WO2004037836A1 - Rhodium und iridium-komplexe - Google Patents
Rhodium und iridium-komplexe Download PDFInfo
- Publication number
- WO2004037836A1 WO2004037836A1 PCT/EP2003/010652 EP0310652W WO2004037836A1 WO 2004037836 A1 WO2004037836 A1 WO 2004037836A1 EP 0310652 W EP0310652 W EP 0310652W WO 2004037836 A1 WO2004037836 A1 WO 2004037836A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- connections
- atoms
- replaced
- same
- different
- Prior art date
Links
- 229910052703 rhodium Inorganic materials 0.000 title claims description 28
- 239000010948 rhodium Substances 0.000 title description 22
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 title description 8
- 150000002503 iridium Chemical class 0.000 title description 3
- 150000001875 compounds Chemical class 0.000 claims abstract description 80
- 125000004432 carbon atom Chemical group C* 0.000 claims description 44
- 125000003118 aryl group Chemical group 0.000 claims description 36
- 238000006396 nitration reaction Methods 0.000 claims description 28
- 239000003795 chemical substances by application Substances 0.000 claims description 27
- 238000000034 method Methods 0.000 claims description 24
- 229910052741 iridium Inorganic materials 0.000 claims description 22
- 239000003446 ligand Substances 0.000 claims description 20
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 claims description 18
- -1 BF 4 " Chemical class 0.000 claims description 18
- 125000001931 aliphatic group Chemical group 0.000 claims description 18
- 125000003545 alkoxy group Chemical group 0.000 claims description 18
- 125000006165 cyclic alkyl group Chemical group 0.000 claims description 18
- 125000001072 heteroaryl group Chemical group 0.000 claims description 18
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 18
- 230000000802 nitrating effect Effects 0.000 claims description 18
- 229920000642 polymer Polymers 0.000 claims description 18
- 125000001424 substituent group Chemical group 0.000 claims description 18
- 125000002950 monocyclic group Chemical group 0.000 claims description 16
- 230000008569 process Effects 0.000 claims description 16
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims description 12
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 10
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 10
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 claims description 9
- 229910052739 hydrogen Inorganic materials 0.000 claims description 9
- 230000007935 neutral effect Effects 0.000 claims description 9
- 238000005160 1H NMR spectroscopy Methods 0.000 claims description 8
- 239000002253 acid Substances 0.000 claims description 8
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 claims description 8
- 238000006243 chemical reaction Methods 0.000 claims description 7
- 229910052717 sulfur Inorganic materials 0.000 claims description 7
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 6
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 claims description 6
- 229920000547 conjugated polymer Polymers 0.000 claims description 6
- XTVVROIMIGLXTD-UHFFFAOYSA-N copper(II) nitrate Chemical compound [Cu+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O XTVVROIMIGLXTD-UHFFFAOYSA-N 0.000 claims description 6
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 5
- 239000000203 mixture Substances 0.000 claims description 5
- 238000002360 preparation method Methods 0.000 claims description 5
- 239000010409 thin film Substances 0.000 claims description 5
- 239000003513 alkali Substances 0.000 claims description 4
- 150000001244 carboxylic acid anhydrides Chemical class 0.000 claims description 4
- ZWWCURLKEXEFQT-UHFFFAOYSA-N dinitrogen pentaoxide Chemical compound [O-][N+](=O)O[N+]([O-])=O ZWWCURLKEXEFQT-UHFFFAOYSA-N 0.000 claims description 4
- OMBRFUXPXNIUCZ-UHFFFAOYSA-N dioxidonitrogen(1+) Chemical class O=[N+]=O OMBRFUXPXNIUCZ-UHFFFAOYSA-N 0.000 claims description 4
- 230000005669 field effect Effects 0.000 claims description 4
- YIXJRHPUWRPCBB-UHFFFAOYSA-N magnesium nitrate Chemical compound [Mg+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O YIXJRHPUWRPCBB-UHFFFAOYSA-N 0.000 claims description 4
- 229910017604 nitric acid Inorganic materials 0.000 claims description 4
- 235000019260 propionic acid Nutrition 0.000 claims description 4
- WYVAMUWZEOHJOQ-UHFFFAOYSA-N propionic anhydride Chemical compound CCC(=O)OC(=O)CC WYVAMUWZEOHJOQ-UHFFFAOYSA-N 0.000 claims description 4
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 claims description 4
- 229910001963 alkali metal nitrate Inorganic materials 0.000 claims description 3
- 229910001964 alkaline earth metal nitrate Inorganic materials 0.000 claims description 3
- 238000004128 high performance liquid chromatography Methods 0.000 claims description 3
- 229920002098 polyfluorene Polymers 0.000 claims description 3
- 229920000123 polythiophene Polymers 0.000 claims description 3
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Inorganic materials [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 claims description 3
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 claims description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims description 2
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 claims description 2
- 229910018286 SbF 6 Inorganic materials 0.000 claims description 2
- 150000001450 anions Chemical class 0.000 claims description 2
- XLJKHNWPARRRJB-UHFFFAOYSA-N cobalt(2+) Chemical compound [Co+2] XLJKHNWPARRRJB-UHFFFAOYSA-N 0.000 claims description 2
- JAWGVVJVYSANRY-UHFFFAOYSA-N cobalt(3+) Chemical compound [Co+3] JAWGVVJVYSANRY-UHFFFAOYSA-N 0.000 claims description 2
- 239000003960 organic solvent Substances 0.000 claims description 2
- 239000011734 sodium Substances 0.000 claims description 2
- 229910002001 transition metal nitrate Inorganic materials 0.000 claims description 2
- WFPZPJSADLPSON-UHFFFAOYSA-N dinitrogen tetraoxide Chemical compound [O-][N+](=O)[N+]([O-])=O WFPZPJSADLPSON-UHFFFAOYSA-N 0.000 claims 2
- KBJMLQFLOWQJNF-UHFFFAOYSA-N nickel(ii) nitrate Chemical compound [Ni+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O KBJMLQFLOWQJNF-UHFFFAOYSA-N 0.000 claims 2
- VTLYFUHAOXGGBS-UHFFFAOYSA-N Fe3+ Chemical compound [Fe+3] VTLYFUHAOXGGBS-UHFFFAOYSA-N 0.000 claims 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims 1
- 150000001716 carbazoles Chemical class 0.000 claims 1
- UFMZWBIQTDUYBN-UHFFFAOYSA-N cobalt(II) nitrate Inorganic materials [Co+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O UFMZWBIQTDUYBN-UHFFFAOYSA-N 0.000 claims 1
- QSQUFRGBXGXOHF-UHFFFAOYSA-N cobalt(III) nitrate Inorganic materials [Co].O[N+]([O-])=O.O[N+]([O-])=O.O[N+]([O-])=O QSQUFRGBXGXOHF-UHFFFAOYSA-N 0.000 claims 1
- 229920001577 copolymer Polymers 0.000 claims 1
