WO2004079496A3 - Systeme pour fabriquer des circuits electriques au moyen d'un support de debit de liquide - Google Patents
Systeme pour fabriquer des circuits electriques au moyen d'un support de debit de liquide Download PDFInfo
- Publication number
- WO2004079496A3 WO2004079496A3 PCT/IL2004/000201 IL2004000201W WO2004079496A3 WO 2004079496 A3 WO2004079496 A3 WO 2004079496A3 IL 2004000201 W IL2004000201 W IL 2004000201W WO 2004079496 A3 WO2004079496 A3 WO 2004079496A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- supporter
- electrical circuits
- fluid flow
- circuits employing
- fabricating electrical
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K13/00—Apparatus or processes specially adapted for manufacturing or adjusting assemblages of electric components
- H05K13/0061—Tools for holding the circuit boards during processing; handling transport of printed circuit boards
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Magnetic Bearings And Hydrostatic Bearings (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Drying Of Solid Materials (AREA)
Abstract
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003055361A JP3995617B2 (ja) | 2003-03-03 | 2003-03-03 | 空気浮上装置 |
JP2003-055361 | 2003-03-03 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2004079496A2 WO2004079496A2 (fr) | 2004-09-16 |
WO2004079496A3 true WO2004079496A3 (fr) | 2006-05-04 |
Family
ID=32958661
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/IL2004/000201 WO2004079496A2 (fr) | 2003-03-03 | 2004-03-02 | Systeme pour fabriquer des circuits electriques au moyen d'un support de debit de liquide |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP3995617B2 (fr) |
TW (1) | TW200505780A (fr) |
WO (1) | WO2004079496A2 (fr) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7908885B2 (en) | 2004-11-08 | 2011-03-22 | New Way Machine Components, Inc. | Non-contact porous air bearing and glass flattening device |
JP4664117B2 (ja) * | 2005-03-03 | 2011-04-06 | 住友重機械工業株式会社 | 搬送物浮上ユニット、搬送物浮上装置、及びステージ装置 |
JP4869612B2 (ja) * | 2005-03-25 | 2012-02-08 | 東京エレクトロン株式会社 | 基板搬送システムおよび基板搬送方法 |
JP4830339B2 (ja) * | 2005-04-27 | 2011-12-07 | 株式会社Ihi | 搬送装置 |
JP4553376B2 (ja) | 2005-07-19 | 2010-09-29 | 東京エレクトロン株式会社 | 浮上式基板搬送処理装置及び浮上式基板搬送処理方法 |
JP4700430B2 (ja) * | 2005-07-26 | 2011-06-15 | シーケーディ株式会社 | 非接触支持装置の検査方法 |
JP4917780B2 (ja) * | 2005-09-08 | 2012-04-18 | 住友化学株式会社 | 露光装置 |
JP4535972B2 (ja) * | 2005-09-09 | 2010-09-01 | 株式会社ブイ・テクノロジー | ワークステージ及び露光装置 |
JP4594241B2 (ja) * | 2006-01-06 | 2010-12-08 | 東京エレクトロン株式会社 | 基板搬送装置、基板搬送方法及びコンピュータプログラム |
JP2007182304A (ja) * | 2006-01-06 | 2007-07-19 | Tokyo Electron Ltd | 基板搬送装置、基板搬送方法及びコンピュータプログラム |
JP2007194508A (ja) * | 2006-01-20 | 2007-08-02 | Tokyo Electron Ltd | 基板搬送装置、基板搬送方法及びコンピュータプログラム |
JP2007283428A (ja) * | 2006-04-14 | 2007-11-01 | Yokogawa Electric Corp | ワーク加工装置およびワーク移送システム |
JP2008140953A (ja) * | 2006-12-01 | 2008-06-19 | Tanken Seal Seiko Co Ltd | 浮上装置 |
JP5221508B2 (ja) * | 2009-12-25 | 2013-06-26 | 東京エレクトロン株式会社 | 基板処理装置 |
JP5485928B2 (ja) * | 2011-03-09 | 2014-05-07 | 東京エレクトロン株式会社 | 基板浮上搬送装置及び基板処理装置 |
JP2014218342A (ja) * | 2013-05-09 | 2014-11-20 | オイレス工業株式会社 | 支持用エアプレートおよびその気体流抵抗器 |
JP2015034078A (ja) * | 2013-08-09 | 2015-02-19 | オイレス工業株式会社 | 支持用エアプレートおよびその気体流抵抗器 |
CN115070493A (zh) * | 2022-07-25 | 2022-09-20 | 南通康弘机械制造有限公司 | 一种数控机床加工用加工接料机构 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3589704A (en) * | 1968-11-12 | 1971-06-29 | Ibm | Holders for irregularly formed integrated circuit devices |
US6590633B1 (en) * | 1997-03-25 | 2003-07-08 | Nikon Corporation | Stage apparatus and method for producing circuit device utilizing the same |
US6625877B1 (en) * | 1998-01-27 | 2003-09-30 | Fuji Machine Mfg. Co., Ltd. | Apparatus for supporting electric-component mounter |
US6666928B2 (en) * | 2001-09-13 | 2003-12-23 | Micell Technologies, Inc. | Methods and apparatus for holding a substrate in a pressure chamber |
US6711797B1 (en) * | 1999-06-21 | 2004-03-30 | Dek International Gmbh | Hydraulic tooling fixture |
-
2003
- 2003-03-03 JP JP2003055361A patent/JP3995617B2/ja not_active Expired - Fee Related
