WO2004012276A1 - 窒素を含む熱電変換材料 - Google Patents
窒素を含む熱電変換材料 Download PDFInfo
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- WO2004012276A1 WO2004012276A1 PCT/JP2003/009491 JP0309491W WO2004012276A1 WO 2004012276 A1 WO2004012276 A1 WO 2004012276A1 JP 0309491 W JP0309491 W JP 0309491W WO 2004012276 A1 WO2004012276 A1 WO 2004012276A1
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- thermoelectric conversion
- conversion material
- thermoelectric
- nitride
- general formula
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- 239000000463 material Substances 0.000 title claims abstract description 129
- 230000009466 transformation Effects 0.000 title abstract 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 title description 25
- 229910052757 nitrogen Inorganic materials 0.000 title description 14
- 239000000203 mixture Substances 0.000 claims abstract description 32
- 229910052761 rare earth metal Inorganic materials 0.000 claims abstract description 25
- 230000007704 transition Effects 0.000 claims abstract description 15
- 238000006243 chemical reaction Methods 0.000 claims description 69
- 150000004767 nitrides Chemical class 0.000 claims description 47
- 229910052688 Gadolinium Inorganic materials 0.000 claims description 11
- 229910052771 Terbium Inorganic materials 0.000 claims description 11
- 239000013078 crystal Substances 0.000 claims description 11
- 229910052742 iron Inorganic materials 0.000 claims description 8
- 229910052748 manganese Inorganic materials 0.000 claims description 8
- 229910052759 nickel Inorganic materials 0.000 claims description 8
- 229910052692 Dysprosium Inorganic materials 0.000 claims description 7
- 150000001875 compounds Chemical class 0.000 claims description 6
- MWUXSHHQAYIFBG-UHFFFAOYSA-N Nitric oxide Chemical compound O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 claims description 4
- 229910052725 zinc Inorganic materials 0.000 claims description 3
- AZFKQCNGMSSWDS-UHFFFAOYSA-N MCPA-thioethyl Chemical compound CCSC(=O)COC1=CC=C(Cl)C=C1C AZFKQCNGMSSWDS-UHFFFAOYSA-N 0.000 claims 1
- 239000000126 substance Substances 0.000 abstract description 6
- 231100000053 low toxicity Toxicity 0.000 abstract 1
- 238000000034 method Methods 0.000 description 18
- 229910052751 metal Inorganic materials 0.000 description 13
- 239000002184 metal Substances 0.000 description 13
- 239000000523 sample Substances 0.000 description 12
- 239000000470 constituent Substances 0.000 description 9
- 239000010409 thin film Substances 0.000 description 9
- 239000010408 film Substances 0.000 description 8
- 239000002994 raw material Substances 0.000 description 8
- 238000005259 measurement Methods 0.000 description 7
- 239000000758 substrate Substances 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 230000007423 decrease Effects 0.000 description 6
- 238000002149 energy-dispersive X-ray emission spectroscopy Methods 0.000 description 6
- 238000002441 X-ray diffraction Methods 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- 229910052733 gallium Inorganic materials 0.000 description 5
- 229910052738 indium Inorganic materials 0.000 description 5
- 229910052706 scandium Inorganic materials 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 229910052684 Cerium Inorganic materials 0.000 description 4
- 229910052693 Europium Inorganic materials 0.000 description 4
- 229910052689 Holmium Inorganic materials 0.000 description 4
- 229910052765 Lutetium Inorganic materials 0.000 description 4
- 229910052779 Neodymium Inorganic materials 0.000 description 4
- 229910052772 Samarium Inorganic materials 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 229910052769 Ytterbium Inorganic materials 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- 230000008021 deposition Effects 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 229910052746 lanthanum Inorganic materials 0.000 description 4
- 150000002910 rare earth metals Chemical class 0.000 description 4
- 229910052727 yttrium Inorganic materials 0.000 description 4
- 229910052691 Erbium Inorganic materials 0.000 description 3
- 229910052777 Praseodymium Inorganic materials 0.000 description 3
- 229910052775 Thulium Inorganic materials 0.000 description 3
- -1 and specifically Inorganic materials 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- 229910001873 dinitrogen Inorganic materials 0.000 description 3
- 125000004430 oxygen atom Chemical group O* 0.000 description 3
- 238000010248 power generation Methods 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 239000007858 starting material Substances 0.000 description 3
- 229910052723 transition metal Inorganic materials 0.000 description 3
