BR0317372A - Fonte de arco de vácuo com dispositivo gerador de campo magnético - Google Patents

Fonte de arco de vácuo com dispositivo gerador de campo magnético

Info

Publication number
BR0317372A
BR0317372A BR0317372-0A BR0317372A BR0317372A BR 0317372 A BR0317372 A BR 0317372A BR 0317372 A BR0317372 A BR 0317372A BR 0317372 A BR0317372 A BR 0317372A
Authority
BR
Brazil
Prior art keywords
magnetic field
vacuum arc
field generator
arc source
generator device
Prior art date
Application number
BR0317372-0A
Other languages
English (en)
Inventor
Andreas Schuetze
Christian Wohlrab
Original Assignee
Unaxis Balzers Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Unaxis Balzers Ag filed Critical Unaxis Balzers Ag
Publication of BR0317372A publication Critical patent/BR0317372A/pt

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/345—Magnet arrangements in particular for cathodic sputtering apparatus
    • H01J37/3452—Magnet distribution
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/327—Arrangements for generating the plasma

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
  • Magnetic Resonance Imaging Apparatus (AREA)
  • Particle Accelerators (AREA)
  • Discharge Heating (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

"FONTE DE ARCO DE VáCUO COM DISPOSITIVO GERADOR DE CAMPO MAGNéTICO". A invenção refere-se a uma fonte de arco de vácuo, abrangendo um alvo com uma superfície para operação de uma descarga de arco voltaico, sendo que o alvo está disposto na região de atuação de um dispositivo gerador de campo magnético, caracterizada pelo fato de que o dispositivo gerador de campo magnético abrange ao menos dois sistemas magnéticos de polaridade oposta e está executado de tal maneira que a componente de campo magnético B~ <sym>~ do campo magnético resultante apresenta por uma grande parte da superfície pequenos valores essencialmente constantes ou é zero.
BR0317372-0A 2002-12-19 2003-10-30 Fonte de arco de vácuo com dispositivo gerador de campo magnético BR0317372A (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH21632002 2002-12-19
PCT/CH2003/000710 WO2004057642A2 (de) 2002-12-19 2003-10-30 Vacuumarcquelle mit magnetfelderzeugungseinrichtung

Publications (1)

Publication Number Publication Date
BR0317372A true BR0317372A (pt) 2005-11-16

Family

ID=32661016

Family Applications (1)

Application Number Title Priority Date Filing Date
BR0317372-0A BR0317372A (pt) 2002-12-19 2003-10-30 Fonte de arco de vácuo com dispositivo gerador de campo magnético

Country Status (11)

Country Link
US (1) US20060175190A1 (pt)
EP (1) EP1576641B8 (pt)
JP (1) JP4989026B2 (pt)
KR (1) KR101074554B1 (pt)
CN (1) CN100573802C (pt)
AT (1) ATE372586T1 (pt)
AU (1) AU2003271505A1 (pt)
BR (1) BR0317372A (pt)
DE (1) DE50308139D1 (pt)
MX (1) MXPA05006762A (pt)
WO (1) WO2004057642A2 (pt)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102005040536A1 (de) * 2005-08-26 2007-03-29 Honeywell Technologies Sarl Verfahren und Vorrichtung zum Messen einer Kraft und einer Position
KR100727646B1 (ko) * 2005-12-06 2007-06-13 장희선 이온 플레이팅장치의 금속타겟용 자속유도구
RU2448388C2 (ru) * 2006-05-16 2012-04-20 Эрликон Трейдинг Аг, Трюббах Электродуговой источник и магнитное приспособление
US7857948B2 (en) 2006-07-19 2010-12-28 Oerlikon Trading Ag, Trubbach Method for manufacturing poorly conductive layers
TWI411696B (zh) 2006-07-19 2013-10-11 Oerlikon Trading Ag 沉積電絕緣層之方法
US7939181B2 (en) * 2006-10-11 2011-05-10 Oerlikon Trading Ag, Trubbach Layer system with at least one mixed crystal layer of a multi-oxide
EP2720249B1 (de) 2007-04-17 2019-07-10 Oerlikon Surface Solutions AG, Pfäffikon Lichtbogenverdampfungskammer mit einer Vakuum Lichtbogenverdampfungsquelle
DE112008004247T5 (de) 2008-12-26 2012-04-12 Fundación Tekniker Lichtbogenverdampfer und Verfahren zum Betreiben des Verdampfers
DE102009008161A1 (de) * 2009-02-09 2010-08-12 Oerlikon Trading Ag, Trübbach Modifizierbare Magnetkonfiguration für Arc-Verdampfungsquellen
JP5649308B2 (ja) * 2009-04-28 2015-01-07 株式会社神戸製鋼所 成膜速度が速いアーク式蒸発源及びこのアーク式蒸発源を用いた皮膜の製造方法
US9856556B2 (en) * 2010-04-23 2018-01-02 Oerlikon Surface Solutions Ag, Pfaeffikon PVD coating for metal machining
JP5318052B2 (ja) * 2010-06-23 2013-10-16 株式会社神戸製鋼所 成膜速度が速いアーク式蒸発源、このアーク式蒸発源を用いた皮膜の製造方法及び成膜装置
JP6403269B2 (ja) * 2014-07-30 2018-10-10 株式会社神戸製鋼所 アーク蒸発源
JP7390396B2 (ja) * 2019-03-15 2023-12-01 ナノフィルム テクノロジーズ インターナショナル リミテッド 改良されたカソードアーク源
KR102156499B1 (ko) 2019-05-31 2020-09-15 배상열 아크 발생 장치

