WO2005087970A1

WO2005087970A1 - Vacuum deposition apparatus

Info

Publication number: WO2005087970A1
Application number: PCT/JP2005/003174
Authority: WO
Inventors: Hisato Tanaka
Original assignee: Ulvac, Inc.
Priority date: 2004-03-12
Filing date: 2005-02-25
Publication date: 2005-09-22
Also published as: JP4563698B2; JP2005256113A

Abstract

A vacuum deposition apparatus having an evaporation source drive mechanism capable of reducing the occurrence of particles in a vacuum chamber and coping with the arrangement of multiple evaporation sources. The vacuum deposition apparatus comprises a hollow shaft (5) closed at one end (5a) and opening at the other end (5b) and a moving mechanism inserting the closed end (5a) of the hollow shaft (5) to the inside (2) of the vacuum chamber and moving the hollow shaft (5) in the axial direction. The evaporation source (4) is fitted to the closed end (5a) side of the hollow shaft (5) and allows a supply system (7) for power and cooling water led into the evaporation source (4) to be provided through the inside of the hollow shaft (5), and the moving mechanism is installed on the outside of the vacuum chamber.

Description

Vacuum deposition equipment

Technical field

The present invention relates to a vacuum evaporation apparatus having a structure in which an evaporation source can move in a vacuum chamber.

Background art

In a vacuum evaporation apparatus, a substrate to be processed and an evaporation source are arranged inside a vacuum chamber so as to face each other, and a substance evaporated from the evaporation source is evaporated on the substrate to form a film. Conventionally, deposition was performed with the evaporation source fixed in a vacuum chamber.In recent years, however, the evaporation source has been moved relative to the substrate for reasons such as a larger substrate area and uniform film quality. A method of forming a film is also employed (for example, see Patent Document 1 below).

Conventionally, a vacuum evaporation apparatus having a structure in which an evaporation source can be moved in a vacuum chamber has a mechanism for driving the evaporation source, such as a chain sprocket, which is disposed in the vacuum chamber, and a power supply cable for the evaporation source. The connection of the cooling water circulation hose and the like was made directly to the evaporation source inside the chamber via the partition of the vacuum chamber.

[0004] Prior art documents related to the invention of this application are shown below. Patent Document 1 discloses a vacuum evaporation apparatus having a structure including a plurality of evaporation sources moving from one end of a substrate to the other end, and continuously forming a multilayer film of different evaporation materials. Further, Patent Document 2 discloses a configuration in which an evaporation source of an electron beam evaporation apparatus is formed in a cylindrical shape, the cylindrical evaporation source is movable in a longitudinal direction, and cooling water is circulated inside. T

Patent Document 1: Japanese Patent Application Laid-Open No. 2003-257644

Patent Document 2: JP-A-10-259474

Disclosure of the invention

Problems to be solved by the invention

[0006] In a conventional vacuum evaporation apparatus having a structure in which an evaporation source can be moved in a vacuum chamber while pressing, as described above, a driving mechanism required to move the evaporation source is a vacuum chamber. Since it is disposed inside the chamber, there is a problem that the inside of the chamber is contaminated by particles generated from the driving mechanism. In addition, since the driving mechanism is arranged in the chamber, the volume of the chamber increases, and it becomes difficult to arrange a plurality of evaporation sources.

[0007] Further, since the power cable, the cooling water introduction pipe, and the like connected to the evaporation source are directly placed in the vacuum chamber, the movement of the evaporation source causes the generation of particles caused by these cables and the like. There was also a problem of durability.

[0008] The present invention has been made in view of the above-described problems, and provides a vacuum evaporation apparatus including an evaporation source driving mechanism that can reduce generation of particles in a chamber and can cope with a plurality of arrangements of evaporation sources. That is the task.

Means for solving the problem

[0009] The above-described problem is to be solved in a vacuum deposition apparatus provided with an evaporation source of a deposition material in a vacuum chamber, wherein a hollow shaft having one end closed and the other end opened is provided. A moving mechanism for inserting the inside of the vacuum chamber to move the hollow shaft in the axial direction, wherein the evaporation source is attached to one end of the hollow shaft, and power and cooling water introduced into the evaporation source are provided. Is supplied through the interior of the hollow shaft, and the moving mechanism is provided outside the vacuum chamber.

In the present invention, since the drive mechanism of the evaporation source is arranged outside the vacuum chamber, it is possible to avoid the generation of particles due to the drive mechanism, to reduce the volume of the vacuum chamber, or to reduce the volume of the vacuum chamber. It is possible to easily cope with multiple arrangements of evaporation sources in the interior.

[0011] Furthermore, since necessary power and cooling water are supplied to the evaporation source via the inside of the hollow shaft supporting the evaporation source, particles from each of the power and cooling water supply systems are provided. Advantageous Effects of the Invention The generation can be suppressed and the contamination of the vacuum chamber can be effectively reduced.

