WO2008084599A1 - 感光性平版印刷版材料 - Google Patents

感光性平版印刷版材料 Download PDF

Info

Publication number
WO2008084599A1
WO2008084599A1 PCT/JP2007/072649 JP2007072649W WO2008084599A1 WO 2008084599 A1 WO2008084599 A1 WO 2008084599A1 JP 2007072649 W JP2007072649 W JP 2007072649W WO 2008084599 A1 WO2008084599 A1 WO 2008084599A1
Authority
WO
WIPO (PCT)
Prior art keywords
printing plate
plate material
lithographic printing
compound
double bond
Prior art date
Application number
PCT/JP2007/072649
Other languages
English (en)
French (fr)
Inventor
Toshiyuki Matsumura
Original Assignee
Konica Minolta Medical & Graphic, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Medical & Graphic, Inc. filed Critical Konica Minolta Medical & Graphic, Inc.
Priority to JP2008553014A priority Critical patent/JPWO2008084599A1/ja
Priority to US12/522,300 priority patent/US20100040978A1/en
Publication of WO2008084599A1 publication Critical patent/WO2008084599A1/ja

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)

Abstract

　本発明の目的は、発光波長が３５０ｎｍから４５０ｎｍの範囲にあるレーザー光での露光に適し、高感度であり、現像性に優れる平版印刷版材料を提供することにある。 当該平版印刷版材料は、（Ａ）重合開始剤、（Ｂ）エチレン性二重結合含有化合物、（Ｃ）増感色素、および（Ｄ）高分子結合材を含有する感光層を有する感光性平版印刷版材料において、感光層が（Ｂ）重合可能な、エチレン性二重結合含有化合物として、（ＢＭ１）分子内に１個以上の重合可能なエチレン性二重結合および１個のヒドロキシル基を有する化合物と、（ＢＭ２）分子内に１個の２級アミノ基および１個のヒドロキシル基を有する化合物と、（ＢＭ３）ジイソシアネート化合物との反応により生成される反応生成物を含有し、ＢＭ１（モル比）／ＢＭ２（モル）が、２．４～３８．０であることを特徴とする。
PCT/JP2007/072649 2007-01-10 2007-11-22 感光性平版印刷版材料 WO2008084599A1 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2008553014A JPWO2008084599A1 (ja) 2007-01-10 2007-11-22 感光性平版印刷版材料
US12/522,300 US20100040978A1 (en) 2007-01-10 2007-11-22 Photosensitive lithographic printing plate material

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-002238 2007-01-10
JP2007002238 2007-01-10

Publications (1)

Publication Number Publication Date
WO2008084599A1 true WO2008084599A1 (ja) 2008-07-17

Family

ID=39608497

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2007/072649 WO2008084599A1 (ja) 2007-01-10 2007-11-22 感光性平版印刷版材料

Country Status (3)

Country Link
US (1) US20100040978A1 (ja)
JP (1) JPWO2008084599A1 (ja)
WO (1) WO2008084599A1 (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007171406A (ja) * 2005-12-20 2007-07-05 Fujifilm Corp 平版印刷版の作製方法および平版印刷版原版
WO2018181556A1 (ja) * 2017-03-29 2018-10-04 旭化成株式会社 感光性樹脂組成物

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101438209A (zh) * 2006-05-09 2009-05-20 柯尼卡美能达医疗印刷器材株式会社 光敏性平版印刷板材料

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10193825A (ja) * 1996-12-23 1998-07-28 Agfa Gevaert Nv 熱により像形成可能な材料
JP2001125255A (ja) * 1999-10-27 2001-05-11 Fuji Photo Film Co Ltd 感光性平版印刷版
JP2003295426A (ja) * 2002-03-28 2003-10-15 Agfa Gevaert Nv ３００〜４５０ｎｍの波長範囲に関して増感された光重合可能な組成物
WO2006090623A1 (ja) * 2005-02-25 2006-08-31 Konica Minolta Medical & Graphic, Inc. 感光性平版印刷版材料
WO2007102322A1 (ja) * 2006-03-06 2007-09-13 Konica Minolta Medical & Graphic, Inc. 感光性平版印刷版材料
WO2007129576A1 (ja) * 2006-05-09 2007-11-15 Konica Minolta Medical & Graphic, Inc. 感光性平版印刷版材料

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3710282A1 (de) * 1987-03-28 1988-10-13 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
EP0851296B1 (en) * 1996-12-23 2002-06-26 Agfa-Gevaert Thermally imageable material
EP0985683A1 (en) * 1998-09-09 2000-03-15 Fuji Photo Film Co., Ltd. Photosensitive composition and method for manufacturing lithographic printing plate
US20030186165A1 (en) * 2002-03-28 2003-10-02 Agfa-Gevaert Photopolymerizable composition sensitized for the wavelength range from 300 to 450 nm
AU2003269489A1 (en) * 2002-10-15 2004-05-04 Showa Denko K. K. Hexaarylbiimidazole compounds and photopolymerization initiator compositions containing the same

