WO2008096615A1 - 透明ガスバリア性フィルム及びその製造方法 - Google Patents
透明ガスバリア性フィルム及びその製造方法 Download PDFInfo
- Publication number
- WO2008096615A1 WO2008096615A1 PCT/JP2008/051060 JP2008051060W WO2008096615A1 WO 2008096615 A1 WO2008096615 A1 WO 2008096615A1 JP 2008051060 W JP2008051060 W JP 2008051060W WO 2008096615 A1 WO2008096615 A1 WO 2008096615A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- gas barrier
- barrier film
- transparent gas
- producing
- same
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
- Y10T428/24992—Density or compression of components
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Laminated Bodies (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/449,186 US20100009147A1 (en) | 2007-02-05 | 2008-01-25 | Transparent gas barrier film |
JP2008557059A JPWO2008096615A1 (ja) | 2007-02-05 | 2008-01-25 | 透明ガスバリア性フィルム及びその製造方法 |
EP08703887A EP2116368A4 (en) | 2007-02-05 | 2008-01-25 | TRANSLUCENT GASPERRFILM AND MANUFACTURING METHOD THEREFOR |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007-025268 | 2007-02-05 | ||
JP2007025268 | 2007-02-05 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2008096615A1 true WO2008096615A1 (ja) | 2008-08-14 |
Family
ID=39681526
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2008/051060 WO2008096615A1 (ja) | 2007-02-05 | 2008-01-25 | 透明ガスバリア性フィルム及びその製造方法 |
Country Status (4)
Country | Link |
---|---|
US (1) | US20100009147A1 (ja) |
EP (1) | EP2116368A4 (ja) |
JP (1) | JPWO2008096615A1 (ja) |
WO (1) | WO2008096615A1 (ja) |
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2010100971A1 (ja) * | 2009-03-04 | 2010-09-10 | コニカミノルタホールディングス株式会社 | 薄膜を有する基材 |
JP2011179104A (ja) * | 2010-03-04 | 2011-09-15 | Fujifilm Corp | ガスバリアフィルム、成膜方法、および成膜装置 |
JP2011184703A (ja) * | 2010-03-04 | 2011-09-22 | Fujifilm Corp | ガスバリアフィルム、成膜方法、および成膜装置 |
WO2012029541A1 (ja) * | 2010-08-30 | 2012-03-08 | コニカミノルタホールディングス株式会社 | 薄膜積層体 |
JP2012083491A (ja) * | 2010-10-08 | 2012-04-26 | Sumitomo Chemical Co Ltd | 液晶表示素子 |
WO2013035682A1 (ja) * | 2011-09-09 | 2013-03-14 | 富士フイルム株式会社 | 機能性フィルムおよび機能性フィルムの製造方法 |
WO2013035683A1 (ja) * | 2011-09-09 | 2013-03-14 | 富士フイルム株式会社 | 機能性フィルムおよび機能性フィルムの製造方法 |
WO2013035689A1 (ja) * | 2011-09-07 | 2013-03-14 | 東レ株式会社 | ガスバリア性フィルム |
WO2013099654A1 (ja) * | 2011-12-27 | 2013-07-04 | 日東電工株式会社 | 透明ガスバリアフィルム、透明ガスバリアフィルムの製造方法、有機el素子、太陽電池および薄膜電池 |
JP2013132897A (ja) * | 2011-12-27 | 2013-07-08 | Nitto Denko Corp | 透明ガスバリアフィルム、透明ガスバリアフィルムの製造方法、有機el素子、太陽電池および薄膜電池 |
JP2013180473A (ja) * | 2012-03-01 | 2013-09-12 | Nitto Denko Corp | 透明ガスバリアフィルム、有機el素子、太陽電池および薄膜電池 |
JP2014065281A (ja) * | 2012-09-27 | 2014-04-17 | Keio Gijuku | 積層体とその製造方法 |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1849593A4 (en) * | 2005-02-17 | 2011-01-05 | Konica Minolta Holdings Inc | GAS REINFORCEMENT, GAS-PROOF MANUFACTURING METHOD, BARRIER BASE WITH GAS-REINFORMS FOR AN ORGANIC ELECTROLUMINESCENT ELEMENT AND ORGANIC ELECTROLUMINESCENT ITEM |
