WO2005057484A1 - Ic card and method for manufacturing ic card - Google Patents

Ic card and method for manufacturing ic card Download PDF

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Publication number
WO2005057484A1
WO2005057484A1 PCT/JP2004/018335 JP2004018335W WO2005057484A1 WO 2005057484 A1 WO2005057484 A1 WO 2005057484A1 JP 2004018335 W JP2004018335 W JP 2004018335W WO 2005057484 A1 WO2005057484 A1 WO 2005057484A1
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WO
WIPO (PCT)
Prior art keywords
card
adhesive
module
module support
antistatic layer
Prior art date
Application number
PCT/JP2004/018335
Other languages
French (fr)
Japanese (ja)
Inventor
Mineko Ito
Original Assignee
Konica Minolta Photo Imaging, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Photo Imaging, Inc. filed Critical Konica Minolta Photo Imaging, Inc.
Publication of WO2005057484A1 publication Critical patent/WO2005057484A1/en

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Classifications

    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06KGRAPHICAL DATA READING; PRESENTATION OF DATA; RECORD CARRIERS; HANDLING RECORD CARRIERS
    • G06K19/00Record carriers for use with machines and with at least a part designed to carry digital markings
    • G06K19/06Record carriers for use with machines and with at least a part designed to carry digital markings characterised by the kind of the digital marking, e.g. shape, nature, code
    • G06K19/067Record carriers with conductive marks, printed circuits or semiconductor circuit elements, e.g. credit or identity cards also with resonating or responding marks without active components
    • G06K19/07Record carriers with conductive marks, printed circuits or semiconductor circuit elements, e.g. credit or identity cards also with resonating or responding marks without active components with integrated circuit chips
    • G06K19/077Constructional details, e.g. mounting of circuits in the carrier
    • G06K19/07718Constructional details, e.g. mounting of circuits in the carrier the record carrier being manufactured in a continuous process, e.g. using endless rolls
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06KGRAPHICAL DATA READING; PRESENTATION OF DATA; RECORD CARRIERS; HANDLING RECORD CARRIERS
    • G06K19/00Record carriers for use with machines and with at least a part designed to carry digital markings
    • G06K19/06Record carriers for use with machines and with at least a part designed to carry digital markings characterised by the kind of the digital marking, e.g. shape, nature, code
    • G06K19/067Record carriers with conductive marks, printed circuits or semiconductor circuit elements, e.g. credit or identity cards also with resonating or responding marks without active components
    • G06K19/07Record carriers with conductive marks, printed circuits or semiconductor circuit elements, e.g. credit or identity cards also with resonating or responding marks without active components with integrated circuit chips
    • G06K19/077Constructional details, e.g. mounting of circuits in the carrier
    • G06K19/0772Physical layout of the record carrier
    • G06K19/07735Physical layout of the record carrier the record carrier comprising means for protecting against electrostatic discharge
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06KGRAPHICAL DATA READING; PRESENTATION OF DATA; RECORD CARRIERS; HANDLING RECORD CARRIERS
    • G06K19/00Record carriers for use with machines and with at least a part designed to carry digital markings
    • G06K19/06Record carriers for use with machines and with at least a part designed to carry digital markings characterised by the kind of the digital marking, e.g. shape, nature, code
    • G06K19/067Record carriers with conductive marks, printed circuits or semiconductor circuit elements, e.g. credit or identity cards also with resonating or responding marks without active components
    • G06K19/07Record carriers with conductive marks, printed circuits or semiconductor circuit elements, e.g. credit or identity cards also with resonating or responding marks without active components with integrated circuit chips
    • G06K19/077Constructional details, e.g. mounting of circuits in the carrier
    • G06K19/07749Constructional details, e.g. mounting of circuits in the carrier the record carrier being capable of non-contact communication, e.g. constructional details of the antenna of a non-contact smart card

Definitions

  • the present invention relates to an IC card having a built-in IC module and a method of manufacturing an IC card.
  • the IC card reads and writes data from and to external devices via electrical contacts provided on the surface and loop antennas inside the card.
  • the Ic card has a large storage capacity and greatly improved security compared to a magnetic card.
  • non-contact type IC cards that have an internal antenna for exchanging information between the IC chip and the outside inside the card and do not have electrical contacts outside the card are compared with contact type IC cards that have electrical contacts on the card surface. It is being used for applications requiring high data confidentiality and anti-counterfeiting like ID cards.
  • an IC card for example, a first sheet material and a second sheet material are bonded with an adhesive. And an IC module having an IC chip and an antenna in the adhesive layer (see, for example, Japanese Patent Application Laid-Open No. 2002-72498). It is preferable to use a low-temperature adhesive from the viewpoint of the transportability of the first sheet material and the second sheet material, the transportability of the IC card due to heat shrinkage, warpage, and the like. IC chip breakage has become a major issue due to the electrification that occurs in the IC.
  • the present invention can prevent an electronic component from being damaged by electrification at the time of manufacturing, which is a conventional problem, and can prevent dust from being mixed at the time of manufacturing, and can obtain an IC card having good surface unevenness. It aims to provide IC cards and IC card manufacturing methods.
  • one embodiment of the present invention provides an IC module having an antenna and an IC chip supported by a module support, and two first sheet members opposing the IC module.
  • An IC card integrated with an adhesive sandwiched between a sheet material and a second sheet material, wherein the IC card has an antistatic layer on at least one surface of the module support.
  • the antistatic layer is characterized by comprising at least one of an ionic conductive polymer, a colloidal metal oxide sol, a crystalline metal oxide particle, and a conjugated conductive polymer.
  • the surface specific resistance of at least one surface of the module support is not more than 1 E + 11 ⁇ at 23 ° C. and 20% RH.
  • the viscosity of the adhesive is 120.
  • the IC card according to any one of the above (1) to (4), wherein the adhesive is a reactive hot melt adhesive.
  • one embodiment of the present invention is a sheet-like shape in which an IC module having an antenna and an IC chip is supported by a module support, and the IC module is provided with two first sheet members facing each other.
  • a method for manufacturing an IC card wherein the IC card is sandwiched between second sheet materials and integrated with an adhesive, comprising an antistatic layer on at least one surface of the module support.
  • the antistatic layer comprises at least one of an ion conductive polymer, a colloidal metal oxide sol, a crystalline metal oxide particle, and a conjugated conductive polymer.
  • the antistatic layer comprises a step of forming a film of the module support.
  • the surface specific resistance of at least one side of the module support is 1 E + 11 ⁇ or less at 23 ° C. and 20% RH, and A method for manufacturing the IC card according to any one of the above.
  • the IC according to any of (7) to (10), wherein the viscosity of the adhesive is 3000 to 2000 OmPas at 120 ° C. This is a method for manufacturing a card.
  • FIG. 1 is an exploded perspective view of an IC card according to an embodiment of the present invention.
  • FIG. 2 is a cross-sectional view of the IC card according to the embodiment of the present invention.
  • FIG. 3 is a plan view of the IC card according to the embodiment of the present invention.
  • FIG. 4 is an enlarged view of a manufacturing apparatus for performing the method for manufacturing an IC card according to the embodiment of the present invention.
  • FIG. 5 is a diagram showing an IC module in an IC card according to the embodiment of the present invention.
  • FIG. 6 shows the results of the evaluation. BEST MODE FOR CARRYING OUT THE INVENTION
  • an embodiment of an IC card and a method of manufacturing an IC card according to the present invention will be described.
  • the present invention is not limited to this embodiment.
  • the embodiments of the present invention show the most preferable embodiments of the present invention, and the terms of the present invention are not limited to these.
  • FIG. 1 is an exploded perspective view of the IC card
  • FIG. 2 is a sectional view of the IC card
  • FIG. 3 is a plan view of the IC card.
  • the thickness of the IC card 1 of this embodiment is specified to be 0.76 mm according to the ISO standard.
  • the IC card 1 includes first and second sheet materials 2 and 3 which are two sheet materials, and adhesives 4 and 5 interposed between the first and second sheet materials 2 and 3. .
  • An image receiving layer 60 is provided on the surface of the first sheet material 2 on which the adhesive 4 is not interposed, and a writing layer is provided on the surface of the second sheet material 3 on which the adhesive 5 is not interposed. 6 1 is formed.
  • An example of the image receiving layer 60 is a layer formed of a material that traps and fixes the dye when the sublimation dye ink is heated by TPH (thermal head) and thermally diffuses.
  • 60 is provided with personal identification information 62.
  • personal identification information 62 For example, in the case of an employee certification card, the character "name”, the character "issue date”, and the image of "face photo” are provided. Information.
  • This image receiving layer 60 is protected by the transparent protective layer 63.
  • the writing layer 61 ′ can be formed, for example, by coating a polyester resin or the like with a white pigment such as silica dispersed therein.
  • An IC module 9 is enclosed in the adhesives 4 and 5, and the IC module 9 includes an antenna 7 and an IC chip 6.
  • the IC module 9 has a single-wafer shape supported by a module support 8.
  • the module support 8 has an antistatic layer 11 on at least one surface.
  • the module support 8 having the antistatic layer 11 has a surface resistivity of at least one side of not more than 1 E + 11 ⁇ / port at 23 ° C and 20% RH. Is preferred.
  • the IC module includes an IC chip for electrically storing information of a user of the IC card, and a coil-shaped antenna connected to the IC chip.
  • the IC chip is a memory only or a microcomputer in addition to the memory, and may include a capacitor in some cases.
  • the IC module has an antenna coil.
  • any method such as conductive paste printing, copper foil etching, or wire welding may be used.
  • the bonding between the IC chip and the antenna pattern is made of conductive adhesives such as silver paste, copper paste, carbon paste, etc.
  • a method using a film e.g., asolum manufactured by Hitachi Chemical Co., Ltd.
  • a method of performing solder bonding or ACF bonding is known, but any method may be used. It is also preferable to have a reinforcing plate near the IC chip in order to improve the point pressure strength of the IC chip.
  • the IC module has a single-wafer shape supported by a module support, and the module support is not particularly limited.
  • the module support is not particularly limited.
  • PET polyethylene terephthalate
  • PEN polyethylene naphthalate
  • PET-G at least ethylene Modified polyester resin obtained by polymerizing three components of glycol, terephthalic acid and 1,4-six-hexane dimethanol
  • PBT polybutylene terephthalate
  • PC polycarbonate
  • P 1 poly
  • the IC chip can be kept in a good state by suppressing the charging and regenerating.
  • the thickness of the module support is preferably from 10 to 100 ⁇ m, and more preferably from 20 to 60. Further, the total thickness of the IC module is preferably from 100 to 500 / m, more preferably from 150 to 450 zm.
  • the module support of the IC module has an antistatic layer on at least one side, and the antistatic layer contains a conductive material called an antistatic agent or a conductive material (hereinafter referred to as an antistatic agent).
  • the antistatic agent is not particularly limited, but preferably contains at least one of an ionic conductive polymer, a colloidal metal oxide sol, a crystalline metal oxide particle, and a conjugated conductive polymer.
  • the ionic conductive polymer is not particularly limited, and may be any of anionic, cationic, amphoteric and nonionic. Among them, anionic and cationic are preferred. More preferred are sulfonic acid-based and carboxylic acid-based polymers or latex-based quaternary ammonium-based polymers or latexes for anionic properties. These ionic conductive monopolymers are described, for example, in the anionic polymer or latex described in JP-B-52-25251, JP-A-51-29923 and JP-B-60-48024. No. 7- 1 8 1 76, No. 5 7- 5 6 05 9, No. 58- 568 Five
  • Colloidal metal oxide sols include, for example, an amorphous stannic acid sol as disclosed in JP-B-35-6616, and an amorphous vanadium pentoxide described in JP-A-55-5982. And alumina sol having an electrolyte as disclosed in JP-B-57-12979.
  • a substance containing a small amount of a hetero atom forming a donor with respect to a metal oxide generally has high conductivity and is preferred.
  • the addition of such I n, 1 ⁇ 0 for a 2 ⁇ 1), the addition of such T a, for the S N_ ⁇ 2 Addition of Sb, Nb, halogen element, etc. is effective.
  • the addition amount of these hetero atoms is preferably in the range of 0.01 mol% to 30 mol%, more preferably 0.1 mol% to 1 mol%.
  • a method of coating the surface of the inorganic or organic filler with these crystalline oxides can also be preferably used.
  • a conjugated conductive polymer is a conjugated polymer with a molecular skeleton consisting of a conjugated system in which a double bond or triple bond that connects a carbon atom to a carbon atom or a heteroatom is alternately long with a single bond.
  • conjugated polymers include: 1) aliphatic conjugated polymers: polymers in which carbon-carbon conjugated systems such as polyacetylene are continuously extended; 2) aromatic co-polymers: aromatic carbonized materials such as poly (paraphenylene). 3) Heterocyclic conjugated polymer: polypyrrole, polythiophene, polyisothia 4018335
  • 1) aliphatic conjugated systems, 3) heterocyclic conjugated systems, and 4) heteroatom-containing conjugated systems can be particularly preferably used. Specific examples thereof include polyacetylene and derivatives thereof, polypyrrole and derivatives thereof.
  • Polythiophene and its derivatives, polyisothianaphthene and its derivatives, polyaniline and its derivatives can be mentioned, but the present invention is not limited to these.
  • a conjugated conductive polymer expresses excellent conductivity by doping with a dopant.
  • the dopant used in the present invention is not particularly limited, and examples thereof include the following.
  • Halogen molecule e.g., C l 2, B r 2 , I 2, IC 1 2, IC 13, IB r, IF , etc.
  • Lewis acids e.g., PF 5, As F 5, S b F 5, BF 3, BC 1 3, BB, etc.
  • the method of doping the dopant is not particularly limited, but a method of polymerizing a conjugated conductive polymer in the presence of the dopant is generally used.
  • the antistatic layer is applied simultaneously with the step of forming a module support of the IC module.
  • “coating at the same time as the film forming step of the module support” means that the antistatic layer is coated before winding once in the film forming step of the module support.
  • a coating liquid for forming an antistatic layer is applied to the polyester film before the completion of the oriented crystallization, and then stretched and heat-treated in at least one direction. Coating the antistatic layer at the same time as the film forming process of the module support of the IC module not only increases the production efficiency but also strengthens the adhesion of the antistatic layer to the module support.
  • the module support having an antistatic layer preferably has a surface specific resistance of at least one side of not more than 1E + 11 ⁇ at 23 ° C20% RH, more preferably 1E at 23 ° C20% RH. + 10 ⁇ or less.
  • the antistatic layer may contain a binder.
  • the binder is not particularly limited, and can be selected according to the adhesiveness to the module support, the physical properties of the antistatic layer, and the like.
  • an aqueous polymer is preferred.
  • a curing agent may be used together with these binders.
  • the thickness of the antistatic layer is preferably not less than 0.0001 ⁇ and not more than 3 am, more preferably not less than 0.001 ⁇ m and not more than 2.5 / im.
  • the adhesive is not particularly limited, but the adhesive of the present invention is preferably a reactive hot melt adhesive.
  • the reactive hot menoleto adhesive has a solid property at room temperature, is melted by heating, is bonded, and then cures itself.
