WO2008096616A1 - 透明ガスバリア性フィルム及びその製造方法 - Google Patents

透明ガスバリア性フィルム及びその製造方法 Download PDF

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Publication number
WO2008096616A1
WO2008096616A1 PCT/JP2008/051061 JP2008051061W WO2008096616A1 WO 2008096616 A1 WO2008096616 A1 WO 2008096616A1 JP 2008051061 W JP2008051061 W JP 2008051061W WO 2008096616 A1 WO2008096616 A1 WO 2008096616A1
Authority
WO
WIPO (PCT)
Prior art keywords
gas barrier
barrier film
transparent gas
producing
atom number
Prior art date
Application number
PCT/JP2008/051061
Other languages
English (en)
French (fr)
Inventor
Kazuhiro Fukuda
Original Assignee
Konica Minolta Holdings, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Holdings, Inc. filed Critical Konica Minolta Holdings, Inc.
Priority to US12/449,189 priority Critical patent/US20100003483A1/en
Priority to EP08703888A priority patent/EP2123445A4/en
Priority to JP2008557060A priority patent/JPWO2008096616A1/ja
Publication of WO2008096616A1 publication Critical patent/WO2008096616A1/ja

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
    • Y10T428/24992—Density or compression of components

Abstract

　本発明は、過酷な環境下で保存されても密着性に優れ、更に激しい衝撃を受けても劣化することなく、かつ良好なガスバリア耐性を備えた透明ガスバリア性フィルムとその製造方法を提供する。この透明ガスバリア性フィルムは、樹脂基材上に、隣接する２層間の炭素原子数濃度差が２．０原子数％以上、１０原子数％以下で、かつそれぞれの層の厚みが１ｎｍ以上、１０ｎｍ以下である条件を満たす少なくとも２層の構成層を有することを特徴とする。
PCT/JP2008/051061 2007-02-05 2008-01-25 透明ガスバリア性フィルム及びその製造方法 WO2008096616A1 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
US12/449,189 US20100003483A1 (en) 2007-02-05 2008-01-25 Transparent gas barrier film
EP08703888A EP2123445A4 (en) 2007-02-05 2008-01-25 TRANSPARENT FILM THAT IS WATERPROOFABLE AND METHOD FOR PRODUCING THE SAME
JP2008557060A JPWO2008096616A1 (ja) 2007-02-05 2008-01-25 透明ガスバリア性フィルム及びその製造方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-025269 2007-02-05
JP2007025269 2007-02-05

Publications (1)

Publication Number Publication Date
WO2008096616A1 true WO2008096616A1 (ja) 2008-08-14

Family

ID=39681527

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/051061 WO2008096616A1 (ja) 2007-02-05 2008-01-25 透明ガスバリア性フィルム及びその製造方法

Country Status (4)

Country Link
US (1) US20100003483A1 (ja)
EP (1) EP2123445A4 (ja)
JP (1) JPWO2008096616A1 (ja)
WO (1) WO2008096616A1 (ja)

Cited By (14)