-
2004
- 2004-03-02 WO PCT/IL2004/000201 patent/WO2004079496A2/fr active Application Filing
- 2004-03-03 TW TW093105535A patent/TW200505780A/zh unknown
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3589704A (en) * | 1968-11-12 | 1971-06-29 | Ibm | Holders for irregularly formed integrated circuit devices |
US6590633B1 (en) * | 1997-03-25 | 2003-07-08 | Nikon Corporation | Stage apparatus and method for producing circuit device utilizing the same |
US6625877B1 (en) * | 1998-01-27 | 2003-09-30 | Fuji Machine Mfg. Co., Ltd. | Apparatus for supporting electric-component mounter |
US6711797B1 (en) * | 1999-06-21 | 2004-03-30 | Dek International Gmbh | Hydraulic tooling fixture |
US6666928B2 (en) * | 2001-09-13 | 2003-12-23 | Micell Technologies, Inc. | Methods and apparatus for holding a substrate in a pressure chamber |
Also Published As
Publication number | Publication date |
---|---|
JP2004262608A (ja) | 2004-09-24 |
WO2004079496A2 (fr) | 2004-09-16 |
TW200505780A (en) | 2005-02-16 |
JP3995617B2 (ja) | 2007-10-24 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
WO2004079496A3 (fr) | Systeme pour fabriquer des circuits electriques au moyen d'un support de debit de liquide | |
WO2004006292A3 (fr) | Cellule photovoltaique | |
WO2006084177A3 (fr) | Boitier de circuit integre loge dans un systeme de boitier | |
WO2006058036A3 (fr) | Transfert d'appel a des dispositifs proches | |
CA2408906A1 (fr) | Ensemble vanne | |
AU2002342623A1 (en) | Method for producing electronic components | |
WO2003021635A3 (fr) | Nanoparticules passivees, leur procede de production et dispositifs integrant lesdites nanoparticules | |
WO2004077258A3 (fr) | Systeme et procede de structuration d'applications reparties | |
WO2003030717A3 (fr) | Limiteur de debit non lineaire destine a un systeme d'aspiration medical | |
WO2004061994A3 (fr) | Procedes de fabrication de dispositifs par soudage a froid basse pression | |
TW200509391A (en) | A device having multiple silicide types and a method for its fabrication | |
WO2003035229A3 (fr) | Puce integree de preparation d'echantillons | |
WO2003047712A3 (fr) | Systeme hybride microfluidique et nanofluidique | |
WO2006107356A3 (fr) | Procede d'adjonction de moniteurs de fabrication a des microcircuits integres | |
AU2000226927A1 (en) | Semiconductor integrated circuit device and method of producing the same, and method of producing masks | |
MXPA03009675A (es) | Aparato para acondicionamiento de aire. | |
WO2002005432A3 (fr) | Modulateur sigma-delta a facteur de retroaction ajustable | |
TW200516748A (en) | Electroosmotic pumps using porous frits for cooling integrated circuit stacks | |
EP1237218A3 (fr) | Système de pile à combustible avec contrôle de la pression | |
WO2003021651A1 (fr) | Fluide de polissage conçu pour un film metallique et procede de production d'un substrat semi-conducteur au moyen de ce fluide de polissage | |
WO2004044469A3 (fr) | Tuyau flexible deformable et procede permettant de produire ce tuyau | |
WO2006032048A3 (fr) | Separation de types de particules par un champ acoustique non uniforme | |
WO2003021680A3 (fr) | Module de puissance a semi-conducteur | |
WO2005008725A3 (fr) | Architecture d'ilots de tension imbriques | |
WO2004000451A3 (fr) | Dispositif et procede de compression haute pression |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AK | Designated states |
Kind code of ref document: A2 Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BW BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE EG ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NA NI NO NZ OM PG PH PL PT RO RU SC SD SE SG SK SL SY TJ TM TN TR TT TZ UA UG US UZ VC VN YU ZA ZM ZW |
|
AL | Designated countries for regional patents |
Kind code of ref document: A2 Designated state(s): BW GH GM KE LS MW MZ SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LU MC NL PL PT RO SE SI SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
122 | Ep: pct application non-entry in european phase | ||
NENP | Non-entry into the national phase |
Ref country code: JP |