WO2008108423A1 - 位置計測モジュール、位置計測装置、ステージ装置、露光装置及びデバイス製造方法 - Google Patents

位置計測モジュール、位置計測装置、ステージ装置、露光装置及びデバイス製造方法 Download PDF

Info

Publication number
WO2008108423A1
WO2008108423A1 PCT/JP2008/054021 JP2008054021W WO2008108423A1 WO 2008108423 A1 WO2008108423 A1 WO 2008108423A1 JP 2008054021 W JP2008054021 W JP 2008054021W WO 2008108423 A1 WO2008108423 A1 WO 2008108423A1
Authority
WO
WIPO (PCT)
Prior art keywords
position measuring
axis direction
reference light
mirror
detecting
Prior art date
Application number
PCT/JP2008/054021
Other languages
English (en)
French (fr)
Inventor
Junichi Moroe
Original Assignee
Nikon Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corporation filed Critical Nikon Corporation
Priority to EP08721441A priority Critical patent/EP2120097A1/en
Priority to JP2009502617A priority patent/JP5327043B2/ja
Publication of WO2008108423A1 publication Critical patent/WO2008108423A1/ja
Priority to US12/555,794 priority patent/US20100068655A1/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/03—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness by measuring coordinates of points
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02002—Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies
    • G01B9/02003—Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies using beat frequencies
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02027—Two or more interferometric channels or interferometers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02027—Two or more interferometric channels or interferometers
    • G01B9/02028—Two or more reference or object arms in one interferometer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/45—Multiple detectors for detecting interferometer signals
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/70—Using polarization in the interferometer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

　本発明に係る位置計測モジュールは、移動体に設けられ、第１軸方向に沿って反射面を有する移動鏡と、前記第１軸方向に配列された複数の計測軸ごとに配置され、前記移動鏡に対して前記第１軸方向と交差する第２軸方向に検出光を照射する検出光ユニットと、前記移動体と異なる部材に固定された固定鏡を含み、該固定鏡に対して基準光を照射する基準光ユニットと、前記計測軸ごとに前記移動鏡で反射された前記検出光の各検出光路の光路結合、または前記基準光ユニットを介した前記基準光の基準光路と前記検出光路との光路結合を行う複数の光路結合素子と、前記光路結合素子を介して入射される前記検出光と前記基準光との干渉による干渉縞を検出し、該干渉縞の検出結果をもとに、前記移動体の前記第２軸方向の位置を計測する検出部と、を備えて構成される。
PCT/JP2008/054021 2007-03-08 2008-03-06 位置計測モジュール、位置計測装置、ステージ装置、露光装置及びデバイス製造方法 WO2008108423A1 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
EP08721441A EP2120097A1 (en) 2007-03-08 2008-03-06 Position measuring module, position measuring apparatus, stage apparatus, exposure apparatus and device manufacturing method
JP2009502617A JP5327043B2 (ja) 2007-03-08 2008-03-06 位置計測モジュール、位置計測装置、ステージ装置、露光装置及びデバイス製造方法
US12/555,794 US20100068655A1 (en) 2007-03-08 2009-09-08 Position measuring module, position measuring apparatus, stage apparatus, exposure apparatus and device manufacturing method

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-057939 2007-03-08
JP2007057939 2007-03-08

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US12/555,794 Continuation US20100068655A1 (en) 2007-03-08 2009-09-08 Position measuring module, position measuring apparatus, stage apparatus, exposure apparatus and device manufacturing method

Publications (1)

Publication Number Publication Date
WO2008108423A1 true WO2008108423A1 (ja) 2008-09-12

Family

ID=39738295

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/054021 WO2008108423A1 (ja) 2007-03-08 2008-03-06 位置計測モジュール、位置計測装置、ステージ装置、露光装置及びデバイス製造方法

Country Status (7)

