WO2008093442A1 - ガス処理装置 - Google Patents

ガス処理装置 Download PDF

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Publication number
WO2008093442A1
WO2008093442A1 PCT/JP2007/065279 JP2007065279W WO2008093442A1 WO 2008093442 A1 WO2008093442 A1 WO 2008093442A1 JP 2007065279 W JP2007065279 W JP 2007065279W WO 2008093442 A1 WO2008093442 A1 WO 2008093442A1
Authority
WO
WIPO (PCT)
Prior art keywords
reactor
internal surface
gas
processing object
processing apparatus
Prior art date
Application number
PCT/JP2007/065279
Other languages
English (en)
French (fr)
Inventor
Toshiaki Kato
Hiroshi Imamura
Original Assignee
Kanken Techno Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kanken Techno Co., Ltd. filed Critical Kanken Techno Co., Ltd.
Priority to KR1020097010936A priority Critical patent/KR101411964B1/ko
Priority to JP2008556002A priority patent/JP5307556B2/ja
Publication of WO2008093442A1 publication Critical patent/WO2008093442A1/ja

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/14—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by absorption
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/32—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/20—Halogens or halogen compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2258/00—Sources of waste gases
    • B01D2258/02—Other waste gases
    • B01D2258/0216—Other waste gases from CVD treatment or semi-conductor manufacturing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2259/00—Type of treatment
    • B01D2259/80—Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
    • B01D2259/818—Employing electrical discharges or the generation of a plasma

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Health & Medical Sciences (AREA)
  • Biomedical Technology (AREA)
  • Environmental & Geological Engineering (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Organic Chemistry (AREA)
  • Treating Waste Gases (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

　管理が容易でメンテナンスの頻度が低く、かつ半導体製造プロセスなどの工業プロセスから排出される様々な種類の処理対象ガスを処理することのできる汎用性の高いガス処理装置を提供する。 　大気圧プラズマＰおよび大気圧プラズマＰに向けて供給される処理対象ガスＦを囲繞し、その内部にて処理対象ガスＦの熱分解を行う反応器１２を有するガス処理装置１０において、反応器１２には、その内面を水Ｗで覆うための水供給手段１６が設けられていることを特徴とする。かかる構成により、反応器１２の内面略全体にいわゆる「濡れ壁」が形成される。このため、処理対象ガスＦ中の固形成分が反応器１２の内面に接触して付着・堆積するのを防止することができると共に、該内面の劣化を遅延させることができる。
PCT/JP2007/065279 2007-01-30 2007-08-03 ガス処理装置 WO2008093442A1 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
KR1020097010936A KR101411964B1 (ko) 2007-01-30 2007-08-03 가스 처리장치
JP2008556002A JP5307556B2 (ja) 2007-01-30 2007-08-03 ガス処理装置

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007019958 2007-01-30
JP2007-019958 2007-01-30

Publications (1)

Publication Number Publication Date
WO2008093442A1 true WO2008093442A1 (ja) 2008-08-07

Family

ID=39673758

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2007/065279 WO2008093442A1 (ja) 2007-01-30 2007-08-03 ガス処理装置

Country Status (5)

Country Link
JP (1) JP5307556B2 (ja)
KR (1) KR101411964B1 (ja)
CN (2) CN104645779A (ja)
TW (1) TWI451900B (ja)
WO (1) WO2008093442A1 (ja)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010027184A2 (ko) * 2008-09-02 2010-03-11 트리플코어스코리아 저압 및 대기압 플라즈마를 이용한 폐가스 제거 시스템
JP2011078876A (ja) * 2009-10-05 2011-04-21 Metawater Co Ltd 亜酸化窒素の還元方法及び還元装置
WO2013024247A1 (en) * 2011-08-17 2013-02-21 Edwards Limited Apparatus for treating a gas stream
JP2013193069A (ja) * 2012-03-22 2013-09-30 Kanken Techno Co Ltd ガス処理装置
KR20140064869A (ko) * 2011-08-17 2014-05-28 에드워즈 리미티드 가스 스트림 처리용 장치
EP2818225A1 (en) * 2013-06-24 2014-12-31 Ebara Corporation Exhaust gas abatement system
EP3023478A3 (en) * 2014-11-19 2016-09-21 Embraer , S.A. A process for recycling composite materials and a system for treating waste gases
JP2021524807A (ja) * 2018-05-16 2021-09-16 ハイバック・コーポレーション 分離されたガス流のポイントオブユース除害装置

