TW201712430A - Photosensitive resin composition for black matrix and uses thereof - Google Patents

Abstract

The invention relates to a photosensitive resin composition for black matrix, a color filter formed by the black matrix, and a liquid crystal display element. The photosensitive resin composition comprises an alkali-soluble resin (A), a compound containing an ethylenically unsaturated group (B), a photoinitiator (C), a solvent (D), a black pigment (E), and a silane compound (F). The black matrix formed by the photosensitive resin composition has the advantage of linearity of pattern with high finesse.

Description

Photosensitive resin composition for black matrix and application thereof

The present invention relates to a photosensitive resin composition for a black matrix and a color filter and a liquid crystal display element formed using the black matrix. In particular, a photosensitive resin composition for a black matrix having a high linearity and a high-definition pattern, and a color filter and a liquid crystal display element formed using the black matrix are provided.

In recent years, with the vigorous development of various technologies of liquid crystal displays, and in order to improve the contrast and display quality of liquid crystal displays, strips and dots of color filters of black matrix in liquid crystal displays are usually set. In the gap between (dot). The black matrix prevents defects such as a decrease in contrast ratio and a decrease in color purity caused by light leakage between pixels.

In general, the black matrix may be a vapor deposited film having chromium or chromium oxide or the like. However, when a black matrix is produced by the vapor deposition film described above, it has a drawback that the process is complicated and the material is expensive. To solve this problem, the black matrix is formed by a photo lithographic technique.

Japanese Laid-Open Patent Publication No. 2006-259716 discloses a photosensitive resin composition for a black matrix. The photosensitive resin composition contains a highly used black pigment, an alkali-soluble resin, a photopolymerization initiator, a reactive monomer having a difunctional group, and an organic solvent. The difunctional reactive monomer improves the reaction between the compounds, and A fine pattern can be formed. Therefore, the obtained photosensitive resin composition has good light blocking properties and sensitivity.

Next, Japanese Patent Laid-Open No. 2008-268854 discloses a black A photosensitive resin composition for a color matrix. The photosensitive resin composition contains an alkali-soluble resin having a carboxylic acid group and an unsaturated group, a photopolymerizable monomer having an ethylenically unsaturated group, a photopolymerization initiator, and a high-usage black pigment. The above alkali-soluble resin having a carboxylic acid group and having an unsaturated group can improve the resolution of the photosensitive resin composition.

Although the prior art has improved the amount of black pigment used in the photosensitive resin group The product can increase the light-shielding property and the like. However, the black matrix formed by the photosensitive resin composition of each of the above-mentioned priors still has the defect of poor linearity of the high-definition pattern, and the efficiency of the black matrix is lowered.

Therefore, how to improve the high precision of the photosensitive resin composition for the black matrix The defect of the linearity of the fineness pattern is to meet the requirements of the current industry, and is an object of research in the technical field to which the present invention pertains.

The present invention provides a photosensitive resin composition for a linear black matrix of a high-definition pattern by using a component which provides a special alkali-soluble resin and a specific decane compound.

Accordingly, the present invention provides a photosensitive resin composition comprising: an alkali-soluble resin (A); a compound (B) having an ethylenically unsaturated group; a photoinitiator (C); a solvent (D); and a black pigment (E) And a decane compound (F); wherein: the alkali-soluble resin (A) comprises a resin (A-1) having an unsaturated group, wherein the unsaturated group-containing resin (A-1) is a mixture Polymerization is formed, and the mixture comprises an epoxy compound (a-1-1) having at least two epoxy groups and a compound (a-1-2) having at least one carboxylic acid group and at least one ethylenically unsaturated group; And the decane compound (F) comprises a first decane compound (F-1), wherein the first decane compound (F-1) has at least one structure represented by the following formula (FI):

Z ₁ represents an acryl group or a (meth)acryl group; Z ₂ represents a hydrogen atom, or may be interposed between a hetero atom selected by an oxygen atom, a sulfur atom, a nitrogen atom or a monovalent hydrocarbon group which may have a substituent of a carbonyl carbon; L represents a divalent hydrocarbon group which may have a substituent selected by an oxygen atom, a sulfur atom, a nitrogen atom or a carbonyl carbon; and W represents an intermediate A divalent hydrocarbon group which may have a substituent selected from a hetero atom selected by an oxygen atom, a sulfur atom or a nitrogen atom or a carbonyl carbon.

The present invention also provides a black matrix which is formed by pre-baking treatment, exposure treatment, development treatment, and post-baking treatment of the above-mentioned photosensitive resin composition.

The present invention further provides a color filter comprising the aforementioned black matrix.

The present invention further provides a liquid crystal display element comprising the aforementioned color filter.

The present invention provides a photosensitive resin composition comprising: an alkali-soluble resin (A); a compound (B) having an ethylenically unsaturated group; a photoinitiator (C); a solvent (D); a black pigment (E); And a decane compound (F); wherein: the alkali-soluble resin (A) comprises a resin (A-1) having an unsaturated group, wherein the unsaturated group-containing resin (A-1) is formed by polymerization of a mixture And the mixture comprises an epoxy compound (a-1-1) having at least two epoxy groups and a compound (a-1-2) having at least one carboxylic acid group and at least one ethylenically unsaturated group; The decane compound (F) comprises a first decane compound (F-1), wherein the first decane compound (F-1) has at least one structure represented by the following formula (FI) in the molecule:

Z ₁ represents an acryl group or a (meth)acryl group; Z ₂ represents a hydrogen atom, or may be interposed between a hetero atom selected by an oxygen atom, a sulfur atom, a nitrogen atom or a monovalent hydrocarbon group which may have a substituent of a carbonyl carbon; L represents a divalent hydrocarbon group which may have a substituent selected by an oxygen atom, a sulfur atom, a nitrogen atom or a carbonyl carbon; and W represents an intermediate A divalent hydrocarbon group which may have a substituent selected from a hetero atom selected by an oxygen atom, a sulfur atom or a nitrogen atom or a carbonyl carbon.

The alkali-soluble resin (A) according to the present invention contains an unsaturated group Resin (A-1). The alkali-soluble resin (A) may optionally contain other alkali-soluble resin (A-2).

The unsaturated group-containing resin (A-1) is formed by polymerization of a mixture. The mixture comprises an epoxy compound (a-1-1) having at least two epoxy groups and a compound (a-1-2) having at least one carboxylic acid group and at least one ethylenically unsaturated group. Further, the mixture may optionally contain a carboxylic anhydride compound (a-1-3) and a compound (a-1-4) having an epoxy group.

The epoxy compound (a-1-1) having at least two epoxy groups includes a compound having a structure represented by the following formula (aI), a compound having a structure represented by the following formula (a-II), and the above compound Combination:

In the formula (aI), A ₁ to A ₄ each independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 5 carbon atoms, an alkoxy group having 1 to 5 carbon atoms, and a carbon number of 6 to 12. An aryl group or an aralkyl group having 6 to 12 carbon atoms.

The compound having a structure represented by the formula (aI) may include a bisphenol quinoid compound having an epoxy group, wherein the bisphenol quinone compound having an epoxy group may be halogenated with a bisphenol fluorene compound. Epoxypropane (epihalohydrin) reaction derived.

Specific examples of the aforementioned bisphenol quinone type compound may include, but are not limited to, 9,9-bis(4-hydroxyphenyl)fluorine, 9,9-bis (4- 9,9-bis(4-hydroxy-3-methylphenyl)fluorine, 9,9-bis(4-hydroxy-3-chlorophenyl)fluorene [9,9- Bis(4-hydroxy-3-chlorophenyl)fluorine], 9,9-bis (4-hydroxyl) 9,9-bis(4-hydroxy-3-bromophenyl)fluorine, 9,9-bis(4-hydroxy-3-fluorophenyl)fluorene [9,9-bis (4-hydroxy-3-fluorophenyl)fluorine], 9,9-bis(4-hydroxy-3-methoxyphenyl)fluorine [9,9-bis(4-hydroxy-3-methoxyphenyl)fluorine], 9 ,9-bis(4-hydroxy-3,5-dimethylphenyl)fluorine, 9,9-bis(4-hydroxy- 9,9-bis(4-hydroxy-3,5-dichlorophenyl)fluorine, 9,9-bis(4-hydroxy-3,5-dibromophenyl)fluorene [9,9-bis(4-hydroxy-3,5-dibromophenyl)fluorine], a similar compound of a bisphenol quinoid type compound, or any combination of the above compounds.

Specific examples of the aforementioned epihalohydrin may include but not It is limited to 3-chloro-1,2-epoxyhydrin, 3-bromo-1,2-epoxyhydrin, a similar compound of halogenated propylene oxide, or any combination of the above compounds.

Specific examples of the epoxy group-containing bisphenol quinoid compound may include, but are not limited to (1) Products manufactured by Nippon Steel Chemical Co., Ltd., for example, products of the type ESF-300 or similar products; (2) goods manufactured by Osaka Gas, for example, products of the type PG-100 or EG-210, or Similar products; (3) Goods manufactured by SMS Technology Co., for example, products of the type SMS-F9PhPG, SMS-F9CrG or SMS-F914PG, or the like.

In the formula (a-II), A ₅ to A ₁₈ each independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 8 carbon atoms or an aromatic group having 6 to 15 carbon atoms; and u represents 0 to 10 The integer.

The compound having a structure represented by the formula (a-II) can react a compound having a structure represented by the following formula (a-II-1) with a halogenated propylene oxide in the presence of an alkali metal hydroxide. Get:

In the formula (a-II-1), the definitions of A ₅ to A ₁₈ and u are as described above, and are not described herein.

A method for synthesizing a compound having a structure represented by the formula (a-II) is a compound having a structure represented by the following formula (a-II-3) and a phenol compound in the presence of an acid catalyst. A condensation reaction is carried out to form a compound having a structure as shown in the formula (a-II-1):

In the formula (a-II-3), A ₁₉ and A ₂₀ each independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 8 carbon atoms or an aromatic group having 6 to 15 carbon atoms; U ₁ and U; ₂ independently represents a halogen atom, an alkyl group having 1 to 6 carbon atoms or an alkoxy group having 1 to 6 carbon atoms. The above alkyl group is preferably a methyl group, an ethyl group or a tert-butyl group, and the alkoxy group is preferably a methoxy group or an ethoxy group.

Specific examples of the aforementioned phenolic compound may include, but are not limited to, phenol, cresol, ethylphenol, n-propylphenol, isobutylphenol, t-butanol (t-butylphenol), octylphenol, nonylphenol, xylenol, methylbutylphenol, Di-t-butylphenol, vinylphenol, propenylphenol, ethinylphenol, cyclopentylphenol, cyclohexylphenol, cyclohexylcresol (cyclohexylcresol) or a similar compound of a phenolic compound. The phenolic compound may be used singly or in combination of plural kinds.

The amount of the compound based on the foregoing structure having the structure shown by the formula (a-II-3) For 1 mole, the phenolic compound is used in an amount of from 0.5 moles to 20 moles, and preferably from 2 moles to 15 moles.

Specific examples of the above acid catalyst may include, but are not limited to, hydrochloric acid, sulfuric acid, and para An analog of p-toluenesulfonic acid, oxalic acid, boron trifluoride, aluminum chloride anhydrous, zinc chloride or acid catalyst. The acid catalyst may be used singly or in combination of plural kinds.

The acid catalyst may preferably be p-toluenesulfonic acid, sulfuric acid, hydrochloric acid or the above compound Any combination of things.

The amount of the acid catalyst used is not particularly limited. Based on the foregoing The compound of the structure shown in (II-1-1) is used in an amount of 100% by weight, and the acid catalyst is used in an amount of from 0.1% by weight to 30% by weight.

The aforementioned condensation reaction can be carried out in the absence of a solvent or an organic solvent. Specific examples of the organic solvent may be toluene, xylene, methyl isobutyl ketone or the like. The organic solvent may be used singly or in combination of plural kinds.

Based on the aforementioned compound having a structure represented by formula (a-II-3) and phenolation The total amount of the compound used is 100% by weight, and the organic solvent is used in an amount of 50% by weight to 300% by weight, preferably 100% by weight to 250% by weight.

The reaction temperature of the condensation reaction can be from 40 ° C to 180 ° C, and the reaction time It can be from 1 hour to 8 hours.

After the condensation reaction is completed, it can be selectively neutralized or washed. deal with.

The neutralization treatment described above adjusts the pH of the solution after the reaction to 3 7, preferably 5 to 7.

The above washing treatment can be carried out using a neutralizing agent. The neutralizing agent can be a base Specific substances, and specific examples of the neutralizing agent may include, but are not limited to, ammonia, sodium dihydrogen phosphate, sodium hydroxide or potassium hydroxide. Oxide; alkaline earth metal hydroxide such as calcium hydroxide or magnesium hydroxide; diethylene triamine, triethylenetetramine, aniline Or an organic amine such as phenylene diamine or any combination of the above compounds. The neutralizing agent may be used singly or in combination of plural kinds.

This water washing treatment can be carried out by a conventional method. For example: will contain neutralization An aqueous solution of the agent is added to the solution after the reaction, and extraction is repeated. After the neutralization treatment or the water washing treatment, the unreacted phenolic compound and the solvent in the solution can be removed by heat treatment under reduced pressure, and concentrated to obtain a compound having a structure represented by the formula (a-II-1). .

When the condensation reaction is completed, an excess of halogenated propylene oxide is added to make the halogen The propylene oxide is subjected to dehydrohalogenation with a compound having a structure represented by the formula (a-II-1), and a compound having a structure represented by the formula (a-II) can be obtained.

Specific examples of the aforementioned halogenated propylene oxide may include, but are not limited to, 3-chloro-1,2-ring Oxypropane, 3-bromo-1,2-epoxypropane or a combination of the above.

Before performing the aforementioned dehydrohalogenation reaction, sodium hydroxide or potassium hydroxide, etc. The alkali metal hydroxide may be added in advance or added to the reaction solution during the reaction. The The reaction temperature for the dehydrohalogenation reaction may be from 20 ° C to 120 ° C, and the reaction time may be from 1 hour to 10 hours.

In one embodiment, the aforementioned alkali metal hydroxide can be an aqueous solution. In this embodiment, when an aqueous alkali metal hydroxide solution is continuously added to the reaction system for dehydrohalogenation reaction, water and halogenated propylene oxide are continuously distilled off under reduced pressure or normal pressure to separate and remove water. And the halogenated propylene oxide can be continuously refluxed into the reaction system.

Tetramethylammonium chloride (tetramethyl chloride) before dehydrohalogenation Ammonium chloride), tetramethyl ammonium bromide, trimethyl benzyl ammonium chloride, etc. can be added to the reaction system as a catalyst, and at 50 After reacting at ° C to 150 ° C for 1 hour to 5 hours, an alkali metal hydroxide or an aqueous solution thereof is added to the reaction system. Then, the reaction is carried out at 20 ° C to 120 ° C for 1 hour to 10 hours to carry out a dehydrohalogenation reaction.

a hydroxyl group in a compound having a structure represented by the formula (a-II-1) The total equivalent number is 1 equivalent, and the halogenated propylene oxide is used in an amount of 1 equivalent to 20 equivalents, and preferably 2 equivalents to 10 equivalents. The total number of hydroxyl groups in the compound having the structure represented by the formula (a-II-1) is 1 equivalent, and the alkali metal hydroxide in the dehydrohalogenation reaction is used in an amount of 0.5 to 15 equivalents, and It is preferably from 0.9 equivalents to 11 equivalents.

In order to make the above dehydrohalogenation reaction proceed smoothly, alcohol such as methanol or ethanol A class of compounds can be added to the reaction system. Further, an aprotic polar solvent such as dimethyl sulfone or dimethyl sulfoxide may be added to the reaction system.

When an alcohol compound is used, based on the above-mentioned total of halogenated propylene oxide The amount used is 100% by weight, and the amount of the alcohol compound used is 2% by weight to 20% by weight, and preferably 4% by weight to 15% by weight. When an aprotic polar solvent is used, the total amount of halogenated propylene oxide used is 100% by weight, and the aprotic polar solvent is used in an amount of 5 to 100% by weight, and preferably 10% by weight to 90% by weight.

When the aforementioned dehydrohalogenation reaction is carried out, the reaction system can selectively carry out water Wash treatment. Then, the halogenated propylene oxide, the alcohol compound, and the aprotic polar solvent are removed in an environment having a temperature of 110 ° C to 250 ° C and a pressure of 1.3 kPa (10 mmHg) or less.

In order to avoid the formation of epoxy resin with hydrolyzable halogen, The solution after dehydrohalogenation reaction may be added with a solvent such as toluene or methyl isobutyl ketone or an aqueous alkali metal hydroxide solution such as sodium hydroxide or potassium hydroxide, and the dehydrohalogenation reaction may be carried out again. . In the foregoing dehydrohalogenation reaction, the total number of hydroxyl groups in the compound having the structure represented by the formula (II-1) is 1 equivalent, and the alkali metal hydroxide is used in an amount of 0.01 mol to 0.3 mol. Ear, and preferably from 0.05 moles to 0.2 moles. Further, the reaction temperature of the dehydrohalogenation reaction may be from 50 ° C to 120 ° C, and the reaction time may be from 0.5 hour to 2 hours.

When the dehydrohalogenation reaction is completed, the salt in the reaction solution can be filtered by The solvent is removed by a step such as washing, and a solvent such as toluene or methyl isobutyl ketone can be distilled off by heating under reduced pressure to form a compound having a structure represented by the formula (a-II). Specific examples of the compound having a structure represented by the formula (a-II) may include, but are not limited to, those manufactured by Nippon Kayaku Co., Ltd., and the models thereof are NC-3000, NC-3000H, NC-3000S, and NC-3000P.

Having at least one carboxylic acid group and at least one ethylenically unsaturated group The compound (a-1-2) may be selected from the group consisting of (1) to (3): (1) acrylic acid, methacrylic acid, 2-methylpropenyloxyethyl succinic acid (2-methacryloyloxyethylbutanedioic acid), 2-methylpropenyloxybutyl succinic acid, 2-methylpropenyloxyethyl adipate, 2-methylpropenyloxybutyl adipate, 2-methyl Propylene oxiranyl hexahydrophthalic acid, 2-methyl propylene oxiranyl maleic acid, 2-methyl propylene oxiranyl maleic acid, 2-methyl propylene oxybutyl maleic acid , 2-methacryloxypropyl succinic acid, 2-methylpropenyl oxypropyl adipate, 2-methylpropenyl propyl propyl tetra Hydrogen phthalic acid, 2-methyl propylene oxypropyl phthalic acid, 2-methyl propylene oxy butyl phthalic acid or 2-methyl propylene oxy butyl hydrogen phthalic acid a compound; (2) a compound obtained by reacting a (meth) acrylate having a hydroxyl group with a dicarboxylic acid compound, wherein specific examples of the dicarboxylic acid compound may include adipic acid, succinic acid, and maleic acid. Or a compound such as phthalic acid; (3) a reaction between a (meth) acrylate having a hydroxyl group and a carboxylic anhydride compound (a-1-3; please refer to the following description, which is not described herein) Specific examples of the (meth) acrylate having a hydroxyl group may include 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate [(2- Hydroxyethyl)methacrylate], 2-hydroxypropyl acrylate, 2-hydroxypropyl methacrylate, 4-hydroxybutyl acrylate [(4- Hydroxybutyl)acrylate], 4-hydroxybutylmethacrylate [(4-hydroxybutyl)methacrylate] or pentaerythritol trimethacrylate Of compound.

The carboxylic anhydride compound (a-1-3) may be selected from a dicarboxylic acid anhydride compound, a tetracarboxylic acid anhydride compound, or any combination of the above compounds.

The aforementioned dicarboxylic anhydride compound may include, but is not limited to, butanedioic anhydride, maleic anhydride, itaconic anhydride, phthalic anhydride, tetrahydrogen. Tetrahydrophthalic anhydride, hexahydrophthalic anhydride, methyltetrahydrophthalic anhydride, methylhexahydrophthalic anhydride, methyl bridged methylene tetrahydrogen Dicarboxylic anhydrides such as methyl endo-methylene tetrahydro phthalic anhydride, chlorendic anhydride, glutaric anhydride or 1,3-dioxoisobenzofuran-5-carboxylic anhydride Compound

The aforementioned tetracarboxylic acid anhydride compound may include, but is not limited to, benzophenone tetramethyl A quaternary carboxylic anhydride compound such as benzophenone tetracarboxylic dianhydride (BTDA), diphenyltetracarboxylic dianhydride or diphenyl ether tetracarboxylic dianhydride.

Specific examples of the epoxy group-containing compound (a-1-4) may include, but are not limited to, Glycidyl methacrylate, 3,4-epoxycyclohexyl methacrylate, a glycidyl ether compound having an unsaturated group, an unsaturated compound having an epoxy group, or a combination of the above compounds.

Specific examples of the glycidyl ether compound having an unsaturated group include It is not limited to products manufactured by Nagase Chemical Industry Co., Ltd., and its models are Denacol EX-111, Denacol EX-121, Denacol EX-141, Denacol EX-145, Denacol EX-146, Denacol EX-171, and Denacol EX-192. .

The unsaturated group-containing resin (A-1) may have the formula (a-I) An epoxy compound (a-1-1) having at least two epoxy groups and a compound (a-1-2) having at least one carboxylic acid group and at least one ethylenically unsaturated group are reacted to form The reaction product of a hydroxyl group. Then, the obtained reaction product is reacted with a carboxylic anhydride compound (a-1-3) to obtain a resin (A-1) having an unsaturated group of the present invention. The number of equivalents of the acid group based on the above-mentioned reaction product having a hydroxyl group is 1 equivalent, and the number of equivalents of the acid anhydride group of the carboxylic anhydride compound (a-1-3) is from 0.4 equivalent to 1 equivalent, and preferably from 0.75 equivalent to 1 equivalent. When a plurality of carboxylic anhydride compounds (a-1-3) are used, such carboxylic anhydride compounds (a-1-3) may be added sequentially or simultaneously to the reaction. When the carboxylic anhydride compound (a-1-3) contains a dicarboxylic anhydride compound and a tetracarboxylic anhydride compound, the molar ratio of the dicarboxylic anhydride compound and the tetracarboxylic anhydride compound is from 1/99 to 90/10, Good for 5/95 to 80/20. The above reaction has an operating temperature in the range of 50 ° C to 130 ° C.

The unsaturated group-containing resin (A-1) may have the formula (a-II) An epoxy compound (a-1-1) having at least two epoxy groups and a compound (a-1-2) having at least one carboxylic acid group and at least one ethylenically unsaturated group are reacted to form The reaction product of a hydroxyl group. Then, the obtained reaction product and the carboxylic anhydride compound (a-1-3) And/or the compound (a-1-4) having an epoxy group is reacted to obtain a resin (A-1) having an unsaturated group of the present invention. The total number of equivalents of the epoxy group in the epoxy compound (a-1-1) having at least two epoxy groups having a structure represented by the formula (a-II) is 1 equivalent, which has at least one carboxyl group The compound having an acid group and at least one ethylenically unsaturated group (a-1-2) has an acid number equivalent number of from 0.8 equivalents to 1.5 equivalents, and preferably from 0.9 equivalents to 1.1 equivalents. The carboxylic anhydride compound (a-1-3) is used in an amount of from 10 mol% to 100 mol%, preferably 20 mol%, based on the total amount of the hydroxyl group of the reaction product having a hydroxyl group of 100 mol%. A percentage of 100 moles, and more preferably from 30 mole percent to 100 mole percent.

When preparing the aforementioned resin (A-1) having an unsaturated group, in order to accelerate the reverse At the rate, a basic compound is generally added to the reaction solution as a reaction catalyst. Specific examples of the reaction catalyst may include, but are not limited to, triphenyl phosphine, triphenyl stibine, triethylamine, triethanolamine, tetramethylammonium chloride ( Tetramethylammonium chloride) or a compound such as benzyltriethylammonium chloride. The aforementioned reaction catalysts may be used singly or in combination of plural kinds.

Based on the foregoing epoxy compound (a-1-1) having at least two epoxy groups and The total amount of the compound (a-1-2) having at least one carboxylic acid group and at least one ethylenically unsaturated group is 100 parts by weight, and the reaction catalyst is used in an amount of from 0.01 part by weight to 10 parts by weight, and It is preferably from 0.3 part by weight to 5 parts by weight.

Next, in order to control the polymerization of the aforementioned unsaturated group-containing resin (A-1) Degree, an inhibitor can be added to the reaction solution. Specific examples of the polymerization inhibitor may include, but are not limited to, methoxyphenol, methylhydroquinohe, hydroquinone, 2,6-di-t-butyl-p-cresol (2,6). -di-t-butyl-p-cresol) or a compound such as phenothiazine. The polymerization inhibitor may be used singly or in combination of plural kinds.

Based on the foregoing epoxy compound (a-1-1) having at least two epoxy groups and The total amount of the compound (a-1-2) having at least one carboxylic acid group and at least one ethylenically unsaturated group is 100 parts by weight, and the polymerization inhibitor is used in an amount of from 0.01 part by weight to 10 parts by weight, and It is preferably from 0.1 part by weight to 5 parts by weight.

Further, when the aforementioned resin (A-1) having an unsaturated group is prepared, polymerization is carried out. A reaction solvent can be added to the reaction solution. Specific examples of the polymerization solvent may include, but are not limited to, an alcohol compound such as ethanol, propanol, isopropanol, butanol, isobutanol, 2-butanol, hexanol or ethylene glycol; methyl ethyl ketone or cyclohexanone; a ketone compound; an aromatic hydrocarbon compound such as toluene or xylene; a cellosolve compound such as celecin or butyl cellosolve; carbital or butyl carbene a propylene glycol alkyl ether compound such as propylene glycol monomethyl ether; a poly(propylene glycol alkyl ether) such as di(propylene glycol) methyl ether; a compound; an acetate compound such as ethyl acetate, butyl acetate, ethylene glycol monoethyl ether acetate or propylene glycol methyl ether acetate; ethyl lactate or An alkyl lactate compound such as butyl lactate; or a dialkyl glycol ether compound. The polymerization solvent may be used singly or in combination of plural kinds.

The acid value of the resin (A-1) having an unsaturated group prepared by the present invention is 50 From mgKOH/g to 150 mgKOH/g.

The above unsaturated group-containing resin (A-1) by colloidal permeation chromatography (Gel) The polystyrene-equivalent weight average molecular weight measured by Permeation Chromatography, GPC) is preferably from 800 to 8,000, more preferably from 1,000 to 6,000.

The amount of the alkali-soluble resin (A) used is 100 parts by weight, which has The saturated base resin (A-1) is used in an amount of 30 parts by weight to 100 parts by weight, preferably 40 parts by weight to 100 parts by weight, and more preferably 50 parts by weight to 100 parts by weight.

When the alkali-soluble resin (A) of the present invention does not contain a tree having an unsaturated group In the case of the fat (A-1), the black matrix formed by the photosensitive resin composition has a high definition map The flaw in the linearity of the case.

The other alkali-soluble resin (A-2) described above may include, but is not limited to, having a carboxy group. Acid or hydroxyl resin. Specific examples of the other alkali-soluble resin (A-2) may be an acrylic resin, a urethane resin, a novolac resin or the like other than the unsaturated group-containing resin (A-1). Alkali soluble resin.

The above other alkali-soluble resin (A-2) by colloidal permeation chromatography (Gel) The polystyrene-equivalent weight average molecular weight measured by Permeation Chromatography, GPC) is preferably from 3,000 to 30,000, more preferably from 5,000 to 25,000.