- VCJMYUPGQJHHFU-UHFFFAOYSA-N iron(III) nitrate Inorganic materials [Fe+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O VCJMYUPGQJHHFU-UHFFFAOYSA-N 0.000 claims 1
- IIPYXGDZVMZOAP-UHFFFAOYSA-N lithium nitrate Inorganic materials [Li+].[O-][N+]([O-])=O IIPYXGDZVMZOAP-UHFFFAOYSA-N 0.000 claims 1
- 239000011591 potassium Substances 0.000 claims 1
- VWDWKYIASSYTQR-UHFFFAOYSA-N sodium nitrate Inorganic materials [Na+].[O-][N+]([O-])=O VWDWKYIASSYTQR-UHFFFAOYSA-N 0.000 claims 1
- 150000002902 organometallic compounds Chemical class 0.000 abstract description 4
- 239000008204 material by function Substances 0.000 abstract description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 16
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 14
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 12
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 8
- 239000002184 metal Substances 0.000 description 8
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 8
- 239000007983 Tris buffer Substances 0.000 description 7
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 6
- 238000005121 nitriding Methods 0.000 description 6
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 5
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 5
- 239000007858 starting material Substances 0.000 description 5
- QPFMBZIOSGYJDE-UHFFFAOYSA-N 1,1,2,2-tetrachloroethane Chemical compound ClC(Cl)C(Cl)Cl QPFMBZIOSGYJDE-UHFFFAOYSA-N 0.000 description 4
- VQGHOUODWALEFC-UHFFFAOYSA-N 2-phenylpyridine Chemical compound C1=CC=CC=C1C1=CC=CC=N1 VQGHOUODWALEFC-UHFFFAOYSA-N 0.000 description 4
- IAZDPXIOMUYVGZ-WFGJKAKNSA-N Dimethyl sulfoxide Chemical compound [2H]C([2H])([2H])S(=O)C([2H])([2H])[2H] IAZDPXIOMUYVGZ-WFGJKAKNSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- JFDZBHWFFUWGJE-UHFFFAOYSA-N benzonitrile Chemical compound N#CC1=CC=CC=C1 JFDZBHWFFUWGJE-UHFFFAOYSA-N 0.000 description 4
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Substances OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 229910002651 NO3 Inorganic materials 0.000 description 3
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 125000005337 azoxy group Chemical group [N+]([O-])(=N*)* 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000001273 butane Substances 0.000 description 3
- 238000011097 chromatography purification Methods 0.000 description 3
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 3
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 3
- 239000002244 precipitate Substances 0.000 description 3
- 239000012429 reaction media Substances 0.000 description 3
- 239000011541 reaction mixture Substances 0.000 description 3
- 238000001953 recrystallisation Methods 0.000 description 3
- 238000006722 reduction reaction Methods 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- CXWXQJXEFPUFDZ-UHFFFAOYSA-N tetralin Chemical compound C1=CC=C2CCCCC2=C1 CXWXQJXEFPUFDZ-UHFFFAOYSA-N 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 2
- QPUYECUOLPXSFR-UHFFFAOYSA-N 1-methylnaphthalene Chemical compound C1=CC=C2C(C)=CC=CC2=C1 QPUYECUOLPXSFR-UHFFFAOYSA-N 0.000 description 2
- FSEXLNMNADBYJU-UHFFFAOYSA-N 2-phenylquinoline Chemical compound C1=CC=CC=C1C1=CC=C(C=CC=C2)C2=N1 FSEXLNMNADBYJU-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 2
- 238000005481 NMR spectroscopy Methods 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- GQPLMRYTRLFLPF-UHFFFAOYSA-N Nitrous Oxide Chemical compound [O-][N+]#N GQPLMRYTRLFLPF-UHFFFAOYSA-N 0.000 description 2
- KYQCOXFCLRTKLS-UHFFFAOYSA-N Pyrazine Chemical compound C1=CN=CC=N1 KYQCOXFCLRTKLS-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical class [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 150000008064 anhydrides Chemical class 0.000 description 2
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 2
- 150000007942 carboxylates Chemical class 0.000 description 2
- 229960001701 chloroform Drugs 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- 229940052308 general anesthetics halogenated hydrocarbons Drugs 0.000 description 2
- 150000008282 halocarbons Chemical class 0.000 description 2
- 150000002466 imines Chemical class 0.000 description 2
- 238000010348 incorporation Methods 0.000 description 2
- 239000000543 intermediate Substances 0.000 description 2
- 150000002504 iridium compounds Chemical class 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 150000002823 nitrates Chemical class 0.000 description 2
- 150000002828 nitro derivatives Chemical class 0.000 description 2
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 230000005693 optoelectronics Effects 0.000 description 2
- 238000006053 organic reaction Methods 0.000 description 2
- SIOXPEMLGUPBBT-UHFFFAOYSA-N picolinic acid Chemical compound OC(=O)C1=CC=CC=N1 SIOXPEMLGUPBBT-UHFFFAOYSA-N 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- HHVIBTZHLRERCL-UHFFFAOYSA-N sulfonyldimethane Chemical compound CS(C)(=O)=O HHVIBTZHLRERCL-UHFFFAOYSA-N 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- HTDIUWINAKAPER-UHFFFAOYSA-N trimethylarsine Chemical compound C[As](C)C HTDIUWINAKAPER-UHFFFAOYSA-N 0.000 description 2
- YWWDBCBWQNCYNR-UHFFFAOYSA-N trimethylphosphine Chemical compound CP(C)C YWWDBCBWQNCYNR-UHFFFAOYSA-N 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- BWHDROKFUHTORW-UHFFFAOYSA-N tritert-butylphosphane Chemical compound CC(C)(C)P(C(C)(C)C)C(C)(C)C BWHDROKFUHTORW-UHFFFAOYSA-N 0.000 description 2
- DJBWYWDKHVKANE-BYPYZUCNSA-N (2s)-2-(2,2-dimethylhydrazinyl)propanoic acid Chemical compound OC(=O)[C@H](C)NN(C)C DJBWYWDKHVKANE-BYPYZUCNSA-N 0.000 description 1
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 1
- XGCDBGRZEKYHNV-UHFFFAOYSA-N 1,1-bis(diphenylphosphino)methane Chemical compound C=1C=CC=CC=1P(C=1C=CC=CC=1)CP(C=1C=CC=CC=1)C1=CC=CC=C1 XGCDBGRZEKYHNV-UHFFFAOYSA-N 0.000 description 1
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- HNFHVPDEAVTSAR-UHFFFAOYSA-N 1,5-diphenylpentane-2,4-dione Chemical compound C=1C=CC=CC=1CC(=O)CC(=O)CC1=CC=CC=C1 HNFHVPDEAVTSAR-UHFFFAOYSA-N 0.000 description 1
- KHMYIIPFUJCUEK-UHFFFAOYSA-N 1-diethylphosphanylethyl(diethyl)phosphane Chemical compound CCP(CC)C(C)P(CC)CC KHMYIIPFUJCUEK-UHFFFAOYSA-N 0.000 description 1
- TZBZZWBYDXSQTP-UHFFFAOYSA-N 1-dimethylphosphanylethyl(dimethyl)phosphane Chemical compound CP(C)C(C)P(C)C TZBZZWBYDXSQTP-UHFFFAOYSA-N 0.000 description 1
- UAXNXOMKCGKNCI-UHFFFAOYSA-N 1-diphenylphosphanylethyl(diphenyl)phosphane Chemical compound C=1C=CC=CC=1P(C=1C=CC=CC=1)C(C)P(C=1C=CC=CC=1)C1=CC=CC=C1 UAXNXOMKCGKNCI-UHFFFAOYSA-N 0.000 description 1
- JUXXCHAGQCBNTI-UHFFFAOYSA-N 1-n,1-n,2-n,2-n-tetramethylpropane-1,2-diamine Chemical compound CN(C)C(C)CN(C)C JUXXCHAGQCBNTI-UHFFFAOYSA-N 0.000 description 1
- CVBUKMMMRLOKQR-UHFFFAOYSA-N 1-phenylbutane-1,3-dione Chemical compound CC(=O)CC(=O)C1=CC=CC=C1 CVBUKMMMRLOKQR-UHFFFAOYSA-N 0.000 description 1
