WO2008108148A1 - 精密位置決め装置 - Google Patents

精密位置決め装置 Download PDF

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Publication number
WO2008108148A1
WO2008108148A1 PCT/JP2008/052491 JP2008052491W WO2008108148A1 WO 2008108148 A1 WO2008108148 A1 WO 2008108148A1 JP 2008052491 W JP2008052491 W JP 2008052491W WO 2008108148 A1 WO2008108148 A1 WO 2008108148A1
Authority
WO
WIPO (PCT)
Prior art keywords
moving table
base
precision positioning
positioning apparatus
springs
Prior art date
Application number
PCT/JP2008/052491
Other languages
English (en)
French (fr)
Inventor
Youichi Motomura
Yoshiaki Kubota
Original Assignee
Kabushiki Kaisha Yaskawa Denki
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kabushiki Kaisha Yaskawa Denki filed Critical Kabushiki Kaisha Yaskawa Denki
Priority to JP2009502494A priority Critical patent/JP5170077B2/ja
Publication of WO2008108148A1 publication Critical patent/WO2008108148A1/ja

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/682—Mask-wafer alignment

Abstract

　ベースとこのベースに対して少なくとも直交する３方向に移動可能な移動テーブルと移動テーブルを少なくとも直交する３方向に移動させるアクチュエータとを備えた精密位置決め装置において、装置全体が小型で、移動テーブルの制御性が良く、ベースと移動テーブルの間の支持部材が損傷しても装置および基板が損傷しない精密位置決め装置を提供することを目的とする。 　支持部材が、ベースから立設されるバネ固定フレーム（３）と、バネ固定フレーム（３）から下垂されるバネ（４）と、からなり、ベース（１）に少なくとも３箇所備えられた支持部材のバネ（４）の下端に、移動テーブル（２）が吊着されるよう構成する。
PCT/JP2008/052491 2007-03-06 2008-02-15 精密位置決め装置 WO2008108148A1 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009502494A JP5170077B2 (ja) 2007-03-06 2008-02-15 精密位置決め装置

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-055505 2007-03-06
JP2007055505 2007-03-06

Publications (1)

Publication Number Publication Date
WO2008108148A1 true WO2008108148A1 (ja) 2008-09-12

Family

ID=39738045

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/052491 WO2008108148A1 (ja) 2007-03-06 2008-02-15 精密位置決め装置

Country Status (3)

Country Link
JP (1) JP5170077B2 (ja)
TW (1) TW200905785A (ja)
WO (1) WO2008108148A1 (ja)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101060865B1 (ko) 2009-09-21 2011-08-31 주식회사 포스코 하이드로 포밍 장치
JP2013134456A (ja) * 2011-12-27 2013-07-08 Sumitomo Heavy Ind Ltd 位置決め装置
CN103376667A (zh) * 2012-04-20 2013-10-30 上海微电子装备有限公司 一种用于曝光装置的掩模台
JP2014123778A (ja) * 2012-05-23 2014-07-03 Asml Netherlands Bv リソグラフィ装置およびデバイス製造方法

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6991927B2 (ja) * 2018-05-30 2022-01-13 キヤノン株式会社 基板保持装置、露光装置及び物品の製造方法
TWI699608B (zh) * 2019-03-15 2020-07-21 日月光半導體製造股份有限公司 用於組裝光學裝置之設備
CN113917797B (zh) * 2021-09-22 2023-03-24 哈尔滨工业大学 一种基于六自由度控制的运动台及其控制方法

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0413533A (ja) * 1990-05-02 1992-01-17 Toshiba Corp テーブル装置
JPH05149968A (ja) * 1991-11-27 1993-06-15 Mitsubishi Electric Corp 半導体センサ
JPH1012539A (ja) * 1996-06-18 1998-01-16 Canon Inc 移動ステージ装置およびこれを用いた露光装置
JP2002203766A (ja) * 2000-12-27 2002-07-19 Nikon Corp 照明光学装置及びそれを備える露光装置
JP2004342987A (ja) * 2003-05-19 2004-12-02 Canon Inc ステージ装置
JP2005101136A (ja) * 2003-09-24 2005-04-14 Nikon Corp ステージ装置及び露光装置
JP2005207589A (ja) * 2003-12-24 2005-08-04 Sairensu:Kk ダンピングコイルばね及び振動減衰装置
JP2007005669A (ja) * 2005-06-27 2007-01-11 Nikon Corp 支持装置、ステージ装置及び露光装置
JP2007010529A (ja) * 2005-06-30 2007-01-18 Nikon Corp 計測方法、計測装置、干渉計システム及び露光装置
JP2007019225A (ja) * 2005-07-07 2007-01-25 Nikon Corp 位置計測装置の反射部材構造及びステージ装置並びに露光装置

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0413533A (ja) * 1990-05-02 1992-01-17 Toshiba Corp テーブル装置
JPH05149968A (ja) * 1991-11-27 1993-06-15 Mitsubishi Electric Corp 半導体センサ
JPH1012539A (ja) * 1996-06-18 1998-01-16 Canon Inc 移動ステージ装置およびこれを用いた露光装置
JP2002203766A (ja) * 2000-12-27 2002-07-19 Nikon Corp 照明光学装置及びそれを備える露光装置
JP2004342987A (ja) * 2003-05-19 2004-12-02 Canon Inc ステージ装置
JP2005101136A (ja) * 2003-09-24 2005-04-14 Nikon Corp ステージ装置及び露光装置
JP2005207589A (ja) * 2003-12-24 2005-08-04 Sairensu:Kk ダンピングコイルばね及び振動減衰装置
JP2007005669A (ja) * 2005-06-27 2007-01-11 Nikon Corp 支持装置、ステージ装置及び露光装置
JP2007010529A (ja) * 2005-06-30 2007-01-18 Nikon Corp 計測方法、計測装置、干渉計システム及び露光装置
JP2007019225A (ja) * 2005-07-07 2007-01-25 Nikon Corp 位置計測装置の反射部材構造及びステージ装置並びに露光装置

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101060865B1 (ko) 2009-09-21 2011-08-31 주식회사 포스코 하이드로 포밍 장치
JP2013134456A (ja) * 2011-12-27 2013-07-08 Sumitomo Heavy Ind Ltd 位置決め装置
CN103376667A (zh) * 2012-04-20 2013-10-30 上海微电子装备有限公司 一种用于曝光装置的掩模台
JP2014123778A (ja) * 2012-05-23 2014-07-03 Asml Netherlands Bv リソグラフィ装置およびデバイス製造方法
US9811005B2 (en) 2012-05-23 2017-11-07 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

Also Published As

Publication number Publication date
TW200905785A (en) 2009-02-01
JPWO2008108148A1 (ja) 2010-06-10
JP5170077B2 (ja) 2013-03-27

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