- 229910052984 zinc sulfide Inorganic materials 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- FLATXDRVRRDFBZ-UHFFFAOYSA-N azanylidynegadolinium Chemical compound [Gd]#N FLATXDRVRRDFBZ-UHFFFAOYSA-N 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 229910021480 group 4 element Inorganic materials 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 238000005245 sintering Methods 0.000 description 2
- 231100000701 toxic element Toxicity 0.000 description 2
- 150000003624 transition metals Chemical class 0.000 description 2
- 238000004056 waste incineration Methods 0.000 description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- 229910002665 PbTe Inorganic materials 0.000 description 1
- 230000005678 Seebeck effect Effects 0.000 description 1
- 229910052789 astatine Inorganic materials 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- XOYLJNJLGBYDTH-UHFFFAOYSA-M chlorogallium Chemical compound [Ga]Cl XOYLJNJLGBYDTH-UHFFFAOYSA-M 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 229910000765 intermetallic Inorganic materials 0.000 description 1
- 231100001231 less toxic Toxicity 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000001451 molecular beam epitaxy Methods 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- OCGWQDWYSQAFTO-UHFFFAOYSA-N tellanylidenelead Chemical compound [Pb]=[Te] OCGWQDWYSQAFTO-UHFFFAOYSA-N 0.000 description 1
- 125000003258 trimethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- XCZXGTMEAKBVPV-UHFFFAOYSA-N trimethylgallium Chemical compound C[Ga](C)C XCZXGTMEAKBVPV-UHFFFAOYSA-N 0.000 description 1
- 238000001947 vapour-phase growth Methods 0.000 description 1
- 230000035899 viability Effects 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0676—Oxynitrides
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N10/00—Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects
- H10N10/80—Constructional details
- H10N10/85—Thermoelectric active materials
- H10N10/851—Thermoelectric active materials comprising inorganic compositions
- H10N10/855—Thermoelectric active materials comprising inorganic compositions comprising compounds containing boron, carbon, oxygen or nitrogen
Definitions
- the present invention relates to an oxynitride (oxynitride) thermoelectric conversion material or a nitride thermoelectric conversion material having a high Seebeck coefficient and a low electric resistivity.
- thermoelectric conversion which directly converts heat energy discarded into the atmosphere into electric energy, is a very effective means for improving energy efficiency.
- This thermoelectric conversion method utilizes the Seebeck effect. This method has the advantage that there is no need for power generation equipment to take place and there is no gas emission, and if there is a temperature difference, in principle, it can be used semi-permanently without special maintenance. Because it can be done, it is also effective in terms of cost.
- thermoelectric power generation is expected as a technology that plays a part in solving the energy problem, but thermoelectric materials with high thermoelectric conversion efficiency are needed to put this into practical use.
- thermoelectric material By the way, the performance of a thermoelectric material is defined by a figure of merit represented by the following equation (1) or an output factor represented by the following equation (2).
- thermoelectric material the higher the thermoelectric conversion efficiency higher performance index, the absolute value of the performance index, about 1 0- 6 / K in a normal metal is about 1 0- 5 kappa in the semiconductor,
- the optimal spoon thermoelectric material on the order of 10 one 4 ZK 10 one 3 / K.
- the output factor allowing power available from 1 CT 5 W / mK 2 at 10- 3 W / mK 2 of the order one.
- thermoelectric conversion material since high-temperature heat is used, it is strongly required that the thermoelectric conversion material be excellent in heat resistance, chemical durability, and the like.
- thermoelectric conversion materials are used as thermoelectric conversion materials, but their thermoelectric conversion efficiencies are as low as around 5%, the operating temperature is about 200 ° C in the former, and 400 in the latter. ° C, which is not applicable to a high-temperature heat source.
- the characteristics are reduced due to oxidation. Therefore, measures such as sealing with an inert gas are required.
- both contain toxic elements that place a burden on the environment, which is a major obstacle to expanding the range of applications. Therefore, there is a demand for the development of a thermoelectric conversion material that can overcome these problems.
