WO2008059682A1 - Résine traitée en surface, son procédé de fabrication et son utilisation - Google Patents
Résine traitée en surface, son procédé de fabrication et son utilisation Download PDFInfo
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- WO2008059682A1 WO2008059682A1 PCT/JP2007/069932 JP2007069932W WO2008059682A1 WO 2008059682 A1 WO2008059682 A1 WO 2008059682A1 JP 2007069932 W JP2007069932 W JP 2007069932W WO 2008059682 A1 WO2008059682 A1 WO 2008059682A1
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- resin
- amine
- film
- meth
- thin film
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/30—Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/046—Forming abrasion-resistant coatings; Forming surface-hardening coatings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/12—Chemical modification
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2333/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
- C08J2333/04—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters
- C08J2333/06—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters of esters containing only carbon, hydrogen, and oxygen, the oxygen atom being present only as part of the carboxyl radical
- C08J2333/10—Homopolymers or copolymers of methacrylic acid esters
- C08J2333/12—Homopolymers or copolymers of methyl methacrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2479/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen, or carbon only, not provided for in groups C08J2461/00 - C08J2477/00
- C08J2479/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C08J2479/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12035—Materials
- G02B2006/12069—Organic material
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31855—Of addition polymer from unsaturated monomers
- Y10T428/31935—Ester, halide or nitrile of addition polymer
Definitions
- the present invention relates to a surface-treated resin, a method for producing the same, and use thereof, and in particular, a resin in which a thin film of amine is formed on the surface of a resin having an ester bond, a method for producing the same, and use thereof About.
- Optical communication can be classified into long-distance communication that connects cities, medium-range communication that connects regions, and short-range communication that connects devices and devices.
- An example of near field communication is communication by a small device such as a mobile phone.
- the current mobile phone is mainly used for electric wiring, and a flexible substrate such as polyimide is mainly used.
- a flexible substrate such as polyimide is mainly used.
- the amount of communication is expected to increase, and with the increase in speed and capacity due to the transmission of optical signals, it is expected that communication methods using film-type optical waveguides will become the mainstream.
- An optical waveguide is one of optical components including a core part and a clad part that covers the core part and is adjusted so that the refractive index is small with respect to the core part. Confinement and direct light to a certain position.
- a film optical waveguide As a film-type optical waveguide that can be bent with a small radius of curvature, for example, a film optical waveguide is disclosed in which a groove extending in a direction perpendicular to the longitudinal direction of the core is formed on the surface of the cladding layer.
- Patent Document 1 The film optical waveguide is a substrate by a stamper. A core resin or a clad resin is formed on the sacrificial layer formed in (1), and the resin is cured by ultraviolet irradiation, and then the sacrificial layer is dissolved.
- Patent Document 1 Japanese Patent Publication “Japanese Patent Laid-Open No. 2006-23661 (Publication Date: January 26, 2006)”
- the film optical waveguide disclosed in Patent Document 1 is irradiated with ultraviolet rays in order to cure the resin in the manufacturing process.
- the surface of the resin is cured only by ultraviolet irradiation. If it cannot be performed sufficiently and a sticky feeling (hereinafter referred to as “tackiness”) due to the uncured resin remains, there is a problem of stickiness.
- Thin film formation methods are broadly classified into physical methods and chemical methods. Examples of the former include forces that can include thermal evaporation, sputtering, ion plating, and the like. These methods have a problem in that the apparatus itself is large and productivity is not good.
- examples of the latter include a gas phase method and a liquid phase method.
- a typical example of the vapor phase method is CVD
- the object to be deposited is OH such as glass. It is a base material including a bond, and a thin film cannot be formed on the surface of the resin.
- these methods are liquid phase methods, there is a problem that the uniformity of the film thickness is impaired as the volume is reduced when the solvent component is volatilized.
- the present invention has been made in view of the above problems, and an object of the present invention is to provide a resin having a thin film of amine formed on the surface, a method for producing the same, and use thereof.
- the present inventor makes a thin film of amine on the surface of the resin under low temperature conditions by bringing the vapor of amine into contact with a resin obtained by polymerizing a monomer having an ester bond.
- the resin that can be easily formed and has a thin film of the amine has a small radius of curvature, and has excellent tackiness and wear resistance, and is very suitable as a material for optical components such as optical waveguides.
- the present invention has been completed.
- the resin according to the present invention is a resin having an ester bond as an essential component, and is characterized by having an amine thin film on the surface.
- the resin according to the present invention can be suitably used as a material for optical components such as an optical waveguide and a light diffusion plate, for example, with a force S.
