WO2008099932A1 - 透明導電膜およびその製造方法 - Google Patents

透明導電膜およびその製造方法 Download PDF

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Publication number
WO2008099932A1
WO2008099932A1 PCT/JP2008/052562 JP2008052562W WO2008099932A1 WO 2008099932 A1 WO2008099932 A1 WO 2008099932A1 JP 2008052562 W JP2008052562 W JP 2008052562W WO 2008099932 A1 WO2008099932 A1 WO 2008099932A1
Authority
WO
WIPO (PCT)
Prior art keywords
transparent electroconductive
oxide layer
transparent
hard carbon
electroconductive oxide
Prior art date
Application number
PCT/JP2008/052562
Other languages
English (en)
French (fr)
Inventor
Takashi Kuchiyama
Kenji Yamamoto
Original Assignee
Kaneka Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kaneka Corporation filed Critical Kaneka Corporation
Priority to US12/449,303 priority Critical patent/US9297061B2/en
Priority to JP2008558156A priority patent/JP5285438B2/ja
Publication of WO2008099932A1 publication Critical patent/WO2008099932A1/ja

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
    • C03C17/3441—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising carbon, a carbide or oxycarbide
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/90—Other aspects of coatings
    • C03C2217/94—Transparent conductive oxide layers [TCO] being part of a multilayer coating
    • C03C2217/944—Layers comprising zinc oxide
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/30—Aspects of methods for coating glass not covered above
    • C03C2218/365—Coating different sides of a glass substrate

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Laminated Bodies (AREA)
  • Non-Insulated Conductors (AREA)
  • Chemical Vapour Deposition (AREA)
  • Manufacturing Of Electric Cables (AREA)

Abstract

　透明基板上に透明導電酸化物層を有する透明導電膜において、透明導電酸化物層を酸化亜鉛とした場合、透明導電酸化物層での表面抵抗値が経時的に増加し、環境変動に対して安定した透明導電膜を得ることが困難であった。そこで、少なくとも１層からなる酸化亜鉛を主成分とする透明導電酸化物層表面に、硬質炭素膜を「透明基板－硬質炭素膜－透明導電酸化物層－硬質炭素膜の順」あるいは「硬質炭素膜－透明基板－透明導電酸化物層－硬質炭素膜の順」で、または、透明導電酸化物層表面に有機珪素化合物被覆層を形成することで、水接触角が７５度以上となり、透明導電酸化物層の抵抗上昇を抑制できる。                                                                                 
PCT/JP2008/052562 2007-02-16 2008-02-15 透明導電膜およびその製造方法 WO2008099932A1 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US12/449,303 US9297061B2 (en) 2007-02-16 2008-02-15 Transparent electroconductive film and process for producing the same
JP2008558156A JP5285438B2 (ja) 2007-02-16 2008-02-15 透明導電膜付き基板およびその製造方法

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2007036821 2007-02-16
JP2007-036821 2007-02-16
JP2007077589 2007-03-23
JP2007-077589 2007-03-23

Publications (1)

Publication Number Publication Date
WO2008099932A1 true WO2008099932A1 (ja) 2008-08-21

Family

ID=39690157

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/052562 WO2008099932A1 (ja) 2007-02-16 2008-02-15 透明導電膜およびその製造方法

Country Status (3)

Country Link
US (1) US9297061B2 (ja)
JP (1) JP5285438B2 (ja)
WO (1) WO2008099932A1 (ja)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009116446A (ja) * 2007-11-02 2009-05-28 Kaneka Corp 透明導電膜を用いたタッチパネル
JP2009114478A (ja) * 2007-11-02 2009-05-28 Kaneka Corp 透明導電膜の製造方法
JP2009117071A (ja) * 2007-11-02 2009-05-28 Kaneka Corp 透明導電膜
JP2009211888A (ja) * 2008-03-03 2009-09-17 Kaneka Corp 透明導電膜
JP2010003502A (ja) * 2008-06-19 2010-01-07 Kaneka Corp 透明導電膜の製造方法
JP2010192186A (ja) * 2009-02-17 2010-09-02 Toray Ind Inc 透明導電積層体
WO2014156889A1 (ja) * 2013-03-25 2014-10-02 積水ナノコートテクノロジー株式会社 積層フィルム及びそのフィルムロール、並びにそれから得られうる光透過性導電性フィルム及びそれを利用したタッチパネル
WO2018164223A1 (ja) * 2017-03-08 2018-09-13 ホヤ レンズ タイランド リミテッド 被膜形成用組成物、被膜を有する物品および被膜を有する物品の製造方法

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101530376B1 (ko) * 2008-10-23 2015-06-26 한국교통대학교산학협력단 벌크상 열전재료 및 이를 구비한 열전소자
US20120327568A1 (en) * 2011-06-24 2012-12-27 Anna-Katrina Shedletsky Thin Film Coatings for Glass Members
US8715779B2 (en) * 2011-06-24 2014-05-06 Apple Inc. Enhanced glass impact durability through application of thin films
US9303309B2 (en) * 2013-01-11 2016-04-05 The Aerospace Corporation Systems and methods for enhancing mobility of atomic or molecular species on a substrate at reduced bulk temperature using acoustic waves, and structures formed using same
US20150286327A1 (en) * 2014-04-07 2015-10-08 Deven Charles Chakrabarti Method and Apparatus for Protecting Touch-Screen Electronic Devices
US10173262B2 (en) 2016-02-04 2019-01-08 The Aerospace Corporation Systems and methods for monitoring temperature using acoustic waves during processing of a material
US10160061B2 (en) 2016-08-15 2018-12-25 The Aerospace Corporation Systems and methods for modifying acoustic waves based on selective heating

