CN112180637B - Color filter and preparation method thereof - Google Patents
Color filter and preparation method thereof Download PDFInfo
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- CN112180637B CN112180637B CN202011140975.6A CN202011140975A CN112180637B CN 112180637 B CN112180637 B CN 112180637B CN 202011140975 A CN202011140975 A CN 202011140975A CN 112180637 B CN112180637 B CN 112180637B
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
- G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Optics & Photonics (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optical Filters (AREA)
- Materials For Photolithography (AREA)
Abstract
The invention belongs to the technical field of image display, and particularly relates to a color filter and a preparation method thereof. Wherein the photosensitive resin composition comprises a colorant, an alkali-soluble resin, a photoradical polymerizable compound, a photoradical polymerization initiator, and an organic solvent, and the compound is represented by the following formula: r 1 R 2 Si(CH 3 ) Wherein R is 1 、R 2 Represents CH 3 CHCH 2 Br or CH 3 CHBrCH 2 Or a mixture of both.
Description
Technical Field
The invention belongs to the technical field of image display, and particularly relates to a color filter and a preparation method thereof.
Background
Currently, the market of liquid crystal displays is expanding, and color filters are mainly used in color liquid crystal displays, and the color filters generally include a substrate (transparent, usually a glass substrate), a color filter layer formed on the substrate and including three primary color patterns of red, green and blue, a black matrix, a protective layer, an ITO conductive film, and the like. The color filter layer is usually prepared by a pigment dispersion method, in which a pigment dispersion type color photoresist is first coated on a glass substrate on which a black matrix is formed, and then the three-color patterns of R, G, and B are formed by repeating the process three times through Vacuum Dry (VD), soft baking, exposure alignment, development, photoresist stripping, and hard baking.
The color filter is mainly composed of a photosensitive resin composition containing a colorant, and the colorant may be a pigment or a dye. In the drying process after coating, in order to shorten the drying time, the problem of surface unevenness is liable to occur at the time of drying under reduced pressure.
Disclosure of Invention
Technical problem to be solved by the invention
The invention aims to provide a color filter and a preparation method thereof, which are used for solving the problem of non-uniformity generated during reduced pressure drying and further obtaining a film layer with low film shrinkage rate before and after post-baking.
The technical scheme adopted by the invention
In order to solve the above problems, the present invention provides a color filter and a method for manufacturing the same.
According to an embodiment of the present invention, there is provided a color filter including a substrate including a black matrix and a color filter layer thereon, the color filter layer being formed in the black matrix.
According to a second aspect of the present invention, there is provided a method for manufacturing a color filter, wherein the color filter layer is formed from a photosensitive resin composition through the steps of coating, exposing, and developing.
One embodiment is a photosensitive resin composition comprising a colorant, an alkali-soluble resin, a photoradical polymerizable compound, a photoradical polymerization initiator, an organic solvent, and a compound represented by the following formula a: r 1 R 2 Si(CH 3 ) Wherein R is 1 、R 2 Represents CH 3 CHCH 2 Br or CH 3 CHBrCH 2 Or a mixture of both.
In one embodiment, the organic solvent comprises at least one of cyclopentanone, cyclohexanone, ethyl lactate, ethyl ethoxypropionate, 3-methoxybutyl acetate, ethyl 3-ethoxy-3-iminopropionate, propylene glycol monomethyl ether acetate, propylene glycol diacetate, propylene glycol monomethyl ether, methyl 3-ethoxypropionate, ethyl cellosolve acetate, ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, methyl 3-methoxypropionate, ethyl carbitol acetate, and butyl carbitol acetate.
One embodiment is a photosensitive resin composition comprising 5 to 10 parts by weight of a colorant, 4 to 15 parts by weight of an alkali-soluble resin, 5 to 15 parts by weight of a photoradical polymerizable compound, 3 to 10 parts by weight of a photoradical polymerization initiator, 1 to 5 parts by weight of a compound represented by formula A, and 60 to 82 parts by weight of an organic solvent.
In one embodiment, the alkali-soluble resin has an acid value of 20 to 200(mgKOH/g)
One embodiment is, wherein the weight average molecular weight of the alkali-soluble resin is 3000-50000.