- NHQDOLFRKUFOTA-UHFFFAOYSA-N 2,3,4-triphenylarsinine Chemical compound C1(=CC=CC=C1)C1=C(C(=[As]C=C1)C1=CC=CC=C1)C1=CC=CC=C1 NHQDOLFRKUFOTA-UHFFFAOYSA-N 0.000 description 1
- TXSVGHNFJXCOOD-UHFFFAOYSA-N 2-diethylphosphanylpropan-2-yl(diethyl)phosphane Chemical compound C(C)P(CC)C(C)(C)P(CC)CC TXSVGHNFJXCOOD-UHFFFAOYSA-N 0.000 description 1
- BUOTXFKBFYRTHP-UHFFFAOYSA-N 2-dimethylphosphanylpropan-2-yl(dimethyl)phosphane Chemical compound CP(C)C(C)(C)P(C)C BUOTXFKBFYRTHP-UHFFFAOYSA-N 0.000 description 1
- LRLQQERNMXHASR-UHFFFAOYSA-N 2-diphenylphosphanylpropan-2-yl(diphenyl)phosphane Chemical compound C=1C=CC=CC=1P(C=1C=CC=CC=1)C(C)(C)P(C=1C=CC=CC=1)C1=CC=CC=C1 LRLQQERNMXHASR-UHFFFAOYSA-N 0.000 description 1
- SDTMFDGELKWGFT-UHFFFAOYSA-N 2-methylpropan-2-olate Chemical compound CC(C)(C)[O-] SDTMFDGELKWGFT-UHFFFAOYSA-N 0.000 description 1
- IMBXXKBLDOWGPI-UHFFFAOYSA-N 2-n,3-n-bis(2,6-ditert-butylphenyl)butane-2,3-diimine Chemical compound CC(C)(C)C=1C=CC=C(C(C)(C)C)C=1N=C(C)C(C)=NC1=C(C(C)(C)C)C=CC=C1C(C)(C)C IMBXXKBLDOWGPI-UHFFFAOYSA-N 0.000 description 1
- KJMMITFGLXLELL-UHFFFAOYSA-N 2-n,3-n-bis(2-methylphenyl)butane-2,3-diimine Chemical compound C=1C=CC=C(C)C=1N=C(C)C(C)=NC1=CC=CC=C1C KJMMITFGLXLELL-UHFFFAOYSA-N 0.000 description 1
- YVZSYWSEFSXJMH-UHFFFAOYSA-N 2-n,3-n-diethylbutane-2,3-diimine Chemical compound CCN=C(C)C(C)=NCC YVZSYWSEFSXJMH-UHFFFAOYSA-N 0.000 description 1
- QTGRLXCDAWOXPD-UHFFFAOYSA-N 2-n,3-n-dimethylbutane-2,3-diimine Chemical compound CN=C(C)C(C)=NC QTGRLXCDAWOXPD-UHFFFAOYSA-N 0.000 description 1
- KLYTUKWIWXAUFO-UHFFFAOYSA-N 2-n,3-n-diphenylbutane-2,3-diimine Chemical compound C=1C=CC=CC=1N=C(C)C(C)=NC1=CC=CC=C1 KLYTUKWIWXAUFO-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- ROFVEXUMMXZLPA-UHFFFAOYSA-N Bipyridyl Chemical compound N1=CC=CC=C1C1=CC=CC=N1 ROFVEXUMMXZLPA-UHFFFAOYSA-N 0.000 description 1
- 238000006443 Buchwald-Hartwig cross coupling reaction Methods 0.000 description 1
- KXDHJXZQYSOELW-UHFFFAOYSA-N Carbamic acid Chemical class NC(O)=O KXDHJXZQYSOELW-UHFFFAOYSA-N 0.000 description 1
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- 239000004471 Glycine Substances 0.000 description 1
- QNAYBMKLOCPYGJ-REOHCLBHSA-N L-alanine Chemical compound C[C@H](N)C(O)=O QNAYBMKLOCPYGJ-REOHCLBHSA-N 0.000 description 1
- KWYHDKDOAIKMQN-UHFFFAOYSA-N N,N,N',N'-tetramethylethylenediamine Chemical compound CN(C)CCN(C)C KWYHDKDOAIKMQN-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- FFDGPVCHZBVARC-UHFFFAOYSA-N N,N-dimethylglycine Chemical compound CN(C)CC(O)=O FFDGPVCHZBVARC-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical compound [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- PCNDJXKNXGMECE-UHFFFAOYSA-N Phenazine Natural products C1=CC=CC2=NC3=CC=CC=C3N=C21 PCNDJXKNXGMECE-UHFFFAOYSA-N 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- WTKZEGDFNFYCGP-UHFFFAOYSA-N Pyrazole Chemical compound C=1C=NNC=1 WTKZEGDFNFYCGP-UHFFFAOYSA-N 0.000 description 1
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 1
- ZMZDMBWJUHKJPS-UHFFFAOYSA-M Thiocyanate anion Chemical compound [S-]C#N ZMZDMBWJUHKJPS-UHFFFAOYSA-M 0.000 description 1
- DTQVDTLACAAQTR-UHFFFAOYSA-M Trifluoroacetate Chemical compound [O-]C(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-M 0.000 description 1
- DGEZNRSVGBDHLK-UHFFFAOYSA-N [1,10]phenanthroline Chemical compound C1=CN=C2C3=NC=CC=C3C=CC2=C1 DGEZNRSVGBDHLK-UHFFFAOYSA-N 0.000 description 1
- 238000000862 absorption spectrum Methods 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 235000004279 alanine Nutrition 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- GUNJVIDCYZYFGV-UHFFFAOYSA-K antimony trifluoride Chemical compound F[Sb](F)F GUNJVIDCYZYFGV-UHFFFAOYSA-K 0.000 description 1
- 239000000010 aprotic solvent Substances 0.000 description 1
- 239000008346 aqueous phase Substances 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- RBFQJDQYXXHULB-UHFFFAOYSA-N arsane Chemical class [AsH3] RBFQJDQYXXHULB-UHFFFAOYSA-N 0.000 description 1
- JCMGUODNZMETBM-UHFFFAOYSA-N arsenic trifluoride Chemical compound F[As](F)F JCMGUODNZMETBM-UHFFFAOYSA-N 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 125000000609 carbazolyl group Chemical class C1(=CC=CC=2C3=CC=CC=C3NC12)* 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 150000003857 carboxamides Chemical class 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- XNEQAVYOCNWYNZ-UHFFFAOYSA-L copper;dinitrite Chemical compound [Cu+2].[O-]N=O.[O-]N=O XNEQAVYOCNWYNZ-UHFFFAOYSA-L 0.000 description 1
- 239000012043 crude product Substances 0.000 description 1
- XLJMAIOERFSOGZ-UHFFFAOYSA-M cyanate Chemical compound [O-]C#N XLJMAIOERFSOGZ-UHFFFAOYSA-M 0.000 description 1
- YMHQVDAATAEZLO-UHFFFAOYSA-N cyclohexane-1,1-diamine Chemical compound NC1(N)CCCCC1 YMHQVDAATAEZLO-UHFFFAOYSA-N 0.000 description 1
- XYZMOVWWVXBHDP-UHFFFAOYSA-N cyclohexyl isocyanide Chemical compound [C-]#[N+]C1CCCCC1 XYZMOVWWVXBHDP-UHFFFAOYSA-N 0.000 description 1
- 238000001212 derivatisation Methods 0.000 description 1
- 150000004985 diamines Chemical class 0.000 description 1
- YPKCXURFKBPRAY-UHFFFAOYSA-N diethylphosphanylmethyl(diethyl)phosphane Chemical compound CCP(CC)CP(CC)CC YPKCXURFKBPRAY-UHFFFAOYSA-N 0.000 description 1
- QKIUAMUSENSFQQ-UHFFFAOYSA-N dimethylazanide Chemical compound C[N-]C QKIUAMUSENSFQQ-UHFFFAOYSA-N 0.000 description 1
- 108700003601 dimethylglycine Proteins 0.000 description 1
- MRNJHNUEBDGNEL-UHFFFAOYSA-N dimethylphosphanylmethyl(dimethyl)phosphane Chemical compound CP(C)CP(C)C MRNJHNUEBDGNEL-UHFFFAOYSA-N 0.000 description 1
- CANPJTMVPQIKCB-UHFFFAOYSA-N ditert-butyl(1-ditert-butylphosphanylethyl)phosphane Chemical compound CC(C)(C)P(C(C)(C)C)C(C)P(C(C)(C)C)C(C)(C)C CANPJTMVPQIKCB-UHFFFAOYSA-N 0.000 description 1
- WBMJFMFJCWPAIT-UHFFFAOYSA-N ditert-butyl(ditert-butylphosphanylmethyl)phosphane Chemical compound CC(C)(C)P(C(C)(C)C)CP(C(C)(C)C)C(C)(C)C WBMJFMFJCWPAIT-UHFFFAOYSA-N 0.000 description 1
- 150000004662 dithiols Chemical class 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000007336 electrophilic substitution reaction Methods 0.000 description 1
- 238000000295 emission spectrum Methods 0.000 description 1
- DNJIEGIFACGWOD-UHFFFAOYSA-N ethanethiol Chemical compound CCS DNJIEGIFACGWOD-UHFFFAOYSA-N 0.000 description 1
- HHFAWKCIHAUFRX-UHFFFAOYSA-N ethoxide Chemical compound CC[O-] HHFAWKCIHAUFRX-UHFFFAOYSA-N 0.000 description 1
- XYIBRDXRRQCHLP-UHFFFAOYSA-N ethyl acetoacetate Chemical compound CCOC(=O)CC(C)=O XYIBRDXRRQCHLP-UHFFFAOYSA-N 0.000 description 1
- 238000007306 functionalization reaction Methods 0.000 description 1
- JVZRCNQLWOELDU-UHFFFAOYSA-N gamma-Phenylpyridine Natural products C1=CC=CC=C1C1=CC=NC=C1 JVZRCNQLWOELDU-UHFFFAOYSA-N 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 238000004770 highest occupied molecular orbital Methods 0.000 description 1
- ZMZDMBWJUHKJPS-UHFFFAOYSA-N hydrogen thiocyanate Natural products SC#N ZMZDMBWJUHKJPS-UHFFFAOYSA-N 0.000 description 1