  • the bonding is performed at 80 ° C. or lower, more preferably 10 to 80 ° C., and further preferably 20 to 80 ° C.
  • the reactive hot melt adhesive is excellent in such low-temperature bonding.
  • a reactive hot melt adhesive a moisture-curable material is disclosed in JP-A-2000-036026, JP-A-2000-219855, JP-A-2000- 211278, and Japanese Patent Application No. 2000-369855.
  • JP-A-10-316959, JP-A-11-5964 and the like are disclosed as photocurable adhesives.
  • a reactive moisture-curing adhesive there is an adhesive whose main component is a urethane polymer containing an isocyanate group at a molecular end, and the isocyanate group reacts with moisture to form a crosslinked structure.
  • Examples of reactive adhesives that can be used in the present invention include TE03 ⁇ manufactured by Sumitomo 3LEM. PT / JP2004 / 018335
  • the viscosity of the adhesive of the present invention is preferably from 3000 to 20000 mPa ⁇ s at 120 ° C.
  • the intensity can be measured by a usual method. When measuring with a BM type viscometer, the above range is obtained under the conditions of rotor No. 4 and rotation speed of 12 rpm.
  • the thickness of the adhesive is preferably from 10 to 500 ⁇ , more preferably from 10 to 450 ⁇ m, in terms of the total thickness of the adhesive in the IC card.
  • an adhesive is first applied to the front and back sheets with an applicator to a predetermined thickness.
  • a coating method a usual method such as a roller method, a T-die method, and a dice method is used.
  • a method of intermittently providing an opening in the T-die slit but the method is not limited to this.
  • a method of making the surface of the adhesive of the present invention uneven there is a method in which the surface of the adhesive applied by the above method is subjected to pressure treatment with an embossinda roll.
  • the applied adhesive Before mounting, the applied adhesive may be heated in advance by a heater or the like. Then, press the IC module mounted between the upper and lower sheets with a press heated to the bonding temperature of the adhesive for a predetermined time, or Alternatively, instead of rolling with a press, the sheet may be rolled while being conveyed in a constant temperature layer at a predetermined temperature. Also, vacuum pressing may be performed to prevent air bubbles from entering during bonding. After laminating with a press or the like, it is punched into a predetermined shape and cut into cards to make cards. When a reactive adhesive is used as the adhesive, it is cured for a predetermined time and then cut into cards.
  • polyester resins such as polyethylene terephthalate, polybutylene terephthalate, polyethylene terephthalate Z-isophthalate copolymer, and polyolefin resins such as polyethylene, polypropylene, and polymethylpentene.
  • the thickness of the support of the present invention is 30 to 300 ⁇ , preferably 50 to 200 m.
  • the bonding process is reduced in view of shrinkage and warpage of the support due to heat.
  • the heat shrinkage of the sheet member at 150 ° C for 30 minutes is preferably 1.2% or less in the longitudinal (MD) and 0.5% or less in the transverse (TD).
  • a heat bonding method, an adhesive bonding method, and an injection molding method are known, but they may be bonded by any method.
  • the two opposing first and second sheet materials may be subjected to format printing or information recording before or after laminating, and offset printing, gravure printing, silk printing, screen printing, intaglio printing It can be formed by any method such as letterpress printing, ink jet method, sublimation transfer method, Kameshi photographic method, and heat melting method.
  • the method of manufacturing an IC card according to the present invention includes a bonding and coating method as disclosed in JP-A-2000-036026, JP-A-2000-2198.55, JP-A-2000- 211278, JP-A-10-316959, and JP-A-11-15964. Is disclosed. Any laminating system, coating system, or the like can be used, and the present invention is not particularly limited. In the method of manufacturing an IC card according to the present invention, it is preferable to process at a low temperature.
  • the temperature at which a predetermined IC module is bonded between two opposing first and second sheet materials is preferably 80 ° C or less, more preferably 0 to 80 ° C, and still more preferably 20 ° C or more.
  • the cooling temperature is 70 ° C.
  • the temperature is preferably 10 to 70 ° C., and more preferably 10 to 60 ° C.
  • the surface smoothness of the base material of the first and second sheet materials, Heating and pressurizing are preferably performed to increase the adhesion between the two sheet materials and the IC module, and it is preferable to manufacture the upper and lower presses, a laminating method, a kyatumble method, and the like.
  • Heating is preferably 10 to 120 ° C, more preferably 30 to 100 ° C.
  • the pressure is preferably 0.1 to 300 kgf Zcm 2 , and more preferably 0:! To 100 kgf / cm 2. If the pressure is higher than this, the IC chip may be damaged.
  • the pressurization time is preferably 0.1 to 180 sec, more preferably 0.1 to 120 sec.If longer, the production efficiency is reduced.
  • the card After leaving the laminated sheet or continuous coated eramy roll formed as a continuous sheet by the adhesive laminating method or the resin injection method for a predetermined time corresponding to the predetermined curing time of the adhesive, the authentication identification image and the bibliographic information are recorded. After that, the card may be formed into a predetermined card size. As a method of forming into a predetermined card size, a punching method, a cutting method, and the like are mainly selected, and an IC card base material can be prepared.
  • the surface resistivity ( ⁇ / port) at 23 ° C and 20% RH was measured at an applied voltage of 100 V with a super insulation resistance meter MODEL-VE-40 (manufactured by Kawaguchi Electric Industry Co., Ltd.). Damage to electronic components due to charging during manufacturing>
  • Adhesion of dust due to electrification at the time of production was judged by evaluating the printability on the IC card.
  • Heat treatment was performed at 210 ° C. to obtain a 38 / m-thick double-sided biaxially stretched polyester film. One side is the A side and the other side is the B side.
  • a mixture of sodium dodecyl diphenyl ether disulfonate and acryl-modified copolymerized polyester resin (Takamatsu Oil & Fats Co., Ltd. SH-416) was used to obtain a total solids content of 4 wt%, and sodium dodecyl diphenyl ether disulfonate Z-acrylic modified copolymer.
  • An aqueous dispersion having a polymer polyester resin ratio of 10Z90 was prepared and applied at 2 g / m 2 (wet).
  • Silver-doped colloidal vanadium pentoxide (US Pat. No. 5,679,505) was dispersed in water together with an aqueous polyurethane dispersion (Daiichi Kogyo Seiyaku Co., Ltd., Superflex 300), and the total solid content was A 10 wt%, silver-doped colloidal pentaoxide / polyurethane / polyurethane aqueous dispersion was prepared at a weight ratio of 10/90, and 2 g / m 2 (wet). Applied. ⁇
  • An aqueous dispersion of antimony-doped tin oxide was mixed with an aqueous polyurethane dispersion (Daiichi Kogyo Seiyaku Co., Ltd., Superflex 300) to give a total solid content of 10 wt%, and an aqueous dispersion of antimony-doped tin oxide / polyurethane at a weight ratio of 65/35.
  • aqueous dispersion of antimony-doped tin oxide / polyurethane was prepared and applied at 2 g / m 2 (wet).
  • Baytronp registered trademark
  • Bayer which is a poly (3,4-ethylenedioxythiophene / polystyrene-snorrephonate)
  • aqueous polyurethane dispersion (Daiichi Kogyo Seiyaku Co., Ltd., Superflexs 300).
  • the mixture was mixed to prepare an aqueous dispersion having a total solid content of 2 wt% and a weight ratio of BaytronP (registered trademark) / polyurethane of 20/80.
  • aqueous dispersion of a polyurethane aqueous dispersion having a solid content of 1% by weight was applied at 2 g / m 2 (wet).
  • An antenna pattern is formed by etching on the B surface of the module support prepared as described above, and an IC chip with a thickness of 70 ⁇ m and 4 x 4 mm square is joined, consisting of 3113304 with a thickness of 100 ⁇ , ⁇ ⁇ 6111111 square.
  • the reinforcing plate was bonded to obtain an IC module.
  • Lumirror E 210 88 ⁇ m manufactured by Toray Industries, Inc. was used as the front and back support of the IC card.
  • a coating liquid for forming the first image-receiving layer, a coating liquid for forming the second image-receiving layer, and a coating liquid for forming the third image-receiving layer, having the following compositions, were applied in this order to the surface of the support 1888 ⁇ m that had been subjected to corona discharge treatment. After drying, the image receiving layer was formed by laminating each layer to have a thickness of 0.2 ⁇ um, 2.5 ⁇ , and 0.5 ⁇ . ⁇ Coating liquid for forming first image receiving layer>
  • the coating liquid for forming the first writing layer, the coating liquid for forming the second writing layer, and the coating liquid for forming the third writing layer having the following composition were applied to the surface of the support backing sheet 188 / zm subjected to the corona discharge treatment.
  • the writing layer was formed by sequentially applying and drying the layers and laminating them so that the respective thicknesses became 5 / ⁇ 1-1-1, 15 im, 0.2 / m. ⁇ Coating liquid for forming first writing layer>
  • Polyester resin [Toyobo Co., Ltd .: Byron 200] 8 parts Isocyanate 1 part [Nippon Polyurethane Industry Co., Ltd .: Coronate HX]
  • Carbon black Trace amount of titanium dioxide particles [CR80, manufactured by Ishihara Sangyo Co., Ltd.] 1 part Methyl ethyl ketone 80 parts Butyl acetate 10 parts ⁇ Coating liquid for forming the second writing layer>
  • polyester resin [Toyobo Co., Ltd .: Vironal MD 1200]
  • FIG. 4 is an enlarged view of an IC card manufacturing apparatus. Subsequently, an IC card manufacturing apparatus as an embodiment will be described.
  • a first sheet material (table sheet) having a long sheet shape and a thickness of 188 / z rn is arranged in a first sheet member supply section ⁇ , and a single sheet material is provided.
  • a second sheet material (back sheet) 3 having a thickness of 188 m is provided in the second sheet member supply section B.
  • the second sheet member supply unit B conveys the second sheet material 3 by sand grip conveyance, and conveys it to the second sheet conveyance member C.
  • the second sheet conveying member C sends the second sheet material 3 to the pressure heating unit D.
  • the adhesive is supplied from the adhesive supplying section E to the second sheet material 3, and the IC module 9 shown in FIG. Place it on sheet material 3.
  • the first sheet material 2 is supplied with an adhesive from an adhesive supply section G, and the first sheet material 2 is sent to a pressure heating section D.
  • the IC card material is sandwiched between the first sheet material 2 and the second sheet material 3 by a heating or pressure roll (pressure 3 kg / cm 2 ), An IC card base material is created.
  • the IC card base material is controlled to a predetermined film thickness by the film thickness control section H, and the adhesive is cooled by the IC card base material cooling member I to be cured and sufficiently adhered to the support. From It is preferable to trim the makeup. With the prepared IC card base material, a 55 mm X 85 mm size IC card base material could be obtained with a rotary cutter.
  • Each of the first sheet member 2 and the second sheet material 3 is coated with a reactive hot-melt adhesive layer IJS 1 to S3 as shown below to a thickness of 16 2 m ', respectively.
  • the IC module was inserted between the front and back supports with the agent, and laminated at 65 ° C for 1 minute.
  • the thickness of the IC card base material thus produced was 760 ⁇ . After the preparation, it was stored for 10 days in an environment of 25 ° C. and 55% RH, and punched by a 55 mm ⁇ 85 mm size card-shaped punching die apparatus.
  • Adhesive S1 Sekisui Chemical Co., Ltd.
  • a personal identification card was prepared by providing a face image, attribute information, and format printing on the IC card that had been subjected to the punching process as described below.
  • the following coating liquid for forming a yellow ink layer, coating liquid for forming a magenta ink layer, and coating liquid for forming a cyan ink layer are formed on a polyethylene terephthalate sheet having a thickness of 6 w'm which has been subjected to a fusion preventing process on the back surface. Were provided so that the thickness of each was 1 ⁇ , and ink sheets of three colors, yellow, magenta, and cyan were obtained.
  • Cyan dye (Compound C-1) 1. Cyan dye (Compound C-1) 1. Polyvinyl acetal 5. [Electrical Chemical Industry Co., Ltd .: Denka Butyral KY
  • Methynorethenoketone 70 parts Toluene 20 parts
  • An ink sheet was obtained by applying a coating liquid for forming an ink layer having the following composition to a 6 / m-thick polyethylene terephthalate sheet that had been subjected to a fusion preventing treatment on the back surface so as to have a thickness of 2 / xm and dried.
  • the ink receiving layer and the ink side of the sublimation type thermal transfer recording ink sheet are overlapped, and the output from the ink sheet side is 0.23 W / dot, pulse width 0.3 to 4.5 msec, dot
  • the output from the ink sheet side is 0.23 W / dot, pulse width 0.3 to 4.5 msec, dot
  • the OP varnish part and the ink 'side of the ink sheet for melt-type thermal transfer recording are overlapped, and the output from the ink sheet side using a thermal head is 0.5 WZ dot, pulse width 1.0 msec, dot density 16 dots / mm
  • the character information was formed on the ⁇ P gas by heating with.
  • An actinic ray-curable transfer foil 1 was prepared by laminating the following composition on a 25 im-thick polyethylene terephthalate film release layer provided with a 0.1 im fluororesin release layer.
  • Polyisocyanate [Coronate HX made by Nippon Polyurethane] 1.5 ⁇ 90 parts of methinoreeth / leketone After application, the curing agent was cured at 50 ° C for 24 hours.
  • an actinic ray-curable transfer foil 1 having the above-mentioned configuration is formed on the image receiving body on which images and characters are recorded Using a heat roller heated to a surface temperature of 200 ° C. and having a rubber hardness of 85 with a diameter of 5 cm, heat was applied at a pressure of 150 kg / cm 2 for 1.2 seconds to perform transfer.
  • An IC module having an antenna and an IC chip is supported by a module support.
  • An IC module is sandwiched between two opposing first and second sheet materials and integrated with an adhesive to form an integrated circuit.
  • the present invention can be applied to an IC card and an IC card manufacturing method capable of preventing damage to electronic components due to electrification, preventing dust from being mixed during manufacturing, and obtaining an IC card having good surface irregularities.
  • the antistatic layer is applied simultaneously with the step of forming the module support, Not only does production efficiency increase, but also the adhesion of the antistatic layer to the module support becomes stronger. ,
  • the surface resistivity of at least one side of the module support is 1 E + 11 ⁇ / port or less at 23 ° C and 20% RH, it can be used in low humidity conditions where static electricity and dust adhesion due to electrification are a problem.
  • the effects of the present invention can be further exerted, and electronic components can be prevented from being damaged due to electrification at the time of manufacturing, dust can be prevented from being mixed at the time of manufacturing, and an IC card having good surface unevenness can be obtained. .
  • the viscosity of the adhesive is 3000 to 20000 mPa's at 120 ° C, and if it is larger than 20000 mPa.s, it is difficult to obtain smoothness at the time of coating or pressing, and the viscosity is higher than 300 OmPa ⁇ s. If it is too small, it will prevent problems such as the adhesive sticking out of the coated sheet during coating and pressing, and the IC module moving without being fixed when the IC module is placed on the adhesive. Can be.