According to a third aspect of the present invention, there is provided a photosensitive resin composition for manufacturing a color filter, comprising a colorant, an alkali-soluble resin, a photo radical polymerizable compound, a photo radical polymerization initiator, an organic solvent, a compound represented by the following formula: r 1 R 2 Si(CH 3 ) Wherein R is 1 、R 2 Represents CH 3 CHCH 2 Br or CH 3 CHBrCH 2 Or a mixture of both.
The invention has the advantages of
The color filter prepared by the method can effectively solve the problem of non-uniformity generated during reduced pressure drying, improve the working efficiency, and can further obtain a film layer with low film shrinkage rate by adding a specific photo-free radical polymerizable compound.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the embodiments of the present invention, but the description of the embodiments should not be construed as limiting the scope of the present invention.
First, colorant
The colorant used in the present invention is not particularly limited, and includes organic pigments, inorganic pigments, and dispersible dyes. Examples of the organic pigment include azo pigments, phthalocyanine pigments, quinacridone pigments, triarylmethane pigments, polycyclic pigments, and the like, and specifically include pigments having a color index (c.i.) number (e.g., c.i. pigment yellow 138, c.i. pigment yellow 139, c.i. pigment yellow 150, c.i. pigment red 177, c.i. pigment red 209, c.i. pigment red 254, c.i. pigment violet 23, c.i. pigment blue 15:6, and c.i. pigment green 36). The inorganic pigment includes various metal oxides, chromates, carbonates, sulfates, sulfides, etc., and the inorganic coloring pigment can be classified into 12 types such as red, orange, yellow, green, blue, purple, brown, black, white, etc. The dispersible dyes include azo type, anthraquinone type, heterocyclic type, and the like.
The colorant has an average primary particle diameter of 10 to 150nm, preferably 10 to 80 nm. The particle size is determined by scanning electron microscopy. With the use of the colorant in the above range, the contrast of the color filter can be improved.
The colorant of the present invention may be directly mixed with an alkali-soluble resin or the like by grinding, and in this case, a pigment dispersant may be added, or usually prepared in the form of a colorant dispersion and mixed with other components. The pigment dispersant is, for example, a polymer dispersant, specifically, a (meth) acrylic copolymer, or the like. Commercially available products such as: DISPER BYK-2000, DISPER BYK-2001, DISPER BYK-2070, DISPER BYK-2150, Disperbyk-107, Polyflow No.50E, etc.
The colorant is contained in an amount of preferably 20 to 80 parts by weight, more preferably 40 to 75 parts by weight, based on 100 parts by weight of the total solid content in the colorant dispersion. The dispersant is preferably contained in an amount of 5 to 50 parts by weight based on 100 parts by mass of the colorant component.
II, alkali soluble resin
The alkali-soluble resin may be used in combination with one or more of an acrylic copolymer having a carboxyl group, a styrene-acrylic copolymer having a carboxyl group, an epoxy (meth) acrylate resin having a carboxyl group, and the like. In order to further improve the film strength of the photosensitive composition after curing, an alkali-soluble resin (commercially available, for example, Photomer 6173) having a carboxyl group in a side chain and a photopolymerizable functional group such as an ethylenically unsaturated group in a side chain is preferable.
The molecular weight of the alkali-soluble resin is preferably 3000-50000 (weight average molecular weight), and the requirements of cohesiveness and developability can be met at the same time. The acid value of the alkali-soluble resin is in the range of 50 to 120mgKOH/g, and the requirements of developing speed, sealing property and storage stability can be simultaneously satisfied.
The content of the alkali-soluble resin is 10 to 80 parts by weight, preferably 10 to 40 parts by weight, based on 100 parts by weight of the solid content in the photosensitive resin composition. Or the content of the alkali-soluble resin is 10 to 500 parts by weight, preferably 20 to 100 parts by weight, relative to 100 parts by weight of the colorant. Within this range, the developability, the storage stability and the appropriate color density can be balanced.
