, and has a structure having the following formula (aI-2-2). After the compound is subjected to a condensation reaction with a phenol, a compound having the structure of the formula (aI-2-1) is formed. Next, a dehydrohalogenation reaction is carried out by adding an excess of halogenated propylene oxide to obtain an epoxy compound (a-1-1) having at least two epoxy groups as shown in the formula (aI-2):
Figure PCTCN2015092029-appb-000034
Figure PCTCN2015092029-appb-000034
在上式(aI-2-2)中,W19与W20分别为相同或不同的氢原子、卤素原子、碳数为1至8的烷基或碳数为6至15的芳香基;M1及M2分别为相同或不同的卤素原子、碳数为1至6的烷基或碳数为1至6的烷氧基。较佳地,上述卤素原子可例如氯或溴,上述烷基可例如甲基、乙基或第三丁基,上述烷氧基可例如甲氧基或乙氧基。In the above formula (aI-2-2), W 19 and W 20 are the same or different hydrogen atom, a halogen atom, an alkyl group having 1 to 8 carbon atoms or an aromatic group having 6 to 15 carbon atoms; 1 and M 2 are each the same or different halogen atom, an alkyl group having 1 to 6 carbon atoms or an alkoxy group having 1 to 6 carbon atoms. Preferably, the above halogen atom may be, for example, chlorine or bromine, and the above alkyl group may be, for example, a methyl group, an ethyl group or a third butyl group, and the above alkoxy group may be, for example, a methoxy group or an ethoxy group.
作为上述酚类的具体例,可列举如:酚(phenol)、甲酚(cresol)、乙酚(ethylphenol)、n-丙酚(n-propylphenol)、异丁酚(isobutylphenol)、t-丁酚(t-butylphenol)、辛酚(octylphenol)、壬基苯酚(nonylphenol)、茬酚(xylenol)、甲基丁基苯酚(methylbutylphenol)、二第三丁基酚(di-t-butylphenol)、乙烯苯酚(vinylphenol)、丙烯苯酚(propenylphenol)、乙炔苯酚(ethinylphenol)、环戊苯酚(cyclopentylphenol)、环己基酚(cyclohexylphenol)或环己基甲酚(cyclohexylcresol)等。上述酚类一般可单独或混合多种使用。Specific examples of the phenols include phenol, cresol, ethylphenol, n-propylphenol, isobutylphenol, and t-butyl phenol. (t-butylphenol), octylphenol, nonylphenol, xylenol, methylbutylphenol, di-t-butylphenol, vinylphenol (vinylphenol), propenylphenol, ethinylphenol, cyclopentylphenol, cyclohexylphenol or cyclohexylcresol. The above phenols can be generally used singly or in combination of two or more.
基于上述具有式(aI-2-2)结构的化合物的使用量为1摩尔,酚类的使用量为0.5摩尔至20摩尔,较佳为2摩尔至15摩尔。The compound having the structure of the above formula (aI-2-2) is used in an amount of 1 mol, and the phenol is used in an amount of 0.5 mol to 20 mol, preferably 2 mol to 15 mol.
作为上述酸催化剂的具体例,可列举:盐酸、硫酸、对甲苯磺酸(p-toluenesulfonic acid)、草酸(oxalic acid)、三氟化硼(boron trifluoride)、无水氯化铝(aluminium chloride anhydrous)、氯化锌(zinc chloride)等,其中以对甲苯磺酸、硫酸或盐酸较佳。上述酸催化剂可单独或混合多种使用。Specific examples of the acid catalyst include hydrochloric acid, sulfuric acid, p-toluenesulfonic acid, oxalic acid, boron trifluoride, and anhydrous chloride anhydrous. ), zinc chloride or the like, wherein p-toluenesulfonic acid, sulfuric acid or hydrochloric acid is preferred. The above acid catalysts may be used singly or in combination of two or more.
另外,上述酸催化剂的使用量虽无特别的限制,但基于上述具有式(aI-2-2) 结构的化合物的使用量为100重量百分比(wt%),酸催化剂的使用量较佳为0.1wt%至30wt%。Further, the amount of the acid catalyst used is not particularly limited, but based on the above formula (aI-2-2) The compound of the structure is used in an amount of 100% by weight (wt%), and the acid catalyst is preferably used in an amount of from 0.1% by weight to 30% by weight.
上述缩合反应可在无溶剂或是在有机溶剂存在下进行。其次,上述有机溶剂的具体例可列举:甲苯(toluene)、二甲苯(xylene)或甲基异丁基酮(methyl isobutyl ketone)等。上述有机溶剂可单独或混合多种使用。The above condensation reaction can be carried out in the absence of a solvent or in the presence of an organic solvent. Specific examples of the organic solvent include toluene, xylene, and methyl isobutyl ketone. The above organic solvents may be used singly or in combination of two or more.
基于具有式(aI-2-2)结构的化合物及酚类的使用量总和为100wt%,上述有机溶剂的使用量为50wt%至300wt%,其中以100wt%至250wt%较佳。另外,上述缩合反应的操作温度为40℃至180℃,且缩合反应的操作时间为1小时至8小时。The total amount of the compound and the phenol used based on the structure of the formula (aI-2-2) is 100% by weight, and the above organic solvent is used in an amount of 50% by weight to 300% by weight, preferably 100% by weight to 250% by weight. Further, the above condensation reaction has an operation temperature of 40 ° C to 180 ° C, and the operation time of the condensation reaction is 1 hour to 8 hours.
在完成上述缩合反应后,可进行中和处理或水洗处理。上述中和处理是将反应后的溶液的pH值调整为pH 3至pH 7,其中以pH 5至pH 7较佳。上述水洗处理可使用中和剂来进行,此中和剂为碱性物质,且其具体例可列举:氢氧化钠(sodium hydroxide)、氢氧化钾(potassium hydroxide)等碱金属氢氧化物;氢氧化钙(calcium hydroxide)、氢氧化镁(magnesium hydroxide)等碱土类金属氢氧化物;二伸乙三胺(diethylene triamine)、三伸乙四胺(triethylenetetramine)、苯胺(aniline)、苯二胺(phenylene diamine)等有机胺;以及氨(ammonia)、磷酸二氢钠(sodium dihydrogen phosphate)等。上述水洗处理可采用公知方法进行,例如,在反应后的溶液中,加入含中和剂的水溶液,反复进行萃取即可。经中和处理或水洗处理后,经减压加热处理,将未反应的酚类及溶剂予以馏除,并进行浓缩,即可获得具有式(aI-2-1)结构的化合物。After completion of the above condensation reaction, a neutralization treatment or a water washing treatment may be carried out. The above neutralization treatment is to adjust the pH of the solution after the reaction to pH 3 to pH 7, preferably pH 5 to pH 7. The water washing treatment may be carried out using a neutralizing agent, and the neutralizing agent is an alkaline substance, and specific examples thereof include alkali metal hydroxides such as sodium hydroxide and potassium hydroxide; and hydrogen; Alkaline earth metal hydroxides such as calcium hydroxide and magnesium hydroxide; diethylene triamine, triethylenetetramine, aniline, phenylenediamine (diethyltetramine) Organic amines such as phenylene diamine; and ammonia, sodium dihydrogen phosphate, and the like. The water washing treatment may be carried out by a known method. For example, an aqueous solution containing a neutralizing agent may be added to the solution after the reaction, and extraction may be repeated. After the neutralization treatment or the water washing treatment, the unreacted phenols and the solvent are distilled off by heating under reduced pressure, and concentrated to obtain a compound having the structure of the formula (aI-2-1).
作为上述卤化环氧丙烷的具体例,可例举:3-氯-1,2-环氧丙烷(3-chloro-1,2-epoxypropane)、3-溴-1,2-环氧丙烷(3-bromo-1,2-epoxypropane)或上述任意组合。在进行上述脱卤化氢反应之前,可预先添加或在反应过程中添加氢氧化钠、氢氧化钾等碱金属氢氧化物。上述脱卤化氢反应的操作温度为20℃至120℃,其操作时间范围为1小时至10小时。Specific examples of the above halogenated propylene oxide include 3-chloro-1,2-epoxypropane and 3-bromo-1,2-epoxypropane (3). -bromo-1, 2-epoxypropane) or any combination of the above. An alkali metal hydroxide such as sodium hydroxide or potassium hydroxide may be added in advance or added during the reaction before the above dehydrohalogenation reaction. The above dehydrohalogenation reaction has an operating temperature of from 20 ° C to 120 ° C and an operation time ranging from 1 hour to 10 hours.
在本发明的具体例中,上述脱卤化氢反应中所添加的碱金属氢氧化物也可使用其水溶液。在此具体例中,将上述碱金属氢氧化物水溶液连续添加至脱卤化氢反应系统内的同时,可于减压或常压下,连续蒸馏出水及卤化环氧丙烷,藉此分离并除去水,同时可将卤化环氧丙烷连续地回流至反应系统内。In a specific example of the present invention, an aqueous solution of the alkali metal hydroxide added to the dehydrohalogenation reaction may be used. In this specific example, while the aqueous alkali metal hydroxide solution is continuously added to the dehydrohalogenation reaction system, water and halogenated propylene oxide can be continuously distilled off under reduced pressure or normal pressure, thereby separating and removing water. At the same time, the halogenated propylene oxide can be continuously refluxed into the reaction system.
上述脱卤化氢反应进行前,也可添加氯化四甲铵(tetramethyl ammonium  chloride)、溴化四甲铵(tetramethyl ammonium bromide)、三甲基苄基氯化铵(trimethyl benzyl ammonium chloride)等的四级铵盐作为催化剂,并在50℃至150℃下,反应1小时至5小时,再加入碱金属氢氧化物或其水溶液,于20℃至120℃的温度下,使其反应1小时至10小时,以进行脱卤化氢反应。Tetramethyl ammonium may also be added before the above dehydrohalogenation reaction is carried out. a quaternary ammonium salt such as chloride), tetramethyl ammonium bromide or trimethyl benzyl ammonium chloride as a catalyst, and reacted at 50 ° C to 150 ° C for 1 hour. After 5 hours, an alkali metal hydroxide or an aqueous solution thereof is further added, and the reaction is carried out at a temperature of from 20 ° C to 120 ° C for 1 hour to 10 hours to carry out a dehydrohalogenation reaction.
基于上述具有式(aI-2-1)结构的化合物中的羟基总当量为1当量,上述卤化环氧丙烷的使用量可为1当量至20当量,其中以2当量至10当量较佳。基于上述具有式(aI-2-1)结构的化合物中的羟基总当量为1当量,上述脱卤化氢反应中添加的碱金属氢氧化物的使用量可为0.8当量至15当量,其中以0.9当量至11当量较佳。The halogenated propylene oxide may be used in an amount of from 1 equivalent to 20 equivalents, preferably from 2 equivalents to 10 equivalents, based on 1 equivalent of the total hydroxyl group in the compound having the structure of the formula (aI-2-1). The alkali metal hydroxide added in the above dehydrohalogenation reaction may be used in an amount of from 0.8 equivalents to 15 equivalents, based on 0.9 equivalents, based on the total equivalent of the hydroxyl group in the compound having the structure of the formula (aI-2-1). Equivalent to 11 equivalents is preferred.
此外,为了使上述脱卤化氢反应顺利进行,除了可添加甲醇、乙醇等醇类之外,也可添加二甲砜(dimethyl sulfone)、二甲亚砜(dimethyl sulfoxide)等非质子性(aprotic)的极性溶剂等来进行反应。在使用醇类的情况下,基于上述卤化环氧丙烷的总量为100wt%,醇类的使用量可为2wt%至20wt%,较佳为4wt%至15wt%。在使用非质子性的极性溶剂的例子中,基于卤化环氧丙烷的总量为100wt%,非质子性的极性溶剂的使用量可为5wt%至100wt%,其中,以10wt%至90wt%较佳。Further, in order to smoothly carry out the above-described dehydrohalogenation reaction, an aprotic such as dimethyl sulfone or dimethyl sulfoxide may be added in addition to an alcohol such as methanol or ethanol. The polar solvent or the like is used to carry out the reaction. In the case of using an alcohol, the alcohol may be used in an amount of 2% by weight to 20% by weight, preferably 4% by weight to 15% by weight based on the total amount of the above-mentioned halogenated propylene oxide being 100% by weight. In the example using an aprotic polar solvent, the total amount of the halogenated propylene oxide is 100% by weight, and the aprotic polar solvent may be used in an amount of 5 wt% to 100 wt%, wherein 10 wt% to 90 wt% % is better.
在完成脱卤化氢反应后,可选择性地进行水洗处理。之后,利用加热减压的方式除去卤化环氧丙烷、醇类及非质子性的极性溶剂等。上述加热减压例如是于温度为110℃至250℃,且压力为1.3kPa(10mmHg)以下的环境下进行。After completion of the dehydrohalogenation reaction, a water washing treatment can be selectively performed. Thereafter, the halogenated propylene oxide, the alcohol, the aprotic polar solvent, and the like are removed by heating and pressure reduction. The heating and depressing is performed, for example, in an environment having a temperature of 110 ° C to 250 ° C and a pressure of 1.3 kPa (10 mmHg) or less.
为了避免形成的环氧树脂含有加水分解性卤素,可将脱卤化氢反应后的溶液加入甲苯、甲基异丁基酮(methyl isobutyl ketone)等溶剂,并加入氢氧化钠、氢氧化钾等碱金属氢氧化物水溶液,再次进行脱卤化氢反应。在脱卤化氢反应中,基于上述具有式(C-II-1)结构的化合物中的羟基总当量为1当量,碱金属氢氧化物的使用量为0.01摩尔至0.3摩尔,其中,以0.05摩尔至0.2摩尔较佳。另外,上述脱卤化氢反应的操作温度范围为50℃至120℃,且其操作时间范围为0.5小时至2小时。In order to prevent the formed epoxy resin from containing a hydrolyzable halogen, the dehydrohalogenated reaction solution may be added to a solvent such as toluene or methyl isobutyl ketone, and a base such as sodium hydroxide or potassium hydroxide may be added. The metal hydroxide aqueous solution is again subjected to a dehydrohalogenation reaction. In the dehydrohalogenation reaction, the total equivalent weight of the hydroxyl group in the compound having the structure of the above formula (C-II-1) is 1 equivalent, and the alkali metal hydroxide is used in an amount of 0.01 mol to 0.3 mol, wherein 0.05 mol is used. It is preferably 0.2 mole. Further, the above dehydrohalogenation reaction has an operating temperature in the range of 50 ° C to 120 ° C and an operation time ranging from 0.5 hour to 2 hours.
在完成脱卤化氢反应后,通过过滤及水洗等步骤去除盐类。此外,也可利用加热减压的方式,将甲苯、甲基异丁基酮等溶剂予以馏除,而可获得如 式(C-II)所示的具有至少二个环氧基的环氧化合物(i)。上述式(C-II)的具有至少二个环氧基的环氧化合物(i)可包含但不限于如商品名为NC-3000、NC-3000H、NC-3000S及NC-3000P等日本化药(Nippon Kayaku Co.Ltd.)所制造的商品。After the completion of the dehydrohalogenation reaction, the salts are removed by filtration, washing, and the like. Further, a solvent such as toluene or methyl isobutyl ketone may be distilled off by heating and decompression to obtain, for example, An epoxy compound (i) having at least two epoxy groups represented by the formula (C-II). The epoxy compound (i) having at least two epoxy groups of the above formula (C-II) may include, but is not limited to, a Japanese chemical such as NC-3000, NC-3000H, NC-3000S, and NC-3000P. (Nippon Kayaku Co. Ltd.) manufactured goods.
具有至少一个羧酸基及至少一个乙烯性不饱和基的化合物(a-1-2)a compound having at least one carboxylic acid group and at least one ethylenically unsaturated group (a-1-2)
所述具有至少一个羧酸基及至少一个乙烯性不饱和基的化合物(a-1-2)例如是选自于由以下(1)至(3)所组成的群组:(1)丙烯酸、甲基丙烯酸、2-甲基丙烯酰氧乙基丁二酸(2-methacryloyloxy ethylbutanedioic acid)、2-甲基丙烯酰氧丁基丁二酸、2-甲基丙烯酰氧乙基己二酸、2-甲基丙烯酰氧丁基己二酸、2-甲基丙烯酰氧乙基六氢邻苯二甲酸、2-甲基丙烯酰氧乙基马来酸、2-甲基丙烯酰氧丙基马来酸、2-甲基丙烯酰氧丁基马来酸、2-甲基丙烯酰氧丙基丁二酸、2-甲基丙烯酰氧丙基己二酸、2-甲基丙烯酰氧丙基四氢邻苯二甲酸、2-甲基丙烯酰氧丙基邻苯二甲酸、2-甲基丙烯酰氧丁基邻苯二甲酸、或2-甲基丙烯酰氧丁基氢邻苯二甲酸;(2)由含羟基的(甲基)丙烯酸酯与二元羧酸化合物反应而得的化合物,其中二元羧酸化合物包含但不限于己二酸、丁二酸、马来酸、邻苯二甲酸;(3)由含羟基的(甲基)丙烯酸酯与羧酸酐化合物反应而得的半酯化合物,其中含羟基的(甲基)丙烯酸酯包含但不限于2-羟基乙基丙烯酸酯[(2-hydroxyethyl)acrylate]、2-羟基乙基甲基丙烯酸酯[(2-hydroxyethyl)methacrylate]、2-羟基丙基丙烯酸酯[(2-hydroxypropyl)acrylate]、2-羟基丙基甲基丙烯酸酯[(2-hydroxypropyl)methacrylate]、4-羟基丁基丙烯酸酯[(4-hydroxybutyl)acrylate]、4-羟基丁基甲基丙烯酸酯[(4-hydroxybutyl)methacrylate]、或季戊四醇三甲基丙烯酸酯等。另外,此处所述的羧酸酐化合物与以下所述的四羧酸二酐或二羧酸酐相同,在此不另赘述。The compound (a-1-2) having at least one carboxylic acid group and at least one ethylenically unsaturated group is, for example, selected from the group consisting of (1) to (3): (1) acrylic acid, 2-methacryloyloxyethylbutanedioic acid, 2-methacryloyloxybutyl succinic acid, 2-methacryloyloxyethyl adipate, 2-methacryloyloxybutyl adipate, 2-methacryloyloxyethylhexahydrophthalic acid, 2-methacryloyloxyethyl maleic acid, 2-methacryloyloxypropane Kamalyx, 2-methacryloyloxybutyl maleic acid, 2-methacryloxypropyl succinic acid, 2-methacryloxypropyl adipate, 2-methacryloyl Oxypropyl propyl tetrahydrophthalic acid, 2-methacryloxypropyl phthalic acid, 2-methacryloyloxybutyl phthalic acid, or 2-methacryloyloxybutyl hydrogen phthalate; (2) A compound obtained by reacting a hydroxyl group-containing (meth) acrylate with a dicarboxylic acid compound, wherein the dicarboxylic acid compound includes, but is not limited to, adipic acid, succinic acid, maleic acid, ortho-benzene Formic acid; (3) from a half ester compound obtained by reacting a (meth) acrylate with a carboxylic anhydride compound, wherein the hydroxyl group-containing (meth) acrylate includes, but not limited to, 2-hydroxyethyl acrylate; 2-hydroxyethylmethacrylate [2-hydroxyethyl) methacrylate], 2-hydroxypropyl acrylate, 2-hydroxypropyl methacrylate ], 4-hydroxybutyl acrylate, 4-hydroxybutyl methacrylate, or pentaerythritol trimethacrylate. Further, the carboxylic anhydride compound described herein is the same as the tetracarboxylic dianhydride or the dicarboxylic acid anhydride described below, and will not be further described herein.
四羧酸或其酸二酐(a-1-3)Tetracarboxylic acid or its acid dianhydride (a-1-3)
四羧酸或其酸二酐(a-1-3)包括含有氟原子的四羧酸或其酸二酐、除了所述含有氟原子的四羧酸或其酸二酐之外的其它四羧酸或其酸二酐或上述两个的组合。The tetracarboxylic acid or its acid dianhydride (a-1-3) includes a tetracarboxylic acid containing a fluorine atom or an acid dianhydride thereof, and a tetracarboxylic acid other than the fluorine atom-containing tetracarboxylic acid or its acid dianhydride. An acid or its acid dianhydride or a combination of the two.
含有氟原子的四羧酸或其酸二酐选自由式(K-1)表示的含有氟原子的四 羧酸化合物以及由式(K-2)表示的含有氟原子的四羧酸二酐化合物所组成的族群。具体而言,由式(K-1)表示的含有氟原子的四羧酸化合物以及由式(K-2)表示的含有氟原子的四羧酸二酐化合物如下。The tetracarboxylic acid containing a fluorine atom or an acid dianhydride thereof is selected from the group consisting of a fluorine atom represented by the formula (K-1) A group consisting of a carboxylic acid compound and a tetracarboxylic dianhydride compound containing a fluorine atom represented by the formula (K-2). Specifically, the fluorine atom-containing tetracarboxylic acid compound represented by the formula (K-1) and the fluorine atom-containing tetracarboxylic dianhydride compound represented by the formula (K-2) are as follows.
Figure PCTCN2015092029-appb-000035
Figure PCTCN2015092029-appb-000035
式(K-1)与式(K-2)中,L2为具有氟的四价芳香族基团,且较佳为具有苯环。具体而言,较佳为选自由式(L-1)至式(L-6)表示的基团中的其中一个。In the formula (K-1) and the formula (K-2), L 2 is a tetravalent aromatic group having fluorine, and preferably has a benzene ring. Specifically, it is preferably one selected from the group consisting of the formula (L-1) to the formula (L-6).
Figure PCTCN2015092029-appb-000036
Figure PCTCN2015092029-appb-000036
式(L-1)至式(L-6)中,E各自独立表示氟原子或三氟甲基,*表示与碳原子键结的位置。In the formulae (L-1) to (L-6), E each independently represents a fluorine atom or a trifluoromethyl group, and * represents a position bonded to a carbon atom.
详言之,含有氟原子的四羧酸或其酸二酐的具体例包括4,4'-六氟亚异丙基二邻苯二甲酸、1,4-二氟均苯四甲酸、1-单氟均苯四甲酸、1,4-二(三氟甲基)均苯四甲酸等含氟的芳香族四羧酸,或上述四羧酸的二酐化合物,或上述化 合物的组合。More specifically, specific examples of the tetracarboxylic acid or acid dianhydride containing a fluorine atom include 4,4'-hexafluoroisopropylidene diphthalic acid, 1,4-difluorobenzenetetracarboxylic acid, and 1- a fluorine-containing aromatic tetracarboxylic acid such as monofluorobenzenetetracarboxylic acid or 1,4-bis(trifluoromethyl)benzenetetracarboxylic acid, or a dianhydride compound of the above tetracarboxylic acid, or the above-mentioned Combination of compounds.
含有氟原子的四羧酸或其酸二酐的具体例还包括3,3'-六氟亚异丙基二邻苯二甲酸、5,5'-[2,2,2-三氟-1-[3-(三氟甲基)苯基]亚乙基]二邻苯二甲酸、5,5'-[2,2,3,3,3-五氟-1-(三氟甲基)亚丙基]二邻苯二甲酸、5,5'-氧基双[4,6,7-三氟-均苯四甲酸]、3,6-双(三氟甲基)均苯四甲酸、4-(三氟甲基)均苯四甲酸、1,4-双(3,4-二羧酸三氟苯氧基)四氟苯等含氟的四羧酸,或上述四羧酸的二酐化合物,或上述化合物的组合。Specific examples of the tetracarboxylic acid or the acid dianhydride containing a fluorine atom further include 3,3'-hexafluoroisopropylidene diphthalic acid, 5,5'-[2,2,2-trifluoro-1 -[3-(Trifluoromethyl)phenyl]ethylidene]diphthalic acid, 5,5'-[2,2,3,3,3-pentafluoro-1-(trifluoromethyl) Propylene]diphthalic acid, 5,5'-oxybis[4,6,7-trifluoro-pyromellitic acid], 3,6-bis(trifluoromethyl)benzenetetracarboxylic acid, a fluorine-containing tetracarboxylic acid such as 4-(trifluoromethyl)benzenetetracarboxylic acid or 1,4-bis(3,4-dicarboxylic acid trifluorophenoxy)tetrafluorobenzene, or a second of the above tetracarboxylic acids An anhydride compound, or a combination of the above compounds.
其它四羧酸或其酸二酐包括饱和直链烃四羧酸、脂环式四羧酸、芳香族四羧酸,或上述四羧酸的二酐化合物,或其组合。The other tetracarboxylic acid or acid dianhydride thereof includes a saturated linear hydrocarbon tetracarboxylic acid, an alicyclic tetracarboxylic acid, an aromatic tetracarboxylic acid, or a dianhydride compound of the above tetracarboxylic acid, or a combination thereof.
饱和直链烃四羧酸的具体例包括丁烷四羧酸、戊烷四羧酸、己烷四羧酸,或上述化合物的组合。饱和直链烃四羧酸也可具有取代基。Specific examples of the saturated linear hydrocarbon tetracarboxylic acid include butane tetracarboxylic acid, pentanetetracarboxylic acid, hexanetetracarboxylic acid, or a combination of the above compounds. The saturated linear hydrocarbon tetracarboxylic acid may also have a substituent.
脂环式四羧酸的具体例包括环丁烷四羧酸、环戊烷四羧酸、环已烷四羧酸,降冰片烷四羧酸,或上述化合物的组合。脂环式四羧酸也可具有取代基。Specific examples of the alicyclic tetracarboxylic acid include cyclobutanetetracarboxylic acid, cyclopentanetetracarboxylic acid, cyclohexanetetracarboxylic acid, norbornanetetracarboxylic acid, or a combination of the above compounds. The alicyclic tetracarboxylic acid may also have a substituent.
芳香族四羧酸的具体例包括均苯四甲酸、二苯甲酮四羧酸、联苯四羧酸、联苯醚四羧酸、二苯基砜四羧酸、1,2,3,6-四氢邻苯二甲酸,或上述化合物的组合。芳香族四羧酸也可具有取代基。Specific examples of the aromatic tetracarboxylic acid include pyromellitic acid, benzophenonetetracarboxylic acid, biphenyltetracarboxylic acid, diphenyl ether tetracarboxylic acid, diphenylsulfone tetracarboxylic acid, 1,2,3,6 - tetrahydrophthalic acid, or a combination of the above compounds. The aromatic tetracarboxylic acid may also have a substituent.
二羧酸或其酸酐(a-1-4)Dicarboxylic acid or its anhydride (a-1-4)
二羧酸或其酸酐(a-1-4)包括含有氟原子的二羧酸或其酸酐、除了所述含有氟原子的二羧酸或其酸酐之外的其它二羧酸或其酸酐或上述两个的组合。The dicarboxylic acid or its anhydride (a-1-4) includes a dicarboxylic acid containing a fluorine atom or an anhydride thereof, a dicarboxylic acid other than the fluorine atom-containing dicarboxylic acid or an anhydride thereof, or an anhydride thereof or the above A combination of two.
含有氟原子的二羧酸或其酸酐选自由式(M-1)表示的含有氟原子的二羧酸化合物以及由式(M-2)表示的含有氟原子的二羧酸酐化合物所组成的族群。具体而言,由式(M-1)表示的含有氟原子的二羧酸化合物以及由式(M-2)表示的含有氟原子的二羧酸酐化合物如下。The dicarboxylic acid containing a fluorine atom or an anhydride thereof is selected from the group consisting of a fluorine atom-containing dicarboxylic acid compound represented by the formula (M-1) and a fluorine atom-containing dicarboxylic anhydride compound represented by the formula (M-2). . Specifically, the fluorine atom-containing dicarboxylic acid compound represented by the formula (M-1) and the fluorine atom-containing dicarboxylic acid anhydride compound represented by the formula (M-2) are as follows.
Figure PCTCN2015092029-appb-000037
Figure PCTCN2015092029-appb-000037
式(M-1)与式(M-2)中,G1表示碳数为1至100的含氟原子的有机基。In the formula (M-1) and the formula (M-2), G 1 represents an organic group of a fluorine atom having 1 to 100 carbon atoms.
含有氟原子的二羧酸或其酸酐的具体例包括3-氟邻苯二甲酸、4-氟邻苯 二甲酸、四氟邻苯二甲酸、3,6-二氟邻苯二甲酸、四氟琥珀酸,或上述二羧酸的酸酐化合物,或上述化合物的组合。Specific examples of the dicarboxylic acid containing a fluorine atom or an anhydride thereof include 3-fluorophthalic acid and 4-fluoro-o-benzene. Dicarboxylic acid, tetrafluorophthalic acid, 3,6-difluorophthalic acid, tetrafluorosuccinic acid, or an acid anhydride compound of the above dicarboxylic acid, or a combination of the above compounds.
其它二羧酸或其酸酐的具体例包括饱和直链烃二羧酸、饱和环状烃二羧酸、不饱和二羧酸,或上述二羧酸化合物的酸酐,或上述化合物的组合。Specific examples of the other dicarboxylic acid or its anhydride include a saturated linear hydrocarbon dicarboxylic acid, a saturated cyclic hydrocarbon dicarboxylic acid, an unsaturated dicarboxylic acid, or an acid anhydride of the above dicarboxylic acid compound, or a combination of the above compounds.
饱和直链烃二羧酸的具体例包括丁二酸、乙酰基丁二酸、己二酸、壬二酸、柠苹酸、丙二酸、戊二酸、柠檬酸、酒石酸、氧代戊二酸、庚二酸、癸二酸、辛二酸、二甘醇酸,或上述化合物的组合。饱和直链烃二羧酸中的烃基也可被取代。Specific examples of the saturated linear hydrocarbon dicarboxylic acid include succinic acid, acetyl succinic acid, adipic acid, sebacic acid, citramalic acid, malonic acid, glutaric acid, citric acid, tartaric acid, oxopentane Acid, pimelic acid, sebacic acid, suberic acid, diglycolic acid, or a combination of the above compounds. Hydrocarbyl groups in saturated linear hydrocarbon dicarboxylic acids can also be substituted.
饱和环状烃二羧酸的具体例包括六氢邻苯二甲酸、环丁烷二羧酸、环戊烷二羧酸、降冰片烷二羧酸、六氢偏苯三酸,或上述化合物的组合。饱和环状烃二羧酸亦可为饱和烃经取代的脂环式二羧酸。Specific examples of the saturated cyclic hydrocarbon dicarboxylic acid include hexahydrophthalic acid, cyclobutanedicarboxylic acid, cyclopentanedicarboxylic acid, norbornanedicarboxylic acid, hexahydrotrimellitic acid, or the like combination. The saturated cyclic hydrocarbon dicarboxylic acid may also be a saturated hydrocarbon-substituted alicyclic dicarboxylic acid.
不饱和二羧酸的具体例包括马来酸、衣康酸、邻苯二甲酸、四氢邻苯二甲酸、甲基桥亚甲基四氢邻苯二甲酸、氯茵酸、偏苯三酸,或上述化合物的组合。Specific examples of the unsaturated dicarboxylic acid include maleic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, methyl bridgedmethylenetetrahydrophthalic acid, chlorinic acid, and trimellitic acid. , or a combination of the above compounds.
其它二羧酸或其酸酐的具体例包括三甲氧基硅烷基丙基丁二酸酐、三乙氧基硅烷基丙基丁二酸酐、甲基二甲氧基硅烷基丙基丁二酸酐、甲基二乙氧基硅烷基丙基丁二酸酐、三甲氧基硅烷基丁基丁二酸酐、三乙氧基硅烷基丁基丁二酸酐、甲基二乙氧基硅烷基丁基丁二酸酐、对(三甲氧基硅烷基)苯基丁二酸酐、对(三乙氧基硅烷基)苯基丁二酸酐、对(甲基二甲氧基硅烷基)苯基丁二酸酐、对(甲基二乙氧基硅烷基)苯基丁二酸酐、间(三甲氧基硅烷基)苯基丁二酸酐、间(三乙氧基硅烷基)苯基丁二酸酐、间(甲基二乙氧基硅烷基)苯基丁二酸酐等二羧酸酐,或上述二羧酸酐的二羧酸化合物,或上述化合物的组合。Specific examples of other dicarboxylic acids or anhydrides thereof include trimethoxysilylpropyl succinic anhydride, triethoxysilyl propyl succinic anhydride, methyldimethoxysilyl propyl succinic anhydride, and methyl group. Diethoxysilylpropyl succinic anhydride, trimethoxysilylbutyl succinic anhydride, triethoxysilyl butyl succinic anhydride, methyldiethoxysilyl butyl succinic anhydride, (trimethoxysilyl)phenyl succinic anhydride, p-(triethoxysilyl)phenyl succinic anhydride, p-(methyldimethoxysilyl)phenyl succinic anhydride, p-methyl Ethoxysilyl)phenylsuccinic anhydride, m-(trimethoxysilyl)phenylsuccinic anhydride, m-(triethoxysilyl)phenylsuccinic anhydride, m-(diethoxysilane) A dicarboxylic acid anhydride such as phenyl succinic anhydride or a dicarboxylic acid compound of the above dicarboxylic anhydride or a combination of the above compounds.
碱可溶性树脂(A-1)的合成方法并无特别限制,只要将具有至少二个环氧基的环氧化合物(a-1-1)、具有至少一个羧酸基及至少一个乙烯性不饱和基的化合物(a-1-2)、四羧酸或其酸二酐(a-1-3)以及二羧酸酐或其酸酐(a-1-4)反应即可获得。The method for synthesizing the alkali-soluble resin (A-1) is not particularly limited as long as the epoxy compound (a-1-1) having at least two epoxy groups, at least one carboxylic acid group, and at least one ethylenic unsaturated group are used. The compound (a-1-2), the tetracarboxylic acid or its acid dianhydride (a-1-3), and the dicarboxylic anhydride or its anhydride (a-1-4) are obtained by reaction.
碱可溶性树脂(A-1)的数量平均分子量一般为1000至8000,较佳为1500至7500,更佳为2000至7000。上述碱可溶性树脂(A-1)通过胶体渗透层析仪(Gel Permeation Chromatography,简称GPC)测定的聚苯乙烯来换算数量平均分子量。 The number average molecular weight of the alkali-soluble resin (A-1) is usually from 1,000 to 8,000, preferably from 1,500 to 7,500, more preferably from 2,000 to 7,000. The above alkali-soluble resin (A-1) is converted into a number average molecular weight by polystyrene measured by a gel permeation chromatography (GPC).
基于所述碱可溶性树脂(A)为100重量份,所述碱可溶性树脂(A-1)的使用量为5至95重量份,较佳为10重量份至90重量份,且更佳为15重量份至85重量份。当未使用碱可溶性树脂(A-1)时,该感光性树脂组成物会有逸气性表现不佳的问题。The alkali-soluble resin (A-1) is used in an amount of 5 to 95 parts by weight, preferably 10 parts by weight to 90 parts by weight, based on 100 parts by weight of the alkali-soluble resin (A), and more preferably 15 parts by weight. Parts by weight to 85 parts by weight. When the alkali-soluble resin (A-1) is not used, the photosensitive resin composition has a problem that the outgassing performance is poor.
当碱可溶性树脂(A-1)的数量平均分子量不在1000至8000范围时,该感光性树脂组成物会有逸气性表现不佳的问题。When the number average molecular weight of the alkali-soluble resin (A-1) is not in the range of from 1,000 to 8,000, the photosensitive resin composition may have a problem that the outgassing performance is poor.
碱可溶性树脂(A-2)Alkali soluble resin (A-2)
碱可溶性树脂(A-2)是由不饱和羧酸或不饱和羧酸酐化合物(a-2-1)、含脂环式碳氢基的不饱和化合物(a-2-2)及其它不饱和化合物(a-2-3)共聚合而得。The alkali-soluble resin (A-2) is composed of an unsaturated carboxylic acid or an unsaturated carboxylic anhydride compound (a-2-1), an alicyclic hydrocarbon group-containing unsaturated compound (a-2-2), and other unsaturated groups. The compound (a-2-3) is obtained by copolymerization.
用以制备该碱可溶性树脂(A-2)的溶剂可包含但不限于乙二醇甲醚、乙二醇乙醚、二甘醇甲醚、二甘醇乙醚、二甘醇正丙醚、二甘醇正丁醚、三甘醇甲醚、三甘醇乙醚、丙二醇甲醚、丙二醇乙醚、一缩二丙二醇甲醚、一缩二丙二醇乙醚、一缩二丙二醇正丙醚、一缩二丙二醇正丁醚、二缩三丙二醇甲醚(tripropylene glycol mono methyl ether)、二缩三丙二醇乙醚(tripropylene glycol mono ethyl ether)等的(聚)亚烷基二醇单烷醚类溶剂;乙二醇甲醚醋酸酯、乙二醇乙醚醋酸酯、丙二醇甲醚醋酸酯、丙二醇乙醚醋酸酯等的(聚)亚烷基二醇单烷醚醋酸酯类溶剂;二甘醇二甲醚、二甘醇甲乙醚、二甘醇二乙醚、四氢呋喃等的其他醚类溶剂;甲乙烷酮、环己酮、2-庚酮、3-庚酮等的酮类溶剂;2-羟基丙酸甲酯、2-羟基丙酸乙酯等的乳酸烷酯类溶剂;2-羟基-2-甲基丙酸甲酯、2-羟基-2-甲基丙酸乙酯、3-甲氧基丙酸甲酯、3-甲氧基丙酸乙酯、3-乙氧基丙酸甲酯、3-乙氧基丙酸乙酯、乙氧基乙酸乙酯、羟基乙酸乙酯、2-羟基-3-甲基丁酸甲酯、3-甲基-3-甲氧基丁基乙酸酯、3-甲基-3-甲氧基丁基丙酸酯、乙酸乙酯、乙酸正丙酯、乙酸异丙酯、乙酸正丁酯、乙酸异丁酯、乙酸正戊酯、乙酸异戊酯、丙酸正丁酯、丁酸乙酯、丁酸正丙酯、丁酸异丙酯、丁酸正丁酯、丙酮酸甲酯、丙酮酸乙酯、丙酮酸正丙酯、乙酰乙酸甲酯、乙酰乙酸乙酯、2-氧基丁酸乙酯等的其他酯类溶剂;甲苯、二甲苯等的芳香族碳氢化合物溶剂;N-甲基吡咯烷酮、N,N-二甲基甲酰胺、N,N-二甲基乙酰胺等的羧酸酰胺溶剂。上述的溶剂可单独一种或混合复数种使用。The solvent used to prepare the alkali-soluble resin (A-2) may include, but is not limited to, ethylene glycol methyl ether, ethylene glycol diethyl ether, diethylene glycol methyl ether, diethylene glycol ethyl ether, diethylene glycol n-propyl ether, diethylene glycol Butyl ether, triethylene glycol methyl ether, triethylene glycol ethyl ether, propylene glycol methyl ether, propylene glycol ethyl ether, dipropylene glycol methyl ether, dipropylene glycol diethyl ether, dipropylene glycol n-propyl ether, dipropylene glycol n-butyl ether, a (poly)alkylene glycol monoalkyl ether solvent such as tripropylene glycol mono methyl ether or tripropylene glycol mono ethyl ether; ethylene glycol methyl ether acetate; a (poly)alkylene glycol monoalkyl ether acetate solvent such as ethylene glycol ethyl ether acetate, propylene glycol methyl ether acetate or propylene glycol diethyl ether acetate; diglyme, diethylene glycol methyl ether, digan Other ether solvents such as alcohol diethyl ether and tetrahydrofuran; ketone solvents such as methyl ethyl ketone, cyclohexanone, 2-heptanone and 3-heptanone; methyl 2-hydroxypropionate and 2-hydroxypropionic acid Alcoholic acid alkyl ester solvent such as ester; methyl 2-hydroxy-2-methylpropionate, 2-hydroxy-2-methyl Ethyl propyl propionate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethoxyacetic acid Ethyl ester, ethyl hydroxyacetate, methyl 2-hydroxy-3-methylbutanoate, 3-methyl-3-methoxybutyl acetate, 3-methyl-3-methoxybutylpropane Acid ester, ethyl acetate, n-propyl acetate, isopropyl acetate, n-butyl acetate, isobutyl acetate, n-amyl acetate, isoamyl acetate, n-butyl propionate, ethyl butyrate, butyric acid N-propyl ester, isopropyl butyrate, n-butyl butyrate, methyl pyruvate, ethyl pyruvate, n-propyl pyruvate, methyl acetoacetate, ethyl acetoacetate, ethyl 2-oxybutyrate Other ester solvents such as; aromatic hydrocarbon solvents such as toluene and xylene; carboxylic acid amides such as N-methylpyrrolidone, N,N-dimethylformamide, and N,N-dimethylacetamide Solvent. The above solvents may be used singly or in combination of plural kinds.
较佳地,用以制备该碱可溶性树脂(A-2)的溶剂是选自于丙二醇甲醚醋酸 酯、3-乙氧基丙酸乙酯或环己酮。Preferably, the solvent used to prepare the alkali-soluble resin (A-2) is selected from the group consisting of propylene glycol methyl ether acetate Ester, ethyl 3-ethoxypropionate or cyclohexanone.
用以制备该碱可溶性树脂(A-2)的起始剂一般为自由基型聚合起始剂,且该起始剂可包含但不限于2,2’-偶氮双异丁腈(2,2’-azobisisobutyronitrile)、2,2’-偶氮双(2,4-二甲基戊腈)[2,2’-azobis-(2,4-dimethylvaleronitrile)]、2,2’-偶氮双(4-甲氧基-2,4-二甲基戊腈)[2,2’-azobis-(4-methoxy-2,4-dimethylvaleronitrile)]、2,2’-偶氮双-2-甲基丁腈(2,2’-azobis-2-methyl butyronitrile)等的偶氮(azo)化合物;过氧化二苯甲酰(benzoylperoxide)等的过氧化合物。The initiator for preparing the alkali-soluble resin (A-2) is generally a radical polymerization initiator, and the initiator may include, but is not limited to, 2,2'-azobisisobutyronitrile (2, 2'-azobisisobutyronitrile, 2,2'-azobis(2,4-dimethylvaleronitrile), 2,2'-azobis (2-methoxy-2,4-dimethylvaleronitrile), 2,2'-azobis-2-methyl An azo compound such as 2,2'-azobis-2-methyl butyronitrile; a peroxy compound such as benzoylperoxide.
不饱和羧酸或不饱和羧酸酐化合物(a-2-1)Unsaturated carboxylic acid or unsaturated carboxylic anhydride compound (a-2-1)
不饱和羧酸或不饱和羧酸酐化合物(a-2-1)的构造并无特别限制。在本发明的具体例中,该不饱和羧酸或不饱和羧酸酐化合物(a-2-1)包括丙烯酸(AA)、甲基丙烯酸(MAA)、2-甲基丙烯酰乙氧基丁二酸酯(HOMS)、丁烯酸、α-氯丙烯酸、乙基丙烯酸、肉桂酸、马来酸、马来酸酐、富马酸、衣康酸、衣康酸酐、柠康酸、柠康酸酐或上述的酸酐或其混合物。较佳地,不饱和羧酸或不饱和羧酸酐化合物(a-2-1)为丙烯酸、甲基丙烯酸、2-甲基丙烯酰乙氧基丁二酸酯或上述的酸酐或其混合物。The structure of the unsaturated carboxylic acid or unsaturated carboxylic anhydride compound (a-2-1) is not particularly limited. In a specific example of the present invention, the unsaturated carboxylic acid or unsaturated carboxylic anhydride compound (a-2-1) includes acrylic acid (AA), methacrylic acid (MAA), 2-methacryloyloxybutylene Acid ester (HOMS), crotonic acid, α-chloroacrylic acid, ethacrylic acid, cinnamic acid, maleic acid, maleic anhydride, fumaric acid, itaconic acid, itaconic anhydride, citraconic acid, citraconic anhydride or The above anhydride or a mixture thereof. Preferably, the unsaturated carboxylic acid or unsaturated carboxylic anhydride compound (a-2-1) is acrylic acid, methacrylic acid, 2-methacryloyloxy succinate or the above anhydride or a mixture thereof.
基于所述碱可溶性树脂(A-2)的所述不饱和羧酸或不饱和羧酸酐化合物(a-2-1)、所述含脂环式碳氢基的不饱和化合物(a-2-2)及所述其它不饱和化合物(a-2-3)的合计量为100重量份,所述不饱和羧酸或不饱和羧酸酐化合物(a-2-1)的使用量范围为20重量份至40重量份;较佳为23重量份至38重量份;更佳为25重量份至35重量份。The unsaturated carboxylic acid or unsaturated carboxylic anhydride compound (a-2-1) based on the alkali-soluble resin (A-2), the alicyclic hydrocarbon group-containing unsaturated compound (a-2- 2) and the total amount of the other unsaturated compound (a-2-3) is 100 parts by weight, and the unsaturated carboxylic acid or unsaturated carboxylic anhydride compound (a-2-1) is used in an amount of 20 parts by weight. The portion is 40 parts by weight; preferably 23 parts by weight to 38 parts by weight; more preferably 25 parts by weight to 35 parts by weight.
含脂环式碳氢基的不饱和化合物(a-2-2)Alicyclic compound containing an alicyclic hydrocarbon group (a-2-2)
含脂环式碳氢基的不饱和化合物(a-2-2)的构造并无特别限制,在本发明的具体例中,含脂环式碳氢基的不饱和化合物(a-2-2)是选自为具有双环戊基的不饱和化合物、具有双环戊烯基的不饱和化合物及其混合物所组成的群组。The structure of the alicyclic hydrocarbon group-containing unsaturated compound (a-2-2) is not particularly limited, and in the specific example of the present invention, an alicyclic hydrocarbon group-containing unsaturated compound (a-2-2) Is a group consisting of an unsaturated compound having a bicyclopentyl group, an unsaturated compound having a dicyclopentenyl group, and a mixture thereof.
在本发明的一具体例中,该具双环戊基的不饱和化合物具有下式(aII-1)所示的结构: In a specific example of the present invention, the unsaturated compound having a bicyclopentyl group has a structure represented by the following formula (aII-1):
Figure PCTCN2015092029-appb-000038
Figure PCTCN2015092029-appb-000038
其中:among them:
U1表示氢原子或甲烷基;及U 1 represents a hydrogen atom or a methyl group;
u表示为0至2的整数。u is represented as an integer from 0 to 2.
另一方面,在本发明的一具体例中,该具双环戊烯基的不饱和化合物具有下式(aII-2)所示的结构:On the other hand, in a specific example of the present invention, the dicyclopentenyl-containing unsaturated compound has a structure represented by the following formula (aII-2):
Figure PCTCN2015092029-appb-000039
Figure PCTCN2015092029-appb-000039
其中:among them:
U2表示氢原子或甲烷基;及U 2 represents a hydrogen atom or a methyl group;
v表示为0至2的整数。v represents an integer of 0 to 2.
在本发明的一较佳具体例中,含脂环式碳氢基的不饱和化合物(a-2-2)是选自由(甲基)丙烯酸双环戊酯、(甲基)丙烯酸双环戊烯酯、(甲基)丙烯酸双环戊氧基乙酯、(甲基)丙烯酸双环戊烯氧基乙酯及其混合物所组成的群组。In a preferred embodiment of the present invention, the alicyclic hydrocarbon group-containing unsaturated compound (a-2-2) is selected from the group consisting of dicyclopentanyl (meth)acrylate and biscyclopentenyl (meth)acrylate. a group consisting of dicyclopentyloxyethyl (meth)acrylate, dicyclopentenyloxyethyl (meth)acrylate, and mixtures thereof.
基于所述碱可溶性树脂(A-2)的所述不饱和羧酸或不饱和羧酸酐化合物(a-2-1)、所述含脂环式碳氢基的不饱和化合物(a-2-2)及所述其它不饱和化合物(a-2-3)的合计量为100重量份,所述含脂环式碳氢基的不饱和化合物(a-2-2)的使用量范围为10重量份至50重量份;较佳为15重量份至45重量份;更佳为20重量份至40重量份。。The unsaturated carboxylic acid or unsaturated carboxylic anhydride compound (a-2-1) based on the alkali-soluble resin (A-2), the alicyclic hydrocarbon group-containing unsaturated compound (a-2- 2) and the total amount of the other unsaturated compound (a-2-3) is 100 parts by weight, and the alicyclic hydrocarbon group-containing unsaturated compound (a-2-2) is used in an amount of 10 parts. The parts by weight to 50 parts by weight; preferably 15 parts by weight to 45 parts by weight; more preferably 20 parts by weight to 40 parts by weight. .
其它不饱和化合物(a-2-3)Other unsaturated compounds (a-2-3)
在本发明的一较佳具体例中,碱可溶性树脂(A-2)可包括其它不饱和化合物(a-2-3)。其它不饱和化合物(a-2-3)的具体例为苯乙烯、α-甲基苯乙烯、乙烯基甲苯、对氯苯乙烯、二乙烯基苯、苯甲基甲基丙烯酸酯、苯甲基丙烯酸酯、苯基甲基丙烯酸酯、苯基丙烯酸酯、2-硝基苯基丙烯酸酯、4-硝基苯基丙烯酸酯、2-硝基苯甲基丙烯酸酯、2-硝基苯甲基甲基丙烯酸酯、2-硝基苯基甲 基丙烯酸酯、2-氯苯基甲基丙烯酸酯、4-氯苯基甲基丙烯酸酯、2-氯苯基丙烯酸酯、4-氯苯基丙烯酸酯、苯氧基乙基甲基丙烯酸酯、苯氧基聚乙二醇丙烯酸酯、苯氧基聚乙二醇甲基丙烯酸酯、壬基苯氧基聚乙二醇丙烯酸酯、壬基苯氧基聚乙二醇甲基丙烯酸酯、N-苯基马来酰亚胺、N-邻-羟基苯基马来酰亚胺、N-间-羟基苯基马来酰亚胺、N-对-羟基苯基马来酰亚胺、N-邻-甲基苯基马来酰亚胺、N-间-甲基苯基马来酰亚胺、N-对-甲基苯基马来酰亚胺、N-邻-甲氧基苯基马来酰亚胺、N-间-甲氧基苯基马来酰亚胺、N-对-甲氧基苯基马来酰亚胺、邻-乙烯基苯酚、间-乙烯基苯酚、对-乙烯基苯酚、2-甲基-4-乙烯基苯酚、3-甲基-4-乙烯基苯酚、邻-异丙烯基苯酚、间-异丙烯基苯酚、对-异丙烯基苯酚、2-乙烯基-1-萘酚、3-乙烯基-1-萘酚、1-乙烯基-2-萘酚、3-乙烯基-2-萘酚、2-异丙烯基-1-萘酚、3-异丙烯基-1-萘酚、邻-甲氧基苯乙烯、间-甲氧基苯乙烯、对-甲氧基苯乙烯、邻-甲氧基甲基苯乙烯、间-甲氧基甲基苯乙烯、对-甲氧基甲基苯乙烯、邻-(乙烯基苯甲基)环氧丙基醚、间-(乙烯基苯甲基)环氧丙基醚、对-(乙烯基苯甲基)环氧丙基醚、茚、乙酰基萘、N-环己基马来酰亚胺、丙烯酸甲酯(MA)、丙烯酸乙酯、丙烯酸正丙酯、丙烯酸异丙酯、丙烯酸正丁酯、丙烯酸异丁酯、丙烯酸第二丁酯、丙烯酸第三丁酯、丙烯酸2-羟基乙酯、丙烯酸2-羟基丙酯、丙烯酸3-羟基丙酯、丙烯酸2-羟基丁酯、丙烯酸3-羟基丁酯、丙烯酸4-羟基丁酯、丙烯酸烯丙酯、丙烯酸三乙二醇甲氧酯、N,N-二甲基胺基丙烯酸乙酯、N,N-二乙基胺基丙烯酸丙酯、N,N-二丁基胺基丙烯酸丙酯、丙烯酸环氧丙基酯、甲基丙烯酸甲酯(MMA)、甲基丙烯酸乙酯、甲基丙烯酸正丙酯、甲基丙烯酸异丙酯、甲基丙烯酸正丁酯、甲基丙烯酸异丁酯、甲基丙烯酸第二丁酯、甲基丙烯酸第三丁酯、甲基丙烯酸2-羟基乙酯、甲基丙烯酸2-羟基丙酯、甲基丙烯酸3-羟基丙酯、甲基丙烯酸2-羟基丁酯、甲基丙烯酸3-羟基丁酯、甲基丙烯酸4-羟基丁酯、甲基丙烯酸烯丙酯、甲基丙烯酸三乙二醇甲氧酯、甲基丙烯酸十二烷基酯、甲基丙烯酸十四烷基酯、甲基丙烯酸十六烷基酯、甲基丙烯酸十八烷基酯、甲基丙烯酸二十烷基酯、甲基丙烯酸二十二烷基酯、甲基丙烯酸N,N-二甲基胺基乙酯、N,N-二甲基胺基甲基丙烯酸丙酯、N-异-丁基胺基甲基丙烯酸乙酯、甲基丙烯酸环氧丙基酯(GMA)、乙酸乙烯酯、丙酸乙烯酯、丁酸乙烯酯、乙烯基甲醚、乙烯基乙醚、烯丙基环氧丙基醚、甲代烯丙基环氧丙基醚(methallyl glycidyl ether)、丙烯腈、甲基丙烯腈、α-氯丙烯腈、氰化亚乙烯、丙烯酰胺、甲基丙烯酰胺、α-氯丙烯酰胺、N-羟乙基丙烯酰胺、N-羟乙基甲基丙烯酰胺、1,3-丁二烯、异戊烯、氯化丁二烯或其混合物;较佳地,该第三不饱和单体系为丙烯酸甲酯、丙烯酸乙酯、丙烯酸正丙酯、丙烯酸异丙酯、丙烯酸正丁酯、丙烯酸异丁酯、丙烯酸第二丁酯、丙烯酸第三丁酯、丙烯酸2-羟基乙酯、丙 烯酸2-羟基丙酯、甲基丙烯酸甲酯、甲基丙烯酸乙酯、甲基丙烯酸正丙酯、甲基丙烯酸异丙酯、甲基丙烯酸正丁酯、甲基丙烯酸异丁酯、甲基丙烯酸第二丁酯、甲基丙烯酸第三丁酯、甲基丙烯酸2-羟基乙酯、甲基丙烯酸2-羟基丙酯、甲基丙烯酸环氧丙基酯、乙酸乙烯酯、丙烯腈、甲基丙烯腈、1,3-丁二烯、异戊烯或其混合物。较佳地,该第三不饱和单体系为苯乙烯、α-甲基苯乙烯、苯基甲基丙烯酸酯、苯基丙烯酸酯、N-苯基马来酰亚胺(PMI)、N-邻-羟基苯基马来酰亚胺、N-间-羟基苯基马来酰亚胺、N-对-羟基苯基马来酰亚胺、甲基丙烯酸环氧丙基酯、甲基丙烯酸甲酯单体、丙烯酸甲酯单体、甲基丙烯酸2-甲基环氧丙酯(MGMA)、甲基丙烯酸苯甲酯(BzMA)或其混合物。In a preferred embodiment of the invention, the alkali-soluble resin (A-2) may include other unsaturated compounds (a-2-3). Specific examples of the other unsaturated compound (a-2-3) are styrene, α-methylstyrene, vinyltoluene, p-chlorostyrene, divinylbenzene, benzyl methacrylate, benzyl. Acrylate, phenyl methacrylate, phenyl acrylate, 2-nitrophenyl acrylate, 4-nitrophenyl acrylate, 2-nitrophenyl methacrylate, 2-nitrobenzyl Methacrylate, 2-nitrophenyl Acrylate, 2-chlorophenyl methacrylate, 4-chlorophenyl methacrylate, 2-chlorophenyl acrylate, 4-chlorophenyl acrylate, phenoxyethyl methacrylate, Phenoxy polyethylene glycol acrylate, phenoxy polyethylene glycol methacrylate, nonyl phenoxy polyethylene glycol acrylate, nonyl phenoxy polyethylene glycol methacrylate, N- Phenyl maleimide, N-o-hydroxyphenylmaleimide, N-m-hydroxyphenylmaleimide, N-p-hydroxyphenylmaleimide, N-ortho -methylphenylmaleimide, N-m-methylphenylmaleimide, N-p-methylphenylmaleimide, N-o-methoxyphenyl Malay Imid, N-m-methoxyphenylmaleimide, N-p-methoxyphenylmaleimide, o-vinylphenol, m-vinylphenol, p-vinyl Phenol, 2-methyl-4-vinylphenol, 3-methyl-4-vinylphenol, o-isopropenylphenol, m-isopropenylphenol, p-isopropenylphenol, 2-vinyl- 1-naphthol, 3-vinyl-1-naphthol, 1-vinyl-2-naphthol, 3-vinyl-2-naphthol, 2-isopropene 1-naphthol, 3-isopropenyl-1-naphthol, o-methoxystyrene, m-methoxystyrene, p-methoxystyrene, o-methoxymethylstyrene , m-methoxymethylstyrene, p-methoxymethylstyrene, o-(vinylbenzyl)epoxypropyl ether, m-(vinylbenzyl)epoxypropyl ether , p-(vinylbenzyl)epoxypropyl ether, hydrazine, acetylnaphthalene, N-cyclohexylmaleimide, methyl acrylate (MA), ethyl acrylate, n-propyl acrylate, acrylic acid Propyl ester, n-butyl acrylate, isobutyl acrylate, dibutyl acrylate, tert-butyl acrylate, 2-hydroxyethyl acrylate, 2-hydroxypropyl acrylate, 3-hydroxypropyl acrylate, 2-hydroxy acrylate Butyl ester, 3-hydroxybutyl acrylate, 4-hydroxybutyl acrylate, allyl acrylate, triethylene glycol methacrylate, N,N-dimethylamino acrylate, N,N-diethyl Propyl propyl acrylate, N,N-dibutylamino propyl acrylate, glycidyl acrylate, methyl methacrylate (MMA), ethyl methacrylate, n-propyl methacrylate, A Acrylic acid Propyl ester, n-butyl methacrylate, isobutyl methacrylate, second butyl methacrylate, third butyl methacrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl methacrylate , 3-hydroxypropyl methacrylate, 2-hydroxybutyl methacrylate, 3-hydroxybutyl methacrylate, 4-hydroxybutyl methacrylate, allyl methacrylate, triethylene methacrylate Alcohol methoxy ester, dodecyl methacrylate, tetradecyl methacrylate, cetyl methacrylate, octadecyl methacrylate, eicosyl methacrylate, Tetylene glycol methacrylate, N,N-dimethylaminoethyl methacrylate, N,N-dimethylaminopropyl methacrylate, N-iso-butylaminomethyl Ethyl acrylate, glycidyl methacrylate (GMA), vinyl acetate, vinyl propionate, vinyl butyrate, vinyl methyl ether, vinyl ethyl ether, allyl epoxypropyl ether, methyl Allyl glycidyl ether, acrylonitrile, methacrylonitrile, alpha-chloroacrylonitrile, vinyl cyanide, propylene Amide, methacrylamide, α-chloroacrylamide, N-hydroxyethyl acrylamide, N-hydroxyethyl methacrylamide, 1,3-butadiene, isoamylene, chlorobutadiene or its Preferably, the third unsaturated single system is methyl acrylate, ethyl acrylate, n-propyl acrylate, isopropyl acrylate, n-butyl acrylate, isobutyl acrylate, second butyl acrylate, acrylic acid Tributyl ester, 2-hydroxyethyl acrylate, C 2-hydroxypropyl enoate, methyl methacrylate, ethyl methacrylate, n-propyl methacrylate, isopropyl methacrylate, n-butyl methacrylate, isobutyl methacrylate, methyl Dibutyl acrylate, tert-butyl methacrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl methacrylate, glycidyl methacrylate, vinyl acetate, acrylonitrile, methyl Acrylonitrile, 1,3-butadiene, isoamylene or a mixture thereof. Preferably, the third unsaturated single system is styrene, α-methylstyrene, phenyl methacrylate, phenyl acrylate, N-phenylmaleimide (PMI), N-ortho -hydroxyphenylmaleimide, N-m-hydroxyphenylmaleimide, N-p-hydroxyphenylmaleimide, glycidyl methacrylate, methyl methacrylate Monomer, methyl acrylate monomer, 2-methylglycidyl methacrylate (MGMA), benzyl methacrylate (BzMA) or a mixture thereof.