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Abstract

Disclosed is an IC card (1) wherein an IC module (9), which has an antenna (7) and an IC chip (6) and is supported by a module supporting body (8), is interposed between opposing first sheet material (2) and second sheet material (3) and integrated together using adhesives (4, 5). The IC card (1) is characterized by having an antistatic layer (11) on at least one side of the module supporting body (8). With such a constitution, damages to electronic components caused by electrostatic charges as well as mixing of foreign particles into the IC card can be prevented during production. Consequently, there can be obtained an IC card having good surface roughness.

Description

P T/JP2004/018335  P T / JP2004 / 018335
明細書 Specification
I Cカード及び I Cカードの製造方法 技術分野 IC card and method of manufacturing IC card
本発明は、 I Cモジュールを内蔵する I Cカード及ぴ I Cカードの製造方法に関 する。 背景技術  The present invention relates to an IC card having a built-in IC module and a method of manufacturing an IC card. Background art
従来、 身分証明書カード ( I Dカード) ゃクレジットカードなどには、 磁気記録 方式によりデータを記録する磁気カードが広く利用されてきた。 し力 しながら、磁 気カードはデータの書き換えが比較的容易にできるため、データの改ざん防止が十 分でないこと、磁気のため外的な影響を受けやすくデータの保護が十分でないこと、 さらに記録できる容量が少ないなどの問題点があった。そこで、近年 I Cチップを 内蔵した I Cカードが普及し始めている。  Conventionally, magnetic cards that record data using the magnetic recording method have been widely used for identification cards (ID cards) and credit cards. However, magnetic cards allow data to be rewritten relatively easily, preventing data falsification from being sufficiently protected, being magnetically vulnerable to external influences, and ensuring that data is not sufficiently protected. There were problems such as a small capacity. Therefore, in recent years, IC cards with a built-in IC chip have begun to spread.
I Cカードは、表面に設けられた電気接点やカード内部のループアンテナを介し て外部の機器とデータの読み書きをする。 I cカードは磁気カードに比べて記憶容 量が大きくセキュリティ性も大きく向上している。特に、カード内部に I Cチップ と外部との情報のやりとりをするためのアンテナを内蔵しカード外部に電気接点 を持たない非接触式 I Cカードは、電気接点をカード表面にもつ接触式 I Cカード に比べてセキュリティ性が優れ、 I Dカードのようにデータの機密性と偽変造防止 性を髙く要求する用途に使用されつつある。  The IC card reads and writes data from and to external devices via electrical contacts provided on the surface and loop antennas inside the card. The Ic card has a large storage capacity and greatly improved security compared to a magnetic card. In particular, non-contact type IC cards that have an internal antenna for exchanging information between the IC chip and the outside inside the card and do not have electrical contacts outside the card are compared with contact type IC cards that have electrical contacts on the card surface. It is being used for applications requiring high data confidentiality and anti-counterfeiting like ID cards.
このような I Cカードとして、例えば第 1のシート材と第 2のシート材が接着剤 を介して貼り合わされ、その接着剤層中に I Cチップ及ぴアンテナを有する I Cモ ジュールを封入するものがある (例えば、 特開 2 0 0 2— 7 4 2 9 8号公報)。 また、第 1のシート材と第 2のシート材の搬送性、熱による収縮、反りなどによ る I Cカードの搬送性の観点から低温接着剤を用いることが好ましいが、 I Cカー ド作成装置内で発生する帯電により I Cチップの破損が大きな課題となっている。 また、帯電により I Cモジュールにゴミが付着し、そのまま接着剤が塗工される 場合は、ゴミが塗布ムラの原因となり、カード表面の凹凸性が劣化し問題であった。 これに対し、搬送部材と I Cカードの摩擦により帯電を緩和するためにプラスチッ クシ一トと加圧部材との接触面に、界面活性剤を介在させる技術が開示されている (例えば、 特開昭 6 3— 3 0 2 0 9 5号公報)。 As such an IC card, for example, a first sheet material and a second sheet material are bonded with an adhesive. And an IC module having an IC chip and an antenna in the adhesive layer (see, for example, Japanese Patent Application Laid-Open No. 2002-72498). It is preferable to use a low-temperature adhesive from the viewpoint of the transportability of the first sheet material and the second sheet material, the transportability of the IC card due to heat shrinkage, warpage, and the like. IC chip breakage has become a major issue due to the electrification that occurs in the IC. In addition, when dust adheres to the IC module due to electrification and the adhesive is applied as it is, the dust causes uneven application, and the unevenness of the card surface deteriorates, which is a problem. On the other hand, a technology has been disclosed in which a surfactant is interposed on a contact surface between a plastic sheet and a pressing member in order to alleviate electrification due to friction between a conveying member and an IC card (for example, see Japanese Unexamined Patent Application Publication No. No. 63-3030205).
しかし I Cカードの表面に介在させるため帯電防止効果が上がるものの仕上が り I Cカード上に画像等の情報を記録する際に印字性が劣化し問題であった。 発明の開示  However, although the antistatic effect is improved because of being interposed on the surface of the IC card, the printing is deteriorated when information such as an image is recorded on the finished IC card, which is a problem. Disclosure of the invention
この発明は、従来の問題点であった製造時の帯電による電子部品の破損防止を行 うと共に、製造時のゴミの混入を防止し、 しかも表面凹凸性が良好な I Cカードを 得ることができる I Cカード及び I Cカードの製造方法を提供することを目的と している。  The present invention can prevent an electronic component from being damaged by electrification at the time of manufacturing, which is a conventional problem, and can prevent dust from being mixed at the time of manufacturing, and can obtain an IC card having good surface unevenness. It aims to provide IC cards and IC card manufacturing methods.
( 1 ) 上記目的を達成するため、本発明の一実施例は、 アンテナ、 I Cチップを有 する I Cモジュールがモジュール支持体に支持されてなり、前記 I Cモジュールを 対向する 2つの第 1のシート材と第 2のシート材の間に挟み込み接着剤により一 体化した I Cカードにおいて、前記モジュール支持体の少なくとも片面に帯電防止 層を有することを特徴とする I Cカードである。 P T/JP2004/018335 (1) In order to achieve the above object, one embodiment of the present invention provides an IC module having an antenna and an IC chip supported by a module support, and two first sheet members opposing the IC module. An IC card integrated with an adhesive sandwiched between a sheet material and a second sheet material, wherein the IC card has an antistatic layer on at least one surface of the module support. PT / JP2004 / 018335
3  Three
(2) 本発明においては、 前記帯電防止層が、 イオン導電性ポリマー、 コロイド状 金属酸化物ゾル、結晶性金属酸化物粒子、共役系導電性高分子の少なくとも 1っ以 上からなることを特徴とする前記 (1) に記載の I cカードである。 (2) In the present invention, the antistatic layer is characterized by comprising at least one of an ionic conductive polymer, a colloidal metal oxide sol, a crystalline metal oxide particle, and a conjugated conductive polymer. The Ic card according to the above (1).
(3)本発明においては、前記帯電防止層が、前記モジュール支持体の製膜工程と 同時に塗設されることを特徴とする前記 (1) または (2) に記載の I Cカードで ある。 - (3) In the present invention, the IC card according to (1) or (2), wherein the antistatic layer is applied simultaneously with the step of forming the module support. -
(4)本発明においては、前記モジュール支持体の少なくとも片面の表面比抵抗が 23°C20%RHで 1 E + 1 1 ΩΖ口以下であることを特徴とする前記( 1 )乃至(4) In the present invention, the surface specific resistance of at least one surface of the module support is not more than 1 E + 11 ΩΖ at 23 ° C. and 20% RH.
(3) のいずれかに記載の I Cカードである。 An IC card according to any of (3).
(5) 本発明においては、前記接着剤の粘度が、 1 20。Cで 3000〜 20000 mP a . sであることを特徴とする前記 (1) 乃至 (4) のいずれかに記載の I C カードである。  (5) In the present invention, the viscosity of the adhesive is 120. The IC card according to any one of the above (1) to (4), wherein C is 3000 to 20000 mPas.
(6)本発明においては、 前記接着剤が、反応型ホットメルト接着剤であることを 特徴とする前記 (1) 乃至 (4) のいずれかに記載の I Cカードである。  (6) In the present invention, the IC card according to any one of the above (1) to (4), wherein the adhesive is a reactive hot melt adhesive.
(7) また、本発明の一実施例は、 アンテナ、 I Cチップを有する I Cモジュール がモジュール支持体に支持されてなる枚葉形状であり、前記 I Cモジュールを対向 する 2つの第 1のシート材と第 2のシート材の間に挟み込み接着剤により一体化 する I Cカードの製造方法において、前記モジュール支持体の少なくとも片面に帯 電防止層を有することを特徴とする I Cカードの製造方法である。  (7) Further, one embodiment of the present invention is a sheet-like shape in which an IC module having an antenna and an IC chip is supported by a module support, and the IC module is provided with two first sheet members facing each other. A method for manufacturing an IC card, wherein the IC card is sandwiched between second sheet materials and integrated with an adhesive, comprising an antistatic layer on at least one surface of the module support.
(8) 本発明においては、 前記帯電防止層が、 イオン導電性ポリマー、 コロイド状 金属酸化物ゾル、結晶性金属酸化物粒子、共役系導電性高分子の少なくとも 1っ以 上からなることを特徴とする前記 (7) に記載の I Cカードの製造方法である。  (8) In the present invention, the antistatic layer comprises at least one of an ion conductive polymer, a colloidal metal oxide sol, a crystalline metal oxide particle, and a conjugated conductive polymer. (7) The method for manufacturing an IC card according to the above (7).
(9)本発明においては、前記帯電防止層が、前記モジュール支持体の製膜工程と 同時に塗設されることを特徴とする前記 (7) または (8) に記載の I Cカードの 製造方法である。 (9) In the present invention, the antistatic layer comprises a step of forming a film of the module support. The method for producing an IC card according to the above (7) or (8), wherein the method is applied simultaneously.
(10)本発明においては、前記モジュール支持体の少なくとも片面の表面比抵抗 が 23°C20%RHで 1 E+ 1 1 ΩΖ口以下であることを特徴とする前記(7)乃 至 (9) のいずれかに記載の I Cカードの製造方法である。  (10) In the present invention, the surface specific resistance of at least one side of the module support is 1 E + 11 ΩΖ or less at 23 ° C. and 20% RH, and A method for manufacturing the IC card according to any one of the above.
(1 1) 本発明においては、前記接着剤の粘度が、 120 °Cで 3000〜 2000 OmP a · sであることを特徴とする前記 (7) 乃至 (1 0) のいずれかに記載の I Cカードの製造方法である。  (11) In the present invention, the IC according to any of (7) to (10), wherein the viscosity of the adhesive is 3000 to 2000 OmPas at 120 ° C. This is a method for manufacturing a card.
(12)本発明においては、前記接着剤が、反応型ホットメルト接着剤であること を特徴とする前記 (7) 乃至 (1 1) のいずれかに記載の' I Cカードの製造方法で ある。 図面の簡単な説明  (12) In the present invention, the method for producing an IC card according to any one of the above (7) to (11), wherein the adhesive is a reactive hot melt adhesive. Brief Description of Drawings
第 1図は、 本発明の実施例に係る I Cカードの分解斜視図である。 FIG. 1 is an exploded perspective view of an IC card according to an embodiment of the present invention.
第 2図は、 本発明の実施例に係る I Cカードの断面図である。 FIG. 2 is a cross-sectional view of the IC card according to the embodiment of the present invention.
第 3図は、 本発明の実施例に係る I Cカードの平面図である。 FIG. 3 is a plan view of the IC card according to the embodiment of the present invention.
第 4図は、本発明の実施例に係る I Cカードの製造方法を実施する製造装置の拡大 図である。 FIG. 4 is an enlarged view of a manufacturing apparatus for performing the method for manufacturing an IC card according to the embodiment of the present invention.
第 5図は、 本発明の実施例に係る I Cカード中の I Cモジュールを示す図である。 第 6図は、 評価の結果を示す図である。 発明を実施するための最良の形態 FIG. 5 is a diagram showing an IC module in an IC card according to the embodiment of the present invention. FIG. 6 shows the results of the evaluation. BEST MODE FOR CARRYING OUT THE INVENTION
以下、この発明の I Cカード及ぴ I Cカードの製造方法の実施の形態について説 明するが、 この発明は、 この実施の形態に限定されない。 また、 この発明の実施の 形態は、発明の最も好ましい形態を示すものであり、 この発明の用語はこれに限定 されない。 Hereinafter, an embodiment of an IC card and a method of manufacturing an IC card according to the present invention will be described. As will be described, the present invention is not limited to this embodiment. The embodiments of the present invention show the most preferable embodiments of the present invention, and the terms of the present invention are not limited to these.
第 1図は I Cカードの分解斜視図、第 2図は I Cカードの断面図、第 3図は I C カードの平面図である。  FIG. 1 is an exploded perspective view of the IC card, FIG. 2 is a sectional view of the IC card, and FIG. 3 is a plan view of the IC card.
この実施の形態の I Cカード 1は、 I S O規格で厚さが 0 . 7 6 mmに規定され ている。 I Cカード 1は、 2枚のシート材である第 1及び第 2のシート材 2 , 3と、 これら第 1及び第 2のシート材 2 , 3間に介在される接着剤 4 , 5とからなる。 この第 1のシート材 2の接着剤 4を介在しない側の表面には、受像層 6 0が設け られ、また第 2のシート材 3の接着剤 5を介在しない側の表面には、筆記層 6 1を 形成している。  The thickness of the IC card 1 of this embodiment is specified to be 0.76 mm according to the ISO standard. The IC card 1 includes first and second sheet materials 2 and 3 which are two sheet materials, and adhesives 4 and 5 interposed between the first and second sheet materials 2 and 3. . An image receiving layer 60 is provided on the surface of the first sheet material 2 on which the adhesive 4 is not interposed, and a writing layer is provided on the surface of the second sheet material 3 on which the adhesive 5 is not interposed. 6 1 is formed.
受像層 6 0の一例としては、昇華染料ィンクが T P H (サーマルへッド) で加熱 されて熱拡散する時に、染料をトラップして定着させる素材で構成されるものが挙 げられ、 この受像層 6 0には個人識別情報 6 2が設けられ、 この個人識別情報 6 2 は、 例えば従業者証明カードの場合には 「氏名」 の文字、 「発行日」 の文字、 「顔写 真」 の画像情報等である。 この受像層 6 0は、 透明保護層 6 3で保護される。 筆記層 6 1'は、例えばポリエステル樹脂等にシリカ等の白色顔料を分散させたも のを塗工して形成することができる。  An example of the image receiving layer 60 is a layer formed of a material that traps and fixes the dye when the sublimation dye ink is heated by TPH (thermal head) and thermally diffuses. 60 is provided with personal identification information 62. For example, in the case of an employee certification card, the character "name", the character "issue date", and the image of "face photo" are provided. Information. This image receiving layer 60 is protected by the transparent protective layer 63. The writing layer 61 ′ can be formed, for example, by coating a polyester resin or the like with a white pigment such as silica dispersed therein.
