WO2006120888A1 - ジイモニウム化合物及びその用途 - Google Patents
ジイモニウム化合物及びその用途 Download PDFInfo
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- WO2006120888A1 WO2006120888A1 PCT/JP2006/308608 JP2006308608W WO2006120888A1 WO 2006120888 A1 WO2006120888 A1 WO 2006120888A1 JP 2006308608 W JP2006308608 W JP 2006308608W WO 2006120888 A1 WO2006120888 A1 WO 2006120888A1
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- group
- resin
- dimonium
- compound
- general formula
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- 150000001875 compounds Chemical class 0.000 title claims abstract description 110
- 238000010521 absorption reaction Methods 0.000 claims abstract description 39
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- 125000001931 aliphatic group Chemical group 0.000 claims abstract description 16
- 125000003118 aryl group Chemical group 0.000 claims abstract description 12
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 5
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- 239000011347 resin Substances 0.000 claims description 58
- 125000001424 substituent group Chemical group 0.000 claims description 24
- 125000000217 alkyl group Chemical group 0.000 claims description 19
- 239000011342 resin composition Substances 0.000 claims description 11
- 229910052731 fluorine Inorganic materials 0.000 claims description 10
- 125000005843 halogen group Chemical group 0.000 claims description 9
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- 125000000538 pentafluorophenyl group Chemical group FC1=C(F)C(F)=C(*)C(F)=C1F 0.000 claims description 8
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- 125000001153 fluoro group Chemical group F* 0.000 claims description 6
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 claims description 5
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 1
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- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 abstract description 7
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- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 6
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- CDAWCLOXVUBKRW-UHFFFAOYSA-N 2-aminophenol Chemical compound NC1=CC=CC=C1O CDAWCLOXVUBKRW-UHFFFAOYSA-N 0.000 description 2
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
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- 125000001231 benzoyloxy group Chemical group C(C1=CC=CC=C1)(=O)O* 0.000 description 2
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- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
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- 238000002845 discoloration Methods 0.000 description 1
- 238000007606 doctor blade method Methods 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- 125000006232 ethoxy propyl group Chemical group [H]C([H])([H])C([H])([H])OC([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003754 ethoxycarbonyl group Chemical group C(=O)(OCC)* 0.000 description 1
- 125000005448 ethoxyethyl group Chemical group [H]C([H])([H])C([H])([H])OC([H])([H])C([H])([H])* 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002366 halogen compounds Chemical class 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 229910001385 heavy metal Inorganic materials 0.000 description 1
- CPBQJMYROZQQJC-UHFFFAOYSA-N helium neon Chemical compound [He].[Ne] CPBQJMYROZQQJC-UHFFFAOYSA-N 0.000 description 1
- 125000006038 hexenyl group Chemical group 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003707 hexyloxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 1
- 150000002430 hydrocarbons Chemical group 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 229910052809 inorganic oxide Inorganic materials 0.000 description 1
- 229910052945 inorganic sulfide Inorganic materials 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 125000002510 isobutoxy group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])O* 0.000 description 1
- 125000000555 isopropenyl group Chemical group [H]\C([H])=C(\*)C([H])([H])[H] 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000004611 light stabiliser Substances 0.000 description 1
- 239000013028 medium composition Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000113 methacrylic resin Substances 0.000 description 1
- HNQIVZYLYMDVSB-UHFFFAOYSA-N methanesulfonimidic acid Chemical group CS(N)(=O)=O HNQIVZYLYMDVSB-UHFFFAOYSA-N 0.000 description 1
- 125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 description 1
- 125000000250 methylamino group Chemical group [H]N(*)C([H])([H])[H] 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- RCHKEJKUUXXBSM-UHFFFAOYSA-N n-benzyl-2-(3-formylindol-1-yl)acetamide Chemical compound C12=CC=CC=C2C(C=O)=CN1CC(=O)NCC1=CC=CC=C1 RCHKEJKUUXXBSM-UHFFFAOYSA-N 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- YZMHQCWXYHARLS-UHFFFAOYSA-N naphthalene-1,2-disulfonic acid Chemical compound C1=CC=CC2=C(S(O)(=O)=O)C(S(=O)(=O)O)=CC=C21 YZMHQCWXYHARLS-UHFFFAOYSA-N 0.000 description 1
- 150000002791 naphthoquinones Chemical class 0.000 description 1
- GTUSLVJOJPWMJE-UHFFFAOYSA-N nickel Chemical class [Ni].[Ni].[Ni] GTUSLVJOJPWMJE-UHFFFAOYSA-N 0.000 description 1
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 125000005981 pentynyl group Chemical group 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- FTDXCHCAMNRNNY-UHFFFAOYSA-N phenol Chemical compound OC1=CC=CC=C1.OC1=CC=CC=C1 FTDXCHCAMNRNNY-UHFFFAOYSA-N 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- 229920000193 polymethacrylate Polymers 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920001184 polypeptide Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 229920002620 polyvinyl fluoride Polymers 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 102000004196 processed proteins & peptides Human genes 0.000 description 1
