Classifications

• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
  • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
  • G03F7/70—Microphotolithographic exposure; Apparatus therefor
  • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
  • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
  • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
  • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
  • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
  • G03F1/36—Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
• • H—ELECTRICITY
  • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
  • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
  • H05K3/00—Apparatus or processes for manufacturing printed circuits
  • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
  • H05K3/0082—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the exposure method of radiation-sensitive masks
• • H—ELECTRICITY
  • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
  • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
  • H05K3/00—Apparatus or processes for manufacturing printed circuits
  • H05K3/0008—Apparatus or processes for manufacturing printed circuits for aligning or positioning of tools relative to the circuit board

Definitions

• This invention relates to amethodof and a system for obtaining image data for drawing an image on a substrate and a method of and a system for drawing an image on a substrate on the basis. of image data obtained by the method of and a system for obtaining image data.
• a spatial light modulator element such as a DMD (digital micro mirror device) is employed and a light beam is modulated on the basis of an exposure image data.
• a desired image is formed by moving the DMD in a predetermined scanning direction relatively to the exposing surface while inputting image data corresponding to the number of micro mirrors in the memory cell of the DMD in response to movement of the DMD in the scanning direction so that spot groups corresponding to the micro mirrors of the DMD are formed in sequence in time sharing. See, for instance, Japanese Unexamined Patent Publication No. 2004-233718.
• the substrate is heat-treated when a color filter pattern is exposed, and can be expanded or shrunk by the heat.
• the substrate is deformed (expanded or shrunk), spots in R, G, B can be mispositioned relatively to each other. Accordingly, it is necessary to form an exposure pattern according to the deformation of the substrate described above.
• the primary object of the present invention is to provide a method of and a system for obtaining image data for drawing an image on a substrate which can obtain image data according to deformation of the substrate without involving deterioration of the production efficiency.
• Another object of the present invention is to provide a method of and a system for drawing an image on a substrate on the basis of image data obtained by the method of and a system for obtaining image data.
• a first method of obtaining image data which is used when an image is formed on a substrate by spot forming region in which imaging spots are formed on the basis of the image data
• the improvement comprises steps of storing a plurality of pieces of imagined imaging data obtained in advance under a plurality of imagined image data obtaining conditions which are for obtaining image data from an original image data representing an image on the basis of a preset relative position of an imaging surface and the spot forming region on the substrate and which are based on relative positions of an imaging surface and the spot forming region different from each other, and at the same time, setting in advance a correspondence between imagined image data obtaining conditions and the imagined image data, obtaining an image data obtaining condition for obtaining an image data from the original image data on the basis of the real relative position of an imaging surface and the spot forming region on the substrate when the image is drawn on the substrate, obtaining the imagined image data obtaining condition corresponding to the image data obtaining condition obtained, identifying a piece of the imagined image data corresponding to the obtained
• the original image data when there is no imagined image data obtaining condition corresponding to the image data obtaining condition in a plurality of pieces of the imagined image data obtaining condition corresponding the stored pieces of the imagined image data, the original image data may be sampled on the basis of the image data obtaining condition to obtain the image data.
• a second method of obtaining image data which is used when an image is formed on a substrate bymoving relatively to the substrate spot forming region in which imaging spots are formed on the basis of the image data and forming the imaging spots on the substrate in sequence with the movement of the spot forming region wherein the improvement comprises steps of obtaining pieces of information which are on imagined loci, of preset spot forming region on the substrate and are on imagined loci of imaging spot data corresponding to imagined loci of preset spot forming region on original image data linking pieces of information on imagined loci of the image data with pieces of the original image data representing the image different from each other in number, obtaining imagined image data from the original image data on the basis of the pieces of information on the imagined loci of imaging spot data, storing in advance the obtained pieces of imagined image data, setting in advance a correspondence between information on the imagined loci of the imaging data and the imagined imaging data, obtaining information on loci of the spot forming region on the substrate when the image is drawn thereon, obtaining information on the loc
• the original image data may be sampled on the basis of the information on the loci of the imaging spot data to obtain the image data.
• a plurality of reference marks provided in predetermined positions on the substrate may be detected to obtain detecting position information representing the positions of the reference marks, and the information on the loci of the spot forming regionmaybe obtained on the basis of the obtained detecting position information.
• the value for identifying the imagined loci of the imaging spot data and/or the loci of the imaging spot data may be quantized at predetermined quantization pitches. Further, address correspondence where the information on the imagined loci of the imaging spot data and an address of the storage region where the imagined image data corresponding to the information on the imagined loci of the imaging spot data is stored are linked with each other may be set in advance while information on imagined loci of the imaging spot data corresponding to the information on the imagined loci of the imaging spot is obtained and the above mentioned address corresponding to the obtained imagined loci of the imaging spot data is identified on the basis of the address correspondence, and the imagined image data stored in advance at the identified address may be obtained.
• the imaging spot in advance information representing the imagined image data corresponding to the information on the imagined loci of the imaging spot and information on the range of the image data corresponding to the information on the imagined loci of the imaging spot, obtain information on the loci of the imaging spot data corresponding to information on the imagined loci of the imaging spot data, identify a piece of imagined image data corresponding to the information on the imagined loci of the imaging spot data from a plurality of pieces of imagined image data on the basis of information representing the imagined image data in the obtained imagined loci of the image data, and obtain as the image data a range of the identified imagined image data corresponding to the information on the loci of the imaging spot data on the basis of the range corresponding to the information on the loci of the imaging spot data in the information on the imagined loci of the imaging spot data.
• the original image data has a repeated image data portion where a fractional original image data is repeated in the direction of the relative movement
• store in advance the obtained pieces of imagined fractional image data set in advance the correspondence of information on the imagined loci of fractional image data and the pieces of imagined fractional image data
• the original image data has a repeated image data portion where a fractional original image data is repeated in the direction of the relative movement
• an image data in the designated range may be obtained on the basis of exception processing information in the information on the imagined loci of the imaging spot data and information which designates the repeated image data portion including in the information on the imagined loci of the imaging spot data exception processing information and information which designates the range of the repeated image data.
• the imagined image data may be stored in common.
• the component of pitches may be included in the loci of the imaging spot data and/or the imagined loci of the imaging spot data.
• a third method of obtaining image data which is used when an image is formed on a substrate bymoving relatively to the substrate spot forming region in which imaging spots are formed on the basis of the image data and forming the imaging spots at predetermined timings on the substrate in sequence with the movement of the spot forming region
• the improvement comprises steps of obtaining pieces of information on the position of imagined imaging spot data corresponding to information on the position of imagined imaging position on an original image data with a plurality of different pieces of information on the position of imagined imaging position which is information on imagined imaging position on the substrate of the spot forming region at a preset timing linked with original image data representing an image, obtaining from the original image data pieces of imagined image data corresponding to the position of imagined imaging spot data on the basis of pieces of information on the position of imagined imaging spot data, storing in advance pieces of the obtained imagined image data, setting in advance a correspondence between the.