接着剤 4, 5内には、 I Cモジュール 9が封入され、 この I Cモジュール 9は、 アンテナ 7、 I Cチップ 6からなる。 この I Cモジュール 9がモジュール支持体 8 に支持されてなる枚葉形状である。このモジュール支持体 8の少なくとも片面に帯 電防止層 1 1を有する。 この帯電防止層 1 1を有するモジュール支持体 8は、少な くとも片面の表面比抵抗が 2 3 °C 2 0 % R Hで 1 E + 1 1 Ω /口以下であること が好ましい。 An IC module 9 is enclosed in the adhesives 4 and 5, and the IC module 9 includes an antenna 7 and an IC chip 6. The IC module 9 has a single-wafer shape supported by a module support 8. The module support 8 has an antistatic layer 11 on at least one surface. The module support 8 having the antistatic layer 11 has a surface resistivity of at least one side of not more than 1 E + 11 Ω / port at 23 ° C and 20% RH. Is preferred.
以下、 この発明について詳細に説明する。  Hereinafter, the present invention will be described in detail.
[ I Cモジュール]  [IC module]
この発明の I Cモジュールとは、当該 I Cカードの利用者の情報を電気的に記憶 する I Cチップ及ぴ I Cチップに接続されたコイル状のアンテナとを有する。 I C チップはメモリのみやそれに加えてマイクロコンピューターなどであり、場合によ りコンデンサーを含んでもよい。 I Cモジュールはアンテナコイルを有するもので あるが、 アンテナパターンを有する場合、 導電性ペースト印刷加工、 或いは銅箔ェ ツチング加工、卷線溶着カ卩ェ等のいずれかの方法を用いてもよい。 I Cチップとァ ンテナパターンとの接合は銀ペースト、銅ペースト、 カーボンペースト等の導電性 接着剤 (日立化成工業の E N— 4 0 0 0シリーズ、東芝ケミカルの X A Pシリーズ 等) や、 異方性導電フィルム (日立化成工業製ァ-ソルム等) を用いる方法、 或い は半田接合、 A C F接合を行う方法が知られているがいずれの方法を用いてもよい。 また、 I Cチップの点圧強度を向上するために I Cチップ近傍に補強板を有するこ とも好ましい。  The IC module according to the present invention includes an IC chip for electrically storing information of a user of the IC card, and a coil-shaped antenna connected to the IC chip. The IC chip is a memory only or a microcomputer in addition to the memory, and may include a capacitor in some cases. The IC module has an antenna coil. When the IC module has an antenna pattern, any method such as conductive paste printing, copper foil etching, or wire welding may be used. The bonding between the IC chip and the antenna pattern is made of conductive adhesives such as silver paste, copper paste, carbon paste, etc. (EN-400 series of Hitachi Chemical Co., Ltd., XAP series of Toshiba Chemical, etc.) or anisotropic conductive A method using a film (e.g., asolum manufactured by Hitachi Chemical Co., Ltd.), or a method of performing solder bonding or ACF bonding is known, but any method may be used. It is also preferable to have a reinforcing plate near the IC chip in order to improve the point pressure strength of the IC chip.
また、 I Cモジュールはモジュール支持体に支持されてなる枚葉形状であり、モ ジュール支持体は特に制限はないが、 ポリエチレンテレフタレート (P E T)、 ポ リエチレンナフタレート (P E N)、 P E T - G (少なくともエチレングリコール、 テレフタル酸及び 1 , 4ーシク口へキサンジメタノールの 3成分を重合した変性ポ リエステノレ樹脂)、 ポリプチレンテレフタレート (P B T)、 ポリカーボネート (P C )、 ポリイミ ド (P 1 )、 アタリロニトリル一ブタジエン一スチレン (A B S ) ポリビニルクロライド (P V C ) 等を用いる。 I Cモジュールは、 最終的に対向 する二つのシート材の間に挟む際、枚葉形状であればよいが、 これは、 初めから枚 葉形状(個片ということ)であっても、 ロール形態から枚葉形状に裁断して使用し てもよい。 The IC module has a single-wafer shape supported by a module support, and the module support is not particularly limited. However, polyethylene terephthalate (PET), polyethylene naphthalate (PEN), PET-G (at least ethylene Modified polyester resin obtained by polymerizing three components of glycol, terephthalic acid and 1,4-six-hexane dimethanol), polybutylene terephthalate (PBT), polycarbonate (PC), polyimide (P 1), atarilonitrile-butadiene Use styrene (ABS) polyvinyl chloride (PVC) or the like. When the IC module is finally sandwiched between two opposing sheet materials, it may have a single-wafer shape. It may be used in the form of a leaf (referred to as an individual piece) or cut from a roll form into a single-sheet form.
従来、個片状の I Cモジュールの場合は、重なっている状態から 1枚剥がす際に 剥離帯電が発生し I Cチップの破損 もたらすという問題があった。また口ール形 態から枚葉形状にする場合も、 ロールを卷きほぐす際、剥離帯電が発生するという 問題があった。本発明は、 この帯電亮生を抑制することにより I Cチップを良好な 状態のまま確保することができる。  Conventionally, in the case of individual IC modules, there has been a problem in that when one of the IC modules is peeled off from the overlapping state, peeling electrification occurs and the IC chip is damaged. Also, in the case where the roll is changed from the wool shape to the single-wafer shape, there is a problem that peeling charging occurs when the roll is unwound. According to the present invention, the IC chip can be kept in a good state by suppressing the charging and regenerating.
モジュール支持体の厚さは 1 0〜 1 00 μ mが好ましく、より好ましくは 20〜 60 である。更に、 I Cモジュールの全厚さは 1 00〜500 / mが好ましく、 より好ましくは 1 50〜450 zmである。  The thickness of the module support is preferably from 10 to 100 μm, and more preferably from 20 to 60. Further, the total thickness of the IC module is preferably from 100 to 500 / m, more preferably from 150 to 450 zm.
[帯電防止層及びその塗設方法]  [Antistatic layer and its coating method]
I Cモジュールのモジュール支持体の少なくとも片面に帯電防止層を有し、帯電 防止層には帯電防止剤或いは導電性素材と言われる導電性を有する素材(以下、帯 電防止剤と記す) を含有する。 帯電防止剤に特に限定はないが、イオン導電性ポリ マー、 コロイド状金属酸化物ゾル、結晶性金属酸化物粒子、共役系導電性高分子の 少なくとも 1つ以上含むことが好ましい。  The module support of the IC module has an antistatic layer on at least one side, and the antistatic layer contains a conductive material called an antistatic agent or a conductive material (hereinafter referred to as an antistatic agent). . The antistatic agent is not particularly limited, but preferably contains at least one of an ionic conductive polymer, a colloidal metal oxide sol, a crystalline metal oxide particle, and a conjugated conductive polymer.
イオン導電性ポリマーは特に限定されず、 ァニオン性、 カチオン性、 両性及ぴノ 二オン性のいずれでも良いが、 その中でも好ましいのは、 ァニオン性、 カチオン性' である。 より好ましいのは、 ァニオン性ではスルホン酸系、 カルボン酸系、 カチォ ン性では、 3級ァミン系、 4級アンモニゥム系のポリマーまたはラテックスである。 これらのイオン導電 1·生ポリマーは、例えば、特公昭 5 2— 2525 1号、特開昭 5 1— 29 9 23号、特公昭 6 0— 48024号記載のァニオン性ポリマーまたは ラテックス、特公昭 5 7— 1 8 1 76号、 同 5 7— 5 6 05 9号、 同 58— 568 5 The ionic conductive polymer is not particularly limited, and may be any of anionic, cationic, amphoteric and nonionic. Among them, anionic and cationic are preferred. More preferred are sulfonic acid-based and carboxylic acid-based polymers or latex-based quaternary ammonium-based polymers or latexes for anionic properties. These ionic conductive monopolymers are described, for example, in the anionic polymer or latex described in JP-B-52-25251, JP-A-51-29923 and JP-B-60-48024. No. 7- 1 8 1 76, No. 5 7- 5 6 05 9, No. 58- 568 Five
8 8
56号、米国特許第 4, 1 18, 231号などに記載のカチオン性ポリマーまたは ラテックスを挙げることができる。 No. 56, U.S. Pat. No. 4,118,231 and the like.
コロイド状金属酸化物ゾルは、例えば特公昭 35-6616号に開示されている ような無定型の酸ィヒ第二錫ゾル、特開昭 55-5982号に記載された無定型の五 酸化バナジウム、特公昭 57- 12979号に開示されているような電解質を有す るアルミナゾルが挙げられる。  Colloidal metal oxide sols include, for example, an amorphous stannic acid sol as disclosed in JP-B-35-6616, and an amorphous vanadium pentoxide described in JP-A-55-5982. And alumina sol having an electrolyte as disclosed in JP-B-57-12979.
結晶性金属酸化物粒子としては、特開昭 56— 143431号に開示されている ような Z n 0、 T i 02、 S n02、 A 1203、 I n23、 S i 02、 M g 0、 B a 0、 Mo03など、 あるいはこれらの複合酸化物が良く、 特に ZnO、 T i 02、 S ηθ 2が好ましい。 また、 金属酸化物に対してドナーを形成する異種原子を少量含む物 は一般的に導電性が高く好ましレ、。異種原子を含む例としては、例えば ZnOに対 しては Al、 I n等の添加、 1^ 02に対しては^^1)、 T a等の添加、 S n〇2に 対しては S b、 Nb、 ハロゲン元素等の添加が効果的である。 これら異種原子の添 加量は 0. 01 m o 1 %〜 30 m o 1 %の範囲が好ましく、 0. 1 m o 1 %〜 1◦ mo 1 %が更に好ましい。 The crystalline metal oxide particles, Z n 0 as disclosed in JP-A-56- 143431, T i 0 2, S n0 2, A 1 2 0 3, I n 2 〇 3, S i 0 2, M g 0, B a 0, Mo0 3 etc., or good composite oxides thereof, in particular ZnO, T i 0 2, S ηθ 2 is preferred. In addition, a substance containing a small amount of a hetero atom forming a donor with respect to a metal oxide generally has high conductivity and is preferred. As an example of containing a heteroatom, ZnO pair and is Al, the addition of such I n, 1 ^ 0 for a 2 ^^ 1), the addition of such T a, for the S N_〇 2 Addition of Sb, Nb, halogen element, etc. is effective. The addition amount of these hetero atoms is preferably in the range of 0.01 mol% to 30 mol%, more preferably 0.1 mol% to 1 mol%.
また、無機又は有機フィラーの表面をこれらの結晶性酸化物で被覆する方法も好 ましく用いることができる。  Further, a method of coating the surface of the inorganic or organic filler with these crystalline oxides can also be preferably used.
共役系導電性高分子とは、炭素原子と炭素原子もしくはへテ口原子とを結合する 二重結合または三重結合が単結合と交互に長く連なつた共役系を分子骨格とした 共役系ポリマーである。 これら共役系ポリマーとしては、 1) 脂肪族共役系:ポリ アセチレンの如き炭素一炭素の共役系が長く連なっているポリマー、 2)芳香族共 役系:ポリ (パラフエ二レン) の如き芳香族炭化水素が長く結合する共役が発達し たポリマー、 3 ) 複素環式共役系:ポリピロール、 ポリチォフェン、 ポリイソチア 4018335 A conjugated conductive polymer is a conjugated polymer with a molecular skeleton consisting of a conjugated system in which a double bond or triple bond that connects a carbon atom to a carbon atom or a heteroatom is alternately long with a single bond. is there. These conjugated polymers include: 1) aliphatic conjugated polymers: polymers in which carbon-carbon conjugated systems such as polyacetylene are continuously extended; 2) aromatic co-polymers: aromatic carbonized materials such as poly (paraphenylene). 3) Heterocyclic conjugated polymer: polypyrrole, polythiophene, polyisothia 4018335
9 ナフテンの如き複素環式ィ匕合物が結合して共役系が発達したポリマー、 4)含へテ 口原子共役系:ポリア-リンの如き脂肪族または芳香族の共役系をへテロ原子で結 合したポリマー、 5) 混合型共役系:ポリ (フエ二レンビ-レン) の如き上記共役 系の構成阜位が交互に結合した構造を持つ共役系ポリマー、 等があげられる。 これらの内、 1) 脂肪族共役系、 3) 複素環式共役系、 4) 含へテロ原子共役系 を特に好ましく用いることができ、その具体例としてポリアセチレン及ぴその誘導 体、 ポリピロール及びその誘導体、 ポリチォフェン及ぴその誘導体、 ポリイソチア ナフテン及びその誘導体、 ポリア二リン及びその誘導体を上げることができるが、 この発明はこれらに限定されるものではない。 9 A polymer in which a heterocyclic compound such as naphthene is bonded to form a conjugated system, and 4) a heteroatom conjugated system: an aliphatic or aromatic conjugated system such as polyaline is heteroatom-containing. 5) Mixed-type conjugated polymers: conjugated polymers having a structure in which the constituent fu positions of the above-mentioned conjugated systems are alternately bonded, such as poly (phenylenevinylene). Of these, 1) aliphatic conjugated systems, 3) heterocyclic conjugated systems, and 4) heteroatom-containing conjugated systems can be particularly preferably used. Specific examples thereof include polyacetylene and derivatives thereof, polypyrrole and derivatives thereof. Polythiophene and its derivatives, polyisothianaphthene and its derivatives, polyaniline and its derivatives can be mentioned, but the present invention is not limited to these.
共役系導電性高分子は、 ドーパントをドーピングすることによって、優れた導電 性を発現させることが一般的である。  In general, a conjugated conductive polymer expresses excellent conductivity by doping with a dopant.