- JBFYUZGYRGXSFL-UHFFFAOYSA-N imidazolide Chemical compound C1=C[N-]C=N1 JBFYUZGYRGXSFL-UHFFFAOYSA-N 0.000 description 1
- MILUBEOXRNEUHS-UHFFFAOYSA-N iridium(3+) Chemical compound [Ir+3] MILUBEOXRNEUHS-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- 150000002527 isonitriles Chemical class 0.000 description 1
- 150000002540 isothiocyanates Chemical class 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 238000004768 lowest unoccupied molecular orbital Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- LSDPWZHWYPCBBB-UHFFFAOYSA-M methanethiolate Chemical compound [S-]C LSDPWZHWYPCBBB-UHFFFAOYSA-M 0.000 description 1
- NBTOZLQBSIZIKS-UHFFFAOYSA-N methoxide Chemical compound [O-]C NBTOZLQBSIZIKS-UHFFFAOYSA-N 0.000 description 1
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 1
- XPRDLFNPXBBFOP-UHFFFAOYSA-N n,n'-bis(2,6-ditert-butylphenyl)ethane-1,2-diimine Chemical compound CC(C)(C)C1=CC=CC(C(C)(C)C)=C1N=CC=NC1=C(C(C)(C)C)C=CC=C1C(C)(C)C XPRDLFNPXBBFOP-UHFFFAOYSA-N 0.000 description 1
- DNQDRIBUHNACIY-UHFFFAOYSA-N n,n'-bis(2-methylphenyl)ethane-1,2-diimine Chemical compound CC1=CC=CC=C1N=CC=NC1=CC=CC=C1C DNQDRIBUHNACIY-UHFFFAOYSA-N 0.000 description 1
- FVHYOVFCJQRHGS-UHFFFAOYSA-N n,n'-diethylethane-1,2-diimine Chemical compound CCN=CC=NCC FVHYOVFCJQRHGS-UHFFFAOYSA-N 0.000 description 1
- YRHYXWGIOLWSEI-UHFFFAOYSA-N n,n'-dimethylethane-1,2-diimine Chemical compound CN=CC=NC YRHYXWGIOLWSEI-UHFFFAOYSA-N 0.000 description 1
- QAHVEIHCWHKZET-UHFFFAOYSA-N n,n'-diphenylethane-1,2-diimine Chemical compound C=1C=CC=CC=1N=CC=NC1=CC=CC=C1 QAHVEIHCWHKZET-UHFFFAOYSA-N 0.000 description 1
- 150000002826 nitrites Chemical class 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 239000001272 nitrous oxide Substances 0.000 description 1
- 239000012074 organic phase Substances 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- MQZFZDIZKWNWFX-UHFFFAOYSA-N osmium(2+) Chemical class [Os+2] MQZFZDIZKWNWFX-UHFFFAOYSA-N 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-M phenolate Chemical compound [O-]C1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-M 0.000 description 1
- 229940031826 phenolate Drugs 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- SUSQOBVLVYHIEX-UHFFFAOYSA-N phenylacetonitrile Chemical compound N#CCC1=CC=CC=C1 SUSQOBVLVYHIEX-UHFFFAOYSA-N 0.000 description 1
- 150000003003 phosphines Chemical class 0.000 description 1
- AQSJGOWTSHOLKH-UHFFFAOYSA-N phosphite(3-) Chemical class [O-]P([O-])[O-] AQSJGOWTSHOLKH-UHFFFAOYSA-N 0.000 description 1
- WKFBZNUBXWCCHG-UHFFFAOYSA-N phosphorus trifluoride Chemical compound FP(F)F WKFBZNUBXWCCHG-UHFFFAOYSA-N 0.000 description 1
- 239000004323 potassium nitrate Substances 0.000 description 1
- 235000010333 potassium nitrate Nutrition 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- SUVIGLJNEAMWEG-UHFFFAOYSA-N propane-1-thiol Chemical compound CCCS SUVIGLJNEAMWEG-UHFFFAOYSA-N 0.000 description 1
- FVSKHRXBFJPNKK-UHFFFAOYSA-N propionitrile Chemical compound CCC#N FVSKHRXBFJPNKK-UHFFFAOYSA-N 0.000 description 1
- AOHJOMMDDJHIJH-UHFFFAOYSA-N propylenediamine Chemical compound CC(N)CN AOHJOMMDDJHIJH-UHFFFAOYSA-N 0.000 description 1
- PBMFSQRYOILNGV-UHFFFAOYSA-N pyridazine Chemical compound C1=CC=NN=C1 PBMFSQRYOILNGV-UHFFFAOYSA-N 0.000 description 1
- 238000006862 quantum yield reaction Methods 0.000 description 1
- LOAUVZALPPNFOQ-UHFFFAOYSA-N quinaldic acid Chemical compound C1=CC=CC2=NC(C(=O)O)=CC=C21 LOAUVZALPPNFOQ-UHFFFAOYSA-N 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- BALRIWPTGHDDFF-UHFFFAOYSA-N rhodium Chemical compound [Rh].[Rh] BALRIWPTGHDDFF-UHFFFAOYSA-N 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- YAYGSLOSTXKUBW-UHFFFAOYSA-N ruthenium(2+) Chemical compound [Ru+2] YAYGSLOSTXKUBW-UHFFFAOYSA-N 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- OUULRIDHGPHMNQ-UHFFFAOYSA-N stibane Chemical class [SbH3] OUULRIDHGPHMNQ-UHFFFAOYSA-N 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- UTLODFUDVKXUIW-UHFFFAOYSA-N tert-butyl(2-tert-butylphosphanylpropan-2-yl)phosphane Chemical compound C(C)(C)(C)PC(C)(C)PC(C)(C)C UTLODFUDVKXUIW-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- PMZLFYBZWYRRAZ-UHFFFAOYSA-N tricyclohexylarsane Chemical compound C1CCCCC1[As](C1CCCCC1)C1CCCCC1 PMZLFYBZWYRRAZ-UHFFFAOYSA-N 0.000 description 1
- WLPUWLXVBWGYMZ-UHFFFAOYSA-N tricyclohexylphosphine Chemical compound C1CCCCC1P(C1CCCCC1)C1CCCCC1 WLPUWLXVBWGYMZ-UHFFFAOYSA-N 0.000 description 1
- AVYPTBDUFIEJDP-UHFFFAOYSA-N tricyclohexylstibane Chemical compound C1CCCCC1[Sb](C1CCCCC1)C1CCCCC1 AVYPTBDUFIEJDP-UHFFFAOYSA-N 0.000 description 1
- BDZBKCUKTQZUTL-UHFFFAOYSA-N triethyl phosphite Chemical compound CCOP(OCC)OCC BDZBKCUKTQZUTL-UHFFFAOYSA-N 0.000 description 1
- CYTQBVOFDCPGCX-UHFFFAOYSA-N trimethyl phosphite Chemical compound COP(OC)OC CYTQBVOFDCPGCX-UHFFFAOYSA-N 0.000 description 1
- PORFVJURJXKREL-UHFFFAOYSA-N trimethylstibine Chemical compound C[Sb](C)C PORFVJURJXKREL-UHFFFAOYSA-N 0.000 description 1
- HVYVMSPIJIWUNA-UHFFFAOYSA-N triphenylstibine Chemical compound C1=CC=CC=C1[Sb](C=1C=CC=CC=1)C1=CC=CC=C1 HVYVMSPIJIWUNA-UHFFFAOYSA-N 0.000 description 1
- QZBJYTDDWVXFDF-UHFFFAOYSA-N tris(2,3,4,5,6-pentafluorophenyl)arsane Chemical compound FC1=C(F)C(F)=C(F)C(F)=C1[As](C=1C(=C(F)C(F)=C(F)C=1F)F)C1=C(F)C(F)=C(F)C(F)=C1F QZBJYTDDWVXFDF-UHFFFAOYSA-N 0.000 description 1
- FQLSDFNKTNBQLC-UHFFFAOYSA-N tris(2,3,4,5,6-pentafluorophenyl)phosphane Chemical compound FC1=C(F)C(F)=C(F)C(F)=C1P(C=1C(=C(F)C(F)=C(F)C=1F)F)C1=C(F)C(F)=C(F)C(F)=C1F FQLSDFNKTNBQLC-UHFFFAOYSA-N 0.000 description 1
- QYWFCUVQKBNIRJ-UHFFFAOYSA-N tris(2,3,4,5,6-pentafluorophenyl)stibane Chemical compound FC1=C(F)C(F)=C(F)C(F)=C1[Sb](C=1C(=C(F)C(F)=C(F)C=1F)F)C1=C(F)C(F)=C(F)C(F)=C1F QYWFCUVQKBNIRJ-UHFFFAOYSA-N 0.000 description 1
- NZJQTVDLVPHKGY-UHFFFAOYSA-N tritert-butylstibane Chemical compound CC(C)(C)[Sb](C(C)(C)C)C(C)(C)C NZJQTVDLVPHKGY-UHFFFAOYSA-N 0.000 description 1
- 230000007306 turnover Effects 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F15/00—Compounds containing elements of Groups 8, 9, 10 or 18 of the Periodic Table
- C07F15/0006—Compounds containing elements of Groups 8, 9, 10 or 18 of the Periodic Table compounds of the platinum group
- C07F15/0073—Rhodium compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F15/00—Compounds containing elements of Groups 8, 9, 10 or 18 of the Periodic Table
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F15/00—Compounds containing elements of Groups 8, 9, 10 or 18 of the Periodic Table
- C07F15/0006—Compounds containing elements of Groups 8, 9, 10 or 18 of the Periodic Table compounds of the platinum group
- C07F15/0033—Iridium compounds
Definitions
- active components functional materials
- organic electro-luminescent devices based on organic components for a general description of the structure, cf.