- an object of the present invention is to provide a thermoelectric conversion material that is composed of a low-toxic element, has excellent heat resistance, chemical durability, and the like, and has high thermoelectric conversion efficiency. Disclosure of the invention
- thermoelectric conversion materials have conducted various studies to solve the above-mentioned problems in the conventional thermoelectric conversion materials, and as a result, have formed an element selected from transition elements, rare earth elements, Al, Ga, In, N, and ⁇ .
- An oxynitride thermoelectric material with a specific composition containing elements, or a nitride thermoelectric material with a specific composition containing transition elements, rare earth elements, Al, Ga, In, and N as constituent elements has high Seebeck coefficient and low electrical resistance It has been found that it is useful as a thermoelectric conversion material because of its high modulus, and the present invention has been completed based on this finding.
- thermoelectric conversion material containing nitrogen of the first invention of the present invention thermoelectric conversion material containing nitrogen of the first invention of the present invention
- the transition element ⁇ is preferably at least one selected from Ni, Fe, Co and Mn, and the rare earth element R is Gd, Sc, At least one selected from Sm, Tb and Dy is preferred.
- the nitride thermoelectric conversion material of the present invention preferably has a composition represented by the above general formula and contains at least one having an amorphous structure.
- thermoelectric conversion material containing nitrogen of the second invention of the present invention thermoelectric conversion material containing nitrogen of the second invention of the present invention
- M is a transition element
- R is a rare earth element
- the absolute value of the Seebeck coefficient at a temperature of 100 ° C or more is 50 ⁇ or more (-50 ⁇ VZK or less).
- ⁇ is at least one element selected from Ni, Fe, Co and Mn, and R is Gd, Sc, Sm and Tb. It is preferable that at least one element selected from the group consisting of rare earth elements, or that D be at least one element selected from the group consisting of Ge, Si, Mg, and Zn.
- the nitride thermoelectric conversion material preferably has an element composition represented by the above general formula (B), and preferably has a wurtzite type crystal structure or an amorphous structure.
- the first oxynitride thermoelectric material which is a thermoelectric conversion material containing nitrogen, It contains at least one metal selected from Al, Ga and In, an oxygen atom (0) and a nitrogen atom (N) as essential components, and contains a transition element and a rare earth element as necessary. Equation (A)
- M in the above formula (A) may be any transition element, and among them, it is preferable to use at least one element selected from Fe, Ni, Co and Mn.
- R may be a rare earth element, and specifically, Sc, Y, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm ⁇ Yb And Lu, but at least one selected from Gd, Sc, Sm, Tb and Dy is preferable.
- the value of X indicating the ratio of In is in the range of 0.2 ⁇ x ⁇ 1.0, but is preferably 0.3 ⁇ x ⁇ 0.8.
- the value of y indicating the ratio of Ga is in the range of 0 ⁇ y ⁇ 0.7, but is preferably 0.1.l ⁇ y 0.3, and z indicating the ratio of A 1 Is in the range 0 ⁇ z ⁇ 0.7, but preferably 0 ⁇ z ⁇ 0.2.
- it is necessary to satisfy the condition x + y + z 1.
- the value of s which indicates the proportion of 0, is in the range of 0.4 ⁇ s ⁇ l. 2, but is preferably 0.5 ⁇ s ⁇ l. 1, indicating the sum of 0 and N
- the value of s + t is in the range 0. s + t ⁇ 1.7.
- the value of 11 indicating the ratio of the transition element M is in the range of 0 ⁇ u ⁇ 0.7, and the value of V indicating the ratio of the rare earth element is in the range of 0 ⁇ v ⁇ 0.05.
- thermoelectric material of the present invention it is necessary that the absolute value of the Seebeck coefficient at a temperature of 100 ° C. or more is 40 / VZK or more (14 or less). Further, it is preferable that the electrical resistivity of those having the following 10- 3 ⁇ .
- FIG. 1 shows an X-ray diffraction pattern of the nitrided oxide thermoelectric conversion material obtained in Example 1 described later.
- Figure 1 (a) shows the quartz glass
- Figure 1 (b) shows the pattern of a thin film of oxynitride thermoelectric conversion material formed on the quartz glass.
- FIG. 1 (b) no peak that is considered to indicate crystallization is observed, and a broad curve similar to that of a glass substrate is observed, indicating that the substrate has an amorphous structure.
- the crystallinity also depends on the film formation method, and it is clear that the sample immediately after being prepared at a relatively low temperature (100 ° C or less) using the sputter-film method has an amorphous structure. I have.
