TWI612386B - Photosensitive resin composition for color filter and application thereof - Google Patents

Abstract

The invention relates to a photosensitive resin composition for a color filter and an application thereof. The photosensitive resin composition for a color filter includes a pigment (A), a dye (B), an alkali-soluble resin (C), a compound (D) having an ethylenically unsaturated group, a photoinitiator (E), and an organic compound. Solvent (F). The alkali-soluble resin (C) includes a first alkali-soluble resin (C-1). The prepared photosensitive resin composition for a color filter has better pattern smoothness and contrast, and has no bubble-like display defects.

Description

Photosensitive resin composition for color filter and application thereof

The present invention relates to a photosensitive resin composition for a color filter, and in particular, to provide a pattern smoothness and contrast with good pattern, and no bubble-like display defects.

At present, color filters have been widely used in the fields of color liquid crystal displays, color facsimile machines, and color cameras. With the increasing market demand, the manufacturing technology of color filters also tends to diversify. At present, the manufacturing methods of color filters include dyeing method, printing method, electroplating method, and dispersion method, among which the dispersion method is the mainstream process.

The dispersion method is to disperse a colored pigment in a photosensitive resin, and then apply the photosensitive resin on a glass substrate. Then, through steps such as exposure and development, a specific pattern can be made. After repeating the operation three times, the pattern of the pixel colored layer of red (R), green (G) and blue (B) can be obtained. Then, if necessary, a protective film may be applied to the pattern of the pixel coloring layer.

The photosensitive resin used in the dispersion method is disclosed in Japanese Patent Laid-Open No. 6-95211 and Japanese Patent Laid-Open No. 8-183819. The alkali-soluble resin includes an alkali-soluble resin, and the alkali-soluble resin is, for example, a copolymer obtained by polymerizing a (meth) acrylic acid as a comonomer component.

However, during the manufacturing process of color filters, multiple heat treatment steps are required, such as red (R), green (G), and blue (B) pixel-colored layer patterns are formed and post-bake. Steps and formation steps of transparent conductive film (ITO film), etc. These steps generally need to be operated at a high temperature above 200 ° C, but if the conventional photosensitive resin is heated at 180 ° C for about 1 hour, it is easy to draw Pigment agglomerated particles are produced in the pigmented layer (generally, the particle size of the pigment agglomerated particles is between 1 and 10 μm), and the heat resistance of the pigmented layer is not good.

In order to improve the above problems, the photosensitive resin composition disclosed in Japanese Patent Laid-Open No. 2001-075273 includes a polymer obtained by polymerizing an unsaturated monomer containing a carboxylic acid group and a monomer containing an epoxy group. An alkali-soluble resin as a photosensitive resin. However, the color filter made of the photosensitive resin composition of this conventional technique has the defects of bubble-like display defects, poor pattern smoothness and poor contrast.

Therefore, how to overcome the problems of bubble-shaped display defects, poor pattern smoothness, and poor contrast at the same time to meet the current industry requirements is the goal of hard research in the technical field to which the present invention belongs.

Therefore, one aspect of the present invention is to provide a photosensitive resin composition for a color filter. The photosensitive resin composition for a color filter includes a pigment (A), a dye (B), and an alkali-soluble resin (C ), With ethylene Saturated compound (D), photoinitiator (E) and organic solvent (F). The photosensitive resin composition for a color filter can improve the smoothness and contrast of the pattern, and has no bubble-like display defects.

Another aspect of the present invention is to provide a method for manufacturing a color filter, which includes the step of forming a pixel layer using the aforementioned photosensitive resin composition for a color filter.

Another aspect of the present invention is to provide a color filter, which is manufactured by using the aforementioned manufacturing method.

Another aspect of the present invention is to provide a liquid crystal display device including the aforementioned color filter.

According to the aspect of the present invention, a photosensitive resin composition for a color filter is proposed. The photosensitive resin composition for a color filter includes a pigment (A), a dye (B), an alkali-soluble resin (C), a compound (D) having an ethylenically unsaturated group, a photoinitiator (E), and an organic compound. The solvent (F) is described below.

Pigment (A)

The pigment (A) of the present invention may include an inorganic pigment, an organic pigment, or a combination thereof.

The above-mentioned inorganic pigment may be a metal compound such as a metal oxide or a metal salt, and may be selected from oxides of metals such as iron, cobalt, aluminum, cadmium, lead, copper, titanium, magnesium, chromium, lead, or antimony, A composite oxide of the aforementioned metals.

The above organic pigments are selected from C.1. Pigment Yellow 1, 3, 11, 12, 13, 14, 15, 16, 17, 20, 24, 31, 53, 55, 60, 61, 65, 71, 73, 74, 81, 83, 93, 95, 97, 98, 99, 100, 101, 104, 106, 108, 109, 110, 113, 114, 116, 117, 119, 120, 126, 127, 128, 129, 138, 139, 150, 151, 152, 153, 154, 155, 156, 166, 167, 168, 175; CI Pigment Orange 1, 5, 13, 14, 16, 17, 24, 34, 36, 38, 40, 43, 46, 49, 51, 61, 63, 64 , 71, 73; CI Pigment Red 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 14, 15, 16, 17, 18, 19, 21, 22, 23, 30, 31, 32, 37, 38, 40, 41, 42, 48: 1, 48: 2, 48: 3, 48: 4, 49: 1, 49: 2, 50: 1, 52: 1, 53: 1, 57, 57: 1, 57: 2, 58: 2, 58: 4, 60: 1, 63: 1, 63: 2, 64: 1, 81: 1, 83, 88, 90: 1, 97, 101, 102, 104, 105, 106, 108, 112, 113, 114, 122, 123, 144, 146, 149, 150, 151, 155, 166, 168, 170, 171, 172, 174, 175, 176, 177, 178, 179, 180, 185, 187, 188, 190, 193, 194, 202, 206, 207, 208, 209, 215, 216, 220, 224, 226, 242, 243, 245, 254, 255, 264, 265; CI Pigment Violet 1, 14, 19, 23, 29, 32, 33, 36, 37, 38, 39, 40, 50; CI Pigment Blue 1, 2, 15, 15: 1, 15: 2, 15: 3, 15: 4, 15: 5, 15: 6, 16, 21, 22, 60 , 61, 64, 66; CI Pigment Green 7, 36, 37, 42, 58; CI Pigment Brown 23, 25, 28; and CI Pigment Black 1, 7. These organic pigments can be used alone or in combination.

The average particle diameter of the primary particles of the pigment (A) may be 10 nm to 200 nm, preferably 20 nm to 150 nm, and more preferably 30 nm to 130 nm.

Based on the total amount of the alkali-soluble resin (C) to be described later being 100 parts by weight, the amount of the pigment (A) used is 30 to 300 parts by weight, preferably 35 to 250 parts by weight, and more preferably 40 Part by weight to 200 parts by weight.

If necessary, the pigment (A) can also selectively use a dispersant, for example, a cationic, anionic, nonionic, amphoteric, polysiloxane, or fluorine-based surfactant.

The surfactant may include, but is not limited to, polyethylene oxide alkyl ethers such as polyethylene oxide dodecyl ether, polyethylene oxide stearyl ether, polyethylene oxide oleyl ether, etc .; Polyethylene oxide alkyl phenyl ether surfactants such as ethylene oxide octyl phenyl ether, polyethylene oxide nonyl phenyl ether; polyethylene glycol dilaurate, polyethylene glycol distearate Ester surfactants such as polyethylene glycol diesters; sorbitan fatty acid ester surfactants; fatty acid modified polyester surfactants; tertiary amine modified polyurethane interface Active agent; manufactured by Shin-Etsu Chemical Co., Ltd., a product of model KP, manufactured by Toray Dow Corning Silicon, a product of model SF-8427, manufactured by Kyoeisha Oil Chemical Industry, a product of model Polyflow, Tochem Products Co. ., Ltd.), model F-Top, Dainippon Ink Chemical Industry, model Megafac, Sumitomo 3M, model Fluorad, Asahi Glass, model Asahi Guard and Surflon . The surfactant can be used singly or in combination.

Dye (B)

The dye (B) of the present invention may include a xanthene dye (B-1). Second, the dye (B) may optionally contain other dyes (B-2).

Xanthene Dye (B-1)

The xanthene dye (B-1) may have a structure represented by the following formula (V):

In formula (V), D ₁ to D ₄ each independently represent a hydrogen atom, -D ₆ , an aromatic hydrocarbon group having 6 to 10 carbon atoms, or a halogen atom, -D ₆ , -OH, -OD ₆ , ^{_{-SO 3 -, -SO 3 H,}} -SO 3 M, -COOH, -COOD 6, -SO 3 D 6, -SO 2 NHD 8 or -SO ₂ ND ₈ D ₉ substituents to carbon atoms of 6 to 10 aromatic hydrocarbon group; D ₅ represents ^{_{-SO 3 -, -SO 3 H,}} -SO 3 M, -COOH, -COOD 6, -SO 3 D 6, -SO 2 NHD 8 or -SO ₂ ND ₈ D _9; u represents An integer from 0 to 5; when u represents 2 to 5, a plurality of D ₅ are the same or different; Z represents a halogen atom; t represents 0 or 1; D ₆ represents an alkyl group having 1 to 10 carbon atoms or a halogen atom A substituted alkyl group having 1 to 10 carbons, wherein -CH ₂ -in the alkyl group having 1 to 10 carbons or the alkyl group substituted with a halogen atom and having 1 to 10 carbons is unsubstituted or Substituted by -O-, carbonyl or -ND _7- ; D ₇ represents an alkyl group having 1 to 10 carbon atoms or an alkyl group substituted with a halogen atom and having 1 to 10 carbon atoms; D ₈ and D ₉ each independently represent carbon A linear alkyl group having 1 to 10 carbon atoms, a branched alkyl group having 1 to 10 carbon atoms, a cycloalkyl group having 3 to 30 carbon atoms, or -Q; wherein a linear alkyl group having 1 to 10 carbon atoms Base, carbon The hydrogen atom in a branched alkyl group having a number of 1 to 10 or a cycloalkyl group having a carbon number of 3 to 30 is unsubstituted or substituted with a substituent, and the substituent is selected from a hydroxyl group, a halogen atom, -Q Group consisting of -CH = CH ₂ and -CH = CH-D ₆ ; linear alkyl group having 1 to 10 carbon atoms, branched alkyl group having 1 to 10 carbon atoms or 3 to 30 carbon atoms -CH ₂ -in a cycloalkyl group is unsubstituted or substituted with -O-, carbonyl, or -ND _7- ; or D ₈ and D ₉ combine to form a heterocyclic group having 1 to 10 carbon atoms, in which the carbon number The hydrogen atom in a heterocyclic group of 1 to 10 is unsubstituted or substituted with D ₆ , -OH, or -Q; Q represents an aromatic hydrocarbon group having 6 to 10 carbons and a hetero group having 5 to 10 carbons Aromatic group, aromatic hydrocarbon group having 6 to 10 carbon atoms substituted with halogen atom, -D ₆ , -OH, -OD ₆ , -NO ₂ , -CH = CH ₂ or -CH = CH-D ₆ , or halogen An atom, -D ₆ , -OH, -OD ₆ , -NO ₂ , -CH = CH ₂ and -CH = CH-D ₆ substituted heteroaromatic group having 5 to 10 carbon atoms; and M represents potassium or sodium.

Preferably, the aforementioned D ₆ may include, but is not limited to, methyl, ethyl, propyl, isopropyl, butyl, isobutyl, pentyl, isopentyl, neoopentyl, cyclopentyl , Hexyl, cyclohexyl, heptyl, cycloheptane, octyl, cyclooctyl, 2-ethylhexyl, nonyl, decyl, tricyclo [5.3.0.0 ^3,10 ] decyl [tricycle (5.3.0.0 ^3,10 ) decanyl], methoxypropyl, hexyloxypropyl, 2-ethylhexyloxypropyl, methoxyhexyl, or epoxypropyl.

Preferably, the aromatic hydrocarbon group having 6 to 10 carbon atoms may include, but is not limited to, phenyl, naphthyl, and the like.

Preferably, the aforementioned -SO ₃ D ₆ may include, but is not limited to, methanesulfonyl, ethanesulfonyl, hexanesulfonyl, or decanesulfonyl .

Preferably, the aforementioned -COOD ₆ may include, but is not limited to, methyloxycarbonyl, ethyloxycarbonyl, propoxycarbonyl, isopropoxycarbonyl, butoxycarbonyl, and isobutoxy Carbonyl, pentyloxycarbonyl, isopentyloxycarbonyl, neopentyloxycarbonyl, cyclopentyloxycarbonyl, hexyloxycarbonyl, cyclohexyloxycarbonyl, heptyloxycarbonyl, cycloheptyloxycarbonyl, octyloxy Carbonyl, cyclooctyloxycarbonyl, 2-ethylhexyloxycarbonyl, nonoxycarbonyl, decyloxycarbonyl, tricyclic [5.3.0.0 ^3,10 ] decylcarbonyl, methoxypropoxycarbonyl, hexane Oxypropoxycarbonyl, 2-ethylhexyloxypropoxycarbonyl or methoxyhexyloxycarbonyl.

、

、

、

(R^a表示碳數為1至3之烷基、碳數為1至3之烷氧基、經鹵素原子取代且碳數為1至3之烷基或經鹵素原子取代且碳數為1至3之烷氧基)、

、

、

(R^b表示碳數為1至3之烷基、碳數為1至3之烷氧基、經鹵素原子取代且碳數為1至3之烷基或經鹵素原子取代且碳數為1至3之烷氧基)、

、

、

、

Preferably, the aforementioned -SO ₂ NHD ₈ may include, but is not limited to, sulfamoyl, methylaminesulfonyl, ethylaminesulfonyl, propylaminesulfonyl, isopropylaminesulfonyl Fluorenyl, butylaminesulfonyl, isobutylaminesulfonyl, pentylaminesulfonyl, isoamylaminesulfonyl, neopentylaminesulfonyl, cyclopentylaminesulfonyl, hexyl Aminosulfonyl, cyclohexylaminesulfonyl, heptylaminesulfonyl, cycloheptylaminesulfonyl, octylaminesulfonyl, cyclooctylaminesulfonyl, 2-ethylhexylaminesulfonyl , Nonylaminosulfonyl, decylaminesulfonyl, tricyclic [5.3.0.0 ^3,10 ] decylaminesulfonyl, methoxypropylaminesulfonyl, hexyloxypropylaminesulfonyl Fluorenyl, 2-ethylhexyloxypropylaminesulfonyl, methoxyhexylaminesulfonyl, epoxypropylaminesulfonyl, 1,5-dimethylhexylaminesulfonyl, propyl Oxypropylaminesulfonyl, isopropoxypropylaminesulfonyl, 3-phenyl-1-methylpropylaminesulfonyl,

,

,

,

(R ^a represents an alkyl group having 1 to 3 carbon atoms, an alkoxy group having 1 to 3 carbon atoms, an alkyl group substituted with a halogen atom and 1 to 3 carbon atoms or a halogen atom substituted with 1 to 3 carbon atoms 3 alkoxy),

,

,

(R ^b represents an alkyl group having 1 to 3 carbon atoms, an alkoxy group having 1 to 3 carbon atoms, an alkyl group substituted with a halogen atom and 1 to 3 carbon atoms or a halogen atom substituted with 1 to 3 carbon atoms 3 alkoxy),

,

,

,

(R^b表示碳數為1至3之烷基、碳數為1至3之烷 氧基、經鹵素原子取代且碳數為1至3之烷基或經鹵素原子取代且碳數為1至3之烷氧基)、

、

Preferably, the aforementioned -SO ₂ ND ₈ D ₉ may include but is not limited to

(R ^b represents an alkyl group having 1 to 3 carbon atoms, an alkoxy group having 1 to 3 carbon atoms, an alkyl group substituted with a halogen atom and 1 to 3 carbon atoms or a halogen atom substituted with 1 to 3 carbon atoms 3 alkoxy),

,

Preferably, the xanthene dye (B-1) may include a structure represented by the following formula (Vi):

In Formula (Vi), D ₁₁ to D ₁₄ each independently represent a hydrogen atom, -D ₆ , an aromatic hydrocarbon group having 6 to 10 carbon atoms, or via a halogen atom, -D ₆ , -OH, -OD ₆ , -SO ^{_{3 -, -SO 3 H, -SO}} 3 Na, -COOH, -COOD 6, -SO 3 D 6, -SO 2 NHD 8 or -SO ₂ ND ₈ D ₉ carbon atoms and substituted with an aromatic hydrocarbon group having 6 to 10 of ; D ₁₅ represents a hydrogen ^{_{atom, -SO 3 -, -SO 3 H}} , -SO 2 NHD 8 or _{-SO 2 ND 8 D 9; D} 16 represents ^{_{-SO 3 -, -SO 3 H,}} -SO 2 NHD 8 or -SO ₂ ND ₈ D ₉ ; Z ₁ represents a halogen atom; t ₁ represents 0 or 1.

Preferably, the xanthene dye (B-1) may include a structure represented by the following formula (V-ii):

In the formula (V-ii), D ₂₁ to D ₂₄ each independently represent a hydrogen atom, -D ₂₆ , an aromatic hydrocarbon group having 6 to 10 carbon atoms, or via a halogen atom, -D ₂₆ , -OH, -OD ₂₆ , ^{_{-SO 3 -, -SO 3 H,}} -SO 3 Na, -COOH, -COOD 26, -SO 3 D 26, or -SO ₂ NHD ₂₈ carbon atoms and substituted with an aromatic hydrocarbon group of 6 to 10; D ₂₅ represents - ^{_{SO 3 -, -SO 3 Na,}} -COOH, -COOD 26, -SO 3 H, or -SO ₂ NHD _28; u ₁ represents an integer of 0-5; when u ₁ represents 2 to 5, a plurality of D ₂₅ Are the same or different; Z ₂ represents a halogen atom; t ₂ represents 0 or 1; D ₂₆ represents an alkyl group having 1 to 10 carbon atoms, or an alkyl group substituted with a halogen atom or -OD ₂₇ and having 1 to 10 carbon atoms ; D ₂₇ represents an alkyl group having a carbon number of 1 to 10; and D ₂₈ represents a hydrogen atom, -D ₂₆ , -COOD ₂₆ , an aromatic hydrocarbon group having a carbon number of 6 to 10, or substituted by -D ₂₆ or -OD ₂₆ And an aromatic hydrocarbon group having 6 to 10 carbon atoms.

Preferably, the xanthene dye (B-1) may include a structure represented by the following formula (V-iii):

(V-iii) In the formula, D ₃₁ and D ₃₂ independently represent a phenyl group, or a halogen _{atom, -D 26, -OD 26, -COOD} 26, the substituent -SO ₃ D ₂₆ or -SO ₂ NHD ₂₈ phenyl; D ₃₃ represents -SO ₃ ^-, or -SO ₂ NHD _28; D ₃₄ represents a hydrogen atom, -SO ₃ ^-, or -SO ₂ NHD _28; Z ₃ represents a halogen atom; t ₃ represents 0 or 1; D ₂₆ represents an alkyl group having 1 to 10 carbon atoms, or an alkyl group substituted with a halogen atom or -OD ₂₇ and having 1 to 10 carbon atoms; D ₂₇ represents an alkyl group having 1 to 10 carbon atoms; and D ₂₈ represents hydrogen An atom, -D ₂₆ , -COOD ₂₆ , an aromatic hydrocarbon group having 6 to 10 carbon atoms, or an aromatic hydrocarbon group substituted with -D ₂₆ or -OD ₂₆ and having 6 to 10 carbon atoms.

Preferably, the xanthene dye (B-1) may include a structure represented by the following formula (V-iv):

In the formula (V-4), D ₄₁ and D ₄₂ independently represent a phenyl group, or by -D ₂₆ -SO ₂ NHD ₂₈ or the substituted phenyl; D ₄₃ represents -SO ₃ ^-, or -SO ₂ NHD ₂₈ Z ₄ represents a halogen atom; t ₄ represents 0 or 1; D ₂₆ represents an alkyl group having 1 to 10 carbon atoms, or an alkyl group substituted with a halogen atom or -OD ₂₇ and having 1 to 10 carbon atoms; D ₂₇ represents An alkyl group having 1 to 10 carbons; and D ₂₈ represents a hydrogen atom, -D ₂₆ , -COOD ₂₆ , an aromatic hydrocarbon group having 6 to 10 carbons, or is substituted with -D ₂₆ or -OD ₂₆ and has a carbon number of 6 To 10 aromatic hydrocarbon groups.

In a specific example of the present invention, the dye (B) may include, but is not limited to, compounds represented by the following formula (V-1) to formula (V-31):

In the formula (V-1) in a, R ^c and R ^d each independently represent a hydrogen atom, -SO ₃ ^-, -COOH, or -SO ₂ NHD _81; D ₈₁ represents a 2-ethylhexyl diyl; Z represents a halogen atom; T represents 0 or 1.

In the formula (V-2), R ^e represents a hydrogen atom, -SO ₃ ^-, -COOH, or -SO ₂ NHD _81; D ₈₁ represents a 2-ethylhexyl diyl; Z represents a halogen atom; T represents 0 or 1.

In the formula (V-3), R ^e represents a hydrogen atom, -SO ₃ ^-, -COOH, or -SO ₂ NHD _81; D ₈₁ represents a 2-ethylhexyl diyl; Z represents a halogen atom; T represents 0 or 1.

In formula (V-4), R ^f , R ^g, and R ^h each independently represent —SO ₃ ^— , —SO ₃ Na, or —SO ₂ NHD ₈₁ ; D ₈₁ represents 2-ethylhexyl.

In the formula (V-5), R ^f , R ^g, and R ^h each independently represent —SO ₃ ^— , —SO ₃ Na, or —SO ₂ NHD ₈₁ ; D ₈₁ represents 2-ethylhexyl.

In the formula ^{(V-6), R i} , R j and R ^k each independently represent hydrogen, -SO ₃ ^-, -SO ₃ H or -SO ₂ NHD _81; D ₈₁ represents a 2-ethylhexyl group.

In the formula ^{(V-7), R i} , R j and R ^k each independently represent hydrogen, -SO ₃ ^-, -SO ₃ H or -SO ₂ NHD _81; D ₈₁ represents a 2-ethylhexyl group.

In the formula ^{(V-8), R l} , R m and R ⁿ each independently represent -SO ₃ ^-, -SO ₃ Na or -SO ₂ NHD _81; D ₈₁ represents a 2-ethylhexyl group.

In the formula ^{(V-9), R l} , R m and R ⁿ each independently represent -SO ₃ ^-, -SO ₃ Na or -SO ₂ NHD _81; D ₈₁ represents a 2-ethylhexyl group.

In the formula (V-10), R ^p , R ^q and R ^r each independently represent hydrogen, —SO ₃ ^— , —SO ₃ H, or —SO ₂ NHD ₈₁ ; D ₈₁ represents 2-ethylhexyl.

In the formula ^{(V-11), R p} , R q and R ^r independently represent hydrogen, -SO ₃ ^-, -SO ₃ H or -SO ₂ NHD _81; D ₈₁ represents a 2-ethylhexyl group.

Preferably, specific examples of the xanthene dye (B-1) of the present invention may include formula (V-1) (R ^c and ^Rd are -SO ₃ ^- and t is 0; CI acid red dye 52), formula (V-22) (CI Acid Red Dye 289), Formula (V-28), Formula (V-31), or any combination of the above materials.

Based on the total amount of alkali-soluble resin (C) to be described later being 100 parts by weight, the amount of xanthene-based dye (B-1) to be used is 3 to 50 parts by weight, preferably 5 to 45 parts by weight, and More preferably, it is 10 to 40 parts by weight.

When the dye (B) of the present invention contains a xanthene-based dye (B-1), the prepared photosensitive resin composition for a color filter has better contrast.

Other dyes (B-2)

The other dye (B-2) may include, but is not limited to, an azo dye, an anthraquinone dye, a phthalocyanine dye, a quinimine dye, a quinoline dye, or a nitro dye.

The aforementioned azo dyes may include, but are not limited to, CI Acid Yellow 11, Acid Orange 7, Acid Red 37, Acid Red 180, Acid Blue 29, Direct Red 28, Direct Red 83, Direct Yellow 12, Direct Orange 26, Direct Green 28. Direct Green 59, Active Yellow 2, Active Red 17, Active Red 120, Active Black 5, Disperse Orange 5, Disperse Red 58, Disperse Blue 165, Basic Blue 41, Basic Red 18, Medium Red 7, Medium Yellow 5 or medium black 7.

The anthraquinone-based dye may include, but is not limited to, C.I. Batblue 4, Acid Blue 40, Acid Green 25, Reactive Blue 19, Reactive Blue 49, Disperse Red 60, Disperse Blue 56 or Disperse Blue 60, and the like.

The phthalocyanine dye may include, but is not limited to, C.I. Basic Blue 5 and the like.

The quinoneimine-based dye may include, but is not limited to, C.I. Basic Blue 3 or Basic Blue 9 and the like.

The quinoline dye may include, but is not limited to, C.I. Solvent Yellow 33, Acid Yellow 3, or Disperse Yellow 64, and the like.

The nitro-based dye may include, but is not limited to, C.I. Acid Yellow 1, Acid Orange 3, or Disperse Yellow 42 and the like. The other dyes (B-2) described above can be used singly or in combination.

Based on the total use amount of the alkali-soluble resin (C) to be described later, the use amount of the other dye (B-2) is 0 to 47 parts by weight, preferably 0 to 40 parts by weight, and more preferably It is 0 to 30 parts by weight.

Based on the total amount of the alkali-soluble resin (C) described later being 100 parts by weight, the amount of the dye (B) used is 5 to 50 parts by weight, preferably 10 to 45 parts by weight, and more preferably 15 parts by weight Parts to 40 parts by weight.

Alkali soluble resin (C)

The alkali-soluble resin (C) of the present invention may include the first alkali-soluble resin (C-1). Second, the alkali-soluble resin (C) may optionally include a second alkali-soluble resin (C-2).

First alkali-soluble resin (C-1)

The first alkali-soluble resin (C-1) has a structure represented by the following formula (I):

In Formula (I), A ₁ and A ₂ each independently represent a hydrogen atom, a hydrocarbon group having 1 to 25 carbon atoms with or without a substituent.

In one embodiment, the first alkali-soluble resin (C-1) has at least one ethylenically unsaturated group.

The first alkali-soluble resin (C-1) can be prepared by reacting a first mixture, and the first mixture is made of an ethylenically unsaturated monomer (c-1) having a structure represented by formula (I-1). -1), copolymerized by ethylenically unsaturated monomer (c-1-2) with at least one carboxylic acid or carboxylic anhydride and other copolymerizable ethylenically unsaturated monomer (c-1-3) A copolymer is obtained by reacting with an ethylenically unsaturated monomer (c-1-4) having an epoxy group.

The ethylenically unsaturated monomer (c-1-1) having a structure represented by the formula (I-1)

The ethylenically unsaturated monomer has a structure represented by the following formula (I-1):

In the formula (I-1), A ₁ and A ₂ each independently represent a hydrogen atom, a hydrocarbon group having 1 to 25 carbon atoms with or without a substituent.

The ethylenically unsaturated monomer may have a structure represented by the following formula (I-2-1) and formula (I-2-2):

In the formula (I-2-1) and the formula (I-2-2), A ₁ and A ₂ each independently represent a hydrogen atom, a hydrocarbon group having 1 to 25 carbon atoms with or without a substituent. The ethylenically unsaturated monomer may be an ether dimer having α-hydroxymethacrylic acid or an esterified product thereof by ether dimerization, that is, the ethylenically unsaturated monomer has at least one ether group.

The aforementioned ether dimer can be formed into a polymer having a structure represented by the following formula (I-3-1) or formula (I-3-2) through a cyclization polymerization reaction:

In the formula (I-3-1) or (I-3-2), A ₁ and A ₂ each independently represent a hydrogen atom, a hydrocarbon group having 1 to 25 carbon atoms with or without a substituent.

The polymer having a structure represented by Formula (I-3-1) or Formula (I-3-2) has a tetrahydropyran ring structure derived from an ether dimer.

In the structure represented by formula (I-1), A ₁ and A ₂ each independently represent a hydrogen atom, a hydrocarbon group having 1 to 25 carbon atoms with or without a substituent, and A ₁ and A ₂ are There is no particular limitation, and A ₁ and A ₂ may be, for example, methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, third butyl, third pentyl, stearyl, Linear or branched alkyl such as lauryl or 2-ethylhexyl; aromatic groups such as phenyl; cyclohexyl, third butylcyclohexyl, dicyclopentadienyl, tricyclodecyl, isobornyl Cycloaliphatic groups such as alkyl, adamantyl, or 2-methyl-2-adamantyl; alkoxy substituted alkyls such as 1-methoxyethyl or 1-ethoxyethyl; benzyl, etc. Alkyl substituted alkyl. The A ₁ and A ₂ may preferably be a methyl group, an ethyl group, a cyclohexyl group, a benzyl group, or the like. The A ₁ and A _{2 are more} preferably a methyl group or an ethyl group.

The aforementioned A ₁ and A ₂ may be the same substituent or different substituents. From the viewpoint of improving the transparency and heat resistance of the polymer, A ₁ and A _{2 are} preferably the same substituent to form a symmetrical ether dimer. From the standpoint of storage stability, A ₁ and A _{2 are} preferably different substituents to form an asymmetric ether dimer. The ether dimer may preferably be, for example: 2,2 '-[oxybis (methylene)] bis-acrylic acid or dialkyl-2,2' [oxybis (methylene)] bis-2-acrylic acid ester.

Specific examples of the symmetric ether dimer may be 2,2 '-[oxybis (methylene)] bis-acrylic acid, dimethyl-2,2'-[oxybis (methylene)] bis- 2-acrylate, diethyl-2,2 '-[oxybis (methylene)] bis-2-acrylate, bis (n-propyl) -2,2'-[oxybis (methylene) ] Bis-2-acrylate, bis (isopropyl) -2,2 '-[oxybis (methylene)] bis-2-acrylate, bis (n-butyl) -2,2'-[oxy Bis (methylene)] bis-2-acrylate, bis (isobutyl) -2,2 '-[oxybis (methylene)] bis-2-acrylate, bis (third butyl)- 2,2 '-[oxybis (methylene)] bis-2-acrylate, bis (third pentyl) -2,2'-[oxybis (methylene)] bis-2-acrylate, Di (stearyl) -2,2 '-[oxybis (methylene)] bis-2-acrylate, bis (dodecyl) -2,2'-[oxybis (methylene)] Bis-2-acrylic acid, bis (2-ethylhexyl) -2,2 '-[oxybis (methylene)] bis-2-acrylate, bis (1-methoxy-ethyl) -2, 2 '-[oxybis (methylene)] bis-2-acrylate, bis (1-ethoxyethyl) -2,2'-[oxybis (methylene)] bis-2-acrylate , Dibenzyl-2,2 '-[oxybis (methylene)] bis-2-acrylate, diphenyl-2,2'-[oxybis (methylene )] Bis-2-propenoate, dicyclohexyl-2,2 '- [oxybis (methylene)] bis-2-propenyl Acid ester, bis (third butylcyclohexyl) -2,2 '-[oxybis (methylene)] bis-2-acrylate, bis (dicyclopentadienyl) 2,2'-[oxy Bis (methylene)] bis-2-acrylate, bis (tricyclodecyl) -2,2 '-[oxybis (methylene)] bis-2-acrylate, bis (isobornyl)- 2,2 '-[oxybis (methylene)] bis-2-acrylate, diadamantyl-2,2'-[oxybis (methylene)] bis-2-acrylate, or di (2 -Methyl-2-adamantyl) -2,2 '-[oxybis (methylene)] bis-2-acrylate and the like.

Preferably, the symmetrical ether dimer may be dimethyl-2,2 '-[oxybis (methylene)] bis-2-acrylate, diethyl-2,2'-[oxybis ( Methylene)] bis-2-acrylate, dicyclohexyl-2,2 '-[oxybis (methylene)] bis-2-acrylate, dibenzyl-2,2'-[oxybis ( Methylene)] bis-2-acrylate, diphenyl-2,2 '-[oxybis (methylene)] bis-2-acrylate or bis (dicyclopentadienyl) 2,2' -[Oxybis (methylene)] bis-2-acrylate and the like.

More preferably, the symmetric ether dimer may be dimethyl-2,2 '-[oxybis (methylene)] bis-2-acrylate, diphenyl-2,2'-[oxybis ( Methylene)] bis-2-acrylate or dibenzyl-2,2 '-[oxybis (methylene)] bis-2-acrylate and the like.

The aforementioned ethylenically unsaturated monomer (c-1-1) having a structure represented by the formula (I-1) may be used singly or in combination.

If the first alkali-soluble resin (C-1) does not contain an ethylenically unsaturated monomer (c-1-1) having a structure represented by the formula (I-1), the obtained color filter is used The photosensitive resin composition is liable to have blistering display defects.

Based on an ethylenically unsaturated monomer (c-1-1) having a structure represented by the formula (I-1), and an ethylenically unsaturated monomer (c-1- 2) with other copolymerizable ethylenically unsaturated monomers The total amount of the compound (c-1-3) used is 100 parts by weight, and the amount of the ethylenically unsaturated monomer (c-1-1) having the structure shown by the formula (I-1) is 5 parts by weight Parts to 50 parts by weight, preferably 10 parts by weight to 45 parts by weight, and more preferably 15 parts by weight to 40 parts by weight.

When the use amount of the ethylenically unsaturated monomer (c-1-1) having the structure shown by the formula (I-1) is in the foregoing range, the photosensitive resin composition is formed after a lithography process. The pixel-colored layer has better splash resistance and is less likely to have blistering display defects.

Ethylene unsaturated monomer (c-1-2) having at least one carboxylic acid or carboxylic anhydride

The ethylenically unsaturated monomer having at least one carboxylic acid may include, but is not limited to, an unsaturated monocarboxylic acid compound, an unsaturated polycarboxylic acid compound, a polycyclic compound having an unsaturated group and one carboxylic acid group, or an unsaturated group And polycyclic compounds with multiple carboxylic acid groups.

The aforementioned unsaturated monocarboxylic acid compound may include, but is not limited to, (meth) acrylic acid, butenoic acid, α-chloroacrylic acid, ethacrylic acid, cinnamic acid, 2- (meth) acrylic acid and ethoxysuccinate (2-methacryloyloxyethyl succinate monoester), 2- (meth) acrylic acid ethoxy hexahydrophthalate, 2- (meth) acrylic acid ethoxy phthalate or omega-carboxylic acid polymer Caprolactone polyol monoacrylate and the like. The omega-carboxylic acid-based polycaprolactone polyol monoacrylate can be a product manufactured by East Asia Synthetic and model ARONIX M-5300.

The aforementioned unsaturated polycarboxylic acid compound may include, but is not limited to, maleic acid, fumaric acid, methyl fumaric acid, itaconic acid, citraconic acid, and the like.

The aforementioned polycyclic compound having an unsaturated group and one carboxylic acid group may include, but is not limited to, 5-carboxylic acid bicyclo [2.2.1] hept-2-ene, 5-carboxylic acid-5-methylbicyclo [2.2. 1] hept-2-ene, 5-carboxylic acid-5-ethylbicyclo [2.2.1] hept-2-ene, 5-carboxylic acid-6-methylbicyclo [2.2.1] hept-2-ene Ene or 5-carboxylic acid-6-ethylbicyclo [2.2.1] hept-2-ene and the like.

Examples of the polycyclic compound having an unsaturated group and a plurality of carboxylic acid groups include 5,6-dicarboxylic acid bicyclo [2.2.1] hept-2-ene and the like.

Preferably, the ethylenically unsaturated monomer having at least one carboxylic acid is selected from the group consisting of acrylic acid, methacrylic acid, 2-methacrylic acid, ethoxysuccinate, and 2-methacrylic acid. Hexahydrophthalate or any combination thereof.

The ethylenically unsaturated monomer having at least one carboxylic anhydride may include, but is not limited to, an unsaturated carboxylic anhydride compound or a polycyclic compound having an unsaturated group and a carboxylic anhydride.

The aforementioned unsaturated carboxylic anhydride compound may include, but is not limited to, maleic anhydride, fumaric anhydride, methyl fumaric anhydride, itaconic anhydride, citraconic anhydride, and the like, and the aforementioned polycyclic compound having an unsaturated group and a carboxylic anhydride may include but It is not limited to 5,6-dicarboxylic anhydride bicyclo [2.2.1] hept-2-ene and the like.