Photo radical polymerizable compound
From the viewpoint of sensitivity, the photo radical polymerizable compound may be appropriately selected from compounds having at least 1, preferably 2 or more terminal ethylenically unsaturated bonds. Preferably, a polyfunctional monomer having two or more functions may be used. For example, 2-hydroxy-3-phenoxypropyl acrylate, ethylene glycol di (meth) acrylate, ethoxylated trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, dipentaerythritol hexa (meth) acrylate (KAYARAD DPHA), and the like.
The content of the photo radical polymerizable compound is 5 to 50 parts by weight based on 100 parts by weight of the solid content in the photosensitive resin composition. The content of the photo radical polymerizable compound is 20 to 200 parts by weight, preferably 30 to 100 parts by weight, based on 100 parts by weight of the colorant content. The developability and film-forming hardness can be balanced.
When the following photopolymerizable monomer 1 was added, the film hardness after post-baking was increased, and the shrinkage of the film was reduced to within 20%. The content thereof may be 10 to 50% by weight of the content of the polymerized monomer.
Tetra, photo radical polymerization initiator
The photo-radical polymerization initiator is selected from benzoins, acetophenones, benzophenones, thioxanthones, triazines, anthraquinones, oxime compounds, etc. The oxime ester photoinitiator is preferably contained, and specifically Irgacure OXE-01, TR-PBG-304 and the like are preferably used. To improve sensitivity, the oxime ester photoinitiator is preferably used together with a photoinitiator having a tertiary amine structure, for example, 2-benzyl-2- (dimethylamino) -1- (4-morpholinophenyl) -1-butanone. The content of the photo radical polymerization initiator is 1 to 25 parts by mass with respect to 100 parts by mass of the photopolymerizable compound.
Five, other additives
The additives in the photosensitive resin composition may include a surfactant, an adhesion promoter, an antioxidant, and the like. The surfactant is preferably a fluorine-based surfactant, such as Surflon KH-40 and PF7002, which are commercially available, and the amount of the surfactant added is preferably 0.001 to 2.0% by mass to 25% by mass.
Sixthly, solvent
The solvent of the present invention may be alcohols, ketones, esters, lactones, aromatic hydrocarbons, ethylene glycol monoalkyl ethers, diethylene glycol dialkyl ethers. Preferably, the solvent includes 1 or more selected from cyclopentanone, cyclohexanone, ethyl lactate, ethyl ethoxypropionate, 3-methoxybutyl acetate, ethyl 3-ethoxy-3-iminopropionate, propylene glycol monomethyl ether acetate, propylene glycol diacetate, propylene glycol monomethyl ether, methyl 3-ethoxypropionate, ethyl cellosolve acetate, ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, methyl 3-methoxypropionate, ethyl carbitol acetate, and butyl carbitol acetate. It is preferable to mix 2 or more of these organic solvents. The use of the solvent can improve the solubility and the dispersion uniformity.
Examples
Synthesis of alkali-soluble resin 1
In a nitrogen atmosphere, to a reaction vessel adding propylene glycol diacetate 450g, subsequently dropwise adding benzyl maleimide 75g, styrene 104g, acrylic acid 43g, peroxide-2-ethyl hexanoic acid tert-butyl ester 4g, simultaneously with n-dodecanethiol 6g, PGMEA 24g, control the reaction temperature 80-110 degrees C, reaction temperature three hours, after blowing air simultaneously dropwise adding p-methoxy phenol 0.4g, methacrylic acid glycidyl ester 28g, triethylamine 0.6g, continue the reaction for 5 hours, get alkali soluble resin 1. The acid value of the resin was 80 (determined based on GB/T2895-2008), the weight average molecular weight was 15000, and the molecular weight distribution was 1.9.
Preparation of pigment Dispersion 1
10 parts by weight of c.i. pigment blue 15: 6. 2 parts of DISPER BYK-2150 dispersant and 88 parts of propylene glycol diacetate were mixed and dispersed by a bead mill to obtain pigment dispersion 1.
Preparation of photopolymerizable monomer 1
At low temperature (0 ℃), hydroxyethyl acrylate, dichloromethane, triethylamine and the compound 1 are added into a reaction vessel, and after uniform mixing, the temperature is gradually raised to room temperature for reaction for 8 hours. Separating by column chromatography to obtain the photo-radical polymerization monomer 1.
