WO2008050941A1 - Quality tester of glass board and method thereof - Google Patents

Quality tester of glass board and method thereof Download PDF

Info

Publication number
WO2008050941A1
WO2008050941A1 PCT/KR2007/002633 KR2007002633W WO2008050941A1 WO 2008050941 A1 WO2008050941 A1 WO 2008050941A1 KR 2007002633 W KR2007002633 W KR 2007002633W WO 2008050941 A1 WO2008050941 A1 WO 2008050941A1
Authority
WO
WIPO (PCT)
Prior art keywords
glass substrate
waveness
shadow image
boundary condition
image
Prior art date
Application number
PCT/KR2007/002633
Other languages
English (en)
French (fr)
Inventor
Bong-Joo Woo
Original Assignee
Semisysco Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Semisysco Co., Ltd. filed Critical Semisysco Co., Ltd.
Priority to CN2007800397368A priority Critical patent/CN101542359B/zh
Priority to JP2009534472A priority patent/JP4971456B2/ja
Publication of WO2008050941A1 publication Critical patent/WO2008050941A1/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/89—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/892—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles characterised by the flaw, defect or object feature examined
    • G01N21/896—Optical defects in or on transparent materials, e.g. distortion, surface flaws in conveyed flat sheet or rod
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/061—Lifting, gripping, or carrying means, for one or more sheets forming independent means of transport, e.g. suction cups, transport frames
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/063—Transporting devices for sheet glass
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1306—Details
    • G02F1/1309—Repairing; Testing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G2201/00—Indexing codes relating to handling devices, e.g. conveyors, characterised by the type of product or load being conveyed or handled
    • B65G2201/02—Articles
    • B65G2201/0214—Articles of special size, shape or weigh
    • B65G2201/022—Flat
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2203/00—Function characteristic
    • G02F2203/69—Arrangements or methods for testing or calibrating a device