- FIG. 2 shows an EDX analysis pattern of an Al In ⁇ N-based sample obtained in Example 1 described later. These compositional analyzes show that Al, In, 0, N, etc. are the main constituent elements.
- the oxynitride thermoelectric material having the above specific composition ratio has a Seebeck coefficient having an absolute value of 40 V or more (at most 40 VZK or less) at a temperature of 100 ° C or more, and most of them are those having an electrical resistivity of less than 10- 3 ⁇ .
- This oxynitride thermoelectric material exhibits a ⁇ -type electric conductivity, and has a negative Seebeck coefficient.
- the oxynitride thermoelectric material of the present invention can exhibit high thermoelectric conversion efficiency.
- thermoelectric materials have excellent properties such as heat resistance and chemical durability, and are composed of only low toxic elements, so that they are practically used as thermoelectric conversion materials. It is highly likely.
- thermoelectric conversion material which is the second nitrogen-containing thermoelectric conversion material in the present invention, has the following general formula ( ⁇ )
- M is a transition element
- R is a rare earth element
- D is a Group IV or Group II element
- ⁇ is a transition metal element. Specifically, at least one element selected from Fe, Ni, Co and Mn can be used.
- R is a rare earth element. Specifically, Sc, Y, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb and Lu At least one element selected from the following can be used.
- the value of X indicating the ratio of In is in the range of 0.2 ⁇ x ⁇ l.0, but is preferably 0.3 ⁇ x ⁇ 0.8
- the value of y which indicates the proportion of Ga, is in the range of 0 ⁇ y ⁇ 0.7, but is preferably 0.20y ⁇ 0.8.
- the nitride thermoelectric conversion material of the present invention has a wurtzite structure or an amorphous structure.
- FIG. 8 shows an X-ray diffraction pattern of the nitride thermoelectric material obtained in Example 26 described later. In Figure 8, 32.
- the diffraction peaks observed in the vicinity correspond to the Uruzeite-type crystal structure, and the other peaks are diffraction peaks from the substrate.
- the crystallinity depends on the film formation method, but it is clear that the sample immediately after preparation of the sputtered film has an amorphous structure, and that the sample after heat treatment has a wurtzite structure. It was revealed.
- (a) is an EDX analysis pattern of the Al InN sample of Example 1 described later
- (b) is an EDX pattern of the AlGaInN sample.
- the nitride thermoelectric conversion material of the present invention having a specific composition ratio, at 100 ° C or more temperature, Ze one Beck coefficient and 1 0 one 3 Omegapaiiota absolute value of 50 ZVZK more (one 50 ⁇ VZK below) It has the following electrical resistivity, exhibits ⁇ -type electrical conductivity, and has a negative Seebeck coefficient. By having a high Seebeck coefficient and a low electric resistivity at the same time, high thermoelectric conversion efficiency can be exhibited.
- thermoelectric conversion material is excellent in heat resistance, chemical durability, and the like, and is composed of an element having less toxic elements, and is highly practical as a thermoelectric conversion material.
- the raw material is provided in a predetermined amount, and I) the gas is sputtered in a mixed gas composed of argon, nitrogen and oxygen, or It can be obtained by providing a predetermined amount.
- an oxynitride thermoelectric material its raw material is not particularly limited as long as it can form an oxynitride thermoelectric material for the purpose of forming a thin film. Things etc. can be used suitably.
- the Ga source Ga metal, GaN, trimethylgallium ((CH 3 Ga), Toryechiru Ga, chloride Ga (GaCl 2), can be used as the Ga 2 ⁇ 3, etc.
- the rare earth source Sani ⁇ objects (e.g. oxide Gadoriniu arm (Gd 2 ⁇ 3), nitrides (such as gadolinium nitride (GdN), trimethyl Gd etc.
- the compounds containing the constituent elements of nitric oxide I arsenide was heat ⁇ charge two or more It may be used as a raw material.
- the raw material is not particularly limited as long as the nitride thermoelectric material can be formed for the purpose of forming a thin film, and a simple metal, a nitride nitride, or the like can be used. it can.
- a simple metal, a nitride nitride, or the like can be used.
- the Ga source Ga metal, GaN, trimethylene Chirugariumu ((CHs) 3 Ga) ⁇ Toryechiru Ga, chloride Ga can be used (GAC 1 2) or the like
- the rare earth source nitrides, e.g., gadolinium nitride (GdN ), Trimethyl Gd, etc. can be used.