US8486487B2 (en) | 2005-02-17 | 2013-07-16 | Konica Minolta Holdings, Inc. | Gas barrier film, gas barrier film manufacturing method, resin substrate for organic electroluminescent device using the aforesaid gas barrier film, and organic electroluminescent device using the aforementioned gas barrier film |
WO2007142059A1 (ja) * | 2006-06-02 | 2007-12-13 | Konica Minolta Holdings, Inc. | ガスバリア膜付きプラスチック製光学素子およびその製造方法とこれを適用した光ピックアップ装置 |
JPWO2008096616A1 (ja) * | 2007-02-05 | 2010-05-20 | コニカミノルタホールディングス株式会社 | 透明ガスバリア性フィルム及びその製造方法 |
WO2008096617A1 (ja) * | 2007-02-06 | 2008-08-14 | Konica Minolta Holdings, Inc. | 透明ガスバリア性フィルム及び透明ガスバリア性フィルムの製造方法 |
US9136402B2 (en) * | 2012-02-28 | 2015-09-15 | International Business Machines Corporation | High efficiency flexible solar cells for consumer electronics |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1086267A (ja) * | 1996-09-11 | 1998-04-07 | Toppan Printing Co Ltd | 被覆フィルム |
JP2004082522A (ja) * | 2002-08-27 | 2004-03-18 | Toray Ind Inc | 高ガスバリア性フィルムおよびその製造方法 |
JP2005169996A (ja) * | 2003-12-15 | 2005-06-30 | Dainippon Printing Co Ltd | ガスバリア性シートおよびその製造方法 |
JP2005169994A (ja) * | 2003-12-15 | 2005-06-30 | Dainippon Printing Co Ltd | ガスバリア性シート |
WO2006087941A1 (ja) * | 2005-02-17 | 2006-08-24 | Konica Minolta Holdings, Inc. | ガスバリアフィルム、ガスバリアフィルムの製造方法および該ガスバリアフィルムを用いた有機エレクトロルミネッセンス素子用樹脂基材、有機エレクトロルミネッセンス素子 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6268695B1 (en) * | 1998-12-16 | 2001-07-31 | Battelle Memorial Institute | Environmental barrier material for organic light emitting device and method of making |
US7749563B2 (en) * | 2002-10-07 | 2010-07-06 | Applied Materials, Inc. | Two-layer film for next generation damascene barrier application with good oxidation resistance |
JP4464155B2 (ja) * | 2003-02-10 | 2010-05-19 | 大日本印刷株式会社 | バリアフィルム |
US7288311B2 (en) * | 2003-02-10 | 2007-10-30 | Dai Nippon Printing Co., Ltd. | Barrier film |
WO2006033233A1 (ja) * | 2004-09-21 | 2006-03-30 | Konica Minolta Holdings, Inc. | 透明ガスバリア性フィルム |
WO2006068181A1 (ja) * | 2004-12-21 | 2006-06-29 | Hitachi Chemical Company, Ltd. | 被膜、シリカ系被膜及びその形成方法、シリカ系被膜形成用組成物、並びに電子部品 |
JP2006187966A (ja) * | 2005-01-07 | 2006-07-20 | Toppan Printing Co Ltd | 透明ガスバリア積層体 |
JPWO2008096616A1 (ja) * | 2007-02-05 | 2010-05-20 | コニカミノルタホールディングス株式会社 | 透明ガスバリア性フィルム及びその製造方法 |
WO2008096617A1 (ja) * | 2007-02-06 | 2008-08-14 | Konica Minolta Holdings, Inc. | 透明ガスバリア性フィルム及び透明ガスバリア性フィルムの製造方法 |
-
2008
- 2008-01-25 JP JP2008557059A patent/JPWO2008096615A1/ja active Pending
- 2008-01-25 EP EP08703887A patent/EP2116368A4/en not_active Withdrawn
- 2008-01-25 US US12/449,186 patent/US20100009147A1/en not_active Abandoned
- 2008-01-25 WO PCT/JP2008/051060 patent/WO2008096615A1/ja active Application Filing