- Organo-rhodium and iridium compounds are of particular interest. With these, taking into account the rhodium or iridium price, it is of crucial importance that efficient access to the corresponding derivatives is made possible here.
- Mono-, di-, tri-, tetra- and -hexa-nitro-functionalized bis- and tris-orthometallized organo-rhodium and organo-iridium compounds [according to compounds (1) to (32) and (1a) to (8a)], which are the subject of the present invention, will be central key building blocks for the production of highly efficient triplet emitters, since the nitro function can be converted into a large number of methods with the aid of common methods described in the literature Functions (eg the amino, nitroso, hydroxylamino, azo and the azoxy function) can be converted.
- photovoltaic devices such as organic photodetectors or organic solar cells, e.g. as electron acceptor or transport material.
- OFTs Organic Thin Film Transistor
- Some of the starting compounds (33) to (64) can be prepared using conventional literature methods, but in particular also according to the published or unpublished application WO 02/060910, DE 10223337.3, WO 02/068435, DE 10155064.2, DE 10223337.3, DE 10215010.9 and DE 10238903.9.
- the selective mono-, di-, tri-, tetra-, and hexa-nitration of bis- and tris-orthomatized rhodium and iridium compounds is unexpected and is not known in this form. It presumably results from the activation which the position (s) on the coordinated phenyl ring, which is para or ortho to the rhodium or iridium atom, experiences through this.
- the unexpectedly high activity of these positions in relation to electrophilic substitution, here nitriding is exploited in a targeted manner through the use of mild nitration agents.
- there is a high selectivity of the nitration of the position para to the metal compared to the also possible ortho substitution, i.e. in a given molecule, all para positions are always nitrided before, under suitable conditions, the nitration takes place in the ortho positions.
- the compounds obtained - if appropriate after recrystallization - but without extensive chromatographic purification, are obtained in very good purities of> 99% by NMR or HPLC. This is for use in opto-electronic Components, or the use as intermediates for the representation of corresponding connections essential.
- the present invention relates to the tris-orthometalated compounds (1) to (8) according to scheme 1, scheme 1:
- Connections (7) where the symbols and indices have the following meaning:
- M Rh, Ir; YO, S, Se, NR 1 ; R is the same or different on each occurrence H, F, Cl, Br, CN, a straight-chain or branched or cyclic alkyl or alkoxy group with 1 to 20 C atoms, one or more non-adjacent CH 2 groups being represented by -O- , -SiR 1 2 -, -S-, -NR 1 - or -CONR 1 - can be replaced and where one or more H atoms can be replaced by F, or an aryl or
- Heteroaryl group with 4 to 14 C atoms which can be substituted by one or more non-aromatic radicals R, where several substituents R, both on the same ring and on the two different rings, together in turn form another aliphatic or aromatic, mono- or can span polycyclic ring system;
- T is the same or different with each occurrence F, Cl, Br, CN, a straight-chain or branched or cyclic alkyl or alkoxy group with 1 to 20 C atoms, one or more non-adjacent CH 2 groups being represented by -O-, - SiR 1 2 -, -S-, -NR 1 - or -CONR 1 - can be replaced and where one or more H atoms can be replaced by F, or an aryl or
- Heteroaryl group with 4 to 14 C atoms which can be substituted by one or more non-aromatic radicals R, where several substituents R, both on the same ring and on the two different rings, together in turn form another aliphatic or aromatic, mono- or can span polycyclic ring system;
- R 1 is the same or different on each occurrence, H or an aliphatic or aromatic hydrocarbon radical having 1 to 20 C atoms; a is 0, 1, 2, 3 or 4, preferably 0, 1 or 2; b is 0, 1, 2 or 3, preferably 0 or 1; c is 0, 1 or 2; m is 1 or 2; n is 1, 2 or 3.
- the present invention also relates to the heteropleptic, bis-orthometalated compounds (9) to (16) according to Scheme 3,
- Z is F, Cl, Br, I, OR 1 , SR 1 , N (R 1 ) 2 ;
- R is the same or different on each occurrence H, F, Cl, Br, CN, a straight-chain or branched or cyclic alkyl or alkoxy group with 1 to 20 C atoms, one or more non-adjacent CH 2 groups being represented by -O- , -SiR 1 2 -, -S-, -NR 1 -, or -CONR 2 - can be replaced and one or more H atoms can be replaced by F, or an aryl or heteroaryl group with 4 to 14 C- Atoms which can be substituted by one or more non-aromatic radicals R, where a plurality of substituents R, both on the same ring and on the two different rings together, can in turn span another aliphatic or aromatic, mono- or polycyclic ring system;
- T is the same or different with each occurrence F, Cl, Br, CN, a straight-chain or branched or cyclic alkyl or alkoxy group with 1 to 20 C atoms, one or more non-adjacent CH 2 groups being represented by -O-, - SiR 1 2 -, -S-, -NR 1 -, or -CONR 2 - can be replaced and one or more H atoms can be replaced by F, or an aryl or heteroaryl group with 4 to 14 C atoms, which can be substituted by one or more non-aromatic radicals R, where a plurality of substituents R, both on the same ring and on the two different rings, can in turn span another aliphatic or aromatic, mono- or polycyclic ring system;
- R is the same or different on each occurrence H or an aliphatic or aromatic hydrocarbon radical having 1 to 20 carbon atoms, a is 0, 1, 2, 3 or 4, preferably 0, 1 or 2; b is 0, 1, 2 or 3, preferably 0 or 1; c is 0, 1 or 2; p is 1 or 2.
- the present invention also relates to the heteroleptic, bis-orthometalated compounds (17) to (32) according to Scheme 4:
- R is the same or different on each occurrence H, F, Cl, Br, CN, a straight-chain or branched or cyclic alkyl or alkoxy group with 1 to 20 C atoms, one or more non-adjacent CH 2 groups being represented by -O- , -S-, -NR 1 -, or -CONR 2 - can be replaced and where one or more H atoms can be replaced by F, or an aryl or heteroaryl group with 4 to 14 C atoms, which can be replaced by one or several, non-aromatic radicals R can be substituted, wherein several substituents R, both on the same ring and on the two different rings together, can in turn span another aliphatic or aromatic, mono- or polycyclic ring system;
- T is the same or different with each occurrence F, Cl, Br, CN, a straight-chain or branched or cyclic alkyl or alkoxy group with 1 to 20 C atoms, one or more non-adjacent CH 2 groups being represented by -O-, - SiR 1 2 -, -S-, -NR 1 -, or -CONR 2 - can be replaced and one or more H atoms can be replaced by F, or an aryl or heteroaryl group with 4 to 14 C atoms, which can be substituted by one or more non-aromatic radicals R, where a plurality of substituents R, both on the same ring and on the two different rings, can in turn span another aliphatic or aromatic, mono- or polycyclic ring system;
- R 1 is the same or different at each occurrence H or an aliphatic or aromatic hydrocarbon radical with 1 to 20 C atoms;
- Li is a neutral, monodentate ligand;
- L 2 is a monoanionic, monodentate ligand;
- L 3 is a neutral or mono- or dianionic bidentate ligand;
- a is 0, 1, 2, 3 or 4, preferably 0, 1 or 2;
- b is 0, 1, 2 or 3, preferably 0 or 1;
- m is 0, 1 or 2;
- p is 1 or 2.