- 108090000765 processed proteins & peptides Proteins 0.000 description 1
- RGBXDEHYFWDBKD-UHFFFAOYSA-N propan-2-yl propan-2-yloxy carbonate Chemical compound CC(C)OOC(=O)OC(C)C RGBXDEHYFWDBKD-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- WVIICGIFSIBFOG-UHFFFAOYSA-N pyrylium Chemical compound C1=CC=[O+]C=C1 WVIICGIFSIBFOG-UHFFFAOYSA-N 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 description 1
- 239000004071 soot Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000000547 substituted alkyl group Chemical group 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 1
- 125000000565 sulfonamide group Chemical group 0.000 description 1
- 230000004083 survival effect Effects 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000001973 tert-pentyl group Chemical group [H]C([H])([H])C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 238000003856 thermoforming Methods 0.000 description 1
- 150000003658 tungsten compounds Chemical class 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 125000004417 unsaturated alkyl group Chemical group 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/244—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only
- G11B7/246—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only containing dyes
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C251/00—Compounds containing nitrogen atoms doubly-bound to a carbon skeleton
- C07C251/02—Compounds containing nitrogen atoms doubly-bound to a carbon skeleton containing imino groups
- C07C251/30—Compounds containing nitrogen atoms doubly-bound to a carbon skeleton containing imino groups having nitrogen atoms of imino groups quaternised
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B53/00—Quinone imides
- C09B53/02—Indamines; Indophenols
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B69/00—Dyes not provided for by a single group of this subclass
- C09B69/02—Dyestuff salts, e.g. salts of acid dyes with basic dyes
- C09B69/06—Dyestuff salts, e.g. salts of acid dyes with basic dyes of cationic dyes with organic acids or with inorganic complex acids
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
- G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
- B41M5/40—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used characterised by the base backcoat, intermediate, or covering layers, e.g. for thermal transfer dye-donor or dye-receiver sheets; Heat, radiation filtering or absorbing means or layers; combined with other image registration layers or compositions; Special originals for reproduction by thermography
- B41M5/46—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used characterised by the base backcoat, intermediate, or covering layers, e.g. for thermal transfer dye-donor or dye-receiver sheets; Heat, radiation filtering or absorbing means or layers; combined with other image registration layers or compositions; Special originals for reproduction by thermography characterised by the light-to-heat converting means; characterised by the heat or radiation filtering or absorbing means or layers
- B41M5/465—Infrared radiation-absorbing materials, e.g. dyes, metals, silicates, C black
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/208—Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation
Definitions
- the present invention relates to a dimonium compound having absorption in the near infrared region and use thereof.
- the present invention relates to a dimonium compound that is not classified as a deleterious substance, has excellent heat resistance, light resistance, solubility, and the like, and whose applications have been expanded, a near-infrared absorption filter using the compound, an optical recording medium, and a resin composition thereof.
- dimonium compounds as near-infrared absorbers are widely known (see, for example, Patent Documents 1 to 3), and are widely used in near-infrared absorption filters, heat insulating films, sunglasses, and the like.
- those whose counter ions are hexafluoroantimonate ions, arsenic hexafluoride ions, etc. are excellent in heat resistance, and among them, compounds of hexafluoroantimonate ions are mainly used. It was used.
- compounds containing antimony fall under the category of deleterious substances, in recent years, the use of heavy metals is restricted in industrial fields, especially in the field of electrical materials. It was.
- Patent Document 1 Japanese Patent Publication No. 7-51555
- Patent Document 2 JP-A-10-316633
- Patent Document 3 Japanese Patent Publication No. 43-25335
- Patent Document 4 International Publication Number WO2004 / 068199
- Patent Document 5 International Publication Number WO2004 / 048480
- the present invention has been made in view of such a situation, and an object of the present invention is to contain antimony and to have excellent stability, particularly heat resistance, light resistance, and moisture heat resistance. Providing near-infrared absorption filters (especially for plasma display panels) that have excellent solubility and expanded applications using infrared absorbing compounds, and such compounds, and are also resistant to weathering, etc. An object of the present invention is to provide an excellent optical recording medium and resin composition.
- the present invention relates to
- R to R each independently represents a hydrogen atom or a fat which may have a substituent.
- the aliphatic hydrocarbon group, R to R may each independently have a halogen atom.
- R 1 represents a substituted or unsubstituted aryl group. Also ring A and
- Bi ring B may have a substituent.