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1086267A (ja) * | 1996-09-11 | 1998-04-07 | Toppan Printing Co Ltd | 被覆フィルム |
JP2004082522A (ja) * | 2002-08-27 | 2004-03-18 | Toray Ind Inc | 高ガスバリア性フィルムおよびその製造方法 |
JP2005169996A (ja) * | 2003-12-15 | 2005-06-30 | Dainippon Printing Co Ltd | ガスバリア性シートおよびその製造方法 |
JP2005169994A (ja) * | 2003-12-15 | 2005-06-30 | Dainippon Printing Co Ltd | ガスバリア性シート |
WO2006087941A1 (ja) * | 2005-02-17 | 2006-08-24 | Konica Minolta Holdings, Inc. | ガスバリアフィルム、ガスバリアフィルムの製造方法および該ガスバリアフィルムを用いた有機エレクトロルミネッセンス素子用樹脂基材、有機エレクトロルミネッセンス素子 |
Non-Patent Citations (2)
Title |
---|
"An outline of the X-ray reflectance method in X-ray diffraction Handbook", January 1999, KOKUSAI BUNKEN INSATSU SHA, pages: 151 |
See also references of EP2116368A4 * |
Cited By (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5780154B2 (ja) * | 2009-03-04 | 2015-09-16 | コニカミノルタ株式会社 | 薄膜を有する基材の製造方法 |
WO2010100971A1 (ja) * | 2009-03-04 | 2010-09-10 | コニカミノルタホールディングス株式会社 | 薄膜を有する基材 |
JP2011179104A (ja) * | 2010-03-04 | 2011-09-15 | Fujifilm Corp | ガスバリアフィルム、成膜方法、および成膜装置 |
JP2011184703A (ja) * | 2010-03-04 | 2011-09-22 | Fujifilm Corp | ガスバリアフィルム、成膜方法、および成膜装置 |
WO2012029541A1 (ja) * | 2010-08-30 | 2012-03-08 | コニカミノルタホールディングス株式会社 | 薄膜積層体 |
JP2012083491A (ja) * | 2010-10-08 | 2012-04-26 | Sumitomo Chemical Co Ltd | 液晶表示素子 |
JPWO2013035689A1 (ja) * | 2011-09-07 | 2015-03-23 | 東レ株式会社 | ガスバリア性フィルム |
US9090780B2 (en) | 2011-09-07 | 2015-07-28 | Toray Industries, Inc. | Gas barrier film |
WO2013035689A1 (ja) * | 2011-09-07 | 2013-03-14 | 東レ株式会社 | ガスバリア性フィルム |
JP2013056514A (ja) * | 2011-09-09 | 2013-03-28 | Fujifilm Corp | 機能性フィルムおよび機能性フィルムの製造方法 |
JP2013056513A (ja) * | 2011-09-09 | 2013-03-28 | Fujifilm Corp | 機能性フィルムおよび機能性フィルムの製造方法 |
WO2013035683A1 (ja) * | 2011-09-09 | 2013-03-14 | 富士フイルム株式会社 | 機能性フィルムおよび機能性フィルムの製造方法 |
WO2013035682A1 (ja) * | 2011-09-09 | 2013-03-14 | 富士フイルム株式会社 | 機能性フィルムおよび機能性フィルムの製造方法 |
WO2013099654A1 (ja) * | 2011-12-27 | 2013-07-04 | 日東電工株式会社 | 透明ガスバリアフィルム、透明ガスバリアフィルムの製造方法、有機el素子、太陽電池および薄膜電池 |
JP2013132897A (ja) * | 2011-12-27 | 2013-07-08 | Nitto Denko Corp | 透明ガスバリアフィルム、透明ガスバリアフィルムの製造方法、有機el素子、太陽電池および薄膜電池 |
US9660208B2 (en) | 2011-12-27 | 2017-05-23 | Nitto Denko Corporation | Transparent gas barrier film, method for producing transparent gas barrier film, organic EL element, solar battery, and thin film battery |
JP2013180473A (ja) * | 2012-03-01 | 2013-09-12 | Nitto Denko Corp | 透明ガスバリアフィルム、有機el素子、太陽電池および薄膜電池 |
JP2014065281A (ja) * | 2012-09-27 | 2014-04-17 | Keio Gijuku | 積層体とその製造方法 |
Also Published As
Publication number | Publication date |
---|---|
US20100009147A1 (en) | 2010-01-14 |
JPWO2008096615A1 (ja) | 2010-05-20 |
EP2116368A1 (en) | 2009-11-11 |
EP2116368A4 (en) | 2012-04-11 |
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