基于所述碱可溶性树脂(A-2)的所述不饱和羧酸或不饱和羧酸酐化合物(a-2-1)、所述含脂环式碳氢基的不饱和化合物(a-2-2)及所述其它不饱和化合物(a-2-3)的合计量为100重量份,所述其它不饱和化合物(a-2-3)的使用量范围为10重量份至70重量份;较佳为17重量份至62重量份;更佳为25重量份至55重量份。The unsaturated carboxylic acid or unsaturated carboxylic anhydride compound (a-2-1) based on the alkali-soluble resin (A-2), the alicyclic hydrocarbon group-containing unsaturated compound (a-2- 2) and the total amount of the other unsaturated compound (a-2-3) is 100 parts by weight, and the other unsaturated compound (a-2-3) is used in an amount ranging from 10 parts by weight to 70 parts by weight; It is preferably from 17 parts by weight to 62 parts by weight; more preferably from 25 parts by weight to 55 parts by weight.
上述碱可溶性树脂(A-2)通过胶体渗透层析仪(Gel Permeation Chromatography,简称GPC)所测定的聚苯乙烯换算的重量平均分子量一般为3000至30000,较佳为5000至25000,更佳为7000至20000。The polystyrene-equivalent weight average molecular weight of the above alkali-soluble resin (A-2) measured by Gel Permeation Chromatography (GPC) is generally from 3,000 to 30,000, preferably from 5,000 to 25,000, more preferably 7000 to 20,000.
基于所述碱可溶性树脂(A)为100重量份,所述碱可溶性树脂(A-2)的使用量为5至95重量份,较佳为10重量份至90重量份,且更佳为15重量份至85重量份。当未使用碱可溶性树脂(A-2)时,该感光性树脂组成物会有高精细度的图案直线性不佳的问题。The alkali-soluble resin (A-2) is used in an amount of 5 to 95 parts by weight, preferably 10 parts by weight to 90 parts by weight, based on 100 parts by weight of the alkali-soluble resin (A), and more preferably 15 parts by weight. Parts by weight to 85 parts by weight. When the alkali-soluble resin (A-2) is not used, the photosensitive resin composition has a problem that the high-definition pattern has poor linearity.
当碱可溶性树脂(A-2)的重量平均分子量不在3000至30000范围时,该感光性树脂组成物会有高精细度的图案直线性不佳的问题。When the weight average molecular weight of the alkali-soluble resin (A-2) is not in the range of 3,000 to 30,000, the photosensitive resin composition has a problem that the pattern linearity of high-definition is poor.
另外,碱可溶性树脂(A-1)与碱可溶性树脂(A-2)的使用量的重量比值范围(A-1)/(A-2)为5/95至95/5。当重量比值范围(A-1)/(A-2)未落入上述范围内时,该感光性树脂组成物会有逸气性表现不佳及高精细度的图案直线性不佳的问题。Further, the weight ratio range (A-1) / (A-2) of the amount of the alkali-soluble resin (A-1) to the alkali-soluble resin (A-2) is 5/95 to 95/5. When the weight ratio range (A-1)/(A-2) does not fall within the above range, the photosensitive resin composition has a problem that the outgassing performance is poor and the high definition pattern linearity is poor.
乙烯性不饱和基的化合物(B)Ethylene unsaturated group compound (B)
乙烯性不饱和基的化合物(B)包括第一化合物(B-1)以及第二化合物(B-2)。 The ethylenically unsaturated group-containing compound (B) includes the first compound (B-1) and the second compound (B-2).
第一化合物(B-1)First compound (B-1)
第一化合物(B-1)可具有胺基甲酸酯基(urethane group)与至少7个丙烯酰基(acryloyl group)。较佳地,第一化合物(B-1)可具有胺基甲酸酯基与至少10个丙烯酰基。The first compound (B-1) may have a urethane group and at least 7 acryloyl groups. Preferably, the first compound (B-1) may have a urethane group and at least 10 acryl groups.
第一化合物(B-1)的制备方法例如但不限于以多异氰酸酯化合物及多元醇化合物经缩合反应而制得,其中多异氰酸酯化合物及多元醇化合物中的至少一个具有丙烯酰基,且该多异氰酸酯化合物及多元醇化合物所含有的丙烯酰基的总数较佳至少为7个,且更佳为至少10个。The preparation method of the first compound (B-1) is, for example but not limited to, a condensation reaction of a polyisocyanate compound and a polyol compound, wherein at least one of the polyisocyanate compound and the polyol compound has an acryloyl group, and the polyisocyanate The total number of acryloyl groups contained in the compound and the polyol compound is preferably at least 7, and more preferably at least 10.
当第一化合物(B-1)具有胺基甲酸酯基及至少10个丙烯酰基时,所制得的感光性树脂组成物的图案平滑性更佳。When the first compound (B-1) has a urethane group and at least 10 acryl groups, the resulting photosensitive resin composition has better pattern smoothness.
第一化合物(B-1)的具体例可为市售的商品,例如:日本合成化学工业股份有限公司制造的商品,且其型号可为UV1700B(重量平均分子量为2000且其具有10个丙烯酰基)、UV6300B(具有7个丙烯酰基)或UV7640B(具有7个丙烯酰基)等;日本化药股份有限公司制造的商品,且其型号可为DPHA40H(重量平均分子量为7000且其具有10个丙烯酰基)或UX5001T(具有8个丙烯酰基)等;根上工业股份有限公司制造的商品,且其型号可为UN3320HS(重量平均分子量为5000且其具有15个丙烯酰基)、UN904(重量平均分子量为4900且其具有10个丙烯酰基)、UN3320HC(重量平均分子量为1500且其具有10个丙烯酰基)等;或者新中村化学公司制造的商品,且其型号可为U15HA(重量平均分子量为2000且其具有15个丙烯酰基)、UA-33H(具有9个丙烯酰基)或UA-53H(具有15个丙烯酰基)等。Specific examples of the first compound (B-1) may be commercially available products, for example, those manufactured by Nippon Synthetic Chemical Co., Ltd., and may be of a type of UV1700B (weight average molecular weight of 2000 and having 10 acryloyl groups) ), UV6300B (having 7 acryloyl groups) or UV7640B (having 7 acryloyl groups), etc.; a product manufactured by Nippon Kayaku Co., Ltd., and its model number is DPHA40H (weight average molecular weight is 7000 and it has 10 acryloyl groups) Or UX5001T (with 8 acryloyl groups), etc.; a product manufactured by Gensei Industrial Co., Ltd., and its model can be UN3320HS (weight average molecular weight is 5000 and it has 15 acryloyl groups), UN904 (weight average molecular weight is 4900 and It has 10 acryloyl groups, UN3320HC (weight average molecular weight 1500 and 10 acryloyl groups thereof), etc.; or a product manufactured by Shin-Nakamura Chemical Co., Ltd., and its model may be U15HA (weight average molecular weight is 2000 and it has 15 Acryl), UA-33H (having 9 acryloyl groups) or UA-53H (having 15 acryloyl groups) and the like.
第一化合物(B-1)可单独一种使用或混合复数种使用。The first compound (B-1) can be used singly or in combination of plural kinds.
较佳地,前述的第一化合物(B-1)可为UV6300B、UX5001T、DPHA40H、UN3320HS、U15HA或上述市售商品的任意组合。Preferably, the aforementioned first compound (B-1) may be any combination of UV6300B, UX5001T, DPHA40H, UN3320HS, U15HA or the above-mentioned commercially available products.
基于碱可溶性树脂(A)的总使用量为100重量份,第一化合物(B-1)的使用量为可为5重量份至100重量份,较佳可为10重量份至95重量份,且更佳可为15重量份至90重量份。The first compound (B-1) may be used in an amount of 5 parts by weight to 100 parts by weight, preferably 10 parts by weight to 95 parts by weight, based on 100 parts by weight of the total amount of the alkali-soluble resin (A). More preferably, it may be 15 parts by weight to 90 parts by weight.
当本发明的乙烯性不饱和基的化合物(B)包含第一化合物(B-1)时,所制得的感光性树脂组成物的图案平滑性较佳。 When the ethylenically unsaturated group-containing compound (B) of the present invention contains the first compound (B-1), the resulting photosensitive resin composition preferably has a pattern smoothness.
第二化合物(B-2)Second compound (B-2)
第二化合物(B-2)的具体例可包含二醇二丙烯酸酯、乙二醇二甲基丙烯酸酯、1,4-丁二醇二丙烯酸酯、1,4-丁二醇二甲基丙烯酸酯、1,6-己二醇二丙烯酸酯、1,6-己二醇二甲基丙烯酸酯、1,9-壬二醇二丙烯酸酯、1,9-壬二醇二甲基丙烯酸酯、二(甲基)丙烯酸二环戊烯酯、三乙二醇二(甲基)丙烯酸酯、四乙二醇二(甲基)丙烯酸酯、三(2-羟基乙基)异氰酸二(甲基)丙烯酸酯、三(2-羟基乙基)异氰酸三(甲基)丙烯酸酯、己内酯改性的三(2-羟基乙基)异氰酸三(甲基)丙烯酸酯、三(甲基)丙烯酸三羟甲基丙酯、经环氧乙烷(简称EO)改性的三(甲基)丙烯酸三羟甲基丙酯、经环氧丙烷(简称PO)改性的三(甲基)丙烯酸三羟甲基丙酯、三丙二醇二(甲基)丙烯酸酯、新戊二醇二(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、季戊四醇四(甲基)丙烯酸酯、聚酯二(甲基)丙烯酸酯、聚乙二醇二(甲基)丙烯酸酯、二季戊四醇六(甲基)丙烯酸酯、二季戊四醇五(甲基)丙烯酸酯、二季戊四醇四(甲基)丙烯酸酯、经己内酯改性的二季戊四醇六(甲基)丙烯酸酯、经己内酯改性的二季戊四醇五(甲基)丙烯酸酯、四(甲基)丙烯酸二三羟甲基丙酯[di(trimethylolpropyl)tetra(meth)acrylate]、经EO改性的双酚A二(甲基)丙烯酸酯、经PO改性的双酚A二(甲基)丙烯酸酯、经EO改性的氢化双酚A二(甲基)丙烯酸酯、经PO改性的氢化双酚A二(甲基)丙烯酸酯、经PO改性的甘油三(甲基)丙烯酸酯、经EO改性的双酚F二(甲基)丙烯酸酯、酚醛清漆聚缩水甘油醚(甲基)丙烯酸酯,或上述化合物的任意组合。Specific examples of the second compound (B-2) may include diol diacrylate, ethylene glycol dimethacrylate, 1,4-butanediol diacrylate, and 1,4-butanediol dimethacrylate. Ester, 1,6-hexanediol diacrylate, 1,6-hexanediol dimethacrylate, 1,9-nonanediol diacrylate, 1,9-nonanediol dimethacrylate, Dicyclopentenyl (meth)acrylate, triethylene glycol di(meth)acrylate, tetraethylene glycol di(meth)acrylate, tris(2-hydroxyethyl)isocyanate di(a) Acrylate, tris(2-hydroxyethyl)isocyanate tri(meth)acrylate, caprolactone modified tris(2-hydroxyethyl)isocyanate tri(meth)acrylate, three Trimethylolpropyl (meth)acrylate, trimethylolpropyl tris(meth)acrylate modified with ethylene oxide (EO), modified by propylene oxide (PO) Trimethylolpropyl methacrylate, tripropylene glycol di(meth) acrylate, neopentyl glycol di(meth) acrylate, pentaerythritol tri(meth) acrylate, pentaerythritol tetra(meth) acrylate , polyester di(meth) acrylate, polyethylene glycol di(meth) propylene Acid ester, dipentaerythritol hexa(meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol tetra (meth) acrylate, caprolactone modified dipentaerythritol hexa (meth) acrylate, Dipentaerythritol penta (meth) acrylate modified by caprolactone, di(trimethylolpropyl) tetra(meth)acrylate, EO modified bisphenol A Di(meth)acrylate, PO modified bisphenol A di(meth)acrylate, EO modified hydrogenated bisphenol A di(meth)acrylate, PO modified hydrogenated bisphenol A Di(meth)acrylate, PO modified tris(meth)acrylate, EO modified bisphenol F di(meth)acrylate, novolac polyglycidyl ether (meth)acrylate Or any combination of the above compounds.
第二化合物(B-2)可单独一种使用或混合复数种使用。The second compound (B-2) can be used singly or in combination of plural kinds.
较佳地,第二化合物(B-2)可为经己内酯改性的二季戊四醇六(甲基)丙烯酸酯、经环氧乙烷(简称EO)改性的三(甲基)丙烯酸三羟甲基丙酯、二季戊四醇六(甲基)丙烯酸酯、二季戊四醇五(甲基)丙烯酸酯、二季戊四醇四(甲基)丙烯酸酯或上述化合物的任意组合。Preferably, the second compound (B-2) may be caprolactone-modified dipentaerythritol hexa(meth) acrylate, ethylene oxide (EO)-modified tris(meth)acrylic acid III. Hydroxymethyl propyl ester, dipentaerythritol hexa (meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol tetra (meth) acrylate or any combination of the above.
基于碱可溶性树脂(A)的总使用量为100重量份,第二化合物(B-2)的使用量为可为15重量份至100重量份,较佳可为20重量份至95重量份,且更佳可为25重量份至90重量份。The second compound (B-2) may be used in an amount of 15 parts by weight to 100 parts by weight, preferably 20 parts by weight to 95 parts by weight, based on 100 parts by weight of the total amount of the alkali-soluble resin (A). More preferably, it may be 25 parts by weight to 90 parts by weight.
另外,基于碱可溶性树脂(A)的总使用量为100重量份时,具有乙烯性不饱和基的化合物(B)的使用量可为20重量份至200重量份,较佳可为30重量 份至190重量份,且更佳可为40重量份至180重量份。Further, when the total amount of the alkali-soluble resin (A) used is 100 parts by weight, the compound (B) having an ethylenically unsaturated group may be used in an amount of 20 parts by weight to 200 parts by weight, preferably 30 parts by weight. The portion is 190 parts by weight, and more preferably 40 parts by weight to 180 parts by weight.
光起始剂(C)Photoinitiator (C)
光起始剂(C)包括光起始剂(C-1)以及其它光起始剂(C-2)。The photoinitiator (C) includes a photoinitiator (C-1) and other photoinitiators (C-2).
光起始剂(C-1)Photoinitiator (C-1)
光起始剂(C)包括由式(1)表示的光起始剂(C-1)。The photoinitiator (C) includes a photoinitiator (C-1) represented by the formula (1).
Figure PCTCN2015092029-appb-000040
Figure PCTCN2015092029-appb-000040
其中R1、R2、R3、R4、R5、R6、R7及R8彼此独立地为氢、C1-C20烷基、COR16、OR17、卤素、NO2、由式(2)所表示的基团或是由式(3)所表示的基团、Wherein R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 and R 8 are each independently hydrogen, C 1 -C 20 alkyl, COR 16 , OR 17 , halogen, NO 2 , The group represented by the formula (2) is a group represented by the formula (3),
Figure PCTCN2015092029-appb-000041
Figure PCTCN2015092029-appb-000041
或R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8彼此独立地为经由式(4)所表示的基团取代的C2-C10烯基、 Or R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 are each independently a group represented by the formula (4). Substituted C 2 -C 10 alkenyl,
Figure PCTCN2015092029-appb-000042
Figure PCTCN2015092029-appb-000042
或R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8彼此独立地共同为—(CH2)p—Y—(CH2)q—;Or R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 are each independently taken as —(CH 2 ) p —Y— (CH 2 ) q —;
或R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8彼此独立地共同为式(5)所表示的基团;Or R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 are each independently a group represented by the formula (5) ;
Figure PCTCN2015092029-appb-000043
Figure PCTCN2015092029-appb-000043
但条件为R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8中的至少一对是由式(5)所表示的基团,However, at least one of R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 is determined by the formula (5). The group represented,
R9、R10、R11及R12彼此独立地为氢、C1-C20烷基,该C1-C20烷基是未经取代或经一或多个以下基团取代:卤素、苯基、CN、OH、SH、C1-C4-烷氧基、-(CO)OH或-(CO)O-(C1-C4烷基);R 9, R 10, R 11 and R 12 are independently hydrogen, C 1 -C 20 alkyl, C 1 -C 20 alkyl which is unsubstituted or substituted with one or more of the following groups to one another: halo, Phenyl, CN, OH, SH, C 1 -C 4 -alkoxy, -(CO)OH or -(CO)O-(C 1 -C 4 alkyl);
或R9、R10、R11及R12彼此独立地为未经取代的苯基或经一或多个以下基团取代的苯基:C1-C6烷基、卤素、CN、OR17、SR18或NR19R20Or R 9 , R 10 , R 11 and R 12 are, independently of each other, an unsubstituted phenyl group or a phenyl group substituted by one or more of the following groups: C 1 -C 6 alkyl, halogen, CN, OR 17 , SR 18 or NR 19 R 20 ;
或R9、R10、R11及R12彼此独立地为卤素、CN、OR17、SR18、SOR18、SO2R18或NR19R20,其中该等取代基OR17、SR18或NR19R20视情况经由该等基团R17、R18、R19和/或R20与萘基环中一个碳原子形成5元或6元环;Or R 9 , R 10 , R 11 and R 12 are, independently of each other, halogen, CN, OR 17 , SR 18 , SOR 18 , SO 2 R 18 or NR 19 R 20 , wherein the substituents OR 17 , SR 18 or NR 19 R 20 optionally forms a 5- or 6-membered ring via a carbon atom in the naphthyl ring via the groups R 17 , R 18 , R 19 and/or R 20 ;
或R9、R10、R11及R12彼此独立地为COR16、NO2或式(2)所表示的基团、Or R 9 , R 10 , R 11 and R 12 are each independently a group represented by COR 16 , NO 2 or formula (2),
Figure PCTCN2015092029-appb-000044
Figure PCTCN2015092029-appb-000044
Y表示O、S、NR26或直接键;Y represents O, S, NR 26 or a direct bond;
p表示0、1、2或3的整数;p represents an integer of 0, 1, 2 or 3;
q表示1、2或3的整数;q represents an integer of 1, 2 or 3;
X表示CO或直接键; X represents CO or a direct bond;
R13表示C1-C20烷基,其未经取代或经一或多个以下基团取代:卤素、R17、COOR17、OR17、SR18、CONR19R20、NR19R20、PO(OCkH2k+1)2或是式(6)所表示的基团;R 13 represents a C 1 -C 20 alkyl group which is unsubstituted or substituted with one or more of the following groups: halogen, R 17 , COOR 17 , OR 17 , SR 18 , CONR 19 R 20 , NR 19 R 20 , PO(OC k H 2k+1 ) 2 or a group represented by the formula (6);
Figure PCTCN2015092029-appb-000045
Figure PCTCN2015092029-appb-000045
或R13表示C2-C20烷基,其间杂有一或多个O、S、SO、SO2、NR26或CO,或是C2-C12烯基,其未经间杂或间杂有一或多个O、CO或NR26,其中该经间杂的C2-C20烷基及该未经间杂或经间杂的C2-C12烯基是未经取代或经一或多个卤素取代;Or R 13 represents a C 2 -C 20 alkyl group, interspersed with one or more of O, S, SO, SO 2 , NR 26 or CO, or a C 2 -C 12 alkenyl group, which has no inter a plurality of O, CO or NR 26 , wherein the meta-hetero C 2 -C 20 alkyl group and the unmeta- or inter-hetero C 2 -C 12 alkenyl group are unsubstituted or substituted with one or more halogens;
或R13表示C4-C8环烯基、C2-C12炔基或未经间杂或间杂有一或多个O、S、CO或NR26的C3-C10环烷基;Or R 13 represents C 4 -C 8 cycloalkenyl, C 2 -C 12 alkynyl or C 3 -C 10 cycloalkyl having no or hetero or one or more O, S, CO or NR 26 ;
或R13表示苯基或萘基,其各为未经取代或经一或多个以下基团取代:OR17、SR18、NR19R20、COR16、CN、NO2、卤素、C1-C20烷基、C1-C4卤代烷基、间杂有一或多个O、S、CO或NR26的C2-C20烷基、或式(7)表示的基团、Or R 13 represents phenyl or naphthyl, each of which is unsubstituted or substituted with one or more of the following groups: OR 17 , SR 18 , NR 19 R 20 , COR 16 , CN, NO 2 , halogen, C 1 a C 2 alkyl group, a C 1 -C 4 haloalkyl group, a C 2 -C 20 alkyl group having one or more O, S, CO or NR 26 or a group represented by the formula (7),
Figure PCTCN2015092029-appb-000046
Figure PCTCN2015092029-appb-000046
或其各经C3-C10环烷基或间杂有一或多个O、S、CO或NR26的C3-C10环烷基取代;Each warp or C 3 -C 10 cycloalkyl, or interrupted by one or more O, S, CO or NR C 3 26 -C 10 cyclic group is unsubstituted;
k表示1至10的整数;k represents an integer from 1 to 10;
R14表示氢、C3-C8环烷基、C2-C5烯基、C1-C20烷氧基或C1-C20烷基,其是未经取代或经一或多个以下基团取代:卤素、苯基、C1-C20烷基苯基或CN;R 14 represents hydrogen, C 3 -C 8 cycloalkyl, C 2 -C 5 alkenyl, C 1 -C 20 alkoxy or C 1 -C 20 alkyl, which is unsubstituted or one or more Substituted by: halogen, phenyl, C 1 -C 20 alkylphenyl or CN;
或R14表示苯基或萘基,其各未经取代或经一或多个以下基团取代:C1-C6烷基、C1-C4卤代烷基、卤素、CN、OR17、SR18和/或NR19R20Or R 14 represents phenyl or naphthyl, each of which is unsubstituted or substituted with one or more of the following groups: C 1 -C 6 alkyl, C 1 -C 4 haloalkyl, halogen, CN, OR 17 , SR 18 and / or NR 19 R 20 ;
或R14表示C3-C20杂芳基、C1-C8烷氧基、苄氧基或苯氧基,该苄氧基及苯氧基是未经取代或经一或多个以下基团取代:C1-C6烷基、C1-C4卤代烷基和/或卤素;R15是C6-C20芳基或C3-C20杂芳基,其各是未经取代或经一或多个以下基团取代:苯基、卤素、C1-C4卤代烷基、CN、NO2、OR17、SR18、NR19R20、PO(OCkH2k+1)2、SO-C1-C10烷基、SO2-C1-C10烷基、间杂有一或多个O、S或NR26的C2-C20烷基;或其各经C1-C20烷基取代,该C1-C20烷基是未 经取代或经一或多个以下基团取代:卤素、COOR17、CONR19R20、苯基、C3-C8环烷基、C3-C20杂芳基、C6-C20芳氧基羰基、C3-C20杂芳氧基羰基、OR17、SR18或NR19R20Or R 14 represents a C 3 -C 20 heteroaryl group, a C 1 -C 8 alkoxy group, a benzyloxy group or a phenoxy group, the benzyloxy group and the phenoxy group being unsubstituted or having one or more of the following groups Group substituted: C 1 -C 6 alkyl, C 1 -C 4 haloalkyl and/or halogen; R 15 is C 6 -C 20 aryl or C 3 -C 20 heteroaryl, each of which is unsubstituted or Substituted by one or more of the following groups: phenyl, halogen, C 1 -C 4 haloalkyl, CN, NO 2 , OR 17 , SR 18 , NR 19 R 20 , PO(OC k H 2k+1 ) 2 , SO-C 1 -C 10 alkyl, SO 2 -C 1 -C 10 alkyl, interrupted by one or more O, S or NR C 26 of 2 -C 20 alkyl; or C 1 -C 20 each warp Alkyl substituted, the C 1 -C 20 alkyl group is unsubstituted or substituted with one or more of the following groups: halogen, COOR 17 , CONR 19 R 20 , phenyl, C 3 -C 8 cycloalkyl, C 3- C 20 heteroaryl, C 6 -C 20 aryloxycarbonyl, C 3 -C 20 heteroaryloxycarbonyl, OR 17 , SR 18 or NR 19 R 20 ;
或R15表示氢、C2-C12烯基、未经间杂或间杂有一或多个O、CO或NR26的C3-C8环烷基;或R15是C1-C20烷基,其是未经取代或经一或多个以下基团取代:卤素、OR17、SR18、C3-C8环烷基、C3-C20杂芳基、C6-C20芳氧基羰基、C3-C20杂芳氧基羰基、NR19R20、COOR17、CONR19R20、PO(OCkH2k+1)2、苯基、式(6)所表示的基团或式(8)所表示的基团、Or R 15 represents hydrogen, C 2 -C 12 alkenyl, C 3 -C 8 cycloalkyl having no or hetero or one or more O, CO or NR 26 ; or R 15 is C 1 -C 20 alkyl , which is unsubstituted or substituted with one or more of the following groups: halogen, OR 17 , SR 18 , C 3 -C 8 cycloalkyl, C 3 -C 20 heteroaryl, C 6 -C 20 aryloxy a group represented by a carbonyl group, a C 3 -C 20 heteroaryloxycarbonyl group, NR 19 R 20 , COOR 17 , CONR 19 R 20 , PO(OC k H 2k+1 ) 2 , a phenyl group, and a formula (6) Or a group represented by the formula (8),
Figure PCTCN2015092029-appb-000047
或该C1-C20烷基是经苯基取代,该苯基是经卤素、C1-C20烷基、C1-C4卤代烷基、OR17、SR18或NR19R20取代;
Figure PCTCN2015092029-appb-000047
Or the C 1 -C 20 alkyl group is substituted by a phenyl group which is substituted by halogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, OR 17 , SR 18 or NR 19 R 20 ;
或R15表示C2-C20烷基,其间杂有一或多个O、SO或SO2,且该经间杂的C2-C20烷基是未经取代或经一或多个以下基团取代:卤素、OR17、COOR17、CONR19R20、苯基或经OR17、SR18或NR19R20取代的苯基;Or R 15 represents a C 2 -C 20 alkyl group in which one or more O, SO or SO 2 are heterogeneous, and the inter-hetero C 2 -C 20 alkyl group is unsubstituted or has one or more of the following groups Substituted: halogen, OR 17 , COOR 17 , CONR 19 R 20 , phenyl or phenyl substituted by OR 17 , SR 18 or NR 19 R 20 ;
或R15表示C2-C20烷酰基或苯甲酰基,其是未经取代或经一或多个以下基团取代:C1-C6烷基、卤素、苯基、OR17、SR18或NR19R20;或R15是未经取代或经一或多个OR17取代的萘甲酰基或是C3-C14杂芳基羰基;Or R 15 represents a C 2 -C 20 alkanoyl or benzoyl group which is unsubstituted or substituted with one or more of the following groups: C 1 -C 6 alkyl, halogen, phenyl, OR 17 , SR 18 Or NR 19 R 20 ; or R 15 is a naphthoyl group or a C 3 -C 14 heteroarylcarbonyl group which is unsubstituted or substituted by one or more OR 17 ;
或R15表示C2-C12烷氧基羰基,其是未经间杂或间杂有一或多个O且该经间杂或未经间杂的C2-C12烷氧基羰基是未经取代或经一或多个羟基取代;Or R 15 represents a C 2 -C 12 alkoxycarbonyl group which is undoped or inter-hetero-doped with one or more O and the inter- or un-doped C 2 -C 12 alkoxycarbonyl group is unsubstituted or One or more hydroxyl substitutions;
或R15表示苯氧基羰基,其是未经取代或经一或多个以下基团取代:C1-C6烷基、卤素、C1-C4卤代烷基、苯基、OR17、SR18或NR19R20Or R 15 represents a phenoxycarbonyl group which is unsubstituted or substituted with one or more of the following groups: C 1 -C 6 alkyl, halogen, C 1 -C 4 haloalkyl, phenyl, OR 17 , SR 18 or NR 19 R 20 ;
或R15表示CN、CONR19R20、NO2、C1-C4卤代烷基、S(O)m-C1-C6烷基、未经取代或经C1-C12烷基或SO2-C1-C6烷基取代的S(O)m-苯基;Or R 15 represents CN, CONR 19 R 20 , NO 2 , C 1 -C 4 haloalkyl, S(O) m -C 1 -C 6 alkyl, unsubstituted or C 1 -C 12 alkyl or SO 2- C 1 -C 6 alkyl-substituted S(O) m -phenyl;
或R15表示SO2O-苯基,其是未经取代或经C1-C12烷基取代;或是二苯基膦酰基或二-(C1-C4烷氧基)-膦酰基;Or R 15 represents an SO 2 O-phenyl group which is unsubstituted or substituted by a C 1 -C 12 alkyl group; or a diphenylphosphono group or a di-(C 1 -C 4 alkoxy)-phosphono group ;
m表示1或2;m represents 1 or 2;
R'14具有针对R14所给出含义中的一个;R' 14 has one of the meanings given for R 14 ;
R'15具有针对R15所给出含义中的一个; R' 15 has one of the meanings given for R 15 ;
X1表示O、S、SO或SO2X 1 represents O, S, SO or SO 2 ;
X2表示O、CO、S或直接键;X 2 represents O, CO, S or a direct bond;
R16表示C6-C20芳基或C3-C20杂芳基,其各是未经取代或经一或多个以下基团取代:苯基、卤素、C1-C4卤代烷基、CN、NO2、OR17、SR18、NR19R20或间杂有一或多个O、S或NR26的C1-C20烷基;或其各经一或多个C1-C20烷基取代,该C1-C20烷基是未经取代或经一或多个以下基团取代:卤素、COOR17、CONR19R20、苯基、C3-C8环烷基、C3-C20杂芳基、C6-C20芳氧基羰基、C3-C20杂芳氧基羰基、OR17、SR18或NR19R20R 16 represents a C 6 -C 20 aryl group or a C 3 -C 20 heteroaryl group, each of which is unsubstituted or substituted with one or more of the following groups: phenyl, halogen, C 1 -C 4 haloalkyl, CN, NO 2 , OR 17 , SR 18 , NR 19 R 20 or a C 1 -C 20 alkyl group having one or more O, S or NR 26 ; or each of one or more C 1 -C 20 alkane Substituted, the C 1 -C 20 alkyl group is unsubstituted or substituted with one or more of the following groups: halogen, COOR 17 , CONR 19 R 20 , phenyl, C 3 -C 8 cycloalkyl, C 3 -C 20 heteroaryl, C 6 -C 20 aryloxycarbonyl, C 3 -C 20 heteroaryloxycarbonyl, OR 17 , SR 18 or NR 19 R 20 ;
或R16表示氢、C1-C20烷基,该C1-C20烷基是未经取代或经一或多个以下基团取代:卤素、苯基、OH、SH、CN、C3-C6烯氧基、OCH2CH2CN、OCH2CH2(CO)O(C1-C4)烷基、O(CO)-(C1-C4烷基)、O(CO)-苯基、(CO)OH或(CO)O(C1-C4烷基);Or R 16 represents hydrogen, C 1 -C 20 alkyl, C 1 -C 20 alkyl which is unsubstituted or substituted with one or more of the following groups: halogen, phenyl, OH, SH, CN, C 3 -C 6 alkenyloxy, OCH 2 CH 2 CN, OCH 2 CH 2 (CO)O(C 1 -C 4 )alkyl, O(CO)-(C 1 -C 4 alkyl), O(CO) -phenyl, (CO)OH or (CO)O(C 1 -C 4 alkyl);
或R16表示C2-C12烷基,其间杂有一或多个O、S或NR26;或R16表示(CH2CH2O)n+1H、(CH2CH2O)n(CO)-(C1-C8烷基)、C2-C12烯基或C3-C8环烷基;Or R 16 represents a C 2 -C 12 alkyl group in which one or more O, S or NR 26 are heterogeneous; or R 16 represents (CH 2 CH 2 O) n+1 H, (CH 2 CH 2 O) n ( CO)-(C 1 -C 8 alkyl), C 2 -C 12 alkenyl or C 3 -C 8 cycloalkyl;
或R16表示经SR18取代的苯基,其中该基团R18表示键结至该COR16基团所附接的该咔唑部分的该苯基或萘基环的直接键;Or R 16 represents a phenyl substituted with SR 18 , wherein the group R 18 represents a direct bond to the phenyl or naphthyl ring of the oxazole moiety to which the COR 16 group is attached;
n表示1至20;n represents 1 to 20;
R17表示氢、苯基-C1-C3烷基、C1-C20烷基,其是未经取代或经一或多个以下基团取代:卤素、OH、SH、CN、C3-C6烯氧基、OCH2CH2CN、OCH2CH2(CO)O(C1-C4烷基)、O(CO)-(C1-C4烷基)、O(CO)-(C2-C4)烯基、O(CO)-苯基、(CO)OH、(CO)O(C1-C4烷基)、C3-C20环烷基、SO2-(C1-C4卤代烷基)、O(C1-C4卤代烷基)或间杂有一或多个O的C3-C20环烷基;R 17 represents hydrogen, phenyl-C 1 -C 3 alkyl, C 1 -C 20 alkyl, which is unsubstituted or substituted with one or more of the following groups: halogen, OH, SH, CN, C 3 -C 6 alkenyloxy, OCH 2 CH 2 CN, OCH 2 CH 2 (CO)O(C 1 -C 4 alkyl), O(CO)-(C 1 -C 4 alkyl), O(CO) -(C 2 -C 4 )alkenyl, O(CO)-phenyl, (CO)OH, (CO)O(C 1 -C 4 alkyl), C 3 -C 20 cycloalkyl, SO 2 - (C 1 -C 4 haloalkyl), O(C 1 -C 4 haloalkyl) or a C 3 -C 20 cycloalkyl group having one or more O;
或R17表示C2-C20烷基,其间杂有一或多个O、S或NR26Or R 17 represents C 2 -C 20 alkyl, in which one or more O, S or NR 26 are heterogeneous;
或R17表示(CH2CH2O)n+1H、(CH2CH2O)n(CO)-(C1-C8烷基)、C1-C8烷酰基、C2-C12烯基、C3-C6烯酰基或未经间杂或间杂有一或多个O、S、CO或NR26的C3-C20环烷基;Or R 17 represents (CH 2 CH 2 O) n+1 H, (CH 2 CH 2 O) n (CO)-(C 1 -C 8 alkyl), C 1 -C 8 alkanoyl, C 2 -C a 12 -alkenyl, C 3 -C 6 enoyl group or a C 3 -C 20 cycloalkyl group having no or hetero or one or more O, S, CO or NR 26 ;
或R17表示C1-C8烷基-C3-C10环烷基,其是未经间杂或间杂有一或多个O;Or R 17 represents a C 1 -C 8 alkyl-C 3 -C 10 cycloalkyl group which is undoped or hetero-has one or more O;
或R17表示苯甲酰基,其是未经取代或经一或多个C1-C6烷基、卤素、OH或C1-C3烷氧基取代; Or R 17 represents a benzoyl group which is unsubstituted or substituted by one or more C 1 -C 6 alkyl groups, halogen, OH or C 1 -C 3 alkoxy groups;
或R17表示苯基、萘基或C3-C20杂芳基,其各是未经取代或经一或多个以下基团取代:卤素、OH、C1-C12烷基、C1-C12烷氧基、CN、NO2、苯基-C1-C3烷氧基、苯氧基、C1-C12烷基硫基、苯基硫基、N(C1-C12烷基)2、二苯基-胺基或式(7)所表示的基团;Or R 17 represents phenyl, naphthyl or C 3 -C 20 heteroaryl, each of which is unsubstituted or substituted with one or more of the following groups: halogen, OH, C 1 -C 12 alkyl, C 1 -C 12 alkoxy, CN, NO 2 , phenyl-C 1 -C 3 alkoxy, phenoxy, C 1 -C 12 alkylthio, phenylthio, N (C 1 -C 12 An alkyl) 2 , a diphenyl-amine group or a group represented by the formula (7);
Figure PCTCN2015092029-appb-000048
Figure PCTCN2015092029-appb-000048
或R17形成键结至该具有由式(2)所表示的基团、或是式(7)所表示的基团所处的苯基或萘基环的其中一个碳原子的直接键、Or R 17 forms a direct bond bonded to one of the carbon atoms of the phenyl or naphthyl ring in which the group represented by the formula (2) or the group represented by the formula (7) is bonded,
Figure PCTCN2015092029-appb-000049
Figure PCTCN2015092029-appb-000049
R18表示氢、C2-C12烯基、C3-C20环烷基或苯基-C1-C3烷基,其中该C2-C12烯基、C3-C20环烷基或苯基-C1-C3烷基是未经间杂或间杂有一或多个O、S、CO、NR26或COOR17;或R18是C1-C20烷基,其是未经取代或经一或多个以下基团取代:OH、SH、CN、C3-C6烯氧基、OCH2CH2CN、OCH2CH2(CO)O(C1-C4烷基)、O(CO)-(C2-C4)烯基、O(CO)-(C1-C4烷基)、O(CO)-苯基或(CO)OR17R 18 represents hydrogen, C 2 -C 12 alkenyl, C 3 -C 20 cycloalkyl or phenyl-C 1 -C 3 alkyl, wherein the C 2 -C 12 alkenyl, C 3 -C 20 naphthenic Or a phenyl-C 1 -C 3 alkyl group which has no or hetero or one or more O, S, CO, NR 26 or COOR 17 ; or R 18 is a C 1 -C 20 alkyl group which is not Substituted or substituted with one or more of the following groups: OH, SH, CN, C 3 -C 6 alkenyloxy, OCH 2 CH 2 CN, OCH 2 CH 2 (CO)O (C 1 -C 4 alkyl) , O(CO)-(C 2 -C 4 )alkenyl, O(CO)-(C 1 -C 4 alkyl), O(CO)-phenyl or (CO)OR 17 ;
或R18表示C2-C20烷基,其间杂有一或多个O、S、CO、NR26或COOR17Or R 18 represents a C 2 -C 20 alkyl group with one or more O, S, CO, NR 26 or COOR 17 interspersed therebetween;
或R18表示(CH2CH2O)nH、(CH2CH2O)n(CO)-(C1-C8烷基)、C2-C8烷酰基或C3-C6烯酰基;Or R 18 represents (CH 2 CH 2 O) n H, (CH 2 CH 2 O) n (CO)-(C 1 -C 8 alkyl), C 2 -C 8 alkanoyl or C 3 -C 6 olefin Acyl group
或R18表示苯甲酰基,其是未经取代或经一或多个以下基团取代:C1-C6烷基、卤素、OH、C1-C4烷氧基或C1-C4烷基硫基;Or R 18 represents a benzoyl group which is unsubstituted or substituted with one or more of the following groups: C 1 -C 6 alkyl, halogen, OH, C 1 -C 4 alkoxy or C 1 -C 4 Alkylthio group;
或R18表示苯基、萘基或C3-C20杂芳基,其各是未经取代或经一或多个以下基团取代:卤素、C1-C12烷基、C1-C4卤代烷基、C1-C12烷氧基、CN、NO2、苯基-C1-C3烷氧基、苯氧基、C1-C12烷基硫基、苯基硫基、N(C1-C12烷基)2、二苯基胺基、(CO)O(C1-C8烷基)、(CO)-C1-C8烷基、(CO)N(C1-C8烷基)2或式(7)所表示的基团、Or R 18 represents phenyl, naphthyl or C 3 -C 20 heteroaryl, each of which is unsubstituted or substituted with one or more of the following groups: halogen, C 1 -C 12 alkyl, C 1 -C 4- haloalkyl, C 1 -C 12 alkoxy, CN, NO 2 , phenyl-C 1 -C 3 alkoxy, phenoxy, C 1 -C 12 alkylthio, phenylthio, N (C 1 -C 12 alkyl) 2 , diphenylamino, (CO)O(C 1 -C 8 alkyl), (CO)-C 1 -C 8 alkyl, (CO)N (C 1 -C 8 alkyl) 2 or a group represented by the formula (7),
Figure PCTCN2015092029-appb-000050
Figure PCTCN2015092029-appb-000050
R19及R20彼此独立地为氢、C1-C20烷基、C2-C4羟基烷基、C2-C10烷氧基烷基、C2-C5烯基、C3-C20环烷基、苯基-C1-C3烷基、C1-C8烷酰基、C1-C8烷酰基氧基、C3-C12烯酰基、SO2-(C1-C4卤代烷基)或苯甲酰基;R 19 and R 20 are each independently hydrogen, C 1 -C 20 alkyl, C 2 -C 4 hydroxyalkyl, C 2 -C 10 alkoxyalkyl, C 2 -C 5 alkenyl, C 3 - C 20 cycloalkyl, phenyl-C 1 -C 3 alkyl, C 1 -C 8 alkanoyl, C 1 -C 8 alkanoyloxy, C 3 -C 12 alkenoyl, SO 2 -(C 1 - C 4 haloalkyl) or benzoyl;
或R19及R20表示苯基、萘基或C3-C20杂芳基,其各是未经取代或经一或多个以下基团取代:卤素、C1-C4卤代烷基、C1-C20烷氧基、C1-C12烷基、苯甲酰基或C1-C12烷氧基;Or R 19 and R 20 represent phenyl, naphthyl or C 3 -C 20 heteroaryl, each of which is unsubstituted or substituted with one or more of the following groups: halogen, C 1 -C 4 haloalkyl, C 1- C 20 alkoxy, C 1 -C 12 alkyl, benzoyl or C 1 -C 12 alkoxy;
或R19及R20与其所附接的N原子一起形成未经间杂或间杂有O、S或NR17的5元或6元饱和或不饱和环,且该5元或6元饱和或不饱和环是未经取代或经一或多个以下基团取代:C1-C20烷基、C1-C20烷氧基、=O、OR17、SR18、NR21R22、(CO)R23、NO2、卤素、C1-C4-卤代烷基、CN、苯基、未经间杂或间杂有一或多个O、S、CO或NR17的C3-C20环烷基、或式(7)表示的基团、Or R 19 and R 20 together with the N atom to which they are attached form a 5- or 6-membered saturated or unsaturated ring which is unintermixed or interspersed with O, S or NR 17 and which is either 5- or 6-membered saturated or unsaturated The ring is unsubstituted or substituted with one or more of the following groups: C 1 -C 20 alkyl, C 1 -C 20 alkoxy, =0, OR 17 , SR 18 , NR 21 R 22 , (CO) R 23 , NO 2 , halogen, C 1 -C 4 -haloalkyl, CN, phenyl, C 3 -C 20 cycloalkyl having one or more O, S, CO or NR 17 undoped or inter-hetero, or a group represented by the formula (7),
Figure PCTCN2015092029-appb-000051
Figure PCTCN2015092029-appb-000051
或R19及R20与其所附接的N原子一起形成杂芳香族环系统,该环系统是未经取代或经一或多个以下基团取代:C1-C20烷基、C1-C4卤代烷基、C1-C20烷氧基、=O、OR17、SR18、NR21R22、(CO)R23、卤素、NO2、CN、苯基或未经间杂或间杂有一或多个O、S、CO或NR17的C3-C20环烷基、或式(7)表示的基团、Or R 19 and R 20 together with the N atom to which they are attached form a heteroaromatic ring system which is unsubstituted or substituted with one or more of the following groups: C 1 -C 20 alkyl, C 1 - C 4 haloalkyl, C 1 -C 20 alkoxy, =0, OR 17 , SR 18 , NR 21 R 22 , (CO)R 23 , halogen, NO 2 , CN, phenyl or uninter or hetero Or a plurality of C 3 -C 20 cycloalkyl groups of O, S, CO or NR 17 or a group represented by the formula (7),
Figure PCTCN2015092029-appb-000052
Figure PCTCN2015092029-appb-000052
R21及R22彼此独立地为氢、C1-C20烷基、C1-C4卤代烷基、C3-C10环烷基或苯基;R 21 and R 22 are each independently hydrogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, C 3 -C 10 cycloalkyl or phenyl;
或R21及R22与其所附接的N原子一起形成未经间杂或间杂有O、S或NR26的5元或6元饱和或不饱和环,且该5元或6元饱和或不饱和环是未稠合或该5元或6元饱和或不饱和环与苯环稠合;Or R 21 and R 22 together with the N atom to which they are attached form a 5- or 6-membered saturated or unsaturated ring which is unintermixed or interspersed with O, S or NR 26 and which is either 5- or 6-membered saturated or unsaturated The ring is unfused or the 5- or 6-membered saturated or unsaturated ring is fused to the benzene ring;
R23表示氢、OH、C1-C20烷基、C1-C4卤代烷基、间杂有一或多个O、CO或NR26的C2-C20烷基、未经间杂或间杂有O、S、CO或NR26的C3-C20环烷基,或R23表示苯基、萘基、苯基-C1-C4烷基、OR17、SR18或NR21R22R 23 represents hydrogen, OH, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, intervening one or more O, CO or NR 26 C 2 -C 20 alkyl, uninter or hetero-O a C 3 -C 20 cycloalkyl group of S, CO or NR 26 , or R 23 represents phenyl, naphthyl, phenyl-C 1 -C 4 alkyl, OR 17 , SR 18 or NR 21 R 22 ;
R24表示(CO)OR17、CONR19R20、(CO)R17;或R24具有针对R19及R20所 给出含义中的一个;R 24 represents (CO)OR 17 , CONR 19 R 20 , (CO)R 17 ; or R 24 has one of the meanings given for R 19 and R 20 ;
R25表示COOR17、CONR19R20、(CO)R17;或R25具有针对R17所给出含义中的一个;R 25 represents COOR 17 , CONR 19 R 20 , (CO)R 17 ; or R 25 has one of the meanings given for R 17 ;
R26表示氢、C1-C20烷基、C1-C4卤代烷基、C2-C20烷基,其间杂有一或多个O或CO;或是苯基-C1-C4烷基、C3-C8环烷基,其是未经间杂或间杂有一或多个O或CO;或是(CO)R19;或是苯基,其是未经取代或经一或多个以下基团取代:C1-C20烷基、卤素、C1-C4卤代烷基、OR17、SR18、NR19R20或式(7)表示的基团;R 26 represents hydrogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, C 2 -C 20 alkyl with one or more O or CO in between; or phenyl-C 1 -C 4 alkane a C 3 -C 8 cycloalkyl group which is undoped or heterozygous with one or more O or CO; or (CO)R 19 ; or a phenyl group which is unsubstituted or one or more Substituted by: C 1 -C 20 alkyl, halogen, C 1 -C 4 haloalkyl, OR 17 , SR 18 , NR 19 R 20 or a group represented by formula (7);
Figure PCTCN2015092029-appb-000053
Figure PCTCN2015092029-appb-000053
但条件为在该分子中存在至少一个式(2)或是式(7)所表示的基团However, the condition is that at least one group represented by formula (2) or formula (7) is present in the molecule.
Figure PCTCN2015092029-appb-000054
Figure PCTCN2015092029-appb-000054
式(1)化合物的特点在于其在咔唑部分上包含一或多个成环(annelated)不饱和环。换言之,R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8中至少一对是由式(5)所表示的基团、The compound of formula (1) is characterized in that it comprises one or more annelated unsaturated rings on the carbazole moiety. In other words, at least one of R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 is represented by the formula (5). Group,
Figure PCTCN2015092029-appb-000055
Figure PCTCN2015092029-appb-000055
C1-C20烷基是直链或支链且是(例如)C1-C18-、C1-C4-、C1-C12-、C1-C8-、C1-C8-或C1-C4烷基或C4-C12-或C4-C8烷基。实例是甲基、乙基、丙基、异丙基、正丁基、第二丁基、异丁基、第三丁基、戊基、己基、庚基、2,4,4-三甲基戊基、2-乙基己基、辛基、壬基、癸基、十二基、十四基、十五基、十六基、十八基及二十基。C1-C6烷基具有与上文针对C1-C20烷基所给出相同的含义且具有最高相应C原子数。C 1 -C 20 alkyl is straight or branched and is, for example, C 1 -C 18 -, C 1 -C 4 -, C 1 -C 12 -, C 1 -C 8 -, C 1 -C 8- or C 1 -C 4 alkyl or C 4 -C 12 - or C 4 -C 8 alkyl. Examples are methyl, ethyl, propyl, isopropyl, n-butyl, t-butyl, isobutyl, tert-butyl, pentyl, hexyl, heptyl, 2,4,4-trimethyl Amyl, 2-ethylhexyl, octyl, decyl, decyl, dodecyl, tetradecyl, fifteen, hexadecyl, octadecyl and decyl. The C 1 -C 6 alkyl group has the same meaning as given above for the C 1 -C 20 alkyl group and has the highest corresponding number of C atoms.
含有一或多个C-C多重键的未经取代或经取代的C1-C20烷基是指如下文所解释的烯基。An unsubstituted or substituted C 1 -C 20 alkyl group containing one or more CC multiple bonds means an alkenyl group as explained below.
C1-C4卤代烷基是如下文所定义经卤素取代的如上文所定义C1-C4烷基。 烷基基团是(例如)单-或多卤化,直至所有H-原子替换为卤素。其是(例如)CzHxHaly,其中x+y=2z+1且Hal是卤素,较佳为F。具体实例是氯甲基、三氯甲基、三氟甲基或2-溴丙基,尤其为三氟甲基或三氯甲基。C2-C4羟基烷基意指经一或两个O原子取代的C2-C4烷基。烷基基团是直链或支链。实例是2-羟基乙基、1-羟基乙基、1-羟基丙基、2-羟基丙基、3-羟基丙基、1-羟基丁基、4-羟基丁基、2-羟基丁基、3-羟基丁基、2,3-二羟基丙基或2,4-二羟基丁基。C2-C10烷氧基烷基是间杂有一个O原子的C2-C10烷基。C2-C10烷基具有与上文针对C1-C20烷基所给出相同的含义且具有最高相应C原子数。实例是甲氧基甲基、甲氧基乙基、甲氧基丙基、乙氧基甲基、乙氧基乙基、乙氧基丙基、丙氧基甲基、丙氧基乙基、丙氧基丙基。C 1 -C 4 haloalkyl halogen substituted as hereinbefore defined C 1 -C 4 alkyl as defined below. The alkyl group is, for example, mono- or polyhalogenated until all H-atoms are replaced by halogen. It is, for example, C z H x Hal y , where x+y=2z+1 and Hal is halogen, preferably F. Specific examples are chloromethyl, trichloromethyl, trifluoromethyl or 2-bromopropyl, especially trifluoromethyl or trichloromethyl. C 2 -C 4 hydroxyalkyl means a C 2 -C 4 alkyl group substituted with one or two O atoms. The alkyl group is straight or branched. Examples are 2-hydroxyethyl, 1-hydroxyethyl, 1-hydroxypropyl, 2-hydroxypropyl, 3-hydroxypropyl, 1-hydroxybutyl, 4-hydroxybutyl, 2-hydroxybutyl, 3-hydroxybutyl, 2,3-dihydroxypropyl or 2,4-dihydroxybutyl. C 2 -C 10 alkoxyalkyl is interrupted by O atoms, a C 2 -C 10 alkyl. The C 2 -C 10 alkyl group has the same meaning as given above for the C 1 -C 20 alkyl group and has the highest corresponding number of C atoms. Examples are methoxymethyl, methoxyethyl, methoxypropyl, ethoxymethyl, ethoxyethyl, ethoxypropyl, propoxymethyl, propoxyethyl, Propoxypropyl.
间杂有一或多个O、S、NR26或CO的C2-C20烷基经O、S、NR26或CO间杂(例如)1至9次、1至5次、1至3次或1次或2次。若存在一个以上间杂基团,则其为相同种类或不同。两个O原子由至少一个亚甲基、较佳至少两个亚甲基(即伸乙基)隔开。该等烷基是直链或支链。举例而言,将存在以下结构单元:-CH2-CH2-O-CH2CH3、-[CH2CH2O]y-CH3(其中y=l至9)、-(CH2-CH2O)7-CH2CH3、-CH2-CH(CH3)-O-CH2-CH2CH3、-CH2-CH(CH3)-O-CH2-CH3、-CH2-CH2-S-CH2CH3、-CH2-CH(CH3)-NW26-CH2-CH3、-CH2-CH2-COO-CH2CH3或-CH2-CH(CH3)-OCO-CH2-CH2CH3A C 2 -C 20 alkyl group having one or more O, S, NR 26 or CO intermixed with O, S, NR 26 or CO (for example) 1 to 9 times, 1 to 5 times, 1 to 3 times or 1 Times or 2 times. If more than one meta-group is present, it is the same species or different. The two O atoms are separated by at least one methylene group, preferably at least two methylene groups (i.e., exoethyl groups). The alkyl groups are straight or branched. For example, the following structural units will be present: -CH 2 -CH 2 -O-CH 2 CH 3 , -[CH 2 CH 2 O] y -CH 3 (where y = 1 to 9), -(CH 2 - CH 2 O) 7 -CH 2 CH 3 , -CH 2 -CH(CH 3 )-O-CH 2 -CH 2 CH 3 , -CH 2 -CH(CH 3 )-O-CH 2 -CH 3 ,- CH 2 -CH 2 -S-CH 2 CH 3 , -CH 2 -CH(CH 3 )-NW 26 -CH 2 -CH 3 , -CH 2 -CH 2 -COO-CH 2 CH 3 or -CH 2 - CH(CH 3 )-OCO-CH 2 -CH 2 CH 3 .
C3-C10环烷基、C3-C10环烷基及C3-C8环烷基在本申请上下文中应理解为至少包含一个环的烷基。其是(例如)环丙基、环丁基、环戊基、环己基、环辛基、戊基环戊基及环己基。C3-C10环烷基在本发明上下文中意欲涵盖二环,换言之,桥联环,例如C 3 -C 10 cycloalkyl, C 3 -C 10 cycloalkyl and C 3 -C 8 cycloalkyl are understood in the context of the present application to mean an alkyl group containing at least one ring. It is, for example, cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cyclooctyl, pentylcyclopentyl and cyclohexyl. C 3 -C 10 cycloalkyl is intended to encompass a bicyclic ring in the context of the present invention, in other words, a bridging ring, for example
Figure PCTCN2015092029-appb-000056
Figure PCTCN2015092029-appb-000056
以及相对应的环。其它实例是诸如And the corresponding ring. Other examples are such as
Figure PCTCN2015092029-appb-000057
Figure PCTCN2015092029-appb-000058
(例如
Figure PCTCN2015092029-appb-000059
)或是
Figure PCTCN2015092029-appb-000060
等结构、以及侨联或稠合环系统,举例而言,该术语意欲涵盖:
Figure PCTCN2015092029-appb-000057
Figure PCTCN2015092029-appb-000058
(E.g
Figure PCTCN2015092029-appb-000059
) or
Figure PCTCN2015092029-appb-000060
Such structures, as well as reunion or fused ring systems, for example, the term is intended to cover:
Figure PCTCN2015092029-appb-000061
等结构。
Figure PCTCN2015092029-appb-000061
And other structures.
间杂有O、S、CO、NR26的C3-C20环烷基具有上文给出的含义,其中烷基中至少一个CH2-基团替换为O、S、CO或NR26。实例是诸如The C 3 -C 20 cycloalkyl group interspersed with O, S, CO, NR 26 has the meaning given above wherein at least one CH 2 - group in the alkyl group is replaced by O, S, CO or NR 26 . An example is something like
Figure PCTCN2015092029-appb-000062
(例如
Figure PCTCN2015092029-appb-000063
)、
Figure PCTCN2015092029-appb-000064
Figure PCTCN2015092029-appb-000065
Figure PCTCN2015092029-appb-000066
等结构。
Figure PCTCN2015092029-appb-000062
(E.g
Figure PCTCN2015092029-appb-000063
),
Figure PCTCN2015092029-appb-000064
Figure PCTCN2015092029-appb-000065
Figure PCTCN2015092029-appb-000066
And other structures.
C1-C8烷基-C3-C10环烷基是经一或多个具有最多8个碳原子的烷基取代的如上文所定义的C3-C10环烷基。实例是:C 1 -C 8 alkyl-C 3 -C 10 cycloalkyl is C 3 -C 10 cycloalkyl as defined above substituted by one or more alkyl groups having up to 8 carbon atoms. An example is:
Figure PCTCN2015092029-appb-000067
等。
Figure PCTCN2015092029-appb-000067
Wait.
间杂有一或多个O的C1-C8烷基-C3-C10环烷基是经一或多个具有最多8个碳原子的烷基取代的如上文所定义的O间杂C3-C10环烷基。实例是:A C 1 -C 8 alkyl-C 3 -C 10 cycloalkyl group interspersed with one or more O is an O-interstitial C 3 - as defined above substituted with one or more alkyl groups having up to 8 carbon atoms C 10 cycloalkyl. An example is:
Figure PCTCN2015092029-appb-000068
等。
Figure PCTCN2015092029-appb-000068
Wait.
