WO2008090030A1 - Procédé pour usiner une électrode de lampe à décharge - Google Patents

Procédé pour usiner une électrode de lampe à décharge Download PDF

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Publication number
WO2008090030A1
WO2008090030A1 PCT/EP2008/050233 EP2008050233W WO2008090030A1 WO 2008090030 A1 WO2008090030 A1 WO 2008090030A1 EP 2008050233 W EP2008050233 W EP 2008050233W WO 2008090030 A1 WO2008090030 A1 WO 2008090030A1
Authority
WO
WIPO (PCT)
Prior art keywords
electrode
oxide layer
sublimation
discharge lamp
temperature
Prior art date
Application number
PCT/EP2008/050233
Other languages
German (de)
English (en)
Inventor
Thomas Bittmann
Jürgen ALMANSTÖTTER
Original Assignee
Osram Gesellschaft mit beschränkter Haftung
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Osram Gesellschaft mit beschränkter Haftung filed Critical Osram Gesellschaft mit beschränkter Haftung
Publication of WO2008090030A1 publication Critical patent/WO2008090030A1/fr

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/24—Manufacture or joining of vessels, leading-in conductors or bases
    • H01J9/245—Manufacture or joining of vessels, leading-in conductors or bases specially adapted for gas discharge tubes or lamps
    • H01J9/247—Manufacture or joining of vessels, leading-in conductors or bases specially adapted for gas discharge tubes or lamps specially adapted for gas-discharge lamps
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/04—Electrodes; Screens; Shields
    • H01J61/06—Main electrodes
    • H01J61/073—Main electrodes for high-pressure discharge lamps
    • H01J61/0732—Main electrodes for high-pressure discharge lamps characterised by the construction of the electrode
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/36—Seals between parts of vessels; Seals for leading-in conductors; Leading-in conductors
    • H01J61/366—Seals for leading-in conductors

