WO2007139072A1 - Snめっきの耐熱剥離性に優れるCu-Zn系合金条及びそのSnめっき条 - Google Patents
Snめっきの耐熱剥離性に優れるCu-Zn系合金条及びそのSnめっき条 Download PDFInfo
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- WO2007139072A1 WO2007139072A1 PCT/JP2007/060838 JP2007060838W WO2007139072A1 WO 2007139072 A1 WO2007139072 A1 WO 2007139072A1 JP 2007060838 W JP2007060838 W JP 2007060838W WO 2007139072 A1 WO2007139072 A1 WO 2007139072A1
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C1/00—Making non-ferrous alloys
- C22C1/06—Making non-ferrous alloys with the use of special agents for refining or deoxidising
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C13/00—Alloys based on tin
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C9/00—Alloys based on copper
- C22C9/04—Alloys based on copper with zinc as the next major constituent
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
- C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
- C22F1/08—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of copper or alloys based thereon
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/48—After-treatment of electroplated surfaces
- C25D5/50—After-treatment of electroplated surfaces by heat-treatment
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/06—Wires; Strips; Foils
- C25D7/0614—Strips or foils
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12431—Foil or filament smaller than 6 mils
- Y10T428/12438—Composite
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12708—Sn-base component
- Y10T428/12715—Next to Group IB metal-base component
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12861—Group VIII or IB metal-base component
- Y10T428/12903—Cu-base component
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12861—Group VIII or IB metal-base component
- Y10T428/12903—Cu-base component
- Y10T428/1291—Next to Co-, Cu-, or Ni-base component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
- Y10T428/2495—Thickness [relative or absolute]
- Y10T428/24967—Absolute thicknesses specified
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
- Y10T428/264—Up to 3 mils
- Y10T428/265—1 mil or less
Definitions
- the present invention relates to a Cu—Zn alloy strip that is suitable as a conductive material such as a connector, a terminal, a relay, and a switch and that has excellent heat resistance peelability for Sn plating, and its Sn plating strip.
- Cu-Zn alloys are widely used as electrical contact materials for connectors, terminals, relays, switches and the like because they are less expensive than phosphor bronze, beryllium copper, Corson alloys, etc., but are inexpensive.
- a typical Cu-Zn alloy is brass, and alloys such as C2600 and C2680 are defined in JIS H3100.
- Sn plating is often applied to obtain low contact resistance stably.
- Cu—Zn alloy Sn plating strips make use of Sn's excellent solder wettability, corrosion resistance, and electrical connectivity, and are used for automotive wiring harness terminals, printed circuit board (PCB) terminals, and consumer connector contacts. Used in large quantities for electrical and electronic parts such as!
- thermal peeling a phenomenon in which the plating layer peels from the base material.
- Addition of Zn to the copper alloy improves the thermal debonding characteristics. Therefore, the heat-resistant peelability of the Cu—Zn alloy is relatively good.
- Cu-Zn-based alloy Cu plating is generally used for Sn plating strips, and Cu / Ni double-layer coating may be applied for applications that require heat resistance.
- Cu / Ni double-layer plating is a plating that has been subjected to reflow treatment after electrical plating in the order of Ni coating, Cu coating, and Sn plating.
- the composition of the layer is Sn, Cu-Sn, Ni, and base material from the surface. Details of this technique are disclosed in Patent Documents 1 to 3 and the like.
- Patent Document 1 JP-A-6-196349
- Patent Document 2 Japanese Patent Laid-Open No. 2003-293187
- Patent Document 3 Japanese Patent Application Laid-Open No. 2004-68026
- the inventor has intensively studied measures for improving the heat-resistant peelability of reflow Sn-plated strips of Cu-Zn alloys. As a result, it was found that by controlling the concentrations of S, ⁇ , P, As, Sb, Bi, Ca, and Mg, the heat-resistant peelability can be greatly improved.
- the present invention has been made based on this discovery and is as follows.
- the Cu-Zn alloy strip of (1) or (2) is used as the base material, and the plating film is composed of the Sn phase, Sn-Cu alloy phase, and Cu phase layers from the surface to the base material.