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI490029B (zh) * 2012-07-20 2015-07-01 Kern Energy Entpr Co Ltd 氣體回收系統
TWI495829B (zh) 2013-08-09 2015-08-11 Orient Service Co Ltd Exhaust gas treatment device
FR3019471B1 (fr) * 2014-04-04 2016-05-06 Thales Sa Dispositif de conversion d'un effluent gazeux par plasma multi-source
TWI554326B (zh) * 2014-07-07 2016-10-21 Semiconductor exhaust gas treatment equipment
KR101633404B1 (ko) * 2014-09-04 2016-06-24 주식회사 지앤비에스엔지니어링 공정 폐 가스 처리장치
KR101514195B1 (ko) * 2015-02-17 2015-04-23 주식회사 에코에너젠 에너지 저감형 DBD Plasma NOx저감장치
KR101825825B1 (ko) * 2016-08-02 2018-02-06 주식회사 에코프로 질소산화물, 염화불화탄소류, 수소염화불화탄소류, 수소불화탄소류 및 과불화화합물을 포함하는 복합 폐가스의 통합 처리 시스템
KR102362761B1 (ko) * 2017-11-22 2022-02-15 씨에스케이(주) 가스 처리 장치
CN108895482B (zh) * 2018-05-30 2020-05-01 安徽理工大学 一种放电等离子体辅助的燃烧火焰稳定器
JP6791510B2 (ja) * 2018-12-14 2020-11-25 カンケンテクノ株式会社 排ガスのプラズマ除害方法とその装置
JP6718566B1 (ja) * 2019-06-27 2020-07-08 カンケンテクノ株式会社 排ガス除害ユニット
KR102089599B1 (ko) * 2019-07-12 2020-03-16 성진엔지니어링(주) 반도체 폐가스 처리장치
CN115025594A (zh) * 2022-06-13 2022-09-09 中环领先半导体材料有限公司 一种外延尾气处理设备

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61263621A (ja) * 1985-05-16 1986-11-21 Kikuchi:Kk ガス濃度の調節方法
JPH0268414A (ja) * 1988-09-02 1990-03-07 Chiyoda Corp 有毒性ガスの燃焼処理法及び装置
WO2001091896A1 (fr) * 2000-05-29 2001-12-06 Three Tec Co., Ltd. Appareil de traitement d'objets et dispositif a plasma dote de cet appareil
JP2003010638A (ja) * 2001-06-29 2003-01-14 Kanken Techno Co Ltd プラズマ排ガス処理方法と該方法を利用した排ガス放電処理塔ならびに前記プラズマ排ガス処理塔を搭載した排ガス処理装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5123836A (en) 1988-07-29 1992-06-23 Chiyoda Corporation Method for the combustion treatment of toxic gas-containing waste gas
CN1227054C (zh) * 2000-09-07 2005-11-16 康肯科技股份有限公司 全氟化碳或全氟化物的除害方法及除害装置
TWI230094B (en) * 2003-01-14 2005-04-01 Desiccant Technology Corp Method for exhaust treatment of perfluoro compounds
JP2005205330A (ja) * 2004-01-23 2005-08-04 Kanken Techno Co Ltd パーフルオロコンパウンド排ガスのプラズマ分解処理方法および該方法を利用したプラズマ分解処理装置並びにこのプラズマ分解処理装置を搭載した排ガス処理システム
JP2006202605A (ja) * 2005-01-20 2006-08-03 Kanken Techno Co Ltd プラズマ除害機用電源装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61263621A (ja) * 1985-05-16 1986-11-21 Kikuchi:Kk ガス濃度の調節方法
JPH0268414A (ja) * 1988-09-02 1990-03-07 Chiyoda Corp 有毒性ガスの燃焼処理法及び装置
WO2001091896A1 (fr) * 2000-05-29 2001-12-06 Three Tec Co., Ltd. Appareil de traitement d'objets et dispositif a plasma dote de cet appareil
JP2003010638A (ja) * 2001-06-29 2003-01-14 Kanken Techno Co Ltd プラズマ排ガス処理方法と該方法を利用した排ガス放電処理塔ならびに前記プラズマ排ガス処理塔を搭載した排ガス処理装置