• information on the position of the imagined imaging spot data and the imagined image data obtaining information on imaging position on the substrate of the spot forming region at an imaging timing described above, obtaining information on the position of imaging spot data corresponding to information on the position of the imaging position of the spot forming region on the substrate with the obtained information on imagined imaging position linked with the original image data, obtaining information on the imagined imaging spot data corresponding to the obtained information on the position of imaging spot data, identifying a piece of imagined image data corresponding to the obtained information on the imagined imaging spot data out of the plurality of pieces of the imagined image data stored in advance on the basis of the above correspondence and obtaining the identified imagined image data as the image data.
• the image data when there is no information on the position of the imagined imaging spot data corresponding to information on the position of the imaging spot data in the plurality of pieces of information on the position of the imagined imaging spot data corresponding to the stored pieces of the imagined imaging spot data, the image data may be obtained from the original image data on the basis of the information on the position of the imaging spot data.
• the image data may be obtained for each of the imaging spot forming regions.
• the imaging spot forming region may be formed by a spatial light modulator element.
• the method of drawing an image of the present invention is characterized by obtaining image data by the use of one of first to third methods of obtaining image data and drawing an image on a substrate on the basis of the obtained image data.
• a first system for obtaining image data which is used when an image is formed on a substrate by spot forming region in which imaging spots are formed on. the basis of the image data
• the improvement comprises imagined image data storage portion for storing a plurality of pieces of imagined imaging data obtained in advance under a plurality of imagined image data obtaining conditions which are for obtaining image data from an original image data representing an image on the basis of a preset relative position of an imaging surface and the spot forming region on the substrate and which are based on relative positions of an imaging surface and the spot forming region different from each other, a correspondence setting portion for setting in advance a correspondence between imagined image data obtaining conditions and the imagined image data, an image data obtaining condition obtaining portion for obtaining an image data obtaining condition for obtaining an image data from the original image data on the basis of the real relative position of an imaging surface and the spot forming region on the substrate when the image is drawn on the substrate, an imagined image data obtaining condition obtaining portion for obtaining the imagined image data obtaining
• the image data obtaining portion may sample the original image data on the basis of the image data obtaining condition to obtain the image data.
• a second system for obtaining image data which is used when an image is formed on a substrate bymoving relatively to the substrate spot forming region in which imaging spots are formed on the basis of the image data and forming the imaging spots on the substrate in sequence with the movement of the spot forming region
• the improvement comprises an imagined imaging spot data locus information obtaining portion for obtaining pieces of information which are on imagined loci of preset spot forming region on the substrate and are on imagined loci of imaging spot data corresponding to imagined loci of preset spot forming region on original image data linking pieces of information on imagined loci of the image data with pieces of the original image data representing the image different from each other in number, an imagined image data storing portion for storing in advance pieces of the imagined image data obtained from the original image data on the basis of the pieces of information on the imagined loci of imaging spot data, a correspondence setting portion for setting in advance a correspondence between information on the imagined loci of the imaging data and the imagined imaging data, an imaging locus information obtaining portion for obtaining information
• the image data obtaining portion may sample the original image data on the basis of the information on the loci of the imaging spot data to obtain the image data.
• the second system for obtaining image data of the present invention maybe further providedwith a position information detectingmeans which detects a plurality of reference marks provided in predetermined positions on the substrate so that the imaging locus information obtaining portion obtains the loci of the spot forming region on the basis of the obtained detecting position information.
• the value for identifying the imagined loci of the imaging spot data and/or the loci of the imaging spot data may be quantized at predetermined quantization pitches.
• the image data obtaining portion may identify the address corresponding to the information on the imagined loci of the imaging spot on the basis of the address correspondence, and may obtain the imagined image data stored in advance at the identified address.
• the image data obtaining portion may identify a piece of imagined image data corresponding to the information on the imagined loci of the imaging spot data from a plurality of pieces of imagined image data on the basis of information representing the imagined image data in the imagined loci of the image data identified by an imagined imaging data loci identifying portion, and obtain as the image data a range of the identified imagined image data corresponding to the information on the loci of the imaging spot data on the basis of the range corresponding to the information on the loci of the imaging spot data in the information on the imagined loci of the imaging spot data.
• the imagined image data storage portion may store in advance the pieces of imagined fractional image data obtained from imagined fractional image data corresponding to a plurality of imagined loci of fractional image data
• the correspondence setting portion may set in advance the correspondence of information on the imagined loci of fractional imaging spot data and the pieces of imagined fractional image data
• the imaging spot data locus information obtaining portion may obtain information on the loci of the fractional imaging spot data dividing the plurality of the fractional imaging spot data with the loci of the fractional imaging spot data linked with the imagined loci of fractional imaging spot data
• the imagined imaging spot data locus information identifying portion may identify information on the imagined loci of the fractional imaging spot data corresponding to the information on the loci of the fractional imaging spot data
• the image data obtaining portion may identify pieces of the fractional imagined image data corresponding to the information on the imagined loci of the fractional imaging spot data identified by the imagined imaging spot data locus information
• the second system for obtaining image data of the present invention may be further provided with a repeated image data portion extracting portion which extracts the repeated image data portion from the original image data and the image data obtaining portion may obtain the image data by the use of the imagined image data only on the extracted repeated image data portion.
• the imagined imaging spot data locus information obtaining portion may cause information on the imagined loci of the imaging spot data to include exception processing information and information which designates the range of the repeated image data and the image data obtaining portion may obtain an image data in the designated range on the basis of exception processing information in the information on the imagined loci of the imaging spot data and information which designates the repeated image data portion.
• the imagined image data may be stored in common.
• the component of pitches may be included in the loci of the imaging spot data and/or the imagined loci of the imaging spot data .
• a third system for obtaining image data which is used when an image is formed on a substrate bymoving relatively to the substrate spot forming region in which imaging spots are formed on the basis of the image data and forming the imaging spots at predetermined timings on the substrate in sequence with the movement of the spot forming region
• the improvement comprises an imagined imaging spot data position information obtaining portion for obtaining pieces of information on the position of imagined imaging spot data corresponding to information on the position of imagined imaging position on an original image data with a plurality of different pieces of information on the position of imagined imaging position which is information on imagined imaging position on the substrate of the spot forming region at a preset timing linked with original image data representing an image, an imagined image data storage portion for storing in advance pieces of the imagined image data obtained from the original image data on the basis of the information on the position of imagined imaging spot data, a correspondence setting portion for setting in advance a correspondence between the information on the position of the imagined imaging spot data and the imagined image data, an imaging position information obtaining portion for obtaining information
• the imaging spot obtaining portion may obtain the image data by sampling the original image data on the basis of the information on the position of the imaging spot data.
• the image data may be obtained for each of the imaging spot forming regions.
• first to third systems may comprise a spatial light modulator element for forming the imaging spot forming region.
