WO2008081746A1 - ハイパーブランチポリマーの合成方法、ハイパーブランチポリマー、レジスト組成物、半導体集積回路および半導体集積回路の製造方法 - Google Patents

ハイパーブランチポリマーの合成方法、ハイパーブランチポリマー、レジスト組成物、半導体集積回路および半導体集積回路の製造方法 Download PDF

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WO2008081746A1
WO2008081746A1 PCT/JP2007/074580 JP2007074580W WO2008081746A1 WO 2008081746 A1 WO2008081746 A1 WO 2008081746A1 JP 2007074580 W JP2007074580 W JP 2007074580W WO 2008081746 A1 WO2008081746 A1 WO 2008081746A1
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Prior art keywords
hyperbranched polymer
core
shell type
integrated circuits
semiconductor integrated
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PCT/JP2007/074580
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English (en)
French (fr)
Inventor
Akinori Uno
Yoshiyasu Kubo
Yusuke Sasaki
Mineko Horibe
Yukihiro Kaneko
Kaoru Suzuki
Minoru Tamura
Shinichiro Kabashima
Yuko Tanaka
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Lion Corporation
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Priority to KR1020097008616A priority Critical patent/KR20090103860A/ko
Priority to US12/521,438 priority patent/US20110101503A1/en
Priority to TW096150540A priority patent/TW200900423A/zh
Publication of WO2008081746A1 publication Critical patent/WO2008081746A1/ja

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G61/02—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes
    • C08G61/025—Polyxylylenes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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    • C08F12/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F12/02—Monomers containing only one unsaturated aliphatic radical
    • C08F12/04—Monomers containing only one unsaturated aliphatic radical containing one ring
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    • C08F12/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F12/02—Monomers containing only one unsaturated aliphatic radical
    • C08F12/04—Monomers containing only one unsaturated aliphatic radical containing one ring
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    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02—Monomers containing only one unsaturated aliphatic radical
    • C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
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    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
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    • C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
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    • C—CHEMISTRY; METALLURGY
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    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02—Monomers containing only one unsaturated aliphatic radical
    • C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
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    • C—CHEMISTRY; METALLURGY
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    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
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    • C08F293/005—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule using free radical "living" or "controlled" polymerisation, e.g. using a complexing agent
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    • C08G83/00—Macromolecular compounds not provided for in groups C08G2/00 - C08G81/00
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    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
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    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C08F220/1804—C4-(meth)acrylate, e.g. butyl (meth)acrylate, isobutyl (meth)acrylate or tert-butyl (meth)acrylate
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    • C08F2438/00—Living radical polymerisation
    • C08F2438/01—Atom Transfer Radical Polymerization [ATRP] or reverse ATRP

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  • Chemical & Material Sciences (AREA)
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  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Emergency Medicine (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Graft Or Block Polymers (AREA)

Abstract

　合成に際して排出される廃液量の低減を図りつつ、安定的かつ大量にコアシェル型ハイパーブランチポリマーを合成することを目的とし、金属触媒の存在下におけるモノマーのリビングラジカル重合を経てコアシェル型ハイパーブランチポリマーを合成する際に、リビングラジカル重合によって合成されたハイパーブランチポリマーをコア部とし、コア部に酸分解性基を導入することにより形成されたシェル部における酸分解性基の一部を酸触媒を用いて分解して酸基を形成したコアシェル型ハイパーブランチポリマーを形成する。その後、コアシェル型ハイパーブランチポリマーを有機溶媒に溶解させた溶液と当該溶液における有機溶媒の量に対して所定割合となる量の超純水とを混合することにより、溶液と超純水との混合溶液中にコアシェル型ハイパーブランチポリマーを析出させ、析出されたコアシェル型ハイパーブランチポリマーを混合溶液から抽出するようにした。
PCT/JP2007/074580 2006-12-28 2007-12-20 ハイパーブランチポリマーの合成方法、ハイパーブランチポリマー、レジスト組成物、半導体集積回路および半導体集積回路の製造方法 WO2008081746A1 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
KR1020097008616A KR20090103860A (ko) 2006-12-28 2007-12-20 하이퍼브랜치 폴리머의 합성 방법, 하이퍼브랜치 폴리머, 레지스트 조성물, 반도체 집적회로 및 반도체 집적회로의 제조 방법
US12/521,438 US20110101503A1 (en) 2006-12-28 2007-12-20 Hyperbranched polymer synthesizing method, hyperbranched polymer, resist composition, semiconductor integrated circuit, and semiconductor integrated circuit fabrication method
TW096150540A TW200900423A (en) 2006-12-28 2007-12-27 Hyperbranched polymer synthesis method, hyperbranched polymer, resist composition, semiconductor integrated circuit, and semiconductor integrated circuit manufacturing method

