WO2004057642A2 - Vacuumarcquelle mit magnetfelderzeugungseinrichtung - Google Patents
Vacuumarcquelle mit magnetfelderzeugungseinrichtung Download PDFInfo
- Publication number
- WO2004057642A2 WO2004057642A2 PCT/CH2003/000710 CH0300710W WO2004057642A2 WO 2004057642 A2 WO2004057642 A2 WO 2004057642A2 CH 0300710 W CH0300710 W CH 0300710W WO 2004057642 A2 WO2004057642 A2 WO 2004057642A2
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- target
- magnetic field
- coil
- arc source
- source according
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32055—Arc discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3414—Targets
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/345—Magnet arrangements in particular for cathodic sputtering apparatus
- H01J37/3452—Magnet distribution
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/32—Processing objects by plasma generation
- H01J2237/327—Arrangements for generating the plasma
Abstract
Description
Claims
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
BR0317372-0A BR0317372A (pt) | 2002-12-19 | 2003-10-30 | Fonte de arco de vácuo com dispositivo gerador de campo magnético |
AU2003271505A AU2003271505A1 (en) | 2002-12-19 | 2003-10-30 | Vacuum arc source comprising a device for generating a magnetic field |
MXPA05006762A MXPA05006762A (es) | 2002-12-19 | 2003-10-30 | Fuente de arco al vacio que comprende un dispositivo para generar un campo magnetico. |
EP03753214A EP1576641B8 (de) | 2002-12-19 | 2003-10-30 | Vacuumarcquelle mit magnetfelderzeugungseinrichtung |
DE50308139T DE50308139D1 (de) | 2002-12-19 | 2003-10-30 | Vacuumarcquelle mit magnetfelderzeugungseinrichtung |
US10/540,162 US20060175190A1 (en) | 2002-12-19 | 2003-10-30 | Vacuum arc source comprising a device for generating a magnetic field |
JP2004560974A JP4989026B2 (ja) | 2002-12-19 | 2003-10-30 | 磁界発生装置付き真空アークソース |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH2163/02 | 2002-12-19 | ||
CH21632002 | 2002-12-19 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2004057642A2 true WO2004057642A2 (de) | 2004-07-08 |
WO2004057642A3 WO2004057642A3 (de) | 2004-12-09 |
Family
ID=32661016
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/CH2003/000710 WO2004057642A2 (de) | 2002-12-19 | 2003-10-30 | Vacuumarcquelle mit magnetfelderzeugungseinrichtung |
Country Status (11)
Country | Link |
---|---|
US (1) | US20060175190A1 (de) |
EP (1) | EP1576641B8 (de) |
JP (1) | JP4989026B2 (de) |
KR (1) | KR101074554B1 (de) |
CN (1) | CN100573802C (de) |
AT (1) | ATE372586T1 (de) |
AU (1) | AU2003271505A1 (de) |
BR (1) | BR0317372A (de) |
DE (1) | DE50308139D1 (de) |
MX (1) | MXPA05006762A (de) |
WO (1) | WO2004057642A2 (de) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2008125397A1 (de) | 2007-04-17 | 2008-10-23 | Sulzer Metaplas Gmbh | Vakuum lichtbogenverdampfungsquelle, sowie eine lichtbogenverdampfungskammer mit einer vakuum lichtbogenverdampfungsquelle |
WO2010088947A1 (de) * | 2009-02-09 | 2010-08-12 | Oerlikon Trading Ag, Trübbach | Modifizierbare magnetkonfiguration für arc-verdampungsquellen |
US7857948B2 (en) | 2006-07-19 | 2010-12-28 | Oerlikon Trading Ag, Trubbach | Method for manufacturing poorly conductive layers |
US20110183084A1 (en) * | 2006-10-11 | 2011-07-28 | Oerlikon Trading Ag, Trubbach | Layer system with at least one mixed crystal layer of a multi-oxide |
EP2599891A2 (de) | 2006-07-19 | 2013-06-05 | Oerlikon Trading AG, Trübbach | Verfahren zum Abscheiden isolierender Schichten |