Preferably, the ethylenically unsaturated monomer having at least one carboxylic anhydride may be maleic anhydride or methyl fumaric anhydride.

The aforementioned ethylenically unsaturated monomer (c-1-2) having at least one carboxylic acid or carboxylic anhydride may be used alone or in combination.

Based on an ethylenically unsaturated monomer (c-1-1) having a structure represented by the formula (I-1) and an ethylenically unsaturated monomer having at least one carboxylic acid or carboxylic anhydride And the monomer (c-1-2), and other copolymerizable ethylenically unsaturated monomers (c-1-3) described below are used in a total amount of 100 parts by weight, which has at least one carboxylic acid or carboxylic anhydride The use amount of the ethylenically unsaturated monomer (c-1-2) is 5 to 40 parts by weight, preferably 10 to 35 parts by weight, and more preferably 15 to 30 parts by weight.

Other copolymerizable ethylenically unsaturated monomers (c-1-3)

Other copolymerizable ethylenically unsaturated monomers (c-1-3) may include, but are not limited to, alkyl (meth) acrylate, cycloaliphatic (meth) acrylate, and aryl (meth) acrylate , An unsaturated dicarboxylic acid ester, a hydroxyalkyl (meth) acrylate, a polyether having a (meth) acrylate group, a styrene compound, or an unsaturated compound other than the above compounds.

The aforementioned alkyl (meth) acrylate may include, but is not limited to, methyl (meth) acrylate, ethyl (meth) acrylate, n-propyl (meth) acrylate, isopropyl (meth) acrylate, ( N-butyl methacrylate, isobutyl (meth) acrylate, second butyl (meth) acrylate, third butyl (meth) acrylate, and the like.

The aforementioned alicyclic (meth) acrylate may include, but is not limited to, cyclohexyl (meth) acrylate, 2-methylcyclohexyl (meth) acrylate, and dicyclopentyl (meth) acrylate {or, Tricyclo [5.2.1.0 ^2,6 ] dec-8-yl (meth) acrylate}, dicyclopentyloxyethyl (meth) acrylate, isobornyl (meth) acrylate or (meth) acrylic acid Tetrahydrofuran ester.

The aforementioned aryl (meth) acrylate may include, but is not limited to, phenyl (meth) acrylate, benzyl methacrylate, and the like.

The aforementioned unsaturated dicarboxylic acid ester may include, but is not limited to, diethyl maleate, diethyl fumarate, diethyl itaconic acid, and the like.

The aforementioned hydroxyalkyl (meth) acrylate may include, but is not limited to, 2-hydroxyethyl (meth) acrylate or 2-hydroxypropyl (meth) acrylate, and the like.

The aforementioned polyether having a (meth) acrylate group may include, but is not limited to, polyethylene glycol mono (meth) acrylate, polypropylene glycol mono (meth) acrylate, and the like.

The aforementioned styrenic compound may include, but is not limited to, styrene, α-methylstyrene, m-methylstyrene, p-methylstyrene, or p-methoxystyrene.

Unsaturated compounds other than the aforementioned compounds may include, but are not limited to, acrylonitrile, methacrylonitrile, vinyl chloride, vinylidene chloride, acrylamide, methacrylamide, vinyl ethyl ester, 1,3-butadiene, Isoprene, 2,3-dimethyl 1,3-butadiene, N-butanediimino-3-maleimide benzoate, N-butadiene imino- 4-maleimide iminobutyrate, N-butanediimide imino-6-maleimide iminohexanoate, N-butamidine imino-3-maleimide propionate , N- (9-acridyl) maleimide, N-octylmaleimide, N-cyclohexylmaleimide, or N-phenyl Maleimide (N-phenylmaleimide) and the like.

The other copolymerizable ethylenically unsaturated monomers (c-1-3) may be used singly or in combination.

Preferably, the other copolymerizable ethylenically unsaturated monomer (c-1-3) is selected from methyl (meth) acrylate, butyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, third butyl (meth) acrylate, benzyl (meth) acrylate, dicyclopentyl (meth) acrylate, isobornyl methacrylate, (methyl ) Dicyclopentyloxyethyl acrylate, styrene, p-methoxystyrene, or any combination of the foregoing.

Based on an ethylenically unsaturated monomer (c-1-1) having a structure represented by the formula (I-1), an ethylenically unsaturated monomer (c-1-2) having at least one carboxylic acid or carboxylic anhydride And other copolymerizable ethylenically unsaturated monomers (c-1-3) are used in a total amount of 100 parts by weight, and the other copolymerizable ethylenically unsaturated monomers (c-1-3) are used in amounts It is 10 to 90 parts by weight, preferably 20 to 80 parts by weight, and more preferably 30 to 70 parts by weight.

Ethylene unsaturated monomer with epoxy group (c-1-4)

The ethylenically unsaturated monomer (c-1-4) having an epoxy group may include, but is not limited to, a (meth) acrylate compound having an epoxy group, an α-alkyl acrylate compound having an epoxy group, or Glycidyl ether compounds and the like.

The aforementioned (meth) acrylate compound having an epoxy group may include, but is not limited to, glycidyl (meth) acrylate, 2-methylglycidyl (meth) acrylate, and (meth) acrylic acid 3,4 -Butylene oxide, 6,7-epoxyheptyl (meth) acrylate, 3,4-epoxycyclohexyl (meth) acrylate or 3,4-epoxycyclohexyl methyl (meth) acrylate Wait.

The aforementioned α-alkyl acrylate compound having an epoxy group may include, but is not limited to, α-ethyl acrylate, α-n-propyl propylene acrylate, α-n-butyl propylene acrylate, or α-ethylacrylic acid-6,7-epoxyheptyl ester and the like.

The aforementioned glycidyl ether compound may include, but is not limited to, o-vinylbenzylglycidyl ether, m-vinylbenzyl glycidylether, or p-vinylbenzyl glycidylether. Vinyl benzylglycidyl ether and the like.

The ethylenically unsaturated monomer (c-1-4) having an epoxy group may be used alone or in combination.

Preferably, the ethylenically unsaturated monomer (c-1-4) having an epoxy group is selected from the group consisting of glycidyl methacrylate, 2-methylglycidyl methacrylate, and methacrylic acid 3,4-epoxycyclohexyl methyl ester, 6,7-epoxyheptyl methacrylate, o-vinyl benzyl glycidyl ether, m-vinyl benzyl glycidyl ether, p-ethylene Benzyl Glycidyl Ether or any combination thereof.

Based on an ethylenically unsaturated monomer (c-1-1) having a structure represented by the formula (I-1), an ethylenically unsaturated monomer (c-1-2) having at least one carboxylic acid or carboxylic anhydride And other copolymerizable ethylenically unsaturated monomers (c-1-3) are used in a total amount of 100 parts by weight, and the amount of the epoxy-based ethylenically unsaturated monomers (c-1-4) is used It is 1 to 35 parts by weight, preferably 3 to 30 parts by weight, and more preferably 5 to 25 parts by weight.

In one embodiment, the first alkali-soluble resin (C-1) is an ethylenically unsaturated monomer (c-1-1) having a structure as shown in Formula (I-1), having at least one The carboxylic acid or carboxylic anhydride ethylenically unsaturated monomer (c-1-2) and other copolymerizable ethylenically unsaturated monomer (c-1-3) undergo a double bond copolymerization reaction to form a polymer Where the side chain of this polymer has There are carboxylic acid groups. Then, the carboxylic acid group in the side chain of the polymer is subjected to an addition reaction with an ethylenically unsaturated monomer (c-1-4) having an epoxy group to prepare the first alkali-soluble resin (C-1 ).

In another embodiment, the first alkali-soluble resin (C-1) is an ethylenically unsaturated monomer (c-1-1) having a structure as shown in Formula (I-1), other The copolymerized ethylenically unsaturated monomer (c-1-3) and the ethylenically unsaturated monomer (c-1-4) having an epoxy group undergo a double bond copolymerization reaction to form a polymer, wherein The side chain of the polymer has an epoxy group. Then, an epoxy group in a side chain of the polymer is subjected to an addition reaction with an ethylenically unsaturated monomer (c-1-2) having at least one carboxylic acid or carboxylic anhydride to prepare the first alkali-soluble resin. (C-1).

In yet another embodiment, the first alkali-soluble resin (C-1) is an ethylenically unsaturated monomer (c-1-1) having a structure as shown in Formula (I-1), other The copolymerized ethylenically unsaturated monomer (c-1-3) and the ethylenically unsaturated monomer (c-1-4) having an epoxy group undergo a double bond copolymerization reaction to form a polymer, wherein The side chain of the polymer has an epoxy group. Then, an epoxy group in a side chain of the polymer is subjected to an addition reaction with an ethylenically unsaturated monomer (c-1-2) having at least one carboxylic acid or carboxylic anhydride, and then half-esterified with an acid anhydride compound Chemical reaction to obtain the first alkali-soluble resin (C-1).

The weight average molecular weight of the obtained first alkali-soluble resin (C-1) measured by a gel permeation chromatography (GPC) in terms of polystyrene is generally 1,000 to 35,000, preferably 3,000 to 30,000 And more preferably 5,000 to 25,000.

Based on the total use amount of the alkali-soluble resin (C) being 100 parts by weight, the use amount of the first alkali-soluble resin (C-1) is 10 to 100 parts by weight, preferably 15 to 90 parts by weight, and More preferably, it is 20 parts by weight to 80 parts by weight.

Second alkali soluble resin (C-2)

The alkali-soluble resin (C) of the present invention may optionally include a second alkali-soluble resin (C-2). The second alkali-soluble resin (C-2) can be prepared by polymerizing a second mixture, and the second mixture includes an epoxy compound (c-2-1) having at least two epoxy groups and at least one carboxyl group. Compound (c-2-2) having an acid group and at least one ethylenically unsaturated group. In addition, the second mixture may optionally include a carboxylic anhydride compound (c-2-3) and / or a compound (c-2-4) having an epoxy group.

Epoxy compound (c-2-1) having at least two epoxy groups

The epoxy compound (c-2-1) having at least two epoxy groups may have a structure represented by the following formula (III) or formula (IV). Among them, the description of "the epoxy compound (c-2-1) may have a structure represented by the following formula (III) or formula (IV)" also covers a compound having a structure represented by the following formula (III) and a compound having the following In the case where a compound having a structure represented by the formula (IV) coexists as an epoxy compound (c-2-1). Specifically, the aforementioned epoxy compound (c-2-1) having at least two epoxy groups has a structure represented by the following formula (III), for example:

In formula (III), B ₁ , B ₂ , B _3, and B ₄ are the same or different, and B ₁ , B ₂ , B _3, and B ₄ each represent a hydrogen atom, a halogen atom, and a carbon number of 1 to 5 An alkyl group, an alkoxy group having 1 to 5 carbons, an aromatic group having 6 to 12 carbons, or an aralkyl group having 6 to 12 carbons.

The epoxy compound (c-2-1) having at least two epoxy groups having a structure as shown in formula (III) may include reacting a bisphenol fluorene compound with an epihalohydrin The obtained epoxy-containing bisphenol amidine type compound is not limited thereto.

Specific examples of the bisphenol hydrazone compound may include, but are not limited to, 9,9-bis (4-hydroxyphenyl) fluorene [9,9-bis (4-hydroxyphenyl) fluorene], 9,9-bis (4-hydroxy -3-methylphenyl) fluorene [9,9-bis (4-hydroxy-3-methylphenyl) fluorene], 9,9-bis (4-hydroxy-3-chlorophenyl) fluorene [9,9-bis (4-hydroxy-3-chlorophenyl) fluorene], 9,9-bis (4-hydroxy-3-bromophenyl) fluorene [9,9-bis (4-hydroxy-3-bromophenyl) fluorene], 9,9 -Bis (4-hydroxy-3-fluorophenyl) fluorene [9,9-bis (4-hydroxy-3-fluorophenyl) fluorene], 9,9-bis (4-hydroxy-3-methoxyphenyl)芴 [9,9-bis (4-hydroxy-3-methoxyphenyl) fluorene], 9,9-bis (4-hydroxy-3,5-dimethylphenyl) 芴 [9,9-bis (4-hydroxy -3,5-dimethylphenyl) fluorene], 9,9-bis (4-hydroxy-3,5-dichlorophenyl) fluorene [9,9-bis (4-hydroxy-3,5-dichlorophenyl) fluorene] or 9,9-bis (4-hydroxy-3,5-dibromophenyl) fluorene [9,9-bis (4-hydroxy-3,5-dibromophenyl) fluorene] and other compounds.

Specific examples of the aforementioned halogenated propylene oxide (epihalohydrin) may include, but are not limited to, 3-chloro-1,2-propylene oxide (epichlorohydrin) or 3-bromo-1,2-propylene oxide (epibromohydrin).

The epoxy-containing bisphenol fluorene type compound prepared by the reaction of a bisphenol fluorene type compound and a halogenated propylene oxide may include, but is not limited to: (1) Nippon Steel Chemical Co., Ltd. Manufactured goods, and its model is ESF-300, etc .; (2) Goods manufactured by Osaka Gas Co., Ltd, and its model is PG-100 or EG-210, etc .; (3) SMS technology ( SMS Technology Co., Ltd), and its model is SMS-F9PhPG, SMS-F9CrG, SMS-F914PG, etc.

In formula (IV), B ₅ to B ₁₈ are the same or different, B ₅ to B ₁₈ are a hydrogen atom, a halogen atom, an alkyl group having 1 to 8 carbon atoms, or an aromatic group having 6 to 15 carbon atoms, And a represents an integer from 0 to 10.

The epoxy compound (c-2-1) having at least two epoxy groups as shown in formula (IV) can be obtained, for example, by having the following formula (IV-1) in the presence of an alkali metal hydroxide. The compound of the structure shown is reacted with a halogenated propylene oxide to obtain:

In formula (IV-1), the definitions of B ₅ to B ₁₈ are as described above, and will not be repeated here.

In addition, the epoxy compound (c-2-1) having at least two epoxy groups as shown in the formula (IV) may be, for example, in the presence of an acid catalyst, using a compound having the following formula (IV-2) The compound having the structure shown is subjected to a condensation reaction with phenols to form a compound having a structure represented by the formula (IV-1). Next, an excess of halogenated propylene oxide is added to perform a dehydrohalogenation reaction to obtain an epoxy compound (c-2-1) having at least two epoxy groups in a structure shown in formula (IV). :

In formula (IV-2), the definitions of B ₇ to B ₁₀ are as described above, and are not repeated here. B ₁₉ and B ₂₀ each independently represent a halogen atom, an alkyl group having 1 to 6 carbon atoms, or an alkoxy group having 1 to 6 carbon atoms.

Preferably, the halogen atom may be, for example, a chlorine atom or a bromine atom; the alkyl group may be, for example, a methyl group, an ethyl group, or a third butyl group; and the alkoxy group may be, for example, a methoxy group or an ethoxy group.

Specific examples of the aforementioned phenols may include, but are not limited to, phenol, cresol, ethylphenol, n-propylphenol, isobutylphenol, and t-butylphenol (t-butylphenol), octylphenol, nonylphenol, xylenol, methyl butylphenol, di-t-butylphenol, ethylene Phenol (vinylphenol), propenylphenol, ethinylphenol, cyclopentylphenol, cyclohexylphenol or cyclohexyl cresol, etc. These phenols may be used alone or in combination.

The amount of the compound based on the aforementioned structure having the formula (IV-2) is 1 mole, and the amount of the phenols is 0.5 to 20 moles, and preferably 2 to 15 moles.

Specific examples of the acid catalyst may include hydrochloric acid, sulfuric acid, p-toluenesulfonic acid, oxalic acid, boron trifluoride, aluminum chloride anhydrous, or chlorine. Zinc chloride, etc. The acid catalyst may preferably be p-toluenesulfonic acid, sulfuric acid, hydrochloric acid, or any combination thereof. The acid catalyst may be used alone or in combination.

Although the use amount of the acid catalyst is not particularly limited, based on the use amount of the compound having the structure represented by the formula (IV-2) is 100% by weight, the use amount of the acid catalyst is preferably 0.1% by weight. Percent to 30 weight percent.

The aforementioned condensation reaction can be performed without a solvent or in the presence of an organic solvent. Specific examples of the organic solvent may include, but are not limited to, toluene, xylene, or methyl isobutyl ketone. isobutyl ketone) and so on. These organic solvents may be used singly or in combination.

Based on the foregoing, the total amount of the compound and phenols having the structure represented by the formula (IV-2) is 100% by weight, and the amount of the organic solvent is 50% to 300% by weight, and preferably 100% by weight To 250 weight percent. The operation temperature of the aforementioned condensation reaction may be 40 ° C to 180 ° C, and the operation time may be 1 hour to 8 hours.

After the condensation reaction is performed, a neutralization treatment or a water washing treatment may be further performed.

The neutralization treatment adjusts the pH value of the solution after the reaction to 3 to 7, and preferably 5 to 7.

The water washing treatment can be performed using a neutralizing agent, and the neutralizing agent is an alkaline substance. Specific examples of the neutralizing agent may include, but are not limited to, alkali metal hydroxides such as sodium hydroxide or potassium hydroxide; calcium hydroxide or magnesium hydroxide Alkaline earth metal hydroxides, etc .; organic amines such as diethylene triamine, triethylenetetramine, aniline or phenylene diamine; ammonia (ammonia), Sodium dihydrogen phosphate or any combination thereof. This neutralizing agent can be used individually or in mixture of multiple types.

This water washing treatment can be performed by a conventional method. For example, an aqueous solution with a neutralizing agent is added to the solution after the reaction, and extraction is performed repeatedly. After neutralization treatment or water washing treatment, The reacted phenols and solvents are concentrated to obtain a compound having a structure represented by formula (IV-1).

Specific examples of the halogenated propylene oxide may include, but are not limited to, 3-chloro-1,2-epoxypropane, 3-bromo-1,2-epoxypropane (3- bromo-1,2-epoxypropane) or any combination thereof.

Before carrying out the above-mentioned dehydrohalogenation reaction, an alkali metal hydroxide such as sodium hydroxide or potassium hydroxide may be added in advance or during the reaction.

The operation temperature of the above-mentioned dehydrohalogenation reaction may be 20 ° C to 120 ° C, and the operation time thereof may be 1 hour to 10 hours.

The alkali metal hydroxide added in the dehydrohalogenation reaction may be an alkali metal hydroxide aqueous solution. In this embodiment, the alkali metal hydroxide aqueous solution is continuously added to the dehydrohalogenation reaction system, and water and halogenated propylene oxide are continuously distilled off under reduced or normal pressure to separate and remove water. The halogenated propylene oxide system was continuously refluxed into the reaction system.

Before carrying out the above-mentioned dehydrohalogenation reaction, tetramethyl ammonium chloride, tetramethyl ammonium bromide or trimethyl benzyl ammonium chloride can be added to the reaction system. The quaternary ammonium salt acts as a catalyst. After reacting at 50 ° C to 150 ° C for 1 hour to 5 hours, an alkali metal hydroxide or an aqueous solution thereof is added. Next, a dehydrohalogenation reaction is performed at a temperature of 20 ° C to 120 ° C for 1 hour to 10 hours.

Based on the total equivalents of hydroxyl groups in the aforementioned compound having the structure represented by formula (IV-1) is 1 equivalent, the amount of the halogenated propylene oxide used may be 1 to 20 equivalents, and preferably 2 to 10 equivalents equivalent.

Based on the total equivalents of the hydroxyl groups in the aforementioned compound having the structure represented by the formula (IV-1) is 1 equivalent, the use amount of the alkali metal hydroxide added in the dehydrohalogenation reaction may be 0.8 equivalent to 15 equivalents, and It may preferably be 0.9 to 11 equivalents.

In addition, in order to make the dehydrohalogenation reaction proceed smoothly, an alcohol such as methanol or ethanol may be added to the reaction system. Second, the reaction system can also add aprotic polar solvents such as dimethyl sulfone or dimethyl sulfoxide for reaction.

In the case of using alcohols, based on the total usage of the aforementioned halogenated propylene oxide is 100% by weight, the usage of the alcohols may be 2 to 20% by weight, and preferably 4 to 15% by weight percentage.

In the case of using an aprotic polar solvent, based on the total amount of halogenated propylene oxide used, 100% by weight, the amount of aprotic polar solvent used is 5 to 100% by weight, and preferably 10 to 100% by weight 90 weight percent.

After the dehydrohalogenation reaction, the product can be optionally washed with water, and halogenated propylene oxide, alcohols, and aprotic polar solvents can be removed by distillation under reduced pressure. This vacuum distillation can be performed at a temperature of 110 ° C to 250 ° C and a pressure of 1.3 kPa [10 millimeters of mercury (mmHg)] or less.

In order to avoid the hydrolyzable halogen of the prepared epoxy resin, the solution after the dehydrohalogenation reaction can be added to a solvent such as toluene or methyl isobutyl ketone, and sodium hydroxide or hydroxide In an aqueous alkali metal hydroxide solution such as potassium, dehydrohalogenation is performed again.

In the dehydrohalogenation reaction, based on the total equivalents of the hydroxyl groups in the compound having the structure represented by the formula (IV-1) is 1 equivalent, the amount of the alkali metal hydroxide used may be 0.01 mol to 0.3 mol And, preferably, it is 0.05 mol to 0.2 mol. Secondly, the operation temperature of the aforementioned dehydrohalogenation reaction may be 50 ° C to 120 ° C, and the operation time thereof may be 0.5 hour to 2 hours.

After the dehydrohalogenation reaction is completed, the salts can be removed by steps such as filtration and water washing, and the solvent such as toluene or methyl isobutyl ketone can be removed by means of distillation under reduced pressure to obtain a compound having the formula (IV) The compound of the structure shown.

The aforementioned epoxy compound (c-2-1) having at least two epoxy groups as shown in the formula (IV) may include, but is not limited to, products manufactured by Nippon Kayaku Co. Ltd., and Models are NC-3000, NC-3000H, NC-3000S or NC-3000P.

Compound (c-2-2) having at least one carboxylic acid group and at least one ethylenically unsaturated group

The aforementioned compound (c-2-2) having at least one carboxylic acid group and at least one ethylenically unsaturated group may be selected from the group consisting of (1) to (3): (1) acrylic acid, methyl Acrylic acid, 2-methacryloyloxyethylbutanedioic acid, 2-methacryloyloxyethylbutanedioic acid, 2-methacryloyloxyethylbutanedioic acid, 2-methacryloyloxyethyl adipic acid base Acrylic acid oxybutyl adipic acid, 2-methacrylic acid oxyethyl hexahydrophthalic acid, 2-methacrylic acid oxyethyl maleic acid, 2-methacrylic acid oxypropyl maleic acid , 2-methacrylic acid oxobutyl maleic acid, 2-methacrylic acid oxopropyl succinic acid, 2-methacrylic acid oxypropyl adipic acid, 2-methacrylic acid oxypropyl tetracarboxylic acid Hydrophthalic acid, 2-methacrylic acid oxypropyl phthalic acid, 2-methacrylic acid oxybutyl phthalic acid, or 2-methacrylic acid oxybutyl phthalic acid; (2) A compound prepared by reacting a (meth) acrylate having a hydroxyl group with a dicarboxylic acid compound, wherein the dicarboxylic acid compound may include, but is not limited to, adipic acid, succinic acid, maleic acid, or Phthalic acid; (3) a half-ester compound prepared by reacting a (meth) acrylate having a hydroxyl group with a carboxylic anhydride compound, wherein the (meth) acrylate having a hydroxyl group may include, but is not limited to, 2-hydroxyethyl Acrylate [(2-hydroxyethyl) acrylate], 2-hydroxyethyl methacrylate [(2-hydroxyethyl) methacrylate], 2-hydroxypropyl acrylate [(2-hydroxypropyl) acrylate], 2-hydroxy [(2-hydroxypropyl) methacrylate], 4-hydroxybutyl acrylate [(4-hydroxybutyl) acrylate], 4-hydroxybutyl methacrylate [(4-hydroxybutyl) methacrylate], or pentaerythritol trimethyl Acrylate, etc. The carboxylic acid anhydride compound may be the same as the carboxylic acid anhydride compound (c-2-3) contained in the second mixture described later, so it will not be repeated here.

Carboxylic anhydride compound (c-2-3)

The aforementioned second mixture may optionally include a carboxylic anhydride compound (-c-2-3) and / or a compound (c-2-4) having an epoxy group.

The above carboxylic anhydride compound (c-2-3) may be selected from the group consisting of (1) to (2): (1) succinic anhydride (butanedioic anhydride), maleic anhydride, itaconic anhydride, phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride (hexahydrophthalic anhydride), methyl tetrahydrophthalic anhydride, methylhexahydrophthalic anhydride, methyl endo-methylene tetrahydro phthalic anhydride, chloramphenicol Dicarboxylic acid anhydride compounds such as chlorendic anhydride, glutaric anhydride or 1,3-dioxoisobenzofuran-5-carboxylic anhydride; and (2) benzophenone tetracarboxylic dianhydride , Abbreviated as BTDA), tetracarboxylic dianhydride or diphenyltetracarboxylic dianhydride and other tetracarboxylic carboxylic anhydride compounds.

Compound with epoxy group (c-2-4)

The compound (c-2-4) having an epoxy group may be, for example, selected from glycidyl methacrylate, 3,4-epoxy cyclohexyl methacrylate, and glycidyl ether having an unsaturated group. A group of compounds, unsaturated compounds having epoxy groups, or any combination of the foregoing.

The aforementioned glycidyl ether compound having an unsaturated group may include, but is not limited to, products manufactured by Nagase Chemical Industry Co., Ltd. and the models are Denacol EX-111, EX-121 Denacol, Denacol EX-141, Denacol EX-145, Denacol EX-146, Denacol EX-171 or Denacol EX-192, etc.

In one embodiment, the second alkali-soluble resin (C-2) may be an epoxy compound (c-2-1) having at least two epoxy groups and at least one carboxylic acid as shown in formula (III). Group and at least one ethylenically unsaturated compound (c-2-2) are polymerized to form a reaction product having a hydroxyl group. Next, a carboxylic anhydride compound (c-2-3) was added and reacted. Based on the total hydroxyl equivalent of the reaction product having a hydroxyl group, the equivalent is 1 equivalent, and the equivalent of the acid anhydride group contained in the carboxylic anhydride compound (c-2-3) is preferably 0.4 equivalent to 1 equivalent, and more preferably 0.75 equivalent to 1 equivalent. . When a plurality of carboxylic anhydride compounds (c-2-3) are used, they can be added sequentially or simultaneously during the reaction. When a dicarboxylic acid anhydride compound and a tetracarboxylic acid anhydride compound are used as the carboxylic acid anhydride compound (c-2-3), the molar ratio of the dicarboxylic acid anhydride compound and the tetracarboxylic acid anhydride compound is preferably 1/99 to 90 / 10, and more preferably 5/95 to 80/20. Second, the operating temperature of the above reaction may be, for example, 50 ° C to 130 ° C.

In another embodiment, the second alkali-soluble resin (C-2) may be an epoxy compound (c-2-1) having at least two epoxy groups and at least one carboxyl group as shown in formula (IV). The acid group and at least one ethylenically unsaturated compound (c-2-2) are reacted to form a hydroxyl-containing reaction product. Next, a polymerization reaction is performed by adding a carboxylic anhydride compound (c-2-3) and / or a compound (c-2-4) having an epoxy group. Based on the total epoxy group equivalent of the epoxy compound (c-2-1) having at least two epoxy groups as shown in formula (IV) is 1 equivalent, the epoxy compound having at least one carboxylic acid group and at least one ethylenic compound The acid value equivalent of the saturated compound (c-2-2) is preferably 0.8 equivalents to 1.5 equivalents, and more preferably 0.9 equivalents to 1.1 equivalents. The total amount of hydroxyl groups based on the above-mentioned reaction product having hydroxyl groups is 100 mole percent (mole%), and the amount of carboxylic anhydride compound (c-2-3) used It is 10 mol% to 100 mol%, preferably 20 mol% to 100 mol%, and more preferably 30 mol% to 100 mol%.

When preparing the aforementioned second alkali-soluble resin (C-2), in order to accelerate the reaction, a basic compound is usually added to the reaction solution as a reaction catalyst. The reaction catalyst may be used singly or in combination. The reaction catalyst may include, but is not limited to, triphenyl phosphine, triphenyl stibine, triethylamine, triethylamine. Ethanolamine (triethanolamine), tetramethylammonium chloride (benzyltriethylammonium chloride) and the like. The total amount of the epoxy compound (c-2-1) having at least two epoxy groups and the compound (c-2-2) having at least one carboxylic acid group and at least one ethylenically unsaturated group is 100. The use amount of the reaction catalyst is preferably 0.01 to 10 parts by weight, and more preferably 0.3 to 5 parts by weight.

In addition, in order to control the degree of polymerization, a polymerization inhibitor is usually added to the reaction solution. The polymerization inhibitor may include, but is not limited to, methoxyphenol, methylhydroquinone, hydroquinone, 2,6-di-tert-butyl-p-cresol (2,6-di- t-butyl-p-cresol) or phenothiazine. In general, the above-mentioned polymerization inhibitors can be used singly or in combination. Based on the total amount of the epoxy compound (c-2-1) having at least two epoxy groups and the compound (c-2-2) having at least one carboxylic acid group and at least one ethylenically unsaturated group, 100 is used. Parts by weight, poly The combined inhibitor is preferably used in an amount of 0.01 to 10 parts by weight, and more preferably 0.1 to 5 parts by weight.

When the second alkali-soluble resin (C-2) is prepared, a polymerization reaction solvent may be added if necessary. Specific examples of the polymerization reaction solvent may include, but are not limited to, alcohol compounds such as ethanol, propanol, isopropanol, butanol, isobutanol, 2-butanol, hexanol, or ethylene glycol; methyl ethyl ketone or cyclohexanone, and the like Ketones; aromatic hydrocarbons such as toluene or xylene; cellosolve or butyl cellosolve; carbitol or butyl carbitol (butyl carbitol) and other carbitol compounds; propylene glycol monomethyl ether (propylene glycol monomethyl ether) and other propylene glycol alkyl ether compounds; dipropylene glycol monomethyl ether [di (propylene glycol) methyl ether] and other propylene glycol alkyl ethers [ poly (propylene glycol) alkyl ether]; acetate compounds such as ethyl acetate, butyl acetate, ethylene glycol monoethyl ether acetate, or propylene glycol methyl ether acetate ; Alkyl lactate compounds such as ethyl lactate or butyl lactate; or dialkyl glycol ethers. This polymerization reaction solvent may be used individually or in mixture of multiple types. In addition, the acid value of the second alkali-soluble resin (C-2) is preferably 50 mgKOH / g to 200 mgKOH / g, and more preferably 60 mgKOH / g to 150 mgKOH / g.

The polystyrene-equivalent number average molecular weight of the aforementioned second alkali-soluble resin (C-2) measured by a colloidal permeation chromatography is generally 500 to 10,000, preferably 800 to 8000, and more preferably 1000 to 6000.

Based on the total use amount of the alkali-soluble resin (C) is 100 parts by weight, and the use amount of the second alkali-soluble resin (C-2) is 0 to 90 parts by weight, preferably 10 to 85 parts by weight, and More preferably, it is 20 parts by weight to 80 parts by weight.

When the alkali-soluble resin (C) contains the second alkali-soluble resin (C-2), the obtained photosensitive resin composition for a color filter is less likely to have bubble-like display defects.

Compound (D) with ethylenically unsaturated group

The compound (D) having an ethylenically unsaturated group of the present invention may include an unsaturated compound having at least one ethylenically unsaturated group and an unsaturated compound having at least two ethylenically unsaturated groups.

Specific examples of the unsaturated compound having at least one ethylenically unsaturated group may include, but are not limited to, acrylamide, acrylamidomorpholine, methacrylamidomorpholine, acrylic-7-amino-3,7-dimethyl Octyl ester, methacrylic acid 7-amino-3,7-dimethyloctyl ester, isobutoxymethacrylamide, isobutoxymethylmethacrylamide, isobornyl acrylate Ethyl ester, isobornyloxyethyl methacrylate, isobornyl acrylate, isobornyl methacrylate, 2-ethylhexyl acrylate, 2-ethylhexyl methacrylate, ethyldiethylene glycol Acrylate, Ethyl Diethylene Glycol Methacrylate, Third Octyl Acrylamidoxamine, Third Octyl Methacrylamidine, Diacetone Acrylamidine, Diacetone Methacrylamidine, Dimethyamine Acrylate Ester, dimethylamino methacrylate, dodecyl acrylate, dodecyl methacrylate, dicyclopentenyloxyethyl acrylate, dicyclopentenyl ethyl methacrylate, dicyclopentyl acrylate Pentenyl, dicyclopentenyl methacrylate, nitrogen, nitrogen-dimethylacrylamide, nitrogen, nitrogen-dimethyl Methacrylamide, tetrachlorophenyl acrylate, tetrachlorophenyl methacrylate, 2-tetrachlorophenoxyethyl acrylate, 2-tetrachlorophenoxyethyl methacrylate, tetrahydrofurfuryl acrylate Ester, tetrahydrofurfuryl methacrylate, tetrabromophenyl acrylate, tetrabromophenyl methacrylate, 2-tetrabromophenoxyethyl acrylate, 2-tetrabromophenoxyethyl methacrylate, 2-trichlorophenoxyethyl acrylate, 2-trichlorophenoxyethyl methacrylate, tribromophenyl acrylate, tribromophenyl methacrylate, 2-tribromophenoxyethyl acrylate Ester, 2-tribromophenoxyethyl methacrylate, 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl acrylate, 2-hydroxypropyl methacrylate Esters, vinyl caprolactam, nitrogen-vinyl sheathinones, phenoxyethyl acrylate, phenoxyethyl methacrylate, pentachlorophenyl acrylate, pentachlorophenyl methacrylate, pentachloroacrylate Bromophenyl, Pentabromophenyl methacrylate, Polyethylene glycol monoacrylate, Polyethylene glycol monomethacrylate, Polypropylene glycol monoacrylate, Polypropylene dimethacrylate Alcohol esters, norbornyl acrylate, or bornyl methacrylate. The unsaturated compound having at least one ethylenically unsaturated group may be used alone or in combination.

Specific examples of the unsaturated compound having at least two ethylenically unsaturated groups may include, but are not limited to, ethylene glycol diacrylate, ethylene glycol dimethacrylate, dicyclopentenyl diacrylate, and dimethacrylic acid. Dicyclopentenyl ester, triethylene glycol diacrylate, tetraethylene glycol diacrylate, tetraethylene glycol dimethacrylate, tris (2-hydroxyethyl) isocyanate diacrylate, tris (2-hydroxyethyl) Isocyanate dimethacrylate, tris (2-hydroxyethyl) isocyanate triacrylate, tris (2-hydroxyethyl) isocyanate trimethacrylate, caprolactone modified tris (2-hydroxyethyl) isocyanate Modification of triacrylate and caprolactone three (2-hydroxyethyl) isocyanate trimethacrylate, trimethylol propyl triacrylate, trimethylol propyl trimethacrylate, ethylene oxide (hereinafter referred to as EO) modified trihydroxy triacrylate Methyl propyl, EO modified trimethylol propyl trimethacrylate, propylene oxide (hereinafter referred to as PO) modified trimethylol propyl triacrylate, PO modified trimethyl methacrylate Methyl propyl ester, triethylene glycol diacrylate, triethylene glycol dimethacrylate, neopentyl glycol diacrylate, neopentyl glycol dimethacrylate, 1,4-butanediol diacrylate, 1,4-butanediol dimethacrylate, 1,6-hexanediol diacrylate, 1,6-hexanediol dimethacrylate, pentaerythritol triacrylate, pentaerythritol trimethacrylate, pentaerythritol Tetraacrylate, pentaerythritol tetramethacrylate, polyester diacrylate, polyester dimethacrylate, polyethylene glycol diacrylate, polyethylene glycol dimethacrylate, dipentaerythritol hexaacrylate hexaacrylate (DPHA), dipentaerythritol hexamethacrylate, dipentaerythritol Pentaacrylate, dipentaerythritol pentamethacrylate, dipentaerythritol tetraacrylate, dipentaerythritol tetramethacrylate, caprolactone modified dipentaerythritol hexaacrylate, caprolactone modified dipentaerythritol hexamethacrylic acid Esters, dipentaerythritol pentaacrylate modified by caprolactone, dipentaerythritol pentamethacrylate modified by caprolactone, ditrimethylolpropane tetraacrylate, ditrimethylolpropane tetramethacrylate, EO modified bisphenol A diacrylate, EO modified bisphenol A dimethacrylate, PO modified bisphenol A diacrylate, PO modified bisphenol A dimethacrylate, EO modified Modified hydrogenated bisphenol A diacrylate, EO modified hydrogenated bisphenol A dimethacrylate, PO modified hydrogenated bisphenol A diacrylate, PO modified hydrogenated bisphenol A dimethacrylate, PO modified glycerin Tripropionate, EO-modified bisphenol F diacrylate, EO-modified bisphenol F dimethacrylate, phenolic polyglycidyl ether acrylate, phenolic polyglycidyl ether methacrylate, Japan East Asia Synthesis A product manufactured by Japan Co., Ltd. under the model number TO-1382, or a product manufactured by Nippon Kayaku Co., Ltd. and having the model numbers KAYARAD DPCA-20, KAYARAD DPCA-30, KAYARAD DPCA-60, or KAYARAD DPCA-120. The unsaturated compound having at least two ethylenically unsaturated groups may be used alone or in combination.