C1-C12烷氧基是经一个O原子取代的C1-C12烷基。C1-C12烷基具有与上文针对C1-C20烷基所给出相同的含义且具有最高相应C原子数。C1-C4烷氧基是直链或支链,例如甲氧基、乙氧基、丙氧基、异丙氧基、正丁氧基、第二丁氧基、异丁氧基或第三丁氧基。C1-C8烷氧基及C1-C4-烷氧基具有与上文所述相同的含义且具有最高相应C原子数。C 1 -C 12 alkoxy is O-substituted by a C 1 -C 12 alkyl. The C 1 -C 12 alkyl group has the same meaning as given above for the C 1 -C 20 alkyl group and has the highest corresponding number of C atoms. C 1 -C 4 alkoxy is straight or branched, such as methoxy, ethoxy, propoxy, isopropoxy, n-butoxy, second butoxy, isobutoxy or Tributoxy. The C 1 -C 8 alkoxy group and the C 1 -C 4 -alkoxy group have the same meanings as described above and have the highest corresponding number of C atoms.
C1-C12烷基硫基是经一个S原子取代的C1-C12烷基。C1-C20烷基具有与上文针对C1-C20烷基所给出相同的含义且具有最高相应C原子数。C1-C4烷基硫基是直链或支链,例如甲基硫基、乙基硫基、丙基硫基、异丙基硫基、正丁基硫基、第二丁基硫基、异丁基硫基、第三丁基硫基。C 1 -C 12 alkylthio is S atom substituted by a C 1 -C 12 alkyl. The C 1 -C 20 alkyl group has the same meaning as given above for the C 1 -C 20 alkyl group and has the highest corresponding number of C atoms. C 1 -C 4 alkylthio is straight-chain or branched, such as methylthio, ethylthio, propylthio, isopropylthio, n-butylthio, second butylthio , isobutylthio group, tert-butylthio group.
苯基-C1-C3烷基是(例如)苄基、苯基乙基、α-甲基苄基或α,α-二甲基-苄基,尤其为苄基。Phenyl-C 1 -C 3 alkyl is, for example, benzyl, phenylethyl, α-methylbenzyl or α,α-dimethyl-benzyl, especially benzyl.
苯基-C1-C3烷氧基是(例如)苄氧基、苯基乙氧基、α-甲基苄氧基或α,α-二甲基苄氧基,尤其为苄氧基。 The phenyl-C 1 -C 3 alkoxy group is, for example, a benzyloxy group, a phenylethoxy group, an α-methylbenzyloxy group or an α,α-dimethylbenzyloxy group, especially a benzyloxy group.
C2-C12烯基是单-或多不饱和且是(例如)C2-C10-、C2-C8-、C2-C5-烯基,例如乙烯基、烯丙基、甲基烯丙基、1,1-二甲基烯丙基、1-丁烯基、3-丁烯基、2-丁烯基、1,3-戊二烯基、5-己烯基、7-辛烯基或十二烯基,尤其为烯丙基。C2-C5烯基具有与上文针对C2-C12烯基所给出相同的含义且具有最高相应C原子数。C 2 -C 12 alkenyl is mono- or polyunsaturated and is, for example, C 2 -C 10 -, C 2 -C 8 -, C 2 -C 5 -alkenyl, such as vinyl, allyl, Methyl allyl, 1,1-dimethylallyl, 1-butenyl, 3-butenyl, 2-butenyl, 1,3-pentadienyl, 5-hexenyl, 7-Octyl or dodecenyl, especially allyl. The C 2 -C 5 alkenyl group has the same meaning as given above for the C 2 -C 12 alkenyl group and has the highest corresponding number of C atoms.
间杂有一或多个O、CO或NR26的C2-C12烯基经O、S、NR26或CO间杂(例如)1至9次、1至5次、1至3次或1次或2次。若存在一个以上间杂基团,则其为相同种类或不同。两个O原子由至少一个亚甲基、较佳至少两个亚甲基(即伸乙基)隔开。烯基是直链或支链且如上文所定义。举例而言,可形成以下结构单元:-CH=CH-O-CH2CH3、-CH=CH-O-CH=CH2等。a C 2 -C 12 alkenyl group having one or more O, CO or NR 26 interspersed with O, S, NR 26 or CO, for example 1 to 9 times, 1 to 5 times, 1 to 3 times or 1 time or 2 times. If more than one meta-group is present, it is the same species or different. The two O atoms are separated by at least one methylene group, preferably at least two methylene groups (i.e., exoethyl groups). Alkenyl is straight or branched and is as defined above. For example, the following structural units can be formed: -CH=CH-O-CH 2 CH 3 , -CH=CH-O-CH=CH 2 and the like.
C4-C8环烯基具有一或多个双键且是(例如)C4-C6-环烯基或C6-C8-环烯基。实例是环丁烯基、环戊烯基、环己烯基或环辛烯基,尤其为环戊烯基及环己烯基,较佳为环己烯基。The C 4 -C 8 cycloalkenyl group has one or more double bonds and is, for example, a C 4 -C 6 -cycloalkenyl group or a C 6 -C 8 -cycloalkenyl group. Examples are cyclobutenyl, cyclopentenyl, cyclohexenyl or cyclooctenyl, especially cyclopentenyl and cyclohexenyl, preferably cyclohexenyl.
C3-C6烯氧基是单或多不饱和且具有上文针对烯基所给出含义中的一个,且附接氧基具有最高相应C原子数。实例是烯丙氧基、甲基烯丙氧基、丁烯氧基、戊烯氧基、1,3-戊二烯氧基、5-己烯氧基。The C 3 -C 6 alkenyloxy group is mono- or polyunsaturated and has one of the meanings given above for an alkenyl group, and the attached oxy group has the highest corresponding number of C atoms. Examples are allyloxy, methylallyloxy, butenyloxy, pentenyloxy, 1,3-pentadienyloxy, 5-hexenyloxy.
C2-C12炔基是单或多不饱和直链或支链且是(例如)C2-C8-、C2-C6-或C2-C4炔基。实例是乙炔基、丙炔基、丁炔基、1-丁炔基、3-丁炔基、2-丁炔基、戊炔基己炔基、2-己炔基、5-己炔基、辛炔基等。The C 2 -C 12 alkynyl group is a mono- or polyunsaturated straight or branched chain and is, for example, a C 2 -C 8 -, C 2 -C 6 - or C 2 -C 4 alkynyl group. Examples are ethynyl, propynyl, butynyl, 1-butynyl, 3-butynyl, 2-butynyl, pentynylhexynyl, 2-hexynyl, 5-hexynyl, Octyl group and the like.
C2-C20烷酰基是直链或支链且是(例如)C2-C18-、C2-C14-、C2-C12-、C2-C8-、C2-C6-或C2-C4烷酰基或C4-C12-或C4-C8烷酰基。实例是乙酰基、丙酰基、丁酰基、异丁酰基、戊酰基、己酰基、庚酰基、辛酰基、壬酰基、癸酰基、十二酰基、十四酰基、十五酰基、十六酰基、十八酰基、二十酰基,较佳为乙酰基。C1-C8烷酰基具有与上文针对C2-C20烷酰基所给出相同的含义且具有最高相应C原子数。The C 2 -C 20 alkanoyl group is straight or branched and is, for example, C 2 -C 18 -, C 2 -C 14 -, C 2 -C 12 -, C 2 -C 8 -, C 2 -C 6- or C 2 -C 4 alkanoyl or C 4 -C 12 - or C 4 -C 8 alkanoyl. Examples are acetyl, propionyl, butyryl, isobutyryl, valeryl, hexanoyl, heptanoyl, octanoyl, decanoyl, decanoyl, dodecanoyl, tetradecanoyl, pentadecanoyl, hexadecanoyl, ten The octayl group, the icosyl group is preferably an acetyl group. The C 1 -C 8 alkanoyl group has the same meaning as given above for the C 2 -C 20 alkanoyl group and has the highest corresponding number of C atoms.
C2-C12烷氧基羰基是直链或支链且是(例如)甲氧基羰基、乙氧基羰基、丙氧基羰基、正丁氧基羰基、异丁氧基羰基、1,1-二甲基丙氧基羰基、戊氧基羰基、己氧基羰基、庚氧基羰基、辛氧基羰基、壬氧基羰基、癸氧基羰基或十二氧基羰基,尤其为甲氧基羰基、乙氧基羰基、丙氧基羰基、正丁氧基羰基或异丁氧基羰基,较佳为甲氧基羰基。 C 2 -C 12 alkoxycarbonyl is straight-chain or branched and is, for example, methoxycarbonyl, ethoxycarbonyl, propoxycarbonyl, n-butoxycarbonyl, isobutoxycarbonyl, 1,1 - dimethylpropoxycarbonyl, pentyloxycarbonyl, hexyloxycarbonyl, heptyloxycarbonyl, octyloxycarbonyl, decyloxycarbonyl, decyloxycarbonyl or dodecyloxycarbonyl, especially methoxy A carbonyl group, an ethoxycarbonyl group, a propoxycarbonyl group, a n-butoxycarbonyl group or an isobutoxycarbonyl group is preferably a methoxycarbonyl group.
间杂有一或多个O的C2-C12烷氧基羰基是直链或支链。两个O原子由至少两个亚甲基(即伸乙基)隔开。该经间杂的烷氧基羰基未经取代或经一或多个羟基取代。C6-C20芳氧基羰基是(例如)苯基氧基羰基[=苯基-O-(CO)-]、萘氧基羰基、蒽氧基羰基等。C5-C20杂芳氧基羰基是C5-C20杂芳基-O-CO-。The C 2 -C 12 alkoxycarbonyl group having one or more O interstitials is linear or branched. The two O atoms are separated by at least two methylene groups (ie, an extended ethyl group). The meta-heteroalkoxycarbonyl group is unsubstituted or substituted with one or more hydroxyl groups. The C 6 -C 20 aryloxycarbonyl group is, for example, a phenyloxycarbonyl group [=phenyl-O-(CO)-], a naphthyloxycarbonyl group, a decyloxycarbonyl group or the like. The C 5 -C 20 heteroaryloxycarbonyl group is a C 5 -C 20 heteroaryl-O-CO- group.
C3-C10环烷基羰基是C3-C10环烷基-CO-,其中环烷基具有上文所示含义中的一个且具有最高相应C原子数。间杂有一或多个O、S、CO、NR26的C3-C10环烷基羰基是指经间杂环烷基-CO-,其中经间杂环烷基是如上文所述所定义。The C 3 -C 10 cycloalkylcarbonyl group is a C 3 -C 10 cycloalkyl-CO- group wherein the cycloalkyl group has one of the meanings indicated above and has the highest corresponding number of C atoms. The C 3 -C 10 cycloalkylcarbonyl group having one or more O, S, CO, NR 26 is inter-heterocycloalkyl-CO-, wherein the meta-heterocycloalkyl group is as defined above.
C3-C10环烷氧基羰基是C3-C10环烷基-O-(CO)-,其中环烷基具有上文所示含义中的一个且具有最高相应C原子数。间杂有一或多个O、S、CO、NR26的C3-C10环烷氧基羰基是指经间杂环烷基-O-(CO)-,其中经间杂环烷基是如上文所述所定义。The C 3 -C 10 cycloalkoxycarbonyl group is C 3 -C 10 cycloalkyl-O-(CO)-, wherein the cycloalkyl group has one of the meanings indicated above and has the highest corresponding number of C atoms. The C 3 -C 10 cycloalkoxycarbonyl group having one or more O, S, CO, NR 26 inter-heterocycloalkyl-O-(CO)-, wherein the inter-heterocycloalkyl group is as described above Defined.
C1-C20烷基苯基是指经一或多个烷基取代的苯基,其中C原子的总和最多为20。The C 1 -C 20 alkylphenyl group means a phenyl group substituted by one or more alkyl groups, wherein the sum of the C atoms is at most 20.
C6-C20芳基是(例如)苯基、萘基、蒽基、菲基、芘基、屈基、并四苯基、联亚三苯基等,尤其为苯基或萘基,较佳为苯基。萘基是1-萘基或2-萘基。C 6 -C 20 aryl is, for example, phenyl, naphthyl, anthracenyl, phenanthryl, anthracenyl, fluorenyl, tetracylphenyl, bistriphenyl, etc., especially phenyl or naphthyl, Good is phenyl. The naphthyl group is 1-naphthyl or 2-naphthyl.
在本发明上下文中,C3-C20杂芳基意欲包含单环或多环系统,例如稠合环系统。实例是噻吩基、苯并[b]噻吩基、萘并[2,3-b]噻吩基、噻蒽基、呋喃基、二苯并呋喃基、呫吨基、噻吨基、啡恶噻基、吡咯基、咪唑基、吡唑基、吡嗪基、嘧啶基、哒嗪基、中氮茚基、异吲哚基、吲哚基、吲唑基、嘌呤基、喹嗪基、异喹啉基、喹啉基、酞嗪基、萘啶基、喹恶啉基、喹唑啉基、噌啉基、喋啶基、咔唑基、β-咔啉基、菲啶基、吖啶基、萘嵌间二氮苯基、菲咯啉基、吩嗪基、异噻唑基、吩噻嗪基、异恶唑基、呋呫基、吩恶基、7-菲基、蒽醌-2-基(=9,10-二侧氧基-9,10-二氢蒽-2-基)、3-苯并[b]噻吩基、5-苯并[b]噻吩基、2-苯并[b]噻吩基、4-二苯并呋喃基、4,7-二苯并呋喃基、4-甲基-7-二苯并呋喃基、2-呫吨基、8-甲基-2-呫吨基、3-呫吨基、2-啡恶噻基、2,7-啡恶噻基、2-吡咯基、3-吡咯基、5-甲基-3-吡咯基、2-咪唑基、4-咪唑基、5-咪唑基、2-甲基-4-咪唑基、2-乙基-4-咪唑基、2-乙基-5-咪唑基、1H-四唑-5-基、3-吡唑基、1-甲基-3-吡唑基、1-丙基-4-吡唑基、2-吡嗪基、5,6-二甲基-2-吡嗪基、2-中氮茚基、2-甲基-3-异吲哚基、2-甲基-1-异吲哚基、1-甲基-2-吲哚基、1-甲基-3-吲哚基、1,5-二甲基-2-吲哚基、1-甲基-3-吲唑基、2,7-二甲基-8-嘌呤 基、2-甲氧基-7-甲基-8-嘌呤基、2-喹嗪基、3-异喹啉基、6-异喹啉基、7-异喹啉基、3-甲氧基-6-异喹啉基、2-喹啉基、6-喹啉基、7-喹啉基、2-甲氧基-3-喹啉基、2-甲氧基-6-喹啉基、6-酞嗪基、7-酞嗪基、1-甲氧基-6-酞嗪基、1,4-二甲氧基-6-酞嗪基、1,8-萘啶-2-基、2-喹恶啉基、6-喹恶啉基、2,3-二甲基-6-喹恶啉基、2,3-二甲氧基-6-喹恶啉基、2-喹唑啉基、7-喹唑啉基、2-二甲基胺基-6-喹唑啉基、3-噌啉基、6-噌啉基、7-噌啉基、3-甲氧基-7-噌啉基、2-喋啶基、6-喋啶基、7-喋啶基、6,7-二甲氧基-2-喋啶基、2-咔唑基、3-咔唑基、9-甲基-2-咔唑基、9-甲基-3-咔唑基、β-咔啉-3-基、1-甲基-β-咔啉-3-基、1-甲基-β-咔啉-6-基、3-菲啶基、2-吖啶基、3-吖啶基、2-萘嵌间二氮苯基、1-甲基-5-萘嵌间二氮苯基、5-菲咯啉基、6-菲咯啉基、1-吩嗪基、2-吩嗪基、3-异噻唑基、4-异噻唑基、5-异噻唑基、2-吩噻嗪基、3-吩噻嗪基、10-甲基-3-吩噻嗪基、3-异恶唑基、4-异恶唑基、5-异恶唑基、4-甲基-3-呋呫基、2-吩恶基、10-甲基-2-吩恶基等。In the context of the present invention, C 3 -C 20 heteroaryl is intended to include monocyclic or polycyclic systems, such as fused ring systems. Examples are thienyl, benzo[b]thienyl, naphtho[2,3-b]thienyl, thioxyl, furyl, dibenzofuranyl, xanthenyl, thioxanthyl, phenothiphenyl , pyrrolyl, imidazolyl, pyrazolyl, pyrazinyl, pyrimidinyl, pyridazinyl, mesoindolyl, isodecyl, decyl, oxazolyl, fluorenyl, quinazolyl, isoquinoline , quinolyl, pyridazinyl, naphthyridinyl, quinoxalinyl, quinazolinyl, porphyrinyl, acridinyl, oxazolyl, β-carboline, phenanthryl, acridinyl, Naphthalene, diphenylphenyl, phenanthroline, phenazinyl, isothiazolyl, phenothiazine, isoxazolyl, furazinyl, oxo, 7-phenanthryl, indole-2-yl (=9,10-di-oxy-9,10-dihydroindol-2-yl), 3-benzo[b]thienyl, 5-benzo[b]thienyl, 2-benzo[b] Thienyl, 4-dibenzofuranyl, 4,7-dibenzofuranyl, 4-methyl-7-dibenzofuranyl, 2-indenyl, 8-methyl-2-indole Base, 3-xanthene, 2-morphothinyl, 2,7-morphothinyl, 2-pyrrolyl, 3-pyrrolyl, 5-methyl-3-pyrrolyl, 2-imidazolyl, 4 -Imidazolyl, 5-imidazolyl, 2-methyl-4-imidazolyl, 2- Ethyl-4-imidazolyl, 2-ethyl-5-imidazolyl, 1H-tetrazol-5-yl, 3-pyrazolyl, 1-methyl-3-pyrazolyl, 1-propyl-4 -pyrazolyl, 2-pyrazinyl, 5,6-dimethyl-2-pyrazinyl, 2-indolizinyl, 2-methyl-3-isoindolyl, 2-methyl-1 -isoindolyl, 1-methyl-2-indolyl, 1-methyl-3-indolyl, 1,5-dimethyl-2-indenyl, 1-methyl-3-indole Azyl, 2,7-dimethyl-8-fluorenyl, 2-methoxy-7-methyl-8-fluorenyl, 2-quinazinyl, 3-isoquinolinyl, 6-isoquinoline , 7-isoquinolyl, 3-methoxy-6-isoquinolyl, 2-quinolyl, 6-quinolyl, 7-quinolinyl, 2-methoxy-3-quinoline , 2-methoxy-6-quinolyl, 6-pyridazinyl, 7-pyridazinyl, 1-methoxy-6-pyridazinyl, 1,4-dimethoxy-6-indole Zinyl, 1,8-naphthyridin-2-yl, 2-quinoxalinyl, 6-quinoxalinyl, 2,3-dimethyl-6-quinoxalinyl, 2,3-dimethoxy -6-quinoxaline, 2-quinazolinyl, 7-quinazolinyl, 2-dimethylamino-6-quinazolinyl, 3-carbolinyl, 6-carbolinyl, 7-carbolinyl, 3-methoxy-7-carbolinyl, 2-acridinyl, 6-acridinyl, 7-acridinyl, 6,7-dimethoxy-2-indolyl 2-咔Azyl, 3-oxazolyl, 9-methyl-2-oxazolyl, 9-methyl-3-oxazolyl, β-carboline-3-yl, 1-methyl-β-carboline- 3-yl, 1-methyl-β-carboline-6-yl, 3-phenantidinyl, 2-acridinyl, 3-acridinyl, 2-naphthyldiazophenyl, 1-methyl 5-5-naphthalene dinitrophenyl, 5-phenanolyl, 6-phenanthroline, 1-phenazinyl, 2-phenazinyl, 3-isothiazolyl, 4-isothiazolyl, 5 -isothiazolyl, 2-phenothiazine, 3-phenothiazine, 10-methyl-3-phenothiazine, 3-isoxazolyl, 4-isoxazolyl, 5-isoxazole Base, 4-methyl-3-furoyl, 2-phenoxy group, 10-methyl-2-phenoxy group, and the like.
C3-C20杂芳基尤其为噻吩基、苯并[b]噻吩基、噻蒽基、噻吨基、1-甲基-2-吲哚基或1-甲基-3-吲哚基;尤其为噻吩基。The C 3 -C 20 heteroaryl group is especially thienyl, benzo[b]thienyl, thioxyl, thioxanthyl, 1-methyl-2-indenyl or 1-methyl-3-indolyl Especially tienyl.
C4-C20杂芳基羰基是经由CO基团连接至分子其余部分的如上文所定义C3-C20杂芳基。A C 4 -C 20 heteroarylcarbonyl group is a C 3 -C 20 heteroaryl group as defined above attached to the remainder of the molecule via a CO group.
经取代的芳基(苯基、萘基、C6-C20芳基或C5-C20杂芳基)是分别经1至7次、1至6次或1至4次、尤其1次、2次或3次取代。显而易见,所定义芳基不能具有比芳基环处的自由位置为多的取代基。Substituted aryl (phenyl, naphthyl, C 6 -C 20 aryl or C 5 -C 20 heteroaryl) is 1 to 7 times, 1 to 6 times or 1 to 4 times, especially 1 time, respectively , 2 or 3 substitutions. It will be apparent that the defined aryl group cannot have more substituents than the free position at the aryl ring.
苯基环上的取代基较佳在苯基环上的位置4中或呈3,4-、3,4,5-、2,6-、2,4-或2,4,6-组态。The substituent on the phenyl ring is preferably in position 4 on the phenyl ring or in the 3,4-, 3,4,5-, 2,6-, 2,4- or 2,4,6-configuration .
间杂1次或多次的经间杂基团间杂(例如)1至19次、1至15次、1至12次、1至9次、1至7次、1至5次、1至4次、1至3次或1次或2次(显而易见,间杂原子数取决于拟间杂的C原子数)。经1次或多次取代的经取代基团具有(例如)1至7个、1至5个、1至4个、1至3个或1个或2个相同或不同取代基。Intermixed with one or more interstitial hetero groups (for example) 1 to 19 times, 1 to 15 times, 1 to 12 times, 1 to 9 times, 1 to 7 times, 1 to 5 times, 1 to 4 times, 1 to 3 times or 1 or 2 times (obviously, the number of heteroatoms depends on the number of C atoms to be inter-hetero). The substituted group substituted by one or more times has, for example, 1 to 7, 1 to 5, 1 to 4, 1 to 3 or 1 or 2 identical or different substituents.
经一或多个所定义取代基取代的基团意欲具有一个取代基或多个如所给出相同或不同定义的取代基。卤素是氟、氯、溴及碘,尤其为氟、氯及溴,较佳为氟及氯。若R1及R2、R2及R3、R3及R4或R5及R6、R6及R7、R7及 R8彼此独立地共同为由式(5)所表示的基团、A group substituted with one or more substituents as defined is intended to have one substituent or a plurality of substituents as defined or differently given. Halogen is fluorine, chlorine, bromine and iodine, especially fluorine, chlorine and bromine, preferably fluorine and chlorine. When R 1 and R 2 , R 2 and R 3 , R 3 and R 4 or R 5 and R 6 , R 6 and R 7 , R 7 and R 8 are each independently a group represented by the formula (5) group,
Figure PCTCN2015092029-appb-000069
则形成例如以下(Ia)-(Ii)结构:
Figure PCTCN2015092029-appb-000069
Then, for example, the following (Ia)-(Ii) structure is formed:
Figure PCTCN2015092029-appb-000070
Figure PCTCN2015092029-appb-000070
Figure PCTCN2015092029-appb-000071
Figure PCTCN2015092029-appb-000071
较佳为结构(Ia)。Preferred is structure (Ia).
式(1)化合物的特点在于至少一个苯基环与咔唑部分稠合以形成“萘基”环。即上述结构中的一个是以式(1)给出。The compound of formula (1) is characterized in that at least one phenyl ring is partially fused to the carbazole to form a "naphthyl" ring. That is, one of the above structures is given by the formula (1).
若R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8彼此独立地共同为-(CH2)P-Y-(CH2)q-,则形成(例如)诸如:If R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 are each independently taken to be -(CH 2 ) P -Y- (CH 2 ) q -, forming, for example, such as:
Figure PCTCN2015092029-appb-000072
Figure PCTCN2015092029-appb-000072
等结构。And other structures.
若苯基或萘基环上的取代基OR17、SR18、SOR18、SO2R18或NR19R20经由基团R17、R18、R19和/或R20与萘基环的一个碳原子形成5元或6元环,则获得包含3个或更多个环(包括萘基环)的结构。实例是:If the substituent OR 17 , SR 18 , SOR 18 , SO 2 R 18 or NR 19 R 20 on the phenyl or naphthyl ring is via the radicals R 17 , R 18 , R 19 and/or R 20 with a naphthyl ring When one carbon atom forms a 5- or 6-membered ring, a structure containing 3 or more rings including a naphthyl ring is obtained. An example is:
Figure PCTCN2015092029-appb-000073
Figure PCTCN2015092029-appb-000073
Figure PCTCN2015092029-appb-000074
Figure PCTCN2015092029-appb-000074
等结构。And other structures.
若R17形成键结至其上具有基团If R 17 forms a bond to have a group thereon
Figure PCTCN2015092029-appb-000075
Figure PCTCN2015092029-appb-000075
的苯基或萘基环的一个碳原子的直接键,则形成(例如)诸如a direct bond of a carbon atom of a phenyl or naphthyl ring, for example, such as
Figure PCTCN2015092029-appb-000076
Figure PCTCN2015092029-appb-000076
结构。structure.
若R16表示经SR18取代的苯基,其中基团R19表示键结至其中附接有COR16基团的咔唑部分的苯基或萘基环的直接键,则形成(例如)诸如If R 16 represents a phenyl group substituted by SR 18 , wherein the group R 19 represents a direct bond bonded to a phenyl or naphthyl ring to which a carbazole moiety of a COR 16 group is attached, for example, such as
Figure PCTCN2015092029-appb-000077
Figure PCTCN2015092029-appb-000077
Figure PCTCN2015092029-appb-000078
Figure PCTCN2015092029-appb-000078
等结构。即,若R16是经SR18取代的苯基,其中基团R18表示键结至其中附接有COR16基团的咔唑部分的苯基或萘基环的直接键,则噻吨基部分与咔唑部分的一个苯基或萘基环一起形成。And other structures. That is, if R 16 is a phenyl group substituted by SR 18 , wherein the group R 18 represents a direct bond bonded to a phenyl or naphthyl ring to which a carbazole moiety of a COR 16 group is attached, the thioxanthyl group Part of it is formed together with a phenyl or naphthyl ring of the carbazole moiety.
若R19及R20与其所附接的N原子一起形成视情况间杂有O、S或NR17的5元或6元饱和或不饱和环,则形成饱和或不饱和环,例如氮丙啶、吡咯、噻唑、吡咯啶、恶唑、吡啶、1,3-二嗪、1,2-二嗪、六氢吡啶或吗啉。较佳地,若R19及R20与其所附接的N原子一起形成视情况间杂有O、S或NR17的5元或6元饱和或不饱和环,则形成未经间杂或间杂有O或NR17、尤其O的5元或6元饱和环。If R 19 and R 20 together with the N atom to which they are attached form a 5- or 6-membered saturated or unsaturated ring which is optionally interspersed with O, S or NR 17 , a saturated or unsaturated ring, such as aziridine, is formed. Pyrrole, thiazole, pyrrolidine, oxazole, pyridine, 1,3-diazine, 1,2-diazine, hexahydropyridine or morpholine. Preferably, if R 19 and R 20 together with the N atom to which they are attached form a 5- or 6-membered saturated or unsaturated ring heterogeneously interspersed with O, S or NR 17 , an inter- or inter-molecular O is formed. Or a 5- or 6-membered saturated ring of NR 17 , especially O.
若R21及R22与其所附接的N原子一起形成视情况间杂有O、S或NR26的5元或6元饱和或不饱和环,且苯环视情况与该饱和或不饱和环稠合,则形成饱和或不饱和环,例如氮丙啶、吡咯、噻唑、吡咯啶、恶唑、吡啶、1,3-二嗪、1,2-二嗪、六氢吡啶或吗啉或相应成环,例如If R 21 and R 22 together with the N atom to which they are attached form a 5- or 6-membered saturated or unsaturated ring optionally mixed with O, S or NR 26 , and the benzene ring is optionally fused to the saturated or unsaturated ring. , forming a saturated or unsaturated ring, such as aziridine, pyrrole, thiazole, pyrrolidine, oxazole, pyridine, 1,3-diazine, 1,2-diazine, hexahydropyridine or morpholine or corresponding ring ,E.g
Figure PCTCN2015092029-appb-000079
等。
Figure PCTCN2015092029-appb-000079
Wait.
若R19及R20与其所附接的N原子一起形成杂芳香族环系统,则该环系统意欲包含一个以上环(例如2个或3个环)以及来自相同种类或不同种类的一个或一个以上杂原子。适宜杂原子是(例如)N、S、O或P、尤其N、S或O。实例是咔唑、吲哚、异吲哚、吲唑、嘌呤、异喹啉、喹啉、咔啉、吩噻嗪等。 If R 19 and R 20 together with the N atom to which they are attached form a heteroaromatic ring system, the ring system is intended to contain more than one ring (eg 2 or 3 rings) and one or one from the same species or different species. Above heteroatoms. Suitable heteroatoms are, for example, N, S, O or P, especially N, S or O. Examples are carbazole, anthracene, isoindole, carbazole, anthracene, isoquinoline, quinoline, porphyrin, phenothiazine and the like.
术语“和/或”或“或/和”在本发明上下文中意欲表达不仅可存在所定义替代物(取代基)中的一个,而且可存在总共若干所定义替代物(取代基),即不同替代物(取代基)的混合物。The term "and/or" or "or/and" is intended to mean in the context of the present invention that not only one of the defined substitutes (substituents) may be present, but also a total of several defined substitutes (substituents) may be present, ie different A mixture of substitutes (substituents).
术语“至少”意欲定义一个或一个以上,例如一个或两个或三个、较佳一个或两个。The term "at least" is intended to define one or more than one, for example one or two or three, preferably one or two.
术语“视情况经取代”意指其提及的基团未经取代或经取代。The term "optionally substituted" means that the group to which it is referred to is unsubstituted or substituted.
术语“视情况经间杂”意指其提及的基团未经杂或经间杂。The term "intervening as appropriate" means that the group to which it is referred is not miscellaneous or interstitial.
在整个本说明书及下文的权利要求中,除非上下文另有要求,否则词语“包含(comprise)”或变体(例如,“comprises”或“comprising”)应理解为暗指包括所述整数或步骤或整数群组或步骤群组,但并不排除任一其它整数或步骤或整数群组或步骤群组。术语“(甲基)丙烯酸酯”在本申请上下文中意欲指丙烯酸酯以及相应甲基丙烯酸酯。Throughout the specification and the claims below, the words "comprise" or variant (eg, "comprises" or "comprising") are understood to include the integer or step, unless the context requires otherwise. Or an integer group or a group of steps, but does not exclude any other integer or step or group of integers or groups of steps. The term "(meth)acrylate" is intended in the context of the present application to mean acrylates and corresponding methacrylates.
式(1)肟酯是通过文献中所述方法来制备,例如通过在以下条件下使相应肟与酰卤、尤其氯化物或酸酐反应:在惰性溶剂(例如第三丁基甲基醚、四氢呋喃(THF)或二甲基甲酰胺)中,在碱(例如三乙胺或吡啶)存在时,或在碱性溶剂(例如吡啶)中。在下文中作为实例,阐述式Ia化合物的制备,其中R7表示肟酯基团且X表示直接键[自适当肟开始实施化合物(Ib)-(Ih)的反应]:The oxime ester of formula (1) is prepared by the methods described in the literature, for example by reacting the corresponding hydrazine with an acid halide, especially a chloride or an acid anhydride, in an inert solvent (for example, tert-butyl methyl ether, tetrahydrofuran (THF) Or dimethylformamide) in the presence of a base such as triethylamine or pyridine or in a basic solvent such as pyridine. The preparation of the compound of the formula Ia is illustrated below as an example, wherein R 7 represents a oxime ester group and X represents a direct bond [the reaction of the compound (Ib)-(Ih) is carried out starting from an appropriate hydrazine]:
Figure PCTCN2015092029-appb-000080
Figure PCTCN2015092029-appb-000080
R1、R2、R5、R6、R8、R13、R14及R15是如上文所定义,Hal意指卤素原子、尤其为Cl。R 1 , R 2 , R 5 , R 6 , R 8 , R 13 , R 14 and R 15 are as defined above, and Hal means a halogen atom, especially Cl.
R14较佳为甲基。R 14 is preferably a methyl group.
此等反应为本领域技术人员所熟知,且通常在-15℃至+50℃、较佳0至25℃的温度下实施。Such reactions are well known to those skilled in the art and are typically carried out at a temperature of from -15 ° C to +50 ° C, preferably from 0 to 25 ° C.
当X表示CO时,相应肟是通过用亚硝酸烷基酯(例如亚硝酸甲酯、亚硝酸乙酯、亚硝酸丙酯、亚硝酸丁酯或亚硝酸异戊酯)将亚甲基亚硝化来合成。 然后,酯化是在与上文所述相同的条件下实施:When X represents CO, the corresponding hydrazine is nitrosated by using an alkyl nitrite such as methyl nitrite, ethyl nitrite, propyl nitrite, butyl nitrite or isoamyl nitrite. To synthesize. The esterification is then carried out under the same conditions as described above:
Figure PCTCN2015092029-appb-000081
Figure PCTCN2015092029-appb-000081
因此,本发明的目的是通过在碱或碱的混合物存在下使相应肟化合物与式VI的酰卤或式VII的酸酐反应来制备如上文所定义式(1)化合物的方法。Accordingly, it is an object of the present invention to prepare a compound of formula (1) as defined above by reacting the corresponding hydrazine compound with an acid halide of formula VI or an anhydride of formula VII in the presence of a mixture of bases or bases.
Figure PCTCN2015092029-appb-000082
Figure PCTCN2015092029-appb-000082
其中Hal是卤素、尤其C1,且R14是如上文所定义。Wherein Hal is halogen, especially C1, and R 14 is as defined above.
所需作为起始材料的肟可通过标准化学教材(例如J.March,Advanced Organic Chemistry,第4版,Wiley Interscience,1992)或专著(例如S.R.Sandler&W.Karo,Organic functional group preparations,第3卷,Academic Press)中所述多种方法来获得。The desired hydrazine as a starting material can be passed through standard chemistry textbooks (eg J. March, Advanced Organic Chemistry, 4th edition, Wiley Interscience, 1992) or monographs (eg SRSandler & W. Karo, Organic functional group preparations, Vol. 3, Various methods are described in Academic Press).
最便利的一种方法是(例如)在极性溶剂(例如二甲基乙酰胺(DMA)、DMA水溶液、乙醇或乙醇水溶液)中使醛或酮与羟胺或其盐反应。在此情形下,添加诸如乙酸钠或吡啶等碱来控制反应混合物的pH。众所周知,反应速度具有pH依赖性,且可在开始时或在反应期间连续地添加碱。也可使用诸如吡啶等碱性溶剂作为碱和/或溶剂或共溶剂。反应温度通常为室温至混合物的回流温度,一般为约20℃至120℃。One of the most convenient methods is to, for example, react an aldehyde or a ketone with hydroxylamine or a salt thereof in a polar solvent such as dimethylacetamide (DMA), aqueous DMA, ethanol or an aqueous ethanol solution. In this case, a base such as sodium acetate or pyridine is added to control the pH of the reaction mixture. It is well known that the reaction rate is pH dependent and the base can be added continuously at the beginning or during the reaction. Basic solvents such as pyridine can also be used as the base and/or solvent or cosolvent. The reaction temperature is usually from room temperature to the reflux temperature of the mixture, and is usually from about 20 ° C to 120 ° C.
相应酮中间体是(例如)通过文献(例如标准化学教材,例如J.March,Advanced Organic Chemistry,第4版,Wiley Interscience,1992)中所述方法来制备。另外,连续弗里德-克拉夫茨反应(Friedel-Crafts reaction)可有效用于合成中间体。此等反应为本领域技术人员所熟知。 The corresponding ketone intermediates are prepared, for example, by methods described in the literature (e.g., standard chemistry textbooks, e.g., J. March, Advanced Organic Chemistry, 4th Ed., Wiley Interscience, 1992). In addition, the continuous Friedel-Crafts reaction can be effectively used to synthesize intermediates. These reactions are well known to those skilled in the art.
肟的另一便利合成是用亚硝酸或亚硝酸烷基酯将“活性”亚甲基亚硝化。碱性条件(如(例如)Organic Syntheses coll.第VI卷(J.Wiley&Sons,New York,1988),第199页及第840页中所述)与酸性条件(如(例如)Organic Synthesis coll.第V卷,第32页及第373页,coll.第III卷,第191页及第513页,coll.第II卷,第202页、第204页及第363页中所述)二个适于制备在本发明中用作起始材料的肟。一般自亚硝酸钠产生亚硝酸。亚硝酸烷基酯可为(例如)亚硝酸甲酯、亚硝酸乙酯、亚硝酸丙酯、亚硝酸丁酯或亚硝酸异戊酯。Another convenient synthesis of hydrazine is the nitrosation of "active" methylene groups with nitrous acid or alkyl nitrite. Basic conditions (as described, for example, in Organic Syntheses coll., Volume VI (J. Wiley & Sons, New York, 1988), pages 199 and 840) and acidic conditions (eg, for example, Organic Synthesis coll. V, pages 32 and 373, coll. Volume III, pages 191 and 513, coll. Volume II, pages 202, 204 and 363) A ruthenium used as a starting material in the present invention is prepared. Nitrous acid is generally produced from sodium nitrite. The alkyl nitrite can be, for example, methyl nitrite, ethyl nitrite, propyl nitrite, butyl nitrite or isoamyl nitrite.
本发明另一实施例是游离式(1A)肟化合物Another embodiment of the invention is a free (1A) hydrazine compound
Figure PCTCN2015092029-appb-000083
其中其中R1、R2、R3、R4、R5、R6、R7及R8彼此独立地为氢、C1-C20烷基、
Figure PCTCN2015092029-appb-000084
COR16、OR17、卤素、NO2或是由式(3)所表示的基团、
Figure PCTCN2015092029-appb-000083
Wherein R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 and R 8 are each independently hydrogen, C 1 -C 20 alkyl,
Figure PCTCN2015092029-appb-000084
COR 16 , OR 17 , halogen, NO 2 or a group represented by the formula (3),
Figure PCTCN2015092029-appb-000085
Figure PCTCN2015092029-appb-000085
或R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7 及R8彼此独立地为经Or R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 are each independently
Figure PCTCN2015092029-appb-000086
取代的C2-C10烯基;
Figure PCTCN2015092029-appb-000086
Substituted C 2 -C 10 alkenyl;
或R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8彼此独立地共同为—(CH2)p—Y—(CH2)q—;Or R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 are each independently taken as —(CH 2 ) p —Y— (CH 2 ) q —;
或R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8彼此独立地共同为式(5)所表示的基团、Or R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 are each independently a group represented by the formula (5) ,
Figure PCTCN2015092029-appb-000087
Figure PCTCN2015092029-appb-000087
但条件为R1及R2、R2及R3、R3及R4、R5及R6、R6及R7 But the conditions are R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7
或R7及R8中的至少一对是由式(5)所表示的基团、Or at least one of R 7 and R 8 is a group represented by the formula (5),
Figure PCTCN2015092029-appb-000088
Figure PCTCN2015092029-appb-000088
R9、R10、R11及R12彼此独立地为氢、C1-C20烷基,该C1-C20烷基是未经取代或经一或多个以下基团取代:卤素、苯基、CN、OH、SH、C1-C4-烷氧基、-(CO)OH或-(CO)O-(C1-C4烷基);R 9, R 10, R 11 and R 12 are independently hydrogen, C 1 -C 20 alkyl, C 1 -C 20 alkyl which is unsubstituted or substituted with one or more of the following groups to one another: halo, Phenyl, CN, OH, SH, C 1 -C 4 -alkoxy, -(CO)OH or -(CO)O-(C 1 -C 4 alkyl);
或R9、R10、R11及R12彼此独立地为未经取代的苯基或经一或多个以下基团取代的苯基:C1-C6烷基、卤素、CN、OR17、SR18或NR19R20Or R 9 , R 10 , R 11 and R 12 are, independently of each other, an unsubstituted phenyl group or a phenyl group substituted by one or more of the following groups: C 1 -C 6 alkyl, halogen, CN, OR 17 , SR 18 or NR 19 R 20 ;
或R9、R10、R11及R12彼此独立地为卤素、CN、OR17、SR18、SOR18、SO2R18或NR19R20,其中该等取代基OR17、SR18或NR19R20视情况经由该等基团R17、R18、R19和/或R20与萘基环中一个碳原子形成5元或6元环;Or R 9 , R 10 , R 11 and R 12 are, independently of each other, halogen, CN, OR 17 , SR 18 , SOR 18 , SO 2 R 18 or NR 19 R 20 , wherein the substituents OR 17 , SR 18 or NR 19 R 20 optionally forms a 5- or 6-membered ring via a carbon atom in the naphthyl ring via the groups R 17 , R 18 , R 19 and/or R 20 ;
或R9、R10、R11及R12彼此独立地为Or R 9 , R 10 , R 11 and R 12 are independently of each other
Figure PCTCN2015092029-appb-000089
COR16或NO2
Figure PCTCN2015092029-appb-000089
COR 16 or NO 2 ;
Y表示O、S、NR26或直接键;Y represents O, S, NR 26 or a direct bond;
p表示0、1、2或3的整数;p represents an integer of 0, 1, 2 or 3;
q表示1、2或3的整数;q represents an integer of 1, 2 or 3;
X表示CO或直接键;X represents CO or a direct bond;
R13表示C1-C20烷基,其是未经取代或经一或多个以下基团取代:卤素、R17、COOR17、OR17、SR18、CONR19R20、NR19R20、PO(OCkH2k+1)2或是式(6)所表示的基团、R 13 represents a C 1 -C 20 alkyl group which is unsubstituted or substituted with one or more of the following groups: halogen, R 17 , COOR 17 , OR 17 , SR 18 , CONR 19 R 20 , NR 19 R 20 , PO(OC k H 2k+1 ) 2 or a group represented by the formula (6),
Figure PCTCN2015092029-appb-000090
Figure PCTCN2015092029-appb-000090
或R13表示C2-C20烷基,其间杂有一或多个O、S、SO、SO2、NR26或CO,或是C2-C12烯基,其是未经间杂或间杂有一或多个O、CO或NR26,其中该经间杂的C2-C20烷基及该未经间杂或经间杂的C2-C12烯基是未经取代或经一或多个卤素取代;Or R 13 represents a C 2 -C 20 alkyl group, interspersed with one or more of O, S, SO, SO 2 , NR 26 or CO, or a C 2 -C 12 alkenyl group which is unintercalated or heterozygous Or a plurality of O, CO or NR 26 , wherein the meta-hetero C 2 -C 20 alkyl group and the unmeta- or inter-hetero C 2 -C 12 alkenyl group are unsubstituted or substituted by one or more halogens ;
或R13表示C4-C8环烯基、C2-C12炔基或未经间杂或间杂有一或多个O、S、CO或NR26的C3-C10环烷基;Or R 13 represents C 4 -C 8 cycloalkenyl, C 2 -C 12 alkynyl or C 3 -C 10 cycloalkyl having no or hetero or one or more O, S, CO or NR 26 ;
或R13表示苯基或萘基,其各为未经取代或经一或多个以下基团取代:OR17、SR18、NR19R20
Figure PCTCN2015092029-appb-000091
Or R 13 represents phenyl or naphthyl, each of which is unsubstituted or substituted with one or more of the following groups: OR 17 , SR 18 , NR 19 R 20 ,
Figure PCTCN2015092029-appb-000091
COR16、CN、NO2、卤素、C1-C20烷基、C1-C4卤代烷基、间杂有一或多个O、S、CO或NR26的C2-C20烷基;或其各经C3-C10环烷基或间杂有一或多个O、S、CO或NR26的C3-C10环烷基取代;COR 16, CN, NO 2, halogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, interrupted by one or more O, S, CO or NR C 26 of 2 -C 20 alkyl; or each warp C 3 -C 10 cycloalkyl, or interrupted by one or more O, S, CO or NR C 3 26 -C 10 cyclic group is unsubstituted;
k表示1至10的整数;k represents an integer from 1 to 10;
R15表示C6-C20芳基或C3-C20杂芳基,其各是未经取代或经一或多个以下基团取代:苯基、卤素、C1-C4卤代烷基、CN、NO2、OR17、SR18、NR19R20、PO(OCkH2k+1)2、SO-C1-C10烷基、SO2-C1-C10烷基、间杂有一或多个O、S或NR26的C2-C20烷基;或其各经C1-C20烷基取代,该C1-C20烷基是未经取代或经一或多个以下基团取代:卤素、COOR17、CONR19R20、苯基、C3-C8环烷基、C3-C20杂芳基、C6-C20芳氧基羰基、C3-C20杂芳氧基羰基、OR17、SR18或NR19R20R 15 represents a C 6 -C 20 aryl group or a C 3 -C 20 heteroaryl group, each of which is unsubstituted or substituted with one or more of the following groups: phenyl, halogen, C 1 -C 4 haloalkyl, CN, NO 2 , OR 17 , SR 18 , NR 19 R 20 , PO(OC k H 2k+1 ) 2 , SO-C 1 -C 10 alkyl, SO 2 -C 1 -C 10 alkyl, heterogeneous C 2 -C 20 alkyl group or a plurality of O, S or NR 26; or a C 1 -C 20 via respective substituted alkyl, C 1 -C 20 alkyl which is unsubstituted or substituted with one or more of the following Group substitution: halogen, COOR 17 , CONR 19 R 20 , phenyl, C 3 -C 8 cycloalkyl, C 3 -C 20 heteroaryl, C 6 -C 20 aryloxycarbonyl, C 3 -C 20 Heteroaryloxycarbonyl, OR 17 , SR 18 or NR 19 R 20 ;
或R15表示氢、C2-C12烯基、C3-C8环烷基,其未经间杂或间杂有一或多 个O、CO或NR26Or R 15 represents hydrogen, C 2 -C 12 alkenyl, C 3 -C 8 cycloalkyl, which has no or hetero or one or more O, CO or NR 26 ;
或R15表示C1-C20烷基,其是未经取代或经一或多个以下基团取代:卤素、OR17、SR18、C3-C8环烷基、C3-C20杂芳基、C6-C20芳氧基羰基、C3-C20杂芳氧基羰基、NR19R20、COOR17、CONR19R20、PO(OCkH2k+1)2、苯基、
Figure PCTCN2015092029-appb-000092
或式(6)所表示的基团;
Or R 15 represents a C 1 -C 20 alkyl group which is unsubstituted or substituted with one or more of the following groups: halogen, OR 17 , SR 18 , C 3 -C 8 cycloalkyl, C 3 -C 20 Heteroaryl, C 6 -C 20 aryloxycarbonyl, C 3 -C 20 heteroaryloxycarbonyl, NR 19 R 20 , COOR 17 , CONR 19 R 20 , PO(OC k H 2k+1 ) 2 , benzene base,
Figure PCTCN2015092029-appb-000092
Or a group represented by the formula (6);
Figure PCTCN2015092029-appb-000093
或该C1-C20烷基是经苯基取代,该苯基是经卤素、C1-C20烷基、C1-C4卤代烷基、OR17、SR18或NR19R20取代;
Figure PCTCN2015092029-appb-000093
Or the C 1 -C 20 alkyl group is substituted by a phenyl group which is substituted by halogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, OR 17 , SR 18 or NR 19 R 20 ;
或R15表示C2-C20烷基,其间杂有一或多个O、SO或SO2,且该经间杂的C2-C20烷基是未经取代或经一或多个以下基团取代:卤素、OR17、COOR17、CONR19R20、苯基或经OR17、SR18或NR19R20取代的苯基;Or R 15 represents a C 2 -C 20 alkyl group in which one or more O, SO or SO 2 are heterogeneous, and the inter-hetero C 2 -C 20 alkyl group is unsubstituted or has one or more of the following groups Substituted: halogen, OR 17 , COOR 17 , CONR 19 R 20 , phenyl or phenyl substituted by OR 17 , SR 18 or NR 19 R 20 ;
或R15表示C2-C20烷酰基或苯甲酰基,其是未经取代或经一或多个以下基团取代:C1-C6烷基、卤素、苯基、OR17、SR18或NR19R20Or R 15 represents a C 2 -C 20 alkanoyl or benzoyl group which is unsubstituted or substituted with one or more of the following groups: C 1 -C 6 alkyl, halogen, phenyl, OR 17 , SR 18 Or NR 19 R 20 ;
或R15表示未经取代或经一或多个OR17取代的萘甲酰基或是C3-C14杂芳基羰基;Or R 15 represents a naphthoyl group or a C 3 -C 14 heteroarylcarbonyl group which is unsubstituted or substituted with one or more OR 17 ;
或R15表示C2-C12烷氧基羰基,其是未经间杂或间杂有一或多个O且该经间杂或未经间杂的C2-C12烷氧基羰基是未经取代或经一或多个羟基取代;Or R 15 represents a C 2 -C 12 alkoxycarbonyl group which is undoped or inter-hetero-doped with one or more O and the inter- or un-doped C 2 -C 12 alkoxycarbonyl group is unsubstituted or One or more hydroxyl substitutions;
或R15表示苯氧基羰基,其是未经取代或经一或多个以下基团取代:C1-C6烷基、卤素、C1-C4卤代烷基、苯基、OR17、SR18或NR19R20Or R 15 represents a phenoxycarbonyl group which is unsubstituted or substituted with one or more of the following groups: C 1 -C 6 alkyl, halogen, C 1 -C 4 haloalkyl, phenyl, OR 17 , SR 18 or NR 19 R 20 ;
或R15表示CN、CONR19R20、NO2、C1-C4卤代烷基、S(O)m-C1-C6烷基、未经取代或经C1-C12烷基或SO2-C1-C6烷基取代的S(O)m-苯基;Or R 15 represents CN, CONR 19 R 20 , NO 2 , C 1 -C 4 haloalkyl, S(O) m -C 1 -C 6 alkyl, unsubstituted or C 1 -C 12 alkyl or SO 2- C 1 -C 6 alkyl-substituted S(O) m -phenyl;
或R15表示SO2O-苯基,其是未经取代或经C1-C12烷基取代;或是二苯基膦酰基或二-(C1-C4烷氧基)-膦酰基;Or R 15 represents an SO 2 O-phenyl group which is unsubstituted or substituted by a C 1 -C 12 alkyl group; or a diphenylphosphono group or a di-(C 1 -C 4 alkoxy)-phosphono group ;
m表示1或2;m represents 1 or 2;
R'15具有针对R15所给出含义中的一个;R' 15 has one of the meanings given for R 15 ;
X1表示O、S、SO或SO2X 1 represents O, S, SO or SO 2 ;
X2表示O、CO、S或直接键; X 2 represents O, CO, S or a direct bond;
R16表示C6-C20芳基或C3-C20杂芳基,其各是未经取代或经一或多个以下基团取代:苯基、卤素、C1-C4卤代烷基、CN、NO2、OR17、SR18、NR19R20或间杂有一或多个O、S或NR26的C1-C20烷基;或其各经一或多个C1-C20烷基取代,该C1-C20烷基是未经取代或经一或多个以下基团取代:卤素、COOR17、CONR19R20、苯基、C3-C8环烷基、C3-C20杂芳基、C6-C20芳氧基羰基、C3-C20杂芳氧基羰基、OR17、SR18或NR19R20R 16 represents a C 6 -C 20 aryl group or a C 3 -C 20 heteroaryl group, each of which is unsubstituted or substituted with one or more of the following groups: phenyl, halogen, C 1 -C 4 haloalkyl, CN, NO 2 , OR 17 , SR 18 , NR 19 R 20 or a C 1 -C 20 alkyl group having one or more O, S or NR 26 ; or each of one or more C 1 -C 20 alkane Substituted, the C 1 -C 20 alkyl group is unsubstituted or substituted with one or more of the following groups: halogen, COOR 17 , CONR 19 R 20 , phenyl, C 3 -C 8 cycloalkyl, C 3 -C 20 heteroaryl, C 6 -C 20 aryloxycarbonyl, C 3 -C 20 heteroaryloxycarbonyl, OR 17 , SR 18 or NR 19 R 20 ;
或R16表示氢、C1-C20烷基,该C1-C20烷基是未经取代或经一或多个以下基团取代:卤素、苯基、OH、SH、CN、C3-C6烯氧基、OCH2CH2CN、OCH2CH2(CO)O(C1-C4)烷基、O(CO)-(C1-C4烷基)、O(CO)-苯基、(CO)OH或(CO)O(C1-C4烷基);Or R 16 represents hydrogen, C 1 -C 20 alkyl, C 1 -C 20 alkyl which is unsubstituted or substituted with one or more of the following groups: halogen, phenyl, OH, SH, CN, C 3 -C 6 alkenyloxy, OCH 2 CH 2 CN, OCH 2 CH 2 (CO)O(C 1 -C 4 )alkyl, O(CO)-(C 1 -C 4 alkyl), O(CO) -phenyl, (CO)OH or (CO)O(C 1 -C 4 alkyl);
或R16表示C2-C12烷基,其间杂有一或多个O、S或NR26;或R16表示(CH2CH2O)n+1H、(CH2CH2O)n(CO)-(C1-C8烷基)、C2-C12烯基或C3-C8环烷基;Or R 16 represents a C 2 -C 12 alkyl group in which one or more O, S or NR 26 are heterogeneous; or R 16 represents (CH 2 CH 2 O) n+1 H, (CH 2 CH 2 O) n ( CO)-(C 1 -C 8 alkyl), C 2 -C 12 alkenyl or C 3 -C 8 cycloalkyl;
或R16表示经SR18取代的苯基,其中该基团R18表示键结至该COR16基团所附接的该咔唑部分的该苯基或萘基环的直接键;Or R 16 represents a phenyl substituted with SR 18 , wherein the group R 18 represents a direct bond to the phenyl or naphthyl ring of the oxazole moiety to which the COR 16 group is attached;
n表示1至20;n represents 1 to 20;
R17表示氢、苯基-C1-C3烷基、C1-C20烷基,其是未经取代或经一或多个以下基团取代:卤素、OH、SH、CN、C3-C6烯氧基、OCH2CH2CN、OCH2CH2(CO)O(C1-C4烷基)、O(CO)-(C1-C4烷基)、O(CO)-(C2-C4)烯基、O(CO)-苯基、(CO)OH、(CO)O(C1-C4烷基)、C3-C20环烷基、SO2-(C1-C4卤代烷基)、O(C1-C4卤代烷基)或间杂有一或多个O的C3-C20环烷基;R 17 represents hydrogen, phenyl-C 1 -C 3 alkyl, C 1 -C 20 alkyl, which is unsubstituted or substituted with one or more of the following groups: halogen, OH, SH, CN, C 3 -C 6 alkenyloxy, OCH 2 CH 2 CN, OCH 2 CH 2 (CO)O(C 1 -C 4 alkyl), O(CO)-(C 1 -C 4 alkyl), O(CO) -(C 2 -C 4 )alkenyl, O(CO)-phenyl, (CO)OH, (CO)O(C 1 -C 4 alkyl), C 3 -C 20 cycloalkyl, SO 2 - (C 1 -C 4 haloalkyl), O(C 1 -C 4 haloalkyl) or a C 3 -C 20 cycloalkyl group having one or more O;
或R17表示C2-C20烷基,其间杂有一或多个O、S或NR26Or R 17 represents C 2 -C 20 alkyl, in which one or more O, S or NR 26 are heterogeneous;
或R17表示(CH2CH2O)n+1H、(CH2CH2O)n(CO)-(C1-C8烷基)、C1-C8烷酰基、C2-C12烯基、C3-C6烯酰基或未经间杂或间杂有一或多个O、S、CO或NR26的C3-C20环烷基;Or R 17 represents (CH 2 CH 2 O) n+1 H, (CH 2 CH 2 O) n (CO)-(C 1 -C 8 alkyl), C 1 -C 8 alkanoyl, C 2 -C a 12 -alkenyl, C 3 -C 6 enoyl group or a C 3 -C 20 cycloalkyl group having no or hetero or one or more O, S, CO or NR 26 ;
或R17表示C1-C8烷基-C3-C10环烷基,其是未经间杂或间杂有一或多个O;Or R 17 represents a C 1 -C 8 alkyl-C 3 -C 10 cycloalkyl group which is undoped or hetero-has one or more O;
或R17表示苯甲酰基,其是未经取代或经一或多个C1-C6烷基、卤素、OH或C1-C3烷氧基取代;Or R 17 represents a benzoyl group which is unsubstituted or substituted by one or more C 1 -C 6 alkyl groups, halogen, OH or C 1 -C 3 alkoxy groups;
或R17表示苯基、萘基或C3-C20杂芳基,其各是未经取代或经一或多个 以下基团取代:卤素、OH、C1-C12烷基、C1-C12烷氧基、CN、NO2、苯基-C1-C3烷氧基、苯氧基、C1-C12烷基硫基、苯基硫基、N(C1-C12烷基)2、二苯基-胺基或
Figure PCTCN2015092029-appb-000094
Or R 17 represents phenyl, naphthyl or C 3 -C 20 heteroaryl, each of which is unsubstituted or substituted with one or more of the following groups: halogen, OH, C 1 -C 12 alkyl, C 1 -C 12 alkoxy, CN, NO 2 , phenyl-C 1 -C 3 alkoxy, phenoxy, C 1 -C 12 alkylthio, phenylthio, N (C 1 -C 12 Alkyl) 2 , diphenyl-amino group or
Figure PCTCN2015092029-appb-000094
或R17形成键结至其上具有基团、
Figure PCTCN2015092029-appb-000095
的苯基或萘基环的其中一个碳原子的直接键;
Or R 17 forms a bond to have a group thereon,
Figure PCTCN2015092029-appb-000095
a direct bond of one of the carbon atoms of the phenyl or naphthyl ring;
R18表示氢、C2-C12烯基、C3-C20环烷基或苯基-C1-C3烷基,其中该C2-C12烯基、C3-C20环烷基或苯基-C1-C3烷基是未经间杂或间杂有一或多个O、S、CO、NR26或COOR17;或R18是C1-C20烷基,其是未经取代或经一或多个以下基团取代:OH、SH、CN、C3-C6烯氧基、OCH2CH2CN、OCH2CH2(CO)O(C1-C4烷基)、O(CO)-(C2-C4)烯基、O(CO)-(C1-C4烷基)、O(CO)-苯基或(CO)OR17R 18 represents hydrogen, C 2 -C 12 alkenyl, C 3 -C 20 cycloalkyl or phenyl-C 1 -C 3 alkyl, wherein the C 2 -C 12 alkenyl, C 3 -C 20 naphthenic Or a phenyl-C 1 -C 3 alkyl group which has no or hetero or one or more O, S, CO, NR 26 or COOR 17 ; or R 18 is a C 1 -C 20 alkyl group which is not Substituted or substituted with one or more of the following groups: OH, SH, CN, C 3 -C 6 alkenyloxy, OCH 2 CH 2 CN, OCH 2 CH 2 (CO)O (C 1 -C 4 alkyl) , O(CO)-(C 2 -C 4 )alkenyl, O(CO)-(C 1 -C 4 alkyl), O(CO)-phenyl or (CO)OR 17 ;
或R18表示C2-C20烷基,其间杂有一或多个O、S、CO、NR26或COOR17Or R 18 represents a C 2 -C 20 alkyl group with one or more O, S, CO, NR 26 or COOR 17 interspersed therebetween;
或R18表示(CH2CH2O)nH、(CH2CH2O)n(CO)-(C1-C8烷基)、C2-C8烷酰基或C3-C6烯酰基;Or R 18 represents (CH 2 CH 2 O) n H, (CH 2 CH 2 O) n (CO)-(C 1 -C 8 alkyl), C 2 -C 8 alkanoyl or C 3 -C 6 olefin Acyl group
或R18表示苯甲酰基,其是未经取代或经一或多个以下基团取代:C1-C6烷基、卤素、OH、C1-C4烷氧基或C1-C4烷基硫基;Or R 18 represents a benzoyl group which is unsubstituted or substituted with one or more of the following groups: C 1 -C 6 alkyl, halogen, OH, C 1 -C 4 alkoxy or C 1 -C 4 Alkylthio group;
或R18表示苯基、萘基或C3-C20杂芳基,其各是未经取代或经一或多个以下基团取代:卤素、C1-C12烷基、C1-C4卤代烷基、C1-C12烷氧基、CN、NO2、苯基-C1-C3烷氧基、苯氧基、C1-C12烷基硫基、苯基硫基、N(C1-C12烷基)2、二苯基胺基、(CO)O(C1-C8烷基)、(CO)-C1-C8烷基、(CO)N(C1-C8烷基)2
Figure PCTCN2015092029-appb-000096
Or R 18 represents phenyl, naphthyl or C 3 -C 20 heteroaryl, each of which is unsubstituted or substituted with one or more of the following groups: halogen, C 1 -C 12 alkyl, C 1 -C 4- haloalkyl, C 1 -C 12 alkoxy, CN, NO 2 , phenyl-C 1 -C 3 alkoxy, phenoxy, C 1 -C 12 alkylthio, phenylthio, N (C 1 -C 12 alkyl) 2 , diphenylamino, (CO)O(C 1 -C 8 alkyl), (CO)-C 1 -C 8 alkyl, (CO)N (C 1 -C 8 alkyl) 2 or
Figure PCTCN2015092029-appb-000096
R19及R20彼此独立地为氢、C1-C20烷基、C2-C4羟基烷基、C2-C10烷氧基烷基、C2-C5烯基、C3-C20环烷基、苯基-C1-C3烷基、C1-C8烷酰基、C1-C8烷酰基氧基、C3-C12烯酰基、SO2-(C1-C4卤代烷基)或苯甲酰基;R 19 and R 20 are each independently hydrogen, C 1 -C 20 alkyl, C 2 -C 4 hydroxyalkyl, C 2 -C 10 alkoxyalkyl, C 2 -C 5 alkenyl, C 3 - C 20 cycloalkyl, phenyl-C 1 -C 3 alkyl, C 1 -C 8 alkanoyl, C 1 -C 8 alkanoyloxy, C 3 -C 12 alkenoyl, SO 2 -(C 1 - C 4 haloalkyl) or benzoyl;
或R19及R20表示苯基、萘基或C3-C20杂芳基,其各是未经取代或经一或多个以下基团取代:卤素、C1-C4卤代烷基、C1-C20烷氧基、C1-C12烷基、苯甲酰基或C1-C12烷氧基;Or R 19 and R 20 represent phenyl, naphthyl or C 3 -C 20 heteroaryl, each of which is unsubstituted or substituted with one or more of the following groups: halogen, C 1 -C 4 haloalkyl, C 1- C 20 alkoxy, C 1 -C 12 alkyl, benzoyl or C 1 -C 12 alkoxy;
或R19及R20与其所附接的N原子一起形成未经间杂或间杂有O、S或NR17的5元或6元饱和或不饱和环,且该5元或6元饱和或不饱和环是未经取代或经一或多个以下基团取代:C1-C20烷基、C1-C20烷氧基、=O、OR17、SR18、NR21R22、(CO)R23、NO2、卤素、C1-C4-卤代烷基、CN、苯基、
Figure PCTCN2015092029-appb-000097
或未经间杂或间杂有一或多个O、S、CO或NR17的C3-C20环烷基;
Or R 19 and R 20 together with the N atom to which they are attached form a 5- or 6-membered saturated or unsaturated ring which is unintermixed or interspersed with O, S or NR 17 and which is either 5- or 6-membered saturated or unsaturated The ring is unsubstituted or substituted with one or more of the following groups: C 1 -C 20 alkyl, C 1 -C 20 alkoxy, =0, OR 17 , SR 18 , NR 21 R 22 , (CO) R 23 , NO 2 , halogen, C 1 -C 4 -haloalkyl, CN, phenyl,
Figure PCTCN2015092029-appb-000097
Or a C 3 -C 20 cycloalkyl group having one or more O, S, CO or NR 17 ;
或R19及R20与其所附接的N原子一起形成杂芳香族环系统,该环系统是未经取代或经一或多个以下基团取代:C1-C20烷基、C1-C4卤代烷基、C1-C20烷氧基、=O、OR17、SR18、NR21R22、(CO)R23
Figure PCTCN2015092029-appb-000098
卤素、NO2、CN、苯基或未经间杂或间杂有一或多个O、S、CO或NR17的C3-C20环烷基;
Or R 19 and R 20 together with the N atom to which they are attached form a heteroaromatic ring system which is unsubstituted or substituted with one or more of the following groups: C 1 -C 20 alkyl, C 1 - C 4 haloalkyl, C 1 -C 20 alkoxy, =0, OR 17 , SR 18 , NR 21 R 22 , (CO)R 23 ,
Figure PCTCN2015092029-appb-000098
Halogen, NO 2 , CN, phenyl or a C 3 -C 20 cycloalkyl group having one or more O, S, CO or NR 17 without impurity or interstitial;
R21及R22彼此独立地为氢、C1-C20烷基、C1-C4卤代烷基、C3-C10环烷基或苯基;R 21 and R 22 are each independently hydrogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, C 3 -C 10 cycloalkyl or phenyl;
或R21及R22与其所附接的N原子一起形成未经间杂或间杂有O、S或NR26的5元或6元饱和或不饱和环,且该5元或6元饱和或不饱和环是未稠合或该5元或6元饱和或不饱和环与苯环稠合;Or R 21 and R 22 together with the N atom to which they are attached form a 5- or 6-membered saturated or unsaturated ring which is unintermixed or interspersed with O, S or NR 26 and which is either 5- or 6-membered saturated or unsaturated The ring is unfused or the 5- or 6-membered saturated or unsaturated ring is fused to the benzene ring;
R23表示氢、OH、C1-C20烷基、C1-C4卤代烷基、间杂有一或多个O、CO或NR26的C2-C20烷基、未经间杂或间杂有O、S、CO或NR26的C3-C20环烷基;R 23 represents hydrogen, OH, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, intervening one or more O, CO or NR 26 C 2 -C 20 alkyl, uninter or hetero-O a C 3 -C 20 cycloalkyl group of S, CO or NR 26 ;
或R23表示苯基、萘基、苯基-C1-C4烷基、OR17、SR18或NR21R22Or R 23 represents phenyl, naphthyl, phenyl-C 1 -C 4 alkyl, OR 17 , SR 18 or NR 21 R 22 ;
R24表示(CO)OR17、CONR19R20、(CO)R17;或R24具有针对R19及R20所 给出含义中的一个;R 24 represents (CO)OR 17 , CONR 19 R 20 , (CO)R 17 ; or R 24 has one of the meanings given for R 19 and R 20 ;
R25表示COOR17、CONR19R20、(CO)R17;或R25具有针对R17所给出含义中的一个;R 25 represents COOR 17 , CONR 19 R 20 , (CO)R 17 ; or R 25 has one of the meanings given for R 17 ;
R26表示氢、C1-C20烷基、C1-C4卤代烷基、C2-C20烷基,其间杂有一或多个O或CO;或是苯基-C1-C4烷基、C3-C8环烷基,其是未经间杂或间杂有一或多个O或CO;或是(CO)R19;或是苯基,其是未经取代或经一或多个以下基团取代:C1-C20烷基、卤素、C1-C4卤代烷基、OR17、SR18、NR19R20
Figure PCTCN2015092029-appb-000099
R 26 represents hydrogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, C 2 -C 20 alkyl with one or more O or CO in between; or phenyl-C 1 -C 4 alkane a C 3 -C 8 cycloalkyl group which is undoped or heterozygous with one or more O or CO; or (CO)R 19 ; or a phenyl group which is unsubstituted or one or more Substituted by the following groups: C 1 -C 20 alkyl, halogen, C 1 -C 4 haloalkyl, OR 17 , SR 18 , NR 19 R 20 ,
Figure PCTCN2015092029-appb-000099
但条件为在该分子中存在至少一个基团But the condition is that at least one group is present in the molecule
Figure PCTCN2015092029-appb-000100
Figure PCTCN2015092029-appb-000100
针对式(1A)化合物所定义基团的较佳的对应于如针对如上文所给出式(1)化合物给出的,只是每一所定义肟酯基团(例如
Figure PCTCN2015092029-appb-000101
)皆替换为相应游离肟基团
Figure PCTCN2015092029-appb-000102
Preferred for the groups defined for the compound of formula (1A) corresponds as given for the compound of formula (1) as given above, except for each of the defined oxime ester groups (eg
Figure PCTCN2015092029-appb-000101
Are replaced by corresponding free sulfonium groups
Figure PCTCN2015092029-appb-000102
每一肟酯基团可以两种构型(Z)或(E)存在。可通过习用方法来分离异构体,但也可使用异构体混合物作为(例如)光起始物质。因此,本发明也是关于式(1)化合物的构型异构体的混合物。Each oxime ester group can exist in two configurations (Z) or (E). The isomers can be separated by conventional methods, but a mixture of isomers can also be used as, for example, a photoinitiating substance. Accordingly, the present invention is also directed to a mixture of configurational isomers of the compound of formula (1).
