WO2007116919A1 - 水素ガス検知材とその被膜方法 - Google Patents
水素ガス検知材とその被膜方法 Download PDFInfo
- Publication number
- WO2007116919A1 WO2007116919A1 PCT/JP2007/057600 JP2007057600W WO2007116919A1 WO 2007116919 A1 WO2007116919 A1 WO 2007116919A1 JP 2007057600 W JP2007057600 W JP 2007057600W WO 2007116919 A1 WO2007116919 A1 WO 2007116919A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- hydrogen gas
- hydrogen
- tungsten
- gas detection
- detection material
- Prior art date
Links
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 title claims abstract description 112
- 239000000463 material Substances 0.000 title claims abstract description 62
- 238000000576 coating method Methods 0.000 title claims abstract description 20
- 238000000034 method Methods 0.000 title claims abstract description 15
- 239000011248 coating agent Substances 0.000 title claims abstract description 13
- 239000001257 hydrogen Substances 0.000 claims abstract description 43
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 43
- 238000004544 sputter deposition Methods 0.000 claims abstract description 19
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 claims abstract description 17
- 229910001930 tungsten oxide Inorganic materials 0.000 claims abstract description 17
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 15
- 239000001301 oxygen Substances 0.000 claims abstract description 15
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 15
- 238000001514 detection method Methods 0.000 claims description 51
- 229910052721 tungsten Inorganic materials 0.000 claims description 24
- 239000010937 tungsten Substances 0.000 claims description 24
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 19
- 239000010408 film Substances 0.000 claims description 14
- 239000010409 thin film Substances 0.000 claims description 14
- 239000002253 acid Substances 0.000 claims description 11
- 230000031700 light absorption Effects 0.000 claims description 11
- 238000001179 sorption measurement Methods 0.000 claims description 11
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims description 6
- 229910001882 dioxygen Inorganic materials 0.000 claims description 6
- WXGOYJBSGSFYJG-UHFFFAOYSA-N [W]O[W] Chemical compound [W]O[W] WXGOYJBSGSFYJG-UHFFFAOYSA-N 0.000 claims 1
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 abstract description 28
- 229910052763 palladium Inorganic materials 0.000 abstract description 13
- 239000000758 substrate Substances 0.000 description 21
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 20
- 239000007789 gas Substances 0.000 description 14
- 238000002834 transmittance Methods 0.000 description 12
- 229910052786 argon Inorganic materials 0.000 description 10
- 229920000139 polyethylene terephthalate Polymers 0.000 description 8
- 239000005020 polyethylene terephthalate Substances 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 7
- 239000003973 paint Substances 0.000 description 7
- -1 polyethylene terephthalate Polymers 0.000 description 7
- 230000007613 environmental effect Effects 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- 239000000446 fuel Substances 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 238000012544 monitoring process Methods 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 239000004698 Polyethylene Substances 0.000 description 3
- 238000002441 X-ray diffraction Methods 0.000 description 3
- 229910003445 palladium oxide Inorganic materials 0.000 description 3
- 230000035699 permeability Effects 0.000 description 3
- 229920000515 polycarbonate Polymers 0.000 description 3
- 239000004417 polycarbonate Substances 0.000 description 3
- 229920000573 polyethylene Polymers 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000004880 explosion Methods 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- 239000002803 fossil fuel Substances 0.000 description 2
- JQPTYAILLJKUCY-UHFFFAOYSA-N palladium(ii) oxide Chemical compound [O-2].[Pd+2] JQPTYAILLJKUCY-UHFFFAOYSA-N 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000002861 polymer material Substances 0.000 description 2
- 238000005477 sputtering target Methods 0.000 description 2
- 230000000007 visual effect Effects 0.000 description 2
- 229920006310 Asahi-Kasei Polymers 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 235000010724 Wisteria floribunda Nutrition 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- WIGAYVXYNSVZAV-UHFFFAOYSA-N ac1lavbc Chemical compound [W].[W] WIGAYVXYNSVZAV-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 238000012790 confirmation Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 230000005183 environmental health Effects 0.000 description 1
- 125000002573 ethenylidene group Chemical group [*]=C=C([H])[H] 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 235000013305 food Nutrition 0.000 description 1
- 230000037406 food intake Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000005431 greenhouse gas Substances 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 238000001451 molecular beam epitaxy Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 229910052705 radium Inorganic materials 0.000 description 1
- HCWPIIXVSYCSAN-UHFFFAOYSA-N radium atom Chemical compound [Ra] HCWPIIXVSYCSAN-UHFFFAOYSA-N 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 229920006298 saran Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
- G01N33/0004—Gaseous mixtures, e.g. polluted air
- G01N33/0009—General constructional details of gas analysers, e.g. portable test equipment
- G01N33/0027—General constructional details of gas analysers, e.g. portable test equipment concerning the detector
- G01N33/0036—General constructional details of gas analysers, e.g. portable test equipment concerning the detector specially adapted to detect a particular component
- G01N33/005—H2
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/75—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated
- G01N21/77—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator
- G01N21/78—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator producing a change of colour
- G01N21/783—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator producing a change of colour for analysing gases
Definitions
- the present invention relates to a hydrogen gas detection material using tungsten oxide and a coating method thereof.