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Publication number Priority date Publication date Assignee Title
JP2010118664A (ja) * 2008-11-12 2010-05-27 Air Products & Chemicals Inc 応力を加えたＳｉＮ膜用アミノ・ビニルシラン前駆体
JP2012083490A (ja) * 2010-10-08 2012-04-26 Sumitomo Chemical Co Ltd 電気泳動表示素子
JP2012084354A (ja) * 2010-10-08 2012-04-26 Sumitomo Chemical Co Ltd 電池セル
JP2012083491A (ja) * 2010-10-08 2012-04-26 Sumitomo Chemical Co Ltd 液晶表示素子
JP2012096531A (ja) * 2010-10-08 2012-05-24 Sumitomo Chemical Co Ltd 積層フィルム
JP4944993B2 (ja) * 2008-08-19 2012-06-06 リンテック株式会社 成形体、その製造方法、電子デバイス部材および電子デバイス
JP2012135879A (ja) * 2010-12-24 2012-07-19 Kojima Press Industry Co Ltd 樹脂製品及びその製造方法
WO2013099654A1 (ja) * 2011-12-27 2013-07-04 日東電工株式会社 透明ガスバリアフィルム、透明ガスバリアフィルムの製造方法、有機ｅｌ素子、太陽電池および薄膜電池
JP2013132897A (ja) * 2011-12-27 2013-07-08 Nitto Denko Corp 透明ガスバリアフィルム、透明ガスバリアフィルムの製造方法、有機ｅｌ素子、太陽電池および薄膜電池
JP2013180473A (ja) * 2012-03-01 2013-09-12 Nitto Denko Corp 透明ガスバリアフィルム、有機ｅｌ素子、太陽電池および薄膜電池
US8889235B2 (en) 2009-05-13 2014-11-18 Air Products And Chemicals, Inc. Dielectric barrier deposition using nitrogen containing precursor
WO2015163358A1 (ja) * 2014-04-23 2015-10-29 コニカミノルタ株式会社 ガスバリアーフィルム及びその製造方法
WO2018047208A1 (ja) * 2016-09-06 2018-03-15 株式会社麗光 透明ハイバリアフイルム、及びそれを使用したハイバイリア積層体
CN115894070A (zh) * 2022-12-15 2023-04-04 湖南工业大学 一种多孔碳化硅陶瓷的制备方法

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JPWO2008096615A1 (ja) * 2007-02-05 2010-05-20 コニカミノルタホールディングス株式会社 透明ガスバリア性フィルム及びその製造方法
US8846187B2 (en) * 2007-02-06 2014-09-30 Konica Minolta Holdings, Inc. Transparent gas barrier film and method for producing transparent gas barrier film
JP5379530B2 (ja) 2009-03-26 2013-12-25 リンテック株式会社 成形体、その製造方法、電子デバイス用部材および電子デバイス
US9365922B2 (en) 2009-05-22 2016-06-14 Lintec Corporation Formed article, method of producing same, electronic device member, and electronic device
JP5697230B2 (ja) 2010-03-31 2015-04-08 リンテック株式会社 成形体、その製造方法、電子デバイス用部材及び電子デバイス
CN103249767B (zh) 2010-08-20 2015-05-06 琳得科株式会社 成形体、其制备方法、电子装置用部件及电子装置
TWI535561B (zh) 2010-09-21 2016-06-01 Lintec Corp A molded body, a manufacturing method thereof, an electronic device element, and an electronic device
TWI457235B (zh) 2010-09-21 2014-10-21 Lintec Corp A gas barrier film, a manufacturing method thereof, an electronic device element, and an electronic device

Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58217344A (ja) 1983-06-01 1983-12-17 旭化成ポリフレックス株式会社 バリヤ−性プラスチツク積層シ−ト
JPH02251429A (ja) 1989-03-27 1990-10-09 Mitsui Toatsu Chem Inc 透明導電性フィルム
JPH06124785A (ja) 1992-10-08 1994-05-06 Idemitsu Kosan Co Ltd 有機ｅｌ素子
JPH10249990A (ja) 1997-03-14 1998-09-22 Kishimoto Akira ガス遮断性及びフレキシビリティーに優れた積層体
JPH11240102A (ja) * 1998-02-26 1999-09-07 Dainippon Printing Co Ltd 透明バリア性フィルム
US6268695B1 (en) 1998-12-16 2001-07-31 Battelle Memorial Institute Environmental barrier material for organic light emitting device and method of making
WO2002048428A1 (en) 2000-12-12 2002-06-20 Konica Corporation Method for forming thin film, article having thin film, optical film, dielectric coated electrode, and plasma discharge processor
JP2003049272A (ja) 2001-08-07 2003-02-21 Konica Corp 大気圧プラズマ処理装置、大気圧プラズマ処理方法及び大気圧プラズマ処理装置用の電極システム
JP2003276111A (ja) * 2002-03-26 2003-09-30 Dainippon Printing Co Ltd 積層フィルム
JP2004068143A (ja) 2002-06-10 2004-03-04 Konica Minolta Holdings Inc 薄膜形成方法並びに該薄膜形成方法により薄膜が形成された基材
JP2005088431A (ja) * 2003-09-18 2005-04-07 Dainippon Printing Co Ltd バリア性フィルム
WO2006087941A1 (ja) * 2005-02-17 2006-08-24 Konica Minolta Holdings, Inc. ガスバリアフィルム、ガスバリアフィルムの製造方法および該ガスバリアフィルムを用いた有機エレクトロルミネッセンス素子用樹脂基材、有機エレクトロルミネッセンス素子