Definitions

  • the present invention relates to an apparatus for inspecting the existence of waveness of a glass substrate used to manufacture a thin film transistor (TFT) and a color filter in a thin film transistor liquid crystal display (TFT-LCD).
  • TFT thin film transistor
  • TFT-LCD thin film transistor liquid crystal display
  • a TFT-LCD includes a lower glass substrate on which a thin film transistor is formed, an upper glass substrate on which a color filter is formed, and liquid crystal injected between the lower glass substrate and the upper glass substrate.
  • a conventional technology for inspecting waveness of a glass substrate is performed by radiating light onto a glass substrate with the glass substrate being vertically disposed, slightly tilting the glass substrate from a state parallel to a light source, and inspecting a shadow of the glass substrate displayed on a screen disposed opposite to the glass substrate.
  • a transmissivity difference (or a phase difference of light) is generated between a portion in which waveness exists and a portion in which no waveness exists from the shadow projected onto the screen to display black and white refractions, thereby making it possible for an operator to determine the existence of waveness.
  • an apparatus for inspecting quality of a glass substrate including a conveyance unit for conveying a glass substrate to process equipment, and an inspection unit for inspecting the existence of waveness in the glass substrate in real time, with the glass substrate being conveyed or with the glass substrate being stopped,
  • the inspection unit including: an illumination part for radiating light to transmit through a surface of the glass substrate; an image processing part for photographing a shadow image on the surface of the glass substrate generated by the light transmitting through the glass substrate when the light is transmitted through the glass substrate by the illumination part; and a controller for inspecting the existence of waveness of the surface of the glass substrate from the shadow image photographed by the image processing part.
  • the illumination part may be a xenon lamp (Xe lamp).
  • a slit may be formed in the front of the illumination part to restrict a radiation direction of the illumination to within the glass substrate only.
  • an illumination angle of the illumination radiated onto only the glass substrate through the slit may be within a range of 18-22 .
  • Another aspect of the present invention may be achieved by providing a method implemented by the apparatus for inspecting quality of a glass substrate including: radiating light to a glass substrate by a predetermined angle and obtaining a shadow image of a surface of the glass substrate; waving the obtained shadow image; differentiating the waved shadow image using a differential algorithm to divide the image at equal intervals; adapting a boundary condition of a reference value of flatness of the glass substrate to the shadow image divided into the equal intervals through the differential; detecting the existence of an image departing from the adapted boundary condition to determine the existence of waveness; and selecting the kind of waveness when the waveness exists, as a result of the determination. [19]
  • An apparatus and method for inspecting quality of a glass substrate uses a camera to more clearly photograph a shadow image of a surface of a glass substrate and more precisely inspect the existence of waveness from the shadow image through a differential algorithm. As a result, it is possible to inspect in real time the quality of the glass substrate continuously conveyed by a conveyance unit to thereby improve quality and satisfaction regarding the product. Of course, it is also possible to reduce time consumed to inspect the quality of the glass substrate to thereby rapidly and continuously perform processes using plasma such as deposition, etching, sputtering, and so on.
  • FIG. 1 is a schematic view of an apparatus for inspecting quality of a glass substrate in accordance with an exemplary embodiment of the present invention
  • FIG. 2 is a front view of a slit adapted to an illumination part in accordance with an exemplary embodiment of the present invention
  • FIG. 3 is a schematic plan view showing a process of laterally inspecting quality of a glass substrate in accordance with an exemplary embodiment of the present invention
  • FIG. 4 is a view showing streak type waveness as a kind of waveness inspected by the present invention.
  • FIG. 5 is a view showing thick band type waveness as a kind of waveness inspected by the present invention.
  • FIG. 6 is a view showing cord type waveness as one kind of waveness inspected by the present invention.
  • FIG. 7 is a detection waveform showing a test result of streak type waveness generated in a glass substrate in accordance with an exemplary embodiment of the present invention.
  • FIG. 8 is a detection waveform showing a test result of thick band type waveness generated in a glass substrate in accordance with an exemplary embodiment of the present invention
  • FIG. 9 is a detection waveform showing a test result of cord type waveness generated in a glass substrate in accordance with an exemplary embodiment of the present invention
  • FIG. 10 is a detection waveform showing a test result of streak type waveness and thick band type waveness simultaneously generated in a glass substrate in accordance with an exemplary embodiment of the present invention
  • FIG. 11 is a flowchart showing a method of inspecting quality of a glass substrate in accordance with an exemplary embodiment of the present invention.
  • FIG. 12 is a schematic plan view showing a process of longitudinally inspecting quality of a glass substrate in accordance with another exemplary embodiment of the present invention.
  • FIG. 1 is a schematic view of an apparatus for inspecting quality of a glass substrate in accordance with an exemplary embodiment of the present invention
  • FIG. 2 is a front view of a slit adapted to an illumination part in accordance with an exemplary embodiment of the present invention
  • FIG. 3 is a schematic plan view showing a process of laterally inspecting quality of a glass substrate in accordance with an exemplary embodiment of the present invention.
