Classifications

• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
  • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
  • H01J37/32—Gas-filled discharge tubes
  • H01J37/32431—Constructional details of the reactor
  • H01J37/32458—Vessel
  • H01J37/32467—Material
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
  • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
  • H01J37/32—Gas-filled discharge tubes
  • H01J37/32431—Constructional details of the reactor
  • H01J37/32458—Vessel
  • H01J37/32477—Vessel characterised by the means for protecting vessels or internal parts, e.g. coatings
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
  • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
  • H01J37/32—Gas-filled discharge tubes
  • H01J37/32431—Constructional details of the reactor
  • H01J37/32733—Means for moving the material to be treated
  • H01J37/32743—Means for moving the material to be treated for introducing the material into processing chamber
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
  • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
  • H01J37/32—Gas-filled discharge tubes
  • H01J37/32431—Constructional details of the reactor
  • H01J37/32733—Means for moving the material to be treated
  • H01J37/32788—Means for moving the material to be treated for extracting the material from the process chamber
• • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
  • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
  • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
  • Y02P80/00—Climate change mitigation technologies for sector-wide applications
  • Y02P80/30—Reducing waste in manufacturing processes; Calculations of released waste quantities

Definitions

• the present invention relates to an aluminum chamber having a one body sealing member, and more specifically to an aluminum chamber capable of maintaining air- tightness of the inside of the chamber, and simultaneously reducing the manufacturing cost and time of the aluminum chamber by manufacturing a one body sealing member using a mold, and simultaneously separately processing plates constituting each surface of the chamber to insert the one body sealing members into one sides at which the surfaces are in contact with each other, followed by connecting the one body sealing members using a connecting member.
• An inductively coupled plasma source, a microwave plasma source, or a ca- pacitively coupled plasma source has been used as the plasma processing device, and a capacitively coupled flat plasma processing device has been used widely.
• the capacitively coupled flat plasma processing device has a pair of parallel flat electrodes (upper and lower electrodes) arranged inside its chamber, wherein an exhaust system is connected to the chamber and a high-frequency current source is connected to the parallel flat electrodes.
• the plasma is processed using coating, etching, ashing, cleaning, and others by maximizing a vacuum level using an exhaust of the exhaust system to remove impurities in the chamber, putting a treated gas into the chamber in a vacuum state to increase pressure of the chamber to a suitable extent, followed by applying a high-frequency voltage to at least one electrode to form a high-frequency electric field between the electrodes and forming plasma with the treated gas by the high-frequency electric field.
• the plasma chamber should be isolated from the outside to maintain the vacuum state, and have good electric conductivity to use electrically high frequency. Accordingly, in order to maintain airtightness and electric conductivity, chambers were manufactured in the prior art by chip-processing aluminum ingots or blocks using a milling machine to dig their insides out. However, such a method has various problems that a large amount of materials is wasted due to the chip processing, as well as economic efficiency is reduced and the manufacturing time is increased since one block is used to manufacture only one chamber.
• the present invention is designed to solve the problems of the prior art, and therefore it is an object of the present invention to provide an aluminum plasma chamber capable of reducing a wasted aluminum material and therefore reducing man ⁇ ufacturing cost and time by separately processing individual plates constituting each surface of the plasma chamber, and of producing uniform plasma by improving its surface treatment and also of being easily carried to an installation place.
