JP5540035B2 - ガス処理装置 - Google Patents
ガス処理装置 Download PDFInfo
- Publication number
- JP5540035B2 JP5540035B2 JP2012066215A JP2012066215A JP5540035B2 JP 5540035 B2 JP5540035 B2 JP 5540035B2 JP 2012066215 A JP2012066215 A JP 2012066215A JP 2012066215 A JP2012066215 A JP 2012066215A JP 5540035 B2 JP5540035 B2 JP 5540035B2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- reactor
- water
- water tank
- exhaust
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 97
- 230000001590 oxidative effect Effects 0.000 claims description 29
- 238000000197 pyrolysis Methods 0.000 claims description 13
- 238000005979 thermal decomposition reaction Methods 0.000 claims description 10
- 238000005406 washing Methods 0.000 claims description 4
- 239000007789 gas Substances 0.000 description 171
- 239000007787 solid Substances 0.000 description 17
- 239000001257 hydrogen Substances 0.000 description 11
- 229910052739 hydrogen Inorganic materials 0.000 description 11
- 238000004519 manufacturing process Methods 0.000 description 10
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 9
- 238000002485 combustion reaction Methods 0.000 description 9
- 238000000034 method Methods 0.000 description 8
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 5
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 5
- 239000007921 spray Substances 0.000 description 5
- 238000003860 storage Methods 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 238000002347 injection Methods 0.000 description 4
- 239000007924 injection Substances 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 238000009736 wetting Methods 0.000 description 4
- 238000004880 explosion Methods 0.000 description 3
- 239000013505 freshwater Substances 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 150000002431 hydrogen Chemical class 0.000 description 2
- 238000004518 low pressure chemical vapour deposition Methods 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- -1 perfluoro compound Chemical class 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- NXHILIPIEUBEPD-UHFFFAOYSA-H tungsten hexafluoride Chemical compound F[W](F)(F)(F)(F)F NXHILIPIEUBEPD-UHFFFAOYSA-H 0.000 description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000006757 chemical reactions by type Methods 0.000 description 1
- KYKAJFCTULSVSH-UHFFFAOYSA-N chloro(fluoro)methane Chemical compound F[C]Cl KYKAJFCTULSVSH-UHFFFAOYSA-N 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000000779 depleting effect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000001784 detoxification Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000007726 management method Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 230000020477 pH reduction Effects 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 239000003507 refrigerant Substances 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
Landscapes
- Treating Waste Gases (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Description
12…反応器
12a…排出口
12b…下端開口
14…プラズマ発生装置
16…水供給手段
18…水槽
20…酸化性ガス供給手段
22…後段湿式スクラバー
28…入口ポート
30…入口ダクト
46…排気ファン
50…バイパス配管
52…ブリーザー弁
54…大気導入配管
P…大気圧プラズマ
F…処理対象ガス
G…排ガス
A…酸化性ガス
Claims (4)
- 水槽上に立設された筒状の反応器の上部にある入口ポートから処理対象ガスを供給し、前記反応器の内部にて前記処理対象ガスの熱分解を行った後、前記反応器の下部に設けられた排出口から熱分解処理後の排ガスが排出されるガス処理装置において、
前記反応器は、その下端面が開口すると共に、この下端開口を介して前記水槽内の水中を経由して来た酸化性ガスが導入されることを特徴とするガス処理装置。 - 前記反応器には、その内面を水で覆うための水供給手段が設けられていることを特徴とする請求項1に記載のガス処理装置。