Country Link
US (1) US20100068655A1 (ja)
EP (1) EP2120097A1 (ja)
JP (1) JP5327043B2 (ja)
KR (1) KR20090128397A (ja)
CN (1) CN101627341A (ja)
TW (1) TW200846626A (ja)
WO (1) WO2008108423A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018200250A (ja) * 2017-05-29 2018-12-20 パナソニックＩｐマネジメント株式会社 干渉計測装置および干渉計測方法

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2006773A (en) * 2010-06-23 2011-12-27 Asml Netherlands Bv Lithographic apparatus.
US8179534B2 (en) * 2010-08-11 2012-05-15 Mitutoyo Corporation Fixed wavelength absolute distance interferometer
DE102012201393A1 (de) * 2012-02-01 2013-08-01 Dr. Johannes Heidenhain Gmbh Positionsmesseinrichtung und Anordnung mit mehreren Positionsmesseinrichtungen
KR20150087949A (ko) * 2014-01-23 2015-07-31 삼성디스플레이 주식회사 마스크리스 노광 장치
WO2017057587A1 (ja) * 2015-09-30 2017-04-06 株式会社ニコン 露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法
JP6553817B2 (ja) 2016-01-19 2019-07-31 エーエスエムエル ネザーランズ ビー．ブイ． 位置センシング機構、そのような機構を含むリソグラフィ装置、位置センシング方法、及びデバイス製造方法
KR102223791B1 (ko) * 2016-02-29 2021-03-05 가부시키가이샤 니콘 노광 장치, 플랫 패널 디스플레이의 제조 방법, 디바이스 제조 방법, 차광 장치, 및 노광 방법
JP6279013B2 (ja) * 2016-05-26 2018-02-14 Ckd株式会社 三次元計測装置
CN107179653B (zh) * 2017-07-20 2018-10-19 武汉华星光电技术有限公司 一种曝光机及其发光装置
CN116727845A (zh) * 2017-10-25 2023-09-12 株式会社尼康 加工装置及移动体的制造方法
CN111781800B (zh) * 2020-06-22 2022-06-03 江苏影速集成电路装备股份有限公司 激光直写设备中多路光路校准系统及方法
CN112129739B (zh) * 2020-09-27 2024-03-19 山东省科学院激光研究所 一种基于光纤表面增强拉曼探针的传感装置及工作方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07253304A (ja) 1994-03-15 1995-10-03 Nikon Corp 多軸位置決めユニットおよびこれにおける測長方法
JPH0875409A (ja) * 1994-08-31 1996-03-22 Advantest Corp レーザー測長装置
JPH11183130A (ja) * 1997-12-18 1999-07-09 Nikon Corp レーザ干渉測長方法および装置、およびそれを用いたステージ装置、およびそれを用いた露光装置
JP2001059704A (ja) * 1999-08-24 2001-03-06 Canon Inc 位置決めステージ装置、半導体露光装置およびデバイス製造方法
JP2006349488A (ja) * 2005-06-15 2006-12-28 Nikon Corp 干渉計システム、ステージ装置、露光装置、及びデバイス製造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3019050B2 (ja) * 1992-12-24 2000-03-13 株式会社ニコン 干渉計装置
JP3412212B2 (ja) * 1993-10-01 2003-06-03 株式会社ニコン 干渉計装置
US5585922A (en) * 1992-12-24 1996-12-17 Nikon Corporation Dual interferometer apparatus compensating for environmental turbulence or fluctuation and for quantization error
US6897963B1 (en) * 1997-12-18 2005-05-24 Nikon Corporation Stage device and exposure apparatus
AU6122099A (en) * 1998-10-14 2000-05-01 Nikon Corporation Shape measuring method and shape measuring device, position control method, stage device, exposure apparatus and method for producing exposure apparatus, and device and method for manufacturing device
DE69943311D1 (de) * 1998-12-24 2011-05-12 Canon Kk Trägerplattesteuerungsvorrichtung, Belichtungsapparat und Verfahren zur Herstellung einer Halbleitervorrichtung