US9165749B2 (en) * | 2006-05-16 | 2015-10-20 | Oerlikon Trading Ag, Truebbach | Arc source and magnet configuration |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102005040536A1 (de) * | 2005-08-26 | 2007-03-29 | Honeywell Technologies Sarl | Verfahren und Vorrichtung zum Messen einer Kraft und einer Position |
KR100727646B1 (ko) * | 2005-12-06 | 2007-06-13 | 장희선 | 이온 플레이팅장치의 금속타겟용 자속유도구 |
US20110315544A1 (en) | 2008-12-26 | 2011-12-29 | Fundacion Tekniker | Arc evaporator and method for operating the evaporator |
JP5649308B2 (ja) * | 2009-04-28 | 2015-01-07 | 株式会社神戸製鋼所 | 成膜速度が速いアーク式蒸発源及びこのアーク式蒸発源を用いた皮膜の製造方法 |
EP2835445A1 (de) * | 2010-04-23 | 2015-02-11 | Sulzer Metaplas GmbH | PVD-Beschichtung zur Metallverarbeitung |
JP5318052B2 (ja) * | 2010-06-23 | 2013-10-16 | 株式会社神戸製鋼所 | 成膜速度が速いアーク式蒸発源、このアーク式蒸発源を用いた皮膜の製造方法及び成膜装置 |
JP6403269B2 (ja) * | 2014-07-30 | 2018-10-10 | 株式会社神戸製鋼所 | アーク蒸発源 |
JP7390396B2 (ja) * | 2019-03-15 | 2023-12-01 | ナノフィルム テクノロジーズ インターナショナル リミテッド | 改良されたカソードアーク源 |
KR102156499B1 (ko) | 2019-05-31 | 2020-09-15 | 배상열 | 아크 발생 장치 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5298136A (en) * | 1987-08-18 | 1994-03-29 | Regents Of The University Of Minnesota | Steered arc coating with thick targets |
WO2002077318A1 (es) * | 2001-03-27 | 2002-10-03 | Fundación Tekniker | Evaporador de arco con guía magnética intensa para blancos de superficie amplia |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4673477A (en) * | 1984-03-02 | 1987-06-16 | Regents Of The University Of Minnesota | Controlled vacuum arc material deposition, method and apparatus |
JPS6247477A (ja) * | 1985-08-28 | 1987-03-02 | Tokuda Seisakusho Ltd | スパツタリング装置 |
NL8700620A (nl) * | 1987-03-16 | 1988-10-17 | Hauzer Holding | Kathode boogverdampingsinrichting alsmede werkwijze voor het bedrijven daarvan. |
DE4017111C2 (de) * | 1990-05-28 | 1998-01-29 | Hauzer Holding | Lichtbogen-Magnetron-Vorrichtung |
US5234560A (en) * | 1989-08-14 | 1993-08-10 | Hauzer Holdings Bv | Method and device for sputtering of films |
DE19617057C2 (de) * | 1996-04-29 | 1998-07-23 | Ardenne Anlagentech Gmbh | Sputteranlage mit zwei längserstreckten Magnetrons |
US6036828A (en) * | 1997-08-30 | 2000-03-14 | United Technologies Corporation | Apparatus for steering the arc in a cathodic arc coater |
US6103074A (en) * | 1998-02-14 | 2000-08-15 | Phygen, Inc. | Cathode arc vapor deposition method and apparatus |
JP2002525431A (ja) * | 1998-09-14 | 2002-08-13 | ユナキス・トレーディング・アクチェンゲゼルシャフト | アーク蒸化室用ターゲット配置 |
TWI242049B (en) * | 1999-01-14 | 2005-10-21 | Kobe Steel Ltd | Vacuum arc evaporation source and vacuum arc vapor deposition apparatus |
JP3789667B2 (ja) * | 1999-01-14 | 2006-06-28 | 株式会社神戸製鋼所 | 真空アーク蒸発源及び真空アーク蒸着装置 |
US5997705A (en) * | 1999-04-14 | 1999-12-07 | Vapor Technologies, Inc. | Rectangular filtered arc plasma source |
JP3917348B2 (ja) * | 1999-05-26 | 2007-05-23 | 株式会社神戸製鋼所 | アーク蒸発源、真空蒸着装置及び真空蒸着方法 |
JP3993388B2 (ja) * | 2001-01-16 | 2007-10-17 | 株式会社神戸製鋼所 | 真空アーク蒸発源 |
DE10127013A1 (de) * | 2001-06-05 | 2002-12-12 | Gabriel Herbert M | Lichtbogen-Verdampfungsvorrichtung |
-
2003
- 2003-10-30 AT AT03753214T patent/ATE372586T1/de not_active IP Right Cessation
- 2003-10-30 AU AU2003271505A patent/AU2003271505A1/en not_active Abandoned
- 2003-10-30 EP EP03753214A patent/EP1576641B8/de not_active Expired - Lifetime
- 2003-10-30 DE DE50308139T patent/DE50308139D1/de not_active Expired - Lifetime
- 2003-10-30 BR BR0317372-0A patent/BR0317372A/pt not_active IP Right Cessation
- 2003-10-30 WO PCT/CH2003/000710 patent/WO2004057642A2/de active IP Right Grant