As described above, according to the vacuum evaporation apparatus of the present invention, the drive mechanism of the evaporation source is disposed outside the vacuum chamber, and the necessary power and cooling water supply to the evaporation source are reduced. Since the process is performed through the interior of the hollow shaft supporting the evaporation source, it is possible to reduce the particle generation factor inside the vacuum chamber and easily cope with a plurality of evaporation sources.

Brief Description of Drawings

FIG. 1 is a side sectional view showing a configuration of an evaporation source driving mechanism of a vacuum chamber according to an embodiment of the present invention.

FIG. 2 is a side sectional view showing one operation of the evaporation source driving mechanism of FIG. 1.

FIG. 3 is a plan view showing an example in which a plurality of evaporation sources are arranged.

Explanation of symbols

1 Evaporation source drive mechanism

2 Deposition chamber

3 Vacuum Channo bulkhead

4 Evaporation source

5 Hollow shaft

5a Closed end of hollow shaft

5b Open end of hollow shaft

6 Bellows

7 Supply system

10 Guide rail

12 Slide guide

15 Drive

BEST MODE FOR CARRYING OUT THE INVENTION

Hereinafter, embodiments of the present invention will be described with reference to the drawings.

FIG. 1 shows a configuration of an evaporation source driving mechanism 1 of a vacuum evaporation apparatus according to an embodiment of the present invention.

The evaporation source drive mechanism 1 includes a hollow shaft 5 that passes through a partition 3 of a vacuum chamber that partitions the film formation chamber 2 and supports the evaporation source 4 in the film formation chamber 2. The hollow shaft 5 has one end 5a on the film forming chamber 2 side closed and the other end 5b on the outside of the vacuum chamber open. Steaming The source 4 is supported near one end 5a of the hollow shaft 5. Hereinafter, one end 5a of the hollow shaft 5 is referred to as a “closed end”, and the other end 5b is referred to as an “open end”.

The hollow shaft 5 is penetrated through a through hole 3a of the partition wall 3, and the hollow shaft 5 is movable in the axial direction through the penetrating portion. Bellows 6 is provided between 5b. That is, in the present embodiment, airtightness between the partition wall 3 and the hollow shaft 5 is ensured by the bellows 6, and the bellows 6 allows communication between the inside and outside of the vacuum chamber in the through portion of the hollow shaft 5. I try to cut off. The inside of the hollow shaft 5 is at atmospheric pressure because its closed end 5a is located inside the vacuum chamber and its open end 5b is located outside the vacuum chamber.

[0019] The evaporation source 4 has a resistance heating source for evaporating the evaporation material and a jacket for circulating cooling water. 7 is connected to the evaporation source 4 via the inside of the hollow shaft 5.

[0020] The evaporation source 4 is not limited to the above-described resistance heating method, and another type of evaporation source such as an electron beam evaporation source can be used.

The inside of the hollow shaft 5 communicates with an open end 5b that opens to the outside (atmosphere side) of the vacuum chamber, and a supply system 7 such as the power cable and the cooling water circulation hose opens the hollow shaft 5. It is inserted from end 5b. The supply system 7 is connected to an external power source and a cooling water circulation system through the inside of a flexible outlet pipe 9 fixed to a support plate 8 attached to the upper end of the hollow shaft 5 on the open end 5b side. Te ru.

The evaporation source 4 is movable inside the film forming chamber 2 along a guide rail 10 extending in the axial direction of the hollow shaft 5. A guide roller 11 that runs on the guide rail 10 is attached to the closed end 5a side of the hollow shaft 5.

[0023] A drive source for moving the hollow shaft 5 in the axial direction is provided outside the vacuum chamber.

The partition 3 of the vacuum chamber is provided with a bracket 13 that supports a slide guide 12 along the extending direction of the hollow shaft 5 at a position directly below the hollow shaft 5 on the outer surface side. A guide block 14 that runs on the slide guide 12 is provided on the open end 5b side of the hollow shaft 5, and is driven by a drive unit 15 attached to the lower surface side of the bracket 13 as shown in FIG. As shown in FIG. 2, the hollow shaft 5 is movable along a slide guide 12.

[0025] The drive unit 15 is formed of a precision feed mechanism such as a servo cylinder, an electric servomotor, or a ball screw unit including a pulse motor, so that the movement amount and the movement position of the hollow shaft 5 can be controlled with high precision. T!

The “moving mechanism” of the present invention is configured by the slide guide 12, the bracket 13, the guide block 14, the driving unit 15, and the like.