• the system for drawing an image of the present invention is characterized by having an imaging means which images on a substrate on the basis of image data obtained by one of first to third methods of obtaining image data or one of first to third systems for obtaining image data.
• the "spot forming region" may be formed by any means so long as it forms a spot forming region on a substrate.
• the imaging spots may be formed by a light beam reflected by the modulator element of a light modulator such as a DMD, or by a light beam as it is emitted by a light source or by ink discharged from the nozzles of an ink jet printer.
• the present invention may be also applied to a method and/or a system where an optimal imagined image data set is selected on the basis of a plurality of real positional relations between the spot forming region and the imaging face from a plurality of imagined image data sets which are prepared in advance on the basis of a plurality of imaginedpositional relations imagined between the spot forming region and the imaging face.
• the imagined image data sets may either be a group of pieces of data which are given in time sharing to the spot forming region or a group of pieces of data which are simultaneously given to a grouped spot forming region.
• each of the imagined image data sets may be compressed by one set or by a plurality of sets. In this case, when an optimal imagined image data set is selected, the imagined image data set is depressed.
• the present invention may be also applied to a method and/or a system where a plurality of imagined image data sets are prepared in advance on the basis of a plurality of imaginedpositional relations imagined between the spot forming region and the imaging face so that an optimal imagined image data set can be selected when an image is discretely formed on the imaging face by a spot forming region.
• a plurality of pieces of imagined image data are obtained by the use of a plurality of different imagined image data obtaining conditions and stored in advance and at the same time, correspondence between imagined image data obtaining conditions andpieces of imagined image data is set in advance, an image data obtaining condition under which image data is obtained is obtained on the basis of the real positional relation between the imaging face and the spot forming region on the substrate when an image is formed on the substrate, an imagined image data obtaining condition corresponding to the obtained image data obtaining condition is obtained, an imagined image data corresponding to the obtained imagined image data obtaining condition is identified from the pieces of imagined image data on the basis of the above correspondence and the identified imagined image data is obtained as the image data.
• a plurality of pieces of imagined image data corresponding to imagined loci of different imaging spot data are obtained from the original image data on the basis of a plurality of pieces of information on loci of different imaging spot data and stored in advance and at the same time, correspondence between information on imagined loci of the imaging spot data and pieces of imagined image data is set in advance, an information on the loci of the imaging spot forming region on the substrate when an image is formed on the substrate is obtained, information on the imaged loci of the imaging spot data corresponding to information on the loci of the spot forming region on the substrate is obtained with the obtained information on the loci of the spot forming region on the substrate linked with the original image data, information on an imagined loci of the imaging spot data corresponding to the obtained information on loci of the imaging spot is obtained, imagined image data corresponding to the obtained information on an imagined loci of the imaging spot data is identified
• a plurality of pieces of imagined image data corresponding to imagined position of different imaging spot data are obtained from the original image data on the basis of a plurality of pieces of different imagined image data position information and stored in advance and at the same time, correspondence between pieces of information on position of the imagined imaging spot data and the imagined image data is set in advance, information on the imaging position of the spot forming region on the substrate at a preset timing when an image is formed on the substrate is obtained, information on the position of the imaging spot data corresponding to the information on the imaging position of the spot forming portion on the substrate is obtainedwith the obtained information on the imagingposition linked with the original image data/ information on the imagined position of the imaging spot data corresponding to the obtained information on the spot forming portion is obtained, imagined image data corresponding to the obtained information on the imagined position of the imaging spot data is identified from a plurality of imagined image data stored in advance on the basis of the above correspondence and the identified imagined image data is obtained as the image data. Accordingly, the time required to obtain the image data corresponding to the
• Figure 1 is a perspective view of an exposure system employing a system for drawing an image on a substrate in accordance with a first and second embodiments of the present invention
• FIG 2 is a perspective view of the scanner of the exposure system shown in Figure 1
• Figure 3A is a plan view showing the exposed area on the exposing face of the substrate
• Figure 3B is a plan view showing the arrangement of the exposed area by each exposure head
• Figure 4 is a view showing the DMD in the exposure head of the exposure system shown in Figure 1
• Figure 5 is a block diagram showing an electric arrangement of the exposure system employing the first embodiment of the present invention
• Figure 6 is a view showing an exposure pattern of the liquid crystal display
• Figure 7 is a view for description of production of the trace data
• Figure 8 is a view showing a correspondence between the vector Vl (information on the imagined loci of the imaging data) and the trace data
• Figures 9A and 9B are views for description of communization of the trace data
• Figures 1OA to 1OC are views for description of communization of the trace data
• Figure 11 is a view for description of obtaining exposure spot data from the vector data
• Figure 12 is a schematic view showing a relation between the reference marks on an optimally-shaped substrate and information on passage of a predetermined micro-mirror
• Figure 13 is a view for description of obtainment of information on exposure of the micro-mirror
• Figure 14 is a view for description of obtaining information on the locus of exposure spot data on the basis of information on the locus of the exposure light beam
• Figure 15 is a view for description of obtaining information on the locus of exposure spot data on the basis of information on the locus of the exposure light beam of the micro-mirror,
• Figure 16 is a view showing another method of setting the vector Vl (information on the imagined loci of the imaging spot data) ,
• Figure 17 is a view showing another method of obtaining the trace data number corresponding to the vector V3 (information on the loci of the imaging spot data) ,
• Figure 18 is a view showing the template data
• Figure 19 is a view showing correspondence between the trace data and the leading address
• Figure 20 is a view for description of another method of obtaining the exposure spot data train corresponding to a locus of the exposure light beam of the micro-mirror
• Figure 2IA is a view showing a case where the vector V3 is partly on the data of the display portion and the other part of the vector V3 is on the data of the wiring portion,
• Figure 2IB is a view for describing a method of reading out the trace data when the vector V3 is in the position shown in Figure 2IA,
• Figure 22 is a view showing the structure of the exposure spot data information when the readout range is designated
• Figure 23 is a view for describing another method of obtaining the exposure spot data when the vector V3 is partly on the data of the wiring portion
• Figures 24A and 24B are views for describing still another method of obtaining the exposure spot data when the vector V3 is partly on the data of the wiring portion
• Figures 25A and 25B are views for describing still another method of obtaining the exposure spot data when the vector V3 is partly on the data of the wiring portion
• Figure 26 is a view showing the exposure spot data train of each micro-mirror
• Figure 27 is a view showing the frame data
• Figure 28 is a block diagram showing an electric arrangement of the exposure system employing a second embodiment of the present invention.
• Figure 29 is a view showing columns of the micro-mirror and the vector V4n (information on the position of the imagined imaging spot data) ,
• Figure 30 is a view showing a method of obtaining the trace data corresponding to a reference vector V41 and the vector V41'
• Figure 31 is a view showing a correspondence between the trace data and the reference vector V41 and the vector V41' (information on the position of the imagined imaging spot data)
• Figure 32 is a view for description of another method of obtaining the detecting vector (information on the imaging position) .
• An exposure system employing a first embodiment of a method of and a system for obtaining an image data of the present invention and a method of and a system for forming an image of the present invention will be described with reference to the drawings, hereinbelow.
• the exposure system is for exposing in a predetermined exposure pattern and especially characterized by production of image data used in exposure in a predetermined exposure pattern.
• the structure of the exposure system will be briefly described first.
• an exposure system 10 is providedwith a plate-like movable stage 14 which attracts a glass substrate 12 against its surface, thereby holding the glass substrate 12.
• a thick plate-like table 18 is supported by four legs 16 and a pair of guides 20 extends in the direction of movement of the movable stage 14 on the upper surface of the table 18.