- Neutral, monodentate ligands LT are carbon monoxide, isonitriles such as e.g. terf-butyl-isonitrile, cyclohexylisonitrile, adamantylisonitrile, amines such as e.g. Trimethylamine, triethylamine, morpholine, phosphines such as e.g. Trifluorophosphine, trimethylphosphine, tricyclohexylphosphine, tri-tert-butylphosphine, triphenylphosphine, tris (pentafluorophenyl) phosphine, phosphites such as e.g.
- arsines such as e.g. Trifluoroarsine, trimethylarsine, tricyclohexylarsine, tri-terf-butylarsine, triphenylarsinine, tri
- Monoanionic, monodentate ligands L 2 are the halides F, Cl, Br, I and cyanide, cyanate, isocyanate, thiocyanate, isothiocyanate, alcoholates such as, for example, methanolate, ethanolate, propanolate, / so-propanolate, tert-butoxide, Phenolate, thioalcoholates such as methanethiolate, ethanethiolate, propanethiolate / so-propanethiolate, ter.-thiobutylate, thiophenolate, amides such as dimethylamide, diethyla id, di-zso-propylamide, morpholide, carboxylates such as acetate, trifluoroacetate and propionate, benzionate anionic, nitrogen-containing heterocycles such as pyrrolid, imidazolide, pyrazolide.
- Neutral or mono- or dianionic bidentate ligands L 3 are diamines such as, for. B. ethylenediamine, N, N, N ' , N ' tetramethylethylenediamine, propylenediamine, N, N, N ' , N ' tetramethylpropylenediamine, cis, trans diaminocyclohexane, cis, trans NNN'.N'-tetramethyldiaminocyclohexane, Imines such as 2 [(1 - (phenylimino) ethyl] pyridine, 2 [(1 - (2-methylphenylimino) ethyl] pyridine, 2 [(1- (2,6-di- / isopropylphenylimino) ethyl] pyhdin, 2 [(1 - (methylimino) ethyl] pyridine, 2 [(1- (ethyl
- the present invention further provides processes for the preparation of the compounds (1) to (32) by reacting the compounds (33) to (64) according to Scheme 5:
- M and the radicals and indices Y, Z, R, T, R 1 , Li, L 2 , L 3 , a, b, c, m and p have the meanings given above, with nitration agents.
- the compounds (1) to (32) and (1a) to (8a) according to the invention are particularly notable for the following properties:
- nitro grouping has a variety of common organic reactions in a variety of functions such as the amino, nitroso, hydroxylamino, azo, azoxy function, to name just a few examples, can be converted. This enables not only tailoring of the physical, electrical and optical properties of these rhodium and iridium building blocks, but also incorporation of these into a large number of polymers.
- the nitro group takes part in the conjugated system of the rhodium or iridium complexes, so that it has a significant influence on the electrical and optical properties of these compounds.
- the location of the HOMO and LUMO and thus the oxidation and reduction potential, the absorption spectrum, the Emission spectrum, triplet lifetime and triplet quantum yield, to name just a few properties can be influenced in a targeted manner.
- the nitro group also has a high acceptor potential, so that the compounds according to the invention are outstandingly suitable for charge separation. This behavior makes the connections according to the invention, among other things, potential key components in photovoltaic devices.
- Connections (34) Connections (2) Connections (35) Connections (3)
- Nitriding agents according to the invention are nitric acid, optionally in combination with a further acid such as sulfuric acid or phosphoric acid, nitrous oxide, dinitrogen pentoxide, nitronium salts of the type NO 2 A, where A is a suitable inert anion such as BF 4 " , PF 6 “ , SbF 6 “ or CF 3 SO 3 " is alkali or alkaline earth metal nitrates such as lithium, sodium, potassium nitrate, magnesium nitrate, optionally in the presence of an acid such as sulfuric acid, phosphoric acid, acetic acid, propionic acid or trifluoroacetic acid or mixtures thereof and / or a carboxylic acid anhydride such as acetic anhydride or propionic anhydride, transition metal nitrates such as iron (II), iron (III), cobalt (II), cobalt (III), nickel (II) or copper (II) nitrite or nitrate,
- nitration agents according to the invention can be divided into those which selectively nitrate the para positions (corresponds to the 5 ' position according to Scheme 7) and those which pernitrate the ortho and para positions (corresponds to positions 3 ' and 5 ' lead for phenylpyridine ligands and positions 4 'and 5' for the thiophenylpyridines according to Scheme 7).
- the former include dilute nitric acid and stoichiometrically used nitronium salts or the alkali and alkaline earth nitrates in organocarboxylic acids and their anhydrides, especially at temperatures below or equal to room temperature.
- the latter include concentrated nitric acid, optionally in combination with another acid, nitronium salts and also the alkali and alkaline earth metal nitrates in organocarboxylic acids and their anhydrides if they are used in excess of stoichiometric amounts and at temperatures above room temperature.
- Reaction media according to the invention are protic or aprotic, halogen-free or halogenated solvents such as, for example, carboxylic acids such as acetic acid or propionic acid, carboxylic acid anhydrides such as acetic anhydride or propionic anhydride, nitrites such as acetonitrile, propionitrile or benzonitrile, ethers such as diethyl ether, THF or dioxane, with respect to the nitrating agents such as inactivated nitrates such as benzyl nitrile Nitrobenzene or chlorobenzene, sulfones such as dimethyl sulfone or sulfolane, halogenated Hydrocarbons such as dichloromethane, trichloromethane, 1, 1-dichloroethane, 1, 2-dichloroethane, 1, 1, 2,2-tetrachloroethane.
- solvents such as, for example, carboxylic acids
- the reaction is carried out in the temperature range from -78 ° C. to 150 ° C., preferably at -30 ° C. to 100 ° C., very preferably at 0 ° C. to 60 ° C.
- the concentration of the rhodium-containing or iridium-containing starting materials - compounds (33) to (64) - is in the range from 0.0005 mol / l to 2 mol / l, particularly preferably in the range from 0.002 mol / l to 0.1 mol / l.
- the rhodium-containing or iridium-containing educts can be dissolved or suspended in the reaction medium.
- the reaction is carried out within 10 minutes to 100 hours, preferably within 1 h to 40 h.
- the compounds according to the invention obtained in this way can - if appropriate after further functionalization - be used, for example, as co-monomers for producing corresponding conjugated or also partially conjugated or non-conjugated polymers.
- polyfluorenes soluble in organic solvents e.g. according to EP-A-842208 or WO 00/22026
- poly-spirobifluorenes e.g. according to
- EP-894107 poly-para-phenylenes (e.g. according to WO 92/18552), poly-carbazoles or polythiophenes (e.g. according to EP-A-1028136) are polymerized in, both in the polymer chain itself , as well as an end group at the chain end or optionally in side chains of the polymer.
- the compounds of the invention are linked in the polymer as shown in formula (3 '), (4'), (5 '), (6'), (7 ') and / or (8'):
- the compounds of the invention can also be linked in the polymer, as in formula (17 '), (18'), (19 '), (20'), (21 '), (22'), (23 '), (24 '), (25'), (26 '), (27'), (28 '), (29'), (30 '), (31') and / or (32 '):
- the polymers according to the invention are notable for their good solubility of at least 0.1% by weight in organic aprotic solvents, such as aromatic hydrocarbons, e.g. Toluene, xylene, anisole, chlorobenzene, naphthalene, methylnaphthalene, tetralin, such as ethers, e.g. Tetrahydrofuran and dioxane such as halogenated hydrocarbons e.g. Dichloromethane, chloroform, 1, 2-dichloroethane, 1, 1, 2,2-tetrachloroethane, such as carboxamides, e.g. Dimethylformamide, dimethylacetamide and N-methylpyrrolidone.
- organic aprotic solvents such as aromatic hydrocarbons, e.g. Toluene, xylene, anisole, chlorobenzene, naphthalene, methylnaphthalene, tetralin, such as ethers
- nitro-substituted metal complexes according to the invention and the polymers according to the invention which contain nitro-substituted metal complexes according to the invention are used as active components in electronic components, such as, for. B. organic light-emitting diodes (OLEDs), organic integrated circuits (O-ICs), organic field-effect transistors (O-FETs), organic thin-film transistors (O-TFTs), organic solar cells (O-SCs) or organic laser diodes (O -Laser).