The vacuum evaporation apparatus provided with the evaporation source driving mechanism 1 configured as described above is provided inside the film formation chamber 2 on the film formation surface of the substrate to be processed, which is disposed at a position facing the evaporation source 4. On the other hand, a predetermined vapor deposition material is formed. In this case, a mask on which an opening pattern of a predetermined shape is formed may be overlaid on the film formation surface of the substrate to be processed.

The evaporation source driving mechanism 1 drives the driving unit 15 from the standby position of the evaporation source 4 shown in FIG. 1 to move the hollow shaft 5 to the film forming chamber 2 side, and the evaporation source 4 is shown in FIG. In the process of moving to the end position, a film forming operation is performed on the substrate to be processed.

Here, when the evaporation source 1 is located at the standby position shown in FIG. 1, film formation processing cannot be performed, that is, processing is performed at a geometrical position where evaporation material is not deposited on the film formation surface. By disposing the substrate, it is possible to carry out the vaporization of the vapor deposition material at the standby position without providing a vapor deposition inhibiting mechanism such as a shirter, etc. Processing can be performed quickly, and productivity and film quality can be improved.

In the present embodiment, since the drive mechanism of the evaporation source 4 is disposed outside the partition 3 of the vacuum chamber, the generation of dust or particles caused by the drive mechanism is avoided. As a result, a high-quality film formation process can be performed while maintaining the cleanness of the film formation chamber 2.

[0031] Further, since the evaporation source driving mechanism 1 is disposed outside the vacuum chamber, it is possible to avoid an increase in the volume of the film forming chamber 2, and thereby to reduce the size of the vacuum chamber.

[0032] Further, by disposing the evaporation source driving mechanism 1 outside the vacuum chamber, it is possible to dispose a plurality of evaporation sources 4 inside the film forming chamber 2, and to form a multilayer film on the substrate to be processed. Will be able to respond sufficiently.

FIG. 3 is a plan view showing an example of the arrangement of a plurality of evaporation sources 4 in the film forming chamber 2. Each evaporation source 4 A and 4B are movable in the film forming chamber 2 by evaporation source driving mechanisms 1A and IB having the same configuration as described above. Each of the evaporation sources 4A and 4B is configured to share the same moving area so as to cover the same area on the film formation surface of the substrate to be processed. The mode of movement of each of the evaporation sources 4 is not particularly limited, and can be moved synchronously or alternately.

According to the present embodiment, the supply of necessary power and cooling water to the evaporation source 4 in the film forming chamber 2 is performed via the inside of the hollow shaft 5 that supports the evaporation source 4. Therefore, there is no need for an insertion mechanism for the power cable, cooling water circulation hose, and the like for the vacuum chamber bulkhead 3.

Further, since the supply system 7 for supplying necessary power and cooling water to the evaporation source 4 is inserted and arranged inside the hollow shaft 5, the supply system 7 accompanying the movement of the evaporation source 4 can be held stably. Thereby, generation of particles can be prevented, and durability of the supply system 7 can be improved.

[0036] The power described in the embodiment of the present invention is, of course, not limited to this, and various modifications can be made based on the technical idea of the present invention.

For example, in the above embodiment, as an example of arranging a plurality of evaporation sources 4 in the film forming chamber 2, the evaporation source driving mechanisms shown in FIG. 1 are arranged side by side on the same surface of the partition wall 3 of the vacuum chamber. Although the configuration has been described, the present invention is not limited to this, and for example, a configuration example in which the above-described evaporation source driving mechanism is disposed on a pair of opposed partition walls of a vacuum chamber can be applied.

[0038] The number of evaporation sources 4 is not limited to two, and the number can be further increased.

Claims

The scope of the claims

[1] In a vacuum evaporation apparatus provided with an evaporation source of an evaporation material in a vacuum chamber,

A hollow shaft having one end closed and the other end opened; and a moving mechanism for inserting one end of the hollow shaft into the inside of the vacuum chamber and moving the hollow shaft in an axial direction,

The evaporation source is attached to one end of the hollow shaft, power and cooling water introduced into the evaporation source are supplied through the inside of the hollow shaft, and the moving mechanism includes the vacuum chamber. A vacuum evaporation apparatus, which is provided outside of the apparatus.

[2] A bellows is provided between an insertion portion of the vacuum chamber through which the hollow shaft is inserted and the other end of the hollow shaft to shut off communication between the inside and the outside of the vacuum chamber. 2. The vacuum deposition apparatus according to item 1.

[3] The moving mechanism includes a slide guide extending along the axial direction of the hollow shaft protruding outside the vacuum chamber, and a drive unit for moving the hollow shaft along the slide guide. The vacuum evaporation apparatus according to claim 1, wherein

4. The vacuum evaporation apparatus according to claim 1, wherein a plurality of the hollow shafts are arranged, and the evaporation source is attached to each of the plurality of hollow shafts.