• the present invention provides an aluminum plasma chamber including an aluminum plasma chamber bottom having a rectangular shape with constant thickness; an aluminum plasma chamber lid having a rectangular-parallelepiped shape with an open bottom and forming a door unit for inputting and outputting an object to be treated at its one side; four rectangular plates to which the aluminum plasma chamber bottom and lid are coupled by a connecting member, the four rectangular plates having constant thickness and being coupled by a connecting member to constitute the wall of the aluminum plasma chamber; a door unit formed in a side of one of the four rectangular plates for inputting and outputting an object to be treated; a coupling projection(s) formed on either or both ends of sections at which each plate of the aluminum plasma chamber is in contact with each other; and one body sealing members inserted into the sections at which each plate of the aluminum plasma chamber is in contact with each other so as to maintain air- tightness of the inside of the plasma chamber.
• each of the four plates constituting the aluminum chamber walls preferably includes a wall unit constituting the aluminum plasma chamber wall; a coupling unit formed in one end of the wall unit and coupled with a coupled unit of one adjacent plate; and a coupled unit formed in the other end of the wall unit and coupled with a coupling unit of another adjacent plate.
• a pair of the plates includes a wall unit constituting the aluminum plasma chamber wall; and coupling units formed in both ends of the wall unit and coupled with coupled units of both adjacent plates, and another pair of the plates includes a wall unit constituting the aluminum plasma chamber wall; and the coupled units formed in both ends of the wall unit and coupled with the coupling units of both adjacent plates.
• FIG. 1 is an exploded perspective view showing an aluminum plasma chamber according to a preferred embodiment of the present invention
• FIG. 2 is a perspective view showing a one body O-ring
• FIG. 3 is a perspective view showing a first plate constituting a plasma chamber wall
• FIG. 4 is a perspective view showing a second plate constituting a plasma chamber wall
• FIG. 5 is a plane view showing the plasma chamber wall of Fig. 1 ;
• FIGs. 6 and 7 are plane views showing the plasma chamber wall according to another embodiment of the present invention. Best Mode for Carrying Out the Invention
• Fig. 1 is an exploded perspective view showing an aluminum plasma chamber 100 according to a preferred embodiment of the present invention
• Fig. 2 is a perspective view showing a one body sealing member 10
• Fig. 3 is a perspective view showing a first plate 30 constituting a plasma chamber wall 50
• Fig. 4 is a perspective view showing a second plate 40 constituting a plasma chamber wall 50.
• the aluminum plasma chamber 100 according to the present invention includes a one body sealing member 10, a chamber bottom 20, each plate 30, 40 constituting the chamber wall 50, and a chamber lid 60.
• the one body sealing member 10 has a one body shape extended along edges of a rectangular parallelepiped so that the chamber bottom 20, each plate 30, 40 con ⁇ stituting the chamber wall, and the chamber lid 60, which constitute the aluminum plasma chamber 100 having a rectangular-parallelepiped shape, may be inserted into sections contacted with each other, as seen in Fig. 2.
• the one body sealing member 10 maintains airtightness between the chamber bottom 20, each plate 30, 40 constituting the chamber wall, and the chamber lid 60 to keep a vacuum state required for plasma reaction in the chamber 100.
• the one body sealing member 10 is made of, but not limited to, synthetic rubber in the present invention.
• the chamber bottom 20 has a rectangular shape with constant thickness.
• a coupling projection 22 is formed along edges of the chamber bottom 20, and grooves 24, into which the one body sealing members 10 are inserted, is formed in the coupling projection 22 along the edges.
• the coupling projection 22 is formed to prevent the one body sealing member 10 from being damaged by plasma generated by inner reaction of the chamber 100, the one body sealing member 10 inserted between sections at which the chamber bottom 20 and the chamber wall 50 are in contact with each other. That is to say, a path, where the plasma is permeated between the sections at which the chamber bottom 20 and the chamber wall 50 are in contact with each other, may be bent to form a multipath, and then the one body sealing member 10 may be protected by preventing the plasma from being permeated if the coupling projection 22 is formed along the edges of the chamber bottom 20.
• Such a coupling projection 22 may be formed in either section at which the chamber bottom 20, each plate 30, 40 constituting the chamber wall 50, and the chamber lid 60 are in contact with each other, and various changes and modi ⁇ fications may be made by those skilled in the art pertaining to the present invention.
• the grooves 24 formed in the coupling projection 22 are formed with a suitable size to insert the one body sealing member 10 therein, and also formed in the sections at which the chamber bottom 20, each plate 30, 40 constituting the chamber wall 50, and the chamber lid 60, as well as lower ends of the chamber bottom 20, each plate 30, 40 constituting the chamber wall 50, and the chamber lid 60 are in contact with each other.