この発明に用いられるドーパントは特に限定されないが、例えば以下のようなも のを挙げることができる。 ハロゲン分子 (例えば、 C l2、 B r2、 I2、 I C 12、 I C 13、 I B r、 I Fなど)、 ルイス酸 (例えば、 P F5、 As F5、 S b F5、 B F 3、 BC 13、 BB r 3、 S03など)、 プロトン酸 (例えば、 HF、 HC 1、 HN03、 H2S04、 HC 104、 F S〇3H、 C 1 S 03H、 CF3S〇3H、 各種有機酸、 アミ ノ酸など)、 遷移金属化合物 (例えば、 F e C l3、 F eOCし T i C l4、 Z r C 14、 H f C 14、 Nb F5、 Nb C 15、 T a C 15、 Mo F5、 Mo C 15、 WFS、 WC 16、 Ln C 13 (Ln = L a、 C e、 P r、 Nd、 Sm等のランタノィド) な ど)、 電解質ァニオン (例えば C I—、 B r -、 I—、 C 1〇4—、 PFS―、 As Fs一、 S b F6―、 BF4—、 CF3S03—、 CF3C02—、 CH3S03一、 CH3C6H5S〇r など)、 ポリマー電解質ァニオン (例えばポリビエル硫酸、 ポリスチレンスノレホン 酸、 ポリ (p—ビニルベンジルスルホン酸)、 ポリアクリル酸、 ポリエチレンスル ホン酸、 ポリビニルスルホン酸、 ポリリン酸、 ポリアスパラギン酸など) 等、 その 他に 02、 XeOF4、 (N02+) (S b F6)、 (N02+) (S b C l 6— )、 (N02 +) (B F4— )、 F S0200 S02F、 Ag C 104、 H2 I r C 16、 La (N〇3) 3 · 6H2 〇などを挙げることができる。 ' ' The dopant used in the present invention is not particularly limited, and examples thereof include the following. Halogen molecule (e.g., C l 2, B r 2 , I 2, IC 1 2, IC 13, IB r, IF , etc.), Lewis acids (e.g., PF 5, As F 5, S b F 5, BF 3, BC 1 3, BB, etc. r 3, S0 3), protonic acid (e.g., HF, HC 1, HN0 3 , H 2 S0 4, HC 10 4, FS_〇 3 H, C 1 S 0 3 H, CF 3 S 〇 3 H, various organic acids, such as amino acids), transition metal compounds (e.g., F e C l 3, F eOC and T i C l 4, Z r C 1 4, H f C 1 4, Nb F 5 , Nb C 1 5, T a C 1 5, Mo F 5, Mo C 1 5, WF S, WC 1 6, Ln C 13 (Ln = L a, C e, P r, Nd, Rantanoido of Sm, etc.) Do etc.), electrolyte Anion (e.g. CI-, B r -, I-, C 1_Rei 4 -, PF S -, As F s one, S b F 6 -, BF 4 -, CF 3 S0 3 -, CF 3 C0 2 -, CH 3 S0 3 one, such as CH 3 C 6 H 5 S_〇_R), polymer electrolytes Anion (e.g. Poribieru sulfate, polystyrene scan Honoré acid, poly (p- vinyl Benzyl sulfonic acid), polyacrylic acid, polyethylene sulf O 2 , XeOF 4 , (N0 2+ ) (S b F 6 ), (N0 2+ ) (S b C l 6 ), etc., such as sulfonic acid, polyvinyl sulfonic acid, polyphosphoric acid, polyaspartic acid, etc. ), (N0 2 +) ( BF 4 -), F S0 2 00 S0 2 F, Ag C 10 4, H 2 I r C 1 6, La ( N_〇 3) 3 · 6H 2 〇 and the like it can. ''
ドーパントをドーピングする方法は特に制限されないが、 ドーパントの存在下で 共役系導電性高分子を重合する方法が一般的である。  The method of doping the dopant is not particularly limited, but a method of polymerizing a conjugated conductive polymer in the presence of the dopant is generally used.
帯電防止層が I Cモジュールのモジュール支持体の製膜工程と同時に塗設され ることが好ましい。 ここで、 モジュール支持体の製膜工程と同時に塗設するとは、 モジュール支持体の製膜工程で一度卷き取る前に帯電防止層を塗設することを言 う。 例えば、 モジュール支持体が 2軸配向ポリエステルフィルムの場合、配向結晶 化完了前のポリエステルフィルムに帯電防止層を形成する塗液を塗布し、 その後、 少なくとも一方向に延伸、熱処理を施す。帯電防止層を I Cモジュールのモジユー ル支持体の製膜工程と同時に塗設することにより、生産効率が上がるばかりでなく 帯電防止層のモジュール支持体への接着が強固になる。  It is preferable that the antistatic layer is applied simultaneously with the step of forming a module support of the IC module. Here, “coating at the same time as the film forming step of the module support” means that the antistatic layer is coated before winding once in the film forming step of the module support. For example, when the module support is a biaxially oriented polyester film, a coating liquid for forming an antistatic layer is applied to the polyester film before the completion of the oriented crystallization, and then stretched and heat-treated in at least one direction. Coating the antistatic layer at the same time as the film forming process of the module support of the IC module not only increases the production efficiency but also strengthens the adhesion of the antistatic layer to the module support.
また、帯電防止層を有するモジュール支持体は、少なくとも片面の表面比抵抗が 23°C20%RHで 1 E+1 1 ΩΖ口以下であることが好ましく、より好ましくは 23°C20%RHで 1 E + 10 ΩΖ口以下である。 これらの値を有すことにより、 静電気そのものや、帯電によるゴミ付着が問題になる低湿度舉件において、 この発 明の効果を発揮することができる。  Further, the module support having an antistatic layer preferably has a surface specific resistance of at least one side of not more than 1E + 11Ω at 23 ° C20% RH, more preferably 1E at 23 ° C20% RH. + 10 Ω or less. By having these values, the effect of the present invention can be exerted in a low humidity kagyu case where static electricity itself or dust adhesion due to electrification is a problem.
帯電防止層にはバインダーを含んでも良い。バインダーは特に限定されず、モジ ユール支持体との接着性や、 帯電防止層の物性等に応じて選択することができる。 特に、帯電防止層を I Cモジュールのモジュール支持体の製膜工程と同時に塗設す る場合、 水性高分子が好ましい。 水性高分子としては、 アクリル樹脂、 スチレン系 樹脂、 ポリエステル系樹脂、 ポリウレタン系樹脂、 ポリビニル系樹脂、塩ィヒビニリ デン、 ポリビュルアルコール、 ポリアミド系樹脂等、 あるいはそれらの各種変性樹 脂など、水に溶解もしくは分散可能で且つ造膜性を持ったあらゆる水性高分子を使 用できる。 また、 これらのバインダーと共に硬化剤も利用しても良い。 帯電防止層 の厚さは好ましくは、 0.0001 μπι以上 3 a m以下であり、より好ましくは 0. O O l ^um以上 2. 5 /im以下である。 The antistatic layer may contain a binder. The binder is not particularly limited, and can be selected according to the adhesiveness to the module support, the physical properties of the antistatic layer, and the like. In particular, when the antistatic layer is applied simultaneously with the step of forming the module support of the IC module, an aqueous polymer is preferred. Acrylic resin, styrene type as the aqueous polymer Resin, polyester resin, polyurethane resin, polyvinyl resin, polyvinylidene chloride, polyvinyl alcohol, polyamide resin, etc., or their modified resins, etc. Any aqueous polymer can be used. A curing agent may be used together with these binders. The thickness of the antistatic layer is preferably not less than 0.0001 μπι and not more than 3 am, more preferably not less than 0.001 μm and not more than 2.5 / im.
[接着剤]  [adhesive]
接着剤に特に制限はないが、 この発明の接着剤は、反応型ホットメルト接着剤で あることが好ましレ、。反応型ホットメノレト接着剤とは、常温では固形を有しており、 加熱により溶融させてから接着加工され、その後、接着剤自身が硬化する性質を有 している。  The adhesive is not particularly limited, but the adhesive of the present invention is preferably a reactive hot melt adhesive. The reactive hot menoleto adhesive has a solid property at room temperature, is melted by heating, is bonded, and then cures itself.
この発明においては、 I Cカード基体がそりやすいと力、高温で貼り合わせるた めに基材が熱収縮等を起こし寸法及び貼り合わせ時の位置精度が劣化する等の問 題点から接着剤を介して貼り合わせる場合に 80 °C以下で貼り合わせることが好 ましく、 さらには 10〜80°C、 さらに好ましくは 20〜80であることが好まし レ、。反応型ホットメルト接着剤はこのような低温での接着加工に優れている。反応 型ホットメルト接着剤として、 湿気硬化型の材料で特開 2000— 036026、 特開 2000— 219855、特開 2000— 211278、特願 2000-36 9855で開示されている。 光硬化型接着剤として、 特開平 10— 316959、 特開平 11— 5964等が開示されている。 反応型湿気硬化接着剤の 1例として、 分子末端にイソシァネート基含有ウレタンポリマーを主成分とし、このイソシァネ 一ト基が水分と反応して架橋構造を形成するものがある。  In the present invention, if the IC card base is easily warped, the base material is subjected to heat shrinkage or the like due to force and high temperature bonding, and the dimensions and positional accuracy at the time of bonding are deteriorated. When bonding together, it is preferable that the bonding is performed at 80 ° C. or lower, more preferably 10 to 80 ° C., and further preferably 20 to 80 ° C. The reactive hot melt adhesive is excellent in such low-temperature bonding. As a reactive hot melt adhesive, a moisture-curable material is disclosed in JP-A-2000-036026, JP-A-2000-219855, JP-A-2000- 211278, and Japanese Patent Application No. 2000-369855. JP-A-10-316959, JP-A-11-5964 and the like are disclosed as photocurable adhesives. As an example of a reactive moisture-curing adhesive, there is an adhesive whose main component is a urethane polymer containing an isocyanate group at a molecular end, and the isocyanate group reacts with moisture to form a crosslinked structure.
この発明に使用できる反応型接着剤としては、 住友スリーェム社製 TE03◦、 P T/JP2004/018335 Examples of reactive adhesives that can be used in the present invention include TE03◦ manufactured by Sumitomo 3LEM. PT / JP2004 / 018335
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TE 1 00、 日立化成ポリマー社製ハイボン 48 20、カネボウェヌエスシー社製 ポンドマスター 1 70シリーズ, H e n k e 1社製 M a c r o p l a s t QR 34 60、積水化学社製エスダイン 96 3 1等が拳げられる。 また、湿気硬化型接着剤 は素材の安全性から遊離 MD I量が 1. 0 %以下の物を使用することが好ましい。 この発明の接着剤の粘度は、 1 20°Cで 3 000〜 20000 mP a · sである ことが好ましい。 20000mP a * sより大きいと塗工時やプレス時に平滑性が 得にくく、 3 00 OmP a · sより小さいと塗工時やプレス時に接着剤が塗工シー トからはみ出したり、接着剤の上に I Cモ.ジュールを載置した際、 I Cモジュール が固定せずに移動してしまう等の問題がある。 TE100, Hibon 4820 manufactured by Hitachi Chemical Co., Ltd., Pondmaster 170 Series manufactured by Kanebo Wenuss C, Macroplast QR 3460 manufactured by Henke 1, and ESDUINE 9631 manufactured by Sekisui Chemical Co., Ltd. It is preferable to use a moisture-curable adhesive having a free MDI content of 1.0% or less from the viewpoint of material safety. The viscosity of the adhesive of the present invention is preferably from 3000 to 20000 mPa · s at 120 ° C. If it is more than 20000 mPa * s, it is difficult to obtain smoothness during coating or pressing, and if it is less than 300 OmPas, the adhesive will protrude from the coating sheet during coating or pressing, When an IC module is placed, there are problems such as the IC module moving without being fixed.
なお、 ¾度は通常の方法で測定できる。 BM型粘度計で測定する場合、 ローター No 4、 回転数 1 2 r pmの条件で上記範囲である。接着剤の膜厚は、 I Cカード 内の接着剤トータルの厚さで 1 0〜50 0 μπιが好ましくより好ましくは 1 0〜 450〃 mである。  The intensity can be measured by a usual method. When measuring with a BM type viscometer, the above range is obtained under the conditions of rotor No. 4 and rotation speed of 12 rpm. The thickness of the adhesive is preferably from 10 to 500 μπι, more preferably from 10 to 450 μm, in terms of the total thickness of the adhesive in the IC card.
こ-こで接着剤を使用した I Cカードの作製方法の一例を挙げる。 I Cカードの作 製に当たっては、先ず表裏のシートにアプリケーターで接着剤を所定の厚さに塗工 する。 塗工方法としてはローラー方式、 Tダイ方式、 ダイス方式などの通常の方法 が使用される。 この発明でストライプ状に塗工する場合、 Tダイスリットを間欠に 開口部を持たせる等の方法があるが、 これに限られるものではない。 また、 この発 明の接着剤表面を凹凸形状にする方法としては、上記方法により塗工した接着剤表 面をェンボシンダロールで加圧処理する方法がある。接着剤を塗工した上下のシー トの間に I Cモジュールを装着する。装着する前に塗工した接着剤をあらかじめヒ 一ター等で加熱させておいてもよい。その後上下シート間に I Cモジュールを装着 したものを接着剤の貼り合わせ温度に加熱したプレスで所定時間プレスするか、又 はプレスでの圧延の替わりに所定温度の恒温層中でシートを搬送しながらロール で圧延してもよい。又、貼り合わせ時に気泡が入るのを防止するために真空プレス してもよい。 プレス等で貼り合わせた後は所定形状に打ち抜くなり、カード状に断 裁等してカード化する。接着剤に反応型接着剤を用いた場合は所定時間硬化反応さ せた後にカード状に断裁する。 Here is an example of a method for manufacturing an IC card using an adhesive. When manufacturing an IC card, an adhesive is first applied to the front and back sheets with an applicator to a predetermined thickness. As a coating method, a usual method such as a roller method, a T-die method, and a dice method is used. In the case of coating in the form of stripes according to the present invention, there is a method of intermittently providing an opening in the T-die slit, but the method is not limited to this. Further, as a method of making the surface of the adhesive of the present invention uneven, there is a method in which the surface of the adhesive applied by the above method is subjected to pressure treatment with an embossinda roll. Install the IC module between the upper and lower sheets coated with adhesive. Before mounting, the applied adhesive may be heated in advance by a heater or the like. Then, press the IC module mounted between the upper and lower sheets with a press heated to the bonding temperature of the adhesive for a predetermined time, or Alternatively, instead of rolling with a press, the sheet may be rolled while being conveyed in a constant temperature layer at a predetermined temperature. Also, vacuum pressing may be performed to prevent air bubbles from entering during bonding. After laminating with a press or the like, it is punched into a predetermined shape and cut into cards to make cards. When a reactive adhesive is used as the adhesive, it is cured for a predetermined time and then cut into cards.
[ I Cカード基材用シート部材]  [Sheet material for IC card substrate]
第 1及ぴ第 2のシート材に用いるシート部材としては、例えば、 ポリエチレンテ レフタレート、 ポリブチレンテレフタレート、 ポリエチレンテレフタレート Zイソ フタレート共重合体等のポリエステル樹脂、 ポリエチレン、 ポリプロピレン、 ポリ メチルペンテン等のポリオレフイン樹脂、 ポリフッ化ビニル、 ポリフッ化ビニリデ ン、 ポリ 4フッ化工チレン、 エチレン一 4フッ化工チレン.共重合体、 等のポリフッ 化工チレン系樹脂、 ナイロン 6、 ナイロン 6 6等のポリアミ ド、 ポリ塩化ビニル、 塩化ビュル/酢酸ビニル共重合体、エチレン/酢酸ビュル共重合体、エチレン Zビ ニルアルコール共重合体、 ポリビュルアルコニル、 ビニロン等のビニル重合体、 生 分解性脂肪族ポリエステル、 生分解性ポリカーボネート、 生分解性ポリ乳酸、 生分 解性ポリビエルアルコール、生分解性セルロースアセテート、生分解性ポリ力プロ ラクトン等の生分解性樹脂、三酢酸セルロース,セロファン等のセルロース系樹脂、 ポリメタアタリル酸メチル、 ポリメタアタリル酸ェチル、 ポリアタリル酸ェチル、 ポリアクリル酸プチル、 等のアクリル系樹脂、 ポリスチレン、 ポリカーボネート、 ポリアリレート、 ポリイミ ド等の合成樹脂シート、 又は上質紙、 薄葉紙、 ダラシン 紙、硫酸紙等の紙、金属箔等の単層体或いはこれら 2層以上の積層体が挙げられる。 この発明の支持体の厚みは 3 0〜3 0 0 μ πι望ましくは 5 0〜2 0 0 mである。 この発明においては、支持体の熱による収縮、反りなどの観点から接着加工を低 温で行う他にシート部材として 150°C、 30分における熱収縮率が縦(MD) で 1. 2%以下、 横 (TD) で 0. 5%以下が好ましい。 Examples of the sheet member used for the first and second sheet materials include polyester resins such as polyethylene terephthalate, polybutylene terephthalate, polyethylene terephthalate Z-isophthalate copolymer, and polyolefin resins such as polyethylene, polypropylene, and polymethylpentene. , Polyvinyl fluoride, polyvinylidene fluoride, polytetrafluoroethylene, ethylenetetrafluoroethylene, copolymers, etc.Polyfluoroethylene resins, polyamides such as nylon 6, nylon 66, polyvinyl chloride, Vinyl polymers such as vinyl chloride / vinyl acetate copolymer, ethylene / vinyl acetate copolymer, ethylene Z vinyl alcohol copolymer, polyvinyl alcohol, vinylon, etc., biodegradable aliphatic polyester, biodegradable polycarbonate, Biodegradable poly milk Biodegradable resins such as acid, biodegradable polyvinyl alcohol, biodegradable cellulose acetate, and biodegradable polycaprolactone; cellulosic resins such as cellulose triacetate and cellophane; polymethyl methacrylate, polyethyl methacrylate, polyataryl Acrylic resins such as ethyl, polybutyl acrylate, etc., synthetic resin sheets such as polystyrene, polycarbonate, polyarylate, polyimide, etc., or single-layer paper such as high-quality paper, thin paper, dalacin paper, parchment paper, etc. Or a laminate of two or more of these. The thickness of the support of the present invention is 30 to 300 μπι, preferably 50 to 200 m. In the present invention, the bonding process is reduced in view of shrinkage and warpage of the support due to heat. In addition to the heat treatment, the heat shrinkage of the sheet member at 150 ° C for 30 minutes is preferably 1.2% or less in the longitudinal (MD) and 0.5% or less in the transverse (TD).
