Classifications

• • C—CHEMISTRY; METALLURGY
  • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
  • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
  • C08K3/00—Use of inorganic substances as compounding ingredients
  • C08K3/34—Silicon-containing compounds
• • C—CHEMISTRY; METALLURGY
  • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
  • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
  • C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
  • C08J5/005—Reinforced macromolecular compounds with nanosized materials, e.g. nanoparticles, nanofibres, nanotubes, nanowires, nanorods or nanolayered materials
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B82—NANOTECHNOLOGY
  • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
  • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
• • C—CHEMISTRY; METALLURGY
  • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
  • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
  • C08J3/00—Processes of treating or compounding macromolecular substances
• • C—CHEMISTRY; METALLURGY
  • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
  • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
  • C08K3/00—Use of inorganic substances as compounding ingredients
  • C08K3/34—Silicon-containing compounds
  • C08K3/346—Clay
• • C—CHEMISTRY; METALLURGY
  • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
  • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
  • C08L25/00—Compositions of, homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Compositions of derivatives of such polymers
  • C08L25/02—Homopolymers or copolymers of hydrocarbons
  • C08L25/04—Homopolymers or copolymers of styrene
  • C08L25/06—Polystyrene
• • C—CHEMISTRY; METALLURGY
  • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
  • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
  • C08K7/00—Use of ingredients characterised by shape
• • C—CHEMISTRY; METALLURGY
  • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
  • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
  • C08K7/00—Use of ingredients characterised by shape
  • C08K7/22—Expanded, porous or hollow particles
  • C08K7/24—Expanded, porous or hollow particles inorganic
• • C—CHEMISTRY; METALLURGY
  • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
  • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
  • C08K9/00—Use of pretreated ingredients
  • C08K9/08—Ingredients agglomerated by treatment with a binding agent
• • C—CHEMISTRY; METALLURGY
  • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
  • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
  • C08L35/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical, and containing at least one other carboxyl radical in the molecule, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
  • C08L35/06—Copolymers with vinyl aromatic monomers