- the thickness of the phase is 0.;! ⁇ 1.5 ⁇ m, the thickness of the Sn—Cu alloy phase is 0 ⁇ ! ⁇ 1 ⁇ ⁇ ⁇ ⁇ ⁇ ⁇
- the thickness of the Cu phase is 0 ⁇ 0.8 m Cu-Zn alloy Sn plating strip with excellent heat-resistant peelability.
- the plating film is composed of the Sn phase, Sn-Cu alloy phase, and Ni phase layers from the surface to the base material.
- Phase thickness is 0.;! ⁇ 1.5 ⁇ m, Sn—Cu Alloy Thickness Strength 0.1— 1. ⁇ ⁇ ⁇ ⁇ Ni Thickness Thickness Strength 0.1—0.8 m Zn-based alloy Sn plating strip.
- the Sn plating of Cu-Zn alloy can be performed before pressing the part (pre-plating) and after pressing (post-plating). Is obtained.
- FIG. 1 A profile in the depth direction of the copper concentration of the sample of Invention Example 23 (Table 2, Cu undercoat).
- the present invention is intended for a copper alloy containing 15 to 40% by mass of Zn, and the effect of the invention is not exhibited for a copper alloy in which Zn is out of this range.
- Brass is mentioned as a copper alloy containing 15 to 40% by mass of Zn.
- yellow powers such as C2600, C2680, and C2720 are specified. Beyond Zn force 40 mass 0/0, and manufacturability is deteriorated, lowering the greater conductivity. If the Zn content is less than 15% by mass, the strength will be insufficient. Preferably it is 27-38 mass%.
- the alloy of the present invention further includes Sn, Ni, Si, Fe, Mn, Co, Ti, Cr, Zr, Al, and Ag for the purpose of improving the strength, heat resistance, stress relaxation resistance, etc. of the alloy.
- One or more of the above can be added in a total amount of 0 ⁇ 01-5.0% by mass.
- the addition of alloy elements may lead to a decrease in electrical conductivity, a decrease in manufacturability, an increase in raw material costs, and so on, so this must be taken into consideration.
- the total amount of these elements is less than 0.01% by mass, the effect of improving the characteristics is not exhibited.
- the total amount of the above elements exceeds 5.0% by mass, the decrease in conductivity becomes significant. Therefore, the total amount is defined as 0.01-5.0 mass%. Preferably it is 0.;!-3.0 mass%.
- VB group P, As, Sb and Bi are elements that promote thermal exfoliation by concentrating at the interface between the plating and the base metal. Therefore, the total concentration is regulated to 100 mass ppm or less. A more preferred concentration is 5 mass ppm or less.
- P is an element often used as a deoxidizer and alloying element for copper alloys. For example, as shown in JP-A-60-86230, P should be added to a Cu-Zn alloy to improve its characteristics. There is also. In order to keep the P concentration low, it is necessary not to add P as a deoxidizer or alloy element, but also to not use copper alloy scrap containing P as a raw material.
- Sb, and Bi are typical impurities contained in electrolytic copper, which is a main raw material for copper products. In order to keep these concentrations low, it is necessary to avoid the use of low-grade electrolytic copper.
- the lower limit of the total concentration of P, As, Sb, and Bi is not particularly restricted, but if you try to lower it to less than 1 mass p pm, a great deal of cost is required. Usually it is.
- Mg and Ca as elements that promote thermal separation by concentrating at the interface between the plating and the base metal. Therefore, the total concentration of Mg and Ca is regulated to 100 mass ppm or less. More preferred! /, Concentration is less than 5 ppm by mass.
- Mg is an element often used as a deoxidizer and alloying element for copper alloys.
- Mg has a remarkable effect on stress relaxation properties, so it is often used as an additive component.
- it is necessary not to add Mg as a deoxidizer or alloy element, but also to not use copper alloy scrap containing Mg as a raw material.
- Ca is an element that is likely to be mixed from a refractory, a molten metal coating, or the like when a Cu-Zn alloy is melted. It is important to use materials that do not contain Ca as materials that come into contact with the molten metal.