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3175894B2 (ja) * 1994-03-25 2001-06-11 株式会社半導体エネルギー研究所 プラズマ処理装置及びプラズマ処理方法
US6066399A (en) * 1997-03-19 2000-05-23 Sanyo Electric Co., Ltd. Hard carbon thin film and method of forming the same
US7749563B2 (en) * 2002-10-07 2010-07-06 Applied Materials, Inc. Two-layer film for next generation damascene barrier application with good oxidation resistance
US7288311B2 (en) * 2003-02-10 2007-10-30 Dai Nippon Printing Co., Ltd. Barrier film
WO2006033233A1 (ja) * 2004-09-21 2006-03-30 Konica Minolta Holdings, Inc. 透明ガスバリア性フィルム
EP1829945A4 (en) * 2004-12-21 2011-03-23 Hitachi Chemical Co Ltd FILM, SILICON FILM AND METHOD OF MANUFACTURING THEREOF, COMPOSITION FOR FORMING THE SILICON FILM AND ELECTRONIC COMPONENT
JP2006224408A (ja) * 2005-02-16 2006-08-31 Dainippon Printing Co Ltd バリア性フィルム
JPWO2008096615A1 (ja) * 2007-02-05 2010-05-20 コニカミノルタホールディングス株式会社 透明ガスバリア性フィルム及びその製造方法
US8846187B2 (en) * 2007-02-06 2014-09-30 Konica Minolta Holdings, Inc. Transparent gas barrier film and method for producing transparent gas barrier film

Patent Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58217344A (ja) 1983-06-01 1983-12-17 旭化成ポリフレックス株式会社 バリヤ−性プラスチツク積層シ−ト
JPH02251429A (ja) 1989-03-27 1990-10-09 Mitsui Toatsu Chem Inc 透明導電性フィルム
JPH06124785A (ja) 1992-10-08 1994-05-06 Idemitsu Kosan Co Ltd 有機ｅｌ素子
JPH10249990A (ja) 1997-03-14 1998-09-22 Kishimoto Akira ガス遮断性及びフレキシビリティーに優れた積層体
JPH11240102A (ja) * 1998-02-26 1999-09-07 Dainippon Printing Co Ltd 透明バリア性フィルム
US6268695B1 (en) 1998-12-16 2001-07-31 Battelle Memorial Institute Environmental barrier material for organic light emitting device and method of making
WO2002048428A1 (en) 2000-12-12 2002-06-20 Konica Corporation Method for forming thin film, article having thin film, optical film, dielectric coated electrode, and plasma discharge processor
JP2003049272A (ja) 2001-08-07 2003-02-21 Konica Corp 大気圧プラズマ処理装置、大気圧プラズマ処理方法及び大気圧プラズマ処理装置用の電極システム
JP2003276111A (ja) * 2002-03-26 2003-09-30 Dainippon Printing Co Ltd 積層フィルム
JP2004068143A (ja) 2002-06-10 2004-03-04 Konica Minolta Holdings Inc 薄膜形成方法並びに該薄膜形成方法により薄膜が形成された基材
JP2005088431A (ja) * 2003-09-18 2005-04-07 Dainippon Printing Co Ltd バリア性フィルム
WO2006087941A1 (ja) * 2005-02-17 2006-08-24 Konica Minolta Holdings, Inc. ガスバリアフィルム、ガスバリアフィルムの製造方法および該ガスバリアフィルムを用いた有機エレクトロルミネッセンス素子用樹脂基材、有機エレクトロルミネッセンス素子