  • FIG. 4 is a view showing streak type waveness as a kind of waveness inspected by the present invention
  • FIG. 5 is a view showing thick band type waveness as a kind of waveness inspected by the present invention
  • FIG. 6 is a view showing cord type waveness as one kind of waveness inspected by the present invention.
  • FIG. 7 is a detection waveform showing a test result of streak type waveness generated in a glass substrate in accordance with an exemplary embodiment of the present invention
  • FIG. 8 is a detection waveform showing a test result of thick band type waveness generated in a glass substrate in accordance with an exemplary embodiment of the present invention
  • FIG. 9 is a detection waveform showing a test result of cord type waveness generated in a glass substrate in accordance with an exemplary embodiment of the present invention
  • FIG. 10 is a detection waveform showing a test result of streak type waveness and thick band type waveness simultaneously generated in a glass substrate in accordance with an exemplary embodiment of the present invention.
  • the apparatus for inspecting quality of a glass substrate in accordance with an exemplary embodiment of the present invention is installed in front of a gate valve of an inlet side of process equipment during processes such as deposition, etching, sputtering, and so on, for manufacturing a TFT-LCD using plasma, in order to inspect in real time the existence of waveness of a glass substrate 2 conveyed by a conveyance unit 1 in an in- situ inspection manner, or inspect the waveness when the glass substrate 2 is stopped.
  • the apparatus includes an illumination part 10, an image processing part 20, and an inspection unit including a controller 30.
  • the illumination part 10 is a xenon lamp for radiating light to transmit through a surface of the glass substrate 2, which is installed at a predetermined angle under the conveyance unit 1 having a roller for conveying the glass substrate 2.
  • a slit 11 is formed in the front of the illumination unit 10 to radiate light onto a surface of the glass substrate 2 only.
  • the image processing unit 20 is a charge coupled device (CCD) camera, which is disposed over the conveyance unit 1 to photograph a shadow image of the surface of the glass substrate 2 generated from light passing through the surface of the glass substrate 2 when light is transmitted through the surface of the glass substrate 2 by the illumination unit 10.
  • CCD charge coupled device
  • the controller 30 controls the illumination unit 10 and the image processing part
  • a memory is installed in the controller 10 to store a reference value for adapting boundary conditions S and S' of flatness of the glass substrate 2.
  • the glass substrate 2 is conveyed to or stopped at, by a multi-stage conveyance unit 1 having rollers, the process equipment for manufacturing a TFT-LCD through processes such as deposition, etching, sputtering, and so on, using plasma.
  • the illumination part 10 generally a xenon lamp, having the slit 11 formed in the front thereof is installed at a predetermined angle , for example 20°under the conveyance unit 1.
  • a predetermined angle for example 20°under the conveyance unit 1.
  • light can be radiated onto only the surface of the glass substrate 3 through the slit 11 to be transmitted to an opposite surface thereof.
  • the shadow image is represented by the illumination transmitted through the upper surface of the glass substrate 2, photographed by the image processing part 20, i.e., the CCD camera, disposed over the conveyance unit 1, and then transmitted to the controller 30.
  • the controller 30 waves the photographed shadow image, differentiates the shadow image at equal intervals through a differential algorithm, and adapts boundary conditions S and S' of a reference value of flatness of the glass substrate 2 from the waved shadow image, thereby detecting whether an image departing from the adapted boundary conditions S and S' exists. As a result, it is possible to determine the existence of waveness and the kind of waveness.
  • the controller 30 calculates the number of the differentiated images deviated from the region of the predetermined boundary conditions to inspect, as shown in FIGS. 4 to 10, whether streak type waveness, thick band type waveness, or cord type waveness is generated on the surface of the glass substrate 2.
  • the controller 30 counts the equal intervals of the differentiated shadow images deviated from the boundary conditions S and S' when some of the differentiated and equally divided shadow image sections deviate from the predetermined boundary conditions S and S'
  • the controller 30 determines that the streak type waveness is generated on the surface of the glass substrate 2.
  • the controller 30 determines that the thick band type waveness is generated on the surface of the glass substrate 2.
  • the controller 30 determines that the cord type waveness is generated on the surface of the glass substrate 2.
  • the controller 30 determines that the streak type waveness and the thick band type waveness are generated on the surface of the glass substrate 2.
  • FIG. 11 is a schematic plan view showing a process of longitudinally inspecting quality of a glass substrate in accordance with another exemplary embodiment of the present invention.
  • one stage is removed from a multi-stage conveyance unit 1 including rollers for conveying a glass substrate 2, and an inspection unit 100 including an illumination part 10, an image processing part 20, and a controller 30 is installed at the removed part in a longitudinal direction thereof. Therefore, it is also possible to detect the existence of waveness in a longitudinal direction of the glass substrate 2.
  • the apparatus and method can detect the existence of waveness on the surface of the glass substrate 2 in both lateral and longitudinal directions thereof, thereby more precisely performing quality inspection of the glass substrate.
  • an apparatus and method in accordance with the present invention use a camera in order to more clearly photograph a shadow image of a surface of a glass substrate, thereby making it possible to more precisely inspect the existence of waveness and the kind of waveness, depending on the shadow image, through a differential algorithm.