较佳的是如上文所定义的式(1)化合物,其中R1、R2、R3、R4、R5、R6、R7及R8彼此独立地为氢、C1-C20烷基、COR16、NO2或式(2)所表示的基团 Preference is given to compounds of the formula (1) as defined above, wherein R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 and R 8 are, independently of one another, hydrogen, C 1 -C 20 Alkyl group, COR 16 , NO 2 or a group represented by formula (2)
Figure PCTCN2015092029-appb-000103
Figure PCTCN2015092029-appb-000103
或R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8彼此独立地共同为式(5)所表示的基团Or R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 are each independently a group represented by the formula (5)
Figure PCTCN2015092029-appb-000104
Figure PCTCN2015092029-appb-000104
但条件为R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8中的至少一对是由式(5)所表示的基团However, at least one of R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 is determined by the formula (5). Represented group
Figure PCTCN2015092029-appb-000105
Figure PCTCN2015092029-appb-000105
X表示CO或直接键;X represents CO or a direct bond;
R13表示C1-C20烷基,其是未经取代或经一或多个以下基团取代:卤素、COOR17、OR17、SR18、CONR19R20、PO(OCkH2k+1)2R 13 represents a C 1 -C 20 alkyl group which is unsubstituted or substituted with one or more of the following groups: halogen, COOR 17 , OR 17 , SR 18 , CONR 19 R 20 , PO(OC k H 2k+ 1 ) 2 ;
或R13表示C2-C20烷基,其间杂有一或多个O、S、NR26或CO;Or R 13 represents a C 2 -C 20 alkyl group, interspersed with one or more O, S, NR 26 or CO;
或R13表示苯基或萘基,此二个未经取代或经一或多个COR16
Figure PCTCN2015092029-appb-000106
所取代;
Or R 13 represents phenyl or naphthyl, the two unsubstituted or via one or more COR 16 or
Figure PCTCN2015092029-appb-000106
Replaced
R14表示C1-C20烷基、苯基或C1-C8烷氧基;R 14 represents a C 1 -C 20 alkyl group, a phenyl group or a C 1 -C 8 alkoxy group;
R15表示苯基、萘基、C3-C20杂芳基,其各未经取代或经一或多个以下基团取代:苯基、卤素、C1-C4卤代烷基、OR17、SR18或C2-C20烷基,其间杂有一或多个O或S;或其各经一或多个C1-C20烷基取代,该C1-C20烷基未经取代或经一或多个以下基团取代:卤素、COOR17、CONR19R20、苯基、C3-C8环烷基、C3-C20杂芳基、C6-C20芳氧基羰基、C4-C20杂芳氧基羰基、OR17、SR18、NR19R20或PO(OCkH2k+1)2R 15 represents a phenyl group, a naphthyl group, a C 3 -C 20 heteroaryl group, each of which is unsubstituted or substituted with one or more of the following groups: phenyl, halogen, C 1 -C 4 haloalkyl, OR 17 , a SR 18 or C 2 -C 20 alkyl group having one or more O or S hetero; or each substituted with one or more C 1 -C 20 alkyl groups, the C 1 -C 20 alkyl group being unsubstituted or Substituted by one or more of the following groups: halogen, COOR 17 , CONR 19 R 20 , phenyl, C 3 -C 8 cycloalkyl, C 3 -C 20 heteroaryl, C 6 -C 20 aryloxycarbonyl , C 4 -C 20 heteroaryloxycarbonyl, OR 17 , SR 18 , NR 19 R 20 or PO(OC k H 2k+1 ) 2 ;
或R15表示C1-C20烷基,其未经取代或经一或多个以下基团取代:OR17、SR18、C3-C8环烷基、C3-C20杂芳基、NR19R20、COOR17、CONR19R20或PO(OCkH2k+1)2Or R 15 represents a C 1 -C 20 alkyl group which is unsubstituted or substituted with one or more of the following groups: OR 17 , SR 18 , C 3 -C 8 cycloalkyl, C 3 -C 20 heteroaryl , NR 19 R 20 , COOR 17 , CONR 19 R 20 or PO(OC k H 2k+1 ) 2 ;
R'14具有针对R14所给出含义中的一个;R' 14 has one of the meanings given for R 14 ;
R'15具有针对R15所给出含义中的一个;R' 15 has one of the meanings given for R 15 ;
R16表示苯基,其未经取代或经一或多个以下基团取代:OR17、SR18、NR19R20或间杂有一或多个O、S或NR26的C2-C20烷基,R 16 represents a phenyl group which is unsubstituted or substituted with one or more of the following groups: OR 17 , SR 18 , NR 19 R 20 or a C 2 -C 20 alkane having one or more O, S or NR 26 base,
或R16表示苯基,其经一或多个C1-C20烷基取代,该C1-C20烷基未经取代或经一或多个以下基团取代:卤素、COOR17、CONR19R20、苯基、C3-C8环烷基、C3-C20杂芳基、C6-C20芳氧基羰基、C4-C20杂芳氧基羰基、OR17、SR18或NR19R20Or R 16 represents a phenyl group which -C 20 alkyl substituted by one or more C 1, C 1 -C 20 alkyl which is unsubstituted or substituted with one or more of the following radicals: halogen, COOR 17, CONR 19 R 20 , phenyl, C 3 -C 8 cycloalkyl, C 3 -C 20 heteroaryl, C 6 -C 20 aryloxycarbonyl, C 4 -C 20 heteroaryloxycarbonyl, OR 17 , SR 18 or NR 19 R 20 ;
或R16表示C1-C20烷基,其未经取代或经以下基团取代:卤素、苯基、OH、SH、CN、C3-C6烯氧基、OCH2CH2(CO)O(C1-C4烷基)、O(CO)-(C1-C4烷基)或(CO)O(C1-C4烷基);Or R 16 represents a C 1 -C 20 alkyl group which is unsubstituted or substituted by a halogen, phenyl, OH, SH, CN, C 3 -C 6 alkenyloxy, OCH 2 CH 2 (CO) O(C 1 -C 4 alkyl), O(CO)-(C 1 -C 4 alkyl) or (CO)O(C 1 -C 4 alkyl);
R17表示C1-C20烷基,其未经取代或经一或多个以下基团取代:卤素、OCH2CH2(CO)O(C1-C4烷基)、O(C1-C4烷基)、(CO)O(C1-C4烷基)、C3-C20环烷基或间杂有一或多个O的C3-C20环烷基;R 17 represents a C 1 -C 20 alkyl group which is unsubstituted or substituted with one or more of the following groups: halogen, OCH 2 CH 2 (CO)O(C 1 -C 4 alkyl), O (C 1 -C 4 alkyl), (CO) O (C 1 -C 4 alkyl), C 3 -C 20 cycloalkyl interrupted by one or more O or a C 3 -C 20 cycloalkyl;
或R17表示C2-C20烷基,其间杂有一或多个O;Or R 17 represents a C 2 -C 20 alkyl group, in which one or more O;
R18表示经(CO)OR17取代的甲基;R 18 represents a methyl group substituted with (CO)OR 17 ;
R19及R20彼此独立地为氢、苯基、C1-C20烷基、C1-C8烷酰基或C1-C8烷酰基氧基;R 19 and R 20 are each independently hydrogen, phenyl, C 1 -C 20 alkyl, C 1 -C 8 alkanoyl or C 1 -C 8 alkanoyloxy;
或R19及R20与其所附接的N原子一起形成杂芳香族环系统,该环系统未经取代或经
Figure PCTCN2015092029-appb-000107
取代;但条件为在该分子中存在至少一个式(2)所表示的基团或是式(7)所表示的基团、
Or R 19 and R 20 together with the N atom to which they are attached form a heteroaromatic ring system which is unsubstituted or
Figure PCTCN2015092029-appb-000107
Substituting; however, the condition is that at least one group represented by the formula (2) or a group represented by the formula (7) is present in the molecule,
Figure PCTCN2015092029-appb-000108
Figure PCTCN2015092029-appb-000108
必须重视如上文所定义的式(1)化合物,其中R1、R2、R5、R6、R7及R8彼此独立地为氢、COR16NO2或式(2)所表示的基团、 It is necessary to pay attention to the compound of the formula (1) as defined above, wherein R 1 , R 2 , R 5 , R 6 , R 7 and R 8 are each independently hydrogen, COR 16 NO 2 or a group represented by the formula (2) group,
Figure PCTCN2015092029-appb-000109
Figure PCTCN2015092029-appb-000109
R3及R4一起为式(5)所表示的基团R 3 and R 4 together are a group represented by the formula (5)
Figure PCTCN2015092029-appb-000110
Figure PCTCN2015092029-appb-000110
R9、R10、R11及R12表示氢R 9 , R 10 , R 11 and R 12 represent hydrogen
X表示直接键;X represents a direct key;
R13表示C1-C20烷基;R 13 represents a C 1 -C 20 alkyl group;
R14表示C1-C20烷基;R 14 represents a C 1 -C 20 alkyl group;
R15表示C1-C20烷基或苯基,其经一或多个OR17或C1-C20烷基取代;R 15 represents a C 1 -C 20 alkyl group or a phenyl group which is substituted with one or more OR 17 or C 1 -C 20 alkyl groups;
R16表示苯基,其经一或多个C1-C20烷基或OR17取代;且R 16 represents a phenyl group which is substituted with one or more C 1 -C 20 alkyl groups or OR 17 ;
R17表示未经取代或经一或多个卤素取代的C1-C20烷基或是间杂有一或多个O的C2-C20烷基。R 17 represents an unsubstituted or substituted by one or more halogen C 1 -C 20 alkyl interrupted by one or more O or a C 2 -C 20 alkyl group.
但条件为在该分子中存在至少一个由式(2)所表示的基团Provided that at least one group represented by formula (2) is present in the molecule
Figure PCTCN2015092029-appb-000111
Figure PCTCN2015092029-appb-000111
本发明的目的进一步是如上文所定义的式(1)化合物,其中R1、R2、R3、R4、R5、R6、R7及R8彼此独立地为氢,A further object of the invention is a compound of formula (1) as defined above, wherein R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 and R 8 are each independently hydrogen,
或R1及R2、R3及R4或R5及R6彼此独立地共同为式(5)所表示的基团、Or R 1 and R 2 , R 3 and R 4 or R 5 and R 6 are each independently a group represented by the formula (5),
Figure PCTCN2015092029-appb-000112
Figure PCTCN2015092029-appb-000112
但条件为R1及R2、R3及R4或R5及R6中至少一对为式(5)所表示的基团、However, the condition is that at least one of R 1 and R 2 , R 3 and R 4 or R 5 and R 6 is a group represented by the formula (5),
Figure PCTCN2015092029-appb-000113
Figure PCTCN2015092029-appb-000113
或R2为式(2)所表示的基团、COR16、NO2或是由式(3)所表示的基团、Or R 2 is a group represented by the formula (2), COR 16 , NO 2 or a group represented by the formula (3),
Figure PCTCN2015092029-appb-000114
Figure PCTCN2015092029-appb-000114
或R7为COR16或式(2)所表示的基团、Or R 7 is a group represented by COR 16 or formula (2),
Figure PCTCN2015092029-appb-000115
Figure PCTCN2015092029-appb-000115
R9、R11及R12表示氢;R 9 , R 11 and R 12 represent hydrogen;
R10表示氢、OR17或COR16R 10 represents hydrogen, OR 17 or COR 16 ;
X表示CO或直接键;X represents CO or a direct bond;
R13表示C1-C20烷基,其未经取代或经一或多个以下基团取代:卤素、R17、OR17、SR18或PO(OCkH2k+1)2R 13 represents a C 1 -C 20 alkyl group which is unsubstituted or substituted with one or more of the following groups: halogen, R 17 , OR 17 , SR 18 or PO(OC k H 2k+1 ) 2 ;
或R13表示C2-C20烷基,其间杂有一或多个O;Or R 13 represents a C 2 -C 20 alkyl group, in which one or more O;
或R13表示苯基;Or R 13 represents a phenyl group;
k表示2的整数;k represents an integer of 2;
R14表示C1-C20烷基或噻吩基;R 14 represents a C 1 -C 20 alkyl group or a thienyl group;
R15表示苯基或萘基,其各未经取代或经一或多个OR17或C1-C20烷基取 代;R 15 represents phenyl or naphthyl, each of which is unsubstituted or substituted with one or more OR 17 or C 1 -C 20 alkyl groups;
或R15表示噻吩基、氢、C1-C20烷基,该C1-C20烷基未经取代或经一或多个以下基团取代:OR17、SR18、C3-C8环烷基、NR19R20或COOR17Or R 15 represents a thiophene group, hydrogen, C 1 -C 20 alkyl, C 1 -C 20 alkyl which is unsubstituted or substituted with one or more of the following groups: OR 17, SR 18, C 3 -C 8 Cycloalkyl, NR 19 R 20 or COOR 17 ;
或R15表示C2-C20烷基,其间杂有SO2Or R 15 represents a C 2 -C 20 alkyl group, interspersed with SO 2 ;
R16表示苯基或萘基,其各未经取代或经一或多个以下基团取代:OR17、SR18、NR19R20或C1-C20烷基;或R16表示噻吩基;R 16 represents a phenyl or naphthyl group, each of which is unsubstituted or substituted with one or more of the following groups: OR 17 , SR 18 , NR 19 R 20 or C 1 -C 20 alkyl; or R 16 represents thienyl ;
R17表示氢、C1-C8烷酰基、C1-C20烷基,其未经取代或经一或多个以下基团:卤素、O(CO)-(C1-C4烷基)、O(CO)-(C2-C4)烯基或间杂有一或多个O的C3-C20环烷基;R 17 represents hydrogen, C 1 -C 8 alkanoyl, C 1 -C 20 alkyl, which is unsubstituted or has one or more of the following groups: halogen, O(CO)-(C 1 -C 4 alkyl Or O(CO)-(C 2 -C 4 )alkenyl or a C 3 -C 20 cycloalkyl group having one or more O;
或R17表示C2-C20烷基,其间杂有一或多个O;Or R 17 represents a C 2 -C 20 alkyl group, in which one or more O;
R18表示C3-C20环烷基、C1-C20烷基,其未经取代或经一或多个OH、O(CO)-(C2-C4)烯基或(CO)OR17取代;R 18 represents C 3 -C 20 cycloalkyl, C 1 -C 20 alkyl, unsubstituted or via one or more OH, O(CO)-(C 2 -C 4 )alkenyl or (CO) Replaced by OR 17 ;
或R18表示苯基,其未经取代或经一或多个卤素取代;Or R 18 represents a phenyl group which is unsubstituted or substituted with one or more halogens;
R19及R20彼此独立地为C1-C8烷酰基或C1-C8烷酰基氧基;R 19 and R 20 are each independently a C 1 -C 8 alkanoyl group or a C 1 -C 8 alkanoyloxy group;
或R19及R20与其所附接的N原子一起形成间杂有O的5元或6元饱和环;Or R 19 and R 20 attached thereto together form a N atoms interrupted by O 5-membered or 6-membered saturated ring;
但条件为在该分子中存在至少一个式(2)所表示的基团However, the condition is that at least one group represented by the formula (2) is present in the molecule.
Figure PCTCN2015092029-appb-000116
Figure PCTCN2015092029-appb-000116
本发明化合物的实例是如上文所定义的式(Ia)-(Ig)化合物。式(Ia)、(Ib)、(Ic)、尤其式(Ia)或(Ic)、或式(Ia)、(Ic)或(Id)、尤其式(Ia)的化合物令人关注。An example of a compound of the invention is a compound of formula (Ia)-(Ig) as defined above. Compounds of formula (Ia), (Ib), (Ic), especially formula (Ia) or (Ic), or formula (Ia), (Ic) or (Id), especially formula (Ia) are of interest.
举例而言,R1、R2、R3、R4、R5、R6、R7及R8彼此独立地为氢、COR16、由式(2)所表示的基团、或R1及R2、R2及R3、R3及R4或R5及R6、R6及R7、R7及R8彼此独立地共同为式(5)所表示的基团、 For example, R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 and R 8 are each independently hydrogen, COR 16 , a group represented by formula (2), or R 1 And R 2 , R 2 and R 3 , R 3 and R 4 or R 5 and R 6 , R 6 and R 7 , R 7 and R 8 are each independently a group represented by the formula (5),
Figure PCTCN2015092029-appb-000117
Figure PCTCN2015092029-appb-000117
举例而言,R3及R4或R1及R2共同为式(5)所表示的基团、For example, R 3 and R 4 or R 1 and R 2 together are a group represented by the formula (5),
Figure PCTCN2015092029-appb-000118
Figure PCTCN2015092029-appb-000118
或R3及R4及R5及R6共同为式(5)所表示的基团、Or R 3 and R 4 and R 5 and R 6 together are a group represented by the formula (5),
Figure PCTCN2015092029-appb-000119
Figure PCTCN2015092029-appb-000119
R3及R4尤其共同为式(5)所表示的基团、
Figure PCTCN2015092029-appb-000120
Figure PCTCN2015092029-appb-000121
R 3 and R 4 are in particular a group represented by the formula (5),
Figure PCTCN2015092029-appb-000120
Figure PCTCN2015092029-appb-000121
举例而言,R1、R5、R6及R8表示氢。For example, R 1 , R 5 , R 6 and R 8 represent hydrogen.
R7尤其为氢COR16或式(2)所表示的基团、
Figure PCTCN2015092029-appb-000122
Figure PCTCN2015092029-appb-000123
R 7 is especially a group represented by hydrogen COR 16 or formula (2),
Figure PCTCN2015092029-appb-000122
Figure PCTCN2015092029-appb-000123
或R7为COR16或式(2)所表示的基团,尤其为式(2)所表示的基团、Or R 7 is a group represented by COR 16 or formula (2), particularly a group represented by formula (2),
Figure PCTCN2015092029-appb-000124
Figure PCTCN2015092029-appb-000124
R2尤其为COR16、式(2)所表示的基团或是由式(3)所表示的基团、 R 2 is especially a group represented by COR 16 , formula (2) or a group represented by formula (3),
Figure PCTCN2015092029-appb-000125
Figure PCTCN2015092029-appb-000125
或R2与R1一起为式(5)所表示的基团。R2尤其为COR16Or R 2 together with R 1 is a group represented by the formula (5). R 2 is especially COR 16 .
Figure PCTCN2015092029-appb-000126
Figure PCTCN2015092029-appb-000126
X较佳为直接键。X is preferably a direct bond.
举例而言,R9、R10、R11及R12彼此独立地为氢、C1-C20烷基、未经取代的苯基或经一或多个以下基团取代的苯基:C1-C6烷基、卤素、OR17或SR18;或R9、R10、R11及R12彼此独立地为卤素、OR17、SR18或NR19R20,其中取代基OR17、SR18或NR19R20视情况经由基团R17、R18、R19和/或R20与萘基环的一个碳原子形成5元或6元环;或R9、R10、R11及R12彼此独立地为COR16或式(2)所表示的基团。
Figure PCTCN2015092029-appb-000127
For example, R 9 , R 10 , R 11 and R 12 are, independently of each other, hydrogen, C 1 -C 20 alkyl, unsubstituted phenyl or phenyl substituted with one or more of the following groups: C 1 -C 6 alkyl, halogen, OR 17 or SR 18 ; or R 9 , R 10 , R 11 and R 12 are each independently halogen, OR 17 , SR 18 or NR 19 R 20 wherein the substituent OR 17 SR 18 or NR 19 R 20 optionally via a group R 17, R 18, R 19 and / or R 20 and one carbon atom naphthyl ring form a 5-membered or 6-membered ring; or R 9, R 10, R 11 And R 12 are each independently a group represented by COR 16 or formula (2).
Figure PCTCN2015092029-appb-000127
具体而言,R9、R10、R11及R12彼此独立地为氢、C1-C20烷基、未经取代的苯基或经一或多个以下基团取代的苯基:C1-C6烷基、卤素、OR17或SR18; 或R9、R10、R11及R12彼此独立地为卤素、OR17、SR18或NR19R20;或R9、R10、R11及R12彼此独立地为COR16或式(2)所表示的基团。Specifically, R 9 , R 10 , R 11 and R 12 are each independently hydrogen, C 1 -C 20 alkyl, unsubstituted phenyl or phenyl substituted with one or more of the following groups: C 1 -C 6 alkyl, halogen, OR 17 or SR 18 ; or R 9 , R 10 , R 11 and R 12 are, independently of each other, halogen, OR 17 , SR 18 or NR 19 R 20 ; or R 9 , R 10 R 11 and R 12 are each independently a group represented by COR 16 or formula (2).
Figure PCTCN2015092029-appb-000128
Figure PCTCN2015092029-appb-000128
举例而言,R9、R10、R11及R12彼此独立地为氢、C1-C20烷基、未经取代的苯基或经一或多个C1-C6烷基取代的苯基;或R9、R10、R11及R12彼此独立地为COR16或式(2)所表示的基团、For example, R 9 , R 10 , R 11 and R 12 are, independently of each other, hydrogen, C 1 -C 20 alkyl, unsubstituted phenyl or substituted by one or more C 1 -C 6 alkyl groups. Phenyl group; or R 9 , R 10 , R 11 and R 12 are each independently a group represented by COR 16 or formula (2),
Figure PCTCN2015092029-appb-000129
Figure PCTCN2015092029-appb-000129
在另一实施例中,举例而言,R9、R10、R11及R12彼此独立地为氢、C1-C20烷基、未经取代的苯基或经一或多个以下基团取代的苯基:C1-C6烷基、卤素、OR17或SR18;或R9、R10、R11及R12彼此独立地为卤素、OR17、SR18或NR19R20,其中取代基OR17、SR18或NR19R20视情况经由基团R17、R18、R19和/或R20与萘基环的一个碳原子形成5元或6元环。In another embodiment, for example, R 9 , R 10 , R 11 and R 12 are, independently of each other, hydrogen, C 1 -C 20 alkyl, unsubstituted phenyl or one or more of the following groups a substituted phenyl group: C 1 -C 6 alkyl, halogen, OR 17 or SR 18 ; or R 9 , R 10 , R 11 and R 12 are each independently halogen, OR 17 , SR 18 or NR 19 R 20 Wherein the substituent OR 17 , SR 18 or NR 19 R 20 optionally forms a 5- or 6-membered ring with one carbon atom of the naphthyl ring via the radicals R 17 , R 18 , R 19 and/or R 20 .
此外,举例而言,R9、R10、R11及R12彼此独立地为氢、C1-C20烷基、未经取代的苯基或经一或多个以下基团取代的苯基:C1-C6烷基、卤素、OR17或SR18,或R9、R10、R11及R12彼此独立地为卤素、OR17、SR18、NR19R20或COR16Further, for example, R 9 , R 10 , R 11 and R 12 are each independently hydrogen, C 1 -C 20 alkyl, unsubstituted phenyl or phenyl substituted with one or more of the following groups C 1 -C 6 alkyl, halogen, OR 17 or SR 18 , or R 9 , R 10 , R 11 and R 12 are each independently halogen, OR 17 , SR 18 , NR 19 R 20 or COR 16 .
或举例而言,R9、R10、R11及R12彼此独立地为氢、C1-C20烷基、未经取代的苯基或经一或多个以下基团取代的苯基:C1-C6烷基、卤素、OR17或SR18,或R9、R10、R11及R12彼此独立地为卤素、OR17、COR16或NR19R20Or by way of example, R 9 , R 10 , R 11 and R 12 are, independently of each other, hydrogen, C 1 -C 20 alkyl, unsubstituted phenyl or phenyl substituted with one or more of the following groups: C 1 -C 6 alkyl, halogen, OR 17 or SR 18 , or R 9 , R 10 , R 11 and R 12 are each independently halogen, OR 17 , COR 16 or NR 19 R 20 .
较佳地,R9、R11及R12表示氢且R10表示氢、OR17或COR16Preferably, R 9 , R 11 and R 12 represent hydrogen and R 10 represents hydrogen, OR 17 or COR 16 .
R13表示(例如)C1-C20烷基,其未经取代或经一或多个以下基团取代:卤素、COOR17或CONR19R20;或R13表示C2-C20烷基,其间杂有一或多个O、 S、SO、SO2、NR26或CO,或是C2-C12烯基,其视情况间杂有一或多个O、CO或NR26,或R13表示C3-C10环烷基,其视情况间杂有一或多个O、S、CO、NR26,或R13表示苯基或萘基,此二个未经取代或经一或多个以下基团取代:OR17、SR18、NR19R20、COR16、NO2、卤素、C1-C20烷基、C1-C4卤代烷基、C2-C20烷基,其间杂有一或多个O、或式(7)表示的基团、R 13 represents, for example, a C 1 -C 20 alkyl group which is unsubstituted or substituted with one or more of the following groups: halogen, COOR 17 or CONR 19 R 20 ; or R 13 represents C 2 -C 20 alkyl In between, one or more of O, S, SO, SO2, NR 26 or CO, or a C 2 -C 12 alkenyl group, optionally having one or more O, CO or NR 26 or R 13 representing C 3 -C 10 cycloalkyl, which is optionally interrupted by one or more O, S, CO, NR 26 , or R 13 represents a phenyl or naphthyl group, which is unsubstituted or substituted with one two or more of the following groups Substitution: OR 17 , SR 18 , NR 19 R 20 , COR 16 , NO 2 , halogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, C 2 -C 20 alkyl, with one or more Or O, or a group represented by the formula (7),
Figure PCTCN2015092029-appb-000130
Figure PCTCN2015092029-appb-000130
或是C1-C20烷基,其未经取代或经一或多个以下基团取代:卤素、R17、COOR17、OR17、SR18、CONR19R20或PO(OCkH2k+1)2;或是C2-C20烷基,其间杂有一或多个O。Or a C 1 -C 20 alkyl group which is unsubstituted or substituted with one or more of the following groups: halogen, R 17 , COOR 17 , OR 17 , SR 18 , CONR 19 R 20 or PO (OC k H 2k +1 ) 2 ; or a C 2 -C 20 alkyl group in which one or more O are heterogeneous.
此外,R13表示(例如)C1-C20烷基,其未经取代或经一或多个以下基团取代:卤素、R17、COOR17、OR17、SR18、CONR19R20或PO(OCkH2k+1)2;或是C2-C20烷基,其间杂有一或多个O;或是C2-C12烯基、C3-C10环烷基;或R13表示苯基或萘基,此二个未经取代或经一或多个以下基团取代:OR17、SR18、NR19R20、COR16、NO2、卤素、C1-C20烷基、C1-C4卤代烷基、C2-C20烷基,其间杂有一或多个O、或式(7)表示的基团、Further, R 13 represents, for example, a C 1 -C 20 alkyl group which is unsubstituted or substituted with one or more of the following groups: halogen, R 17 , COOR 17 , OR 17 , SR 18 , CONR 19 R 20 or PO(OC k H 2k+1 ) 2 ; or a C 2 -C 20 alkyl group in which one or more O is hetero; or a C 2 -C 12 alkenyl group, a C 3 -C 10 cycloalkyl group; or R 13 represents a phenyl or naphthyl group which is unsubstituted or substituted with one or more of the following groups: OR 17 , SR 18 , NR 19 R 20 , COR 16 , NO 2 , halogen, C 1 -C 20 alkane a C 1 -C 4 haloalkyl group, a C 2 -C 20 alkyl group, having one or more O or a group represented by the formula (7)
Figure PCTCN2015092029-appb-000131
Figure PCTCN2015092029-appb-000131
在另一实施例中,R13表示(例如)C1-C20烷基,其未经取代或经一或多个以下基团取代:卤素、R17、OR17、SR18或PO(OCkH2k+1)2;或是C2-C20烷基,其间杂有一或多个O;或是C2-C12烯基、C3-C10环烷基、苯基或萘基。In another embodiment, R 13 represents, for example, C 1 -C 20 alkyl, which is unsubstituted or substituted with one or more of the following: halo, R 17 , OR 17 , SR 18 or PO (OC k H 2k+1 ) 2 ; or a C 2 -C 20 alkyl group in which one or more O is hetero; or a C 2 -C 12 alkenyl group, a C 3 -C 10 cycloalkyl group, a phenyl group or a naphthyl group; .
或R13表示(例如)C1-C20烷基,其未经取代或经一或多个以下基团取代:卤素、R17、OR17、SR18或PO(OCkH2k+1)2;或是C2-C20烷基,其间杂有一或多个O;或是苯基、C2-C12烯基或C3-C10环烷基。Or R 13 represents, for example, a C 1 -C 20 alkyl group which is unsubstituted or substituted with one or more of the following groups: halogen, R 17 , OR 17 , SR 18 or PO(OC k H 2k+1 ) 2 ; or a C 2 -C 20 alkyl group having one or more O; or a phenyl group, a C 2 -C 12 alkenyl group or a C 3 -C 10 cycloalkyl group.
或R13表示(例如)C1-C20烷基、苯基、C2-C12烯基或C3-C10环烷基。Or R 13 represents, for example, a C 1 -C 20 alkyl group, a phenyl group, a C 2 -C 12 alkenyl group or a C 3 -C 10 cycloalkyl group.
或R13表示(例如)C1-C20烷基、C2-C12烯基或C3-C10环烷基。Or R 13 represents, for example, a C 1 -C 20 alkyl group, a C 2 -C 12 alkenyl group or a C 3 -C 10 cycloalkyl group.
较佳地,R13表示C1-C20烷基,尤其为C1-C8烷基,例如2-乙基己基。Preferably, R 13 represents a C 1 -C 20 alkyl group, especially a C 1 -C 8 alkyl group, such as 2-ethylhexyl.
R14表示(例如)氢、C3-C8环烷基、C2-C5烯基、C1-C20烷氧基或C1-C20烷基,其未经取代或经一或多个卤素或苯基取代;或R14表示苯基或萘基,此二个未经取代或经一或多个以下基团取代:C1-C6烷基、C1-C4卤代烷基、卤 素、OR17、SR18和/或NR19R20;或R14表示C3-C5杂芳基,例如噻吩基,或是C1-C8烷氧基、苄氧基或苯氧基。R 14 represents, for example, hydrogen, C 3 -C 8 cycloalkyl, C 2 -C 5 alkenyl, C 1 -C 20 alkoxy or C 1 -C 20 alkyl, which is unsubstituted or subjected to one or Substituted by a plurality of halogens or phenyl groups; or R 14 represents a phenyl or naphthyl group, which are unsubstituted or substituted with one or more of the following groups: C 1 -C 6 alkyl, C 1 -C 4 haloalkyl , halogen, OR 17 , SR 18 and/or NR 19 R 20 ; or R 14 represents a C 3 -C 5 heteroaryl group, for example a thienyl group, or a C 1 -C 8 alkoxy group, a benzyloxy group or a phenoxy group base.
或R14表示(例如)C1-C20烷基,其未经取代或经一或多个卤素或苯基取代;或R14表示C3-C5杂芳基(例如噻吩基)或是未经取代或经取代一或多个以下基团取代的苯基:C1-C6烷基、C1-C4卤代烷基、卤素、OR17、SR18和/或NR19R20;或R14表示C1-C8烷氧基、苄氧基或苯氧基。Or R 14 represents, for example, a C 1 -C 20 alkyl group which is unsubstituted or substituted with one or more halogen or phenyl groups; or R 14 represents a C 3 -C 5 heteroaryl group (e.g., thienyl) or a phenyl group which is unsubstituted or substituted with one or more of the following groups: C 1 -C 6 alkyl, C 1 -C 4 haloalkyl, halogen, OR 17 , SR 18 and/or NR 19 R 20 ; R 14 represents a C 1 -C 8 alkoxy group, a benzyloxy group or a phenoxy group.
在另一实施例中,R14表示C1-C20烷基,其未经取代或经苯基取代;或R14表示苯基,其未经取代或经一或多个C1-C6烷基取代。In another embodiment, R 14 represents C 1 -C 20 alkyl, which is unsubstituted or substituted with phenyl; or R 14 represents phenyl, which is unsubstituted or via one or more C 1 -C 6 Alkyl substitution.
较佳地,R14表示C1-C20烷基、C3-C5杂芳基(例如噻吩基),或是苯基,尤其为C1-C20烷基或噻吩基,尤其为C1-C8烷基。Preferably, R 14 represents C 1 -C 20 alkyl, C 3 -C 5 heteroaryl (such as thienyl), or phenyl, especially C 1 -C 20 alkyl or thienyl, especially C 1- C 8 alkyl.
R15表示(例如)C6-C20芳基或C5-C20杂芳基,其各未经取代或经一或多个以下基团取代:苯基、卤素、C1-C4卤代烷基、CN、NO2、OR17、SR18、NR19R20、C1-C20烷基;或R15表示氢、C3-C8环烷基,该C3-C8环烷基视情况间杂有一或多个O、CO或NR26;或R15表示C1-C20烷基,其未经取代或经一或多个以下基团取代:卤素、OR17、C3-C8环烷基、C5-C20杂芳基、C8-C20苯氧基羰基、C5-C20杂芳氧基-羰基、NR19R20、COOR17、CONR19R20、PO(OCkH2k+1)2、式(6)所表示的基团、苯基、或经以下基团取代的苯基:卤素、C1-C20烷基、C1-C4卤代烷基、OR17或NR19R20R 15 represents, for example, a C 6 -C 20 aryl group or a C 5 -C 20 heteroaryl group, each of which is unsubstituted or substituted with one or more of the following groups: phenyl, halogen, C 1 -C 4 haloalkane a group, CN, NO 2 , OR 17 , SR 18 , NR 19 R 20 , C 1 -C 20 alkyl; or R 15 represents hydrogen, C 3 -C 8 cycloalkyl, the C 3 -C 8 cycloalkyl Depending on the case, one or more O, CO or NR 26 ; or R 15 represents a C 1 -C 20 alkyl group which is unsubstituted or substituted with one or more of the following groups: halogen, OR 17 , C 3 -C 8 -cycloalkyl, C 5 -C 20 heteroaryl, C 8 -C 20 phenoxycarbonyl, C 5 -C 20 heteroaryloxy-carbonyl, NR 19 R 20 , COOR 17 , CONR 19 R 20 , PO (OC k H 2k+1 ) 2 , a group represented by the formula (6), a phenyl group, or a phenyl group substituted by a halogen group, a C 1 -C 20 alkyl group, a C 1 -C 4 haloalkyl group , OR 17 or NR 19 R 20 ;
Figure PCTCN2015092029-appb-000132
Figure PCTCN2015092029-appb-000132
或R15表示C2-C20烷基,其间杂有一或多个O、S或SO2,或R15表示C2-C20烷酰基、苯甲酰基、C2-C12烷氧基羰基、苯氧基羰基、CONR19R20、NO2或C1-C4卤代烷基。Or R 15 represents a C 2 -C 20 alkyl group in which one or more O, S or SO 2 are heterogeneous, or R 15 represents a C 2 -C 20 alkanoyl group, a benzoyl group, a C 2 -C 12 alkoxycarbonyl group. , phenoxycarbonyl, CONR 19 R 20 , NO 2 or C 1 -C 4 haloalkyl.
此外,R15表示(例如)氢、C6-C20芳基,尤其为苯基或萘基,其各未经取代或经C1-C12烷基取代;或是C3-C5杂芳基,例如噻吩基;或是C3-C8环烷基、C1-C20烷基,其未经取代或经一或多个以下基团取代:OR17、SR17、C3-C8-环烷基、NR19R20或COOR17;或R15表示C2-C20烷基,其间杂有一或多个O或SO2Further, R 15 represents, for example, hydrogen, C 6 -C 20 aryl, especially phenyl or naphthyl, each unsubstituted or substituted by C 1 -C 12 alkyl; or C 3 -C 5 hetero An aryl group, such as a thienyl group; or a C 3 -C 8 cycloalkyl group, a C 1 -C 20 alkyl group, which is unsubstituted or substituted with one or more of the following groups: OR 17 , SR 17 , C 3 - C 8 -cycloalkyl, NR 19 R 20 or COOR 17 ; or R 15 represents C 2 -C 20 alkyl with one or more O or SO 2 heteromixed therebetween.
式(1)化合物令人关注,其中R15表示(例如)氢、苯基、萘基,其各未经取代或经C1-C8烷基取代;或R15表示噻吩基、C1-C20烷基,其未经取代或经一 或多个以下基团取代:OR17、SR17、C3-C8-环烷基、NR19R20或COOR17;或R15表示C2-C20烷基,其间杂有一或多个O或SO2Compounds of formula (1) are of interest, wherein R 15 represents, for example, hydrogen, phenyl, naphthyl, each unsubstituted or substituted by C 1 -C 8 alkyl; or R 15 represents thienyl, C 1 - a C 20 alkyl group which is unsubstituted or substituted with one or more of the following groups: OR 17 , SR 17 , C 3 -C 8 -cycloalkyl, NR 19 R 20 or COOR 17 ; or R 15 represents C 2 a -C 20 alkyl group in which one or more O or SO 2 are heterogeneous.
R15尤其为(例如)C3-C8环烷基或C1-C20烷基,尤其为C1-C20烷基,尤其为C1-C12烷基。R 15 is especially, for example, C 3 -C 8 cycloalkyl or C 1 -C 20 alkyl, especially C 1 -C 20 alkyl, especially C 1 -C 12 alkyl.
R'14及R'15的较佳的分别是如上文针对R14及R15所给出的。Preferred of R' 14 and R' 15 are as given above for R 14 and R 15 respectively.
X1表示(例如)O、S或SO,例如O或S,尤其为O。X 1 represents, for example, O, S or SO, such as O or S, especially O.
R16表示(例如)C6-C20芳基(尤其苯基或萘基、尤其苯基)或C5-C20杂芳基(尤其噻吩基),其各未经取代或经一或多个以下基团取代:苯基、卤素、C1-C4卤代烷基、CN、NO2、OR17、SR18、NR19R20或间杂有一或多个O的C1-C20烷基;或其各经一或多个C1-C20烷基取代,该C1-C20烷基未经取代或经一或多个以下基团取代:卤素、COOR17、CONR19R20、苯基、C3-C8环烷基、C5-C20杂芳基、C6-C20芳氧基羰基、C5-C20杂芳氧基羰基、OR17、SR18或NR19R20;或R16表示氢、C1-C20烷基,该C1-C20烷基未经取代或经一或多个以下基团取代:卤素、苯基、OH、SH、C3-C6烯氧基、OCH2CH2(CO)O(C1-C4烷基)、O(CO)-(C1-C4烷基)、O(CO)-苯基、(CO)OH或(CO)O(C1-C4烷基);或R16表示C2-C12烷基,其间杂有一或多个O;或表示(CH2CH2O)n+1H、(CH2CH2O)n(CO)-(C1-C8烷基)、C2-C12烯基或C3-C8环烷基,且n是1至20,例如1至12或1至8,尤其为1或2。R 16 represents, for example, a C 6 -C 20 aryl group (especially phenyl or naphthyl, especially phenyl) or a C 5 -C 20 heteroaryl (especially thienyl), each unsubstituted or via one or more Substituted for: phenyl, halogen, C 1 -C 4 haloalkyl, CN, NO 2 , OR 17 , SR 18 , NR 19 R 20 or a C 1 -C 20 alkyl group having one or more O; or each with one or more C 1 -C 20 substituted alkyl, C 1 -C 20 alkyl which is unsubstituted or substituted with one or more of the following radicals: halogen, COOR 17, CONR 19 R 20 , benzyl , C 3 -C 8 cycloalkyl, C 5 -C 20 heteroaryl, C 6 -C 20 aryloxycarbonyl, C 5 -C 20 heteroaryloxycarbonyl, OR 17 , SR 18 or NR 19 R 20; or R 16 represents hydrogen, C 1 -C 20 alkyl, C 1 -C 20 alkyl which is unsubstituted or substituted with one or more of the following groups: halogen, phenyl, OH, SH, C 3 - C 6 alkenyloxy, OCH 2 CH 2 (CO)O(C 1 -C 4 alkyl), O(CO)-(C 1 -C 4 alkyl), O(CO)-phenyl, (CO) OH or (CO)O(C 1 -C 4 alkyl); or R 16 represents a C 2 -C 12 alkyl group with one or more O in between; or (CH 2 CH 2 O) n+1 H, (CH 2 CH 2 O) n (CO)-(C 1 -C 8 alkyl), C 2 -C 12 alkenyl or C 3- C 8 cycloalkyl, and n is from 1 to 20, for example from 1 to 12 or from 1 to 8, especially 1 or 2.
此外,R16表示(例如)苯基或萘基,尤其为苯基、噻吩基或咔唑,其各未经取代或经一或多个以下基团取代:苯基、卤素、C1-C4卤代烷基、OR17、SR18、NR19R20或C1-C20烷基;或R16表示C1-C20烷基,其未经取代或经一或多个以下基团取代:卤素、苯基、OH、SH、C3-C6烯氧基、OCH2CH2(CO)O(C1-C4烷基)、O(CO)-(C1-C4烷基)、O(CO)-苯基、(CO)OH或(CO)O(C1-C4烷基);或R16表示C2-C12烷基,其间杂有一或多个O;或是(CH2CH2O)n+1H、(CH2CH2O)n(CO)-(C1-C8烷基)、C2-C12烯基或C3-C8环烷基,且n是1至20,例如1至12或1至8,尤其为1或2。Furthermore, R 16 represents, for example, phenyl or naphthyl, especially phenyl, thienyl or oxazole, each unsubstituted or substituted by one or more of the following groups: phenyl, halogen, C 1 -C a 4- haloalkyl group, OR 17 , SR 18 , NR 19 R 20 or C 1 -C 20 alkyl; or R 16 represents a C 1 -C 20 alkyl group which is unsubstituted or substituted with one or more of the following groups: Halogen, phenyl, OH, SH, C 3 -C 6 alkenyloxy, OCH 2 CH 2 (CO)O(C 1 -C 4 alkyl), O(CO)-(C 1 -C 4 alkyl) , O(CO)-phenyl, (CO)OH or (CO)O(C 1 -C 4 alkyl); or R 16 represents a C 2 -C 12 alkyl group, wherein one or more O are heterogeneous; (CH 2 CH 2 O) n+1 H, (CH 2 CH 2 O) n (CO)-(C 1 -C 8 alkyl), C 2 -C 12 alkenyl or C 3 -C 8 cycloalkyl And n is from 1 to 20, such as from 1 to 12 or from 1 to 8, especially 1 or 2.
此外,R16表示(例如)苯基或萘基,尤其为苯基,其各未经取代或经一或多个以下基团取代:苯基、卤素、C1-C4卤代烷基、OR17、SR18、NR19R20或C1-C20烷基;或R16表示C3-C5杂芳基,尤其为噻吩基。Further, R 16 represents, for example, phenyl or naphthyl, especially phenyl, each unsubstituted or substituted with one or more of the following groups: phenyl, halogen, C 1 -C 4 haloalkyl, OR 17 , SR 18 , NR 19 R 20 or C 1 -C 20 alkyl; or R 16 represents a C 3 -C 5 heteroaryl group, especially a thienyl group.
R16尤其为(例如)苯基,其未经取代或经一或多个以下基团取代:OR17、 SR18、NR19R20或C1-C20烷基,或R16表示噻吩基。R 16 is especially, for example, phenyl which is unsubstituted or substituted by one or more of the following groups: OR 17 , SR 18 , NR 19 R 20 or C 1 -C 20 alkyl, or R 16 represents thienyl .
较佳地,R16表示(例如)苯基或萘基,其各未经取代或经一或多个C1-C20烷基取代。Preferably, R 16 represents, for example, phenyl or naphthyl, each of which is unsubstituted or substituted with one or more C 1 -C 20 alkyl groups.
R16尤其为苯基,其经一或多个C1-C20烷基取代。R 16 is especially phenyl which is substituted by one or more C 1 -C 20 alkyl groups.
R17表示(例如)氢、苯基-C1-C3烷基、C1-C20烷基,其未经取代或经一或多个以下基团取代:卤素、OH、OCH2CH2(CO)O(C1-C4烷基)、O(CO)-(C1-C4烷基)、O(CO)-(C2-C4)烯基、O(CO)-苯基、(CO)OH、(CO)O(C1-C4烷基)、C3-C20环烷基或间杂有一或多个O的C3-C20环烷基;或R17表示C2-C20烷基,其间杂有一或多个O;是(CH2CH2O)n+1H、(CH2CH2O)n(CO)-(C1-C8烷基)、C1-C8烷酰基、C2-C12烯基、C3-C6烯酰基或C3-C20环烷基,其视情况间杂有一或多个O;或R17表示苯甲酰基,其未经取代或经一或多个C1-C6烷基、卤素、OH或C1-C3烷氧基取代;或R17表示苯基、萘基或C5-C20杂芳基,其各未经取代或经一或多个以下基团取代:卤素、OH、C1-C12烷基、C1-C12烷氧基、CN、NO2、苯基-C1-C3烷氧基、苯氧基、C1-C12烷基硫基、苯基硫基、N(C1-C12烷基)2、二苯基-胺基或式(7)表示的基团R 17 represents, for example, hydrogen, phenyl-C 1 -C 3 alkyl, C 1 -C 20 alkyl, which is unsubstituted or substituted with one or more of the following groups: halogen, OH, OCH 2 CH 2 (CO)O(C 1 -C 4 alkyl), O(CO)-(C 1 -C 4 alkyl), O(CO)-(C 2 -C 4 )alkenyl, O(CO)-benzene group, (CO) OH, (CO ) O (C 1 -C 4 alkyl), C 3 -C 20 cycloalkyl interrupted by one or more O or a C 3 -C 20 cycloalkyl; or R 17 represents a C 2 -C 20 alkyl group having one or more O in between; (CH 2 CH 2 O) n+1 H, (CH 2 CH 2 O) n (CO)-(C 1 -C 8 alkyl) a C 1 -C 8 alkanoyl group, a C 2 -C 12 alkenyl group, a C 3 -C 6 enoyl group or a C 3 -C 20 cycloalkyl group, optionally having one or more O; or R 17 representing a benzene group An acyl group which is unsubstituted or substituted by one or more C 1 -C 6 alkyl, halogen, OH or C 1 -C 3 alkoxy groups; or R 17 represents phenyl, naphthyl or C 5 -C 20 Aryl groups each substituted or substituted with one or more of the following groups: halogen, OH, C 1 -C 12 alkyl, C 1 -C 12 alkoxy, CN, NO 2 , phenyl-C 1 -C 3 alkoxy, phenoxy, C 1 -C 12 alkylthio, phenylthio, N (C 1 -C 12 alkyl) 2, diphenyl - group, or of formula (7) table Group
Figure PCTCN2015092029-appb-000133
Figure PCTCN2015092029-appb-000133
在另一实施例中,R17表示(例如)氢、苯基-C1-C3烷基、C1-C20烷基,其未经取代或经一或多个以下基团取代:卤素、O(CO)-(C1-C4烷基)、O(CO)-(C2-C4烯基)或间杂有一或多个O的C2-C20烷基;或是C1-C8烷酰基、C2-C12烯基、C3-C6烯酰基、间杂有一或多个O的C2-C20烷基、视情况间杂有一或多个O的C3-C20环烷基;或是苯甲酰基,其未经取代或经一或多个以下基团取代:C1-C6烷基、卤素、OH或C1-C3烷氧基;或是苯基或萘基,其各未经取代或经一或多个以下基团取代:卤素、C1-C12烷基或C1-C12烷氧基。In another embodiment, R 17 represents, for example, hydrogen, phenyl-C 1 -C 3 alkyl, C 1 -C 20 alkyl, which is unsubstituted or substituted with one or more of the following: halogen , O(CO)-(C 1 -C 4 alkyl), O(CO)-(C 2 -C 4 alkenyl) or a C 2 -C 20 alkyl group having one or more O; or C 1 a C 8 alkanoyl group, a C 2 -C 12 alkenyl group, a C 3 -C 6 alkenoyl group, a C 2 -C 20 alkyl group having one or more O interstitials, and optionally a C 3 -C having one or more O a 20 cycloalkyl group; or a benzoyl group which is unsubstituted or substituted with one or more of the following groups: C 1 -C 6 alkyl, halogen, OH or C 1 -C 3 alkoxy; or benzene Or a naphthyl group, each of which is unsubstituted or substituted with one or more of the following groups: halogen, C 1 -C 12 alkyl or C 1 -C 12 alkoxy.
