WO2007125589A1 - プラズマディスプレイパネルおよびその製造に用いる成膜装置 - Google Patents
プラズマディスプレイパネルおよびその製造に用いる成膜装置 Download PDFInfo
- Publication number
- WO2007125589A1 WO2007125589A1 PCT/JP2006/308941 JP2006308941W WO2007125589A1 WO 2007125589 A1 WO2007125589 A1 WO 2007125589A1 JP 2006308941 W JP2006308941 W JP 2006308941W WO 2007125589 A1 WO2007125589 A1 WO 2007125589A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- screen
- dielectric layer
- discharge
- display panel
- plasma display
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45563—Gas nozzles
- C23C16/45565—Shower nozzles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
- C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
- C23C16/5096—Flat-bed apparatus
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J11/00—Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
- H01J11/10—AC-PDPs with at least one main electrode being out of contact with the plasma
- H01J11/12—AC-PDPs with at least one main electrode being out of contact with the plasma with main electrodes provided on both sides of the discharge space
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J11/00—Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
- H01J11/20—Constructional details
- H01J11/34—Vessels, containers or parts thereof, e.g. substrates
- H01J11/38—Dielectric or insulating layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/02—Manufacture of electrodes or electrode systems
Definitions
- the present invention relates to a plasma display panel having a dielectric layer covering an electrode, a method for manufacturing a plasma display panel, and a film forming apparatus used for manufacturing.
- An AC type plasma display panel useful for displaying a color image has a dielectric layer covering electrodes.
- the dielectric layer is interposed between the electrode and the discharge space, and the dielectric layer is charged with a charge called a wall charge.
- the display using an AC plasma display panel uses the wall voltage generated by charging the wall charges.
- a data write operation in a line sequential scanning format is employed in which the wall voltage of cells to be lit among the cells arranged in a matrix on the screen is higher than the wall voltage of other cells.
- a sustaining operation is performed in which the wall voltage is used to generate a display discharge of the number of times corresponding to the gradation value of the display data.
- the sustain is started, and the addressing and the sustain are separated in time.
- the discharge current is concentrated and flows in a short time of about 1 ⁇ s.
- the peak value of the discharge current reaches an amperage order value. Since the display requires a driving integrated circuit and a power supply circuit corresponding to the peak value of the discharge current, it is desirable that the peak value of the discharge current be small in view of the low cost and light weight of the driving device. .
- Japanese Patent Application Laid-Open No. 7-29498 is a prior art document relating to the reduction of the peak value of the discharge current.
- This publication discloses a panel structure in which the thickness of the dielectric layer gradually increases as one end force of the screen is directed toward the other end. According to this panel structure, since the thickness of the dielectric layer and the discharge start voltage of the cell are higher than the discharge start voltage of the cell when the dielectric layer is thin, variations occur in the discharge start of the discharge corresponding to the voltage application. In other words, the concentration of the discharge current is relaxed and the current waveform becomes broad.
- Japanese Patent Application Laid-Open No. 2001-57158 discloses a panel structure in which the electrode area that determines the scale of discharge decreases as it goes from the center of the screen to the periphery. Power loss due to voltage drop is reduced by the reduction of the electrode area with electrical resistance. Although the brightness is also reduced, some reduction in brightness at the periphery of the screen is allowed.
- Japanese Patent Application Laid-Open No. 2003-345297 discloses a plasma display device that reduces the luminance of the peripheral portion of the screen by adding signal processing to display data.
- CVD chemical vapor deposition
- Patent Document 1 Japanese Patent Laid-Open No. 7-29498
- Patent Document 2 JP 2001-57158 A
- Patent Document 3 Japanese Patent Laid-Open No. 2003-345297
- Patent Document 4 Japanese Patent No. 3481142
- the dielectric layer becomes thicker toward the other end force of the screen.
- the luminance decreases from one end of the screen toward the other end! ⁇ Unnatural luminance distribution occurs.
- the discharge characteristics of the cells are greatly different between one end and the other end, it is difficult to realize a stable display with a narrow drive voltage tolerance (margin).
- a first object of the present invention is to provide a plasma display panel having a low discharge current peak value and inconspicuous variations in luminance between cells.
- the second object is to provide a manufacturing method and apparatus suitable for mass production of a plasma display panel that achieves the first object.
- a plasma display panel that achieves the first object has a screen composed of a plurality of cell walls and a dielectric layer covering the entire area of the screen.
- Each cell includes a discharge space filled with a discharge gas, a pair of electrodes for generating a discharge in the discharge space, and the dielectric.