• the movable stage 14 is disposed so that its longitudinal direction is directed toward the 'direction of movement of the movable stage 14 and is movable back and forth along the guides 20.
• a substantially U-shaped gate 22 extends across the path of movement of the movable stage 14 at the center of the table 18.
• the opposite ends of the gate 22 are respectively fixed to the corresponding side surfaces of the table 18.
• a scanner 24 is provided, and on the other side of the gate 22, a plurality of (e.g., two) cameras 26 for detecting the leading end and the trailing end of the glass substrate 12 and a plurality of circular reference marks 12a on the substrate 12 are provided.
• the reference marks 12a on the substrate 12 are, for instance, holes which are formed in advance on the substrate 12 on the basis of preset information on the position of the reference marks . Lands, or etching marks may be used instead of holes.
• a predetermined pattern formed on the substrate 12, for instance, a pattern of the layer under the layer to be exposed may be used as the reference marks 12a. Though only six reference marks 12a are shown in Figure 1, actually more reference marks 12a are provided.
• the scanner 24 and the cameras 26 are mounted on the gate 22 to be fixedly positioned above the path of movement of the movable stage 14 and are connected to a controller (to be described later) for controlling them.
• the scanner 24 is provided with ten exposure heads 30(3OA to 30J) which are substantially arranged in a matrix of 2 rows X 5 columns.
• a plurality of DMDs 36 each of which is a spatial modulator element for spatial modulation of a light beam impinging thereon are disposed inside each of the exposure head 30.
• the DMD 36 has a number of two-dimensionalIy arranged micro-mirrors 38, and are mounted so that the row of the micro-mirrors 38 is at a predetermined set inclination angle ⁇ to the scanning direction. With this arrangement, the area 32 exposed by each exposure head 30 is a rectangular area inclined to the scanning direction.
• a strip-like exposed area 34 is formed on the substrate 12 for each exposure head 30.
• the light source for causing the light beam to enter each of the exposure heads 30 is abbreviated in the drawings, for instance, a laser can be used.
• the DMDs 36 of each exposure head 30 is turned on/off on the basis of a micro-mirror unit and a dot pattern (black/white) corresponding to the micro-mirrors 38 of the DMDs 36 is exposed on the substrate 12.
• the strip-like exposed areas 34 are formed by two-dimensionally arranged dots corresponding to the micro-mirrors 38 shown in Figure 4. Since the two-dimensionally arranged dot pattern is inclined with respect to the scanning direction, the dots arranged in the scanning direction passes between the dots arranged in a direction intersecting the scanning direction, whereby high resolution can be realized. Dots which are not used can exist due to fluctuation in adjustment of the inclined angle. For example, the dots hatched in Figure 4 are not used, and the mirrors 38 in the DMD 36 corresponding to the dots are always off.
• the exposure head 30 in each of the lines are shifted by a predetermined distance in the direction of the arrangement so that each of the strip-like exposed areas 34 partly overlaps with those adjacent thereto. Accordingly, for instance, an area between the leftmost exposing area 32A in the first row and the next leftmost exposing area 32C in the first row which cannot be exposed by either of the exposing areas is exposed by the leftmost exposing area 32B in the second row. Similarly, an area between the exposing area 32 and an area 32D next to the exposing area 32B which cannot be exposed by either of the exposing areas is exposed by the exposing area 32C.
• the exposure system 10 comprises an image processing portion 50 which receives vector data representing an exposure pattern to be exposed output from a data making system 40, a detected positional information obtaining portion 51 which obtains information on the position of the reference marks 12a on the basis of images of the reference marks 12a taken by the cameras 26, an exposing light locus information obtaining portion 52 which obtains information on loci of the exposing light of each of the micro-mirrors 38 on the substrate 12 upon a real exposure on the basis of the information on the position obtained by the detected positional information obtaining portion 51, an exposing spot data locus information obtaining portion 53 which obtains information on the locus of each of the exposing spots on the coordinate system of the exposed image data on the basis of the information on loci of the exposing light of each of the micro-mirrors 38 obtained by the exposing light locus information obtaining portion 52, an exposing spot data information obtaining portion 54 which obtains exposing spot data information to be described later on the basis of the exposing spot data locus information obtained by the exposing spot data
• the exposure system 10 is provided with a moving mechanism
• the moving mechanism 60 may be of any known structure so long as it moves the movable stage 14 back and forth along the guides 20.
• the substrate 12 placed on the movable stage 14 is moved in the stage moving direction, and a control signal is output in sequence to the exposure head 30 from the exposure head control portion 58 with the movement to formdots on the substrate 12 in time sharing, whereby the substrate 12 is exposed in a desired exposure pattern.
• a piece of predetermined trace data is selected from a plurality of pieces of template data stored in advance in the exposing spot data obtaining portion 56, an exposing spot data train for each micro-mirror 38 is obtained on the basis of the selected trace data, and the control signal is output to each micro-mirror 38 of the exposure head 30 on the basis of the obtained exposing spot data train, whereby the substrate 12 is exposed in a desired exposure pattern.
• the template data stored in advance in the exposing spot data obtaining portion 56, and a method of producing the same are first described. [Method of producing the template data]
• vector data representing an exposure pattern in which the substrate 12 is to be exposed is first made.
• vector data representing an exposure pattern of a liquid crystal display is made.
• the exposure pattern R of the liquid crystal comprises a display portion where a plurality of LCD pixels P formed by three TFTs for displaying (r, g, b) are two-dimensionally arranged in a direction in which the LCD pixels P are perpendicular as shown in Figure 6 and a wiring portion comprising wiring connected to the display portion.
• Tl denotes a TFT for displaying r
• T2 denotes a TFT for displaying g
• T3 denotes a TFT for displaying b and the wiring portion is shown by the solid line.
• vector data representing an exposure pattern R such as shown in Figure 6 is made.
• the vector data made in the data making system 40 is output to the image processing portion 50. Then, in the image processing portion 50, the vector data is separated into display portion data representing the display portion and wiring portion data representing the wiring portion. The display portion data and the wiring portion data are respectively converted into raster data and temporarily stored.
• the template data is made. Though, the template data is not made for the wiring portion data in this embodiment, the method of obtaining the exposing spot data from the wiring portion data will be described later.
• one piece of the LCD pixel data PD in the display portion data D is linked with the coordinates of the exposing spot on the substrate to be exposed by each micro-mirror 38, and pieces of LCD pixel data PD on an extended vector VIt of vector Vl joining a predetermined starting point s (xl,yl) in a piece of the LCD pixel data PD and a predetermined ending point e (x2,y2) are sampled at predetermined sampling pitches, whereby a fractional exposing spot data strain is obtained.
• y-direction is a direction corresponding to the scanning direction of the micro-mirror 38 with respect to the substrate 12.
• x-direction is a direction perpendicular to the above scanning direction. That is, the vector Vl means a part of the locus on which an image of the micro-mirror can pass the substrate 12.
• Vl is s (xl,yl)
• the ending point of the same is e (x2,y2)
• the sampling pitches in the x-direction of the exposing spot data is pitch_x
• the sampling pitches in the y-direction of the same is pitch_y
• fluctuations of the ending point is ⁇ x in the x-direction and ⁇ y in the y-direction
• the extended vector VIt of vector Vl means a vector obtained by extending the ending point e(x2,y2) of the vector vl toward the ending point of the vector vl and can be expressed by the following relation.
• the reference vector Vl is set for a starting point s in a piece of LCD pixel data and the LCD pixel data on the extended vector VIt of the reference vector
• Vl is sampled at the sampling pitch pitch_y ⁇ , and at the same time, vectors Vl joining the starting point s of the reference vector Vl and the ending points e in a predetermined fluctuating range W about the ending point e of the reference vector are set and the LCD pixel data on the extended vector VIt of each of the set vectors Vl is sampled at the sampling pitches pitch_x and pitch_y, whereby a fractional exposing spot data strain is obtained for the extended vector VIt of each of the set vectors Vl .
• the size of the fluctuating range W has been set in advance according to the degree of deformation of the substrate 12.
• vectors Vl joining the starting point s and the ending points e in the predetermined fluctuating range W are set in the manner described above, whereby a fractional exposing spot data strain is obtained for the extended vector VIt of each of the set vectors Vl.
• the fractional exposing spot data strain obtained in the manner described above will be referred to as "trace data", hereinbelow.
• ( ⁇ x, ⁇ y) of the ending points joined to the starting points s are attached with trace data numbers as shown in Figure 8.