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Textile Engineering (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Nonlinear Science (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
PCT/KR2007/002633 2006-10-27 2007-05-30 Quality tester of glass board and method thereof WO2008050941A1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN2007800397368A CN101542359B (zh) 2006-10-27 2007-05-30 玻璃衬底的质量测试机及其方法
JP2009534472A JP4971456B2 (ja) 2006-10-27 2007-05-30 ガラス基板の品質検査装置及びその検査方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR20060105240A KR100838655B1 (ko) 2006-10-27 2006-10-27 유리기판의 품질 검사장치 및 그 검사방법
KR10-2006-0105240 2006-10-27

Publications (1)

Publication Number Publication Date
WO2008050941A1 true WO2008050941A1 (en) 2008-05-02

Family

ID=39324710

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2007/002633 WO2008050941A1 (en) 2006-10-27 2007-05-30 Quality tester of glass board and method thereof

Country Status (5)

Country Link
JP (1) JP4971456B2 (ko)
KR (1) KR100838655B1 (ko)
CN (1) CN101542359B (ko)
TW (1) TWI329200B (ko)
WO (1) WO2008050941A1 (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011523701A (ja) * 2008-05-19 2011-08-18 セミシスコ・カンパニー・リミテッド 基板の品質検査装置及びその検査方法

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9080986B2 (en) * 2010-02-15 2015-07-14 Ricoh Company, Ltd. Transparent object detection system and transparent flat plate detection system
KR200461687Y1 (ko) 2010-09-09 2012-07-30 (주)쎄미시스코 다단의 기판 투입 게이트를 가지는 기판 품질 검사장치
CN103185662B (zh) * 2011-12-30 2015-09-09 信义汽车玻璃(深圳)有限公司 汽车钢化玻璃水波纹检测支架和系统、以及检测方法
KR101316039B1 (ko) * 2012-05-02 2013-10-10 (주)쎄미시스코 수광장치와 이를 이용한 기판 품질검사장치
JPWO2022224636A1 (ko) * 2021-04-22 2022-10-27
KR20240028785A (ko) 2022-08-25 2024-03-05 주식회사 큐빅셀 유리기판의 단면 검사 장치 및 이를 이용한 검사 방법

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08136239A (ja) * 1994-11-11 1996-05-31 Adomon Sci Kk 検査装置及び検査方法
JP2004219108A (ja) * 2003-01-09 2004-08-05 Dainippon Printing Co Ltd 着色膜の膜厚ムラ検査方法及び装置
JP2005083906A (ja) * 2003-09-09 2005-03-31 Asahi Kasei Engineering Kk 欠陥検出装置

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56166452A (en) * 1980-05-27 1981-12-21 Nippon Sheet Glass Co Ltd Detecting method for distortion defect of transparent plate
JPH0283438A (ja) * 1988-09-21 1990-03-23 Nissan Motor Co Ltd 透明板表面の付着物等評価装置
CN1016101B (zh) * 1989-09-22 1992-04-01 中国新型建筑材料工业杭州设计研究院 浮法玻璃缺陷在线自动检测装置
FR2663744B1 (fr) * 1990-06-25 1993-05-28 Saint Gobain Vitrage Int Procede et dispositif de mesure de la qualite optique d'un vitrage.
JPH05272949A (ja) * 1992-03-30 1993-10-22 Nippon Sheet Glass Co Ltd ガラス板表面評価方法
JPH07306152A (ja) * 1994-03-16 1995-11-21 Sekisui Chem Co Ltd 光学的歪検査装置
JP3668294B2 (ja) * 1995-08-22 2005-07-06 オリンパス株式会社 表面欠陥検査装置
JP4385419B2 (ja) * 1998-11-30 2009-12-16 株式会社ニコン 外観検査方法及び外観検査装置
KR20010055184A (ko) * 1999-12-09 2001-07-04 구자홍 유리기판의 패턴 검사용 광학 장치
JP2001201429A (ja) * 2000-01-18 2001-07-27 Mitsubishi Chemicals Corp 検査基体の欠陥検査方法および装置
JP2002310925A (ja) * 2001-04-18 2002-10-23 Corning Japan Kk 板材検査方法および板材検査装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08136239A (ja) * 1994-11-11 1996-05-31 Adomon Sci Kk 検査装置及び検査方法
JP2004219108A (ja) * 2003-01-09 2004-08-05 Dainippon Printing Co Ltd 着色膜の膜厚ムラ検査方法及び装置
JP2005083906A (ja) * 2003-09-09 2005-03-31 Asahi Kasei Engineering Kk 欠陥検出装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011523701A (ja) * 2008-05-19 2011-08-18 セミシスコ・カンパニー・リミテッド 基板の品質検査装置及びその検査方法