- R to R in the general formula (1) are an aliphatic hydrocarbon group having a fluorine atom
- R to R in formula (1) is a linear or branched alkyl group
- R to R in the general formula (1) are all n-butyl groups or iso-butyl groups (5)
- a resin composition comprising the dimonium compound according to any one of (1) to (6) and a resin
- a near-infrared absorption filter comprising a layer containing the dimonium compound according to any one of (1) to (6) above,
- a plasma display comprising the near-infrared absorbing filter described in (8) above, and
- An optical information recording medium comprising the recording layer containing the dimonium compound according to any one of (1) to (6) above,
- the near-infrared absorbing dimonium compound of the present invention does not contain antimony or arsenic, is not a deleterious substance, has a molar extinction coefficient of 90,000 or more, and has excellent heat resistance, light resistance and solubility. It is. In addition, it is particularly excellent in heat resistance and moist heat resistance compared to conventional dimonium salts having hexafluorophosphate ion, perchlorate ion or borofluoride ion.
- the near-infrared absorption filter using the dimonium compound of the present invention is a near-infrared absorption filter that does not contain antimony or the like and is extremely excellent in heat resistance, and it is difficult to cause a reaction such as decomposition by heat.
- the dimonium compound of the present invention is a near infrared absorption filter,
- it can be suitably used for a near-infrared absorbing film such as a heat insulating film and sunglasses, and is particularly suitable for a near-infrared absorbing filter for plasma display.
- the optical information recording medium of the present invention can significantly improve the light resistance as compared with a conventional optical information recording medium containing a dimonium compound. Further, these dimonium compounds have sufficient solubility in preparing an optical information recording medium and are excellent in processability. Further, for example, when this compound is contained in an organic dye thin film corresponding to the recording layer of the optical information recording medium, it is possible to provide an optical information recording medium in which durability in repeated reproduction and light resistance stability are remarkably improved.
- the dimonium compound of the present invention is a salt having a dimonium cation and two arylbis (alkylsulfonyl) carboanions as counterions, and is represented by the above general formula (1).
- R to R each independently have a hydrogen atom or a substituent.
- An aliphatic hydrocarbon group means a group obtained by removing one hydrogen atom from a saturated and unsaturated straight chain, branched chain or cyclic aliphatic hydrocarbon.
- the number of carbon atoms is usually 1 to 36, preferably 1 to 20 carbon atoms.
- saturated aliphatic hydrocarbon group or unsaturated aliphatic hydrocarbon group having no substituent include methinole group, ethyl group, n-propyl group, iso_propyl group, n_butyl group, i so-butynole group, sec-butinole group, tert-butinole group, n-pentinole group, iso_pentinole group, tert pentyl group, octyl group, decyl group, dodecyl group, octadecyl group, isopropinole group, cyclopentyl group, cyclohex Xyl group, vinyl group, aryl group, propenyl group, butur group, pentur group, hexenyl group, hexadenyl group, isopropenyl group, isohexenyl group, cyclohexenyl group, cyclopentaeny
- methinole group ethyl group, n-propinole group, isopropyl group, nbutyl group, isobutyl group, sec butyl group, tertbutyl group, n-pentyl group, isopentyl group, tert C1 C5 straight and branched chain saturated aliphatic hydrocarbons such as pentyl group, vinyl group, aryl group, propenyl group, pentynyl group And a basic group or an unsaturated aliphatic hydrocarbon group.
- At least one of R to R is a linear or branched (C1-C6) key.
- R to R is a branched alkyl group.
- R to R are all alkyl groups branched at the ends.
- R to R are all alkyl groups branched at the terminal, R to R are all
- Examples of the substituent in the aliphatic hydrocarbon group having a substituent include a halogen atom (eg, F, Cl, Br), a hydroxyl group, an alkoxy group (eg, methoxy group, ethoxy group, isobutoxy group, etc.) An alkoxyalkoxy group (eg, methoxyethoxy group), an aryl group (eg, phenyl group, naphthyl group, etc., this aryl group may further have a substituent), an aryloxy group (eg, phenoxy).
- a halogen atom eg, F, Cl, Br
- a hydroxyl group eg, an alkoxy group (eg, methoxy group, ethoxy group, isobutoxy group, etc.)
- An alkoxyalkoxy group eg, methoxyethoxy group
- an aryl group eg, phenyl group, naphthyl group, etc., this
- asyloleoxy group eg, acetyloxy group, butylyloxy group, hexyloxy group, benzoyloxy group, etc.
- aryloyl group and aryloyloxy group including benzoyloxy group may further have a substituent.
- Amino group alkyl-substituted amino group (eg, methylamino group, dimethylamino group, etc.), cyano group Nitro group, carboxyl group, carbonamide group, alkoxycarbonyl group (eg, methoxycarbonyl group, ethoxycarbonyl group, etc.), acyl group, acylamide group (eg, acetateamide group, etc.), sulfonamide group (eg, methanesulfonamide group, etc.) ), Sulfo group strength S.
- halogen atom cyano group, nitro group, hydroxynole group, carboxyl group, carbonamido group, alkoxycarbonyl group, acyl group, aryl group or alkoxy group are preferred.