[I Cカードの製造方法]  [Method of manufacturing IC card]
この発明の I Cカード製造方式としては、熱貼合法、接着剤貼合法及び射出成形 法が知られているが、 いずれの方法で貼り合わせてもよい。 又、対向する 2つの第 1及ぴ第 2のシート材は、貼り合わせる前後いずれかにフォーマツト印刷又は、情 報記録を行ってもよくオフセット印刷、 グラビア印刷、 シルク印刷、 スクリーン印 刷、 凹版印刷、 凸版印刷、 インクジェシト方式、 昇華転写方式、 亀子写真方式、 熱 溶融方式等のいずれの方式によっても形成することができる。  As the IC card manufacturing method of the present invention, a heat bonding method, an adhesive bonding method, and an injection molding method are known, but they may be bonded by any method. Also, the two opposing first and second sheet materials may be subjected to format printing or information recording before or after laminating, and offset printing, gravure printing, silk printing, screen printing, intaglio printing It can be formed by any method such as letterpress printing, ink jet method, sublimation transfer method, Kameshi photographic method, and heat melting method.
この発明の I Cカードの製造方法は、特開 2000— 036026、特開 200 0— 2198.55、 特開 2000— 211278、特開平 10— 316959、特 開平 11一 5964等のように貼り合わせ、塗設方法が開示されている。いずれの 貼り合わせ方式、 塗設方式等を用いることができ、 この発明には特に制限ない。 この発明の I Cカードの製造方法は、低温で加工することが好ましい。対向する 2つの第 1及ぴ第 2のシート材との間に所定の I Cモジュールを接着させる温度 は、 80°C以下であることが好ましく、 より好ましくは 0〜80°C、更に好ましく は 20° (:〜 80°Cである。 この発明の製造において、貼り合わせ後に第 1及び第 2 のシート材のそり等を低減させるために冷却工程を設けることが好ましい。冷却温 度は 70°C以下であることが好ましく、 より好ましくは一 10〜70°C、更に好ま しくは 10〜60°Cである。貼り合わせ時には、第 1及び第 2のシート材の基材の 表面平滑性、対向する 2つのシート材と I Cモジュールの密着性をあげるために加 熱及び加圧を行うことが好ましく、上下プレス方式、 ラミネート方式、 キヤタビラ 方式等で製造することが好ましい。 更には、 I Cチップの部品の割れを考慮して、 線接触に近く僅かなズレでも無理な曲げ力が加わる口"ラーを避けて平面プレス 型とするのが好ましい。加熱は、 10〜120°Cが好ましくより好ましくは 30〜 100°Cである。 加圧は、 0. 1〜300 k g f Zcm2が好ましく、 より好まし くは 0. :!〜 100 k g f /cm2である。 これより圧が高い場合、 I Cチップが 破損する恐れがある。加熱及び加圧時間は好ましくは、 0. l〜180 s e cより 好ましくは 0. 1〜120 s e cである。 これより時間が長いと製造効率が低下す る。 The method of manufacturing an IC card according to the present invention includes a bonding and coating method as disclosed in JP-A-2000-036026, JP-A-2000-2198.55, JP-A-2000- 211278, JP-A-10-316959, and JP-A-11-15964. Is disclosed. Any laminating system, coating system, or the like can be used, and the present invention is not particularly limited. In the method of manufacturing an IC card according to the present invention, it is preferable to process at a low temperature. The temperature at which a predetermined IC module is bonded between two opposing first and second sheet materials is preferably 80 ° C or less, more preferably 0 to 80 ° C, and still more preferably 20 ° C or more. ° (: up to 80 ° C. In the production of the present invention, it is preferable to provide a cooling step after bonding to reduce the warpage of the first and second sheet materials. The cooling temperature is 70 ° C. The temperature is preferably 10 to 70 ° C., and more preferably 10 to 60 ° C. At the time of laminating, the surface smoothness of the base material of the first and second sheet materials, Heating and pressurizing are preferably performed to increase the adhesion between the two sheet materials and the IC module, and it is preferable to manufacture the upper and lower presses, a laminating method, a kyatabila method, and the like. Considering the crack of It is preferable to use a flat press type so as to avoid an opening which causes excessive bending force even with slight displacement close to line contact. Heating is preferably 10 to 120 ° C, more preferably 30 to 100 ° C. The pressure is preferably 0.1 to 300 kgf Zcm 2 , and more preferably 0:! To 100 kgf / cm 2. If the pressure is higher than this, the IC chip may be damaged. And the pressurization time is preferably 0.1 to 180 sec, more preferably 0.1 to 120 sec.If longer, the production efficiency is reduced.
前記接着剤貼合法や樹脂射出法で連続シートとして形成された貼り合わせた枚 葉シート又は連続塗エラミロールは、接着剤の所定硬化時間に合わせた時間内放置 後、認証識別画像や書誌事項を記録をしても良く、その後所定のカードサイズに成 形しても良い。所定のカードサイズに形成する方法としては打ち抜く方法、断裁す る方法等が主に選択され I Cカード基材を作成するこ ができる。  After leaving the laminated sheet or continuous coated eramy roll formed as a continuous sheet by the adhesive laminating method or the resin injection method for a predetermined time corresponding to the predetermined curing time of the adhesive, the authentication identification image and the bibliographic information are recorded. After that, the card may be formed into a predetermined card size. As a method of forming into a predetermined card size, a punching method, a cutting method, and the like are mainly selected, and an IC card base material can be prepared.
[実施例]  [Example]
以下、実施例を挙げて、 この発明を詳細に説明するが、 この発明の態様はこれに 限定されなしい。 なお、例中の評価は次の方法で測定した。評価の結果を第 6図に 示す。  Hereinafter, the present invention will be described in detail with reference to examples, but embodiments of the present invention are not limited thereto. The evaluation in the examples was measured by the following method. Figure 6 shows the results of the evaluation.
<表面比抵抗 >  <Surface resistivity>
超絶縁抵抗計 MODEL— VE— 40 (川口電気工業 (株) 製) にて、 印加電圧 100Vで、 23°C20%RHにおける表面比抵抗値 (Ω /口) を測定した。 く製造時の帯電による電子部品の破損性 >  The surface resistivity (Ω / port) at 23 ° C and 20% RH was measured at an applied voltage of 100 V with a super insulation resistance meter MODEL-VE-40 (manufactured by Kawaguchi Electric Industry Co., Ltd.). Damage to electronic components due to charging during manufacturing>
製造前後で電子部品の破損を R/Mを用いて通信性を評価し判断した。  Electronic components were evaluated for damage before and after manufacturing by using R / M to evaluate communication.
A:通信可能 A: Can communicate
B :通信可能であるが不安定 C:通信不可 B: Communication possible but unstable C: Communication not possible
く製造時の帯電によるゴミ付着 > Dust adhesion due to static electricity during manufacturing>
製造時の帯電によるゴミ付着は、 I Cカードへの印字性を評価し判断した。 Adhesion of dust due to electrification at the time of production was judged by evaluating the printability on the IC card.
A:印字良好 A: Good printing
B :僅かに印字部がかすれていた B: The print part was slightly faint
C:印字部がはっきりかすれていた  C: The printed part was clearly faded
<モジュール支持体の作成 >  <Creation of module support>
固有粘度が 0. 6 5のポリエチレンテレフタレートを 1 70 で 3時間乾燥後 2 After drying polyethylene terephthalate with an intrinsic viscosity of 0.65 at 170 for 3 hours 2
0°Cに維持した回転冷却ドラム上に溶融押し出して未延伸フィルムとし、次に該未 延伸フィルムを機械軸方向に 3. 6倍延伸した後、フィルム両面に以下の各塗液を キスコート法にて塗布した。 引き続き 1 0 5 °Cで横方向に 3. 9倍延伸し、ついでIt is melt extruded onto a rotating cooling drum maintained at 0 ° C to form an unstretched film.Then, the unstretched film is stretched 3.6 times in the machine axis direction. And applied. Continue stretching 3.9 times in the transverse direction at 105 ° C, then
2 1 0°Cで熱処理して厚さ 3 8 / mの両面被覆二軸延伸ポリエステルフィルムを 得た。 一方の面を A面、 もう一方の面を B面とする。 Heat treatment was performed at 210 ° C. to obtain a 38 / m-thick double-sided biaxially stretched polyester film. One side is the A side and the other side is the B side.
•塗液 L (イオン導電性ポリマー)  • Coating liquid L (ion conductive polymer)
ドデシルジフェニルエーテルジスルホン酸ソ一ダとァクリル変性共重合ポリェ ステル樹脂 (高松油脂 (株) SH—4 1 6) を混合して総固形分 4w t%、 ドデシ ルジフエニルエーテルジスルホン酸ソーダ Zァクリル変性共重合体ポリエステル 樹脂比 10Z90の水分散液を作成し、 2 g/m2 (we t) で塗布した。 A mixture of sodium dodecyl diphenyl ether disulfonate and acryl-modified copolymerized polyester resin (Takamatsu Oil & Fats Co., Ltd. SH-416) was used to obtain a total solids content of 4 wt%, and sodium dodecyl diphenyl ether disulfonate Z-acrylic modified copolymer. An aqueous dispersion having a polymer polyester resin ratio of 10Z90 was prepared and applied at 2 g / m 2 (wet).
搴塗液 M (コロイド状金属酸化物ゾル) Shin coating liquid M (colloidal metal oxide sol)
銀をドープしたコロイド状五酸化バナジウム (米国特許第 5, 6 79, 50 5号) をポリウレタン水分散体 (第 1工業製薬 (株) スーパーフレックス 300) ととも に水中に分散し、総固形分 1 0w t%、銀をドープしたコロイド状五酸化パナジゥ ム /ポリウレタン重量比 1 0/9 0の水分散液を作成し、 2 g /m2 (we t) で 塗布した。 · Silver-doped colloidal vanadium pentoxide (US Pat. No. 5,679,505) was dispersed in water together with an aqueous polyurethane dispersion (Daiichi Kogyo Seiyaku Co., Ltd., Superflex 300), and the total solid content was A 10 wt%, silver-doped colloidal pentaoxide / polyurethane / polyurethane aqueous dispersion was prepared at a weight ratio of 10/90, and 2 g / m 2 (wet). Applied. ·
き塗液 N (結晶性金属酸化物) Coating liquid N (crystalline metal oxide)
ァンチモンドープ酸化錫の水分散体をポリウレタン水分散体 (第 1工業製薬 (株) スーパーフレックス 300) に混合し、総固形分 10wt%、 アンチモンドープ酸 化錫/ポリゥレタン重量比 65/35の水分散液を作成し、 2 g /m2 (we t) で塗布した。 An aqueous dispersion of antimony-doped tin oxide was mixed with an aqueous polyurethane dispersion (Daiichi Kogyo Seiyaku Co., Ltd., Superflex 300) to give a total solid content of 10 wt%, and an aqueous dispersion of antimony-doped tin oxide / polyurethane at a weight ratio of 65/35. Was prepared and applied at 2 g / m 2 (wet).
•塗料 O (共役系導電性高分子)  • Paint O (conjugated conductive polymer)
' ポリ 3, 4一エチレンジォキシチォフェン/ポリスチレンスノレホネートである B a y t r o nP (登録商標) (B a y e r) をポリウレタン水分散体 (第 1工業製 薬 (株) スーパーフレツクス 300 ) に混合し、 総固形分 2 w t %、 B a y t r o nP (登録商標) /ポリウレタン重量比 20/80の水分散液を作成し、 4 gZm '' Baytronp (registered trademark) (Bayer), which is a poly (3,4-ethylenedioxythiophene / polystyrene-snorrephonate), is added to an aqueous polyurethane dispersion (Daiichi Kogyo Seiyaku Co., Ltd., Superflexs 300). The mixture was mixed to prepare an aqueous dispersion having a total solid content of 2 wt% and a weight ratio of BaytronP (registered trademark) / polyurethane of 20/80.
2 (we t) で塗布した。 2 (wet) was applied.
秦塗料 P (比較:帯電防止剤を含まない) Hata Paint P (Comparison: without antistatic agent)
固形分 1 Ow t%のポリウレタン水分散体(第 1工業製薬(株) スーパーフレツ タス 300) の水分散液を 2 g/m2 (we t) で塗布した。 An aqueous dispersion of a polyurethane aqueous dispersion having a solid content of 1% by weight (Daiichi Kogyo Seiyaku Co., Ltd., Superfretas 300) was applied at 2 g / m 2 (wet).
以上のように作成したモジュール支持体の B面にエッチングによりアンテナパ ターンを形成し、厚み 70 ^m, 4 X 4mm角の I Cチップを接合し、厚み 100 μ χη, δ Χ 6111111角の3113304からなる補強板を接着して I Cモジュールを得 た。  An antenna pattern is formed by etching on the B surface of the module support prepared as described above, and an IC chip with a thickness of 70 ^ m and 4 x 4 mm square is joined, consisting of 3113304 with a thickness of 100 μχη, δ Χ 6111111 square. The reinforcing plate was bonded to obtain an IC module.
