WO2006090575A1 - Procede d'exposition et dispositif servant a aligner - Google Patents

Procede d'exposition et dispositif servant a aligner Download PDF

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Publication number
WO2006090575A1
WO2006090575A1 PCT/JP2006/302028 JP2006302028W WO2006090575A1 WO 2006090575 A1 WO2006090575 A1 WO 2006090575A1 JP 2006302028 W JP2006302028 W JP 2006302028W WO 2006090575 A1 WO2006090575 A1 WO 2006090575A1
Authority
WO
WIPO (PCT)
Prior art keywords
exposure
unit
focus
photosensitive material
adjustment range
Prior art date
Application number
PCT/JP2006/302028
Other languages
English (en)
Japanese (ja)
Inventor
Norihisa Takada
Tomoya Kitagawa
Original Assignee
Fujifilm Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corporation filed Critical Fujifilm Corporation
Publication of WO2006090575A1 publication Critical patent/WO2006090575A1/fr

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70783—Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details

Definitions

  • DMD micromirrors using control signals generated in accordance with image data, etc., by an exposure head (scanner) 302 having a DMD arranged in the lens and a lens system that forms an image of the laser light reflected by the DMD on the scanning surface
  • an exposure head (scanner) 302 having a DMD arranged in the lens and a lens system that forms an image of the laser light reflected by the DMD on the scanning surface
  • Each of these is controlled on and off to modulate laser light, and image exposure is performed on the photosensitive material 306 set on the stage 304 and moved along the scanning direction with the modulated laser light.
  • a step of moving the moving unit with respect to the emission direction when the variation range is smaller than a width within which the focal position can be adjusted and the fluctuation range is smaller than the width through which the focal position can be adjusted.
  • the exposure apparatus 100 includes a rectangular thick plate-like mounting table 156 supported by four legs 154.
  • Two guides 158 are extended along the longitudinal direction on the upper surface of the installation table 156, and a rectangular flat plate-like stage 152 is provided on the two guides 158.
  • the stage 152 is arranged such that the longitudinal direction thereof faces the extending direction of the guide 158, and is supported by the guide 158 so as to be able to reciprocate on the installation table 156. It is driven by the device and reciprocates along the guide 158.
  • the photosensitive material 150 is attracted and held on the upper surface of the stage 152 in a state where the mounting position is determined by a positioning unit (not shown).
  • the lens systems 54 and 58 are arranged so that the DMD 50 and the exposed surface 56 are in a conjugate relationship.
  • the laser light emitted from the fiber array light source 66 is made uniform.
  • each pixel is enlarged by about 5 times by these lens systems 54 and 58, and is set to be condensed.
  • the controller 190 1 controls the driving device, and the stage 152 starts to move at a constant speed along the guide 158 on the origin position force shown in FIG.
  • Each detection unit 180 is controlled and operated by the controller 190 in synchronization with the start of the movement of the stage or at a timing just before the leading edge of the photosensitive material 150 reaches just below the CCD camera 182 of the detection unit 180.

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Automatic Focus Adjustment (AREA)

Abstract

Cette invention se rapporte à un centre (C56) d'une plage de variation (D56) d'une surface (56) à exposer qui est approchée de la valeur centrale (C166) de la plage de réglage du point focal d'une tête d'exposition (166à en conduisant un élévateur (157) fourni sur une installation (156) afin de déplacer un étage (152) dans la direction Z, c'est à dire dans la direction de l'axe optique. Il en résulte que le centre (C56) de la plage de variation (D56) de la surface (56) devant être exposée, en raison de la trajectoire d'un matériau photosensible (150) ou d'une erreur dans la dimension de l'épaisseur, approche la valeur (C166) et un point focal est réglé au moyen d'un mécanisme d'autofocus dans chaque tête d'exposition (166). La valeur (C166) est la position centrale de la plage réglant le point focal dans chaque tête d'exposition (166), et lorsque le centre (C56) de la plage de variation (D56) sur la surface du matériau photosensible (150), c'est à dire la surface (56) devant être exposée, s’approche de la valeur (C166), la plage de variation (D56) de la surface (56) devant être exposée, en raison de la trajectoire du matériau photosensible (150) ou d'une erreur dans la dimension de l'épaisseur, peut facilement être confinée dans une plage (D166), c'est à dire la plage de réglage du point focal de chaque tête d'exposition (166). En conséquence, l'apparition d'une erreur et la baisse de rendement peuvent être évités.
PCT/JP2006/302028 2005-02-22 2006-02-07 Procede d'exposition et dispositif servant a aligner WO2006090575A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005-045912 2005-02-22
JP2005045912A JP2006234960A (ja) 2005-02-22 2005-02-22 露光方法および露光装置