Nuclear magnetic resonance data for photo radical polymerization monomer 1 are as follows: 1 HNMR（300MHZ，DMSO）：2.88（S,16H） 4.48（m,4H） 4.56（m,4H）5.83（m,2H） 6.12（m,2H） 6.41（m,2H）
4. preparation of compounds shown as formula A and formula B
Under the protection of nitrogen at low temperature (0 ℃), 1mol of dimethyl dibromosilane is added into a reaction vessel, 2mol of propylene oxide is dropped into the reaction vessel for reaction at 0 ℃ for 2 hours, and then the reaction vessel is heated to 50 ℃ for reaction for 2 hours. Separating by column chromatography to obtain the compound shown in formula A. 1 HNMR (300 MHZ, DMSO): 0.14 (s, 6H), 1.27 (d, 3H), 1.71 (d, 3H), 3.48 (m, 1H), 3.90 (m, 1H), 4.11 (m, 1H), 4.23 (m, 1H), wherein R 1 、R 2 Respectively represent CH 3 CHCH 2 Br or CH 3 CHBrCH 2 。
Under the same realization conditions, replacing dimethyl dibromo silane with dimethyl dichloro silane to obtain the compound shown in the formula B. R 1 R 2 Si(CH 3 ) Wherein R is 1 、R 2 Represents CH 3 CHCH 2 Cl or CH 3 CHClCH 2 。
Photosensitive composition examples (see Table 1)
TABLE 1
6. Evaluation of inhomogeneities
Spin-coating the photosensitive resin composition on a glass substrate of 100mm × 100mm, vacuum-drying at 80Pa for 20s, and pre-baking at 80 deg.C for 3 minutes to form a colored layer with a film thickness of 0.9 μm; the substrate was observed using an FNA-35 inspection lamp, and the presence or absence of unevenness on the coating film surface was determined by streaking. See table 2.
7. Evaluation of film thickness variation
The film thickness of the coating layer at different positions after vacuum drying was measured by an optical measuring instrument, and the maximum difference value between the film thicknesses was as follows (normally, only the film thickness at the center portion and the film thickness at the edge portion were measured). See table 2.
8. Evaluation of film shrinkage
Irradiating with ultra-high pressure mercury lamp at exposure of 70mJ/cm 2. Post-exposure development (e.g., 0.05 wt% aqueous potassium hydroxide, spray development at 25 ℃ for 60S); post-baking at 240 deg.C for 30min at 200 deg.C after development. The shrinkage was calculated as compared with the film thickness after development.
Table 2: evaluation of unevenness and evaluation of film thickness variation
From the above data, it can be seen that the addition of the compound of formula a according to the present invention can significantly improve or even eliminate the inhomogeneities caused by drying under reduced pressure. Without the addition of the compound of formula A or without the addition of the compound of formula A and with the addition of the compound of formula B, this effect is not achieved. After the photo-polymerization monomer 1 is further added, the four-membered ring structures on two sides of the benzene ring on the photo-polymerization monomer 1 can be utilized to realize crosslinking during heating, so that the hardness of the membrane is improved, and the shrinkage rate of the membrane is reduced.
The present invention is not limited to the above embodiments, and any changes or substitutions that can be easily made by those skilled in the art within the technical scope of the present invention are also within the scope of the present invention. Therefore, the protection scope of the present invention should be subject to the protection scope of the claims.
Claims (6)
1. A preparation method of a color filter comprises a substrate, wherein the substrate comprises a black matrix and a color filter layer, and the color filter layer is formed in the black matrix;
the color filter layer is formed by coating, exposing and developing a photosensitive resin composition;
the photosensitive resin composition comprises a colorant, an alkali-soluble resin, a photoradical polymerizable compound, a photoradical polymerization initiator, an organic solvent, and a compound represented by the following formula A: r 1 R 2 Si(CH 3 ) Wherein R is 1 、R 2 Represents CH 3 CHCH 2 Br or CH 3 CHBrCH 2 Or a mixture of both.