- the hydrogen gas detector is used to detect changes in the electrical resistance of the semiconductor surface due to hydrogen adsorption and has a power supply circuit that can be an ignition source for explosions, which has been a safety issue. Therefore, hydrogen leak detection paint containing fine particles with a particle size of 1 ⁇ m or less, such as palladium oxide or acid tungsten tungsten, or a hydrogen gas detection material coated with the paint, is suspected of hydrogen leak.
- Patent Documents 1 to 3 There has been proposed a method for detecting leakage of hydrogen affixed to a certain location (Patent Documents 1 to 3). The determination of hydrogen leakage by the paint is based on visual confirmation of the discoloration of palladium oxide or tungsten oxide due to the adsorption of the leaked hydrogen. This is a leak detection method.
- the coating is coated by a chemical manufacturing method using various chemicals such as strong, acidic aqueous solution, strong, basic aqueous solution, and harmful organic solvent, the manufacturing cost is high.
- the environmental load of the worker and the environmental sanitation of workers Ma
- Patent Document 1 Japanese Patent Laid-Open No. 4-279681
- Patent Document 2 JP-A-8-253742
- Patent Document 3 Japanese Patent Laid-Open No. 2005-345338
- the present invention provides a hydrogen gas detection material comprising a thin film of tungsten oxide and a coating method thereof.
- the hydrogen gas detecting material is characterized in that (1) the main component is tungsten oxide and the shape thereof is a thin film, and (2) the laminated structural force of palladium and tungsten oxide is also obtained.
- the hydrogen gas detecting material is coated on the base material in a state where the base material temperature is room temperature (20 ° C.) by a sputtering method in which the oxygen pressure is controlled.
- the present invention it is possible to coat a hydrogen gas detection material whose light absorption characteristics change due to hydrogen adsorption on a base material surface that also has a polymer material force such as organic compounds, resin, and vinyl. It becomes. As a result, it is possible to manufacture a hydrogen gas detection sheet and a hydrogen gas sensor that are low in production cost and low in environmental burden and are environmentally safe.
- FIG. 1 is a schematic cross-sectional view of a hydrogen gas detection material.
- FIG.2 X-ray diffraction pattern of oxidized tungsten film coated on quartz glass substrate.
- Figure 3 Measurement arrangement of light absorption characteristics for hydrogen gas of the hydrogen gas detection material coated on the substrate
- FIG. 4 Light absorption characteristics for hydrogen gas of the hydrogen gas detector formed by the tungsten oxide deposited at oxygen pressures of 13 mPa, 15 mPa, 22 mPa (A), 42 mPa, and 69 mPa.
- FIG. 6 Change in transmitted light intensity with time of hydrogen gas detector coated on 100m-thick polyethylene terephthalate (PET) when repeated exposure and stop operations of hydrogen gas are performed.
- the hydrogen gas detection material of the present invention is composed of an acid tungsten film and palladium deposited on the surface of the acid tungsten film, and the palladium adsorbs molecular hydrogen gas. It is dissociated into hydrogen atoms.
- the tungsten oxide is preferably a thin film having a thickness of 300-1 ⁇ m. When the thickness is 300 nm or less, it is also inconvenient that the change in transmitted light intensity is difficult to distinguish. If the thickness is 1 m or more, peeling of acid-tungsten tends to occur, and the force is also inconvenient.
