JPWO2008093442A1 - ガス処理装置 - Google Patents
ガス処理装置 Download PDFInfo
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- JPWO2008093442A1 JPWO2008093442A1 JP2008556002A JP2008556002A JPWO2008093442A1 JP WO2008093442 A1 JPWO2008093442 A1 JP WO2008093442A1 JP 2008556002 A JP2008556002 A JP 2008556002A JP 2008556002 A JP2008556002 A JP 2008556002A JP WO2008093442 A1 JPWO2008093442 A1 JP WO2008093442A1
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- 238000012545 processing Methods 0.000 title claims abstract description 130
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 210
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 53
- 238000000354 decomposition reaction Methods 0.000 claims description 31
- 229910021529 ammonia Inorganic materials 0.000 claims description 26
- 230000001603 reducing effect Effects 0.000 claims description 12
- 238000000197 pyrolysis Methods 0.000 claims description 10
- 230000001590 oxidative effect Effects 0.000 claims description 8
- 238000005406 washing Methods 0.000 claims description 5
- 239000007789 gas Substances 0.000 abstract description 255
- 239000007787 solid Substances 0.000 abstract description 33
- 238000004519 manufacturing process Methods 0.000 abstract description 16
- 238000000034 method Methods 0.000 abstract description 13
- 238000009736 wetting Methods 0.000 abstract description 12
- 238000000151 deposition Methods 0.000 abstract description 9
- 238000012423 maintenance Methods 0.000 abstract description 7
- 239000004065 semiconductor Substances 0.000 abstract description 7
- 230000006866 deterioration Effects 0.000 abstract description 4
- 210000002381 plasma Anatomy 0.000 description 105
- 239000007921 spray Substances 0.000 description 30
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 28
- MWUXSHHQAYIFBG-UHFFFAOYSA-N nitrogen oxide Inorganic materials O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 20
- 239000000126 substance Substances 0.000 description 18
- 238000003860 storage Methods 0.000 description 16
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 15
- 238000002485 combustion reaction Methods 0.000 description 14
- 239000001294 propane Substances 0.000 description 14
- 239000012752 auxiliary agent Substances 0.000 description 12
- 239000013505 freshwater Substances 0.000 description 9
- 238000005979 thermal decomposition reaction Methods 0.000 description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 7
- 239000001257 hydrogen Substances 0.000 description 7
- 229910052739 hydrogen Inorganic materials 0.000 description 7
- 229910052757 nitrogen Inorganic materials 0.000 description 7
- 239000001301 oxygen Substances 0.000 description 7
- 229910052760 oxygen Inorganic materials 0.000 description 7
- 238000011144 upstream manufacturing Methods 0.000 description 7
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 6
- GQPLMRYTRLFLPF-UHFFFAOYSA-N Nitrous Oxide Chemical compound [O-][N+]#N GQPLMRYTRLFLPF-UHFFFAOYSA-N 0.000 description 6
- 238000010586 diagram Methods 0.000 description 6
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 4
- 238000001784 detoxification Methods 0.000 description 4
- 238000012546 transfer Methods 0.000 description 4
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- -1 perfluoro compound Chemical class 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000002671 adjuvant Substances 0.000 description 1
- 239000003570 air Substances 0.000 description 1
