WO2004040644A3 - Speicherzelle, speicherzellen-anordnung, strukturier-anordnung und verfahren zum herstellen einer speicherzelle - Google Patents

Speicherzelle, speicherzellen-anordnung, strukturier-anordnung und verfahren zum herstellen einer speicherzelle Download PDF

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Publication number
WO2004040644A3
WO2004040644A3 PCT/DE2003/003589 DE0303589W WO2004040644A3 WO 2004040644 A3 WO2004040644 A3 WO 2004040644A3 DE 0303589 W DE0303589 W DE 0303589W WO 2004040644 A3 WO2004040644 A3 WO 2004040644A3
Authority
WO
WIPO (PCT)
Prior art keywords
memory cell
arrangement
production
structuring
memory
Prior art date
Application number
PCT/DE2003/003589
Other languages
English (en)
French (fr)
Other versions
WO2004040644A2 (de
Inventor
Andrew Graham
Franz Hofmann
Wolfgang Hoenlein
Johannes Kretz
Franz Kreupl
Erhard Landgraf
Richard Johannes Luyken
Wolfgang Roesner
Thomas Schulz
Michael Specht
Original Assignee
Infineon Technologies Ag
Andrew Graham
Franz Hofmann
Wolfgang Hoenlein
Johannes Kretz
Franz Kreupl
Erhard Landgraf
Richard Johannes Luyken
Wolfgang Roesner
Thomas Schulz
Michael Specht
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Infineon Technologies Ag, Andrew Graham, Franz Hofmann, Wolfgang Hoenlein, Johannes Kretz, Franz Kreupl, Erhard Landgraf, Richard Johannes Luyken, Wolfgang Roesner, Thomas Schulz, Michael Specht filed Critical Infineon Technologies Ag
Priority to EP03778241A priority Critical patent/EP1556893A2/de
Publication of WO2004040644A2 publication Critical patent/WO2004040644A2/de
Publication of WO2004040644A3 publication Critical patent/WO2004040644A3/de
Priority to US11/119,531 priority patent/US20050276093A1/en

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
    • G11C13/02—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using elements whose operation depends upon chemical change
    • G11C13/025—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using elements whose operation depends upon chemical change using fullerenes, e.g. C60, or nanotubes, e.g. carbon or silicon nanotubes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
    • G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
    • G11C13/0021—Auxiliary circuits
    • G11C13/0033—Disturbance prevention or evaluation; Refreshing of disturbed memory data
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B12/00—Dynamic random access memory [DRAM] devices
    • H10B12/01—Manufacture or treatment
    • H10B12/02—Manufacture or treatment for one transistor one-capacitor [1T-1C] memory cells
    • H10B12/03—Making the capacitor or connections thereto
    • H10B12/038—Making the capacitor or connections thereto the capacitor being in a trench in the substrate
    • H10B12/0383—Making the capacitor or connections thereto the capacitor being in a trench in the substrate wherein the transistor is vertical
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B12/00—Dynamic random access memory [DRAM] devices
    • H10B12/30—DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells
    • H10B12/39—DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells the capacitor and the transistor being in a same trench
    • H10B12/395—DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells the capacitor and the transistor being in a same trench the transistor being vertical
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K19/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic element specially adapted for rectifying, amplifying, oscillating or switching, covered by group H10K10/00
    • H10K19/10—Integrated devices, or assemblies of multiple devices, comprising at least one organic element specially adapted for rectifying, amplifying, oscillating or switching, covered by group H10K10/00 comprising field-effect transistors
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C2213/00—Indexing scheme relating to G11C13/00 for features not covered by this group
    • G11C2213/10—Resistive cells; Technology aspects
    • G11C2213/16—Memory cell being a nanotube, e.g. suspended nanotube
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B12/00—Dynamic random access memory [DRAM] devices
    • H10B12/01—Manufacture or treatment
    • H10B12/02—Manufacture or treatment for one transistor one-capacitor [1T-1C] memory cells
    • H10B12/05—Making the transistor
    • H10B12/053—Making the transistor the transistor being at least partially in a trench in the substrate
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
    • H10K10/40—Organic transistors
    • H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
    • H10K10/462—Insulated gate field-effect transistors [IGFETs]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
    • H10K10/40—Organic transistors
    • H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
    • H10K10/462—Insulated gate field-effect transistors [IGFETs]
    • H10K10/491—Vertical transistors, e.g. vertical carbon nanotube field effect transistors [CNT-FETs]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/20—Carbon compounds, e.g. carbon nanotubes or fullerenes
    • H10K85/221—Carbon nanotubes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/60—Organic compounds having low molecular weight
    • H10K85/615—Polycyclic condensed aromatic hydrocarbons, e.g. anthracene

