WO2005112071A1 - X線源及びその陽極 - Google Patents
X線源及びその陽極 Download PDFInfo
- Publication number
- WO2005112071A1 WO2005112071A1 PCT/JP2005/009078 JP2005009078W WO2005112071A1 WO 2005112071 A1 WO2005112071 A1 WO 2005112071A1 JP 2005009078 W JP2005009078 W JP 2005009078W WO 2005112071 A1 WO2005112071 A1 WO 2005112071A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- layer
- metal layer
- ray source
- anode
- target
- Prior art date
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
- H01J35/02—Details
- H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
- H01J35/08—Anodes; Anti cathodes
- H01J35/112—Non-rotating anodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2235/00—X-ray tubes
- H01J2235/08—Targets (anodes) and X-ray converters
- H01J2235/088—Laminated targets, e.g. plurality of emitting layers of unique or differing materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
- H01J35/02—Details
- H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
- H01J35/08—Anodes; Anti cathodes
- H01J35/112—Non-rotating anodes
- H01J35/116—Transmissive anodes
Definitions
- the present invention relates to an X-ray source for generating X-rays used for nondestructively observing internal structures of industrial products, biological samples, and the like, and an anode thereof.
- a method for facilitating the positioning of an electron beam focus on a target, especially immediately after a hot filament as an electron source is replaced.
- a hole through which an electron beam passes is formed in the center of an aperture between an electron lens and a target and is divided around the hole.
- An electrode is provided. If the beam shape is divergent or skewed, the electron beam collides with the divided electrodes without passing through the center.
- the electron beam can pass through the center and align the X-ray generation point with the center position on the target.
- the spot size of the electron beam on the target is limited by the focus of the electron lens. It is impossible to reduce it beyond performance.
- the output data of an X-ray image detector is required to facilitate proper adjustment of the focusing position of an electron beam on a target.
- a method has been devised to automatically adjust the electron lens based on the force. In this method, it cannot be detected automatically until the spot size of the electron beam is reduced to the minimum.
- a microfocus X-ray source is intended to observe an image of an object with high spatial resolution by narrowing the spot size of an electron beam focused on a target to a very small value.
- the size of the area for generating X-rays on the target is determined by the ability of the electron lens to focus the electron beam on the target, and the spot size of the electron beam on the target.
- the user of the device can determine the extent to which the focal point spread and the position of the electron beam on the target are displaced. It was difficult to measure directly and quantitatively easily.
- the microfocus X-ray source requires an electron lens having an electron focusing function with a very high degree of convergence, which has led to a problem that the cost of the apparatus is increased.
- An object of the present invention is to provide an X-ray source capable of focusing an X-ray finer than an electron beam spot size and an anode thereof.
- the anode of the X-ray source includes a first metal layer, an insulating layer, and a second metal layer formed in this order on a base, and the first metal layer is formed of a second metal layer. Having an atomic number higher than the atomic number of the element that constitutes the first metal layer, and a hole for partially exposing the first metal layer in the insulating layer and the second metal layer. .
- the number of electrons per unit volume of the first metal layer that is, the volume density of the number of electrons is determined by the number of electrons per unit volume of the second metal layer, that is, the number of electrons.
- a hole for partially exposing the first metal layer is formed in the insulating layer and the second metal layer having a volume density larger than that of the first metal layer.
- the anode of the X-ray source includes a substrate, a target layer overlaid on the substrate, for generating X-rays by electron impact, and an insulating layer overlaid on the target layer. And a shield layer overlying the insulating layer and having an opening with the insulating layer to partially expose the target layer.
- FIG. 1 is a diagram showing a cross-sectional structure of an X-ray source according to the present embodiment.
- FIG. 2 is a cross-sectional view of the anode of FIG. 1.
- FIG. 3 is a plan view of the anode of FIG. 1.
- FIG. 1 shows a cross-sectional structure of an X-ray source (also referred to as an X-ray tube) according to the present embodiment.
- a vacuum container 10 accommodates a cathode 11, an anode 8, a force grid electrode 12, a deflection coil 13, an aperture 14, and an electron lens 15.
- the grid electrode 12 is formed by a field emission electron source such as a thermoelectron emitted from a filament of the cathode 11 or a carbon nanotube.
- four deflection coils 13 are discretely arranged around the central axis (optical axis) of the electron beam 5 at a period of 90 °.
- the four deflection coils 13 constitute a deflection unit together with a deflection coil control unit (not shown) that supplies current to them.
- the four electronic lenses (also referred to as focus coils) 15 constitute an electronic lens unit together with an electronic lens control unit (not shown) for supplying a current thereto.