- OLEDs organic light-emitting diodes
- O-ICs organic integrated circuits
- O-FETs organic field-effect transistors
- OF-TFTs organic thin-film transistors
- O-SCs organic solar cells
- O-Laser organic laser diodes
- the invention therefore also relates to electronic components, such as. B. organic or polymeric light emitting diodes (OLEDs or PLEDs), organic integrated circuits (O-ICs), organic field-effect transistors (O-FETs), organic thin-film transistors (O-TFTs), organic solar cells (O-SCs) or organic Laser diodes (O-lasers) containing one or more nitro-substituted metal complexes according to the invention or one or more polymers according to the invention which contain one or more nitro-substituted metal complexes according to the invention.
- OLEDs or PLEDs organic integrated circuits
- O-FETs organic field-effect transistors
- OF-TFTs organic thin-film transistors
- O-SCs organic solar cells
- O-lasers organic Laser diodes
- the compounds according to the invention can of course also be further functionalized by common organic reaction types, and can thus be converted into extended low molecular weight Rh or Ir complexes.
- the reduction of the nitro groups to amino, nitroso, hydroxylamino, azo and azoxy functions should be mentioned here as an example.
- microcrystalline precipitate was then filtered off (P4), washed three times with 50 ml of ethanol, recrystallized from DMSO / ethanol and then dried in vacuo (60 ° C., 10 "4 mbar).
- the yield - with a purity of> 99.5% after 1 H-NMR - was 6,693 g - 6,814 g corresponding to 85.0% - 86.6%.
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Electroluminescent Light Sources (AREA)
- Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
- Pyridine Compounds (AREA)
Abstract
Description
Claims
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/532,185 US7589203B2 (en) | 2002-10-26 | 2003-09-25 | Rhodium and iridium complexes |
EP03753454A EP1558619B1 (de) | 2002-10-26 | 2003-09-25 | Rhodium und iridium-komplexe |
DE50309380T DE50309380D1 (de) | 2002-10-26 | 2003-09-25 | Rhodium und iridium-komplexe |
JP2004545782A JP2006507279A (ja) | 2002-10-26 | 2003-09-25 | ロジウムおよびイリジウム錯体。 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10249926A DE10249926A1 (de) | 2002-10-26 | 2002-10-26 | Rhodium- und Iridium-Komplexe |
DE10249926.8 | 2002-10-26 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2004037836A1 true WO2004037836A1 (de) | 2004-05-06 |
Family
ID=32087211
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2003/010652 WO2004037836A1 (de) | 2002-10-26 | 2003-09-25 | Rhodium und iridium-komplexe |
Country Status (7)
Country | Link |
---|---|
US (1) | US7589203B2 (de) |
EP (2) | EP1558619B1 (de) |
JP (1) | JP2006507279A (de) |
KR (1) | KR100989247B1 (de) |
CN (1) | CN1695173A (de) |
DE (3) | DE10249926A1 (de) |
WO (1) | WO2004037836A1 (de) |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2007020952A1 (ja) * | 2005-08-12 | 2007-02-22 | Sumitomo Chemical Company, Limited | 高分子材料およびそれを用いた素子 |
EP1873163A1 (de) | 2006-03-21 | 2008-01-02 | Semiconductor Energy Laboratory Co., Ltd. | Metallorganischer Komplex und lichtemittierendes Element, lichtemittierende Vorrichtung und den metallorganischen Komplex verwendende elektronische Vorrichtung |
EP1923385A1 (de) | 2006-11-20 | 2008-05-21 | Gwangju Institute of Science and Technology | Iridiumkomplex, Carbazolderivate und Copolymer damit |
US7445857B2 (en) | 2004-12-22 | 2008-11-04 | Industrial Technology Research Institute | Organometallic complex and organic electroluminescent devices utilizing the same |
KR100880220B1 (ko) | 2004-10-04 | 2009-01-28 | 엘지디스플레이 주식회사 | 유기 실리콘을 갖는 페닐 피리딘기를 포함하는 이리듐화합물계 발광 화합물 및 이를 발색 재료로서 사용하는유기전계발광소자 |
US7999254B2 (en) | 2008-11-17 | 2011-08-16 | Semiconductor Energy Laboratory Co., Ltd. | Light-emitting element and light-emitting device |
US8101755B2 (en) | 2008-10-23 | 2012-01-24 | Semiconductor Energy Laboratory Co., Ltd. | Organometallic complex including pyrazine derivative |
US8247086B2 (en) | 2005-12-05 | 2012-08-21 | Semiconductor Energy Laboratory Co., Ltd. | Organometallic complex and light-emitting element, light-emitting device and electronic device using the same |
US8889266B2 (en) | 2005-03-17 | 2014-11-18 | Semiconductor Energy Laboratory Co., Ltd. | Organometallic complex, and light-emitting element, light-emitting device and electronic-device using the organometallic complex |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8084145B2 (en) * | 2004-04-02 | 2011-12-27 | Semiconductor Energy Laboratory Co., Ltd. | Organometallic complex, light emitting element using the complex, light emitting device using the element, and electric apparatus using the device |
TWI479008B (zh) * | 2004-07-07 | 2015-04-01 | Universal Display Corp | 穩定且有效之電致發光材料 |
DE102005039064A1 (de) * | 2005-08-18 | 2007-03-01 | Merck Patent Gmbh | Metallkomplexe |
JP5244329B2 (ja) * | 2006-03-21 | 2013-07-24 | 株式会社半導体エネルギー研究所 | 有機金属錯体及び発光材料 |
JP5273910B2 (ja) * | 2006-03-31 | 2013-08-28 | キヤノン株式会社 | 発光素子用有機化合物、発光素子および画像表示装置 |
KR100776826B1 (ko) * | 2006-06-14 | 2007-11-29 | 고려대학교 산학협력단 | 이리듐 착물의 제조방법 |
WO2008143113A1 (en) * | 2007-05-18 | 2008-11-27 | Semiconductor Energy Laboratory Co., Ltd. | Organometallic complex, composition and light emitting element including the organometallic complex |
WO2008149828A1 (en) * | 2007-06-05 | 2008-12-11 | Semiconductor Energy Laboratory Co., Ltd. | Organometallic complex, and light-emitting materia light-emitting element, light-emitting device and electronic device |
JP5271721B2 (ja) * | 2008-01-23 | 2013-08-21 | 株式会社半導体エネルギー研究所 | トリアリールピラジン誘導体の製造方法 |
JP5554075B2 (ja) * | 2009-01-21 | 2014-07-23 | 株式会社半導体エネルギー研究所 | 有機金属錯体 |
US8664383B2 (en) | 2010-10-15 | 2014-03-04 | Semiconductor Energy Laboratory Co., Ltd. | Organometallic complex, and light-emitting element and display device using the organometallic complex |
JP6117618B2 (ja) | 2012-06-01 | 2017-04-19 | 株式会社半導体エネルギー研究所 | 有機金属錯体、発光素子、発光装置、電子機器、及び照明装置 |
US10203333B2 (en) | 2013-06-18 | 2019-02-12 | Rubipy Scientific, Inc. | Electronically neutral metal complexes as biological labels |
US9231217B2 (en) * | 2013-11-28 | 2016-01-05 | Semiconductor Energy Laboratory Co., Ltd. | Synthesis method of organometallic complex, synthesis method of pyrazine derivative, 5,6-diaryl-2-pyrazyl triflate, light-emitting element, light-emitting device, electronic device, and lighting device |
JP6697299B2 (ja) | 2015-04-01 | 2020-05-20 | 株式会社半導体エネルギー研究所 | 有機金属錯体、発光素子、発光装置、電子機器、および照明装置 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1191613A2 (de) * | 2000-09-26 | 2002-03-27 | Canon Kabushiki Kaisha | Lumineszente Vorrichtung, Bildanzeigevorrichtung und Metallkoordinationsverbindung |
JP2003073387A (ja) * | 2001-09-04 | 2003-03-12 | Canon Inc | 金属配位化合物及び有機発光素子 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4111878A1 (de) | 1991-04-11 | 1992-10-15 | Wacker Chemie Gmbh | Leiterpolymere mit konjugierten doppelbindungen |
DE69608446T3 (de) | 1995-07-28 | 2010-03-11 | Sumitomo Chemical Company, Ltd. | 2,7-aryl-9-substituierte fluorene und 9-substituierte fluorenoligomere und polymere |