- a conjugate containing two or more constituent elements of the nitride thermoelectric material may be used as a raw material.
- the thin film forming means in the present invention is not particularly limited, and a known thin film forming method such as a sputtering method, a metal organic vapor phase growth method, and a molecular beam epitaxy method can be employed.
- the film forming time and temperature are not particularly limited as long as a thin film of a thermoelectric material containing nitrogen is formed, and, for example, the film is formed at about 50 to 1100 ° C for about 30 minutes to 3 hours. It is desirable to do. Further, the amounts of oxygen and nitrogen in the generated thermoelectric conversion material can be appropriately controlled by the nitrogen gas partial pressure during film formation, the film formation temperature, and the like.
- sample form is not particularly limited to the thin film, GaN, A1N, InN, Ga 2 ⁇ 3, Al 2 ⁇ 3, I n 2 0 3
- a bulk body prepared by weighing a predetermined amount of a raw material powder of an elemental metal element or the like, and sintering and sintering at a high temperature is also effective as a thermoelectric material.
- FIG. 3 shows a schematic diagram of an example of a thermoelectric conversion element using the thermoelectric material containing nitrogen of the present invention as a thermoelectric conversion material.
- the structure of the thermoelectric conversion element is the same as that of a known thermoelectric conversion element.
- Substrate 1 for high temperature part, substrate 2 for low temperature part, P-type thermoelectric conversion material 3, N-type thermoelectric conversion material 4, in the thermoelectric conversion element constituted by the electrode 5, the conductive wire 6, and the like, the oxynitride thermoelectric conversion material or the nitride thermoelectric conversion material of the present invention may be used as an N-type thermoelectric conversion element.
- Example 1 for high temperature part
- substrate 2 for low temperature part P-type thermoelectric conversion material 3
- N-type thermoelectric conversion material 4 in the thermoelectric conversion element constituted by the electrode 5, the conductive wire 6, and the like, the oxynitride thermoelectric conversion material or the nitride thermoelectric conversion material of the present invention may be used as an N-type thermoelectric conversion element.
- metal A1 as a source of A1 and metal In as a source of In
- Al y Ir OsNt was produced by a high frequency sputtering method.
- the deposition time was 3 hours and the deposition temperature was 80 ° C.
- the obtained oxynitride thermoelectric material is Al. 3 . N. 7 . 0. 4 . N.
- the composition shown was 60 .
- FIG. 4 is a graph showing the temperature dependence of the Seebeck coefficient of the obtained oxynitride thermoelectric material at 100 to 700 ° C. From FIG. 4, it was found that this oxynitride thermoelectric material exhibited a Seebeck coefficient having an absolute value of 40 ° V / K or more in a temperature range of 100 to 700 ° C.
- FIG. 5 is a graph showing the temperature dependence of the electrical resistivity measured by the DC four-probe method for this oxynitride thermoelectric material. From Figure 5, the electrical resistivity of the oxinitride thermoelectric material exhibits a semiconductor behavior which decreases with increasing temperature, the 700 ° C, was low as 10_ 4 ⁇ below.
- Example 2 Further addition of Ga to the composition of Example 1, in the same manner as in Example 1, the general formula:. Al 0 23 1 n. 70 Ga 0 .. 7 O 0. 4. N. 6 . Was produced.
- FIG. 6 is a graph showing the temperature dependence of the Seebeck coefficient of the obtained oxynitride thermoelectric material at 100 to 700 ° C. From FIG. 6, it can be seen that this oxynitride thermoelectric material has a Zebeck coefficient of 50 ⁇ V / K or more in the temperature range of 100 to 700 ° C. It was found to indicate a number.
- FIG. 7 is a graph showing the temperature dependence of the electrical resistivity measured by the DC four-terminal method for the thermoelectric material. From Figure 7, the electrical resistivity of the oxinitride thermoelectric material exhibits a semiconductor behavior which decreases with increasing temperature, the 700 ° C, there in low as well as 10- 4 ⁇ Example 1 Was.
- thermoelectric material reducing the number of constituent elements of this type of thermoelectric material will affect not only the electrical properties but also the thermal conductivity. That is, compared with single element semiconductors such as Si and Ge, Si and Ge are mixed crystal compositions, for example, Si. . 5 G e.