Preferably, the compound (D) having an ethylenically unsaturated group is selected from the group consisting of trimethylolpropyl triacrylate, trimethylolpropyl triacrylate modified by EO, and trihydroxymethyltriacrylate modified by PO. Methylpropyl ester, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol hexaacrylate, dipentaerythritol pentaacrylate, dipentaerythritol tetraacrylate, caprolactone modified dipentaerythritol hexaacrylate, tetraacrylate ditrihydroxyol Methylpropyl ester, PO modified glycerol tripropionate, KAYARAD DPCA-20, KAYARAD DPCA-30, KAYARAD DPCA-60 or KAYARAD DPCA-120 or any combination of the above compounds.

The compound (D) having an ethylenically unsaturated group may be used alone or in combination.

Based on the total amount of the alkali-soluble resin (C) used, 100 parts by weight, the amount of the ethylenically unsaturated compound (D) used is 20 to 200 parts by weight, preferably 30 to 180 parts by weight And more preferably 50 parts by weight to 150 parts by weight.

Photoinitiator (E)

The photoinitiator (E) of the present invention may include a photoinitiator (E-1) having a structure represented by the following formula (II). Second, the photo-initiator (E) may optionally include other free-radical photo-initiators (E-2).

Photoinitiator (E-1)

The photoinitiator (E-1) may have a structure represented by the following formula (II):

、COR₁₆、OR₁₇、鹵素、 NO₂或

，或R₁及R₂、R₂及R₃、R₃及R₄、R₅ 及R₆、R₆及R₇或R₇及R₈彼此獨立地為經

取代之C₂-C₁₀烯基或R₁及R₂、R₂及R₃、R₃及R₄、R₅及R₆、R₆及R₇或R₇及R₈彼此獨立地共同為-(CH₂)_P-Y-(CH₂)_q-；或R₁及R₂、R₂及R₃、R₃及R₄、R₅及R₆、R₆及R₇或R₇ 及R₈彼此獨立地共同為

；但條件為R₁及R₂、R₂及R₃、R₃及R₄、R₅及R₆、R₆及 R₇或R₇及R₈中至少一對係

R₉、R₁₀、R₁₁及R₁₂彼此獨立地為氫、C₁-C₂₀烷基，該C₁-C₂₀烷基未經取代或經一或多個以下基團取代：鹵素、 苯基、CN、OH、SH、C₁-C₄-烷氧基、(CO)OH或(CO)O(C₁-C₄烷基)；或R₉、R₁₀、R₁₁及R₁₂彼此獨立地為未經取代之苯基或經一或多個以下基團取代之苯基：C₁-C₆烷基、鹵素、CN、OR₁₇、SR₁₈或NR₁₉R₂₀；或R₉、R₁₀、R₁₁及R₁₂彼此獨立地為鹵素、CN、OR₁₇、SR₁₈、SOR₁₈、SO₂R₁₈或NR₁₉R₂₀，其中該等取代基OR₁₇、SR₁₈或NR₁₉R₂₀視情況經由基團R₁₇、R₁₈、R₁₉及/或R₂₀與萘基環中一個碳原子形成5員或6員環； 或R₉、R₁₀、R₁₁及R₁₂彼此獨立地為

、COR₁₆或NO₂；Y係O、S、NR₂₆或直接鍵；p係整數0、1、2或3；q係整數1、2或3；X係CO或直接鍵；R₁₃係C₁-C₂₀烷基，其未經取代或經一或多個以下基團取代：鹵素、R₁₇、COOR₁₇、OR₁₇、SR₁₈、CONR₁₉R₂₀、NR₁₉R₂₀、PO(OC_kH_2k+1)₂或

；或R₁₃係C₂-C₂₀烷基，其間雜有一或多個O、S、SO、SO₂、NR₂₆或CO，或係C₂-C₁₂烯基，其未經間雜或間雜有一或多個O、CO或NR₂₆，其中經間雜之C₂-C₂₀烷基及未經間雜或經間雜之C₂-C₁₂烯基未經取代或經一或多個鹵素取代；或R₁₃係C₄-C₈環烯基、C₂-C₁₂炔基或未經間雜或間雜有一或多個O、S、CO或NR₂₆之C₃-C₁₀環烷基； 或R₁₃係苯基或萘基，其各未經取代或經一或多個以下基團取代：OR₁₇、SR₁₈、NR₁₉R₂₀、

、COR₁₆、CN、NO₂、鹵素、C₁-C₂₀烷基、C₁-C₄鹵代烷基、間雜有一或多個O、S、CO或NR₂₆之C₂-C₂₀烷基；或其各經C₃-C₁₀環烷基或間雜有一或多個O、S、CO或NR₂₆之C₃-C₁₀環烷基取代；k係整數1至10；R₁₄係氫、C₃-C₈環烷基、C₂-C₅烯基、C₁-C₂₀烷氧基或C₁-C₂₀烷基，其未經取代或經一或多個鹵素、苯基、C₁-C₂₀烷基苯基或CN取代；或R₁₄係苯基或萘基，其各未經取代或經一或多個以下基團取代：C₁-C₆烷基、C₁-C₄鹵代烷基、鹵素、CN、OR₁₇、SR₁₈及/或NR₁₉R₂₀；或R₁₄係C₃-C₂₀雜芳基、C₁-C₈烷氧基、苄氧基或苯氧基，該苄氧基及苯氧基未經取代或經一或多個C₁-C₆烷基、C₁-C₄鹵代烷基及/或鹵素取代；R₁₅係C₆-C₂₀芳基或C₃-C₂₀雜芳基，其各未經取代或經一或多個以下基團取代：苯基、鹵素、C₁-C₄鹵代烷基、CN、NO₂、OR₁₇、SR₁₈、NR₁₉R₂₀、PO(OC_kH_2k+1)₂、SO-C₁-C₁₀烷基、SO₂-C₁-C₁₀烷基、間雜有一或多個O、S或NR₂₆之C₂-C₂₀烷基；或其各經C₁-C₂₀烷基取代，該C₁-C₂₀烷基未經取代或經一或多個以下基團取代：鹵素、COOR₁₇、CONR₁₉R₂₀、苯基、C₃-C₈環烷基、C₃-C₂₀雜芳基、C₆-C₂₀芳氧基羰基、C₃-C₂₀雜芳氧基羰基、OR₁₇、SR₁₈或NR₁₉R₂₀；或R₁₅係氫、C₂-C₁₂烯基、未經間雜或間雜有一或多個O、CO或NR₂₆之C₃-C₈環烷基； 或R₁₅係C₁-C₂₀烷基，其未經取代或經一或多個以下基團取代：鹵素、OR₁₇、SR₁₈、C₃-C₈環烷基、C₃-C₂₀雜芳基、C₆-C₂₀芳氧基羰基、C₃-C₂₀雜芳氧基羰基、NR₁₉R₂₀、COOR₁₇、CONR₁₉R₂₀、PO(OC_kH_2k+1)₂、

、

、苯基；或該C₁-C₂₀烷基經苯基取代，該苯基經鹵素、C₁-C₂₀烷基、C₁-C₄鹵代烷基、OR₁₇、SR₁₈或NR₁₉R₂₀取代；或R₁₅係C₂-C₂₀烷基，其間雜有一或多個O、SO或SO₂，且該經間雜之C₂-C₂₀烷基未經取代或經一或多個以下基團取代：鹵素、OR₁₇、COOR₁₇、CONR₁₉R₂₀、苯基或經OR₁₇、SR₁₈或NR₁₉R₂₀取代之苯基；或R₁₅係C₂-C₂₀烷醯基或苯甲醯基，其未經取代或經一或多個以下基團取代：C₁-C₆烷基、鹵素、苯基、OR₁₇、SR₁₈或NR₁₉R₂₀；或R₁₅係未經取代或經一或多個OR₁₇取代之萘甲醯基或係C₃-C₁₄雜芳基羰基；或R₁₅係C₂-C₁₂烷氧基羰基，其未經間雜或間雜有一或多個O且該經間雜或未經間雜之C₂-C₁₂烷氧基羰基未經取代或經一或多個羥基取代；或R₁₅係苯氧基羰基，其未經取代或經一或多個以下基團取代：C₁-C₆烷基、鹵素、C₁-C₄鹵代烷基、苯基、OR₁₇、SR₁₈或NR₁₉R₂₀；或R₁₅係CN、CONR₁₉R₂₀、NO₂、C₁-C₄鹵代烷基、S(O)_m-C₁-C₆烷基、未經取代或經C₁-C₁₂烷基或SO₂-C₁-C₆烷基取代之S(O)_m-苯基； 或R₁₅係SO₂O-苯基，其未經取代或經C₁-C₁₂烷基取代；或係二苯基膦醯基或二(C₁-C₄烷氧基)-膦醯基；m係1或2；R’₁₄具有針對R₁₄所給出含義中之一者；R’₁₅具有針對R₁₅所給出含義中之一者；X₁係O、S、SO或SO₂；X₂係O、CO、S或直接鍵；R₁₆係C₆-C₂₀芳基或C₃-C₂₀雜芳基，其各未經取代或經一或多個以下基團取代：苯基、鹵素、C₁-C₄鹵代烷基、CN、NO₂、OR₁₇、SR₁₈、NR₁₉R₂₀或間雜有一或多個O、S或NR₂₆之C₁-C₂₀烷基；或其各經一或多個C₁-C₂₀烷基取代，該C₁-C₂₀烷基未經取代或經一或多個以下基團取代：鹵素、COOR₁₇、CONR₁₉R₂₀、苯基、C₃-C₈環烷基、C₃-C₂₀雜芳基、C₆-C₂₀芳氧基羰基、C₃-C₂₀雜芳氧基羰基、OR₁₇、SR₁₈或NR₁₉R₂₀；或R₁₆係氫、C₁-C₂₀烷基，該C₁-C₂₀烷基未經取代或經一或多個以下基團取代：鹵素、苯基、OH、SH、CN、C₃-C₆烯氧基、OCH₂CH₂CN、OCH₂CH₂(CO)O(C₁-C₄烷基)、O(CO)-(C₁-C₄烷基)、O(CO)-苯基、(CO)OH或(CO)O(C₁-C₄烷基)；或R₁₆係C₂-C₁₂烷基，其間雜有一或多個O、S或NR₂₆；或R₁₆係(CH₂CH₂O)_n+1H、(CH₂CH₂O)_n(CO)-(C₁-C₈烷基)、C₂-C₁₂烯基或C₃-C₈環烷基； 或R₁₆係經SR₁₈取代之苯基，其中基團R₁₈表示鍵結至其中附接有COR₁₆之咔唑部分之苯基或萘基環的直接鍵；n係1至20；R₁₇係氫、苯基-C₁-C₃烷基、C₁-C₂₀烷基，其未經取代或經一或多個以下基團取代：鹵素、OH、SH、CN、C₃-C₆烯氧基、OCH₂CH₂CN、OCH₂CH₂(CO)O(C₁-C₄烷基)、O(CO)-(C₁-C₄烷基)、O(CO)-(C₂-C₄烯基)、O(CO)-苯基、(CO)OH、(CO)O(C₁-C₄烷基)、C₃-C₂₀環烷基、SO₂-(C₁-C₄鹵代烷基)、O(C₁-C₄鹵代烷基)或間雜有一或多個O之C₃-C₂₀環烷基；或R₁₇係C₂-C₂₀烷基，其間雜有一或多個O、S或NR₂₆；或R₁₇係(CH₂CH₂O)_n+1H、(CH₂CH₂O)_n(CO)-(C₁-C₈烷基)、C₁-C₈烷醯基、C₂-C₁₂烯基、C₃-C₆烯醯基或未經間雜或間雜有一或多個O、S、CO或NR₂₆之C₃-C₂₀環烷基；或R₁₇係C₁-C₈烷基-C₃-C₁₀環烷基，其未經間雜或間雜有一或多個O；或R₁₇係苯甲醯基，其未經取代或經一或多個C₁-C₆烷基、鹵素、OH或C₁-C₃烷氧基取代；或R₁₇係苯基、萘基或C₃-C₂₀雜芳基，其各未經取代或經一或多個以下基團取代：鹵素、OH、C₁-C₁₂烷基、C₁-C₁₂烷氧基、CN、NO₂、苯基-C₁-C₃烷氧基、苯氧基、C₁-C₁₂烷基硫基、苯基硫基、N(C₁-C₁₂烷基)₂、二苯基-胺基或

； 或R₁₇形成鍵結至其上具有基團

或

之苯基或萘基環之一個碳原子之直接鍵； R₁₈係氫、C₂-C₁₂烯基、C₃-C₂₀環烷基或苯基-C₁-C₃烷基，其中C₂-C₁₂烯基、C₃-C₂₀環烷基或苯基-C₁-C₃烷基未經間雜或間雜有一或多個O、S、CO、NR₂₆或COOR₁₇；或R₁₈係C₁-C₂₀烷基，其未經取代或經一或多個以下基團取代：OH、SH、CN、C₃-C₆烯氧基、OCH₂CH₂CN、OCH₂CH₂(CO)O(C₁-C₄烷基)、O(CO)-(C₂-C₄烯基)、O(CO)-(C₁-C₄烷基)、O(CO)-苯基或(CO)OR₁₇；或R₁₈係C₂-C₂₀烷基，其間雜有一或多個O、S、CO、NR₂₆或COOR₁₇；或R₁₈係(CH₂CH₂O)_nH、(CH₂CH₂O)_n(CO)-(C₁-C₈烷基)、C₂-C₈烷醯基或C₃-C₆烯醯基；或R₁₈係苯甲醯基，其未經取代或經一或多個以下基團取代：C₁-C₆烷基、鹵素、OH、C₁-C₄烷氧基或C₁-C₄烷基硫基；或R₁₈係苯基、萘基或C₃-C₂₀雜芳基，其各未經取代或經一或多個以下基團取代：鹵素、C₁-C₁₂烷基、C₁-C₄鹵代烷基、C₁-C₁₂烷氧基、CN、NO₂、苯基-C₁-C₃烷氧基、苯氧基、C₁-C₁₂烷基硫基、苯基硫基、N(C₁-C₁₂烷基)₂、二苯基胺基、(CO)O(C₁-C₈烷基)、(CO)-C₁-C₈烷基、 (CO)N(C₁-C₈烷基)₂或

；R₁₉及R₂₀彼此獨立地為氫、C₁-C₂₀烷基、C₂-C₄羥基烷基、C₂-C₁₀烷氧基烷基、C₂-C₅烯基、C₃-C₂₀環烷基、苯基-C₁-C₃烷基、C₁-C₈烷醯基、C₁-C₈烷醯基氧基、C₃-C₁₂烯醯基、SO₂-(C₁-C₄鹵代烷基)或苯甲醯基； 或R₁₉及R₂₀係苯基、萘基或C₃-C₂₀雜芳基，其各未經取代或經一或多個以下基團取代：鹵素、C₁-C₄鹵代烷基、C₁-C₂₀烷氧基、C₁-C₁₂烷基、苯甲醯基或C₁-C₁₂烷氧基；或R₁₉及R₂₀與其所附接之N原子一起形成未經間雜或間雜有O、S或NR₁₇之5員或6員飽和或不飽和環，且該5員或6員飽和或不飽和環未經取代或經一或多個以下基團取代：C₁-C₂₀烷基、C₁-C₂₀烷氧基、=O、OR₁₇、SR₁₈、NR₂₁R₂₂、(CO)R₂₃、NO₂、鹵素、C₁-C₄-鹵代烷基、CN、 苯基、

或C₃-C₂₀環烷基，該C₃-C₂₀環烷基未經間雜或間雜有一或多個O、S、CO或NR₁₇；或R₁₉及R₂₀與其所附接之N原子一起形成雜芳香族環系統，該環系統未經取代或經一或多個以下基團取代：C₁-C₂₀烷基、C₁-C₄鹵代烷基、C₁-C₂₀烷氧基、=O、OR₁₇、 SR₁₈、NR₂₁R₂₂、(CO)R₂₃、

、鹵素、NO₂、CN、苯基或C₃-C₂₀環烷基，該C₃-C₂₀環烷基未經間雜或間雜有一或多個O、S、CO或NR₁₇；R₂₁及R₂₂彼此獨立地為氫、C₁-C₂₀烷基、C₁-C₄鹵代烷基、C₃-C₁₀環烷基或苯基；或R₂₁及R₂₂與其所附接之N原子一起形成未經間雜或間雜有O、S或NR₂₆之5員或6員飽和或不飽和環，且該5員或6員飽和或不飽和環未稠合或該5員或6員飽和或不飽和環係與苯環稠合；R₂₃係氫、OH、C₁-C₂₀烷基、C₁-C₄鹵代烷基、間雜有一或多個O、CO或NR₂₆之C₂-C₂₀烷基、未經間雜或間雜有O、S、CO或NR₂₆之C₃-C₂₀環烷基，或R₂₃係苯基、萘基、苯基-C₁-C₄烷基、OR₁₇、SR₁₈或NR₂₁R₂₂；R₂₄係(CO)OR₁₇、CONR₁₉R₂₀、(CO)R₁₇；或R₂₄具有針對R₁₉及R₂₀所給出含義中之一者； R₂₅係COOR₁₇、CONR₁₉R₂₀、(CO)R₁₇；或R₂₅具有針對R₁₇所給出含義中之一者；R₂₆係氫、C₁-C₂₀烷基、C₁-C₄鹵代烷基、間雜有一或多個O或CO之C₂-C₂₀烷基；或係苯基-C₁-C₄烷基、未經間雜或間雜有一或多個O或CO之C₃-C₈環烷基；或係(CO)R₁₉；或係苯基，其未經取代或經一或多個以下基團取代：C₁-C₂₀烷基、鹵素、C₁-C₄鹵代烷基、OR₁₇、SR₁₈、NR₁₉R₂₀或

； 但條件為在該分子中存在至少一個基團

或

。 Wherein R ₁ , R ₂ , R ₃ , R ₄ , R ₅ , R ₆ , R ₇ and R ₈ are independently hydrogen, C ₁ -C ₂₀ alkyl,

, COR ₁₆ , OR ₁₇ , halogen, NO ₂ or

, Or R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ , R ₅ and R ₆ , R ₆ and R ₇ or R ₇ and R ₈ are independent of each other.

Substituted C ₂ -C ₁₀ alkenyl or R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ , R ₅ and R ₆ , R ₆ and R ₇ or R ₇ and R ₈ independently of one another are -(CH ₂ ) _P -Y- (CH ₂ ) _q- ; or R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ , R ₅ and R ₆ , R ₆ and R ₇ or R ₇ and R ₈ independently of each other is

But provided that at least one of R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ , R ₅ and R ₆ , R ₆ and R ₇ or R ₇ and R ₈

R ₉ , R ₁₀ , R ₁₁ and R ₁₂ are independently of each other hydrogen, C ₁ -C ₂₀ alkyl, the C ₁ -C ₂₀ alkyl is unsubstituted or substituted with one or more of the following groups: halogen, benzene Group, CN, OH, SH, C ₁ -C ₄ -alkoxy, (CO) OH or (CO) O (C ₁ -C ₄ alkyl); or R ₉ , R ₁₀ , R ₁₁ and R ₁₂ each other Independently unsubstituted phenyl or phenyl substituted with one or more of the following: C ₁ -C ₆ alkyl, halogen, CN, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₉ , R ₁₀ , R ₁₁ and R ₁₂ are each independently halogen, CN, OR ₁₇ , SR ₁₈ , SOR ₁₈ , SO ₂ R ₁₈ or NR ₁₉ R ₂₀ , wherein the substituents OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ Optionally a 5- or 6-membered ring with a carbon atom in the naphthyl ring via the groups R ₁₇ , R ₁₈ , R ₁₉ and / or R ₂₀ ; or R ₉ , R ₁₀ , R ₁₁ and R ₁₂ are independently of each other as

, COR ₁₆ or NO ₂ ; Y is O, S, NR ₂₆ or direct bond; p is integer 0, 1, 2 or 3; q is integer 1, 2 or 3; X is CO or direct bond; R ₁₃ is C _1- C ₂₀ alkyl, which is unsubstituted or substituted with one or more of the following groups: halogen, R ₁₇ , COOR ₁₇ , OR ₁₇ , SR ₁₈ , CONR ₁₉ R ₂₀ , NR ₁₉ R ₂₀ , PO (OC _k H _{2k + 1} ) ₂ or

; Or R ₁₃ is a C ₂ -C ₂₀ alkyl group, which is interspersed with one or more O, S, SO, SO ₂ , NR ₂₆ or CO, or C ₂ -C ₁₂ alkenyl group, which is not interspersed or interspersed with one Or more O, CO or NR ₂₆ in which the interspersed C ₂ -C ₂₀ alkyl and unsaturated or interspersed C ₂ -C ₁₂ alkenyl are unsubstituted or substituted with one or more halogens; or R ₁₃ is C ₄ -C ₈ cycloalkenyl, C ₂ -C ₁₂ alkynyl or C ₃ -C ₁₀ cycloalkyl without one or more O, S, CO or NR ₂₆ ; or R ₁₃ Phenyl or naphthyl, each unsubstituted or substituted with one or more of the following groups: OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ ,

_{, COR 16, CN, NO 2} , halogen, C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, interrupted by one or more O, S, CO or NR C ₂₆ of ₂ -C ₂₀ alkyl group; or via their respective C ₃ -C ₁₀ cycloalkyl, or interrupted by one or more O, S, CO or NR ₂₆ of the C ₃ -C ₁₀ cycloalkyl; based integer k 1 to 10; R ₁₄ type hydrogen, C ₃ -C ₈ cycloalkyl, C ₂ -C ₅ alkenyl, C ₁ -C ₂₀ alkoxy, or C ₁ -C ₂₀ alkyl, which are unsubstituted or substituted by one or more halogen, phenyl, C _1- C ₂₀ alkylphenyl or CN substituted; or R ₁₄ is phenyl or naphthyl, each of which is unsubstituted or substituted with one or more of the following: C ₁ -C ₆ alkyl, C ₁ -C ₄ haloalkane Group, halogen, CN, OR ₁₇ , SR ₁₈ and / or NR ₁₉ R ₂₀ ; or R ₁₄ is a C ₃ -C ₂₀ heteroaryl group, C ₁ -C ₈ alkoxy group, benzyloxy group or phenoxy group, the Benzyloxy and phenoxy are unsubstituted or substituted with one or more C ₁ -C ₆ alkyl, C ₁ -C ₄ haloalkyl and / or halogen; R ₁₅ is C ₆ -C ₂₀ aryl or C ₃ -C ₂₀ heteroaryl, each unsubstituted or substituted with one or more of the following groups: phenyl, halogen, C ₁ -C ₄ haloalkyl, CN, NO ₂ , OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ 、 PO (OC _k H _{2k + 1} ) ₂ , SO-C ₁ -C ₁₀ alkyl, SO ₂ -C ₁ -C ₁₀ alkyl, C ₂ -C ₂₀ alkyl interspersed with one or more O, S or NR ₂₆ ; or each C _1- C ₂₀ alkyl substitution, the C ₁ -C ₂₀ alkyl group is unsubstituted or substituted with one or more of the following groups: halogen, COOR ₁₇ , CONR ₁₉ R ₂₀ , phenyl, C ₃ -C ₈ cycloalkyl, C ₃ -C ₂₀ heteroaryl, C ₆ -C ₂₀ aryloxycarbonyl, C ₃ -C ₂₀ heteroaryloxycarbonyl, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₁₅ is hydrogen, C _2- C ₁₂ alkenyl, C ₃ -C ₈ cycloalkyl without one or more O, CO or NR ₂₆ ; or R ₁₅ is C ₁ -C ₂₀ alkyl, which is unsubstituted or Multiple substitutions of the following groups: halogen, OR ₁₇ , SR ₁₈ , C ₃ -C ₈ cycloalkyl, C ₃ -C ₂₀ heteroaryl, C ₆ -C ₂₀ aryloxycarbonyl, C ₃ -C ₂₀ heteroaryl Oxycarbonyl, NR ₁₉ R ₂₀ , COOR ₁₇ , CONR ₁₉ R ₂₀ , PO (OC _k H _{2k + 1} ) ₂ ,

,

, Phenyl; or the C ₁ -C ₂₀ alkyl group is substituted with a phenyl group, the phenyl group is halogen, C ₁ -C ₂₀ alkyl group, C ₁ -C ₄ haloalkyl group, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ Substituted; or R ₁₅ is a C ₂ -C ₂₀ alkyl group, in which one or more O, SO, or SO ₂ is interspersed, and the interspersed C ₂ -C ₂₀ alkyl group is unsubstituted or substituted by one or more of the following groups Group substitution: halogen, OR ₁₇ , COOR ₁₇ , CONR ₁₉ R ₂₀ , phenyl or phenyl substituted with OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₁₅ is a C ₂ -C ₂₀ alkylfluorenyl or benzyl Fluorenyl, which is unsubstituted or substituted with one or more of the following: C ₁ -C ₆ alkyl, halogen, phenyl, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₁₅ is unsubstituted or A naphthylmethyl group substituted with one or more OR ₁₇ or a C ₃ -C ₁₄ heteroarylcarbonyl group; or R ₁₅ is a C ₂ -C ₁₂ alkoxycarbonyl group, which is not interspersed or has one or more O And the C ₂ -C ₁₂ alkoxycarbonyl group is unsubstituted or substituted with one or more hydroxyl groups; or R ₁₅ is a phenoxycarbonyl group which is unsubstituted or substituted with one or more Group substitution: C ₁ -C ₆ alkyl, halogen, C ₁ -C ₄ haloalkyl, phenyl, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₁₅ is CN, CONR ₁₉ R ₂₀ , NO ₂ , C ₁ -C ₄ haloalkyl, S (O) _m -C ₁ -C ₆ alkyl, unsubstituted or C ₁ -C ₁₂ alkyl or SO ₂ -C ₁ -C ₆ alkyl substituted S (O) _m -phenyl; or R ₁₅ is SO ₂ O-phenyl, which is unsubstituted or C ₁ -C ₁₂ alkyl Group substitution; or diphenylphosphinofluorenyl or bis (C ₁ -C ₄ alkoxy) -phosphinofluorenyl; m is 1 or 2; R _'14 has one of the meanings given for R ₁₄ ; R _'15 has one of the meanings given for R ₁₅ ; X ₁ is O, S, SO or SO ₂ ; X ₂ is O, CO, S or a direct bond; R ₁₆ is C ₆ -C ₂₀ aryl Or C ₃ -C ₂₀ heteroaryl, each of which is unsubstituted or substituted with one or more of the following groups: phenyl, halogen, C ₁ -C ₄ haloalkyl, CN, NO ₂ , OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ or one or more C ₁ -C ₂₀ alkyl groups with one or more O, S or NR ₂₆ ; or each substituted with one or more C ₁ -C ₂₀ alkyl groups, the C ₁ -C ₂₀ alkyl group Unsubstituted or substituted with one or more of the following groups: halogen, COOR ₁₇ , CONR ₁₉ R ₂₀ , phenyl, C ₃ -C ₈ cycloalkyl, C ₃ -C ₂₀ heteroaryl, C ₆ -C ₂₀ Aryloxycarbonyl, C ₃ -C ₂₀ heteroaryloxycarbonyl, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₁₆ is hydrogen, C ₁ -C ₂₀ alkyl, the C ₁ -C ₂₀ alkyl is unsubstituted or substituted with one or more of the following groups: halogen, phenyl , OH, SH, CN, C ₃ -C ₆ alkenyloxy, OCH ₂ CH ₂ CN, OCH ₂ CH ₂ (CO) O (C ₁ -C ₄ alkyl), O (CO)-(C ₁ -C ₄ alkyl), O (CO) -phenyl, (CO) OH or (CO) O (C ₁ -C ₄ alkyl); or R ₁₆ is C ₂ -C ₁₂ alkyl, with one or more intervening in between O, S or NR ₂₆ ; or R ₁₆ series (CH ₂ CH ₂ O) _{n + 1} H, (CH ₂ CH ₂ O) _n (CO)-(C ₁ -C ₈ alkyl), C ₂ -C ₁₂ Alkenyl or C ₃ -C ₈ cycloalkyl; or R ₁₆ is a phenyl substituted with SR ₁₈ , where the group R ₁₈ represents a phenyl or naphthyl ring bonded to the carbazole moiety to which COR ₁₆ is attached N is 1 to 20; R ₁₇ is hydrogen, phenyl-C ₁ -C ₃ alkyl, C ₁ -C ₂₀ alkyl, which is unsubstituted or substituted with one or more of the following groups: halogen , OH, SH, CN, C ₃ -C ₆ alkenyloxy, OCH ₂ CH ₂ CN, OCH ₂ CH ₂ (CO) O (C ₁ -C ₄ alkyl), O (CO)-(C ₁ -C ₍₄ alkyl), O (CO)-(C ₂ -C ₄ alkenyl), O (CO) -phenyl, (CO) OH, (CO) O (C ₁ -C ₄ alkyl), C _3- C ₂₀ cycloalkyl, SO _2- (C ₁ -C ₄ haloalkyl), O (C ₁ -C ₄ haloalkyl) or a C ₃ -C ₂₀ cycloalkyl group interspersed with one or more O; or R ₁₇ is a C ₂ -C ₂₀ alkyl group interspersed with one or more O, S or NR ₂₆ ; or R ₁₇ series (CH ₂ CH ₂ O) _{n + 1} H, (CH ₂ CH ₂ O) _n (CO)-(C ₁ -C ₈ alkyl), C ₁ -C ₈ alkyl, C ₂ -C ₁₂ Alkenyl, C ₃ -C ₆ alkenyl or C ₃ -C ₂₀ cycloalkyl without one or more O, S, CO or NR ₂₆ ; or R ₁₇ is C ₁ -C ₈ alkyl -C ₃ -C ₁₀ cycloalkyl, which has one or more O unsubstituted or interspersed; or R ₁₇ is benzamyl, which is unsubstituted or has one or more C ₁ -C ₆ alkyl, halogen , OH or C ₁ -C ₃ alkoxy substitution; or R ₁₇ is phenyl, naphthyl or C ₃ -C ₂₀ heteroaryl, each unsubstituted or substituted with one or more of the following groups: halogen, OH, C ₁ -C ₁₂ alkyl, C ₁ -C ₁₂ alkoxy, CN, NO ₂ , phenyl-C ₁ -C ₃ alkoxy, phenoxy, C ₁ -C ₁₂ alkylthio, Phenylthio, N (C ₁ -C ₁₂ alkyl) ₂ , diphenyl-amino or

; Or R ₁₇ forms a bond to a group having

or

Direct bond of one carbon atom of phenyl or naphthyl ring; R ₁₈ is hydrogen, C ₂ -C ₁₂ alkenyl, C ₃ -C ₂₀ cycloalkyl or phenyl-C ₁ -C ₃ alkyl, where C _2- C ₁₂ alkenyl, C ₃ -C ₂₀ cycloalkyl or phenyl-C ₁ -C ₃ alkyl without one or more O, S, CO, NR ₂₆ or COOR ₁₇ ; or R ₁₈ Is a C ₁ -C ₂₀ alkyl group, which is unsubstituted or substituted with one or more of the following groups: OH, SH, CN, C ₃ -C ₆ alkenyloxy, OCH ₂ CH ₂ CN, OCH ₂ CH ₂ ( CO) O (C ₁ -C ₄ alkyl), O (CO)-(C ₂ -C ₄ alkenyl), O (CO)-(C ₁ -C ₄ alkyl), O (CO) -phenyl Or (CO) OR ₁₇ ; or R ₁₈ is a C ₂ -C ₂₀ alkyl group, which is interspersed with one or more O, S, CO, NR ₂₆ or COOR ₁₇ ; or R ₁₈ (CH ₂ CH ₂ O) _n H , (CH ₂ CH ₂ O) _n (CO)-(C ₁ -C ₈ alkyl), C ₂ -C ₈ alkylfluorenyl or C ₃ -C ₆ alkenyl; or R ₁₈ benzamyl, It is unsubstituted or substituted with one or more of the following groups: C ₁ -C ₆ alkyl, halogen, OH, C ₁ -C ₄ alkoxy, or C ₁ -C ₄ alkylthio; or R ₁₈ series phenyl, naphthyl or C ₃ -C ₂₀ heteroaryl, each of which is unsubstituted or substituted with one or more of the following radicals: halogen, C ₁ -C ₁₂ alkyl, C ₁ -C ₄ Substituted alkyl, C ₁ -C ₁₂ alkoxy, CN, NO _2, phenyl -C ₁ -C ₃ alkoxy, phenoxy, C ₁ -C ₁₂ alkylthio, phenylthio, N (C ₁ -C ₁₂ alkyl) ₂ , diphenylamino, (CO) O (C ₁ -C ₈ alkyl), (CO) -C ₁ -C ₈ alkyl, (CO) N (C ₁ -C ₈ alkyl) ₂ or

; R ₁₉ and R ₂₀ are each independently hydrogen, C ₁ -C ₂₀ alkyl, C ₂ -C ₄ hydroxyalkyl, C ₂ -C ₁₀ alkoxyalkyl, C ₂ -C ₅ alkenyl, C ₃ -C ₂₀ cycloalkyl, phenyl-C ₁ -C ₃ alkyl, C ₁ -C ₈ alkylfluorenyl, C ₁ -C ₈ alkylfluorenyloxy, C ₃ -C ₁₂ alkenyl, SO _2- (C ₁ -C ₄ haloalkyl) or benzamidine; or R ₁₉ and R ₂₀ are phenyl, naphthyl or C ₃ -C ₂₀ heteroaryl, each of which is unsubstituted or substituted by one or more of the following groups Group substitution: halogen, C ₁ -C ₄ haloalkyl, C ₁ -C ₂₀ alkoxy, C ₁ -C ₁₂ alkyl, benzamidine or C ₁ -C ₁₂ alkoxy; or R ₁₉ and R ₂₀ With its attached N atom to form a 5- or 6-membered saturated or unsaturated ring that is not interspersed or interspersed with O, S, or NR ₁₇ , and the 5- or 6-membered saturated or unsaturated ring is unsubstituted or One or more of the following groups substituted: C ₁ -C ₂₀ alkyl, C ₁ -C ₂₀ alkoxy, = O, OR ₁₇ , SR ₁₈ , NR ₂₁ R ₂₂ , (CO) R ₂₃ , NO ₂ , halogen , C ₁ -C ₄ -haloalkyl, CN, phenyl,

Or C ₃ -C ₂₀ cycloalkyl, the C ₃ -C ₂₀ cycloalkyl has one or more O, S, CO, or NR ₁₇ without interspersed or interspersed; or R ₁₉ and R ₂₀ with the N atom to which it is attached Together form a heteroaromatic ring system that is unsubstituted or substituted with one or more of the following groups: C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, C ₁ -C ₂₀ alkoxy, = O, OR ₁₇ , SR ₁₈ , NR ₂₁ R ₂₂ , (CO) R ₂₃ ,

, Halogen, NO ₂ , CN, phenyl, or C ₃ -C ₂₀ cycloalkyl, the C ₃ -C ₂₀ cycloalkyl has one or more O, S, CO, or NR ₁₇ uninterspersed or interspersed; R ₂₁ and R _{22 is} independently of each other hydrogen, C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, C ₃ -C ₁₀ cycloalkyl or phenyl; or R ₂₁ and R ₂₂ together with the N atom to which they are attached Forms a 5- or 6-membered saturated or unsaturated ring without interspersed or interspersed O, S, or NR ₂₆ , and the 5- or 6-membered saturated or unsaturated ring is not fused or the 5- or 6-membered saturated or unsaturated ring saturated ring system is fused with a benzene ring; R ₂₃ type hydrogen, OH, C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, interrupted by one or more O, cO or NR C ₂₆ alkoxy of ₂ -C ₂₀ , C ₃ -C ₂₀ cycloalkyl without meta or hetero, O, S, CO or NR ₂₆ , or R ₂₃ phenyl, naphthyl, phenyl-C ₁ -C ₄ alkyl, OR ₁₇ , SR ₁₈ or NR ₂₁ R ₂₂ ; R ₂₄ is (CO) OR ₁₇ , CONR ₁₉ R ₂₀ , (CO) R ₁₇ ; or R ₂₄ has one of the meanings given for R ₁₉ and R ₂₀ ; R ₂₅ is COOR ₁₇ , CONR ₁₉ R ₂₀ , (CO) R ₁₇ ; or R ₂₅ has one of the meanings given for R ₁₇ ; R ₂₆ is hydrogen, C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl , Heteroaryl having one or more O or CO of C ₂ -C ₂₀ alkyl group; or a phenyl-based -C ₁ -C ₄ alkyl, interrupted or not interrupted by one or more O or CO of C ₃ -C ₈ cycloalkyl Or (CO) R ₁₉ ; or phenyl, which is unsubstituted or substituted with one or more of the following groups: C ₁ -C ₂₀ alkyl, halogen, C ₁ -C ₄ haloalkyl, OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ or

; Provided that at least one group is present in the molecule

or

.