Citations (7)

* Cited by examiner, † Cited by third party
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JPH0448515A (ja) * 1990-06-14 1992-02-18 Hitachi Aic Inc 透明導電性フィルムの製造方法
JPH0781979A (ja) * 1993-09-17 1995-03-28 Nippon Sheet Glass Co Ltd 防汚性ガラス物品
JP2000212514A (ja) * 1999-01-13 2000-08-02 Samsung Sdi Co Ltd スプレ―膜形成用組成物、及びそれを用いて形成されたスプレ―膜を具備している透明導電膜
JP2001283643A (ja) * 2000-03-31 2001-10-12 Toyobo Co Ltd 透明導電性フィルム、透明導電性シートおよびタッチパネル
JP2002042557A (ja) * 2000-07-25 2002-02-08 Sumitomo Metal Mining Co Ltd 透明導電性基材とその製造方法およびこの製造方法に用いられる透明コート層形成用塗布液と透明導電性基材が適用された表示装置
WO2005083722A1 (ja) * 2004-02-27 2005-09-09 Sumitomo Metal Mining Co., Ltd. 透明導電膜及びそれを用いた透明導電性基材
JP2005268113A (ja) * 2004-03-19 2005-09-29 Sumitomo Metal Mining Co Ltd 透明導電性薄膜製造用酸化物焼結体ターゲット、透明導電性薄膜、透明導電性基板、表示デバイスおよび有機エレクトロルミネッセンス素子

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JPH0448515Y2 (ja) 1985-09-30 1992-11-16
JPH0411227A (ja) * 1990-04-27 1992-01-16 Ricoh Co Ltd 薄膜二端子素子
JPH048515A (ja) 1990-04-27 1992-01-13 Hitachi Chem Co Ltd 積層板の製造方法
DE69408405T2 (de) * 1993-11-11 1998-08-20 Nissin Electric Co Ltd Plasma-CVD-Verfahren und Vorrichtung
DE19643550A1 (de) * 1996-10-24 1998-05-14 Leybold Systems Gmbh Lichttransparentes, Wärmestrahlung reflektierendes Schichtensystem
DE69817263T2 (de) * 1997-06-19 2004-07-15 Sumitomo Chemical Co., Ltd. Frontscheibe für Plasma-Anzeige
US6605826B2 (en) * 2000-08-18 2003-08-12 Semiconductor Energy Laboratory Co., Ltd. Light-emitting device and display device

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0448515A (ja) * 1990-06-14 1992-02-18 Hitachi Aic Inc 透明導電性フィルムの製造方法
JPH0781979A (ja) * 1993-09-17 1995-03-28 Nippon Sheet Glass Co Ltd 防汚性ガラス物品
JP2000212514A (ja) * 1999-01-13 2000-08-02 Samsung Sdi Co Ltd スプレ―膜形成用組成物、及びそれを用いて形成されたスプレ―膜を具備している透明導電膜
JP2001283643A (ja) * 2000-03-31 2001-10-12 Toyobo Co Ltd 透明導電性フィルム、透明導電性シートおよびタッチパネル
JP2002042557A (ja) * 2000-07-25 2002-02-08 Sumitomo Metal Mining Co Ltd 透明導電性基材とその製造方法およびこの製造方法に用いられる透明コート層形成用塗布液と透明導電性基材が適用された表示装置
WO2005083722A1 (ja) * 2004-02-27 2005-09-09 Sumitomo Metal Mining Co., Ltd. 透明導電膜及びそれを用いた透明導電性基材
JP2005268113A (ja) * 2004-03-19 2005-09-29 Sumitomo Metal Mining Co Ltd 透明導電性薄膜製造用酸化物焼結体ターゲット、透明導電性薄膜、透明導電性基板、表示デバイスおよび有機エレクトロルミネッセンス素子

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009116446A (ja) * 2007-11-02 2009-05-28 Kaneka Corp 透明導電膜を用いたタッチパネル
JP2009114478A (ja) * 2007-11-02 2009-05-28 Kaneka Corp 透明導電膜の製造方法
JP2009117071A (ja) * 2007-11-02 2009-05-28 Kaneka Corp 透明導電膜
JP2009211888A (ja) * 2008-03-03 2009-09-17 Kaneka Corp 透明導電膜
JP2010003502A (ja) * 2008-06-19 2010-01-07 Kaneka Corp 透明導電膜の製造方法
JP2010192186A (ja) * 2009-02-17 2010-09-02 Toray Ind Inc 透明導電積層体
WO2014156889A1 (ja) * 2013-03-25 2014-10-02 積水ナノコートテクノロジー株式会社 積層フィルム及びそのフィルムロール、並びにそれから得られうる光透過性導電性フィルム及びそれを利用したタッチパネル
JP2014209440A (ja) * 2013-03-25 2014-11-06 積水ナノコートテクノロジー株式会社 積層フィルム及びそのフィルムロール、並びにそれから得られうる光透過性導電性フィルム及びそれを利用したタッチパネル
CN104718582A (zh) * 2013-03-25 2015-06-17 积水纳米涂层科技有限公司 叠层膜及其膜卷、以及可由其得到的透光性导电膜及利用其的触摸板
WO2018164223A1 (ja) * 2017-03-08 2018-09-13 ホヤ レンズ タイランド リミテッド 被膜形成用組成物、被膜を有する物品および被膜を有する物品の製造方法

Also Published As

Publication number Publication date
US20100089615A1 (en) 2010-04-15
JPWO2008099932A1 (ja) 2010-05-27
US9297061B2 (en) 2016-03-29
JP5285438B2 (ja) 2013-09-11

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