• the above fluctuations ( ⁇ x, ⁇ y) of the ending points means, with the position of an ending point e of the reference vector taken as a reference, deviations in the x-direction and the y-direction of the ending points e in the fluctuating range W as described above. Accordingly, the fluctuations ⁇ x and ⁇ y of the ending point e of the reference vector are both 0.
• the trace data corresponding to a trace data number is output from the image processing portion 50.
• the correspondence shown in Figure 8 is set in the exposing spot data information obtaining portion 54.
• the trace data is united into a template data with each piece of the trace data linked with the trace data numbers and is stored in a template storage portion 56a in the exposing spot data obtaining portion 56.
• the resolution of the exposed dot to be exposed by the micro-mirror 38 is 0.05jUm while the resolution of the display portion data D is 0.25jUm and larger than that of the exposed dot as shown in Figures 9A and 9B when the trace data is obtained in the manner described above, there can exist a plurality of vectors Vl which are the same in the position of the starting point s in the y-direction and the starting point and the ending point of which are both included in the range in the x-direction of one piece of pixel data .in the display portion data.
• the vectors Vl are the same in the exposing spot data thereon.
• pieces of the trace data may be communized and the same trace data number may be attached to the pieces of the trace data.
• the template storage portion 56a can be small in capacity.
• vectors Vl which are not included in the range in the x-direction of one piece of pixel data in the display portion in the ending points though common in the starting points s are necessary to discretely obtain since pieces of the exposing spot data thereon are different from each other.
• the display pixel data is determined depending on the resolution of the display portion data D. That is, the display pixel data is data of a minimum unit forming the display portion data D different from the LCD pixel data of the exposure pattern R.
• a part of the exposing spots arranged in a row in the x-direction need not be made as the starting points s, whereby the number of the vectors 1 may be reduced so that the volume of trace data can be reduced. Further, it is not necessary to take all the exposing points in as the ending points e but the number of the vectors 1 may be reduced by not making a part of the exposing spots in the fluctuating range W as the ending points e .
• the number of the vectors 1 may be reduced by making the ending points e not to fluctuate in the x-direction and setting only vectors parallel to the y-direction.
• the starting point s of the vector Vl in the y-direction only three patterns (0.075/0.25) (See Figures 1OA to 10C) corresponding to the resolution of a piece of display pixel data in the y-direction may be considered.
• the above sampling pitch is n (a natural number) times the above resolution in the y-direction, the situation may be similarly considered and the starting point s may be moved in n positions to obtain pieces of trace data in the respective n positions.
• the respective vectors Vl may be quantized at predetermined pitches .
• the coordinates of the starting point s, the ending point e and the midpoint of each vector Vl, the inclination of the vector Vl and the like which are values for identifying the vector Vl may be quantized.
• the number of the vectors Vl can be reduced, the amount of trace data corresponding to the vector Vl can be reduced and the template storage portion 56a can be small in capacity.
• the starting point s and the ending point e may be joined by a curved line or a broken line.
• the trace data corresponding to the vector Vl may be obtained by obtaining a contour vector V R of an exposure pattern F represented by a vector data, obtaining intersections Cl and C2 of the contour vector V R and the vector Vl, obtaining a fractional vector V Pi of the vector Vl from the starting point s of the vector Vl to the intersection Cl by sampling exposing spot data indicated at 0 at predetermined sampling pitches, obtaining a fractional vector Vp 2 from the intersection Cl to the intersection C2 by sampling exposing spot data indicated at 1 at predetermined sampling pitches, obtaining a fractional vector Vp 3 from the intersection C2 to the ending point e by sampling exposing spot data indicated at 0 at predetermined sampling pitches, and joining these vectors .
• the method of setting the vector Vl is the
• the data train may be obtained by a method where the values of ordinate y of the intersections Cl and C2 are respectively divided by the sampling pitches pitch_y in the y-direction, and the data number where "0" or "1" is continuous is calculated by the use of the difference between pieces of data converted into integers .
• the controller 70 first outputs a control signal to the moving mechanism 60, and the moving mechanism 60 moves the movable stage
• the "upstream” described above means the right side as seen in Figure 1, that is, the side where the scanner 24 is provided with respect to the gate 22 and the "downstream” described above means the left side as seen in Figure 1, that is, the side where the cameras 26 are provided with respect to the gate 22.
• the detected positional information obtaining portion 51 obtains detected positional information representing information on the detected position of the reference marks 12a on the substrate 12 on the basis of the input image data. Though may be obtained, for instance, by extracting a circular image, the detected positional information of the reference marks 12a may be detected by any other known methods . Further, the detected positional information of the reference marks 12a is specifically obtained as the values of coordinates whose coordinate system is the same as that of the exposed dot exposed by each micro-mirror 38.
• the detected positional information of the reference marks 12a thus obtained is output to the exposing light locus information obtaining portion 52 from the detected positional information obtaining portion 51.
• exposing light locus information obtaining portion 52 information on loci of the exposing light from each of the micro-mirrors 38 on the substrate 12 upon a real exposure is obtained on the basis of the input detected positional information. Specifically, a passing position information representing the position where an image of each micro-mirror 38 of the DMD 36 of each exposure head 30 passes has been set in advance for each micro-mirror 38 in the exposing light locus information obtaining portion 52. The passing position information has been set in advance depending on the position of each exposure head 30 with respect to the setting position of the substrate 12 on the movable stage 14 and is represented by a plurality of vectors or values of the coordinates of a plurality of points.
• Figure 12 shows the relation between a substrate 12 which does not undergo a press step or the like, that is, there have been generated no deformation such as strain in the substrate 12, and which is ideal in shape so that the reference marks 12a are correctly positioned in positions indicated by the preset reference mark positional information 12b and the passing position information 12c.
• the coordinate system of the passing position information is the same as that of the exposed dot exposed by the micro-mirror 38.
• the length of vector V2 parted by reference points 12e shown by a white circle in Figure 12
• the passing position information 12c is set to be equal to that of the reference vector described ' above.
• the passing position information 12c and the detected positional information 12d are linked with each other and the relative position of each reference point 12c in the passing position information 12c to those in the detected positional information 12d is obtained as shown Figure 13.
• the areas of rectangles Sa, Sb, Sc and Sd determined by a reference point 12e and the detected positional information 12d surrounding the reference point 12e are obtained.
• Such areas are obtained for each of the reference points 12e and are output as exposing light locus information to the exposing spot data locus information obtaining portion 53.
• Such exposing light locus information is obtained for each piece of the passing position information 12c, and are output to the exposing spot data locus information obtaining portion 53.
• the exposing spot data locus information obtaining portion 53 obtains the exposing spot data locus information corresponding to the input exposing light locus information as described above.
• position information 12f on the coordinate system of the exposed image data has been set in advance as shown in Figure 15 and the coordinates of a trace point 12g which satisfies the following formula (10) for each reference point 12e and information on a vector V3 joining the trace points 12g is output to the exposing spot data information obtaining portion 54 as the exposing spot data locus information as shown in Figure 15.
• Sa:Sb:Sc:Sd Ta:Tb:Tc:Td • •• (10)
• the exposing spot data information obtaining portion 54 obtains exposing spot data information on the basis of information of each of the input vectors V3. Specifically, the exposing spot data information obtaining portion 54 obtains values of the coordinates of a starting point and an ending point of each vector V3, carries out relative conversion on the values of the coordinates to values of the coordinates of a coordinate system of the exposing spot in a piece of LCD pixel data, obtains the fluctuation ( ⁇ x, ⁇ y) of the ending point on the basis of the relative-converted values of the coordinates of the starting point and the ending point, and obtains the trace data number corresponding to each vector V3 on the basis of the relative-converted values of the coordinates of the starting point, the fluctuation ( ⁇ x, ⁇ y) of the ending point and the correspondence shown in Figure 8.
• the trace data is obtained by taking the positions of all the exposing spots in a piece of LCD pixel data as the starting point s as described above, and setting vectors Vl on the starting point s in this embodiment, the number of the pieces of the trace data may be reduced by making the position of the starting point s in the y-direction only those hatched in Figure 16 (that is, only a part) .