- substituents can exist independently, for example, one amino group substituted with an unsubstituted linear alkyl group and a cyano-substituted alkyl group, an unsubstituted branched alkyl group and a cyano group.
- the substituted alkyl group may be substituted, or the unsubstituted linear alkyl group and the unsubstituted branched alkyl group may be substituted.
- substituted aliphatic hydrocarbon group examples include a cyanomethyl group, 2-cyanoethyl group, 3_cyanopropyl group, 2_cyanopropyl group, 4-cyanobutyl group, 3-cyanobutyl group, 2-cyanobutyl group, 5—Cyanopentyl group, 4 Cyanopentyl group, 3 —Cyano-substituted (C1-C6) alkyl groups such as cyanopentyl group, 2_cyanopentyl group, 3,4_disianobutyl group, methoxyethyl group, ethoxyethyl group, 3-methoxypropyl group, 3_ethoxypropyl group, 4-methoxybutyl group Group, 4_ethoxybutyl group, 5-ethoxypentyl group, 5-methoxypentyl group and other alkoxy-substituted (C1 to C6) alkyl groups, trifluoromethyl group, monofluoromethyl
- R to R are fats which may have a halogen atom independently of each other.
- the aliphatic hydrocarbon group include saturated and unsaturated linear, branched and cyclic alkyl groups, and the number of carbon atoms is preferably 1 to 36, more preferably a saturated group which may have a substituent. And those having 1 to 20 carbon atoms, with 1 to 4 carbon atoms being most preferred.
- the halogen atom fluorine, chlorine, bromine, and iodine atoms are preferable, and fluorine atom, fluorine, chlorine, and bromine atoms are most preferable.
- R to R are each independently a methyl group or trifluoromethyl.
- Til group difluoromethyl group, monofluoromethyl group, dichloromethyl group, monochloromethylol group, dibromomethyl group, difluorochloromethyl group, ethyl group, pentafluoroethylenol group, tetrafluoroethyl group, Trifluoroethyl, trifluorochloroethyl, difluoroethyl, monofluoroethyl, trifluoroethyl, propyl, heptafluoropropyl, hexafluoropropyl, pentafluoropropyl Group, tetrafluoropropyl group, trifluoropropyl group, difluoropropyl group, monofluoropropyl group, perfluorobutyl group, perfluorohexyl group, perfluorooctinole group, perfluorooctylethyl group Saturated linear
- An alkyl group can also be formed.
- R to R are both aliphatic hydrocarbon groups having a fluorine atom.
- Specific examples include trifluoromethyl group, difluoromethyl group, monofluoromethyl group, pentafluoroethyl group, tetrafluoroethyl group, trifluoroethyl group, difluoroethyl group, heptafluoropropyl.
- R represents a substituted or unsubstituted aryl group, and specific examples thereof include a phenyl group and a biphenyl group.
- the rings A and B may have 1 to 4 substituents in addition to the 1 and 4_ positions, respectively.
- substituent that can be bonded include a halogen atom, a hydroxyl group, a lower alkoxy group, a cyan group, and a lower alkyl group.
- halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.
- the alkoxy group include C1-C5 alkoxy groups such as methoxy group and ethoxy group
- examples of the lower alkyl group include C1-C5 alkyl groups such as methyl group and ethyl group.
- Rings A and B are preferably both not substituted, or substituted with a halogen atom (especially a chlorine atom, bromine atom or fluorine atom), a methyl group or a cyan group.
- a halogen atom especially a chlorine atom, bromine atom or fluorine atom
- Ring B has a substituent, all four B rings are the same, and the position of the substituent is relative to the nitrogen atom bonded to the phenylene diamine skeleton of ring A. Those in the m_ position are preferred.
- Rings A and B preferably have no substituent other than the 1 and 4 positions.
- the dimonium compound represented by the general formula (1) of the present invention can be obtained, for example, by a method according to the method described in Patent Document 3. That is, the following formula (4) obtained by reducing the product obtained by the Ullmann reaction of p-phenylenediamine and 1-black _4_nitrobenzene:
- rings A and B are as defined above.
- the compound of formula (2) can also be synthesized by reaction. Production of exemplified compound No. 19 Any compound other than all substituents can be obtained by a method similar to the production method c
- the compound synthesized above is oxidized in an organic solvent, preferably in a water-soluble polar solvent such as DMF, DMI, NMP, etc. at 0-100 ° C, preferably 5-70 ° C, corresponding to the following formula (3)
- Add 2 equivalents of an agent (eg silver salt) to carry out the oxidation reaction.
- the compound synthesized above is oxidized with an oxidizing agent such as silver nitrate, silver perchlorate, or cupric chloride, and then the reaction solution is added with an anion acid or salt of formula (3) for reaction.