- 235000011114 ammonium hydroxide Nutrition 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 238000006757 chemical reactions by type Methods 0.000 description 1
- KYKAJFCTULSVSH-UHFFFAOYSA-N chloro(fluoro)methane Chemical compound F[C]Cl KYKAJFCTULSVSH-UHFFFAOYSA-N 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 230000000779 depleting effect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 239000008235 industrial water Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000008155 medical solution Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 239000001272 nitrous oxide Substances 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 239000003507 refrigerant Substances 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 230000002463 transducing effect Effects 0.000 description 1
- 230000026683 transduction Effects 0.000 description 1
- 238000010361 transduction Methods 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/14—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by absorption
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/32—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/46—Removing components of defined structure
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2257/00—Components to be removed
- B01D2257/20—Halogens or halogen compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2258/00—Sources of waste gases
- B01D2258/02—Other waste gases
- B01D2258/0216—Other waste gases from CVD treatment or semi-conductor manufacturing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2259/00—Type of treatment
- B01D2259/80—Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
- B01D2259/818—Employing electrical discharges or the generation of a plasma
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Analytical Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Health & Medical Sciences (AREA)
- Biomedical Technology (AREA)
- Environmental & Geological Engineering (AREA)
- General Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Organic Chemistry (AREA)
- Treating Waste Gases (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
Description
12…反応器
12a…外筒
12b…内筒
14…プラズマ発生装置
16…水供給手段
18…前段湿式スクラバー
20…水タンク
22…後段湿式スクラバー
24…水貯留部
36…水供給配管
38…ポンプ
40…枝配管
42…排水管
44…熱交換器
46…水温計
48…水供給配管
50…新水供給配管
52…流量調整装置
54…排気ファン
56…バイパス配管
58…ブリーザー弁
60…大気導入配管
62…分解助剤導入部
64…アンモニア供給装置
66…スプレーノズル
P…プラズマジェット
F…排ガス
G…作動ガス
S…(反応筒管壁内の)空間
[化1]
SiH4+O2→SiO2+H2O
[化2]
Si(OC2H5)4+6O2→SiO2+2CO2+10H2O
[化3]
2PH3+5O2→2H3PO5
[化4]
B2H6+3O2→2H3BO3
[化5]
2CO+O2→2CO2
[化6]
CF4+2H2O→CO2+4HF
[化7]
2C2F6+6H2O+O2→4CO2+12HF
[化8]
2NF3+3H2O→6HF+NO+NO2
[化9]
SF6+4H2O→H2SO4+6HF
[化10]
NF3+3H2→3HF+NH3
[化11]
NF3+NH3→N2+3HF
[化12]
N2O+H2→N2+H2O
[化13]
3N2O+2NH3→4N2+3H2O
[化14]
NO+NO2+3H2→N2+3H2O
[化15]
NO+NO2+2NH3→2N2+3H2O
Claims (8)
- 大気圧プラズマおよび前記大気圧プラズマに向けて供給される処理対象ガスを囲繞し、その内部にて前記処理対象ガスの熱分解を行う反応器を備えるガス処理装置において、
前記反応器には、その内面を水で覆うための水供給手段が設けられていることを特徴とするガス処理装置。 - 内部で発生させた前記大気圧プラズマを前記反応器に供給するプラズマ発生装置を備えており、
前記反応器には、前記プラズマ発生装置から供給された前記大気圧プラズマを前記反応器内に導入するためのプラズマ導入孔と、前記処理対象ガスを導入するための処理対象ガス導入孔とが互いに異なる位置に設けられていることを特徴とする請求の範囲第1項に記載のガス処理装置。 - 前記反応器の前段には、前記処理対象ガスを水洗する前段湿式スクラバーが更に設けられていることを特徴とする請求の範囲第1項または第2項に記載のガス処理装置。
- 前記反応器内または前記反応器に前記処理対象ガスを供給するガス供給路内の少なくとも一方に酸化性ガスまたは還元性ガスのいずれか一方を導入する分解助剤導入部をさらに備える、請求の範囲第1項ないし第3項のいずれかに記載のガス処理装置。
- 前記水供給手段または前記前段湿式スクラバーで使用する水の少なくとも一方にアンモニアを供給するアンモニア供給装置をさらに備える、請求の範囲第1項ないし第4項のいずれかに記載のガス処理装置。
- 前記反応器から排出された熱分解処理後の排ガスを水洗する後段湿式スクラバーが設けられていることを特徴とする請求の範囲第1項ないし第5項のいずれかに記載のガス処理装置。
- 前記前段湿式スクラバーの入口側と前記ガス処理装置出口側に設けられた排気ファンの入口側とを繋ぐ常閉のバイパス配管と、