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4673477A (en) * 1984-03-02 1987-06-16 Regents Of The University Of Minnesota Controlled vacuum arc material deposition, method and apparatus
JPS6247477A (ja) * 1985-08-28 1987-03-02 Tokuda Seisakusho Ltd スパツタリング装置
NL8700620A (nl) * 1987-03-16 1988-10-17 Hauzer Holding Kathode boogverdampingsinrichting alsmede werkwijze voor het bedrijven daarvan.
DE4017111C2 (de) * 1990-05-28 1998-01-29 Hauzer Holding Lichtbogen-Magnetron-Vorrichtung
US5298136A (en) * 1987-08-18 1994-03-29 Regents Of The University Of Minnesota Steered arc coating with thick targets
US5234560A (en) * 1989-08-14 1993-08-10 Hauzer Holdings Bv Method and device for sputtering of films
DE19617057C2 (de) * 1996-04-29 1998-07-23 Ardenne Anlagentech Gmbh Sputteranlage mit zwei längserstreckten Magnetrons
US6036828A (en) * 1997-08-30 2000-03-14 United Technologies Corporation Apparatus for steering the arc in a cathodic arc coater
US6103074A (en) * 1998-02-14 2000-08-15 Phygen, Inc. Cathode arc vapor deposition method and apparatus
WO2000016373A1 (de) * 1998-09-14 2000-03-23 Unaxis Trading Ag Targetanordnung für eine arc-verdampfungs-kammer
JP3789667B2 (ja) * 1999-01-14 2006-06-28 株式会社神戸製鋼所 真空アーク蒸発源及び真空アーク蒸着装置
TWI242049B (en) * 1999-01-14 2005-10-21 Kobe Steel Ltd Vacuum arc evaporation source and vacuum arc vapor deposition apparatus
US5997705A (en) * 1999-04-14 1999-12-07 Vapor Technologies, Inc. Rectangular filtered arc plasma source
JP3917348B2 (ja) * 1999-05-26 2007-05-23 株式会社神戸製鋼所 アーク蒸発源、真空蒸着装置及び真空蒸着方法
JP3993388B2 (ja) * 2001-01-16 2007-10-17 株式会社神戸製鋼所 真空アーク蒸発源
BR0116951B1 (pt) * 2001-03-27 2011-06-14 evaporador de arco com guia magnÉtico poderoso para alvos tendo uma grande Área de superfÍcie.
DE10127013A1 (de) * 2001-06-05 2002-12-12 Gabriel Herbert M Lichtbogen-Verdampfungsvorrichtung

Also Published As

Publication number Publication date
MXPA05006762A (es) 2005-09-08
WO2004057642A3 (de) 2004-12-09
KR101074554B1 (ko) 2011-10-17
EP1576641A2 (de) 2005-09-21
US20060175190A1 (en) 2006-08-10
EP1576641B8 (de) 2007-10-17
ATE372586T1 (de) 2007-09-15
CN100573802C (zh) 2009-12-23
CN1729549A (zh) 2006-02-01
JP2006510803A (ja) 2006-03-30
WO2004057642A2 (de) 2004-07-08
AU2003271505A1 (en) 2004-07-14
DE50308139D1 (de) 2007-10-18
AU2003271505A8 (en) 2004-07-14
KR20050084412A (ko) 2005-08-26
JP4989026B2 (ja) 2012-08-01
EP1576641B1 (de) 2007-09-05

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Legal Events

Date Code Title Description
B25D Requested change of name of applicant approved

Owner name: OC OERLIKON BALZERS AG (LI)

Free format text: ALTERADO DE: UNAXIS BALZERS AKTIENGESELLSCHAFT

B25A Requested transfer of rights approved

Owner name: OERLIKON TRADING AG, TRUBBACH (CH)

Free format text: TRANSFERIDO DE: OC OERLIKON BALZERS AG

B25G Requested change of headquarter approved

Owner name: OERLIKON TRADING AG, TRUEBBACH (CH)

B08F Application dismissed because of non-payment of annual fees [chapter 8.6 patent gazette]

Free format text: REFERENTE A 12A ANUIDADE.

B08K Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette]

Free format text: EM VIRTUDE DO ARQUIVAMENTO PUBLICADO NA RPI 2330 DE 01-09-2015 E CONSIDERANDO AUSENCIA DE MANIFESTACAO DENTRO DOS PRAZOS LEGAIS, INFORMO QUE CABE SER MANTIDO O ARQUIVAMENTO DO PEDIDO DE PATENTE, CONFORME O DISPOSTO NO ARTIGO 12, DA RESOLUCAO 113/2013.