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Semiconductor Memories (AREA)

Abstract

Die Erfindung betrifft eine Speicherzelle, eine Speicherzellen-Anordnung, eine Strukturier-Anordnung und ein Verfahren zum Herstellen einer Speicherzelle. Die Speicherzelle hat einen Vertikal-Schalt-Transistor und einen Speicher-Kondensator, wobei der Vertikal-Schalt-Transistor eine halbleitende Nanostruktur aufweist, die auf zumindest einem Teil des Speicher-Kondensators aufgewachsen ist.
PCT/DE2003/003589 2002-10-31 2003-10-29 Speicherzelle, speicherzellen-anordnung, strukturier-anordnung und verfahren zum herstellen einer speicherzelle WO2004040644A2 (de)

Priority Applications (2)

Application Number Priority Date Filing Date Title
EP03778241A EP1556893A2 (de) 2002-10-31 2003-10-29 Speicherzelle, speicherzellen-anordnung, strukturier-anordnung und verfahren zum herstellen einer speicherzelle
US11/119,531 US20050276093A1 (en) 2002-10-31 2005-04-29 Memory cell, memory cell arrangement, patterning arrangement, and method for fabricating a memory cell

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10250834.8 2002-10-31
DE10250834A DE10250834A1 (de) 2002-10-31 2002-10-31 Speicherzelle, Speicherzellen-Anordnung, Strukturier-Anordnung und Verfahren zum Herstellen einer Speicherzelle

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US11/119,531 Continuation US20050276093A1 (en) 2002-10-31 2005-04-29 Memory cell, memory cell arrangement, patterning arrangement, and method for fabricating a memory cell

Publications (2)

Publication Number Publication Date
WO2004040644A2 WO2004040644A2 (de) 2004-05-13
WO2004040644A3 true WO2004040644A3 (de) 2004-08-12

Family

ID=32115043

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/DE2003/003589 WO2004040644A2 (de) 2002-10-31 2003-10-29 Speicherzelle, speicherzellen-anordnung, strukturier-anordnung und verfahren zum herstellen einer speicherzelle

Country Status (4)

Country Link
US (1) US20050276093A1 (de)
EP (1) EP1556893A2 (de)
DE (1) DE10250834A1 (de)
WO (1) WO2004040644A2 (de)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7316061B2 (en) * 2003-02-03 2008-01-08 Intel Corporation Packaging of integrated circuits with carbon nano-tube arrays to enhance heat dissipation through a thermal interface
DE10331528A1 (de) * 2003-07-11 2005-02-03 Infineon Technologies Ag DRAM-Halbleiterspeicherzelle sowie Verfahren zu deren Herstellung
WO2007022359A2 (en) * 2005-08-16 2007-02-22 The Regents Of The University Of California Vertical integrated silicon nanowire field effect transistors and methods of fabrication
EP1796162A3 (de) 2005-12-06 2010-06-02 Canon Kabushiki Kaisha Schaltkreiselement mit einem Kondensator und Feldeffekttransistor mit Nanodrähten
US7365018B2 (en) * 2005-12-28 2008-04-29 Sandisk Corporation Fabrication of semiconductor device for flash memory with increased select gate width
FR2897204B1 (fr) * 2006-02-07 2008-05-30 Ecole Polytechnique Etablissem Structure de transistor vertical et procede de fabrication
DE102006009721B4 (de) * 2006-03-02 2011-08-18 Qimonda AG, 81739 Nanodraht (Nanowire)-Speicherzelle und Verfahren zu deren Herstellung
DE102006013245A1 (de) * 2006-03-22 2007-10-04 Infineon Technologies Ag Verfahren zur Ausbildung von Öffnungen in einer Matrizenschicht und zur Herstellung von Kondensatoren
GB0611557D0 (en) * 2006-06-12 2006-07-19 Univ Belfast Nanostructured systems and a method of manufacture of the same
US7667260B2 (en) * 2006-08-09 2010-02-23 Micron Technology, Inc. Nanoscale floating gate and methods of formation
US7795671B2 (en) * 2007-01-04 2010-09-14 Fairchild Semiconductor Corporation PN junction and MOS capacitor hybrid RESURF transistor
US7858506B2 (en) * 2008-06-18 2010-12-28 Micron Technology, Inc. Diodes, and methods of forming diodes
US9099537B2 (en) * 2009-08-28 2015-08-04 International Business Machines Corporation Selective nanotube growth inside vias using an ion beam
US8436447B2 (en) * 2010-04-23 2013-05-07 Sandisk 3D Llc Memory cell that includes a carbon-based memory element and methods of forming the same
US8871576B2 (en) 2011-02-28 2014-10-28 International Business Machines Corporation Silicon nanotube MOSFET
KR102295966B1 (ko) * 2014-08-27 2021-09-01 삼성전자주식회사 나노와이어를 이용한 반도체 소자 형성 방법
CN105810750B (zh) * 2014-12-29 2019-02-01 中芯国际集成电路制造(上海)有限公司 一种碳纳米管神经元器件及其制作方法
US9923140B2 (en) * 2016-04-20 2018-03-20 Sandisk Technologies Llc Low power barrier modulated cell for storage class memory
WO2019130127A1 (en) * 2017-12-26 2019-07-04 King Abdullah University Of Science And Technology Silicon nanotube, negative-capacitance transistor with ferroelectric layer and method of making