- the resin according to the present invention is preferably in the form of a film.
- Film-like resins are required to be flexible, such as optical waveguides used in small devices such as mobile phones, so it is necessary that the flexibility is not impaired even after the film is formed on the surface. . Since the amine film provided on the surface of the resin according to the present invention is a thin film, the flexibility of the film is not impaired. Therefore, the film-like resin according to the present invention can be suitably used as a material for an optical component that needs to be wired in a narrow portion such as an optical waveguide of a mobile phone or the like.
- the amin thin film is preferably formed by bringing a vapor containing amine into contact with the surface of the resin.
- a method for easily forming a thin film on the surface of an organic material such as a resin has not been obtained so far.
- a gaseous amine reacts with an ester bond of the resin.
- a thin film of amine is easily formed on the surface of the resin. Therefore, it is possible to easily reduce the tackiness of the resin and improve the wear resistance, and to maintain the flexibility of the resin.
- the amine can be volatilized at a relatively low temperature, and can be vaporized at a temperature lower than the glass transition temperature or the heat distortion temperature of the resin. Therefore, it can be manufactured using a substrate having low heat resistance, and the usability of the substrate can be increased.
- the amin is a primary amin! /. Since primary amines are particularly reactive among amines, they easily react with the ester bond of a resin and easily form a thin film. Therefore, according to the above configuration, it is possible to more easily produce a resin having no tackiness and excellent wear resistance and flexibility. Moreover, since primary amines have two NH bonds in the molecule, it is easy to produce a silane coupling agent.
- the above amine is preferably a silane coupling agent.
- the resin according to the present invention can be easily blended with the inorganic material, and a stacked film can be further formed on the formed thin film. It becomes possible. Therefore, a composite material of resin and inorganic material can be easily produced.
- the resin is preferably an acrylic resin!
- Acrylic resin is widely used as a resin for optical parts such as optical waveguides and has an ester bond! /, But it may be insufficiently cured by simply irradiating with ultraviolet rays. high. According to the above configuration, a thin film of amine is formed on the surface of the acrylic resin, so that tackiness can be reduced, wear resistance can be improved, and flexibility can be maintained. The usefulness can be further increased.
- the acrylic resin is preferably a crosslinkable acrylic resin. According to the above configuration, since the acrylic resin becomes a network polymer by crosslinking, the wear resistance, impact resistance, heat resistance, solvent resistance, oil resistance, etc. can be further improved. The usefulness of the resin of the invention can be further increased.
- the resin is a thermoplastic resin!
- Thermoplastic resins can be made into a resin having excellent moldability because thermoplasticity to the extent that it can be molded by heating is obtained and plasticity can be maintained reversibly.
- An optical waveguide according to the present invention includes the resin according to the present invention.
- the resin according to the present invention has no tackiness and is excellent in wear resistance and flexibility. Therefore, the optical waveguide can be used as an optical waveguide having good handleability and strength and excellent flexibility. For this reason, it is very excellent as an optical waveguide that needs to be wired in a narrow part, such as a hinge part of a mobile phone, PDA, notebook PC, etc., and requires flexibility.
- the method for producing a surface-treated resin according to the present invention comprises a step A in which an amine-containing vapor is generated by volatilizing an amine, and the amine-containing vapor is an essential component of an ester bond. And a step B of forming a thin film of the amine on the surface of the resin by contacting with the resin.
- FIG. 1 is a process diagram showing a process of producing an optical waveguide by a stamper method.
- the resin according to the present invention is a resin having an ester bond as an essential component, and has a thin film of amine on the surface.
- the above resin is a polymerized monomer and has at least one ester bond in the molecule. The ester bond reacts with the amine to produce an amide bond, and forms a thin film of the amine.
- the monomer having an ester bond is not particularly limited.
- An alicyclic compound having two or more (meth) atallyloyl groups (2) an aliphatic compound having two or more (meth) attalyloyl groups, (3) having two or more (meth) atteroyl groups
- Aromatic compounds (4) heterocyclic compounds having two or more (meth) acryloyl groups, (5) compounds having one (meth) attalyloyl group, and the like.
- the above “(meth) attalyl group” represents an taliloyl group or a methallyloyl group.
- Examples of the alicyclic compound having two or more (meth) atalyloyl groups include cyclopentane (meth) acrylate, cyclohexane di (meth) acrylate, and methylcyclohexane.
- examples of the aliphatic compound having two or more (meth) atalyloyl groups include, for example, ethylene glycol di (meth) acrylate, 1,2- and 1,3-propylene glycol di (meth).