Publications (1)

Publication Number Publication Date
WO2006090575A1 true WO2006090575A1 (fr) 2006-08-31

Family

ID=36927217

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2006/302028 WO2006090575A1 (fr) 2005-02-22 2006-02-07 Procede d'exposition et dispositif servant a aligner

Country Status (2)

Country Link
JP (1) JP2006234960A (fr)
WO (1) WO2006090575A1 (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009244407A (ja) * 2008-03-28 2009-10-22 Fujifilm Corp 露光装置、及び露光方法
JP7214431B2 (ja) * 2018-10-22 2023-01-30 株式会社Ｓｃｒｅｅｎホールディングス 描画方法および描画装置
CN112379575A (zh) * 2020-11-13 2021-02-19 江苏富伟博智能科技有限公司 车载玻璃曝光z轴曲线运动训练方法

Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03233925A (ja) * 1990-02-09 1991-10-17 Canon Inc 自動焦点調整制御装置
JPH05275313A (ja) * 1992-03-25 1993-10-22 Nikon Corp 焦点位置検出装置
JPH06260394A (ja) * 1993-03-09 1994-09-16 Nippon Steel Corp 半導体基板の露光方法及び露光装置
JPH0774088A (ja) * 1993-01-22 1995-03-17 Hitachi Ltd 投影露光装置およびその方法
JPH11195579A (ja) * 1997-12-26 1999-07-21 Nikon Corp 露光装置及び露光方法
JP2000003864A (ja) * 1999-06-14 2000-01-07 Nikon Corp 走査露光方法、走査型露光装置、及び前記方法を用いるデバイス製造方法
JP2001332471A (ja) * 2000-05-19 2001-11-30 Canon Inc 露光装置
JP2002184693A (ja) * 2001-12-06 2002-06-28 Nikon Corp 走査型露光装置、走査露光方法、及びデバイス製造方法。
JP2004012903A (ja) * 2002-06-07 2004-01-15 Fuji Photo Film Co Ltd 露光装置
JP2004046146A (ja) * 2002-05-23 2004-02-12 Fuji Photo Film Co Ltd 露光ヘッド
JP2005032909A (ja) * 2003-07-10 2005-02-03 Fuji Photo Film Co Ltd 照明光学系およびそれを用いた露光装置
JP2005032777A (ja) * 2003-07-07 2005-02-03 Advanced Lcd Technologies Development Center Co Ltd 露光装置および露光方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1231513A1 (fr) * 2001-02-08 2002-08-14 Asm Lithography B.V. Appareil de projection lithographique avec surface réglable de focalisation
JP2004327660A (ja) * 2003-04-24 2004-11-18 Nikon Corp 走査型投影露光装置、露光方法及びデバイス製造方法

Patent Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03233925A (ja) * 1990-02-09 1991-10-17 Canon Inc 自動焦点調整制御装置
JPH05275313A (ja) * 1992-03-25 1993-10-22 Nikon Corp 焦点位置検出装置
JPH0774088A (ja) * 1993-01-22 1995-03-17 Hitachi Ltd 投影露光装置およびその方法
JPH06260394A (ja) * 1993-03-09 1994-09-16 Nippon Steel Corp 半導体基板の露光方法及び露光装置
JPH11195579A (ja) * 1997-12-26 1999-07-21 Nikon Corp 露光装置及び露光方法
JP2000003864A (ja) * 1999-06-14 2000-01-07 Nikon Corp 走査露光方法、走査型露光装置、及び前記方法を用いるデバイス製造方法
JP2001332471A (ja) * 2000-05-19 2001-11-30 Canon Inc 露光装置
JP2002184693A (ja) * 2001-12-06 2002-06-28 Nikon Corp 走査型露光装置、走査露光方法、及びデバイス製造方法。
JP2004046146A (ja) * 2002-05-23 2004-02-12 Fuji Photo Film Co Ltd 露光ヘッド
JP2004012903A (ja) * 2002-06-07 2004-01-15 Fuji Photo Film Co Ltd 露光装置
JP2005032777A (ja) * 2003-07-07 2005-02-03 Advanced Lcd Technologies Development Center Co Ltd 露光装置および露光方法
JP2005032909A (ja) * 2003-07-10 2005-02-03 Fuji Photo Film Co Ltd 照明光学系およびそれを用いた露光装置

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