- the deposited palladium thickness is preferably between 2 nm and 20 nm.
- the transparent substrate is preferably transparent or translucent to visible light of 400 nm or more.
- the base material include, but are not limited to, a base material having a high molecular force such as polycarbonate, polyethylene, polyethylene terephthalate (PET), polypropylene, and polyvinyl chloride.
- PET polyethylene terephthalate
- polypropylene polypropylene
- polyvinyl chloride polyvinyl chloride
- the method for coating a hydrogen gas detection material of the present invention comprises a sputtering target comprising tungsten power. Sputtering the substrate to form an acid tungsten film on the surface of the substrate, and then depositing palladium on the surface of the acid tungsten film, It is characterized by controlling the light absorption characteristics by hydrogen adsorption by controlling the oxygen pressure during the process.
- the purity of tungsten in the sputtering target is not particularly limited, but a higher one is preferable.
- the snottering is preferably a mixed atmosphere of argon and oxygen.
- the substrate temperature at the time of sputtering is preferably room temperature (20 ° C.).
- the transmittance changes by 50% or more due to hydrogen adsorption as a required light absorption characteristic of the hydrogen gas detection material.
- the oxygen gas pressure is 14 to 80 mPa and the argon gas pressure should be 130 to 170 mPa.
- the oxygen gas pressure is 15 to 40 mPa and the argon gas pressure is 140 to 160 mPa.
- the ratio of oxygen gas is The gas pressure (the sum of oxygen gas pressure and argon gas pressure) may be controlled to about 10% to about 30%. Therefore, when the input sputtering power is 50 W and the distance between the substrate and the target is 10 cm, the partial pressure of oxygen gas is 10-30 mPa when the total gas pressure is fixed at 100 mPa. It may be controlled to.
- the gas pressure of the atmosphere and other sputtering conditions can be appropriately set by those skilled in the art based on the disclosure of this specification.
- Noradium can be deposited by a high-frequency sputtering method, a direct current sputtering method, a molecular beam epitaxy method, or a vacuum evaporation method, and any method can be used as long as it can be deposited at a temperature lower than the heat resistant temperature of the substrate.
- the deposition conditions are sputtering power of 25 W to 50 W, the substrate at room temperature, and an argon gas pressure of 30 to 170 mPa. preferable.
- Other methods and conditions for the deposition of the palladium can be appropriately set by those skilled in the art based on the disclosure of the present specification.
- Example 1 in order to evaluate the crystal structure of the coated oxide-tungsten and to optimize the hydrogen detection characteristics, an acid was formed on the surface of a quartz glass substrate 20 mm long, 20 mm wide, and 0.5 mm thick. A tungsten thin film was coated. Tungsten is used as a target for coating tungsten oxide, the distance between the substrate and the target is 10 cm, the substrate temperature is room temperature, the atmosphere is argon gas partial pressure 148 mPa and oxygen partial pressure 22 mPa. The metal tungsten target was sputtered at 50 W for 30 minutes under controlled conditions. The film thickness of tandasten oxide was about 0.3 m.
- FIG. 2 shows the results of evaluating the crystallinity of the coated film by the X-ray diffraction method.
- Cu ⁇ ⁇ rays were used as the radiation source.
- a wide diffraction peak is seen around the diffraction angle of 23 degrees, but no other peaks are seen.
- the broad peak near the diffraction angle of 23 degrees is quartz glass.
- the light absorption characteristics of the hydrogen gas detection material with respect to hydrogen were evaluated by measuring changes in transmitted light intensity before and after hydrogen exposure using the measurement apparatus shown in FIG.
- the evaluation method is to irradiate a sample in a cell whose atmosphere can be controlled with red light with a wavelength of 645 nm, where the transmitted light intensity changes most significantly, and use a spectroscopic instrument.
- Fig. 4A shows the measurement results of the relative transmittance of the hydrogen gas detection material.
- the water The relative transmittance of the raw gas detection material is 14%, that is, the change in transmittance is 86%.
- the hydrogen gas detection material has sufficient performance to detect hydrogen.
- Example 1 it is important to control the oxygen partial pressure at the time of coating with acid tungsten.
- various values of oxygen partial pressure (Comparative Example 1: 13 mPa, Comparative Example 2: 15 mPa, Example 2: 42 mPa, Example 3: 69 mPa)
- the tungsten oxide thin film was coated in the same manner as in Example 1, except that the film thickness of tandasten oxide and other coating conditions were the same.