- examples of the aromatic compound having two or more (meth) atalyloyl groups include ethylene oxide or propylene oxide adducts of bisphenol A and F, di (meth) atalylate, biphenyl mono-1,4.
- heterocyclic compound having two or more (meth) atalyloyl groups include, for example, N, N di (meth) atalyloylbiperazine, N, N di (meth) atalyloinole 1, 1— Dimethylhydantoin, 1,3,5 Tri (meth) atalyleurehexahydro-1,3,5 Triazine, Bis [2 (meth) Ataloyloxychetyl] -1- (2-hydroxyethyl) isocyanonurate, Tris [2 ( Meta) Ataliloylochetyl] Isocyanurate, 3, 5 Diglycidyl leu 1, 1-
- examples of the compound having one (meth) atalyloyl group include n-, i- and t-butyl (meth) acrylate, 2-ethyl hexyl (meth) acrylate, methoxyethylene glycol (meth) acrylate.
- the resin must have at least one ester bond in the molecule.
- the resin may be a thermoplastic resin having an ester bond (thermoplastic polymer).
- thermoplastic polymer examples include polyethylene terephthalate, polybutylene terephthalate, polymethyl methacrylate, polycarbonate, polyethylene naphthalate, and polybutylene naphthalate.
- the polymerization method is not particularly limited, and may be a chain reaction or a sequential reaction, but a polymer can be efficiently produced in a chain using a radical reaction. Therefore, the photo radical polymerization method and / or the thermal radical polymerization method are preferably used.
- the anion polymerization initiator includes nucleophilic reagents such as alkali metals, metal hydroxides, and Grignard reagents, and the cationic polymerization initiator includes electrophilic reagents such as proton acids, Lewis acids, metal halides, and stable carbon ions. Can be used.
- the photopolymerization initiator used in the photoradical polymerization method is not particularly limited, and is a commonly used photopolymerization initiator, that is, acetophenones, benzophenones, diacetyls, benzyls, Benzoin, benzoin ethers, benzyldimethylketanols, benzoylbenzoates, hydroxyphenyl ketones, carbonyl compound photopolymerization initiators such as aminophenyl ketones, thiuram sulfides, thixanthones, etc.
- Organic sulfur compound-based photopolymerization initiators organophosphorus compound-based photopolymerization initiators such as isylphosphinic acid esters, and the like can be used. These photopolymerization initiators may be used alone or in combination of two or more.
- the blending ratio of the photopolymerization initiator is 0.5% by weight or more and 10% by weight or less, preferably 1% by weight or more and 7% by weight or less based on the total amount of the resin composition containing the monomer. If the blending ratio is less than 0.5% by weight, the photocuring property is insufficient, and if it exceeds 10% by weight, the curing reaction becomes too rapid and adversely affects the physical properties of the cured product.
- the resin composition refers to a composition containing the monomer as an essential component and capable of radical polymerization.
- the phrase “having a monomer as an essential component” means that a monomer may be included as a structural unit. Therefore, the resin composition includes an oligomer or a polymer obtained by polymerizing monomers! /, Or may /!
- Photoradical polymerization is generally performed by irradiating a resin composition containing a monomer with ultraviolet rays.
- Ultra-high pressure mercury lamp, high pressure mercury lamp, low pressure mercury lamp, methanol There are lamps, ride lamps, carbon arc lamps, xenon lamps, etc., but high pressure mercury lamps, metal lamps, and ride lamps are preferred.
- the amount of ultraviolet irradiation is not particularly limited, but is preferably 1000 mj / cm 2 or more and 5000 mj / cm 2 or less.
- the thermal polymerization initiator used in the thermal radical polymerization method is a thermal polymerization initiator that decomposes by heat to generate radicals, and has a thermal decomposition temperature of about 30 ° C or higher, preferably about 60 ° C or higher. These thermal polymerization initiators are used.
- the thermal polymerization initiator is not particularly limited, but the use of an organic peroxide that does not purify by-products such as gas and water is particularly suitable.
- a thermal polymerization initiator having a thermal decomposition temperature of less than about 30 ° C is not preferable because the resin becomes unstable.
- the organic peroxide is not particularly limited, but is not limited to alkyl or aryl peroxides, dialkyl or dialyl peroxides, alkyl peroxide acids and esters thereof, diacyl peroxide.
- Conventionally known organic peroxides such as oxides, ketones and peroxides can be used.
- thermal polymerization initiators may be used alone or in combination of two or more.