- the lower limit of the total concentration of Mg and Ca is not particularly restricted, it is becoming more than 0.5 mass ppm because it requires a great deal of cost to reduce it to less than 0.5 mass ppm. It is normal.
- Each concentration of O and S is regulated to 30 mass ppm or less. If any concentration exceeds 30 mass pp m, the heat-resistant peelability of the Sn plating deteriorates.
- it is effective to coat the molten metal surface with charcoal during ingot production. In this case, if moisture is adsorbed on the charcoal, this moisture becomes a source of oxygen contamination, so it is important to use charcoal that is sufficiently dry.
- the charcoal coating is composed of chloride, fluoride, etc. If a salt coating is used in combination, the molten metal is cut off from the atmosphere, so a higher deoxidation effect can be obtained.
- a desulfurizing agent such as CO can be added to the molten metal to remove S contained in the molten metal.
- a Cu plating layer and a Sn plating layer are sequentially formed on the Cu-Zn alloy base material by electric plating, and then reflow treatment is performed.
- the Cu plating layer reacts with the Sn plating layer to form a Sn—Cu alloy phase, and the plating layer structure becomes Sn phase, Sn—Cu alloy phase, and Cu phase from the surface side.
- the solder wettability decreases, and when it exceeds 1.5 111, the thermal stress generated inside the adhesion layer when heated is increased, and the plating peeling is promoted.
- the more preferred range is 0 ⁇ 2 ⁇ ; L O ⁇ m.
- the Sn—Cu alloy phase Since the Sn—Cu alloy phase is hard, if it exists in a thickness of 0.1 ⁇ m or more, it contributes to a reduction in soot input. On the other hand, when the thickness of the Sn—Cu alloy phase exceeds 1.5 m, the thermal stress generated inside the adhesion layer when heated increases, and the plating peeling is promoted. A more preferable thickness is 0 • 5 to .2 m.
- solder wettability is improved by performing Cu undercoating. Therefore, it is necessary to apply Cu grounding of 0.1 m or more during electrodeposition.
- This Cu base coating may be consumed and lost during Sn-Cu alloy phase formation during reflow. That is, the lower limit value of the Cu phase thickness after reflow is not regulated, and the thickness may be zero.
- the upper limit of the thickness of the Cu phase is set to 0 ⁇ 8 Hm or less in the state after reflow. If it exceeds 0.8 jm, the thermal stress generated inside the adhesion layer when heated is increased, and plating peeling is promoted.
- a more preferable Cu phase thickness is 0.4 m or less.
- the thickness of each plating at the time of electrical plating is set to 0 for Sn plating.
- a Ni plating layer, a Cu plating layer, and a Sn plating layer are sequentially formed on the Cu-Zn alloy base material by electric plating, and then reflow treatment is performed.
- reflow treatment Cu plating reacts with Sn to become Sn-Cu alloy phase, and Cu phase disappears.
- the Ni layer remains in a state where the thickness immediately after the electroplating is maintained. As a result, the structure of the plating layer becomes Sn phase, Sn—Cu alloy phase, and Ni phase from the surface side.
- the solder wettability decreases, and when it exceeds 1.5 111, the thermal stress generated inside the adhesion layer when heated is increased, and the plating peeling is promoted.
- a more preferred range is 0 ⁇ 2 ⁇ ; L O ⁇ m.
- the Sn-Cu alloy phase Since the Sn-Cu alloy phase is hard, if it exists with a thickness of 0.1 m or more, it contributes to a reduction in the input power. On the other hand, when the thickness of the Sn—Cu alloy phase exceeds 1.5 m, the thermal stress generated inside the adhesion layer when heated increases, and the plating peeling is promoted. More preferred thickness is 0
- the thickness of the Ni phase is 0 ⁇ ;! ⁇ 0 ⁇ 8 ⁇ m. If the Ni thickness is less than 0 ⁇ 1 m, the corrosion resistance and heat resistance will decrease. When the Ni thickness exceeds 0.8 m, the thermal stress generated in the adhesion layer when heated is increased, and plating peeling is promoted. More preferable N ⁇ thickness is 0
- the thickness of each plating at the time of electroplating is in the range of 0.5 to 1.8 nm for Sn plating, Cu plating (or 0.1 to 0.4 m, Ni plating) (Make appropriate adjustment in the range of 0.1 to 0.8 ⁇ m, and perform reflow treatment under appropriate conditions in the range of 230 to 600 ° C and 3 to 30 seconds.