- a dielectric layer that is a part of the body layer and interposed between the discharge space and the electrode; The dielectric layer has a thickness distribution that gradually increases from the thinnest central portion of the screen toward the peripheral portion of the screen.
- the discharge start voltage of a cell with a thick dielectric layer is higher than the discharge start voltage of a cell with a thin dielectric layer, the thickness of the dielectric layer varies depending on the position in the screen. Compared to a uniform structure over the entire screen, the variation in the discharge start time between cells is remarkable. Dispersion of the discharge start time alleviates the concentration of discharge current.
- the discharge start voltage is low and the cell (ie, the cell at the center of the screen) has a stronger discharge than the cell with the high discharge start voltage (ie, the cell at the periphery of the screen).
- brightness is high.
- a luminance distribution corresponding to the thickness of the dielectric layer is generated during display.
- the brightness is uniform within the screen, but the brightness distribution where the brightness of the display near the center of the screen is high, and the brightness decreases as it goes to the periphery, where the person who looks at the display frequently turns the line of sight is conspicuous! .
- the manufacturing method for achieving the second object includes a film forming process in which a dielectric layer is formed by chemical vapor deposition on a substrate on which electrodes are arranged.
- the area force corresponding to the central part of the screen in the substrate with the least amount of material gas supplied to the area corresponding to the central part of the screen in the substrate during film formation The area corresponding to the peripheral part of the screen
- the supply amount of material gas is made non-uniform so that the supply amount gradually increases as it goes to. Since the amount of the substance deposited on the substrate corresponds to the supply amount of the material gas, a dielectric layer having a thickness distribution corresponding to the distribution of the supply amount of the material gas can be obtained.
- FIG. 1 is a front view showing an overall configuration of a plasma display panel.
- FIG. 2 is a diagram showing a typical screen color arrangement.
- FIG. 3 is an exploded perspective view showing a cell structure of a typical plasma display panel.
- FIG. 4 is a schematic diagram of a cross-sectional structure of a main part of a plasma display panel.
- FIG. 5 is a schematic diagram of a configuration of a film forming apparatus.
- FIG. 6 is a schematic view of a gas ejection surface of a shower of a film forming apparatus.
- a surface discharge type plasma display panel in which both the first and second electrodes for causing display discharge are covered with one dielectric layer is suitable for the implementation of the present invention.
- the plasma display panel includes a front panel 10, a rear panel 20, and a screen 50 composed of cells (light emitting elements) that are formed of V and discharge gas (not shown) and are arranged vertically and horizontally.
- the plasma display panel is approximately 994mm x 585mm.
- Both the front plate 10 and the back plate 20 are members in which a plurality of layers including electrodes are fixed to a glass substrate having a thickness of about 3 mm larger than the screen 50.
- the front plate 10 and the back plate 20 are arranged to face each other so as to overlap each other, and are joined together by a sealing material 35 having a frame shape in a plan view arranged at the periphery of the overlapping region.
- the discharge gas is sealed in the internal space (discharge space) sealed by the front plate 10, the back plate 20, and the sealing material 35.
- the screen 50 is composed of a number of cells arranged in rows and columns.
- the figure shows a row containing 3 senoles 51, 52, 53 and a part of a row containing 3 senoles 54, 55, 56.
- the color arrangement on the screen 50 is a stripe arrangement in which the light emission colors of the cells belonging to each column are the same, and the light emission colors are different from those of the adjacent columns.
- Three cells aligned in the horizontal direction correspond to one pixel of the image.
- a typical plasma display panel has a surface discharge cell structure shown in FIG. In FIG. 3, a portion including six cells corresponding to three columns in two rows is drawn, and the front plate 10 and the back plate 20 are separated in order to make the internal structure easy to understand.
- the front plate 10 includes a glass substrate 11, a first row electrode X, a second row electrode Y, a dielectric layer 17, and a protective film 18.
- Each of the row electrode X and the row electrode ⁇ is a laminate of a patterned transparent conductive film 12 and a metal film 14.
- the back plate 20 includes a glass substrate 21, a column electrode A, a dielectric layer 22, a plurality of barrier ribs 23, a red (R) phosphor 24, a green (G) phosphor 25, and a blue (B) phosphor 26. Is provided.
- the row electrodes X and the row electrodes Y alternately arranged on the inner surface of the glass substrate 11 as display electrodes for generating surface discharge are covered with a dielectric layer 17 and a thin protective film 18.
- the dielectric layer 17 is an essential element for an AC type plasma display panel. By covering with the dielectric layer 17, the surface discharge is repeated using the wall charges accumulated in the dielectric layer 17. Can be woken up.
- the protective film 18 prevents sputtering of the dielectric layer 17.