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
D.A. SHIRLEY, PHYS, REV., vol. B5, 1972, pages 4709
See also references of EP2123445A4 *

Cited By (20)

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JP4944993B2 (ja) * 2008-08-19 2012-06-06 リンテック株式会社 成形体、その製造方法、電子デバイス部材および電子デバイス
US8580993B2 (en) 2008-11-12 2013-11-12 Air Products And Chemicals, Inc. Amino vinylsilane precursors for stressed SiN films
JP2013016859A (ja) * 2008-11-12 2013-01-24 Air Products & Chemicals Inc 応力を加えたＳｉＮ膜用アミノ・ビニルシラン前駆体
JP2010118664A (ja) * 2008-11-12 2010-05-27 Air Products & Chemicals Inc 応力を加えたＳｉＮ膜用アミノ・ビニルシラン前駆体
US8889235B2 (en) 2009-05-13 2014-11-18 Air Products And Chemicals, Inc. Dielectric barrier deposition using nitrogen containing precursor
JP2012083490A (ja) * 2010-10-08 2012-04-26 Sumitomo Chemical Co Ltd 電気泳動表示素子
JP2012084354A (ja) * 2010-10-08 2012-04-26 Sumitomo Chemical Co Ltd 電池セル
JP2012083491A (ja) * 2010-10-08 2012-04-26 Sumitomo Chemical Co Ltd 液晶表示素子
JP2012096531A (ja) * 2010-10-08 2012-05-24 Sumitomo Chemical Co Ltd 積層フィルム
JP2017053036A (ja) * 2010-10-08 2017-03-16 住友化学株式会社 積層フィルムの製造方法
JP2012135879A (ja) * 2010-12-24 2012-07-19 Kojima Press Industry Co Ltd 樹脂製品及びその製造方法
US9660208B2 (en) 2011-12-27 2017-05-23 Nitto Denko Corporation Transparent gas barrier film, method for producing transparent gas barrier film, organic EL element, solar battery, and thin film battery
JP2013132897A (ja) * 2011-12-27 2013-07-08 Nitto Denko Corp 透明ガスバリアフィルム、透明ガスバリアフィルムの製造方法、有機ｅｌ素子、太陽電池および薄膜電池
WO2013099654A1 (ja) * 2011-12-27 2013-07-04 日東電工株式会社 透明ガスバリアフィルム、透明ガスバリアフィルムの製造方法、有機ｅｌ素子、太陽電池および薄膜電池
JP2013180473A (ja) * 2012-03-01 2013-09-12 Nitto Denko Corp 透明ガスバリアフィルム、有機ｅｌ素子、太陽電池および薄膜電池
WO2015163358A1 (ja) * 2014-04-23 2015-10-29 コニカミノルタ株式会社 ガスバリアーフィルム及びその製造方法
WO2018047208A1 (ja) * 2016-09-06 2018-03-15 株式会社麗光 透明ハイバリアフイルム、及びそれを使用したハイバイリア積層体
JP6359782B1 (ja) * 2016-09-06 2018-07-18 株式会社麗光 透明ハイバリアフイルム、及びそれを使用したハイバイリア積層体
CN115894070A (zh) * 2022-12-15 2023-04-04 湖南工业大学 一种多孔碳化硅陶瓷的制备方法
CN115894070B (zh) * 2022-12-15 2023-11-10 湖南工业大学 一种多孔碳化硅陶瓷的制备方法

Also Published As

Publication number Publication date
EP2123445A4 (en) 2012-04-11
JPWO2008096616A1 (ja) 2010-05-20
EP2123445A1 (en) 2009-11-25
US20100003483A1 (en) 2010-01-07

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