- the dimonium compound represented by the formula (1) can also be synthesized by the method.
- n_butyl group when one is an iso-pentyl group and the rest is an n-butyl group, that is, one of the four combinations of substituents contains an iso-pentyl group. And the remaining 3 pairs are all In the case of n_butyl group, it is abbreviated as ⁇ 3 (n_C H, n_C H) (n_C H, i_C H)
- cy means cyclo.
- the resin composition of the present invention is represented by the resin and the general formula (1). It contains the dimonium compound of the present invention.
- the resin used for the resin include polyethylene, polystyrene, polyacrylic acid, polyacrylic acid ester, polyacetate butyl, polyataryl nitrinole, polysalt butyl, polyvinyl fluoride, and other bur compounds.
- Polymer Polymethacrylic acid, Polymethacrylate, Polyvinylidene chloride, Polyvinylidene fluoride, Polyvinylidene fluoride, Vinylidene fluoride / trifluoroethylene copolymer, Vinylidene fluoride / tetrafluoroethylene copolymer, Vinyl imide compounds such as vinylidene cyanide / vinyl acetate copolymer or copolymers of fluorine compounds, resins containing fluorine such as polytrifluoroethylene, polytetrafluoroethylene, polyhexafluoropropylene, nylon 6, Polyamides such as nylon 66, polyimides, polyurethanes, polypeptides, polyesters such as polyethylene terephthalate, polyethers such as polycarbonates and polyoxymethylenes, epoxy resins, polybulal alcohols, and polyvinyl petitals.
- the method for producing the resin composition of the present invention is not particularly limited.
- the following methods known per se can be used.
- the dimonium compound of the present invention is usually used as the base resin powder. Alternatively, it may be added to pellets, heated to 150 to 350 ° C., dissolved, and then molded to produce a resin plate, or formed into a film (resin plate) using an extruder.
- the addition amount of the dimonium compound of the present invention varies depending on the thickness, absorption strength, visible light transmittance, etc. of the resin plate or film to be produced, but is usually 0.01 to 30% by weight based on the weight of the base resin, Preferably 0.03 to 15% by weight is used.
- the compound and a resin monomer or a prepolymer of a resin monomer are injected into a mold in the presence of a polymerization catalyst, reacted and cured, or poured into a mold. And solidify until it becomes a hard product in the mold.
- resins can be formed by this method, and specific examples of resins for which such a method can be used include acrylic resins and diesters. Examples thereof include ethylene glycol bis (aryl carbonate) resin, epoxy resin, phenol monophenol aldehyde resin, polystyrene resin, and silicon resin.
- the casting method using bulk polymerization of methyl methacrylate is preferred, as it provides an acrylic sheet with excellent hardness, heat resistance, and chemical resistance.
- Known radical thermal polymerization initiators can be used as the polymerization catalyst.
- peroxides such as benzoyl peroxide, p-chlorobenzoyl peroxide, diisopropyl peroxycarbonate, Examples thereof include azo compounds such as bisisoptyronitrile.
- the amount used is generally from 0.01 to 5% by weight, based on the total amount of the mixture.
- the heating temperature in the thermal polymerization is usually 40 to 200 ° C, and the polymerization time is usually about 30 minutes to 8 hours.
- a method of photopolymerization by adding a photopolymerization initiator or a sensitizer can also be employed.
- the dimonium compound of the present invention is dissolved in a binder resin and an organic solvent to form a paint, and the above compound is finely divided in the presence of the resin to disperse it. There are ways to do this.
- a binder resin and an organic solvent for example, aliphatic ester resin, acrylic resin, melamine resin, urethane resin, aromatic ester resin, polystrength A boronate resin, a polyvinyl resin, an aliphatic polyolefin resin, an aromatic polyolefin resin, a polyvinyl alcohol resin, a polybutyl-modified resin, or a copolymer resin thereof can be used as a binder.
- a halogen-based, alcohol-based, ketone-based, ester-based, aliphatic hydrocarbon-based, aromatic hydrocarbon-based, ether-based solvent, or a mixture thereof can be used.
- concentration of the dimonium compound of the present invention varies depending on the thickness of the coating to be produced, the absorption intensity, and the visible light transmittance, but is generally from 0.1 to 30% by weight based on the binder resin.
- a near-infrared absorption filter is obtained by coating the transparent resin film, transparent resin plate, transparent glass or the like with a spin coater, a bar coater, a ronor coater, a spray or the like using the coating material thus prepared. Can do.
- a polyvinyl butyral adhesive for ethylene, urethane and talyl resins, or laminated glass ethylene
- a known transparent adhesive for laminated glass such as vinyl acetate adhesive can be used.
- the near-infrared absorbing filter of the present invention may be a resin composition containing the dimonium compound of the present invention provided on a substrate, or the substrate itself contains a near-infrared absorbing compound (or its curing)
- the layer which consists of a thing) may be sufficient.