• the vector V3 represented by a starting point Pl and an ending point P2 after the relative conversion is extended beyond the starting point Pl and an starting point PO which is on the extension and exists in the correspondence shown in Figure 8 is obtained.
• a trace data number corresponding to the vector V3 is obtained on the basis of the starting point PO, the fluctuation ( ⁇ x, ⁇ y) and the correspondence shown in Figure 8.
• the trace data number is obtained by obtaining a starting point PO on an extension of the vector as described above, not only the trace data number but also the deviation in the y-direction of the starting point Pl from the starting point PO is obtained as a reading starting position.
• the trace data number and the reading starting position are both obtained for each vector V3, and are out to the exposing spot data obtaining portion 56 as exposing spot data information.
• the reading starting point is 0.
• the vector V3 is made by joining adjacent trace points 12g with a straight line, but the present invention need not be limited to the arrangement.
• adjacent trace points 12g may be joined with a curved line or a broken line to make the vector 3. It is preferred that especially the intersection of the straight line joining pieces of the position information adjacent to each other in the x-direction and the vector V3 be approximated at a broken line.
• a pitch component may be included in the vector V3 and/or the trace data so that the pitch component is taken into account when retrieving the trace data from the vectors V3.
• obtainment of the exposing spot data A method of obtaining the exposing spot data in the display portion data on the basis of the exposing spot data information of the vector V3 obtained by the exposing spot data information obtaining portion 54 in the manner described above will be described next.
• the template storage portion 56a of the exposing spot data obtaining portion 56 each piece of the trace data is stored linked with the trace data number (1 to n) as shown in Figure 18.
• the exposing spot data obtaining portion 56 selects the trace data having the trace data number indicated by the exposing point data information and reads out the exposing spot data from the reading starting point of the exposing point data information in the selected trace data.
• the reading starting position is 0, the trace data is read out from the top.
• the reading starting position is ml, the trace data is read out from the position of ml as shown in Figure 14.
• the exposing spot data the exposing spot data number N only may be read out .
• the exposing spot data information obtaining portion 54 it is possible to set in advance the correspondence such as shown in Figure 19 in the exposing spot data information obtaining portion 54, to obtain the top address of the storage area where the trace data of the trace data number is stored from the trace data number obtained for each vector V3 and the correspondence shown in Figure 19, obtain a reading starting address from the top address and the reading starting position, and to output the reading starting address to the exposing spot data obtaining portion 56 so that the exposing spot data obtaining portion 56 begins to read out the exposing spot data from the address indicated by the input reading starting address.
• an exposing spot data train corresponding to the exposing spot data locus of a micro-mirror 38 is obtained.
• the exposing spot data locus information on the display portion data for each micro-mirror 38 is obtained on the basis of passing position information and detected position information for the micro-mirror 38 in the manner similar to that described above, and exposing spot data information comprising a trace data number and a reading starting position is obtained on the basis of the exposing spot data locus information for each micro-mirror 38, whereby the trace data is read out on the basis of the exposing spot data information for each micro-mirror 38 and an exposing spot data train for each micro-mirror 38 is obtained.
• each of the vectors V3 may be quantized in response to the quantization of the vector Vl.
• the method of quantization of the vectors V3 is the same as that of the vector Vl.
• the values after quantization can be obtained by substituting these values in formula (8) or (9) described above.
• a method of obtaining the exposing spot data when the trace data number corresponding to the vector V3 is found in the exposing spot data information obtaining portion 54 is described, the trace data number corresponding to the vector V3 sometimes does not exist due to deformation of the substrate 12 larger than the expected range. Even in such a case, it is necessary to suitably obtain the exposing spot data corresponding to the vector V3.
• the sampling data obtaining portion 55 it is possible to output information on the vector V3 to the sampling data obtaining portion 55, to sample the exposing spot data corresponding to the vector V3 from the display data in the sampling data obtaining portion 55, to output the sampled exposing spot data to the exposing spot data obtaining portion 56 and to join the sampled exposing spot data with the exposing spot data corresponding to other vectors V3 in the exposing spot data obtaining portion 56 when the trace data number corresponding to the vector V3 is not found.
• the exposing spot data train corresponding to the exposing spot data locus for one micro-mirror by generating exposing spot data train corresponding in length to the exposing spot data locus for one micro-mirror from the exposing spot data and the 0 data based on the trace data and exposing spot data train corresponding in length to the exposing spot data locus for one micro-mirror from the exposing spot data and the 0 data based on the sampled data and by calculating the logical addition of these data train as shown in Figure 20.
• the wiring portion data has been temporarily stored in the image processing portion 50 after the raster conversion as described above.
• the wiring portion data which has been temporarily stored in the image processing portion 50 is output to the sampling data obtaining portion 55.
• the exposingpoint locus information of each micro-mirror 38 obtained in the exposing spot data locus information obtaining portion 53 is also output to the sampling data obtaining portion 55.
• the sampling data obtaining portion 55 samples the wiring portion data on each vector V3 at predetermined sampling pitches with each vectors V3 of the exposing point locus information linked with the wiring portion data and reads out the sampled wiring portion data as the exposing spot data.
• sampling data obtaining portion 55 outputs an exposing spot data train for each micro-mirror 38 obtained in the manner described above to the exposing spot data obtaining portion 56. It is assumed that the part in the wiring portion data corresponding to the display portion data has been turned to the 0 data.
• an exposing spot data train for each micro-mirror 38 representing the exposing pattern R of the liquid crystal display is generated by synthesizing an exposing spot data train for each micro-mirror 38 obtained by reading out the trace data with an exposing spot data train for each micro-mirror 38 obtained in the sampling data obtaining portion 55.
• the synthesis is carried out by calculating the logical addition of the exposing spot data train for each micro-mirror 38 obtained by reading out the trace data and the exposing spot data train for each micro-mirror 38 obtained in the sampling data obtaining portion 55 for exposing spot data information for each micro-mirror 38.
• the range on the display portion data may be output to the exposing spot data obtaining portion 56 from the exposing spot data information obtaining portion 54 together with the trace data number as the exposing spot data and in the exposing spot data obtaining portion 56, the exposing spot data corresponding to the above range of the trace data maybe obtained in the exposing spot data obtainingportion 56.
• the present invention may be arranged to read out the exposing spot data in the range of from tl to t2 in the trace data as shown in Figure 21B.
• the part which is on the wiring portion outside the range of from tl to t2 in the trace data may be added with the 0 data.
• the present invention may be arranged to calculate the logical addition of the 0 data added as described above and the exposing spot data obtained by sampling the wiring portion data.
• the data structure of the exposing spot data locus information may be such as shown in Figure 22, where a bit in the bytes showing the reading starting point is used for an exception processing flag and range designation bytes are provided in the bytes following the bit.
• the exception processing flag e.g., 1
• the exception processing flag may be erected while during the normal processing, the exception processing flag is turned off (e.g., 0) and there is no range designation byte in the following bytes.
• the exposing spot data obtaining portion 56 When the on exception processing flag (e.g., 1) is detected in the exposing spot data obtaining portion 56, the exposing spot data is read out from the reading starting position as in the normal processing and then the trace data in the range designated by the range designation bytes is made effective and the exposing spot data outside the range is made to be 0. Whereas, when the exception processing flag is off (e.g., 0), there is no range designation byte and accordingly, the trace data may be read out from the reading starting position as the normal processing.
• the on exception processing flag e.g., 1
• the template data is also stored in the exposing spot data information obtaining portion 54, and the exposing spot data in the range of the display portion is read out from the trace data corresponding to the above vector V3 while the 0 data is added to the part on the wiring portion data and the exception processing byte (in m bytes and the overall bit indicates "1") is added to the top of the exposing spot data as shown in Figure 20, whereby the exposing spot data added with the exception processing byte may be output to the exposing spot data obtaining portion 56.