- the blending ratio of the thermal polymerization initiator is 0.5% by weight or more and 5% by weight or less, preferably 1% by weight or more and 3% by weight or less based on the total amount of the resin composition containing the monomer. If the blending ratio is less than 0.5% by weight, the thermosetting property is insufficient, and if it exceeds 5% by weight, the curing reaction becomes too rapid and adversely affects the physical properties of the resin.
- thermal radical polymerization when an organic peroxide is used as a thermal polymerization initiator, curing is performed by heating to a temperature equal to or higher than the thermal decomposition temperature of the organic peroxide. Therefore, although the heating temperature depends on the type of organic peroxide to be blended, the heating time is usually from 10 minutes to 60 minutes.
- the photopolymerization initiator and the thermal polymerization initiator may be used singly or in combination. When used in combination, the blending ratio is as described above.
- thermosetting is performed by heating to complete the curing. Is generally. Since photocuring is superior to heat curing in terms of handleability and curing speed, it is preferable to employ photocuring in the present invention.
- the above-mentioned "resin composition containing a monomer" to be subjected to a polymerization reaction includes a monomer, a polymerization initiator, a polymerization inhibitor, a polymerization accelerator, an antifoaming agent, a light stabilizer, as necessary. It may contain a small amount of additives such as an agent, a heat stabilizer, a leveling agent, a coupling agent, and an antistatic agent.
- the resin is more preferably a crosslinkable acrylic resin, preferably an acrylic resin.
- a crosslinkable acrylic resin two (meth) atalyloyl groups that are used to crosslink the two main chains of the polymer are required. It must contain at least one compound.
- the acrylic resin that is not crosslinkable may be a polymer of a compound having one (meth) atteroyl group, or a copolymer of two or more compounds having one (meth) atteroyl group. Good.
- the (meth) acrylate group at the terminal of the acrylic resin is preferably a urethane (meth) acrylate group because the flexibility of the resin can be increased.
- the diol constituting the urethane bond is not particularly limited.
- polyester-based, polyether-based, and polycarbonate-based diols can be used.
- the diisocyanate constituting the urethane bond is not particularly limited.
- aliphatic (hexamethylene diisocyanate, etc.), alicyclic (cyclohexane dicyanate, etc.), aromatic (toluene diethanolate). Isocyanate, etc.) can be used.
- the resin according to the present invention may be thermoplastic or curable! /, But can improve moldability and is suitable for production of optical components such as optical waveguides. Therefore, a curable resin is preferable.
- the shape of the resin according to the present invention is not particularly limited, and may be any shape such as a pellet, a powder, a film, and a plate, but the resin according to the present invention has tackiness. Excellent wear resistance and good flexibility, so it is more useful when made into a film. Therefore, it is particularly preferable that the film is in the form of a film.
- the "film” includes both a film-like material and a sheet-like material.
- the film thickness of the film is not particularly limited!
- the film may be a stretched film by stretching! /.
- a conventionally known stretching method for example, longitudinal stretching in which the difference in peripheral speed between rolls is used for stretching in the longitudinal direction of the film, and both ends of the film are held with tenter clips or the like in the width direction of the film.
- Methods such as transverse stretching for stretching and sequential biaxial stretching combining these can be used.
- the longitudinal stretching and the transverse stretching may be only one stage, or two or more stages of multi-stage stretching may be performed.
- simultaneous biaxial stretching in which the longitudinal and lateral directions are simultaneously stretched can be used.
- the resin according to the present invention is a resin having an ester bond as an essential component, and is provided with a thin film of amine. That is, amine is an essential component in the resin according to the present invention, and the above amine reacts with an ester bond to form an amide bond, whereby an amine film is formed on the surface of the resin, and tack resistance is reduced. Resins with good wear and flexibility can be obtained.
- the amine Since the amine needs to be reacted with an ester bond, it must have an NH bond.
- the amine is a primary amine and / or a secondary amine. Of these, primary amines are preferred because they are more reactive than secondary amines.
- the amine is more preferably a silane coupling agent in order to make it possible to form a laminated film on the thin film. Furthermore, by using a silane coupling agent, the odor peculiar to ammine can be reduced, so that the effect of making the production of the resin according to the present invention easier can also be obtained.
- the primary amine is not particularly limited! /, but the silane coupling agent includes 3 aminopropyltrimethoxysilane, 3 aminopropyltriethoxysilane, N-2 (7 noethyl) 3 Use force S to use aminopropylmethyldimethoxysilane, N-2 (aminoethyl) 3 aminopropyl trifluoromethylsilane, N-2 (aminoethyl) 3 aminopropyltriethoxysilane, and the like.