- Si and Ge are mixed crystal compositions, for example, Si. . 5 G e.
- the transition element compound used as a starting material except that instead of the compounds shown in Table 1, in the same manner as in Example 1, the general formula:... A10 20 Ga 0 15 I no ssMo.20 O 0. 45 ⁇ .
- An oxynitride thermoelectric material represented by ss was produced.
- M contains at least one of transition metals (Ni, Fe, Co, Mn).
- Table 1 shows the measurement results of the Seebeck coefficient and the electrical resistivity of each of the obtained oxynitride thermoelectric materials.
- Examples 7 to 22 Except that the rare earth element used as a starting material was changed to the elements shown in Table 2, in the same manner as in Example 1, the general formula:.... A 10. soGao 19 1 no 6 i R 0 20 ⁇ 0 42 vo. An oxynitride thermoelectric material indicated by ⁇ 0 was produced. As R, it's Sc, Y, La, Ce, P]? , Nd, Pm, Sm-Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb and Lu. -Table 2 shows the measurement results of the Seebeck coefficient and the electrical resistivity of each of the obtained oxynitride thermoelectric materials.
- the conductivity type was N-type.
- those using Gd, Sc, Sm, and Tb simultaneously satisfy both low resistivity and high Seebeck coefficient, and can be used as thermoelectric conversion materials.
- thermoelectric material of the present invention a sample having a composition outside the range specified in the present invention was prepared, and the same evaluation was performed. Shown.
- Example 26
- Al InN was prepared by a high frequency sputtering method. The deposition time was 3 hours and the deposition temperature was 80 ° C. The obtained thermoelectric material is Al. 5 . In. 5 . It was expressed by the element and composition of N.
- Fig. 10 shows a graph showing the viability. From FIG. 10, it can be seen that this nitride thermoelectric material exhibits a Seebeck coefficient with an absolute value of 5 ⁇ iVZK or more in a temperature range of 100 to 700 ° C.
- FIG. 11 is a graph showing the temperature dependence of the electrical resistivity measured by the DC four-terminal method for the nitride thermoelectric material. From FIG. 11, it can be seen that the electrical resistivity of the nitride thermoelectric material shows a semiconductor-like behavior that decreases with an increase in temperature, and at 700 ° C., has a low value of 10 4 ⁇ m.
- Example 26 The composition of Example 26, further added Ga, in the same manner as in Example 26, the general formula:. Alo 26 Ga. . 44 In ⁇ .3 ⁇ !. Was produced.
- FIG. 12 is a graph showing the temperature dependence of the Seek coefficient at 100 to 700 ° C. of the obtained nitride thermoelectric material. According to FIG. 12, it can be seen that this nitride thermoelectric material exhibits a Zebeck coefficient whose absolute value is 50 ° VZK or more in a temperature range of 100 to 700 ° C.
- FIG. 13 is a graph showing the temperature dependence of the electrical resistivity of the nitride thermoelectric material measured by the DC four-terminal method. From FIG. 13, the electrical resistivity of the nitride thermoelectric material shows a semiconductor-like behavior that decreases with an increase in temperature, and at 700 ° C., as low as 1 ° to 4 ⁇ m as in Example 26. It turns out that it becomes.
- Alo. 29 Ga was obtained in the same manner as in Example 26 except that the transition element compound used as a raw material was changed to the compounds shown in Table 4. 01 I no. 70 ⁇ . 20 ⁇ . In table The nitride thermoelectric material to be manufactured was produced. In the formula, M contains at least one of transition metals (Ni, Fe, Co, Mn).
- Table 4 shows the measurement results of the Seebeck coefficient and the electrical resistivity of each of the obtained nitride thermoelectric materials.
- a nitride thermoelectric material represented by was prepared.
- R is a rare earth element, and specifically, Sc, Y, La, Ce, Pr ⁇ . Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, T At least one element selected from m, Yb and Lu can be used.
- Table 5 shows the measurement results of the Seebeck coefficient and the electrical resistivity of each of the obtained nitride thermoelectric materials.
- the conductivity type was N-type.
- Gd, Sc, Sm, and Tb simultaneously satisfy low resistivity and high Seebeck coefficient, and can be used as thermoelectric conversion materials.