。 The compound of formula (II) is characterized in that it contains one or more annelated unsaturated rings on the carbazole moiety. In other words, at least one of R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ , R ₅ and R ₆ , R ₆ and R _7, or R ₇ and R ₈

.

C ₁ -C ₂₀ alkyl is straight or branched and is, for example, C ₁ -C _18- , C ₁ -C _4- , C ₁ -C _12- , C ₁ -C _8- , C ₁ -C _8- or C ₁ -C ₄ alkyl or C ₄ -C ₁₂ -or C ₄ -C ₈ alkyl. Examples are methyl, ethyl, propyl, isopropyl, n-butyl, second butyl, isobutyl, third butyl, pentyl, hexyl, heptyl, 2,4,4-trimethyl Amyl, 2-ethylhexyl, octyl, nonyl, decyl, dodecyl, tetradecyl, pentadecyl, hexadecyl, octadecyl and icosyl. C ₁ -C ₆ alkyl has the same meaning as given above for C ₁ -C ₂₀ alkyl and has the highest corresponding number of C atoms.

It contains one or more CC multiple bonds of a substituted or non-substituted alkyl group of C ₁ -C ₂₀ as explained herein refers to the alkenyl group.

C ₁ -C ₄ haloalkyl is a halogen substituted C ₁ -C ₄ alkyl group as defined above, as defined below. Alkyl groups are, for example, mono- or polyhalogenated until all H-atoms are replaced with halogen. It is, for example, C _n H _x Hal _y , where x + y = 2n + 1 and Hal is halogen, preferably F. Specific examples are chloromethyl, trichloromethyl, trifluoromethyl or 2-bromopropyl, especially trifluoromethyl or trichloromethyl. C ₂ -C ₄ hydroxyalkyl means C ₂ -C ₄ alkyl substituted with one or two O atoms. Alkyl groups are straight or branched. Examples are 2-hydroxyethyl, 1-hydroxyethyl, 1-hydroxypropyl, 2-hydroxypropyl, 3-hydroxypropyl, 1-hydroxybutyl, 4-hydroxybutyl, 2-hydroxybutyl, 3-hydroxybutyl, 2,3-dihydroxypropyl or 2,4-dihydroxybutyl. C ₂ -C ₁₀ alkoxyalkyl lines interrupted by O atoms of a C ₂ -C ₁₀ alkyl. C ₂ -C ₁₀ alkyl has the same meaning as given above for C ₁ -C ₂₀ alkyl and has the highest corresponding number of C atoms. Examples are methoxymethyl, methoxyethyl, methoxypropyl, ethoxymethyl, ethoxyethyl, ethoxypropyl, propoxymethyl, propoxyethyl, Propoxypropyl.

C ₂ -C ₂₀ alkyl interspersed with one or more O, S, NR ₂₆ or CO via O, S, NR ₂₆ or CO (for example) 1 to 9 times, 1 to 5 times, 1 to 3 times or 1 Times or 2 times. If more than one meta group is present, they are the same kind or different. The two O atoms are separated by at least one methylene group, preferably at least two methylene groups (ie, ethylidene). These alkyl groups are straight or branched. For example, the following structural units will exist: -CH ₂ -CH ₂ -O-CH ₂ CH ₃ ,-(CH ₂ CH ₂ O) _y -CH ₃ (where y = 1 to 9),-(CH _2- CH ₂ O) ₇ -CH ₂ CH ₃ , -CH ₂ -CH (CH ₃ ) -O-CH ₂ -CH ₂ CH ₃ , -CH ₂ -CH (CH ₃ ) -O-CH ₂ -CH ₃ ,- CH ₂ -CH ₂ -S-CH ₂ CH ₃ , -CH ₂ -CH (CH ₃ ) -NR ₂₆ -CH ₂ -CH ₃ , -CH ₂ -CH ₂ -COO-CH ₂ CH ₃ or -CH _2- CH (CH ₃ ) -OCO-CH ₂ -CH ₂ CH ₃ .

、

、

及相應環。其他實例係諸如

、

、

(例如

)或

等結構、以及橋聯或稠合環系統，舉例而 言，該術語亦意欲涵蓋

、

等。 C ₃ -C ₁₀ cycloalkyl, C ₃ -C ₁₀ cycloalkyl and C ₃ -C ₈ cycloalkyl are to be understood in the context of this application as alkyl groups containing at least one ring. It is, for example, cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cyclooctyl, pentylcyclopentyl and cyclohexyl. C ₃ -C ₁₀ cycloalkyl is also intended to encompass bicyclics in the context of the present invention, in other words, bridged rings such as

,

,

And the corresponding ring. Other examples are such as

,

,

(E.g

)or

Isostructure, and bridged or fused ring systems, the term is also intended to cover, for example

,

Wait.

、

、

(例如

)、

、

或

等結構。 A C ₃ -C ₂₀ cycloalkyl group interspersed with O, S, CO, NR ₂₆ has the meaning given above, wherein at least one CH ₂ -group in the alkyl group is replaced with O, S, CO or NR ₂₆ . Examples are such as

,

,

(E.g

),

,

or

And other structures.

、

等。 C ₁ -C ₈ alkyl-C ₃ -C ₁₀ cycloalkyl is a C ₃ -C ₁₀ cycloalkyl group, as defined above, substituted with one or more alkyl groups having up to 8 carbon atoms. Instance system

,

Wait.

、

等。 C ₁ -C ₈ alkyl-C ₃ -C ₁₀ cycloalkyl interspersed with one or more O is an O interspersed C ₃ -as defined above substituted with one or more alkyl groups having up to 8 carbon atoms C ₁₀ cycloalkyl. Instance system

,

Wait.

C ₁ -C ₁₂ alkoxy substituted with the system via a O atom C ₁ -C ₁₂ alkyl. C ₁ -C ₁₂ alkyl has the same meaning as given above for C ₁ -C ₂₀ alkyl and has the highest corresponding number of C atoms. C ₁ -C ₄ alkoxy is straight or branched, such as methoxy, ethoxy, propoxy, isopropoxy, n-butoxy, second butoxy, isobutoxy, or Tributoxy. C ₁ -C ₈ alkoxy and C ₁ -C ₄ -alkoxy have the same meaning as described above and have the highest corresponding number of C atoms.

C ₁ -C ₁₂ alkylthio is a C ₁ -C ₁₂ alkyl substituted with one S atom. C ₁ -C ₂₀ alkyl has the same meaning as given above for C ₁ -C ₂₀ alkyl and has the highest corresponding number of C atoms. C ₁ -C ₄ alkylthio is linear or branched, such as methylthio, ethylthio, propylthio, isopropylthio, n-butylthio, second butylthio , Isobutylthio, third butylthio.

Phenyl-C ₁ -C ₃ alkyl is, for example, benzyl, phenylethyl, α-methylbenzyl or α, α-dimethyl-benzyl, especially benzyl.

Phenyl-C ₁ -C ₃ alkoxy is, for example, benzyloxy, phenylethoxy, α-methylbenzyloxy or α, α-dimethylbenzyloxy, especially benzyloxy.

C ₂ -C ₁₂ alkenyl is mono- or polyunsaturated and is, for example, C ₂ -C _10- , C ₂ -C _8- , C ₂ -C ₅ -alkenyl, such as vinyl, allyl, Methylallyl, 1,1-dimethylallyl, 1-butenyl, 3-butenyl, 2-butenyl, 1,3-pentadienyl, 5-hexenyl, 7-octenyl or dodecenyl, especially allyl. C ₂ -C ₅ alkenyl has the same meaning as given above for C ₂ -C ₁₂ alkenyl and has the highest corresponding number of C atoms.

C ₂ -C ₁₂ alkenyl interspersed with one or more O, CO or NR ₂₆ via O, S, NR ₂₆ or CO interspersed (for example) 1 to 9 times, 1 to 5 times, 1 to 3 times or 1 time or 2 times. If more than one meta group is present, they are the same kind or different. The two O atoms are separated by at least one methylene group, preferably at least two methylene groups (ie, ethylidene). Alkenyl is straight or branched and is as defined above. For example, the following structural units may be formed: -CH = CH-O-CH ₂ CH ₃ , -CH = CH-O-CH = CH ₂ and the like.

C ₄ -C ₈ cycloalkenyl has one or more double bonds and is, for example, C ₄ -C ₆ -cycloalkenyl or C ₆ -C ₈ -cycloalkenyl. Examples are cyclobutenyl, cyclopentenyl, cyclohexenyl or cyclooctenyl, especially cyclopentenyl and cyclohexenyl, and preferably cyclohexenyl.

C ₃ -C ₆ alkenyloxy is mono- or polyunsaturated and has one of the meanings given above for alkenyl, and the attached oxygen group has the highest corresponding number of C atoms. Examples are allyloxy, methallyloxy, butenyloxy, pentenyloxy, 1,3-pentadienyloxy, 5-hexenyloxy.

C ₂ -C ₁₂ alkynyl is a mono- or polyunsaturated straight or branched chain and is, for example, C ₂ -C _8- , C ₂ -C ₆ -or C ₂ -C ₄ alkynyl. Examples are ethynyl, propynyl, butynyl, 1-butynyl, 3-butynyl, 2-butynyl, pentynylhexynyl, 2-hexynyl, 5-hexynyl, Octynyl and others.

C ₂ -C ₂₀ alkylfluorenyl is straight or branched and is, for example, C ₂ -C _18- , C ₂ -C _14- , C ₂ -C _12- , C ₂ -C _8- , C _2- C ₆ -or C ₂ -C ₄ alkylfluorenyl or C ₄ -C ₁₂ -or C ₄ -C ₈ alkylfluorenyl. Examples are ethenyl, propionyl, butyryl, isobutyryl, pentyl, hexyl, heptyl, octyl, nonyl, decyl, dodecyl, tetradecyl, pentadecyl Base, hexadecyl, octadecyl, and icosyl, preferably ethenyl. C ₁ -C ₈ alkylfluorenyl has the same meaning as given above for C ₂ -C ₂₀ alkylfluorenyl and has the highest corresponding number of C atoms.

C ₂ -C ₁₂ alkoxycarbonyl is straight or branched and is, for example, methoxycarbonyl, ethoxycarbonyl, propoxycarbonyl, n-butoxycarbonyl, isobutoxycarbonyl, 1,1 -Dimethylpropoxycarbonyl, pentoxycarbonyl, hexyloxycarbonyl, heptyloxycarbonyl, octyloxycarbonyl, nonoxycarbonyl, decoxycarbonyl or dodecyloxycarbonyl, especially methoxy The carbonyl, ethoxycarbonyl, propoxycarbonyl, n-butoxycarbonyl or isobutoxycarbonyl group is preferably a methoxycarbonyl group.

The C ₂ -C ₁₂ alkoxycarbonyl group interspersed with one or more O is linear or branched. The two O atoms are separated by at least two methylene (ie, ethylene). The meta heteroalkoxycarbonyl group is unsubstituted or substituted with one or more hydroxyl groups. C ₆ -C ₂₀ aryloxycarbonyl is, for example, phenyloxycarbonyl [= phenyl-O- (CO)-], naphthyloxycarbonyl, anthracenoxycarbonyl, and the like. C ₅ -C ₂₀ heteroaryloxycarbonyl is C ₅ -C ₂₀ heteroaryl-O-CO-.

C ₃ -C ₁₀ cycloalkylcarbonyl is C ₃ -C ₁₀ cycloalkyl-CO-, wherein cycloalkyl has one of the meanings indicated above and has the highest corresponding number of C atoms. The C ₃ -C ₁₀ cycloalkylcarbonyl group interspersed with one or more O, S, CO, NR ₂₆ refers to a metacycloalkyl-CO- group, wherein the metacycloalkyl group is as defined above.

C ₃ -C ₁₀ cycloalkoxycarbonyl is C ₃ -C ₁₀ cycloalkyl-O- (CO)-, wherein cycloalkyl has one of the meanings indicated above and has the highest corresponding number of C atoms. The C ₃ -C ₁₀ cycloalkoxycarbonyl group interspersed with one or more O, S, CO, NR ₂₆ refers to metacycloalkyl-O- (CO)-, wherein the metacycloalkyl group is as described above As defined.

C ₁ -C ₂₀ alkylphenyl refers to a phenyl substituted with one or more alkyl groups, where the total of C atoms is at most 20.

基、并四苯基、聯伸三苯基等，尤其為苯基或萘基，較佳為苯基。萘基係1-萘基或2-萘基。 C ₆ -C ₂₀ aryl is, for example, phenyl, naphthyl, anthracenyl, phenanthryl, fluorenyl,

Phenyl, tetracrylphenyl, triphenylene, etc., especially phenyl or naphthyl, preferably phenyl. Naphthyl is 1-naphthyl or 2-naphthyl.

唏基、呫噸基、噻噸基、啡噁噻基、吡咯基、咪唑基、吡唑基、吡嗪基、嘧啶基、噠嗪基、中氮茚基、異吲哚 基、吲哚基、吲唑基、嘌呤基、喹嗪基、異喹啉基、喹啉基、酞嗪基、萘啶基、喹噁啉基、喹唑啉基、

啉基、喋啶基、咔唑基、β-哢啉基、菲啶基、吖啶基、萘嵌間二氮苯基、菲咯啉基、吩噻基、異噻唑基、吩噻嗪基、異噁唑基、呋呫基、吩噁基、7-菲基、蒽醌-2-基(=9,10-二側氧基-9,10-二氫蒽-2-基)、3-苯并[b]噻吩基、5-苯并[b]噻吩基、2-苯并[b]噻吩基、4-二苯并呋喃基、4,7-二苯并呋喃基、4-甲基-7-二苯并呋喃基、2-呫噸基、8-甲基-2-呫噸基、3-呫噸基、2-啡噁噻基、2,7-啡噁噻基、2-吡咯基、3-吡咯基、5-甲基-3-吡咯基、2-咪唑基、4-咪唑基、5-咪唑基、2-甲基-4-咪唑基、2-乙基-4-咪唑基、2-乙基-5-咪唑基、1H-四唑-5-基、3-吡唑基、1-甲基-3-吡唑基、1-丙基-4-吡唑基、2-吡嗪基、5,6-二甲基-2-吡嗪基、2-中氮茚基、2-甲基-3-異吲哚基、2-甲基-1-異吲哚基、1-甲基-2-吲哚基、1-甲基-3-吲哚基、1,5-二甲基-2-吲哚基、1-甲基-3-吲唑基、2,7-二甲基-8-嘌呤基、2-甲氧基-7-甲基-8-嘌呤基、2-喹嗪基、3-異喹啉基、6-異喹啉基、7-異喹啉基、3-甲氧基-6-異喹啉基、2-喹啉基、6-喹啉基、7-喹啉基、2-甲氧基-3-喹啉基、2-甲氧基-6-喹啉基、6-酞嗪基、7-酞嗪基、1-甲氧基-6-酞嗪基、1,4-二甲氧基-6-酞嗪基、1,8-萘啶-2-基、2-喹噁啉基、6-喹噁啉基、2,3-二甲基-6-喹噁啉基、2,3-二甲氧基-6-喹噁啉基、2-喹唑啉基、7-喹唑啉基、2-二甲基胺基-6-喹唑啉基、3-

啉基、6-

啉基、7-

啉基、3-甲氧基-7-

啉基、2-喋啶基、6-喋啶基、7-喋啶基、6,7-二 甲氧基-2-喋啶基、2-咔唑基、3-咔唑基、9-甲基-2-咔唑基、9-甲基-3-咔唑基、β-哢啉-3-基、1-甲基-β-哢啉-3-基、1-甲基-β-哢啉-6-基、3-菲啶基、2-吖啶基、3-吖啶基、2-萘嵌間二氮苯基、1-甲基-5-萘嵌間二氮苯基、5-菲咯啉基、6-菲咯啉基、1-吩嗪基、2-吩嗪基、3-異噻唑基、4-異噻唑基、5-異噻唑基、2-吩噻嗪基、3-吩噻嗪基、10-甲基-3-吩噻嗪基、3-異噁唑基、4-異噁唑基、5-異噁唑基、4-甲基-3-呋呫基、2-吩噁基、10-甲基-2-吩噁基等。 In the context of the present invention, a C ₃ -C ₂₀ heteroaryl is intended to include a monocyclic or polycyclic system, such as a fused ring system. Examples are thienyl, benzo [b] thienyl, naphtho [2,3-b] thienyl, thienyl, furanyl, dibenzofuranyl,

Fluorenyl, xanthenyl, thioxanthenyl, phenoxathiol, pyrrolyl, imidazolyl, pyrazolyl, pyrazinyl, pyrimidinyl, pyridazinyl, midindenyl, isoindolyl, indolyl , Indazolyl, purinyl, quinazinyl, isoquinolinyl, quinolinyl, phthalazinyl, naphthyridinyl, quinoxalinyl, quinazolinyl,

Porphyrinyl, pyridinyl, carbazolyl, β-fluorinyl, phenanthridyl, acridinyl, naphthylazine, phenanthroline, phenothiyl, isothiazolyl, phenothiazyl , Isoxazolyl, furfuryl, phenoxal, 7-phenanthryl, anthraquinone-2-yl (= 9,10-dioxo-9,10-dihydroanthracen-2-yl), 3 -Benzo [b] thienyl, 5-benzo [b] thienyl, 2-benzo [b] thienyl, 4-dibenzofuryl, 4,7-dibenzofuryl, 4-methyl -7-dibenzofuranyl, 2-xanthenyl, 8-methyl-2-xanthenyl, 3-xanthenyl, 2-phenoxanthenyl, 2,7-phenoxanthenyl, 2 -Pyrrolyl, 3-pyrrolyl, 5-methyl-3-pyrrolyl, 2-imidazolyl, 4-imidazolyl, 5-imidazolyl, 2-methyl-4-imidazolyl, 2-ethyl-4 -Imidazolyl, 2-ethyl-5-imidazolyl, 1H-tetrazol-5-yl, 3-pyrazolyl, 1-methyl-3-pyrazolyl, 1-propyl-4-pyrazolyl , 2-pyrazinyl, 5,6-dimethyl-2-pyrazinyl, 2-indolizinyl, 2-methyl-3-isoindolyl, 2-methyl-1-isoindole , 1-methyl-2-indolyl, 1-methyl-3-indolyl, 1,5-dimethyl-2-indolyl, 1-methyl-3-indazolyl, 2 , 7-dimethyl-8-purinyl, 2-methoxy-7-methyl-8-purine , 2-quinazinyl, 3-isoquinolinyl, 6-isoquinolinyl, 7-isoquinolinyl, 3-methoxy-6-isoquinolinyl, 2-quinolinyl, 6- Quinolinyl, 7-quinolinyl, 2-methoxy-3-quinolinyl, 2-methoxy-6-quinolinyl, 6-phthalazinyl, 7-phthalazinyl, 1-methoxy -6-phthalazinyl, 1,4-dimethoxy-6-phthalazinyl, 1,8-naphthyridin-2-yl, 2-quinoxalinyl, 6-quinoxalinyl, 2, 3-dimethyl-6-quinoxaline group, 2,3-dimethoxy-6-quinoxaline group, 2-quinazolinyl group, 7-quinazolinyl group, 2-dimethylamino group -6-quinazolinyl, 3-

Phenyl, 6-

Phenyl, 7-

Phenyl, 3-methoxy-7-

Phenyl, 2-pyridinyl, 6-pyridinyl, 7-pyridinyl, 6,7-dimethoxy-2-pyridinyl, 2-carbazolyl, 3-carbazolyl, 9- Methyl-2-carbazolyl, 9-methyl-3-carbazolyl, β-fluorin-3-yl, 1-methyl-β-fluorin-3-yl, 1-methyl-β- Perylene-6-yl, 3-phenanthridyl, 2-acridyl, 3-acridyl, 2-naphthylazine, 1-methyl-5-naphthylazine, 5-phenanthroline, 6-phenanthroline, 1-phenazinyl, 2-phenazinyl, 3-isothiazolyl, 4-isothiazolyl, 5-isothiazolyl, 2-phenthiazinyl , 3-phenothiazinyl, 10-methyl-3-phenothiazinyl, 3-isooxazolyl, 4-isooxazolyl, 5-isooxazolyl, 4-methyl-3-furanyl Group, 2-phenoxa group, 10-methyl-2-phenoxa group and the like.

C ₃ -C ₂₀ heteroaryl is especially thienyl, benzo [b] thienyl, thiathranyl, thioxantyl, 1-methyl-2-indolyl or 1-methyl-3-indolyl ; Especially thienyl.

C ₄ -C ₂₀ heteroarylcarbonyl is a C ₃ -C ₂₀ heteroaryl group, as defined above, attached to the rest of the molecule via a CO group.

Substituted aryl groups (phenyl, naphthyl, C ₆ -C ₂₀ aryl or C ₅ -C ₂₀ heteroaryl) are 1 to 7 times, 1 to 6 times or 1 to 4 times, especially 1 times, respectively. , 2 or 3 substitutions. Obviously, the defined aryl group cannot have more substituents than there are free positions at the aryl ring.

The substituent on the phenyl ring is preferably in position 4 on the phenyl ring or in a 3,4-, 3,4,5-, 2,6-, 2,4-, or 2,4,6-configuration .

Interstitial groups that are interspersed one or more times (for example) 1 to 19 times, 1 to 15 times, 1 to 12 times, 1 to 9 times, 1 to 7 times, 1 to 5 times, 1 to 4 times, 1 to 3 times or 1 or 2 times (obviously, the number of inter-hetero atoms depends on the number of C atoms to be inter-hetero-hetero). A substituted group substituted 1 or more times has For example, 1 to 7, 1 to 5, 1 to 4, 1 to 3, or 1 or 2 of the same or different substituents.

；則形成(例如)以下式(II-a)至式(II-i)：

亦或(例如)諸如式(II-d)至式(II-h)等結構：

A group substituted with one or more defined substituents is intended to have one substituent or more substituents with the same or different definitions as given. Halogen is fluorine, chlorine, bromine and iodine, especially fluorine, chlorine and bromine, and fluorine and chlorine are preferred. If R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ or R ₅ and Re, R ₆ and R ₇ , R ₇ and R ₈ are independently common to each other as

; Then, for example, the following formula (II-a) to formula (II-i) are formed:

Or, for example, structures such as formula (II-d) to formula (II-h):

The preferred formula is (II-a).

Compounds of formula (II) are characterized in that at least one phenyl ring is fused with a carbazole moiety to form a "naphthyl" ring. That is, one of the above structures is given by formula (II).

、

等結構。 If R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ , R ₅ and R ₆ , R ₆ and R _7, or R ₇ and R ₈ independently of each other are-(CH ₂ ) _P -Y- (CH ₂ ) _q- , then forming (for example) such as

,

And other structures.

等。 If the substituents OR ₁₇ , SR ₁₈ , SOR ₁₈ , SO ₂ R ₁₈ or NR ₁₉ R ₂₀ on the phenyl or naphthyl ring are through the groups R ₁₇ , R ₁₈ , R ₁₉ and / or R ₂₀ When a carbon atom forms a 5-membered or 6-membered ring, a structure including 3 or more rings (including a naphthyl ring) is obtained. Instance system

Wait.

或

之苯基或萘基環之一個碳原子之直接鍵，則形成(例如)諸如

、

結構。 If R ₁₇ forms a bond to a group

or

A direct bond to a carbon atom of a phenyl or naphthyl ring forms, for example, such as

,

structure.

、

等結構。亦即，若R₁₆係經SR₁₈取代之苯基，其中基團R₁₈表示鍵結至其中附接有COR₁₆基團之咔唑部分之苯基或萘基環的直接鍵，則噻噸基部分與咔唑部分之一個苯基或萘基環一起形成。 If R ₁₆ is a phenyl substituted with SR ₁₈ , where the group R ₁₉ represents a direct bond to a phenyl or naphthyl ring bonded to the carbazole moiety to which the COR ₁₆ group is attached, then, for example, such as

,

And other structures. That is, if R ₁₆ is a phenyl substituted with SR ₁₈ , where the group R ₁₈ represents a direct bond to a phenyl or naphthyl ring bonded to a carbazole moiety having a COR ₁₆ group attached thereto, then thioxanthene The base moiety is formed with a phenyl or naphthyl ring of the carbazole moiety.

If R ₁₉ and R ₂₀ together with the N atom to which they are attached form a 5- or 6-membered saturated or unsaturated ring optionally mixed with O, S or NR ₁₇ , then a saturated or unsaturated ring is formed, such as aziridine, Pyrrole, thiazole, pyrrolidine, oxazole, pyridine, 1,3-diazine, 1,2-diazine, hexahydropyridine or morpholine. Preferably, R ₁₉ and R ₂₀ when appended thereto together with the N atom to which optionally is interrupted by O, S or NR 5, or 6 of ₁₇ membered saturated or unsaturated ring, is formed without interrupted or is interrupted by O Or NR ₁₇ , especially O's 5 or 6 member saturated ring.

)等。 If R ₂₁ and R _{22 together} with the attached N atom form a 5- or 6-membered saturated or unsaturated ring optionally mixed with O, S or NR ₂₆ , and the benzene ring is fused with the saturated or unsaturated ring as appropriate , Then form a saturated or unsaturated ring, such as aziridine, pyrrole, thiazole, pyrrolidine, oxazole, pyridine, 1,3-diazine, 1,2-diazine, hexahydropyridine or morpholine or the corresponding ring (E.g

)Wait.

If R ₁₉ and R ₂₀ together with the N atom to which they are attached form a heteroaromatic ring system, the ring system is intended to include more than one ring (e.g., 2 or 3 rings) and one or one from the same species or different species Above heteroatoms. Suitable heteroatom systems are, for example, N, S, O or P, especially N, S or O. Examples are carbazole, indole, isoindole, indazole, purine, isoquinoline, quinoline, oxoline, phenothiazine, and the like.

The term "and / or" or "or / and" in the context of the present invention is intended to express that not only one of the defined substitutions (substituents) may exist, but also a total of several defined substitutions (substituents), that Mixture of different substitutes (substituents).

The term "at least" is intended to define one or more, such as one or both or three, preferably one or both.

The term "optionally substituted" means that the group to which it refers is unsubstituted or substituted.

The term "as the case may be" means that the group to which it refers is not or is not.

Throughout this specification and the scope of patent applications below, unless the context requires otherwise, the word "comprise" or variations (e.g., "comprises" or "comprising") shall be understood to imply the inclusion of the stated integer or Step or integer group or step group, but does not exclude any other integer or step or integer group or step group. The term "(meth) acrylate" in the context of this application is intended to refer to acrylates and corresponding methacrylates.

The preferred ones shown in the text used for the compounds of the present invention in the context of the present invention are intended to refer to all categories of patent application scope, that is, to the patent application scope of compositions, uses, methods, color filters, and the like.

The oxime esters of formula (II) are prepared by the methods described in the literature, for example by reacting the corresponding oxime with a halogen, especially a chloride or an acid anhydride, under the following conditions: (THF) or dimethylformamide], in the presence of a base such as triethylamine or pyridine, or in a basic solvent such as pyridine. In the following, as an example, the preparation of a compound of formula (II-a) is illustrated, in which R ₇ is an oxime ester group and X is a direct bond system [the reaction of compounds (II-b)-(II-h) is carried out starting from an appropriate oxime ]:

R ₁ , R ₂ , R ₅ , R ₆ , R ₈ , R ₁₃ , R ₁₄ and R ₁₅ are as defined above, and Hal means a halogen atom, especially Cl.

R _{14 is} preferably methyl.

These reactions are well known to those skilled in the art and are usually carried out at a temperature of -15 ° C to + 50 ° C, preferably 0 to 25 ° C.

When X is CO, the corresponding oxime is obtained by dividing the methylene methylene group with Nitrification to synthesize. The esterification is then carried out under the same conditions as described above:

之醯鹵或

之酸酐反應來製備如上文所定義式(IV)化合物之方法，其中Hal係鹵素、尤其Cl，且R₁₄係如上文所定義。 Therefore, the object of the present invention is also to make the corresponding oxime compound and the corresponding oxime compound in the presence of a base or a mixture of bases.

Zhi Ling or

A method for the reaction of an acid anhydride to prepare a compound of formula (IV) as defined above, wherein Hal is halogen, especially Cl, and R ₁₄ is as defined above.

The oxime required as a starting material can be obtained through standard chemistry textbooks (such as J. March, Advanced Organic Chemistry, 4th Edition, Wiley Interscience, 1992) or monographs (such as SRSandler & W. Karo, Organic functional group preparations, Section 3, Academic Press).

One of the most convenient methods is, for example, reacting an aldehyde or ketone with hydroxylamine or a salt thereof in a polar solvent such as dimethylacetamide (DMA), aqueous DMA, ethanol or aqueous ethanol. In this case, a base such as sodium acetate or pyridine is added to control the pH of the reaction mixture. It is well known that the reaction rate is pH-dependent, and the base can be added continuously at the beginning or during the reaction. It is also possible to use a basic solvent such as pyridine as the base and / or solvent or co-solvent. The reaction temperature is usually from room temperature to the reflux temperature of the mixture, and is generally about 20 ° C to 120 ° C.

The corresponding ketone intermediates are prepared, for example, by methods described in the literature (e.g. standard chemistry textbooks, e.g. J. March, Advanced Organic Chemistry, 4th edition, Wiley Interscience, 1992). In addition, the continuous Friedel-Crafts reaction can be effectively used for the synthesis of intermediates. These reactions are well known to those skilled in the art.

Another convenient synthesis of oximes is the use of nitrous acid or alkyl nitrite to "active" methylene nitrite. Basic conditions (as described, for example, in Organic Syntheses coll., Volume VI (J. Wiley & Sons, New York, 1988), pages 199 and 840) and acidic conditions (as, for example, Organic Synthesis coll (Vol. V, pages 32 and 373, coll. Vol. III, pages 191 and 513, coll. Vol. II, pages 202, 204 and 363) Suitable for the preparation of oximes used as starting materials in the present invention. Nitrite is generally produced from sodium nitrite. The alkyl nitrite may be, for example, methyl nitrite, ethyl nitrite, propyl nitrite, butyl nitrite, or isoamyl nitrite.