Definitions

• Nanocomposite Polymeric materials that are reinforced with insoluble materials such as, for example, fibers or particulate materials are generally referred to as "polymer composites" or simply as “composites".
• polymer composites or simply as “composites”.
• a nanocomposite has come into widespread use.
• a nanocomposite has a reinforcing material that has one or more dimensions on the order of a nanometer.
• One type of nanocomposite has an exfoliated layered silicate as the reinforcing material wherein the layered structure is broken up and individual silicate platelets are dispersed throughout the polymeric resin.
• Layered silicates are generally composed of stacked silicate platelets.
• the individual silicate platelets typically have a thickness on the order of about one nanometer and an aspect ratio of at least about 100.
• the spaces between the silicate platelets are called “gallery spaces". Under the proper conditions, the gallery spaces can be filled with a material such as, for example, a polymer.
• the material swells the layered silicate, increasing the distance between silicate platelets in a process termed "intercalation”. If the layered silicate swells sufficiently such that at least some of the individual silicate platelets are no longer organized into stacks, those individual silicate platelets are said to be "exfoliated".
• the degree to which a polymer will intercalate and/or exfoliate a particular layered silicate typically depends on the compatibility of the polymer with the layered silicate.
• polymers having groups that are compatible with the layered silicates may intercalate and/or exfoliate layered silicates.
• some polymers such as, for example, non-polar polymers (for example, polyethylene, polypropylene) may not readily intercalate or exfoliate layered silicates due to a lack of compatibility with the layered silicate.
• the present invention provides a method of making a composite comprising: combining components comprising a deprotectable polymer, an activating agent, and a layered silicate, wherein the deprotectable polymer has a backbone and a plurality of protected polar groups pendant from the backbone; and deprotecting at least one protected polar group to form a polar group having a hydrogen atom covalently bonded to an N, O, or S atom, or a salt thereof, thereby providing a deprotected polymer; and forming a composite, wherein the layered silicate is at least partially intercalated with the deprotected polymer, or the layered silicate is at least partially exfoliated, or both.
• the method further comprises polymerizing monomers comprising at least one monomer having a protected polar group to provide a deprotectable polymer. In some embodiments, the method further comprises mixing the composite with a polymeric resin to provide a nanocomposite.
• Methods according to the present invention are useful, for example, for making polymers that are sufficiently compatible with layered silicates that they can intercalate and/or exfoliate layered silicates. Such methods are particularly useful for forming nanocomposites from polymers such as, for example, poly(alpha-olefin) polymers that are produced by anionic polymerization under conditions wherein the presence of polar groups having a hydrogen atom covalently bonded to an N, O, or S atom would interfere with the polymerization.
• the terms "deprotectable” and “protected” as applied to groups are synonymous; the term “deprotected polymer” refers to a polymer which has been at least partially deprotected to generate at least one polar group having a hydrogen atom covalently bonded to an N, O, or S atom; the term “(meth)acryl” encompasses acryl and/or methacryl; and the term “pendant group” as applied to a polymer includes end groups.
• Useful layered silicates include, for example, natural phyllosilicates, synthetic phyllosilicates, organically modified phyllosilicates (for example, organoclays), and combinations thereof.
• natural phyllosilicates include smectite and smectite-type clays such as montmorillonite, nontronite, bentonite, beidellite, hectorite, saponite, sauconite, fluorohectorite, stevensite, volkonskoite, magadiite, kenyaite, halloysite, hydrotalcite, and combinations thereof.
• Examples of synthetic phyllosilicates include those prepared by hydrothermal processes as disclosed in U.S. Pat. Nos. 3,252,757 (Granquist); 3,666,407 (Orlemann);
• Organoclays are typically smectite or smectite-type clays produced by interacting a clay with one or more suitable intercalants.
• intercalants are typically organic compounds, which may be neutral or ionic.
• neutral organic intercalants include polar compounds such as amides, esters, lactams, nitriles, ureas, carbonates, phosphates, phosphonates, sulfates, sulfonates, nitro compounds, and the like.
• Neutral organic intercalants can be monomelic, oligomeric, or polymeric, and may intercalate into the layers of the clay through hydrogen bonding without completely replacing the original charge balancing ions.
• Suitable ionic intercalants include cationic surfactants such as, for example, onium compounds such as ammonium (primary, secondary, tertiary, and quaternary), phosphonium, or sulfonium derivatives of aliphatic, aromatic or aliphatic amines, phosphines and sulfides.
• Onium compounds include, for example, quaternary ammonium ions having at least one long chain aliphatic group (for example, octadecyl, myristyl, or oleyl) bound to the quaternary nitrogen atom. Further details concerning organoclays and methods for their preparation may be found, for example, in U.S. Pat.
• layered silicates exhibit a d-layer spacing that can be determined by well-known techniques such as X-ray diffraction (XRD) and/or transmission electron microscopy (TEM).
• XRD X-ray diffraction
• TEM transmission electron microscopy
• the d-layer spacing typically increases as intercalation between individual silicate layers by the deprotected polymer proceeds until the layers become so widely separated that they are considered exfoliated and no d-layer spacing is observable by XRD or TEM.
• the deprotectable polymer has a backbone with pendant protected polar groups covalently bonded thereto. Upon deprotection, the protected polar groups form polar groups having a hydrogen atom bonded to an N, O, or S atom.
• t-butyl esters may be deprotected in the presence of an acid catalyst to form the corresponding carboxylic acid and isobutene.
• acid catalyst for example, a carboxylic acid and isobutene.
• polar groups having a hydrogen atom covalently bonded to an N, O, or S atom include -SH, -OH, -CO2H, -NHOR, -NROH, -
• R represents H or an optionally substituted alkyl, aryl, alkaryl, or aralkyl group.
• R represents H or an optionally substituted alkyl, aryl, alkaryl, or aralkyl group.
• R represents H or an optionally substituted alkyl, aryl, alkaryl, or aralkyl group.
• R represents H or an optionally substituted alkyl, aryl, alkaryl, or aralkyl group.
• Salts for example, alkali metal salts, alkaline earth salts