- the result of the X-ray diffraction measurement of the obtained film is the same as that of the acid-tungsten thin film of Example 1, and the acid-tungsten thin film obtained by the coating method of the present invention is amorphous. I was divided.
- Example 2 Palladium was deposited on the surface of the tungsten oxide thin film under the same conditions as in Example 1, and the light absorption characteristics with respect to hydrogen were examined in the same manner as in Example 1.
- the relative transmittance of the hydrogen gas detection material is shown in FIG. 4 together with the results of Example 1.
- the oxygen pressure is 14 mPa or less
- the relative permeability of the hydrogen gas detection material is 87%, that is, the change in the permeability is 13%, so hydrogen detection is difficult.
- the hydrogen gas detector has a permeability change of 50% or more due to hydrogen adsorption. Therefore, it can be seen that hydrogen detection is sufficiently possible using an oxide-tungsten thin film coated with an oxygen partial pressure controlled to 14 mPa or higher.
- Example 1 1.2 mm thick polycarbonate plate, 40 ⁇ m thick polyethylene sheet, 11 ⁇ m thick polychlorinated vinylidene (Asahi Kasei Saran Wrap), 100 m thick OHP sheet (Fuji Xerox), 100 m thick
- PET polyethylene terephthalate
- the hydrogen gas detection material was coated in the same coating conditions as in Example 1.
- the light absorption characteristics with respect to hydrogen gas were examined in the same manner as in Example 1.
- Fig. 5 shows the change over time of the relative transmittance when the hydrogen gas detection material is exposed to hydrogen.
- Example 6 Permeation when the hydrogen gas detection material coated on a 100-m-thick PET sheet in Example 6 was exposed and stopped multiple times under the same measurement conditions as in Example 1. The time change of the light intensity was examined. The result is shown in Fig. 6. Since the hydrogen gas detecting material stops the hydrogen gas, that is, the transmittance is restored when the hydrogen gas is not present in the surroundings, the light absorption property of the hydrogen gas detecting material is reversible with respect to the hydrogen gas. I knew that. When the hydrogen gas exposure and stop operations are repeated, the decrease and restoration of the transmittance are repeated, so that the hydrogen gas detection material can be repeatedly detected.
- the present invention relates to an optical hydrogen gas detection material and a coating method thereof.
- the hydrogen gas detection material of the present invention comprises an acid-tungsten thin film in which palladium is deposited on the surface as a catalytic metal, and an inexpensive polymer material can be used for the substrate to be coated.
- various types of substrates can be coated, and a tape, sheet or test paper for detecting leakage of hydrogen gas, and a hydrogen gas detection sensor can be manufactured.
- INDUSTRIAL APPLICABILITY The present invention is useful as providing a coating method for a hydrogen gas detection material that ensures the safety that is indispensable for the next-generation technology for hydrogen energy.
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- Crystallography & Structural Chemistry (AREA)
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- Combustion & Propulsion (AREA)
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- Condensed Matter Physics & Semiconductors (AREA)
- Food Science & Technology (AREA)
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Abstract
Description
Claims
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/225,815 US8052898B2 (en) | 2006-04-04 | 2007-04-04 | Hydrogen gas detecting material and the coating method |