第 6図の表に示される結果から明らかなように、モジュール支持体が本発明の表 面比抵抗を満たす場合、 電子部品の破損や印字がすれが発生しない。 一方、表面比 抵抗が、本発明の範囲以上になると、電子部品の破損や凹凸の影響で印字かすれが 生じる。 く I Cカードの作成 > As is evident from the results shown in the table of FIG. 6, when the module support satisfies the surface resistivity of the present invention, no breakage of electronic components or blurring of printing occurs. On the other hand, if the surface resistivity exceeds the range of the present invention, the printed parts will be blurred due to the damage or unevenness of the electronic components. Creating an IC card>
I Cカードの表面及び裏面支持体として、東レ株式会社製ルミラー E 2 0 1 8 8 μ mを使用した。  Lumirror E 210 88 μm manufactured by Toray Industries, Inc. was used as the front and back support of the IC card.
(表面支持体の作成) ,  (Creation of surface support),
支持体 1 8 8 μ mにコロナ放電処理した面に下記組成の第 1受像層形成用塗工 液、第 2受像層形成用塗工液及び第 3受像層形成用塗工液をこの順に塗布乾燥して、 それぞれの厚みが 0. 2 ^um、 2. 5 μ πι、 0. 5 μ πιになる様に積層することに より受像層を形成した。 〈第 1受像層形成用塗工液〉  A coating liquid for forming the first image-receiving layer, a coating liquid for forming the second image-receiving layer, and a coating liquid for forming the third image-receiving layer, having the following compositions, were applied in this order to the surface of the support 1888 μm that had been subjected to corona discharge treatment. After drying, the image receiving layer was formed by laminating each layer to have a thickness of 0.2 μum, 2.5 μπι, and 0.5 μπι. <Coating liquid for forming first image receiving layer>
ポリビエルプチラール榭脂  Polybier Petilal resin
〔積水化学工業 (株) 製:エスレック B L— 1〕 9部 イソシァネート 〔日本ポリウレタン工業 (株) 製: コロネート ΗΧ〕 1部 メチルェチルケトン 8 0部 酢酸プチル 1 0部 〈第 2受像層形成用塗工液〉  [Sekisui Chemical Co., Ltd .: Eslec BL-1] 9 parts Isocyanate [Nippon Polyurethane Industry Co., Ltd .: Coronate ΗΧ] 1 part Methyl ethyl ketone 80 parts Butyl acetate 10 parts <For forming the second image receiving layer Coating liquid>
ポリビニルプチラール樹脂  Polyvinyl butyral resin
〔積水化学工業 (株) 製:エスレック ΒΧ— 1〕 ' 6部 金属イオン含有化合物 (化合物 MS) 4部 メチルェチノレケトン 8 0部 酢酸プチル 1 0部 [Sekisui Chemical Co., Ltd .: Esrec II-1] '6 parts Metal ion-containing compound (Compound MS) 4 parts Methylethynoleketone 80 parts Butyl acetate 10 parts
〈第 3受像層形成用塗工液〉 <Coating liquid for forming third image receiving layer>
ポリエチレンワックス 2部 2 parts of polyethylene wax
〔東邦化学工業 (株) 製:ハイテック E 1 0 0 0〕 [Toho Chemical Industry Co., Ltd .: Hitec E100]
ウレタン変性ェチレンアタリル酸共重合体 8部 〔東邦化学工業 (株) 製:ハイテック S 6254〕 8 parts of urethane-modified ethylenic allylic acid copolymer [Toho Chemical Industry Co., Ltd .: Hitec S 6254]
メチルセルロース 〔信越化学工業 (株) 製: SM15〕 0. 1部 水 .. 90部 Methylcellulose [Shin-Etsu Chemical Co., Ltd .: SM15] 0.1 parts Water 90 parts
(フォーマツト印刷) (Format printing)
' 樹脂凸版印刷法により、 ロゴと OPニスを順次印刷した。 'Logo and OP varnish were sequentially printed by resin letterpress printing.
(裏面支持体の作成) (筆記層の作成)  (Create backside support) (Create writing layer)
前記支持体裏シート 1 88 /z mにコロナ放電処理した面に下記組成の第 1筆記 層形成用塗工液、第 2筆記層形成用塗工液及び第 3筆記層形成用塗工液をこの順に 塗布乾燥して、 それぞれの厚みが 5 /^1?1、 1 5 im, 0. 2 / mになる様に積層す ることにより筆記層を形成した。 〈第 1筆記層形成用塗工液〉  The coating liquid for forming the first writing layer, the coating liquid for forming the second writing layer, and the coating liquid for forming the third writing layer having the following composition were applied to the surface of the support backing sheet 188 / zm subjected to the corona discharge treatment. The writing layer was formed by sequentially applying and drying the layers and laminating them so that the respective thicknesses became 5 / ^ 1-1-1, 15 im, 0.2 / m. <Coating liquid for forming first writing layer>
ポリエステル樹脂 〔東洋紡績 (株) 製:バイロン 200〕 8部 イソシァネート 1部 〔日本ポリウレタン工業 (株) 製: コロネート HX〕  Polyester resin [Toyobo Co., Ltd .: Byron 200] 8 parts Isocyanate 1 part [Nippon Polyurethane Industry Co., Ltd .: Coronate HX]
カーボンブラック 微量 二酸化チタン粒子 〔石原産業 (株) 製: CR80〕 . 1部 メチルェチルケトン 80部 酢酸ブチル 10部 〈第 2筆記層形成用塗工液〉  Carbon black Trace amount of titanium dioxide particles [CR80, manufactured by Ishihara Sangyo Co., Ltd.] 1 part Methyl ethyl ketone 80 parts Butyl acetate 10 parts <Coating liquid for forming the second writing layer>
ポリエステル樹脂 4部 〔東洋紡績 (株) 製:バイロナール MD 1 200〕  4 parts of polyester resin [Toyobo Co., Ltd .: Vironal MD 1200]
シリカ 5部 二酸化チタン粒子 〔石原産業 (株) 製: CR80〕 1部 水 90部 〈第 3筆記層形成用塗工液〉 Silica 5 parts Titanium dioxide particles [Ishihara Sangyo Co., Ltd .: CR80] 1 part Water 90 parts <Coating liquid for forming the third writing layer>
ポリアミド樹脂 〔三和化学工業 (株) 製—:サンマイド 5 5〕 5部 メタノール 9 5部 く I Cカード用基材の作成 >  Polyamide resin [manufactured by Sanwa Chemical Industry Co., Ltd .: Sunmide 55] 5 parts Methanol 95 5 parts Preparation of base material for IC card>
第 4図の I Cカード製造装置を使用し、第 1のシート材、第 2のシート材として 裏面支持体、表面支持体を使用した。第 4図は I Cカード製造装置の拡大図である。 続いて、 実施形態としての I Cカード製造装置について説明をする。  The IC card manufacturing apparatus shown in FIG. 4 was used, and a back support and a front support were used as the first sheet material and the second sheet material. FIG. 4 is an enlarged view of an IC card manufacturing apparatus. Subsequently, an IC card manufacturing apparatus as an embodiment will be described.
この I Cカード製造装置は、 長尺シート状で厚さ 1 8 8 /z rnの第 1のシート材 (表シ一ト) ·2が第 1シート部材供給部 Αに配備され、枚葉シートで厚さ 1 8 8 mの第 2のシート材(裏シ一ト) 3が第 2シート部材供給部 Bに配備される。 第 2 シート部材供給部 Bは、サンドグリツプ搬送で第 2のシート材 3を搬送し、第 2シ 一ト搬送部材 Cに搬送する。第 2シート搬送部材 Cは、第 2のシート材 3を加圧加 熱部 Dに送る。  In this IC card manufacturing apparatus, a first sheet material (table sheet) having a long sheet shape and a thickness of 188 / z rn is arranged in a first sheet member supply section 、, and a single sheet material is provided. A second sheet material (back sheet) 3 having a thickness of 188 m is provided in the second sheet member supply section B. The second sheet member supply unit B conveys the second sheet material 3 by sand grip conveyance, and conveys it to the second sheet conveyance member C. The second sheet conveying member C sends the second sheet material 3 to the pressure heating unit D.
第 2シート搬送部材 Cの搬送時に、第 2のシート材 3に接着剤供給部 Eから接着 剤を供給し、第 5図.に示す I Cモジュール 9を I C固定部材供給部 Fから第 2のシ ート材 3に配置する。  When the second sheet conveying member C is conveyed, the adhesive is supplied from the adhesive supplying section E to the second sheet material 3, and the IC module 9 shown in FIG. Place it on sheet material 3.
第 1のシート材 2には、接着剤供給部 Gから接着剤を供給し、 この第 1のシート 材 2は加圧加熱部 Dに送られる。  The first sheet material 2 is supplied with an adhesive from an adhesive supply section G, and the first sheet material 2 is sent to a pressure heating section D.
加圧加熱部 Dでは、 加熱又は加圧ロール (圧力 3 k g / c m2) により第 1のシ ート材 2と第 2のシート材 3との間に I Cカード用材料を挟んで貼り合わされ、 I Cカード基材原版が作成される。 In the pressure heating section D, the IC card material is sandwiched between the first sheet material 2 and the second sheet material 3 by a heating or pressure roll (pressure 3 kg / cm 2 ), An IC card base material is created.
この I Cカード基材原版は、膜厚制御部 Hで所定の膜厚に制御され、 I Cカード 基材冷却部材 Iで接着剤を冷却して硬化、支持体との密着性が十分に行われてから 化粧断裁することが好ましい。作成された I Cカード基材原版はロータリーカツタ 一により 5 5mmX 8 5 mmサイズの I Cカード基材を得ることができた。 The IC card base material is controlled to a predetermined film thickness by the film thickness control section H, and the adhesive is cooled by the IC card base material cooling member I to be cured and sufficiently adhered to the support. From It is preferable to trim the makeup. With the prepared IC card base material, a 55 mm X 85 mm size IC card base material could be obtained with a rotary cutter.
それぞれの第 1のシート部材 2と第 2のシート材 3には、以下に示す反応型ホッ トメルト接着斉 IJS 1〜S 3を厚みがそれぞれ 1 6 2 m'になるように塗工し、接着 剤付き表裏支持体の間に I Cモジュールを入れ、 6 5 °C 1分間ラミネートした。 こ のようにして作成した I Cカード用基材の厚みは 76 0 μιηであった。作成後は 2 5°C5 5%RHの環境下で 1 0日間保存し、 5 5mmX 8 5 mmサイズのカード形 状打ち抜き金型装置によって打ち抜き加工した。  Each of the first sheet member 2 and the second sheet material 3 is coated with a reactive hot-melt adhesive layer IJS 1 to S3 as shown below to a thickness of 16 2 m ', respectively. The IC module was inserted between the front and back supports with the agent, and laminated at 65 ° C for 1 minute. The thickness of the IC card base material thus produced was 760 μιη. After the preparation, it was stored for 10 days in an environment of 25 ° C. and 55% RH, and punched by a 55 mm × 85 mm size card-shaped punching die apparatus.
接着剤 S 1 :積水化学工業 (株) 製  Adhesive S1: Sekisui Chemical Co., Ltd.
エスダイン 9 6 3 1 S 1 20°C溶融粘度 460 OmP a · s 接着剤 S 2 :積水化学工業 (株) 製  Esdine 9 6 3 1 S 1 20 ° C melt viscosity 460 OmPas adhesive S 2: Sekisui Chemical Co., Ltd.
エスダイン 96 1 1 1 20 °C溶融粘度 1 900 OmP a · s 接着剤 S 3 :積水化学工業 (株) 製  Esdine 96 1 1 1 20 ° C Melt viscosity 1 900 OmPas adhesive S 3: Sekisui Chemical Co., Ltd.
エスダイン 96 1 3A 1 20 °C溶融粘度 2500 OmP a · s く個人認証用カードへの個人情報記載方法及び表面保護方法 >  Esdine 96 1 3A 1 20 ° C Melt viscosity 2500 OmP a · s Method for describing personal information on personal authentication card and surface protection method>
前記打ち抜き加工を施した I Cカードに下記により顔画像と属性情報とフォー マット印刷を設けた個人認証力ードの作成を行つた。  A personal identification card was prepared by providing a face image, attribute information, and format printing on the IC card that had been subjected to the punching process as described below.
(昇華型感熱転写記録用のインクシートの作成)  (Preparation of ink sheet for sublimation type thermal transfer recording)
裏面に融着防止加工した厚さ 6 w'mのポリエチレンテレフタレートシートに下 記糸且成のイェローインク層形成用塗工液、マゼンダインク層形成用塗工液、 シアン インク層形成用塗工液を各々の厚みが 1 μιηになるように設け、イェロー、マゼン ダ、 シァンの 3色のインクシートを得た。  The following coating liquid for forming a yellow ink layer, coating liquid for forming a magenta ink layer, and coating liquid for forming a cyan ink layer are formed on a polyethylene terephthalate sheet having a thickness of 6 w'm which has been subjected to a fusion preventing process on the back surface. Were provided so that the thickness of each was 1 μιη, and ink sheets of three colors, yellow, magenta, and cyan were obtained.
〈イェローインク層形成用塗工液〉 イェロー染料 (化合物 Y_l) <Coating liquid for forming yellow ink layer> Yellow dye (compound Y_l)
ポリビュルァセタール 5 〔電気化学工業 (株) 製:デンカプチラール ΚΥ— 24〕  Polybulacetal 5 [manufactured by Denki Kagaku Kogyo Co., Ltd .: Dencaptiral ΚΥ—24]
ポリメチルメタアタリレート変性ポリスチレン  Polymethyl methacrylate-modified polystyrene
〔東亜合成化学工業 (株) 製: レデダ G Ρ— 200〕 [Toa Gosei Chemical Industry Co., Ltd .: Rededa G II-200]
ウレタン変性シリコンオイノレ 0. 〔大日精化工業 (株) 製:ダイァロマー SP— 2105〕  Urethane-modified silicon oil 0. [Dainichi Seika Industry Co., Ltd .: DIALOMAR SP-2105]
メチルェチルケトン 7 トルエン 2 〈マゼンダインク層形成用塗工液〉  Methyl ethyl ketone 7 Toluene 2 <Magenta ink layer forming coating liquid>
マゼンダ染料 (化合物 Μ— 1)  Magenta dye (Compound II-1)
ポリビ二/レアセターノレ 5 · 〔電気化学工業 (株) 製:デンカプチラール ΚΥ— 24〕  Polyvinyl / Rare Setanol 5 · [Dencaptiral ΚΥ-24 manufactured by Denki Kagaku Kogyo Co., Ltd.]