R17也为(例如)氢、苯基-C1-C3烷基、C1-C8烷酰基、C1-C20烷基,其未经取代或经一或多个以下基团取代:卤素、C3-C20环烷基、O(CO)-(C1-C4烷基)、O(CO)-(C2-C4烯基)或间杂有一或多个O的C2-C20烷基,或R17表示C2-C20烷基,其间杂有一或多个O。R 17 is also, for example, hydrogen, phenyl-C 1 -C 3 alkyl, C 1 -C 8 alkanoyl, C 1 -C 20 alkyl, which is unsubstituted or substituted with one or more of the following groups : halogen, C 3 -C 20 cycloalkyl, O(CO)-(C 1 -C 4 alkyl), O(CO)-(C 2 -C 4 alkenyl) or inter-hetero C with one or more O 2 -C 20 alkyl group, or R 17 represents C 2 -C 20 alkyl, heteroalkyl having one or more therebetween O.
R17尤其为氢、C1-C8烷酰基、C1-C20烷基,其未经取代或经一或多个以下基团取代:O(CO)-(C1-C4烷基)、O(CO)-(C2-C4烯基)或间杂有一或多个O 的C2-C20烷基,或R17表示C2-C20烷基,其间杂有一或多个O。R 17 is especially hydrogen, C 1 -C 8 alkanoyl, C 1 -C 20 alkyl, which is unsubstituted or substituted by one or more of the following groups: O(CO)-(C 1 -C 4 alkyl , O(CO)-(C 2 -C 4 alkenyl) or a C 2 -C 20 alkyl group having one or more O, or R 17 representing a C 2 -C 20 alkyl group, one or more O.
R18表示(例如)C3-C20环烷基,其未经间杂或间杂有一或多个O;或R18表示C1-C20烷基,其未经取代或经一或多个以下基团取代:OH、O(CO)-(C2-C4)烯基、O(CO)-(C1-C4烷基)或(CO)OR17;或R18表示C2-C20烷基,其间杂有一或多个O、S、CO、NR26或COOR17;或R18表示C2-C8烷酰基或C3-C6烯酰基、苯甲酰基;或R18表示苯基、萘基或C3-C20杂芳基,其各未经取代或经一或多个以下基团取代:卤素、C1-C12烷基、C1-C4卤代烷基、C1-C12烷氧基或NO2R 18 represents, for example, a C 3 -C 20 cycloalkyl group which has no or a hetero or one or more O; or R 18 represents a C 1 -C 20 alkyl group which is unsubstituted or one or more of the following Group substitution: OH, O(CO)-(C 2 -C 4 )alkenyl, O(CO)-(C 1 -C 4 alkyl) or (CO)OR 17 ; or R 18 represents C 2 -C a 20 alkyl group having one or more of O, S, CO, NR 26 or COOR 17 in between ; or R 18 represents a C 2 -C 8 alkanoyl group or a C 3 -C 6 alkenoyl group, a benzoyl group; or R 18 represents Phenyl, naphthyl or C 3 -C 20 heteroaryl, each unsubstituted or substituted by one or more of the following groups: halogen, C 1 -C 12 alkyl, C 1 -C 4 haloalkyl, C 1 -C 12 alkoxy or NO 2 .
在另一实施例中,R18表示(例如)C3-C20环烷基、C1-C20烷基,其未经取代或经一或多个以下基团取代:OH、O(CO)-(C2-C4)烯基、O(CO)-(C1-C4烷基)或(CO)OR17;或R18表示苯基或萘基,其各未经取代或经一或多个卤素或C1-C12烷基、尤其卤素取代。In another embodiment, R 18 represents, for example, C 3 -C 20 cycloalkyl, C 1 -C 20 alkyl, which is unsubstituted or substituted with one or more of the following groups: OH, O (CO )-(C 2 -C 4 )alkenyl, O(CO)-(C 1 -C 4 alkyl) or (CO)OR 17 ; or R 18 represents phenyl or naphthyl, each unsubstituted or via One or more halogen or C 1 -C 12 alkyl groups, especially halogen.
R18表示(例如)C1-C20烷基、C2-C12烯基、C3-C20环烷基、苯基-C1-C3烷基、C2-C8烷酰基、苯甲酰基、苯基或萘基。R 18 represents, for example, a C 1 -C 20 alkyl group, a C 2 -C 12 alkenyl group, a C 3 -C 20 cycloalkyl group, a phenyl-C 1 -C 3 alkyl group, a C 2 -C 8 alkanoyl group, Benzoyl, phenyl or naphthyl.
举例而言,R18表示C1-C20烷基,其经一或多个以下基团取代:OH、O(CO)-(C2-C4)烯基、O(CO)-(C1-C4烷基)或(CO)OR17,或R18表示苯基,其经一或多个卤素取代。For example, R 18 represents C 1 -C 20 alkyl substituted with one or more of the following groups: OH, O(CO)-(C 2 -C 4 )alkenyl, O(CO)-(C 1 -C 4 alkyl) or (CO)OR 17 , or R 18 represents a phenyl group which is substituted by one or more halogens.
较佳地,R18表示C1-C8烷基,其如上文所定义经取代。Preferably, R 18 represents C 1 -C 8 alkyl, which is substituted as defined above.
举例而言,R19及R20彼此独立地为氢、C1-C20烷基、C2-C4羟基烷基、C3-C20环烷基、苯基-C1-C3烷基、苯基或萘基、C1-C8烷酰基、C1-C8烷酰基氧基、C3-C12烯酰基或苯甲酰基;或R19及R20与其所附接的N原子一起形成视情况间杂有O、S或NR17的5元或6元饱和或不饱和环;或R19及R20与其所附接的N原子一起形成杂芳香族环系统,该环系统未经取代或经一或多个以下基团取代:C1-C20烷基、C1-C4卤代烷基、或式(7)表示的基团、For example, R 19 and R 20 are each independently hydrogen, C 1 -C 20 alkyl, C 2 -C 4 hydroxyalkyl, C 3 -C 20 cycloalkyl, phenyl-C 1 -C 3 alkane a phenyl or naphthyl group, a C 1 -C 8 alkanoyl group, a C 1 -C 8 alkanoyloxy group, a C 3 -C 12 alkenoyl group or a benzoyl group; or R 19 and R 20 attached thereto The atoms together form a 5- or 6-membered saturated or unsaturated ring heterogeneously interspersed with O, S or NR 17 ; or R 19 and R 20 together with the N atom to which they are attached form a heteroaromatic ring system, the ring system is not Substituted or substituted with one or more of the following groups: a C 1 -C 20 alkyl group, a C 1 -C 4 haloalkyl group, or a group represented by the formula (7),
Figure PCTCN2015092029-appb-000134
Figure PCTCN2015092029-appb-000134
此外,举例而言,R19及R20彼此独立地为氢、C1-C20烷基、C2-C4羟基烷基、C3-C20环烷基、苯基-C1-C3烷基、C1-C8烷酰基、C1-C8烷酰基氧基、C3-C12烯酰基或苯甲酰基;或R19及R20与其所附接的N原子一起形成视情况间杂有O或NR17的5元或6元饱和环;或R19及R20与其所附接的N原子一起形成 咔唑环。Further, for example, R 19 and R 20 are each independently hydrogen, C 1 -C 20 alkyl, C 2 -C 4 hydroxyalkyl, C 3 -C 20 cycloalkyl, phenyl-C 1 -C a 3- alkyl group, a C 1 -C 8 alkanoyl group, a C 1 -C 8 alkanoyloxy group, a C 3 -C 12 alkenoyl group or a benzoyl group; or R 19 and R 20 together with the N atom to which they are attached In the case of a 5- or 6-membered saturated ring of O or NR 17 ; or R 19 and R 20 together with the N atom to which they are attached form an indazole ring.
举例而言,R19及R20彼此独立地为氢、C1-C20烷基、C2-C4羟基烷基、C3-C20环烷基、苯基-C1-C3烷基、C1-C8烷酰基、C1-C8烷酰基氧基、C3-C12烯酰基或苯甲酰基;或R19及R20与其所附接的N原子一起形成视情况间杂有O或NR17的5元或6元饱和环。For example, R 19 and R 20 are each independently hydrogen, C 1 -C 20 alkyl, C 2 -C 4 hydroxyalkyl, C 3 -C 20 cycloalkyl, phenyl-C 1 -C 3 alkane a C 1 -C 8 alkanoyl group, a C 1 -C 8 alkanoyloxy group, a C 3 -C 12 alkenoyl group or a benzoyl group; or R 19 and R 20 together with the N atom to which they are attached form a heterogeneous There is a 5- or 6-membered saturated ring of O or NR 17 .
较佳地,R19及R20彼此独立地为C1-C8烷酰基、C1-C8烷酰基氧基;或R19及R20与其所附接的N原子一起形成吗啉环。Preferably, R 19 and R 20 are, independently of each other, a C 1 -C 8 alkanoyl group, a C 1 -C 8 alkanoyloxy group; or R 19 and R 20 together with the N atom to which they are attached form a morpholine ring.
举例而言,R21及R22彼此独立地为氢、C1-C20烷基、C1-C4卤代烷基、C3-C10环烷基或苯基;或R21及R22与其所附接的N原子一起形成吗啉环。R21及R22尤其彼此独立地为氢或C1-C20烷基。For example, R 21 and R 22 are each independently hydrogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, C 3 -C 10 cycloalkyl or phenyl; or R 21 and R 22 The attached N atoms together form a morpholine ring. R 21 and R 22 are, in particular, independently of one another hydrogen or C 1 -C 20 alkyl.
R23表示(例如)氢、OH、苯基或C1-C20烷基。R23尤其为氢、OH或C1-C4烷基。R 23 represents, for example, hydrogen, OH, phenyl or C 1 -C 20 alkyl. R 23 is especially hydrogen, OH or C 1 -C 4 alkyl.
R24的较佳的是如针对R19及R20所给出。R25的较佳的是如针对R17所给出。R 24 is preferably as given for R 19 and R 20 . R 25 is preferably as given for R 17 .
R26表示(例如)氢、C1-C20烷基、C1-C4卤代烷基、C2-C20烷基,其间杂有一或多个O或CO;或是苯基-C1-C4烷基、C3-C8环烷基,其视情况间杂有一或多个O或CO;或是(CO)R19或苯基,其未经取代或经一或多个以下基团取代:C1-C20烷基、卤素、C1-C4卤代烷基、OR17、SR18、NR19R20R 26 represents, for example, hydrogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, C 2 -C 20 alkyl, heterogeneously having one or more O or CO; or phenyl-C 1 - a C 4 alkyl group, a C 3 -C 8 cycloalkyl group optionally having one or more O or CO; or (CO)R 19 or a phenyl group which is unsubstituted or has one or more of the following groups Substitution: C 1 -C 20 alkyl, halogen, C 1 -C 4 haloalkyl, OR 17 , SR 18 , NR 19 R 20 .
或R26表示(例如)氢、C1-C20烷基、C1-C4卤代烷基;是苯基-C1-C4烷基、C3-C8环烷基、(CO)R19或苯基,其未经取代或经一或多个C1-C20烷基取代。此外,R26表示(例如)氢或C1-C20烷基、尤其为C1-C4烷基。Or R 26 represents, for example, hydrogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl; phenyl-C 1 -C 4 alkyl, C 3 -C 8 cycloalkyl, (CO)R 19 or a phenyl group which is unsubstituted or substituted by one or more C 1 -C 20 alkyl groups. Further, R 26 represents, for example, hydrogen or a C 1 -C 20 alkyl group, especially a C 1 -C 4 alkyl group.
发明式(1)化合物的实例包括下列由式(1-1)至式(1-84)所表示的化合物:Examples of the compound of the formula (1) of the invention include the following compounds represented by the formula (1-1) to the formula (1-84):
Figure PCTCN2015092029-appb-000135
Figure PCTCN2015092029-appb-000135
Figure PCTCN2015092029-appb-000136
Figure PCTCN2015092029-appb-000136
Figure PCTCN2015092029-appb-000137
Figure PCTCN2015092029-appb-000137
Figure PCTCN2015092029-appb-000138
Figure PCTCN2015092029-appb-000138
Figure PCTCN2015092029-appb-000139
Figure PCTCN2015092029-appb-000139
Figure PCTCN2015092029-appb-000140
Figure PCTCN2015092029-appb-000140
Figure PCTCN2015092029-appb-000141
Figure PCTCN2015092029-appb-000141
Figure PCTCN2015092029-appb-000142
Figure PCTCN2015092029-appb-000142
Figure PCTCN2015092029-appb-000143
Figure PCTCN2015092029-appb-000143
Figure PCTCN2015092029-appb-000144
Figure PCTCN2015092029-appb-000144
Figure PCTCN2015092029-appb-000145
Figure PCTCN2015092029-appb-000145
Figure PCTCN2015092029-appb-000146
Figure PCTCN2015092029-appb-000146
Figure PCTCN2015092029-appb-000147
Figure PCTCN2015092029-appb-000147
Figure PCTCN2015092029-appb-000148
Figure PCTCN2015092029-appb-000148
Figure PCTCN2015092029-appb-000149
Figure PCTCN2015092029-appb-000149
基于所述碱可溶性树脂(A)为100重量份,所述光起始剂(C-1)的使用量为5重量份至100重量份,较佳为10重量份至90重量份,更佳为15重量份至80重量份。The photoinitiator (C-1) is used in an amount of 5 parts by weight to 100 parts by weight, preferably 10 parts by weight to 90 parts by weight, based on 100 parts by weight of the alkali-soluble resin (A), more preferably It is from 15 parts by weight to 80 parts by weight.
当感光性树脂组成物不使用光起始剂(C-1)时,则感光性树脂组成物的图案平滑性不佳。When the photosensitive resin composition does not use the photoinitiator (C-1), the pattern smoothness of the photosensitive resin composition is not good.
当光起始剂(C-1)的使用量为5重量份至100重量份范围时,所制得的感光性树脂组成物的高精细度的图案直线性较佳。When the photoinitiator (C-1) is used in an amount of from 5 parts by weight to 100 parts by weight, the high-definition pattern linearity of the obtained photosensitive resin composition is preferable.
其它光起始剂(C-2)Other photoinitiators (C-2)
其它光起始剂(C-2)的具体例包括其它氧-酰基肟类化合物(O-acyloxime)或非氧-酰基肟类光起始剂。 Specific examples of the other photoinitiator (C-2) include other oxy-acyl steroids (O-acyloxime) or non-oxy-acyl hydrazine-based photoinitiators.
其它氧-酰基肟类化合物Other oxy-acyl hydrazines
其它氧-酰基肟类化合物的具体例包括具体例包括1-[4-(苯基硫代)苯基]-丙烷-3-环戊烷-1,2-二酮2-(O-苯酰基肟)、1-[4-(苯基硫代)苯基]-庚烷-1,2-二酮2-(O-苯酰基肟)、1-[4-(苯基硫代)苯基]-辛烷-1,2-二酮-2-(O-苯酰基肟),或上述化合物的组合。1-[4-(苯基硫代)苯基]-辛烷-1,2-二酮-2-(O-苯酰基肟)可为由汽巴精化(Ciba Specialty Chemicals)有限公司制造,型号为IRGACURE OXE-01的商品。Specific examples of other oxy-acyl hydrazine compounds include 1-[4-(phenylthio)phenyl]-propane-3-cyclopentane-1,2-dione 2-(O-benzoyl group).肟), 1-[4-(phenylthio)phenyl]-heptane-1,2-dione 2-(O-benzoylhydrazine), 1-[4-(phenylthio)phenyl ]-octane-1,2-dione-2-(O-benzoylhydrazine), or a combination of the above compounds. 1-[4-(Phenylthio)phenyl]-octane-1,2-dione-2-(O-benzoyloxime) may be manufactured by Ciba Specialty Chemicals Co., Ltd. The model number is IRGACURE OXE-01.
此外,其它氧-酰基肟类化合物的具体例包括1-[4-(苯酰基)苯基]-庚烷-1,2-二酮-2-(O-苯酰基肟)、1-[9-乙基-6-(2-甲基苯酰基)-9H-咔唑-3-取代基]-乙烷酮-1-(O-乙酰基肟)、1-[9-乙基-6-(3-甲基苯酰基)-9H-咔唑-3-取代基]-乙烷酮-1-(O-乙酰基肟)、1-[9-乙基-6-苯酰基-9H-咔唑-3-取代基]-乙烷酮-1-(O-乙酰基肟)、乙烷酮-1-[9-乙基-6-(2-甲基-4-四氢呋喃基苯酰基)-9H-咔唑-3-取代基]-1-(O-乙酰基肟)、乙烷酮-1-[9-乙基-6-(2-甲基-4-四氢吡喃基苯酰基)-9H-咔唑-3-取代基]-1-(O-乙酰基肟)、乙烷酮-1-[9-乙基-6-(2-甲基-5-四氢呋喃基苯酰基)-9H-咔唑-3-取代基]-1-(O-乙酰基肟)、乙烷酮-1-[9-乙基-6-(2-甲基-5-四氢吡喃基苯酰基)-9H-咔唑-3-取代基]-1-(O-乙酰基肟)、乙烷酮-1-[9-乙基-6-(2-甲基-4-四氢呋喃基甲氧基苯酰基)-9H-咔唑-3-取代基]-1-(O-乙酰基肟)、乙烷酮-1-[9-乙基-6-(2-甲基-4-四氢吡喃基甲氧基苯酰基)-9H-咔唑-3-取代基]-1-(O-乙酰基肟)、乙烷酮-1-[9-乙基-6-(2-甲基-5-四氢呋喃基甲氧基苯酰基)-9H-咔唑-3-取代基]-1-(O-乙酰基肟)、乙烷酮-1-[9-乙基-6-(2-甲基-5-四氢吡喃基甲氧基苯酰基)-9H-咔唑-3-取代基]-1-(O-乙酰基肟)、乙烷酮-1-[9-乙基-6-{2-甲基-4-(2,2-二甲基-1,3-二氧杂戊环基)苯酰基}-9H-咔唑-3-取代基]-1-(O-乙酰基肟)、乙烷酮-1-[9-乙基-6-{2-甲基-4-(2,2-二甲基-1,3-二氧杂戊环基)甲氧基苯酰基}-9H-咔唑-3-取代基]-1-(O-乙酰基肟),或上述化合物的组合。1-[9-乙基-6-(2-甲基苯酰基)-9H-咔唑-3-取代基]-乙烷酮-1-(O-乙酰基肟)可为由汽巴精化有限公司制造,型号为IRGACURE OXE-02的商品。Further, specific examples of other oxy-acyl hydrazine compounds include 1-[4-(benzoyl)phenyl]-heptane-1,2-dione-2-(O-benzoyl hydrazine), 1-[9 -ethyl-6-(2-methylbenzoyl)-9H-indazole-3-substituted]-ethanone-1-(O-acetyl oxime), 1-[9-ethyl-6- (3-methylbenzoyl)-9H-indazole-3-substituted]-ethanone-1-(O-acetylindole), 1-[9-ethyl-6-benzoyl-9H-indole Zyrid-3-yl]-ethane ketone-1-(O-acetyl oxime), ethane ketone-1-[9-ethyl-6-(2-methyl-4-tetrahydrofuranylbenzoyl)- 9H-carbazole-3-substituted]-1-(O-acetylindole), ethane ketone-1-[9-ethyl-6-(2-methyl-4-tetrahydropyranylbenzoyl) )-9H-carbazole-3-substituted]-1-(O-acetyl hydrazine), ethane ketone-1-[9-ethyl-6-(2-methyl-5-tetrahydrofuranylbenzoyl) -9H-carbazole-3-substituted]-1-(O-acetyl oxime), ethane ketone-1-[9-ethyl-6-(2-methyl-5-tetrahydropyranylbenzene) Acyl)-9H-carbazole-3-substituent]-1-(O-acetylhydrazine), ethane ketone-1-[9-ethyl-6-(2-methyl-4-tetrahydrofuranylmethoxy) Benzoyl)-9H-carbazole-3-Substituent]-1-(O-acetylhydrazine), Ethyl Ketone-1-[9-Ethyl-6-(2-methyl-4-tetrahydro) Pyranylmethoxybenzoyl)-9H-carbazole-3-take代基]-1-(O-acetyl hydrazine), ketone-1-[9-ethyl-6-(2-methyl-5-tetrahydrofurylmethoxybenzoyl)-9H-carbazole- 3-Substituent]-1-(O-acetyl oxime), ethane ketone-1-[9-ethyl-6-(2-methyl-5-tetrahydropyranylmethoxybenzoyl)- 9H-carbazole-3-substituted]-1-(O-acetyl hydrazine), ethane ketone-1-[9-ethyl-6-{2-methyl-4-(2,2-dimethyl -1,3-dioxolanyl)benzoyl}-9H-indazole-3-substituted]-1-(O-acetylhydrazine), ethane ketone-1-[9-ethyl- 6-{2-methyl-4-(2,2-dimethyl-1,3-dioxolanyl)methoxybenzoyl}-9H-indazole-3-substituted]-1- (O-acetyl hydrazine), or a combination of the above compounds. 1-[9-ethyl-6-(2-methylbenzoyl)-9H-indazole-3-substituted]-ethanone-1-(O-acetylhydrazine) can be refined by Ciba Made by the company, the model is IRGACURE OXE-02.
其它氧-酰基肟类化合物可单独使用或组合多种来使用。Other oxy-acyl hydrazine compounds may be used singly or in combination of two or more.
非氧-酰基肟类光起始剂 Non-oxy-acyl hydrazine photoinitiator
非氧-酰基肟类光起始剂的具体例包括三氮杂苯类化合物、苯乙烷酮类化合物、二咪唑类化合物、二苯甲酮类化合物、α-二酮类化合物、醇酮类化合物、醇酮醚类化合物、酰膦氧化物类化合物、醌类化合物、含卤素类化合物、过氧化物,或上述化合物的组合。Specific examples of the non-oxy-acyl hydrazine photoinitiator include a triazabenzene compound, an acetophenone compound, a diimidazole compound, a benzophenone compound, an α-diketone compound, and an alcohol ketone. A compound, an alcohol ketone ether compound, an acylphosphine oxide compound, an anthraquinone compound, a halogen-containing compound, a peroxide, or a combination of the above compounds.
三氮杂苯类化合物的具体例包括乙烯基-卤代甲基-s-三氮杂苯化合物、2-(萘并-1-取代基)-4,6-二(卤代甲基)-s-三氮杂苯化合物、4-(对-胺基苯基)-2,6-二(卤代甲基)-s-三氮杂苯化合物,或上述化合物的组合。Specific examples of the triazabenzene compound include a vinyl-halomethyl-s-triazabenzene compound, 2-(naphtho-1-substituted)-4,6-di(halomethyl)- An s-triazabenzene compound, a 4-(p-aminophenyl)-2,6-di(halomethyl)-s-triazabenzene compound, or a combination of the above compounds.
乙烯基-卤代甲基-s-三氮杂苯化合物的具体例包括2,4-二(三氯甲基)-6-对-甲氧基苯乙烯基-s-三氮杂苯、2,4-二(三氯甲基)-3-(1-对-二甲基胺基苯基-1,3-丁二烯基)-s-三氮杂苯、2-三氯甲基-3-胺基-6-对-甲氧基苯乙烯基-s-三氮杂苯,或上述化合物的组合。Specific examples of the vinyl-halogenomethyl-s-triazabenzene compound include 2,4-bis(trichloromethyl)-6-p-methoxystyryl-s-triazabenzene, 2 ,4-di(trichloromethyl)-3-(1-p-dimethylaminophenyl-1,3-butadienyl)-s-triazabenzene, 2-trichloromethyl- 3-Amino-6-p-methoxystyryl-s-triazabenzene, or a combination of the above compounds.
2-(萘并-1-取代基)-4,6-二(卤代甲基)-s-三氮杂苯化合物的具体例包括2-(萘并-1-取代基)-4,6-二(三氯甲基)-s-三氮杂苯、2-(4-甲氧基-萘并-1-取代基)-4,6-二(三氯甲基)-s-三氮杂苯、2-(4-乙氧基-萘并-1-取代基)-4,6-二(三氯甲基)-s-三氮杂苯、2-(4-丁氧基-萘并-1-取代基)-4,6-二(三氯甲基)-s-三氮杂苯、2-[4-(2-甲氧基乙基)-萘并-1-取代基]-4,6-二(三氯甲基)-s-三氮杂苯、2-[4-(2-乙氧基乙基)-萘并-1-取代基]-4,6-二(三氯甲基)-s-三氮杂苯、2-[4-(2-丁氧基乙基)-萘并-1-取代基]-4,6-二(三氯甲基)-s-三氮杂苯、2-(2-甲氧基-萘并-1-取代基)-4,6-二(三氯甲基)-s-三氮杂苯、2-(6-甲氧基-5-甲基-萘并-2-取代基)-4,6-二(三氯甲基)-s-三氮杂苯、2-(6-甲氧基-萘并-2-取代基)-4,6-二(三氯甲基)-s-三氮杂苯、2-(5-甲氧基-萘并-1-取代基)-4,6-二(三氯甲基)-s-三氮杂苯、2-(4,7-二甲氧基-萘并-1-取代基)-4,6-二(三氯甲基)-s-三氮杂苯、2-(6-乙氧基-萘并-2-取代基)-4,6-二(三氯甲基)-s-三氮杂苯、2-(4,5-二甲氧基-萘并-1-取代基)-4,6-二(三氯甲基)-s-三氮杂苯,或上述化合物的组合。Specific examples of the 2-(naphtho-1-substituted)-4,6-di(halomethyl)-s-triazabenzene compound include 2-(naphtho-1-substituted)-4,6 - bis(trichloromethyl)-s-triazabenzene, 2-(4-methoxy-naphtho-1-substituted)-4,6-di(trichloromethyl)-s-triazole Heterobenzene, 2-(4-ethoxy-naphtho-1-substituted)-4,6-bis(trichloromethyl)-s-triazabenzene, 2-(4-butoxy-naphthalene And-1-substituted)-4,6-bis(trichloromethyl)-s-triazabenzene, 2-[4-(2-methoxyethyl)-naphtho-1-yl] -4,6-bis(trichloromethyl)-s-triazabenzene, 2-[4-(2-ethoxyethyl)-naphthyl-1-substituted]-4,6-di ( Trichloromethyl)-s-triazabenzene, 2-[4-(2-butoxyethyl)-naphthyl-1-substituted]-4,6-di(trichloromethyl)-s -Triazabenzene, 2-(2-methoxy-naphtho-1-substituted)-4,6-di(trichloromethyl)-s-triazabenzene, 2-(6-methoxy 5-methyl-naphtho-2-substituted)-4,6-bis(trichloromethyl)-s-triazabenzene, 2-(6-methoxy-naphtho-2-substituted -4,6-bis(trichloromethyl)-s-triazabenzene, 2-(5-methoxy-naphtho-1-substituted)-4,6-di(trichloromethyl) )-s-triazabenzene, 2-(4,7-dimethoxy-naphtho-1-substituted)-4,6-di(trichloromethyl)-s-triaza Benzene, 2-(6-ethoxy-naphtho-2-substituted)-4,6-di(trichloromethyl)-s-triazabenzene, 2-(4,5-dimethoxy -naphtho-1-substituted)-4,6-bis(trichloromethyl)-s-triazabenzene, or a combination of the above compounds.
4-(对-胺基苯基)-2,6-二(卤代甲基)-s-三氮杂苯化合物的具体例包括4-[对-N,N-二(乙氧基羰基甲基)胺基苯基]-2,6-二(三氯甲基)-s-三氮杂苯、4-[邻-甲基-对-N,N-二(乙氧基羰基甲基)胺基苯基]-2,6-二(三氯甲基)-s-三氮杂苯、4-[对-N,N-二(氯乙基)胺基苯基]-2,6-二(三氯甲基)-s-三氮杂苯、4-[邻-甲基-对-N,N-二(氯乙基)胺基苯基]-2,6-二(三氯甲基)-s-三氮杂苯、4-(对-N-氯乙基胺基苯基)-2,6-二(三氯甲基)-s-三氮杂苯、4-(对-N-乙氧基羰基甲基胺基苯基)-2,6-二 (三氯甲基)-s-三氮杂苯、4-[对-N,N-二(苯基)胺基苯基]-2,6-二(三氯甲基)-s-三氮杂苯、4-(对-N-氯乙基羰基胺基苯基)-2,6-二(三氯甲基)-s-三氮杂苯、4-[对-N-(对-甲氧基苯基)羰基胺基苯基]-2,6-二(三氯甲基)-s-三氮杂苯、4-[间-N,N-二(乙氧基羰基甲基)胺基苯基]-2,6-二(三氯甲基)-s-三氮杂苯、4-[间-溴-对-N,N-二(乙氧基羰基甲基)胺基苯基]-2,6-二(三氯甲基)-s-三氮杂苯、4-[间-氯-对-N,N-二(乙氧基羰基甲基)胺基苯基]-2,6-二(三氯甲基)-s-三氮杂苯、4-[间-氟-对-N,N-二(乙氧基羰基甲基)胺基苯基]-2,6-二(三氯甲基)-s-三氮杂苯、4-[邻-溴-对-N,N-二(乙氧基羰基甲基)胺基苯基]-2,6-二(三氯甲基)-s-三氮杂苯、4-[邻-氯-对-N,N-二(乙氧基羰基甲基)胺基苯基-2,6-二(三氯甲基)-s-三氮杂苯、4-[邻-氟-对-N,N-二(乙氧基羰基甲基)胺基苯基]-2,6-二(三氯甲基)-s-三氮杂苯、4-[邻-溴-对-N,N-二(氯乙基)胺基苯基]-2,6-二(三氯甲基)-s-三氮杂苯、4-[邻-氯-对-N,N-二(氯乙基)胺基苯基]-2,6-二(三氯甲基)-s-三氮杂苯、4-[邻-氟-对-N,N-二(氯乙基)胺基苯基]-2,6-二(三氯甲基)-s-三氮杂苯、4-[间-溴-对-N,N-二(氯乙基)胺基苯基]-2,6-二(三氯甲基)-s-三氮杂苯、4-[间-氯-对-N,N-二(氯乙基)胺基苯基]-2,6-二(三氯甲基)-s-三氮杂苯、4-[间-氟-对-N,N-二(氯乙基)胺基苯基]-2,6-二(三氯甲基)-s-三氮杂苯、4-(间-溴-对-N-乙氧基羰基甲基胺基苯基)-2,6-二(三氯甲基)-s-三氮杂苯、4-(间-氯-对-N-乙氧基羰基甲基胺基苯基)-2,6-二(三氯甲基)-s-三氮杂苯、4-(间-氟-对-N-乙氧基羰基甲基胺基苯基)-2,6-二(三氯甲基)-s-三氮杂苯、4-(邻-溴-对-N-乙氧基羰基甲基胺基苯基)-2,6-二(三氯甲基)-s-三氮杂苯、4-(邻-氯-对-N-乙氧基羰基甲基胺基苯基)-2,6-二(三氯甲基)-s-三氮杂苯、4-(邻-氟-对-N-乙氧基羰基甲基胺基苯基)-2,6-二(三氯甲基)-s-三氮杂苯、4-(间-溴-对-N-氯乙基胺基苯基)-2,6-二(三氯甲基)-s-三氮杂苯、4-(间-氯-对-N-氯乙基胺基苯基)-2,6-二(三氯甲基)-s-三氮杂苯、4-(间-氟-对-N-氯乙基胺基苯基)-2,6-二(三氯甲基)-s-三氮杂苯、4-(邻-溴-对-N-氯乙基胺基苯基)-2,6-二(三氯甲基)-s-三氮杂苯、4-(邻-氯-对-N-氯乙基胺基苯基)-2,6-二(三氯甲基)-s-三氮杂苯、4-(邻-氟-对-N-氯乙基胺基苯基)-2,6-二(三氯甲基)-s-三氮杂苯、2,4-二(三氯甲基)-6-[3-溴-4-[N,N-双(乙氧基羰基甲基)胺基]苯基]-1,3,5-三氮杂苯,或上述化合物的组合。三氮杂苯类化合物可单独使用或组合多种来使用。Specific examples of the 4-(p-aminophenyl)-2,6-bis(halomethyl)-s-triazabenzene compound include 4-[p-N,N-di(ethoxycarbonyl) Aminophenyl]-2,6-bis(trichloromethyl)-s-triazabenzene, 4-[o-methyl-p-N,N-di(ethoxycarbonylmethyl) Aminophenyl]-2,6-bis(trichloromethyl)-s-triazabenzene, 4-[p-N,N-bis(chloroethyl)aminophenyl]-2,6- Bis(trichloromethyl)-s-triazabenzene, 4-[o-methyl-p-N,N-di(chloroethyl)aminophenyl]-2,6-di(trichloromethane) -s-triazabenzene, 4-(p-N-chloroethylaminophenyl)-2,6-bis(trichloromethyl)-s-triazabenzene, 4-(p- N-ethoxycarbonylmethylaminophenyl)-2,6-di (trichloromethyl)-s-triazabenzene, 4-[p-N,N-di(phenyl)aminophenyl]-2,6-di(trichloromethyl)-s-triazole Heterobenzene, 4-(p-N-chloroethylcarbonylaminophenyl)-2,6-di(trichloromethyl)-s-triazabenzene, 4-[p-N-(p-a) Oxyphenyl)carbonylaminophenyl]-2,6-bis(trichloromethyl)-s-triazabenzene, 4-[m-N,N-bis(ethoxycarbonylmethyl)amine Phenyl]-2,6-bis(trichloromethyl)-s-triazabenzene, 4-[m-bromo-p-N,N-bis(ethoxycarbonylmethyl)aminophenyl -2,6-bis(trichloromethyl)-s-triazabenzene, 4-[m-chloro-p-N,N-di(ethoxycarbonylmethyl)aminophenyl]-2 ,6-bis(trichloromethyl)-s-triazabenzene, 4-[m-fluoro-p-N,N-bis(ethoxycarbonylmethyl)aminophenyl]-2,6- Bis(trichloromethyl)-s-triazabenzene, 4-[o-bromo-p-N,N-bis(ethoxycarbonylmethyl)aminophenyl]-2,6-di(three Chloromethyl)-s-triazabenzene, 4-[o-chloro-p-N,N-bis(ethoxycarbonylmethyl)aminophenyl-2,6-di(trichloromethyl) -s-triazabenzene, 4-[o-fluoro-p-N,N-bis(ethoxycarbonylmethyl)aminophenyl]-2,6-di(trichloromethyl)-s- Triazabenzene, 4-[o-bromo-p-N,N-bis(chloroethyl)aminophenyl]-2,6 -bis(trichloromethyl)-s-triazabenzene, 4-[o-chloro-p-N,N-di(chloroethyl)aminophenyl]-2,6-di(trichloromethane) -s-triazabenzene, 4-[o-fluoro-p-N,N-bis(chloroethyl)aminophenyl]-2,6-di(trichloromethyl)-s-three Azabenzene, 4-[m-bromo-p-N,N-bis(chloroethyl)aminophenyl]-2,6-di(trichloromethyl)-s-triazabenzene, 4- [m-chloro-p-N,N-bis(chloroethyl)aminophenyl]-2,6-bis(trichloromethyl)-s-triazabenzene, 4-[m-fluoro-pair -N,N-bis(chloroethyl)aminophenyl]-2,6-bis(trichloromethyl)-s-triazabenzene, 4-(m-bromo-p-N-ethoxyl) Carbonylmethylaminophenyl)-2,6-bis(trichloromethyl)-s-triazabenzene, 4-(m-chloro-p-N-ethoxycarbonylmethylaminophenyl) -2,6-bis(trichloromethyl)-s-triazabenzene, 4-(m-fluoro-p-N-ethoxycarbonylmethylaminophenyl)-2,6-di(three Chloromethyl)-s-triazabenzene, 4-(o-bromo-p-N-ethoxycarbonylmethylaminophenyl)-2,6-di(trichloromethyl)-s-three Azabenzene, 4-(o-chloro-p-N-ethoxycarbonylmethylaminophenyl)-2,6-bis(trichloromethyl)-s-triazabenzene, 4-(ortho -fluoro-p-N-ethoxycarbonylmethylaminophenyl)-2,6-di(trichloromethyl)-s-three Azabenzene, 4-(m-bromo-p-N-chloroethylaminophenyl)-2,6-bis(trichloromethyl)-s-triazabenzene, 4-(m-chloro- p-N-chloroethylaminophenyl)-2,6-bis(trichloromethyl)-s-triazabenzene, 4-(m-fluoro-p-N-chloroethylaminophenyl) -2,6-bis(trichloromethyl)-s-triazabenzene, 4-(o-bromo-p-N-chloroethylaminophenyl)-2,6-di(trichloromethane) -s-triazabenzene, 4-(o-chloro-p-N-chloroethylaminophenyl)-2,6-bis(trichloromethyl)-s-triazabenzene, 4 -(o-fluoro-p-N-chloroethylaminophenyl)-2,6-bis(trichloromethyl)-s-triazabenzene, 2,4-di(trichloromethyl)- 6-[3-Bromo-4-[N,N-bis(ethoxycarbonylmethyl)amino]phenyl]-1,3,5-triazabenzene, or a combination of the above compounds. The triazabenzene compounds may be used singly or in combination of two or more.
三氮杂苯类化合物较佳为包括4-[间-溴-对-N,N-二(乙氧基羰基甲基)胺基 苯基]-2,6-二(三氯甲基)-s-三氮杂苯、2,4-二(三氯甲基)-6-对-甲氧基苯乙烯基-s-三氮杂苯,或上述化合物的组合。The triazabenzene compound preferably includes 4-[m-bromo-p-N,N-bis(ethoxycarbonylmethyl)amino group. Phenyl]-2,6-bis(trichloromethyl)-s-triazabenzene, 2,4-bis(trichloromethyl)-6-p-methoxystyryl-s-triazole A heterobenzene, or a combination of the above compounds.
苯乙烷酮类化合物的具体例包括对二甲胺苯乙烷酮、α,α’-二甲氧基氧化偶氮苯乙烷酮、2,2’-二甲基-2-苯基苯乙烷酮、对-甲氧基苯乙烷酮、2-甲基-1-(4-甲基硫代苯基)-2-吗啉代-1-丙酮、2-苄基-2-N,N-二甲胺-1-(4-吗啉代苯基)-1-丁酮,或上述化合物的组合。Specific examples of the acetophenone compound include p-dimethylacetonone, α,α'-dimethoxy oxy acetophenone, and 2,2'-dimethyl-2-phenylbenzene. Ethyl ketone, p-methoxyacetophenone, 2-methyl-1-(4-methylthiophenyl)-2-morpholino-1-propanone, 2-benzyl-2-N N-dimethylamine-1-(4-morpholinophenyl)-1-butanone, or a combination of the above compounds.
苯乙烷酮类化合物可单独使用或组合多种来使用。The acetophenone compounds may be used singly or in combination of two or more.
2-甲基-1-(4-甲基硫代苯基)-2-吗啉代-1-丙酮可为由汽巴精化有限公司制造,型号为IRGACURE 907的商品。2-苄基-2-N,N-二甲胺-1-(4-吗啉代苯基)-1-丁酮可为由汽巴精化有限公司制造,型号为IRGACURE 369的商品。2-Methyl-1-(4-methylthiophenyl)-2-morpholino-1-propanone may be a product of the model IRGACURE 907 manufactured by Ciba Specialty Chemicals Co., Ltd. 2-Benzyl-2-N,N-dimethylamine-1-(4-morpholinophenyl)-1-butanone is commercially available from Ciba Specialty Chemicals, Inc. under the model number IRGACURE 369.
苯乙烷酮类化合物较佳为包括2-甲基-1-(4-甲基硫代苯基)-2-吗啉代-1-丙酮、2-苄基-2-N,N-二甲胺-1-(4-吗啉代苯基)-1-丁酮,或上述化合物的组合。The acetophenone-based compound preferably includes 2-methyl-1-(4-methylthiophenyl)-2-morpholino-1-propanone, 2-benzyl-2-N,N-di Methylamine-1-(4-morpholinophenyl)-1-butanone, or a combination of the above compounds.
二咪唑类化合物的具体例包括2,2’-双(邻-氯苯基)-4,4’,5,5’-四苯基二咪唑、2,2’-双(邻-氟苯基)-4,4’,5,5’-四苯基二咪唑、2,2’-双(邻-甲基苯基)-4,4’,5,5’-四苯基二咪唑、2,2’-双(邻-甲氧基苯基)-4,4’,5,5’-四苯基二咪唑、2,2’-双(邻-乙基苯基)-4,4’,5,5’-四苯基二咪唑、2,2’-双(对-甲氧基苯基)-4,4’,5,5’-四苯基二咪唑、2,2’-双(2,2’,4,4’-四甲氧基苯基)-4,4’,5,5’-四苯基二咪唑、2,2’-双(2-氯苯基)-4,4’,5,5’-四苯基二咪唑、2,2’-双(2,4-二氯苯基)-4,4’,5,5’-四苯基二咪唑,或上述化合物的组合。Specific examples of the diimidazole compound include 2,2'-bis(o-chlorophenyl)-4,4',5,5'-tetraphenyldiimidazole, 2,2'-bis(o-fluorophenyl) -4,4',5,5'-tetraphenyldiimidazole, 2,2'-bis(o-methylphenyl)-4,4',5,5'-tetraphenyldiimidazole, 2 , 2'-bis(o-methoxyphenyl)-4,4',5,5'-tetraphenyldiimidazole, 2,2'-bis(o-ethylphenyl)-4,4' , 5,5'-tetraphenyldiimidazole, 2,2'-bis(p-methoxyphenyl)-4,4',5,5'-tetraphenyldiimidazole, 2,2'-double (2,2',4,4'-tetramethoxyphenyl)-4,4',5,5'-tetraphenyldiimidazole, 2,2'-bis(2-chlorophenyl)-4 , 4',5,5'-tetraphenyldiimidazole, 2,2'-bis(2,4-dichlorophenyl)-4,4',5,5'-tetraphenyldiimidazole, or the above A combination of compounds.
二咪唑类化合物可单独使用或组合多种来使用。The diimidazole compounds may be used singly or in combination of two or more.
二咪唑类化合物较佳为2,2’-双(2,4-二氯苯基)-4,4’,5,5’-四苯基二咪唑。The diimidazole compound is preferably 2,2'-bis(2,4-dichlorophenyl)-4,4',5,5'-tetraphenyldiimidazole.
二苯甲酮类化合物的具体例包括噻吨酮、2,4-二乙基噻吨酮、噻吨酮-4-砜、二苯甲酮、4,4’-双(二甲胺)二苯甲酮、4,4’-双(二乙胺)二苯甲酮,或上述化合物的组合。二苯甲酮类化合物可单独或混合使用。二苯甲酮类化合物较佳为4,4’-双(二乙胺)二苯甲酮。Specific examples of the benzophenone compound include thioxanthone, 2,4-diethylthioxanthone, thioxanthone-4-sulfone, benzophenone, 4,4'-bis(dimethylamine) II. Benzophenone, 4,4'-bis(diethylamine)benzophenone, or a combination of the above compounds. The benzophenone compounds can be used singly or in combination. The benzophenone compound is preferably 4,4'-bis(diethylamine)benzophenone.
α-二酮类化合物的具体例包括苯偶酰、双乙酰,或上述化合物的组合。α-二酮类化合物可单独使用或组合多种来使用。Specific examples of the α-diketone compound include benzil, diacetyl, or a combination of the above compounds. The α-diketone compounds may be used singly or in combination of two or more.
酮醇类化合物的具体例包括二苯乙醇酮。酮醇类化合物可单独使用或组合多种来使用。Specific examples of the ketol compound include benzoin. The ketol compounds may be used singly or in combination of two or more.
酮醇醚类化合物的具体例包括二苯乙醇酮甲醚、二苯乙醇酮乙醚、二苯 乙醇酮异丙醚,或上述化合物的组合。酮醇醚类化合物可单独使用或组合多种来使用。Specific examples of the ketol ether compound include benzophenone methyl ether, benzophenone ether, and diphenyl. Ethanol ketone isopropyl ether, or a combination of the above compounds. The ketol ether compounds may be used singly or in combination of two or more.
酰膦氧化物类化合物的具体例包括2,4,6-三甲基苯酰基二苯基膦氧化物、双(2,6-二甲氧基苯酰)-2,4,4-三甲基苯基膦氧化物,或上述化合物的组合。酰膦氧化物类化合物可单独使用或组合多种来使用。Specific examples of the phosphinyl oxide-based compound include 2,4,6-trimethylbenzoyldiphenylphosphine oxide, bis(2,6-dimethoxybenzoyl)-2,4,4-trimethyl A phenylphosphine oxide, or a combination of the above compounds. The acylphosphine oxide compounds may be used singly or in combination of two or more.
醌类化合物的具体例包括蒽醌、1,4-萘醌,或上述化合物的组合。醌类化合物可单独使用或组合多种来使用。Specific examples of the quinone compound include hydrazine, 1,4-naphthoquinone, or a combination of the above compounds. The terpenoids may be used singly or in combination of two or more.
含卤素类化合物的具体例包括苯酰甲基氯、三溴甲基苯砜、三(三氯甲基)-s-三氮杂苯,或上述化合物的组合。含卤素类化合物可单独使用或组合多种来使用。Specific examples of the halogen-containing compound include benzoyl chloride, tribromomethylphenylsulfone, tris(trichloromethyl)-s-triazabenzene, or a combination of the above compounds. The halogen-containing compound may be used singly or in combination of two or more.
过氧化物的具体例包括二-第三丁基过氧化物等。过氧化物可单独使用或组合多种来使用。Specific examples of the peroxide include di-tert-butyl peroxide and the like. The peroxides may be used singly or in combination of two or more.
基于所述碱可溶性树脂(A)为100重量份,所述其它光起始剂(C-2)的使用量为0重量份至95重量份,较佳为0重量份至80重量份,更佳为0重量份至65重量份。The other photoinitiator (C-2) is used in an amount of from 0 part by weight to 95 parts by weight, preferably from 0 part by weight to 80 parts by weight, based on 100 parts by weight of the alkali-soluble resin (A), more preferably It is preferably from 0 part by weight to 65 parts by weight.
另外,基于所述碱可溶性树脂(A)为100重量份,所述光起始剂(C)的使用量为10至100重量份,较佳为15重量份至90重量份,更佳为20重量份至80重量份。Further, the photoinitiator (C) is used in an amount of 10 to 100 parts by weight, preferably 15 parts by weight to 90 parts by weight, more preferably 20 based on 100 parts by weight of the alkali-soluble resin (A). Parts by weight to 80 parts by weight.
溶剂(D):Solvent (D):
本发明的有机溶剂(D)需可溶解碱可溶性树脂(A)、具有乙烯性不饱和基的化合物(B)及光起始剂(C),且不与该等成份相互反应,并具有适当的挥发性的。The organic solvent (D) of the present invention is required to dissolve the alkali-soluble resin (A), the compound (B) having an ethylenically unsaturated group, and the photoinitiator (C), and does not react with the components and has appropriate Volatile.
在本发明的一具体例中,有机溶剂(D)为乙二醇甲醚、乙二醇乙醚、二甘醇甲醚、二甘醇乙醚、二甘醇正丙醚、二甘醇正丁醚、三甘醇甲醚、三甘醇乙醚、丙二醇甲醚、丙二醇乙醚、一缩二丙二醇甲醚、一缩二丙二醇乙醚、一缩二丙二醇正丙醚、一缩二丙二醇正丁醚、二缩三丙二醇甲醚、二缩三丙二醇乙醚等的(聚)亚烷基二醇单烷醚类;乙二醇甲醚醋酸酯、乙二醇乙醚醋酸酯、丙二醇甲醚醋酸酯、丙二醇乙醚醋酸酯等(聚)亚烷基二醇单烷醚醋酸酯类;二甘醇二甲醚、二甘醇甲乙醚、二甘醇二乙醚、四氢呋喃等其它醚类;甲乙 烷酮、环己酮、2-庚酮、3-庚酮等酮类;2-羟基丙酸甲酯、2-羟基丙酸乙酯等乳酸烷酯类;2-羟基-2-甲基丙酸甲酯、2-羟基-2-甲基丙酸乙酯、3-甲氧基丙酸甲酯、3-甲氧基丙酸乙酯、3-乙氧基丙酸甲酯、3-乙氧基丙酸乙酯(EEP)、乙氧基乙酸乙酯、羟基乙酸乙酯、2-羟基-3-甲基丁酸甲酯、3-甲基-3-甲氧基丁基乙酸酯、3-甲基-3-甲氧基丁基丙酸酯、乙酸乙酯、乙酸正丙酯、乙酸异丙酯、乙酸正丁酯、乙酸异丁酯、乙酸正戊酯、乙酸异戊酯、丙酸正丁酯、丁酸乙酯、丁酸正丙酯、丁酸异丙酯、丁酸正丁酯、丙酮酸甲酯、丙酮酸乙酯、丙酮酸正丙酯、乙酰乙酸甲酯、乙酰乙酸乙酯、2-氧基丁酸乙酯等其它酯类;甲苯、二甲苯等芳香族碳氢化合物类;N-甲基吡咯烷酮、N,N-二甲基甲酰胺、N,N-二甲基乙酰胺等羧酸酰胺类等溶剂,较佳地,溶剂是选自丙二醇甲醚醋酸酯、3-乙氧基丙酸乙酯,且前述溶剂可单独一种或混合复数种使用。In a specific embodiment of the present invention, the organic solvent (D) is ethylene glycol methyl ether, ethylene glycol ethyl ether, diethylene glycol methyl ether, diethylene glycol ethyl ether, diethylene glycol n-propyl ether, diethylene glycol n-butyl ether, three Glycol methyl ether, triethylene glycol ethyl ether, propylene glycol methyl ether, propylene glycol ethyl ether, dipropylene glycol methyl ether, dipropylene glycol diethyl ether, dipropylene glycol n-propyl ether, dipropylene glycol n-butyl ether, tripropylene glycol (poly)alkylene glycol monoalkyl ethers such as methyl ether and tripropylene glycol ethyl ether; ethylene glycol methyl ether acetate, ethylene glycol ethyl ether acetate, propylene glycol methyl ether acetate, propylene glycol diethyl ether acetate, etc. Poly)alkylene glycol monoalkyl ether acetate; diglyme, diethylene glycol methyl ether, diethylene glycol diethyl ether, tetrahydrofuran and other ethers; Ketones such as alkyl ketone, cyclohexanone, 2-heptanone, 3-heptanone; alkyl lactate such as methyl 2-hydroxypropionate or ethyl 2-hydroxypropionate; 2-hydroxy-2-methylpropane Methyl ester, ethyl 2-hydroxy-2-methylpropanoate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, 3-B Ethyl oxypropionate (EEP), ethyl ethoxyacetate, ethyl hydroxyacetate, methyl 2-hydroxy-3-methylbutanoate, 3-methyl-3-methoxybutyl acetate , 3-methyl-3-methoxybutyl propionate, ethyl acetate, n-propyl acetate, isopropyl acetate, n-butyl acetate, isobutyl acetate, n-amyl acetate, isoamyl acetate , n-butyl propionate, ethyl butyrate, n-propyl butyrate, isopropyl butyrate, n-butyl butyrate, methyl pyruvate, ethyl pyruvate, n-propyl pyruvate, methyl acetoacetate , other esters such as ethyl acetoacetate and ethyl 2-oxybutyrate; aromatic hydrocarbons such as toluene and xylene; N-methylpyrrolidone, N,N-dimethylformamide, N,N a solvent such as a carboxylic acid amide such as dimethylacetamide. Preferably, the solvent is selected from the group consisting of propylene glycol methyl ether acetate and 3-ethyl b. Acid ethyl ester, and the mixed solvent may be used alone or plural kinds thereof.
基于所述碱可溶性树脂(A)为100重量份,所述有机溶剂(D)的使用量为500重量份至5000重量份;较佳为800重量份至4500重量份;更佳为1000至4000重量份。The organic solvent (D) is used in an amount of 500 parts by weight to 5000 parts by weight, based on 100 parts by weight of the alkali-soluble resin (A); preferably 800 parts by weight to 4,500 parts by weight; more preferably 1,000 to 4,000 parts by weight Parts by weight.
颜料(E):Pigment (E):
颜料(E)可为无机颜料、有机颜料或此等的一组合。The pigment (E) may be an inorganic pigment, an organic pigment or a combination of these.
上述无机颜料的具体例包括硫酸钡、氧化锌、硫酸铅、黄色铅、锌黄、氧化铁红[红色氧化铁(III)]、镉红、群青、低铁氰化铁、氧化铬绿、钴绿、琥珀、钛黑、合成铁黑、二氧化钛或四氧化三铁等的金属氧化物粉末、金属硫化物粉末或金属粉末等。Specific examples of the above inorganic pigment include barium sulfate, zinc oxide, lead sulfate, yellow lead, zinc yellow, iron oxide red [red iron oxide (III)], cadmium red, ultramarine blue, iron ferricyanide, chromium oxide green, cobalt. Metal oxide powder such as green, amber, titanium black, synthetic iron black, titanium dioxide or triiron tetroxide, metal sulfide powder or metal powder.
上述有机颜料的具体例包括C.I.颜料红1、2、3、4、5、6、7、8、9、12、14、15、16、17、21、22、23、31、32、37、41、47、48、48:1、48:2、48:4、49、49:1、49:2、50:1、52:1、52:2、53、53:1、53:2、53:3、57、57:1、57:2、58:4、60、63、63:1、63:2、64、64:1、68、69、81、81:1、81:2、81:3、81:4、83、88、90:1、101、101:1、104、108、108:1、109、112、113、114、122、123、144、146、147、149、151、166、168、169、170、172、173、174、176、177、178、179、181、184、185、187、188、190、193、194、200、202、206、207、208、209、210、214、216、220、 221、224、230、231、232、233、235、236、237、238、239、242、243、245、247、249、250、251、253、254、255、256、257、258、259、260、262、263、264、265、266、267、268、269、270、271、272、273、274、275、276或式(e-1)表示的化合物等的红色颜料;C.I.颜料黄1、1:1、2、3、4、5、6、9、10、12、13、14、16、17、24、31、32、34、35、35:1、36、36:1、37、37:1、40、41、42、43、48、53、55、61、62、62:1、63、65、73、74、75,81、83、87、93、94、95、97、100、101、104、105、108、109、110、111、116、117、119、120、126、127、127:1、129、133、134、136、138、139、142、147、148、150、151、153、154、155、157、158、159、160、161、162、163、164、165、166、167、168、169、170、172、173、174、175、176、180、181、182、183、184、185、188、189、190、191、191:1、192、193、194、195、196、197、198、199、200、202、203、204、205、206、207或208等的黄色颜料;C.I.颜料橙1、2、5、13、16、17、19、20、21、22、23、24、34、36、38、39、43、46、48、49、61、62、64、65、67、68、69、70、71、72、73、74、75、77、78或79等的橙色颜料;C.I.颜料紫l、14、19、23、29、32、33、36、37、38、39、40、50等的紫色颜料;C.I.颜料蓝l、2、15、15:1、15:2、15:3、15:4、15:5、15:6、16、21、22、60、61、64、66等的蓝色颜料;C.I.颜料绿7、36、37、42、58等的绿色颜料;C.I.颜料棕23、25、28等的棕色颜料;以及C.I.颜料黑l、7等的黑色颜料。该有机颜料可单独一种或混合复数种使用。Specific examples of the above organic pigment include CI Pigment Red 1, 2, 3, 4, 5, 6, 7, 8, 9, 12, 14, 15, 16, 17, 21, 22, 23, 31, 32, 37, 41, 47, 48, 48:1, 48:2, 48:4, 49, 49:1, 49:2, 50:1, 52:1, 52:2, 53, 53:1, 53:2 53:3, 57, 57:1, 57:2, 58:4, 60, 63, 63:1, 63:2, 64, 64:1, 68, 69, 81, 81:1, 81:2 81:3, 81:4, 83, 88, 90:1, 101, 101:1, 104, 108, 108:1, 109, 112, 113, 114, 122, 123, 144, 146, 147, 149, 151, 166, 168, 169, 170, 172, 173, 174, 176, 177, 178, 179, 181, 184, 185, 187, 188, 190, 193, 194, 200, 202, 206, 207, 208, 209, 210, 214, 216, 220, 221, 224, 230, 231, 232, 233, 235, 236, 237, 238, 239, 242, 243, 245, 247, 249, 250, 251, 253, 254, 255, 256, 257, 258, 259, Red pigment of 260, 262, 263, 264, 265, 266, 267, 268, 269, 270, 271, 272, 273, 274, 275, 276 or a compound represented by formula (e-1); CI Pigment Yellow 1 , 1:1, 2, 3, 4, 5, 6, 9, 10, 12, 13, 14, 16, 17, 24, 31, 32, 34, 35, 35:1, 36, 36:1, 37 , 37:1, 40, 41, 42, 43, 48, 53, 55, 61, 62, 62: 1, 63, 65, 73, 74, 75, 81, 83, 87, 93, 94, 95, 97 , 100, 101, 104, 105, 108, 109, 110, 111, 116, 117, 119, 120, 126, 127, 127: 1, 129, 133, 134, 136, 138, 139, 142, 147, 148 , 150, 151, 153, 154, 155, 157, 158, 159, 160, 161, 162, 163, 164, 165, 166, 167, 168, 169, 170, 172, 173, 174, 175, 176, 180 , 181, 182, 183, 184, 185, 188, 189, 190, 191, 191: 1, 192, 193, 194, 195, 196, 197, 198, 199, 200, 202, 203, 204, 205, 206 207 or Yellow pigment of 208 et al; CI Pigment Orange 1, 2, 5, 13, 16, 17, 19, 20, 21, 22, 23, 24, 34, 36, 38, 39, 43, 46, 48, 49, 61 , orange pigment of 62, 64, 65, 67, 68, 69, 70, 71, 72, 73, 74, 75, 77, 78 or 79; CI pigment violet 1, 14, 19, 23, 29, 32, Purple pigments of 33, 36, 37, 38, 39, 40, 50, etc.; CI pigment blue l, 2, 15, 15:1, 15:2, 15:3, 15:4, 15:5, 15:6 , blue pigments of 16, 21, 22, 60, 61, 64, 66, etc.; green pigments of CI pigment green 7, 36, 37, 42, 58, etc.; brown pigments of CI pigment brown 23, 25, 28; And black pigments such as CI Pigment Black l, 7. The organic pigments may be used singly or in combination of plural kinds.