- the substrate is not particularly limited as long as it can be generally used for a near infrared absorption filter, but a resin substrate is usually used.
- the thickness of the layer containing the dimonium compound of the present invention is appropriately determined according to the purpose such as a force near-infrared cut rate which is usually about 0.1 ⁇ m to 10 mm.
- the content of the dimonium compound of the present invention is also appropriately determined according to the target near-infrared cut rate.
- Examples of the resin that can be used include the same resins as those of the resin composition.
- a resin that is as transparent as possible is preferable.
- Examples of the method for producing the near-infrared absorbing filter include the same methods as those for producing the resin composition.
- the near-infrared absorbing filter of the present invention may contain only the dimonium compound of the general formula (1) of the present invention as a near-infrared absorbing compound, but two or more kinds of the dimonium compounds of the present invention may be used. Further, these compounds may be used in combination with near infrared absorbing compounds other than the dimonium compound of the present invention. Examples of other near-infrared absorbing compounds that can be used in combination include phthalocyanine dyes, cyanine dyes, di-nickel nickel complexes, and the like.
- inorganic metal near-infrared absorbing compounds that can be used in combination include copper compounds such as metallic copper or copper sulfide and copper oxide, metal mixtures mainly composed of zinc oxide, tungsten compounds, ITO, and soot. Can be mentioned.
- a dye having an absorption in the visible region may be added within a range that does not impair the effects of the present invention. Also contains only toning dyes The near-infrared absorption filter of the present invention can be attached later.
- the near infrared cut region is preferably 750 to 1200 nm, more preferably 800 to 1000 nm, and the average near infrared transmittance of the region is 50. /. Or less, more preferably 30% or less, even more preferably 20% or less, particularly preferably 10% or less.
- the near-infrared absorbing filter of the present invention is not limited to applications such as a display front plate, but is also used for filters and films that need to cut infrared rays, such as heat insulating films, optical products, and sunglasses. I can do it.
- the near-infrared absorbing filter of the present invention has a very high transmittance in the visible light region, does not contain antimony or arsenic, and has excellent near-infrared light that absorbs a wide range in the environment-friendly near-infrared region. Absorption filter. In addition, it is more stable than conventional near-infrared absorbing filters that contain no antimony, perchlorate ions, hexafluorophosphate ions, or borofluoride ions. Furthermore, the solubility is sufficient and the processability is also excellent.
- the near-infrared absorption filter of the present invention is very excellent in heat resistance, moisture and heat resistance, and light resistance, and hardly undergoes a reaction such as decomposition by heat, so that the near-infrared absorption filter hardly causes coloring in the visible part. Can be obtained. Furthermore, since it has such characteristics, it can be suitably used for near-infrared absorption filters and near-infrared absorption films such as heat-insulating films and sunglasses, particularly for near-infrared absorption filters for plasma displays. Is preferred.
- the optical information recording medium of the present invention has a recording layer on a substrate, and the recording layer contains the dimonium compound of the present invention.
- This recording layer may be composed only of a dimonium compound or may be mixed with various additives such as a binder. In this case, information is recorded by the dimonium compound of the present invention.
- a mixture containing the dimonium compound of the present invention and an organic dye other than this, Inclusion in the recording layer of an optical information recording medium on which information is recorded by the organic dye can improve the light resistance of the optical information recording medium.
- organic dyes used for recording information in such optical information recording media include cyanine dyes, squalium dyes, indoor diphosphate dyes, phthalocyanine dyes, azo dyes, and melocyanine dyes. And polymethine dyes, naphthoquinone dyes, pyrylium dyes, and the like.
- the dimonium compound of the present invention is usually used in an amount of 0.01 to 10 monolayers, preferably 0.03 to 3 monolayers, per 1 mol of these organic dyes.
- the optical information recording medium of the present invention is provided with a recording layer containing the dimonium compound of the present invention and, if desired, a dye other than this, on a substrate. If necessary, a reflective layer and a protective layer are provided. It is done. Any known substrate can be used. For example, a glass plate, a metal plate, a plastic plate or a film may be mentioned. Plastics for producing these include acrylic resin, polycarbonate resin, methacrylic resin, polysulfone resin, polyimide resin, amorphous polyolefin resin, polyester resin. And polypropylene resin. Examples of the shape of the substrate include various shapes such as a disk shape, a card shape, a sheet shape, and a roll film shape.
- a guide groove may be formed on a glass or plastic substrate to facilitate tracking during recording.
- an undercoat layer such as a plastic binder, an inorganic oxide, or an inorganic sulfide may be provided on the glass or plastic substrate.
- the undercoat layer preferably has a lower thermal conductivity than the substrate.