• salts for example, alkali metal salts, alkaline earth salts
• the protected polar groups may comprise, for example, deprotectable carboxyl groups, deprotectable sulfhydryl groups, deprotectable thiocarboxyl groups, deprotectable sulfonyl groups, deprotectable sulfenyl groups, deprotectable hydroxyl groups, deprotectable amino groups, deprotectable amido groups, or a combination thereof.
• the deprotectable polymer may be prepared by any suitable method such as, for example, by protecting polar groups on a corresponding polymer.
• polar groups having one or more hydrogen atoms bonded to an N, O, or S atom may be converted to a deprotectable form (that is, protected) by reaction with a suitable reagent that reacts with (that is, protects) the polar group and converts it to a form without hydrogen atoms bonded to an N, O, or S atom, or a salt thereof.
• a suitable reagent that reacts with (that is, protects) the polar group and converts it to a form without hydrogen atoms bonded to an N, O, or S atom, or a salt thereof.
• Subsequent deprotection regenerates the original polar group.
• Examples of compounds having protected hydroxyl groups include: ethers such as, for example, tert-butyl ethers, benzyl ethers, p-methoxybenzyl ethers, 3,4-di- methoxybenzyl ethers, trityl ethers, allyl ethers, benzyl ethers, alkoxymethyl ethers, methoxymethyl ethers, 2-methoxyethoxymethyl ethers, benzyloxymethyl ethers, p- methoxybenzyloxymethyl ethers, silyl ethers (for example, trimethylsilyl ethers, triethylsilyl ethers, tert-butyldimethylsilyl ethers, tert-butyldiphenylsilyl ethers, triisopropylsilyl ethers, diethylisopropylsilyl ethers, thexyldimethylsilyl ethers,
• Useful protecting groups for hydroxyl groups include, for example, t-butoxycarbonyloxy, t-butylcarbamato, and trialkylsiloxy groups.
• t-Butyl derivatives for example, t-butyl esters, t-butyl carbonates
• Examples of compounds having protected diol groups include O,O-acetals such as, for example, isopropylidene acetals, cyclopentylidene acetals, cyclohexylidene acetals, arylmethylene acetals, methylene acetals, and diphenylmethylene acetals; 1,2-diacetals such as, for example, cyclohexane- 1,2-diacetals and butane-2,3-diacetals; and silylene derivatives such as, for example, 1,1,3,3-tetraisopropyldisiloxanylidene derivatives.
• O,O-acetals such as, for example, isopropylidene acetals, cyclopentylidene acetals, cyclohexylidene acetals, arylmethylene acetals, methylene acetals, and diphenylmethylene acetals
• Examples of compounds having protected thiol groups include: thioethers such as, for example, tert-butyl thioethers, benzyl and substituted benzyl thioethers (for example, trityl thioethers); 2-(trimethylsilyl)ethyl thioethers; 2-cyanoethyl thioethers; 9- fluorenylmethy] thioethers; and thiocarbonate derivatives.
• thioethers such as, for example, tert-butyl thioethers, benzyl and substituted benzyl thioethers (for example, trityl thioethers); 2-(trimethylsilyl)ethyl thioethers; 2-cyanoethyl thioethers; 9- fluorenylmethy] thioethers; and thiocarbonate derivatives.
• Examples of compounds having protected carboxyl groups include: anhydrides such as, for example, C2 - C5 alkanoic anhydride derivatives; esters such as, for example, methyl esters, tert-butyl esters, benzyl esters, allyl esters, phenacyl esters, alkoxyalkyl esters, esters, 2,2,2-trichloroethyl esters, 2-(trimethylsilyl)ethyl esters, 2-p- toluenesulfonylethyl esters, trialkylsilyl esters; and 2-substituted-l,3-oxazolines.
• anhydrides such as, for example, C2 - C5 alkanoic anhydride derivatives
• esters such as, for example, methyl esters, tert-butyl esters, benzyl esters, allyl esters, phenacyl esters, alkoxyalkyl esters, esters, 2,2,2-trich
• Examples of compounds having protected phosphate groups include: alkyl esters such as, for example, methyl esters, isopropyl esters, and tert-butyl esters; benzyl esters; allyl esters; p-hydroxyphenacyl esters; 2-cyanoethyl esters; 9-fluorenylmethyl esters; 2- (trimethylsilyl)ethyl esters; 2-(methylsulfonyl)ethyl esters; and 2,2,2-trichloroethyl esters.
• alkyl esters such as, for example, methyl esters, isopropyl esters, and tert-butyl esters
• benzyl esters allyl esters
• p-hydroxyphenacyl esters 2-cyanoethyl esters
• 9-fluorenylmethyl esters 2- (trimethylsilyl)ethyl esters
• 2-(methylsulfonyl)ethyl esters 2-(methyls
• Examples of compounds having protected amino groups include: imides and amides such as, for example, phthaloyl and tetrachlorophthaloyl imides, dithiasuccinyl imides, and trifluoroacetamides; carbamates such as, for example, methyl carbamates, ethyl carbamates, tert-butyl carbamates, benzyl carbamates, allyl carbamates, 9- fluorenyl methyl carbamates, 2-(trimethylsilyl)ethyl carbamates, and 2,2,2-trichloroethyl carbamates; sulfonyl derivatives such as, for example, arylsulfonamides (for example, p- toluenesulfonamides); N-sulfenyl derivatives; N,O-acetals such as, for example, methoxymethylamines; triazinanones such as, for example, l,3-dimethyl-l,
• the deprotectable polymer may be prepared by polymerizing one or more polymerizable monomers wherein at least one of the monomers has a protected polar group.
• polymerizable monomers having one or more protected polar groups such as those as described hereinabove.
• a moiety having one or more protected polar groups may be attached to a polymerizable moiety. This technique is particularly useful for monomers wherein the polar group is incompatible with the polymerizable moiety.
• the polar group(s) of a polar group-containing polymerizable monomer for example, 2-hydroxyethyl (meth)acrylate
• a polar group-containing polymerizable monomer for example, 2-hydroxyethyl (meth)acrylate
• Examples of cationically polymerizable monomers that have at least one protected polar group include: cationically polymerizable monomers having protected hydroxyl groups such as, for example, t-butyl, trialkylsilyl, and tetrahydropyranyl vinyl ethers; vinyl esters (for example, vinyl benzoate); vinylene carbonate; and alkyl vinyl carbonates.
• Examples of cationically polymerizable monomers having protected sulfhydryl groups include: t-butyl, trialkylsilyl, and tetrahydropyranyl vinyl thioethers, vinyl thioesters (for example, vinyl thiobenzoates), and alkyl vinyl thiocarbonates.
• the deprotectable polymer may typically be prepared by polymerizing monomers comprising one or more deprotectable monomers
• the deprotectable polymer may also be prepared by protecting pendant groups on a polymer such as, for example, a polymer having one or more pendant groups with a hydrogen atom bonded to an N, S, or O atom or a salt thereof.
• Protected monomers may be homopolymerized or copolymerized with one or more additional monomers, including additional protected monomers.
• additional monomers include alpha-olefins (for example, ethylene, propylene), vinyl esters, vinyl ethers, aliphatic 1,3-dienes, styrenic monomers, (meth)acrylate monomers (for example, C1-C8 alkyl (meth)acrylate esters), acrylonitrile, tetrafluoroethylene, hexafluoropropylene, vinylidene difluoride, cyclosiloxanes, epoxides, [n]- metallocenophanes, and combinations thereof.