Figure PCTCN2015092029-appb-000150
Figure PCTCN2015092029-appb-000150
式(e-1)表示的化合物为溴化二酮吡咯并吡咯颜料,其可通过公知的专利 文献(公开号:WO 2009/144115)所揭示的合成方法来制作。The compound represented by the formula (e-1) is a brominated diketopyrrolopyrrole pigment which can be passed through a known patent. The synthesis method disclosed in the publication (Publication No. WO 2009/144115) is produced.
上述的合成方法例如是以琥珀酸二酯作为原料来合成溴化二酮吡咯并吡咯颜料的合成方法。具体而言,将2摩尔的4-溴苯腈及1摩尔的琥珀酸二酯加至惰性有机溶剂(例如:第三戊醇(tert-amylalcohol))中。接着,于碱金属或碱金属醇盐的存在下及80℃至110℃的高温下进行缩合反应,以生成溴化二酮吡咯并吡咯化合物的碱金属盐。然后,使用水、醇类或酸等来质子化溴化二酮吡咯并吡咯化合物的碱金属盐,以获得溴化二酮吡咯并吡咯颜料。在质子化的阶段,一次粒径的尺寸可通过质子化的温度、所使用的水、醇类与酸的比例及其添加量来控制。上述的合成方法仅为举例说明,且该溴化二酮吡咯并吡咯颜料的合成方法不限于此。The above synthesis method is, for example, a method for synthesizing a brominated diketopyrrolopyrrole pigment using a succinic acid diester as a raw material. Specifically, 2 moles of 4-bromobenzonitrile and 1 mole of succinic acid diester are added to an inert organic solvent (for example, tert-amylalcohol). Next, a condensation reaction is carried out in the presence of an alkali metal or an alkali metal alkoxide and at a high temperature of from 80 ° C to 110 ° C to form an alkali metal salt of a brominated diketopyrrolopyrrole compound. Then, an alkali metal salt of a brominated diketopyrrolopyrrole compound is protonated using water, an alcohol or an acid or the like to obtain a brominated diketopyrrolopyrrole pigment. At the stage of protonation, the size of the primary particle size can be controlled by the temperature of protonation, the water used, the ratio of alcohol to acid, and the amount of addition thereof. The above synthesis method is merely illustrative, and the synthesis method of the brominated diketopyrrolopyrrole pigment is not limited thereto.
基于碱可溶性树脂(A)的使用量为100重量份,颜料(E)的使用量可为30重量份至300重量份,较佳为40重量份至250重量份,且更佳为50重量份至200重量份。The pigment (E) may be used in an amount of 30 parts by weight to 300 parts by weight, preferably 40 parts by weight to 250 parts by weight, and more preferably 50 parts by weight, based on 100 parts by weight of the alkali-soluble resin (A). Up to 200 parts by weight.
染料(F)Dye (F)
染料(F)包括染料(F-1)以及其它染料(F-2)。The dye (F) includes the dye (F-1) as well as other dyes (F-2).
染料(F-1)Dye (F-1)
染料(F-1)包括由式(f-1)表示的化合物。The dye (F-1) includes a compound represented by the formula (f-1).
Figure PCTCN2015092029-appb-000151
Figure PCTCN2015092029-appb-000151
式(f-1)中,J1、J2、J3及J4各自独立表示氢原子、碳数为1至8的烷基、经取代的碳数为1至8的烷基、碳数为3至8的环烷基、经取代的碳数为3至8的环烷基、苯基或经取代的苯基;J5及J6各自独立表示氢原子、碳数为1至8的烷基或氯原子;J7表示具有聚合性不饱合基的基;a表示1至5的整数。 In the formula (f-1), J 1 , J 2 , J 3 and J 4 each independently represent a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, a substituted alkyl group having 1 to 8 carbon atoms, and a carbon number. a cycloalkyl group of 3 to 8, a substituted cycloalkyl group having a carbon number of 3 to 8, a phenyl group or a substituted phenyl group; and J 5 and J 6 each independently represent a hydrogen atom and have a carbon number of 1 to 8. An alkyl group or a chlorine atom; J 7 represents a group having a polymerizable unsaturated group; and a represents an integer of 1 to 5.
J1、J2、J3及J4中的碳数为1至8的烷基的具体例包括甲基、乙基、丙基、异丙基、丁基、第二丁基、第三丁基、异丁基、戊基、第三戊基、己基、庚基、辛基、异辛基、第三辛基或2-乙基己基等。J1、J2、J3及J4较佳为碳数为1至6的烷基,且更佳为碳数为1至4的烷基。Specific examples of the alkyl group having 1 to 8 carbon atoms in J 1 , J 2 , J 3 and J 4 include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, a second butyl group and a third butyl group. Base, isobutyl, pentyl, third amyl, hexyl, heptyl, octyl, isooctyl, trioctyl or 2-ethylhexyl, and the like. J 1 , J 2 , J 3 and J 4 are preferably an alkyl group having 1 to 6 carbon atoms, and more preferably an alkyl group having 1 to 4 carbon atoms.
J1、J2、J3及J4中的碳数为3至8的环烷基的具体例包括环丙基、环丁基、环戊基、环己基、环庚基或环辛基。J1、J2、J3及J4较佳为碳数为5至7的环烷基,且更佳为环己基。Specific examples of the cycloalkyl group having 3 to 8 carbon atoms in J 1 , J 2 , J 3 and J 4 include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group or a cyclooctyl group. J 1 , J 2 , J 3 and J 4 are preferably a cycloalkyl group having a carbon number of 5 to 7, and more preferably a cyclohexyl group.
J1、J2、J3及J4中的碳数为3至8的环烷基的具体例包括环丙基、环丁基、环戊基、环己基、环庚基或环辛基。J1、J2、J3及J4较佳为碳数为5至7的环烷基,且更佳为环己基。Specific examples of the cycloalkyl group having 3 to 8 carbon atoms in J 1 , J 2 , J 3 and J 4 include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group or a cyclooctyl group. J 1 , J 2 , J 3 and J 4 are preferably a cycloalkyl group having a carbon number of 5 to 7, and more preferably a cyclohexyl group.
J1、J2、J3及J4中的碳数为1至8的烷基、碳数为3至8的环烷基及苯基可以具有取代基,该取代基较佳为卤素原子、-Ja、-OH、-OJa、-SO3H、-SO3T、-CO2H、-CO2Ja、-SO3Ja、-SO2NHJb、-SO-2NJbJc或-SO3 -The alkyl group having 1 to 8 carbon atoms, the cycloalkyl group having 3 to 8 carbon atoms, and the phenyl group in J 1 , J 2 , J 3 and J 4 may have a substituent, and the substituent is preferably a halogen atom. -J a , -OH, -OJ a , -SO 3 H, -SO 3 T, -CO 2 H, -CO 2 J a , -SO 3 J a , -SO 2 NHJ b , -SO- 2 NJ b J c or -SO 3 - .
在此,Ja表示碳数为1至10的饱和烃基。其中,该饱和烃基中所含有的氢原子可以经卤素原子取代,另外饱和烃基中含有的亚甲基可以经氧原子、羰基或-NJa-取代。Here, J a represents a saturated hydrocarbon group having a carbon number of 1 to 10. Here, the hydrogen atom contained in the saturated hydrocarbon group may be substituted by a halogen atom, and the methylene group contained in the saturated hydrocarbon group may be substituted with an oxygen atom, a carbonyl group or -NJ a -.
Jb和Jc各自独立表示碳数为1至10的直链状或支链状的烷基、碳数为3至30(较佳为3至8)的环烷基或-D,或表示Jb和Jc相互键结而形成的碳数为2至10的杂环基。其中,该烷基和环烷基所含有的氢原子可以经羟基、卤素原子、-D、-CH=CH2或-CH=CHJa取代,另外该烷基和环烷基中含有的亚甲基可以经氧原子、羰基或-NJa-取代,该杂环基所含有的氢原子可以经-Ja、-OH或-D取代。J b and J c each independently represent a linear or branched alkyl group having 1 to 10 carbon atoms, a cycloalkyl group having a carbon number of 3 to 30 (preferably 3 to 8) or -D, or A heterocyclic group having 2 to 10 carbon atoms formed by bonding J b and J c to each other. Wherein the hydrogen atom contained in the alkyl group and the cycloalkyl group may be substituted by a hydroxyl group, a halogen atom, -D, -CH=CH 2 or -CH=CHJ a , and the methylene group contained in the alkyl group and the cycloalkyl group The group may be substituted with an oxygen atom, a carbonyl group or -NJ a -, and the hydrogen atom contained in the heterocyclic group may be substituted with -J a , -OH or -D.
T表示钠原子或钾原子。T represents a sodium atom or a potassium atom.
D表示碳数为6至10的芳香族烃基或碳数为5至10的芳香族杂环基。其中,该芳香族烃基及芳香族杂环基所含有的氢原子可以经-OH、-Ja、-OJa、-NO2、-CH=CH2、-CH=CHJa或卤素原子取代。D represents an aromatic hydrocarbon group having 6 to 10 carbon atoms or an aromatic heterocyclic group having 5 to 10 carbon atoms. Here, the hydrogen atom contained in the aromatic hydrocarbon group and the aromatic heterocyclic group may be substituted with -OH, -J a , -OJ a , -NO 2 , -CH=CH 2 , -CH=CHJ a or a halogen atom.
Ja中的饱和烃基只要碳数为1至10,则可以为直链状、支链状以及环状中的任一种,并且也可以具有桥联结构(bridged structure)。具体而言,除与上述J1、J2、J3及J4同样的烷基之外,Ra的具体例还可以包括壬基、癸基、环戊基、环己基、环庚基、环辛基或三环癸基。另外,饱和烃基所含有的亚 甲基经氧原子取代而成的基的具体例包括甲氧基丙基、乙氧基丙基、2-乙基己氧基丙基或甲氧基己基等。The saturated hydrocarbon group in J a may be any of a linear chain, a branched chain, and a cyclic chain as long as the carbon number is from 1 to 10, and may have a bridged structure. Specifically, in addition to the alkyl group similar to the above J 1 , J 2 , J 3 and J 4 , specific examples of R a may further include an anthracenyl group, a fluorenyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, Cyclooctyl or tricyclic fluorenyl. Further, specific examples of the group in which the methylene group contained in the saturated hydrocarbon group is substituted with an oxygen atom include a methoxypropyl group, an ethoxypropyl group, a 2-ethylhexyloxypropyl group or a methoxyhexyl group.
另外,J1、J2、J3及J4中的烷基、环烷基以及苯基的取代基-CO2Ra的具体例包括甲氧羰基(methyloxycarbonyl)、乙氧羰基(ethyloxycarbonyl)、丙氧羰基(propyloxycarbonyl)、异丙氧羰基(isopropyloxycarbonyl)、丁氧羰基(butyloxycarbonyl)、环己氧羰基(cyclohexyloxycarbonyl)或甲氧基丙氧羰基(methoxy propyloxycarbonyl)。另外,-SO3Ja的具体例包括甲磺酰基(methanesulfonyl group)、乙磺酰基(ethanesulfonyl group)、己磺酰基(hexanesulfonyl group)或癸磺酰基(decanesulfonyl group)。Further, specific examples of the alkyl group, the cycloalkyl group and the substituent of the phenyl group -CO 2 R a in J 1 , J 2 , J 3 and J 4 include a methyloxycarbonyl group, an ethyloxycarbonyl group, and a methyloxycarbonyl group. Propyloxycarbonyl, isopropyloxycarbonyl, butyloxycarbonyl, cyclohexyloxycarbonyl or methoxy propyloxycarbonyl. Further, specific examples of -SO 3 J a include a methanesulfonyl group, a ethanesulfonyl group, a hexanesulfonyl group or a decanesulfonyl group.
Jb和Jc相互键结而形成的杂环基的具体例包括吡咯(pyrrole)、吡啶(pyridine)、吲哚(indole)、异吲哚(isoindole)、喹啉(quinoline)、异喹啉(isoquinoline)、咔唑(carbazole)、啡啶(phenanthridine)、吖啶(acridine)或啡噻嗪(phenothiazine)。Specific examples of the heterocyclic group in which J b and J c are bonded to each other include pyrrole, pyridine, indole, isoindole, quinoline, isoquinoline. (isoquinoline), carbazole, phenanthridine, acridine or phenothiazine.
D中的芳香族烃基的具体例包括苯基、萘基、薁基(azulenyl)等。另外,芳香族杂环基的具体例包括呋喃基(furyl group)、噻吩基(thienyl group)、吡啶基(pyridyl group)、吡咯基(pyrrolyl group)、恶唑基(oxazolyl group)、异恶唑基(isothiazolyl group)、噻唑基(thiazolyl group)、异噻唑基(isothiazolyl group)、咪唑基(imidazolyl group)、吡唑基(pyrazolyl group)或嘧啶基(pyrimidyl group)。Specific examples of the aromatic hydrocarbon group in D include a phenyl group, a naphthyl group, an azulenyl group, and the like. Further, specific examples of the aromatic heterocyclic group include a furyl group, a thienyl group, a pyridyl group, a pyrrolyl group, an oxazolyl group, and an isoxazole. An isothiazolyl group, a thiazolyl group, an isothiazolyl group, an imidazolyl group, a pyrazolyl group or a pyrimidyl group.
J5和J6中的碳数为1至8的烷基的具体例与J1、J2、J3及J4中的碳数为1至8的烷基的具体例相同,在此不另行赘述。Specific examples of the alkyl group having 1 to 8 carbon atoms in J 5 and J 6 are the same as the specific examples of the alkyl group having 1 to 8 carbon atoms in J 1 , J 2 , J 3 and J 4 , and Will be described separately.
a表示1至5的整数,a为2以上的整数时,多个J7可以相同也可不同,a较佳为1或2,更佳为1。a represents an integer of 1 to 5, and when a is an integer of 2 or more, a plurality of J 7 may be the same or different, and a is preferably 1 or 2, more preferably 1.
由式(f-1)表示的化合物较佳为包括由式(f-2)表示的化合物。又,由式(f-2)表示的化合物较佳为式(f-2)中的-COOJ8基取代在苯环上的邻位的化合物。The compound represented by the formula (f-1) preferably includes the compound represented by the formula (f-2). Further, the compound represented by the formula (f-2) is preferably a compound in which the -COOJ 8 group in the formula (f-2) is substituted at the ortho position on the benzene ring.
Figure PCTCN2015092029-appb-000152
Figure PCTCN2015092029-appb-000152
式(f-2)中,J1、J2、J3及J4各自独立表示氢原子、碳数为1至8的烷基、经取代的碳数为1至8的烷基、碳数为3至8的环烷基、经取代的碳数为3至8的环烷基、苯基或经取代的苯基;J5及J6各自独立表示氢原子、碳数为1至8的烷基或氯原子;J8表示具有聚合性不饱合基的基。In the formula (f-2), J 1 , J 2 , J 3 and J 4 each independently represent a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, a substituted alkyl group having 1 to 8 carbon atoms, and a carbon number. a cycloalkyl group of 3 to 8, a substituted cycloalkyl group having a carbon number of 3 to 8, a phenyl group or a substituted phenyl group; and J 5 and J 6 each independently represent a hydrogen atom and have a carbon number of 1 to 8. An alkyl group or a chlorine atom; and J 8 represents a group having a polymerizable unsaturated group.
就考虑交联反应的容易性而言,J7及J8中的聚合性不饱和基较佳为丙烯酰基或甲基丙烯酰基。J8的具体例较佳为由式(f-3)表示的基或由式(f-4)表示的基。The polymerizable unsaturated group in J 7 and J 8 is preferably an acryloyl group or a methacryloyl group in view of easiness of the crosslinking reaction. Specific examples of J 8 are preferably a group represented by the formula (f-3) or a group represented by the formula (f-4).
Figure PCTCN2015092029-appb-000153
Figure PCTCN2015092029-appb-000153
Figure PCTCN2015092029-appb-000154
立表示0至6的整数。
Figure PCTCN2015092029-appb-000154
An integer representing 0 to 6.
J9和J10较佳为甲基。J 9 and J 10 are preferably a methyl group.
V1、V2、V3及V4中的碳数为1至12的烷二基的具体例包括亚甲基、伸乙基、乙烷-1,1-二基、丙烷-1,1-二基、丙烷-1,2-二基、丙烷-1,3-二基、丙烷-2,2-二基、丁烷-1,2-二基、丁烷-1,3-二基、丁烷-1,4-二基、戊烷-1,2-二基、戊烷-1,3-二基、戊烷-1,4-二基、戊烷-1,5-二基、己烷-1,5-二基、己烷-1,6-二基、辛烷-1,8-二基或癸烷-1,10-二基。V1、V2、V3及V4较佳为碳数为2至8的烷二基,且更佳为碳数为2至6的烷二基。Specific examples of the alkanediyl group having 1 to 12 carbon atoms in V 1 , V 2 , V 3 and V 4 include a methylene group, an ethylidene group, an ethane-1,1-diyl group, and a propane-1,1. -diyl, propane-1,2-diyl, propane-1,3-diyl, propane-2,2-diyl, butane-1,2-diyl, butane-1,3-diyl Butane-1,4-diyl, pentane-1,2-diyl, pentane-1,3-diyl, pentane-1,4-diyl, pentane-1,5-diyl Hexane-1,5-diyl, hexane-1,6-diyl, octane-1,8-diyl or decane-1,10-diyl. V 1 , V 2 , V 3 and V 4 are preferably an alkanediyl group having a carbon number of 2 to 8, and more preferably an alkanediyl group having a carbon number of 2 to 6.
该烷二基的取代基包括羟基、卤素原子、(甲基)丙烯酰氧基或苯氧基等,且较佳为羟基。The substituent of the alkanediyl group includes a hydroxyl group, a halogen atom, a (meth)acryloyloxy group or a phenoxy group, and the like, and is preferably a hydroxyl group.
Q2中的二价脂环式烃基较佳为碳数为3至20的脂环式烃基,更佳为碳数为3至12的脂环式烃基。此外,该脂环式烃基可以为2至4环的交联环式烃基。The divalent alicyclic hydrocarbon group in Q 2 is preferably an alicyclic hydrocarbon group having 3 to 20 carbon atoms, more preferably an alicyclic hydrocarbon group having 3 to 12 carbon atoms. Further, the alicyclic hydrocarbon group may be a 2 to 4 ring crosslinked cyclic hydrocarbon group.
具体而言,J8较佳为(甲基)丙烯酰氧基烷基。另外,该(甲基)丙烯酰氧基 烷基的总碳数较佳为4至16,特佳为4至10。Specifically, J 8 is preferably a (meth)acryloyloxyalkyl group. Further, the (meth)acryloyloxyalkyl group has a total carbon number of preferably 4 to 16, particularly preferably 4 to 10.
b较佳为表示0至3的整数,另外c和d较佳为各自独立表示0至3的整数。b is preferably an integer representing 0 to 3, and c and d are preferably integers each independently representing 0 to 3.
由式(f-1)表示的化合物是由具有羟基及聚合性不饱和基的化合物与由式(f-5)表示的化合物反应而得,其中聚合性不饱合基为丙烯酰基或甲基丙烯酰基。该酯化反应可以使用周知的方法。又,式(f-5)中的-COOH基较佳为取代在苯环上的邻位。The compound represented by the formula (f-1) is obtained by reacting a compound having a hydroxyl group and a polymerizable unsaturated group with a compound represented by the formula (f-5), wherein the polymerizable unsaturated group is an acryloyl group or a methyl group. Acryl. A well-known method can be used for this esterification reaction. Further, the -COOH group in the formula (f-5) is preferably substituted with an ortho position on the benzene ring.
Figure PCTCN2015092029-appb-000155
Figure PCTCN2015092029-appb-000155
式(f-5)中,J1、J2、J3及J4各自独立表示氢原子、碳数为1至8的烷基、经取代的碳数为1至8的烷基、碳数为3至8的环烷基、经取代的碳数为3至8的环烷基、苯基或经取代的苯基;J5及J6各自独立表示氢原子、碳数为1至8的烷基或氯原子;IN-表示阴离子。In the formula (f-5), J 1 , J 2 , J 3 and J 4 each independently represent a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, a substituted alkyl group having 1 to 8 carbon atoms, and a carbon number. a cycloalkyl group of 3 to 8, a substituted cycloalkyl group having a carbon number of 3 to 8, a phenyl group or a substituted phenyl group; and J 5 and J 6 each independently represent a hydrogen atom and have a carbon number of 1 to 8. An alkyl or chlorine atom; IN - represents an anion.
上述具有羟基及聚合性不饱和基的化合物,只要在该化合物中分别具有1个以上的羟基及(甲基)丙烯酰基即可,羟基及(甲基)丙烯酰基的键结数、键结位置没有特别的限制。另外,羟基可以使用醇性羟基、酚性羟基中的任一种。进而,除羟基及(甲基)丙烯酰基以外还具有其它取代基时,其种类、键结位置、键结数不受限制。The compound having a hydroxyl group and a polymerizable unsaturated group may have one or more hydroxyl groups and a (meth)acryloyl group in the compound, and the number of bonds and bonding sites of the hydroxyl group and the (meth)acryloyl group. There are no special restrictions. Further, as the hydroxyl group, any of an alcoholic hydroxyl group and a phenolic hydroxyl group can be used. Further, when other substituents are contained in addition to the hydroxyl group and the (meth)acryloyl group, the kind, the bonding position, and the number of bonds are not limited.
具有羟基及(甲基)丙烯酰基的化合物的具体例较佳为由式(f-3a)或(f-4a)表示的化合物。A specific example of the compound having a hydroxyl group and a (meth)acryloyl group is preferably a compound represented by the formula (f-3a) or (f-4a).
Figure PCTCN2015092029-appb-000156
Figure PCTCN2015092029-appb-000156
式(f-3a)及(f-4a)中,J9、J10、V1、V2、V3、V4、Q1、Q2、b、c以及d与式(f-3)及(f-4)中的J9、J10、V1、V2、V3、V4、Q1、Q2、b、c以及d同义,在此不另行赘述。In the formulas (f-3a) and (f-4a), J 9 , J 10 , V 1 , V 2 , V 3 , V 4 , Q 1 , Q 2 , b, c and d and the formula (f-3) And J 9 , J 10 , V 1 , V 2 , V 3 , V 4 , Q 1 , Q 2 , b, c, and d in (f-4) are synonymous, and are not described herein.
具有羟基及(甲基)丙烯酰基的化合物的具体例较佳为包括由式(f-2-1)至式(f-2-4)表示的化合物中的至少一个。Specific examples of the compound having a hydroxyl group and a (meth)acryloyl group preferably include at least one of the compounds represented by the formula (f-2-1) to the formula (f-2-4).
Figure PCTCN2015092029-appb-000157
Figure PCTCN2015092029-appb-000157
式(f-2-1)中,Jd表示氢原子或甲基;f和g各自独立表示0至2的整数;h表示1至6的整数。其中,f和g中的至少1种为1以上的整数时,-CH(OH)-基、-CH(CH3)-基以及-CH2-基可以按任意的顺序键结。In the formula (f-2-1), J d represents a hydrogen atom or a methyl group; and g F are each independently an integer of 0 to 2; H represents an integer of 1 to 6. When at least one of f and g is an integer of 1 or more, the -CH(OH)- group, the -CH(CH 3 )- group, and the -CH 2 - group may be bonded in an arbitrary order.
Figure PCTCN2015092029-appb-000158
Figure PCTCN2015092029-appb-000158
式(f-2-2)中,Je表示氢原子或甲基;i和j各自独立表示1至12的整数。In the formula (f-2-2), J e represents a hydrogen atom or a methyl group; and i and j each independently represent an integer of 1 to 12.
Figure PCTCN2015092029-appb-000159
Figure PCTCN2015092029-appb-000159
式(f-2-3)中,Jf表示氢原子或甲基;k和mx各自独立表示1至12的整数。In the formula (f-2-3), J f represents a hydrogen atom or a methyl group; and k and mx each independently represent an integer of 1 to 12.
Figure PCTCN2015092029-appb-000160
Figure PCTCN2015092029-appb-000160
式(f-2-4)中,Jg表示氢原子或甲基;A表示选自以下述式(fI)至(fIV)表示的基的群组中的二价基;n及q各自独立表示0至6的整数。In the formula (f-2-4), J g represents a hydrogen atom or a methyl group; and A represents a divalent group selected from the group consisting of the groups represented by the following formulas (fI) to (fIV); n and q are each independently An integer representing 0 to 6.
Figure PCTCN2015092029-appb-000161
Figure PCTCN2015092029-appb-000161
由式(f-2-1)表示的化合物的具体例包括(甲基)丙烯酸2-羟基乙酯、(甲基)丙烯酸1-甲基-2-羟基乙酯、(甲基)丙烯酸2-甲基-2-羟基乙酯、(甲基)丙烯酸3-羟基丙酯、(甲基)丙烯酸1-甘油酯(1-glycerol(meth)acrylate)、(甲基)丙烯酸4-羟基丁酯、(甲基)丙烯酸5-羟基戊酯、(甲基)丙烯酸6-羟基己酯、(甲基)丙烯酸7-羟基庚酯、(甲基)丙烯酸8-羟基辛酯、(甲基)丙烯酸9-羟基壬酯、(甲基)丙烯酸10-羟基癸酯、(甲基)丙烯酸11-羟基十一烷酯或(甲基)丙烯酸12-羟基十二烷酯。Specific examples of the compound represented by the formula (f-2-1) include 2-hydroxyethyl (meth)acrylate, 1-methyl-2-hydroxyethyl (meth)acrylate, and (meth)acrylic acid 2- Methyl-2-hydroxyethyl ester, 3-hydroxypropyl (meth)acrylate, 1-glycerol (meth)acrylate, 4-hydroxybutyl (meth)acrylate, 5-hydroxypentyl (meth)acrylate, 6-hydroxyhexyl (meth)acrylate, 7-hydroxyheptyl (meth)acrylate, 8-hydroxyoctyl (meth)acrylate, (meth)acrylic acid 9 - Hydroxy decyl ester, 10-hydroxydecyl (meth) acrylate, 11-hydroxyundecyl (meth) acrylate or 12-hydroxydodecyl (meth) acrylate.
另外,由式(f-2-2)表示的化合物的具体例包括(甲基)丙烯酸2-(6-羟基己酰氧基)乙酯、(甲基)丙烯酸3-(6-羟基己酰氧基)丙酯、(甲基)丙烯酸4-(6-羟基己酰氧基)丁酯、(甲基)丙烯酸5-(6-羟基己酰氧基)戊酯或(甲基)丙烯酸6-(6-羟基己酰氧基)己酯等(甲基)丙烯酸(6-羟基己酰氧基)烷基酯类等;(甲基)丙烯酸(6-羟基己酰氧基)烷基酯类的市售品包括商品名为PLACCEL FM1D、PLACCEL FM2D(以上,大赛璐(DAICEL)化学工业(股)制)等。Further, specific examples of the compound represented by the formula (f-2-2) include 2-(6-hydroxyhexanoyloxy)ethyl (meth)acrylate and 3-(6-hydroxyhexanoyl (meth)acrylate. Oxy)propyl ester, 4-(6-hydroxyhexanoyloxy)butyl (meth)acrylate, 5-(6-hydroxyhexanoyloxy)pentyl (meth)acrylate or (meth)acrylic acid 6 -(6-Hydroxyhexanoyloxy)hexyl ester, etc. (6-hydroxyhexanoyloxy)alkyl (meth)acrylate, etc.; (6-hydroxyhexanoyloxy)alkyl (meth)acrylate Commercial products of the class include the trade names PLACCEL FM1D, PLACCEL FM2D (above, DAICEL Chemical Industry Co., Ltd.) and the like.
另外,以式(f-2-3)表示的化合物的具体例包括(甲基)丙烯酸2-(3-羟基-2,2-二甲基丙氧基羰基氧基)乙酯、(甲基)丙烯酸3-(3-羟基-2,2-二甲基丙氧基羰基氧基)丙酯、(甲基)丙烯酸4-(3-羟基-2,2-二甲基丙氧基羰基氧基)丁酯、(甲基)丙烯酸5-(3-羟基-2,2-二甲基丙氧基羰基氧基)戊酯或(甲基)丙烯酸6-(3-羟基-2,2-二甲基丙氧基羰基氧基)己酯等(甲基)丙烯酸(3-羟基-2,2-二甲基丙氧基羰基氧基)烷基酯类等;(甲基)丙烯酸(3-羟基-2,2-二甲基丙氧基羰基氧基)烷基酯类的市售品包括商品名为HEMAC1(大赛璐(DAICEL)化学工业(股)制)等。Further, specific examples of the compound represented by the formula (f-2-3) include 2-(3-hydroxy-2,2-dimethylpropoxycarbonyloxy)ethyl (meth)acrylate, (methyl) ) 3-(3-hydroxy-2,2-dimethylpropoxycarbonyloxy)propyl acrylate, 4-(3-hydroxy-2,2-dimethylpropoxycarbonyloxy)(meth)acrylate Butyl ester, 5-(3-hydroxy-2,2-dimethylpropoxycarbonyloxy)pentyl (meth)acrylate or 6-(3-hydroxy-2,2-(meth)acrylate (3-hydroxy-2,2-dimethylpropoxycarbonyloxy)alkyl (meth)acrylate, etc.; dimethyl oxycarbonyl oxy) hexyl ester; (meth)acrylic acid (3) Commercial products of -hydroxy-2,2-dimethylpropoxycarbonyloxy)alkyl esters include the trade name HEMAC1 (manufactured by DAICEL Chemical Industry Co., Ltd.) and the like.
另外,以式(f-2-4)表示的化合物的具体例包括(甲基)丙烯酸4-羟基环己酯、(甲基)丙烯酸(4-羟甲基环己基)甲酯、(甲基)丙烯酸2-[4-(2-羟乙基)环己基] 乙酯、(甲基)丙烯酸3-羟基双环[2.2.1]庚-5-烯-2-基酯、(甲基)丙烯酸(3-羟甲基双环[2.2.1]庚-5-烯-2-基)甲酯、(甲基)丙烯酸2-[3-(2-羟乙基)双环[2.2.1]庚-5-烯-2-基]乙酯、(甲基)丙烯酸8-羟基双环[2.2.1]庚-5-烯-2-基酯、(甲基)丙烯酸2-羟基八氢-4,7-亚甲基茚-5-基酯((meth)acrylic acid 2-hydroxy octahydro-4,7-methanoindene-5-yl ester)、(甲基)丙烯酸(2-羟甲基八氢-4,7-亚甲基茚-5-基)甲酯、(甲基)丙烯酸2-[2-(2-羟乙基)八氢-4,7-亚甲基茚-5-基]乙酯、(甲基)丙烯酸3-羟基金刚烷-1-基酯、(甲基)丙烯酸(3-羟甲基金刚烷-1-基)甲酯或(甲基)丙烯酸2-[3-(2-羟乙基)金刚烷-1-基]乙酯等。Further, specific examples of the compound represented by the formula (f-2-4) include 4-hydroxycyclohexyl (meth)acrylate, (4-hydroxymethylcyclohexyl)methyl (meth)acrylate, and (methyl) ) 2-[4-(2-hydroxyethyl)cyclohexyl acrylate] Ethyl ester, 3-hydroxybicyclo[2.2.1]hept-5-en-2-yl (meth)acrylate, (meth)acrylic acid (3-hydroxymethylbicyclo[2.2.1]hept-5-ene 2-yl)methyl ester, 2-[3-(2-hydroxyethyl)bicyclo[2.2.1]hept-5-en-2-yl]ethyl (meth)acrylate, (meth)acrylic acid 8 -Hydroxybicyclo[2.2.1]hept-5-en-2-yl ester, 2-hydroxy octahydro-4,7-methylene fluoren-5-yl (meth) acrylate (meth) -hydroxy octahydro-4,7-methanoindene-5-yl ester), (meth)acrylic acid (2-hydroxymethyl octahydro-4,7-methylene fluoren-5-yl)methyl ester, (methyl) 2-[2-(2-hydroxyethyl) octahydro-4,7-methylene fluoren-5-yl]ethyl acrylate, 3-hydroxyadamantan-1-yl (meth)acrylate, (A) Ethyl (3-hydroxymethyladamantan-1-yl)methyl acrylate or 2-[3-(2-hydroxyethyl)adamantan-1-yl]ethyl (meth)acrylate.
在这些具有羟基及(甲基)丙烯酰基的化合物中,从反应性的观点而言,较佳为下述化合物:式(f-2-1)中的f及g为0,且h为2至6的化合物;式(f-2-1)中的f为1,g为0,且h为1至5的化合物;式(f-2-2)中的i为2或3,且j为1的化合物;式(f-2-3)中的k为2或3,且m为1的化合物;式(f-2-4)中的n为1或2,或q为1或2,且A为由式(fI)或式(fIV)表示的基的化合物。Among these compounds having a hydroxyl group and a (meth)acryloyl group, from the viewpoint of reactivity, the following compounds are preferable: f and g in the formula (f-2-1) are 0, and h is 2 a compound of 6; wherein f in the formula (f-2-1) is 1, g is 0, and h is a compound of 1 to 5; i in the formula (f-2-2) is 2 or 3, and j a compound of 1; a compound of formula (f-2-3) wherein k is 2 or 3 and m is 1; n in formula (f-2-4) is 1 or 2, or q is 1 or 2 And A is a compound of the group represented by the formula (fI) or the formula (fIV).
具有羟基及(甲基)丙烯酰基的化合物较佳为包括(甲基)丙烯酸2-羟基乙酯、(甲基)丙烯酸1-甘油酯、(甲基)丙烯酸6-羟基己酯、(甲基)丙烯酸2-(6-羟基己酰氧基)乙酯、(甲基)丙烯酸2-(3-羟基-2,2-二甲基丙氧基羰基氧基)乙酯、(甲基)丙烯酸(4-羟甲基环己基)甲酯或(甲基)丙烯酸(3-羟甲基金刚烷-1-基)甲酯。The compound having a hydroxyl group and a (meth)acryloyl group preferably includes 2-hydroxyethyl (meth)acrylate, 1-glyceryl (meth)acrylate, 6-hydroxyhexyl (meth)acrylate, (methyl) ) 2-(6-hydroxyhexanoyloxy)ethyl acrylate, 2-(3-hydroxy-2,2-dimethylpropoxycarbonyloxy)ethyl (meth)acrylate, (meth)acrylic acid (4-Hydroxymethylcyclohexyl)methyl ester or (3-hydroxymethyladamantan-1-yl)methyl (meth)acrylate.
除了由式(f-2-1)至式(f-2-4)表示的化合物以外,具有羟基及(甲基)丙烯酰基的化合物的具体例包括4-羟基苯基(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯(pentaerythritol tri(meth)acrylate)、二季戊四醇五(甲基)丙烯酸酯、二甲基丙烯酸甘油酯、由式(f-2-5)表示的化合物或由式(f-2-6)表示的化合物。Specific examples of the compound having a hydroxyl group and a (meth)acryloyl group include 4-hydroxyphenyl (meth) acrylate, in addition to the compound represented by the formula (f-2-1) to the formula (f-2-4). , pentaerythritol tri(meth)acrylate, dipentaerythritol penta (meth) acrylate, glyceryl dimethacrylate, a compound represented by formula (f-2-5) or The compound represented by (f-2-6).
在本发明中,具有羟基及(甲基)丙烯酰基的化合物可以单独使用或组合两种以上来使用。In the present invention, the compound having a hydroxyl group and a (meth)acryloyl group may be used singly or in combination of two or more.
Figure PCTCN2015092029-appb-000162
Figure PCTCN2015092029-appb-000162
Figure PCTCN2015092029-appb-000163
Figure PCTCN2015092029-appb-000163
接着,对上述式(f-5)中的IN-进行说明。Next, IN - in the above formula (f-5) will be described.
IN-的具体例包括卤素离子、硼阴离子、磷酸阴离子、羧酸阴离子、硫酸阴离子、有机磺酸阴离子、氮阴离子或甲基化物阴离子(methide anion)等。Specific examples of IN - include a halogen ion, a boron anion, a phosphate anion, a carboxylic acid anion, a sulfate anion, an organic sulfonate anion, a nitrogen anion or amethide anion.
卤素离子包括氟离子、氯离子、溴离子或碘离子等。Halogen ions include fluoride ions, chloride ions, bromide ions or iodide ions.
另外,硼阴离子的具体例包括BF4 -等无机硼阴离子;(CF3)4B-、(CF3)3BF-、(CF3)2BF2 -、(CF3)BF3 -、(C2F5)4B-、(C2F5)3BF-、(C2F5)BF3 -、(C2F5)2BF2 -、(CF3)(C2F5)2BF-、(C6F5)4B-、[(CF3)2C6H3]4B-、(CF3C6H4)4B-、(C6F5)2BF2 -、(C6F5)BF3 -、(C6H3F2)4B-、B(CN)4 -、B(CN)F3 -、B(CN)2F2 -、B(CN)3F-、(CF3)3B(CN)-、(CF3)2B(CN)2 -、(C2F5)3B(CN)-、(C2F5)2B(CN)2 -、(n-C3F7)3B(CN)-、(n-C4F9)3B(CN)-、(n-C4F9)2B(CN)2 -、(n-C6F13)3B(CN)-、(CHF2)3B(CN)-、(CHF2)2B(CN)2 -、(CH2CF3)3B(CN)-、(CH2CF3)2B(CN)2 -、(CH2C2F5)3B(CN)-、(CH2C2F5)2B(CN)2 -、(CH2CH2C3F7)2B(CN)2 -、(n-C3F7CH2)2B(CN)2 -、(C6H5)3B(CN)-、四苯基硼酸盐、四(单氟苯基)硼酸盐、四(二氟苯基)硼酸盐、四(三氟苯基)硼酸盐、四(四氟苯基)硼酸盐、四(五氟苯基)硼酸盐、四(四氟甲基苯基)硼酸盐、四(甲苯基)硼酸盐、四(二甲苯基)硼酸盐、(三苯基,五氟苯基)硼酸盐、[参(五氟苯基),苯基]硼酸盐或十三氢化-7,8-二羰基十一硼酸盐(tridecahydride-7,8-dicarbaundecaborate)等有机硼阴离子,除此之外,还可以举出在日本特开平10-195119号公报、日本特开2010-094807号公报、日本特开2006-243594号公报、日本特开2002-341533号公报或日本特开平08-015521号公报等中记载的硼阴离子。Further, specific examples of the boron anion include inorganic boron anions such as BF 4 - ; (CF 3 ) 4 B - , (CF 3 ) 3 BF - , (CF 3 ) 2 BF 2 - , (CF 3 ) BF 3 - , ( C 2 F 5 ) 4 B - , (C 2 F 5 ) 3 BF-, (C 2 F 5 ) BF 3 - , (C 2 F 5 ) 2 BF 2 - , (CF 3 ) (C 2 F 5 ) 2 BF - , (C 6 F 5 ) 4 B - , [(CF 3 ) 2 C 6 H 3 ] 4 B - , (CF 3 C 6 H 4 ) 4 B - , (C 6 F 5 ) 2 BF 2 - , (C 6 F 5 )BF 3 - , (C 6 H 3 F 2 ) 4 B - , B(CN) 4 - , B(CN)F 3 - , B(CN) 2 F 2 - , B( CN) 3 F -, (CF 3) 3 B (CN) -, (CF 3) 2 B (CN) 2 -, (C 2 F 5) 3 B (CN) -, (C 2 F 5) 2 B (CN) 2 - , (nC 3 F 7 ) 3 B(CN) - , (nC 4 F 9 ) 3 B(CN) - , (nC 4 F 9 ) 2 B(CN) 2 - , (nC 6 F 13 ) 3 B(CN) - , (CHF 2 ) 3 B(CN) - , (CHF 2 ) 2 B(CN) 2 - , (CH 2 CF 3 ) 3 B(CN) - , (CH 2 CF 3 2 B(CN) 2 - , (CH 2 C 2 F 5 ) 3 B(CN) - , (CH 2 C 2 F 5 ) 2 B(CN) 2 - , (CH 2 CH 2 C 3 F 7 ) 2 B(CN) 2 - , (nC 3 F 7 CH 2 ) 2 B(CN) 2 - , (C 6 H 5 ) 3 B(CN) - , tetraphenyl borate, tetra (monofluorophenyl) Borate, tetrakis(difluorophenyl)borate, tetrakis(trifluorophenyl)boron Acid salt, tetrakis(tetrafluorophenyl)borate, tetrakis(pentafluorophenyl)borate, tetrakis(tetrafluoromethylphenyl)borate, tetrakis(tolyl)borate, tetra (two) Tolyl)borate, (triphenyl, pentafluorophenyl)borate, [paras(pentafluorophenyl), phenyl]borate or tridecahydro-7,8-dicarbonyl undecaborate In addition to the organic boron anions such as the acid salt (tridecahydride-7, 8-dicarbaundecaborate), JP-A-H05-195119, JP-A-2010-094807, and JP-A-2006-243594 The boron anion described in Japanese Laid-Open Patent Publication No. Hei. No. 2002-341533 or Japanese Patent Publication No. Hei 08-015521.
另外,磷酸阴离子的具体例包括HPO4 2-、PO4 3-、PF6 -等无机磷酸阴离子;(C2F5)2PF4 -、(C2F5)3PF3 -、[(CF3)2CF]2PF4 -、[(CF3)2CF]3PF3、(n-C3F7)2PF4 -、 (n-C3F7)3PF3 -、(n-C4F9)3PF3 -、(C2F5)(CF3)2PF3 -、[(CF3)2CFCF2]2PF4 -、[(CF3)2CFCF2]3PF3 -、(n-C4F9)2PF4 -、(n-C4F9)3PF3 -、(C2F4H)(CF3)2PF3 -、(C2F3H2)3PF3 -、(C2F5)(CF3)2PF3 -、辛基磷酸阴离子、十二烷基磷酸阴离子、十八烷基磷酸阴离子、苯基磷酸阴离子或壬基苯基磷酸阴离子等有机磷酸阴离子。Further, specific examples of the phosphate anion include inorganic phosphate anions such as HPO 4 2- , PO 4 3- , PF 6 - ; (C 2 F 5 ) 2 PF 4 - , (C 2 F 5 ) 3 PF 3 - , [( CF 3 ) 2 CF] 2 PF 4 - , [(CF 3 ) 2 CF] 3 PF 3 , (nC 3 F 7 ) 2 PF 4 - , (nC 3 F 7 ) 3 PF 3 - , (nC 4 F 9 3 PF 3 - , (C 2 F 5 )(CF 3 ) 2 PF 3 - , [(CF 3 ) 2 CFCF 2 ] 2 PF 4 - , [(CF 3 ) 2 CFCF 2 ] 3 PF 3 - , ( nC 4 F 9 ) 2 PF 4 - , (nC 4 F 9 ) 3 PF 3 - , (C 2 F 4 H)(CF 3 ) 2 PF 3 - , (C 2 F 3 H 2 ) 3 PF 3 - , (C 2 F 5 ) (CF 3 ) 2 PF 3 - , an octyl phosphate anion, a dodecyl phosphate anion, an octadecyl phosphate anion, a phenyl phosphate anion or a nonylphenyl phosphate anion.
另外,羧酸阴离子的具体例包括CH3COO-、C2H5COO-、C6H5COO-等,除此之外,还包括日本特开2009-265641号公报或日本特开2008-096680号公报记载的羧酸阴离子。Further, specific examples of the carboxylic acid anion include CH 3 COO - , C 2 H 5 COO - , C 6 H 5 COO - and the like, and in addition to Japanese Patent Laid-Open Publication No. 2009-265641 or JP-A-2008- A carboxylic acid anion described in Japanese Patent No. 096680.
另外,硫酸阴离子的具体例包括硫酸阴离子、亚硫酸阴离子。Further, specific examples of the sulfate anion include a sulfate anion and a sulfite anion.
有机磺酸阴离子的具体例包括甲磺酸(methanesulfonic acid)、乙磺酸(ethanesulfonic acid)、三氟甲磺酸、九氟丁磺酸等烷基磺酸阴离子;苯磺酸、苯二磺酸根离子、对甲苯磺酸、对三氟甲基磺酸、五氟苯磺酸、萘磺酸、萘二磺酸根离子等芳基磺酸阴离子,除此之外,还包括2-(甲基)丙烯酰氧基-1,1,2,2-四氟乙磺酸、2-(4-乙烯基苯氧基)-1,1,2,2-四氟乙磺酸,在国际公表第2011/037195号册子、日本专利第3736221号说明书或日本特开2011-070172号公报中记载的有机磺酸阴离子。Specific examples of the organic sulfonic acid anion include an alkylsulfonic acid anion such as methanesulfonic acid, ethanesulfonic acid, trifluoromethanesulfonic acid or nonafluorobutanesulfonic acid; benzenesulfonic acid and benzenedisulfonate An arylsulfonic acid anion such as ion, p-toluenesulfonic acid, p-trifluoromethanesulfonic acid, pentafluorobenzenesulfonic acid, naphthalenesulfonic acid or naphthalene disulfonate ion, in addition to 2-(methyl) Acryloxy-1,1,2,2-tetrafluoroethanesulfonic acid, 2-(4-vinylphenoxy)-1,1,2,2-tetrafluoroethanesulfonic acid, in International Publication No. 2011 An organic sulfonic acid anion described in Japanese Patent No. 3,736,221, or Japanese Patent Application Laid-Open No. 2011-070172.
另外,氮阴离子的具体例包括[(CN)2N]-、[(FSO2)2N]-、[(FSO2)N(CF3SO2)]-、[(CF3SO2)2N]-、[(FSO2)N(CF3CF2SO2)]-、[(FSO2)N{(CF3)2CFSO2}]-、[(FSO2)N(CF3CF2CF2SO2)]-、[(FSO2)N(CF3CF2CF2CF2SO2)]-、[(FSO2)N{(CF3)2CFCF2SO2}]-、[(FSO2)N{CF3CF2(CF3)CFSO2}]-、[(FSO2)N{(CF3)3CSO2}]-等,除此之外,还包括在日本特开2011-133844号公报、日本特开2011-116803号公报、日本特开2010-090341号公报中记载的氮阴离子。Further, specific examples of the nitrogen anion include [(CN) 2 N] - , [(FSO 2 ) 2 N] - , [(FSO 2 )N(CF 3 SO 2 )] - , [(CF 3 SO 2 ) 2 N] - , [(FSO 2 )N(CF 3 CF 2 SO 2 )] - , [(FSO 2 )N{(CF 3 ) 2 CFSO 2 }] - , [(FSO 2 )N(CF 3 CF 2 CF 2 SO 2 )] - , [(FSO 2 )N(CF 3 CF 2 CF 2 CF 2 SO 2 )] - , [(FSO 2 )N{(CF 3 ) 2 CFCF 2 SO 2 }] - , [ (FSO 2 )N{CF 3 CF 2 (CF 3 )CFSO 2 }] - , [(FSO 2 )N{(CF 3 ) 3 CSO 2 }] -, etc., in addition to The nitrogen anions described in JP-A-2010-090341, and JP-A-2010-090341.
另外,甲基化物阴离子的具体例包括(CF3SO2)3C-、(CF3CF2SO2)3C-、[(CF3)2CFSO2]3C-、(CF3CF2CF2SO2)3C-、(CF3CF2CF2CF2SO2)3C-、[(CF3)2CFCF2SO2]3C-、[CF3CF2(CF3)CFSO2]3C-、[(CF3)3CSO2]3C-、(FSO2)3C-等,除此之外,还包括在日本特开2011-145540号公报、美国专利第5,554,664号说明书、日本特开2005-309408号公报、日本特开2004-085657号公报或日本特表2010-505787号公报等中记载的甲基化物阴离子。Further, specific examples of the methide anion include (CF 3 SO 2 ) 3 C - , (CF 3 CF 2 SO 2 ) 3 C - , [(CF 3 ) 2 CFSO 2 ] 3 C - , (CF 3 CF 2 CF 2 SO 2 ) 3 C - , (CF 3 CF 2 CF 2 CF 2 SO 2 ) 3 C - , [(CF 3 ) 2 CFCF 2 SO 2 ] 3 C - , [CF 3 CF 2 (CF 3 ) CFSO 2 ] 3 C - , [(CF 3 ) 3 CSO 2 ] 3 C - , (FSO 2 ) 3 C - and the like, in addition to Japanese Patent Laid-Open No. 2011-145540, No. 5,554,664 The methide anion described in JP-A-2005-309657, JP-A-2004-085657, and JP-A-2010-505787.
基于碱可溶性树脂(A)的使用量为100重量份,染料(F-1)的使用量可为3 重量份至90重量份,较佳为5重量份至85重量份,且更佳为10重量份至80重量份。The amount of the dye (F-1) used may be 3 based on the amount of the alkali-soluble resin (A) used in an amount of 100 parts by weight. The parts by weight to 90 parts by weight, preferably 5 parts by weight to 85 parts by weight, and more preferably 10 parts by weight to 80 parts by weight.
当本发明的染料(F)包含染料(F-1)时,所制得的感光性树脂组成物的逸气性较佳。When the dye (F) of the present invention contains the dye (F-1), the resulting photosensitive resin composition preferably has a gassing property.
其它染料(F-2)Other dyes (F-2)
染料(F)可包括其它染料(F-2)。其它染料(F-2)的具体例包括C.I.溶剂红45、C.I.溶剂红49等红色染料;C.I.溶剂蓝35、C.I.溶剂蓝37、C.I.溶剂蓝59、C.I.溶剂蓝67等蓝色染料;C.I.酸性红91、C.I.酸性红92、C.I.酸性红97、C.I.酸性红114、C.I.酸性红138、C.I.酸性红151、C.I.酸性红289等酸性红色染料;或C.I.酸性蓝80、C.I.酸性蓝83、C.I.酸性蓝90等酸性蓝色染料。The dye (F) may include other dyes (F-2). Specific examples of other dyes (F-2) include red dyes such as CI Solvent Red 45 and CI Solvent Red 49; blue solvents such as CI Solvent Blue 35, CI Solvent Blue 37, CI Solvent Blue 59, and CI Solvent Blue 67; Acid red dyes such as red 91, CI acid red 92, CI acid red 97, CI acid red 114, CI acid red 138, CI acid red 151, CI acid red 289; or CI acid blue 80, CI acid blue 83, CI acid Acidic blue dye such as blue 90.
基于碱可溶性树脂(A)的使用量为100重量份,其它染料(F-2)的使用量可为0重量份至87重量份,较佳为0重量份至80重量份,且更佳为0重量份至70重量份。The other dye (F-2) may be used in an amount of from 0 part by weight to 87 parts by weight, preferably from 0 part by weight to 80 parts by weight, based on 100 parts by weight of the alkali-soluble resin (A), and more preferably 0 parts by weight to 70 parts by weight.
另外,基于碱可溶性树脂(A)的使用量为100重量份,染料(F)的使用量可为5重量份至90重量份,较佳为10重量份至85重量份,且更佳为15重量份至80重量份。Further, the dye (F) may be used in an amount of 5 parts by weight to 90 parts by weight, preferably 10 parts by weight to 85 parts by weight, based on the amount of the alkali-soluble resin (A) used in an amount of 100 parts by weight, and more preferably 15 parts by weight. Parts by weight to 80 parts by weight.
添加剂(G):Additive (G):
在不影响本发明功效的前提下,本发明的感光性树脂组成物还可选择性进一步添加添加剂(G)。The photosensitive resin composition of the present invention may optionally further be further added with the additive (G) without affecting the efficacy of the present invention.
添加剂(G)可包括填充剂、聚合物(指上述的碱可溶性树脂(A)以外的聚合物)、密着促进剂、抗氧化剂、紫外线吸收剂、防凝集剂、热酸发生剂、具有氧杂环丁烷基的化合物、金刚烷基酯化合物或甘脲(glycoluril)衍生物等。The additive (G) may include a filler, a polymer (refer to a polymer other than the above-described alkali-soluble resin (A)), an adhesion promoter, an antioxidant, an ultraviolet absorber, an anti-agglomerating agent, a thermal acid generator, and an oxygen-containing agent. a cyclobutane compound, an adamantyl ester compound or a glycoluril derivative or the like.
填充剂的具体例包括玻璃或铝等。Specific examples of the filler include glass or aluminum and the like.
聚合物的具体例包括聚乙烯醇、聚乙二醇单烷基醚、聚氟丙烯酸烷酯或上述聚合物的组合。Specific examples of the polymer include polyvinyl alcohol, polyethylene glycol monoalkyl ether, polyfluoroalkyl acrylate or a combination of the above polymers.
密着促进剂的具体例包括乙烯基三甲氧基硅烷、乙烯基三乙氧基硅烷、乙烯基三(2-甲氧乙氧基)硅烷、N-(2-胺基乙基)-3-胺基丙基甲基二甲氧基硅烷、N-(2-胺基乙基)-3-胺基丙基三甲氧基硅烷、3-胺基丙基三乙氧基硅烷、3- 环氧丙醇丙基三甲氧基硅烷、3-环氧丙醇丙基甲基二甲氧基硅烷、2-(3,4-环氧环己基)乙基三甲氧基硅烷、3-氯丙基甲基二甲氧基硅烷、3-氯丙基三甲氧基硅烷、3-甲基丙烯氧基丙基三甲氧基硅烷、3-巯基丙基三甲氧基硅烷或上述化合物的组合。Specific examples of the adhesion promoter include vinyltrimethoxysilane, vinyltriethoxysilane, vinyltris(2-methoxyethoxy)silane, and N-(2-aminoethyl)-3-amine Propylmethyldimethoxysilane, N-(2-aminoethyl)-3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3- Glycidylpropyltrimethoxysilane, 3-glycidylpropylmethyldimethoxysilane, 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane, 3-chloropropane Methyldimethoxysilane, 3-chloropropyltrimethoxysilane, 3-methacryloxypropyltrimethoxysilane, 3-mercaptopropyltrimethoxysilane or a combination of the above compounds.
抗氧化剂的具体例包括2,2-硫代双(4-甲基-6-第三丁基苯酚)、2,6-二-第三丁基苯酚或上述化合物的组合。Specific examples of the antioxidant include 2,2-thiobis(4-methyl-6-tert-butylphenol), 2,6-di-t-butylphenol or a combination of the above compounds.
紫外线吸收剂的具体例包括2-(3-第三丁基-5-甲基-2-羟基苯基)-5-氯苯基叠氮、烷氧基苯酮(alkoxy phenone)、式(g-1)所表示的化合物或上述化合物的组合。Specific examples of the ultraviolet absorber include 2-(3-tert-butyl-5-methyl-2-hydroxyphenyl)-5-chlorophenyl azide, alkoxy phenone, and formula (g). -1) A compound represented or a combination of the above compounds.
Figure PCTCN2015092029-appb-000164
Figure PCTCN2015092029-appb-000164
在式(g-1)中,Gy表示-CH2CH2-或是-CH2CH(OH)CH2-,Gz表示氢原子或是CH3In the formula (g-1), Gy represents -CH 2 CH 2 - or -CH 2 CH(OH)CH 2 -, and Gz represents a hydrogen atom or CH 3 .
防凝集剂的具体例包括聚丙烯酸钠(sodium polyacrylate)等。Specific examples of the anti-agglomerating agent include sodium polyacrylate and the like.
热酸发生剂的具体例包括式(g-2)所表示的热酸发生剂、Irgacure 250、Irgacure 261(以上汽巴精化有限公司制造)或上述化合物的组合。Specific examples of the thermal acid generator include a thermal acid generator represented by the formula (g-2), Irgacure 250, Irgacure 261 (manufactured by Ciba Specialty Chemicals Co., Ltd.), or a combination of the above compounds.
Figure PCTCN2015092029-appb-000165
Figure PCTCN2015092029-appb-000165
式(g-2)中,nx个Gx1各自独立表示羟基、碳数为1至4的烷基、碳数为1至4的酰氧基、碳数为1至4的烷氧基羰基、碳数为7至10的芳烷氧基羰基,较佳为碳数为1至4的酰氧基(例如,乙酰氧基(CH3COO-))、碳数为1至4的烷氧基羰基(例如,甲氧基羰基(CH3O-C(=O)-O-))、或是碳数为7至10的芳烷氧基羰基(例如,芐氧羰基(PhCH2O-C(=O)-O-)),更佳为乙酰氧基;In the formula (g-2), nx each of Gx 1 independently represents a hydroxyl group, an alkyl group having 1 to 4 carbon atoms, an acyloxy group having 1 to 4 carbon atoms, an alkoxycarbonyl group having 1 to 4 carbon atoms, An aralkoxycarbonyl group having 7 to 10 carbon atoms, preferably an acyloxy group having 1 to 4 carbon atoms (for example, acetoxy (CH 3 COO - )), an alkoxy group having 1 to 4 carbon atoms a carbonyl group (for example, methoxycarbonyl (CH 3 OC(=O)-O-)) or an aralkoxycarbonyl group having a carbon number of 7 to 10 (for example, benzyloxycarbonyl (PhCH 2 OC(=O)) -O-)), more preferably an acetoxy group;
Gx2与Gx3各自独立表示碳数为1至4的烷基或芐基、较佳为Gx2或Gx3 任意其中一个是碳数为1至4的烷基(特别是甲基)则另一个为芐基,其中Gx2与Gx3中的芐基是经取代或是未经取代;Gx 2 and Gx 3 each independently represent a benzyl or alkyl having 1 to 4 group, Gx 2 is preferably any one or Gx 3 is alkyl having 1 to 4 (especially methyl) is another One is a benzyl group, wherein the benzyl group in Gx 2 and Gx 3 is substituted or unsubstituted;
An-表示BF4 -、PF6 -、AsF6 -、SbF6 -、三氟甲磺酸阴离子或双(三氟甲烷磺酰)胺阴离子;An - represents BF 4 - , PF 6 - , AsF 6 - , SbF 6 - , trifluoromethanesulfonate anion or bis(trifluoromethanesulfonyl)amine anion;
nx表示0至5的整数。Nx represents an integer from 0 to 5.
较佳的,式(g-2)所表示的热酸发生剂可为式(g-2-1)所表示的热酸发生剂。Preferably, the thermal acid generator represented by the formula (g-2) may be a thermal acid generator represented by the formula (g-2-1).