The amount of the alkali-soluble resin (A) used is 100 parts by weight, and other alkalis may be used. The soluble resin (A-2) is used in an amount of from 0 part by weight to 70 parts by weight, preferably from 0 part by weight to 40 parts by weight, and more preferably from 0 part by weight to 50 parts by weight.

The compound (B) having an ethylenically unsaturated group according to the present invention may contain The compound (B-1) having one ethylenically unsaturated group or the compound (B-2) having two or more (including two) ethylenically unsaturated groups.

Specific examples of the compound (B-1) having one ethylenically unsaturated group may be Including but not limited to (meth)acrylamide, (meth) propylene morpholine, (meth) acrylate-7-amino-3,7-dimethyloctyl ester, isobutyl Oxymethyl(meth)acrylamide, isobornyloxyethyl (meth)acrylate, isobornyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, ethyldiethyl Glycol (meth) acrylate, trioctyl (meth) acrylamide, diacetone (meth) acrylamide, dimethylaminoethyl (meth) acrylate, (meth) acrylate Dialkyl ester, dicyclopentenyloxyethyl (meth)acrylate, dicyclopentenyl (meth)acrylate, N,N-dimethyl(meth)acrylamide, (meth)acrylic acid Tetrachlorophenyl ester, 2-tetrachlorophenoxyethyl (meth)acrylate, tetrahydrofurfuryl (meth)acrylate, tetrabromophenyl (meth)acrylate, (A) Ethyl 4-tetrabromophenoxyethyl acrylate, 2-trichlorophenoxyethyl (meth)acrylate, tribromophenyl (meth)acrylate, 2-tribromo(meth)acrylate Phenoxyethyl ester, 2-hydroxy-(methyl) propylene Ethyl acetate, propyl 2-hydroxy-(meth)acrylate, vinyl caprolactam, nitrogen-vinylpyrrolidone, phenoxyethyl (meth)acrylate, pentachlorophenyl (meth)acrylate, A compound such as pentabromophenyl (meth)acrylate, polyethylene mono(meth)acrylate, propylene mono(meth)acrylate or borneol (meth)acrylate. The compound (B-1) having one ethylenically unsaturated group may be used singly or in combination of plural kinds.

a compound having two or more (including two) ethylenically unsaturated groups Specific examples of (B-2) may include, but are not limited to, ethylene glycol di(meth)acrylate, dicyclopentenyl di(meth)acrylate, triethylene glycol di(meth)acrylate, tetraethyl b. Diol (meth) acrylate, tris(2-hydroxyethyl) isocyanate di(meth) acrylate, tris(2-hydroxyethyl) isocyanate tri(meth) acrylate, Ester-modified tris(2-hydroxyethyl)isocyanate tri(meth)acrylate, tris(meth)acrylic acid trimethylolpropyl ester, ethylene oxide (EO) modified three Trimethylolpropyl (meth)acrylate, propylene oxide (PO) modified tris(meth)acrylate tris(meth)acrylate, tripropylene glycol di(meth)acrylate, neopentyl Alcohol di(meth)acrylate, 1,4-butanediol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, pentaerythritol tri(meth)acrylate, pentaerythritol IV (Meth) acrylate, polyester di(meth) acrylate, polyethylene glycol di(meth) acrylate, dipentaerythritol hexa(meth) acrylate, dipentaerythritol penta (meth) acrylate, two Pentaerythritol tetra(meth)acrylate, Lactate-modified dipentaerythritol hexa(meth) acrylate, caprolactone-modified dipentaerythritol penta (meth) acrylate, di(trimethylolpropane) tetra (dimethylolpropane) tetra (meth)acrylate], epoxide-modified bisphenol A di(meth) acrylate, propylene oxide modified bisphenol A di(meth) acrylate, modified with ethylene oxide Hydrogenated bisphenol A di(meth) acrylate, propylene oxide modified hydrogenated bisphenol A di(meth) acrylate, propylene oxide modified glycerol tri(meth) acrylate, via ring Ethylene oxide modified bisphenol F di(meth)acrylate, novolak polyglycidyl ether (meth) acrylate or any combination of the above. The compound having two or more (including two) ethylenically unsaturated groups may be used alone or in combination. A variety of uses.

Specific examples of the compound (B) having an ethylenically unsaturated group may be included Including but not limited to trimethylolpropyl triacrylate, trimethylolpropyl triacrylate modified with ethylene oxide, trimethylolpropyl triacrylate modified with propylene oxide, pentaerythritol triacrylate , pentaerythritol tetraacrylate, dipentaerythritol hexaacrylate, dipentaerythritol pentaacrylate, dipentaerythritol tetraacrylate, caprolactone modified dipentaerythritol hexaacrylate, ditrimethylolpropyl methacrylate, propylene oxide Modified triglyceride or any combination of the above.

The compound (B) having an ethylenically unsaturated group is preferably triacrylic acid. Trimethylolpropyl propyl ester, dipentaerythritol tetraacrylate, dipentaerythritol hexaacrylate or any combination of the above.

The amount of the alkali-soluble resin (A) used is 100 parts by weight, which has B The ethylenically unsaturated group-containing compound (B) is used in an amount of 10 parts by weight to 100 parts by weight, preferably 12 parts by weight to 90 parts by weight, and more preferably 15 parts by weight to 80 parts by weight.

The photoinitiator (C) according to the invention comprises a photoinitiator (C-1) having the structure of formula (CI):

Wherein R ₁ , R ₂ , R ₃ , R ₄ , R ₅ , R ₆ , R ₇ and R ₈ are each independently hydrogen, C ₁ -C ₂₀ alkyl, , COR ₁₆ , OR ₁₇ , halogen, NO ₂ or Or R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ , R ₅ and R ₆ , R ₆ and R ₇ or R ₇ and R ₈ are each independently Substituted C ₂ -C ₁₀ alkenyl or R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ , R ₅ and R ₆ , R ₆ and R ₇ or R ₇ and R ₈ are independently of each other -(CH ₂ ) _P -Y-(CH ₂ ) _q -; or R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ , R ₅ and R ₆ , R ₆ and R ₇ or R ₇ and R _{8 is} independent of each other However, the condition is at least one of R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ , R ₅ and R ₆ , R ₆ and R ₇ or R ₇ and R ₈ R _9, R _10, R ₁₁ and R ₁₂ independently of one another hydrogen, C ₁ -C ₂₀ alkyl, C ₁ -C ₂₀ alkyl which is unsubstituted or substituted with one or more of the following radicals: halogen, phenyl a group, CN, OH, SH, C ₁ -C ₄ -alkoxy, (CO)OH or (CO)O(C ₁ -C ₄ alkyl); or R ₉ , R ₁₀ , R ₁₁ and R ₁₂ A phenyl group which is independently substituted with an unsubstituted phenyl group or substituted with one or more of the following groups: C ₁ -C ₆ alkyl, halogen, CN, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₉ , R ₁₀ , R ₁₁ and R ₁₂ are, independently of each other, halogen, CN, OR ₁₇ , SR ₁₈ , SOR ₁₈ , SO ₂ R ₁₈ or NR ₁₉ R ₂₀ , wherein the substituents OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ Optionally forming a 5- or 6-membered ring with a carbon atom in the naphthyl ring via the group R ₁₇ , R ₁₈ , R ₁₉ and/or R ₂₀ ; or R ₉ , R ₁₀ , R ₁₁ and R ₁₂ are independently of each other , COR ₁₆ or NO ₂ ; Y series O, S, NR ₂₆ or direct bond; p is an integer 0, 1, 2 or 3; q is an integer 1, 2 or 3; X is CO or direct bond; R ₁₃ is C _{a 1-} C ₂₀ alkyl group which is unsubstituted or substituted with one or more of the following groups: halogen, R ₁₇ , COOR ₁₇ , OR ₁₇ , SR ₁₈ , CONR ₁₉ R ₂₀ , NR ₁₉ R ₂₀ , PO (OC _k H _2k+1 ) ₂ or Or R ₁₃ is a C ₂ -C ₂₀ alkyl group, interspersed with one or more of O, S, SO, SO ₂ , NR ₂₆ or CO, or a C ₂ -C ₁₂ alkenyl group, which has no inter a plurality of O, CO or NR ₂₆ wherein the C ₂ -C ₂₀ alkyl group and the unintervened or interstitial C ₂ -C ₁₂ alkenyl group are unsubstituted or substituted by one or more halogens; or R ₁₃ Is a C ₄ -C ₈ cycloalkenyl group, a C ₂ -C ₁₂ alkynyl group or a C ₃ -C ₁₀ cycloalkyl group having one or more O, S, CO or NR ₂₆ undoped or inter-hetero; or R _13- based benzene Or a naphthyl group, each of which is unsubstituted or substituted with one or more of the following groups: OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ , _{, COR 16, CN, NO 2} , halogen, C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, interrupted by one or more O, S, CO or NR C ₂₆ of ₂ -C ₂₀ alkyl group; or via their respective C ₃ -C ₁₀ cycloalkyl, or interrupted by one or more O, S, CO or NR ₂₆ of the C ₃ -C ₁₀ cycloalkyl; based integer k 1 to 10; R ₁₄ type hydrogen, C ₃ -C ₈ cycloalkyl, C ₂ -C ₅ alkenyl, C ₁ -C ₂₀ alkoxy or C ₁ -C ₂₀ alkyl, unsubstituted or via one or more halogens, phenyl, C ₁ - C ₂₀ alkylphenyl or CN substituted; or R ₁₄ phenyl or naphthyl, each unsubstituted or substituted by one or more of the following groups: C ₁ -C ₆ alkyl, C ₁ -C ₄ haloalkane a group, a halogen, CN, OR ₁₇ , SR ₁₈ and/or NR ₁₉ R ₂₀ ; or R ₁₄ C ₃ -C ₂₀ heteroaryl, C ₁ -C ₈ alkoxy, benzyloxy or phenoxy, Benzyloxy and phenoxy are unsubstituted or substituted by one or more C ₁ -C ₆ alkyl, C ₁ -C ₄ haloalkyl and/or halogen; R ₁₅ C ₆ -C ₂₀ aryl or C ₃ a -C ₂₀ heteroaryl group, each unsubstituted or substituted by one or more of the following groups: phenyl, halo, C ₁ -C ₄ haloalkyl, CN, NO ₂ , OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ , PO (OC _k H _{2k +1 2} , SO-C ₁ -C ₁₀ alkyl, SO ₂ -C ₁ -C ₁₀ alkyl, hetero- or one or more C ₂ -C ₂₀ alkyl groups of O, S or NR ₂₆ ; or each of them C ₁ -C ₂₀ alkyl substituted, the C ₁ -C ₂₀ alkyl group is unsubstituted or substituted with one or more of the following groups: halogen, COOR ₁₇ , CONR ₁₉ R ₂₀ , phenyl, C ₃ -C ₈ cycloalkyl , C ₃ -C ₂₀ heteroaryl, C ₆ -C ₂₀ aryloxycarbonyl, C ₃ -C ₂₀ heteroaryloxycarbonyl, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₁₅ hydrogen, C ₂ a -C ₁₂ alkenyl group, a C ₃ -C ₈ cycloalkyl group having one or more O, CO or NR ₂₆ undoped or inter-hetero; or an R ₁₅ -C ₁ -C ₂₀ alkyl group, which is unsubstituted or Or substituted with more than one of the following groups: halogen, OR ₁₇ , SR ₁₈ , C ₃ -C ₈ cycloalkyl, C ₃ -C ₂₀ heteroaryl, C ₆ -C ₂₀ aryloxycarbonyl, C ₃ -C ₂₀ An aryloxycarbonyl group, NR ₁₉ R ₂₀ , COOR ₁₇ , CONR ₁₉ R ₂₀ , PO(OC _k H _2k+1 ) ₂ , Or a phenyl group; or the C ₁ -C ₂₀ alkyl group substituted by a phenyl group, which is halogen, C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ Substituting; or R ₁₅ is a C ₂ -C ₂₀ alkyl group, interspersed with one or more O, SO or SO ₂ , and the interstitial C ₂ -C ₂₀ alkyl group is unsubstituted or has one or more of the following groups Group substitution: halogen, OR ₁₇ , COOR ₁₇ , CONR ₁₉ R ₂₀ , phenyl or phenyl substituted by OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₁₅ C ₂ -C ₂₀ alkanoyl or benzoyl A thiol group which is unsubstituted or substituted with one or more of the following groups: C ₁ -C ₆ alkyl, halogen, phenyl, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₁₅ is unsubstituted or a naphthylmethyl group substituted by one or more OR ₁₇ or a C ₃ -C ₁₄ heteroarylcarbonyl group; or an R ₁₅ C ₂ -C ₁₂ alkoxycarbonyl group, which has no or a heterogeneous one or more O And the inter- or un-doped C ₂ -C ₁₂ alkoxycarbonyl group is unsubstituted or substituted by one or more hydroxyl groups; or R ₁₅ is a phenoxycarbonyl group which is unsubstituted or one or more of the following Group substitution: C ₁ -C ₆ alkyl, halogen, C ₁ -C ₄ haloalkyl, phenyl, OR ₁₇ , S R ₁₈ or NR ₁₉ R ₂₀ ; or R ₁₅ is CN, CONR ₁₉ R ₂₀ , NO ₂ , C ₁ -C ₄ haloalkyl, S(O) _m -C ₁ -C ₆ alkyl, unsubstituted or C ₁ -C ₁₂ alkyl or SO ₂ -C ₁ -C ₆ alkyl substituted S(O) _m -phenyl; or R ₁₅ -based SO ₂ O-phenyl which is unsubstituted or C ₁ -C ₁₂ Alkyl substituted; or diphenylphosphonium or di(C ₁ -C ₄ alkoxy)-phosphonium; m system 1 or 2; R' ₁₄ has one of the meanings given for R ₁₄ ; R' ₁₅ has one of the meanings given for R ₁₅ ; X ₁ is O, S, SO or SO ₂ ; X ₂ is O, CO, S or direct bond; R ₁₆ is C ₆ - C ₂₀ a C ₃ -C ₂₀ heteroaryl group, each unsubstituted or substituted by one or more of the following groups: phenyl, halogen, C ₁ -C ₄ haloalkyl, CN, NO ₂ , OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ or interrupted by one or more O, S or NR C ₂₆ of ₁ -C ₂₀ alkyl group; or each with one or more C ₁ -C ₂₀ alkyl, C ₁ -C ₂₀ alkoxy which Substituent substituted or substituted with one or more of the following groups: halogen, COOR ₁₇ , CONR ₁₉ R ₂₀ , phenyl, C ₃ -C ₈ cycloalkyl, C ₃ -C ₂₀ heteroaryl, C ₆ -C ₂₀ aryloxycarbonyl, C ₃ -C ₂₀ heteroaryloxycarbonyl, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₁₆ is hydrogen, C ₁ -C ₂₀ alkyl, the C ₁ -C ₂₀ alkyl group is unsubstituted or substituted with one or more of the following groups: halogen, phenyl , OH, SH, CN, C ₃ -C ₆ alkenyloxy, OCH ₂ CH ₂ CN, OCH ₂ CH ₂ (CO)O(C ₁ -C ₄ alkyl), O(CO)-(C ₁ -C ₄ alkyl), O(CO)-phenyl, (CO)OH or (CO)O(C ₁ -C ₄ alkyl); or R ₁₆ C ₂ -C ₁₂ alkyl, one or more O, S or NR ₂₆ ; or R ₁₆ (CH ₂ CH ₂ O) _n+1 H, (CH ₂ CH ₂ O) _n (CO)-(C ₁ -C ₈ alkyl), C ₂ -C ₁₂ Alkenyl or C ₃ -C ₈ cycloalkyl; or R ₁₆ is phenyl substituted by SR ₁₈ wherein the group R ₁₈ represents a phenyl or naphthyl ring bonded to the oxazole moiety to which COR ₁₆ is attached Direct bond; n is 1 to 20; R ₁₇ is hydrogen, phenyl-C ₁ -C ₃ alkyl, C ₁ -C ₂₀ alkyl, which is unsubstituted or substituted with one or more of the following groups: halogen , OH, SH, CN, C ₃ -C ₆ alkenyloxy, OCH ₂ CH ₂ CN, OCH ₂ CH ₂ (CO)O(C ₁ -C ₄ alkyl), O(CO)-(C ₁ -C _4- alkyl), OCO)-(C ₂ -C ₄ )alkenyl, O(CO)-phenyl, (CO)OH, (CO)O(C ₁ -C ₄ alkyl), C ₃ -C ₂₀ Cycloalkyl, SO ₂ -(C ₁ -C ₄ haloalkyl), O (C ₁ -C ₄ haloalkyl) or a C ₃ -C ₂₀ cycloalkyl group having one or more O; or an R ₁₇ C ₂ -C ₂₀ alkyl group with one or more O, S or NR _{26 in between} ; or R ₁₇ series (CH ₂ CH ₂ O) _n+1 H, (CH ₂ CH ₂ O) _n (CO)-(C ₁ -C ₈ alkyl), C ₁ -C ₈ alkanoyl, C ₂ -C ₁₂ Alkenyl, C ₃ -C ₆ olefinic group or C ₃ -C ₂₀ cycloalkyl having one or more O, S, CO or NR ₂₆ unintercalated or heterozygous; or R ₁₇ C ₁ -C ₈ alkyl a -C ₃ -C ₁₀ cycloalkyl group which has no or a hetero or one or more O; or an R ₁₇ benzyl fluorenyl group which is unsubstituted or has one or more C ₁ -C ₆ alkyl groups, halogen , OH or C ₁ -C ₃ alkoxy substituted; or R ₁₇ is phenyl, naphthyl or C ₃ -C ₂₀ heteroaryl, each unsubstituted or substituted by one or more of the following groups: halogen, OH, C ₁ -C ₁₂ alkyl, C ₁ -C ₁₂ alkoxy, CN, NO ₂ , phenyl-C ₁ -C ₃ alkoxy, phenoxy, C ₁ -C ₁₂ alkylthio, Phenylthio, N(C ₁ -C ₁₂ alkyl) ₂ , diphenyl-amine or Or R ₁₇ forms a bond to have a group thereon or a direct bond of one carbon atom of a phenyl or naphthyl ring or R ₁₈ hydrogen, C ₂ -C ₁₂ alkenyl, C ₃ -C ₂₀ cycloalkyl or phenyl-C ₁ -C ₃ alkyl, wherein C ₂ -C ₁₂ alkenyl, C ₃ -C ₂₀ cycloalkyl or phenyl-C ₁ -C ₃ alkyl without inter or hetero-have one or more O, S, CO, NR ₂₆ or COOR ₁₇ ; or R ₁₈ Is a C ₁ -C ₂₀ alkyl group which is unsubstituted or substituted with one or more of the following groups: OH, SH, CN, C ₃ -C ₆ alkenyloxy, OCH ₂ CH ₂ CN, OCH ₂ CH ₂ ( CO)O(C ₁ -C ₄ alkyl), O(CO)-(C ₂ -C ₄ )alkenyl, O(CO)-(C ₁ -C ₄ alkyl), O(CO)-phenyl Or (CO)OR ₁₇ ; or R ₁₈ C ₂ -C ₂₀ alkyl with one or more O, S, CO, NR ₂₆ or COOR _{17 in between} ; or R ₁₈ (CH ₂ CH ₂ O) _n H , (CH ₂ CH ₂ O) _n (CO)-(C ₁ -C ₈ alkyl), C ₂ -C ₈ alkanoyl or C ₃ -C ₆ alkenyl; or R ₁₈ benzhydryl, It is unsubstituted or substituted with one or more of the following groups: C ₁ -C ₆ alkyl, halogen, OH, C ₁ -C ₄ alkoxy or C ₁ -C ₄ alkylthio; or R ₁₈ phenyl, naphthyl or C ₃ -C ₂₀ heteroaryl, each of which is unsubstituted or substituted with one or more of the following radicals: halogen, C ₁ -C ₁₂ alkyl, C ₁ -C ₄ Substituted alkyl, C ₁ -C ₁₂ alkoxy, CN, NO _2, phenyl -C ₁ -C ₃ alkoxy, phenoxy, C ₁ -C ₁₂ alkylthio, phenylthio, N (C ₁ -C ₁₂ alkyl) ₂ , diphenylamino, (CO)O(C ₁ -C ₈ alkyl), (CO)-C ₁ -C ₈ alkyl, (CO)N (C ₁ -C ₈ alkyl) ₂ or R ₁₉ and R ₂₀ are each independently hydrogen, C ₁ -C ₂₀ alkyl, C ₂ -C ₄ hydroxyalkyl, C ₂ -C ₁₀ alkoxyalkyl, C ₂ -C ₅ alkenyl, C ₃ - C ₂₀ cycloalkyl, phenyl-C ₁ -C ₃ alkyl, C ₁ -C ₈ alkanoyl, C ₁ -C ₈ alkenyloxy, C ₃ -C ₁₂ alkenyl, SO ₂ -( C ₁ -C ₄ haloalkyl) or benzylidene; or R ₁₉ and R ₂₀ are phenyl, naphthyl or C ₃ -C ₂₀ heteroaryl, each unsubstituted or via one or more of the following groups Substituted: halogen, C ₁ -C ₄ haloalkyl, C ₁ -C ₂₀ alkoxy, C ₁ -C ₁₂ alkyl, benzhydryl or C ₁ -C ₁₂ alkoxy; or R ₁₉ and R ₂₀ The attached N atoms together form a 5- or 6-membered saturated or unsaturated ring which is not intermixed or interspersed with O, S or NR ₁₇ , and the 5 or 6 member saturated or unsaturated ring is unsubstituted or Or substituted with a plurality of groups: C ₁ -C ₂₀ alkyl, C ₁ -C ₂₀ alkoxy, =0, OR ₁₇ , SR ₁₈ , NR ₂₁ R ₂₂ , (CO)R ₂₃ , NO ₂ , halogen, C ₁ -C ₄ -haloalkyl, CN, phenyl, Or a C ₃ -C ₂₀ cycloalkyl group, the C ₃ -C ₂₀ cycloalkyl group having no or hetero or one or more O, S, CO or NR ₁₇ ; or R ₁₉ and R ₂₀ and the N atom to which it is attached Together forming a heteroaromatic ring system, the ring system is unsubstituted or substituted with one or more of the following groups: C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, C ₁ -C ₂₀ alkoxy, =O, OR ₁₇ , SR ₁₈ , NR ₂₁ R ₂₂ , (CO)R ₂₃ , , Halogen, NO _2, CN, phenyl or C ₃ -C ₂₀ cycloalkyl group, the C ₃ -C ₂₀ cycloalkyl interrupted or not interrupted with one or more O, S, CO or NR _17; R ₂₁ and R ₂₂ independently of one another hydrogen, C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, C ₃ -C ₁₀ cycloalkyl or phenyl; or R ₂₁ and R _{22 together} with the attached N atom Forming a 5- or 6-membered saturated or unsaturated ring without interstitial or interstitial with O, S or NR ₂₆ , and the 5 or 6 member saturated or unsaturated ring is not fused or the 5 or 6 members are saturated or not The saturated ring system is fused to a benzene ring; R ₂₃ is hydrogen, OH, C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, intervening one or more O, CO or NR ₂₆ C ₂ -C ₂₀ alkane a C ₃ -C ₂₀ cycloalkyl group having an O, S, CO or NR ₂₆ or an R ₂₃ phenyl group, a naphthyl group, a phenyl-C ₁ -C ₄ alkyl group, OR ₁₇ , SR ₁₈ or NR ₂₁ R ₂₂ ; R ₂₄ system (CO)OR ₁₇ , CONR ₁₉ R ₂₀ , (CO)R ₁₇ ; or R ₂₄ having one of the meanings given for R ₁₉ and R ₂₀ ; R ₂₅ system COOR ₁₇ , CONR ₁₉ R ₂₀ , (CO)R ₁₇ ; or R ₂₅ have one of the meanings given for R ₁₇ ; R ₂₆ is hydrogen, C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl ,between a C ₂ -C ₂₀ alkyl group having one or more O or CO; or a phenyl-C ₁ -C ₄ alkyl group, a C ₃ -C ₈ naphthene having no or hetero or one or more O or CO Or a group (CO)R ₁₉ ; or a phenyl group which is unsubstituted or substituted with one or more of the following groups: C ₁ -C ₂₀ alkyl, halogen, C ₁ -C ₄ haloalkyl, OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ or But the condition is that at least one group is present in the molecule or

The photoinitiator (C-1) having the structure represented by the formula (CI) is characterized in that it contains one or more annelated unsaturated rings on the carbazole moiety. In other words, at least one of R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ , R ₅ and R ₆ , R ₆ and R ₇ or R ₇ and R ₈

In one embodiment, the photoinitiator (C-1) having the structure of formula (CI), the C ₁ -C ₂₀ alkyl group being linear or branched and of, for example, C ₁ -C ₁₈ -, C ₁ -C ₄ -, C ₁ -C ₁₂ -, C ₁ -C ₈ -, C ₁ -C ₈ - or C ₁ -C ₄ alkyl or C ₄ -C ₁₂ - or C ₄ -C ₈ alkyl. Examples are methyl, ethyl, propyl, isopropyl, n-butyl, t-butyl, isobutyl, tert-butyl, pentyl, hexyl, heptyl, 2,4,4-trimethyl Amyl, 2-ethylhexyl, octyl, decyl, decyl, dodecyl, tetradecyl, fifteen, hexadecyl, octadecyl and decyl. The C ₁ -C ₆ alkyl group has the same meaning as given above for the C ₁ -C ₂₀ alkyl group and has the highest corresponding number of C atoms.

The unsubstituted or substituted C ₁ -C ₂₀ alkyl group containing one or more CC multiple bonds means an alkenyl group as explained below.

The C ₁ -C ₄ haloalkyl group as defined below, based substituted with halogen or as hereinbefore defined C ₁ -C ₄ alkyl. The alkyl group is, for example, mono- or polyhalogenated until all H-atoms are replaced by halogen. It is, for example, C _n H _x Hal _y , wherein x+y=2n+1 and Hal is halogen, preferably F. Specific examples are chloromethyl, trichloromethyl, trifluoromethyl or 2-bromopropyl, especially trifluoromethyl or trichloromethyl. C ₂ -C ₄ hydroxyalkyl means a C ₂ -C ₄ alkyl group substituted with one or two O atoms. The alkyl group is straight or branched. Examples are 2-hydroxyethyl, 1-hydroxyethyl, 1-hydroxypropyl, 2-hydroxypropyl, 3-hydroxypropyl, 1-hydroxybutyl, 4-hydroxybutyl, 2-hydroxybutyl, 3-hydroxybutyl, 2,3-dihydroxypropyl or 2,4-dihydroxybutyl. C ₂ -C ₁₀ alkoxyalkyl lines interrupted by O atoms of a C ₂ -C ₁₀ alkyl. The C ₂ -C ₁₀ alkyl group has the same meaning as given above for the C ₁ -C ₂₀ alkyl group and has the highest corresponding number of C atoms. Examples are methoxymethyl, methoxyethyl, methoxypropyl, ethoxymethyl, ethoxyethyl, ethoxypropyl, propoxymethyl, propoxyethyl, Propoxypropyl.

a C ₂ -C ₂₀ alkyl group having one or more O, S, NR ₂₆ or CO intermixed with O, S, NR ₂₆ or CO (for example) 1 to 9 times, 1 to 5 times, 1 to 3 times or 1 or 2 times. If more than one meta-group is present, it is the same species or different. The two O atoms are separated by at least one methylene group, preferably at least two methylene groups (ie, an extended ethyl group). These alkyl groups are linear or branched. For example, the following structural units will be present: -CH ₂ -CH ₂ -O-CH ₂ CH ₃ , -[CH ₂ CH ₂ O] _y -CH ₃ (where y = 1 to 9), -(CH ₂ - CH ₂ O) ₇ -CH ₂ CH ₃ , -CH ₂ -CH(CH ₃ )-O-CH ₂ -CH ₂ CH ₃ , -CH ₂ -CH(CH ₃ )-O-CH ₂ -CH ₃ ,- CH ₂ -CH ₂ -S-CH ₂ CH ₃ , -CH ₂ -CH(CH ₃ )-NR ₂₆ -CH ₂ -CH ₃ , -CH ₂ -CH ₂ -COO-CH ₂ CH ₃ or -CH ₂ - CH(CH ₃ )-OCO-CH ₂ -CH ₂ CH ₃ .