- the recording layer in the optical information recording medium of the present invention contains, for example, the dimonium compound of the present invention and, more preferably, the dimonium compound of the present invention and other organic dyes in a known organic mixture 'J, such as tetrafluoro Soluble in chloropropanol (TFP), octafluoropentanol (OFP), diacetone alcohol, methanol, ethanol, butanol, methyl solvosolve, ethyl solvosolve, dichloroethane, isophorone, cyclohexanone, etc.
- TFP chloropropanol
- OFP octafluoropentanol
- diacetone alcohol methanol, ethanol, butanol, methyl solvosolve, ethyl solvosolve, dichloroethane, isophorone, cyclohexanone, etc.
- a binder can be obtained by adding a binder and coating the solution on a substrate with a spin coater, bar coater, roll coater or the like.
- Other methods include vacuum deposition, sputtering, doctor blade method, casting method or soaking the substrate in the solution. It can also be obtained by the dateping method.
- an acrylic resin, a urethane resin, an epoxy resin, or the like can be used as the binder.
- the film thickness of the recording layer is preferably from 0.01 am to 5 zm, more preferably from 0.02 111 to 3/111 in consideration of recording sensitivity and reflectance.
- an undercoat layer can be provided below the recording layer, and a protective layer can be provided on the recording layer, and a reflective layer can be provided between the recording layer and the protective layer. It can be provided.
- the reflective layer is composed of gold, silver, copper, aluminum, etc., preferably gold, silver, or aluminum metal, and these metals may be used alone as two or more alloys. Also good.
- This layer is formed by a vacuum deposition method, a sputtering method, an ion plating method, or the like. The thickness of such a reflective layer is usually 0.02 to 2 ⁇ m.
- the protective layer that may be provided on the reflective layer is usually formed by applying an ultraviolet curable resin by a spin coating method and then irradiating the ultraviolet ray to cure the coating film.
- an ultraviolet curable resin by a spin coating method and then irradiating the ultraviolet ray to cure the coating film.
- epoxy resin, acrylic resin, silicone resin, urethane resin, etc. are also used as the protective film forming material.
- the thickness of such a protective film is usually from 0 ⁇ 01 to: 100 / im.
- Information recording or image formation in the optical information recording medium of the present invention is performed by a focused spot such as a laser, for example, a semiconductor laser, a helium neon laser, a He-Cd laser, a YAG laser, or an Ar laser.
- a high-energy beam is irradiated to the recording layer through the substrate or from the opposite side of the substrate, and information or images are read out by irradiating a low-power laser beam to form pits and pits. This is done by detecting the difference between the reflected light amount or transmitted light amount of the unexposed portion.
- the dimonium compound of the present invention has a maximum absorption wavelength of 900 nm or more and a molar extinction coefficient as large as tens of thousands to hundreds of thousands.
- the results of stability tests such as heat resistance, light resistance, and heat-and-moisture resistance show superior stability with less discoloration compared to conventional products, and sufficient solvent solubility compared to solubility tests. It can be used as an infrared absorber with good processability.
- the near-infrared absorption filter using the dimonium compound of the present invention has higher solubility and processability than the conventional near-infrared absorption filter using the dimonium compound, and is further resistant to heat and moisture. Excellent stability such as heat resistance and light resistance. Especially these cheap It is a near-infrared absorbing filter with excellent heat resistance, moist heat resistance, and light resistance that hardly undergoes reactions such as decomposition in the qualitative test and hardly causes coloring in the visible region.
- a near-infrared absorption filter a near-infrared absorption film such as a heat insulating film and sunglasses, and particularly for a near-infrared absorption filter for a plasma display. Is preferred.
- the optical information recording medium of the present invention is superior in light resistance stability as compared with a conventional optical information recording medium comprising a dimonium compound.
- the dimonium compound of the present invention has sufficient solubility and excellent processability in preparing an optical information recording medium. For example, when an organic dye thin film corresponding to the recording layer of an optical information recording medium contains these compounds as a light stabilizer, it provides an optical information recording medium with significantly improved durability and light resistance during repeated reproduction. can do.
- the corresponding phenylenediamine derivative was oxidized with an oxidizing agent in the presence of the corresponding anion, or after oxidation with the oxidizing agent, in the same manner as in Synthesis Example 1, and then reacted with the corresponding anion. Can be synthesized.
- Example 3 Near-infrared absorbing filter and heat stability test
- Example 2 In 18.8 parts of MEK (methyl ethyl ketone), 1.2 parts of the dimonium compound obtained in Example 1 were dissolved. To this solution, 80 parts of a resin solution in which 25 parts of acrylic resin (Mitsubishi Rayon Co., Ltd., Dialnal BR-80) was added and dissolved in 75 parts of MEK was mixed to obtain a coating solution. This was coated on a polyester film so as to have a thickness of 2 to 4 ⁇ m, and dried at 80 ° C. to obtain a near infrared absorption filter of the present invention.