• through holes 26 are formed in the coupling projection 22 so that a connecting member 28 such as a bolt can be inserted therein to connect the chamber bottom 20 and each plate 30, 40 constituting the wall each other.
• a connecting member 28 such as a bolt
• coupling holes corresponding to the through holes 26 are formed in a lower surface of each plate 30, 40 constituting the chamber wall 50.
• a bolt is preferably used for the connecting member 28.
• a screw thread is not formed in the through hole 26 but in the coupling hole to prevent the chamber bottom 20 and the wall 50 from being spaced apart by the connecting member 28 such as a bolt.
• Three through holes 26 are formed along edges of each surface of the chamber bottom 20 in the figures, but the suitable number of the through holes 26 and the coupling holes may be formed to connect the chamber bottom 20 and the wall 50 each other and maintain air- tightness.
• Coupling holes 32, 42 and through holes 61 are formed also in the upper section of each plate 30, 40 constituting the chamber wall 50, and chamber lid 60, but not further described here again.
• the aluminum plasma chamber wall 50 is composed of four rectangular plates 30
• each plate constitutes the plasma chamber wall 50 by connecting a pair of a first plate 30 and a second plate 40 to face each other, the first plate 30 and the second plate 40 having the same shape and size.
• the first plate 30 has a rectangular shape with constant thickness, and is composed of a wall unit 34 constituting the plasma chamber wall, and coupled units 35, 36 which are coupled with coupling units of both adjacent plates and in which coupling holes 37 are formed.
• Inner sides of the coupling units of the both plates are coupled with the coupled units 35, 36 to be at a right angles with the wall unit 34 at their front ends, and they are coupled so that an outer surface of the wall unit 34 and the front ends of both plates are placed on the same plane.
• a suitable number of the coupling holes 37 are formed to be coupled with the coupling units of both plates by the connecting member 44 such as a bolt, and the grooves 31, into which the one body sealing members 10 are inserted, are extendedly formed in the upper surface and the both sides except the lower surface.
• the second plate 40 has a rectangular shape with constant thickness, and is composed of a wall unit 46 constituting the plasma chamber wall, and coupling units 47 48 which are coupled with the coupled units of both adjacent plates and in which through holes 43 are formed.
• Coupled units of the both plates are coupled with the inner surfaces of the front ends of the coupling units 47, 48, and the front ends are placed on the same plane as outer surfaces of the wall units 34 of both plates.
• a suitable number of the through holes 43 are formed to be coupled to the coupled units of both plates by the connecting member 44 such as a bolt, and the grooves 41, into which the one body sealing members 10 are inserted, are formed along their upper surfaces.
• a coupling projection 45 is formed in the both ends of the second plates 40 together with the coupling units 47, 48 to prevent the one body sealing member 10 from being damaged by the plasma, as described above.
• a door unit 52 for inputting/outputting an object to be treated is formed in one side of the first plate 30 or the second plate 40. Although it is shown that the door unit 52 is formed in the first plate 30, but not limited thereto, the door unit 52 may be also formed in the second plate 40.
• the door unit 52 includes an opening 54 formed in one side of the chamber lid 60; a door member 56 for opening/shutting the opening 54; and a guide member 55 for guiding the door member 56 when it moves up and down.
• the opening 54 is formed through the wall of the lid 60 in one side of the chamber lid 60 at a suitable size to input and output the object to be treated, and preferably has a flat shape extended in a horizontal direction.
• the door member 56 moves up and down by the guide member 55, and the door member 56 may be, but not limited thereto, operated manually by a worker, and an additional cylinder can be installed so that it can move automatically.
• a protrusion (not shown) corresponding to a shape of the opening 54 is formed on an inner side of the door member 56. The protrusion is fit into the opening 54, and then the opening 54 is shut if the door member 56 moves up by the guide member 55, while the door member 56 moves apart from the opening 54, and then the opening 54 is opened if the door member 56 moves down by the guide member 55.
• Various changes and modifications may be made for the door unit 52 by those skilled in the art pertaining to the present invention.