The C ₃ -C ₁₀ cycloalkyl, C ₃ -C ₁₀ cycloalkyl and C ₃ -C ₈ cycloalkyl are understood in the context of the present application to mean an alkyl group containing at least one ring. It is, for example, cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cyclooctyl, pentylcyclopentyl and cyclohexyl. C ₃ -C ₁₀ cycloalkyl is also intended to encompass a bicyclic ring in the context of the present invention, in other words, a bridging ring, for example , , And the corresponding ring. Other examples are such as , (E.g )or Such structures, as well as bridging or fused ring systems, for example, the term is also intended to cover Wait.

The C ₃ -C ₂₀ cycloalkyl group interspersed with O, S, CO, NR ₂₆ has the meaning given above wherein at least one CH ₂ - group in the alkyl group is replaced by O, S, CO or NR ₂₆ . Examples are such as (E.g or And other structures.

The C ₁ -C ₈ alkyl-C ₃ -C ₁₀ cycloalkyl group is a C ₃ -C ₁₀ cycloalkyl group as defined above substituted with one or more alkyl groups having up to 8 carbon atoms. Instance system Wait.

a C ₁ -C ₈ alkyl-C ₃ -C ₁₀ cycloalkyl group having one or more O groups substituted by one or more alkyl groups having up to 8 carbon atoms, as defined above, O interstitial C ₃ - C ₁₀ cycloalkyl. Instance system Wait.

The C ₁ -C ₁₂ alkoxy substituted with the system via a O atom C ₁ -C ₁₂ alkyl. The C ₁ -C ₁₂ alkyl group has the same meaning as given above for the C ₁ -C ₂₀ alkyl group and has the highest corresponding number of C atoms. The C ₁ -C ₄ alkoxy is straight or branched, such as methoxy, ethoxy, propoxy, isopropoxy, n-butoxy, second butoxy, isobutoxy or Third butoxy. The C ₁ -C ₈ alkoxy group and the C ₁ -C ₄ -alkoxy group have the same meanings as described above and have the highest corresponding number of C atoms.

The C ₁ -C ₁₂ substituted alkylthio system S atom of a C ₁ -C ₁₂ alkyl. The C ₁ -C ₂₀ alkyl group has the same meaning as given above for the C ₁ -C ₂₀ alkyl group and has the highest corresponding number of C atoms. The C ₁ -C ₄ alkylthio group is linear or branched, such as methylthio, ethylthio, propylthio, isopropylthio, n-butylthio, and second butyl sulfide. Base, isobutylthio, tert-butylthio.

The phenyl-C ₁ -C ₃ alkyl group is, for example, benzyl, phenylethyl, α-methylbenzyl or α,α-dimethyl-benzyl, especially benzyl.

The phenyl-C ₁ -C ₃ alkoxy is, for example, a benzyloxy group, a phenylethoxy group, an α-methylbenzyloxy group or an α,α-dimethylbenzyloxy group, especially a benzyloxy group. .

The C ₂ -C ₁₂ alkenyl group is mono- or polyunsaturated and is, for example, C ₂ -C ₁₀ -, C ₂ -C ₈ -, C ₂ -C ₅ -alkenyl, such as vinyl, allyl , methallyl, 1,1-dimethylallyl, 1-butenyl, 3-butenyl, 2-butenyl, 1,3-pentadienyl, 5-hexenyl , 7-octenyl or dodecenyl, especially allyl. The C ₂ -C ₅ alkenyl group has the same meaning as given above for the C ₂ -C ₁₂ alkenyl group and has the highest corresponding number of C atoms.

The C ₂ -C ₁₂ alkenyl group having one or more O, CO or NR ₂₆ is heterogeneous (for example) 1 to 9 times, 1 to 5 times, 1 to 3 times or 1 time by O, S, NR ₂₆ or CO. Or 2 times. If more than one meta-group is present, it is the same species or different. The two O atoms are separated by at least one methylene group, preferably at least two methylene groups (ie, an extended ethyl group). The alkenyl group is straight or branched and is as defined above. For example, the following structural units can be formed: -CH=CH-O-CH ₂ CH ₃ , -CH=CH-O-CH=CH ₂ and the like.

The C ₄ -C ₈ cycloalkenyl group has one or more double bonds and is, for example, a C ₄ -C ₆ -cycloalkenyl group or a C ₆ -C ₈ -cycloalkenyl group. Examples are cyclobutenyl, cyclopentenyl, cyclohexenyl or cyclooctenyl, especially cyclopentenyl and cyclohexenyl, preferably cyclohexenyl.

The C ₃ -C ₆ alkenyloxy group is mono- or polyunsaturated and has one of the meanings given above for an alkenyl group, and the attached oxy group has the highest corresponding number of C atoms. Examples are allyloxy, methylallyloxy, butenyloxy, pentenyloxy, 1,3-pentadienyloxy, 5-hexenyloxy.

The C ₂ -C ₁₂ alkynyl group is mono- or polyunsaturated linear or branched and is, for example, a C ₂ -C ₈ -, C ₂ -C ₆ - or C ₂ -C ₄ alkynyl group. Examples are ethynyl, propynyl, butynyl, 1-butynyl, 3-butynyl, 2-butynyl, pentynylhexynyl, 2-hexynyl, 5-hexynyl, Octyl group and the like.

The C ₂ -C ₂₀ alkenyl group is linear or branched and is, for example, C ₂ -C ₁₈ -, C ₂ -C ₁₄ -, C ₂ -C ₁₂ -, C ₂ -C ₈ -, C ₂ -C ₆ - or C ₂ -C ₄ alkyl fluorenyl or C ₄ -C ₁₂ - or C ₄ -C ₈ alkyl fluorenyl. Examples are ethyl acetyl, propyl, butyl, isobutyl, pentylene, hexyl, decyl, octyl, fluorenyl, fluorenyl, fluorenyl, tetradecyl, fifteen Base, hexadecanyl, octadecyl, and decyl, preferably acetyl. The C ₁ -C ₈ alkano group has the same meaning as given above for the C ₂ -C ₂₀ alkano group and has the highest corresponding number of C atoms.

The C ₂ -C ₁₂ alkoxycarbonyl group is straight or branched and is, for example, a methoxycarbonyl group, an ethoxycarbonyl group, a propoxycarbonyl group, a n-butoxycarbonyl group, an isobutoxycarbonyl group, 1, 1-Dimethylpropoxycarbonyl, pentyloxycarbonyl, hexyloxycarbonyl, heptyloxycarbonyl, octyloxycarbonyl, decyloxycarbonyl, decyloxycarbonyl or dodecyloxycarbonyl, especially methoxy A carbonyl group, an ethoxycarbonyl group, a propoxycarbonyl group, a n-butoxycarbonyl group or an isobutoxycarbonyl group is preferably a methoxycarbonyl group.

The C ₂ -C ₁₂ alkoxycarbonyl group having one or more O is linear or branched. The two O atoms are separated by at least two methylene groups (ie, an extended ethyl group). The meta-alkyloxycarbonyl group is unsubstituted or substituted with one or more hydroxyl groups. The C ₆ -C ₂₀ aryloxycarbonyl group is, for example, a phenyloxycarbonyl group [=phenyl-O-(CO)-], a naphthyloxycarbonyl group, a decyloxycarbonyl group or the like. C ₅ -C ₂₀ heteroaryloxycarbonyl C ₅ -C ₂₀ heteroaryl-O-CO-.

The C ₃ -C ₁₀ cycloalkylcarbonyl system is C ₃ -C ₁₀ cycloalkyl-CO-, wherein the cycloalkyl group has one of the meanings indicated above and has the highest corresponding number of C atoms. The C ₂ -C ₁₀ cycloalkylcarbonyl group having one or more O, S, CO, NR ₂₆ refers to a heterocycloalkylene-CO- group, wherein the meta-heterocycloalkyl group is as defined above.

The C ₃ -C ₁₀ cycloalkoxycarbonyl group is C ₃ -C ₁₀ cycloalkyl-O-(CO)-, wherein the cycloalkyl group has one of the meanings indicated above and has the highest corresponding number of C atoms. The C ₃ -C ₁₀ cycloalkoxycarbonyl group having one or more O, S, CO, NR ₂₆ refers to a heterocycloalkylene-O-(CO)- group, wherein the meta-heterocycloalkyl group is as described above Defined.

The C ₁ -C ₂₀ alkylphenyl group means a phenyl group substituted by one or more alkyl groups, wherein the sum of C atoms is at most 20.

The C ₆ -C ₂₀ aryl group (for example) phenyl, naphthyl, anthracenyl, phenanthryl, fluorenyl, A tetraphenyl, a triphenyl or the like, especially a phenyl or naphthyl group, preferably a phenyl group. Naphthyl 1-naphthyl or 2-naphthyl.

In the context of the present invention, the C ₃ -C ₂₀ heteroaryl is intended to include monocyclic or polycyclic systems, such as fused ring systems. Examples are thienyl, benzo[b]thienyl, naphtho[2,3-b]thienyl, thioxyl, furyl, dibenzofuranyl, Sulfhydryl, xanthenyl, thioxanthyl, phenothiphenyl, pyrrolyl, imidazolyl, pyrazolyl, pyrazinyl, pyrimidinyl, pyridazinyl, carbazinyl, isodecyl, fluorenyl , carbazolyl, fluorenyl, quinazolyl, isoquinolyl, quinolyl, pyridazinyl, naphthyridinyl, quinoxalinyl, quinazolinyl, Polinyl, acridinyl, oxazolyl, β-carbolinyl, phenanthryl, acridine, naphthyldiazophenyl, phenanthroline, phenazinyl, isothiazolyl, phenothiazine , isoxazolyl, furazolyl, phenomethoxy, 7-phenanthryl, inden-2-yl (=9,10-di-oxy-9,10-dihydroindol-2-yl), 3 -benzo[b]thienyl, 5-benzo[b]thienyl, 2-benzo[b]thienyl, 4-dibenzofuranyl, 4,7-dibenzofuranyl, 4-methyl Base-7-dibenzofuranyl, 2-xanthene, 8-methyl-2-indenyl, 3-indolyl, 2-morphothinyl, 2,7-morphothinyl, 2 -pyrrolyl, 3-pyrrolyl, 5-methyl-3-pyrrolyl, 2-imidazolyl, 4-imidazolyl, 5-imidazolyl, 2-methyl-4-imidazolyl, 2-ethyl-4 -Imidazolyl, 2-ethyl-5-imidazolyl, 1H-tetrazol-5-yl, 3-pyrazolyl, 1-methyl-3-pyrazolyl, 1-propyl-4-pyrazolyl , 2-pyrazinyl, 5,6-dimethyl-2-pyrazinyl, 2-indolizinyl, 2-methyl-3-isoindolyl, 2-methyl-1-isoindole , 1-methyl-2-indenyl, 1-methyl-3-indolyl, 1,5-dimethyl-2-indenyl, 1-methyl-3-oxazolyl, 2 ,7-dimethyl-8-fluorenyl, 2-methoxy-7-methyl-8-fluorene , 2-quinazinyl, 3-isoquinolinyl, 6-isoquinolinyl, 7-isoquinolinyl, 3-methoxy-6-isoquinolinyl, 2-quinolinyl, 6- Quinolinyl, 7-quinolyl, 2-methoxy-3-quinolyl, 2-methoxy-6-quinolinyl, 6-pyridazinyl, 7-pyridazinyl, 1-methoxy -6-oxazinyl, 1,4-dimethoxy-6-pyridazinyl, 1,8-naphthyridin-2-yl, 2-quinoxalinyl, 6-quinoxalinyl, 2, 3-Dimethyl-6-quinoxalinyl, 2,3-dimethoxy-6-quinoxalinyl, 2-quinazolinyl, 7-quinazolinyl, 2-dimethylamino -6-quinazolinyl, 3- Lolinyl, 6- Olinyl group, 7- Lolinyl, 3-methoxy-7- Lolinyl, 2-acridinyl, 6-acridinyl, 7-acridinyl, 6,7-dimethoxy-2-acridinyl, 2-oxazolyl, 3-oxazolyl, 9- Methyl-2-oxazolyl, 9-methyl-3-oxazolyl, β-carboline-3-yl, 1-methyl-β-carboline-3-yl, 1-methyl-β- Porphyrin-6-yl, 3-phenanthryl, 2-acridinyl, 3-acridinyl, 2-naphthyldiazophenyl, 1-methyl-5-naphthyldiazophenyl, 5-phenanthroline, 6-phenanthroline, 1-phenazinyl, 2-phenazinyl, 3-isothiazolyl, 4-isothiazolyl, 5-isothiazolyl, 2-phenothiazine , 3-phenothiazine, 10-methyl-3-phenothiazinyl, 3-isoxazolyl, 4-isoxazolyl, 5-isoxazolyl, 4-methyl-3-furazan Base, 2-oxo group, 10-methyl-2-phenoxy group, and the like.

The C ₃ -C ₂₀ heteroaryl is especially thienyl, benzo[b]thienyl, thioxyl, thioxanthyl, 1-methyl-2-indenyl or 1-methyl-3-indole a base; especially a thienyl group.

The C ₄ -C ₂₀ heteroarylcarbonyl group is attached to the remainder of the molecule via a CO group as defined above for a C ₃ -C ₂₀ heteroaryl group.

The substituted aryl (phenyl, naphthyl, C ₆ -C ₂₀ aryl or C ₅ -C ₂₀ heteroaryl) is 1 to 7 times, 1 to 6 times or 1 to 4 times, especially 1 Sub, 2 or 3 substitutions. It will be apparent that the defined aryl group cannot have more substituents than the free position at the aryl ring.

The substituent on the phenyl ring is preferably in position 4 on the phenyl ring or in the 3,4-, 3,4,5-, 2,6-, 2,4- or 2,4,6-group. state.

1 or 19 times, 1 to 15 times, 1 to 12 times, 1 to 9 times, 1 to 7 times, 1 to 5 times, 1 to 4 times, such as 1 to 19 times, 1 to 15 times, 1 to 12 times, 1 to 9 times, 1 to 7 times, 1 to 5 times, 1 to 4 times 1, 1 to 3 or 1 or 2 times (obviously, the number of heteroatoms depends on the number of C atoms in the interstitial). After 1 time The substituted group which is substituted multiple times has, for example, 1 to 7, 1 to 5, 1 to 4, 1 to 3 or 1 or 2 identical or different substituents.

The group substituted with one or more of the defined substituents is intended to have one substituent or a plurality of substituents as defined or differently given. Halogen is fluorine, chlorine, bromine and iodine, especially fluorine, chlorine and bromine, preferably fluorine and chlorine. When R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ or R ₅ and Re, R ₆ and R ₇ , R ₇ and R ₈ are independently of each other ; then form (for example) the following structure (Ia)-I(i): Or (for example) structures such as (Id)-(Ih):

The preferred structure is (Ia).

The photoinitiator (C-1) having the structure represented by the formula (C-I) is characterized in that at least one phenyl ring is partially fused with a carbazole to form a "naphthyl" ring. That is, one of the above structures is given by the structure shown by the formula (C-I).

If R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ , R ₅ and R ₆ , R ₆ and R ₇ or R ₇ and R ₈ are each independently taken to be -(CH ₂ ) _P -Y- (CH ₂ ) _q -, forming, for example, such as And other structures.

If the substituent OR ₁₇ , SR ₁₈ , SOR ₁₈ , SO ₂ R ₁₈ or NR ₁₉ R ₂₀ on the phenyl or naphthyl ring is via the radicals R ₁₇ , R ₁₈ , R ₁₉ and/or R ₂₀ and the naphthyl ring When a carbon atom forms a 5- or 6-membered ring, a structure comprising 3 or more rings including a naphthyl ring is obtained.

Instance system Wait.

If R ₁₇ forms a bond to have a group thereon or a direct bond of a carbon atom of a phenyl or naphthyl ring, for example, such as And other structures.

If R ₁₆ is a phenyl group substituted by SR ₁₈ , wherein the group R ₁₉ represents a direct bond bonded to a phenyl or naphthyl ring to which a carbazole moiety of the COR ₁₆ group is attached, for example, such as And other structures. That is, if R ₁₆ is a phenyl group substituted by SR ₁₈ , wherein the group R ₁₈ represents a direct bond bonded to a phenyl or naphthyl ring to which a carbazole moiety of the COR ₁₆ group is attached, the thioxanthene The base moiety is formed together with a phenyl or naphthyl ring of the carbazole moiety.

If R ₁₉ and R ₂₀ together with the N atom to which they are attached form a 5- or 6-membered saturated or unsaturated ring, optionally mixed with O, S or NR ₁₇ , a saturated or unsaturated ring, such as aziridine, is formed. Pyrrole, thiazole, pyrrolidine, oxazole, pyridine, 1,3-diazine, 1,2-diazine, hexahydropyridine or morpholine. Preferably, if R ₁₉ and R ₂₀ together with the N atom to which they are attached form a 5- or 6-membered saturated or unsaturated ring of O, S or NR ₁₇ as appropriate, an inter- or inter-molecular O is formed. Or NR ₁₇ , especially the 5- or 6-member saturated ring of O.

If R ₂₁ and R ₂₂ together with the N atom to which they are attached form a 5- or 6-membered saturated or unsaturated ring, optionally mixed with O, S or NR ₂₆ , and the benzene ring is optionally fused to the saturated or unsaturated ring. , forming a saturated or unsaturated ring, such as aziridine, pyrrole, thiazole, pyrrolidine, oxazole, pyridine, 1,3-diazine, 1,2-diazine, hexahydropyridine or morpholine or corresponding ring Ring (for example )Wait.

If R ₁₉ and R ₂₀ together with the N atom to which they are attached form a heteroaromatic ring system, the ring system is intended to contain more than one ring (eg 2 or 3 rings) and one or one from the same or different species. Above heteroatoms. Suitable hetero atomic systems are, for example, N, S, O or P, especially N, S or O. Examples are carbazole, indole, isoindole, oxazole, indole, isoquinoline, quinoline, porphyrin, phenothiazine and the like.

The term "and/or" or "or/and" is intended to be used in the context of the present invention. Not only can one of the defined alternatives (substituents) be present, but there can also be a total of several defined alternatives (substituents), ie mixtures of different substitutes (substituents).

The term "at least" is intended to define one or more, such as one or two. Or three, preferably one or both.

The term "optionally substituted" means that the group to which it is referred is unsubstituted or Replace.

The term "as appropriate" means that the group referred to is not miscellaneous or inter- miscellaneous.

Throughout this specification and the scope of the patent application below, unless the context Otherwise, the word "comprise" or variant (eg, "comprises" or "comprising") shall be understood to include the integer or step or integer group or group of steps, but does not exclude Any other integer or step or integer group or group of steps. The term "(meth)acrylate" is intended to mean acrylate and corresponding in the context of the present application. Methacrylate.

The preferred embodiments shown in the text for the compounds of the present invention in the context of the present invention are intended to refer to all categories of patent applications, i.e., the scope of application for compositions, uses, methods, color filters, and the like.

The photoinitiator (C-1) having the structure of the formula (CI) is prepared by the method described in the literature, for example, by reacting the corresponding hydrazine with a hydrazine halide, especially a chloride or an acid anhydride, under the following conditions. : in an inert solvent such as tert-butyl methyl ether, tetrahydrofuran (THF) or dimethylformamide, in the presence of a base such as triethylamine or pyridine, or in a basic solvent such as pyridine. In the following, as an example, the preparation of the compound of the formula Ia, wherein R ₇ is an oxime ester group and the X-based direct bond system [the reaction of the compound (Ib)-(Ih) from the appropriate oxime] is explained:

R ₁ , R ₂ , R ₅ , R ₆ , R ₈ , R ₁₃ , R ₁₄ and R ₁₅ are as defined above, and Hal means a halogen atom, especially Cl.

R _{14 is} preferably a methyl group.

Such reactions are well known to those skilled in the art and are typically carried out at a temperature of from -15 ° C to +50 ° C, preferably from 0 to 25 ° C.

When X is CO, the corresponding lanthanide is obtained by using alkyl nitrite (such as methyl nitrite, ethyl nitrite, propyl nitrite, butyl nitrite or isoamyl nitrite). Nitrification to synthesize. The esterification is then carried out under the same conditions as described above:

Thus, the subject matter of the present invention is also prepared by reacting the corresponding hydrazine compound with an hydrazine halide of the formula (a) or an anhydride of the formula (b) in the presence of a mixture of a base or a base, as defined above. A method of the photoinitiator (C-1) of the structure shown.

Wherein Hal is halogen, especially Cl, and R ₁₄ is as defined above.

The desired starting material can be obtained by standard chemistry textbooks (eg J. March, Advanced Organic Chemistry, 4th edition, Wiley Interscience, 1992) or monographs (eg SRSandler & W. Karo, Organic functional group preparations, A variety of methods are described in Volume 3, Academic Press).

One of the most convenient methods is, for example, reacting an aldehyde or a ketone with hydroxylamine or a salt thereof in a polar solvent such as dimethylacetamide (DMA), aqueous DMA, ethanol or an aqueous ethanol solution. In this case, a base such as sodium acetate or pyridine is added to control the pH of the reaction mixture. It is well known that the reaction rate is pH dependent and the base can be added continuously at the beginning or during the reaction. An alkaline solvent such as pyridine can also be used as the base and/or solvent or co-solvent. The reaction temperature is usually from room temperature to the reflux temperature of the mixture, and is usually from about 20 ° C to 120 ° C.

The corresponding ketone intermediate system, for example, is prepared by methods described in the literature (e.g., standard chemistry textbooks, e.g., J. March, Advanced Organic Chemistry, 4th Ed., Wiley Interscience, 1992). In addition, the continuous Friedel-Crafts reaction can be effectively used to synthesize intermediates. These reactions are It is well known to those skilled in the art.

Another convenient synthesis of hydrazine is the nitrosation of "active" methylene groups with nitrous acid or alkyl nitrite. Basic conditions (as described, for example, in Organic Syntheses coll., Volume VI (J. Wiley & Sons, New York, 1988), pages 199 and 840) and acidic conditions (e.g., for example) Organic Synthesis coll Volume V, pages 32 and 373, coll. Volume III, pages 191 and 513, coll. Volume II, pages 202, 204 and 363) It is suitable for the preparation of hydrazine used as a starting material in the present invention. Nitrous acid is generally produced from sodium nitrite. The alkyl nitrite can be, for example, methyl nitrite, ethyl nitrite, propyl nitrite, butyl nitrite or isoamyl nitrite.

Another embodiment of the present invention is a photoinitiator (C-1) having a structure of the formula (IA):

Wherein R ₁ , R ₂ , R ₃ , R ₄ , R ₅ , R ₆ , R ₇ and R ₈ are each independently hydrogen, C ₁ -C ₂₀ alkyl, , COR ₁₆ , OR ₁₇ , halogen, NO ₂ or