- Electrolysis was performed in a copper nitrate bath using commercially available electrolytic copper as an anode, and high-purity copper was deposited on a force sword.
- the P, As, Sb, Bi, Ca, Mg, and S concentrations in this high purity copper were all less than 1 ppm by mass.
- this high purity copper was used as an experimental material.
- the molten metal was poured into a mold to produce an ingot having a width of 60 mm and a thickness of 30 mm, and processed into a Cu underlayer reflow Sn plating material and a Cu / Ni underlayer reflow Sn plating material in the following steps.
- Step 1 After heating at 800 ° C. for 3 hours, hot rolling to a thickness of 8 mm.
- Step 2 Remove the oxidized scale on the surface of the hot rolled sheet with a grinder.
- Step 4 Heat at 400 ° C for 30 minutes as recrystallization annealing.
- Step 5 Pick up with 10% sulfuric acid-1% hydrogen peroxide solution and mechanical polishing with # 1200 emery paper in order to remove the surface oxide film.
- Step 7 Heat at 400 ° C for 30 minutes as recrystallization annealing.
- Step 8 Pickle with 10% sulfuric acid 1% hydrogen peroxide solution to remove the surface oxide film.
- Step 10 Perform electrolytic degreasing under the following conditions using a sample as a force sword in an alkaline aqueous solution. Current density: 3A / dm 2.
- Degreasing agent Trademark “Pakuna P105” manufactured by Yuken Industry Co., Ltd. Degreasing agent concentration:
- Step 11 Pickling using a 10 mass% sulfuric acid aqueous solution.
- Plating bath composition nickel sulfate 250g / L, nickel chloride 45g / L, boric acid 30g / L.
- Ni plating thickness is adjusted by electrodeposition time.
- Plating bath composition copper sulfate 200g / L, sulfuric acid 60g / L.
- Step 14 Apply Sn plating under the following conditions.
- 'Plating bath composition stannous oxide 41g / L, phenolsulfonic acid 268g / L, surfactant 5g / L.
- Step 15 As a reflow treatment, put the sample in a heating furnace adjusted to 400 ° C and nitrogen (oxygen lvol% or less) for 10 seconds and cool with water.
- Zn and Sn concentrations are measured by I CP emission spectroscopy, and P, As, Sb, Bi, Ca, Mg and S concentrations are determined by ICP mass spectrometry, and O The concentration was measured by an inert gas melting infrared absorption method.
- the concentration profiles of Sn, Cu, and Ni in the depth direction were determined by GDS (Glow Discharge Optical Emission Spectrometer). The measurement conditions are as follows.
- Fig. 1 shows the data of Invention Example 23 (Table 2, Cu base coating), which will be described later, as a typical concentration profile by GDS.
- Table 2 Cu base coating
- the thickness of this layer was read as the Cu phase thickness.
- the thickness of the Ni base plating (Ni phase) was determined from the Ni concentration profile data.
- Strip specimens with a width of 10 mm were collected and heated to a temperature of 105 ° C or 150 ° C up to 3000 hours in the atmosphere. In the meantime, the sample was taken out of the heating furnace every 100 hours and subjected to 90 ° bending and bending back with a bending radius of 0.5 mm (90 ° bending was performed once and again). Then, the surface of the inner periphery of the sample was observed with an optical microscope (magnification 50 times) to examine the presence or absence of plating peeling.
- the Cu / Ni underlaying material electroplating is performed at 400 ° C with a Ni thickness of 0.2 ⁇ 111, a Cu thickness of 0.3 mm, and a Sn thickness of 0.8 m.
- the Sn phase thickness was about 0.4 ⁇ 111 and the Cu-Sn alloy phase was about 1 m in all invention examples and comparative examples.