Another embodiment of the present invention is a free oxime compound of formula (IIa):

、COR₁₆、OR₁₇、鹵素、NO₂ 或

；或R₁及R₂、R₂及R₃、R₃及R₄、R₅及R₆、R₆及R₇或R₇ 及R₈彼此獨立地為經

取代之C₂-C₁₀烯基；或R₁及R₂、R₂及R₃、R₃及R₄、R₅及R₆、R₆及R₇或R₇及R₈彼此獨立地共同為-(CH₂)_P-Y-(CH₂)_q-；或R₁及R₂、R₂及R₃、R₃及R₄、R₅及R₆、R₆及R₇或R₇ 及R₈彼此獨立地共同為

；但條件為R₁及R₂、R₂及R₃、R₃及R₄、R₅及R₆、R₆及 R₇或R₇及R₈中至少一對係

，R₉、R₁₀、R₁₁及R₁₂彼此獨立地為氫、C₁-C₂₀烷基，該C₁-C₂₀烷基未經取代或經一或多個以下基團取代：鹵素、苯基、CN、OH、SH、C₁-C₄-烷氧基、(CO)OH或(CO)O(C₁-C₄烷基)； 或R₉、R₁₀、R₁₁及R₁₂彼此獨立地為未經取代之苯基或經一或多個以下基團取代之苯基：C₁-C₆烷基、鹵素、CN、OR₁₇、SR₁₈或NR₁₉R₂₀；或R₉、R₁₀、R₁₁及R₁₂彼此獨立地為鹵素、CN、OR₁₇、SR₁₈、SOR₁₈、SO₂R₁₈或NR₁₉R₂₀，其中該等取代基OR₁₇、SR₁₈或NR₁₉R₂₀視情況經由基團R₁₇、R₁₈、R₁₉及/或R₂₀與萘基環中一個碳原子形成5員或6員環； 或R₉、R₁₀、R₁₁及R₁₂彼此獨立地為

、COR₁₆或NO₂；Y係O、S、NR₂₆或直接鍵；p係整數0、1、2或3；q係整數1、2或3；X係CO或直接鍵；R₁₃係C₁-C₂₀烷基，其未經取代或經一或多個以下基團取代：鹵素、R₁₇、COOR₁₇、OR₁₇、SR₁₈、CONR₁₉R₂₀、 NR₁₉R₂₀、PO(OC_kH_2k+1)₂或

；或R₁₃係C₂-C₂₀烷基，其間雜有一或多個O、S、SO、SO₂、NR₂₆或CO，或係C₂-C₁₂烯基，其未經間雜或間雜有一或多個O、CO或NR₂₆，其中經間雜之C₂-C₂₀烷基及未經間雜或經間雜之C₂-C₁₂烯基未經取代或經一或多個鹵素取代；或R₁₃係C₄-C₈環烯基、C₂-C₁₂炔基或C₃-C₁₀環烷基，其未經間雜或間雜有一或多個O、S、CO或NR₂₆；或R₁₃係苯基或萘基，其各未經取代或經一或多個以下 基團取代：OR₁₇、SR₁₈、NR₁₉R₂₀、

、COR₁₆、CN、NO₂、鹵素、C₁-C₂₀烷基、C₁-C₄鹵代烷基、C₂-C₂₀ 烷基，其間雜有一或多個O、S、CO或NR₂₆；或其各經C₃-C₁₀環烷基或間雜有一或多個O、S、CO或NR₂₆之C₃-C₁₀環烷基取代；k係整數1至10；R₁₅係C₆-C₂₀芳基或C₃-C₂₀雜芳基，其各未經取代或經一或多個以下基團取代：苯基、鹵素、C₁-C₄鹵代烷基、CN、NO₂、OR₁₇、SR₁₈、NR₁₉R₂₀、PO(OC_kH_2k+1)₂、SO-C₁-C₁₀烷基、SO₂-C₁-C₁₀烷基、間雜有一或多個O、S或NR₂₆之C₂-C₂₀烷基；或其各經C₁-C₂₀烷基取代，該C₁-C₂₀烷基未經取代或經一或多個以下基團取代：鹵素、COOR₁₇、CONR₁₉R₂₀、苯基、C₃-C₈環烷基、C₃-C₂₀雜芳基、C₆-C₂₀芳氧基羰基、C₃-C₂₀雜芳氧基羰基、OR₁₇、SR₁₈或NR₁₉R₂₀；或R₁₅係氫、C₂-C₁₂烯基、C₃-C₈環烷基，其未經間雜或間雜有一或多個O、CO或NR₂₆；或R₁₅係C₁-C₂₀烷基，其未經取代或經一或多個以下基團取代：鹵素、OR₁₇、SR₁₈、C₃-C₈環烷基、C₃-C₂₀雜芳基、C₆-C₂₀芳氧基羰基、C₃-C₂₀雜芳氧基羰基、NR₁₉R₂₀、 COOR₁₇、CONR₁₉R₂₀、PO(OC_kH_2k+1)₂、

、

、苯基；或該C₁-C₂₀烷基經苯基取代，該苯基經鹵素、C₁-C₂₀烷基、C₁-C₄鹵代烷基、OR₁₇、SR₁₈或NR₁₉R₂₀取代；或R₁₅係C₂-C₂₀烷基，其間雜有一或多個O、SO或SO₂，且該經間雜之C₂-C₂₀烷基未經取代或經一或多個以下基團取代：鹵素、OR₁₇、COOR₁₇、CONR₁₉R₂₀、苯基或經OR₁₇、SR₁₈或NR₁₉R₂₀取代之苯基；或R₁₅係C₂-C₂₀烷醯基或苯甲醯基，其未經取代或經一或多個以下基團取代：C₁-C₆烷基、鹵素、苯基、OR₁₇、SR₁₈或NR₁₉R₂₀； 或R₁₅係未經取代或經一或多個OR₁₇取代之萘甲醯基或係C₃-C₁₄雜芳基羰基；或R₁₅係C₂-C₁₂烷氧基羰基，其未經間雜或間雜有一或多個O且該經間雜或未經間雜之C₂-C₁₂烷氧基羰基未經取代或經一或多個羥基取代；或R₁₅係苯氧基羰基，其未經取代或經一或多個以下基團取代：C₁-C₆烷基、鹵素、C₁-C₄鹵代烷基、苯基、OR₁₇、SR₁₈或NR₁₉R₂₀；或R₁₅係CN、CONR₁₉R₂₀、NO₂、C₁-C₄鹵代烷基、S(O)_m-C₁-C₆烷基、未經取代或經C₁-C₁₂烷基或SO₂-C₁-C₆烷基取代之S(O)_m-苯基；或R₁₅係SO₂O-苯基，其未經取代或經C₁-C₁₂烷基取代；或係二苯基膦醯基或二(C₁-C₄烷氧基)-膦醯基；m係1或2；R’₁₅具有針對R₁₅所給出含義中之一者；X₁係O、S、SO或SO₂；X₂係O、CO、S或直接鍵；R₁₆係C₆-C₂₀芳基或C₃-C₂₀雜芳基，其每一者未經取代或經一或多個以下基團取代：苯基、鹵素、C₁-C₄鹵代烷基、CN、NO₂、OR₁₇、SR₁₈、NR₁₉R₂₀或間雜有一或多個O、S或NR₂₆之C₁-C₂₀烷基；或其每一者經一或多個C₁-C₂₀烷基取代，該C₁-C₂₀烷基未經取代或經一或多個以下基團取代：鹵素、COOR₁₇、CONR₁₉R₂₀、苯基、C₃-C₈環烷基、C₃-C₂₀雜芳基、C₆-C₂₀芳氧基羰基、C₃-C₂₀雜芳氧基羰基、OR₁₇、SR₁₈或NR₁₉R₂₀；或R₁₆係氫、未經取代或經一或多 個以下基團取代之C₁-C₂₀烷基：鹵素、苯基、OH、SH、CN、C₃-C₆烯氧基、OCH₂CH₂CN、OCH₂CH₂(CO)O(C₁-C₄烷基)、O(CO)-(C₁-C₄烷基)、O(CO)-苯基、(CO)OH或(CO)O(C₁-C₄烷基)；或R₁₆係間雜有一或多個O、S或NR₂₆之C₂-C₁₂烷基；或R₁₆係(CH₂CH₂O)_n+1H、(CH₂CH₂O)_n(CO)-(C₁-C₈烷基)、C₂-C₁₂烯基或C₃-C₈環烷基；或R₁₆係經SR₁₈取代之苯基，其中基團R₁₈表示鍵結至其中附接有COR₁₆基團之咔唑部分之苯基或萘基環的直接鍵；n係1至20；R₁₇係氫、苯基-C₁-C₃烷基、C₁-C₂₀烷基，其未經取代或經一或多個以下基團取代：鹵素、OH、SH、CN、C₃-C₆烯氧基、OCH₂CH₂CN、OCH₂CH₂(CO)O(C₁-C₄烷基)、O(CO)-(C₁-C₄烷基)、O(CO)-(C₂-C₄烯基)、O(CO)-苯基、(CO)OH、(CO)O(C₁-C₄烷基)、SO₂-(C₁-C₄鹵代烷基)、O(C₁-C₄鹵代烷基)、C₃-C₂₀環烷基或間雜有一或多個O之C₃-C₂₀環烷基；或R₁₇係C₂-C₂₀烷基，其間雜有一或多個O、S或NR₂₆；或R₁₇係(CH₂CH₂O)_n+1H、(CH₂CH₂O)_n(CO)-(C₁-C₈烷基)、C₁-C₈烷醯基、C₂-C₁₂烯基、C₃-C₆烯醯基或C₃-C₂₀環烷基，其未經間雜或間雜有一或多個O、S、CO或NR₂₆；或R₁₇係C₁-C₈烷基-C₃-C₁₀環烷基，其未經間雜或間雜有一或多個O； 或R₁₇係苯甲醯基，其未經取代或經一或多個C₁-C₆烷基、鹵素、OH或C₁-C₃烷氧基取代；或R₁₇係苯基、萘基或C₃-C₂₀雜芳基，其各未經取代或經一或多個以下基團取代：鹵素、OH、C₁-C₁₂烷基、C₁-C₁₂烷氧基、CN、NO₂、苯基-C₁-C₃烷氧基、苯氧基、C₁-C₁₂烷基硫基、苯基硫基、N(C₁-C₁₂烷基)₂、二苯基-胺基或

； 或R₁₇形成鍵結至其上具有基團

或

之苯基或萘基環之一個碳原子之直接鍵；R₁₈係氫、C₂-C₁₂烯基、C₃-C₂₀環烷基或苯基-C₁-C₃烷基，其中C₂-C₁₂烯基、C₃-C₂₀環烷基或苯基-C₁-C₃烷基未經間雜或間雜有一或多個O、S、CO、NR₂₆或COOR₁₇；或R₁₈係C₁-C₂₀烷基，其未經取代或經一或多個以下基團取代：OH、SH、CN、C₃-C₆烯氧基、OCH₂CH₂CN、OCH₂CH₂(CO)O(C₁-C₄烷基)、O(CO)-(C₂-C₄烯基)、O(CO)-(C₁-C₄烷基)、O(CO)-苯基或(CO)OR₁₇；或R₁₈係C₂-C₂₀烷基，其間雜有一或多個O、S、CO、NR₂₆或COOR₁₇；或R₁₈係(CH₂CH₂O)_nH、(CH₂CH₂O)_n(CO)-(C₁-C₈烷基)、C₂-C₈烷醯基或C₃-C₆烯醯基；或R₁₈係苯甲醯基，其未經取代或經一或多個以下基團取代：C₁-C₆烷基、鹵素、OH、C₁-C₄烷氧基或C₁-C₄烷基硫基；或R₁₈係苯基、萘基或C₃-C₂₀雜芳基，其各未經取代或經一或多個以下基團取代：鹵素、C₁-C₁₂烷基、C₁-C₄鹵代烷基、C₁-C₁₂烷氧基、CN、NO₂、苯基-C₁-C₃烷氧基、苯氧基、C₁-C₁₂烷基硫基、苯基硫基、N(C₁-C₁₂烷基)₂、二 苯基胺基、(CO)O(C₁-C₈烷基)、(CO)-C₁-C₈烷基、 (CO)N(C₁-C₈烷基)₂或

。 Wherein R ₁ , R ₂ , R ₃ , R ₄ , R ₅ , R ₆ , R ₇ and R ₈ are independently hydrogen, C ₁ -C ₂₀ alkyl,

, COR ₁₆ , OR ₁₇ , halogen, NO ₂ or

; Or R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ , R ₅ and R ₆ , R ₆ and R ₇ or R ₇ and R ₈ are independent of each other.

Substituted C ₂ -C ₁₀ alkenyl; or R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ , R ₅ and R ₆ , R ₆ and R _7, or R ₇ and R ₈ are independently common with each other Is-(CH ₂ ) _P -Y- (CH ₂ ) _q- ; or R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ , R ₅ and R ₆ , R ₆ and R ₇ or R ₇ And R ₈ independently of each other are

But provided that at least one of R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ , R ₅ and R ₆ , R ₆ and R ₇ or R ₇ and R ₈

, R ₉ , R ₁₀ , R ₁₁ and R ₁₂ are independently of each other hydrogen, C ₁ -C ₂₀ alkyl, the C ₁ -C ₂₀ alkyl is unsubstituted or substituted with one or more of the following groups: halogen, Phenyl, CN, OH, SH, C ₁ -C ₄ -alkoxy, (CO) OH or (CO) O (C ₁ -C ₄ alkyl); or R ₉ , R ₁₀ , R ₁₁ and R ₁₂ Independently of each other are unsubstituted phenyl or phenyl substituted with one or more of the following: C ₁ -C ₆ alkyl, halogen, CN, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₉ , R ₁₀ , R ₁₁ and R ₁₂ are independently of each other halogen, CN, OR ₁₇ , SR ₁₈ , SOR ₁₈ , SO ₂ R ₁₈ or NR ₁₉ R ₂₀ , wherein the substituents OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ optionally forms a 5- or 6-membered ring with one carbon atom in the naphthyl ring via the groups R ₁₇ , R ₁₈ , R ₁₉ and / or R ₂₀ ; or R ₉ , R ₁₀ , R ₁₁ and R ₁₂ are independent of each other for

, COR ₁₆ or NO ₂ ; Y is O, S, NR ₂₆ or direct bond; p is integer 0, 1, 2 or 3; q is integer 1, 2 or 3; X is CO or direct bond; R ₁₃ is C _1- C ₂₀ alkyl, which is unsubstituted or substituted with one or more of the following groups: halogen, R ₁₇ , COOR ₁₇ , OR ₁₇ , SR ₁₈ , CONR ₁₉ R ₂₀ , NR ₁₉ R ₂₀ , PO (OC _k H _{2k + 1} ) ₂ or

; Or R ₁₃ is a C ₂ -C ₂₀ alkyl group, which is interspersed with one or more O, S, SO, SO ₂ , NR ₂₆ or CO, or C ₂ -C ₁₂ alkenyl group, which is not interspersed or interspersed with one Or more O, CO or NR ₂₆ in which the interspersed C ₂ -C ₂₀ alkyl and unsaturated or interspersed C ₂ -C ₁₂ alkenyl are unsubstituted or substituted with one or more halogens; or R ₁₃ is a C ₄ -C ₈ cycloalkenyl, C ₂ -C ₁₂ alkynyl, or C ₃ -C ₁₀ cycloalkyl group, which is not interspersed or interspersed with one or more O, S, CO, or NR ₂₆ ; or R ₁₃ Phenyl or naphthyl, each unsubstituted or substituted with one or more of the following groups: OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ ,

COR ₁₆ , CN, NO ₂ , halogen, C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, C ₂ -C ₂₀ alkyl, interposed with one or more O, S, CO or NR ₂₆ ; each warp or C ₃ -C ₁₀ cycloalkyl, or interrupted by one or more O, S, CO or NR ₂₆ of the C ₃ -C ₁₀ cycloalkyl; K-based integer from 1 to 10; R ₁₅ lines C ₆ - C ₂₀ aryl or C ₃ -C ₂₀ heteroaryl, each unsubstituted or substituted with one or more of the following groups: phenyl, halogen, C ₁ -C ₄ haloalkyl, CN, NO ₂ , OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ , PO (OC _k H _{2k + 1} ) ₂ , SO-C ₁ -C ₁₀ alkyl, SO ₂ -C ₁ -C ₁₀ alkyl, interspersed with one or more O, S or C ₂ -C ₂₀ alkyl group of NR ₂₆ ; or each C ₁ -C ₂₀ alkyl group substituted, the C ₁ -C ₂₀ alkyl group is unsubstituted or substituted with one or more of the following groups: halogen, COOR ₁₇ , CONR ₁₉ R ₂₀ , phenyl, C ₃ -C ₈ cycloalkyl, C ₃ -C ₂₀ heteroaryl, C ₆ -C ₂₀ aryloxycarbonyl, C ₃ -C ₂₀ heteroaryloxycarbonyl, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₁₅ is hydrogen, C ₂ -C ₁₂ alkenyl, C ₃ -C ₈ cycloalkyl, which is not interspersed or interspersed with one or more O, CO or NR ₂₆ ; or R ₁₅ C ₁ -C ₂₀ alkyl-based, which was used without A substituted or by one or more of the following groups: _{halo, OR 17, SR 18, C} 3 -C 8 cycloalkyl, C ₃ -C ₂₀ heteroaryl, C ₆ -C ₂₀ aryloxycarbonyl group, C ₃ -C ₂₀ heteroaryloxycarbonyl, NR ₁₉ R ₂₀ , COOR ₁₇ , CONR ₁₉ R ₂₀ , PO (OC _k H _{2k + 1} ) ₂ ,

,

, Phenyl; or the C ₁ -C ₂₀ alkyl group is substituted with a phenyl group, the phenyl group is halogen, C ₁ -C ₂₀ alkyl group, C ₁ -C ₄ haloalkyl group, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ Substituted; or R ₁₅ is a C ₂ -C ₂₀ alkyl group, in which one or more O, SO, or SO ₂ is interspersed, and the interspersed C ₂ -C ₂₀ alkyl group is unsubstituted or substituted by one or more groups Group substitution: halogen, OR ₁₇ , COOR ₁₇ , CONR ₁₉ R ₂₀ , phenyl or phenyl substituted with OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₁₅ is a C ₂ -C ₂₀ alkylfluorenyl or benzyl Fluorenyl, which is unsubstituted or substituted with one or more of the following: C ₁ -C ₆ alkyl, halogen, phenyl, OR ₁₇ , SR _18, or NR ₁₉ R ₂₀ ; or R ₁₅ is unsubstituted or A naphthylmethyl group substituted with one or more OR ₁₇ or a C ₃ -C ₁₄ heteroarylcarbonyl group; or R ₁₅ is a C ₂ -C ₁₂ alkoxycarbonyl group, which is not interspersed or interspersed with one or more O And the C ₂ -C ₁₂ alkoxycarbonyl group is unsubstituted or substituted with one or more hydroxyl groups; or R ₁₅ is a phenoxycarbonyl group which is unsubstituted or substituted with one or more Group substitution: C ₁ -C ₆ alkyl, halogen, C ₁ -C ₄ haloalkyl, phenyl, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₁₅ is CN, CONR ₁₉ R ₂₀ , NO ₂ , C ₁ -C ₄ haloalkyl, S (O) _m -C ₁ -C ₆ alkyl, unsubstituted or C ₁ -C ₁₂ alkyl or SO ₂ -C ₁ -C ₆ alkyl substituted S (O) _m -phenyl; or R ₁₅ is SO ₂ O-phenyl, which is unsubstituted or substituted by C ₁ -C ₁₂ Group substitution; or is diphenylphosphinofluorenyl or bis (C ₁ -C ₄ alkoxy) -phosphinofluorenyl; m is 1 or 2; R _'15 has one of the meanings given for R ₁₅ ; X ₁ is O, S, SO or SO ₂ ; X ₂ is O, CO, S or a direct bond; R ₁₆ is C ₆ -C ₂₀ aryl or C ₃ -C ₂₀ heteroaryl, each of which is not Substituted or substituted with one or more of the following groups: phenyl, halogen, C ₁ -C ₄ haloalkyl, CN, NO ₂ , OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ or interspersed with one or more O, S or C ₁ -C ₂₀ alkyl of NR ₂₆ ; or each of them is substituted by one or more C ₁ -C ₂₀ alkyl, the C ₁ -C ₂₀ alkyl is unsubstituted or substituted by one or more of the following Substitution: halogen, COOR ₁₇ , CONR ₁₉ R ₂₀ , phenyl, C ₃ -C ₈ cycloalkyl, C ₃ -C ₂₀ heteroaryl, C ₆ -C ₂₀ aryloxycarbonyl, C ₃ -C ₂₀ heteroaryl butoxycarbonyl, oR _17, SR ₁₈ or NR ₁₉ R _20; or R ₁₆ lines , Unsubstituted or substituted with one or more of the following radicals C ₁ -C ₂₀ alkyl group: halogen, phenyl, OH, SH, CN, C 3 -C 6 alkenyloxy, OCH ₂ CH ₂ CN, OCH ₂ CH ₂ (CO) O (C ₁ -C ₄ alkyl), O (CO)-(C ₁ -C ₄ alkyl), O (CO) -phenyl, (CO) OH or (CO) O ( (C ₁ -C ₄ alkyl); or R ₁₆ is a C ₂ -C ₁₂ alkyl mixed with one or more O, S or NR ₂₆ ; or R ₁₆ is (CH ₂ CH ₂ O) _{n + 1} H, ( CH ₂ CH ₂ O) _n (CO)-(C ₁ -C ₈ alkyl), C ₂ -C ₁₂ alkenyl or C ₃ -C ₈ cycloalkyl; or R ₁₆ is phenyl substituted with SR ₁₈ , Where the group R ₁₈ represents a direct bond to a phenyl or naphthyl ring bonded to the carbazole moiety to which the COR ₁₆ group is attached; n is 1 to 20; R ₁₇ is hydrogen, phenyl-C ₁ -C ₃ alkyl, C ₁ -C ₂₀ alkyl, unsubstituted or substituted with one or more of the following groups: halogen, OH, SH, CN, C ₃ -C ₆ alkenyloxy, OCH ₂ CH ₂ CN, OCH ₂ CH ₂ (CO) O (C ₁ -C ₄ alkyl), O (CO)-(C ₁ -C ₄ alkyl), O (CO)-(C ₂ -C ₄ alkenyl), O ( CO) -phenyl, (CO) OH, (CO) O (C ₁ -C ₄ alkyl), SO _2- (C ₁ -C ₄ haloalkyl), O (C ₁ -C ₄ haloalkyl), C or ₃ -C ₂₀ cycloalkyl interrupted by one or more of C ₃ -C ₂₀ O Alkyl group; R _17, or C ₂ -C ₂₀ alkyl-based, have therebetween one or more heteroatoms O, S or NR _26; or R ₁₇ lines _{(CH 2 CH 2 O) n} + 1 H, (CH 2 CH 2 O ) _n (CO)-(C ₁ -C ₈ alkyl), C ₁ -C ₈ alkyl, C ₂ -C ₁₂ alkenyl, C ₃ -C ₆ alkenyl or C ₃ -C ₂₀ cycloalkyl , Which is not interspersed or interspersed with one or more O, S, CO or NR ₂₆ ; or R ₁₇ is a C ₁ -C ₈ alkyl-C ₃ -C ₁₀ cycloalkyl group, which is unstrained or interspersed with one or more O; or R ₁₇ is benzamidine, which is unsubstituted or substituted with one or more C ₁ -C ₆ alkyl, halogen, OH or C ₁ -C ₃ alkoxy; or R ₁₇ is phenyl , Naphthyl or C ₃ -C ₂₀ heteroaryl, each unsubstituted or substituted with one or more of the following groups: halogen, OH, C ₁ -C ₁₂ alkyl, C ₁ -C ₁₂ alkoxy, CN, NO ₂ , phenyl-C ₁ -C ₃ alkoxy, phenoxy, C ₁ -C ₁₂ alkylthio, phenylthio, N (C ₁ -C ₁₂ alkyl) ₂ , diphenyl Amino-amino

; Or R ₁₇ forms a bond to a group having

or

Direct bond of one carbon atom of phenyl or naphthyl ring; R ₁₈ is hydrogen, C ₂ -C ₁₂ alkenyl, C ₃ -C ₂₀ cycloalkyl or phenyl-C ₁ -C ₃ alkyl, where C _2- C ₁₂ alkenyl, C ₃ -C ₂₀ cycloalkyl or phenyl-C ₁ -C ₃ alkyl without one or more O, S, CO, NR ₂₆ or COOR ₁₇ ; or R ₁₈ Is a C ₁ -C ₂₀ alkyl group, which is unsubstituted or substituted with one or more of the following groups: OH, SH, CN, C ₃ -C ₆ alkenyloxy, OCH ₂ CH ₂ CN, OCH ₂ CH ₂ ( CO) O (C ₁ -C ₄ alkyl), O (CO)-(C ₂ -C ₄ alkenyl), O (CO)-(C ₁ -C ₄ alkyl), O (CO) -phenyl Or (CO) OR ₁₇ ; or R ₁₈ is a C ₂ -C ₂₀ alkyl group, which is interspersed with one or more O, S, CO, NR ₂₆ or COOR ₁₇ ; or R ₁₈ (CH ₂ CH ₂ O) _n H , (CH ₂ CH ₂ O) _n (CO)-(C ₁ -C ₈ alkyl), C ₂ -C ₈ alkylfluorenyl or C ₃ -C ₆ alkenyl; or R ₁₈ benzamyl, It is unsubstituted or substituted with one or more of the following groups: C ₁ -C ₆ alkyl, halogen, OH, C ₁ -C ₄ alkoxy, or C ₁ -C ₄ alkylthio; or R ₁₈ series phenyl, naphthyl or C ₃ -C ₂₀ heteroaryl, each of which is unsubstituted or substituted with one or more of the following radicals: halogen, C ₁ -C ₁₂ alkyl, C ₁ -C ₄ Substituted alkyl, C ₁ -C ₁₂ alkoxy, CN, NO _2, phenyl -C ₁ -C ₃ alkoxy, phenoxy, C ₁ -C ₁₂ alkylthio, phenylthio, N (C ₁ -C ₁₂ alkyl) ₂ , diphenylamino, (CO) O (C ₁ -C ₈ alkyl), (CO) -C ₁ -C ₈ alkyl, (CO) N (C ₁ -C ₈ alkyl) ₂ or

.

或C₃-C₂₀環烷基，該C₃-C₂₀環烷基未經間雜或間雜有一或多個O、S、CO或NR₁₇；或R₁₉及R₂₀與其所附接之N原子一起形成雜芳香族環系統，該環系統未經取代或經一或多個以下基團取代：C₁-C₂₀烷基、C₁-C₄鹵代烷基、C₁-C₂₀烷氧基、=O、OR₁₇、SR₁₈、NR₂₁R₂₂、(CO)R₂₃、

、鹵素、NO₂、CN、苯基或C₃-C₂₀環烷基，該C₃-C₂₀環烷基未經間雜或間雜有一或多個O、S、CO或NR₁₇；R₂₁及R₂₂彼此獨立地為氫、C₁-C₂₀烷基、C₁-C₄鹵代烷基、C₃-C₁₀環烷基或苯基；或R₂₁及R₂₂與其所附接之N原子一起形成未經間雜或間雜有O、S或NR₂₆之5員或6員飽和或不飽和環，且該5員或6員飽和或不飽和環未稠合或該5員或6員飽和或不飽和環係與苯環稠合； R₂₃係氫、OH、C₁-C₂₀烷基、C₁-C₄鹵代烷基、間雜有一或多個O、CO或NR₂₆之C₂-C₂₀烷基、未經間雜或間雜有O、S、CO或NR₂₆之C₃-C₂₀環烷基，或R₂₃係苯基、萘基、苯基-C₁-C₄烷基、OR₁₇、SR₁₈或NR₂₁R₂₂；R₂₄係(CO)OR₁₇、CONR₁₉R₂₀、(CO)R₁₇；或R₂₄具有針對R₁₉及R₂₀所給出含義中之一者；R₂₅係COOR₁₇、CONR₁₉R₂₀、(CO)R₁₇；或R₂₅具有針對R₁₇所給出含義中之一者；R₂₆係氫、C₁-C₂₀烷基、C₁-C₄鹵代烷基、C₂-C₂₀烷基，其間雜有一或多個O或CO；或係苯基-C₁-C₄烷基、C₃-C₈環烷基，其未經間雜或間雜有一或多個O或CO；或係(CO)R₁₉；或係苯基，其未經取代或經一或多個以下基團取代：C₁-C₂₀烷基、鹵素、C₁-C₄鹵代烷 基、OR₁₇、SR₁₈、NR₁₉R₂₀或

； 但條件為在該分子中存在至少一個基團

或

。 R ₁₉ and R ₂₀ are each independently hydrogen, C ₁ -C ₂₀ alkyl, C ₂ -C ₄ hydroxyalkyl, C ₂ -C ₁₀ alkoxyalkyl, C ₂ -C ₅ alkenyl, C _3- C ₂₀ cycloalkyl, phenyl-C ₁ -C ₃ alkyl, SO _2- (C ₁ -C ₄ haloalkyl), C ₁ -C ₈ alkylfluorenyl, C ₁ -C ₈ alkylfluorenyloxy, C ₃ -C ₁₂ alkenyl or benzamidine; or R ₁₉ and R ₂₀ are phenyl, naphthyl, or C ₃ -C ₂₀ heteroaryl, each of which is unsubstituted or has one or more of the following groups Substitution: halogen, C ₁ -C ₄ haloalkyl, C ₁ -C ₂₀ alkoxy, C ₁ -C ₁₂ alkyl, benzamyl or C ₁ -C ₁₂ alkoxy; or R ₁₉ and R ₂₀ with The attached N atoms together form a 5- or 6-membered saturated or unsaturated ring that is not interspersed or interspersed with O, S, or NR ₁₇ , and the 5- or 6-membered saturated or unsaturated ring is unsubstituted or Or more of the following groups substituted: C ₁ -C ₂₀ alkyl, C ₁ -C ₂₀ alkoxy, = O, OR ₁₇ , SR ₁₈ , NR ₂₁ R ₂₂ , (CO) R ₂₃ , NO ₂ , halogen, C ₁ -C ₄ -haloalkyl, CN, phenyl,

Or C ₃ -C ₂₀ cycloalkyl, the C ₃ -C ₂₀ cycloalkyl has one or more O, S, CO, or NR ₁₇ without interspersed or interspersed; or R ₁₉ and R ₂₀ with the N atom to which it is attached Together form a heteroaromatic ring system that is unsubstituted or substituted with one or more of the following groups: C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, C ₁ -C ₂₀ alkoxy, = O, OR ₁₇ , SR ₁₈ , NR ₂₁ R ₂₂ , (CO) R ₂₃ ,

, Halogen, NO ₂ , CN, phenyl, or C ₃ -C ₂₀ cycloalkyl, the C ₃ -C ₂₀ cycloalkyl has one or more O, S, CO, or NR ₁₇ uninterspersed or interspersed; R ₂₁ and R _{22 is} independently of each other hydrogen, C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, C ₃ -C ₁₀ cycloalkyl or phenyl; or R ₂₁ and R ₂₂ together with the N atom to which they are attached Forms a 5- or 6-membered saturated or unsaturated ring without interspersed or interspersed O, S, or NR ₂₆ , and the 5- or 6-membered saturated or unsaturated ring is not fused or the 5- or 6-membered saturated or unsaturated ring saturated ring system is fused with a benzene ring; R ₂₃ type hydrogen, OH, C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, interrupted by one or more O, cO or NR C ₂₆ alkoxy of ₂ -C ₂₀ , C ₃ -C ₂₀ cycloalkyl without meta or hetero, O, S, CO or NR ₂₆ , or R ₂₃ phenyl, naphthyl, phenyl-C ₁ -C ₄ alkyl, OR ₁₇ , SR ₁₈ or NR ₂₁ R ₂₂ ; R ₂₄ is (CO) OR ₁₇ , CONR ₁₉ R ₂₀ , (CO) R ₁₇ ; or R ₂₄ has one of the meanings given for R ₁₉ and R ₂₀ ; R ₂₅ is COOR ₁₇ , CONR ₁₉ R ₂₀ , (CO) R ₁₇ ; or R ₂₅ has one of the meanings given for R ₁₇ ; R ₂₆ is hydrogen, C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl , C ₂ -C ₂₀ alkyl, with one or more O or CO interspersed between them; or phenyl-C ₁ -C ₄ alkyl, C ₃ -C ₈ cycloalkyl, without interspersed or interspersed with one or more O Or CO; or (CO) R ₁₉ ; or phenyl, which is unsubstituted or substituted with one or more of the following groups: C ₁ -C ₂₀ alkyl, halogen, C ₁ -C ₄ haloalkyl, OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ or

; Provided that at least one group is present in the molecule

or

.

)皆替換為相應游離肟基團

。 Preferred groups defined for compounds of formula (IIa) correspond to those given for compounds of formula (II) as given below, except that each defined oxime ester group (e.g.

) Are replaced by the corresponding free oxime group

.

Each oxime ester group can exist in two configurations (Z) or (E). Isomers can be separated by conventional methods, but it is also possible to use a mixture of isomers as, for example, a photoinitiator. Accordingly, the present invention also relates to a mixture of configurational isomers of a compound of formula (II).

、COR₁₆或NO₂，或R₁及R₂、R₂及R₃、R₃及R₄、R₅及R₆、R₆及R₇或R₇ 及R₈彼此獨立地共同為

；但條件為R₁及R₂、R₂及R₃、R₃及R₄、R₅及R₆、R₆及 R₇或R₇及R₈中至少一對係

，X係CO或直接鍵；R₁₃係C₁-C₂₀烷基，其未經取代或經一或多個以下基團取代：鹵素、OR₁₇、SR₁₈、COOR₁₇、CONR₁₉R₂₀或PO(OC_kH_2k+1)₂；或R₁₃係C₂-C₂₀烷基，其間雜有一或多個O、S、NR₂₆或CO；或R₁₃係苯基或萘基，此二者未經取代或經一或多個

或COR₁₆取代；R₁₄係C₁-C₂₀烷基、苯基或C₁-C₈烷氧基；R₁₅係苯基、萘基、C₃-C₂₀雜芳基，其各未經取代或經一或多個以下基團取代：苯基、鹵素、C₁-C₄鹵代烷基、OR₁₇、SR₁₈或C₂-C₂₀烷基，其間雜有一或多個O或S；或其各經一或多個C₁-C₂₀烷基取代，該C₁-C₂₀烷基未經取代或經一或多個以下基團取代：鹵素、COOR₁₇、CONR₁₉R₂₀、苯基、C₃-C₈環烷基、C₃-C₂₀雜芳基、C₆-C₂₀芳氧基羰基、 C₄-C₂₀雜芳氧基羰基、OR₁₇、SR₁₈、NR₁₉R₂₀或PO(OC_kH_2k+1)₂；或R₁₅係C₁-C₂₀烷基，其未經取代或經一或多個以下基團取代：OR₁₇、SR₁₈、C₃-C₈環烷基、C₃-C₂₀雜芳基、NR₁₉R₂₀、COOR₁₇、CONR₁₉R₂₀或PO(OC_kH_2k+1)₂；R’₁₄具有針對R₁₄所給出含義中之一者；R’₁₅具有針對R₁₅所給出含義中之一者；R₁₆係苯基，其未經取代或經一或多個以下基團取代：OR₁₇、SR₁₈、NR₁₉R₂₀或間雜有一或多個O、S或NR₂₆之C₂-C₂₀烷基，或R₁₆係苯基，其經一或多個C₁-C₂₀烷基取代，該C₁-C₂₀烷基未經取代或經一或多個以下基團取代：鹵素、COOR₁₇、CONR₁₉R₂₀、苯基、C₃-C₈環烷基、C₃-C₂₀雜芳基、C₆-C₂₀芳氧基羰基、C₄-C₂₀雜芳氧基羰基、OR₁₇、SR₁₈或NR₁₉R₂₀；或R₁₆係C₁-C₂₀烷基，其未經取代或經以下基團取代：鹵素、苯基、OH、SH、CN、C₃-C₆烯氧基、OCH₂CH₂(CO)O(C₁-C₄烷基)、O(CO)-(C₁-C₄烷基)或(CO)O(C₁-C₄烷基)；R₁₇係C₁-C₂₀烷基，其未經取代或經一或多個以下基團取代：鹵素、OCH₂CH₂(CO)O(C₁-C₄烷基)、O(C₁-C₄烷基)、(CO)O(C₁-C₄烷基)、C₃-C₂₀環烷基或間雜有一或多個O之C₃-C₂₀環烷基；或R₁₇係C₂-C₂₀烷基，其間雜有一或多個O； R₁₈係經(CO)OR₁₇取代之甲基；R₁₉及R₂₀彼此獨立地為氫、苯基、C₁-C₂₀烷基、C₁-C₈烷醯基或C₁-C₈烷醯基氧基；或R₁₉及R₂₀與其所附接之N原子一起形成雜芳香族環 系統，該環系統未經取代或經

取代； 但條件為在該分子中存在至少一個基團

或

。 Preferred are compounds of formula (II) as defined above, wherein R ₁ , R ₂ , R ₃ , R ₄ , R ₅ , R ₆ , R ₇ and R ₈ are independently hydrogen, C ₁ -C ₂₀ alkyl,

, COR ₁₆ or NO ₂ , or R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ , R ₅ and R ₆ , R ₆ and R ₇ or R ₇ and R ₈ independently of one another are

But provided that at least one of R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ , R ₅ and R ₆ , R ₆ and R ₇ or R ₇ and R ₈

, X is CO or a direct bond; R ₁₃ is a C ₁ -C ₂₀ alkyl group, which is unsubstituted or substituted with one or more of the following groups: halogen, OR ₁₇ , SR ₁₈ , COOR ₁₇ , CONR ₁₉ R ₂₀ or PO (OC _k H _{2k + 1} ) ₂ ; or R ₁₃ is a C ₂ -C ₂₀ alkyl group with one or more O, S, NR ₂₆ or CO interposed therebetween; or R ₁₃ is phenyl or naphthyl, both Unsubstituted or one or more

Or COR ₁₆ substitution; R ₁₄ is C ₁ -C ₂₀ alkyl, phenyl or C ₁ -C ₈ alkoxy; R ₁₅ is phenyl, naphthyl, C ₃ -C ₂₀ heteroaryl, each without Substituted or substituted with one or more of the following groups: phenyl, halogen, C ₁ -C ₄ haloalkyl, OR ₁₇ , SR ₁₈ or C ₂ -C ₂₀ alkyl, interspersed with one or more O or S; or They are each substituted with one or more C ₁ -C ₂₀ alkyl groups, the C ₁ -C ₂₀ alkyl group being unsubstituted or substituted with one or more of the following groups: halogen, COOR ₁₇ , CONR ₁₉ R ₂₀ , phenyl , C ₃ -C ₈ cycloalkyl, C ₃ -C ₂₀ heteroaryl, C ₆ -C ₂₀ aryloxycarbonyl, C ₄ -C ₂₀ heteroaryloxycarbonyl, OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ Or PO (OC _k H _{2k + 1} ) ₂ ; or R ₁₅ is a C ₁ -C ₂₀ alkyl group, which is unsubstituted or substituted with one or more of the following groups: OR ₁₇ , SR ₁₈ , C ₃ -C ₈ Cycloalkyl, C ₃ -C ₂₀ heteroaryl, NR ₁₉ R ₂₀ , COOR ₁₇ , CONR ₁₉ R ₂₀ or PO (OC _k H _{2k + 1} ) ₂ ; R _'14 has one of the meanings given for R ₁₄ One; R _'15 has one of the meanings given for R ₁₅ ; R ₁₆ is phenyl, which is unsubstituted or substituted with one or more of the following groups: OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ Or interspersed with one or more O, S or NR ₂₆ C ₂ -C ₂₀ alkyl groups, or R ₁₆ series phenyl, which is substituted with one or more C ₁ -C ₂₀ alkyl groups, the C ₁ -C ₂₀ alkyl groups Is unsubstituted or substituted with one or more of the following groups: halogen, COOR ₁₇ , CONR ₁₉ R ₂₀ , phenyl, C ₃ -C ₈ cycloalkyl, C ₃ -C ₂₀ heteroaryl, C ₆ -C ₂₀ aryloxycarbonyl, C ₄ -C ₂₀ heteroaryloxycarbonyl, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₁₆ is C ₁ -C ₂₀ alkyl, which is unsubstituted or substituted with : Halogen, phenyl, OH, SH, CN, C ₃ -C ₆ alkenyloxy, OCH ₂ CH ₂ (CO) O (C ₁ -C ₄ alkyl), O (CO)-(C ₁ -C ₄ Alkyl) or (CO) O (C ₁ -C ₄ alkyl); R ₁₇ is C ₁ -C ₂₀ alkyl, which is unsubstituted or substituted with one or more of the following groups: halogen, OCH ₂ CH ₂ (CO) O (C ₁ -C ₄ alkyl), O (C ₁ -C ₄ alkyl), (CO) O (C ₁ -C ₄ alkyl), C ₃ -C ₂₀ cycloalkyl or interspersed Or C ₃ -C ₂₀ cycloalkyl of O; or R ₁₇ is C ₂ -C ₂₀ alkyl with one or more O interposed therebetween; R ₁₈ is methyl substituted with (CO) OR ₁₇ ; R ₁₉ and R ₂₀ independently of one another hydrogen, phenyl, C ₁ -C ₂₀ alkyl, C ₁ -C ₈ alkanoyl group or a C ₁ -C ₈ alkanoyl-yloxy ; Or R ₁₉ and R ₂₀ appended thereto the N atom to form a heteroaromatic ring system with the ring system is unsubstituted or

Substitution; provided that at least one group is present in the molecule

or

.