Figure PCTCN2015092029-appb-000166
Figure PCTCN2015092029-appb-000166
式(g-2-1)中,Gx4表示碳数为1至4的烷基或是芐基,较佳为碳数为1至4的烷基且较佳为甲基,Gx5表示氢原子或是碳数为1至4的烷基,且较佳为氢原子,Gx6表示碳数为1至4的烷基或是芐基,且较佳为芐基,且Gx6表示芐基时,其可经取代或是未经取代,Gx7表示碳数为1至4的烷基,且较佳为甲基。In the formula (g-2-1), Gx 4 represents an alkyl group having 1 to 4 carbon atoms or a benzyl group, preferably an alkyl group having 1 to 4 carbon atoms and preferably a methyl group, and Gx 5 represents hydrogen. The atom is preferably an alkyl group having 1 to 4 carbon atoms, and preferably a hydrogen atom, and Gx 6 represents an alkyl group having 1 to 4 carbon atoms or a benzyl group, and preferably a benzyl group, and Gx 6 represents a benzyl group. When it is substituted or unsubstituted, Gx 7 represents an alkyl group having 1 to 4 carbon atoms, and is preferably a methyl group.
上述式(g-2)所表示的热酸发生剂的较佳具体例包括,4-乙酰氧基苯基二甲基锍阳离子、4-羟基苯基芐基甲基锍阳离子、4-乙酰氧基苯基芐基甲基锍阳离子、4-甲氧基羰基苯基、芐基甲基锍阳离子、4-羟基苯基二芐基锍阳离子或4-乙酰氧基苯基二芐基锍阳离子与PF6 -、SBF6 -、三氟甲磺酸阴离子或双(三氟甲烷磺酰)胺阴离子所形成的盐类;San-aid(注册商标)SI-60L、SI-80L、SI-100L、SI-110L、SI-145、SI-150、SI160、SI180L以及SI-250(三新化学工业制)、Adeka Optomer SP-170、SP-172(ADEKA制)。Preferable specific examples of the thermal acid generator represented by the above formula (g-2) include a 4-acetoxyphenyldimethylhydrazine cation, a 4-hydroxyphenylbenzylmethylphosphonium cation, and a 4-acetoxy group. Phenylbenzylbenzylphosphonium cation, 4-methoxycarbonylphenyl, benzylmethylphosphonium cation, 4-hydroxyphenyldibenzylphosphonium cation or 4-acetoxyphenyldibenzylphosphonium cation Salts formed by PF 6 - , SBF 6 - , trifluoromethanesulfonate anion or bis(trifluoromethanesulfonyl)amine anion; San-aid (registered trademark) SI-60L, SI-80L, SI-100L, SI-110L, SI-145, SI-150, SI160, SI180L, and SI-250 (manufactured by Sanshin Chemical Industry Co., Ltd.), Adeka Optomer SP-170, and SP-172 (manufactured by ADEKA).
具有氧杂环丁烷基的化合物的具体例包括商品名OXT-121、OXT-213、OXT-221、OXT-101、OXT-212(以上东亚合成有限公司制造)等。Specific examples of the compound having an oxetane group include trade names OXT-121, OXT-213, OXT-221, OXT-101, OXT-212 (manufactured by Toagosei Co., Ltd.) and the like.
金刚烷基酯化合物具有(g-3)所表示的结构。 The adamantyl ester compound has a structure represented by (g-3).
Figure PCTCN2015092029-appb-000167
Figure PCTCN2015092029-appb-000167
式(g-3)中,Ga1表示-O-CO-CH=CH2或是-O-CO-C(CH3)=CH2、Ga2表示碳数为1至6的烷基、gm表示1至3的整数、gn表示0至4的整数,且上述金刚烷骨架中的其中一个碳原子与Ga1以及Ga2结合,或是与两个Ga1或是两个Ga2结合。In the formula (g-3), Ga 1 represents -O-CO-CH=CH 2 or -O-CO-C(CH 3 )=CH 2 , and Ga 2 represents an alkyl group having a carbon number of 1 to 6, gm. An integer of 1 to 3, gn represents an integer of 0 to 4, and one of the carbon atoms in the adamantane skeleton is bonded to Ga 1 and Ga 2 or to two Ga 1 or two Ga 2 .
较佳地,所述金刚烷基酯化合物具有式(g-3-1)所表示的2-金刚烷基(甲基)丙烯酸酯或是具有式(g-3-2)所表示的1-金刚烷基(甲基)丙烯酸酯。Preferably, the adamantyl ester compound has 2-adamantyl (meth) acrylate represented by formula (g-3-1) or 1- represented by formula (g-3-2) Adamantyl (meth) acrylate.
Figure PCTCN2015092029-appb-000168
Figure PCTCN2015092029-appb-000168
式(g-3-1)中,Ga3表示氢原子或甲基、Ga4表示氢原子或碳数为1至6的烷基。In the formula (g-3-1), Ga 3 represents a hydrogen atom or a methyl group, and Ga 4 represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms.
Figure PCTCN2015092029-appb-000169
Figure PCTCN2015092029-appb-000169
式(g-3-2)中,Ga5表示氢原子或甲基。In the formula (g-3-2), Ga 5 represents a hydrogen atom or a methyl group.
金刚烷基酯化合物的具体例包括2-甲基-2-金刚烷基丙烯酸酯、2-乙基-2-金刚烷基丙烯酸酯、2-甲基-2-金刚烷基甲基丙烯酸酯、2-乙基-2-金刚烷基甲基丙烯酸酯、2-丙基-2-金刚烷基丙烯酸酯以及2-丁基-2-金刚烷基丙烯酸酯等 化合物。Specific examples of the adamantyl ester compound include 2-methyl-2-adamantyl acrylate, 2-ethyl-2-adamantyl acrylate, 2-methyl-2-adamantyl methacrylate, 2-ethyl-2-adamantyl methacrylate, 2-propyl-2-adamantyl acrylate, 2-butyl-2-adamantyl acrylate, etc. Compound.
甘脲(glycoluril)衍生物具有下式(g-4)所表示的结构。The glycoluril derivative has a structure represented by the following formula (g-4).
Figure PCTCN2015092029-appb-000170
Figure PCTCN2015092029-appb-000170
在式(g-4)中:Gb表示氢原子、经取代或未经取代的碳数为1至20的烃基及酰基所组成的群;Gb可为相同或不同;Gc是选自由氢原子、经取代或未经取代的碳数为1至15的烃基、酰基及硝基所组成的群;Gc可为相同或不同;s表示0、1或2;以及In the formula (g-4): Gb represents a hydrogen atom, a substituted or unsubstituted hydrocarbon group having 1 to 20 carbon atoms and an acyl group; Gb may be the same or different; Gc is selected from a hydrogen atom, a substituted or unsubstituted group of hydrocarbon groups having 1 to 15 carbon atoms, an acyl group and a nitro group; Gc may be the same or different; s represents 0, 1 or 2;
Gd1表示
Figure PCTCN2015092029-appb-000171
其中,Gd2表示氢原子或碳数为1
Gd 1 means
Figure PCTCN2015092029-appb-000171
Wherein, Gd 2 represents a hydrogen atom or a carbon number of 1
至4的烷基。An alkyl group to 4.
上述甘脲衍生物的特点为在双环系统中,至少2个缩水甘油基各别在环系统中的氮-取代位置上,其中,该2个缩水甘油基的取代位置如式(g-4)所示,亦即2个缩水甘油基是各别键结在同一五元环的氮-取代位置(1,3-位)。另外,具有式(g-4)结构的化合物也包含2个缩水甘油基各别键结在两个五元环的氮-取代位置(1,5-位或1,7-位)。且,具有式(g-4)结构的化合物也可包含具有3个缩水甘油基,该3个缩水甘油基各别键结在两个五元环的氮-取代位置(1,3,5-位或1,3,7-位)。且,具有式(g-4)结构的化合物也可包含具有4个缩水甘油基,该4个缩水甘油基各别键结在两个五元环的氮-取代位置(1,3,5,7-位)。The above-mentioned glycoluril derivative is characterized in that in the bicyclic system, at least two glycidyl groups are each in a nitrogen-substituted position in the ring system, wherein the substitution positions of the two glycidyl groups are as in the formula (g-4) As shown, the two glycidyl groups are each a nitrogen-substituted position (1,3-position) bonded to the same five-membered ring. Further, the compound having the structure of the formula (g-4) also contains two glycidyl groups each bonded to the nitrogen-substituted position (1,5-position or 1,7-position) of the two five-membered rings. Further, the compound having the structure of the formula (g-4) may also contain 3 glycidyl groups which are each bonded at the nitrogen-substituted position of the two five-membered rings (1, 3, 5- Bit or 1, 3, 7-bit). Further, the compound having the structure of the formula (g-4) may also contain 4 glycidyl groups each bonded to the nitrogen-substituted position of the two five-membered rings (1, 3, 5, 7-bit).
式(g-4)中,Gb是选自由氢原子、经取代或未经取代的碳数1至20的烃基及酰基所组成的群。较佳地,Gb的碳数为1至15;更佳地,Gb的碳数为 1至12。Gb的碳数小于上述碳数亦可,例如:Gb的碳数为10、8或4。上述数值也适用于未经取代的Gb。当该上述烃基系经取代,则更多碳数可导入至Gb,其中针对上述烃基说明如下。此处针对烃基的说明也适用于酰基。In the formula (g-4), Gb is a group selected from a hydrogen atom, a substituted or unsubstituted hydrocarbon group having 1 to 20 carbon atoms, and an acyl group. Preferably, Gb has a carbon number of from 1 to 15; more preferably, the carbon number of Gb is 1 to 12. The carbon number of Gb may be smaller than the above carbon number. For example, the carbon number of Gb is 10, 8, or 4. The above values also apply to unsubstituted Gb. When the above hydrocarbon group is substituted, more carbon number can be introduced to Gb, wherein the above hydrocarbon group is explained below. The description herein for the hydrocarbyl group also applies to the acyl group.
上述Gb的烃基可为包含上述碳数1至20的直链状和/或分支状烷基及烯基;芳基亦可。根据本发明的定义,烃基可包含狭义的芳香基,即单独由一芳香环系统构成的烷芳基(alkaryl)或芳烷基(aralkyl)。当Gb表示芳基、芳烷基或烷芳基时,其较佳具体例可包含但不限于苯基、芐基、甲苯基、二甲苯基或上述的同族化合物。The hydrocarbon group of the above Gb may be a linear or/or branched alkyl group and an alkenyl group having the above carbon number of 1 to 20; and an aryl group may also be used. According to the definition of the invention, the hydrocarbyl group may comprise a narrowly defined aromatic group, i.e. an alkaryl or aralkyl consisting solely of an aromatic ring system. When Gb represents an aryl group, an aralkyl group or an alkylaryl group, preferred examples thereof may include, but are not limited to, a phenyl group, a benzyl group, a tolyl group, a xylyl group or a homologous compound as described above.
此外,上述Gb也可为环烷基或环烯基,该环烷基或环烯基也包含具有经取代的环烷基或环烯基。另一方面,Gb表示饱和或部分饱和的环状基时,较佳为环戊基、环己基及其衍生物。再一方面,Gb表示杂环状基时,较佳为含有O、N和/或S的环化合物。上述的环系统较佳为具有1个、2个或3个杂原子,或为饱合、不饱合或芳香族的环状基。Further, the above Gb may also be a cycloalkyl group or a cycloalkenyl group, and the cycloalkyl group or cycloalkenyl group also has a substituted cycloalkyl group or a cycloalkenyl group. On the other hand, when Gb represents a saturated or partially saturated cyclic group, a cyclopentyl group, a cyclohexyl group and a derivative thereof are preferred. In another aspect, when Gb represents a heterocyclic group, a ring compound containing O, N and/or S is preferred. The above ring system preferably has one, two or three heteroatoms or is a saturated, unsaturated or aromatic cyclic group.
视需要,该Gb可进一步具有其它取代基,其较佳具体例为卤素、烷氧基、酰基或酰氧基,其中,卤素以氯和/或溴为较佳。The Gb may further have other substituents, preferably a halogen, an alkoxy group, an acyl group or an acyloxy group, wherein the halogen is preferably chlorine or/or bromine.
当Gb进一步含有烃基取代基时,较佳地,该取代基的碳数不超过10个,更佳为不超过8个;尤佳为不超过6个;特佳为不超过4个。烃基取代基包含但不限于含卤素、烷氧基等取代基的芳基、芳烷基、烷芳基、环烷基和/或烷基。另外也包含前述的杂环系,例如含杂原子数1至3的杂环系。When Gb further contains a hydrocarbyl substituent, preferably, the substituent has no more than 10 carbon atoms, more preferably no more than 8, more preferably no more than 6, and particularly preferably no more than 4. The hydrocarbyl substituent includes, but is not limited to, an aryl group, an aralkyl group, an alkylaryl group, a cycloalkyl group, and/or an alkyl group having a substituent such as a halogen or an alkoxy group. Further, the above heterocyclic ring system is also contained, for example, a heterocyclic ring system having a hetero atom number of 1 to 3.
具有式(g-4)结构的化合物中,Gb在不考虑取代基存在的情况下的全部碳原子数为不超过12个;较佳为不超过10个;更佳为不超过8个;尤佳为不超过4个或6个。上述全部碳原子数的数值也适用于含有取代基的Gb。In the compound having the structure of the formula (g-4), the total number of carbon atoms of Gb in the presence of the substituent is not more than 12; preferably not more than 10; more preferably not more than 8; Good for no more than 4 or 6. The above numerical values of the number of carbon atoms are also applicable to Gb containing a substituent.
视需要,Gc不为氢原子时,则可为相同或不同的烃基。较佳地,各别烃基的碳原子数不超过12个;更佳地为不超过10个或8个;尤佳为不超过6个或4个。有关Gb的叙述也适用于Gc。If Gc is not a hydrogen atom, if desired, it may be the same or different hydrocarbon group. Preferably, the respective hydrocarbon groups have no more than 12 carbon atoms; more preferably no more than 10 or 8; more preferably no more than 6 or 4. The description of Gb also applies to Gc.
根据Gc的烃基可为含有上述碳数1至15的直链状和/或分支状的烷基及烯基等;芳基亦可。有关Gb的叙述也适用于Gc,故该芳基也包含烷芳基或芳烷基而Gb中关于环烷基、环烯基及杂环基的叙述亦适用于Gc。The hydrocarbon group of Gc may be a linear or/or branched alkyl group and an alkenyl group having the above carbon number of 1 to 15, and the aryl group may be used. The description about Gb also applies to Gc, so the aryl group also contains an alkaryl group or an aralkyl group, and the description about a cycloalkyl group, a cycloalkenyl group and a heterocyclic group in Gb also applies to Gc.
较佳地,该Gc上的取代基为卤素、羟基、胺基、N-取代胺基、巯基、烷巯基、芳巯基、烷氧基、芳氧基和/或酰氧基等。该Gc上可具有上述一个 或多个取代基。较佳地,Gc上具有1至3个取代基;更佳地,Gc具有经取代或未经取代的烷基,而Gb中关于该数值的限定的定义可适用于Gc。Preferably, the substituent on the Gc is a halogen, a hydroxyl group, an amine group, an N-substituted amine group, a decyl group, an alkyl group, an aryl group, an alkoxy group, an aryloxy group and/or an acyloxy group. The Gc can have the above one Or multiple substituents. Preferably, Gc has from 1 to 3 substituents; more preferably, Gc has a substituted or unsubstituted alkyl group, and a defined definition of this value in Gb is applicable to Gc.
甘脲衍生物的较佳具体例包含表1所示的N,N'-二缩水甘油基甘脲。Preferred specific examples of the glycoluril derivative include N,N'-diglycidylglycolide shown in Table 1.
表1:Table 1:
Figure PCTCN2015092029-appb-000172
Figure PCTCN2015092029-appb-000172
Figure PCTCN2015092029-appb-000173
Figure PCTCN2015092029-appb-000173
其中,-表示氢原子。Wherein - represents a hydrogen atom.
基于碱可溶性树脂(A)的使用量为100重量份,添加剂(G)的使用量为0.1重量份至10重量份,较佳为0.3重量份至7重量份,且更佳为0.5重量份至4重量份。The additive (G) is used in an amount of from 0.1 part by weight to 10 parts by weight, based on the amount of the alkali-soluble resin (A), preferably from 0.3 part by weight to 7 parts by weight, and more preferably from 0.5 part by weight to more preferably 0.5 part by weight. 4 parts by weight.
<感光性树脂组成物的制备方法><Method for Preparing Photosensitive Resin Composition>
可用来制备感光性树脂组成物的方法例如:将碱可溶性树脂(A)、具有乙烯性不饱和基的化合物(B)、光起始剂(C)、溶剂(D)以及颜料(E)放置于搅拌器中搅拌,使其均匀混合成溶液状态,必要时亦可添加染料(F)以及添加剂(G),予以均匀混合后,便可获得溶液状态的感光性树脂组成物。A method which can be used for preparing a photosensitive resin composition, for example, placing an alkali-soluble resin (A), a compound having an ethylenically unsaturated group (B), a photoinitiator (C), a solvent (D), and a pigment (E) The mixture is stirred in a stirrer to be uniformly mixed into a solution state, and if necessary, a dye (F) and an additive (G) may be added and uniformly mixed to obtain a photosensitive resin composition in a solution state.
又,感光性树脂组成物的制备方法没有特别的限制。感光性树脂组成物的制备方法例如是先将一部分的碱可溶性树脂(A)及具有乙烯性不饱和基的化合物(B)分散于一部分的溶剂(D)中,以形成分散溶液;并且接着混合其余的碱可溶性树脂(A)、具有乙烯性不饱和基的化合物(B)、光起始剂(C)、溶剂(D)、颜料(E)来制备。Further, the method for preparing the photosensitive resin composition is not particularly limited. The photosensitive resin composition is prepared by, for example, dispersing a part of the alkali-soluble resin (A) and the compound (B) having an ethylenically unsaturated group in a part of the solvent (D) to form a dispersion solution; and then mixing The remaining alkali-soluble resin (A), the compound (B) having an ethylenically unsaturated group, the photoinitiator (C), the solvent (D), and the pigment (E) are prepared.
或者,感光性树脂组成物也可以是由先将一部分的颜料(E)分散于一部分的溶剂(D),以形成颜料分散液后;并且混合其余的颜料(E)、碱可溶性树脂(A)、具有乙烯性不饱和基的化合物(B)、光起始剂(C)、溶剂(D)来制备。又,上述颜料(E)的分散步骤可通过例如珠磨机(beads mill)或辊磨机(roll mill)等混合器混合来进行。 Alternatively, the photosensitive resin composition may be obtained by dispersing a part of the pigment (E) in a part of the solvent (D) to form a pigment dispersion liquid; and mixing the remaining pigment (E) and the alkali-soluble resin (A). The compound (B) having an ethylenically unsaturated group, a photoinitiator (C), and a solvent (D) are prepared. Further, the dispersion step of the above pigment (E) can be carried out by mixing with a mixer such as a beads mill or a roll mill.
<像素层与彩色滤光片的制造方法><Method of Manufacturing Pixel Layer and Color Filter>
彩色滤光片是由感光性组成物依序在上面已形成黑色矩阵的基板上施予预烤、曝光、显影及曝后烤处理而制得,其中黑色矩阵用以隔离各像素层。以下详述彩色滤光片的制备方法。The color filter is prepared by sequentially pre-baking, exposing, developing, and post-baking the photosensitive composition on the substrate on which the black matrix has been formed, wherein the black matrix is used to isolate each pixel layer. The preparation method of the color filter will be described in detail below.
首先,通过旋转涂布或流延涂布或辊式涂布等涂布方式,在基板上均匀地涂布溶液状态的彩色滤光片用感光性树脂组成物,以形成涂膜。上述基板例如是用于液晶显示装置的无碱玻璃、钠钙玻璃、硬质玻璃(派勒斯玻璃)、石英玻璃,以及附着有透明导电膜的此等玻璃等;用于光电变换装置(如固体摄影装置)的基板(如:硅基板);或事先形成有能隔离红、绿、蓝等像素层的遮光用黑色矩阵(black matrix)的基板。First, a photosensitive resin composition for a color filter in a solution state is uniformly applied onto a substrate by a coating method such as spin coating or cast coating or roll coating to form a coating film. The substrate is, for example, an alkali-free glass, a soda-lime glass, a hard glass (Pyles glass), a quartz glass, and the like to which a transparent conductive film is attached, which is used for a liquid crystal display device; A substrate (for example, a silicon substrate) of a solid-state imaging device; or a substrate having a black matrix for shielding light that can separate pixel layers such as red, green, and blue.
形成涂膜之后,以减压干燥的方式去除大部分溶剂,然后以预烤方式将残余的溶剂完全去除,以形成预烤涂膜。值得注意的是,减压干燥及预烤的条件,依各成分的种类、比率而改变。一般而言,减压干燥是在0毫米汞柱至200毫米汞柱的压力下进行1秒至60秒,并且预烤乃在70℃至110℃温度下对涂膜进行1分钟至15分钟的加热处理。After the coating film is formed, most of the solvent is removed by drying under reduced pressure, and then the residual solvent is completely removed by pre-baking to form a pre-baked coating film. It is worth noting that the conditions of drying under reduced pressure and pre-baking vary depending on the type and ratio of each component. In general, the vacuum drying is performed at a pressure of 0 mmHg to 200 mmHg for 1 second to 60 seconds, and the prebaking is performed at a temperature of 70 ° C to 110 ° C for 1 minute to 15 minutes. Heat treatment.
接着,以具有特定图案的光罩对上述预烤涂膜进行曝光。在曝光过程中所使用的光线例如是g线、h线或i线等的紫外线为佳,而紫外线照射装置可为(超)高压水银灯或金属卤素灯。Next, the prebaked coating film is exposed by a photomask having a specific pattern. The light used in the exposure process is preferably ultraviolet light such as g-line, h-line or i-line, and the ultraviolet irradiation device may be a (ultra) high-pressure mercury lamp or a metal halide lamp.
然后,在23±2℃的温度下,将上述经曝光的预烤涂膜浸渍于显影液中,以去除预烤涂膜的不需要的部分,藉此可在基板上形成特定的图案。显影液的具体例包括氢氧化钠、氢氧化钾、碳酸钠、碳酸氢钠、碳酸钾、碳酸氢钾、硅酸钠、甲基硅酸钠、氨水、乙胺、二乙胺、二甲基乙醇胺、氢氧化四甲铵、氢氧化四乙铵、胆碱、吡咯、呱啶或1,8-二氮杂二环-(5.4.0)-7-十一烯等碱性化合物的碱性水溶液。显影液的浓度为0.001重量%至10重量%,较佳为0.005重量%至5重量%,且更佳为0.01重量%至1重量%。Then, the exposed prebaked coating film is immersed in a developing solution at a temperature of 23 ± 2 ° C to remove an unnecessary portion of the prebaked coating film, whereby a specific pattern can be formed on the substrate. Specific examples of the developing solution include sodium hydroxide, potassium hydroxide, sodium carbonate, sodium hydrogencarbonate, potassium carbonate, potassium hydrogencarbonate, sodium silicate, sodium methyl silicate, ammonia water, ethylamine, diethylamine, dimethyl Basicity of basic compounds such as ethanolamine, tetramethylammonium hydroxide, tetraethylammonium hydroxide, choline, pyrrole, acridine or 1,8-diazabicyclo-(5.4.0)-7-undecene Aqueous solution. The concentration of the developer is from 0.001% by weight to 10% by weight, preferably from 0.005% by weight to 5% by weight, and more preferably from 0.01% by weight to 1% by weight.
在预烤涂膜经显影之后,将具有特定的图案的基板以水洗净,再以压缩空气或压缩氮气将上述特定的图案风干。然后,以热板或烘箱等加热装置进行后烤处理(post-bake)(即加热处理)。后烤温度为100℃至280℃,且加热时间为1分钟至15分钟,以去除涂膜中的挥发成分并使未反应的乙烯性不饱和双键进行热硬化反应。经过上述的处理步骤后,即可在基板上固定特定的图 案,藉此形成像素层。重复上述步骤,依序在基板上成形红、绿、蓝等像素层。After the prebaked coating film is developed, the substrate having the specific pattern is washed with water, and the above specific pattern is air-dried with compressed air or compressed nitrogen. Then, post-bake (i.e., heat treatment) is performed by a heating device such as a hot plate or an oven. The post-baking temperature is from 100 ° C to 280 ° C, and the heating time is from 1 minute to 15 minutes to remove volatile components in the coating film and to carry out a thermosetting reaction of the unreacted ethylenically unsaturated double bond. After the above processing steps, a specific map can be fixed on the substrate. Thus, a pixel layer is formed. The above steps are repeated, and pixel layers such as red, green, and blue are sequentially formed on the substrate.
最后,在温度为220℃至250℃的真空环境下,通过溅镀在所述像素层的表面上形成ITO(氧化铟锡)保护膜(蒸镀膜)。必要时,对上述ITO保护膜施行蚀刻与布线,并且在ITO保护膜表面涂布液晶配向膜(液晶配向膜用聚酰亚胺),藉此形成具有像素层的彩色滤光片。Finally, an ITO (Indium Tin Oxide) protective film (evaporated film) was formed on the surface of the pixel layer by sputtering in a vacuum atmosphere at a temperature of 220 ° C to 250 ° C. When necessary, the ITO protective film is etched and wired, and a liquid crystal alignment film (polyimide for liquid crystal alignment film) is applied onto the surface of the ITO protective film, thereby forming a color filter having a pixel layer.
<液晶显示装置的制造方法><Method of Manufacturing Liquid Crystal Display Device>
首先,将通过上述彩色滤光片的形成方法所形成的彩色滤光片以及设置有薄膜电晶体(thin film transistor;TFT)的基板作对向配置,并且在上述两个之间设置间隙(晶胞间隔,cell gap)。接着,以粘着剂贴合彩色滤光片与上述基板的周围部分并且留下注入孔。然后,在基板表面以及粘着剂所分隔出的间隙内由注入孔注入液晶,并封住注入孔来形成液晶层。随后,通过在彩色滤光片中接触液晶层的另一侧与基板中接触液晶层的另一侧提供偏光板,以形成液晶显示元件。接着,在液晶显示元件的一侧设置面光源,以形成液晶显示装置。上述所使用的液晶,即液晶化合物或液晶组成物,此处并未特别限定,惟可使用任何一种液晶化合物及液晶组成物。First, a color filter formed by the above-described method of forming a color filter and a substrate provided with a thin film transistor (TFT) are disposed oppositely, and a gap (cell) is provided between the two Interval, cell gap). Next, the color filter is attached to the peripheral portion of the above substrate with an adhesive and the injection hole is left. Then, liquid crystal is injected from the injection hole in the gap between the surface of the substrate and the adhesive, and the injection hole is sealed to form a liquid crystal layer. Subsequently, a polarizing plate is provided by contacting the other side of the liquid crystal layer in the color filter with the other side of the substrate in contact with the liquid crystal layer to form a liquid crystal display element. Next, a surface light source is provided on one side of the liquid crystal display element to form a liquid crystal display device. The liquid crystal used as the liquid crystal compound or the liquid crystal composition is not particularly limited herein, and any liquid crystal compound or liquid crystal composition can be used.
此外,在制作彩色滤光片中所使用的液晶配向膜是用来限制液晶分子的配向,并且没有特别的限制,举凡无机物或有机物任一个均可,并且本发明并不限于此。Further, the liquid crystal alignment film used in the production of the color filter is used to restrict the alignment of the liquid crystal molecules, and is not particularly limited, and any of inorganic substances or organic substances may be used, and the present invention is not limited thereto.
碱可溶性树脂(A-1)的合成例Synthesis example of alkali-soluble resin (A-1)
以下说明碱可溶性树脂(A-1)的合成例A-1-1至合成例A-1-3:Synthesis Example A-1-1 to Synthesis Example A-1-3 of the alkali-soluble resin (A-1) will be described below:
合成例A-1-1Synthesis Example A-1-1
首先,将100重量份的芴环氧化合物(型号ESF-300,新日铁化学制造;环氧当量231)、30重量份的丙烯酸、0.3重量份的氯化苄基三乙基铵、0.1重量份的2,6-二第三丁基对甲酚以及130重量份的丙二醇单甲醚醋酸酯以连续式添加方式加入至500毫升的四颈烧瓶中。入料速度控制在25重量份/分钟,并且反应过程的温度维持在100℃至110℃,反应15小时后,即可获得固成 分浓度为50重量%的淡黄色透明混合液。接着,使上述淡黄色透明混合液经受萃取、过滤及加热烘干的步骤,即可得固体成分含量为99.9重量%的化合物(A-1-1-a)。First, 100 parts by weight of a ruthenium epoxy compound (Model ESF-300, manufactured by Nippon Steel Chemical Co., Ltd.; epoxy equivalent 231), 30 parts by weight of acrylic acid, 0.3 parts by weight of benzyltriethylammonium chloride, 0.1 weight A portion of 2,6-di-t-butyl-p-cresol and 130 parts by weight of propylene glycol monomethyl ether acetate were added in a continuous manner to a 500 ml four-necked flask. The feed rate is controlled at 25 parts by weight/min, and the temperature of the reaction process is maintained at 100 ° C to 110 ° C. After 15 hours of reaction, solidification can be obtained. A pale yellow transparent mixture having a concentration of 50% by weight. Next, the pale yellow transparent mixture is subjected to a step of extraction, filtration, and heat drying to obtain a compound (A-1-1-a) having a solid content of 99.9% by weight.
接着,将1.0摩尔的化合物(A-1-1-a)、0.1摩尔的联苯四羧酸、1.4摩尔的马来酸、1.9克的氯化苄基三乙基铵、0.6克的2,6-二第三丁基对甲酚、700克的丙二醇单甲醚醋酸酯以及100克的3-乙氧基丙酸乙酯以同时添加方式加入至500毫升的四颈烧瓶中,以形成反应溶液。最后,将上述反应溶液加热至110℃,并且反应2小时,即可得酸价为125毫克KOH/克且数量平均分子量为1250的碱可溶性树脂(A-1-1)。Next, 1.0 mol of the compound (A-1-1-a), 0.1 mol of biphenyltetracarboxylic acid, 1.4 mol of maleic acid, 1.9 g of benzyltriethylammonium chloride, and 0.6 g of 2, 6-di-t-butyl-p-cresol, 700 g of propylene glycol monomethyl ether acetate, and 100 g of ethyl 3-ethoxypropionate were added to a 500-ml four-necked flask in a simultaneous manner to form a reaction. Solution. Finally, the above reaction solution was heated to 110 ° C, and reacted for 2 hours to obtain an alkali-soluble resin (A-1-1) having an acid value of 125 mg KOH/g and a number average molecular weight of 1,250.
合成例A-1-2Synthesis Example A-1-2
首先,将100重量份的芴环氧化合物(型号PG-100,大阪瓦斯制造;环氧当量259)、35重量份的甲基丙烯酸、0.3重量份的氯化苄基三乙基铵、0.1重量份的2,6-二第三丁基对甲酚以及135重量份的丙二醇单甲醚醋酸酯以连续添加方式加入至500毫升的四颈烧瓶中。入料速度控制在25重量份/分钟,并且反应过程的温度维持在100℃至110℃下,反应15小时后,即可获得固体成分含量为50重量%的淡黄色透明混合液。使上述淡黄色透明混合液经受萃取、过滤及加热烘干的步骤,即可得固体成分含量为99.9重量%的化合物(A-1-2-a)。First, 100 parts by weight of an oxime epoxy compound (Model PG-100, manufactured by Osaka Gas; epoxy equivalent 259), 35 parts by weight of methacrylic acid, 0.3 parts by weight of benzyltriethylammonium chloride, 0.1 weight A portion of 2,6-di-t-butyl-p-cresol and 135 parts by weight of propylene glycol monomethyl ether acetate were added in a continuous addition to a 500 ml four-necked flask. The feed rate was controlled at 25 parts by weight/min, and the temperature of the reaction process was maintained at 100 ° C to 110 ° C. After 15 hours of reaction, a pale yellow transparent mixture having a solid content of 50% by weight was obtained. The pale yellow transparent mixture is subjected to a step of extraction, filtration, and heat drying to obtain a compound (A-1-2-a) having a solid content of 99.9% by weight.
接着,将1.0摩尔的化合物(A-1-2-a)、2.9克的氯化苄基三乙基铵以及950克的丙二醇甲醚醋酸酯加入至500毫升的四颈烧瓶中,以形成反应溶液。接着,添加0.8摩尔的二苯甲酮四羧酸二酐并在90℃下反应2小时。然后,再添加0.8摩尔的四氢邻苯二甲酸酐(tetrahydrophthalic anhydride),并在90℃下反应4小时。经上述合成步骤,可得酸价为92毫克KOH/克,且数量平均分子量为7860的碱可溶性树脂(A-1-2)。Next, 1.0 mol of the compound (A-1-2-a), 2.9 g of benzyltriethylammonium chloride, and 950 g of propylene glycol methyl ether acetate were placed in a 500 ml four-necked flask to form a reaction. Solution. Next, 0.8 mol of benzophenonetetracarboxylic dianhydride was added and reacted at 90 ° C for 2 hours. Then, 0.8 mol of tetrahydrophthalic anhydride was further added and reacted at 90 ° C for 4 hours. Through the above synthesis step, an alkali-soluble resin (A-1-2) having an acid value of 92 mgKOH/g and a number average molecular weight of 7,860 can be obtained.
合成例A-1-3Synthesis Example A-1-3
将1.0莫耳的化合物(A-1-2-a)、2.5克的氯化苄基三乙基铵以及900克的丙二醇甲醚醋酸酯加入至500毫升的四颈烧瓶中,以形成反应溶液。添加0.5莫耳的二苯甲酮四羧酸二酐并在90℃下反应2小时。然后,再添加1.0莫 耳的四氢邻苯二甲酸酐(tetrahydrophthalic anhydride),并在90℃下反应4小时。经上述合成步骤,可得酸价为100毫克KOH/克,且数量平均分子量为4250的碱可溶性树脂(A-1-3)。1.0 mol of the compound (A-1-2-a), 2.5 g of benzyltriethylammonium chloride, and 900 g of propylene glycol methyl ether acetate were added to a 500 ml four-necked flask to form a reaction solution. . 0.5 mol of benzophenone tetracarboxylic dianhydride was added and reacted at 90 ° C for 2 hours. Then add 1.0 more The ear was tetrahydrophthalic anhydride and reacted at 90 ° C for 4 hours. Through the above synthesis step, an alkali-soluble resin (A-1-3) having an acid value of 100 mgKOH/g and a number average molecular weight of 4,250 can be obtained.
碱可溶性树脂(A-2)的合成例及比较合成例Synthesis Example and Comparative Synthesis Example of Alkali Soluble Resin (A-2)
以下说明碱可溶性树脂(A-2)的合成例A-2-1至合成例A-2-7以及比较合成例A’-2-1至比较合成例A’-2-3:Synthesis Example A-2-1 to Synthesis Example A-2-7 and Comparative Synthesis Example A'-2-1 to Comparative Synthesis Example A'-2-3 of the alkali-soluble resin (A-2) will be described below:
合成例A-2-1Synthesis Example A-2-1
在一容积1000毫升的四颈锥瓶上设置氮气导入口、搅拌器、加热器、冷凝管及温度计,并导入氮气。然后,将20重量份的2-甲基丙烯酰乙氧基丁二酸酯(以下简称为HOMS)、50重量份的丙烯酸双环戊烯酯(dicyclopenteny acrylate,以下简称为FA-511A)、30重量份的甲基丙烯酸苯甲酯(以下简称为BzMA)溶解于100重量份的3-乙氧基丙酸乙酯(以下简称为EEP)中,其中单体混合物入料的方式为连续添加,并予搅拌均匀混合后,同时将该四颈锥瓶的油浴温度提升至100℃,然后,将10重量份的聚合起始剂2,2’-偶氮双-2-甲基丁腈(以下简称为AMBN)溶解于100重量份的EEP中,并分成二等份量,每间隔一小时添加一等份量到该四颈锥瓶中。整个聚合过程的反应温度维持在100℃,聚合时间持续3小时,聚合完成后,将聚合产物自该四颈锥瓶中取出,并把溶剂脱挥,便可得该碱可溶性树脂(A-2-1)。A nitrogen inlet, a stirrer, a heater, a condenser, and a thermometer were placed on a 1000-ml four-necked flask and nitrogen was introduced. Then, 20 parts by weight of 2-methacryloyloxy succinate (hereinafter abbreviated as HOMS), 50 parts by weight of dicyclopenteny acrylate (hereinafter abbreviated as FA-511A), 30 parts by weight a portion of benzyl methacrylate (hereinafter abbreviated as BzMA) is dissolved in 100 parts by weight of ethyl 3-ethoxypropionate (hereinafter referred to as EEP), wherein the monomer mixture is fed in a continuous manner, and After uniformly mixing with stirring, the oil bath temperature of the four-necked flask was simultaneously raised to 100 ° C, and then 10 parts by weight of a polymerization initiator 2,2'-azobis-2-methylbutyronitrile (hereinafter It is abbreviated as AMBN) and dissolved in 100 parts by weight of EEP, and divided into two equal portions, and an aliquot is added to the four-necked flask every one hour. The reaction temperature of the whole polymerization process is maintained at 100 ° C, and the polymerization time is maintained for 3 hours. After the polymerization is completed, the polymerization product is taken out from the four-necked flask, and the solvent is devolatilized to obtain the alkali-soluble resin (A-2). -1).
合成例A-2-2至合成例A-2-7以及比较合成例A’-2-1至比较合成例A’-2-3Synthesis Example A-2-2 to Synthesis Example A-2-7 and Comparative Synthesis Example A'-2-1 to Comparative Synthesis Example A'-2-3
合成例A-2-2至合成例A-2-7以及比较合成例A’-2-1至比较合成例A’-2-3的碱可溶性树脂是以与合成例A-2-1相同的步骤来制备,并且其不同处在于各合成例及比较合成例的成分种类及其使用量、反应时间、以及反应温度,如表2所示。 The alkali-soluble resins of Synthesis Example A-2-2 to Synthesis Example A-2-7 and Comparative Synthesis Example A'-2-1 to Comparative Synthesis Example A'-2-3 were the same as Synthesis Example A-2-1. The steps were prepared, and the difference was in the composition types of the respective synthesis examples and comparative synthesis examples, the amounts thereof used, the reaction time, and the reaction temperature, as shown in Table 2.
表2中的简称所对应的化合物如下所示。The compounds corresponding to the abbreviations in Table 2 are as follows.
Figure PCTCN2015092029-appb-000174
Figure PCTCN2015092029-appb-000174
Figure PCTCN2015092029-appb-000175
Figure PCTCN2015092029-appb-000175
染料(F-1)的合成例Synthesis example of dye (F-1)
以下说明染料(F-1)的合成例F-1-1至合成例F-1-3:The synthesis example F-1-1 of the dye (F-1) to the synthesis example F-1-3 will be described below:
合成例F-1-1Synthesis Example F-1-1
在18质量份的碱性紫10(basic violet 10)中加入170质量份的无水氯仿、1.0质量份的樟脑磺酸、1.4质量份的4-(N,N-二甲基胺基)吡啶以及18质量份的甲基丙烯酸2-羟乙酯,并搅拌约30分钟。其后,缓慢加入在10.5质量份的1-乙基-3-(3-二甲基胺基丙基)碳二酰亚胺盐酸盐中加入47质量份的无水氯仿并预先溶解而成的溶液后,在室温搅拌约2小时。用150质量份的1N盐酸水溶液进行2次分液操作之后,用150质量份的10%食盐水清洗有机层2次。接着,加入43质量份的无水硫酸镁搅拌约30分钟后,过滤干燥剂、馏去溶剂,即可获得20.6质量份的由式(F-1-1)表示的化合物(以下简称为染料F-1-1)。170 parts by mass of anhydrous chloroform, 1.0 part by mass of camphorsulfonic acid, and 1.4 parts by mass of 4-(N,N-dimethylamino)pyridine were added to 18 parts by mass of basic violet 10 (basic violet 10). And 18 parts by mass of 2-hydroxyethyl methacrylate, and stirred for about 30 minutes. Thereafter, 47 parts by mass of anhydrous chloroform was added to 10.5 parts by mass of 1-ethyl-3-(3-dimethylaminopropyl)carbodiimide hydrochloride and dissolved in advance. After the solution, it was stirred at room temperature for about 2 hours. After two times of liquid separation operation using 150 parts by mass of 1N aqueous hydrochloric acid solution, the organic layer was washed twice with 150 parts by mass of 10% saline. Then, after adding 43 parts by mass of anhydrous magnesium sulfate and stirring for about 30 minutes, the desiccant was filtered off, and the solvent was distilled off to obtain 20.6 parts by mass of a compound represented by the formula (F-1-1) (hereinafter referred to as dye F). -1-1).
Figure PCTCN2015092029-appb-000176
Figure PCTCN2015092029-appb-000176
合成例F-1-2Synthesis Example F-1-2
在放入了搅拌子的500mL三角烧瓶中装入20质量份的染料F-1-1及14.5质量份的双(三氟甲磺酰基)酰亚胺锂、添加130质量份的氯仿和100质量份的离子交换水,接着在室温搅拌约2小时。其后,分离除去水层,用200质量份的离子交换水清洗有机层2次。在减压下将有机层浓缩后,在50℃对残渣减压干燥12小时,即可获得26.6质量份的由式(F-1-2)表示的化合物(以下简称为染料F-1-2)。 20 parts by mass of dye F-1-1 and 14.5 parts by mass of lithium bis(trifluoromethanesulfonyl)imide were added to a 500 mL Erlenmeyer flask to which a stir bar was placed, 130 parts by mass of chloroform and 100 masses were added. A portion of the ion-exchanged water was then stirred at room temperature for about 2 hours. Thereafter, the aqueous layer was separated and removed, and the organic layer was washed twice with 200 parts by mass of ion-exchanged water. After concentrating the organic layer under reduced pressure, the residue was dried under reduced pressure at 50 ° C for 12 hours to obtain 26.6 parts by mass of a compound represented by formula (F-1-2) (hereinafter referred to as dye F-1-2). ).
Figure PCTCN2015092029-appb-000177
Figure PCTCN2015092029-appb-000177
合成例F-1-3Synthesis Example F-1-3
在合成例F-1-2中使用四氰基硼酸钾代替双(三氟甲磺酰基)酰亚胺锂,除此之外,以与合成例F-1-2相同的方式合成染料F-1-3。The dye F- was synthesized in the same manner as in Synthesis Example F-1-2 except that potassium tetracyanoborate was used instead of lithium bis(trifluoromethanesulfonyl)imide in Synthesis Example F-1-2. 1-3.
感光性树脂组成物的实施例与比较例Example and Comparative Example of Photosensitive Resin Composition
以下说明感光性树脂组成物及膜的实施例1至实施例13以及比较例1至比较例10:Hereinafter, Examples 1 to 13 and Comparative Examples 1 to 10 of the photosensitive resin composition and film will be described:
实施例1Example 1
将80重量份的碱可溶性树脂A-1-1、20重量份的碱可溶性树脂A-2-1、60重量份的二季戊四醇六丙烯酸酯(简称为B-2-1)、15重量份的由式(1-10)所表示的光起始剂(简称为C-1-2)、15重量份的1-[9-乙基-6-(2-甲基苯酰基)-9H-咔唑-3-取代基]-乙烷酮-1-(O-乙酰基肟)(简称为C-2-1)、50重量份的C.I.颜料红254(C.I.Pigment R254)(简称为E-2)以及15重量份的CI酸性红91(简称为F-2-2)加入800重量份的丙二醇甲醚醋酸酯(简称为D-1)中,并且以摇动式搅拌器搅拌均匀后,即可制得实施例1的感光性树脂组成物。80 parts by weight of the alkali-soluble resin A-1-1, 20 parts by weight of the alkali-soluble resin A-2-1, 60 parts by weight of dipentaerythritol hexaacrylate (abbreviated as B-2-1), and 15 parts by weight a photoinitiator represented by formula (1-10) (abbreviated as C-1-2), 15 parts by weight of 1-[9-ethyl-6-(2-methylbenzoyl)-9H-indole Zyridin-3-substituted]-ethanone-1-(O-acetylhydrazine) (abbreviated as C-2-1), 50 parts by weight of CI Pigment Red 254 (CIPigment R254) (abbreviated as E-2) And 15 parts by weight of CI Acid Red 91 (abbreviated as F-2-2) are added to 800 parts by weight of propylene glycol methyl ether acetate (abbreviated as D-1), and after being uniformly stirred by a shaker, The photosensitive resin composition of Example 1 was obtained.
实施例2至实施例13Example 2 to Example 13
实施例2至实施例13的感光性树脂组成物是以与实施例1相同的步骤来制备,并且其不同处在于:改变感光性树脂组成物的成分种类及其使用量(如表3所示)。将所制得的膜以下列各评价方式进行评价,其结果如表3所示。The photosensitive resin compositions of Examples 2 to 13 were prepared in the same manner as in Example 1, and were different in that the composition of the photosensitive resin composition and the amount thereof were changed (as shown in Table 3). ). The obtained film was evaluated in the following evaluation manners, and the results are shown in Table 3.
比较例1至比较例10Comparative Example 1 to Comparative Example 10
比较例1至比较例10的感光性树脂组成物是以与实施例1相同的步骤来 制备,并且其不同处在于:改变感光性树脂组成物的成分种类及其使用量(如表4所示)。将所制得的膜以下列各评价方式进行评价,其结果如表4所示。The photosensitive resin compositions of Comparative Example 1 to Comparative Example 10 were the same steps as in Example 1. It was prepared and differed in that the kinds of components of the photosensitive resin composition and the amounts thereof used were changed (as shown in Table 4). The obtained film was evaluated in the following evaluation manners, and the results are shown in Table 4.
表3及表4中标号所对应的化合物如下所示。The compounds corresponding to the labels in Tables 3 and 4 are as follows.
Figure PCTCN2015092029-appb-000178
Figure PCTCN2015092029-appb-000178
Figure PCTCN2015092029-appb-000179
Figure PCTCN2015092029-appb-000179
Figure PCTCN2015092029-appb-000180
Figure PCTCN2015092029-appb-000180
评价方式Evaluation method
a.高精细度的图案直线性a. High definition pattern linearity
将实施例1至13以及比较例1至10所制得的感光性树脂组成物以旋转涂布的方式,涂布在100mm×100mm的玻璃基板上,先进行减压干燥,压力100mmHg、时间30秒钟,然后再进行预烤,温度80℃、时间3分钟,可形成膜厚2.5μm的预烤涂膜。将该预烤涂膜隔着具有25μm宽(间距(pitch)50μm)的条状图案的光罩,利用300mJ/cm2的紫外光(曝光机型号AG500-4N),藉此进行了曝光,之后浸渍于23℃的显影液1分钟及2分钟两种条件,之后以纯水洗净,再以200℃后烤80分钟,即可在玻璃基板上形成膜厚2.0μm的感光性树脂层。The photosensitive resin compositions obtained in Examples 1 to 13 and Comparative Examples 1 to 10 were applied by spin coating to a glass substrate of 100 mm × 100 mm, and dried under reduced pressure at a pressure of 100 mmHg and time 30. After a second, and then pre-baked at a temperature of 80 ° C for 3 minutes, a pre-baked film having a film thickness of 2.5 μm was formed. The prebaked coating film was exposed through a photomask having a strip pattern of 25 μm width (pitch 50 μm) by using 300 mJ/cm 2 of ultraviolet light (exposure model AG500-4N). Thereafter, the developer was immersed in a developing solution at 23° C. for 1 minute and 2 minutes, and then washed with pure water, and then baked at 200° C. for 80 minutes to form a photosensitive resin layer having a film thickness of 2.0 μm on the glass substrate.
利用光学显微镜对所述方法所形成的条状图案进行观察及评价。评价的等级如下所述:The strip pattern formed by the method was observed and evaluated by an optical microscope. The rating of the evaluation is as follows:
◎:1分钟直线性良好、2分钟直线性良好;◎: Good linearity in 1 minute and good linearity in 2 minutes;
○:1分钟直线性良好、2分钟部分直线性不良;○: The linearity was good in 1 minute, and the linearity was poor in 2 minutes;
△:1分钟部分直线性不良、2分钟直线性不良;△: Partial linearity was poor in 1 minute, and linearity was poor in 2 minutes;
╳:1分钟直线性不良、2分钟直线性不良。╳: 1 minute of poor linearity and 2 minutes of poor linearity.
b.图案平滑性b. Pattern smoothness
使用曝光机(Canon制造,型号为PLA-501F)以100毫焦耳/平方公分(mJ/cm2)的紫外光照射上述评价方式(a)的膜厚为2.5μm的预烤涂膜,再将该预烤涂膜浸渍于23℃的显影液1分钟,以纯水洗净。然后,再于235℃烘烤30分钟,即可在玻璃基板上形成膜厚2.0μm的像素层。使用原子力显微镜(Atomic Force Microscope,简称AFM)(Dimension3100,由威科仪器公司(Veeco Instruments Inc.)制造)测定像素层的表面粗糙度以评价其图案平滑性。测定面积为10μm2。表面粗糙度依据以下基准进行评价。所测得的表面粗糙度越小,表示感光性树脂组成物所形成的硬化物的表面粗糙度较低而较佳。即,表面粗糙度越低图案平滑性越佳。评价的等级如下所述:The pre-baked coating film of the above evaluation method (a) having a film thickness of 2.5 μm was irradiated with ultraviolet light of 100 mJ/cm 2 (mJ/cm 2 ) using an exposure machine (manufactured by Canon, model: PLA-501F), and then The prebaked coating film was immersed in a developing solution at 23 ° C for 1 minute, and washed with pure water. Then, by baking at 235 ° C for 30 minutes, a pixel layer having a film thickness of 2.0 μm was formed on the glass substrate. The surface roughness of the pixel layer was measured using an Atomic Force Microscope (AFM) (Dimension 3100, manufactured by Veeco Instruments Inc.) to evaluate its pattern smoothness. The measurement area was 10 μm 2 . The surface roughness was evaluated based on the following criteria. The smaller the measured surface roughness, the better the surface roughness of the cured product formed of the photosensitive resin composition is. That is, the lower the surface roughness, the better the pattern smoothness. The rating of the evaluation is as follows:
◎:表面粗糙度≤6nm◎: Surface roughness ≤ 6nm
○:6nm<表面粗糙度≤8nm ○: 6 nm < surface roughness ≤ 8 nm
△:8nm<表面粗糙度≤10nm△: 8 nm < surface roughness ≤ 10 nm
╳:10nm<表面粗糙度╳: 10nm<surface roughness
c.逸气性c. outgassing
将实施例1至13以及比较例1至10所制得的感光性树脂组成物以与上述评价方式(a)中所述相同方式进行旋转涂布、曝光及显影,接着,再于无尘烘箱(clean oven)中于230℃的氮气环境下进行1小时的加热处理。于加热后使用热脱附能谱分析仪(电子科学社制、WA1000S/W型)在220℃下加热30分钟,并从脱离出的原子量18(水)的成分量算出逸气量。评价的等级如下所述:The photosensitive resin compositions obtained in Examples 1 to 13 and Comparative Examples 1 to 10 were spin-coated, exposed, and developed in the same manner as described in the above evaluation method (a), and then, in a dust-free oven. Heat treatment was carried out for 1 hour in a clean oven at 230 ° C in a nitrogen atmosphere. After heating, it was heated at 220 ° C for 30 minutes using a thermal desorption spectrum analyzer (manufactured by Electronic Science Co., Ltd., WA1000S/W type), and the amount of outgas was calculated from the amount of the atomic weight 18 (water) which was separated. The rating of the evaluation is as follows:
◎:脱气量<10ppm。◎: The amount of degassing is <10 ppm.
○:10ppm≤脱气量<20ppm。○: 10 ppm ≤ degassing amount < 20 ppm.
△:20ppm≤脱气量<30ppm。△: 20 ppm ≤ degassing amount < 30 ppm.
╳:脱气量≥30ppm。 ╳: The amount of degassing is ≥30ppm.
表3table 3
Figure PCTCN2015092029-appb-000181
Figure PCTCN2015092029-appb-000181
表3(续)Table 3 (continued)
Figure PCTCN2015092029-appb-000182
Figure PCTCN2015092029-appb-000182
表4Table 4
Figure PCTCN2015092029-appb-000183
Figure PCTCN2015092029-appb-000183
表4(续)Table 4 (continued)
Figure PCTCN2015092029-appb-000184
Figure PCTCN2015092029-appb-000184
<评价结果><evaluation result>
由表3以及表4得知,与使用碱可溶性树脂(A-1)的感光性树脂组成物所形成的膜(实施例1至实施例13)相比,使用不含碱可溶性树脂(A-1)的感光性树脂组成物(比较例4、8、10)所形成的膜的逸气性不佳。It is understood from Tables 3 and 4 that the alkali-free resin (A- is used as compared with the film formed of the photosensitive resin composition using the alkali-soluble resin (A-1) (Examples 1 to 13). The film formed of the photosensitive resin composition of 1) (Comparative Examples 4, 8, and 10) had poor gassing properties.
再者,与使用碱可溶性树脂(A-2)的感光性树脂组成物所形成的膜(实施例1至实施例13)相比,使用不含碱可溶性树脂(A-2)的感光性树脂组成物(比较例1~3及8~10)所形成的膜的高精细度的图案直线性不佳。Further, a photosensitive resin containing no alkali-soluble resin (A-2) is used as compared with a film formed of a photosensitive resin composition using an alkali-soluble resin (A-2) (Examples 1 to 13). The high-definition pattern of the film formed by the compositions (Comparative Examples 1 to 3 and 8 to 10) had poor linearity.
另外,与使用含有光起始剂(C-1)的感光性树脂组成物所形成的膜(实施例1至实施例13)相比,使用不含有光起始剂(C-1)的感光性树脂组成物所形成的膜(比较例7、9、10)所形成的膜的图案平滑性不佳。Further, a photosensitive film containing no photoinitiator (C-1) was used as compared with a film formed using a photosensitive resin composition containing a photoinitiator (C-1) (Examples 1 to 13). The film formed of the film (Comparative Examples 7, 9, 10) formed of the resin composition had poor pattern smoothness.
另外,当所述碱可溶性树脂(A-1)与所述碱可溶性树脂(A-2)的使用量的重量比值范围(A-1)/(A-2)在5/95至95/5的范围外时((比较例5、6),所形成的膜的高精细度的图案直线性不佳及逸气性不佳。Further, when the ratio of the weight ratio of the alkali-soluble resin (A-1) to the alkali-soluble resin (A-2) is (A-1) / (A-2) is 5/95 to 95/5 When the range is outside (Comparative Examples 5 and 6), the formed film has a high-definition pattern with poor linearity and poor gassing properties.
综上所述,本发明的感光性树脂组成物由于包括碱可溶性树脂(A-1)、碱可溶性树脂(A-2)以及特定结构的光起始剂(C-1),且碱可溶性树脂(A-1)与碱可溶性树脂(A-2)的使用量的重量比值范围(A-1)/(A-2)在5/95至95/5之间,因此可以改善高精细度的图案直线性不佳、图案平滑性不佳以及高逸气性等问题,进而适用于彩色滤光片以及液晶显示装置。As described above, the photosensitive resin composition of the present invention includes an alkali-soluble resin (A-1), an alkali-soluble resin (A-2), and a photoinitiator (C-1) having a specific structure, and an alkali-soluble resin. The weight ratio range (A-1)/(A-2) of the use amount of (A-1) to the alkali-soluble resin (A-2) is between 5/95 and 95/5, so that high definition can be improved. Problems such as poor pattern linearity, poor pattern smoothness, and high outgassing are applicable to color filters and liquid crystal display devices.
最后应说明的是:以上各实施例仅用以说明本发明的技术方案,而非对其限制;尽管参照前述各实施例对本发明进行了详细的说明,本领域的普通技术人元应当理解:其依然可以对前述各实施例所记载的技术方案进行修改,或者对其中部分或者全部技术特征进行等同替换;而这些修改或者替换,并不使相应技术方案的本质脱离本发明各实施例技术方案的范围。 Finally, it should be noted that the above embodiments are merely illustrative of the technical solutions of the present invention, and are not intended to be limiting; although the present invention has been described in detail with reference to the foregoing embodiments, those of ordinary skill in the art should understand: The technical solutions described in the foregoing embodiments may be modified, or some or all of the technical features may be equivalently replaced; and the modifications or substitutions do not deviate from the technical solutions of the embodiments of the present invention. The scope.