Also Published As

Publication number Publication date
KR20080037927A (ko) 2008-05-02
TW200819736A (en) 2008-05-01
KR100838655B1 (ko) 2008-06-16
CN101542359B (zh) 2012-11-07
JP4971456B2 (ja) 2012-07-11
CN101542359A (zh) 2009-09-23
JP2010507801A (ja) 2010-03-11
TWI329200B (en) 2010-08-21

Similar Documents

Publication Publication Date Title
WO2008050941A1 (en) Quality tester of glass board and method thereof
KR100399507B1 (ko) 반사표면코팅부에있는결함을인식평가하는방법
US7412088B2 (en) Inspection method, and inspection device, and manufacturing for display panel
WO2006093381A1 (en) Apparatus and method for inspecting edge defect and discoloration of glass substrate
JP2006250715A (ja) フイルムの欠陥検査装置及び方法
TW201610418A (zh) 偏光薄膜缺陷監測方法
US20190107500A1 (en) Apparatus and method for testing conductivity of graphene
JP2004219108A (ja) 着色膜の膜厚ムラ検査方法及び装置
KR20190013600A (ko) 광학필름 결함 검출 장치 및 광학필름 결함 검출 방법
JP2015004674A (ja) 光学フィルムの欠陥判別方法
KR20080098852A (ko) 얼룩 결함 검사 장치와 방법, 및 평판 디스플레이 패널의제조 방법
WO2009142346A1 (en) Glass waviness inspection device and inspection method thereof
TWI697664B (zh) 透過雷射結晶設備的雲紋量化系統及透過雷射結晶設備的雲紋量化方法
JP2008096314A (ja) マクロ検査装置
JP2006078426A (ja) 欠陥検査装置、欠陥検査方法
WO2012070723A1 (ko) 유리 기판의 불균일도 측정 시스템 및 방법
KR100953202B1 (ko) 유리기판 품질 검사장치의 조명부 광원 조절 구조
JP2009236826A (ja) 欠陥検出装置及び方法
JP4650096B2 (ja) 塗布ムラ検査方法及びそのプログラム
US8045150B2 (en) Semiconductor wafer inspection method
KR20140088789A (ko) 광학 필름 검사 장치
TWI697663B (zh) 透過使用紫外線之雷射結晶設備的雲紋量化系統及透過使用紫外線之雷射結晶設備的雲紋量化方法
WO2018120611A1 (zh) 动态彩色滤光片巨观检查系统及方法
KR102284293B1 (ko) 불투명 영역을 포함하는 대상물의 불량을 검사하는 검사 장치 및 방법
KR102164115B1 (ko) 표면 측정 장치, 이를 포함하는 소둔설비 및 표면 측정 방법

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 200780039736.8

Country of ref document: CN

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 07746780

Country of ref document: EP

Kind code of ref document: A1

ENP Entry into the national phase

Ref document number: 2009534472

Country of ref document: JP

Kind code of ref document: A

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 07746780

Country of ref document: EP

Kind code of ref document: A1