Or R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ , R ₅ and R ₆ , R ₆ and R ₇ or R ₇ and R ₈ are each independently Substituted C ₂ -C ₁₀ alkenyl; or R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ , R ₅ and R ₆ , R ₆ and R ₇ or R ₇ and R ₈ are independently of each other Is -(CH ₂ ) _P -Y-(CH ₂ ) _q -; or R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ , R ₅ and R ₆ , R ₆ and R ₇ or R ₇ And R ₈ are mutually independent However, the condition is at least one of R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ , R ₅ and R ₆ , R ₆ and R ₇ or R ₇ and R _{8 , R 9, R 10, R} 11 and R ₁₂ independently of one another hydrogen, C ₁ -C ₂₀ alkyl, C ₁ -C ₂₀ alkyl which is unsubstituted or substituted with one or more of the following groups: halo, Phenyl, CN, OH, SH, C ₁ -C ₄ -alkoxy, (CO)OH or (CO)O(C ₁ -C ₄ alkyl); or R ₉ , R ₁₀ , R ₁₁ and R ₁₂ Independently from each other, an unsubstituted phenyl group or a phenyl group substituted with one or more of the following groups: C ₁ -C ₆ alkyl, halogen, CN, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₉ And R ₁₀ , R ₁₁ and R ₁₂ are, independently of each other, halogen, CN, OR ₁₇ , SR ₁₈ , SOR ₁₈ , SO ₂ R ₁₈ or NR ₁₉ R ₂₀ , wherein the substituents OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ optionally forming a 5- or 6-membered ring with a carbon atom in the naphthyl ring via the group R ₁₇ , R ₁₈ , R ₁₉ and/or R ₂₀ ; or R ₉ , R ₁₀ , R ₁₁ and R ₁₂ independently of each other for , COR ₁₆ or NO ₂ ; Y series O, S, NR ₂₆ or direct bond; p is an integer 0, 1, 2 or 3; q is an integer 1, 2 or 3; X is CO or direct bond; R ₁₃ is C _{a 1} -C ₂₀ alkyl group which is unsubstituted or substituted with one or more of the following groups: halogen, R ₁₇ , COOR ₁₇ , OR ₁₇ , SR ₁₈ , CONR ₁₉ R ₂₀ , NR ₁₉ R ₂₀ , PO (OC _k H _2k+1 ) ₂ or Or R ₁₃ is a C ₂ -C ₂₀ alkyl group, interspersed with one or more of O, S, SO, SO ₂ , NR ₂₆ or CO, or a C ₂ -C ₁₂ alkenyl group, which has no inter a plurality of O, CO or NR ₂₆ wherein the C ₂ -C ₂₀ alkyl group and the unintervened or interstitial C ₂ -C ₁₂ alkenyl group are unsubstituted or substituted by one or more halogens; or R ₁₃ Is a C ₄ -C ₈ cycloalkenyl group, a C ₂ -C ₁₂ alkynyl group or a C ₃ -C ₁₀ cycloalkyl group which has no or hetero or one or more O, S, CO or NR ₂₆ ; or R ₁₃ a phenyl or naphthyl group, each of which is unsubstituted or substituted with one or more of the following groups: OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ , , COR ₁₆ , CN, NO ₂ , halogen, C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, C ₂ -C ₂₀ alkyl, interspersed with one or more O, S, CO or NR ₂₆ ; each warp or C ₃ -C ₁₀ cycloalkyl, or interrupted by one or more O, S, CO or NR ₂₆ of the C ₃ -C ₁₀ cycloalkyl; K-based integer from 1 to 10; R ₁₅ lines C ₆ - C ₂₀ aryl or C ₃ -C ₂₀ heteroaryl, each unsubstituted or substituted by one or more of the following groups: phenyl, halogen, C ₁ -C ₄ haloalkyl, CN, NO ₂ , OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ , PO(OC _k H _2k+1 ) ₂ , SO-C ₁ -C ₁₀ alkyl, SO ₂ -C ₁ -C ₁₀ alkyl, hetero or one or more O, S or NR C ₂₆ of ₂ -C ₂₀ alkyl group; or each warp substituted C ₁ -C ₂₀ alkyl, C ₁ -C ₂₀ alkyl which is unsubstituted or substituted with one or more of the following radicals: halogen, COOR ₁₇ , CONR ₁₉ R ₂₀ , phenyl, C ₃ -C ₈ cycloalkyl, C ₃ -C ₂₀ heteroaryl, C ₆ -C ₂₀ aryloxycarbonyl, C ₃ -C ₂₀ heteroaryloxycarbonyl, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₁₅ is hydrogen, C ₂ -C ₁₂ alkenyl, C ₃ -C ₈ cycloalkyl, which has no or hetero or one or more O, CO or NR ₂₆ ; R ₁₅ is a C ₁ -C ₂₀ alkyl group which has not been Substituted or substituted with one or more of the following groups: halogen, OR ₁₇ , SR ₁₈ , C ₃ -C ₈ cycloalkyl, C ₃ -C ₂₀ heteroaryl, C ₆ -C ₂₀ aryloxycarbonyl, C ₃ -C ₂₀ heteroaryloxycarbonyl, NR ₁₉ R ₂₀ , COOR ₁₇ , CONR ₁₉ R ₂₀ , PO(OC _k H _2k+1 ) ₂ , Or a phenyl group; or the C ₁ -C ₂₀ alkyl group substituted by a phenyl group, which is halogen, C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ Substituting; or R ₁₅ is a C ₂ -C ₂₀ alkyl group, interspersed with one or more O, SO or SO ₂ , and the interstitial C ₂ -C ₂₀ alkyl group is unsubstituted or substituted by one or more of the following groups Group substitution: halogen, OR ₁₇ , COOR ₁₇ , CONR ₁₉ R ₂₀ , phenyl or phenyl substituted by OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₁₅ C ₂ -C ₂₀ alkanoyl or benzoyl A thiol group which is unsubstituted or substituted with one or more of the following groups: C ₁ -C ₆ alkyl, halogen, phenyl, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₁₅ is unsubstituted or a naphthylmethyl group substituted by one or more OR ₁₇ or a C ₃ -C ₁₄ heteroarylcarbonyl group; or an R ₁₅ C ₂ -C ₁₂ alkoxycarbonyl group, which has no or a heterogeneous one or more O And the inter- or non-hetero-C ₂ -C ₁₂ alkoxycarbonyl group is unsubstituted or substituted with one or more hydroxy groups; or the R ₁₅ phenoxycarbonyl group is unsubstituted or one or more of the following Group substitution: C ₁ -C ₆ alkyl, halogen, C ₁ -C ₄ haloalkyl, phenyl, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₁₅ is CN, CONR ₁₉ R ₂₀ , NO ₂ , C ₁ -C ₄ haloalkyl, S(O) _m -C ₁ -C ₆ alkyl, unsubstituted or via C ₁ -C ₁₂ alkyl or SO ₂ -C ₁ -C ₆ alkyl substituted S(O) _m -phenyl; or R ₁₅ -based SO ₂ O-phenyl, unsubstituted or C ₁ -C ₁₂ alkane Substituent; or a diphenylphosphinium or di(C ₁ -C ₄ alkoxy)-phosphonium; m system 1 or 2; R' ₁₅ has one of the meanings given for R ₁₅ ; X ₁ is O, S, SO or SO ₂ ; X ₂ is O, CO, S or a direct bond; R ₁₆ is a C ₆ -C ₂₀ aryl or C ₃ -C ₂₀ heteroaryl group, each of which is not Substituted or substituted with one or more of the following groups: phenyl, halo, C ₁ -C ₄ haloalkyl, CN, NO ₂ , OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ or miscellaneous one or more O, S or NR C ₂₆ of ₁ -C ₂₀ alkyl group; or each substituted by one or more C ₁ -C ₂₀ alkyl, C ₁ -C ₂₀ alkyl which is unsubstituted or substituted with one or more of the following groups Substitution: halogen, COOR ₁₇ , CONR ₁₉ R ₂₀ , phenyl, C ₃ -C ₈ cycloalkyl, C ₃ -C ₂₀ heteroaryl, C ₆ -C ₂₀ aryloxycarbonyl, C ₃ -C ₂₀ heteroaryl butoxycarbonyl, oR _17, SR ₁₈ or NR ₁₉ R _20; or R ₁₆ lines , Unsubstituted or substituted with one or more of the following radicals C ₁ -C ₂₀ alkyl group: halogen, phenyl, OH, SH, CN, C 3 -C 6 alkenyloxy, OCH ₂ CH ₂ CN, OCH ₂ CH ₂ (CO)O(C ₁ -C ₄ alkyl), O(CO)-(C ₁ -C ₄ alkyl), O(CO)-phenyl, (CO)OH or (CO)O ( C ₁ -C ₄ alkyl); or R ₁₆ interstitial with one or more C ₂ -C ₁₂ alkyl groups of O, S or NR ₂₆ ; or R ₁₆ system (CH ₂ CH ₂ O) _n+1 H, ( CH ₂ CH ₂ O) _n (CO)-(C ₁ -C ₈ alkyl), C ₂ -C ₁₂ alkenyl or C ₃ -C ₈ cycloalkyl; or R ₁₆ is a phenyl substituted by SR ₁₈ , Wherein the group R ₁₈ represents a direct bond bonded to a phenyl or naphthyl ring to which a carbazole moiety of a COR ₁₆ group is attached; n is 1 to 20; R ₁₇ is hydrogen, phenyl-C ₁ -C _{a 3-} alkyl, C ₁ -C ₂₀ alkyl group which is unsubstituted or substituted with one or more of the following groups: halogen, OH, SH, CN, C ₃ -C ₆ alkenyloxy, OCH ₂ CH ₂ CN, OCH ₂ CH ₂ (CO)O(C ₁ -C ₄ alkyl), O(CO)-(C ₁ -C ₄ alkyl), O(CO)-(C ₂ -C ₄ )alkenyl, O ( CO)-phenyl, (CO)OH, (CO)O(C ₁ -C ₄ alkyl), SO ₂ -(C ₁ -C ₄ haloalkyl), O(C ₁ -C ₄ haloalkyl), C or ₃ -C ₂₀ cycloalkyl interrupted by one or more of C ₃ -C ₂₀ O Alkyl group; R _17, or C ₂ -C ₂₀ alkyl-based, have therebetween one or more heteroatoms O, S or NR _26; or R ₁₇ lines _{(CH 2 CH 2 O) n} + 1 H, (CH 2 CH 2 O _n (CO)-(C ₁ -C ₈ alkyl), C ₁ -C ₈ alkanoyl, C ₂ -C ₁₂ alkenyl, C ₃ -C ₆ alkenyl or C ₃ -C ₂₀ cycloalkyl , having no or hetero or one or more O, S, CO or NR ₂₆ ; or R ₁₇ C ₁ -C ₈ alkyl-C ₃ -C ₁₀ cycloalkyl, which has one or more Or O; or R ₁₇ is benzhydryl, which is unsubstituted or substituted by one or more C ₁ -C ₆ alkyl, halogen, OH or C ₁ -C ₃ alkoxy; or R ₁₇ phenyl , naphthyl or C ₃ -C ₂₀ heteroaryl, each unsubstituted or substituted by one or more of the following groups: halogen, OH, C ₁ -C ₁₂ alkyl, C ₁ -C ₁₂ alkoxy, CN, NO ₂ , phenyl-C ₁ -C ₃ alkoxy, phenoxy, C ₁ -C ₁₂ alkylthio, phenylthio, N(C ₁ -C ₁₂ alkyl) ₂ , diphenyl Amino-amino group or Or R ₁₇ forms a bond to have a group thereon or a direct bond of one carbon atom of a phenyl or naphthyl ring; R ₁₈ is hydrogen, C ₂ -C ₁₂ alkenyl, C ₃ -C ₂₀ cycloalkyl or phenyl-C ₁ -C ₃ alkyl, wherein C ₂ -C ₁₂ alkenyl, C ₃ -C ₂₀ cycloalkyl or phenyl-C ₁ -C ₃ alkyl without inter or hetero-have one or more O, S, CO, NR ₂₆ or COOR ₁₇ ; or R ₁₈ Is a C ₁ -C ₂₀ alkyl group which is unsubstituted or substituted with one or more of the following groups: OH, SH, CN, C ₃ -C ₆ alkenyloxy, OCH ₂ CH ₂ CN, OCH ₂ CH ₂ ( CO)O(C ₁ -C ₄ alkyl), O(CO)-(C ₂ -C ₄ )alkenyl, O(CO)-(C ₁ -C ₄ alkyl), O(CO)-phenyl Or (CO)OR ₁₇ ; or R ₁₈ C ₂ -C ₂₀ alkyl with one or more O, S, CO, NR ₂₆ or COOR _{17 in between} ; or R ₁₈ (CH ₂ CH ₂ O) _n H , (CH ₂ CH ₂ O) _n (CO)-(C ₁ -C ₈ alkyl), C ₂ -C ₈ alkanoyl or C ₃ -C ₆ alkenyl; or R ₁₈ benzhydryl, It is unsubstituted or substituted with one or more of the following groups: C ₁ -C ₆ alkyl, halogen, OH, C ₁ -C ₄ alkoxy or C ₁ -C ₄ alkylthio; or R ₁₈ phenyl, naphthyl or C ₃ -C ₂₀ heteroaryl, each of which is unsubstituted or substituted with one or more of the following radicals: halogen, C ₁ -C ₁₂ alkyl, C ₁ -C ₄ Substituted alkyl, C ₁ -C ₁₂ alkoxy, CN, NO _2, phenyl -C ₁ -C ₃ alkoxy, phenoxy, C ₁ -C ₁₂ alkylthio, phenylthio, N (C ₁ -C ₁₂ alkyl) ₂ , diphenylamino, (CO)O(C ₁ -C ₈ alkyl), (CO)-C ₁ -C ₈ alkyl, (CO)N (C ₁ -C ₈ alkyl) ₂ or R ₁₉ and R ₂₀ are each independently hydrogen, C ₁ -C ₂₀ alkyl, C ₂ -C ₄ hydroxyalkyl, C ₂ -C ₁₀ alkoxyalkyl, C ₂ -C ₅ alkenyl, C ₃ - C ₂₀ cycloalkyl, phenyl-C ₁ -C ₃ alkyl, SO ₂ -(C ₁ -C ₄ haloalkyl), C ₁ -C ₈ alkanoyl, C ₁ -C ₈ alkenyloxy, a C ₃ -C ₁₂ olefinic group or a benzhydryl group; or R ₁₉ and R ₂₀ are a phenyl, naphthyl or C ₃ -C ₂₀ heteroaryl group, each unsubstituted or having one or more of the following groups Substituted: halogen, C ₁ -C ₄ haloalkyl, C ₁ -C ₂₀ alkoxy, C ₁ -C ₁₂ alkyl, benzhydryl or C ₁ -C ₁₂ alkoxy; or R ₁₉ and R ₂₀ The attached N atoms together form a 5- or 6-membered saturated or unsaturated ring which is not intermixed or interspersed with O, S or NR ₁₇ , and the 5 or 6 member saturated or unsaturated ring is unsubstituted or Or substituted with a plurality of groups: C ₁ -C ₂₀ alkyl, C ₁ -C ₂₀ alkoxy, =0, OR ₁₇ , SR ₁₈ , NR ₂₁ R ₂₂ , (CO)R ₂₃ , NO ₂ , halogen, C ₁ -C ₄ -haloalkyl, CN, phenyl, Or a C ₃ -C ₂₀ cycloalkyl group, the C ₃ -C ₂₀ cycloalkyl group having no or hetero or one or more O, S, CO or NR ₁₇ ; or R ₁₉ and R ₂₀ and the N atom to which it is attached Together forming a heteroaromatic ring system, the ring system is unsubstituted or substituted with one or more of the following groups: C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, C ₁ -C ₂₀ alkoxy, =O, OR ₁₇ , SR ₁₈ , NR ₂₁ R ₂₂ , (CO)R ₂₃ , , halogen, NO ₂ , CN, phenyl or C ₃ -C ₂₀ cycloalkyl, the C ₃ -C ₂₀ cycloalkyl group having no or hetero or one or more O, S, CO or NR ₁₇ ; R ₂₁ and R ₂₂ independently of one another hydrogen, C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, C ₃ -C ₁₀ cycloalkyl or phenyl; or R ₂₁ and R _{22 together} with the attached N atom Forming a 5- or 6-membered saturated or unsaturated ring without interstitial or interstitial with O, S or NR ₂₆ , and the 5 or 6 member saturated or unsaturated ring is not fused or the 5 or 6 members are saturated or not The saturated ring system is fused to a benzene ring; R ₂₃ is hydrogen, OH, C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, intervening one or more O, CO or NR ₂₆ C ₂ -C ₂₀ alkane a C ₃ -C ₂₀ cycloalkyl group having an O, S, CO or NR ₂₆ or an R ₂₃ phenyl group, a naphthyl group, a phenyl-C ₁ -C ₄ alkyl group, OR ₁₇ , SR ₁₈ or NR ₂₁ R ₂₂ ; R ₂₄ system (CO)OR ₁₇ , CONR ₁₉ R ₂₀ , (CO)R ₁₇ ; or R ₂₄ having one of the meanings given for R ₁₉ and R ₂₀ ; R ₂₅ system COOR ₁₇ , CONR ₁₉ R ₂₀ , (CO)R ₁₇ ; or R ₂₅ have one of the meanings given for R ₁₇ ; R ₂₆ is hydrogen, C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl , C _{a 2} -C ₂₀ alkyl group in which one or more O or CO are heterogeneous; or a phenyl-C ₁ -C ₄ alkyl group, a C ₃ -C ₈ cycloalkyl group, which has no or a heterogeneous one or more O Or CO; or (CO)R ₁₉ ; or a phenyl group which is unsubstituted or substituted with one or more of the following groups: C ₁ -C ₂₀ alkyl, halogen, C ₁ -C ₄ haloalkyl, OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ or But the condition is that at least one group is present in the molecule or

The preferred group of the group defined by the photoinitiator (C-1) of the structure represented by the formula (IA) corresponds to a photoinitiator (C- as for the structure shown by the formula (CI) given below. 1) given, just for each defined oxime ester group (eg Are replaced by corresponding free sulfonium groups

Each oxime ester group can exist in two configurations (Z) or (E). The isomers can be separated by conventional methods, but a mixture of isomers can also be used as, for example, a photoinitiator. Accordingly, the present invention is also a mixture of configurational isomers of the photoinitiator (C-1) of the structure represented by the formula (C-I).

Preferred is a photoinitiator (C-1) of the structure represented by the formula (CI) as defined above, wherein R ₁ , R ₂ , R ₃ , R ₄ , R ₅ , R ₆ , R ₇ and R _{8 is} independently of each other hydrogen, C ₁ -C ₂₀ alkyl, , COR ₁₆ or NO ₂ , or R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ , R ₅ and R ₆ , R ₆ and R ₇ or R ₇ and R ₈ are independently of each other However, the condition is at least one of R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ , R ₅ and R ₆ , R ₆ and R ₇ or R ₇ and R ₈ X is a CO or a direct bond; R ₁₃ is a C ₁ -C ₂₀ alkyl group which is unsubstituted or substituted with one or more of the following groups: halogen, OR ₁₇ , SR ₁₈ , COOR ₁₇ , CONR ₁₉ R ₂₀ or PO (OC _k H _2k+1 ) ₂ ; or R ₁₃ is a C ₂ -C ₂₀ alkyl group in which one or more O, S, NR ₂₆ or CO; or R ₁₃ is a phenyl or naphthyl group; Unsubstituted or one or more Or substituted by COR ₁₆ ; R ₁₄ is C ₁ -C ₂₀ alkyl, phenyl or C ₁ -C ₈ alkoxy; R ₁₅ is phenyl, naphthyl, C ₃ -C ₂₀ heteroaryl, each of which is not Substituted or substituted with one or more of the following: phenyl, halo, C ₁ -C ₄ haloalkyl, OR ₁₇ , SR ₁₈ or C ₂ -C ₂₀ alkyl, interspersed with one or more O or S; which each with one or more C ₁ -C ₂₀ alkyl, C ₁ -C ₂₀ alkyl which is unsubstituted or substituted with one or more of the following radicals: _{halogen, COOR 17, CONR 19 R 20} , phenyl , C ₃ -C ₈ cycloalkyl, C ₃ -C ₂₀ heteroaryl, C ₆ -C ₂₀ aryloxycarbonyl, C ₄ -C ₂₀ heteroaryloxycarbonyl, OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ Or PO(OC _k H _2k+1 ) ₂ ; or R ₁₅ is a C ₁ -C ₂₀ alkyl group which is unsubstituted or substituted with one or more of the following groups: OR ₁₇ , SR ₁₈ , C ₃ -C ₈ a cycloalkyl group, a C ₃ -C ₂₀ heteroaryl group, NR ₁₉ R ₂₀ , COOR ₁₇ , CONR ₁₉ R ₂₀ or PO(OC _k H _2k+1 ) ₂ ; R' ₁₄ has the meaning given for R ₁₄ one; R _'15 has the meanings for R ₁₅ Suo one of those given; R ₁₆ lines phenyl, which is unsubstituted or substituted with one or more of the following _{groups: oR 17, SR 18, NR} 19 R 20 Or intermixed with one or more C ₂ -C ₂₀ alkyl groups of O, S or NR ₂₆ , or an R ₁₆ -phenyl group substituted with one or more C ₁ -C ₂₀ alkyl groups, the C ₁ -C ₂₀ alkane Substituent substituted or substituted with one or more of the following groups: halogen, COOR ₁₇ , CONR ₁₉ R ₂₀ , phenyl, C ₃ -C ₈ cycloalkyl, C ₃ -C ₂₀ heteroaryl, C ₆ -C ₂₀ aryloxycarbonyl, C ₄ -C ₂₀ heteroaryloxycarbonyl, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₁₆ C ₁ -C ₂₀ alkyl, unsubstituted or substituted by : halogen, phenyl, OH, SH, CN, C ₃ -C ₆ alkenyloxy, OCH ₂ CH ₂ (CO)O(C ₁ -C ₄ alkyl), O(CO)-(C ₁ -C ₄ Alkyl) or (CO)O(C ₁ -C ₄ alkyl); R ₁₇ is a C ₁ -C ₂₀ alkyl group which is unsubstituted or substituted with one or more of the following groups: halogen, OCH ₂ CH ₂ (CO)O(C ₁ -C ₄ alkyl), O(C ₁ -C ₄ alkyl), (CO)O(C ₁ -C ₄ alkyl), C ₃ -C ₂₀ cycloalkyl or hetero Or a plurality of C ₃ -C ₂₀ cycloalkyl groups of O; or R ₁₇ C ₂ -C ₂₀ alkyl groups with one or more O interstitials; R ₁₈ is a methyl group substituted by (CO)OR ₁₇ ; R ₁₉ and R ₂₀ independently of one another hydrogen, phenyl, C ₁ -C ₂₀ alkyl, C ₁ -C ₈ alkanoyl group or a C ₁ -C ₈ alkanoyl-yloxy ; Or R ₁₉ and R ₂₀ appended thereto the N atom to form a heteroaromatic ring system with the ring system is unsubstituted or Substituting; but the condition is that at least one group is present in the molecule or (C-1), wherein R ₁ , R ₂ , R ₅ , R ₆ , R ₇ and R ₈ are each independently hydrogen,

Attention must be paid to the photoinitiator COR ₁₆ or NO _{2 of the} structure of formula (CI) as defined above, together with R ₃ and R ₄ R ₉ , R ₁₀ , R ₁₁ and R ₁₂ are hydrogen; X is a direct bond; R ₁₃ is a C ₁ - C ₂₀ alkyl group; R ₁₄ is a C ₁ - C ₂₀ alkyl group; and R ₁₅ is a C ₁ - C ₂₀ alkane Or a phenyl group substituted with one or more OR ₁₇ or C ₁ -C ₂₀ alkyl groups; R ₁₆ is a phenyl group substituted with one or more C ₁ -C ₂₀ alkyl groups or OR ₁₇ ; and R ₁₇ a C ₁ -C ₂₀ alkyl group or an interstitial heterocyclic one or more C ₂ -C ₂₀ alkyl groups substituted by one or more halogens; provided that at least one group is present in the molecule

The subject matter of the present invention is further a photoinitiator (C-1) of the structure represented by the formula (CI) as defined above, wherein R ₁ , R ₂ , R ₃ , R ₄ , R ₅ , R ₆ , R ₇ and R ₈ are each independently hydrogen, or R ₁ and R ₂ , R ₃ and R ₄ or R ₅ and R ₆ are independently of each other However, the condition is that at least one of R ₁ and R ₂ , R ₃ and R ₄ or R ₅ and R ₆ is Or R ₂ , COR ₁₆ , NO ₂ or Or R ₇ series Or COR ₁₆ ; R ₉ , R ₁₁ and R ₁₂ are hydrogen; R ₁₀ is hydrogen, OR ₁₇ or COR ₁₆ ; X is CO or a direct bond; R ₁₃ is a C ₁ - C ₂₀ alkyl group, which is unsubstituted or Substituted by one or more of the following groups: halogen, R ₁₇ , OR ₁₇ , SR ₁₈ or PO(OC _k H _2k+1 ) ₂ ; or R ₁₃ C ₂ -C ₂₀ alkyl, with one or more O inter Or R ₁₃ is a phenyl group; k is an integer 2; R ₁₄ is a C ₁ -C ₂₀ alkyl or thienyl group; R ₁₅ is a phenyl or naphthyl group, each unsubstituted or via one or more OR ₁₇ or C ₁ -C ₂₀ alkyl substituted; or R ₁₅ is thienyl, hydrogen, C ₁ -C ₂₀ alkyl, the C ₁ -C ₂₀ alkyl group is unsubstituted or substituted with one or more of the following groups: OR ₁₇ , SR ₁₈ , C ₃ -C ₈ cycloalkyl, NR ₁₉ R ₂₀ or COOR ₁₇ ; or R ₁₅ C ₂ -C ₂₀ alkyl, interspersed with SO ₂ ; R ₁₆ phenyl or naphthyl, each of which Substituted or substituted with one or more of the following groups: OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ or C ₁ -C ₂₀ alkyl; or R ₁₆ thienyl; R ₁₇ hydrogen, C ₁ -C ₈ An alkanoyl group, a C ₁ -C ₂₀ alkyl group, which is unsubstituted or has one or more of the following groups: halogen, O(CO)-(C ₁ -C ₄ alkyl), O(CO)-(C ₂ -C ₄₎ alkenyl group or interrupted by one or a plurality of C ₃ -C ₂₀ cycloalkyl groups of O; or R ₁₇ C ₂ -C ₂₀ alkyl groups with one or more O interstitials; R ₁₈ C ₃ -C ₂₀ cycloalkyl groups, C ₁ -C ₂₀ An alkyl group which is unsubstituted or substituted with one or more OH, O(CO)-(C ₂ -C ₄ )alkenyl or (CO)OR ₁₇ ; or an R ₁₈ phenyl group which is unsubstituted or Substituted by one or more halogens; R ₁₉ and R ₂₀ are each independently C ₁ -C ₈ alkanoyl or C ₁ -C ₈ alkenyloxy; or R ₁₉ and R ₂₀ together with the N atom to which they are attached Forming a 5- or 6-membered saturated ring with O; however, the condition is that at least one group is present in the molecule

Examples of compounds of the invention are the compounds of formula (Ia)-(Ig) as defined above. Formula (Ia), (Ib), (Ic), especially Formula (Ia) or (Ic), or Formula (Ia), (Ic) or (Id), especially Its compound of formula (Ia) is of interest.

For example, R ₁ , R ₂ , R ₃ , R ₄ , R ₅ , R ₆ , R ₇ and R ₈ are each independently hydrogen, Or COR ₁₆ , or R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ or R ₅ and R ₆ , R ₆ and R ₇ , R ₇ and R ₈ are independently of each other

For example, R ₃ and R ₄ or R ₁ and R ₂ are Or R ₃ and R ₄ and R ₅ and R ₆ are ; R ₃ and R _{4 are} especially common

For example, R ₁ , R ₅ , R ₆ and R ₈ are hydrogen. Or COR ₁₆ , especially

R _{7 is} especially hydrogen, Or COR ₁₆ . Or R ₇ series

R _{2 is} especially , COR ₁₆ or Or R ₂ together with R ₁ . R _{2 is} especially COR ₁₆ .

X is preferably a direct bond.

For example, R ₉ , R ₁₀ , R ₁₁ and R ₁₂ are, independently of each other, hydrogen, C ₁ -C ₂₀ alkyl, unsubstituted phenyl or phenyl substituted with one or more of the following groups: C ₁ -C ₆ alkyl, halogen, OR ₁₇ or SR ₁₈ ; or R ₉ , R ₁₀ , R ₁₁ and R ₁₂ are each independently halogen, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ wherein the substituent OR ₁₇ SR ₁₈ or NR ₁₉ R ₂₀ optionally via a group R _17, R _18, R ₁₉ and / or R ₂₀ form a 5 or 6-membered ring with a carbon atom naphthyl ring; or R _9, R _10, R ₁₁ And R ₁₂ are independent of each other Or COR ₁₆ .

Specifically, for example, R ₉ , R ₁₀ , R ₁₁ and R ₁₂ are each independently hydrogen, C ₁ -C ₂₀ alkyl, unsubstituted phenyl or substituted by one or more of the following groups Phenyl group: C ₁ -C ₆ alkyl group, halogen, OR ₁₇ or SR ₁₈ ; or R ₉ , R ₁₀ , R ₁₁ and R ₁₂ are each independently halogen, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₉ , R ₁₀ , R ₁₁ and R ₁₂ are independent of each other Or COR ₁₆ .

For example, R ₉ , R ₁₀ , R ₁₁ and R ₁₂ are, independently of each other, hydrogen, C ₁ -C ₂₀ alkyl, unsubstituted phenyl or substituted by one or more C ₁ -C ₆ alkyl groups. Phenyl; or R ₉ , R ₁₀ , R ₁₁ and R ₁₂ are independently of each other Or COR ₁₆ .

In another embodiment, for example, R ₉ , R ₁₀ , R ₁₁ and R ₁₂ are, independently of each other, hydrogen, C ₁ -C ₂₀ alkyl, unsubstituted phenyl or one or more of the following groups a substituted phenyl group: C ₁ -C ₆ alkyl, halogen, OR ₁₇ or SR ₁₈ ; or R ₉ , R ₁₀ , R ₁₁ and R ₁₂ are each independently halogen, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ Wherein the substituent OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ optionally forms a 5- or 6-membered ring via a group R ₁₇ , R ₁₈ , R ₁₉ and/or R ₂₀ with one carbon atom of the naphthyl ring.

In addition, for _{example, R 9, R 10, R} 11 and R ₁₂ independently of one another hydrogen, C ₁ -C ₂₀ alkyl, unsubstituted or substituted phenyl group of one or more of the phenyl group C ₁ -C ₆ alkyl, halogen, OR ₁₇ or SR ₁₈ , or R ₉ , R ₁₀ , R ₁₁ and R ₁₂ are each independently halogen, OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ or COR ₁₆ .

Or by way of example, R ₉ , R ₁₀ , R ₁₁ and R ₁₂ are, independently of each other, hydrogen, C ₁ -C ₂₀ alkyl, unsubstituted phenyl or phenyl substituted with one or more of the following groups: C ₁ -C ₆ alkyl, halogen, OR ₁₇ or SR ₁₈ , or R ₉ , R ₁₀ , R ₁₁ and R ₁₂ are each independently halogen, OR ₁₇ , COR ₁₆ or NR ₁₉ R ₂₀ .

Preferably, R ₉ , R ₁₁ and R ₁₂ are hydrogen and R ₁₀ is hydrogen, OR ₁₇ or COR ₁₆ .