Definitions

  • the invention relates to a method for processing an electrode of a discharge lamp, in which an oxide layer is produced on the surface of the electrode.
  • an electrode for a high-intensity discharge lamp must be cleaned during manufacture of the lamp from impurities that can affect the lighting properties and the life of the lamp during operation.
  • These residual materials or impurities existing in or on the electrode rod can only be removed insufficiently by known methods.
  • a mechanical Rommein is known in which the electrodes rub in a bed of itself and on the added abrasive particles by shaking within an aqueous solution.
  • the achievable surface roughness is not below the dimension of the abrasive particles and the surface is contaminated by the abrasion and the abrasive.
  • an electrochemical etching is known in which the surface of the electrode is attacked on an atomic scale. In this procedure, existing surface structures are leveled and smoothed. However, the surface is also affected by the removal solution. taminiert. In both of these methods, additional purification steps are subsequently required in order to be able to further reduce the impurities.
  • US Pat. No. 6,626,725 B1 discloses a discharge lamp in which a rod-shaped electrode made of tungsten is introduced in regions in a neck of a discharge vessel by a gas-tight pinch and on the other hand extends in regions into a discharge space of the discharge vessel.
  • the surface of the electrode is processed.
  • an oxide layer is first produced on the surface. In this case, for example, a tungsten trioxide layer can be produced.
  • the oxidized electrode is then heated at about 1200 ° C. in a hydrogen furnace in which hydrogen bubbles up in water.
  • an oxide layer is generated on the surface of the electrode. This oxide layer is then subsequently subjected to sublimation.
  • a defined surface profile can thereby also be adjusted in order to be able to ensure constant ratios for the bond between the electrode material and the glass material of the discharge vessel, in particular in the pinch region, over the length of the electrode.
  • the generation of the oxide layer and the subsequent sublimation are preferably carried out before the introduction of the electrode into the discharge vessel of the discharge lamp.
  • the effort for the removal of impurities from the electrode can be further reduced.
  • the sublimation is carried out in a vacuum environment.
  • a sublimation pressure of less than or equal to 10 5 mbar is set.
  • the sublimation is carried out at a temperature between 1400K and 1900K. It can be provided that the temperature during the sublimation is kept substantially constant. Likewise, however, it can also be provided that the temperature is increased or decreased as the duration of the sublimation progresses.
  • the duration of the sublimation and / or the temperature during sublimation is preferably set as a function of the layer thickness of the oxide layer and / or the type of oxide layer.
  • the parameters (temperature, pressure and time duration) of the sublimation process are advantageously set to ensure complete sublimation of the tungsten oxide from the electrode surface in order to minimize adhesion between the electrode surface and the surrounding quartz glass of the lamp vessel after assembly of the electrode in the lamp vessel ,
  • a volatile oxide layer is formed on the surface of the electrode.
  • the oxide layer is preferably under normal air atmosphere and under normal ambient air pressure and a temperature between see 700K and 1300K, in particular generated between 1000K and 1300K.
  • the surface of the electrode is thus preferably oxidized defined in air at normal pressure in a temperature range between 700K and 1300K.
  • the electrode is at least partially formed of tungsten and on the surface forms a tungsten oxide layer.
  • tungsten oxide layers can form, for example a WO 3 layer or a W 2 O 5 layer. Other types of oxide layers are possible.
  • the essential advantage of the method according to the invention lies in the cleaning of the electrode surface without an additional contamination of the substances used for the removal of the surface layer, in particular the abrasive particles or the electrolytes used in the prior art. In addition, no cleaning residues occur.
  • the uniform attack of the oxygen results in a fine-grained oxide layer, in particular a WO 3 layer, with a uniform thickness. Subsequent to the sublimation of the oxide layer, this results in a uniform surface with fine roughness over the length of the electrode pin.
  • no additional cleaning steps are required in a method according to the invention, because all the impurities are removed from the surface of the electrode by the sublimation process with the tungsten oxide.
  • the oxide layer is produced only on a part of the surface of the electrode section embedded in the discharge vessel material after the sealing of the discharge vessel, in order to produce surface regions of different morphology on this electrode section.
  • the parts of the surface of the abovementioned electrode section on which an oxide layer is produced and subsequently removed by sublimation have a different surface structure than the untreated surface regions of the electrode section which are not provided with the oxide layer.
  • the surface areas of the abovementioned electrode section treated by oxidation and sublimation have a lower adhesion to the discharge vessel material than the untreated surface areas.
  • surface regions with different adhesion to the discharge vessel material are produced on the electrode section embedded in the discharge vessel material. The risk that any microscopic cracks or cracks in the discharge vessel material that occur due to the thermal expansion of the electrode and its adhesion to the discharge vessel material during lamp operation can increase to larger, destroying the sealing of the discharge vessel cracks is thereby reduced.
  • FIG. 1 shows a partial section of a discharge lamp with electrodes produced according to the invention
  • FIGS. 2 and 3 show two further exemplary embodiments of electrodes produced according to the invention.
  • a schematic partial section of a high-pressure discharge lamp 1 which has a discharge vessel 2 with a discharge space 3.
  • a first electrode 4 anode
  • a second electrode 5 cathode
  • Two diametrically opposed necks 21 and 22 adjoin the central part of the discharge vessel 2, which is oval in cross-section.
  • the first electrode 4 is in this neck
  • These two rods of the electrodes 4 and 5 are formed of WoIf- ram or a tungsten alloy.
  • the electrodes 4 and 5 are cleaned of residual materials or impurities by a method to be explained below, whereby photometric properties and the service life of the high-pressure discharge lamp 1 during operation are not negatively influenced.
  • the surfaces of the electrodes 4 and 5 have defined surface profiles to provide constant ratios for the bond between the first electrode 4 and the quartz glass material of the neck 21 on the one hand and the second electrode 5 and the quartz glass material of the neck
  • the provided electrode 4 is exposed to a temperature of over 700K under normal air atmosphere and normal ambient pressure. In particular, a temperature between 1000K and 1300K is set. A tungsten trioxide layer (WO 3 layer) is then produced on the surface of the electrode 4. This is generated defined by the set process parameters and the thickness of the oxide layer follows a linear time law. Subsequently, a vacuum atmosphere is then generated in which a pressure ⁇ 10 5 mbar is set. The electrode with its outside edge layer is then subjected to a sublimation in this vacuum and a temperature greater than 1400K, in particular a temperature in the range between 1450K and 1900K, set.
  • a temperature between 1000K and 1300K is set.
  • a tungsten trioxide layer WO 3 layer
  • a vacuum atmosphere is then generated in which a pressure ⁇ 10 5 mbar is set.
  • the electrode with its outside edge layer is then subjected to a sublimation in this vacuum and a temperature greater than 1400K, in particular a temperature in
  • the sublimation, the vacuum and the relatively high temperature are particularly sufficient in their combination to remove any impurities existing in or on the electrode 4.
  • the process parameters can be varied become. For example, higher temperature may allow less vacuum or less treatment time to be required. Likewise, it is possible that the larger the vacuum is (that is, the smaller the pressure in the evacuated space is), the lower the required temperature or the shorter the treatment time. In addition, with a longer treatment time, the temperature and the vacuum can be set lower.
  • the invention is not limited to the embodiment explained in more detail above.
  • it is sufficient to produce the oxide layer only on the surface of the embedded after sealing of the discharge vessel 2 in the quartz glass of the discharge vessel 2 sections 41 and 51 of the electrodes 4 and 5, and then by sublimation, according to the method described in more detail above again to remove.
  • 2 shows an electrode 5 'according to the second exemplary embodiment of the invention with an oxide layer which is produced only on the surface of the portion 51' of the electrode 5 'embedded in the glass of the squeezing foot or neck 22 of the discharge vessel 2. The oxide layer is again removed from the surface of the electrode portion 51a 'by sublimation prior to sealing the neck 22.
  • the oxide layer is formed only on annular surface areas 511a", 512a "and 513a” of the quartz glass of the neck 22 of the discharge vessel 2 embedded portion 51a "of the electro-
  • the surface regions 511a ", 512a” and 513a "provided with the oxide layer are separated from each other by uncoated surface regions 514a" of the electrode section 51a ".
  • the surface areas 511a ", 512a" and 513a “have a different surface structure and, in particular, less adhesion to the quartz glass of the neck 22 than the untreated surface areas 514a"
  • the electrode according to the invention with a magnification factor of 1500 or 5000, it can be seen that the electrode surface has a knob-like structure, similar to the structure of a Raufasertape- te or a rough plaster.
  • the surface of the electrode treated according to the invention has a roughness which is two to three times greater than smoothly polished electrodes.