、COR₁₆或NO₂， R₃及R₄一起為

；R₉、R₁₀、R₁₁及R₁₂係氫；X係直接鍵；R₁₃係C₁-C₂₀烷基；R₁₄係C₁-C₂₀烷基；R₁₅係C₁-C₂₀烷基或苯基，其經一或多個OR₁₇或C₁-C₂₀烷基取代；R₁₆係苯基，其經一或多個C₁-C₂₀烷基或OR₁₇取代；且R₁₇係未經取代或經一或多個鹵素取代之C₁-C₂₀烷基或係間雜有一或多個O之C₂-C₂₀烷基。 Attention must be paid to compounds of formula (II) as defined above, wherein R ₁ , R ₂ , R ₅ , R ₆ , R ₇ and R ₈ are independently hydrogen,

, COR ₁₆ or NO ₂ , R ₃ and R ₄ together are

; R ₉ , R ₁₀ , R ₁₁ and R ₁₂ are hydrogen; X is a direct bond; R ₁₃ is C ₁ -C ₂₀ alkyl; R ₁₄ is C ₁ -C ₂₀ alkyl; R ₁₅ is C ₁ -C ₂₀ Alkyl or phenyl substituted with one or more OR ₁₇ or C ₁ -C ₂₀ alkyl; R ₁₆ is phenyl substituted with one or more C ₁ -C ₂₀ alkyl or OR ₁₇ ; and R ₁₇ based unsubstituted or substituted with one or more of halogen or C ₁ -C ₂₀ alkyl interrupted by one or more lines of C ₂ -C ₂₀ O-alkyl.

。 Provided that at least one group is present in the molecule

.

；但條件為R₁及R₂、R₃及R₄或R₅及R₆中至少一對為

； 或R₂係

、COR₁₆、NO₂或

或R₇係

或COR₁₆；R₉、R₁₁及R₁₂係氫；R₁₀係氫、OR₁₇或COR₁₆；X係CO或直接鍵；R₁₃係C₁-C₂₀烷基，其未經取代或經一或多個以下基團取代：鹵素、R₁₇、OR₁₇、SR₁₈或PO(OC_kH_2k+1)₂；或R₁₃係C₂-C₂₀烷基，其間雜有一或多個O；或R₁₃係苯基；k係整數2；R₁₄係C₁-C₂₀烷基或噻吩基；R₁₅係苯基或萘基，其各未經取代或經一或多個OR₁₇或C₁-C₂₀烷基取代；或R₁₅係噻吩基、氫、C₁-C₂₀烷基，該 C₁-C₂₀烷基未經取代或經一或多個以下基團取代：OR₁₇、SR₁₈、C₃-C₈環烷基、NR₁₉R₂₀或COOR₁₇；或R₁₅係C₂-C₂₀烷基，其間雜有SO₂；R₁₆係苯基或萘基，其各未經取代或經一或多個以下基團取代：OR₁₇、SR₁₈、NR₁₉R₂₀或C₁-C₂₀烷基；或R₁₆係噻吩基；R₁₇係氫、C₁-C₈烷醯基、C₁-C₂₀烷基，其未經取代或經一或多個以下基團：鹵素、O(CO)-(C₁-C₄烷基)、O(CO)-(C₂-C₄烯基)或間雜有一或多個O之C₃-C₂₀環烷基；或R₁₇係C₂-C₂₀烷基，其間雜有一或多個O；R₁₈係C₃-C₂₀環烷基、C₁-C₂₀烷基，其未經取代或經一或多個OH、O(CO)-(C₂-C₄烯基)或(CO)OR₁₇取代；或R₁₈係苯基，其未經取代或經一或多個鹵素取代；R₁₉及R₂₀彼此獨立地為C₁-C₈烷醯基或C₁-C₈烷醯基氧基；或R₁₉及R₂₀與其所附接之N原子一起形成間雜有O之5員或6員飽和環；但條件為在該分子中存在至少一個基團

。 The subject of the present invention is further a compound of formula (II) as defined above, wherein R ₁ , R ₂ , R ₃ , R ₄ , R ₅ , R ₆ , R ₇ and R ₈ are independently hydrogen, or R ₁ And R ₂ , R ₃ and R ₄ or R ₅ and R ₆ independently of one another are

; Provided that at least one of R ₁ and R ₂ , R ₃ and R ₄ or R ₅ and R ₆ is

; Or R ₂ series

, COR ₁₆ , NO ₂ or

Or R ₇ series

Or COR ₁₆ ; R ₉ , R ₁₁ and R ₁₂ are hydrogen; R ₁₀ is hydrogen, OR ₁₇ or COR ₁₆ ; X is CO or a direct bond; R ₁₃ is C ₁ -C ₂₀ alkyl, which is unsubstituted or One or more of the following groups are substituted: halogen, R ₁₇ , OR ₁₇ , SR ₁₈ or PO (OC _k H _{2k + 1} ) ₂ ; or R ₁₃ is a C ₂ -C ₂₀ alkyl group with one or more O in between Or R ₁₃ is phenyl; k is an integer 2; R ₁₄ is C ₁ -C ₂₀ alkyl or thienyl; R ₁₅ is phenyl or naphthyl, each of which is unsubstituted or via one or more OR ₁₇ or C ₁ -C ₂₀ alkyl substitution; or R ₁₅ is thienyl, hydrogen, C ₁ -C ₂₀ alkyl, which C ₁ -C ₂₀ alkyl is unsubstituted or substituted with one or more of the following groups: OR ₁₇ , SR ₁₈ , C ₃ -C ₈ cycloalkyl, NR ₁₉ R ₂₀ or COOR ₁₇ ; or R ₁₅ is a C ₂ -C ₂₀ alkyl with SO ₂ interposed therebetween; R ₁₆ is phenyl or naphthyl, each Unsubstituted or substituted with one or more of the following groups: OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ or C ₁ -C ₂₀ alkyl; or R ₁₆ is thienyl; R ₁₇ is hydrogen, C ₁ -C ₈ Alkyl, C ₁ -C ₂₀ alkyl, unsubstituted or via one or more of the following groups: halogen, O (CO)-(C ₁ -C ₄ alkyl), O (CO)-(C _2- C ₄ alkenyl) or interspersed with one or more O ₃ C ₃ -C ₂₀ cycloalkyl; or R ₁₇ is C ₂ -C ₂₀ alkyl with one or more O interposed therebetween; R ₁₈ is C ₃ -C ₂₀ cycloalkyl, C ₁ -C ₂₀ alkyl Group, which is unsubstituted or substituted with one or more OH, O (CO)-(C ₂ -C ₄ alkenyl) or (CO) OR ₁₇ ; or R ₁₈ is phenyl, which is unsubstituted or substituted Or more than one halogen substitution; R ₁₉ and R ₂₀ are independently C ₁ -C ₈ alkylfluorenyl or C ₁ -C ₈ alkylfluorenyloxy; or R ₁₉ and R ₂₀ are formed together with the N atom to which they are attached 5- or 6-membered saturated rings mixed with O; provided that at least one group is present in the molecule

.

Examples of compounds of the invention are compounds of formula (II-a) to formula (II-g) as defined above. Formula (II-a), (II-b), (II-c), especially formula (II-a) or (II-c), or formula (II-a), (II-c) or (II- d) Compounds of formula (II-a) are of particular interest.

或COR₁₆，或R₁及R₂、R₂及R₃、R₃及R₄或R₅及R₆、R₆及R₇、R₇及R₈彼此獨立地共同為

。 For example, R ₁ , R ₂ , R ₃ , R ₄ , R ₅ , R ₆ , R ₇ and R ₈ are independently hydrogen,

Or COR ₁₆ or R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ or R ₅ and R ₆ , R ₆ and R ₇ , R ₇ and R ₈ independently of one another are

.

或R₃及R₄及R₅及R₆共同為

；R₃及R₄尤其共同為

。 For example, R ₃ and R ₄ or R ₁ and R ₂ together are

Or R ₃ and R ₄ and R ₅ and R ₆ together are

; R ₃ and R _{4 are} particularly common

.

For example, R ₁ , R ₅ , R ₆ and R ₈ are hydrogen.

或COR₁₆。或R₇係

或COR₁₆、尤其為

。 R _{7 is} especially hydrogen,

Or COR ₁₆ . Or R ₇ series

Or COR ₁₆ , especially

.

，COR₁₆或

或R₂與R₁一起為

。R₂尤其為COR₁₆。 R _{2 is} especially

, COR ₁₆ or

Or R ₂ together with R ₁ is

. R _{2 is} especially COR ₁₆ .

X is preferably a direct bond.

或COR₁₆。 For example, R ₉ , R ₁₀ , R _11, and R ₁₂ are each independently hydrogen, C ₁ -C ₂₀ alkyl, unsubstituted phenyl, or phenyl substituted with one or more of the following groups: C _1- C ₆ alkyl, halogen, OR ₁₇ or SR ₁₈ ; or R ₉ , R ₁₀ , R ₁₁ and R ₁₂ are independently of each other halogen, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ , wherein the substituents OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ optionally forms a 5- or 6-membered ring with one carbon atom of the naphthyl ring via the groups R ₁₇ , R ₁₈ , R ₁₉ and / or R ₂₀ ; or R ₉ , R ₁₀ , R ₁₁ And R ₁₂ are independent of each other

Or COR ₁₆ .

或COR₁₆。 Specifically, for example, R ₉ , R ₁₀ , R _11, and R ₁₂ are each independently hydrogen, C ₁ -C ₂₀ alkyl, unsubstituted phenyl, or one substituted with one or more of the following groups Phenyl: C ₁ -C ₆ alkyl, halogen, OR ₁₇ or SR ₁₈ ; or R ₉ , R ₁₀ , R ₁₁ and R ₁₂ are each independently halogen, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₉ , R ₁₀ , R ₁₁ and R ₁₂ are independently of each other

Or COR ₁₆ .

或COR₁₆。 For example, R ₉ , R ₁₀ , R _11, and R ₁₂ are each independently hydrogen, C ₁ -C ₂₀ alkyl, unsubstituted phenyl, or one substituted with one or more C ₁ -C ₆ alkyl. Phenyl; or R ₉ , R ₁₀ , R ₁₁ and R ₁₂ are each independently

Or COR ₁₆ .

In another embodiment, for example, R ₉ , R ₁₀ , R _11, and R ₁₂ are independently of each other hydrogen, C ₁ -C ₂₀ alkyl, unsubstituted phenyl, or via one or more of the following groups Group substituted phenyl: C ₁ -C ₆ alkyl, halogen, OR ₁₇ or SR ₁₈ ; or R ₉ , R ₁₀ , R ₁₁ and R ₁₂ are independently halogen, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ Wherein the substituents OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ optionally form a 5- or 6-membered ring with one carbon atom of the naphthyl ring via the groups R ₁₇ , R ₁₈ , R ₁₉ and / or R ₂₀ .

In addition, for example, R ₉ , R ₁₀ , R _11, and R ₁₂ are each independently hydrogen, C ₁ -C ₂₀ alkyl, unsubstituted phenyl, or phenyl substituted with one or more of the following groups : C ₁ -C ₆ alkyl, halogen, OR ₁₇ or SR ₁₈ , or R ₉ , R ₁₀ , R ₁₁ and R ₁₂ are each independently halogen, OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ or COR ₁₆ .

Or, for example, R ₉ , R ₁₀ , R ₁₁ and R ₁₂ are independently of each other hydrogen, C ₁ -C ₂₀ alkyl, unsubstituted phenyl, or phenyl substituted with one or more of the following groups: C ₁ -C ₆ alkyl, halogen, OR ₁₇ or SR ₁₈ , or R ₉ , R ₁₀ , R ₁₁ and R ₁₂ are each independently halogen, OR ₁₇ , COR ₁₆ or NR ₁₉ R ₂₀ .

Preferably, R ₉ , R ₁₁ and R ₁₂ are hydrogen and R ₁₀ is hydrogen, OR ₁₇ or COR ₁₆ .

、COR₁₆、NO₂、鹵素、C₁-C₂₀烷基、C₁-C₄鹵代烷基、C₂-C₂₀烷基，其間雜有一或多個O；或係C₁-C₂₀烷基，其未經取代或經一或多個以下基團取代：鹵素、R₁₇、COOR₁₇、OR₁₇、SR₁₈、CONR₁₉R₂₀或PO(OC_kH_2k+1)₂；或係C₂-C₂₀烷基，其間雜有一或多個O。 R ₁₃ is, for example, a C ₁ -C ₂₀ alkyl group, which is unsubstituted or substituted with one or more of the following groups: halogen, COOR ₁₇ or CONR ₁₉ R ₂₀ ; or R ₁₃ is a C ₂ -C ₂₀ alkyl group , Interspersed with one or more O, S, SO, SO ₂ , NR ₂₆ or CO, or C ₂ -C ₁₂ alkenyl, optionally interspersed with one or more O, CO or NR ₂₆ , or R ₁₃ series C ₃ -C ₁₀ cycloalkyl, optionally mixed with one or more O, S, CO, NR ₂₆ , or R ₁₃ phenyl or naphthyl, both of which are unsubstituted or have one or more of the following groups Group substitution: OR ₁₇ , sR ₁₈ , NR ₁₉ R ₂₀ ,

, COR ₁₆ , NO ₂ , halogen, C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, C ₂ -C ₂₀ alkyl with one or more O interposed therebetween; or C ₁ -C ₂₀ alkyl , Which is unsubstituted or substituted with one or more of the following groups: halogen, R ₁₇ , COOR ₁₇ , OR ₁₇ , SR ₁₈ , CONR ₁₉ R ₂₀ or PO (OC _k H _{2k + 1} ) ₂ ; or C ₂ -C ₂₀ alkyl with one or more O interposed therebetween.

、COR₁₆、NO₂、鹵素、C₁-C₂₀烷基、C₁-C₄鹵代烷基、C₂-C₂₀烷基，其間雜有一或多個O。 In addition, R ₁₃ is, for example, a C ₁ -C ₂₀ alkyl group, which is unsubstituted or substituted with one or more of the following groups: halogen, R ₁₇ , COOR ₁₇ , OR ₁₇ , SR ₁₈ , CONR ₁₉ R ₂₀ or PO (OC _k H _{2k + 1} ) ₂ ; or a C ₂ -C ₂₀ alkyl group with one or more O interposed therebetween; or a C ₂ -C ₁₂ alkenyl group, a C ₃ -C ₁₀ cycloalkyl group; or R ₁₃ based phenyl or naphthyl, both of which unsubstituted or substituted with one or more of the following _{groups: oR 17, SR 18, NR} 19 R 20,

, COR ₁₆ , NO ₂ , halogen, C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, C ₂ -C ₂₀ alkyl, with one or more O interposed therebetween.

In another embodiment, R ₁₃ is, for example, a C ₁ -C ₂₀ alkyl group, which is unsubstituted or substituted with one or more of the following groups: halogen, R ₁₇ , OR ₁₇ , SR _18, or PO (OC _k H _{2k + 1} ) ₂ ; or C ₂ -C ₂₀ alkyl with one or more O interposed therebetween; or C ₂ -C ₁₂ alkenyl, C ₃ -C ₁₀ cycloalkyl, phenyl or naphthyl ; Or R ₁₃ is, for example, a C ₁ -C ₂₀ alkyl group, which is unsubstituted or substituted with one or more of the following groups: halogen, R ₁₇ , OR ₁₇ , SR _18, or PO (OC _k H2 _{k + 1} ) _2; or C _2- C ₂₀ alkyl-based, have therebetween one or more O heteroatom; or a phenyl-based, C ₂ -C ₁₂ alkenyl or C ₃ -C ₁₀ cycloalkyl; or R ₁₃ lines (e.g.) C ₁ -C ₂₀ alkyl, phenyl, C ₂ -C ₁₂ alkenyl or C ₃ -C ₁₀ cycloalkyl; or R ₁₃ series (for example) C ₁ -C ₂₀ alkyl, C ₂ -C ₁₂ alkenyl Or C ₃ -C ₁₀ cycloalkyl.

Preferably, R ₁₃ is a C ₁ -C ₂₀ alkyl group, especially a C ₁ -C ₈ alkyl group, such as 2-ethylhexyl.

R ₁₄ is, for example, hydrogen, C ₃ -C ₈ cycloalkyl, C ₂ -C ₅ alkenyl, C ₁ -C ₂₀ alkoxy, or C ₁ -C ₂₀ alkyl, which are unsubstituted or Multiple halogen or phenyl substitution; or R ₁₄ is phenyl or naphthyl, both of which are unsubstituted or substituted with one or more of the following groups: C ₁ -C ₆ alkyl, C ₁ -C ₄ haloalkyl , Halogen, OR ₁₇ , SR ₁₈ and / or NR ₁₉ R ₂₀ ; or R ₁₄ is a C ₃ -C ₅ heteroaryl group, such as thienyl, or C ₁ -C ₈ alkoxy, benzyloxy or phenoxy base.

Or R ₁₄ is, for example, a C ₁ -C ₂₀ alkyl group, which is unsubstituted or substituted with one or more halogen or phenyl groups; or R ₁₄ is a C ₃ -C ₅ heteroaryl group (for example, thienyl) or Phenyl, unsubstituted or substituted with one or more of the following: C ₁ -C ₆ alkyl, C ₁ -C ₄ haloalkyl, halogen, OR ₁₇ , SR ₁₈ and / or NR ₁₉ R ₂₀ ; or R ₁₄ is C ₁ -C ₈ alkoxy, benzyloxy or phenoxy.

In another embodiment, R ₁₄ represents C ₁ -C ₂₀ alkyl, which is unsubstituted or substituted with phenyl; or R ₁₄ is phenyl, which is unsubstituted or substituted with one or more C ₁ -C ₆ Alkyl substituted.

Preferably, R ₁₄ is C ₁ -C ₂₀ alkyl, C ₃ -C ₅ heteroaryl (such as thienyl), or is phenyl, especially C ₁ -C ₂₀ alkyl or thienyl, especially C _1- C ₈ alkyl.

、苯基或經以下基團取代之苯基：鹵素、C₁-C₂₀烷基、C₁-C₄鹵代烷基、OR₁₇或NR₁₉R₂₀；或R₁₅係C₂-C₂₀烷基，其間雜有一或多個O、S或SO₂，或R₁₅係C₂-C₂₀烷醯基、苯甲醯基、C₂-C₁₂烷氧基羰基、苯氧基羰基、CONR₁₉R₂₀、NO₂或C₁-C₄鹵代烷基。 R ₁₅ is, for example, a C ₆ -C ₂₀ aryl group or a C ₅ -C ₂₀ heteroaryl group, each of which is unsubstituted or substituted with one or more of the following groups: phenyl, halogen, C ₁ -C ₄ haloalkane Group, CN, NO ₂ , OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ , C ₁ -C ₂₀ alkyl group; or R ₁₅ series hydrogen, C ₃ -C ₈ cycloalkyl group, the C ₃ -C ₈ cycloalkyl group Optionally mixed with one or more O, CO or NR ₂₆ ; or R ₁₅ is a C ₁ -C ₂₀ alkyl group, which is unsubstituted or substituted with one or more of the following groups: halogen, OR ₁₇ , C ₃ -C ₈ cycloalkyl, C ₅ -C ₂₀ heteroaryl, C ₈ -C ₂₀ phenoxycarbonyl, C ₅ -C ₂₀ heteroaryloxy-carbonyl, NR ₁₉ R ₂₀ , COOR ₁₇ , CONR ₁₉ R ₂₀ , PO (OC _k H _{2k + 1} ) ₂ ,

, Phenyl or phenyl substituted by: halogen, C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, OR ₁₇ or NR ₁₉ R ₂₀ ; or R ₁₅ is C ₂ -C ₂₀ alkyl , Interspersed with one or more O, S or SO ₂ , or R ₁₅ is C ₂ -C ₂₀ alkylfluorenyl, benzamidine, C ₂ -C ₁₂ alkoxycarbonyl, phenoxycarbonyl, CONR ₁₉ R ₂₀ , NO ₂ or C ₁ -C ₄ haloalkyl.

In addition, R ₁₅ is, for example, hydrogen, C ₆ -C ₂₀ aryl, especially phenyl or naphthyl, each of which is unsubstituted or substituted with C ₁ -C ₁₂ alkyl; or is C ₃ -C ₅ hetero Aryl, such as thienyl; or C ₃ -C ₈ cycloalkyl, C ₁ -C ₂₀ alkyl, which are unsubstituted or substituted with one or more of the following groups: OR ₁₇ , SR ₁₇ , C _3- C ₈ - cycloalkyl, NR ₁₉ R ₂₀ or COOR _17; R _15, or C ₂ -C ₂₀ alkyl-based, have therebetween one or more heteroatoms O or SO _2.

Compounds of formula (II) are of interest, in which R ₁₅ is, for example, hydrogen, phenyl, naphthyl, each of which is unsubstituted or substituted with C ₁ -C ₈ alkyl; or R ₁₅ is thienyl, C _1- C ₂₀ alkyl, which is unsubstituted or substituted with one or more of the following groups: OR ₁₇ , SR ₁₇ , C ₃ -C ₈ -cycloalkyl, NR ₁₉ R ₂₀ or COOR ₁₇ ; or R ₁₅ is C ₂ -C ₂₀ alkyl with one or more O or SO ₂ interspersed therebetween.

R ₁₅ is, for example, a C ₃ -C ₈ cycloalkyl group or a C ₁ -C ₂₀ alkyl group, especially a C ₁ -C ₂₀ alkyl group, especially a C ₁ -C ₁₂ alkyl group.

R _'14 and R' ₁₅ are the preferred lines are as described above for R ₁₄ and R ₁₅ are given.

X ₁ is, for example, O, S or SO, such as O or S, especially O.

R ₁₆ is, for example, a C ₆ -C ₂₀ aryl group (especially phenyl or naphthyl group, especially phenyl group) or a C ₅ -C ₂₀ heteroaryl group (especially thienyl group), each of which is unsubstituted or substituted by one or more Substituted by the following groups: phenyl, halogen, C ₁ -C ₄ haloalkyl, CN, NO ₂ , OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ or C ₁ -C ₂₀ alkyl interspersed with one or more O; Or each of them is substituted with one or more C ₁ -C ₂₀ alkyl groups, the C ₁ -C ₂ 0 alkyl group is unsubstituted or substituted with one or more of the following groups: halogen, COOR ₁₇ , CONR ₁₉ R ₂₀ , Phenyl, C ₃ -C ₈ cycloalkyl, C ₅ -C ₂₀ heteroaryl, C ₆ -C ₂₀ aryloxycarbonyl, C ₅ -C ₂₀ heteroaryloxycarbonyl, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₁₆ is hydrogen, C ₁ -C ₂₀ alkyl, the C ₁ -C ₂₀ alkyl is unsubstituted or substituted with one or more of the following groups: halogen, phenyl, OH, SH, C ₃ -C ₆ alkenyloxy, OCH ₂ CH ₂ (CO) O (C ₁ -C ₄ alkyl), O (CO)-(C ₁ -C ₄ alkyl), O (CO) -phenyl, (CO ) OH or (CO) O (C ₁ -C ₄ alkyl); or R ₁₆ is C ₂ -C ₁₂ alkyl, with one or more O interposed therebetween; or (CH ₂ CH ₂ O) _{n + 1} H _{, (CH 2 CH 2 O)} n (CO) - (C 1 -C 8 alkyl), C ₂ -C ₁₂ alkenyl or C ₃ -C ₈ cycloalkyl Group, and n lines 1 to 20, e.g. 1-12 or 1-8, in particular 1 or 2.

In addition, R ₁₆ is, for example, phenyl or naphthyl, especially phenyl, thienyl, or carbazole, each of which is unsubstituted or substituted with one or more of the following groups: phenyl, halogen, C ₁ -C _4- haloalkyl, OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ or C ₁ -C ₂₀ alkyl; or R ₁₆ is C ₁ -C ₂₀ alkyl, which is unsubstituted or substituted with one or more of the following groups: Halogen, phenyl, OH, SH, C ₃ -C ₆ alkenyloxy, OCH ₂ CH ₂ (CO) O (C ₁ -C ₄ alkyl), O (CO)-(C ₁ -C ₄ alkyl) , O (CO) -phenyl, (CO) OH or (CO) O (C ₁ -C ₄ alkyl); or R ₁₆ is a C ₂ -C ₁₂ alkyl group with one or more O interposed therebetween; or (CH ₂ CH ₂ O) _{n + 1} H, (CH ₂ CH ₂ O) _n (CO)-(C ₁ -C ₈ alkyl), C ₂ -C ₁₂ alkenyl or C ₃ -C ₈ cycloalkyl And n is 1 to 20, such as 1 to 12 or 1 to 8, especially 1 or 2.

In addition, R ₁₆ is, for example, phenyl or naphthyl, especially phenyl, each of which is unsubstituted or substituted with one or more of the following groups: phenyl, halogen, C ₁ -C ₄ haloalkyl, OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ or C ₁ -C ₂₀ alkyl; or R ₁₆ is C ₃ -C ₅ heteroaryl, especially thienyl.

R ₁₆ is, for example, phenyl, which is unsubstituted or substituted with one or more of the following groups: OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ or C ₁ -C ₂₀ alkyl, or R ₁₆ is thienyl .

Preferably, R ₁₆ is, for example, phenyl or naphthyl, each of which is unsubstituted or substituted with one or more C ₁ -C ₂₀ alkyl.

R _{16 is} especially phenyl, which is substituted with one or more C ₁ -C ₂₀ alkyl.

。 R ₁₇ is, for example, hydrogen, phenyl-C ₁ -C ₃ alkyl, C ₁ -C ₂₀ alkyl, which is unsubstituted or substituted with one or more of the following groups: halogen, OH, OCH ₂ CH ₂ (CO) O (C ₁ -C ₄ alkyl), O (CO)-(C ₁ -C ₄ alkyl), O (CO)-(C ₂ -C ₄ ) alkenyl, O (CO) -benzene group, (CO) OH, (CO ) O (C 1 -C 4 alkyl), C ₃ -C ₂₀ cycloalkyl interrupted by one or more O or of C ₃ -C ₂₀ cycloalkyl; or R ₁₇ lines C ₂ -C ₂₀ alkyl with one or more O interposed between it; (CH ₂ CH ₂ O) _{n + 1} H, (CH ₂ CH ₂ O) _n (CO)-(C ₁ -C ₈ alkyl) , C ₁ -C ₈ alkylfluorenyl, C ₂ -C ₁₂ alkenyl, C ₃ -C ₆ alkenyl, or C ₃ -C ₂₀ cycloalkyl, optionally mixed with one or more O; or R ₁₇ series Benzamidine, which is unsubstituted or substituted with one or more C ₁ -C ₆ alkyl, halogen, OH or C ₁ -C ₃ alkoxy; or R ₁₇ is phenyl, naphthyl or C _5- C ₂₀ heteroaryl, each unsubstituted or substituted with one or more of the following groups: halogen, OH, C ₁ -C ₁₂ alkyl, C ₁ -C ₁₂ alkoxy, CN, NO ₂ , phenyl -C ₁ -C ₃ alkoxy, phenoxy, C ₁ -C ₁₂ alkylthio, phenylthio, N (C ₁ -C ₁₂ alkyl) ₂ , diphenyl-amino or

.

In another embodiment, R ₁₇ is, for example, hydrogen, phenyl-C ₁ -C ₃ alkyl, C ₁ -C ₂₀ alkyl, which is unsubstituted or substituted with one or more of the following groups: halogen , O (CO)-(C ₁ -C ₄ alkyl), O (CO)-(C ₂ -C ₄ alkenyl), or C ₂ -C ₂₀ alkyl interspersed with one or more O; or C ₁ -C ₈ alkyl, C ₂ -C ₁₂ alkenyl, C ₃ -C ₆ alkenyl, C ₂ -C ₂₀ alkyl interspersed with one or more O, optionally C ₃ interspersed with one or more O -C ₂₀ cycloalkyl; or a benzoyl group based, which is unsubstituted or substituted with one or more of the following groups: C ₁ -C ₆ alkyl, halogen, OH or C ₁ -C ₃ alkoxy; Or is phenyl or naphthyl, each of which is unsubstituted or substituted with one or more of the following groups: halogen, C ₁ -C ₁₂ alkyl, or C ₁ -C ₁₂ alkoxy.

R ₁₇ is also, for example, hydrogen, phenyl-C ₁ -C ₃ alkyl, C ₁ -C ₈ alkyl, C ₁ -C ₂₀ alkyl, which is unsubstituted or via one or more of the following groups Substitution: halogen, C ₃ -C ₂₀ cycloalkyl, O (CO)-(C ₁ -C ₄ alkyl), O (CO)-(C ₂ -C ₄ alkenyl) or one or more O C ₂ -C ₂₀ alkyl, or R ₁₇ is C ₂ -C ₂₀ alkyl, with one or more O interposed therebetween.

R _{17 is} especially hydrogen, C ₁ -C ₈ alkyl, C ₁ -C ₂₀ alkyl, which are unsubstituted or substituted with one or more of the following groups: O (CO)-(C ₁ -C ₄ alkyl ), O (CO)-(C ₂ -C ₄ alkenyl), or C ₂ -C ₂₀ alkyl with one or more O interspersed, or R ₁₇ C ₂ -C ₂₀ alkyl with one or more interspersed between A O.

R ₁₈ is, for example, a C ₃ -C ₂₀ cycloalkyl group, which is unsaturated or has one or more O; or R ₁₈ is a C ₁ -C ₂₀ alkyl group, which is unsubstituted or after one or more Group substitution: OH, O (CO)-(C ₂ -C ₄ ) alkenyl, O (CO)-(C ₁ -C ₄ alkyl) or (CO) OR ₁₇ ; or R ₁₈ is C ₂ -C ₂₀ alkyl with one or more O, S, CO, NR ₂₆ or COOR ₁₇ interposed therebetween; or R ₁₈ is a C ₂ -C ₈ alkylfluorenyl or C ₃ -C ₆ alkenyl, benzamidine; or R ₁₈ is phenyl, naphthyl or C ₃ -C ₂₀ heteroaryl, each unsubstituted or substituted with one or more of the following groups: halogen, C ₁ -C ₁₂ alkyl, C ₁ -C ₄ haloalkane Radical, C ₁ -C ₁₂ alkoxy or NO ₂ .

In another embodiment, R ₁₈ is, for example, a C ₃ -C ₂₀ cycloalkyl group, a C ₁ -C ₂₀ alkyl group, which is unsubstituted or substituted with one or more of the following groups: OH, O (CO )-(C ₂ -C ₄ alkenyl), O (CO)-(C ₁ -C ₄ alkyl) or (CO) OR ₁₇ ; or R ₁₈ is phenyl or naphthyl, each of which is unsubstituted or One or more halogen or C ₁ -C ₁₂ alkyl, especially halogen substitution.

R _18- based (for example) C ₁ -C ₂₀ alkyl, C ₂ -C ₁₂ alkenyl, C ₃ -C ₂₀ cycloalkyl, phenyl-C ₁ -C ₃ alkyl, C ₂ -C ₈ alkyl , Benzamidine, phenyl or naphthyl.

For example, R ₁₈ is a C ₁ -C ₂₀ alkyl group, which is substituted with one or more of the following groups: OH, O (CO)-(C ₂ -C ₄ alkenyl), O (CO)-(C _1- C ₄ alkyl) or (CO) OR ₁₇ , or R ₁₈ is phenyl, which is substituted with one or more halogens.

Preferably, R ₁₈ is C ₁ -C ₈ alkyl, which is substituted as defined above.

。 For example, R ₁₉ and R ₂₀ are independently of each other hydrogen, C ₁ -C ₂₀ alkyl, C ₂ -C ₄ hydroxyalkyl, C ₃ -C ₂₀ cycloalkyl, phenyl-C ₁ -C ₃ alkyl Phenyl, or naphthyl, C ₁ -C ₈ alkylfluorenyl, C ₁ -C ₈ alkylfluorenyloxy, C ₃ -C ₁₂ alkenyl or benzamyl; or R ₁₉ and R ₂₀ the attached N atom form together optionally interrupted with O, S or NR 5, or 6 of ₁₇ membered saturated or unsaturated ring; or R ₁₉ and R ₂₀ appended thereto the N atom to form a heteroaromatic ring system together, The ring system is unsubstituted or substituted with one or more of the following: C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, or

.

In addition, for example, R ₁₉ and R ₂₀ are independently of each other hydrogen, C ₁ -C ₂₀ alkyl, C ₂ -C ₄ hydroxyalkyl, C ₃ -C ₂₀ cycloalkyl, phenyl-C ₁ -C ₃ alkyl, C ₁ -C ₈ alkylfluorenyl, C ₁ -C ₈ alkylfluorenyloxy, C ₃ -C ₁₂ alkenyl or benzamyl; or R ₁₉ and R ₂₀ with the N to which it is attached Atoms together form a 5- or 6-membered saturated ring optionally mixed with O or NR ₁₇ ; or R ₁₉ and R ₂₀ together with the N atom to which they are attached form a carbazole ring.

For example, R ₁₉ and R ₂₀ are independently of each other hydrogen, C ₁ -C ₂₀ alkyl, C ₂ -C ₄ hydroxyalkyl, C ₃ -C ₂₀ cycloalkyl, phenyl-C ₁ -C ₃ alkyl , C ₁ -C ₈ alkylfluorenyl, C ₁ -C ₈ alkylfluorenyloxy, C ₃ -C ₁₂ alkenyl or benzamyl; or R ₁₉ and R ₂₀ together with the N atom to which they are attached A 5 or 6 member saturated ring with O or NR ₁₇ interspersed as appropriate.

Preferably, R ₁₉ and R ₂₀ are independently of each other C ₁ -C ₈ alkylfluorenyl, C ₁ -C ₈ alkylfluorenyloxy; or R ₁₉ and R ₂₀ together with the N atom to which they are attached form a morpholine ring.

For example, R ₂₁ and R ₂₂ are independently of each other hydrogen, C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, C ₃ -C ₁₀ cycloalkyl or phenyl; or R ₂₁ and R ₂₂ and The attached N atoms together form a morpholine ring. R ₂₁ and R ₂₂ are, independently of one another, hydrogen or C ₁ -C ₂₀ alkyl.

R ₂₃ is, for example, hydrogen, OH, phenyl or C ₁ -C ₂₀ alkyl. R _{23 is} especially hydrogen, OH or C ₁ -C ₄ alkyl.

The better of R ₂₄ is as given for R ₁₉ and R ₂₀ . The better of R ₂₅ is as given for R ₁₇ .

R ₂₆ is, for example, hydrogen, C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, C ₂ -C ₂₀ alkyl, interposed with one or more O or CO; or phenyl-C _1- C ₄ alkyl, C ₃ -C ₈ cycloalkyl, optionally mixed with one or more O or CO; or (CO) R ₁₉ or phenyl, unsubstituted or through one or more of the following groups Substitution: C ₁ -C ₂₀ alkyl, halogen, C ₁ -C ₄ haloalkyl, OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ ; or R ₂₆ represents, for example, hydrogen, C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl; phenyl-C ₁ -C ₄ alkyl, C ₃ -C ₈ cycloalkyl, (CO) R ₁₉ or phenyl, which is unsubstituted or substituted by one or more C ₁ -C ₂₀ alkyl substituted. Furthermore, R ₂₆ is, for example, hydrogen or C ₁ -C ₂₀ alkyl, especially C ₁ -C ₄ alkyl.