- 2003-10-30 JP JP2004560974A patent/JP4989026B2/ja not_active Expired - Fee Related
- 2003-10-30 MX MXPA05006762A patent/MXPA05006762A/es active IP Right Grant
- 2003-10-30 KR KR1020057011359A patent/KR101074554B1/ko active IP Right Grant
- 2003-10-30 US US10/540,162 patent/US20060175190A1/en not_active Abandoned
- 2003-10-30 CN CNB200380107068XA patent/CN100573802C/zh not_active Expired - Fee Related
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5298136A (en) * | 1987-08-18 | 1994-03-29 | Regents Of The University Of Minnesota | Steered arc coating with thick targets |
WO2002077318A1 (es) * | 2001-03-27 | 2002-10-03 | Fundación Tekniker | Evaporador de arco con guía magnética intensa para blancos de superficie amplia |
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9165749B2 (en) * | 2006-05-16 | 2015-10-20 | Oerlikon Trading Ag, Truebbach | Arc source and magnet configuration |
US7857948B2 (en) | 2006-07-19 | 2010-12-28 | Oerlikon Trading Ag, Trubbach | Method for manufacturing poorly conductive layers |
EP2599891A2 (de) | 2006-07-19 | 2013-06-05 | Oerlikon Trading AG, Trübbach | Verfahren zum Abscheiden isolierender Schichten |
US9702036B2 (en) * | 2006-10-11 | 2017-07-11 | Oerlikon Surface Solutions Ag, Pfäffikon | Layer system with at least one mixed crystal layer of a multi-oxide |
US20110183084A1 (en) * | 2006-10-11 | 2011-07-28 | Oerlikon Trading Ag, Trubbach | Layer system with at least one mixed crystal layer of a multi-oxide |
EP2720248A2 (de) | 2007-04-17 | 2014-04-16 | Sulzer Metaplas GmbH | Vakuum-Lichtbogenverdampfungsquelle, sowie eine Lichtbogenverdampfungskammer mit einer Vakuum -Lichtbogenverdampfungsquelle |
WO2008125397A1 (de) | 2007-04-17 | 2008-10-23 | Sulzer Metaplas Gmbh | Vakuum lichtbogenverdampfungsquelle, sowie eine lichtbogenverdampfungskammer mit einer vakuum lichtbogenverdampfungsquelle |
EP2720249A2 (de) | 2007-04-17 | 2014-04-16 | Sulzer Metaplas GmbH | Lichtbogenverdampfungskammer mit einer Vakuum Lichtbogenverdampfungsquelle |
US9269545B2 (en) | 2007-04-17 | 2016-02-23 | Oerlikon Surface Solutions Ag, Truebbach | Vacuum arc vaporisation source and also a vacuum arc vaporisation chamber with a vacuum arc vaporisation source |
RU2550502C2 (ru) * | 2009-02-09 | 2015-05-10 | Эрликон Трейдинг Аг, Трюббах | Модифицируемая конфигурация магнитов для электродуговых испарителей |
WO2010088947A1 (de) * | 2009-02-09 | 2010-08-12 | Oerlikon Trading Ag, Trübbach | Modifizierbare magnetkonfiguration für arc-verdampungsquellen |
US11264216B2 (en) | 2009-02-09 | 2022-03-01 | Oerlikon Surface Solutions Ag, Pfäffikon | Modifiable magnet configuration for arc vaporization sources |
US11535928B2 (en) | 2009-02-09 | 2022-12-27 | Oerlikon Surface Solutions Ag, Pfäffikon | Modifiable magnet configuration for arc vaporization sources |
Also Published As
Publication number | Publication date |
---|---|
EP1576641B8 (de) | 2007-10-17 |
JP4989026B2 (ja) | 2012-08-01 |
JP2006510803A (ja) | 2006-03-30 |
KR101074554B1 (ko) | 2011-10-17 |
DE50308139D1 (de) | 2007-10-18 |
EP1576641B1 (de) | 2007-09-05 |
MXPA05006762A (es) | 2005-09-08 |
ATE372586T1 (de) | 2007-09-15 |
AU2003271505A1 (en) | 2004-07-14 |
EP1576641A2 (de) | 2005-09-21 |
WO2004057642A3 (de) | 2004-12-09 |
CN100573802C (zh) | 2009-12-23 |
BR0317372A (pt) | 2005-11-16 |
US20060175190A1 (en) | 2006-08-10 |
KR20050084412A (ko) | 2005-08-26 |
CN1729549A (zh) | 2006-02-01 |
AU2003271505A8 (en) | 2004-07-14 |
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