Claims (20)

  1. 一种感光性树脂组成物,其特征在于,包括:A photosensitive resin composition characterized by comprising:
    碱可溶性树脂(A);Alkali-soluble resin (A);
    具有乙烯性不饱和基的化合物(B);a compound (B) having an ethylenically unsaturated group;
    光起始剂(C);Photoinitiator (C);
    溶剂(D);Solvent (D);
    颜料(E);Pigment (E);
    其中,所述碱可溶性树脂(A)包括碱可溶性树脂(A-1)及碱可溶性树脂(A-2),其中,所述碱可溶性树脂(A-1)是由一混合物反应而获得,且所述混合物包括具有至少二个环氧基的环氧化合物(a-1-1)、具有至少一个羧酸基及至少一个乙烯性不饱和基的化合物(a-1-2)、四羧酸或其酸二酐(a-1-3)以及二羧酸或其酸酐(a-1-4);Wherein the alkali-soluble resin (A) includes an alkali-soluble resin (A-1) and an alkali-soluble resin (A-2), wherein the alkali-soluble resin (A-1) is obtained by reacting a mixture, and The mixture includes an epoxy compound (a-1-1) having at least two epoxy groups, a compound (a-1-2) having at least one carboxylic acid group and at least one ethylenically unsaturated group, and a tetracarboxylic acid Or its acid dianhydride (a-1-3) and dicarboxylic acid or its anhydride (a-1-4);
    所述具有至少二个环氧基的环氧化合物(a-1-1)具有如下式(aI-1)或下式(aI-2)所示的结构:The epoxy compound (a-1-1) having at least two epoxy groups has a structure represented by the following formula (aI-1) or the following formula (aI-2):
    Figure PCTCN2015092029-appb-100001
    Figure PCTCN2015092029-appb-100001
    式(aI-1)中,W1、W2、W3以及W4各自为相同或不同,且独立表示氢原子、卤素原子、碳数为1至5的烷基、碳数为1至5的烷氧基、碳数为6至12的芳基或碳数为6至12的芳烷基,In the formula (aI-1), W 1 , W 2 , W 3 and W 4 are each the same or different and independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 5 carbon atoms, and a carbon number of 1 to 5. Alkoxy group, aryl group having 6 to 12 carbon atoms or aralkyl group having 6 to 12 carbon atoms,
    Figure PCTCN2015092029-appb-100002
    Figure PCTCN2015092029-appb-100002
    式(aI-2)中,W5至W18各自为相同或不同,且独立表示氢原子、卤素原子、碳数为1至8的烷基或碳数为6至15的芳香基,s表示0至10的整数;In the formula (aI-2), W 5 to W 18 are each the same or different and independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 8 carbon atoms or an aromatic group having 6 to 15 carbon atoms, and s represents An integer from 0 to 10;
    所述碱可溶性树脂(A-1)的数量平均分子量为1000~8000;The number average molecular weight of the alkali-soluble resin (A-1) is from 1,000 to 8,000;
    所述碱可溶性树脂(A-2)是由不饱和羧酸或不饱和羧酸酐化合物(a-2-1)、 含脂环式碳氢基的不饱和化合物(a-2-2)及其它不饱和化合物(a-2-3)共聚合而得;The alkali-soluble resin (A-2) is composed of an unsaturated carboxylic acid or an unsaturated carboxylic anhydride compound (a-2-1), Copolymerization of an alicyclic hydrocarbon group-containing unsaturated compound (a-2-2) and other unsaturated compound (a-2-3);
    所述碱可溶性树脂(A-2)的重量平均分子量为3000~30000;The alkali-soluble resin (A-2) has a weight average molecular weight of 3,000 to 30,000;
    所述碱可溶性树脂(A-1)与所述碱可溶性树脂(A-2)的使用量的重量比值范围(A-1)/(A-2)为5/95至95/5;The weight ratio range (A-1) / (A-2) of the amount of the alkali-soluble resin (A-1) to the alkali-soluble resin (A-2) is 5/95 to 95/5;
    所述光起始剂(C)包括由式(1)表示的光起始剂(C-1);The photoinitiator (C) comprises a photoinitiator (C-1) represented by formula (1);
    Figure PCTCN2015092029-appb-100003
    Figure PCTCN2015092029-appb-100003
    其中R1、R2、R3、R4、R5、R6、R7及R8彼此独立地为氢、C1-C20烷基、COR16、OR17、卤素、NO2、由式(2)所表示的基团或是由式(3)所表示的基团、Wherein R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 and R 8 are each independently hydrogen, C 1 -C 20 alkyl, COR 16 , OR 17 , halogen, NO 2 , The group represented by the formula (2) is a group represented by the formula (3),
    Figure PCTCN2015092029-appb-100004
    Figure PCTCN2015092029-appb-100004
    或R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8彼此独立地为经由式(4)所表示的基团取代的C2-C10烯基 Or R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 are each independently a group represented by the formula (4). Substituted C 2 -C 10 alkenyl
    Figure PCTCN2015092029-appb-100005
    Figure PCTCN2015092029-appb-100005
    或R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8彼此独立地共同为—(CH2)p—Y—(CH2)q—;Or R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 are each independently taken as —(CH 2 ) p —Y— (CH 2 ) q —;
    或R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8彼此独立地共同为式(5)所表示的基团;Or R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 are each independently a group represented by the formula (5) ;
    Figure PCTCN2015092029-appb-100006
    Figure PCTCN2015092029-appb-100006
    但条件为R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8中的至少一对是由式(5)所表示的基团,However, at least one of R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 is determined by the formula (5). The group represented,
    R9、R10、R11及R12彼此独立地为氢、C1-C20烷基,该C1-C20烷基是未经取代或经一或多个以下基团取代:卤素、苯基、CN、OH、SH、C1-C4-烷氧基、-(CO)OH或-(CO)O-(C1-C4烷基);R 9, R 10, R 11 and R 12 are independently hydrogen, C 1 -C 20 alkyl, C 1 -C 20 alkyl which is unsubstituted or substituted with one or more of the following groups to one another: halo, Phenyl, CN, OH, SH, C 1 -C 4 -alkoxy, -(CO)OH or -(CO)O-(C 1 -C 4 alkyl);
    或R9、R10、R11及R12彼此独立地为未经取代的苯基或经一或多个以下基团取代的苯基:C1-C6烷基、卤素、CN、OR17、SR18或NR19R20Or R 9 , R 10 , R 11 and R 12 are, independently of each other, an unsubstituted phenyl group or a phenyl group substituted by one or more of the following groups: C 1 -C 6 alkyl, halogen, CN, OR 17 , SR 18 or NR 19 R 20 ;
    或R9、R10、R11及R12彼此独立地为卤素、CN、OR17、SR18、SOR18、SO2R18或NR19R20,其中该等取代基OR17、SR18或NR19R20视情况经由该等基团R17、R18、R19和/或R20与萘基环中一个碳原子形成5元或6元环;Or R 9 , R 10 , R 11 and R 12 are, independently of each other, halogen, CN, OR 17 , SR 18 , SOR 18 , SO 2 R 18 or NR 19 R 20 , wherein the substituents OR 17 , SR 18 or NR 19 R 20 optionally forms a 5- or 6-membered ring via a carbon atom in the naphthyl ring via the groups R 17 , R 18 , R 19 and/or R 20 ;
    或R9、R10、R11及R12彼此独立地为COR16、NO2或式(2)所表示的基团、Or R 9 , R 10 , R 11 and R 12 are each independently a group represented by COR 16 , NO 2 or formula (2),
    Figure PCTCN2015092029-appb-100007
    Figure PCTCN2015092029-appb-100007
    Y表示O、S、NR26或直接键;Y represents O, S, NR 26 or a direct bond;
    p表示整数0、1、2或3;p represents an integer of 0, 1, 2 or 3;
    q表示整数1、2或3;q represents an integer of 1, 2 or 3;
    X表示CO或直接键;X represents CO or a direct bond;
    R13表示C1-C20烷基,其是未经取代或经一或多个以下基团取代:卤素、R17、COOR17、OR17、SR18、CONR19R20、NR19R20、PO(OCkH2k+1)2或是式(6) 所表示的基团;R 13 represents a C 1 -C 20 alkyl group which is unsubstituted or substituted with one or more of the following groups: halogen, R 17 , COOR 17 , OR 17 , SR 18 , CONR 19 R 20 , NR 19 R 20 , PO(OC k H 2k+1 ) 2 or a group represented by the formula (6);
    Figure PCTCN2015092029-appb-100008
    Figure PCTCN2015092029-appb-100008
    或R13表示C2-C20烷基,其间杂有一或多个O、S、SO、SO2、NR26或CO,或是C2-C12烯基,其是未经间杂或间杂有一或多个O、CO或NR26,其中该经间杂的C2-C20烷基及该未经间杂或经间杂的C2-C12烯基是未经取代或经一或多个卤素取代;Or R 13 represents a C 2 -C 20 alkyl group, interspersed with one or more of O, S, SO, SO 2 , NR 26 or CO, or a C 2 -C 12 alkenyl group which is unintercalated or heterozygous Or a plurality of O, CO or NR 26 , wherein the meta-hetero C 2 -C 20 alkyl group and the unmeta- or inter-hetero C 2 -C 12 alkenyl group are unsubstituted or substituted by one or more halogens ;
    或R13表示C4-C8环烯基、C2-C12炔基或未经间杂或间杂有一或多个O、S、CO或NR26的C3-C10环烷基;Or R 13 represents C 4 -C 8 cycloalkenyl, C 2 -C 12 alkynyl or C 3 -C 10 cycloalkyl having no or hetero or one or more O, S, CO or NR 26 ;
    或R13表示苯基或萘基,其各为未经取代或经一或多个以下基团取代:OR17、SR18、NR19R20、COR16、CN、NO2、卤素、C1-C20烷基、C1-C4卤代烷基、间杂有一或多个O、S、CO或NR26的C2-C20烷基或式(7)表示的基团、Or R 13 represents phenyl or naphthyl, each of which is unsubstituted or substituted with one or more of the following groups: OR 17 , SR 18 , NR 19 R 20 , COR 16 , CN, NO 2 , halogen, C 1 a C 2 alkyl group, a C 1 -C 4 haloalkyl group, a C 2 -C 20 alkyl group having one or more O, S, CO or NR 26 or a group represented by the formula (7),
    Figure PCTCN2015092029-appb-100009
    Figure PCTCN2015092029-appb-100009
    或其各经C3-C10环烷基或间杂有一或多个O、S、CO或NR26的C3-C10环烷基取代;Each warp or C 3 -C 10 cycloalkyl, or interrupted by one or more O, S, CO or NR C 3 26 -C 10 cyclic group is unsubstituted;
    k表示整数1至10;k represents an integer of 1 to 10;
    R14表示氢、C3-C8环烷基、C2-C5烯基、C1-C20烷氧基或C1-C20烷基,其是未经取代或经一或多个以下基团取代:卤素、苯基、C1-C20烷基苯基或CN;R 14 represents hydrogen, C 3 -C 8 cycloalkyl, C 2 -C 5 alkenyl, C 1 -C 20 alkoxy or C 1 -C 20 alkyl, which is unsubstituted or one or more Substituted by: halogen, phenyl, C 1 -C 20 alkylphenyl or CN;
    或R14表示苯基或萘基,其各未经取代或经一或多个以下基团取代:C1-C6烷基、C1-C4卤代烷基、卤素、CN、OR17、SR18和/或NR19R20Or R 14 represents phenyl or naphthyl, each of which is unsubstituted or substituted with one or more of the following groups: C 1 -C 6 alkyl, C 1 -C 4 haloalkyl, halogen, CN, OR 17 , SR 18 and / or NR 19 R 20 ;
    或R14表示C3-C20杂芳基、C1-C8烷氧基、苄氧基或苯氧基,该苄氧基及苯氧基是未经取代或经一或多个以下基团取代:C1-C6烷基、C1-C4卤代烷基和/或卤素;Or R 14 represents a C 3 -C 20 heteroaryl group, a C 1 -C 8 alkoxy group, a benzyloxy group or a phenoxy group, the benzyloxy group and the phenoxy group being unsubstituted or having one or more of the following groups Group substituted: C 1 -C 6 alkyl, C 1 -C 4 haloalkyl and/or halogen;
    R15表示C6-C20芳基或C3-C20杂芳基,其各是未经取代或经一或多个以下基团取代:苯基、卤素、C1-C4卤代烷基、CN、NO2、OR17、SR18、NR19R20、PO(OCkH2k+1)2、SO-C1-C10烷基、SO2-C1-C10烷基、间杂有一或多个O、S或NR26的C2-C20烷基;或其各经C1-C20烷基取代,该C1-C20烷基是未经取代或经一或多个以下基团取代:卤素、COOR17、CONR19R20、苯基、C3-C8环烷基、C3-C20杂芳基、C6-C20芳氧基羰基、C3-C20杂芳氧基羰基、OR17、SR18或NR19R20R 15 represents a C 6 -C 20 aryl group or a C 3 -C 20 heteroaryl group, each of which is unsubstituted or substituted with one or more of the following groups: phenyl, halogen, C 1 -C 4 haloalkyl, CN, NO 2 , OR 17 , SR 18 , NR 19 R 20 , PO(OC k H 2k+1 ) 2 , SO-C 1 -C 10 alkyl, SO 2 -C 1 -C 10 alkyl, heterogeneous C 2 -C 20 alkyl group or a plurality of O, S or NR 26; or a C 1 -C 20 via respective substituted alkyl, C 1 -C 20 alkyl which is unsubstituted or substituted with one or more of the following Group substitution: halogen, COOR 17 , CONR 19 R 20 , phenyl, C 3 -C 8 cycloalkyl, C 3 -C 20 heteroaryl, C 6 -C 20 aryloxycarbonyl, C 3 -C 20 Heteroaryloxycarbonyl, OR 17 , SR 18 or NR 19 R 20 ;
    或R15表示氢、C2-C12烯基、未经间杂或间杂有一或多个O、CO或NR26的C3-C8环烷基;或R15表示C1-C20烷基,其是未经取代或经一或多个以下基团取代:卤素、OR17、SR18、C3-C8环烷基、C3-C20杂芳基、C6-C20芳氧基羰基、C3-C20杂芳氧基羰基、NR19R20、COOR17、CONR19R20、PO(OCkH2k+1)2、苯基、式(6)所表示的基团或式(8)所表示的基团、Or R 15 represents hydrogen, C 2 -C 12 alkenyl, C 3 -C 8 cycloalkyl having no or hetero or one or more O, CO or NR 26 ; or R 15 represents C 1 -C 20 alkyl , which is unsubstituted or substituted with one or more of the following groups: halogen, OR 17 , SR 18 , C 3 -C 8 cycloalkyl, C 3 -C 20 heteroaryl, C 6 -C 20 aryloxy a group represented by a carbonyl group, a C 3 -C 20 heteroaryloxycarbonyl group, NR 19 R 20 , COOR 17 , CONR 19 R 20 , PO(OC k H 2k+1 ) 2 , a phenyl group, and a formula (6) Or a group represented by the formula (8),
    Figure PCTCN2015092029-appb-100010
    Figure PCTCN2015092029-appb-100010
    或该C1-C20烷基是经苯基取代,该苯基是经卤素、C1-C20烷基、C1-C4卤代烷基、OR17、SR18或NR19R20取代;Or the C 1 -C 20 alkyl group is substituted by a phenyl group which is substituted by halogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, OR 17 , SR 18 or NR 19 R 20 ;
    或R15表示C2-C20烷基,其间杂有一或多个O、SO或SO2,且该经间杂的C2-C20烷基是未经取代或经一或多个以下基团取代:卤素、OR17、COOR17、CONR19R20、苯基或经OR17、SR18或NR19R20取代的苯基;Or R 15 represents a C 2 -C 20 alkyl group in which one or more O, SO or SO 2 are heterogeneous, and the inter-hetero C 2 -C 20 alkyl group is unsubstituted or has one or more of the following groups Substituted: halogen, OR 17 , COOR 17 , CONR 19 R 20 , phenyl or phenyl substituted by OR 17 , SR 18 or NR 19 R 20 ;
    或R15表示C2-C20烷酰基或苯甲酰基,其是未经取代或经一或多个以下基团取代:C1-C6烷基、卤素、苯基、OR17、SR18或NR19R20;或R15表示未经取代或经一或多个OR17取代的萘甲酰基或是C3-C14杂芳基羰基;Or R 15 represents a C 2 -C 20 alkanoyl or benzoyl group which is unsubstituted or substituted with one or more of the following groups: C 1 -C 6 alkyl, halogen, phenyl, OR 17 , SR 18 Or NR 19 R 20 ; or R 15 represents a naphthoyl group which is unsubstituted or substituted with one or more OR 17 or a C 3 -C 14 heteroarylcarbonyl group;
    或R15表示C2-C12烷氧基羰基,其是未经间杂或间杂有一或多个O且该经间杂或未经间杂的C2-C12烷氧基羰基是未经取代或经一或多个羟基取代;Or R 15 represents a C 2 -C 12 alkoxycarbonyl group which is undoped or inter-hetero-doped with one or more O and the inter- or un-doped C 2 -C 12 alkoxycarbonyl group is unsubstituted or One or more hydroxyl substitutions;
    或R15表示苯氧基羰基,其是未经取代或经一或多个以下基团取代:C1-C6烷基、卤素、C1-C4卤代烷基、苯基、OR17、SR18或NR19R20Or R 15 represents a phenoxycarbonyl group which is unsubstituted or substituted with one or more of the following groups: C 1 -C 6 alkyl, halogen, C 1 -C 4 haloalkyl, phenyl, OR 17 , SR 18 or NR 19 R 20 ;
    或R15表示CN、CONR19R20、NO2、C1-C4卤代烷基、S(O)m-C1-C6烷基、未经取代或经C1-C12烷基或SO2-C1-C6烷基取代的S(O)m-苯基;Or R 15 represents CN, CONR 19 R 20 , NO 2 , C 1 -C 4 haloalkyl, S(O) m -C 1 -C 6 alkyl, unsubstituted or C 1 -C 12 alkyl or SO 2- C 1 -C 6 alkyl-substituted S(O) m -phenyl;
    或R15表示SO2O-苯基,其是未经取代或经C1-C12烷基取代;或是二苯基膦酰基或二-(C1-C4烷氧基)-膦酰基;Or R 15 represents an SO 2 O-phenyl group which is unsubstituted or substituted by a C 1 -C 12 alkyl group; or a diphenylphosphono group or a di-(C 1 -C 4 alkoxy)-phosphono group ;
    m表示1或2;m represents 1 or 2;
    R'14具有针对R14所给出含义中的一个;R' 14 has one of the meanings given for R 14 ;
    R'15具有针对R15所给出含义中的一个;R' 15 has one of the meanings given for R 15 ;
    X1表示O、S、SO或SO2X 1 represents O, S, SO or SO 2 ;
    X2表示O、CO、S或直接键;X 2 represents O, CO, S or a direct bond;
    R16表示C6-C20芳基或C3-C20杂芳基,其各是未经取代或经一或多个以下基团取代:苯基、卤素、C1-C4卤代烷基、CN、NO2、OR17、SR18、NR19R20 或间杂有一或多个O、S或NR26的C1-C20烷基;或其各经一或多个C1-C20烷基取代,该C1-C20烷基是未经取代或经一或多个以下基团取代:卤素、COOR17、CONR19R20、苯基、C3-C8环烷基、C3-C20杂芳基、C6-C20芳氧基羰基、C3-C20杂芳氧基羰基、OR17、SR18或NR19R20R 16 represents a C 6 -C 20 aryl group or a C 3 -C 20 heteroaryl group, each of which is unsubstituted or substituted with one or more of the following groups: phenyl, halogen, C 1 -C 4 haloalkyl, CN, NO 2 , OR 17 , SR 18 , NR 19 R 20 or a C 1 -C 20 alkyl group having one or more O, S or NR 26 ; or each of one or more C 1 -C 20 alkane Substituted, the C 1 -C 20 alkyl group is unsubstituted or substituted with one or more of the following groups: halogen, COOR 17 , CONR 19 R 20 , phenyl, C 3 -C 8 cycloalkyl, C 3 -C 20 heteroaryl, C 6 -C 20 aryloxycarbonyl, C 3 -C 20 heteroaryloxycarbonyl, OR 17 , SR 18 or NR 19 R 20 ;
    或R16表示氢、C1-C20烷基,该C1-C20烷基是未经取代或经一或多个以下基团取代:卤素、苯基、OH、SH、CN、C3-C6烯氧基、OCH2CH2CN、OCH2CH2(CO)O(C1-C4)烷基、O(CO)-(C1-C4烷基)、O(CO)-苯基、(CO)OH或(CO)O(C1-C4烷基);Or R 16 represents hydrogen, C 1 -C 20 alkyl, C 1 -C 20 alkyl which is unsubstituted or substituted with one or more of the following groups: halogen, phenyl, OH, SH, CN, C 3 -C 6 alkenyloxy, OCH 2 CH 2 CN, OCH 2 CH 2 (CO)O(C 1 -C 4 )alkyl, O(CO)-(C 1 -C 4 alkyl), O(CO) -phenyl, (CO)OH or (CO)O(C 1 -C 4 alkyl);
    或R16表示C2-C12烷基,其间杂有一或多个O、S或NR26;或R16表示(CH2CH2O)n+1H、(CH2CH2O)n(CO)-(C1-C8烷基)、C2-C12烯基或C3-C8环烷基;Or R 16 represents a C 2 -C 12 alkyl group in which one or more O, S or NR 26 are heterogeneous; or R 16 represents (CH 2 CH 2 O) n+1 H, (CH 2 CH 2 O) n ( CO)-(C 1 -C 8 alkyl), C 2 -C 12 alkenyl or C 3 -C 8 cycloalkyl;
    或R16表示经SR18取代的苯基,其中该基团R18表示键结至该COR16基团所附接的该咔唑部分的该苯基或萘基环的直接键;Or R 16 represents a phenyl substituted with SR 18 , wherein the group R 18 represents a direct bond to the phenyl or naphthyl ring of the oxazole moiety to which the COR 16 group is attached;
    n表示1至20;n represents 1 to 20;
    R17表示氢、苯基-C1-C3烷基、C1-C20烷基,其是未经取代或经一或多个以下基团取代:卤素、OH、SH、CN、C3-C6烯氧基、OCH2CH2CN、OCH2CH2(CO)O(C1-C4烷基)、O(CO)-(C1-C4烷基)、O(CO)-(C2-C4)烯基、O(CO)-苯基、(CO)OH、(CO)O(C1-C4烷基)、C3-C20环烷基、SO2-(C1-C4卤代烷基)、O(C1-C4卤代烷基)或间杂有一或多个O的C3-C20环烷基;R 17 represents hydrogen, phenyl-C 1 -C 3 alkyl, C 1 -C 20 alkyl, which is unsubstituted or substituted with one or more of the following groups: halogen, OH, SH, CN, C 3 -C 6 alkenyloxy, OCH 2 CH 2 CN, OCH 2 CH 2 (CO)O(C 1 -C 4 alkyl), O(CO)-(C 1 -C 4 alkyl), O(CO) -(C 2 -C 4 )alkenyl, O(CO)-phenyl, (CO)OH, (CO)O(C 1 -C 4 alkyl), C 3 -C 20 cycloalkyl, SO 2 - (C 1 -C 4 haloalkyl), O(C 1 -C 4 haloalkyl) or a C 3 -C 20 cycloalkyl group having one or more O;
    或R17表示C2-C20烷基,其间杂有一或多个O、S或NR26Or R 17 represents C 2 -C 20 alkyl, in which one or more O, S or NR 26 are heterogeneous;
    或R17表示(CH2CH2O)n+1H、(CH2CH2O)n(CO)-(C1-C8烷基)、C1-C8烷酰基、C2-C12烯基、C3-C6烯酰基或未经间杂或间杂有一或多个O、S、CO或NR26的C3-C20环烷基;Or R 17 represents (CH 2 CH 2 O) n+1 H, (CH 2 CH 2 O) n (CO)-(C 1 -C 8 alkyl), C 1 -C 8 alkanoyl, C 2 -C a 12 -alkenyl, C 3 -C 6 enoyl group or a C 3 -C 20 cycloalkyl group having no or hetero or one or more O, S, CO or NR 26 ;
    或R17表示C1-C8烷基-C3-C10环烷基,其是未经间杂或间杂有一或多个O;Or R 17 represents a C 1 -C 8 alkyl-C 3 -C 10 cycloalkyl group which is undoped or hetero-has one or more O;
    或R17表示苯甲酰基,其是未经取代或经一或多个C1-C6烷基、卤素、OH或C1-C3烷氧基取代;Or R 17 represents a benzoyl group which is unsubstituted or substituted by one or more C 1 -C 6 alkyl groups, halogen, OH or C 1 -C 3 alkoxy groups;
    或R17表示苯基、萘基或C3-C20杂芳基,其各是未经取代或经一或多个以下基团取代:卤素、OH、C1-C12烷基、C1-C12烷氧基、CN、NO2、苯基-C1-C3烷氧基、苯氧基、C1-C12烷基硫基、苯基硫基、N(C1-C12烷基)2、二苯基-胺基或式(7)所表示的基团; Or R 17 represents phenyl, naphthyl or C 3 -C 20 heteroaryl, each of which is unsubstituted or substituted with one or more of the following groups: halogen, OH, C 1 -C 12 alkyl, C 1 -C 12 alkoxy, CN, NO 2 , phenyl-C 1 -C 3 alkoxy, phenoxy, C 1 -C 12 alkylthio, phenylthio, N (C 1 -C 12 An alkyl) 2 , a diphenyl-amine group or a group represented by the formula (7);
    Figure PCTCN2015092029-appb-100011
    Figure PCTCN2015092029-appb-100011
    或R17形成键结至该具有由式(2)所表示的基团、或是式(7)所表示的基团所处的苯基或萘基环的其中一个碳原子的直接键、Or R 17 forms a direct bond bonded to one of the carbon atoms of the phenyl or naphthyl ring in which the group represented by the formula (2) or the group represented by the formula (7) is bonded,
    Figure PCTCN2015092029-appb-100012
    Figure PCTCN2015092029-appb-100012
    R18表示氢、C2-C12烯基、C3-C20环烷基或苯基-C1-C3烷基,其中该C2-C12烯基、C3-C20环烷基或苯基-C1-C3烷基是未经间杂或间杂有一或多个O、S、CO、NR26或COOR17;或R18是C1-C20烷基,其是未经取代或经一或多个以下基团取代:OH、SH、CN、C3-C6烯氧基、OCH2CH2CN、OCH2CH2(CO)O(C1-C4烷基)、O(CO)-(C2-C4)烯基、O(CO)-(C1-C4烷基)、O(CO)-苯基或(CO)OR17R 18 represents hydrogen, C 2 -C 12 alkenyl, C 3 -C 20 cycloalkyl or phenyl-C 1 -C 3 alkyl, wherein the C 2 -C 12 alkenyl, C 3 -C 20 naphthenic Or a phenyl-C 1 -C 3 alkyl group which has no or hetero or one or more O, S, CO, NR 26 or COOR 17 ; or R 18 is a C 1 -C 20 alkyl group which is not Substituted or substituted with one or more of the following groups: OH, SH, CN, C 3 -C 6 alkenyloxy, OCH 2 CH 2 CN, OCH 2 CH 2 (CO)O (C 1 -C 4 alkyl) , O(CO)-(C 2 -C 4 )alkenyl, O(CO)-(C 1 -C 4 alkyl), O(CO)-phenyl or (CO)OR 17 ;
    或R18表示C2-C20烷基,其间杂有一或多个O、S、CO、NR26或COOR17Or R 18 represents a C 2 -C 20 alkyl group with one or more O, S, CO, NR 26 or COOR 17 interspersed therebetween;
    或R18表示(CH2CH2O)nH、(CH2CH2O)n(CO)-(C1-C8烷基)、C2-C8烷酰基或C3-C6烯酰基;Or R 18 represents (CH 2 CH 2 O) n H, (CH 2 CH 2 O) n (CO)-(C 1 -C 8 alkyl), C 2 -C 8 alkanoyl or C 3 -C 6 olefin Acyl group
    或R18表示苯甲酰基,其是未经取代或经一或多个以下基团取代:C1-C6烷基、卤素、OH、C1-C4烷氧基或C1-C4烷基硫基;Or R 18 represents a benzoyl group which is unsubstituted or substituted with one or more of the following groups: C 1 -C 6 alkyl, halogen, OH, C 1 -C 4 alkoxy or C 1 -C 4 Alkylthio group;
    或R18表示苯基、萘基或C3-C20杂芳基,其各是未经取代或经一或多个以下基团取代:卤素、C1-C12烷基、C1-C4卤代烷基、C1-C12烷氧基、CN、NO2、苯基-C1-C3烷氧基、苯氧基、C1-C12烷基硫基、苯基硫基、N(C1-C12烷基)2、二苯基胺基、(CO)O(C1-C8烷基)、(CO)-C1-C8烷基、(CO)N(C1-C8烷基)2或式(7)所表示的基团Or R 18 represents phenyl, naphthyl or C 3 -C 20 heteroaryl, each of which is unsubstituted or substituted with one or more of the following groups: halogen, C 1 -C 12 alkyl, C 1 -C 4- haloalkyl, C 1 -C 12 alkoxy, CN, NO 2 , phenyl-C 1 -C 3 alkoxy, phenoxy, C 1 -C 12 alkylthio, phenylthio, N (C 1 -C 12 alkyl) 2 , diphenylamino, (CO)O(C 1 -C 8 alkyl), (CO)-C 1 -C 8 alkyl, (CO)N (C 1 -C 8 alkyl) 2 or a group represented by the formula (7)
    Figure PCTCN2015092029-appb-100013
    Figure PCTCN2015092029-appb-100013
    R19及R20彼此独立地为氢、C1-C20烷基、C2-C4羟基烷基、C2-C10烷氧基烷基、C2-C5烯基、C3-C20环烷基、苯基-C1-C3烷基、C1-C8烷酰基、C1-C8烷酰基氧基、C3-C12烯酰基、SO2-(C1-C4卤代烷基)或苯甲酰基;R 19 and R 20 are each independently hydrogen, C 1 -C 20 alkyl, C 2 -C 4 hydroxyalkyl, C 2 -C 10 alkoxyalkyl, C 2 -C 5 alkenyl, C 3 - C 20 cycloalkyl, phenyl-C 1 -C 3 alkyl, C 1 -C 8 alkanoyl, C 1 -C 8 alkanoyloxy, C 3 -C 12 alkenoyl, SO 2 -(C 1 - C 4 haloalkyl) or benzoyl;
    或R19及R20表示苯基、萘基或C3-C20杂芳基,其各是未经取代或经一或多个以下基团取代:卤素、C1-C4卤代烷基、C1-C20烷氧基、C1-C12烷基、苯甲酰基或C1-C12烷氧基; Or R 19 and R 20 represent phenyl, naphthyl or C 3 -C 20 heteroaryl, each of which is unsubstituted or substituted with one or more of the following groups: halogen, C 1 -C 4 haloalkyl, C 1- C 20 alkoxy, C 1 -C 12 alkyl, benzoyl or C 1 -C 12 alkoxy;
    或R19及R20与其所附接的N原子一起形成未经间杂或间杂有O、S或NR17的5元或6元饱和或不饱和环,且该5元或6元饱和或不饱和环是未经取代或经一或多个以下基团取代:C1-C20烷基、C1-C20烷氧基、=O、OR17、SR18、NR21R22、(CO)R23、NO2、卤素、C1-C4-卤代烷基、CN、苯基、未经间杂或间杂有一或多个O、S、CO或NR17的C3-C20环烷基、或式(7)表示的基团Or R 19 and R 20 together with the N atom to which they are attached form a 5- or 6-membered saturated or unsaturated ring which is unintermixed or interspersed with O, S or NR 17 and which is either 5- or 6-membered saturated or unsaturated The ring is unsubstituted or substituted with one or more of the following groups: C 1 -C 20 alkyl, C 1 -C 20 alkoxy, =0, OR 17 , SR 18 , NR 21 R 22 , (CO) R 23 , NO 2 , halogen, C 1 -C 4 -haloalkyl, CN, phenyl, C 3 -C 20 cycloalkyl having one or more O, S, CO or NR 17 undoped or inter-hetero, or a group represented by the formula (7)
    Figure PCTCN2015092029-appb-100014
    Figure PCTCN2015092029-appb-100014
    或R19及R20与其所附接的N原子一起形成杂芳香族环系统,该环系统是未经取代或经一或多个以下基团取代:C1-C20烷基、C1-C4卤代烷基、C1-C20烷氧基、=O、OR17、SR18、NR21R22、(CO)R23、卤素、NO2、CN、苯基或未经间杂或间杂有一或多个O、S、CO或NR17的C3-C20环烷基、或式(7)表示的基团Or R 19 and R 20 together with the N atom to which they are attached form a heteroaromatic ring system which is unsubstituted or substituted with one or more of the following groups: C 1 -C 20 alkyl, C 1 - C 4 haloalkyl, C 1 -C 20 alkoxy, =0, OR 17 , SR 18 , NR 21 R 22 , (CO)R 23 , halogen, NO 2 , CN, phenyl or uninter or hetero Or a plurality of C 3 -C 20 cycloalkyl groups of O, S, CO or NR 17 or a group represented by the formula (7)
    Figure PCTCN2015092029-appb-100015
    Figure PCTCN2015092029-appb-100015
    R21及R22彼此独立地为氢、C1-C20烷基、C1-C4卤代烷基、C3-C10环烷基或苯基;R 21 and R 22 are each independently hydrogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, C 3 -C 10 cycloalkyl or phenyl;
    或R21及R22与其所附接的N原子一起形成未经间杂或间杂有O、S或NR26的5元或6元饱和或不饱和环,且该5元或6元饱和或不饱和环是未稠合或该5元或6元饱和或不饱和环与苯环稠合;Or R 21 and R 22 together with the N atom to which they are attached form a 5- or 6-membered saturated or unsaturated ring which is unintermixed or interspersed with O, S or NR 26 and which is either 5- or 6-membered saturated or unsaturated The ring is unfused or the 5- or 6-membered saturated or unsaturated ring is fused to the benzene ring;
    R23表示氢、OH、C1-C20烷基、C1-C4卤代烷基、间杂有一或多个O、CO或NR26的C2-C20烷基、未经间杂或间杂有O、S、CO或NR26的C3-C20环烷基,或R23表示苯基、萘基、苯基-C1-C4烷基、OR17、SR18或NR21R22R 23 represents hydrogen, OH, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, intervening one or more O, CO or NR 26 C 2 -C 20 alkyl, uninter or hetero-O a C 3 -C 20 cycloalkyl group of S, CO or NR 26 , or R 23 represents phenyl, naphthyl, phenyl-C 1 -C 4 alkyl, OR 17 , SR 18 or NR 21 R 22 ;
    R24表示(CO)OR17、CONR19R20、(CO)R17;或R24具有针对R19及R20所给出含义中的一个;R 24 represents (CO)OR 17 , CONR 19 R 20 , (CO)R 17 ; or R 24 has one of the meanings given for R 19 and R 20 ;
    R25表示COOR17、CONR19R20、(CO)R17;或R25具有针对R17所给出含义中的一个;R 25 represents COOR 17 , CONR 19 R 20 , (CO)R 17 ; or R 25 has one of the meanings given for R 17 ;
    R26表示氢、C1-C20烷基、C1-C4卤代烷基、C2-C20烷基,其间杂有一或多个O或CO;或是苯基-C1-C4烷基、C3-C8环烷基,其是未经间杂或间杂有一或多个O或CO;或是(CO)R19;或是苯基,其是未经取代或经一或多个以下基团取代:C1-C20烷基、卤素、C1-C4卤代烷基、OR17、SR18、NR19R20或式(7) 表示的基团R 26 represents hydrogen, C 1 -C 20 alkyl, C 1 -C 4 haloalkyl, C 2 -C 20 alkyl with one or more O or CO in between; or phenyl-C 1 -C 4 alkane a C 3 -C 8 cycloalkyl group which is undoped or heterozygous with one or more O or CO; or (CO)R 19 ; or a phenyl group which is unsubstituted or one or more Substituted by: C 1 -C 20 alkyl, halogen, C 1 -C 4 haloalkyl, OR 17 , SR 18 , NR 19 R 20 or a group represented by formula (7)
    Figure PCTCN2015092029-appb-100016
    Figure PCTCN2015092029-appb-100016
    但条件为在该分子中存在至少一个式(2)或是式(7)所表示的基团However, the condition is that at least one group represented by formula (2) or formula (7) is present in the molecule.
    Figure PCTCN2015092029-appb-100017
    Figure PCTCN2015092029-appb-100017
  2. 根据权利要求1所述的感光性树脂组成物,其特征在于,所述由式(1)表示的光起始剂(C-1)中,所述R1、R2、R3、R4、R5、R6、R7及R8彼此独立地为氢、C1-C20烷基、COR16、NO2或由式(2)表示的基團;The photosensitive resin composition according to claim 1, wherein the photoinitiator (C-1) represented by the formula (1), the R 1 , R 2 , R 3 , R 4 And R 5 , R 6 , R 7 and R 8 are each independently hydrogen, C 1 -C 20 alkyl, COR 16 , NO 2 or a group represented by the formula (2);
    Figure PCTCN2015092029-appb-100018
    Figure PCTCN2015092029-appb-100018
    或R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8彼此独立地共同为式(5)所表示的基团;Or R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 are each independently a group represented by the formula (5) ;
    Figure PCTCN2015092029-appb-100019
    Figure PCTCN2015092029-appb-100019
    但条件为R1及R2、R2及R3、R3及R4、R5及R6、R6及R7或R7及R8中的至少一对是由式(5)所表示的基团;However, at least one of R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 or R 7 and R 8 is determined by the formula (5). a group represented;
    X表示CO或直接键;X represents CO or a direct bond;
    R-13表示C1-C20烷基,其是未经取代或经一或多个以下基团取代:卤素、OR17、SR18、COOR17、CONR19R20或PO(OCkH2k+1)2R -13 represents a C 1 -C 20 alkyl group which is unsubstituted or substituted with one or more of the following groups: halogen, OR 17 , SR 18 , COOR 17 , CONR 19 R 20 or PO (OC k H 2k +1 ) 2 ;
    或R13表示C2-C20烷基,其间杂有一或多个O、S、NR26或CO;Or R 13 represents a C 2 -C 20 alkyl group, interspersed with one or more O, S, NR 26 or CO;
    或R13表示苯基或萘基,此二个是未经取代或经由一或多个COR16或式(7)表示的基团取代;Or R 13 represents a phenyl or naphthyl group, and the two are unsubstituted or substituted by one or more groups represented by COR 16 or formula (7);
    Figure PCTCN2015092029-appb-100020
    Figure PCTCN2015092029-appb-100020
    R-14表示C1-C20烷基、苯基或C1-C8烷氧基;R - 14 represents a C 1 -C 20 alkyl group, a phenyl group or a C 1 -C 8 alkoxy group;
    R15表示苯基、萘基、C3-C20杂芳基,其各是未经取代或经一或多个以下 基团取代:苯基、卤素、C1-C4卤代烷基、OR17、SR18或C2-C20烷基,其间杂有一或多个O或S;或其各经一或多个C1-C20烷基取代,该C1-C20烷基是未经取代或经一或多个以下基团取代:卤素、COOR17、CONR19R20、苯基、C3-C8环烷基、C3-C20杂芳基、C6-C20芳氧基羰基、C4-C20杂芳氧基羰基、OR17、SR18、NR19R20或PO(OCkH2k+1)2R 15 represents a phenyl group, a naphthyl group, a C 3 -C 20 heteroaryl group, each of which is unsubstituted or substituted with one or more of the following groups: phenyl, halogen, C 1 -C 4 haloalkyl, OR 17 An SR 18 or C 2 -C 20 alkyl group having one or more O or S hetero; or each of which is substituted by one or more C 1 -C 20 alkyl groups, the C 1 -C 20 alkyl group being unsubstituted Substituted or substituted with one or more of the following groups: halogen, COOR 17 , CONR 19 R 20 , phenyl, C 3 -C 8 cycloalkyl, C 3 -C 20 heteroaryl, C 6 -C 20 aryloxy Alkylcarbonyl, C 4 -C 20 heteroaryloxycarbonyl, OR 17 , SR 18 , NR 19 R 20 or PO(OC k H 2k+1 ) 2 ;
    或R15表示C1-C20烷基,其是未经取代或经一或多个以下基团取代:OR17、SR18、C3-C8环烷基、C3-C20杂芳基、NR19R20、COOR17、CONR19R20或PO(OCkH2k+1)2Or R 15 represents a C 1 -C 20 alkyl group which is unsubstituted or substituted with one or more of the following groups: OR 17 , SR 18 , C 3 -C 8 cycloalkyl, C 3 -C 20 heteroaryl Base, NR 19 R 20 , COOR 17 , CONR 19 R 20 or PO(OC k H 2k+1 ) 2 ;
    R'14具有针对R14所给出含义中的一个;R' 14 has one of the meanings given for R 14 ;
    R'15具有针对R15所给出含义中的一个;R' 15 has one of the meanings given for R 15 ;
    R16表示苯基,其是未经取代或经一或多个以下基团取代:OR17、SR18、NR19R20或间杂有一或多个O、S或NR26的C2-C20烷基;R 16 represents a phenyl group which is unsubstituted or substituted with one or more of the following groups: OR 17 , SR 18 , NR 19 R 20 or a C 2 -C 20 having one or more O, S or NR 26 interstitial alkyl;
    或R16表示苯基,其是经一或多个C1-C20烷基取代,该C1-C20烷基是未经取代或经一或多个以下基团取代:卤素、COOR17、CONR19R20、苯基、C3-C8环烷基、C3-C20杂芳基、C6-C20芳氧基羰基、C4-C20杂芳氧基羰基、OR17、SR18或NR19R20Or R 16 represents phenyl which is substituted with one or more C 1 -C 20 alkyl, C 1 -C 20 alkyl which is unsubstituted or is substituted with one or more of the following radicals: halogen, COOR 17 , CONR 19 R 20 , phenyl, C 3 -C 8 cycloalkyl, C 3 -C 20 heteroaryl, C 6 -C 20 aryloxycarbonyl, C 4 -C 20 heteroaryloxycarbonyl, OR 17 , SR 18 or NR 19 R 20 ;
    或R16表示C1-C20烷基,其是未经取代或经以下基团取代:卤素、苯基、OH、SH、CN、C3-C6烯氧基、OCH2CH2(CO)O(C1-C4烷基)、O(CO)-(C1-C4烷基)或(CO)O(C1-C4烷基);Or R 16 represents C 1 -C 20 alkyl, which is unsubstituted or substituted by halogen, phenyl, OH, SH, CN, C 3 -C 6 alkenyloxy, OCH 2 CH 2 (CO O(C 1 -C 4 alkyl), O(CO)-(C 1 -C 4 alkyl) or (CO)O(C 1 -C 4 alkyl);
    R-17表示C1-C20烷基,其是未经取代或经一或多个以下基团取代:卤素、OCH2CH2(CO)O(C1-C4烷基)、O(C1-C4烷基)、(CO)O(C1-C4烷基)、C3-C20环烷基或间杂有一或多个O的C3-C20环烷基;R -17 represents a C 1 -C 20 alkyl group which is unsubstituted or substituted with one or more of the following groups: halogen, OCH 2 CH 2 (CO)O(C 1 -C 4 alkyl), O ( C 1 -C 4 alkyl), (CO) O (C 1 -C 4 alkyl), C 3 -C 20 cycloalkyl interrupted by one or more O or a C 3 -C 20 cycloalkyl;
    或R17表示C2-C20烷基,其间杂有一或多个O;Or R 17 represents a C 2 -C 20 alkyl group, in which one or more O;
    R18表示经(CO)OR17取代的甲基;R 18 represents a methyl group substituted with (CO)OR 17 ;
    R19及R20彼此独立地为氢、苯基、C1-C20烷基、C1-C8烷酰基或C1-C8烷酰基氧基;R 19 and R 20 are each independently hydrogen, phenyl, C 1 -C 20 alkyl, C 1 -C 8 alkanoyl or C 1 -C 8 alkanoyloxy;
    或R19及R20与其所附接的N原子一起形成杂芳香族环系统,该环系统是未经取代或经由式(7)表示的基团取代;Or R 19 and R 20 together with the N atom to which they are attached form a heteroaromatic ring system which is unsubstituted or substituted via a group represented by formula (7);
    Figure PCTCN2015092029-appb-100021
    Figure PCTCN2015092029-appb-100021
    但条件为在该分子中存在至少一个式(2)或是式(7)所表示的基团However, the condition is that at least one group represented by formula (2) or formula (7) is present in the molecule.
    Figure PCTCN2015092029-appb-100022
    Figure PCTCN2015092029-appb-100022
  3. 根据权利要求1所述的感光性树脂组成物,其特征在于,所述由式(1)表示的光起始剂(C-1)中,所述R1、R2、R3、R4、R5、R6、R7及R8彼此独立地为氢,或R1及R2、R3及R4或R5及R6彼此独立地共同为式(5)所表示的基团;The photosensitive resin composition according to claim 1, wherein the photoinitiator (C-1) represented by the formula (1), the R 1 , R 2 , R 3 , R 4 R 5 , R 6 , R 7 and R 8 are each independently hydrogen, or R 1 and R 2 , R 3 and R 4 or R 5 and R 6 are independently of each other and are a group represented by the formula (5). ;
    Figure PCTCN2015092029-appb-100023
    Figure PCTCN2015092029-appb-100023
    但条件为R1及R2、R3及R4或R5及R6中的至少一对是由式(5)所表示的基团;However, at least one of R 1 and R 2 , R 3 and R 4 or R 5 and R 6 is a group represented by the formula (5);
    或R2表示COR16、NO2或是由式(2)所表示的基团或是由式(3)所表示的基团;Or R 2 represents COR 16, NO 2 or by formula (2) or a group represented by the formula (3) a group represented by;
    Figure PCTCN2015092029-appb-100024
    Figure PCTCN2015092029-appb-100024
    或R7表示COR16或是由式(2)所表示的基团;Or R 7 represents COR 16 or a group represented by formula (2);
    R9、R11及R12表示氢;R 9 , R 11 and R 12 represent hydrogen;
    R10表示氢、OR17或COR16R 10 represents hydrogen, OR 17 or COR 16 ;
    X表示CO或直接键;X represents CO or a direct bond;
    R13表示C1-C20烷基,其是未经取代或经一或多个以下基团取代:卤素、R17、OR17、SR18或PO(OCkH2k+1)2R 13 represents a C 1 -C 20 alkyl group which is unsubstituted or substituted with one or more of the following groups: halogen, R 17 , OR 17 , SR 18 or PO(OC k H 2k+1 ) 2 ;
    或R13表示C2-C20烷基,其间杂有一或多个O;Or R 13 represents a C 2 -C 20 alkyl group, in which one or more O;
    或R13表示苯基;Or R 13 represents a phenyl group;
    k表示整数2;k represents an integer 2;
    R14表示C1-C20烷基或噻吩基;R 14 represents a C 1 -C 20 alkyl group or a thienyl group;
    R15表示苯基或萘基,其各是未经取代或经一或多个OR17或C1-C20烷基取代;R 15 represents phenyl or naphthyl, each of which is unsubstituted or substituted with one or more OR 17 or C 1 -C 20 alkyl groups;
    或R15表示噻吩基、氢、C1-C20烷基,该C1-C20烷基是未经取代或经一或多个以下基团取代:OR17、SR18、C3-C8环烷基、NR19R20或COOR17Or R 15 represents a thiophene group, hydrogen, C 1 -C 20 alkyl, C 1 -C 20 alkyl which is unsubstituted or substituted with one or more of the following groups: OR 17, SR 18, C 3 -C 8 -cycloalkyl, NR 19 R 20 or COOR 17 ;
    或R15表示C2-C20烷基,其间杂有SO2Or R 15 represents a C 2 -C 20 alkyl group, interspersed with SO 2 ;
    R16表示苯基或萘基,其各是未经取代或经一或多个以下基团取代:OR17、SR18、NR19R20或C1-C20烷基;R 16 represents a phenyl or naphthyl group, each of which is unsubstituted or substituted with one or more of the following groups: OR 17 , SR 18 , NR 19 R 20 or C 1 -C 20 alkyl;
    或R16表示噻吩基;Or R 16 represents a thienyl group;
    R17表示氢、C1-C8烷酰基、C1-C20烷基,该C1-C20烷基是未经取代或经一或多个以下基团取代:卤素、O(CO)-(C1-C4烷基)、O(CO)-(C2-C4)烯基或间杂有一或多个O的C3-C20环烷基;R 17 represents hydrogen, C 1 -C 8 alkanoyl, C 1 -C 20 alkyl, C 1 -C 20 alkyl which is unsubstituted or substituted with one or more of the following groups: halo, O (CO) a (C 1 -C 4 alkyl), O(CO)-(C 2 -C 4 )alkenyl group or a C 3 -C 20 cycloalkyl group having one or more O;
    或R17表示C2-C20烷基,其间杂有一或多个O;Or R 17 represents a C 2 -C 20 alkyl group, in which one or more O;
    R18表示C3-C20环烷基、C1-C20烷基,其是未经取代或经一或多个OH、O(CO)-(C2-C4)烯基或(CO)OR17取代;R 18 represents C 3 -C 20 cycloalkyl, C 1 -C 20 alkyl, which is unsubstituted or via one or more OH, O(CO)-(C 2 -C 4 )alkenyl or (CO) ) OR 17 replaced;
    或R18表示苯基,其是未经取代或经一或多个卤素取代;Or R 18 represents a phenyl group which is unsubstituted or substituted with one or more halogens;
    R19及R20彼此独立地为C1-C8烷酰基或C1-C8烷酰基氧基;R 19 and R 20 are each independently a C 1 -C 8 alkanoyl group or a C 1 -C 8 alkanoyloxy group;
    或R19及R20与其所附接的N原子一起形成间杂有O的5元或6元饱和环;Or R 19 and R 20 attached thereto together form a N atoms interrupted by O 5-membered or 6-membered saturated ring;
    但条件为在该分子中存在至少一个由式(2)所表示的基团;Provided that at least one group represented by formula (2) is present in the molecule;
    Figure PCTCN2015092029-appb-100025
    Figure PCTCN2015092029-appb-100025
  4. 根据权利要求1所述的感光性树脂组成物,其特征在于,所述含脂环式碳氢基的不饱和化合物(a-2-2)是选自为具有双环戊基的不饱和化合物、具有双环戊烯基的不饱和化合物及其混合物所组成的群。The photosensitive resin composition according to claim 1, wherein the alicyclic hydrocarbon group-containing unsaturated compound (a-2-2) is selected from the group consisting of unsaturated compounds having a bicyclopentyl group, A group consisting of unsaturated compounds having a dicyclopentenyl group and mixtures thereof.
  5. 根据权利要求4所述的感光性树脂组成物,其特征在于,所述含脂环式碳氢基的不饱和化合物(a-2-2)是选自由(甲基)丙烯酸双环戊酯、(甲基)丙烯 酸双环戊烯酯、(甲基)丙烯酸双环戊氧基乙酯、(甲基)丙烯酸双环戊烯氧基乙酯及其混合物所组成的群。The photosensitive resin composition according to claim 4, wherein the alicyclic hydrocarbon group-containing unsaturated compound (a-2-2) is selected from the group consisting of dicyclopentanyl (meth)acrylate, Methyl) propylene A group consisting of dicyclopentenyl acid ester, dicyclopentyloxyethyl (meth)acrylate, dicyclopentenyloxyethyl (meth)acrylate, and mixtures thereof.
  6. 根据权利要求1所述的感光性树脂组成物,其特征在于,所述具有乙烯性不饱和基的化合物(B)包括第一化合物(B-1),其中所述第一化合物(B-1)具有胺基甲酸酯基与至少7个丙烯酰基。The photosensitive resin composition according to claim 1, wherein the compound (B) having an ethylenically unsaturated group comprises a first compound (B-1), wherein the first compound (B-1) ) having a urethane group and at least 7 acryl groups.
  7. 根据权利要求6所述的感光性树脂组成物,其特征在于,所述第一化合物(B-1)具有胺基甲酸脂基与至少10个丙烯酰基。The photosensitive resin composition according to claim 6, wherein the first compound (B-1) has a urethane group and at least 10 acryl groups.
  8. 根据权利要求1所述的感光性树脂组成物,其特征在于,还包括染料(F)。The photosensitive resin composition according to claim 1, further comprising a dye (F).
  9. 根据权利要求8所述的感光性树脂组成物,其特征在于,所述染料(F)包括由式(f-1)表示的染料(F-1),The photosensitive resin composition according to claim 8, wherein the dye (F) comprises a dye (F-1) represented by the formula (f-1),
    Figure PCTCN2015092029-appb-100026
    Figure PCTCN2015092029-appb-100026
    式(f-1)中,In the formula (f-1),
    J1、J2、J3及J4各自独立表示氢原子、碳数为1至8的烷基、经取代的碳数为1至8的烷基、碳数为3至8的环烷基、经取代的碳数为3至8的环烷基、苯基或经取代的苯基;J 1 , J 2 , J 3 and J 4 each independently represent a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, a substituted alkyl group having 1 to 8 carbon atoms, and a cycloalkyl group having 3 to 8 carbon atoms. a substituted cycloalkyl group having 3 to 8 carbon atoms, a phenyl group or a substituted phenyl group;
    J5及J6各自独立表示氢原子、碳数为1至8的烷基或氯原子;J 5 and J 6 each independently represent a hydrogen atom, an alkyl group having 1 to 8 carbon atoms or a chlorine atom;
    J7表示具有聚合性不饱合基的基;J 7 represents a group having a polymerizable unsaturated group;
    a表示1至5的整数。a represents an integer from 1 to 5.
  10. 根据权利要求9所述的感光性树脂组成物,其特征在于,所述由式(f-1)表示的化合物包括由式(f-2)表示的化合物,The photosensitive resin composition according to claim 9, wherein the compound represented by the formula (f-1) includes a compound represented by the formula (f-2).
    Figure PCTCN2015092029-appb-100027
    Figure PCTCN2015092029-appb-100027
    式(f-2)中,In the formula (f-2),
    J1、J2、J3及J4各自独立表示氢原子、碳数为1至8的烷基、经取代的碳数为1至8的烷基、碳数为3至8的环烷基、经取代的碳数为3至8的环烷基、苯基或经取代的苯基;J 1 , J 2 , J 3 and J 4 each independently represent a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, a substituted alkyl group having 1 to 8 carbon atoms, and a cycloalkyl group having 3 to 8 carbon atoms. a substituted cycloalkyl group having 3 to 8 carbon atoms, a phenyl group or a substituted phenyl group;
    J5及J6各自独立表示氢原子、碳数为1至8的烷基或氯原子;J 5 and J 6 each independently represent a hydrogen atom, an alkyl group having 1 to 8 carbon atoms or a chlorine atom;
    J8表示具有聚合性不饱合基的基。J 8 represents a group having a polymerizable unsaturated group.
  11. 根据权利要求10所述的感光性树脂组成物,其特征在于,J8为由式(f-3)表示的基或由式(f-4)表示的基,The photosensitive resin composition according to claim 10, wherein J 8 is a group represented by the formula (f-3) or a group represented by the formula (f-4).
    Figure PCTCN2015092029-appb-100028
    Figure PCTCN2015092029-appb-100028
    式(f-3)及式(f-4)中,In the formula (f-3) and the formula (f-4),
    J9及J10各自独立表示氢原子或甲基;J 9 and J 10 each independently represent a hydrogen atom or a methyl group;
    V1、V2、V3及V4各自独立表示经取代或未经取代的碳数为1至12的烷二基;V 1 , V 2 , V 3 and V 4 each independently represent a substituted or unsubstituted alkanediyl group having 1 to 12 carbon atoms;
    Q1表示
    Figure PCTCN2015092029-appb-100029
    Q 1 indicates
    Figure PCTCN2015092029-appb-100029
    Q2表示二价脂环式烃基;Q 2 represents a divalent alicyclic hydrocarbon group;
    b表示0至12的整数;b represents an integer from 0 to 12;
    c及d各自独立表示0至6的整数。c and d each independently represent an integer from 0 to 6.
  12. 根据权利要求1所述的感光性树脂组成物,其特征在于,基于所述碱可溶性树脂(A)的使用量总和为100重量份,所述含乙烯性不饱和基的化合物(B)的使用量范围为20重量份至200重量份;所述光起始剂(C)的使用量范围为10重量份至100重量份;所述溶剂(D)的使用量范围为500重量份至5000重量份;所述颜料(E)的使用量范围为30重量份至300重量份。The photosensitive resin composition according to claim 1, wherein the total amount of the alkali-soluble resin (A) used is 100 parts by weight, and the ethylenically unsaturated group-containing compound (B) is used. The amount ranges from 20 parts by weight to 200 parts by weight; the photoinitiator (C) is used in an amount ranging from 10 parts by weight to 100 parts by weight; the solvent (D) is used in an amount ranging from 500 parts by weight to 5000 parts by weight. The pigment (E) is used in an amount ranging from 30 parts by weight to 300 parts by weight.
  13. 根据权利要求8所述的感光性树脂组成物,其特征在于,基于所述碱可溶性树脂(A)的使用量总和为100重量份,所述染料(F)的使用量范围为5重量份至90重量份。 The photosensitive resin composition according to claim 8, wherein the dye (F) is used in an amount of 5 parts by weight based on 100 parts by weight of the total amount of the alkali-soluble resin (A) used. 90 parts by weight.
  14. 根据权利要求1所述的感光性树脂组成物,其特征在于,基于所述碱可溶性树脂(A-2)的所述不饱和羧酸或不饱和羧酸酐化合物(a-2-1)、所述含脂环式碳氢基的不饱和化合物(a-2-2)及所述其它不饱和化合物(a-2-3)的合计量为100重量份,所述含脂环式碳氢基的不饱和化合物(a-2-2)的使用量范围为10重量份至50重量份。The photosensitive resin composition according to claim 1, wherein the unsaturated carboxylic acid or unsaturated carboxylic anhydride compound (a-2-1) based on the alkali-soluble resin (A-2) The total amount of the alicyclic hydrocarbon group-containing unsaturated compound (a-2-2) and the other unsaturated compound (a-2-3) is 100 parts by weight, and the alicyclic hydrocarbon group is contained. The unsaturated compound (a-2-2) is used in an amount ranging from 10 parts by weight to 50 parts by weight.
  15. 根据权利要求6所述的感光性树脂组成物,其特征在于,基于所述碱可溶性树脂(A)的使用量总和为100重量份,所述第一化合物(B-1)的使用量范围为5重量份至100重量份。The photosensitive resin composition according to claim 6, wherein the first compound (B-1) is used in an amount ranging from 100 parts by weight based on the total amount of the alkali-soluble resin (A) used. 5 parts by weight to 100 parts by weight.
  16. 根据权利要求1所述的感光性树脂组成物,其特征在于,基于所述碱可溶性树脂(A)的使用量总和为100重量份,所述光起始剂(C-1)的使用量范围为5重量份至100重量份。The photosensitive resin composition according to claim 1, wherein the photoinitiator (C-1) is used in an amount of 100 parts by weight based on the total amount of the alkali-soluble resin (A) used. It is 5 parts by weight to 100 parts by weight.
  17. 根据权利要求9所述的感光性树脂组成物,其特征在于,基于所述碱可溶性树脂(A)的使用量总和为100重量份,所述染料(F-1)的使用量范围为3重量份至90重量份。The photosensitive resin composition according to claim 9, wherein the dye (F-1) is used in an amount of 3 parts by weight based on 100 parts by weight of the total amount of the alkali-soluble resin (A). Parts to 90 parts by weight.
  18. 一种彩色滤光片的制造方法,其特征在于,使用权利要求1至17任一项的所述感光性树脂组成物而形成一像素层。A method of producing a color filter, comprising forming a pixel layer using the photosensitive resin composition according to any one of claims 1 to 17.
  19. 一种彩色滤光片,其特征在于,通过权利要求18的方法所制得。A color filter produced by the method of claim 18.
  20. 一种液晶显示装置,其特征在于,包括权利要求19的彩色滤光片。 A liquid crystal display device comprising the color filter of claim 19.
PCT/CN2015/092029 2014-10-15 2015-10-15 Photosensitive resin composition, method for manufacturing colour filter, colour filter and liquid crystal display device WO2016058551A1 (en)

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