DE19614971A1 (de) | 1996-04-17 | 1997-10-23 | Hoechst Ag | Polymere mit Spiroatomen und ihre Verwendung als Elektrolumineszenzmaterialien |
DE19846766A1 (de) | 1998-10-10 | 2000-04-20 | Aventis Res & Tech Gmbh & Co | Konjugierte Polymere, enthaltend spezielle Fluorenbausteine mit verbesserten Eigenschaften |
US6166172A (en) | 1999-02-10 | 2000-12-26 | Carnegie Mellon University | Method of forming poly-(3-substituted) thiophenes |
DE10104426A1 (de) * | 2001-02-01 | 2002-08-08 | Covion Organic Semiconductors | Verfahren zur Herstellung von hochreinen, tris-ortho-metallierten Organo-Iridium-Verbindungen |
-
2002
- 2002-10-26 DE DE10249926A patent/DE10249926A1/de not_active Withdrawn
-
2003
- 2003-09-25 DE DE50313109T patent/DE50313109D1/de not_active Expired - Lifetime
- 2003-09-25 DE DE50309380T patent/DE50309380D1/de not_active Expired - Lifetime
- 2003-09-25 WO PCT/EP2003/010652 patent/WO2004037836A1/de active IP Right Grant
- 2003-09-25 CN CNA038246481A patent/CN1695173A/zh active Pending
- 2003-09-25 EP EP03753454A patent/EP1558619B1/de not_active Expired - Lifetime
- 2003-09-25 US US10/532,185 patent/US7589203B2/en not_active Expired - Fee Related
- 2003-09-25 EP EP08004334A patent/EP1944309B1/de not_active Expired - Lifetime
- 2003-09-25 KR KR1020057007164A patent/KR100989247B1/ko not_active IP Right Cessation
- 2003-09-25 JP JP2004545782A patent/JP2006507279A/ja active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1191613A2 (de) * | 2000-09-26 | 2002-03-27 | Canon Kabushiki Kaisha | Lumineszente Vorrichtung, Bildanzeigevorrichtung und Metallkoordinationsverbindung |
JP2003073387A (ja) * | 2001-09-04 | 2003-03-12 | Canon Inc | 金属配位化合物及び有機発光素子 |
Cited By (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100880220B1 (ko) | 2004-10-04 | 2009-01-28 | 엘지디스플레이 주식회사 | 유기 실리콘을 갖는 페닐 피리딘기를 포함하는 이리듐화합물계 발광 화합물 및 이를 발색 재료로서 사용하는유기전계발광소자 |
US7445857B2 (en) | 2004-12-22 | 2008-11-04 | Industrial Technology Research Institute | Organometallic complex and organic electroluminescent devices utilizing the same |
US8889266B2 (en) | 2005-03-17 | 2014-11-18 | Semiconductor Energy Laboratory Co., Ltd. | Organometallic complex, and light-emitting element, light-emitting device and electronic-device using the organometallic complex |
WO2007020952A1 (ja) * | 2005-08-12 | 2007-02-22 | Sumitomo Chemical Company, Limited | 高分子材料およびそれを用いた素子 |
US8274074B2 (en) | 2005-08-12 | 2012-09-25 | Sumitomo Chemical Company, Limited | Polymer material and device using the same |
US8247086B2 (en) | 2005-12-05 | 2012-08-21 | Semiconductor Energy Laboratory Co., Ltd. | Organometallic complex and light-emitting element, light-emitting device and electronic device using the same |
US9187689B2 (en) | 2005-12-05 | 2015-11-17 | Semiconductor Energy Laboratory Co., Ltd. | Organometallic complex and light-emitting element, light-emitting device, and electronic device using the same |
EP2254173A1 (de) * | 2006-03-21 | 2010-11-24 | Semiconductor Energy Laboratory Co, Ltd. | Metallorganischer Komplex und lichtemittierendes Element, lichtemittierende Vorrichtung und den metallorganischen Komplex verwendende elektronische Vorrichtung |
EP1873163A1 (de) | 2006-03-21 | 2008-01-02 | Semiconductor Energy Laboratory Co., Ltd. | Metallorganischer Komplex und lichtemittierendes Element, lichtemittierende Vorrichtung und den metallorganischen Komplex verwendende elektronische Vorrichtung |
US8999520B2 (en) | 2006-03-21 | 2015-04-07 | Semiconductor Energy Laboratory Co., Ltd. | Organometallic complex and light emitting element, light emitting device, and electronic device using the organometallic complex |
US10103341B2 (en) | 2006-03-21 | 2018-10-16 | Semiconductor Energy Laboratory Co., Ltd. | Organometallic complex and light emitting element, light emitting device, and electronic device using the organometallic complex |
EP1923385A1 (de) | 2006-11-20 | 2008-05-21 | Gwangju Institute of Science and Technology | Iridiumkomplex, Carbazolderivate und Copolymer damit |
US8101755B2 (en) | 2008-10-23 | 2012-01-24 | Semiconductor Energy Laboratory Co., Ltd. | Organometallic complex including pyrazine derivative |
US8329903B2 (en) | 2008-10-23 | 2012-12-11 | Semiconductor Energy Laboratory Co., Ltd. | Light-emitting element including organometallic complex including pyrazine derivative |
US7999254B2 (en) | 2008-11-17 | 2011-08-16 | Semiconductor Energy Laboratory Co., Ltd. | Light-emitting element and light-emitting device |
US8461580B2 (en) | 2008-11-17 | 2013-06-11 | Semiconductor Energy Laboratory Co., Ltd. | Light-emitting element and light-emitting device |
US8772082B2 (en) | 2008-11-17 | 2014-07-08 | Semiconductor Energy Laboratory Co., Ltd. | Light-emitting element and light-emitting device |
Also Published As
Publication number | Publication date |
---|---|
DE50309380D1 (de) | 2008-04-24 |
JP2006507279A (ja) | 2006-03-02 |
KR20050074500A (ko) | 2005-07-18 |
EP1558619B1 (de) | 2008-03-12 |
DE10249926A1 (de) | 2004-05-06 |
EP1944309A1 (de) | 2008-07-16 |
US20050253135A1 (en) | 2005-11-17 |
EP1944309B1 (de) | 2010-09-15 |
DE50313109D1 (de) | 2010-10-28 |
US7589203B2 (en) | 2009-09-15 |
CN1695173A (zh) | 2005-11-09 |
EP1558619A1 (de) | 2005-08-03 |
KR100989247B1 (ko) | 2010-10-20 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP1558619B1 (de) | Rhodium und iridium-komplexe | |
EP1363923B1 (de) | Rhodium- und iridium-komplexe | |
EP2289902B1 (de) | Rhodium- und Iridium-Komplexe | |
EP1504015B1 (de) | Rhodium- und iridium-komplexe | |
EP1379534B1 (de) | Rhodium-und iridium-komplexe | |
EP1768989B1 (de) | Metallkomplexe | |
EP1957505B1 (de) | Verfahren zur herstellung ortho-metallierter metallverbindungen | |
EP1366054B1 (de) | Verfahren zur herstellung von hochreinen, tris-ortho-metallierten organo-iridium-verbindungen | |
EP1749014A1 (de) | Metallkomplexe | |
EP1562964B1 (de) | Palladium- und platin-komplexe | |
EP1448577B1 (de) | Rhodium- und iridium-komplexe |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AK | Designated states |
Kind code of ref document: A1 Designated state(s): CN JP KR US |
|
AL | Designated countries for regional patents |
Kind code of ref document: A1 Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LU MC NL PT RO SE SI SK TR |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
DFPE | Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101) | ||
WWE | Wipo information: entry into national phase |
Ref document number: 2003753454 Country of ref document: EP |
|
WWE | Wipo information: entry into national phase |
Ref document number: 1020057007164 Country of ref document: KR Ref document number: 2004545782 Country of ref document: JP |
|
WWE | Wipo information: entry into national phase |
Ref document number: 20038246481 Country of ref document: CN |
|
WWE | Wipo information: entry into national phase |
Ref document number: 10532185 Country of ref document: US |
|
WWP | Wipo information: published in national office |
Ref document number: 1020057007164 Country of ref document: KR |
|
WWP | Wipo information: published in national office |
Ref document number: 2003753454 Country of ref document: EP |
|
WWG | Wipo information: grant in national office |
Ref document number: 2003753454 Country of ref document: EP |