- 前記反応器から排出された熱分解処理後の排ガスを水洗する後段湿式スクラバーが設けられていることを特徴とする請求項1又は2に記載のガス処理装置。
- 前記反応器の入口ポートに接続されたダクトおよび前記ガス処理装置の出口側に設けられた排気ファンのサクション側を繋ぐ常閉のバイパス配管と、
前記排気ファンのサクション側に接続され、ブリーザー弁を介して前記反応器から排出された熱分解処理後の排ガスの流路に大気を導入する大気導入配管とが設けられていることを特徴とする請求項1乃至3の何れかに記載のガス処理装置。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012066215A JP5540035B2 (ja) | 2012-03-22 | 2012-03-22 | ガス処理装置 |
TW101148974A TWI581827B (zh) | 2012-03-22 | 2012-12-21 | Gas handling device |
CN201310009031.9A CN103316561B (zh) | 2012-03-22 | 2013-01-10 | 气体处理装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012066215A JP5540035B2 (ja) | 2012-03-22 | 2012-03-22 | ガス処理装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2013193069A JP2013193069A (ja) | 2013-09-30 |
JP5540035B2 true JP5540035B2 (ja) | 2014-07-02 |
Family
ID=49185776
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2012066215A Active JP5540035B2 (ja) | 2012-03-22 | 2012-03-22 | ガス処理装置 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP5540035B2 (ja) |
CN (1) | CN103316561B (ja) |
TW (1) | TWI581827B (ja) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20220020409A (ko) * | 2014-09-12 | 2022-02-18 | 어플라이드 머티어리얼스, 인코포레이티드 | 반도체 프로세싱 장비 유출물의 처리를 위한 제어기 |
CN110582340A (zh) * | 2017-05-29 | 2019-12-17 | 北京康肯环保设备有限公司 | 排气的减压除害方法及其装置 |
KR101984814B1 (ko) * | 2017-08-31 | 2019-05-31 | 주식회사 에코에너젠 | Ipa를 포함하는 공정 배기 스트림의 처리 시스템 |
KR102362761B1 (ko) * | 2017-11-22 | 2022-02-15 | 씨에스케이(주) | 가스 처리 장치 |
CN109028102A (zh) * | 2018-06-27 | 2018-12-18 | 德淮半导体有限公司 | 气体的燃烧装置及其使用方法 |
CN113015573A (zh) * | 2018-11-06 | 2021-06-22 | 北京康肯环保设备有限公司 | 废气导入喷嘴、水处理装置以及废气处理装置 |
CN109821373B (zh) * | 2019-03-11 | 2020-09-01 | 中南大学 | 一种等离子体废气处理装置及方法 |
CN113041810B (zh) * | 2020-12-30 | 2022-08-30 | 北京京仪自动化装备技术股份有限公司 | 废气处理系统 |
DE102021103365B4 (de) | 2021-02-12 | 2024-02-15 | Das Environmental Expert Gmbh | Verfahren und Brenner zur thermischen Entsorgung von Schadstoffen in Prozessgasen |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6409802B1 (en) * | 1997-11-10 | 2002-06-25 | Ebara Corporation | Method for preventing scaling in wet-process waste gas treatment equipment |
JP2000334294A (ja) * | 1999-05-31 | 2000-12-05 | Shinmeiwa Auto Engineering Ltd | 代替フロンのプラズマアーク分解方法及び装置 |
JP2001170479A (ja) * | 1999-12-16 | 2001-06-26 | Mitsubishi Heavy Ind Ltd | 有機ハロゲン化合物の分解処理装置 |
JP2003144844A (ja) * | 2001-11-07 | 2003-05-20 | Mitsubishi Heavy Ind Ltd | 有機ハロゲン化合物の分解装置 |
KR100647997B1 (ko) * | 2004-12-13 | 2006-11-23 | 유니셈 주식회사 | 폐가스 처리 장치 |
CN104645779A (zh) * | 2007-01-30 | 2015-05-27 | 康肯科技股份有限公司 | 气体处理装置 |
JP2010023000A (ja) * | 2008-07-24 | 2010-02-04 | Kanken Techno Co Ltd | 排ガス除害装置 |
JP4955027B2 (ja) * | 2009-04-02 | 2012-06-20 | クリーン・テクノロジー株式会社 | 排ガス処理装置における磁場によるプラズマの制御方法 |
TWM373236U (en) * | 2009-10-01 | 2010-02-01 | Jian Jia Technologies Co Ltd | Improved exhaust gas treatment device |
-
2012
- 2012-03-22 JP JP2012066215A patent/JP5540035B2/ja active Active
- 2012-12-21 TW TW101148974A patent/TWI581827B/zh active
-
2013
- 2013-01-10 CN CN201310009031.9A patent/CN103316561B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
JP2013193069A (ja) | 2013-09-30 |
TWI581827B (zh) | 2017-05-11 |
TW201338828A (zh) | 2013-10-01 |
CN103316561A (zh) | 2013-09-25 |
CN103316561B (zh) | 2016-07-06 |
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