Examples of compounds of formula (II) according to the invention are

In one embodiment, the method for preparing the photo-initiator represented by the aforementioned formula (II-1) is as follows:

(1) Preparation of 11- (2-ethylhexyl) -11H-benzo [a] carbazole:

First, sodium hydride was added to a DMF solution having a temperature of 0 ° C and 11H-benzo [a] carbazole dissolved. After stirring at 0 ° C for 1 hour, 1-bromo-2-ethylhexane was added at 0 ° C, and the mixture was stirred at room temperature overnight. Then, the reaction product was poured into ice water. After extraction, 11- (2-ethylhexyl) -11H-benzo [a] carbazole represented by the following formula (II-1-1) can be obtained:

(2) 1- [11- (2-ethylhexyl) -5- (2,4,6-trimethylbenzyl) -11H-benzo [a] carbazole-8-yl] -ethyl Ketone preparation:

The above-prepared 11- (2-ethylhexyl) -11H-benzo [a] carbazole was first dissolved in dichloromethane at 0 ° C. Then, 2,4,6-trimethyl benzamidine chloride and aluminum chloride were added to the dichloromethane solution. After stirring at room temperature for 2.5 hours, the temperature was lowered to 0 ° C, and acetic acid chloride and aluminum chloride were added. The temperature was raised to room temperature and the reaction was stirred for 3 hours. Next, the reaction product is poured into ice water, and after extraction, 1- [11- (2-ethylhexyl) -5- (2,4, 6-trimethylbenzyl) -11H-benzo [a] carbazole-8-yl] -ethanone:

(3) 1- [11- (2-ethylhexyl) -5- (2,4,6-trimethylbenzyl) -11H-benzo [a] carbazole-8-yl] -ethyl Preparation of ketoxime O-acetate:

Add the aforementioned 1- [11- (2-ethylhexyl) -5- (2,4,6-trimethylbenzyl) -11H-benzo [a] carbazole-8-yl] -ethyl The ketone was dissolved in toluene and N-methylpyrrolidone and heated to 80 ° C. Then, sodium acetate and ammonium hydroxychloride were added to the aforementioned solution, and the temperature was raised to 100 ° C. After the reaction was stirred overnight, the reaction solution was cooled to 0 ° C, and triethylamine and acetamidine were added.

Next, the reaction was stirred at room temperature for 2 hours, and then extracted and concentrated to obtain a crude product. This crude product is washed with a third butyl methyl ether to obtain a photoinitiator represented by the aforementioned formula (II-1).

The above-mentioned photoinitiators (E-1) having a structure represented by the formula (II) may be used alone or in combination.

Based on the total used amount of the aforementioned alkali-soluble resin (C) being 100 parts by weight, the used amount of the photoinitiator (E-1) having a structure as shown in formula (II) may be 5 to 65 parts by weight It is preferably 10 to 60 parts by weight, and more preferably 15 to 55 parts by weight.

When the photoinitiator (E) of the present invention does not include the aforementioned photoinitiator (E-1) having a structure represented by the formula (II), the obtained photosensitive resin composition for a color filter With the defect of poor pattern smoothness.

Other radical photoinitiators (E-2)

The other free radical type photoinitiator (E-2) may be selected from the group consisting of acetophenone, biimidazole, acyl oxime, or the photoinitiator. Any combination.

The acetophenone-based compound may include, but is not limited to, p-dimethylamino-acetophenone, α, α'-dimethoxyazoxy-acetophenone ), 2,2'-dimethyl-2-phenyl-acetophenone (2,2'-dimethyl-2-phenyl-acetophenone), p-methoxy-acetophenone, 2- Methyl-1- (4-methylthiophenyl) -2-morpholino-1-acetone [2-methyl-1- (4-methylthiophenyl) -2-morpholino-1-propanone], 2-benzyl 2--2-nitro, nitro-dimethylamine-1- (4-morpholinophenyl) -1-butanone [2-benzyl-2-N, N-dimethylamino-1- (4-morpholinophenyl) -1 -butanone].

The diimidazole-based compound may be selected from 2,2'-bis (o-chlorophenyl) -4,4 ', 5,5'-tetraphenyldiimidazole [2,2'-bis (o-chlorophenyl)- 4,4 ', 5,5'-tetraphenyl-biimidazole], 2,2'-bis (o-fluorophenyl) -4,4', 5,5'-tetraphenyldiimidazole [2,2'- bis (o-fluorophenyl) -4,4 ', 5,5'-tetraphenyl-biimidazole], 2,2'-bis (o-methylphenyl) -4,4', 5,5'-tetraphenyl Diimidazole [2,2'-bis (o-methyl phenyl) -4,4 ', 5,5'-tetraphenyl-biimidazole], 2,2'-bis (o-methoxyphenyl) -4,4', 5,5'-tetraphenyldiimidazole [ 2,2'-bis (o-methoxyphenyl) -4,4 ', 5,5'-tetraphenyl-biimidazole], 2,2'-bis (o-ethylphenyl) -4,4', 5,5 '-Tetraphenyldiimidazole [2,2'-bis (o-ethylphenyl) -4,4', 5,5'-tetraphenyl-biimidazole], 2,2'-bis (p-methoxyphenyl)- 4,4 ', 5,5'-tetraphenyldiimidazole [2,2'-bis (p-methoxyphenyl) -4,4', 5,5'-tetraphenyl-biimidazole], 2,2'-bis ( 2,2 ', 4,4'-tetramethoxyphenyl) -4,4', 5,5'-tetraphenyldiimidazole [2,2'-bis (2,2 ', 4,4' -tetramethoxyphenyl) -4,4 ', 5,5'-tetra-phenyl-biimidazole], 2,2'-bis (2-chlorophenyl) -4,4', 5,5'-tetraphenyldiimidazole [2,2'-bis (2-chlorophenyl) -4,4 ', 5,5'-tetraphenyl-biimidazole] or 2,2'-bis (2,4-dichlorophenyl) -4,4', 5,5'-tetraphenyldiimidazole [2,2'-bis (2,4-dichlorophenyl) -4,4 ', 5,5'-tetraphenyl-biimidazole] and the like.

The oxime compound can be selected from acetone, 1- [9-ethyl-6- (2-methylbenzylidene) -9hydro-carbazole-3-substituent]-, 1- (oxy -Ethanedioxime) {Ethanone, 1- [9-ethyl-6- (2-methylbenzoyl) -9H-carbazole-3-yl]-, 1- (O-acetyl oxime)}, 1- [4- (benzene Thio) phenyl] -octane-1,2-dione 2- (O-phenylfluorenyloxime) {1- [4- (phenylthio) phenyl] -octane-1,2-dione-2- ( O-benzoyloxime), acetone, 1- [9-ethyl-6- (2-chloro-4-benzyl-thio-benzylidene) -9hydro-carbazole-3-substituent] -, 1- (oxy-acetamoxime) {Ethanone, 1- [9-ethyl -6- (2-chloro-4-benzyl-thio-benzoyl) -9H-carbazole-3-yl]-, 1- (O-acetyl oxime)}.

Specifics of the aforementioned acetone, 1- [9-ethyl-6- (2-methylbenzylidene) -9hydro-carbazole-3-substituent]-, 1- (oxy-acetamoxime) Examples can be a product manufactured by Ciba Specialty Chemicals, its model is CGI-242, and it has a structure shown by the following formula (VI-1):

Specific examples of the aforementioned 1- [4- (phenylthio) phenyl] -octane-1,2-dione 2- (O-phenylamidinooxime) may be products manufactured by Ciba Specialty Chemicals, and the model number is CGI-124, and it has a structure shown by the following formula (VI-2):

The aforementioned acetone, 1- [9-ethyl-6- (2-chloro-4-benzyl-thio-benzylidene) -9hydro-carbazole-3-substituent]-, 1- A specific example of (oxy-acetamoxime) can be a product manufactured by Asahi Kasei Corporation, and it has a structure represented by the following formula (VI-3):

Preferably, the other free radical type photoinitiator (E-2) may be 2-methyl-1- (4-methylthiophenyl) -2-morpholino-1-acetone, 2- Benzyl-2-nitro, nitro-dimethylamine-1- (4-morpholinophenyl) -1-butanone, 2,2'-bis (o-chlorophenyl) -4,4 ', 5 , 5'-tetraphenyldiimidazole, acetone, 1- [9-ethyl-6- (2-methylbenzylidene) -9hydro-carbazole-3-substituent]-, 1- (Oxy-acetimoxime) or any combination of the above compounds.

The other free radical type photoinitiator (E-2) may further include thioxanthone, 2,4-diethyl-thioxanthanone, and thioxanthone-4- Thioxanthone-4-sulfone, benzophenone, 4,4'-bis (dimethylamine) benzophenone [4,4'-bis (dimethylamino) benzophenone], or 4,4'- Bis (diethylamine) benzophenone [4,4'-bis (diethylamino) benzophenone] and other benzophenone compounds; benzil or acetyl and other alpha -Diketone (α-diketone) compounds; acyloin compounds such as benzoin; benzophenone methyl ether (benzoin methylether), benzoin ethylether or benzoin isopropyl ether (acyloin ether) compounds; 2,4,6-trimethylbenzene Diphenylphosphine oxide (2,4,6-trimethyl-benzoyl-diphenyl-phosphineoxide), bis- (2,6-dimethoxyphenylhydrazone) -2,4,4-trimethylphenylphosphine oxide [Bis- (2,6-dimethoxy-benzoyl) -2,4,4-trimethyl-benzyl-phosphineoxide] and other compounds such as acylphosphine oxide; anthraquinone or 1,4-naphthalene Quinones such as 1,4-naphthoquinone; phenacyl chloride, tribromomethyl-phenylsulfone, or tris (trichloromethyl) -s-tri Halides such as tris (trichloromethyl) -s-triazine; peroxides such as di-tertbutylperoxide.

The aforementioned compound may preferably be a benzophenone compound, and more preferably may be 4,4'-bis (diethylamine) benzophenone.

The other radical-type photoinitiators (E-2) may be used alone or in combination.

Based on the total use amount of the aforementioned alkali-soluble resin (C) being 100 parts by weight, the use amount of the other radical-type photoinitiator (E-2) may be 0 parts by weight to 35 parts by weight, and preferably 0 parts by weight Parts to 30 parts by weight, and more preferably 0 to 25 parts by weight.

Based on the total use amount of the aforementioned alkali-soluble resin (C) being 100 parts by weight, the use amount of the photoinitiator (E) may be 5 to 100 parts by weight, preferably 10 to 90 parts by weight, and More preferably, it may be 15 to 80 parts by weight.

Organic solvent (F)

The organic solvent (F) of the present invention means that the pigment (A), the dye (B), the alkali-soluble resin (C), the compound (D) having an ethylenically unsaturated group, and the photoinitiator (E) can be dissolved. An organic solvent that does not react with the above components. The organic solvent preferably has an appropriate volatility.

The organic solvent (F) may include but is not limited to ethylene glycol methyl ether, ethylene glycol ethyl ether, diethylene glycol methyl ether, diethylene glycol ethyl ether, diethylene glycol n-propyl ether, diethylene glycol n-butyl ether, and triethylene glycol methyl ether. , Triethylene glycol ether, propylene glycol methyl ether, propylene glycol ether, dipropylene glycol methyl ether, dipropylene glycol ether, dipropylene glycol n-propyl ether, dipropylene glycol n-butyl ether, tripropylene glycol dipropylene glycol (polyglycol monomethyl ether) or tripropylene glycol monoethyl ether, and other (poly) alkylene glycol monoalkyl ether solvents; ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, propylene glycol (Poly) alkylene glycol monoalkyl ether acetate solvents such as monomethyl ether acetate or propylene glycol monoethyl ether acetate; diglyme, diethylene glycol diethyl ether, diethylene glycol diethyl ether, or tetrahydrofuran, etc. Other ether solvents; methyl ethyl ketone, cyclohexanone, 2-heptanone or 3-heptanone; ketone solvents; methyl 2-hydroxypropionate or ethyl 2-hydroxypropionate Solvents; methyl 2-hydroxy-2-methylpropionate, ethyl 2-hydroxy-2-methylpropionate, 3-methoxy Methyl propionate, 3-methoxy propionate, ethyl 3-ethoxypropionate, methyl 3-ethoxypropionate Ethyl acetate, ethyl ethoxyacetate, ethyl hydroxyacetate, methyl 2-hydroxy-3-methylbutanoate, 3-methyl-3-methoxybutyl acetate, 3-methyl- 3-methoxybutylpropionate, ethyl acetate, n-propyl acetate, isopropyl acetate, n-butyl acetate, isobutyl acetate, n-pentyl acetate, isoamyl acetate, n-butyl propionate , Ethyl butyrate, n-propyl butyrate, isopropyl butyrate, n-butyl butyrate, methyl pyruvate, ethyl pyruvate, n-propyl pyruvate, methyl ethyl acetate, ethyl ethyl acetate Esters or other ester solvents such as ethyl 2-oxybutyrate; aromatic hydrocarbon solvents such as toluene or xylene; nitrogen-methylpyrrolidone, nitrogen, nitrogen-dimethylformamide or nitrogen, nitrogen -A carboxylic acid amine solvent such as dimethylacetamide. These organic solvents (F) can be used alone or in combination.

The aforementioned organic solvent (F) may preferably be propylene glycol monomethyl ether acetate, ethyl 3-ethoxypropionate, or any combination thereof.

Based on the total use amount of the alkali-soluble resin (C) being 100 parts by weight, the use amount of the organic solvent (F) may be 500 parts by weight to 5000 parts by weight, preferably 800 parts by weight to 4500 parts by weight, and more preferably It may be 1000 parts by weight to 4000 parts by weight.

Additive (G)

Before the effects of the present invention are not affected, the photosensitive resin composition for a color filter of the present invention may optionally contain an additive (G). The additive (G) may contain a filler, a polymer other than the alkali-soluble resin (C), an adhesion promoter, an antioxidant, an ultraviolet absorber, an anti-agglomerating agent, or a cationic polymerizable compound.

Specific examples of the filler may include, but are not limited to, glass, aluminum, and the like.

Specific examples of the aforementioned polymer may include, but are not limited to, polyvinyl alcohol, polyethylene glycol monoalkyl ether, polyfluoroalkyl acrylate, or any combination of the foregoing polymers.

Specific examples of the adhesion promoter may include, but are not limited to, vinyltrimethoxysilane, vinyltriethoxysilane, vinyltri (2-methoxyethoxy) silane, and nitrogen- (2-aminoethyl) ) -3-aminopropylmethyldimethoxysilane, nitrogen- (2-aminoethyl) -3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane , 3-glycidyl propyl trimethoxysilane, 3-glycidyl propyl methyldimethoxysilane, 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, 3 -Chloropropylmethyldimethoxysilane, 3-chloropropyltrimethoxysilane, 3-methacryloxypropyltrimethoxysilane, 3-mercaptopropyltrimethoxysilane, or a compound thereof Any combination.

Specific examples of the foregoing antioxidant may include, but are not limited to, 2,2-thiobis (4-methyl-6-third butylphenol), 2,6-di-third butylphenol, or any combination thereof .

Specific examples of the aforementioned ultraviolet absorber may include, but are not limited to, 2- (3-thirdbutyl-5-methyl-2-hydroxyphenyl) -5-chlorophenyl azide, and alkoxy phenone ) Or any combination of the above.

Specific examples of the anti-aggregation agent may include, but are not limited to, sodium polyacrylate.

Specific examples of the aforementioned cationic polymerizable compound may include, but are not limited to, products made by Ciba Refining Co., Ltd., and the model may be Irgacure 250 or Irgacure 261.

Based on the total use amount of the alkali-soluble resin (C) being 100 parts by weight, the use amount of the additive (G) may be 0.1 to 10 parts by weight, preferably 0.3 to 7 parts by weight, and more preferably may be 0.5 to 4 parts by weight.

Preparation method of photosensitive resin composition for color filter

The photosensitive resin composition for a color filter is prepared by adding the aforementioned pigment (A), dye (B), alkali-soluble resin (C), compound (D) having an ethylenically unsaturated group, and a photoinitiator. (E) and organic solvent (F) are placed in a stirrer and stirred to uniformly mix them into a solution state, and additives (G) may be optionally added if necessary.

The method for preparing the photosensitive resin composition for the color filter is not particularly limited. It may first disperse a part of the alkali-soluble resin (C) and the compound (D) having an ethylenically unsaturated group in one part. Parts of the organic solvent (F) to form a dispersion solution. Then, the aforementioned mixed solution and the pigment (A), the dye (B), the alkali-soluble resin (C), the compound (D) having an ethylenically unsaturated group, the photoinitiator (E), and the organic solvent (F) are mixed. That is, the photosensitive resin composition for a color filter of the present invention can be obtained.

In addition, the photosensitive resin composition for a color filter may first disperse a part of the pigment (A) in a part of the organic solvent (F) to form a pigment dispersion liquid. Then, the aforementioned pigment dispersion liquid, pigment (A), dye (B), alkali-soluble resin (C), compound (D) having an ethylenically unsaturated group, a photoinitiator (E), and an organic solvent (F ) To obtain a photosensitive resin composition for a color filter of the present invention. Among them, the aforementioned pigment (A) The dispersing step may be performed by a mixer such as a beads mill or a roll mill.

Method for manufacturing pixel layer and color filter

The present invention also provides a pixel layer and a method for forming a color filter. The pixel layer is formed by using the photosensitive resin composition for the color filter. The pixel layer is also referred to as a pixel color layer hereinafter .

The present invention also provides a color filter, which is manufactured by using the above-mentioned method for forming a color filter.

The method for forming a color filter includes steps including a coating step, an exposure step, a developing step, a post-baking step, and sputtering of an indium tin oxide (ITO) protective film.

The coating step is a method in which the photosensitive resin composition for a color filter is coated on a substrate by a coating method such as spin coating, cast coating, or roll coating.

The above substrates may be alkali-free glass, soda-lime glass, hard glass (Pales glass), quartz glass applied to liquid crystal display devices, and these glasses with a transparent conductive film attached thereto, or they may be applied to photoelectric conversion devices such as solid Photographic device) substrate (such as a silicon substrate).

In addition, before coating a photosensitive resin composition for a color filter on a substrate, a black matrix for shielding light from a pixel colored layer such as red, green, and blue must be formed on the substrate.

After the coating step is performed, most of the organic solvent in the photosensitive resin composition for a color filter is removed by drying under reduced pressure. And then The pre-bake method removes residual organic solvents to form a pre-bake coating film.

The operating conditions of the above-mentioned reduced-pressure drying and pre-baking may vary depending on the type of each component and the blending ratio. Drying under reduced pressure is generally performed at a pressure of 0 mm Hg to 200 mm Hg for 1 second to 60 seconds, and pre-baking is generally performed at 70 ° C to 110 ° C for 1 minute to 15 minutes.

The aforementioned exposure step is to expose the pre-baking coating film by using a photomask having a specific pattern. The light used in the exposure process is preferably ultraviolet rays such as g-line, h-line, or i-line, and the equipment used to provide ultraviolet light may be (ultra-high-pressure) mercury lamps and metal halide lamps.

The aforementioned developing step is to dip the exposed pre-baking coating film in a developing solution at a temperature of 21 ° C to 25 ° C, and perform a developing step of about 15 seconds to 5 minutes to remove the above-mentioned pre-baking coating after exposure. Unwanted portions of the film can form a pixel-colored layer having a specific pattern.

The developer may include sodium hydroxide, potassium hydroxide, sodium carbonate, sodium bicarbonate, potassium carbonate, potassium bicarbonate, sodium silicate, sodium methyl silicate, ammonia, ethylamine, diethylamine, and dimethyl. Basic compounds such as methylethanolamine, tetramethylammonium hydroxide, tetraethylammonium hydroxide, choline, pyrrole, pyridine, or 1,8-diazabicyclo- (5,4,0) -7-undecene Composition of alkaline aqueous solution.

The concentration of the developing solution may be generally from 0.001 to 10 weight percent, preferably from 0.005 to 5 weight percent, and more preferably from 0.01 to 1 weight percent.

The post-baking step is performed by using compressed air or compressed nitrogen to dry the pixel-colored layer having a specific pattern. Then, use a hot plate or baking A heating device such as a box performs a post-bake process on the pixel-colored layer having the specific pattern to cure the pixel-colored layer. The temperature of the post-baking step may be 150 ° C to 250 ° C. When using a hot plate, the heating time is 5 minutes to 60 minutes. When using an oven, the heating time is 15 minutes to 150 minutes.

Repeat the above steps to sequentially form pixel, colored layers such as red, green, and blue on the substrate.

The aforementioned step of sputtering an ITO protective film is to form an ITO protective film on the surface of the pixel coloring layer by a sputtering process in a vacuum environment of 220 ° C to 250 ° C to form a color filter with a pixel layer. . If necessary, the ITO protective film is subjected to etching and wiring treatment, and a liquid crystal alignment film is coated on the surface of the ITO protective film.

Manufacturing method of liquid crystal display

The present invention also provides a liquid crystal display, and the liquid crystal display includes the aforementioned color filter.

In the liquid crystal display, the above-mentioned color filter and a substrate provided with a thin film transistor (TFT) are oppositely arranged, and a gap (cell gap) is formed between the two. Then, the color filter and the peripheral portion of the substrate are bonded with an adhesive, and a liquid crystal injection hole is left. Then, liquid crystal is injected through the liquid crystal injection hole, and the injection hole is sealed to form a liquid crystal layer. Thereafter, the polarizing plate is disposed on the other side of the color filter opposite to the liquid crystal layer and the other side of the substrate opposite to the liquid crystal layer, so that a liquid crystal display can be manufactured.

The liquid crystal may be a liquid crystal compound or a liquid crystal composition. The liquid crystal is not particularly limited, and any liquid crystal compound and liquid crystal composition can be used.

In addition, the liquid crystal alignment film used in the color filter is used to restrict the alignment of liquid crystal molecules, and it is not particularly limited.

The following uses several embodiments to explain the application of the present invention, but it is not intended to limit the present invention. Those with ordinary knowledge in the technical field of the present invention can make various changes and modifications without departing from the spirit and scope of the present invention. Retouch.

100‧‧‧ device

110‧‧‧ photosensitive resin layer

120‧‧‧polarizing plate

120a‧‧‧direction

130‧‧‧polarizing plate

130a‧‧‧ direction

140‧‧‧light source

150‧‧‧ Luminance Meter

200‧‧‧ device

210‧‧‧ photosensitive resin layer

220‧‧‧polarizing plate

220a‧‧‧ direction

230‧‧‧Polarizer

230a‧‧‧direction

240‧‧‧ light source

250‧‧‧ Luminance Meter

[Fig. 1] A perspective view showing a contrast detection device in an evaluation method according to the present invention.

[Fig. 2] A perspective view showing another detection device for contrast in the evaluation method according to the present invention.

Preparation of the first alkali-soluble resin (C-1)

The first alkali-soluble resin (C-1) of Synthesis Example C-1-1 to Synthesis Example C-1-7 was prepared in accordance with Table 1.

Synthesis Example C-1-1

A four-necked conical flask was provided with a stirrer, a thermometer, a condenser tube, and a nitrogen inlet, and nitrogen was introduced. Then, 100 parts by weight of propylene glycol was added Methyl ether acetate (hereinafter referred to as PGMEA) was put into a four-necked conical flask, and the temperature was raised to 100 ° C. Next, 3 parts by weight of dimethyl-2,2 '-[oxybis (methylene)] bis-2-acrylate (hereinafter referred to as DMOA) and 82 parts by weight of styrene (hereinafter referred to as SM) 10 parts by weight of 3,4-epoxycyclohexyl methyl methacrylate (hereinafter referred to as ECMMA) and 4 parts by weight of 2,2'-azobis-2-methylbutyronitrile (hereinafter referred to as AMBN) It was dissolved in 100 parts by weight of PGMEA, and the mixed solution was dropped into a four-necked conical flask dropwise within 2 hours. After reacting at 100 ° C for 6.5 hours, 15 parts by weight of acrylic acid (hereinafter referred to as AA) was added to a four-necked conical flask filled with nitrogen, and the temperature was raised to 110 ° C. After 6 hours of reaction, the alkali-soluble resin (C-1-1) of Synthesis Example C-1-1 was obtained.

Synthesis Example C-1-2 to Synthesis Example C-1-7

Synthesis Example C-1-2 to Synthesis Example C-1-7 use the same preparation method as that of the first alkali-soluble resin of Synthesis Example C-1-1, except for Synthesis Example C-1-2 To Synthesis Example C-1-7, the types and amounts of raw materials in the first alkali-soluble resin were changed, and their formulations are shown in Table 1, respectively, and will not be repeated here.

Preparation of the second alkali-soluble resin (C-2)

Synthesis Example C-2-1

100 parts by weight of a rhenium epoxy compound (manufactured by Nippon Steel Chemical Co., Ltd. and model ESF-300; epoxy equivalent 231), 30 parts by weight of acrylic acid, 0.3 parts by weight of benzyltriethylammonium chloride, Parts by weight of 2,6-di-tert-butyl-p-cresol and 130 parts by weight of propylene glycol methyl ether acetate were continuously added to a 500 mL four-necked flask, and the feed rate was controlled to 25 per minute Parts by weight, and the temperature is maintained at 100 ° C to 110 ° C. After 15 hours of reaction, a pale yellow transparent mixed solution having a solid content concentration of 50% by weight was obtained.

Next, 100 parts by weight of the above mixed solution was dissolved in 25 parts by weight of ethylene glycol ether acetate, and 6 parts by weight of tetrahydrophthalic anhydride and 13 parts by weight of benzophenone tetracarboxylic dianhydride were added at the same time. And heated to 110 ° C to 115 ° C. After the reaction for 2 hours, the second alkali-soluble resin (C-2-1) of Synthesis Example C-2-1 having an acid value of 98.0 mgKOH / g and a number average molecular weight of 1623 was obtained.

Synthesis Example C-2-2

100 parts by weight of a rhenium epoxy compound (manufactured by Nippon Steel Chemical Co., Ltd. and model ESF-300; epoxy equivalent 231), 30 parts by weight of acrylic acid, 0.3 parts by weight of benzyltriethylammonium chloride, 0.1 Parts by weight of 2,6-di-tert-butyl-p-cresol and 130 parts by weight of propylene glycol methyl ether acetate were continuously added to a 500 mL four-necked flask, and the feed rate was controlled to 25 parts by weight per minute, and the temperature was controlled. Maintained at 100 ° C to 110 ° C. After 15 hours of reaction, a pale yellow transparent mixed solution having a solid content concentration of 50% by weight was obtained.

Next, 100 parts by weight of the above-mentioned mixed solution was dissolved in 25 parts by weight of ethylene glycol ether acetate, and 13 parts by weight of benzophenonetetracarboxylic dianhydride was added at the same time. After reacting at 90 ° C to 95 ° C for 2 hours, adding 6 parts by weight of tetrahydrophthalic anhydride and reacting at 90 ° C to 95 ° C for 4 hours, an acid value of 99.0 mgKOH / g and an average number can be obtained. The second alkali-soluble resin (C-2-2) of Synthesis Example C-2-2 having a molecular weight of 2162.

Synthesis Example C-2-3

400 parts by weight of an epoxy compound (manufactured by Nippon Kayaku Co., Ltd. and model number NC-3000; epoxy equivalent weight is 288), 102 parts by weight of acrylic acid, 0.3 parts by weight of methoxyphenol, 5 Part by weight of triphenylphosphine and 264 parts by weight of propylene glycol methyl ether acetate were placed in a reaction flask, and the temperature was maintained at 95 ° C. After 9 hours of reaction, an intermediate product having an acid value of 2.2 mgKOH / g was obtained. Next, 151 parts by weight of tetrahydrophthalic anhydride was added and reacted at 95 ° C for 4 hours to obtain Synthesis Example C-2-3 with an acid value of 102 mgKOH / g and a number average molecular weight of 2589. The second alkali-soluble resin (C-2-3).

Preparation of other alkali-soluble resins (C’-1)

In the following, other alkali-soluble resins (C'-1) of Synthesis Example C'-1-1 and Synthesis Example C'-1-2 were prepared according to Table 1.

Synthesis Example C’-1-1

A four-necked conical flask was provided with a stirrer, a thermometer, a condenser tube, and a nitrogen inlet, and nitrogen was introduced. Then, 100 parts by weight of propylene glycol methyl ether acetate (hereinafter referred to as PGMEA) was added to a four-necked conical flask, and the temperature was raised to 100 ° C. Next, 70 parts by weight of 2-hydroxyethyl methacrylate (hereinafter referred to as HEMA), 5 parts by weight of 2-methylepoxypropyl methacrylate (hereinafter referred to as MGMA), and 4.5 parts by weight AMBN was dissolved in 100 parts by weight of PGMEA, and the mixed solution was dropped into a four-necked conical flask dropwise within 2 hours. After reacting at 105 ° C for 6 hours, 15 parts by weight of 2-methacrylic acid ethoxysuccinate (hereinafter referred to as HOMS) and 15 parts by weight of Methacrylic acid (hereinafter referred to as MAA) was added to a four-necked conical flask filled with nitrogen, and the temperature was increased to 110 ° C. After 6 hours of reaction, the alkali-soluble resin (C'-1-1) of Synthesis Example C'-1-1 was obtained.

Synthesis Example C’-1-2

Synthesis Example C'-1-2 uses the same preparation method as that of other alkali-soluble resins in Synthesis Example C'-1-1. The difference is that Synthesis Example C'-1-2 uses other alkali-soluble resins. The type and amount of raw materials used in the formula are shown in Table 1 and will not be repeated here.

Preparation of a photosensitive resin composition for a color filter

The photosensitive resin compositions for color filters of Examples 1 to 12 and Comparative Examples 1 to 5 are prepared according to Table 2 below.

Example 1

50 parts by weight of CI Pigment Red 254 (hereinafter referred to as A-1), 15 parts by weight of CI Acid Red 37 (hereinafter referred to as B-2-1), and 100 parts by weight of the base of the aforementioned Synthesis Example C-1-1 Soluble resin (C-1-1), 20 parts by weight of EO modified trimethylolpropyl triacrylate (hereinafter abbreviated as D-1) and 30 parts by weight of the compound having the formula (II-1) A structured photoinitiator (hereinafter abbreviated as E-1-1) was added to 1500 parts by weight of ethyl 3-ethoxypropionate (hereinafter abbreviated as F-1), and a shaking type (shaking type After stirrer), the photosensitive resin composition for a color filter of Example 1 can be obtained. The obtained photosensitive resin composition for a color filter was evaluated by the following evaluation methods. The results are shown in Table 2. The evaluation methods of the bubble-like display defects, pattern smoothness, and contrast will be described later.

Examples 2 to 12 and Comparative Examples 1 to 5

Examples 2 to 12 and Comparative Examples 1 to 5 use the same production method as the method for producing the photosensitive resin composition for a color filter of Example 1, except that Examples 2 to Examples are different. 12 and Comparative Examples 1 to 5 change the types and amounts of raw materials in the photosensitive resin composition for color filters, and their formulations and evaluation results are shown in Table 2, respectively, and are not repeated here.

Evaluation method 1. Bubble-like display defects

The liquid crystal display elements prepared by using the foregoing Examples 1 to 12 and Comparative Examples 1 to 5 were placed in an environment having a temperature of 100 ° C and a relative humidity of 95%, and the appearance of bubble-like display defects was observed with the naked eye. The time t is evaluated based on the following criteria: ◎: 500 hours <t; ○: 400 hours <t ≦ 500 hours; △: 300 hours <t ≦ 400 hours; ×: t ≦ 300 hours.

2.pattern smoothness

The photosensitive resin compositions for color filters of Examples 1 to 12 and Comparative Examples 1 to 5 were spin-coated on a soda glass substrate having a SiO ₂ film, and were applied at 90 ° C. Pre-bake at 100 ° C for 100 seconds to form a pre-bake coating film with a film thickness of 2.5 μm. Then, after the substrate is cooled to room temperature, the photomask is introduced and irradiated with a high-pressure mercury lamp including wavelengths of 365 nm, 405 nm, and 436 nm, and the irradiation amount is 400 J / m ² . Then, the substrate was immersed in a 0.04 wt% potassium hydroxide aqueous solution at 23 ° C. for 1 minute for development. Then, the substrate was washed with pure water and air-dried, and then baked in an oven at 220 ° C. for 30 minutes to obtain a pixel-colored layer.

Then, the surface roughness of the surface of the pixel colored layer was measured with an atomic force microscope manufactured by Digital Instruments, and evaluated according to the following criteria: ◎: Surface roughness <40Å; ○: 40Å ≦ Surface roughness <50Å; △ : 50Å ≦ surface roughness <60Å; ×: 60Å ≦ surface roughness.

3.Contrast

The photosensitive resin compositions prepared in Examples 1 to 12 and Comparative Examples 1 to 5 were spin-coated on a glass substrate having a size of 100 mm × 100 mm. Then, it was dried under reduced pressure at a pressure of 100 mmHg and a time of 30 seconds. Next, a pre-baking process is performed. The temperature is 80 ° C. and the time is 2 minutes, and a pre-baking coating film with a film thickness of 2.5 μm can be formed. After the pre-baking process, the pre-bake coating film is irradiated with ultraviolet light (exposure machine: Canon PLA-501F) with an energy of 100 mJ / cm ² , and the pre-bake coating film after exposure is immersed in a developing solution at 23 ° C. After 1 minute, the coating film was washed with pure water, and a post-baking process was performed at 235 ° C. After 30 minutes, a photosensitive resin layer having a film thickness of 2.0 μm was formed on the glass substrate.

The photosensitive resin layer with a thickness of about 2.0 μm was measured with the detection device shown in FIG. 1 and FIG. 2 to measure the brightness value of the photosensitive resin layer, and the brightness ratio was calculated. In the detection device 100 of FIG. 1, the above-mentioned photosensitive resin layer 110 is disposed between two polarizing plates 120 and 130, and the light emitted from the light source 140 sequentially passes through the polarizing plate 120 and the photosensitive resin. Layer 110 and polarizing plate 130. Then, the luminance value (cd / cm ² ) of the light passing through the polarizing plate 130 was measured with a luminance meter 150 (manufactured by Topcon, model: BM-5A).

Wherein, the polarization direction 120 a of the polarizing plate 120 is parallel to the polarization direction 130 a of the polarizing plate 130, and the luminance value measured by the apparatus 100 of FIG. 1 is A. The detection device 200 shown in FIG. 2 is substantially the same as the detection device 100 shown in FIG. 1, except that the polarization direction 220 a of the polarizing plate 220 in the detection device 200 is perpendicular to the polarization direction 230 a of the polarizing plate 230. And the luminance value measured by the apparatus 200 is B.

Next, the following formula (VII) is used to calculate the contrast of the photosensitive resin composition and evaluate it based on the following criteria:

◎: 3500 ≦ contrast; ○: 3300 ≦ contrast <3500; △: 3000 ≦ contrast <3300; ×: contrast <3000.

As is clear from the results in Table 2, when the first alkali-soluble resin (C-1) of the alkali-soluble resin (C) of the present invention does not contain an ethylenically unsaturated monomer having a structure represented by the formula (I-1) In the case of (c-1-1), the obtained photosensitive resin composition for a color filter may have bubble-like display defects.

When the photoinitiator (E) does not include a photoinitiator (E-1) having a structure represented by the formula (II), the obtained photosensitive resin composition for a color filter has pattern smoothness. Poor flaws.

Next, when the dye (B) of the present invention contains a xanthene-based dye (B-1) having a structure represented by the formula (V), the photosensitive resin composition for a color filter has better contrast.

When the amount of the ethylenically unsaturated monomer (c-1-1) having the structure represented by the formula (I-1) is within the foregoing range, the photosensitive resin for a color filter is composed of After the object is subjected to the lithography process, the formed pixel coloring layer has better sputtering resistance and is less likely to have bubble-like display defects.

In addition, when the alkali-soluble resin (C) of the photosensitive resin composition for a color filter contains the second alkali-soluble resin (C-2), the obtained photosensitive resin composition is less likely to have a bubble-like display defect. .

It should be added that although the present invention exemplifies specific compounds, compositions, reaction conditions, processes, analytical methods, or specific instruments, the photosensitive resin composition for color filters of the present invention and its applications are explained, but the present invention belongs to Anyone with ordinary knowledge in the technical field knows that the present invention is not limited to this, and without departing from the spirit and scope of the present invention, the photosensitive resin composition for a color filter of the present invention and its application may use other compounds. , Composition, reaction conditions, process, analytical method or instrument.

Although the present invention has been disclosed in the above embodiments, it is not intended to limit the present invention. Any person with ordinary knowledge in the technical field to which the present invention pertains may make various changes without departing from the spirit and scope of the present invention. And retouching, so the scope of protection of the present invention shall be determined by the scope of the attached patent application.