• the exception processing byte in m bytes and the overall bit indicates "1
• the exposing spot data obtaining portion 56 when the exception processing byte is detected, the exposing spot data is not read out from the template storage portion 56a but the data following the exception processing byte is obtained as the exposing spot data corresponding to the above' vector V3.
• the wiring portion data is stored in the sampling data obtaining portion 55 with the display portion data and the wiring portion data separated from each other and the exposing spot data train obtained in the sampling data obtaining portion 55 and that obtained in the exposing spot data obtaining portion 56 are synthesized in the description above, the display portion data and the wiring portion data need not be separated.
• the exposure image data before separation is stored in the exposing spot data information obtaining portion 54 and information representing the range of the display portion data is stored. Then, in the exposing spot data information obtaining portion 54, whether a vector V3 of the input exposing data locus is partly on the wiring data is determined on the basis of the information representing the range of the display portion data.
• the exposing spot data information (the trace data number and the reading starting position) of the vector V3 is obtained, and an identification flag "0" is added to the top of the exposing spot data as shown in Figure 24A and the exposing spot data information with the identification flag is output to the exposing spot data obtaining portion 56.
• the part of the exposing spot data corresponding to the vector V3 is sampled from the exposure image data stored in advance and an identification flag "1" is added to the top of the sampled data as shown in Figure 24B and the sampled data with the identification flag is output to the exposing spot data obtaining portion 56.
• the sampled data be made of a run length system.
• the exposing spot data information following the identification flag "0" is read and the trace data is read in the manner described above on the basis of the exposing spot data information, whereby the exposing spot data corresponding to the vector V3 is obtained.
• the sampled data following the identification flag "0" is read and when the sampled data has been made of a run length system, the sampled data is decoded, whereby the exposing spot data corresponding to the vector V3 is obtained.
• the data structure in this case need not be limited to such but other data structures may be employed.
• the data may be formed by the sampled data corresponding to the part of the vector V3 on the wiring portion data and the exposing spot data information corresponding to the part of the vector V3 on the display portion data.
• the sampled data corresponding to the part of the vector V3 on the wiring portion data may be sampled from the exposure image data stored in advance in the exposing spot data information obtaining portion 54 in the manner described above. It is preferred that the sampled data be made of a run length system.
• the exposing spot data information may bear thereon the trace data number and the reading starting position corresponding to the part of the vector V3 on the display portion data and a length of the exposing spot data train to be read out, that is, data representing a length of the exposing spot data.
• a type flag may be provided in the exposing spot data information as shown in Figure 25B so that when the vector V3 is not partly on the display portion data, the type flag is set to "o" whereas when the vector V3 is partly on the display portion data, the type flag is set to "1".
• the type flag is V, no sampled data is added to the exposing spot data, and no length data is included in the exposing spot data information.
• the trace data corresponding to thus obtained trace data number is read out from the above reading starting position by the length indicated by the length data, thereby obtaining the exposing spot data of the display portion.
• the 1 data on the top of the sampled data is further detected to obtain the sampled data following thereto.
• the exposing data corresponding to the above vector V3 can be obtained.
• the exposing spot data for each micro-mirror 38 thus obtained is output to the exposure head control portion 58, and in response to the output, the movable stage 14 is again moved toward the upstream at a desired speed.
• the exposure is started. Specifically, a control signal is output to the DMD 36 of each exposure head 30 from the exposure head control portion 58, and the exposure head 30 turns on and off of the micro-mirror 38 of the DMD 36 to expose the substrate 12 according to the input control signal.
• the present invention may be arranged either to read out an exposing spot data train corresponding to each position of the micro-mirror 30- of the exposure head 30 one by one from L exposing spot data trains obtained for eachmicro-mirror 30, for instance, as shown in Figure 26, and to output it to the
• a method of obtaining exposing data when a substrate 12 which has been deformed due to the press step or the like .is to be exposed the same method can be employed to obtain exposing data when a substrate 12 which has not been deformed and is ideal in shape is to be exposed.
• the exposing spot data locus information corresponding to the passing position information set in advance for each of the micro-mirrors 38 may be obtained to obtain information on the exposing spot data on the basis of the obtained exposing spot data locus information and the trace data may be read out on the basis of the information on the exposing spot data.
• the reference marks 12a on the substrate 12 are detected and information on the exposing light locus of each micro-mirror 38 is obtained on the basis of the detected positional information of the reference marks 12a
• the present invention need not be limited to such an arrangement.
• exposing light locus information on the substrate 12 upon real exposure is obtained on the basis of a deviation information obtaining means which obtains deviation of the movable stage 14 in a direction perpendicular to the direction of movement thereof, and exposing spot data locus information comprising vectors V3 is obtained on the basis of the exposing light locus information
• the exposing spot data may be obtained for each vector V3 in the manner described above .
• the deviation information may be set in advance in the deviation information obtaining means .
• a method using a laser beam which is employed in an IC wafer stepper system may be employed.
• a method using a laser beam which is employed in an IC wafer stepper system may be employed.
• the deviation can be measured by detecting in sequence with movement of the movable stage 14 the phase shift of the reflected light with the detecting portion.
• the exposing light locus may be obtained taking into account yaw of the movable stage 14. Further, the exposing, light locus maybe obtained taking into account both the detected position information and the deviation information.
• a speed fluctuation information obtaining means which obtains in advance information on fluctuation in speed of the movement of the substrate 12 may be provided so that the exposing spot data is obtained on the basis of the information on fluctuation in speed of the movement of the substrate 12 obtained by the speed fluctuation information obtaining means so that the sampling pitch pitch_y ⁇ becomes smaller in the area on the substrate 12 where the movement of the substrate 12 is slower so that the exposing slot becomes high in its density as the movement of the substrate 12 becomes slower.
• the information on fluctuation in speed of the movement of the substrate 12 means information on non-uniformity in speed of the movement of the substrate 12 generated according to the accuracy in control of the moving mechanism 60 of the movable stage 14.
• the original image data from which the exposing spot data is to be obtained need not be of data structure like display portion data.
• the original image data is not of data structure like displayportion data, it is necessary to set the vector Vl with not only the starting point s in a piece of the LCD pixel data PD but also all the exposing points on the original image data taken as the starting point s, and to obtain pieces of trace data corresponding to the vector Vl .
• the method of setting the ending point e of the vector Vl may be same as described above.
• the trace data corresponding to the vector V3 When the trace data corresponding to the vector V3 is to be obtained, the trace data may be obtained in the same manner with coordinates of the starting point s and the ending point e of the vector V3 used as they are without carrying out relative conversion on the coordinates of the starting point s and the ending point e of the vector V3.
• the exposure system 20 using a second embodiment of the present invention is substantially the same in arrangement as that using a first embodiment of the present invention shown in Figure 1.
• the exposure system 20 differs in the template data to be stored in advance and in production thereof . Specifically, in the exposure system 10 employing the first embodiment of the present invention,
• a template data is made by trace data corresponding to the locus.
• the exposure system 20 employing the second embodiment of the present invention expecting an exposing spot train where a predetermined train of the micro-mirrors in the DMD 36 can expose the substrate 12, trace data corresponding to the exposing spot train is obtained and is made the template data.
• the exposure system 20 comprises, as shown in Figure 28, an image processing portion 80 which carries out predetermined processing on image data representing an exposure pattern to expose, an exposing spot position information obtaining portion 82 which obtains position information of the exposing spot train of a micro-mirror train on the substrate 12 upon real exposure, an exposing spot data information obtaining portion 84 which obtains exposing spot data information to be described later on the basis of exposing spot position information obtained by the exposing spot position information obtaining portion 82, and an exposing spot data obtaining portion 86 which obtains exposing spot data train of the micro-mirror train on the basis of the exposing spot data information obtained by the exposing spot data information obtaining portion 84.