- the Cu phase disappeared and the Ni phase disappeared. Remained in the thickness (0 ⁇ 2 m) at the time of electrodeposition.
- Mg and Ca concentrations are changed under conditions where the P, As, Sb, Bi, S, and O concentrations are low.
- the stripping time at 105 ° C is less than 3000 hours regardless of whether the substrate is Cu or Cu / Ni.
- shortening of the peeling time is not observed at 150 ° C, and the adverse effects of Mg and Ca are more prominent at 105 ° C.
- Comparative Examples 6 and 7 are alloys in which S and O exceed 30 mass ppm, respectively. In both cases, the peel-off time of 105 ° C and 150 ° C is less than 3000 hours regardless of whether the substrate is Cu or Cu / Ni.
- Inventive Examples 10 to 13 are the force S that changes the Zn concentration within the scope of the present invention, and in any case, plating peeling does not occur after 3000 hours.
- Inventive Examples 14 to 20 are small examples selected from the group consisting of Sn, Ni, Si, Fe, Mn, Co, Ti, Cr, Zr, Al, and Ag within the scope of the present invention. Even if at least one kind is added, the strength is V, the displacement is! /, But no plating peeling occurs after 3000 hours.
- Tables 2 and 3 show examples in which the effect of plating thickness on heat-resistant peelability was investigated.
- the base material composition is Cu—30.0% by mass21, the total concentration of P, As, Sb, and Bi is 3.2 mass ppm, the total concentration of Mg and Ca is 2.1 mass ppm, the O concentration is 18 mass ppm, and the S concentration is 12 Mass at p pm.
- the electrodeposition thickness of the Cu base was set to 0.8 111, and the thickness of Sn was changed.
- the Sn electrodeposition thickness was 2.0 m and reflow was performed under the same conditions as the others, the thickness of the Sn phase after reflow exceeded 1.5 mm.
- Comparative Example 9 in which the Sn electrodeposition thickness was 2.0 m and the reflow time was extended, the Sn—Cu alloy phase thickness after reflow exceeded 1.5 111.
- the peeling time was less than 3000 hours at both 105 ° C and 150 ° C.
- Table 3 shows data for Cu / Ni undercoat.
- Invention Examples 29 to 35 which are the alloys of the present invention, plating peeling occurred even after heating for 3,000 hours at 105 ° C and 150 ° C.
- the electrodeposition thickness of Sn was set to 0.9 ⁇ ⁇ Cu, and the thickness of the Ni underlayer was changed to 0.2111.
- the stripping time was less than 3000 hours at both 105 ° C and 150 ° C.
- the electrodeposition thickness of the Cu underlayer was set to 0. ⁇ ⁇ Ni, and the thickness of Sn was varied.
- the peeling time was below 3000 hours at both 105 ° C and 150 ° C.
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Abstract
Description
Claims
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2007800194715A CN101454468B (zh) | 2006-05-29 | 2007-05-28 | Sn镀层的耐热剥离性优异的Cu-Zn类合金条及其镀Sn条 |
| US12/227,765 US7972709B2 (en) | 2006-05-29 | 2007-05-28 | Cu-Zn alloy strip superior in thermal peel resistance of Sn plating and Sn plating strip thereof |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006148597A JP2007314859A (ja) | 2006-05-29 | 2006-05-29 | Snめっきの耐熱剥離性に優れるCu−Zn系合金条及びそのSnめっき条 |