A-1 C.I.Pigment Red 254

A-2 C.I.Pigment Green 36

A-3 C.I. Pigment Blue 15: 6

A-4 C.I.Pigment Blue 66

B-1-1 Compound represented by formula (V-1) (R ^c and R ^d are -SO ₃ ^- and t is 0)

B-1-2 Compound represented by formula (V-22)

B-1-3 Compound represented by formula (V-28)

B-2-1 C.I. Acid Red 37

B-2-2 C.I. Disperse Red 60

B-2-3 C.I. Disperse Blue 60

D-1 EO modified triacrylic acid trimethyl acrylate

D-2 Dipentaerythritol hexaacrylate

D-3 Caprolactone Modified Dipentaerythritol Hexacrylate

E-1-1 Photoinitiator having a structure represented by formula (II-1)

E-1-2 Photoinitiator having a structure shown by formula (II-11)

E-1-3 Photoinitiator having a structure shown by formula (II-27)

E-2-1 2-methyl-1- (4-methylthiophenyl) -2-morpholino-1-acetone

E-2-2 2,2’-bis (o-chlorophenyl) -4,4 ’, 5,5’-tetraphenyldiimidazole

E-2-3 1- [4- (phenylthio) phenyl] -octane-1,2-dione 2- (O-phenylhydrazine)

F-1 ethyl 3-ethoxypropionate

F-2 Propylene glycol methyl ether acetate

F-3 methyl isobutyl ketone

G-1 3-Mercaptopropyltrimethoxysilane

G-2 2,2-thiobis (4-methyl-6-tert-butylphenol)

G-3 2- (3-Third-butyl-5-methyl-2-merylphenyl) -5-chlorophenyl azide

Claims (17)

A photosensitive resin composition for a color filter, comprising: a pigment (A); a dye (B); an alkali-soluble resin (C); a compound (D) having an ethylenically unsaturated group; and a photoinitiator. (E); and an organic solvent (F), wherein the alkali-soluble resin (C) includes a first alkali-soluble resin (C-1), and the first alkali-soluble resin (C-1) has the following formula ( I) Structure shown:

In formula (I), A ₁ and A ₂ each independently represent a hydrogen atom, a hydrocarbon group having 1 to 25 carbon atoms with or without a substituent; and the photoinitiator (E) includes a compound having the following formula ( II) Photoinitiator (E-1) of the structure shown:

In formula (II), R ₁ , R ₂ , R ₃ , R ₄ , R ₅ , R ₆ , R ₇ and R ₈ are independently hydrogen, C ₁ -C ₂₀ alkyl,

, COR ₁₆ , OR ₁₇ , halogen, NO ₂ or

; Or R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ , R ₅ and R ₆ , R ₆ and R ₇ or R ₇ and R ₈ are independent of each other.

Substituted C ₂ -C ₁₀ alkenyl; or R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ , R ₅ and R ₆ , R ₆ and R _7, or R ₇ and R ₈ are independently common with each other Is-(CH ₂ ) _p -Y- (CH ₂ ) _q- ; or R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ , R ₅ and R ₆ , R ₆ and R ₇ or R ₇ And R ₈ independently of each other are

; Provided that at least one of R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ , R ₅ and R ₆ , R ₆ and R ₇ or R ₇ and R ₈

, R ₉ , R ₁₀ , R ₁₁ and R ₁₂ are independently of each other hydrogen, C ₁ -C ₂₀ alkyl, the C ₁ -C ₂₀ alkyl is unsubstituted or substituted with one or more of the following groups: halogen , Phenyl, CN, OH, SH, C ₁ -C ₄ -alkoxy, (CO) OH or (CO) O (C ₁ -C ₄ alkyl); or R ₉ , R ₁₀ , R ₁₁ and R _{12 is} independently unsubstituted phenyl or phenyl substituted with one or more of the following: C ₁ -C ₆ alkyl, halogen, CN, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₉ , R ₁₀ , R ₁₁ and R ₁₂ are independently of each other halogen, CN, OR ₁₇ , SR ₁₈ , SOR ₁₈ , SO ₂ R ₁₈ or NR ₁₉ R ₂₀ , wherein the substituents OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ optionally forms a 5- or 6-membered ring with one carbon atom in the naphthyl ring via these groups R ₁₇ , R ₁₈ , R ₁₉ and / or R ₂₀ ; or R ₉ , R ₁₀ , R ₁₁ and R ₁₂ Independent of each other

, COR ₁₆ or NO ₂ ; Y is O, S, NR ₂₆ or direct bond; p is integer 0, 1, 2 or 3; q is integer 1, 2 or 3; X is CO or direct bond; R ₁₃ is C _1- C ₂₀ alkyl, which is unsubstituted or substituted with one or more of the following groups: halogen, R ₁₇ , COOR ₁₇ , OR ₁₇ , SR ₁₈ , CONR ₁₉ R ₂₀ , NR ₁₉ R ₂₀ , PO (OC _k H _{2k + 1} ) ₂ or

; Or R ₁₃ is a C ₂ -C ₂₀ alkyl group, interspersed with one or more O, S, SO, SO ₂ , NR ₂₆ or CO, or a C ₂ -C ₁₂ alkenyl group, which is not interspersed or interspersed One or more O, CO or NR ₂₆ wherein the interspersed C ₂ -C ₂₀ alkyl and the unsaturated or interspersed C ₂ -C ₁₂ alkenyl are unsubstituted or substituted by one or more halogens Substitution; or R ₁₃ is C ₄ -C ₈ cycloalkenyl, C ₂ -C ₁₂ alkynyl or C ₃ -C ₁₀ cycloalkyl without one or more O, S, CO or NR ₂₆ ; Or R ₁₃ is phenyl or naphthyl, each of which is unsubstituted or substituted with one or more of the following groups: OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ ,

_{, COR 16, CN, NO 2} , halogen, C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, interrupted by one or more O, S, CO or NR C ₂₆ of ₂ -C ₂₀ alkyl group; or via their respective C ₃ -C ₁₀ cycloalkyl, or interrupted by one or more O, S, CO or NR ₂₆ of the C ₃ -C ₁₀ cycloalkyl; based integer k 1 to 10; R ₁₄ type hydrogen, C ₃ -C ₈ cycloalkyl, C ₂ -C ₅ alkenyl, C ₁ -C ₂₀ alkoxy, or C ₁ -C ₂₀ alkyl, which are unsubstituted or substituted with one or more of the following groups: halogen, Phenyl, C ₁ -C ₂₀ alkylphenyl or CN; or R ₁₄ phenyl or naphthyl, each of which is unsubstituted or substituted with one or more of the following groups: C ₁ -C ₆ alkyl, C _1- C ₄ haloalkyl, halogen, CN, OR ₁₇ , SR ₁₈ and / or NR ₁₉ R ₂₀ ; or R ₁₄ is C ₃ -C ₂₀ heteroaryl, C ₁ -C ₈ alkoxy, benzyloxy or Phenoxy, the benzyloxy and phenoxy are unsubstituted or substituted with one or more of the following groups: C ₁ -C ₆ alkyl, C ₁ -C ₄ haloalkyl and / or halogen; R ₁₅ series C ₆ -C ₂₀ aryl or C ₃ -C ₂₀ heteroaryl, each of which is unsubstituted or substituted with one or more of the following groups: phenyl, halogen, C ₁ -C ₄ haloalkyl, CN, NO ₂ , OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ , PO (OC _k H _{2k + 1} ) ₂ , SO-C ₁ -C ₁₀ alkyl, SO ₂ -C ₁ -C ₁₀ alkyl, interspersed with one or more O, S or NR C ₂ -C ₂₀ alkyl of ₂₆ ; or each substituted by C ₁ -C ₂₀ alkyl, the C ₁ -C ₂₀ alkyl is unsubstituted or substituted with one or more of the following groups: halogen, COOR ₁₇ , CONR ₁₉ R ₂₀ , phenyl, C ₃ -C ₈ cycloalkyl, C ₃ -C ₂₀ heteroaryl, C ₆ -C ₂₀ aryloxycarbon, C ₃ -C ₂₀ heteroaryloxycarbonyl, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₁₅ is hydrogen, C ₂ -C ₁₂ alkenyl, C ₃ -C ₈ cycloalkyl without one or more O, CO or NR ₂₆ ; or R ₁₅ is a C ₁ -C ₂₀ alkyl group, which is unsubstituted or substituted with one or more of the following groups: halogen, OR ₁₇ , SR ₁₈ , C ₃ -C ₈ cycloalkyl, C ₃ -C ₂₀ hetero Aryl, C ₆ -C ₂₀ aryloxycarbonyl, C ₃ -C ₂₀ heteroaryloxycarbonyl, NR ₁₉ R ₂₀ , COOR ₁₇ , CONR ₁₉ R ₂₀ , PO (OC _k H _{2k + 1} ) ₂ ,

,

, Phenyl; or the C ₁ -C ₂₀ alkyl is substituted with phenyl, the phenyl is substituted with halogen, C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, OR ₁₇ , SR ₁₈ or NR ₁₉ R _{20 is} substituted; or R ₁₅ is a C ₂ -C ₂₀ alkyl group with one or more O, SO or SO ₂ interspersed therebetween, and the interspersed C ₂ -C ₂₀ alkyl group is unsubstituted or one or more Substitution of: halogen, OR ₁₇ , COOR ₁₇ , CONR ₁₉ R ₂₀ , phenyl or phenyl substituted with OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₁₅ is a C ₂ -C ₂₀ alkylfluorenyl Or benzamidine, which is unsubstituted or substituted with one or more of the following groups: C ₁ -C ₆ alkyl, halogen, phenyl, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₁₅ Unsubstituted or substituted with one or more OR ₁₇ or naphthylmethyl or C ₃ -C ₁₄ heteroarylcarbonyl; or R ₁₅ is C ₂ -C ₁₂ alkoxycarbonyl, which is unsubstituted or unsubstituted One or more O and the interspersed or unsaturated C ₂ -C ₁₂ alkoxycarbonyl group is unsubstituted or substituted with one or more hydroxyl groups; or R ₁₅ is phenoxycarbonyl group, which is unsubstituted Or substituted with one or more of the following groups: C ₁ -C ₆ alkyl, halogen, C ₁ -C ₄ haloalkyl, Phenyl, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₁₅ is CN, CONR ₁₉ R ₂₀ , NO ₂ , C ₁ -C ₄ haloalkyl, S (O) _m -C ₁ -C ₆ alkyl, unsubstituted or C ₁ -C ₁₂ alkyl or SO ₂ -C ₁ -C ₆ alkyl group substituted with the S (O) _m - group; or R ₁₅ SO ₂ O- based phenyl, which is unsubstituted Department or by C ₁ -C ₁₂ substituted alkyl; or based diphenylphosphino acyl or di (C ₁ -C ₄ alkoxy) - phosphino acyl; m lines 1 or 2; R _'14 R ₁₄ having the targeted Give one of the meanings; R _'15 has one of the meanings given for R ₁₅ ; X ₁ is O, S, SO, or SO ₂ ; X ₂ is O, CO, S, or a direct bond; R ₁₆ C ₆ -C ₂₀ aryl or C ₃ -C ₂₀ heteroaryl, each of which is unsubstituted or substituted with one or more of the following groups: phenyl, halogen, C ₁ -C ₄ haloalkyl, CN, NO ₂ , OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ or C ₁ -C ₂₀ alkyl groups with one or more O, S or NR ₂₆ interspersed; or each of them is substituted with one or more C ₁ -C ₂₀ alkyl groups The C ₁ -C ₂₀ alkyl is unsubstituted or substituted with one or more of the following groups: halogen, COOR ₁₇ , CONR ₁₉ R ₂₀ , phenyl, C ₃ -C ₈ cycloalkyl, C ₃ -C ₂₀ heteroaryl, C ₆ -C ₂₀ aryloxycarbonyl, C ₃ -C ₂₀ heteroaryloxycarbonyl, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₁₆ is hydrogen, C ₁ -C ₂₀ alkyl, the C ₁ -C ₂₀ alkyl is unsubstituted or Multiple substitutions of: halogen, phenyl, OH, SH, CN, C ₃ -C ₆ alkenyloxy, OCH ₂ CH ₂ CN, OCH ₂ CH ₂ (CO) O (C ₁ -C ₄ alkyl) , O (CO)-(C ₁ -C ₄ alkyl), O (CO) -phenyl, (CO) OH or (CO) O (C ₁ -C ₄ alkyl); or R ₁₆ is C _2- C ₁₂ alkyl with one or more O, S or NR ₂₆ interposed between them; or R ₁₆ series (CH ₂ CH ₂ O) _{n + 1} H, (CH ₂ CH ₂ O) _n (CO)-(C _1- C ₈ alkyl), C ₂ -C ₁₂ alkenyl or C ₃ -C ₈ cycloalkyl; or R ₁₆ is a phenyl substituted with SR ₁₈ , wherein the group R ₁₈ represents a bond to the COR ₁₆ group A direct bond of the phenyl or naphthyl ring of the carbazole moiety attached; n is 1 to 20; R ₁₇ is hydrogen, phenyl-C ₁ -C ₃ alkyl, C ₁ -C ₂₀ alkyl, It is unsubstituted or substituted with one or more of the following groups: halogen, OH, SH, CN, C ₃ -C ₆ alkenyloxy, OCH ₂ CH ₂ CN, OCH ₂ CH ₂ (CO) O (C ₁ -C ₄ alkyl), O (CO)-(C ₁ -C ₄ alkyl), O (CO)-(C ₂ -C ₄ alkenyl), O (CO) -phenyl, (CO) OH, _{(CO) O (C 1 -C} 4 alkyl), C ₃ -C _{20 Alkyl, SO 2 - (C 1 -C} 4 haloalkyl), O (C ₁ -C ₄ haloalkyl) or interrupted by one or more O of C ₃ -C ₂₀ cycloalkyl; or R ₁₇ based C ₂ - C ₂₀ alkyl with one or more O, S or NR ₂₆ interspersed between them; or R ₁₇ based on (CH ₂ CH ₂ O) _{n + 1} H, (CH ₂ CH ₂ O) _n (CO)-(C _1- (C ₈ alkyl), C ₁ -C ₈ alkyl, C ₂ -C ₁₂ alkenyl, C ₃ -C ₆ alkenyl or one or more O, S, CO or NR ₂₆ C ₃ -C ₂₀ cycloalkyl; or R ₁₇ is C ₁ -C ₈ alkyl-C ₃ -C ₁₀ cycloalkyl, which is one or more O without interspersed or interspersed; or R ₁₇ is benzamidine Group, which is unsubstituted or substituted with one or more C ₁ -C ₆ alkyl, halogen, OH or C ₁ -C ₃ alkoxy; or R ₁₇ is phenyl, naphthyl or C ₃ -C ₂₀ Heteroaryl, each of which is unsubstituted or substituted with one or more of the following groups: halogen, OH, C ₁ -C ₁₂ alkyl, C ₁ -C ₁₂ alkoxy, CN, NO ₂ , phenyl- C ₁ -C ₃ alkoxy, phenoxy, C ₁ -C ₁₂ alkylthio, phenylthio, N (C ₁ -C ₁₂ alkyl) ₂ , diphenyl-amino or

; Or R ₁₇ forms a bond to the group

or

Direct bond to one of the carbon atoms of the phenyl or naphthyl ring; R ₁₈ is hydrogen, C ₂ -C ₁₂ alkenyl, C ₃ -C ₂₀ cycloalkyl or phenyl-C ₁ -C ₃ alkyl , Wherein the C ₂ -C ₁₂ alkenyl, C ₃ -C ₂₀ cycloalkyl or phenyl-C ₁ -C ₃ alkyl is one or more O, S, CO, NR ₂₆ or COOR ₁₇ ; or R ₁₈ is a C ₁ -C ₂₀ alkyl group, which is unsubstituted or substituted with one or more of the following groups: OH, SH, CN, C ₃ -C ₆ alkenyloxy, OCH ₂ CH ₂ CN , OCH ₂ CH ₂ (CO) O (C ₁ -C ₄ alkyl), O (CO)-(C ₂ -C ₄ alkenyl), O (CO)-(C ₁ -C ₄ alkyl), O (CO) -phenyl or (CO) OR ₁₇ ; or R ₁₈ is a C ₂ -C ₂₀ alkyl group, which is interspersed with one or more O, S, CO, NR ₂₆ or COOR ₁₇ ; or R ₁₈ is (CH ₂ CH ₂ O) _n H, (CH ₂ CH ₂ O) _n (CO)-(C ₁ -C ₈ alkyl), C ₂ -C ₈ alkyl or C ₃ -C ₆ alkenyl; or R ₁₈ Is benzamidine, which is unsubstituted or substituted with one or more of the following groups: C ₁ -C ₆ alkyl, halogen, OH, C ₁ -C ₄ alkoxy, or C ₁ -C ₄ alkyl Thio; or R _18- based phenyl, naphthyl or C ₃ -C ₂₀ heteroaryl, each of which is unsubstituted or substituted with one or more of the following groups: halogen, C _1- C ₁₂ alkyl, C ₁ -C ₄ haloalkyl, C ₁ -C ₁₂ alkoxy, CN, NO ₂ , phenyl-C ₁ -C ₃ alkoxy, phenoxy, C ₁ -C ₁₂ Alkylthio, phenylthio, N (C ₁ -C ₁₂ alkyl) ₂ , diphenylamino, (CO) O (C ₁ -C ₈ alkyl), (CO) -C ₁ -C ₈ alkyl, (CO) N (C ₁ -C ₈ alkyl) ₂ or

R ₁₉ and R ₂₀ are each independently hydrogen, C ₁ -C ₂₀ alkyl, C ₂ -C ₄ hydroxyalkyl, C ₂ -C ₁₀ alkoxyalkyl, C ₂ -C ₅ alkenyl, C _3- C ₂₀ cycloalkyl, phenyl-C ₁ -C ₃ alkyl, C ₁ -C ₈ alkylfluorenyl, C ₁ -C ₈ alkylfluorenyloxy, C ₃ -C ₁₂ alkenyl, SO _2- ( C ₁ -C ₄ haloalkyl) or benzamidine; or R ₁₉ and R ₂₀ are phenyl, naphthyl or C ₃ -C ₂₀ heteroaryl, each of which is unsubstituted or substituted with one or more of the following Group substitution: halogen, C ₁ -C ₄ haloalkyl, C ₁ -C ₂₀ alkoxy, C ₁ -C ₁₂ alkyl, benzamidine or C ₁ -C ₁₂ alkoxy; or R ₁₉ and R ₂₀ With its attached N atom to form a 5- or 6-membered saturated or unsaturated ring which is not interspersed or interspersed with O, S or NR ₁₇ , and the 5- or 6-membered saturated or unsaturated ring system is unsubstituted or Substituted by one or more of the following groups: C ₁ -C ₂₀ alkyl, C ₁ -C ₂₀ alkoxy, = O, OR ₁₇ , SR ₁₈ , NR ₂₁ R ₂₂ , (CO) R ₂₃ , NO ₂ , Halogen, C ₁ -C ₄ -haloalkyl, CN, phenyl,

Or C ₃ -C ₂₀ cycloalkyl without one or more O, S, CO or NR ₁₇ ; or R ₁₉ and R ₂₀ together with the N atom to which they are attached form a heteroaromatic ring system, the The ring system is unsubstituted or substituted with one or more of the following groups: C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, C ₁ -C ₂₀ alkoxy, = O, OR ₁₇ , SR ₁₈ , NR ₂₁ R ₂₂ , (CO) R ₂₃ ,

, Halogen, NO ₂ , CN, phenyl or C ₃ -C ₂₀ cycloalkyl without one or more O, S, CO or NR ₁₇ ; R ₂₁ and R ₂₂ are independently hydrogen, C _1- C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, C ₃ -C ₁₀ cycloalkyl or phenyl; or R ₂₁ and R ₂₂ together with the N atom to which they are attached are uninterminated or interspersed with O, 5 or 6 membered saturated or unsaturated rings of S or NR ₂₆ , and the 5 or 6 membered saturated or unsaturated ring system is not fused or the 5 or 6 membered saturated or unsaturated ring is fused with a benzene ring; R ₂₃ is hydrogen, OH, C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, C ₂ -C ₂₀ alkyl interspersed with one or more O, CO or NR ₂₆ , unsaturated or interspersed O C ₃ -C ₂₀ cycloalkyl, S, CO, or NR ₂₆ , or R ₂₃ is phenyl, naphthyl, phenyl-C ₁ -C ₄ alkyl, OR ₁₇ , SR ₁₈ or NR ₂₁ R ₂₂ ; R ₂₄ (CO) OR ₁₇ , CONR ₁₉ R ₂₀ , (CO) R ₁₇ ; or R ₂₄ has one of the meanings given for R ₁₉ and R ₂₀ ; R ₂₅ is COOR ₁₇ , CONR ₁₉ R ₂₀ , ( CO) R ₁₇ ; or R ₂₅ has one of the meanings given for R ₁₇ ; R ₂₆ is hydrogen, C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, C ₂ -C ₂₀ alkyl, In the meantime One or more O or CO; or phenyl-C ₁ -C ₄ alkyl, C ₃ -C ₈ cycloalkyl, which are unsaturated or interspersed with one or more O or CO; or (CO ) R ₁₉ ; or is phenyl, which is unsubstituted or substituted with one or more of the following groups: C ₁ -C ₂₀ alkyl, halogen, C ₁ -C ₄ haloalkyl, OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ or

; Provided that at least one group is present in the molecule

or

The photosensitive resin composition for a color filter according to item 1 of the scope of the patent application, wherein in the formula (II) of the photoinitiator (E-1): R ₁ , R ₂ , R ₃ , R ₄ , R ₅ , R ₆ , R ₇ and R ₈ are each independently hydrogen, C ₁ -C ₂₀ alkyl,

, COR ₁₆ or NO ₂ , or R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ , R ₅ and R ₆ , R ₆ and R ₇ or R ₇ and R ₈ independently of one another are

But provided that at least one of R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ , R ₅ and R ₆ , R ₆ and R ₇ or R ₇ and R ₈

; X is CO or a direct bond; R ₁₃ is C ₁ -C ₂₀ alkyl, which is unsubstituted or substituted with one or more of the following groups: halogen, OR ₁₇ , SR ₁₈ , COOR ₁₇ , CONR ₁₉ R ₂₀ Or PO (OC _k H _{2k + 1} ) ₂ ; or R ₁₃ is a C ₂ -C ₂₀ alkyl group, which is interspersed with one or more O, S, NR ₂₆ or CO; or R ₁₃ is phenyl or naphthyl, and Both are unsubstituted or passed through one or more

Or COR ₁₆ substitution; R ₁₄ is C ₁ -C ₂₀ alkyl, phenyl or C ₁ -C ₈ alkoxy; R ₁₅ is phenyl, naphthyl, C ₃ -C ₂₀ heteroaryl, each of which is Substituted or substituted with one or more of the following groups: phenyl, halogen, C ₁ -C ₄ haloalkyl, OR ₁₇ , SR ₁₈ or C ₂ -C ₂₀ alkyl, interspersed with one or more O or S; Or each of them is substituted with one or more C ₁ -C ₂₀ alkyl groups, and the C ₁ -C ₂₀ alkyl group is unsubstituted or substituted with one or more of the following groups: halogen, COOR ₁₇ , CONR ₁₉ R ₂₀ , Phenyl, C ₃ -C ₈ cycloalkyl, C ₃ -C ₂₀ heteroaryl, C ₆ -C ₂₀ aryloxycarbonyl, C ₄ -C ₂₀ heteroaryloxycarbonyl, OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ or PO (OC _k H _{2k + 1} ) ₂ ; or R ₁₅ is a C ₁ -C ₂₀ alkyl group, which is unsubstituted or substituted with one or more of the following groups: OR ₁₇ , SR ₁₈ , C ₃ -C ₈ cycloalkyl, C ₃ -C ₂₀ heteroaryl, NR ₁₉ R ₂₀ , COOR ₁₇ , CONR ₁₉ R ₂₀ or PO (OC _k H _{2k + 1} ) ₂ ; R _'14 has the value given for R ₁₄ one of those meanings; R _'15 has the meanings for R ₁₅ Suo one of those given; R ₁₆ lines phenyl, which is unsubstituted or substituted with one line or more of the following groups: oR _17, SR ₁₈ NR ₁₉ R ₂₀ or interrupted by one or more O, S or NR ₂₆ of C ₂ -C ₂₀ alkyl, phenyl or R ₁₆ lines, which lines with one or more C ₁ -C ₂₀ substituted alkyl, said C _1- C ₂₀ alkyl is unsubstituted or substituted with one or more of the following groups: halogen, COOR ₁₇ , CONR ₁₉ R ₂₀ , phenyl, C ₃ -C ₈ cycloalkyl, C ₃ -C ₂₀ heteroaryl , C ₆ -C ₂₀ aryloxycarbonyl, C ₄ -C ₂₀ heteroaryloxycarbonyl, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₁₆ is C ₁ -C ₂₀ alkyl, which is Substituted or substituted by: halogen, phenyl, OH, SH, CN, C ₃ -C ₆ alkenyloxy, OCH ₂ CH ₂ (CO) O (C ₁ -C ₄ alkyl), O (CO) -(C ₁ -C ₄ alkyl) or (CO) O (C ₁ -C ₄ alkyl); R ₁₇ is C ₁ -C ₂₀ alkyl, which is unsubstituted or via one or more of the following groups Substitution: halogen, OCH ₂ CH ₂ (CO) O (C ₁ -C ₄ alkyl), O (C ₁ -C ₄ alkyl), (CO) O (C ₁ -C ₄ alkyl), C _3- C ₂₀ cycloalkyl or C ₃ -C ₂₀ cycloalkyl mixed with one or more O; or R ₁₇ is C ₂ -C ₂₀ alkyl mixed with one or more O; R ₁₈ is (CO) OR the _{17-substituted} methyl; R ₁₉ and R ₂₀ independently of one another hydrogen, phenyl, C ₁ -C ₂₀ alkyl, C ₁ -C ₈ alkanoyl group C ₁ -C ₈ alkoxy group, acyl; or R ₁₉ and R ₂₀ appended thereto the N atom to form a heteroaromatic ring system with the ring system is unsubstituted or system

Substitution; provided that at least one group is present in the molecule

or

The photosensitive resin composition for a color filter according to item 1 of the scope of the patent application, wherein in the formula (II) of the photoinitiator (E-1): R ₁ , R ₂ , R ₃ , R ₄ , R ₅ , R ₆ , R ₇ and R ₈ are each independently hydrogen, or R ₁ and R ₂ , R ₃ and R ₄ or R ₅ and R ₆ are independently common to each other as

Provided that at least one of R ₁ and R ₂ , R ₃ and R ₄ or R ₅ and R ₆ is

; Or R ₂ series

, COR ₁₆ , NO ₂ or

; Or R ₇ series

Or COR ₁₆ ; R ₉ , R ₁₁ and R ₁₂ are hydrogen; R ₁₀ is hydrogen, OR ₁₇ or COR ₁₆ ; X is CO or a direct bond; R ₁₃ is C ₁ -C ₂₀ alkyl, which is unsubstituted or Substituted by one or more of the following groups: halogen, R ₁₇ , OR ₁₇ , SR ₁₈ or PO (OC _k H _{2k + 1} ) ₂ ; or R ₁₃ is a C ₂ -C ₂₀ alkyl group with one or more intervening O; or R ₁₃ is phenyl; k is integer 2; R ₁₄ is C ₁ -C ₂₀ alkyl or thienyl; R ₁₅ is phenyl or naphthyl, each of which is unsubstituted or undergoes one or more OR ₁₇ or C ₁ -C ₂₀ alkyl substitution; or R ₁₅ is thienyl, hydrogen, C ₁ -C ₂₀ alkyl, the C ₁ -C ₂₀ alkyl is unsubstituted or substituted with one or more of the following groups : OR ₁₇ , SR ₁₈ , C ₃ -C ₈ cycloalkyl, NR ₁₉ R ₂₀ or COOR ₁₇ ; or R ₁₅ is C ₂ -C ₂₀ alkyl with SO ₂ interposed therebetween; R ₁₆ is phenyl or naphthyl , Each of which is unsubstituted or substituted with one or more of the following groups: OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ or C ₁ -C ₂₀ alkyl; or R ₁₆ is thienyl; R ₁₇ is hydrogen, C _1- C ₈ alkyl, C ₁ -C ₂₀ alkyl, the C ₁ -C ₂₀ alkyl is unsubstituted or substituted with one or more of the following groups: halogen, O (CO)-(C _1- C ₄ alkyl), O (CO)- (C ₂ -C ₄ alkenyl) or C ₃ -C ₂₀ cycloalkyl with one or more O interspersed; or R ₁₇ is C ₂ -C ₂₀ alkyl with one or more O interspersed between them; R ₁₈ is C ₃ -C ₂₀ cycloalkyl, C ₁ -C ₂₀ alkyl, which are unsubstituted or substituted with one or more OH, O (CO)-(C ₂ -C ₄ alkenyl) or (CO) OR ₁₇ ; Or R ₁₈ is phenyl, which is unsubstituted or substituted with one or more halogens; R ₁₉ and R ₂₀ are independently C ₁ -C ₈ alkylfluorenyl or C ₁ -C ₈ alkylfluorenyloxy ; Or R ₁₉ and R ₂₀ together with the N atom to which they are attached form a 5- or 6-membered saturated ring with O in between; provided that at least one group is present in the molecule

The photosensitive resin composition for a color filter according to item 1 of the scope of the patent application, wherein the first alkali-soluble resin (C-1) has at least one ethylenically unsaturated group. The photosensitive resin composition for a color filter according to item 1 or 4 of the scope of patent application, wherein the first alkali-soluble resin (C-1) is prepared by reacting a first mixture, and the first mixture It is composed of an ethylenically unsaturated monomer (c-1-1) having a structure represented by the following formula (I-1), and an ethylenically unsaturated monomer (c-1-2) having at least one carboxylic acid or carboxylic anhydride. ) And other copolymerizable ethylenically unsaturated monomers (c-1-3) are copolymerized into a copolymer, and then with an epoxy-based ethylenically unsaturated monomer (c-1-4) The result is:

In the formula (I-1), A ₁ and A ₂ each independently represent a hydrogen atom, a hydrocarbon group having 1 to 25 carbon atoms with or without a substituent. The photosensitive resin composition for a color filter according to item 1 of the scope of the patent application, wherein the alkali-soluble resin (C) includes a second alkali-soluble resin (C-2), and the second alkali-soluble resin (C- 2) It is prepared by polymerizing a second mixture, and the second mixture includes an epoxy compound (c-2-1) having at least two epoxy groups and at least one carboxylic acid group and at least one ethylene. Compound of unsaturated unsaturated group (c-2-2). The photosensitive resin composition for a color filter according to item 6 of the patent application scope, wherein the epoxy compound (c-2-1) having at least two epoxy groups has the following formula (III) or formula ( IV) Structure shown:

In formula (III), B ₁ , B ₂ , B _3, and B ₄ are the same or different, and B ₁ , B ₂ , B _3, and B ₄ each represent a hydrogen atom, a halogen atom, and a carbon number of 1 to 5 An alkyl group, an alkoxy group having 1 to 5 carbon atoms, an aromatic group having 6 to 12 carbon atoms or an aralkyl group having 6 to 12 carbon atoms;

In formula (IV), B ₅ to B ₁₈ are the same or different, B ₅ to B ₁₈ are a hydrogen atom, a halogen atom, an alkyl group having 1 to 8 carbon atoms, or an aromatic group having 6 to 15 carbon atoms, And a represents an integer from 0 to 10. The photosensitive resin composition for a color filter according to item 1 of the scope of the patent application, wherein the dye (B) includes a xanthene-based dye (B-1) having a structure represented by the following formula (V):

In formula (V), D ₁ to D ₄ each independently represent a hydrogen atom, -D ₆ , an aromatic hydrocarbon group having 6 to 10 carbon atoms, or a halogen atom, -D ₆ , -OH, -OD ₆ , ^{_{-SO 3 -, -SO 3 H,}} -SO 3 M, -COOH, -COOD 6, -SO 3 D 6, -SO 2 NHD 8 or -SO ₂ ND ₈ D ₉ substituents to carbon atoms of 6 to 10 aromatic hydrocarbon group; D ₅ represents ^{_{-SO 3 -, -SO 3 H,}} -SO 3 M, -COOH, -COOD 6, -SO 3 D 6, -SO 2 NHD 8 or -SO ₂ ND ₈ D _9; u represents An integer from 0 to 5; when u represents 2 to 5, a plurality of D ₅ are the same or different; Z represents a halogen atom; t represents 0 or 1; D ₆ represents an alkyl group having 1 to 10 carbon atoms or a halogen atom A substituted alkyl group having 1 to 10 carbons, wherein -CH ₂ -in the alkyl group having 1 to 10 carbons or the alkyl group substituted with a halogen atom and having 1 to 10 carbons is unsubstituted or Substituted by -O-, carbonyl or -ND _7- ; D ₇ represents an alkyl group having 1 to 10 carbon atoms or an alkyl group substituted with a halogen atom and having 1 to 10 carbon atoms; D ₈ and D ₉ each independently represent carbon A linear alkyl group having 1 to 10 carbon atoms, a branched alkyl group having 1 to 10 carbon atoms, a cycloalkyl group having 3 to 30 carbon atoms, or -Q; wherein a linear alkyl group having 1 to 10 carbon atoms Base, carbon The hydrogen atom in a branched alkyl group having a number of 1 to 10 or a cycloalkyl group having a carbon number of 3 to 30 is unsubstituted or substituted with a substituent, and the substituent is selected from a hydroxyl group, a halogen atom, -Q Group consisting of -CH = CH ₂ and -CH = CH-D ₆ ; linear alkyl group having 1 to 10 carbon atoms, branched alkyl group having 1 to 10 carbon atoms or 3 to 30 carbon atoms -CH ₂ -in a cycloalkyl group is unsubstituted or substituted with -O-, carbonyl, or -ND _7- ; or D ₈ and D ₉ combine to form a heterocyclic group having 1 to 10 carbon atoms, in which the carbon number The hydrogen atom in a heterocyclic group of 1 to 10 is unsubstituted or substituted with D ₆ , -OH, or -Q; Q represents an aromatic hydrocarbon group having 6 to 10 carbons and a hetero group having 5 to 10 carbons Aromatic group, aromatic hydrocarbon group having 6 to 10 carbon atoms substituted with halogen atom, -D ₆ , -OH, -OD ₆ , -NO ₂ , -CH = CH ₂ or -CH = CH-D ₆ , or halogen An atom, -D ₆ , -OH, -OD ₆ , -NO ₂ , -CH = CH ₂ and -CH = CH-D ₆ substituted heteroaromatic group having 5 to 10 carbon atoms; and M represents potassium or sodium. The photosensitive resin composition for a color filter according to item 1 of the scope of patent application, wherein the total amount of the alkali-soluble resin (C) used is 100 parts by weight, and the amount of the pigment (A) used is 30 weights Parts to 300 parts by weight, the use amount of the dye (B) is 5 parts by weight to 50 parts by weight; the use amount of the compound having an ethylenically unsaturated group (D) is 20 parts by weight to 200 parts by weight. The amount of the starting agent (E) is 5 parts by weight To 100 parts by weight, and the organic solvent (F) is used in an amount of 500 to 5000 parts by weight. The photosensitive resin composition for a color filter according to item 8 of the scope of the patent application, wherein the total amount of the alkali-soluble resin (C) used is 100 parts by weight, and the amount of the xanthene-based dye (B-1) The amount used is 3 to 50 parts by weight. The photosensitive resin composition for a color filter according to item 1 of the scope of patent application, wherein the first alkali-soluble resin (C-1) is 100 parts by weight based on the total amount of the alkali-soluble resin (C) used. The amount used is 10 to 100 parts by weight. The photosensitive resin composition for a color filter according to item 5 of the scope of patent application, based on the ethylenically unsaturated monomer (c-1-1) having a structure represented by the formula (I-1) The total amount of the ethylenically unsaturated monomer (c-1-2) having at least one carboxylic acid or carboxylic anhydride and the other copolymerizable ethylenically unsaturated monomer (c-1-3) is 100 The use amount of the ethylenically unsaturated monomer (c-1-1) having a structure represented by the formula (I-1) is 5 parts by weight to 50 parts by weight. The photosensitive resin composition for a color filter according to item 6 of the scope of patent application, wherein the total amount of the alkali-soluble resin (C) is based on The used amount is 100 parts by weight, and the used amount of the second alkali-soluble resin (C-2) is 0 to 90 parts by weight. The photosensitive resin composition for a color filter according to item 1 of the scope of the patent application, wherein the total amount of the alkali-soluble resin (C) used is 100 parts by weight, and the structure has the structure shown in formula (II) The light initiator (E-1) is used in an amount of 5 to 65 parts by weight. A method for manufacturing a color filter includes the step of forming a pixel layer by using the photosensitive resin composition for a color filter according to any one of claims 1 to 14. A color filter is manufactured by using the method for manufacturing a color filter as described in item 15 of the scope of patent application. A liquid crystal display device includes the color filter described in item 16 of the scope of patent application.