R ₁₃ is, for example, a C ₁ -C ₂₀ alkyl group which is unsubstituted or substituted with one or more of the following groups: halogen, COOR ₁₇ or CONR ₁₉ R ₂₀ ; or R ₁₃ C ₂ -C ₂₀ alkyl In the meantime, one or more of O, S, SO, SO ₂ , NR ₂₆ or CO, or a C ₂ -C ₁₂ alkenyl group, optionally having one or more O, CO or NR ₂₆ or R ₁₃ systems a C ₃ -C ₁₀ cycloalkyl group optionally having one or more O, S, CO, NR ₂₆ or R ₁₃ phenyl or naphthyl groups, either unsubstituted or having one or more of the following groups Group replacement: OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ , , COR ₁₆ , NO ₂ , halogen, C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, C ₂ -C ₂₀ alkyl, heteroatom having one or more O; or C ₁ -C ₂₀ alkyl , which is unsubstituted or substituted with one or more of the following groups: halogen, R ₁₇ , COOR ₁₇ , OR ₁₇ , SR ₁₈ , CONR ₁₉ R ₂₀ or PO(OC _k H _2k+1 ) ₂ ; or C ₂ -C ₂₀ alkyl group with one or more O in between.

Further, R ₁₃ is, for example, a C ₁ -C ₂₀ alkyl group which is unsubstituted or substituted with one or more of the following groups: halogen, R ₁₇ , COOR ₁₇ , OR ₁₇ , SR ₁₈ , CONR ₁₉ R ₂₀ or PO(OC _k H _2k+1 ) ₂ ; or a C ₂ -C ₂₀ alkyl group with one or more O; or a C ₂ -C ₁₂ alkenyl group, a C ₃ -C ₁₀ cycloalkyl group; or R _{a 13} -phenyl or naphthyl group which is unsubstituted or substituted with one or more of the following groups: OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ , And COR ₁₆ , NO ₂ , halogen, C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, C ₂ -C ₂₀ alkyl, with one or more O intervening.

In another embodiment, R ₁₃ lines (e.g.) C ₁ -C ₂₀ alkyl, which is unsubstituted or substituted with one or more of the following radicals: _{halogen, R 17, OR 17, SR} 18 or PO (OC _k H _2k+1 ) ₂ ; or a C ₂ -C ₂₀ alkyl group in which one or more O is hetero; or a C ₂ -C ₁₂ alkenyl group, a C ₃ -C ₁₀ cycloalkyl group, a phenyl group or a naphthyl group; .

Or R ₁₃ is, for example, a C ₁ -C ₂₀ alkyl group which is unsubstituted or substituted with one or more of the following groups: halogen, R ₁₇ , OR ₁₇ , SR ₁₈ or PO(OC _k H2 _k+1 ) _2; or C ₂ -C ₂₀ alkyl-based, have therebetween one or more O heteroatom; or a phenyl-based, C ₂ -C ₁₂ alkenyl or C ₃ -C ₁₀ cycloalkyl.

Or R ₁₃ is, for example, a C ₁ -C ₂₀ alkyl group, a phenyl group, a C ₂ -C ₁₂ alkenyl group or a C ₃ -C ₁₀ cycloalkyl group.

Or R ₁₃ is, for example, a C ₁ -C ₂₀ alkyl group, a C ₂ -C ₁₂ alkenyl group or a C ₃ -C ₁₀ cycloalkyl group.

Preferably, R ₁₃ is C ₁ -C ₂₀ alkyl, especially C ₁ -C ₈ alkyl, such as 2-ethylhexyl.

R ₁₄ is, for example, hydrogen, C ₃ -C ₈ cycloalkyl, C ₂ -C ₅ alkenyl, C ₁ -C ₂₀ alkoxy or C ₁ -C ₂₀ alkyl, unsubstituted or via one or a plurality of halogen or phenyl substitutions; or R ₁₄ phenyl or naphthyl, both unsubstituted or substituted by one or more of the following groups: C ₁ -C ₆ alkyl, C ₁ -C ₄ haloalkyl , halogen, OR ₁₇ , SR ₁₈ and/or NR ₁₉ R ₂₀ ; or R ₁₄ C ₃ -C ₅ heteroaryl, such as thienyl, or C ₁ -C ₈ alkoxy, benzyloxy or phenoxy base.

Or R ₁₄ is, for example, a C ₁ -C ₂₀ alkyl group which is unsubstituted or substituted with one or more halogen or phenyl groups; or an R ₁₄ C ₃ -C ₅ heteroaryl group (e.g., thienyl) or a system a phenyl group which is unsubstituted or substituted with one or more of the following groups: C ₁ -C ₆ alkyl, C ₁ -C ₄ haloalkyl, halogen, OR ₁₇ , SR ₁₈ and/or NR ₁₉ R ₂₀ ; R ₁₄ is a C ₁ -C ₈ alkoxy group, a benzyloxy group or a phenoxy group.

In another embodiment, R ₁₄ represents C ₁ -C ₂₀ alkyl, which is unsubstituted or substituted with phenyl; or R ₁₄ is phenyl, unsubstituted or via one or more C ₁ -C ₆ Alkyl substitution.

Preferably, R ₁₄ is C ₁ -C ₂₀ alkyl, C ₃ -C ₅ heteroaryl (such as thienyl), or phenyl, especially C ₁ -C ₂₀ alkyl or thienyl, especially C _1- C ₈ alkyl.

R ₁₅ is, for example, a C ₆ -C ₂₀ aryl group or a C ₅ -C ₂₀ heteroaryl group, each of which is unsubstituted or substituted with one or more of the following groups: phenyl, halogen, C ₁ -C ₄ haloalkane Base, CN, NO ₂ , OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ , C ₁ -C ₂₀ alkyl; or R ₁₅ hydrogen, C ₃ -C ₈ cycloalkyl, C ₃ -C ₈ cycloalkyl Depending on the case, one or more O, CO or NR ₂₆ ; or R ₁₅ C ₁ -C ₂₀ alkyl groups which are unsubstituted or substituted by one or more of the following groups: halogen, OR ₁₇ , C ₃ -C ₈ -cycloalkyl, C ₅ -C ₂₀ heteroaryl, C ₈ -C ₂₀ phenoxycarbonyl, C ₅ -C ₂₀ heteroaryloxy-carbonyl, NR ₁₉ R ₂₀ , COOR ₁₇ , CONR ₁₉ R ₂₀ , PO (OC _k H _2k+1 ) ₂ , Phenyl or phenyl substituted by the following groups: halogen, C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, OR ₁₇ or NR ₁₉ R ₂₀ ; or R ₁₅ C ₂ -C ₂₀ alkyl In between, one or more of O, S or SO ₂ , or R ₁₅ C ₂ -C ₂₀ alkyl fluorenyl, benzhydryl, C ₂ -C ₁₂ alkoxycarbonyl, phenoxycarbonyl, CONR ₁₉ R ₂₀ , NO ₂ or C ₁ -C ₄ haloalkyl.

Further, R ₁₅ is, for example, hydrogen, C ₆ -C ₂₀ aryl, especially phenyl or naphthyl, each unsubstituted or substituted by C ₁ -C ₁₂ alkyl; or C ₃ -C ₅ hetero An aryl group, such as a thienyl group; or a C ₃ -C ₈ cycloalkyl group, a C ₁ -C ₂₀ alkyl group, which is unsubstituted or substituted with one or more of the following groups: OR ₁₇ , SR ₁₇ , C ₃ - C ₈ -cycloalkyl, NR ₁₉ R ₂₀ or COOR ₁₇ ; or R ₁₅ C ₂ -C ₂₀ alkyl, heterogeneously having one or more O or SO ₂ .

The photoinitiator (C-1) having the structure of the formula (CI) is of interest, wherein R ₁₅ is, for example, hydrogen, phenyl, naphthyl, each unsubstituted or via C ₁ -C ₈ An alkyl group; or an R ₁₅ -thiophenyl group, a C ₁ -C ₂₀ alkyl group, which is unsubstituted or substituted with one or more of the following groups: OR ₁₇ , SR ₁₇ , C ₃ -C ₈ -cycloalkyl, NR ₁₉ R ₂₀ or COOR ₁₇ ; or R ₁₅ is a C ₂ -C ₂₀ alkyl group in which one or more O or SO ₂ are heterogeneous.

R _{15 is} especially, for example, C ₃ -C ₈ cycloalkyl or C ₁ -C ₂₀ alkyl, especially C ₁ -C ₂₀ alkyl, especially C ₁ -C ₁₂ alkyl.

The preferred ones of R' ₁₄ and R' ₁₅ are as set forth above for R ₁₄ and R ₁₅ , respectively.

X ₁ is, for example, O, S or SO, such as O or S, especially O.

R ₁₆ is, for example, a C ₆ -C ₂₀ aryl group (especially phenyl or naphthyl, especially phenyl) or a C ₅ -C ₂₀ heteroaryl (especially thienyl), each unsubstituted or one or more Substituted for: phenyl, halogen, C ₁ -G ₄ haloalkyl, CN, NO ₂ , OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ or a C ₁ -C ₂₀ alkyl group having one or more O; or each with one or more C ₁ -C ₂₀ substituted alkyl, C ₁ -C ₂₀ alkyl which is unsubstituted or substituted with one or more of the following radicals: _{halogen, COOR 17, CONR 19 R 20} , benzyl , C ₃ -C ₈ cycloalkyl, C ₅ -C ₂₀ heteroaryl, C ₆ -C ₂₀ aryloxycarbonyl, C ₅ -C ₂₀ heteroaryloxycarbonyl, OR ₁₇ , SR ₁₈ or NR ₁₉ R _20; or R ₁₆ based hydrogen, C ₁ -C ₂₀ alkyl, C ₁ -C ₂₀ alkyl which is unsubstituted or substituted with one or more of the following groups: halogen, phenyl, OH, SH, C ₃ - C ₆ alkenyloxy, OCH ₂ CH ₂ (CO)O(C ₁ -C ₄ alkyl), O(CO)-(C ₁ -C ₄ alkyl), O(CO)-phenyl, (CO) OH or (CO)O(C ₁ -C ₄ alkyl); or R ₁₆ C ₂ -C ₁₂ alkyl, heterogeneously having one or more O; or (CH ₂ CH ₂ O) _n+1 H, (CH ₂ CH ₂ O) _n (CO)-(C ₁ -C ₈ alkyl), C ₂ -C ₁₂ alkenyl or C ₃ -C ₈ naphthenic And n is 1 to 20, such as 1 to 12 or 1 to 8, especially 1 or 2.

Furthermore, R ₁₆ is, for example, phenyl or naphthyl, especially phenyl, thienyl or oxazole, each unsubstituted or substituted by one or more of the following groups: phenyl, halogen, C ₁ -C _{a 4-} haloalkyl group, OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ or C ₁ -C ₂₀ alkyl; or an R ₁₆ C ₁ -C ₂₀ alkyl group which is unsubstituted or substituted with one or more of the following groups: Halogen, phenyl, OH, SH, C ₃ -C ₆ alkenyloxy, OCH ₂ CH ₂ (CO)O(C ₁ -C ₄ alkyl), O(CO)-(C ₁ -C ₄ alkyl) , O(CO)-phenyl, (CO)OH or (CO)O(C ₁ -C ₄ alkyl); or R ₁₆ C ₂ -C ₁₂ alkyl, in which one or more O; or (CH ₂ CH ₂ O) _n+1 H, (CH ₂ CH ₂ O) _n (CO)-(C ₁ -C ₈ alkyl), C ₂ -C ₁₂ alkenyl or C ₃ -C ₈ cycloalkyl And n is from 1 to 20, such as from 1 to 12 or from 1 to 8, especially 1 or 2.

Further, R ₁₆ is, for example, phenyl or naphthyl, especially phenyl, each unsubstituted or substituted with one or more of the following groups: phenyl, halo, C ₁ -C ₄ haloalkyl, OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ or C ₁ -C ₂₀ alkyl; or R ₁₆ C ₃ -C ₅ heteroaryl, especially thienyl.

R _{16 is} especially, for example, phenyl which is unsubstituted or substituted by one or more of the following groups: OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ or C ₁ -C ₂₀ alkyl, or R _16- based thienyl .

Preferably, R ₁₆ is, for example, phenyl or naphthyl, each unsubstituted or substituted with one or more C ₁ -C ₂₀ alkyl groups.

R _{16 is} especially phenyl which is substituted by one or more C ₁ -C ₂₀ alkyl groups.

R ₁₇ is, for example, hydrogen, phenyl-C ₁ -C ₃ alkyl, C ₁ -C ₂₀ alkyl, which is unsubstituted or substituted with one or more of the following groups: halogen, OH, OCH ₂ CH ₂ (CO)O(C ₁ -C ₄ alkyl), O(CO)-(C ₁ -C ₄ alkyl), O(CO)-(C ₂ -C ₄ )alkenyl, O(CO)-benzene a C ₃ -C ₂₀ cycloalkyl group; or a R ₁₇ system having one or more O groups; or (CO)OH, (CO)O(C ₁ -C ₄ alkyl), C ₃ -C ₂₀ cycloalkyl or inter-hetero a C ₂ -C ₂₀ alkyl group in which one or more O is hetero; a system of (CH ₂ CH ₂ O) _n+1 H, (GH ₂ CH ₂ O) _n (CO)-(C ₁ -C ₈ alkyl) a C ₁ -C ₈ alkanoyl group, a C ₂ -C ₁₂ alkenyl group, a C ₃ -C ₆ olefinic group or a C ₃ -C ₂₀ cycloalkyl group optionally having one or more O; or an R ₁₇ system a benzhydryl group which is unsubstituted or substituted by one or more C ₁ -C ₆ alkyl, halogen, OH or C ₁ -C ₃ alkoxy groups; or R ₁₇ phenyl, naphthyl or C5-C _{a 20} heteroaryl group, each of which is unsubstituted or substituted with one or more of the following groups: halogen, OH, C ₁ -C ₁₂ alkyl, C ₁ -C ₁₂ alkoxy, CN, NO ₂ , phenyl- C ₁ -C ₃ alkoxy, phenoxy, C ₁ -C ₁₂ alkylthio, phenylthio, N(C ₁ -C ₁₂ alkyl) ₂ , diphenyl-amine or

In another embodiment, R ₁₇ is, for example, hydrogen, phenyl-C ₁ -C ₃ alkyl, C ₁ -C ₂₀ alkyl, which is unsubstituted or substituted with one or more of the following groups: halogen , O(CO)-(C ₁ -C ₄ alkyl), O(CO)-(C ₂ -C ₄ alkenyl) or a C ₂ -C ₂₀ alkyl group having one or more O; or a C ₁ -C ₈ alkyl fluorenyl, C ₂ -C ₁₂ alkenyl, C ₃ -C ₆ olefinic group, heterochromic one or more C ₂ -C ₂₀ alkyl groups, optionally with one or more C ₃ a -C ₂₀ cycloalkyl group; or a benzhydryl group which is unsubstituted or substituted with one or more of the following groups: C ₁ -C ₆ alkyl, halogen, OH or C ₁ -C ₃ alkoxy; Or a phenyl or naphthyl group, each unsubstituted or substituted with one or more of the following groups: halogen, C ₁ -C ₁₂ alkyl or C ₁ -C ₁₂ alkoxy.

R ₁₇ is also, for example, hydrogen, phenyl-C ₁ -C ₃ alkyl, C ₁ -C ₈ alkanoyl, C ₁ -C ₂₀ alkyl, unsubstituted or via one or more of the following groups substituents: halogen, C ₃ -C ₂₀ cycloalkyl, O (CO) - or interrupted by one or more O (C ₂ -C ₄ alkenyl) the - (C ₁ -C ₄ alkyl), O (CO) C ₂ -C ₂₀ alkyl, or R ₁₇ C ₂ -C ₂₀ alkyl, heterogeneous with one or more O.

R _{17 is} especially hydrogen, C ₁ -C ₈ alkanoyl, C ₁ -C ₂₀ alkyl, which is unsubstituted or substituted by one or more of the following groups: O(CO)-(C ₁ -C ₄ alkane a group of O(CO)-(C ₂ -C ₄ alkenyl) or a C ₂ -C ₂₀ alkyl group having one or more O, or an R ₁₇ C ₂ -C ₂₀ alkyl group, having one or more O.

R ₁₈ is, for example, a C ₃ -C ₂₀ cycloalkyl group which has no or a hetero or one or more O; or an R ₁₈ C ₁ -C ₂₀ alkyl group which is unsubstituted or one or more Group substitution: OH, O(CO)-(C ₂ -C ₄ )alkenyl, O(CO)-(C ₁ -C ₄ alkyl) or (CO)OR ₁₇ ; or R ₁₈ C ₂ -C _{a 20} alkyl group having one or more of O, S, CO, NR ₂₆ or COOR _{17 in between} ; or an R ₁₈ C ₂ -C ₈ alkanoyl group or a C ₃ -C ₆ alkenyl group or a benzamidine group; R ₁₈ is phenyl, naphthyl or C ₃ -C ₂₀ heteroaryl, each unsubstituted or substituted by one or more of the following groups: halogen, C ₁ -C ₁₂ alkyl, C ₁ -C ₄ haloalkane Base, C ₁ -C ₁₂ alkoxy or NO ₂ .

In another embodiment, R ₁₈ is, for example, C ₃ -C ₂₀ cycloalkyl, C ₁ -C ₂₀ alkyl, which is unsubstituted or substituted with one or more of the following groups: OH, O (CO )-(C ₂ -C ₄ )alkenyl, O(CO)-(C ₁ -C ₄ alkyl) or (CO)OR ₁₇ ; or R ₁₈ phenyl or naphthyl, each unsubstituted or via One or more halogen or C ₁ -C ₁₂ alkyl groups, especially halogen.

R ₁₈ is, for example, C ₁ -C ₂₀ alkyl, C ₂ -C ₁₂ alkenyl, C ₃ -C ₂₀ cycloalkyl, phenyl-C ₁ -C ₃ alkyl, C ₂ -C ₈ alkanoyl , benzylidene, phenyl or naphthyl.

For example, R ₁₈ is a C ₁ -C ₂₀ alkyl group substituted with one or more of the following groups: OH, O(CO)-(C ₂ -C ₄ )alkenyl, O(CO)-(C ₁ -C ₄ alkyl) or (CO)OR ₁₇ , or R ₁₈ -phenyl, substituted by one or more halogens.

Preferably, R ₁₈ is C ₁ -C ₈ alkyl, which is substituted as defined above.

For example, R ₁₉ and R ₂₀ are each independently hydrogen, C ₁ -C ₂₀ alkyl, C ₂ -C ₄ hydroxyalkyl, C ₃ -C ₂₀ cycloalkyl, phenyl-C ₁ -C ₃ alkane a phenyl or naphthyl group, a C ₁ -C ₈ alkanoyl group, a C ₁ -C ₈ alkenyloxy group, a C ₃ -C ₁₂ alkenyl group or a benzhydryl group; or R ₁₉ and R ₂₀ The attached N atoms together form a 5- or 6-membered saturated or unsaturated ring heterogeneously interspersed with O, S or NR ₁₇ ; or R ₁₉ and R ₂₀ together with the N atom to which they are attached form a heteroaromatic ring system, The ring system is unsubstituted or substituted with one or more of the following groups: C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, or

Further, for example, R ₁₉ and R ₂₀ are each independently hydrogen, C ₁ -C ₂₀ alkyl, C ₂ -C ₄ hydroxyalkyl, C ₃ -C ₂₀ cycloalkyl, phenyl-C ₁ -C _{a 3} alkyl group, a C ₁ -C ₈ alkyl fluorenyl group, a C ₁ -C ₈ alkyl fluorenyloxy group, a C ₃ -C ₁₂ olefinic fluorenyl group or a benzhydryl group; or R ₁₉ and R ₂₀ are attached thereto The atoms together form a 5- or 6-membered saturated ring, optionally mixed with O or NR ₁₇ ; or R ₁₉ and R ₂₀ together with the N atom to which they are attached form an indazole ring.

For example, R ₁₉ and R ₂₀ are each independently hydrogen, C ₁ -C ₂₀ alkyl, C ₂ -C ₄ hydroxyalkyl, C ₃ -C ₂₀ cycloalkyl, phenyl-C ₁ -C ₃ alkane a C ₁ -C ₈ alkanoyl group, a C ₁ -C ₈ alkanoyloxy group, a C ₃ -C ₁₂ alkenyl group or a benzhydryl group; or R ₁₉ and R ₂₀ together with the N atom to which it is attached Form a 5- or 6-membered saturated ring with O or NR ₁₇ as appropriate.

Preferably, R ₁₉ and R ₂₀ are, independently of each other, a C ₁ -C ₈ alkanoyl group, a C ₁ -C ₈ alkenyloxy group; or R ₁₉ and R ₂₀ together with the N atom to which they are attached form a morpholine ring.

For example, R ₂₁ and R ₂₂ are, independently of each other, hydrogen, C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, C ₃ -C ₁₀ cycloalkyl or phenyl; or R ₂₁ and R ₂₂ The attached N atoms together form a morpholine ring. R ₂₁ and R _{22 are, in} particular, independently of one another hydrogen or C ₁ -C ₂₀ alkyl.

R ₂₃ is, for example, hydrogen, OH, phenyl or C ₁ -C ₂₀ alkyl. R _{23 is} especially hydrogen, OH or C ₁ -C ₄ alkyl.

The preferred of R ₂₄ is as given for R ₁₉ and R ₂₀ . The preferred of R ₂₅ is as given for R ₁₇ .

R ₂₆ is, for example, hydrogen, C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, C ₂ -C ₂₀ alkyl, heterogeneously having one or more O or CO; or phenyl-C ₁ - a C ₄ alkyl group, a C ₃ -C ₈ cycloalkyl group optionally having one or more O or CO; or a (CO)R ₁₉ or phenyl group which is unsubstituted or has one or more of the following groups Substitution: C ₁ -C ₂₀ alkyl, halogen, C ₁ -C ₄ haloalkyl, OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ .

Or R ₂₆ represents, for example, hydrogen, C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl; phenyl-C ₁ -C ₄ alkyl, C ₃ -C ₈ cycloalkyl, (CO)R ₁₉ or a phenyl group which is unsubstituted or substituted by one or more C ₁ -C ₂₀ alkyl groups. Further, R ₂₆ is, for example, hydrogen or a C ₁ -C ₂₀ alkyl group, especially a C ₁ -C ₄ alkyl group.

An example of the photoinitiator (C-1) having the structure of the formula (CI) of the present invention is as follows:

The photoinitiator (C-1) having the structure represented by the formula (C-I) is used for photopolymerization of a composition comprising at least one ethylenically unsaturated photopolymerizable compound.

In a specific example of the present invention, the total amount of the alkali-soluble resin (A) used is 100 parts by weight, and the photoinitiator (C-1) having the structure represented by the formula (CI) is used in an amount of 5 parts by weight. The portion is 50 parts by weight, preferably 8 parts by weight to 45 parts by weight, more preferably 10 parts by weight to 40 parts by weight. When the photoinitiator (C-1) having the structure represented by the formula (C-I) is used, the black matrix formed of the photosensitive resin composition has an advantage that the linearity of the high-definition pattern is good.

The photoinitiator (C) may further comprise other photoinitiators (C-2). The light Specific examples of the initiator (C-2) may include, but are not limited to, an O-indenyl hydrazine compound, a triazabenzene compound, an acetophenone compound, a diimidazole compound, a benzophenone compound, and an α-diketone compound. A ketone alcohol compound, a keto alcohol ether compound, a phosphonium phosphide oxide, an anthraquinone compound, a halogen-containing compound, a peroxide or any combination of the above compounds.

Specific examples of the above O-indenyl ruthenium compound may include, but are not limited to, 1-[4-(phenylthio)phenyl]-heptane-1,2-dione 2-(O-benzofluorenyl), 1-[4-(phenylthio)phenyl]-octane-1,2-dione-2-(O-phenylhydrazinyl), 1-[4-(phenylindenyl)phenyl]- Heptane-1,2-dione-2-(O-phenylhydrazinium), 1-[9-ethyl-6-(2-methylphenylhydrazino)-9H-indazole-3-substituent ]-Ethyl ketone-1-(O-acetamidoxime), 1-[9-ethyl-6-(3-methylphenylhydrazino)-9H-indazole-3-substituted]-ethane Keto-1-(O-ethylindenyl), 1-(9-ethyl-6-benzoin-9H-indazole-3-substituted)-ethanone-1-(O-ethenyl)肟), Ethyl ketone-1-[9-ethyl-6-(2-methyl-4-tetrahydrofurylbenzoyl)-9H-indazole-3-substituted]-1-(O-acetonitrile) Ethyl ketone-1-[9-ethyl-6-(2-methyl-5-tetrahydropyranylphenyl)-9H-indazole-3-substituted]-1-( O-Ethyl hydrazide), Ethyl ketone-1-[9-ethyl-6-(2-methyl-5-tetrahydrofuranylphenyl)-9H-indazole-3-substituted]-1- (O-Ethylhydrazine), Ethyl Ketone-1-[9-Ethyl-6-(2-methyl-4-tetrahydrofurylmethoxyphenyl)-]H-indazole-3-Substituent ]-1-(O-acetamidoxime), ketone-1-[9-ethyl-6-(2-methyl-4-tetrahydropyranylmethoxy) Phenylhydrazinyl)-9H-indazole-3-substituted]-1-(O-acetamidopurine), eththone-1-[9-ethyl-6-(2-methyl-5-tetrahydrofuran) Methoxy phenyl fluorenyl)-9H-carbazole-3-substituted]-1-(O-ethyl fluorenyl), ethane ketone-1-[9-ethyl-6-(2-methyl -5-tetrahydropyranylmethoxyphenylhydrazino)-9H-carbazole-3-substituent]-1-(O-acetamidopurine), ethane ketone-1-{9-ethyl- 6-[2-Methyl-4-(2,2-dimethyl-1,3-dioxolanyl)benzoyl]-9H-indazole-3-substituted}-1-(O -Ethyl hydrazide), Ethyl ketone-1-{9-ethyl-6-[2-methyl-4-(2,2-dimethyl-1,3-dioxolanyl) A a compound such as oxyphenylhydrazino]-9H-indazole-3-substituted group-1-(O-ethinyl) or a combination of the above compounds.

Preferably, the O-indenyl ruthenium compound may be 1-[4-(phenylthio)phenyl]-octane-1,2-dione-2-(O-phenylhydrazinium), which Can be manufactured by Ciba Specialty Chemicals Co., Ltd. And the model number is OXE-01; 1-[9-ethyl-6-(2-methylbenzylidene)-9H-indazole-3-substituted]-ethanone-1-(O- Ethyl hydrazine), which can be manufactured by Ciba Specialty Chemicals Co., Ltd. and model number OXE-02; Ethyl ketone-1-[9-ethyl-6-(2-methyl-4-tetrahydrofuran Oxyphenyl fluorenyl)-9H-carbazole-3-substituted]-1-(O-ethenyl hydrazine); ethane ketone-1-{9-ethyl-6-[2-methyl-4 -(2,2-dimethyl-1,3-dioxolanyl)methoxybenzoinyl]-9H-indazole-3-substituted}-1-(O-ethylindenyl) Or any combination of the above compounds. The O-indenyl ruthenium compound may be used singly or in combination of plural kinds.

Specific examples of the above triazabenzene compound may include, but are not limited to, a vinyl-halomethyl-s-triazabenzene compound, and a 2-(naphtho-1-substituted)-4,6-bis-halogen group. a compound such as a methyl-s-triazabenzene compound, a 4-(p-aminophenyl)-2,6-di-halomethyl-s-triazabenzene compound, or any combination of the above compounds .