- the arrangement of the row electrodes may be either of two widely known forms. One is to make the electrode gap between adjacent rows wider than the electrode gap (surface discharge gap) in each row as shown in FIG. The other is to make all row electrode gaps equal.
- FIG. 4 The basic configuration of the plasma display panel 1 of FIG. 4 is as shown in FIGS. In FIG. 4, the same reference numerals as those in FIGS. 1 to 3 are attached to the components of the plasma display panel 1 in order to facilitate understanding of the structure. Further, illustration of the protective film 18 is omitted. 4 (shows the cross-sectional structure corresponding to arrows b and c in FIG. 3, and FIG. 4 (B) shows the cross-sectional structure corresponding to arrows a and c in FIG.
- the plasma display panel 1 has a screen 50 composed of a plurality of cells and a dielectric layer 17 over the entire area of the screen 50.
- Each cell includes a discharge space 31 filled with a discharge gas, a pair of row electrodes X and Y for generating a surface discharge in the discharge space 31, a column electrode A for addressing, and a dielectric layer 17. It includes a part of the dielectric that is interposed between the discharge space 31 and the row electrode pair.
- the dielectric layer 17 has a thickness distribution that is the thinnest at the center of the screen 50 and gradually increases toward the peripheral portion of the center force screen 50 as the force is applied.
- the thickness dl of the dielectric layer 17 at the center of the screen 50 is about 10 m
- the dielectric layer 17 at the end of the screen 50 in the column direction is 17 m
- the thickness d2 is about 12 m
- the thickness d3 of the dielectric layer 17 at the end of the screen 50 in the row direction is about 15 m. In the figure, the difference in thickness is exaggerated.
- a CVD method is suitable for forming the dielectric layer 17 having such a thickness distribution. Even in screen printing of glass paste, it is possible to change the printing thickness by adjusting the pressing force of the squeegee. It is extremely difficult to print a film with a depressed center. Not realistic.
- a parallel plate type plasma CVD apparatus is suitable for forming a relatively large object such as the glass substrate 11 of the plasma display panel 1.
- a parallel plate type plasma CVD apparatus 300 is a chamber (reaction chamber) 310 that also has a metal container force, a shower 320 that blows material gas over a wide range, and a film formation target.
- a movable base 330 that supports the glass substrate 11 and a frame 73 that holds the glass substrate 11 are provided.
- the shower 320 has a plate 325 in which a large number of holes are formed, and also serves as an upper electrode for generating plasma.
- the lower surface of the plate 325 is a gas ejection surface.
- a heater for heating the glass substrate 11 is incorporated in the movable base 330 that also serves as the lower electrode.
- the glass substrate 11 on which the row electrode group 40 is formed is placed between the plate 325 of the shower 320 and the movable base 330, and between the row electrode group 40 and the plate 325. Plasma is generated in the space.
- the movable base 330 is a lift type movable up and down. When the glass substrate 11 is carried in and out, the movable base 330 is lowered and separated from the fixedly arranged frame 73.
- the chamber 310 is equipped with a loading and unloading mechanism with an interlock function.
- An important feature of the plasma CVD apparatus 300 is that the conductance force in the ventilation of each of the many holes of the plate 325 is selected so that the amount of ejection increases as it moves toward the peripheral portion of the gas ejection surface. ,Is Rukoto.
- the plate 325 is divided into a plurality of regions so that the gas ejection surface draws a concentric boundary line around the geometric center, and the hole diameters differ between the regions.
- the diameter of the hole 401 arranged in the first region including the geometric center becomes farther from the smallest geometric center, the diameters of the holes 402, 403, and 404 in the second, third, and fourth regions increase.
- the arrangement pitch of the holes 401 to 404 is uniform over the entire area of the gas ejection surface.
- the inside of the chamber 310 into which the glass substrate 11 is loaded is reduced to a pressure of about 330 to 470 Pa, for example, and the glass substrate 11 is heated to a temperature of about 200 ° C to 400 ° C.
- a material gas is introduced into the chamber 310 from the introduction hole 321 provided in the center.
- nitrous oxide N 2 O
- the introduced material gas is transferred from the plate 325 to the glass substrate.
- the amount of ejection is not uniform. As described above, the amount of ejection is larger as it is closer to the peripheral portion where the amount of ejection at the center of the gas ejection surface is the smallest.
- the chamber 310 is evacuated.
- the chamber 310 is provided with a vacuum gauge (not shown), and the degree of vacuum in the chamber 310 is kept constant by controlling the valve of the exhaust system according to the output.
- plasma generated by applying high-frequency power of 1.5 kW to 2.5 kW activates the material gas to cause a chemical reaction. Promote. Then, the film material generated by the chemical reaction is deposited on the film formation surface S1 of the glass substrate 11 to form a dielectric layer.