• Suitable polymerization methods include, for example, cationic, anionic, free radical, metathesis, and condensation polymerization methods, and combinations thereof.
• inclusion of amino, hydroxy, or sulfhydryl group-containing monomers can lead to undesirable side reactions such as, for example, Michael addition, chain transfer, and/or termination.
• anionic polymerization it can be difficult or impossible to polymerize or copolymerize monomers having one or more hydrogen atoms bonded to an N, O, or S atom, since the polymerization is typically quenched by abstraction of the hydrogen atoms by the initiator and/or growing polymer.
• deprotectable polymers may be synthesized in processes that are carried out in batch or semi-batch reactors; continuous stirred tank reactors; tubular reactors; stirred tubular reactors; plug flow reactors; temperature controlled stirred tubular reactors as described, for example, in U.S. Pat. App. Publ. Nos.
• the deprotectable polymer should be melt-processible, although this is not a requirement.
• the deprotectable polymer may have any form such as, for example, a linear or branched homopolymer, random copolymer, tapered or gradient copolymer, or block copolymer (for example, diblock and triblock copolymers), including linear, comb, ladder, and star forms thereof, as long as it is not covalently crosslinked to form a three-dimensional polymeric network that is neither melt- processable nor solvent-soluble.
• the deprotectable polymer may be free of hydrogen atoms covalently bonded to a heteroatom (for example, N, S, O), however the deprotectable polymer may contain hydrogen atoms that are covalently bonded to a heteroatom.
• a heteroatom for example, N, S, O
• Deprotection methods typically depend of the particular protecting group chosen, and may include, for example, acid or base catalyzed deprotection and/or hydrolysis of one or more protected polar groups. Such methods typically involve an activating agent such as, for example, water and/or an acid or base catalyst or an oxidizing or reducing agent. Whatever the specific chemical composition of the activating agent, it generally serves to increase the rate at which deprotection of the protected polar groups occurs. The nature of the activating agent may vary, for example, according to specific protected polar groups on the deprotectable polymer. Heat and/or light may also be used in combination with the activating agent. Deprotection of the protected polar groups may be followed by subsequent reaction.
• an activating agent such as, for example, water and/or an acid or base catalyst or an oxidizing or reducing agent. Whatever the specific chemical composition of the activating agent, it generally serves to increase the rate at which deprotection of the protected polar groups occurs.
• the nature of the activating agent may vary, for example, according to
• acid catalyzed de-esterification or modification reaction of poly(meth)acrylic esters to form a polymethacrylic acid may be followed by a condensation reaction to form polymethacrylic anhydride, or a group exposed by a deprotection reaction may then be further reacted to form a derivative product, for example, by grafting a moiety to the deprotected polar group.
• the activating agent may be a catalyst such as, for example, a Lewis acid or Lewis base, including Br ⁇ nsted acids and Br ⁇ nsted bases.
• a catalyst such as, for example, a Lewis acid or Lewis base, including Br ⁇ nsted acids and Br ⁇ nsted bases.
• Br ⁇ nsted acid refers to any molecular or ionic species that can act as a proton donor
• Lewis acid refers to any molecular or ionic species that can act as an electron pair acceptor
• “Br ⁇ nsted base” refers to any molecular or ionic species that can act as a proton donor
• Lewis acid refers to any molecular or ionic species that can act as an electron pair donor.
• Lewis acids examples include H + , any positively charged metal ion (for example Ti3+ Fe 2+ , Ni 2+ , Pt 4 +, Na + , K + ), BH 3 , BF 3 , BCl 3 , AlCl 3 , and all Br ⁇ nsted acids.
• Br ⁇ nsted acids include mineral acids (for example, sulfuric acid, hydrochloric acid, nitric acid, phosphoric acid, hydrobromic acid, and partially neutralized salts thereof), organic acids (for example, formic acid, acetic acid, trifluoroacetic acid, trichloroacetic acid, toluenesulfonic acid, dichloroacetic acid, phenylphosphonic acid, ethylphosphinic acid, methanesulfonic acid, ethanesulfonic acid, 2-propanesulfonic acid, trifluoromethanesulfonic acid, benzenesulfonic acid, and para-toluenesulfonic acid), and combinations thereof.
• mineral acids for example, sulfuric acid, hydrochloric acid, nitric acid, phosphoric acid, hydrobromic acid, and partially neutralized salts thereof
• organic acids for example, formic acid, acetic acid, trifluoroacetic acid, trichloroacetic
• a Lewis acid catalyst may be produced in situ by exposing a suitable precursor material to actinic radiation as, for example, through a glass port on a melt extruder.
• suitable precursor material include onium salts (for example, diaryliodonium salts or triarylsulfonium salts) as described, for example, in U.S. Pat. Nos. 4,318,766 (Smith); 4,173,476 (Smith et al.); and 4,378,277 (Smith).
• Lewis bases include PF 3 ; PCl 3 ; any negatively charged ion (for example,
• Br, Cl “ , F " , or SC ⁇ 2' ), and all Br ⁇ nsted bases examples include Br;
• the activating agent should be well mixed with the deprotectable polymer and layered silicate in order to ensure rapid and/or uniform deprotection of the protected polar groups, although this is not a requirement.
• the activating agent is typically combined with the layered silicate and deprotectable polymer in an amount effective to facilitate deprotection of at least some of the protected polar groups of the deprotectable polymer when the components are combined. For example, if the components are combined in a melt extruder, then the amount of activating agent is typically selected to provide the desired degree of deprotection of the deprotectable polymer during the residence time of the components in the extruder.
• the activating agent is combined with the layered silicate and deprotectable polymer in an amount of from 0.001 to 10 parts by weight for every part by weight of the deprotectable polymer, although greater and lesser amounts may be used. More typically, the activating agent is combined with the layered silicate and deprotectable polymer in an amount of from 0.01 to 5 parts by weight for every part by weight of the deprotectable polymer.
• the deprotectable polymer, layered silicate, and activating agent may be combined with one or more additional polymers (for example, including additional deprotectable polymers) before or after at least partial deprotection of the deprotectable polymer and intercalation and/or exfoliation of the layered silicate.
• the mixture comprising deprotected polymer, intercalated and/or exfoliated layered silicate, and activating agent may comprise a masterbatch that is suitable for dilution in a single polymer or across a spectrum of polymeric materials.