Specific examples of the aforementioned vinyl-halomethyl-s-triazabenzene compound may include, but are not limited to, 2,4-bis(trichloromethyl)-6-p-methoxystyryl-s-three. Azabenzene, 2,4-bis(trichloromethyl)-3-(1-p-dimethylaminophenyl-1,3-butadienyl)-s-triazabenzene or 2- A compound such as trichloromethyl-3-amino-6-p-methoxystyryl-s-triazabenzene or the like, or any combination of the above compounds.

Specific examples of the aforementioned 2-(naphtho-1-substituted)-4,6-bis-halomethyl-s-triazabenzene compound may include, but are not limited to, 2-(naphtho-1-substituted) -4,6-bis-trichloromethyl-s-triazabenzene, 2-(4-methoxy-naphtho-1-substituted)-4,6-bis-trichloromethyl-s- Triazabenzene, 2-(4-ethoxy-naphtho-1-substituted)-4,6-bis-trichloromethyl-s-triazabenzene, 2-(4-butoxy- Naphtho-1-substituted)-4,6-bis-trichloromethyl-s-triazabenzene, 2-[4-(2-methoxyethyl)-naphtho-1-yl] -4,6-bis-trichloromethyl-s-triazabenzene, 2-[4-(2-ethoxyethyl)-naphtho-1-yl]-4,6-bis-three Chloromethyl-s-triazabenzene, 2-[4-(2-butoxyethyl)-naphthyl-1-substituted]-4,6-bis-trichloromethyl-s-triazole Heterobenzene, 2-(2-methoxy-naphtho-1-substituted)-4,6-bis-trichloromethyl-s-triazabenzene, 2-(6-methoxy-5- Methyl-naphtho-2-substituted)-4,6-bis-trichloromethyl-s-triazabenzene, 2-(6-methoxy-naphtho-2-substituted)- 4,6-bis-trichloromethyl-s-triazabenzene, 2-(5-methoxy-naphtho-1-substituted)-4,6-bis-trichloromethyl-s-three Azabenzene, 2-(4,7-dimethoxy-naphtho-1-substituted)-4,6-bis-trichloromethyl-s-triazabenzene, 2-(6-ethoxy -naphthyl-2-substituted)-4,6-bis-trichloromethyl-s-triazabenzene or 2-(4,5-dimethoxy-naphthyl-1-substituted)- A compound such as 4,6-bis-trichloromethyl-s-triazabenzene or the like, or any combination of the above compounds.

Specific examples of the aforementioned 4-(p-aminophenyl)-2,6-di-halomethyl-s-triazabenzene compound may include, but are not limited to, 4-[p-N,N-di (B Oxycarbonylmethyl)aminophenyl]-2,6-bis(trichloromethyl)-s-triazabenzene, 4-[o-methyl-p-N,N-di(ethoxy) Carbonylmethyl)aminophenyl]-2,6-bis(trichloromethyl)-s-triazabenzene, 4-[p-N,N-di(chloroethyl)aminophenyl]- 2,6-bis(trichloromethyl)-s-triazabenzene, 4-[o-methyl-p-N,N-di(chloroethyl)aminophenyl]-2,6-di (trichloromethyl)-s-triazabenzene, 4-(p-N-chloroethylaminophenyl)-2,6-di(trichloromethyl)-s-triazabenzene, 4 -(p-N-ethoxycarbonylmethylaminophenyl)-2,6-bis(trichloromethyl)-s-triazabenzene, 4-[p-N,N-di(phenyl) Aminophenyl]-2,6-bis(trichloromethyl)-s-triazabenzene, 4-(p-N-chloroethylcarbonylaminophenyl)-2,6-di(three Chloromethyl)-s-triazabenzene, 4-[p-N-(p-methoxyphenyl)carbonylaminophenyl]-2,6-di(trichloromethyl)-s-three Azabenzene, 4-[m-N,N-bis(ethoxycarbonylmethyl)aminophenyl]-2,6-di(trichloromethyl)-s-triazabenzene, 4-[ m-bromo-p-N,N-bis(ethoxycarbonylmethyl)amine -2,6-bis(trichloromethyl)-s-triazabenzene, 4-[m-chloro-p-N,N-di(ethoxycarbonylmethyl)aminophenyl]- 2,6-bis(trichloromethyl)-s-triazabenzene, 4-[m-fluoro-p-N,N-bis(ethoxycarbonylmethyl)aminophenyl]-2,6 - bis(trichloromethyl)-s-triazabenzene, 4-[o-bromo-p-N,N-bis(ethoxycarbonylmethyl)aminophenyl]-2,6-di ( Trichloromethyl)-s-triazabenzene, 4-[o-chloro-p-N,N-bis(ethoxycarbonylmethyl)aminophenyl]-2,6-di(trichloromethane) -s-triazabenzene, 4-[o-fluoro-p-N,N-bis(ethoxycarbonylmethyl)aminophenyl]-2,6-di(trichloromethyl)- S-triazabenzene, 4-[o-bromo-p-N,N-bis(chloroethyl)aminophenyl]-2,6-di(trichloromethyl)-s-triazabenzene 4-[o-chloro-p-N,N-bis(chloroethyl)aminophenyl]-2,6-di(trichloromethyl)-s-triazabenzene, 4-[o- Fluorine-p-N,N-di(chloroethyl)amine Phenyl]-2,6-bis(trichloromethyl)-s-triazabenzene, 4-[m-bromo-p-N,N-di(chloroethyl)aminophenyl]-2, 6-bis(trichloromethyl)-s-triazabenzene, 4-[m-chloro-p-N,N-bis(chloroethyl)aminophenyl]-2,6-di(trichloro) Methyl)-s-triazabenzene, 4-[m-fluoro-p-N,N-bis(chloroethyl)aminophenyl]-2,6-di(trichloromethyl)-s- Triazabenzene, 4-(m-bromo-p-N-ethoxycarbonylmethylaminophenyl)-2,6-bis(trichloromethyl)-s-triazabenzene, 4-( m-chloro-p-N-ethoxycarbonylmethylaminophenyl)-2,6-bis(trichloromethyl)-s-triazabenzene, 4-(m-fluoro-p-N- Ethoxycarbonylmethylaminophenyl)-2,6-bis(trichloromethyl)-s-triazabenzene, 4-(o-bromo-p-N-ethoxycarbonylmethylamino group Phenyl)-2,6-bis(trichloromethyl)-s-triazabenzene, 4-(o-chloro-p-N-ethoxycarbonylmethylaminophenyl)-2,6- Bis(trichloromethyl)-s-triazabenzene, 4-(o-fluoro-p-N-ethoxycarbonylmethylaminophenyl)-2,6-di(trichloromethyl)- S-triazabenzene, 4-(m-bromo-p-N-chloroethylaminophenyl)-2,6-di(trichloromethyl)-s-triazabenzene, 4-(between -chloro-p-N-chloroethylaminophenyl)-2,6-bis(trichloromethyl)-s-triazole Benzene, 4-(m-fluoro-p-N-chloroethylaminophenyl)-2,6-bis(trichloromethyl)-s-triazabenzene, 4-(o-bromo-pair -N-chloroethylaminophenyl)-2,6-bis(trichloromethyl)-s-triazabenzene, 4-(o-chloro-p-N-chloroethylaminophenyl) -2,6-bis(trichloromethyl)-s-triazabenzene, 4-(o-fluoro-p-N-chloroethylaminophenyl)-2,6-di(trichloromethyl) )-s-triazabenzene or 2,4-bis(trichloromethyl)-6-{3-bromo-4-[N,N-bis(ethoxycarbonylmethyl)amino]phenyl} a compound of -1,3,5-triazabenzene or the like, or any combination of the above compounds.

The above triazabenzene compound may preferably be 4-[m-bromo-p-N,N-bis(ethoxycarbonylmethyl)aminophenyl]-2,6-di(trichloromethyl)- S-triazabenzene, 2,4-bis(trichloromethyl)-6-p-methoxystyryl-s-triazabenzene or a combination of the above compounds. The triazabenzene compound may be used singly or in combination of plural kinds.

Specific examples of the above-mentioned acetophenone compound may include, but are not limited to, p-dimethylacetonone, α,α'-dimethoxyoxyazopropenone, 2,2'-dimethyl-2 -Phenylacetophenone, p-methoxyacetophenone, 2-benzyl-2-N,N-dimethylamine-1-(4-morpholinophenyl)-1-butanone or Combination of 2-methyl-1-(4-methylthiophenyl)-2-morpholino-1-propanone Or any combination of the above compounds. The acetophenone compound is preferably 2-methyl-1-[4-(methylthio)phenyl]-2-morpholine-1-propanone, 2-benzyl-2-N,N - dimethylamine-1-(4-morpholinophenyl)-1-butanone. The above-mentioned acetophenone compounds may be used singly or in combination of plural kinds.

Specific examples of the above diimidazole compound may include, but are not limited to, 2,2'-bis(o-chlorophenyl)-4,4',5,5'-tetraphenyldiimidazole, 2,2'-bis (ortho) -fluorophenyl)-4,4',5,5'-tetraphenyldiimidazole, 2,2'-bis(o-methylphenyl)-4,4',5,5'-tetraphenyl Diimidazole, 2,2'-bis(o-methoxyphenyl)-4,4',5,5'-tetraphenyldiimidazole, 2,2'-bis(o-ethylphenyl)- 4,4',5,5'-tetraphenyldiimidazole, 2,2'-bis(p-methoxyphenyl)-4,4',5,5'-tetraphenyldiimidazole, 2, 2'-bis(2,2',4,4'-tetramethoxyphenyl)-4,4',5,5'-tetraphenyldiimidazole, 2,2'-bis(2-chlorobenzene -4,4',5,5'-tetraphenyldiimidazole or 2,2'-bis(2,4-dichlorophenyl)-4,4',5,5'-tetraphenyl a compound such as imidazole or the like, or any combination of the above compounds. The above diimidazole compounds may be used singly or in combination of plural kinds. The diimidazole compound is preferably 2,2'-bis(2,4-dichlorophenyl)-4,4',5,5'-tetraphenyldiimidazole.

Specific examples of the above benzophenone compound may include thioxanthone, 2,4-diethylthioxanthone, thioxanthone-4-oxime, benzophenone, and 4,4'-bis(dimethylamine). A compound such as benzophenone or 4,4'-bis(diethylamine)benzophenone, or any combination of the above compounds. The benzophenone compound may be used singly or in combination of plural kinds. The benzophenone compound is preferably 4,4'-bis(diethylamine)benzophenone.

Specific examples of the above α-diketone compound may include, but are not limited to, benzoin or ethenyl.

Specific examples of the above ketol compound may include, but are not limited to, benzoin.

Specific examples of the ketol ether compound may include, but are not limited to, a compound such as benzoin ketone methyl ether, benzophenone ethyl ether or diphenylethanol ketone isopropyl ether, or any combination of the above compounds.

Specific examples of the above phosphonium phosphine oxide may include, but are not limited to, 2,4,6-trimethyl A compound such as phenylindole diphenylphosphine oxide or bis-(2,6-dimethoxyphenylhydrazine)-2,4,4-trimethylphenylphosphine oxide, or any combination of the above compounds.

Specific examples of the above quinone compound may include a compound such as hydrazine or 1,4-naphthoquinone or the like, or any combination of the above compounds.

Specific examples of the halogen-containing compound may include a compound such as phenylhydrazine methyl chloride, tribromomethylphenylhydrazine or tris(trichloromethyl)-s-triazabenzene, or any combination of the above compounds.

Specific examples of the above peroxide may include, but are not limited to, a compound such as di-tert-butyl peroxide.

Preferably, the photoinitiator (C-2) may be 1-[9-ethyl-6-(2-methylbenzhydryl)-9H-indazole-3-substituted]-ethane Keto-1-(O-ethylindenyl), 1-[4-(phenylthio)phenyl]-octane-1,2-dione-2-(O-phenylhydrazinium), 2 -Methyl-1-(4-methylthiophenyl)-2-morpholino-1-propanone or any combination of the above.

The photoinitiator (C) is used in an amount of 5 parts by weight to 50 parts by weight, preferably 8 parts by weight to 45 parts by weight, based on 100 parts by weight of the alkali-soluble resin (A), and more preferably 10 parts by weight to 40 parts by weight.

The solvent (D) of the present invention can dissolve the above-mentioned alkali-soluble resin (A), the compound (B) having an ethylenically unsaturated group, and the photoinitiator (C), but not with the black pigment (E) described later. The decane compound (F) produces a reaction and preferably has a suitable volatility.

Specific examples of the solvent (D) may include, but are not limited to, an alkyl glycol monoalkyl ether compound, an alkyl glycol monoalkyl ether acetate compound, a diethylene glycol alkyl ether, other ether compounds, a ketone compound, An alkyl lactate compound, another ester compound, an aromatic hydrocarbon compound, a carboxylic acid amine compound, or any combination of the above compounds. The above solvent (D) may be used singly or in combination of plural kinds.

Specific examples of the aforementioned alkyl glycol monoalkyl ether compound may include, but are not limited to, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, diethylene glycol monoethyl ether, diethylene glycol mono-n-propyl ether, Diethylene glycol mono-n-butyl ether, triethylene glycol monomethyl ether, triethylene glycol monoethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol mono-n-propyl ether a compound such as dipropylene glycol mono-n-butyl ether, tripropylene glycol monomethyl ether or tripropylene glycol monoethyl ether, or any combination of the above compounds.

Specific examples of the alkyl glycol monoalkyl ether acetate compound may include, but are not limited to, compounds such as ethylene glycol methyl ether acetate, ethylene glycol ethyl ether acetate, propylene glycol methyl ether acetate or propylene glycol diethyl ether acetate, or the like. Any combination of compounds.

Specific examples of the diethylene glycol alkyl ether may include, but are not limited to, compounds such as diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether or diethylene glycol diethyl ether, or any combination of the above compounds.

Specific examples of the above other ether compound may include, but are not limited to, a compound such as tetrahydrofuran.

Specific examples of the ketone compound may include, but are not limited to, a compound such as methyl ethyl ketone, cyclohexanone, 2-heptanone, 3-heptanone or diacetone alcohol, or any combination of the above compounds.

Specific examples of the lactide alkyl ester compound may include, but are not limited to, a compound such as methyl lactate or ethyl lactate, or any combination of the above compounds.

Specific examples of the above other ester compounds may include, but are not limited to, methyl 2-hydroxy-2-methylpropanoate, ethyl 2-hydroxy-2-methylpropionate, methyl 3-methoxypropionate, and 3 -ethyl methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl ethoxyacetate, ethyl hydroxyacetate, 2-hydroxy-3-methylbutyl Methyl ester, 3-methyl-3-methoxybutyl acetate, 3-methyl-3-methoxybutyl propionate, ethyl acetate, n-propyl acetate, isopropyl acetate, acetic acid N-butyl ester, isobutyl acetate, n-amyl acetate, isoamyl acetate, n-butyl propionate, ethyl butyrate, n-propyl butyrate, isopropyl butyrate, n-butyl butyrate, pyruvic acid a compound such as methyl ester, ethyl pyruvate, n-propyl pyruvate, methyl ethyl acetate, ethyl acetate or ethyl 2-oxybutyrate, or any combination of the above.

Specific examples of the aromatic hydrocarbon compound may include, but are not limited to, a compound such as toluene or xylene, or any combination of the above compounds.

Specific examples of the carboxylic acid amine compound may be a compound such as N-methylpyrrolidone, N,N-dimethylformamide or N,N-dimethylacetamide, or any combination of the above compounds.

Preferably, the solvent (D) may be propylene glycol methyl ether acetate or ethyl 3-ethoxypropionate.

The solvent (D) is used in an amount of 300 parts by weight to 3000 parts by weight, preferably 350 parts by weight to 2500 parts by weight, and more preferably 400 parts by weight, based on 100 parts by weight of the alkali-soluble resin (A). Up to 2000 parts by weight.

The black pigment (E) of the present invention is preferably a black pigment having heat resistance, light resistance and solvent resistance.

Specific examples of the black pigment (E) may include, but are not limited to, black organic pigments such as perylene black, cyanine black, or aniline black; red, blue, and green Among the pigments such as purple, yellow, cyanine or magenta, two or more pigments are selected for mixing to form a black-colored mixed organic pigment; carbon black, chromium oxide A light-shielding material such as iron oxide, titanium black or graphite.

Specific examples of the above carbon black may include, but are not limited to, C.I. Pigment black 7, or a product manufactured by Mitsubishi Chemical Corporation, and the model number is MA100, MA230, MA8, #970, #1000, #2350 or #2650. The black pigment (E) may be used singly or in combination of plural kinds.

Preferably, the black pigment (E) may be carbon black or a product of the aforementioned model MA100 or MA230.

The black pigment (E) is used in an amount of 50 parts by weight to 500 parts by weight, preferably 60 parts by weight to 450 parts by weight based on 100 parts by weight of the alkali-soluble resin (A). Parts, and more preferably from 70 parts by weight to 400 parts by weight.

The decane compound (F) of the present invention contains a first decane compound (F-1).

The first decane compound (F-1) according to the present invention is mainly a ruthenium atom bonded to a hydrolyzable group by an organic functional group having an unsaturated group bonded to a divalent organic group having a urea bond, and there is no particular The limit is preferably a monomer. The organic functional group having an unsaturated group may, for example, be a vinyl group, an acryl group or a methacryl group, and more preferably an acryl group or a methacryl group. The hydrolyzable group bonded to the ruthenium atom may, for example, be an alkoxy group such as a methoxy group, an ethoxy group, a propoxy group or a butoxy group, a halogen atom such as chlorine or bromine, or an ethoxy group. The alkoxy group is more preferably an alkoxy group having 1 to 4 carbon atoms, and particularly preferably a methoxy group or an ethoxy group.

The structure in which the organic functional group having an unsaturated group and the divalent organic group having a urea bond are bonded is preferably one represented by the following formula (FI):

Z ₁ represents an acryl group or a (meth)acryl group; Z ₂ represents a hydrogen atom, or may be interposed between a hetero atom selected by an oxygen atom, a sulfur atom, a nitrogen atom or a monovalent hydrocarbon group which may have a substituent of a carbonyl carbon; L represents a divalent hydrocarbon group which may have a substituent selected by an oxygen atom, a sulfur atom, a nitrogen atom or a carbonyl carbon; and W represents an intermediate A divalent hydrocarbon group which may have a substituent selected from a hetero atom selected by an oxygen atom, a sulfur atom or a nitrogen atom or a carbonyl carbon.

In the above structure, the substituent in Z ₂ , L, W is, for example, a halogen atom, an alkyl group, a perfluoroalkyl group, a polyether group, a perfluoropolyether group, a hydrolyzable alkyl group, a (meth) propylene group, One type selected from the group consisting of an epoxy group, an amine group, and a fluorenyl group is preferably an alkyl group, a hydrolyzable alkyl group or a (meth) propylene group.

The monovalent hydrocarbon group of Z ₂ is preferably a carbon number of 1 to 20, particularly preferably 1 to 10, and examples thereof include an alkyl group, an alkenyl group, an aryl group, and a cycloalkyl group. Further, the divalent hydrocarbon group of L and W is preferably a carbon number of 1 to 20, particularly preferably 1 to 10, and examples thereof include an alkyl group and an aryl group.

A preferred specific example of the first decane compound (F-1) may be a structure represented by the following formulas (1) to (3):

In the formula (1), Q represents a hydrolyzable group, Z ₃ independently represents an unsubstituted or substituted alkyl group having 1 to 4 carbon atoms, s represents an integer of 1 to 3; and M represents an unsubstituted or substituted carbon atom. a alkyl group of 1 to 6, Z ₄ represents a hydrogen atom, or an unsubstituted or substituted alkyl group having 1 to 8 carbon atoms, and Z ₅ represents a group of the structure represented by the following formula (i) or formula (ii):

Wherein Z ₆ and Z ₇ each independently represent a hydrogen atom or a methyl group, and t represents 1 to 4;

In the formula (2), Q represents a hydrolyzable group, Z ₃ independently represents an unsubstituted or substituted alkyl group having 1 to 4 carbon atoms, s represents an integer of 1 to 3; and M represents an unsubstituted or substituted carbon atom. Any of Z ₈ and Z ₉ represents a group of the structure represented by the above formula (i) or (ii), and the other represents a structure represented by the above formula (i) or (ii). a group, a hydrogen atom, or an unsubstituted or substituted alkyl group having 1 to 8 carbon atoms;

In the formula (3), Q independently represents a hydrolyzable group, Z ₃ independently represents an unsubstituted or substituted alkyl group having 1 to 4 carbon atoms, s represents an integer of 1 to 3; and M represents an unsubstituted or substituted carbon. The alkyl group having an atomic number of 1 to 6 and Z ₁₀ represents a group of the structure represented by the above formula (i) or formula (ii).

In the above formulae (1) to (3), Q represents a hydrolyzable group, and examples thereof include alkoxy groups such as a methoxy group, an ethoxy group, a propoxy group, and a butoxy group; and a halogen atom such as chlorine or bromine; The oxy group or the like is preferably an alkoxy group, more preferably an alkoxy group having 1 to 4 carbon atoms, particularly preferably a methoxy group or an ethoxy group. Further, Z ₃ independently represents an unsubstituted or substituted alkyl group having 1 to 4 carbon atoms, and specific examples thereof include a methyl group, an ethyl group, a n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group and the like. s represents an integer of 1 to 3, preferably 2 or 3.

Z ₄ in the above formula (1) independently represents a hydrogen atom, an unsubstituted or substituted alkyl group having 1 to 8 carbon atoms, and specifically, a hydrogen atom, a methyl group, an ethyl group, a propyl group, an isopropyl group, or the like may be exemplified. Butyl, isobutyl, tert-butyl, pentyl, hexyl, cyclohexyl, octyl and the like.

Further, in the above formulae (1) to (3), M is, for example, a methylene group, an ethyl group, a propyl group, a 1-methyl-propyl group, a 2-methyl-propyl group, a 3-methyl group. - propyl, butyl, etc., except as defined by the examples herein.

Specific examples of the decane compound having an unsaturated group bonded to urea in one molecule of the present invention are represented by the following formulas (4) to (12), wherein Me represents a methyl group.

Further, a compound having a methoxy group of the above formula as an ethoxy group can also be exemplified in the same manner.

The first decane compound (F-1) of the present invention can be obtained by reacting a decane compound containing a primary amine group and/or a secondary amine group and a hydrolyzable group with an isocyanate compound having a photopolymerizable group.

In the production of the first decane compound (F-1) of the present invention, a solvent may be used as needed, and the solvent is not particularly limited as long as it is not reactive with the amino decane and the isocyanate compound of the raw material, and specifically, specifically, An aliphatic hydrocarbon solvent such as pentane, hexane, heptane or decane; an ether solvent such as diethyl ether, tetrahydrofuran or 1,4-dioxane; formamide or dimethylformamide; A guanamine solvent such as N-methylpyrrolidone or an aromatic hydrocarbon solvent such as benzene, toluene or xylene.

When the first decane compound (F-1) of the present invention is produced, the reaction is exothermic, and if it is unfavorable high temperature, a side reaction may occur. Therefore, at the time of production, the reaction temperature is preferably from -10 to 150 ° C, particularly preferably from 0 to 100 ° C, more preferably from 5 to 50 ° C. When the temperature is lower than -10 °C, in addition to the slower reaction rate, the productivity will be lowered, and special manufacturing equipment must be used to maintain the extremely low temperature, which is not in line with reality. On the other hand, when it is higher than 150 ° C, there is a side reaction such as a polymerization reaction from a polymerizable functional group.

Reaction time required for the production of the first decane compound (F-1) of the present invention The temperature is managed by the exothermic reaction as described above, and the exothermic reaction is completed, and is not particularly limited, but is preferably from 10 minutes to 24 hours, more preferably from about 1 hour to 10 hours.

The decane compound containing a primary amine group and/or a secondary amine group and a hydrolyzable group as a raw material required for the production of the first decane compound (F-1) of the present invention is not particularly limited, and specifically, A-aminomethyltrimethoxydecane, α-aminomethylmethyldimethoxydecane, α-aminomethyldimethylmethoxydecane, α-aminomethyltriethoxy Decane, α-aminomethylmethyldiethoxydecane, α-aminomethyldimethylethoxydecane, γ-aminopropyltrimethoxydecane, γ-aminopropylmethyldi Methoxy decane, γ-aminopropyl dimethyl methoxy decane, γ-aminopropyl triethoxy decane, γ-aminopropyl methyl diethoxy decane, γ-amino propyl Dimethyl ethoxy decane, N-2 (aminoethyl) α-aminomethyl trimethoxy decane, N-2 (aminoethyl) α-aminomethyl methyl dimethoxy Decane, N-2 (aminoethyl) α-aminomethyl dimethyl methoxy decane, N-2 (aminoethyl) α-aminomethyl triethoxy decane, N-2 ( Aminoethyl)α-aminomethylmethyldiethoxydecane, N-2(aminoethyl)α-aminomethyldimethylethoxy Decane, bis-(trimethoxydecylpropyl)amine, bis-(methyldimethoxydecylpropyl)amine, bis-(dimethylmethoxydecylpropyl)amine, bis-( Triethoxy(indolylpropyl)amine, bis-(methyldiethoxydecylpropyl)amine, bis-(dimethylethoxydecylpropyl)amine, and the like.

The isocyanate compound having a photopolymerizable group as a raw material required for the production of the first decane compound (F-1) of the present invention is not particularly limited as long as it has the above-mentioned functional group, and is commercially available as a readily available one. (Meth) propylene oxiranyl ethyl isocyanate, ethylene glycol-isocyanatoethyl ether mono (meth) acrylate, bis-1,1-((meth) propylene methoxymethyl Ethyl isocyanate and the like.

When the first decane compound (F-1) of the present invention is produced, the ratio of the decane compound containing a primary amine group and/or a secondary amine group and a hydrolyzable group to an isocyanate compound having a photopolymerizable group is not particularly Limited, but from the point of reactivity, productivity It is preferable to have photopolymerizability in a range of 0.5 to 3 moles, particularly 0.8 to 2.5 moles, for 1 mole of a decane compound containing a primary amine group and/or a secondary amine group and a hydrolyzable group. A base isocyanate compound. When the amount of the isocyanate compound having a photopolymerizable group is too small, a decane compound containing a primary amino group and/or a secondary amine group and a hydrolyzable group remains in a large amount, and although it does not affect the physical properties of decane, In addition to the decrease in purity, disadvantages such as lack of productivity are also caused. On the other hand, if there are too many, they will be polymerized and gelled.

The first decane compound (F-1) of the present invention is obtained by reacting an amine group with an isocyanate group to form a urea bond. Further, the decane compound thus obtained is suitably used as a decane coupling agent.

The first decane compound (F-1) is used in an amount of 3 parts by weight to 30 parts by weight, preferably 4 parts by weight to 25 parts by weight, based on 100 parts by weight of the alkali-soluble resin (A), and more preferably It is preferably from 5 parts by weight to 20 parts by weight.

When the first decane compound (F-1) is not used, the black matrix formed of the photosensitive resin composition has a defect that the linearity of the high-definition pattern is poor.

When the amount of the first decane compound (F-1) used in the present invention is in the above range, the black matrix formed of the photosensitive resin composition has an advantage that the linearity of the high-definition pattern is good.

The decane compound (F) according to the present invention may further comprise a second decane compound (F-2) having a structure represented by the formula (F-II):

In the formula (F-II), T ₁ represents an alkylene group having 1 to 6 carbon atoms; and T ₂ represents a methyl group, an ethyl group or a propyl group.