- the secondary amine is not particularly limited, but as the silane coupling agent, for example, N phenyl-1-3-aminopropyltrimethoxysilane can be used.
- secondary amines other than silane coupling agents include, for example, dimethylamine, N-ethylmethylamine, jetylamine, N-methylpropynylamine, jetylamine, N-methylisopropylamine, N-methylisopropylamine, N-ethylyl.
- the total thickness of the optical waveguide and the amine thin film is preferably 800 m or less. If the amine film becomes thicker, the thickness of the optical waveguide must be reduced.
- the size of the core portion serving as the optical path is determined by the size of the projector and the light receiver.
- the thickness of at least 30 m In order to minimize the optical loss of the core portion, It is necessary to secure a thickness of at least 30 m, and accordingly, it is necessary to secure a heat of at least 50 m for the cladding that covers the core.
- the thickness of the optical waveguide portion is preferably 50,1 m or more and 800 ⁇ m or less, and more preferably 80 ⁇ m or more and 300 ⁇ m or less. Further, the thickness of the amin thin film is preferably 0.01 to 5 m and more preferably 0.05 to 2 m.
- the thin film of the amine should be formed on the surface of the resin. From the viewpoint of reducing tackiness and improving wear resistance, it is preferable that the surface is uniformly formed. However, as long as the effect of reducing tackiness and / or improving wear resistance is obtained, the entire surface is not necessarily formed. It is not necessary for the body to be completely covered with the amine film.
- the “surface” refers to an interface between resin and air. For example, when the resin is in the form of a film, it is more preferable that the resin is formed on both sides as long as a thin film is formed on at least one surface.
- the method for forming the thin film of the amine on the surface of the resin is not particularly limited. It is preferable to form the film by bringing the vapor containing the force S and the amine into contact with the surface of the resin.
- the amine-containing vapor can be generated, for example, by heating and volatilizing the already exemplified amine.
- the amine exemplified above is the glass transition of the resin Since it can be volatilized below the temperature or heat distortion temperature, it can be volatilized at a relatively low temperature, and a thin film can be formed on the surface of the resin. That is, since the resin according to the present invention can be produced at a low temperature, a substrate having low heat resistance can be used. Therefore, the firing temperature is several hundreds like the CVD method. Because it is C, there are no problems that cannot be applied to organic materials, and it can be used with high versatility.
- the method of bringing the amine-containing vapor into contact with the surface of the resin is not particularly limited.
- the resin and the amine are placed in a container having a structure that can be sealed as a whole.
- the container can be heated by putting it in a thermostatic chamber or the like, and the container can be filled with saturated amine vapor, or the amine-containing vapor can be sprayed onto the resin surface. If the vapor contacts the surface of the resin, an amide bond can be formed between the amino group and the ester bond, and as a result, a thin film of the amine can be formed on the surface of the resin.
- the "amin-containing vapor” is preferably a vapor composed of amin, but, for example, a vapor composed of a substance other than ammine, such as a small amount of water vapor, etc. May be included.
- vapor refers to a substance in a gaseous state that can coexist with a liquid state (Rikagaku Dictionary 4th edition, page 603, Iwanami Shoten).
- the amount of amine to be volatilized may be an amount capable of forming a thin film on the surface of the resin.
- an amine having a volume greater than the volume calculated from the surface area of the resin and the suitable thickness of the amine film already described (for example, 0.01 am or more and 5 mm or less, or 0.05 mm or more and 2 m or less) is used. That's fine.
- the upper limit of the amount of amine to be volatilized is not particularly limited. For example, when the reaction is carried out in an airtight container, the amount of amine deposited on the surface of the resin is determined by the saturated vapor pressure, and in principle, the reaction only occurs on the surface layer, so an excessive film is formed. It is very unlikely.
- the resin is immersed in a bath containing a processing solution of the amine and then pulled up at lOcm / min, and then the resin is removed.
- the power S can be cited as a method of immersing and washing in a bath containing isopropyl alcohol, removing the excess film, and drying the resin in a vapor atmosphere of isopropyl alcohol.
- the strong chemical bond between the amine and the ester bond occurs only at the interface of the resin, and the thickly formed film is on the upper part of the thin film. It can be removed by washing.