ポリメチルメタァクリ レート変性ポリスチレン  Polymethyl methacrylate modified polystyrene
〔東亜合成化学工業 (株) 製: レデダ G Ρ— 200〕 [Toa Gosei Chemical Industry Co., Ltd .: Rededa G II-200]
ウレタン変性シリコンオイル 0 〔大日精化工業 (株) 製:ダイァロマー SP— 2105〕  Urethane-modified silicone oil 0 [Dainichi Seika Kogyo Co., Ltd .: DIALOMAR SP-2105]
メチ /レエチゾレケトン 7 . トノレェン 2 〈シアンインク層形成用塗工液〉  Met / Reetizole ketone 7. Tonolen 2 <Cyan ink layer forming coating liquid>
シアン染料 (化合物 C一 1) 1. シアン染料 (化合物 C一 2) 1. ポリビニルァセタール 5. 〔電気化学工業 (株) 製:デンカブチラール KY Cyan dye (Compound C-1) 1. Cyan dye (Compound C-1) 1. Polyvinyl acetal 5. [Electrical Chemical Industry Co., Ltd .: Denka Butyral KY
ポリメチルメタァクリレート変性ポリスチレン  Polymethyl methacrylate modified polystyrene
〔東亜合成化学工業 (株) 製: レデダ G P— 2 0 0〕  [Toa Gosei Chemical Industry Co., Ltd .: Rededa GP—200]
ウレタン変性シリコンオイノレ 0 . 5部 0.5 parts of urethane-modified silicon oil
〔大日精化工業 (株) 製:ダイァロマー S P— 2 1 0 5〕 [Dainichi Seika Kogyo Co., Ltd .: DIALOMAR SP—210]
メチノレエテノレケトン 7 0部 トルエン 2 0部 Methynorethenoketone 70 parts Toluene 20 parts
(溶融型感熱転写記録用のィンクシートの作成) (Preparation of ink sheet for melt-type thermal transfer recording)
裏面に融着防止加工した厚さ 6 z mのポリエチレンテレフタレートシートに下 記組成のインク層形成用塗工液を厚みが 2 /x mになる様に塗布乾燥してインクシ 一トを得た。  An ink sheet was obtained by applying a coating liquid for forming an ink layer having the following composition to a 6 / m-thick polyethylene terephthalate sheet that had been subjected to a fusion preventing treatment on the back surface so as to have a thickness of 2 / xm and dried.
〈インク層形成用塗工液〉  <Coating liquid for forming ink layer>
カルナバワックス 1部 ェチレン酢酸.ビニル共重合体 1部 〔三井デュポンケミカル社製: E V 4 0 Y〕  Carnauba wax 1 part Ethylene acetic acid vinyl copolymer 1 part [Mitsui DuPont Chemical: EV 40 Y]
カーボンプラック 3部 フユノール樹脂 〔荒川化学工業 (株) 製:タマノル 5 2 1〕 5部 メチノレエチノレケトン 9 0部 Carbon black 3 parts Fuunol resin [Arakawa Chemical Industry Co., Ltd .: Tamanol 5 2 1] 5 parts Methynorethinole ketone 90 parts
(顔画像の形成) (Formation of face image)
受像層と昇華型感熱転写記録用のィンクシートのィンク側を重ね合わせィンク シート側からサーマノレへッドを用いて出力 0 . 2 3 W/ドット、 パルス幅 0 . 3〜 4 . 5 m秒、 ドット密度 1 6 ドット /mmの条件で加熱することにより画像に階調 性のある人物画像を受像層に形成した。この画像においては上記色素と受像層の二 ッケルが錯体を形成している。 The ink receiving layer and the ink side of the sublimation type thermal transfer recording ink sheet are overlapped, and the output from the ink sheet side is 0.23 W / dot, pulse width 0.3 to 4.5 msec, dot By heating under the condition of a density of 16 dots / mm, a human image with gradation was formed on the image receiving layer. In this image, the dye and the image receiving layer Nickel forms a complex.
(文字情報の形成)  (Formation of character information)
O Pニス部と溶融型感熱転写記録用のィンクシートのインク'側を重ね合わせィ ンクシート側からサーマルヘッドを用いて出力 0. 5WZドット、 パルス幅 1. 0 m秒、 ドット密度 16ドット /mmの条件で加熱することにより文字情報を〇 P二 ス上に形成した。  The OP varnish part and the ink 'side of the ink sheet for melt-type thermal transfer recording are overlapped, and the output from the ink sheet side using a thermal head is 0.5 WZ dot, pulse width 1.0 msec, dot density 16 dots / mm The character information was formed on the 〇 P gas by heating with.
[表面保護方法]  [Surface protection method]
(表面保護層形成方法)  (Method of forming surface protective layer)
ぐ活性光線硬化型転写箔 1の作成 > Of actinic ray-curable transfer foil 1>
0.1 imのフッ素樹脂層の離型層を設けた厚み 25 imのポリエチレンテレフ タレ一トフィルムの離型層上に下記組成物を積層し活性光線硬化型転写箔 1の作 成を行った。  An actinic ray-curable transfer foil 1 was prepared by laminating the following composition on a 25 im-thick polyethylene terephthalate film release layer provided with a 0.1 im fluororesin release layer.
(活性光線硬化性化合物)  (Actinic ray curable compound)
新中村化学社製 A— 9300/新中村化学社製  A—9300 manufactured by Shin-Nakamura Chemical Co., Ltd./Manufactured by Shin-Nakamura Chemical Co., Ltd.
EA- 1020 = 35/1 1. 75部 反応開始剤  EA-1020 = 35/1 1.75 parts initiator
ィルガキュア 184日本チバガイキー社製  Irgacure 184 Japan
添加剤不飽和基含有樹脂 48部 その他の添加剤  Additives Unsaturated group-containing resin 48 parts Other additives
大日本ィンキ界面活性剤 F-179 0. 25咅 B Dainippon Ink Surfactant F-179 0.25 咅 B
〈中間層形成塗工液〉 膜厚 1. 0 m <Intermediate layer forming coating liquid> Film thickness 1.0 m
ポリビニルプチラール樹脂  Polyvinyl butyral resin
〔積水化学 (株) 製:エスレック BX— 1〕 3. 5部 タフテックス M- (旭化成) 5部 硬化剤 [Sekisui Chemical Co., Ltd .: Esrec BX-1] 3.5 parts Tuftex M- (Asahi Kasei) 5 parts curing agent
ポリイソシァネート [コロネート HX 日本ポリウレタン製] 1. 5咅 メチノレエチ/レケトン 90部 塗布後硬化剤の硬化は、 50°C、 24時間で行った。  Polyisocyanate [Coronate HX made by Nippon Polyurethane] 1.5 咅 90 parts of methinoreeth / leketone After application, the curing agent was cured at 50 ° C for 24 hours.
〈接着層形成塗工液〉 膜厚 0. δ μιη.  <Adhesive layer forming coating liquid> Thickness 0.δ μιη.
ウレタン変性エチレンェチルァクリ レート共重合体  Urethane-modified ethylene ethyl acrylate copolymer
〔東邦化学工業 (株) 製:ハイテック S 6 2 54 Β〕 8部 ポリアタリル酸エステル共重合体  [Toho Chemical Industry Co., Ltd .: Hitec S6254-II] 8 parts Polyatarylate copolymer
〔日本純薬 (株) 製:ジュリマー AT 5 1 0〕 2部 水 45部 エタノ一/レ 45部 さらに画像、文字が記録された前記受像体上に前記構成からなる活性光線硬化型 転写箔 1を用いて表面温度 200°Cに加熱した、直径 5 cmゴム硬度 8 5のヒート ローラーを用いて圧力 1 50 k g/cm2で 1. 2秒間熱をかけて転写を行なった。 産業上の利用可能性 [Manufactured by Nippon Junyaku Co., Ltd .: Jurimar AT510] 2 parts Water 45 parts Etanol / Le 45 parts Further, an actinic ray-curable transfer foil 1 having the above-mentioned configuration is formed on the image receiving body on which images and characters are recorded Using a heat roller heated to a surface temperature of 200 ° C. and having a rubber hardness of 85 with a diameter of 5 cm, heat was applied at a pressure of 150 kg / cm 2 for 1.2 seconds to perform transfer. Industrial applicability
アンテナ、 I Cチップを有する I Cモジュールがモジュール支持体に支持されて なる I Cモジュールを対向する 2つの第 1のシート材と第 2のシート材の間に挟 み込み接着剤により一体化し、製造時の帯電による電子部品の破損防止を行うと共 に、製造時のゴミの混入を防止し、表面凹凸性が良好な I Cカードを得ることがで きる I Cカード及ぴ I Cカードの製造方法に適用できる。  An IC module having an antenna and an IC chip is supported by a module support. An IC module is sandwiched between two opposing first and second sheet materials and integrated with an adhesive to form an integrated circuit. The present invention can be applied to an IC card and an IC card manufacturing method capable of preventing damage to electronic components due to electrification, preventing dust from being mixed during manufacturing, and obtaining an IC card having good surface irregularities.
また、 帯電防止層が、 モジュール支持体の製膜工程と同時に塗設されることで、 生産効率が上がるばかりでなく帯電防止層のモジュール支持体への接着が強固に なる。 、 In addition, since the antistatic layer is applied simultaneously with the step of forming the module support, Not only does production efficiency increase, but also the adhesion of the antistatic layer to the module support becomes stronger. ,
さらに、モジュール支持体の少なくとも片面の表面比抵抗が 23 °C 20 %RHで 1 E+11 Ω /口以下であることで、静電気そのものや、帯電によるゴミ付着が問 題になる低湿度条件において、 この発明の効果をさらに発揮することができ、製造 時の帯電による電子部品の破損防止を行うと共に、 製造時のゴミの混入を防止し、 表面凹凸性が良好な I Cカードを得ることができる。  Furthermore, since the surface resistivity of at least one side of the module support is 1 E + 11 Ω / port or less at 23 ° C and 20% RH, it can be used in low humidity conditions where static electricity and dust adhesion due to electrification are a problem. In addition, the effects of the present invention can be further exerted, and electronic components can be prevented from being damaged due to electrification at the time of manufacturing, dust can be prevented from being mixed at the time of manufacturing, and an IC card having good surface unevenness can be obtained. .
また、 さらに接着剤の粘度が、 120°Cで 3000〜 20000 mP a ' sであ り、 20000mP a . sより大きいと塗工時やプレス時に平滑性が得にくく、 3 00 OmP a · sより小さいと塗工時やプレス時に接着剤が塗工シートからはみ出 したり、接着剤の上に I Cモジュールを载置した際、 I Cモジュールが固定せずに 移動してしまう等の問題を抑制することができる。  Further, the viscosity of the adhesive is 3000 to 20000 mPa's at 120 ° C, and if it is larger than 20000 mPa.s, it is difficult to obtain smoothness at the time of coating or pressing, and the viscosity is higher than 300 OmPa · s. If it is too small, it will prevent problems such as the adhesive sticking out of the coated sheet during coating and pressing, and the IC module moving without being fixed when the IC module is placed on the adhesive. Can be.

Claims

請求の範囲 The scope of the claims
1. アンテナ、 I Cチップを有する I Cモジュールがモジュール支持体に支持さ れてなり、前記 I Cモジュールを対向する第 1のシート材と第 2のシート材の間に 挟み込み接着剤により一体化した I Cカードにおいて、 1. An IC card in which an IC module having an antenna and an IC chip is supported by a module support, and the IC module is sandwiched between a first sheet material and a second sheet material facing each other and integrated with an adhesive. At
前記モジュール支持体の少なくとも片面に帯電防止層を有することを特徴とす る I Cカード。  An IC card having an antistatic layer on at least one surface of the module support.
2. 前記帯電防止層が、 2. The antistatic layer,
イオン導電性ポリマー、 コロイド状金属酸化物ゾル、結晶性金属酸化物粒子、共 役系導電性高分子の少なくとも 1つ以上からなるこ.とを特徴とする請求の範囲第 1項に記載の I Cカード。  The IC according to claim 1, comprising at least one of an ion conductive polymer, a colloidal metal oxide sol, a crystalline metal oxide particle, and a shared conductive polymer. card.
3. 前記帯電防止層が、 3. The antistatic layer,
前記モジュール支持体の製膜工程と同時に塗設されることを特徴とする請求の 範囲第 1項に記載の I Cカード。  2. The IC card according to claim 1, wherein the IC card is applied simultaneously with the step of forming a film of the module support.
4. 前記モジュール支持体の少なくとも片面の表面比抵抗が 2 3 °C 20 % R Hで 1 E+ 1 1 Ω /口以下であることを特徴とする請求の範囲第 1項に記載の I C力 一ド。 4. The IC head according to claim 1, wherein the surface resistivity of at least one side of the module support is 1 E + 11 Ω / port at 23 ° C. and 20% RH. .
5. 前記接着剤の粘度が、 1 20。 で 3000〜20000mP a · sであるこ とを特徴とする請求の範囲第 1項に記載の I Cカード。 5. The viscosity of the adhesive is 120. 2. The IC card according to claim 1, wherein the pressure is 3000 to 20000 mPa · s.
6 . 前記接着剤が、 6. The adhesive is
反応型ホットメルト接着剤であることを特徴とする請求の範囲第 1項に記載の I Cカード。  2. The IC card according to claim 1, wherein the IC card is a reactive hot melt adhesive.
7 . アンテナ、 I Cチップを有する I Cモジュールがモジュール支持体に支持さ れてなる枚葉形状であり、前記 I Cモジュールを対向する第 1のシート材と第 2の シート材の間に挟み込み接着剤により一体ィヒする Ϊ Cカードの製造方法において、 前記モジュール支持体の少なくとも片面に帯電防止層を有することを特徴とす る I Cカードの製造方法。 7. An IC module having an antenna and an IC chip is a single-wafer shape supported by a module support, and the IC module is sandwiched between a first sheet material and a second sheet material facing each other by an adhesive. A method for manufacturing an IC card, wherein the method for manufacturing a C card comprises an antistatic layer on at least one surface of the module support.
8 . 前記帯電防止層が、 8. The antistatic layer is
イオン導電性ポリマー、 コロイド状金属酸化物ゾル、結晶性金属酸化物粒子、共 役系導電性高分子の少なくとも 1つ以上からなることを特徴とする請求の範囲第 7項に記載の I Cカードの製造方法。  The IC card according to claim 7, comprising at least one of an ion conductive polymer, a colloidal metal oxide sol, a crystalline metal oxide particle, and a conjugating conductive polymer. Production method.
9 . 前記帯電防止層が、 9. The antistatic layer is
前記モジュール支持体の製膜工程と同時に塗設されることを特徴とする請求の 範囲第 7項に記載の I Cカードの製造方法。  The method for producing an IC card according to claim 7, wherein the IC card is applied simultaneously with the step of forming a film of the module support.
·  ·
1 0 . 前記モジュール支持体の少なくとも片面の表面比抵抗が 2 3 °C 2 0 % R H で 1 E + 1 1 ΩΖ口以下であることを特徴とする請求の範囲第 7項に記載の I C カードの製造方法。 10. The IC card according to claim 7, wherein the surface resistivity of at least one surface of the module support is not more than 1E + 11ΩΩ at 23 ° C. and 20% RH. Manufacturing method.
1 1. 前記接着剤の粘度が、 120 °Cで 3000〜20000mP a · sである ことを特徴とする請求の範囲第 7項に記載の I Cカードの製造方法。 11. The method for producing an IC card according to claim 7, wherein the viscosity of the adhesive is 3000 to 20000 mPa · s at 120 ° C.
12. 前記接着剤が、 12. The adhesive is
反応型ホットメルト接着剤であることを特徴とする請求の範囲第 7項に記載の I Cカードの製造方法。  8. The method for producing an IC card according to claim 7, which is a reactive hot melt adhesive.
PCT/JP2004/018335 2003-12-15 2004-12-02 Ic card and method for manufacturing ic card WO2005057484A1 (en)

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