- these rare earth added compositions for the same reason as in Example 27, a reduction in thermal conductivity can be expected due to the effect of the mixed crystal, and an improvement in the figure of merit can be expected.
- D contains at least one of a group IV element (Ge, Si) or a group II element (Zn, Mg).
- Table 6 shows the measurement results of the Seebeck coefficient and the electrical resistivity of each of the obtained nitride thermoelectric materials. ' Table 6
- Table 7 shows the measurement results of the Seebeck coefficient and the electrical resistivity of each of the obtained nitride thermoelectric materials. .
- thermoelectric conversion material containing nitrogen of the present invention is composed of only low-toxic elements, it has a high Seebeck coefficient and a low electrical resistivity, and is excellent in heat resistance, chemical stability, and the like. is there. Therefore, it is easy to use and handle as a thermoelectric conversion material, and is extremely useful as a thermoelectric conversion material using a high-temperature heat source, which was impossible with a conventional intermetallic compound material.
- thermoelectric conversion material containing nitrogen of the present invention By adopting a method of incorporating the thermoelectric conversion material containing nitrogen of the present invention into a thermoelectric conversion system, for example, it is possible to effectively use heat energy that has been discarded in the atmosphere.
- FIG. 1 (a) is an X-ray diffraction pattern diagram of a quartz glass substrate.
- (B) is an X-ray diffraction pattern diagram of the oxynitride thermoelectric material thin film formed on the quartz glass substrate obtained in Example 1.
- FIG. 2 shows an EDX analysis pattern of the oxynitride thermoelectric material obtained in Example 1.
- FIG. 3 is a schematic diagram of an example of a thermoelectric conversion element using the nitrogen-containing thermoelectric material of the present invention as a thermoelectric conversion material.
- FIG. 4 is a graph showing the temperature dependence of the Seebeck coefficient at 100 to 700 ° C. of the oxynitride thermoelectric material obtained in Example 1.
- FIG. 5 is a graph showing the temperature dependence of the electrical resistivity of the nitride thermoelectric material obtained in Example 1 measured by a DC four-terminal method.
- FIG. 6 is a graph showing the temperature dependence of the Seebeck coefficient of the nitride thermoelectric material obtained in Example 2 at 100 to 700 ° C.
- FIG. 7 is a graph showing the temperature dependence of the electrical resistivity of the nitride thermoelectric material obtained in Example 2 measured by a DC four-terminal method.
- FIG. 8 is an X-ray diffraction pattern diagram of the nitride thermoelectric material obtained in Example 26.
- FIG. 9 (a) shows the EDX analysis pattern of the AlInN sample of Example 26, and FIG. 9 (b) shows the EDX pattern of the AlGaInN sample.
- FIG. 10 is a graph showing the temperature dependence of the Seek coefficient at 100 to 700 ° C. of the nitride thermoelectric material obtained in Example 26.
- FIG. 11 is a graph showing the temperature dependence of the electrical resistivity of the nitride thermoelectric material obtained in Example 26 measured by a DC four-terminal method.
- FIG. 12 is a graph showing the temperature dependence of the Seebeck coefficient at 100 to 70 ° C. of the nitride thermoelectric material obtained in Example 27.
- FIG. 13 is a graph showing the temperature dependence of the electrical resistivity of the nitridite thermoelectric material obtained in Example 27 measured by a DC four-terminal method.