- the surface-treated resin i.e., the resin having a thin film of ammine formed on the surface is not tacky because the surface is coated with the thin film of ammine even if an uncured resin remains. . Therefore, it does not adhere to the housing during manufacture. Also excellent in wear resistance. Furthermore, since the amine is formed as a thin film, the flexibility of the resin is not impaired.
- the resin according to the present invention has such very excellent characteristics, and as described above, can be produced very easily at low temperatures.
- the presence or absence of amin thin film is determined by methods used for surface analysis, such as FT-IR, transmission electron microscope, scanning electron microscope, X-ray microanalyzer, scanning probe microscope, X-ray photoelectron spectroscopy, X-ray This can be confirmed by analyzing using photoelectron spectroscopy, a color laser microscope, etc.
- FT-IR ATR method
- the power S can be used to confirm the presence or absence of an amin thin film by calculating the difference in absorption spectrum between the resin according to the present invention and an untreated product.
- the film thickness of the amine film can be measured by the above methods, as described above, the possibility that an excessive film is formed on the surface of the resin according to the present invention is extremely low. Therefore, basically, there is little need to measure and manage the film thickness.
- the resin according to the present invention is preferably in the form of a film as described above.
- the amine thin film may be formed after the resin is previously formed into a film.
- a conventionally known molding method can be used as the molding method. For example, methods such as injection molding, extrusion molding, blow molding, vacuum forming, and compression molding can be applied. Further, the film may be cut out from the resin on which the amine thin film is formed.
- the use of the resin according to the present invention is not particularly limited. It can be used as a material for various optical components such as a Renel lens, a lenticular lens, a micro lens, a prism sheet, a light reflecting plate, a light diffusing plate, and a diffraction grating.
- the resin according to the present invention is useful because it can be a material for these optical components even when it is not in a film form, for example, when a film is cut out from a plate-like resin.
- the optical waveguide according to the present invention includes the resin according to the present invention.
- optical waveguides are characterized by being able to bend with a small radius of curvature, especially in small devices such as mobile phones, and with low tackiness and handling! / And excellent wear resistance. Very important. Since the resin according to the present invention has a thin film of amine on the surface, it can satisfy these characteristics and is very useful as a material for an optical waveguide.
- the method for producing an optical waveguide provided with the resin according to the present invention is not particularly limited except that the resin according to the present invention is used as the resin, and a conventionally known method can be used.
- a selective polymerization method, photolithography + RIE method, direct exposure method, bleach method, stamper method and the like can be used.
- the stamper method is particularly preferably used because of its low productivity and low cost.
- FIG. 1 is a process diagram showing a process of forming an optical waveguide by a stamper method.
- a lower clad resin 12a is applied onto a substrate 10 by a known method such as a spin coating method or a doctor blade method, and then the convex stamper 11 is pressed. To do.
- the lower clad portion 2a having the engraved portion 13 of the core portion is formed by photocuring and / or thermosetting in the pressed state (see (B) of FIG. 1 and FIG. 1). (C)).
- the core part 3 is formed by filling the engraved part 13 with the resin 14 for the core part and pressing and curing the flat plate 15 with photocuring and / or thermosetting ( (D) in Figure 1).
- the upper clad part 2b is formed by applying the curable resin composition 12b for the upper clad part and photocuring and / or thermally curing the substrate 16 in a pressed state. 1 (E)), the optical waveguide 1 is completed by removing the substrate ((F) in FIG. 1).
- a transparent substrate such as a glass plate is used when photocuring is performed.
- the tack property was evaluated by a quick stick method. The procedure of this method is shown below. Surfaces with remaining tackiness are attached under no-load conditions. One side was set on the bottom and the other side was set on a tensile tester, and the resistance was measured by pulling at a rate of 30.5 cm / min in the direction of 90 ° to the bottom. Those with no resistance were judged as having no tack, and those with measured resistance were judged as having tack.
- the sample was bent visually so that the radius was 2 mm, and then returned to its original position.
- the sample surface was visually checked for scratches after being repeated 1000 times.
- the sample was subjected to the same test on both the front and back surfaces.
- the surface of the formed thin film was analyzed by FT-IR (ATR method), the difference from the untreated product was calculated, and the presence or absence of the thin film was judged by whether there was a difference.
- PET polyethylene terephthalate
- AH-600 manufactured by Kyoeisha Chemical Co., Ltd.
- Lucillin TPO manufactured by BASF
- PMMA polymethylmegorgelylate
- Example 2 Was used under the same conditions as in Example 1 to obtain a laminated film, which was subjected to a surface treatment.
- a laminated film was obtained under the same conditions as in Example 1 except that octylamine was used in place of ⁇ -aminopropyltrimethoxysilane in Example 1, and the surface treatment was performed.