- the film formation surface S1 in this example is the upper surface of the glass substrate 11 on which the row electrode group 40 is formed.
- the film thickness distribution depends on the conductance setting of the plate 325. As the amount of material gas supplied to the plasma generation space between the plate 325 and the glass substrate 11 increases, the film formation rate increases with the amount of film material that also generates material gas force. Since the conductance of the plate 325 is set so that the supply amount increases with the central force directed toward the periphery, the dielectric layer 17 having the thickness distribution shown in FIG. 4 is obtained.
- the method of intentionally making the supply amount of the material gas non-uniform is not limited to the method of making the diameters of the holes 401 to 404 different, and the arrangement density of the holes from which the material gas is ejected is reduced.
- the method may be different continuously or stepwise according to the position in the ejection surface.
- the configuration of the plasma display panel 1 can be changed as appropriate within the scope of the gist of the present invention.
- the material, dimensions, and shape of the constituent elements are not limited to the examples.
- the plasma display panel 1 is not limited to the surface discharge type but may be a counter discharge type.
- the film forming apparatus used to form the dielectric layer 17 is not limited to a parallel plate type plasma CVD apparatus. Films can be deposited by thermal CVD or optical C VD!
- the present invention can be used for a display device including a surface discharge type and a counter discharge type AC plasma display panel, and alleviates the requirement of current supply capability for a drive circuit.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Physics & Mathematics (AREA)
- Metallurgy (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Gas-Filled Discharge Tubes (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
Description
Claims
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/281,914 US20090146563A1 (en) | 2006-04-28 | 2006-04-28 | Plasma display panel and deposition apparatus used in the manufacturing thereof |
JP2008513036A JPWO2007125589A1 (ja) | 2006-04-28 | 2006-04-28 | プラズマディスプレイパネルおよびその製造に用いる成膜装置 |
PCT/JP2006/308941 WO2007125589A1 (ja) | 2006-04-28 | 2006-04-28 | プラズマディスプレイパネルおよびその製造に用いる成膜装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2006/308941 WO2007125589A1 (ja) | 2006-04-28 | 2006-04-28 | プラズマディスプレイパネルおよびその製造に用いる成膜装置 |
Publications (1)
Publication Number | Publication Date |
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WO2007125589A1 true WO2007125589A1 (ja) | 2007-11-08 |
Family
ID=38655135
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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PCT/JP2006/308941 WO2007125589A1 (ja) | 2006-04-28 | 2006-04-28 | プラズマディスプレイパネルおよびその製造に用いる成膜装置 |
Country Status (3)
Country | Link |
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US (1) | US20090146563A1 (ja) |
JP (1) | JPWO2007125589A1 (ja) |
WO (1) | WO2007125589A1 (ja) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004165591A (ja) * | 2002-09-20 | 2004-06-10 | Nissin Electric Co Ltd | 薄膜形成装置及び方法 |
JP2005243380A (ja) * | 2004-02-26 | 2005-09-08 | Sony Corp | 交流駆動型プラズマ表示装置及びその製造方法 |
JP2006308941A (ja) * | 2005-04-28 | 2006-11-09 | Kyocera Mita Corp | 画像形成装置 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3481142B2 (ja) * | 1998-07-07 | 2003-12-22 | 富士通株式会社 | ガス放電表示デバイス |
JP3625157B2 (ja) * | 1999-08-18 | 2005-03-02 | パイオニア株式会社 | プラズマディスプレイパネル |
US20050041001A1 (en) * | 2001-05-28 | 2005-02-24 | Sumida Keisuke ` | Plasma display panel and manufacturing method |
-
2006
- 2006-04-28 WO PCT/JP2006/308941 patent/WO2007125589A1/ja active Application Filing
- 2006-04-28 JP JP2008513036A patent/JPWO2007125589A1/ja active Pending
- 2006-04-28 US US12/281,914 patent/US20090146563A1/en not_active Abandoned
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004165591A (ja) * | 2002-09-20 | 2004-06-10 | Nissin Electric Co Ltd | 薄膜形成装置及び方法 |
JP2005243380A (ja) * | 2004-02-26 | 2005-09-08 | Sony Corp | 交流駆動型プラズマ表示装置及びその製造方法 |
JP2006308941A (ja) * | 2005-04-28 | 2006-11-09 | Kyocera Mita Corp | 画像形成装置 |
Also Published As
Publication number | Publication date |
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JPWO2007125589A1 (ja) | 2009-09-10 |
US20090146563A1 (en) | 2009-06-11 |
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