- MEK methyl ethyl ketone
- the obtained near-infrared absorption filter was left in an oven at 100 ° C. for 250 hours to conduct a heat stability test. Before and after the test, the filter was measured with a spectrophotometer (manufactured by Shimadzu Corporation, UV-3150), and the residual amount of dye was evaluated from the change in absorbance at the maximum absorption wavelength. The L * value (brightness), a * value, and b * value (chromaticity) were measured using the spectrophotometer, and the stability was evaluated based on the change in b * value. The results are shown in Tables 2_1 and 2_2.
- the near-infrared absorption filter obtained in the same manner as in Example 3 was allowed to stand in a thermo-hygrostat under the conditions of 85 ° C. and 85% RH for 250 hours, and a moisture and heat resistance test was conducted. Before and after the test, the filter was measured with a spectrophotometer (manufactured by Shimadzu Corporation, UV-3150), and the amount of dye remaining was evaluated from the change in absorbance at the maximum absorption wavelength. The L * value (brightness), a * value, and b * value (chromaticity) were measured using the spectrophotometer, and the stability was evaluated based on the change in b * value. The results are shown in Table 3-1 and Table 3-2.
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Optical Filters (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Thermal Transfer Or Thermal Recording In General (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
Abstract
Description
Claims
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Cited By (7)
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WO2007148595A1 (ja) * | 2006-06-20 | 2007-12-27 | Nippon Kayaku Kabushiki Kaisha | ジイモニウム化合物及びその用途 |
CN102395642A (zh) * | 2009-04-14 | 2012-03-28 | 株式会社日本触媒 | 近红外线吸收粘合剂组合物 |
JP2013182028A (ja) * | 2012-02-29 | 2013-09-12 | Fujifilm Corp | 赤外線吸収性組成物および赤外線カットフィルタ |
JP2014097976A (ja) * | 2008-09-01 | 2014-05-29 | Tokyo Ohka Kogyo Co Ltd | 新規な化合物、および酸発生剤 |
WO2015198782A1 (ja) * | 2014-06-25 | 2015-12-30 | ソニー株式会社 | 赤外光カットフィルタ、固体撮像素子及び撮像装置 |
US9966402B2 (en) | 2014-12-04 | 2018-05-08 | Jsr Corporation | Solid-state imaging device |
US10854661B2 (en) | 2015-01-21 | 2020-12-01 | Jsr Corporation | Solid-state imaging device, infrared-absorbing composition, and flattened-film-forming curable composition |
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KR101251898B1 (ko) * | 2010-12-28 | 2013-04-08 | 에스케이케미칼주식회사 | 디이모늄계 화합물 및 이를 이용한 근적외선 흡수 필터 |
CN111665583B (zh) * | 2015-05-12 | 2022-03-15 | Agc株式会社 | 近红外线吸收色素和吸收层 |
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JP2005049848A (ja) * | 2003-07-16 | 2005-02-24 | Asahi Glass Co Ltd | 光学フィルム |
WO2006028006A1 (ja) * | 2004-09-06 | 2006-03-16 | Nippon Kayaku Kabushiki Kaisha | ジイモニウム化合物及びその用途 |
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JP2005049848A (ja) * | 2003-07-16 | 2005-02-24 | Asahi Glass Co Ltd | 光学フィルム |
WO2006028006A1 (ja) * | 2004-09-06 | 2006-03-16 | Nippon Kayaku Kabushiki Kaisha | ジイモニウム化合物及びその用途 |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2007148595A1 (ja) * | 2006-06-20 | 2007-12-27 | Nippon Kayaku Kabushiki Kaisha | ジイモニウム化合物及びその用途 |
JP2014097976A (ja) * | 2008-09-01 | 2014-05-29 | Tokyo Ohka Kogyo Co Ltd | 新規な化合物、および酸発生剤 |
CN102395642A (zh) * | 2009-04-14 | 2012-03-28 | 株式会社日本触媒 | 近红外线吸收粘合剂组合物 |
JP2013182028A (ja) * | 2012-02-29 | 2013-09-12 | Fujifilm Corp | 赤外線吸収性組成物および赤外線カットフィルタ |
WO2015198782A1 (ja) * | 2014-06-25 | 2015-12-30 | ソニー株式会社 | 赤外光カットフィルタ、固体撮像素子及び撮像装置 |
US9966402B2 (en) | 2014-12-04 | 2018-05-08 | Jsr Corporation | Solid-state imaging device |
US10854661B2 (en) | 2015-01-21 | 2020-12-01 | Jsr Corporation | Solid-state imaging device, infrared-absorbing composition, and flattened-film-forming curable composition |
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KR20080007333A (ko) | 2008-01-18 |
CN101175716A (zh) | 2008-05-07 |
JPWO2006120888A1 (ja) | 2008-12-18 |
TW200642994A (en) | 2006-12-16 |
JP4908414B2 (ja) | 2012-04-04 |
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