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07253304A (ja) 1994-03-15 1995-10-03 Nikon Corp 多軸位置決めユニットおよびこれにおける測長方法
JPH0875409A (ja) * 1994-08-31 1996-03-22 Advantest Corp レーザー測長装置
JPH11183130A (ja) * 1997-12-18 1999-07-09 Nikon Corp レーザ干渉測長方法および装置、およびそれを用いたステージ装置、およびそれを用いた露光装置
JP2001059704A (ja) * 1999-08-24 2001-03-06 Canon Inc 位置決めステージ装置、半導体露光装置およびデバイス製造方法
JP2006349488A (ja) * 2005-06-15 2006-12-28 Nikon Corp 干渉計システム、ステージ装置、露光装置、及びデバイス製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018200250A (ja) * 2017-05-29 2018-12-20 パナソニックＩｐマネジメント株式会社 干渉計測装置および干渉計測方法

Also Published As

Publication number Publication date
EP2120097A1 (en) 2009-11-18
JP5327043B2 (ja) 2013-10-30
JPWO2008108423A1 (ja) 2010-06-17
CN101627341A (zh) 2010-01-13
KR20090128397A (ko) 2009-12-15
TW200846626A (en) 2008-12-01
US20100068655A1 (en) 2010-03-18

Similar Documents

Publication Publication Date Title
WO2008108423A1 (ja) 位置計測モジュール、位置計測装置、ステージ装置、露光装置及びデバイス製造方法
SG169987A1 (en) Plane position detecting apparatus, exposure apparatus and device manufacturing method
US8605258B2 (en) Distance measuring device and method for measuring distance
TW200951646A (en) Surface position detection device, exposure device, surface position detection method and device production method
WO2010062860A3 (en) Fiber-based interferometer system for monitoring an imaging interferometer
EP2241940A3 (en) Illuminating device and image reading apparatus
JP2013517465A5 (ja)
WO2006101923A3 (en) High intensity fabry-perot sensor
WO2009041709A3 (en) Localized surface plasmon resonance sensor and method of detecting a target substance using said sensor
CN104583874A (zh) 衬底支承装置及曝光装置
TW200712597A (en) Optical module of a light source module and a sensor module positioned on a frame
WO2009060962A1 (ja) 結像光学系および距離測定装置
TW201129775A (en) Fiber-based interferometer system for monitoring an imaging interferometer
WO2009028332A1 (ja) 波面収差計測装置および方法、並びに波面収差調整方法
ATE301276T1 (de) Optischer distanzsensor
WO2010010311A3 (fr) Dispositif optique et procede de mesure de rotation d'un objet
WO2009040241A3 (en) Method and apparatus for measurement and control of photomask to substrate alignment
WO2008152979A1 (ja) 光走査型センサ
JP2005241353A (ja) 光学式変位センサおよび外力検出装置
WO2008149706A1 (ja) 表示装置、タッチパネル、及び、検知方法
WO2008136404A1 (ja) 光学部材、干渉計システム、ステージ装置、露光装置、及びデバイス製造方法
WO2010015458A3 (de) Optischer sensor und verfahren zum vermessen von profilen
US9229171B2 (en) Optical communication device
JP5700293B2 (ja) 高速光学測定装置
ATE511077T1 (de) Optoelektronischer sensor und verfahren zur überwachung

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 200880007480.7

Country of ref document: CN

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 08721441

Country of ref document: EP

Kind code of ref document: A1

ENP Entry into the national phase

Ref document number: 2009502617

Country of ref document: JP

Kind code of ref document: A

WWE Wipo information: entry into national phase

Ref document number: 1020097017888

Country of ref document: KR

WWE Wipo information: entry into national phase

Ref document number: 2008721441

Country of ref document: EP

NENP Non-entry into the national phase

Ref country code: DE