2. The method of claim 1, wherein the organic solvent comprises at least one of cyclopentanone, cyclohexanone, ethyl lactate, ethyl ethoxypropionate, 3-methoxybutyl acetate, ethyl 3-ethoxy-3-iminopropionate, propylene glycol monomethyl ether acetate, propylene glycol diacetate, propylene glycol monomethyl ether, methyl 3-ethoxypropionate, ethyl cellosolve acetate, ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, methyl 3-methoxypropionate, ethyl carbitol acetate, and butyl carbitol acetate.
3. The method of manufacturing a color filter according to claim 1, wherein the photosensitive resin composition comprises 5 to 10 parts by weight of a colorant, 4 to 15 parts by weight of an alkali-soluble resin, 5 to 15 parts by weight of a photo radical polymerizable compound, 3 to 10 parts by weight of a photo radical polymerization initiator, 1 to 5 parts by weight of the compound represented by formula A, and 60 to 82 parts by weight of an organic solvent.
4. The method of manufacturing a color filter according to claim 1, wherein the alkali-soluble resin has an acid value of 20 to 200 (mgKOH/g).
5. The method of claim 1, wherein the alkali-soluble resin has a weight average molecular weight of 3000-50000.
6. A photosensitive resin composition for preparing color filter contains coloring agent and alkali-solubleA resin, a photo radical polymerizable compound, a photo radical polymerization initiator, an organic solvent, and a compound represented by the following formula: r 1 R 2 Si(CH 3 ) Wherein R is 1 、R 2 Represents CH 3 CHCH 2 Br or CH 3 CHBrCH 2 Or a mixture of both.
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102213917A (en) * | 2010-04-08 | 2011-10-12 | 东友精细化工有限公司 | Black-colored photosensitive resin composition, black matrix prepared by using thereof and color filter comprising the black matrix |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4202680B2 (en) * | 2001-06-15 | 2008-12-24 | 日油株式会社 | Ink-jet ink composition for color filter, method for producing ink composition, and method for producing color filter |
| CN101644892A (en) * | 2008-08-07 | 2010-02-10 | 京东方科技集团股份有限公司 | Colored photosensitive resin composition and method for preparing colored filter |
| CN101655664A (en) * | 2008-08-20 | 2010-02-24 | 京东方科技集团股份有限公司 | Photosensitive resin composition and method for preparing color filter |
| CN101750886A (en) * | 2008-12-16 | 2010-06-23 | 京东方科技集团股份有限公司 | Photosensitive resin composite and preparation method of color optical filter |
| CN101750887B (en) * | 2008-12-19 | 2012-07-18 | 京东方科技集团股份有限公司 | Photosensitive resin composition |
| CN104272188B (en) * | 2012-04-27 | 2018-10-09 | 富士胶片株式会社 | Photosensitive resin composition for layer insulation film, cured film and forming method thereof, organic EL display device and liquid crystal display device |
| TWI484296B (en) * | 2013-12-03 | 2015-05-11 | Chi Mei Corp | Photosensitive resin composition, color filter and method for manufacturing the same, liquid crystal display apparatus |
| KR101863249B1 (en) * | 2015-08-27 | 2018-05-31 | 삼성에스디아이 주식회사 | Photosensitive resin composition and color filter using the same |
| TWI610132B (en) * | 2015-09-30 | 2018-01-01 | 奇美實業股份有限公司 | Photosensitive resin composition for black matrix and uses thereof |
| JP2017146554A (en) * | 2016-02-19 | 2017-08-24 | アーゼッド・エレクトロニック・マテリアルズ（ルクセンブルグ）ソシエテ・ア・レスポンサビリテ・リミテ | Negative-type photosensitive composition which can be cured at low temperature |
| CN110845868B (en) * | 2018-08-21 | 2022-11-18 | 北京鼎材科技有限公司 | High-transmission macromolecular green dye, color photosensitive resin composition and color filter |
-
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Patent Citations (1)
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| CN102213917A (en) * | 2010-04-08 | 2011-10-12 | 东友精细化工有限公司 | Black-colored photosensitive resin composition, black matrix prepared by using thereof and color filter comprising the black matrix |
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