• a suitable number of the coupling holes 32, 42 are formed in the upper and lower surfaces of the first plate 30 and the second plate 40 to be connected with the chamber lid 60 and the bottom 20 by the connecting members 62, 28 such as a bolt, respectively.
• FIG. 5 is a plane view showing the plasma chamber wall 50 of Fig. 1
• Figs. 6 and 7 are plane views showing the plasma chamber walls 70, 80 according to other embodiments.
• the coupled units are formed at both ends of a facing pair of the first plates 30, and the coupling projections in connection with the coupling units are formed in both ends of a facing pair of the second plates 40, as described previously (see Fig 5).
• the coupling unit and the coupling projection may be formed in one end of each plate, and the coupled units may be formed in another ends (see Fig 6). Or else the coupling unit or the coupled unit in connection with the coupling projection may be formed in both ends of each plate (see Fig. 7).
• the chamber lid 60 has a rectangular-parallelepiped shape with an open bottom.
• the coupling projection is formed in the section in contact with the chamber wall 50, and the suitable number of the through holes 61 are also formed so that it can be connected with the chamber wall 50 by the connecting member 62 such as a bolt, as described above.
• the one body sealing member 10 is manufactured by injection molding method using general molds. At first, raw rubber is ground using a roller to remove elasticity and improve plasticity by inducing rubber particles to be uniform and molecules to be cut, and then vulcanizing agents, antioxidants and so on are mixed therewith. In this case, the vulcanizing agent functions to weave the raw rubber into 3-dimensional network so as to give elasticity. And, the antioxidant prevents the rubber from being aged, for example it prevents its increased adhesive property or its cracking and hardening as the time passes. Subsequently, the raw rubber is loaded into the mold prepared thus, and the assembled mold is pressed under high pressure to shape a one body sealing member 10. If the shaping is accomplished out with a desired level, the mold is removed to obtain the one body sealing member 10. The one body sealing member 10 having a rectangular-parallelepiped frame may be obtained by such a process.
• the chamber bottom 20 is manufactured into a rectangular shape with constant thickness to correspond to a shape and a size of the lower surface of the chamber wall 50 using a milling machine and others.
• each plate 30, 40 constituting the chamber wall 50 is manufactured to have a rectangular shape with which the wall unit 34, 46, the coupling unit 47, 48, and the coupled unit 35, 36 are formed, as described above.
• the chamber lid 60 is manufactured into a rectangular shape with constant thickness and an open bottom by processing the aluminum ingot or the block using the milling machine and others.
• the grooves, into which the coupling projection and the one body sealing member 10 are inserted are suitably formed on either or both sides of the sections at which the plasma chamber bottom 20, each plate 30, 40 constituting the wall 50, and the lid 60 are in contact with each other.
• the plasma chamber bottom 20, a pair of the first plates 30, a pair of the second plates 40, and the plasma chamber lid 60 are sequentially assembled into the one body sealing member 10.
• the aluminum plasma chamber 100 is completed by inserting the one body sealing members 10 into the grooves 24, 31, 41 of the plasma chamber bottom 20, the lid 60, and each plate 30, 40, and connecting them to each other by means of the connecting members 28, 44, 62 as a bolt.
• the aluminum plasma chamber may be useful to reduce wasted materials compared to the conventional chip process and therefore reducing the manufacturing cost and time by separately processing the chamber lid, each plate constituting the chamber wall, and the chamber bottom, which constitute the chamber. Also, the aluminum plasma chamber may useful to improve surface treatment of the individual components to obtain the uniform plasma, and it may be easily conveyed to an installation place since it is easily movable in components.
• the chambers may be more easily assembled since the one body sealing members may be inserted into the grooves formed in the chamber lid, each plate constituting the chamber wall, and the chamber bottom to complete the aluminum plasma chamber.

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• Physics & Mathematics (AREA)
• Engineering & Computer Science (AREA)
• Plasma & Fusion (AREA)
• Chemical & Material Sciences (AREA)
• Analytical Chemistry (AREA)
• Drying Of Semiconductors (AREA)
• Plasma Technology (AREA)

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Citations (4)

• 2004
  • 2004-07-27 KR KR1020040058721A patent/KR100544896B1/ko active IP Right Grant
• 2005
  • 2005-07-27 WO PCT/KR2005/002446 patent/WO2006011757A1/en active Application Filing

Patent Citations (4)

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