- X-ray sources are used for X-ray diagnostic apparatuses, X-ray computed tomography apparatuses, and the like.
- the X-ray source is connected to, for example, one end of a C-shaped arm and an image intensifier (II) or solid-state X-ray detector (also called a flat panel detector (FPD)) at the other end. Attached to face each other.
- II image intensifier
- FPD flat panel detector
- the X-ray source is mounted together with an X-ray detector on an annular frame that is rotatably held.
- the X-ray source and X-ray detector can be fixed and the object can be mounted on a rotating table for tomography.
- FIG. 2 shows a cross-sectional structure of the anode 8 of FIG.
- FIG. 3 shows a plan structure of the anode 8 of FIG.
- a first metal layer 2 is overlaid on a substrate 1 also serving as an X-ray emission window of an X-ray source.
- the first metal layer 2 constitutes a target layer for effectively generating X-rays by collision of the electron beam 5.
- the electron beam 5 accelerated at high speed by the high voltage between the cathode 11 and the anode 8 collides with the first metal layer 2, a large amount of heat is generated in a minute area.
- the substrate 1 needs to be a material having a high X-ray transmittance, that is, a material composed of an element having a relatively small atomic number so that it can be used as a window material, and has excellent heat conductivity. It needs to be a material. Since the atomic number of an element is equal to the number of electrons possessed by the atom of the element, a material composed of an element having a relatively small atomic number means that the number of electrons per unit volume, that is, the volume of electrons It can be said that it is a material with low density.
- Such a material examples include a single material composed of a single element such as diamond, graphite, beryllium, and aluminum, and a compound material such as aluminum nitride, boron nitride, and silicon carbide. It is selectively used as a material for the substrate 1 from the inside.
- the first metal layer 2 is made of a single material of an element having a relatively large atomic number, such as tungsten or molybdenum, or a composite material containing the element.
- an insulating layer 3 having a relatively small atomic number and having an elemental force is overlaid.
- the insulating layer 3 is required to be a substance that can be electrically insulated, has heat resistance, and has a low vapor pressure, and is preferably made of a material such as silicon dioxide, aluminum aluminum, or diamond.
- a second metal layer 4 made of a single material of an element having a relatively small atomic number such as titanium or a composite material containing the element is stacked on the insulating layer 3.
- the second metal layer 4 is configured such that the amount of X-rays generated in the second metal layer 4 under the same conditions is smaller than the amount of X-rays generated in the first metal layer 2 or
- the atomic number of the element that mainly constitutes is smaller than the atomic number of the element that constitutes or mainly constitutes the first metal layer 2.
- the volume density of the number of electrons of the second metal layer 4 is smaller than the volume density of the number of electrons of the first metal layer 2.
- an element constituting or mainly constituting the second metal layer 4 is selected so that almost no X-rays are generated in the second metal layer 4.
- the second metal layer 4 is provided as a shield layer for shielding the first metal layer 2 from the electron beam 5 except for the opening.
- a minute, substantially circular opening (also referred to as a hole) 6 is formed substantially at the center of the second metal layer 4 and the insulating layer 3.
- the opening 6 is formed by etching.
- the anode 8 is aligned with the center axis of the electron beam 5 so that the center of the opening 6 is located on the center axis of the electron beam 5.
- a plurality of openings 6 may be provided near the central axis of the single force electron beam 5. In this way, when the opening is thermally damaged by the electron beam, the life of the anode can be extended by selecting an opening that is not damaged by electron beam deflection from among the plurality of openings. It can be substantially extended.
- the aperture 6 has a diameter smaller than the limit diameter of the spot 26 of the electron beam 5 that can be narrowed down by the electron lens 15. Since the opening 6 is opened in the second metal layer 4 and the insulating layer 3, a part of the surface of the first metal layer 2 corresponding to the opening 6 is exposed to the cathode 11.
- the electron beam 5 arriving at the anode 8 is shielded by the second metal layer 4, passes through the opening 6 and collides with a part of the surface of the first metal layer 2.
- X-rays are generated on a part of the surface of the first metal layer 2 colliding with the electron beam 5. Therefore, the X-ray focal point where X-rays are generated can be realized in a size smaller than the spot diameter of the electron beam 5. That is, when the electron beam 5 is irradiated on the anode 8, the electrons that have passed through the opening 6 and reached the bottom, that is, the surface of the first metal layer 2, have a large atomic number. X-rays are generated by colliding with.
- the electron beam 5 when the spot 26 of the electron beam 5 is wider than the opening 6, the electron beam 5 also collides with the second metal 4 having a small atomic number.