DE112007000853T DE112007000853T5 (de) | 2006-04-04 | 2007-04-04 | Material zur Detektion von Wasserstoffgas sowie Beschichtungsverfahren |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006-102809 | 2006-04-04 | ||
JP2006102809A JP4775708B2 (ja) | 2006-04-04 | 2006-04-04 | 水素ガス検知材とその被膜方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2007116919A1 true WO2007116919A1 (ja) | 2007-10-18 |
Family
ID=38581208
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2007/057600 WO2007116919A1 (ja) | 2006-04-04 | 2007-04-04 | 水素ガス検知材とその被膜方法 |
Country Status (4)
Country | Link |
---|---|
US (1) | US8052898B2 (ja) |
JP (1) | JP4775708B2 (ja) |
DE (1) | DE112007000853T5 (ja) |
WO (1) | WO2007116919A1 (ja) |
Cited By (3)
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KR101312211B1 (ko) * | 2010-07-09 | 2013-09-27 | 신닛테츠스미킨 카부시키카이샤 | Ni 첨가 강판 및 그 제조 방법 |
CN105214646A (zh) * | 2015-09-24 | 2016-01-06 | 福建医科大学 | 氧化钨量子点材料模拟过氧化物酶 |
US9260771B2 (en) | 2011-09-28 | 2016-02-16 | Nippon Steel & Sumitomo Metal Corporation | Ni-added steel plate and method of manufacturing the same |
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Publication number | Priority date | Publication date | Assignee | Title |
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JP4919228B2 (ja) * | 2007-05-15 | 2012-04-18 | 独立行政法人日本原子力研究開発機構 | 水素ガス検知膜 |
WO2013108087A1 (en) * | 2012-01-18 | 2013-07-25 | Jawaharlal Nehru Centre For Advanced Scientific Research | A system and a method to detect hydrogen leakage using nano-crystallised palladium gratings |
KR101557611B1 (ko) * | 2015-03-20 | 2015-10-05 | 아주대학교산학협력단 | 수소 검출 센서 및 이의 제조방법 |
KR101745128B1 (ko) * | 2015-09-01 | 2017-06-08 | 현대자동차주식회사 | 수소 변색 나노입자, 이의 제조 방법 및 이를 포함하는 수소 센서 |
JP6229986B1 (ja) * | 2016-07-21 | 2017-11-15 | 国立大学法人東北大学 | 鉄鋼材料中の水素の検出器 |
KR101888398B1 (ko) | 2016-09-09 | 2018-08-14 | 하이리움에너지 주식회사 | 수소 센서 및 수소 센싱 잡화물 |
KR101990120B1 (ko) * | 2017-06-08 | 2019-06-19 | 하이리움에너지 주식회사 | 수소 감지 센서, 수소 감지 센서의 제조방법 및 수소 감지 잡화물 |
KR102242201B1 (ko) * | 2019-07-10 | 2021-04-19 | 아주대학교 산학협력단 | 수소 센서 및 이의 제조방법 |
CN114354688B (zh) * | 2022-01-06 | 2024-04-12 | 北京理工大学 | 超低温氢气爆炸流场试验监测系统 |
FR3135143A1 (fr) * | 2022-04-28 | 2023-11-03 | Totalenergies Onetech | Système de mesure et de transmission d’une teneur variable en dihydrogène pour un récepteur externe |
FR3135144A1 (fr) * | 2022-04-28 | 2023-11-03 | Totalenergies Onetech | Système de mesure et de transmission d’une teneur variable en dihydrogène pour optimiser la combustion d’un flux de gaz naturel |
US11808747B1 (en) | 2022-07-06 | 2023-11-07 | King Fahd University Of Petroleum And Minerals | Hydrogen gas sensor, and method of making and using thereof |
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- 2007-04-04 US US12/225,815 patent/US8052898B2/en not_active Expired - Fee Related
- 2007-04-04 WO PCT/JP2007/057600 patent/WO2007116919A1/ja active Application Filing
- 2007-04-04 DE DE112007000853T patent/DE112007000853T5/de not_active Ceased
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Cited By (5)
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KR101312211B1 (ko) * | 2010-07-09 | 2013-09-27 | 신닛테츠스미킨 카부시키카이샤 | Ni 첨가 강판 및 그 제조 방법 |
US8882942B2 (en) | 2010-07-09 | 2014-11-11 | Nippon Steel & Sumitomo Metal Corporation | Ni-added steel plate and method of manufacturing the same |
US9260771B2 (en) | 2011-09-28 | 2016-02-16 | Nippon Steel & Sumitomo Metal Corporation | Ni-added steel plate and method of manufacturing the same |
CN105214646A (zh) * | 2015-09-24 | 2016-01-06 | 福建医科大学 | 氧化钨量子点材料模拟过氧化物酶 |
CN105214646B (zh) * | 2015-09-24 | 2018-04-17 | 福建医科大学 | 一种氧化钨量子点材料在模拟过氧化物酶的应用 |
Also Published As
Publication number | Publication date |
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JP4775708B2 (ja) | 2011-09-21 |
US8052898B2 (en) | 2011-11-08 |
JP2007278744A (ja) | 2007-10-25 |
US20090267032A1 (en) | 2009-10-29 |
DE112007000853T5 (de) | 2009-02-19 |
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