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Abstract
Description
Claims
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
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US10/522,573 US7521629B2 (en) | 2002-07-29 | 2003-07-25 | Thermoelectric transportation material containing nitrogen |
AU2003248131A AU2003248131A1 (en) | 2002-07-29 | 2003-07-25 | Thermoelectric transformation material containing nitrogen |
DE10392993T DE10392993B4 (de) | 2002-07-29 | 2003-07-25 | Thermoelektrisches Material enthaltend Stickstoff |
GB0503241A GB2417129B (en) | 2002-07-29 | 2003-07-25 | Thermoelectric transformation material containing nitrogen |
US12/355,227 US8203067B2 (en) | 2002-07-29 | 2009-01-16 | Thermoelectric transportation material containing nitrogen |
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JP2002219288A JP4000366B2 (ja) | 2002-07-29 | 2002-07-29 | 窒化物熱電変換材料 |
JP2002-219288 | 2002-07-29 | ||
JP2002-272054 | 2002-09-18 | ||
JP2002272054A JP4000369B2 (ja) | 2002-09-18 | 2002-09-18 | 酸化窒化物熱電変換材料 |
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US12/355,227 Division US8203067B2 (en) | 2002-07-29 | 2009-01-16 | Thermoelectric transportation material containing nitrogen |
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US (2) | US7521629B2 (ja) |
AU (1) | AU2003248131A1 (ja) |
DE (1) | DE10392993B4 (ja) |
GB (1) | GB2417129B (ja) |
WO (1) | WO2004012276A1 (ja) |
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JP5218285B2 (ja) * | 2009-06-04 | 2013-06-26 | 住友化学株式会社 | 熱電変換材料 |
WO2011072014A1 (en) | 2009-12-08 | 2011-06-16 | Lehigh Univeristy | THERMOELECTRIC MATERIALS BASED ON SINGLE CRYSTAL AlInN-GaN GROWN BY METALORGANIC VAPOR PHASE EPITAXY |
KR101626933B1 (ko) | 2013-11-29 | 2016-06-02 | 주식회사 엘지화학 | 신규한 화합물 반도체 및 그 활용 |
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JP2001085751A (ja) * | 1999-09-17 | 2001-03-30 | Nec Corp | 熱電変換材料及びそれを用いた素子、並びに熱電変換材料の製造方法 |
JP2001127350A (ja) * | 1999-08-17 | 2001-05-11 | Tokyo Gas Co Ltd | 熱電変換材料及び熱電変換素子 |
JP2002134798A (ja) * | 2000-10-27 | 2002-05-10 | Tokyo Gas Co Ltd | 酸化物超伝導デバイス用ペルチェ素子 |
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JPS56116673A (en) * | 1980-02-19 | 1981-09-12 | Sharp Corp | Amorphous thin film solar cell |
US5911899A (en) * | 1995-06-15 | 1999-06-15 | Mitsui Chemicals, Inc. | Corrosion-proof transparent heater panels and preparation process thereof |
JP2001085781A (ja) * | 1999-09-17 | 2001-03-30 | Mitsubishi Electric Corp | 変調器集積半導体レーザ及び変調器集積半導体レーザを使用した半導体レーザ装置 |
JP2001160627A (ja) * | 1999-11-30 | 2001-06-12 | Toyoda Gosei Co Ltd | Iii族窒化物系化合物半導体発光素子 |
JP2001223395A (ja) | 2000-02-09 | 2001-08-17 | Natl Inst Of Advanced Industrial Science & Technology Meti | 熱電材料の製造方法 |
US6599564B1 (en) * | 2000-08-09 | 2003-07-29 | The Board Of Trustees Of The University Of Illinois | Substrate independent distributed bragg reflector and formation method |
DE10127974A1 (de) * | 2001-06-08 | 2002-12-12 | Philips Corp Intellectual Pty | Gasentladungslampe |
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2003
- 2003-07-25 WO PCT/JP2003/009491 patent/WO2004012276A1/ja active Application Filing
- 2003-07-25 DE DE10392993T patent/DE10392993B4/de not_active Expired - Fee Related
- 2003-07-25 AU AU2003248131A patent/AU2003248131A1/en not_active Abandoned
- 2003-07-25 US US10/522,573 patent/US7521629B2/en not_active Expired - Fee Related
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JP2001127350A (ja) * | 1999-08-17 | 2001-05-11 | Tokyo Gas Co Ltd | 熱電変換材料及び熱電変換素子 |
JP2001085751A (ja) * | 1999-09-17 | 2001-03-30 | Nec Corp | 熱電変換材料及びそれを用いた素子、並びに熱電変換材料の製造方法 |
JP2002134798A (ja) * | 2000-10-27 | 2002-05-10 | Tokyo Gas Co Ltd | 酸化物超伝導デバイス用ペルチェ素子 |
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US8203067B2 (en) | 2012-06-19 |
US7521629B2 (en) | 2009-04-21 |
US20060037637A1 (en) | 2006-02-23 |
DE10392993B4 (de) | 2011-03-24 |
GB0503241D0 (en) | 2005-03-23 |
US20090184295A1 (en) | 2009-07-23 |
AU2003248131A1 (en) | 2004-02-16 |
DE10392993T5 (de) | 2005-08-18 |
GB2417129B (en) | 2006-10-25 |
GB2417129A (en) | 2006-02-15 |
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