A specific example of the second decane compound (F-2) may be tris(trimethoxyformamidine) Alkylmethyl)isocyanurate, tris(triethoxycarbamidylmethyl)isocyanurate, tris(2-trimethoxyformamidoethyl)isocyanurate, three ( 2-triethoxymethane alkylethyl)isocyanurate, [bis(2-trimethoxycarbamidylethyl)-(3-triethoxycarbamidylpropyl)]isocyanurate Acid ester, [trimethoxyformamylmethyl-(2-trimethoxycarbamidylethyl)-(3-trimethoxycarbamidylpropyl)]isocyanurate, tris(3-trimethyl) Oxidylalkylpropyl)isocyanurate (structure represented by the following formula (F-II-1)), tris(3-triethoxydecylpropyl)isocyanurate (the following formula) (structure represented by (F-II-2)) or tris(3-tripropoxydecylpropyl)isocyanurate (structure represented by the following formula (F-II-3)).

The second decane compound (F-2) is used in an amount of 1 part by weight to 10 parts by weight, preferably 1 part by weight to 8 parts by weight, based on 100 parts by weight of the alkali-soluble resin (A), and more preferably It is preferably from 1 part by weight to 5 parts by weight.

When a second decane compound (F-2) is used, the photosensitive resin composition The formed black matrix has the advantage of good linearity of a high-definition pattern.

The decane compound (F) is used in an amount of 4 parts by weight to 40 parts by weight, preferably 5 parts by weight to 33 parts by weight, and more preferably 6 parts by weight, based on 100 parts by weight of the alkali-soluble resin (A). Parts to 25 parts by weight.

The photosensitive resin composition for a black matrix of the present invention can be further selectively added with an additive (G) without affecting the effects of the present invention. Specific examples of the additive (G) may include a surfactant, a filler, an adhesion promoter, an antioxidant, an anti-aggregation agent, or the like other than the alkali-soluble resin (A), which can increase various properties such as mechanical properties. Things.

Specific examples of the surfactant may include a cationic surfactant, an anionic surfactant, a nonionic surfactant, an amphoteric surfactant, a polyoxyalkylene surfactant, a fluorosurfactant, or the above-mentioned interfacial activity. Any combination of agents.

Specific examples of the surfactant may include, but are not limited to, polyethoxylated alkyl ethers such as polyethoxydodecyl ether, polyethoxylated decyl ether or polyethoxy oleyl ether; Polyethoxylated alkylphenyl ethers such as oxyoctyl phenyl ether or polyethoxylated phenyl ether; polyethylene glycol dilaurate or polyethylene glycol distearate Ethylene glycol diesters; sorbitan fatty acid ester compounds; fatty acid modified polyester compounds; tertiary amine modified polyurethane compounds; or commercially available products. Wherein, the commercially available product may be a product manufactured by Shin-Etsu Chemical Co., Ltd., and its model is KP; a product manufactured by Dow Corning Toray Co., Ltd., and its model number is SF-8427; A product manufactured by Kyoeisha Oil Chemical Industry Co., Ltd., and its model is Polyflow; a product manufactured by Tochem Products Co., Ltd., and its model is F-Top; manufactured by Dainippon Ink Chemical Industry The product is of the type of Megafac; Sumitomo 3M's product, and its model is Fluorade; or the product manufactured by Asahi Glass Co., Ltd., and its model is Asahi Guard or Surflon. The surfactant may be used singly or in combination of plural kinds.

Specific examples of the aforementioned filler may include glass or aluminum or the like.

Specific examples of the adhesion promoter may include vinyltrimethoxydecane, vinyltriethoxydecane, vinyltris(2-methoxyethoxy)decane, and N-(2-aminoethyl). 3-aminopropylmethyldimethoxydecane, N-(2-aminoethyl)-3-aminopropyltrimethoxydecane, 3-aminopropyltriethoxydecane, 3- Glycidoxypropyltrimethoxydecane (commercially available from Shin-Etsu Chemical Co., Ltd., model number KBM-403), 3-glycidoxypropylmethyldiethoxydecane, 2-(3,4 -Epoxycyclohexyl)ethyltrimethoxydecane, 3-chloropropylmethyldimethoxydecane, 3-chloropropyltrimethoxydecane, 3-methylpropoxypropyltrimethoxydecane Or a compound such as 3-mercaptopropyltrimethoxydecane or any combination of the above compounds.

Specific examples of the aforementioned antioxidant may include 2,2-thiobis(4-methyl-6-tert-butylphenol), 2,6-di-tert-butylphenol or any combination of the above compounds.

Specific examples of the anti-agglomerating agent may include a compound such as sodium polyacrylate.

The use of the filler other than the filler, the adhesion promoter, the antioxidant, the anti-aggregation agent or the alkali-soluble resin (A) in the additive (G) based on 100 parts by weight of the alkali-soluble resin (A) The amount is not more than 10 parts by weight, and preferably not more than 6 parts by weight.

The photosensitive resin composition for a black matrix is prepared by using the above-mentioned alkali-soluble resin (A), a compound having an ethylenically unsaturated group (B), a photoinitiator (C), a solvent (D), and a black pigment ( E) and the decane compound (F) are placed in a stirrer and stirred to be uniformly mixed into a solution state, and if necessary, an additive (G) may be added, and evenly mixed, the photosensitivity of the black matrix in a solution state can be obtained. Resin composition.

Next, the preparation method of the photosensitive resin composition for the black matrix is not particularly limited. The black pigment (E) may be directly added to the alkali-soluble resin (A), the compound having an ethylenically unsaturated group (B), the photoinitiator (C), the solvent (D) and the decane compound (F). a photosensitive resin composition which can be dispersed to form the aforementioned solution state Things. Alternatively, a part of the black pigment (E) is first added to a mixture consisting of a part of the alkali-soluble resin (A) and a part of the solvent (D) to form a pigment dispersion. Then, the remaining alkali-soluble resin (A), the compound (B) having an ethylenically unsaturated group, the photoinitiator (C), the remaining solvent (D), the remaining black pigment, and the decane compound (F) are added. To the above-mentioned pigment dispersion liquid, a photosensitive resin composition in a solution state is obtained.

Next, the dispersion step of the above black pigment (E) can be carried out by a mixer such as a beads mill or a roll mill.

The present invention also provides a black matrix formed by the pre-baked treatment, an exposure treatment, a development treatment, and a post-baking treatment of the photosensitive resin composition described above.

The black matrix is obtained by applying the above-mentioned black matrix photosensitive resin composition onto a substrate, and sequentially performing prebaking treatment, exposure treatment, development treatment, and post-baking treatment. When the film thickness of the obtained black matrix is 1 μm, the optical density may be 3.0 or more, preferably 3.2 to 5.5, and more preferably 3.5 to 5.5. The preparation method of the black matrix of the present invention is described in detail below.

First, a photosensitive resin composition for a black matrix in a solution state is uniformly coated on a substrate by a coating method such as spin coating or cast coating to form a coating. membrane. Specific examples of the substrate may include alkali-free glass, soda-lime glass, hard glass (Pyrus glass), quartz glass, and a transparent conductive film attached to the glass described above for a liquid crystal display device or the like; or for solid-state photography A photoelectric conversion device substrate (for example, a germanium substrate) such as a device.

After the coating film is formed, most of the solvent is removed by drying under reduced pressure. Then, the remaining solvent is removed in a pre-bake manner to form a pre-baked film. The conditions for drying under reduced pressure and pre-baking are changed depending on the type and ratio of each component. The drying under reduced pressure is generally carried out at a pressure of less than 200 mmHg for 1 second to 20 seconds, and the pre-bake is heat-treated at 70 ° C to 110 ° C for 1 minute to 15 minutes.

Next, the pre-baked coating film is exposed by a photomask having a specific pattern. Light processing. The light used for the exposure processing may be ultraviolet light such as g line, h line or i line, and the ultraviolet light irradiation device may be a (super) high pressure mercury lamp or a metal halide lamp.

After performing the exposure treatment, the pre-baked coating film after the exposure is immersed in a developing solution of 21 ° C to 25 ° C to remove the unexposed portion of the prebaked coating film, and can be formed on the substrate. Specific pattern.

The developer may be sodium hydroxide, potassium hydroxide, sodium carbonate, sodium hydrogencarbonate, potassium carbonate, potassium hydrogencarbonate, sodium citrate, sodium methyl citrate, ammonia, ethylamine, diethylamine or dimethyl. Basic compounds such as ethanolamine, tetramethylammonium hydroxide, tetraethylamine hydroxide, choline, pyrrole, piperidine or 1,8-diazabicyclo-[5,4,0]-7-undecene . The concentration of the developer is generally from 0.001% by weight to 10% by weight, preferably from 0.005% by weight to 5% by weight, and more preferably from 0.01% by weight to 1% by weight.

After the development treatment, the substrate having the specific pattern is washed with water, and the substrate is air-dried by compressed air or compressed nitrogen. Then, post-baking treatment is performed by a heating device such as a hot plate or an oven to form a black matrix on the substrate. The post-baking treatment temperature is generally from 150 ° C to 250 ° C. When the heating device uses a hot plate, the heating time is 5 minutes to 60 minutes; when the heating device uses an oven, the heating time is 15 minutes to 150 minutes.

The present invention further provides a color filter comprising the aforementioned black matrix.

The color filter of the present invention is prepared by uniformly coating a photosensitive resin composition for a color filter in a solution state by a coating method such as spin coating, cast coating or roll coating. The substrate having the black matrix described above is formed to form a coating film.

After the coating film is formed, most of the solvent is removed by drying under reduced pressure, and the remaining solvent is removed by pre-baking to form a pre-baked coating film. Among them, the conditions under reduced pressure drying and pre-baking are changed depending on the type or ratio of each component. Drying under reduced pressure is generally carried out at a pressure of 0 mmHg to 200 mmHg for 1 second to 60 seconds, and pre-baked at 70 ° C to The coating film was heat treated at 110 ° C for 1 minute to 15 minutes.

Then, the aforementioned prebaked coating film is subjected to exposure treatment in a mask having a specific pattern. The light used for the exposure processing may be ultraviolet light such as g line, h line or i line, and the ultraviolet light irradiation device may be a (super) high pressure mercury lamp or a metal halide lamp.

After performing the exposure treatment, the pre-baked coating film after the exposure is immersed in a developing solution of 21 ° C to 25 ° C to remove the unexposed portion of the prebaked coating film, and can be formed on the substrate. Specific pattern.

After the development treatment, the substrate having the specific pattern is washed with water, and the substrate is air-dried by compressed air or compressed nitrogen. Then, the post-baking treatment is performed by a heating device such as a hot plate or an oven. The conditions of the post-baking treatment are as described above and will not be further described herein. The above steps are repeated to form a pixel layer of red, green, blue or the like on the substrate.

Next, an ITO protective film (vapor deposited film) was formed on the surface of the above-mentioned pixel coloring layer by sputtering in a vacuum environment of 220 ° C to 250 ° C. When necessary, the ITO protective film is etched and wired, and a liquid crystal alignment film (polyimine for liquid crystal alignment film) is applied onto the surface of the ITO protective film to form a color filter having a pixel layer.

The present invention further provides a liquid crystal display element comprising the aforementioned color filter.

The color filter prepared as described above and the substrate provided with a thin film transistor (TFT) are disposed to face each other, and a gap (cell gap) is provided between the two. Then, the color filter is attached to the peripheral portion of the above substrate with an adhesive and the injection hole is left. Next, liquid crystal is injected from the injection hole in the gap between the surface of the substrate and the adhesive, and the injection hole is sealed to form a liquid crystal layer. Thereafter, the polarizing plate is disposed on the other side of the color filter that contacts the liquid crystal layer and the other side of the substrate that contacts the liquid crystal layer, thereby forming a liquid crystal display.

The liquid crystal may be a liquid crystal compound or a liquid crystal composition, and is not particularly limited herein, and any liquid crystal compound and liquid crystal composition may be used.

Further, the liquid crystal alignment film used in the color filter is used to restrict the alignment of the liquid crystal molecules, and is not particularly limited, and any of inorganic substances or organic substances may be used, and the present invention is not limited thereto.

The following embodiments are used to illustrate the application of the present invention, and are not intended to limit the present invention. Those skilled in the art can make various changes without departing from the spirit and scope of the present invention. Retouching.

Preparation of alkali soluble resin (A)

Synthesis Example A-1-1

First, 100 parts by weight of a ruthenium epoxy compound (manufactured by Nippon Steel Chemical Co., Ltd., model ESF-300, and having an epoxy equivalent of 231), 30 parts by weight of acrylic acid, and 0.3 parts by weight of benzyl chloride Triethylammonium, 0.1 part by weight of 2,6-di-t-butyl-p-cresol and 130 parts by weight of propylene glycol methyl ether acetate were added in a continuous addition to a 500-mL four-necked flask. The feed rate of the reactant was controlled at 25 parts by weight/min, and the reaction was carried out at 100 ° C to 110 ° C. After 15 hours of reaction, a pale yellow transparent mixture having a solid concentration of 50% by weight was obtained.

Next, 100 parts by weight of the above pale yellow transparent mixture was added to 25 parts by weight of ethylene glycol ethyl ether acetate, and 6 parts by weight of tetrahydrophthalic anhydride and 13 parts by weight of benzophenone were simultaneously added. Tetracarboxylic acid dianhydride. Then, the reaction is carried out at 110 ° C to 115 ° C. After reacting for 2 hours, a resin A-1-1 having an unsaturated group was obtained, and its acid value was 98.0 mgKOH/g.

Synthesis Example A-1-2

First, 100 parts by weight of a ruthenium epoxy compound (manufactured by Nippon Steel Chemical Co., Ltd., model ESF-300, and having an epoxy equivalent of 231), 30 parts by weight of acrylic acid, and 0.3 parts by weight of benzyl chloride Triethylammonium, 0.1 part by weight of 2,6-di-t-butyl-p-cresol and 130 parts by weight of propylene glycol methyl ether acetate were continuously added to a 500-mL four-necked flask. The feed rate of the reactant is controlled at 25 parts by weight per minute, and The reaction is carried out at 100 ° C to 110 ° C. After 15 hours of reaction, a pale yellow transparent mixture having a solid concentration of 50% by weight was obtained.

Next, 100 parts by weight of the pale yellow transparent mixture obtained above was dissolved in 25 parts by weight of ethylene glycol ethyl ether acetate, and 13 parts by weight of benzophenonetetracarboxylic dianhydride was added. Then, the reaction is carried out at 110 ° C to 115 ° C. After reacting for 2 hours, 6 parts by weight of tetrahydrophthalic anhydride was added, and reacted at 90 ° C to 95 ° C for 4 hours to obtain an unsaturated group-containing resin A-1-2, and its acid value It was 99.0 mgKOH/g.

Synthesis Example A-1-3

First, 400 parts by weight of an epoxy compound (manufactured by Nippon Kayaku Co., Ltd., model number NC-3000, and having an epoxy equivalent of 288), 102 parts by weight of acrylic acid, and 0.3 parts by weight of methoxy group. Phenol (methoxyphenol), 5 parts by weight of triphenylphosphine, and 264 parts by weight of propylene glycol methyl ether acetate were placed in a reaction flask. The reaction was carried out at 95 ° C, and after 9 hours, an intermediate product having an acid value of 2.2 mg KOH / g was obtained. Next, 151 parts by weight of tetrahydrophthalic anhydride was added. Then, by reacting at 95 ° C for 4 hours, a resin A-1-3 having an unsaturated group having an acid value of 102 mgKOH/g and a weight average molecular weight of 3,200 was obtained.

Synthesis Example A-2-1

First, 1 part by weight of 2,2'-azobisisobutyronitrile, 240 parts by weight of propylene glycol methyl ether acetate, 20 parts by weight of methacrylic acid, 15 parts by weight of styrene, and 35 parts by weight of methyl group. Benzyl acrylate, 10 parts by weight of glycerol monomethacrylate, and 20 parts by weight of N-phenyl maleimine were added to a round bottom flask equipped with a stirrer. Then, a condenser was placed on the round bottom flask, and the inside of the round bottom flask was filled with nitrogen. Subsequently, the mixture was slowly stirred and heated to 80 ° C to uniformly mix the respective reactants and carry out a polymerization reaction. After reacting for 4 hours, the temperature was raised to 100 ° C, and 0.5 part by weight of 2,2'-azobisisobutyronitrile was added thereto to carry out a reaction. After the reaction for 1 hour, another alkali-soluble resin A-2-1 was obtained.

Synthesis Example A-2-2

First, 2 parts by weight of 2,2'-azobisisobutyronitrile, 300 parts by weight of dipropylene glycol monomethyl ether, 15 parts by weight of methacrylic acid, 15 parts by weight of ethyl 2-hydroxyacrylate, and 70 weight A portion of benzyl methacrylate was added to a round bottom flask with a stirrer. Then, a condenser was placed on the round bottom flask, and the inside of the round bottom flask was filled with nitrogen. Subsequently, the mixture was slowly stirred and heated to 80 ° C to uniformly mix the respective reactants and carry out a polymerization reaction. After reacting for 3 hours, the temperature was raised to 100 ° C, and 0.5 part by weight of 2,2'-azobisisobutyronitrile was added thereto to carry out a reaction. After the reaction for 1 hour, other alkali-soluble resin A-2-2 was obtained.

Preparation of photosensitive resin composition

The photosensitive resin compositions of Examples 1 to 10 and Comparative Examples 1 to 5 were prepared according to Tables 1 and 2 below.

Example 1: 100 parts by weight of the above-mentioned alkali-soluble resin A-1-1, 10 parts by weight of dipentaerythritol hexaacrylate (hereinafter abbreviated as B-1), and 5 parts by weight of C-1 shown in Table 1 -1 photoinitiator, 50 parts by weight of MA100 (product of Mitsubishi Chemical, hereinafter abbreviated as E-1), 1 part by weight of F-1-1 decane compound as shown in Table 1, and 2 parts by weight of The F-2-1 decane compound shown in Table 1 was added to 300 parts by weight of propylene glycol methyl ether acetate (hereinafter abbreviated as D-1), and the mixture was uniformly stirred by a shaking type stirrer. The photosensitive resin composition of Example 1 was obtained. The obtained photosensitive resin composition was evaluated by the following evaluation method, and the obtained result is shown in Table 1.

In Examples 2 to 10 and Comparative Examples 1 to 5, the same production method as that of the photosensitive resin composition of Example 1 was used, except that Examples 2 to 9 and Comparative Examples 1 to 7 changed the photosensitivity. The type and amount of the raw materials in the resin composition, and the formulations and evaluation results thereof are shown in Table 1 and Table 2, respectively, and are not described herein.

In Table 1 and Table 2:

B-1 dipentaerythritol hexaacrylate

B-2 dipentaerythritol pentaacrylate B-3 ethylene oxide modified dipentaerythritol hexaacrylate

(ethylene oxide(EO)-modified dipentaerythritol hexaacrylate)

C-2-1 1-[9-Ethyl-6-(2-methylbenzhydryl)-9H-indazole-3-substituted]-ethanone-1-(O-ethylindenyl) (Products manufactured by Ciba Specialty Chemicals, model number OXE-02)

C-2-2 1-[4-(phenylthio)phenyl]-octane-1,2-dione-2-(O-phenylhydrazinyl) (product of Ciba Specialty Chemicals, model number OXE-01)

C-2-3 2-methyl-1-(4-methylthiophenyl)-2-morpholino-1-propanone (product of Ciba Specialty Chemicals, model IRGACURE 907)

D-1 propylene glycol monomethyl ether acetate

D-2 3-ethoxypropionate ethyl ester

E-1 MA100 (Mitsubishi Chemical)

E-2 MA230 (Mitsubishi Chemical)

F-1-1 type (4)

F-1-2 type (6)

F-1-3 type (8)

F-1-4 type (10)

F-1-5 type (12)

F-2-1 type (F-II-1)

F-2-2 type (F-II-2)

F-2-3 type (F-II-3)

Evaluation method: linearity of high-definition patterns

The photosensitive resin compositions of the above respective Examples and Comparative Examples were applied by spin coating to a glass substrate having a length and a width of 100 mm. Then, it was dried under reduced pressure at a pressure of about 100 mmHg (mmHg) for about 30 seconds. Next, the above glass substrate was prebaked at 80 ° C for 3 minutes to form a prebaked film having a film thickness of 2.5 μm. Thereafter, using a photomask having a strip pattern of 25 μm [pitch 50 μm], an exposure machine (manufactured by Canon, model: PLA-501F) was used at 300 mJ/cm ² (mJ/cm ² ). The above pre-baked coating film is irradiated with ultraviolet light. After irradiation with ultraviolet light, the prebaked coating film was immersed in a developing solution at 23 ° C for 2 minutes. Thereafter, the prebaked coating film was washed with pure water, and the prebaked coating film was post-baked at 200 ° C for 80 minutes to form a photosensitive resin layer having a film thickness of 2.0 μm on the glass substrate.

The strip pattern formed by the above method was observed by an optical microscope, and the high definition pattern linearity was evaluated in accordance with the following criteria.

*: 95% or more of the high-definition pattern has good linearity.

◎: 90% or more, and a high-definition pattern of less than 95% has good linearity.

○: 80% or more, and a high-definition pattern of less than 90% has good linearity.

Δ: 70% or more, and the high-definition pattern of less than 80% has good linearity.

×: The linearity of the high-definition pattern of less than 70% is good.

The above-described embodiments are merely illustrative of the principles and effects of the invention, and are not intended to limit the invention. Modifications and variations of the embodiments described above will be apparent to those skilled in the art without departing from the spirit of the invention. The scope of the invention should be as set forth in the appended claims.

Claims (15)