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10193825A (ja) * 1996-12-23 1998-07-28 Agfa Gevaert Nv 熱により像形成可能な材料
JP2001125255A (ja) * 1999-10-27 2001-05-11 Fuji Photo Film Co Ltd 感光性平版印刷版
JP2003295426A (ja) * 2002-03-28 2003-10-15 Agfa Gevaert Nv ３００〜４５０ｎｍの波長範囲に関して増感された光重合可能な組成物
WO2006090623A1 (ja) * 2005-02-25 2006-08-31 Konica Minolta Medical & Graphic, Inc. 感光性平版印刷版材料
WO2007102322A1 (ja) * 2006-03-06 2007-09-13 Konica Minolta Medical & Graphic, Inc. 感光性平版印刷版材料
WO2007129576A1 (ja) * 2006-05-09 2007-11-15 Konica Minolta Medical & Graphic, Inc. 感光性平版印刷版材料

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007171406A (ja) * 2005-12-20 2007-07-05 Fujifilm Corp 平版印刷版の作製方法および平版印刷版原版
WO2018181556A1 (ja) * 2017-03-29 2018-10-04 旭化成株式会社 感光性樹脂組成物
JPWO2018181556A1 (ja) * 2017-03-29 2019-08-08 旭化成株式会社 感光性樹脂組成物
KR20190100968A (ko) * 2017-03-29 2019-08-29 아사히 가세이 가부시키가이샤 감광성 수지 조성물
KR102295744B1 (ko) 2017-03-29 2021-08-30 아사히 가세이 가부시키가이샤 감광성 수지 조성물

Also Published As

Publication number Publication date
JPWO2008084599A1 (ja) 2010-04-30
US20100040978A1 (en) 2010-02-18

Similar Documents

Publication Publication Date Title
CN101390016B (zh) 光致聚合的组合物
US8088836B2 (en) Oxime ester compounds and photosensitive resin compositions using the same
TWI678597B (zh) 圖型形成方法及使用其所製造之電子裝置
ATE553417T1 (de) Fotopolymer-druckplatten-vorläufer
TWI675819B (zh) 肟基磺酸酯衍生物
TW201902881A (zh) 三嗪過氧化物衍生物、含有該衍生物的聚合性組合物、由該聚合性組合物形成的固化物以及該固化物的製備方法
WO2007023133A3 (en) Photopolymer printing plate precursor.
TW201403220A (zh) 用於壓印的底層膜形成組成物及圖案形成方法
TW201831445A (zh) 過氧化肉桂酸酯衍生物、含有該化合物的聚合性組合物及其固化物與製備方法
TWI608294B (zh) 感光性樹脂組成物
KR101003323B1 (ko) 청자색 레이저 감광성 레지스트재층을 갖는 화상 형성재 및그 레지스트 화상 형성 방법
ATE422251T1 (de) Lithographischer druckplattenvorläufer
DE602008000023D1 (de) Lithographiedruckplattenvorläufer und Verfahren zur Herstellung einer Lithographiedruckplatte
EP1630604A3 (en) Photosensitive lithographic printing plate
WO2013008652A1 (ja) 光重合開始剤、感光性組成物及び硬化物
WO2008084599A1 (ja) 感光性平版印刷版材料
US5731363A (en) Photopolymerizable composition containing sensitizing dye and titanocene compound
TWI521301B (zh) A negative photosensitive resin composition, a photosensitive dry film, and a light receiving device
EP1832928A3 (en) Photosensitive recording material, planographic printing plate precursor, and stacks of the same
TW200832065A (en) Polymerizable resin composition
WO2008096673A1 (ja) 感光性平版印刷版材料
Sugita et al. I-line photoresist composed of multifunctional acrylate, photo initiator, and photo acid generator, which can be patterned after g-line photo-crosslinking
KR20130006334A (ko) 감광성 수지 조성물
JP4385737B2 (ja) 感光性樹脂組成物、並びにそれを用いた感光性画像形成材料及び感光性画像形成材
KR102048588B1 (ko) 블랙 컬럼 스페이서용 감광성 수지 조성물, 블랙 컬럼 스페이서, 표시장치, 및 블랙 컬럼 스페이서의 형성 방법

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 07832378

Country of ref document: EP

Kind code of ref document: A1

WWE Wipo information: entry into national phase

Ref document number: 2008553014

Country of ref document: JP

WWE Wipo information: entry into national phase

Ref document number: 12522300

Country of ref document: US

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 07832378

Country of ref document: EP

Kind code of ref document: A1