前記排気ファンの入口側に接続され、ブリーザー弁を介して前記反応器から排出された熱分解処理後の排ガスの流路に大気を導入する大気導入配管とが設けられていることを特徴とする請求の範囲第3項ないし第6項のいずれかに記載のガス処理装置。 - 前記水供給手段に供給する水を貯留すると共に、前記反応器の内面を流れた水が回収される水タンクと、
前記水タンクに貯留された水の温度を測定する水温計と、
前記水温計からの水温信号を受けて、前記水タンクに貯留された水の水温が一定となるように制御する水温調整手段とを有することを特徴とする請求の範囲第1項ないし第7項のいずれかに記載のガス処理装置。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008556002A JP5307556B2 (ja) | 2007-01-30 | 2007-08-03 | ガス処理装置 |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007019958 | 2007-01-30 | ||
JP2007019958 | 2007-01-30 | ||
PCT/JP2007/065279 WO2008093442A1 (ja) | 2007-01-30 | 2007-08-03 | ガス処理装置 |
JP2008556002A JP5307556B2 (ja) | 2007-01-30 | 2007-08-03 | ガス処理装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2008093442A1 true JPWO2008093442A1 (ja) | 2010-05-20 |
JP5307556B2 JP5307556B2 (ja) | 2013-10-02 |
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JP2008556002A Active JP5307556B2 (ja) | 2007-01-30 | 2007-08-03 | ガス処理装置 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP5307556B2 (ja) |
KR (1) | KR101411964B1 (ja) |
CN (2) | CN101541400A (ja) |
TW (1) | TWI451900B (ja) |
WO (1) | WO2008093442A1 (ja) |
Cited By (1)
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JP2014529680A (ja) * | 2011-08-17 | 2014-11-13 | エドワーズ リミテッド | ガス流処理装置 |
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KR101026457B1 (ko) * | 2008-09-02 | 2011-03-31 | (주)트리플코어스코리아 | 저압 및 대기압 플라즈마를 이용한 폐가스 제거 시스템 |
JP5153748B2 (ja) * | 2009-10-05 | 2013-02-27 | メタウォーター株式会社 | 亜酸化窒素の還元方法及び還元装置 |
GB2493750A (en) * | 2011-08-17 | 2013-02-20 | Edwards Ltd | Apparatus for treating a gas stream |
JP5540035B2 (ja) * | 2012-03-22 | 2014-07-02 | カンケンテクノ株式会社 | ガス処理装置 |
TWI490029B (zh) * | 2012-07-20 | 2015-07-01 | Kern Energy Entpr Co Ltd | 氣體回收系統 |
JP6196481B2 (ja) * | 2013-06-24 | 2017-09-13 | 株式会社荏原製作所 | 排ガス処理装置 |
TWI495829B (zh) | 2013-08-09 | 2015-08-11 | Orient Service Co Ltd | Exhaust gas treatment device |
FR3019471B1 (fr) * | 2014-04-04 | 2016-05-06 | Thales Sa | Dispositif de conversion d'un effluent gazeux par plasma multi-source |
TWI554326B (zh) * | 2014-07-07 | 2016-10-21 | Semiconductor exhaust gas treatment equipment | |
KR101633404B1 (ko) * | 2014-09-04 | 2016-06-24 | 주식회사 지앤비에스엔지니어링 | 공정 폐 가스 처리장치 |
BR102014028832B1 (pt) * | 2014-11-19 | 2017-04-11 | Embraer Sa | processo de reciclagem para recuperar o material de reforço fibroso de materiais compósitos e sistema de tratamento de gases efluentes |
KR101514195B1 (ko) * | 2015-02-17 | 2015-04-23 | 주식회사 에코에너젠 | 에너지 저감형 DBD Plasma NOx저감장치 |
KR101825825B1 (ko) * | 2016-08-02 | 2018-02-06 | 주식회사 에코프로 | 질소산화물, 염화불화탄소류, 수소염화불화탄소류, 수소불화탄소류 및 과불화화합물을 포함하는 복합 폐가스의 통합 처리 시스템 |
KR102362761B1 (ko) * | 2017-11-22 | 2022-02-15 | 씨에스케이(주) | 가스 처리 장치 |
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CN108895482B (zh) * | 2018-05-30 | 2020-05-01 | 安徽理工大学 | 一种放电等离子体辅助的燃烧火焰稳定器 |
JP6791510B2 (ja) * | 2018-12-14 | 2020-11-25 | カンケンテクノ株式会社 | 排ガスのプラズマ除害方法とその装置 |
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- 2007-08-03 JP JP2008556002A patent/JP5307556B2/ja active Active
- 2007-08-03 WO PCT/JP2007/065279 patent/WO2008093442A1/ja active Application Filing
- 2007-08-03 CN CN201510026640.4A patent/CN104645779A/zh active Pending
- 2007-08-03 KR KR1020097010936A patent/KR101411964B1/ko active IP Right Grant
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JP2014529680A (ja) * | 2011-08-17 | 2014-11-13 | エドワーズ リミテッド | ガス流処理装置 |
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