- a cross-linkable acrylic resin 40 parts by weight of AH-600, 60 parts by weight of 041MA (manufactured by Kyoeisha Chemical Co., Ltd.), and 1 part by weight of photopolymerization initiator Lucillin TPO (manufactured by BASF) are mixed.
- the prepared resin composition ( ⁇ ) was applied.
- Example 2 Surface treatment was carried out under the same conditions as in Example 1 using quartz glass as an adherend instead of ⁇ -600 and PET film in Example 1.
- Example 2 Lamination was carried out under the same conditions as in Example 1 except that ⁇ _Atalyloxypropyl trimethoxysilane ( ⁇ — 5103: manufactured by Shin-Etsu Chemical Co., Ltd.) was used instead of ⁇ - aminopropyltrimethoxysilane in Example 1. A film was obtained and the surface treatment was performed.
- ⁇ _Atalyloxypropyl trimethoxysilane ⁇ — 5103: manufactured by Shin-Etsu Chemical Co., Ltd.
- Example 4 A laminated film was obtained under the same conditions as in Example 1 except that trimethoxysilane (KBM-403: manufactured by Shin-Etsu Chemical Co., Ltd.) was used, and the surface treatment was performed. [0120] As a result, it was confirmed that the surface tackiness remained after the sample was taken out.
- trimethoxysilane KBM-403: manufactured by Shin-Etsu Chemical Co., Ltd.
- the optical waveguide produced using the resin according to the present invention is also excellent in wear resistance and bendability without tackiness.
- the adherend even if quartz glass or polyimide having no ester bond is used as the adherend, an amine film is not formed on the surface. You can't get it. That is, in order to obtain the resin according to the present invention, it is essential that the adherend has an ester bond.
- the resin according to the present invention is a resin having an ester bond as an essential component, and has a structure in which a thin film of amine is provided on the surface.
- an ester bond is formed between the step A of generating a vapor containing amine by volatilizing the amine and the vapor containing the amine. And a step B of forming a thin film of the above amine on the surface of the resin by contacting with the resin as an essential component.
- the resin according to the present invention is a resin having an ester bond as an essential component.
- a thin film of amin is provided on the surface. Therefore, it can be produced at a low temperature and has excellent wear resistance and flexibility without tackiness. Therefore, the resin according to the present invention can be suitably used as a material for optical parts such as an optical waveguide, and can be widely applied to the information and communication industries.
Description
Claims
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP20070829668 EP2082872B1 (en) | 2006-11-16 | 2007-10-12 | Light guide having a surface-treated resin, and production method thereof |
AT07829668T ATE543642T1 (de) | 2006-11-16 | 2007-10-12 | Ein oberflächenbehandeltes harz enthaltende lichtleiter, und verfahren zu dessen herstellung |
US12/439,689 US8183313B2 (en) | 2006-11-16 | 2007-10-12 | Light guide including surface-treated resin |
CN2007800325745A CN101511586B (zh) | 2006-11-16 | 2007-10-12 | 经表面处理的树脂及其制备方法、以及该树脂的用途 |
KR1020097003635A KR101101514B1 (ko) | 2006-11-16 | 2007-10-12 | 표면처리된 수지 및 그 제조 방법, 및 그 이용 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006-310643 | 2006-11-16 | ||
JP2006310643A JP4929998B2 (ja) | 2006-11-16 | 2006-11-16 | 表面処理された樹脂を備える光導波路およびその製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2008059682A1 true WO2008059682A1 (fr) | 2008-05-22 |
Family
ID=39401494
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2007/069932 WO2008059682A1 (fr) | 2006-11-16 | 2007-10-12 | Résine traitée en surface, son procédé de fabrication et son utilisation |
Country Status (7)
Country | Link |