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5256588A (en) * 1992-03-23 1993-10-26 Motorola, Inc. Method for forming a transistor and a capacitor for use in a vertically stacked dynamic random access memory cell
US5610441A (en) * 1995-05-19 1997-03-11 International Business Machines Corporation Angle defined trench conductor for a semiconductor device
WO2001057917A2 (en) * 2000-02-07 2001-08-09 Xidex Corporation System and method for fabricating logic devices comprising carbon nanotube transistors
US20010021553A1 (en) * 1999-08-26 2001-09-13 International Business Machines Corporation Vertical DRAM cell with TFT over trench capacitor
US20020001905A1 (en) * 2000-06-27 2002-01-03 Choi Won-Bong Vertical nano-size transistor using carbon nanotubes and manufacturing method thereof
DE10118405A1 (de) * 2001-04-12 2002-10-24 Infineon Technologies Ag Heterostruktur-Bauelement
WO2003050854A2 (en) * 2001-12-12 2003-06-19 The Pennsylvania State University Chemical reactor templates: sacrificial layer fabrication and template use

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100223807B1 (ko) * 1997-06-04 1999-10-15 구본준 반도체 소자의 제조방법
DE10036897C1 (de) * 2000-07-28 2002-01-03 Infineon Technologies Ag Feldeffekttransistor, Schaltungsanordnung und Verfahren zum Herstellen eines Feldeffekttransistors

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5256588A (en) * 1992-03-23 1993-10-26 Motorola, Inc. Method for forming a transistor and a capacitor for use in a vertically stacked dynamic random access memory cell
US5610441A (en) * 1995-05-19 1997-03-11 International Business Machines Corporation Angle defined trench conductor for a semiconductor device
US20010021553A1 (en) * 1999-08-26 2001-09-13 International Business Machines Corporation Vertical DRAM cell with TFT over trench capacitor
WO2001057917A2 (en) * 2000-02-07 2001-08-09 Xidex Corporation System and method for fabricating logic devices comprising carbon nanotube transistors
US20020001905A1 (en) * 2000-06-27 2002-01-03 Choi Won-Bong Vertical nano-size transistor using carbon nanotubes and manufacturing method thereof
DE10118405A1 (de) * 2001-04-12 2002-10-24 Infineon Technologies Ag Heterostruktur-Bauelement
WO2003050854A2 (en) * 2001-12-12 2003-06-19 The Pennsylvania State University Chemical reactor templates: sacrificial layer fabrication and template use

Also Published As

Publication number Publication date
DE10250834A1 (de) 2004-05-19
EP1556893A2 (de) 2005-07-27
WO2004040644A2 (de) 2004-05-13
US20050276093A1 (en) 2005-12-15

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