• a masterbatch typically has a relatively high content of intercalated and/or exfoliated layered silicate.
• the total amount of the intercalated silicate and exfoliated silicate platelets may comprise at least 30, 40, 50, 60 percent by weight or more of the composite.
• the composite may be let down into (that is, combined with) a polymeric resin to form a nanocomposite.
• the deprotectable polymer, activating agent, and a layered silicate may be combined in any order (including all at once). Typically, the components are combined contemporaneously, although in some cases it may be desirable to allow a period of time to elapse between addition of the various components (for example, by combining the deprotectable polymer and the activating agent and allowing them to react to generate a deprotected polymer prior to combining them with the layered silicate and/or other optional components).
• the deprotectable polymer, layered silicate, and activating agent are combined under high shear rate conditions (for example, in a kneader or extruder), especially if no solvent is present.
• the deprotectable polymer, layered silicate, and activating agent may be combined at an elevated or reduced temperature as compared to ambient temperature (for example, at a temperature of from 30 0 C to 160 0 C). Elevated temperatures typically increase the rate of deprotection, facilitate mixing, and may aid in removal of volatile components, however elevated temperatures may also tend to increase degradation of polymeric components.
• vents attached to any mixing apparatus used to combine the deprotectable polymer, layered silicate, and activating agent.
• Such vents may be held at a reduced pressure to facilitate removal of volatile components.
• one such procedure is described in U.S. Pat. Appl. No. 10/950,834 (Nelson et al.), filed September 27, 2004.
• the resultant composite typically contains less than or equal to 5 percent by weight of solvent, based on the total weight of the composite.
• the composite may contain less than or equal to 4, 3, 2, 1, or even less than 0.1 percent by weight of solvent, based on the total weight of the composite.
• the deprotected polymer typically at least partially intercalates and/or at least partially exfoliates the layered silicate.
• the greater the degree of deprotection the greater will be the number of polar groups having N-H, O-H, and/or S-H bonds on the at least partially deprotected polymer, which in turn typically tends to increase the rate and/or degree of intercalation and/or exfoliation of the layered silicate.
• the rate and/or extent of intercalation and/or exfoliation may also be influenced by variables such as the presence of solvent, temperature, shear conditions, the chemical nature and/or concentration of the components (for example, deprotectable polymer, layered silicate, and/or activating agent), degree of mixing, and duration of mixing.
• variables such as the presence of solvent, temperature, shear conditions, the chemical nature and/or concentration of the components (for example, deprotectable polymer, layered silicate, and/or activating agent), degree of mixing, and duration of mixing.
• the total amount of intercalated and/or exfoliated layered silicate may comprise at least 30, 40, 50, or even 60 or more percent by weight of the composite.
• the layered silicate may be at least 30, 40, 50, 60, 70, 80,or even 90 percent exfoliated, or more.
• Composites formed according to the present invention may be combined with a fluid polymeric resin within the body of a screw extruder, whereupon it forms a fluid (for example, molten) composite material that may be solidified (for example, by cooling or curing) after extraction from the extruder.
• extruder temperatures may be in a range of from 100 °C to 180 °C, although temperatures outside of this range may also be used.
• the composite and polymeric resin may be combined in sequential steps such as, for example, those described above, the polymeric resin, layered silicate, deprotectable polymer, and activating agent may also be combined and the layered silicate exfoliated in a single step.
• Such single step processes may be carried out using methods suitable for mixing the deprotectable polymer, activating agent, and layered silicate, for example, as described herein.
• any amount of the composite may be let down into any amount of polymeric resin, for example, depending on the intended physical properties of the resultant nanocomposite.
• the weight ratio of the polymeric resin to the weight ratio of the polymeric resin to the exfoliated silicate platelets is in a range of 20 to 200, inclusive.
• Any organic polymeric resin may be used in practice of the present invention.
• useful polymeric resins may be thermoplastic, thermosetting, or a combination thereof.
• methods according to the present invention are well suited for use with thermoplastic polymeric resins.
• thermoplastic polymeric resins include, for example: polylactones such as, for example, poly(pivalolactone) and poly(caprolactone); polyurethanes such as, for example, those derived from reaction of diisocyanates such as 1,5-naphthalene diisocyanate, p-phenylene diisocyanate, m-phenylene diisocyanate, 2,4-toluene diisocyanate, 4,4'-diphenylmethane diisocyanate, 3,3'-dimethyl-4,4'-diphenylmethane diisocyanate, 3,3'-dimethyl-4,4'-biphenyl diisocyanate, 4,4'-diphenylisopropylidene diisocyanate, 3,3'-dimethyl-4,4'-diphenyl diisocyanate, 3,3'-dimethyl-4,4'- diphenylmethane diisocyanate, 3,3'-dimeth
• Useful elastomeric polymeric resins include thermoplastic and thermoset elastomeric polymeric resins such as, for example, polybutadiene, polyisobutylene, ethylene-propylene copolymers, ethylene-propylene-diene terpolymers, sulfonated ethylene-propylene-diene terpolymers, polychloroprene, poly(2,3- dimethylbutadiene), poly(butadiene-co-pentadiene), chlorosulfonated polyethylenes, polysulfide elastomers, silicone elastomers, poly(butadiene-co-nitrile), hydrogenated nitrile-butadiene copolymers, acrylic elastomers, ethylene-acrylate copolymers.
• thermoplastic and thermoset elastomeric polymeric resins such as, for example, polybutadiene, polyisobutylene, ethylene-propylene copolymers, ethylene-propylene
• thermoplastic elastomeric polymer resins include block copolymers, made up of blocks of glassy or crystalline blocks such as polystyrene, poly(vinyltoluene), poly(t- butylstyrene), and polyester, and the elastomeric blocks such as polybutadiene, polyisoprene, ethylene-propylene copolymers, ethylene-butylene copolymers, polyether ester and the like as, for example, poly(styrene-butadiene-styrene) block copolymers marketed by Shell Chemical Company, Houston, Texas, under the trade designation
• Useful polymeric resins also include fluoropolymers, that is, at least partially fluorinated polymers.