---|---|
US (1) | US8183313B2 (ja) |
EP (1) | EP2082872B1 (ja) |
JP (1) | JP4929998B2 (ja) |
KR (1) | KR101101514B1 (ja) |
CN (1) | CN101511586B (ja) |
AT (1) | ATE543642T1 (ja) |
WO (1) | WO2008059682A1 (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
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US20110277631A1 (en) * | 2009-11-12 | 2011-11-17 | National University Of Singapore | Method for modifying a polyimide membrane |
EP2664635B1 (en) * | 2011-06-13 | 2015-05-20 | DIC Corporation | Radically polymerizable composition, cured product, and plastic lens |
WO2014175856A1 (en) * | 2013-04-22 | 2014-10-30 | Empire Technology Development, Llc | Opto-mechanical alignment |
CN110908234B (zh) * | 2018-08-28 | 2022-08-02 | 深圳光峰科技股份有限公司 | 固化胶及其投影屏幕 |
CN114683448B (zh) * | 2020-12-25 | 2023-12-22 | 光耀科技股份有限公司 | 用于头戴式显示器的光学透镜装置及其制造方法 |
Citations (7)
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JPS5075265A (ja) * | 1973-11-06 | 1975-06-20 | ||
JPS62250037A (ja) * | 1986-04-22 | 1987-10-30 | Toray Ind Inc | エンジニアリングプラスチツク複合体 |
JPH02279736A (ja) * | 1989-04-19 | 1990-11-15 | Neos Co Ltd | ポリエステル表面のフッ素機能化法 |
JPH02279737A (ja) * | 1989-04-19 | 1990-11-15 | Neos Co Ltd | ポリエステル表面のフッ素機能化法 |
JP2003176460A (ja) | 2001-10-01 | 2003-06-24 | Nippon Sheet Glass Co Ltd | 光学部品の接合方法およびプライマー組成物 |
JP2005017431A (ja) | 2003-06-24 | 2005-01-20 | Nikon Corp | フィルタ接合方法 |
JP2006023661A (ja) | 2004-07-09 | 2006-01-26 | Omron Corp | フィルム光導波路及びその製造方法並びにフィルム光導波路用基材 |
Family Cites Families (5)
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DE1521249C3 (de) | 1966-04-29 | 1975-03-06 | Bayer Ag, 5090 Leverkusen | Verfahren zum Oberflächenvergüten von Kunststoffen |
US20030116273A1 (en) | 2001-10-01 | 2003-06-26 | Koichiro Nakamura | Method of bonding an optical part |
WO2003032332A1 (fr) | 2001-10-05 | 2003-04-17 | Bridgestone Corporation | Film transparent electroconducteur, son procede de fabrication, et ecran tactile y relatif |
DE602004004655T8 (de) | 2003-05-26 | 2008-02-14 | Omron Corp. | Härtende harzzusammensetzung, optisches bauteil und lichtwellenleiter |
US7501289B2 (en) * | 2003-12-25 | 2009-03-10 | Fujifilm Corporation | Biosensor |
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2006
- 2006-11-16 JP JP2006310643A patent/JP4929998B2/ja not_active Expired - Fee Related
-
2007
- 2007-10-12 CN CN2007800325745A patent/CN101511586B/zh not_active Expired - Fee Related
- 2007-10-12 WO PCT/JP2007/069932 patent/WO2008059682A1/ja active Application Filing
- 2007-10-12 AT AT07829668T patent/ATE543642T1/de active
- 2007-10-12 KR KR1020097003635A patent/KR101101514B1/ko not_active IP Right Cessation
- 2007-10-12 EP EP20070829668 patent/EP2082872B1/en not_active Not-in-force
- 2007-10-12 US US12/439,689 patent/US8183313B2/en not_active Expired - Fee Related
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JPS5075265A (ja) * | 1973-11-06 | 1975-06-20 | ||
JPS62250037A (ja) * | 1986-04-22 | 1987-10-30 | Toray Ind Inc | エンジニアリングプラスチツク複合体 |
JPH02279736A (ja) * | 1989-04-19 | 1990-11-15 | Neos Co Ltd | ポリエステル表面のフッ素機能化法 |
JPH02279737A (ja) * | 1989-04-19 | 1990-11-15 | Neos Co Ltd | ポリエステル表面のフッ素機能化法 |
JP2003176460A (ja) | 2001-10-01 | 2003-06-24 | Nippon Sheet Glass Co Ltd | 光学部品の接合方法およびプライマー組成物 |
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Also Published As
Publication number | Publication date |
---|---|
KR20090040446A (ko) | 2009-04-24 |
EP2082872A4 (en) | 2010-01-20 |
US20100304153A1 (en) | 2010-12-02 |
ATE543642T1 (de) | 2012-02-15 |
EP2082872B1 (en) | 2012-02-01 |
JP2008126426A (ja) | 2008-06-05 |
CN101511586A (zh) | 2009-08-19 |
KR101101514B1 (ko) | 2012-01-03 |
JP4929998B2 (ja) | 2012-05-09 |
EP2082872A1 (en) | 2009-07-29 |
CN101511586B (zh) | 2012-11-07 |
US8183313B2 (en) | 2012-05-22 |
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