- the X-ray generation region substantially depends on the area of the bottom of the opening 6. Therefore, by making the size of the opening 6 formed by photolithography or electron beam exposure to be smaller than the size of the spot 26 of the electron beam 5, the X-ray focus X-ray can be obtained. It is possible to miniaturize the X-ray generation area of the device beyond the beam focus performance of the device.
- the first metal layer 2 and the second metal layer 4 are electrically insulated because they are separated by the insulating layer 3 therebetween.
- the base 1 also serving as the window material of the X-ray source is electrically insulated from the casing 10, and the second metal layer 4 and the insulating layer 3 are etched at the center of the center axis of the X-ray beam 5 by etching.
- An ammeter 25 is connected so that the amount of current of the electron beam 5 that is removed and collides with the opening 6 whose surface is exposed to the first metal layer 2 can be detected. Therefore, the intensity ratio of the electron beam that collides with the first metal layer 2 and the second metal layer 4 can be detected by monitoring the current flowing to the ground for the respective metal layers 2 and 4.
- the current flowing from the first metal layer 2 to the ground is 0, and it is detected by the current that the electron beam 5 is warped in the position of the opening 6. .
- the spot diameter of the electron beam 5 is wider than the diameter of the opening 6, the ratio of the current flowing from the first metal layer 2 and the second metal layer 4 to the ground respectively becomes the spot 26 of the electron beam 5 It is monitored as an amount that reflects the size of the size.
- Electrons that collide with the second metal layer 4 around the opening 6 generate a small amount of X-rays because the atomic number of the second metal layer 4 is small. Therefore, even when the electron beam 5 is wider than the size of the opening 6, the size of the X-ray generation region (X-ray focal point) is roughly equal to the size of the opening 6 formed by etching. It is almost equal to the diameter.
- the second metal layer 4 is made up of a plurality of intersecting openings 6, in this case two grooves 19, 20 [four sub-sections 4 1]. , 4- 2, 4- 3, 4 4
- the grooves 19 and 20 reach the insulating layer 3, and the surfaces of the first metal layer 2 are exposed in the grooves 19 and 20.
- the grooves 19 and 20 are formed by removing the second metal layer 4 and the insulating layer 3 therebelow by etching calories, and the outermost surface is the first metal layer 2.
- the electrode portions 4-1, 4-2, 4, 3, 4-4 made of the second metal layer 4 are electrically separated.
- Ammeters 21, 2, 23 and 24 are connected so that they can be detected.
- the current values detected by the ammeters 21, 2, 23, 24 are denoted as II, 12, 13, 14.
- the direction and distance of the shift of the center of the spot 26 of the electron beam 5 with respect to the center of the opening 6 can be specified based on the comparison results of the current values II, 12, 13, and 14.
- the deflection coil control unit (not shown) specifies the direction and distance of the deviation based on the current values II, 12, 13, and 14, and supplies a current corresponding to the specified direction and distance of the deviation to the four deflection coils 13.
- the center of the spot 26 of the electron beam 5 is dynamically adjusted to the center of the opening 6. A specific description will be given assuming that the coordinates of the center in FIG. 3 are (0, 0).
- the shift in the X direction in FIG. 3 can be specified by comparing the sum of the currents II and 13 and the sum of the currents 12 and 14.
- the sum of the currents 12 and 14 is almost 0, it can be seen that the electron beam 5 hits a region almost off the center (0, 0) (X ⁇ 0). Therefore, the current flowing through the pair of deflection coils 13 in the X direction is controlled so that the electron beam 5 gradually moves to X> 0.
- the sum of the currents 12 and 14 becomes non-zero, and becomes approximately the same as the sum of the currents II and 13.
- An electron lens control unit (not shown) includes a current value 10 detected by an ammeter 25 connected to the first metal layer 2, and a divided electrode portion 4-1, 4 of the second metal layer 4. -Based on the sum of the currents II, 12, 13, I 4 detected by the ammeters 21, 22, 23, 24 connected to 2, 4, 3, 4 4 The size can be specified.
- the electron lens control unit controls the electron beam 5. The current flowing through the electron lens 15 can be controlled so that the spot 26 reaches the critical diameter.
- the spot 26 of the electron beam 5 approaches the critical diameter, the sum of the currents II, 12, 13, and 14 detected by the ammeters 21, 22, 23, and 24 decreases, and the first metal layer The current value 10 detected by the ammeter 25 connected to 2 becomes higher.
- the spot 26 of the electron beam 5 reaches the critical diameter, the difference between the sum of the currents II, 12, 13, and 14 and the current 10 becomes a predetermined value.