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006-355873 2006-12-28
JP2006355873 2006-12-28

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WO2008081746A1 true WO2008081746A1 (ja) 2008-07-10

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US (1) US20110101503A1 (ja)
JP (1) JP2008179770A (ja)
KR (1) KR20090103860A (ja)
TW (1) TW200900423A (ja)
WO (1) WO2008081746A1 (ja)

Families Citing this family (4)

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Publication number Priority date Publication date Assignee Title
CN104151483B (zh) * 2014-06-04 2016-02-10 常州大学 一种端羟基超支化聚丙烯酸酯的制备方法
KR102241144B1 (ko) * 2019-04-30 2021-04-15 부산대학교 산학협력단 이중 금속 시안화물 촉매를 이용한 초분지 폴리글리시돌 제조 방법 및 이에 의해 제조된 초분지 폴리글리시돌
US11746169B2 (en) 2020-07-06 2023-09-05 Asahi Kasei Kabushiki Kaisha Polymer composition and ion-exchange membrane
CN114749038A (zh) * 2021-01-11 2022-07-15 中化(宁波)润沃膜科技有限公司 一种高通量反渗透复合膜及其制备方法

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11269216A (ja) * 1998-03-23 1999-10-05 Sekisui Chem Co Ltd スチレン系誘導体のリビングポリマーの製造方法
WO2005061566A1 (ja) * 2003-12-22 2005-07-07 Lion Corporation ハイパーブランチポリマー及びその製造方法、並びに該ハイパーブランチポリマーを含有するレジスト組成物
WO2007020734A1 (ja) * 2005-08-12 2007-02-22 Lion Corporation ナノ平滑性とエッチング耐性を有するフォトレジストポリマーならびにレジスト組成物
JP2007154181A (ja) * 2005-11-11 2007-06-21 Lion Corp ハイパーブランチポリマーの製造方法
JP2007206537A (ja) * 2006-02-03 2007-08-16 Lion Corp 溶解性を向上させたレジスト組成物の製造方法
JP2007211049A (ja) * 2006-02-07 2007-08-23 Lion Corp 酸触媒を含まないハイパーブランチポリマーの製造方法
JP2007231170A (ja) * 2006-03-01 2007-09-13 Lion Corp ハイパーブランチポリマーの製造方法

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* Cited by examiner, † Cited by third party
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EP2079844B1 (en) * 2006-10-04 2015-01-07 The University of Akron Synthesis of inimers and hyperbranched polymers

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11269216A (ja) * 1998-03-23 1999-10-05 Sekisui Chem Co Ltd スチレン系誘導体のリビングポリマーの製造方法
WO2005061566A1 (ja) * 2003-12-22 2005-07-07 Lion Corporation ハイパーブランチポリマー及びその製造方法、並びに該ハイパーブランチポリマーを含有するレジスト組成物
WO2007020734A1 (ja) * 2005-08-12 2007-02-22 Lion Corporation ナノ平滑性とエッチング耐性を有するフォトレジストポリマーならびにレジスト組成物
JP2007154181A (ja) * 2005-11-11 2007-06-21 Lion Corp ハイパーブランチポリマーの製造方法
JP2007206537A (ja) * 2006-02-03 2007-08-16 Lion Corp 溶解性を向上させたレジスト組成物の製造方法
JP2007211049A (ja) * 2006-02-07 2007-08-23 Lion Corp 酸触媒を含まないハイパーブランチポリマーの製造方法
JP2007231170A (ja) * 2006-03-01 2007-09-13 Lion Corp ハイパーブランチポリマーの製造方法

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Title
JOURNAL OF POLYMER SCIENCE: PART A: POLYMER CHEMISTRY, vol. 36, 1998, pages 955 - 970 *
MACROMOLECULES, vol. 29, 1996, pages 1079 - 1081 *
POLYMER BULLETIN, vol. 55, 2005, pages 181 - 189 *

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US20110101503A1 (en) 2011-05-05
KR20090103860A (ko) 2009-10-01
TW200900423A (en) 2009-01-01
JP2008179770A (ja) 2008-08-07

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