| JP2006-148597 | 2006-05-29 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2007139072A1 true WO2007139072A1 (ja) | 2007-12-06 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP2007/060838 Ceased WO2007139072A1 (ja) | 2006-05-29 | 2007-05-28 | Snめっきの耐熱剥離性に優れるCu-Zn系合金条及びそのSnめっき条 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US7972709B2 (ja) |
| JP (1) | JP2007314859A (ja) |
| KR (1) | KR101081779B1 (ja) |
| CN (1) | CN101454468B (ja) |
| WO (1) | WO2007139072A1 (ja) |
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| JP2011127153A (ja) * | 2009-12-16 | 2011-06-30 | Autonetworks Technologies Ltd | めっき材料とその製造方法 |
| WO2019097846A1 (ja) * | 2017-11-15 | 2019-05-23 | Jx金属株式会社 | 耐食性CuZn合金 |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4522970B2 (ja) * | 2006-04-26 | 2010-08-11 | 日鉱金属株式会社 | ウィスカーが抑制されたCu−Zn合金耐熱Snめっき条 |
| JP5339995B2 (ja) * | 2009-04-01 | 2013-11-13 | Jx日鉱日石金属株式会社 | Cu−Zn−Sn系合金板及びCu−Zn−Sn系合金Snめっき条 |
| JP5742621B2 (ja) * | 2011-09-20 | 2015-07-01 | 三菱マテリアル株式会社 | 銅合金及び鋳造品 |
| CN102443717B (zh) * | 2012-01-10 | 2015-04-15 | 宁波金田铜业(集团)股份有限公司 | 一种低成本弹性黄铜合金 |
| JP6029296B2 (ja) * | 2012-03-08 | 2016-11-24 | Jx金属株式会社 | 電気電子機器用Cu−Zn−Sn−Ca合金 |
| PL2906733T3 (pl) * | 2012-10-10 | 2017-11-30 | Kme Germany Gmbh & Co. Kg | Materiał na elektryczne elementy stykowe |
| JP6304864B2 (ja) * | 2013-03-18 | 2018-04-04 | 三菱マテリアル株式会社 | 電子・電気機器用銅合金、電子・電気機器用銅合金薄板、電子・電気機器用導電部品及び端子 |
| CN107354340A (zh) * | 2017-09-14 | 2017-11-17 | 安徽天大铜业有限公司 | 一种用于电缆铜芯的铜合金 |
| DE102018100440A1 (de) * | 2018-01-10 | 2019-07-11 | Phoenix Contact Gmbh & Co. Kg | Verfahren zum Herstellen eines kaltverformbaren Crimpkontakts, Verfahren zum Herstellen einer elektromechanischen Crimpverbindung und Crimpkontakt |
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| JP4522970B2 (ja) * | 2006-04-26 | 2010-08-11 | 日鉱金属株式会社 | ウィスカーが抑制されたCu−Zn合金耐熱Snめっき条 |
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- 2007-05-28 CN CN2007800194715A patent/CN101454468B/zh not_active Expired - Fee Related
- 2007-05-28 US US12/227,765 patent/US7972709B2/en not_active Expired - Fee Related
- 2007-05-28 WO PCT/JP2007/060838 patent/WO2007139072A1/ja not_active Ceased
- 2007-05-28 KR KR1020087030099A patent/KR101081779B1/ko active Active
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| JPH1025562A (ja) * | 1996-07-11 | 1998-01-27 | Dowa Mining Co Ltd | 銅基合金およびその製造方法 |
| JP2004068026A (ja) * | 2001-07-31 | 2004-03-04 | Kobe Steel Ltd | 接続部品用導電材料及びその製造方法 |
| JP2005226097A (ja) * | 2004-02-10 | 2005-08-25 | Kobe Steel Ltd | 電気・電子部品用錫めっき銅合金材及びその製造方法 |
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| JP2011127153A (ja) * | 2009-12-16 | 2011-06-30 | Autonetworks Technologies Ltd | めっき材料とその製造方法 |
| WO2019097846A1 (ja) * | 2017-11-15 | 2019-05-23 | Jx金属株式会社 | 耐食性CuZn合金 |
| US12006563B2 (en) | 2017-11-15 | 2024-06-11 | Jx Metals Corporation | Corrosion resistant CuZn alloy |
Also Published As
| Publication number | Publication date |
|---|---|
| CN101454468A (zh) | 2009-06-10 |
| KR20090010237A (ko) | 2009-01-29 |
| KR101081779B1 (ko) | 2011-11-09 |
| CN101454468B (zh) | 2011-06-08 |
| US20090239094A1 (en) | 2009-09-24 |
| US7972709B2 (en) | 2011-07-05 |
| JP2007314859A (ja) | 2007-12-06 |
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