• the DMD 36 is first imaginarily divided into predetermined micro-mirror trains.
• the image data is linked with the coordinate system of the exposing spot which is caused to expose the substrate 12 by the micro-mirror 38.
• the exposing spot train 38b on the substrate 12 to be caused to expose the substrate 12 at predetermined timings in sequence by a micro-mirror train 38a in the micro-mirror trains which have been divided is linked with the coordinate system and the image data described above.
• the position of the exposing spot train at this time is the position of the exposing spot train when the DMD 36 is ideally positioned with respect to the substrate 12. It is assumed that the information on the position of the exposing spot train at this time has been set in advance.
• reference vectors V41 to V4n each of which joins an exposing spot at one end of each exposing spot train and an exposing spot at the other end of the exposing spot train are set .
• aplurality of vectors V41' within a fluctuation angle ⁇ with respect to the reference vector V41 are set, pieces of the exposing spot data on the reference vector V41 and the vector v41 f are sampled from the image data and pieces of trace data corresponding to the reference vector V41 and the vector v41' are obtained.
• the position of the starting point s of the reference vector V41 is moved in a predetermined range, for instance, indicated at a hatched portion in Figure 30, and vectors v41' are set for the reference vector V41 having the respective starting points s in the same manner as described above to obtain pieces of trace data corresponding to the reference vector V41 and the vector v41' in the same manner as described above.
• the fluctuation angle ⁇ and the predetermined range are suitably set according to fluctuation of the position of the DMD with respect to the substrate 12.
• the trace data is obtained in the same manner as described above.
• the position of the starting point s and the angular fluctuation ⁇ with respect to the reference vector are linked with the trace data number for the reference vectors V41 to V4n and the vectors V41' to V4n f to obtain correspondence such as shown in Figure 31. This correspondence is set in the exposing spot data information obtaining portion 84.
• Pieces of the trace data corresponding to the reference vectors V41 to V4n and the vectors V41' to V4n' are linked with the trace data numbers and are made template data, and are output to the exposing spot data obtaining portion 86 from the image processing portion 80 to be stored in a template storage portion 86a.
• Positional information on the substrate 12 of the exposing spot data train caused to really expose by the micro-mirror train 38a is first measured.
• This measurement of the positional information can be effected by moving the movable stage 14 at a speed equal to the speed at which the image is really exposed on the substrate 12 and at the same time turning on the micro-mirror train 38a of the DMD 36 at a timing equal to the real exposing timing and detecting the light from the micro-mirror train 38a with a detector provided on the movable stage 14.
• detecting vectors V51 to V5n which joins an exposing spot at one end of each exposing spot train and an exposing spot at the other end of the exposing spot train are obtained and information on the detecting vectors V51 to V5n is obtained by the exposing spot position information obtaining portion 82 as the exposing spot position information, and the exposing spot position information obtaining portion 82 outputs the information on the detecting vectors V51 to V5n to the exposing spot data information obtaining portion 84.
• the trace data numbers having the same starting point s and the same angular fluctuation ⁇ as the detecting vectors V51 to V5n are obtained on the basis of the correspondence shown in Figure 31, and the trace data numbers are output to the exposing spot data obtaining portion 86 as the exposing spot information.
• the template data is referred for the trace data numbers respectively corresponding to the detecting vectors V51 to V5n, and the trace data corresponding to the detecting vectors V51 to V5n are read out.
• the trace data obtained in the manner described above is obtained as exposing spot data for each timing of the micro-mirror train 38a.
• the exposing spot data for the micro-mirror train 38a has been described in the above description, the exposing spot data for the other micro-mirror trains may be obtained in the same manner.
• frame data for the DMD 36 at each timing is obtained. Exposure on the basis of the frame data maybe effected in the same manner as in the first embodiment described above.
• the DMD 36 is divided into predetermined micro-mirror trains such as shown in Figure 29 in the description above, the division need not be limited to that shown in Figure 29 and other methods of division may be employed.
• the DMD 36 may be divided by the rows of the micro-mirrors.
• the DMD 36 may be divided by a triangular region into a plurality of groups, and a template may be prepared for each group.
• the template may be prepared.
• the trace data is obtained for the divided reference vector in the same manner as described above, the trace data may be made the template data.
• a detecting vector joining the exposing spot on one end of the measured exposing spot train and the exposing spot on the other end of the exposing spot train with a straight line is obtained in the above description, the part between the exposing spot on one end of the exposing spot train and that on the other end thereof may be approximated at a broken line detecting vector V6 as shown in Figure 32.
• pieces of the trace data respectively corresponding to segment vectors V61 and V62 of the broken line detecting vector V6 are read out from the template data and joined together to obtain the exposing spot data corresponding to the micro-mirror train.
• the exposing spot data is obtained in the manner described above, it is necessary for the method of dividing the micro-mirror train to correspond to the approximation by the detecting vector at a broken line.
• a desired template may be selected on the basis of the relative position of the exposing spot of the micro-mirror and the detected position of the reference marks 12a.
• a transmission type spatial light modulator element can be employed in addition to such a reflection type spatial light modulator element .
• the present invention may be applied to so called an outer drum type exposure system provided with a drum around which a photosensitive material is wound.
• the substrate 12 which is exposed by the above embodiments of the present invention need not be limited to a printed circuit board but may be, for instance, a substrate for a flat panel display.
• the substrate 12 may be either like a sheet or like a member in a continuous length (e.g., a flexible board) in its shape.
• the method of and system for drawing an image of the present invention may be applied to drawing an image by a printer such as of an ink jet system.
• a printer such as of an ink jet system.
• an imaging dot by discharge of ink may be formed in the same manner as the present invention. That is, the imaging spot forming region in the present invention may ⁇ be regarded as a region to which ink discharged from each nozzle of the printer of the ink jet system adheres.
• the locus information in the present invention may be on the basis of information on the locus of the spot forming region on the real substrate or information on approximation of the locus of the spot forming region on the real substrate or information on estimation of the locus of the spot forming region on the real substrate.
• the sampling pitches pitch_x and pitch_y may be used instead of the fluctuations ⁇ x and ⁇ y.
• the image pattern to be made the template need not be limited to a repeated pattern but may be an image which discretely appears repeatedly.
• the image pattern to be made the template need not be limited to patterns which are digitally conforms to each other but may be those which may be approximate to be substantially the same.
• the image pattern to be made the template may be those in which a plurality of kinds of images are repeatedly appear.
• a template may be prepared for each kind of image or when there is a rule in arrangement of the kinds of images, a template may be prepared for each kind of arrangement.
• the member exposed by the present invention may be an LSI. In this case, the same pattern such as the memory cells may be made the template.
• the system to prepare the templates and the system to read out the templates may be separately formed.
• the template may be compressed one by one or by pluralities.
• the template to be used in drawing the image when the template to be used in drawing the image is selected, the template is depressed and is transmitted to the exposure head.

Landscapes

• Engineering & Computer Science (AREA)
• Physics & Mathematics (AREA)
• General Physics & Mathematics (AREA)
• Manufacturing & Machinery (AREA)
• Microelectronics & Electronic Packaging (AREA)
• Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
• Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
• Image Analysis (AREA)

Applications Claiming Priority (4)

Publications (1)

Family

ID=37115247

Family Applications (1)

Country Status (4)

Families Citing this family (2)

Citations (5)

• 2005
  • 2005-09-16 JP JP2005269782A patent/JP4448075B2/ja not_active Expired - Fee Related
• 2006
  • 2006-04-21 KR KR1020077025883A patent/KR20080000645A/ko not_active Application Discontinuation
  • 2006-04-21 WO PCT/JP2006/308928 patent/WO2006112555A1/en active Application Filing
  • 2006-04-21 TW TW095114301A patent/TW200707127A/zh unknown

Patent Citations (5)

Also Published As

Similar Documents

Legal Events