- the size of the spot 26 of the electron beam 5 is controlled by controlling the current flowing through the electron lens 15 so that the difference between the sum of the currents II, 12, 13, and 14 and the current 10 matches or approximates a predetermined value. Can be minimized.
- the focus as an X-ray source for generating X-rays can be narrowed down more than the region where the accelerated electrons collide with the anode target, and the micro focus having high spatial resolution can be obtained.
- An X-ray source can be configured. Therefore, an electromagnetic lens having a low electron beam focusing ability can be used, and the cost of the apparatus can be reduced.
- by monitoring the value of the current flowing through each electrode on the divided target it is possible to control the generation point of the X-ray source on the target to a predetermined location that is pre-determined, The focus position of the electron beam can be easily adjusted.
- the spot size of the electron beam on the target can be monitored and controlled.
Abstract
Description
Claims
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004147850A JP4601994B2 (ja) | 2004-05-18 | 2004-05-18 | X線源及びその陽極 |
JP2004-147850 | 2004-05-18 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2005112071A1 true WO2005112071A1 (ja) | 2005-11-24 |
Family
ID=35394411
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2005/009078 WO2005112071A1 (ja) | 2004-05-18 | 2005-05-18 | X線源及びその陽極 |
Country Status (2)
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JP (1) | JP4601994B2 (ja) |
WO (1) | WO2005112071A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP4254464A1 (en) * | 2022-03-29 | 2023-10-04 | Excillum AB | Determination of operational state of x-ray source |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007123022A (ja) * | 2005-10-27 | 2007-05-17 | Shimadzu Corp | X線源およびそれに用いられるターゲット |
JP5687001B2 (ja) * | 2009-08-31 | 2015-03-18 | 浜松ホトニクス株式会社 | X線発生装置 |
JP5591048B2 (ja) * | 2010-09-30 | 2014-09-17 | キヤノン株式会社 | X線管の製造方法、及びx線管 |
JP6110209B2 (ja) * | 2013-05-17 | 2017-04-05 | 浜松ホトニクス株式会社 | X線発生用ターゲット及びx線発生装置 |
KR102120400B1 (ko) * | 2014-03-26 | 2020-06-09 | 한국전자통신연구원 | 타깃 유닛 및 그를 구비하는 엑스 선 튜브 |
US10453579B2 (en) * | 2015-02-05 | 2019-10-22 | Shimadzu Corporation | X-ray generator |
EP3312868A1 (en) * | 2016-10-21 | 2018-04-25 | Excillum AB | Structured x-ray target |
KR102385456B1 (ko) * | 2017-11-30 | 2022-04-12 | 한국전기연구원 | 빔 전류 측정이 가능한 선형가속기용 엑스선 타켓 |
CN112912987B (zh) | 2018-10-22 | 2022-05-31 | 佳能安内华股份有限公司 | X射线发生装置和x射线摄影系统 |
JP7099488B2 (ja) * | 2020-04-06 | 2022-07-12 | 株式会社ニコン | X線発生装置、x線装置、構造物の製造方法、及び構造物製造システム |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09171788A (ja) * | 1995-11-28 | 1997-06-30 | Philips Electron Nv | 微小焦点x線管球及びそれを用いた装置及びその使用方法 |
JP2001319605A (ja) * | 2000-05-12 | 2001-11-16 | Shimadzu Corp | X線管及びx線発生装置 |
JP2002313266A (ja) * | 2001-04-13 | 2002-10-25 | Rigaku Corp | X線管 |
-
2004
- 2004-05-18 JP JP2004147850A patent/JP4601994B2/ja not_active Expired - Fee Related
-
2005
- 2005-05-18 WO PCT/JP2005/009078 patent/WO2005112071A1/ja active Application Filing
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09171788A (ja) * | 1995-11-28 | 1997-06-30 | Philips Electron Nv | 微小焦点x線管球及びそれを用いた装置及びその使用方法 |
JP2001319605A (ja) * | 2000-05-12 | 2001-11-16 | Shimadzu Corp | X線管及びx線発生装置 |
JP2002313266A (ja) * | 2001-04-13 | 2002-10-25 | Rigaku Corp | X線管 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP4254464A1 (en) * | 2022-03-29 | 2023-10-04 | Excillum AB | Determination of operational state of x-ray source |
WO2023186870A1 (en) * | 2022-03-29 | 2023-10-05 | Excillum Ab | Determination of operational state of x-ray source |
Also Published As
Publication number | Publication date |
---|---|
JP4601994B2 (ja) | 2010-12-22 |
JP2005332623A (ja) | 2005-12-02 |
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