Cited By (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010027184A3 (ko) * 2008-09-02 2010-07-08 트리플코어스코리아 저압 및 대기압 플라즈마를 이용한 폐가스 제거 시스템
KR101026457B1 (ko) * 2008-09-02 2011-03-31 (주)트리플코어스코리아 저압 및 대기압 플라즈마를 이용한 폐가스 제거 시스템
WO2010027184A2 (ko) * 2008-09-02 2010-03-11 트리플코어스코리아 저압 및 대기압 플라즈마를 이용한 폐가스 제거 시스템
JP2011078876A (ja) * 2009-10-05 2011-04-21 Metawater Co Ltd 亜酸化窒素の還元方法及び還元装置
US9512518B2 (en) 2011-08-17 2016-12-06 Edwards Limited Apparatus for treating a gas stream
WO2013024247A1 (en) * 2011-08-17 2013-02-21 Edwards Limited Apparatus for treating a gas stream
KR20140064869A (ko) * 2011-08-17 2014-05-28 에드워즈 리미티드 가스 스트림 처리용 장치
KR20140064867A (ko) * 2011-08-17 2014-05-28 에드워즈 리미티드 가스 스트림을 처리하기 위한 장치
JP2014529492A (ja) * 2011-08-17 2014-11-13 エドワーズ リミテッド ガス流処理装置
KR102001268B1 (ko) * 2011-08-17 2019-07-17 에드워즈 리미티드 가스 스트림 처리용 장치
KR101993487B1 (ko) * 2011-08-17 2019-06-26 에드워즈 리미티드 가스 스트림을 처리하기 위한 장치
JP2013193069A (ja) * 2012-03-22 2013-09-30 Kanken Techno Co Ltd ガス処理装置
JP2015004501A (ja) * 2013-06-24 2015-01-08 株式会社荏原製作所 排ガス処理装置
US10227926B2 (en) 2013-06-24 2019-03-12 Ebara Corporation Exhaust gas abatement system
KR20150000428A (ko) * 2013-06-24 2015-01-02 가부시키가이샤 에바라 세이사꾸쇼 배출 가스 처리 장치
EP2818225A1 (en) * 2013-06-24 2014-12-31 Ebara Corporation Exhaust gas abatement system
KR102016184B1 (ko) 2013-06-24 2019-10-21 가부시키가이샤 에바라 세이사꾸쇼 배출 가스 처리 장치
EP3023478A3 (en) * 2014-11-19 2016-09-21 Embraer , S.A. A process for recycling composite materials and a system for treating waste gases
JP2021524807A (ja) * 2018-05-16 2021-09-16 ハイバック・コーポレーション 分離されたガス流のポイントオブユース除害装置
JP7485655B2 (ja) 2018-05-16 2024-05-16 ハイバック・コーポレーション 分離されたガス流のポイントオブユース除害装置

Also Published As

Publication number Publication date
JP5307556B2 (ja) 2013-10-02
CN104645779A (zh) 2015-05-27
TWI451900B (zh) 2014-09-11
TW200900135A (en) 2009-01-01
KR101411964B1 (ko) 2014-06-26
CN101541400A (zh) 2009-09-23
KR20090104804A (ko) 2009-10-06
JPWO2008093442A1 (ja) 2010-05-20

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