• fluoropolymers include polyvinylidene fluoride; copolymers of tetrafluoroethylene, hexafluoropropylene and vinylidene fluoride; copolymers of tetrafluoroethylene, hexafluoropropylene, perfluoropropyl vinyl ether, and vinylidene fluoride; tetrafluoroethylene-hexafluoropropylene copolymers; tetrafluoroethylene- perfluoro(alkyl vinyl ether) copolymers (for example, tetrafluoroethylene-perfluoro(propyl vinyl ether)); and combinations thereof.
• thermoplastic fluoropolymers include, for example, those marketed by Dyneon LLC, Oakdale, Minnesota, under the trade designations "TETV” (for example, “THV 220", “THV 400G”, “THV 500G”, “THV 815”, and “THV 610X”), “PVDF”, “PFA'V'HTE”, “ETFE”, and “FEP”; those marketed by Atofina Chemicals, Philadelphia, Pennsylvania, under the trade designation “KYNAR” (for example, “KYNAR 740”); those marketed by Solvay Solexis, Thorofare, New Jersey, under the trade designations "HYLAR” (for example, “HYLAR 700”) and “HALAR ECTFE”.
• TETV for example, “THV 220", “THV 400G”, “THV 500G”, “THV 815”, and “THV 610X”
• KYNAR for example, “KYNAR 740”
• HYLAR for example, “HYLAR 700”
• thermosetting polymeric resins include, for example, epoxy resins, alkyd resins, acrylic resins, one-part and two-part urethane resins, cyanate resins, phenolic resins, aminoplast resins, and combinations thereof. If a thermosetting resin is used, a suitable curative for that resin (for example, a thermal curative and/or photocurative) may also be included with the polymeric resin.
• a suitable curative for that resin for example, a thermal curative and/or photocurative
• the composite and/or nanocomposite may further contain one or more additives such as, for example, surfactants, flame proofing agents, fillers, ultraviolet absorbers, antioxidants, tackifier resins, colorants, fragrances, or antimicrobial agents.
• additives such as, for example, surfactants, flame proofing agents, fillers, ultraviolet absorbers, antioxidants, tackifier resins, colorants, fragrances, or antimicrobial agents.
• Methods according to the present invention may be carried out in batch process or in a continuous manner.
• Composites and nanocomposites prepared according to the present invention are dispersions, typically isotropic dispersions of intercalated and/or more typically exfoliated silicate platelets in the polymeric resin.
• the amount of exfoliated silicate platelets in composites and nanocomposites according to the present invention may be in any amount, but in the case of nanocomposites are typically in a range of from 0.1 to 10 percent by weight, more typically in a range of from 0.5 to 7 percent by weight, and even more typically in a range of from 1 to 5 percent by weight, inclusive, based on the total weight of the nanocomposite.
• the weight ratio of the exfoliated silicate platelets to the layered silicate in the composite or nanocomposite may be at least 1, 2, 3, 4, 5, 10, 50 or more, although lesser weight ratios may also be used.
• composites (including nanocomposites) according to the present invention are typically prepared and processed in a fluid state (for example, as a melt or in optional solvent), they may also be utilized as solids; for example after cooling and/or after removing any optional solvent.
• Polymeric resin in the nanocomposite may be solidified or hardened, for example, by cooling in the case of thermoplastic resins, or by at least partially curing in the case of thermosetting polymeric resins.
• compositions prepared according to the present invention are useful, for example, in the manufacture of barrier films or bottles, and flame retardant materials.
• Methods of the present invention are particularly advantageous as used in conjunction with polymers synthesized using continuous stirred tube reactors such as, for example, those described in U.S. Pat. No. 6,448,353 Bl (Nelson et al.), and U.S. Pat. Appl. No. 10/931,732 (Marx et al.), filed September 1, 2004.
• the polymer synthesis and mixing apparatuses may be set up in series so that the deprotectable polymer is fed directly into a mixing apparatus where it is combined with the layered silicate and activating agent.
• Methods according to the present invention may be carried out in a discontinuous or in a continuous manner.
• LS2 organically modified montmorillonite clay available under the trade designation "CLOISITE 3OB” from Southern Clay Products (modified with methyl, tallow (-65% Cig; -30% C ⁇ ; ⁇ 5% C14), bis-2-hydroxyethyl, quaternary ammonium chloride); believed to have a d-layer spacing of 1.85 nm
• LS3 natural montmorillonite clay available under the trade designation "CLOISITE NA + " from Southern Clay Products; believed to have a d-layer spacing of 1.17 nm.
• LS4 organically modified montmorillonite clay available under the trade designation "CLOISITE 93A” from Southern Clay Products (methyl, dihydrogenated tallow (-65% C 18 ; -30% Ci 6 ; -5% Cj 4 ) ternary ammonium sulfate); believed to have a d-layer spacing of 2.36 nm
• P(S-MAn) poly(styrene-methacrylic acid-co-anhydride) synthesized from P(S-tBMA)according to the procedure of Example 1.
• GPC Gel Permeation Chromatography
• the GPC was system operated at room temperature using THF eluent that moved at a flow rate of approximately 0.95 mL/minute.
• a refractive index detector was used to detect changes in concentration.
• Number average molecular weight (M n ) and polydispersity index (PDI) calculations were calibrated using narrow polydispersity polystyrene controls ranging in molecular weight from 7.5 x 10" to 580 g/mole. The actual calculations were made with software (available under the trade designation "CALIBER" from Polymer Labs).
• Block concentrations were calculated from relative areas of characteristic block component spectra.
• 29si magic angle spinning (29si MAS) NMR analyses were performed using a 400 MHz wide bore NMR spectrometer available under the trade designation "INOVA NMR spectrometer” from Varian, Inc.
• Reflection geometry X-ray scattering data were collected using a four-circle diffractometer (available under the trade designation "HUBER (424/511.1)” from Huber Diffr reliestechnik GmbH, D83253 Rimsting, Germany), copper K-alpha radiation, and scintillation detector registry of the scattered radiation.
• the incident beam was collimated to a circular aperture of 0.70 millimeters.
• Scans were conducted in a reflection geometry from 0.5 to 10 degrees (2 theta) using a 0.05 degree step size and 10 second dwell time.
• a sealed tube X-ray source and X-ray generator settings of 40 kilovolts and 20 milliamperes were used.
• Data analysis and peak position definition were determined using X-ray diffraction analysis software available under the trade designation "JADE” from MDI, Inc., Livermore, California.
• TRANSFORM INFRARED SPECTROMETER Thermo Electron Corp., Waltham, Massachusetts
• TRANSFORM INFRARED SPECTROMETER Thermo Electron Corp., Waltham, Massachusetts
• the complicated carbonyl region of each spectrum was deconvoluted using the facilities in the spectroscopy software suite available under the trade designation "GRAMS” from Thermo Electron Corporation.
• HVP high viscosity processor