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Vessels And Coating Films For Discharge Lamps (AREA)

Abstract

L'invention concerne un procédé pour usiner une électrode (4, 5) de lampe à décharge (1). Selon ce procédé, une couche d'oxyde est produite à la surface de l'électrode (4, 5), la couche d'oxyde étant sublimée.
PCT/EP2008/050233 2007-01-24 2008-01-10 Procédé pour usiner une électrode de lampe à décharge WO2008090030A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE200710003486 DE102007003486A1 (de) 2007-01-24 2007-01-24 Verfahren zum Bearbeiten einer Elektrode einer Entladungslampe
DE102007003486.7 2007-01-24

Publications (1)

Publication Number Publication Date
WO2008090030A1 true WO2008090030A1 (fr) 2008-07-31

Family

ID=39233021

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2008/050233 WO2008090030A1 (fr) 2007-01-24 2008-01-10 Procédé pour usiner une électrode de lampe à décharge

Country Status (2)

Country Link
DE (1) DE102007003486A1 (fr)
WO (1) WO2008090030A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012059435A1 (fr) 2010-11-05 2012-05-10 Osram Ag Procédé de fabrication d'une électrode pour une lampe à décharge à haute pression et lampe à décharge à haute pression comprenant au moins une électrode ainsi fabriquée

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102011075899A1 (de) * 2011-05-16 2012-11-22 Osram Ag Gasentladungslampe und Elektrode für eine Gasentladungslampe

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0330268A1 (fr) * 1988-02-23 1989-08-30 Koninklijke Philips Electronics N.V. Lampe électrique
EP0410511A1 (fr) * 1989-07-24 1991-01-30 Koninklijke Philips Electronics N.V. Lampe électrique
JP2003217438A (ja) * 2002-01-24 2003-07-31 New Japan Radio Co Ltd 陰極およびその製造方法
DE102005057735A1 (de) * 2004-12-02 2006-06-08 Koito Manufacturing Co., Ltd. Bogenentladungsröhre für eine Entladungslampe und Verfahren zum Herstellen derselben

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6626725B1 (en) 2000-05-08 2003-09-30 Welch Allyn, Inc Electrode treatment surface process for reduction of a seal cracks in quartz

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0330268A1 (fr) * 1988-02-23 1989-08-30 Koninklijke Philips Electronics N.V. Lampe électrique
EP0410511A1 (fr) * 1989-07-24 1991-01-30 Koninklijke Philips Electronics N.V. Lampe électrique
JP2003217438A (ja) * 2002-01-24 2003-07-31 New Japan Radio Co Ltd 陰極およびその製造方法
DE102005057735A1 (de) * 2004-12-02 2006-06-08 Koito Manufacturing Co., Ltd. Bogenentladungsröhre für eine Entladungslampe und Verfahren zum Herstellen derselben

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012059435A1 (fr) 2010-11-05 2012-05-10 Osram Ag Procédé de fabrication d'une électrode pour une lampe à décharge à haute pression et lampe à décharge à haute pression comprenant au moins une électrode ainsi fabriquée
DE102010043463A1 (de) 2010-11-05 2012-05-10 Osram Ag Verfahren zum Herstellen einer Elektrode für eine Hochdruckentladungslampe und Hochdruckentladungslampe mit mindestens einer derart hergestellten Elektrode
US20130221842A1 (en) * 2010-11-05 2013-08-29 Wolfgang Seitz Method for Producing an Electrode for a High-Pressure Discharge Lamp and High-Pressure Discharge Lamp Comprising at least One Electrode thus Produced
US8876570B2 (en) * 2010-11-05 2014-11-04 Osram Gmbh Method for producing an electrode for a high-pressure discharge lamp and high-pressure discharge lamp comprising at least one electrode thus produced

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Publication number Publication date
DE102007003486A1 (de) 2008-07-31

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