A photosensitive resin composition for a black matrix comprising: an alkali-soluble resin (A); a compound (B) having an ethylenically unsaturated group; a photoinitiator (C); a solvent (D); and a black pigment (E) And a decane compound (F); wherein: the alkali-soluble resin (A) comprises a resin (A-1) having an unsaturated group, wherein the unsaturated group-containing resin (A-1) is polymerized from a mixture Forming, and the mixture comprises an epoxy compound (a-1-1) having at least two epoxy groups and a compound (a-1-2) having at least one carboxylic acid group and at least one ethylenically unsaturated group; The decane compound (F) comprises a first decane compound (F-1), wherein the first decane compound (F-1) has at least one structure represented by the following formula (FI): Z ₁ represents an acryl group or a (meth)acryl group; Z ₂ represents a hydrogen atom, or may be interposed between a hetero atom selected by an oxygen atom, a sulfur atom, a nitrogen atom or a monovalent hydrocarbon group which may have a substituent of a carbonyl carbon; L represents a divalent hydrocarbon group which may have a substituent selected by an oxygen atom, a sulfur atom, a nitrogen atom or a carbonyl carbon; and W represents an intermediate A divalent hydrocarbon group which may have a substituent selected from a hetero atom selected by an oxygen atom, a sulfur atom or a nitrogen atom or a carbonyl carbon. The photosensitive resin composition for a black matrix according to claim 1, wherein the epoxy compound (a-1-1) having at least two epoxy groups contains a compound having a structure represented by the following formula (aI) or A compound of the structure represented by the formula (a-II) or a combination of the above compounds: In the formula (aI) and the formula (a-II), A ₁ to A ₄ each independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 5 carbon atoms, an alkoxy group having 1 to 5 carbon atoms, An aryl group having 6 to 12 carbon atoms or an aralkyl group having 6 to 12 carbon atoms; and A ₅ to A ₁₈ each independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 8 carbon atoms or a carbon number of 6 An aromatic group to 15; and the u represents an integer from 0 to 10. The photosensitive resin composition for a black matrix of claim 1 is used in an amount of 30 parts by weight based on 100 parts by weight of the alkali-soluble resin (A), and the amount of the unsaturated group-containing resin (A-1) is 30 parts by weight. To 100 parts by weight; the compound (B) having an ethylenically unsaturated group is used in an amount of 10 parts by weight to 100 parts by weight; and the photoinitiator (C) is used in an amount of 5 parts by weight to 50 parts by weight, The solvent (D) is used in an amount of 300 parts by weight to 3000 parts by weight; the black pigment (E) is used in an amount of 50 parts by weight to 500 parts by weight; the decane compound (F) is used in an amount of 4 parts by weight to 40 parts by weight; and the first having at least one functional group The decane compound (F-1) is used in an amount of from 3 parts by weight to 30 parts by weight. A photosensitive resin composition for a black matrix according to claim 1, wherein the photoinitiator (C) comprises a photoinitiator (C-1) having a structure represented by the formula (CI): Wherein R ₁ , R ₂ , R ₃ , R ₄ , R ₅ , R ₆ , R ₇ and R ₈ are each independently hydrogen, C ₁ -C ₂₀ alkyl, , COR ₁₆ , OR ₁₇ , halogen, NO ₂ or Or R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ , R ₅ and R ₆ , R ₆ and R ₇ or R ₇ and R ₈ are each independently Substituted C ₂ -C ₁₀ alkenyl; or R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ , R ₅ and R ₆ , R ₆ and R ₇ or R ₇ and R ₈ are independently of each other Is -(CH ₂ ) _p -Y-(CH ₂ ) _q -; or R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ , R ₅ and R ₆ , R ₆ and R ₇ or R ₇ And R ₈ are mutually independent However, the condition is at least one of R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ , R ₅ and R ₆ , R ₆ and R ₇ or R ₇ and R _{8 , R 9, R 10, R} 11 and R ₁₂ are independently hydrogen, C ₁ -C ₂₀ alkyl, C ₂₀ alkyl group which is unsubstituted or line ₁ -C one another by one or more of the following radicals: halogen , phenyl, CN, OH, SH, C ₁ -C ₄ -alkoxy, (CO)OH or (CO)O(C ₁ -C ₄ alkyl); or R ₉ , R ₁₀ , R ₁₁ and R ₁₂ independently of each other as an unsubstituted phenyl group or a phenyl group substituted with one or more of the following groups: C ₁ -C ₆ alkyl, halogen, CN, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₉ , R ₁₀ , R ₁₁ and R ₁₂ are, independently of each other, halogen, CN, OR ₁₇ , SR ₁₈ , SOR ₁₈ , SO ₂ R ₁₈ or NR ₁₉ R ₂₀ , wherein the substituents OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ optionally forms a 5- or 6-membered ring with one of the carbon atoms of the naphthyl ring via the groups R ₁₇ , R ₁₈ , R ₁₉ and/or R ₂₀ ; or R ₉ , R ₁₀ , R ₁₁ and R ₁₂ Independent of each other , COR ₁₆ or NO ₂ ; Y series O, S, NR ₂₆ or direct bond; p is an integer 0, 1, 2 or 3; q is an integer 1, 2 or 3; X is CO or direct bond; R ₁₃ is C _{a 1-} C ₂₀ alkyl group which is unsubstituted or substituted with one or more of the following groups: halogen, R ₁₇ , COOR ₁₇ , OR ₁₇ , SR ₁₈ , CONR ₁₉ R ₂₀ , NR ₁₉ R ₂₀ , PO (OC _k H _2k+1 ) ₂ or Or R ₁₃ is a C ₂ -C ₂₀ alkyl group, interspersed with one or more of O, S, SO, SO ₂ , NR ₂₆ or CO, or a C ₂ -C ₁₂ alkenyl group, which has no inter Or a plurality of O, CO or NR ₂₆ , wherein the inter-hetero C ₂ -C ₂₀ alkyl group and the uninterstitial or inter-hetero C ₂ -C ₁₂ alkenyl group are unsubstituted or substituted by one or more halogens Or R ₁₃ is a C ₄ -C ₈ cycloalkenyl group, a C ₂ -C ₁₂ alkynyl group or a C ₃ -C ₁₀ cycloalkyl group having one or more O, S, CO or NR ₂₆ undoped or inter-hetero; or R ₁₃ based phenyl or naphthyl, each of which is unsubstituted or substituted with one or more of the following _{groups: oR 17, SR 18, NR} 19 R 20, _{, COR 16, CN, NO 2} , halogen, C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, interrupted by one or more O, S, CO or NR C ₂₆ of ₂ -C ₂₀ alkyl group; or via their respective C ₃ -C ₁₀ cycloalkyl, or interrupted by one or more O, S, CO or NR ₂₆ of the C ₃ -C ₁₀ cycloalkyl; based integer k 1 to 10; R ₁₄ type hydrogen, C ₃ a -C ₈ cycloalkyl, C ₂ -C ₅ alkenyl, C ₁ -C ₂₀ alkoxy or C ₁ -C ₂₀ alkyl group which is unsubstituted or substituted with one or more of the following groups: halogen, Phenyl, C ₁ -C ₂₀ alkylphenyl or CN; or R ₁₄ -phenyl or naphthyl, each unsubstituted or substituted by one or more of the following groups: C ₁ -C ₆ alkyl, C _1- C ₄ haloalkyl, halogen, CN, OR ₁₇ , SR ₁₈ and/or NR ₁₉ R ₂₀ ; or R ₁₄ C ₃ -C ₂₀ heteroaryl, C ₁ -C ₈ alkoxy, benzyloxy or phenoxy, benzyloxy and phenoxy which is unsubstituted or substituted with one line or more of the following groups: C ₁ -C ₆ alkyl, C ₁ -C ₄ haloalkyl and / or halogen; R ₁₅ lines a C ₆ -C ₂₀ aryl or C ₃ -C ₂₀ heteroaryl group, each of which is unsubstituted or substituted with one or more of the following groups: phenyl, halogen, C ₁ -C ₄ haloalkyl, CN, NO ₂ , OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ , PO(OC _k H _2k+1 ) ₂ , SO-C ₁ -C ₁₀ alkyl, SO ₂ -C ₁ -C ₁₀ alkyl, hetero or one or more O, S or NR the ₂ -C ₂₀ C ₂₆ alkyl group; or each warp substituted C ₁ -C ₂₀ alkyl, C ₂₀ alkyl group which line ₁ -C unsubstituted or substituted by one or more of the following radicals: halogen, COOR ₁₇ , CONR ₁₉ R ₂₀ , phenyl, C ₃ -C ₈ cycloalkyl, C ₃ -C ₂₀ heteroaryl, C ₆ -C ₂₀ aryloxycarbonyl, C ₃ -C ₂₀ heteroaryloxycarbonyl, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₁₅ is hydrogen, C ₂ -C ₁₂ alkenyl, unmixed or heterozygous with one or more O, CO or NR ₂₆ C ₃ -C ₈ cycloalkyl; or R _{a 15} series C ₁ -C ₂₀ alkyl group which is unsubstituted or substituted with one or more of the following groups: halogen, OR ₁₇ , SR ₁₈ , C ₃ -C ₈ cycloalkyl, C ₃ -C ₂₀ heteroaryl a C ₆ -C ₂₀ aryloxycarbonyl group, a C ₃ -C ₂₀ heteroaryloxycarbonyl group, NR ₁₉ R ₂₀ , COOR ₁₇ , CONR ₁₉ R ₂₀ , PO(OC _k H _2k+1 ) ₂ , Or a phenyl group; or the C ₁ -C ₂₀ alkyl group is substituted by a phenyl group which is halogen, C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, OR ₁₇ , SR ₁₈ or NR ₁₉ R _{20 is} substituted; or R ₁₅ is a C ₂ -C ₂₀ alkyl group in which one or more O, SO or SO ₂ are heterogeneous, and the interstitial C ₂ -C ₂₀ alkyl group is unsubstituted or one or more Substituted by: halogen, OR ₁₇ , COOR ₁₇ , CONR ₁₉ R ₂₀ , phenyl or phenyl substituted with OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₁₅ C ₂ -C ₂₀ alkyl fluorenyl or a benzoyl group which is unsubstituted or substituted with one line or more of the following groups: C ₁ -C ₆ alkyl, halogen, phenyl, oR _17, SR ₁₈ or NR ₁₉ R _20; or R ₁₅ lines a naphthylmethyl group or a C ₃ -C ₁₄ heteroarylcarbonyl group which is unsubstituted or substituted with one or more OR ₁₇ ; or an R ₁₅ C ₂ -C ₁₂ alkoxycarbonyl group which is uninterfering or heterozygous One or more O and the inter- or un-doped C ₂ -C ₁₂ alkoxycarbonyl group is unsubstituted or substituted with one or more hydroxyl groups; or the R ₁₅ -based phenoxycarbonyl group is unsubstituted Or substituted by one or more of the following groups: C ₁ -C ₆ alkyl, halogen, C ₁ -C ₄ haloalkyl, Phenyl, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₁₅ based CN, CONR ₁₉ R ₂₀ , NO ₂ , C ₁ -C ₄ haloalkyl, S(O) _m -C ₁ -C ₆ alkyl, S(O) _m -phenyl unsubstituted or substituted with C ₁ -C ₁₂ alkyl or SO ₂ -C ₁ -C ₆ alkyl; or R ₁₅ -based SO ₂ O-phenyl, which is unsubstituted or by C ₁ -C ₁₂ substituted alkyl; or based diphenylphosphino acyl or di (C ₁ -C ₄ alkoxy) - phosphino acyl; m lines 1 or 2; R _'14 R ₁₄ having the targeted Give one of the meanings; R' ₁₅ has one of the meanings given for R ₁₅ ; X ₁ is O, S, SO or SO ₂ ; X ₂ is O, CO, S or direct bond; R ₁₆ a C ₆ -C ₂₀ aryl or C ₃ -C ₂₀ heteroaryl group, each of which is unsubstituted or substituted with one or more of the following groups: phenyl, halogen, C ₁ -C ₄ haloalkyl, CN, _{NO 2, oR 17, SR 18} , NR 19 R 20 or interrupted by one or more O, S or NR C ₂₆ of ₁ -C ₂₀ alkyl group; or each with one or more C ₁ -C ₂₀ alkyl substituted with , the C ₁ -C ₂₀ alkyl group is unsubstituted or substituted with one or more of the following groups: halogen, COOR ₁₇ , CONR ₁₉ R ₂₀ , phenyl, C ₃ -C ₈ cycloalkyl, C ₃ -C ₂₀ heteroaryl, C ₆ -C ₂₀ aryloxycarbonyl, C ₃ -C ₂₀ heteroaryloxycarbonyl, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₁₆ hydrogen, C ₁ -C ₂₀ alkyl, the C ₁ -C ₂₀ alkyl is unsubstituted or via one or Substituted by a plurality of groups: halogen, phenyl, OH, SH, CN, C ₃ -C ₆ alkenyloxy, OCH ₂ CH ₂ CN, OCH ₂ CH ₂ (CO)O (C ₁ -C ₄ alkyl) , O(CO)-(C ₁ -C ₄ alkyl), O(CO)-phenyl, (CO)OH or (CO)O(C ₁ -C ₄ alkyl); or R ₁₆ C ₂ - C ₁₂ alkyl group with one or more O, S or NR _{26 in between} ; or R ₁₆ (CH ₂ CH ₂ O) _n+1 H, (CH ₂ CH ₂ O) _n (CO)-(C ₁ - a C ₈ alkyl group, a C ₂ -C ₁₂ alkenyl group or a C ₃ -C ₈ cycloalkyl group; or R ₁₆ is a phenyl group substituted by SR ₁₈ , wherein the group R ₁₈ represents a bond to the COR ₁₆ group Attached to the direct bond of the phenyl or naphthyl ring of the oxazole moiety; n is 1 to 20; R ₁₇ is hydrogen, phenyl-C ₁ -C ₃ alkyl, C ₁ -C ₂₀ alkyl, It is unsubstituted or substituted with one or more of the following groups: halogen, OH, SH, CN, C ₃ -C ₆ alkenoxy, OCH ₂ CH ₂ CN, OCH ₂ CH ₂ (CO)O (C ₁ -C ₄ alkyl), O(CO)-(C ₁ -C ₄ alkyl), O(CO)-(C ₂ -C ₄ )alkenyl, O(CO)-phenyl, (CO)OH, _{(CO) O (C 1 -C} 4 alkyl), C ₃ -C _{20 Alkyl, SO 2 - (C 1 -C} 4 haloalkyl), O (C ₁ -C ₄ haloalkyl) or interrupted by one or more O of C ₃ -C ₂₀ cycloalkyl; or R ₁₇ based C ₂ - a C ₂₀ alkyl group having one or more O, S or NR _{26 in between} ; or R ₁₇ (CH ₂ CH ₂ O) _n+1 H, (CH ₂ CH ₂ O) _n (CO)-(C ₁ - C ₈ alkyl), C ₁ -C ₈ alkanoyl, C ₂ -C ₁₂ alkenyl, C ₃ -C ₆ alkenyl or uninter or hetero or one or more O, S, CO or NR ₂₆ a C ₃ -C ₂₀ cycloalkyl group; or an R ₁₇ system C ₁ -C ₈ alkyl-C ₃ -C ₁₀ cycloalkyl group, which is undoped or heterozygous with one or more O; or R ₁₇ is benzamidine a group which is unsubstituted or substituted by one or more C ₁ -C ₆ alkyl, halogen, OH or C ₁ -C ₃ alkoxy groups; or R ₁₇ phenyl, naphthyl or C ₃ -C ₂₀ a heteroaryl group, each of which is unsubstituted or substituted with one or more of the following groups: halogen, OH, C ₁ -C ₁₂ alkyl, C ₁ -C ₁₂ alkoxy, CN, NO ₂ , phenyl- C ₁ -C ₃ alkoxy, phenoxy, C ₁ -C ₁₂ alkylthio, phenylthio, N(C ₁ -C ₁₂ alkyl) ₂ , diphenyl-amine or Or R ₁₇ forms a bond to the group or a direct bond of one of the carbon atoms of the phenyl or naphthyl ring; R ₁₈ is hydrogen, C ₂ -C ₁₂ alkenyl, C ₃ -C ₂₀ cycloalkyl or phenyl-C ₁ -C ₃ alkyl Wherein the C ₂ -C ₁₂ alkenyl group, the C ₃ -C ₂₀ cycloalkyl group or the phenyl-C ₁ -C ₃ alkyl group is uninter or hetero- or one or more O, S, CO, NR ₂₆ or COOR ₁₇ ; or R ₁₈ is a C ₁ -C ₂₀ alkyl group which is unsubstituted or substituted with one or more of the following groups: OH, SH, CN, C ₃ -C ₆ alkenyloxy, OCH ₂ CH ₂ CN , OCH ₂ CH ₂ (CO)O(C ₁ -C ₄ alkyl), O(CO)-(C ₂ -C ₄ )alkenyl, O(CO)-(C ₁ -C ₄ alkyl), O (CO)-phenyl or (CO)OR ₁₇ ; or R ₁₈ C ₂ -C ₂₀ alkyl with one or more O, S, CO, NR ₂₆ or COOR ₁₇ ; or R ₁₈ (CH _{2 )} CH ₂ O) _n H, (CH ₂ CH ₂ O) _n (CO)-(C ₁ -C ₈ alkyl), C ₂ -C ₈ alkanoyl or C ₃ -C ₆ olefin; or R ₁₈ Is a benzinyl group which is unsubstituted or substituted with one or more of the following groups: C ₁ -C ₆ alkyl, halogen, OH, C ₁ -C ₄ alkoxy or C ₁ -C ₄ alkyl group; or R ₁₈ lines phenyl, naphthyl or C ₃ -C ₂₀ heteroaryl, which is unsubstituted or departments with one or more of the following radicals: halogen C ₁ -C ₁₂ alkyl, C _{1 -C. 4} haloalkyl, C ₁ -C ₁₂ alkoxy, CN, NO _2, phenyl -C ₁ -C ₃ alkoxy, phenoxy, C ₁ -C ₁₂ alkylthio, phenylthio, N(C ₁ -C ₁₂ alkyl) ₂ , diphenylamino, (CO)O(C ₁ -C ₈ alkyl), (CO)-C ₁ - C ₈ alkyl, (CO) N(C ₁ -C ₈ alkyl) ₂ or R ₁₉ and R ₂₀ are each independently hydrogen, C ₁ -C ₂₀ alkyl, C ₂ -C ₄ hydroxyalkyl, C ₂ -C ₁₀ alkoxyalkyl, C ₂ -C ₅ alkenyl, C ₃ - C ₂₀ cycloalkyl, phenyl-C ₁ -C ₃ alkyl, C ₁ -C ₈ alkanoyl, C ₁ -C ₈ alkenyloxy, C ₃ -C ₁₂ alkenyl, SO ₂ -( a C ₁ -C ₄ haloalkyl group or a benzylidene group; or R ₁₉ and R ₂₀ are a phenyl group, a naphthyl group or a C ₃ -C ₂₀ heteroaryl group, each of which is unsubstituted or has one or more of the following groups; Group substitution: halogen, C ₁ -C ₄ haloalkyl, C ₁ -C ₂₀ alkoxy, C ₁ -C ₁₂ alkyl, benzhydryl or C ₁ -C ₁₂ alkoxy; or R ₁₉ and R ₂₀ Together with the N atom to which it is attached, it forms a 5- or 6-membered saturated or unsaturated ring which is not intermixed or interspersed with O, S or NR ₁₇ , and the 5 or 6 member saturated or unsaturated ring system is unsubstituted or Substituted by one or more of the following groups: C ₁ -C ₂₀ alkyl, C ₁ -C ₂₀ alkoxy, =0, OR ₁₇ , SR ₁₈ , NR ₂₁ R ₂₂ , (CO)R ₂₃ , NO ₂ , Halogen, C ₁ -C ₄ -haloalkyl, CN, phenyl, Or a C ₃ -C ₂₀ cycloalkyl group having one or more O, S, CO or NR ₁₇ without intermixing or intermixing; or R ₁₉ and R ₂₀ together with the N atom to which they are attached form a heteroaromatic ring system, The ring system is unsubstituted or substituted with one or more of the following groups: C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, C ₁ -C ₂₀ alkoxy, =0, OR ₁₇ , SR ₁₈ , NR ₂₁ R ₂₂ , (CO)R ₂₃ , , Halogen, NO _2, CN, phenyl or interrupted or not interrupted with one or more O, S, CO or NR ₁₇ of the C ₃ -C ₂₀ cycloalkyl group; R ₂₁ and R ₂₂ independently of one another hydrogen, C _{a 1-} C ₂₀ alkyl group, a C ₁ -C ₄ haloalkyl group, a C ₃ -C ₁₀ cycloalkyl group or a phenyl group; or R ₂₁ and R ₂₂ together with the N atom to which they are attached form an unintermixed or intervening O, a 5- or 6-membered saturated or unsaturated ring of S or NR26, and the 5- or 6-membered saturated or unsaturated ring system is not fused or the 5- or 6-membered saturated or unsaturated ring is fused to the benzene ring; ₂₃ is hydrogen, OH, C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, hetero or one or more O, CO or C ₂ -C ₂₀ alkyl of NR ₂₆ , unintermixed or intervening O, C ₃ -C ₂₀ cycloalkyl of S, CO or NR ₂₆ or R ₂₃ phenyl, naphthyl, phenyl-C ₁ -C ₄ alkyl, OR ₁₇ , SR ₁₈ or NR ₂₁ R ₂₂ ; R ₂₄ (CO)OR ₁₇ , CONR ₁₉ R ₂₀ , (CO)R ₁₇ ; or R ₂₄ having one of the meanings given for R ₁₉ and R ₂₀ ; R ₂₅ is COOR ₁₇ , CONR ₁₉ R ₂₀ , (CO ) R _17; or R ₂₅ R ₁₇ Suo for having one of the meanings given by; R ₂₆ type hydrogen, C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, C ₂ -C ₂₀ alkyl, therebetween One or more O or CO; or a phenyl-based -C ₁ -C ₄ alkyl, C ₃ -C ₈ cycloalkyl, which is based not interrupted or is interrupted by one or more O or CO; or tie (CO) R ₁₉ ; or a phenyl group which is unsubstituted or substituted with one or more of the following groups: C ₁ -C ₂₀ alkyl, halogen, C ₁ -C ₄ haloalkyl, OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ or But the condition is that at least one group is present in the molecule or A photosensitive resin composition for a black matrix according to claim 4, wherein the photoinitiator (C) comprises a photoinitiator (C-1) having a structure represented by the formula (CI), wherein R ₁ , R ₂ , R ₃ , R ₄ , R ₅ , R ₆ , R ₇ and R ₈ are each independently hydrogen, C ₁ -C ₂₀ alkyl, , COR ₁₆ or NO ₂ , or R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ , R ₅ and R ₆ , R ₆ and R ₇ or R ₇ and R ₈ are independently of each other However, the condition is at least one of R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ , R ₅ and R ₆ , R ₆ and R ₇ or R ₇ and R ₈ X is a CO or a direct bond; R ₁₃ is a C ₁ -C ₂₀ alkyl group which is unsubstituted or substituted with one or more of the following groups: halogen, OR ₁₇ , SR ₁₈ , COOR ₁₇ , CONR ₁₉ R ₂₀ or PO(OC _k H _2k+1 ) ₂ ; or R ₁₃ is a C ₂ -C ₂₀ alkyl group in which one or more O, S, NR ₂₆ or CO are mixed; or R ₁₃ is a phenyl or naphthyl group. Unsubstituted or one or more Or substituted by COR ₁₆ ; R ₁₄ is C ₁ -C ₂₀ alkyl, phenyl or C ₁ -C ₈ alkoxy; R ₁₅ is phenyl, naphthyl, C ₃ -C ₂₀ heteroaryl, each of which is not Substituted or substituted with one or more of the following groups: phenyl, halogen, C ₁ -C ₄ haloalkyl, OR ₁₇ , SR ₁₈ or C ₂ -C ₂₀ alkyl, with one or more O or S in between; or each with one or more C ₁ -C ₂₀ alkyl, C ₁ -C ₂₀ alkyl which is unsubstituted or substituted with one line or more of the following radicals: _{halogen, COOR 17, CONR 19 R 20} , phenyl, C ₃ -C ₈ cycloalkyl, C ₃ -C ₂₀ heteroaryl, C ₆ -C ₂₀ aryloxycarbonyl group, C ₄ -C ₂₀ aryloxycarbonyl group _{heteroaryl, OR 17, SR 18, NR} 19 R ₂₀ or PO(OC _k H _2k+1 ) ₂ ; or R ₁₅ is a C ₁ -C ₂₀ alkyl group which is unsubstituted or substituted with one or more of the following groups: OR ₁₇ , SR ₁₈ , C ₃ -C ₈ cycloalkyl, C ₃ -C _{20 heteroaryl, NR 19 R 20, COOR 17} , CONR 19 R 20 or _{PO (OC k H 2k + 1} ) 2; R '14 has given for R ₁₄ one of those meanings; R _'15 has the meanings for R ₁₅ Suo one of those given; R ₁₆ lines phenyl, which is unsubstituted or substituted with one line or more of the following groups: oR _17, SR ₁₈ NR ₁₉ R ₂₀ or interrupted by one or more O, S or NR ₂₆ of C ₂ -C ₂₀ alkyl, phenyl or R ₁₆ lines, which lines with one or more C ₁ -C ₂₀ substituted alkyl, said C line ₁ -C ₂₀ alkyl unsubstituted or substituted with one or more of the following radicals: _{halogen, COOR 17, CONR 19 R 20} , phenyl, C ₃ -C ₈ cycloalkyl, C ₃ -C ₂₀ heteroaryl a C ₆ -C ₂₀ aryloxycarbonyl group, a C ₄ -C ₂₀ heteroaryloxycarbonyl group, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or an R ₁₆ C ₁ -C ₂₀ alkyl group, which is not Substituted or substituted by halogen, phenyl, OH, SH, CN, C ₃ -C ₆ alkenyloxy, OCH ₂ CH ₂ (CO)O(C ₁ -C ₄ alkyl), O(CO) -(C ₁ -C ₄ alkyl) or (CO)O(C ₁ -C ₄ alkyl); R ₁₇ is a C ₁ -C ₂₀ alkyl group which is unsubstituted or has one or more of the following groups Substitution: halogen, OCH ₂ CH ₂ (CO) O (C ₁ -C ₄ alkyl), O(C ₁ -C ₄ alkyl), (CO)O(C ₁ -C ₄ alkyl), C ₃ - C ₂₀ alkyl or cycloalkyl interrupted by one or more O of C ₃ -C ₂₀ cycloalkyl; R _17, or C ₂ -C ₂₀ alkyl-based, have therebetween one or more heteroatoms O; R ₁₈ through lines (CO) oR the _{17-substituted} methyl; R ₁₉ and R ₂₀ independently of one another hydrogen, phenyl, C ₁ -C ₂₀ alkyl, C ₁ -C ₈ alkanoyl group C ₁ -C ₈ alkoxy group, acyl; or R ₁₉ and R ₂₀ appended thereto the N atom to form a heteroaromatic ring system with the ring system is unsubstituted or system Substituting; but the condition is that at least one group is present in the molecule or A photosensitive resin composition for a black matrix according to claim 4, wherein the photoinitiator (C) comprises a photoinitiator (C-1) having a structure represented by the formula (CI), wherein R ₁ , R ₂ , R ₃ , R ₄ , R ₅ , R ₆ , R ₇ and R ₈ are each independently hydrogen, or R ₁ and R ₂ , R ₃ and R ₄ or R ₅ and R ₆ are independently of each other However, the condition is that at least one of R ₁ and R ₂ , R ₃ and R ₄ or R ₅ and R ₆ is Or R ₂ , COR ₁₆ , NO ₂ or Or R ₇ series Or COR ₁₆ ; R ₉ , R ₁₁ and R ₁₂ are hydrogen; R ₁₀ is hydrogen, OR ₁₇ or COR ₁₆ ; X is CO or a direct bond; R ₁₃ is a C ₁ - C ₂₀ alkyl group which is unsubstituted or Substituted by one or more of the following groups: halogen, R ₁₇ , OR ₁₇ , SR ₁₈ or PO(OC _k H _2k+1 ) ₂ ; or R ₁₃ C ₂ -C ₂₀ alkyl, with one or more O; or R ₁₃ is a phenyl group; k is an integer 2; R ₁₄ is a C ₁ -C ₂₀ alkyl or thienyl group; R ₁₅ is a phenyl or naphthyl group, each of which is unsubstituted or has one or more ORs ₁₇ or C ₁ -C ₂₀ alkyl substituted; or R ₁₅ is thienyl, hydrogen, C ₁ -C ₂₀ alkyl, the C ₁ -C ₂₀ alkyl is unsubstituted or substituted with one or more of the following groups :OR ₁₇ , SR ₁₈ , C ₃ -C ₈ cycloalkyl, NR ₁₉ R ₂₀ or COOR ₁₇ ; or R ₁₅ C ₂ -C ₂₀ alkyl with intervening SO ₂ ; R ₁₆ phenyl or naphthyl , each of which is unsubstituted or substituted with one or more of the following groups: OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ or C ₁ -C ₂₀ alkyl; or R ₁₆ is thienyl; R ₁₇ is hydrogen, C acyl ₁ -C ₈ alkoxy, C ₁ -C ₂₀ alkyl, C ₁ -C ₂₀ alkyl which is unsubstituted or substituted with one line or more of the following groups: halo, O (CO) - (C 1 - C ₄ alkyl), O (CO) -(C ₂ -C ₄ )alkenyl or hetero-C ₃ -C ₂₀ cycloalkyl having one or more O; or R ₁₇ C ₂ -C ₂₀ alkyl, heterogeneous one or more O; R ₁₈ C ₃ -C ₂₀ cycloalkyl, C ₁ -C ₂₀ alkyl, unsubstituted or via one or more OH, O(CO)-(C ₂ -C ₄ )alkenyl or (CO)OR ₁₇ Substituted; or R ₁₈ is a phenyl group which is unsubstituted or substituted by one or more halogens; R ₁₉ and R ₂₀ are each independently C ₁ -C ₈ alkyl fluorenyl or C ₁ -C ₈ alkyl fluorenyl oxygen Or R ₁₉ and R ₂₀ together with the N atom to which they are attached form a 5- or 6-membered saturated ring interspersed with O; provided that at least one group is present in the molecule The photosensitive resin composition for a black matrix according to any one of claims 4 to 6, wherein the amount of the alkali-soluble resin (A) used is 100 parts by weight, and the light having the structure represented by the formula (CI) The starting agent (C-1) is used in an amount of 5 parts by weight to 50 parts by weight. A photosensitive resin composition for a black matrix according to claim 1, wherein the first decane compound (F-1) has a structure represented by the following formula (1): Q represents a hydrolyzable group, Z ₃ independently represents an unsubstituted or substituted alkyl group having 1 to 4 carbon atoms, s represents an integer of 1 to 3; and M represents an unsubstituted or substituted alkylene group having 1 to 6 carbon atoms. The group, Z ₄ represents a hydrogen atom, or an unsubstituted or substituted alkyl group having 1 to 8 carbon atoms, and Z ₅ represents a group of the structure represented by the following formula (i) or formula (ii): In the formula, Z ₆ and Z ₇ each independently represent a hydrogen atom or a methyl group, and t represents 1 to 4. The photosensitive resin composition for a black matrix of claim 1, wherein the first decane compound (F-1) has a structure represented by the following formula (2): Q represents a hydrolyzable group, Z ₃ independently represents an unsubstituted or substituted alkyl group having 1 to 4 carbon atoms, s represents an integer of 1 to 3; and M represents an unsubstituted or substituted alkylene group having 1 to 6 carbon atoms. Any one of Z ₈ and Z ₉ represents a group of the structure represented by formula (i) or formula (ii), and the other represents a group of a structure represented by formula (i) or formula (ii), a hydrogen atom, or an unsubstituted group. Or substituted alkyl having 1 to 8 carbon atoms; In the formula, Z ₆ and Z ₇ each independently represent a hydrogen atom or a methyl group, and t represents 1 to 4. A photosensitive resin composition for a black matrix according to claim 1, wherein the first decane compound (F-1) has a structure represented by the following formula (3): Q independently represents a hydrolyzable group, Z ₃ independently represents an unsubstituted or substituted alkyl group having 1 to 4 carbon atoms, s represents an integer of 1 to 3; and M represents an unsubstituted or substituted carbon atom of 1 to 6 An alkyl group, Z ₁₀ represents a group of the structure represented by formula (i) or formula (ii): In the formula, Z ₆ and Z ₇ each independently represent a hydrogen atom or a methyl group, and t represents 1 to 4. A photosensitive resin composition for a black matrix according to claim 1, wherein the decane compound (F) comprises a second decane compound (F-2) having a structure represented by the formula (F-II): In the formula (F-II), T ₁ represents an alkylene group having 1 to 6 carbon atoms; and T ₂ represents a methyl group, an ethyl group or a propyl group. The photosensitive resin composition for a black matrix of claim 11, wherein the second decane compound having a structure represented by the formula (F-II) is used based on 100 parts by weight of the alkali-soluble resin (A). F-2) is used in an amount of from 1 part by weight to 10 parts by weight. A black matrix formed by a prebaking treatment, an exposure treatment, a development treatment, and a post-baking treatment of a photosensitive resin composition for a black matrix according to any one of claims 1 to 12. A color filter comprising a black matrix according to claim 13. A liquid crystal display comprising a color filter according to claim 14.