• LIST DISCOTHERM B6 HIGH VISCOSITY PROCESSOR a high viscosity processor
• the HVP has a horizontal, cylindrical body with a concentric agitator shaft. Mounted on the shaft (and extending perpendicular to the shaft) are disk elements having angled peripheral mixing-kneading bars and stationary hook-shaped bars mounted on the inside of the housing that interact with and clean the shaft and disk elements as they rotate.
• the HVP has a twin-screw discharge for material removal.
• the total volume of the HVP is 17.5 L, with a working volume of 12 L.
• the housing, shaft, and disk elements are all heated via a hot oil heating system.
• the heat transfer area in the reactor is 0.67 m ⁇ . Temperature is controlled and monitored in three locations within the HVP: (1) the reactor entrance zone (zone 1), (2) the reactor intermediate zone (zone 2) and (3) the reactor exit zone (zone 3).
• a variable speed motor drives the agitator shaft at a maximum torque of 1200 Nm.
• a vacuum pump is attached to the reactor at the top of zone 2 for vapor removal.
• Twin-screw extrusion is carried out using a co-rotating 25-mm twin-screw extruder (TSE) with 41:1 L/D, available under the trade designation "COPERION ZSK-25 WORLD LAB EXTRUDER” from Coperion Corp., Ramsey, New Jersey. Barrel zones for the extruder are 4D (100 mm) in length. The extruder is run at 320°F (160 0 C) with a screw speed of 300 rpm in all examples.
• TSE twin-screw extruder
• the TSE has a kneading section in barrel zone 4 for incorporating LSI and/or P(S- VP) into molten PS resin after their addition to the extruder in barrel zone 3.
• This kneading section is 3D in length, incorporating high- and medium-shear-intensity forwarding kneading elements for dispersive mixing and a low shear-intensity, reversing kneading element for generating a melt seal and distributive mixing.
• a small atmospheric vent, ID in length, at the beginning of barrel zone 5 is used to vent any entrapped air from the powder addition in barrel zone 3.
• Three downstream mixing sections are incorporated to add shear energy for dispersive and distributive mixing.
• a 3.5D mixing section spanned barrel zones 5 and 6, a 2.5D mixing section is employed in barrel zone 7, and a 3D mixing section spans barrel zones 8 and 9.
• medium- to low-shear- intensity, forwarding kneading elements and narrow-paddled, low-shear-intensity, reversing kneading elements are utilized to yield appropriate dispersive and distributive mixing.
• a vacuum of 52 torr (6.9 kPa) is pulled on a 2D (50mm) vacuum vent in barrel zone 9 to remove any volatiles.
• a gear-type mixing element available under the trade designation "ZME" from Coperion Corp.
• Feeding of LSI and/or P(S-VP) into a 2D (50mm) port open to the atmosphere in barrel zone 3 of the twin-screw extruder is accomplished using a gravimetric feeder equipped with twin auger screws, available under the trade designation "K-TRON GRAVIMETRIC FEEDER,
• MODEL KCLKT20 from K-Tron International, Pitman, New Jersey.
• the extrudate from the TSE is metered through a 10.3 mL/revolution gear pump available under the trade designation "NORMAG" from Dynisco Extrusion, Hickory, North Carolina, and extruded through a 1/2-inch (1.3-cm) diameter pipe to form a strand.
• the strand is cooled at 8 0 C in a water bath and pelletized.
• XRD analysis of LSI as purchased showed a d-layer spacing of 2.42 nanometers (nm).
• Feed solutions were made with varying amounts of LSI and P(S-t-BMA) in THF (as reported in Table 1) by dissolving the P(S-t-BMA) in THF and then adding the LSI.
• Each P(S-t-BMA)/LSl feed solution was fed via a gear pump to a high viscosity processor at 0.48 1/min as described in the General Procedure for Masterbatch Preparation.
• the HVP was heated at 178 °C, and at a vacuum setting of 90 torr.
• Zone 1 132 °C
• Zone 2 182 °C
• Zone 3 175 °C.
• the resultant P(S-MAn)/LSl composites were analyzed by XRD to determine dispersion quality and by infrared spectroscopy to verify the synthesis of methacrylic acid and anhydride. Both composites were found to have a layered silicate with a d-layer spacing of 3.7 nm and showed second and third order diffraction patterns. Infrared analysis of the resultant composites showed the presence of acid and anhydride.
• the BVP had a kneading trough that held 600 mL and had a working volume of 300 mL. The bottom of the trough was double-walled allowing the batch to be heated via a hot oil circulator. Kneading was accomplished with two kneading paddles fixed to the motor that mixed both horizontally and vertically. The paddles continually wiped the walls and each other. In the lid of the BVP was a port from which a vacuum could be established and liquid could be introduced. A DC motor with a constant power output of 160 watts was mounted downstream from a gear assembly that was capable of transmitting a torque of 60 Nm to drive the paddles.
• P(I)-DVB-tBDMS 100 g was added to the bowl. This mixture was allowed to melt and then lOOg of LS 1 was added to the bowl. The paddles were stirring at a rate of 63 ⁇ m. The composite was allowed to mix for 30 minutes and an aliquot (Sample 3A) was taken. At this point, 1.0 g of PTSA was added to the mixture. The bowl was sealed and held at a vacuum level of 60 torr. The resultant composite was allowed to mix for an additional 30 minutes at 63 ⁇ m. After 30 minutes, an aliquot (Sample 3B) was taken. XRD analysis was performed on Samples 3 A and 3B.
• Sample 3 A was determined to have a d-layer spacing of 2.9 nm and Sample 4B was determined to have a d-layer spacing of 3.3 nm.
• 29gj MAS NMR analysis was also performed on the composites from samples 3A and 3B and at least partial deprotection of the trialkylsilyl-protected hydroxyl group, t- butyl-Si(CH3)2"O-> was verified. Deprotection was verified by a decrease in the relative intensity of the resonance (+17.5 ppm) associated with protected end group from 11.7% (3A) to 10.9% (3B).
• COMPARATIVE EXAMPLES A - B and EXAMPLES 4-5 Comparative Examples A - B and Examples 4-5 were prepared with compositions as reported in Table 2. P(I)-D VB-tBDMS and THF were mixed until the P(I)-D VB- tBDMS was completely dissolved. Layered silicate (LS2 or LS3) was then added to solution and allowed to mix on a shaker for 1 hour, until it was dispersed in the solution. If indicated, TBAF was added to the clay-containing solutions and this final solution was allowed to mix on a shaker for 24 hours. Aliquot samples of the resulting solution were extracted and the solvent was removed in a vacuum oven. Comparative Examples A - B and Examples 4-5 were analyzed via XRD and 29si MAS NMR. Results of XRD analysis are reported in Table 2.
• 29si MAS NMR analysis verified that at least partial deprotection had occurred from Comparative Examples A-B and Examples 4-5 as judged by a decrease in the presence of the trialkylsilane protected hydroxyl group, t-butyl-Si(CH3)2-O-.
• the relative intensities of the 29si MAS NMR resonance at +17.5 ppm associated with the trialkylsilane protected hydroxyl group are reported in Table 2 (below).

Landscapes

• Chemical & Material Sciences (AREA)
• Engineering & Computer Science (AREA)
• Organic Chemistry (AREA)
• Health & Medical Sciences (AREA)
• Chemical Kinetics & Catalysis (AREA)
• Medicinal Chemistry (AREA)
• Polymers & Plastics (AREA)
• Materials Engineering (AREA)
• Nanotechnology (AREA)
• Manufacturing & Machinery (AREA)
• Dispersion Chemistry (AREA)
• Physics & Mathematics (AREA)
• Composite Materials (AREA)
• Condensed Matter Physics & Semiconductors (AREA)
• General Physics & Mathematics (AREA)
• Crystallography & Structural Chemistry (AREA)
• Compositions Of Macromolecular Compounds (AREA)
• Silicates, Zeolites, And Molecular Sieves (AREA)

Priority Applications (4)

Applications Claiming Priority (2)

Publications (1)

Family

ID=36121284

Family Applications (1)

Country Status (7)

Cited By (2)

Families Citing this family (30)

Citations (2)

Family Cites Families (90)

• 2004
  • 2004-12-14 US US11/011,538 patent/US8193270B2/en not_active Expired - Fee Related
• 2005
  • 2005-10-25 WO PCT/US2005/038586 patent/WO2006065357A1/en not_active Ceased
  • 2005-10-25 CA CA002588041A patent/CA2588041A1/en not_active Abandoned
  • 2005-10-25 EP EP05818486A patent/EP1853649A1/en not_active Withdrawn
  • 2005-10-25 JP JP2007546656A patent/JP4960256B2/ja not_active Expired - Fee Related
  • 2005-10-25 KR KR1020077015462A patent/KR20070089993A/ko not_active Ceased
  • 2005-10-25 CN CN2005800429232A patent/CN101080445B/zh not_active Expired - Fee Related

Patent Citations (3)

Also Published As

Similar Documents

Legal Events