WO2003064966A1 - Procede de mesure d'interference, dispositif de mesure d'interference, methode de production pour systeme optique de projection, systeme optique de projection, et aligneur de projection - Google Patents

Procede de mesure d'interference, dispositif de mesure d'interference, methode de production pour systeme optique de projection, systeme optique de projection, et aligneur de projection Download PDF

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Publication number
WO2003064966A1
WO2003064966A1 PCT/JP2003/000306 JP0300306W WO03064966A1 WO 2003064966 A1 WO2003064966 A1 WO 2003064966A1 JP 0300306 W JP0300306 W JP 0300306W WO 03064966 A1 WO03064966 A1 WO 03064966A1
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WIPO (PCT)
Prior art keywords
light beam
interference
optical system
measurement
light
Prior art date
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PCT/JP2003/000306
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English (en)
Japanese (ja)
Inventor
Yuichi Takigawa
Hideki Komatsuda
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Nikon Corporation
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Publication date
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Publication of WO2003064966A1 publication Critical patent/WO2003064966A1/fr

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02034—Interferometers characterised by particularly shaped beams or wavefronts
    • G01B9/02038—Shaping the wavefront, e.g. generating a spherical wavefront
    • G01B9/02039—Shaping the wavefront, e.g. generating a spherical wavefront by matching the wavefront with a particular object surface shape
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/26—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes
    • G01B11/27—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes for testing the alignment of axes
    • G01B11/272—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes for testing the alignment of axes using photoelectric detection means
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02056—Passive reduction of errors
    • G01B9/02057—Passive reduction of errors by using common path configuration, i.e. reference and object path almost entirely overlapping

Definitions

  • Interference measurement method interference measurement device, and
  • the present invention relates to an interference measurement method and an interference measurement apparatus applied to interference measurement using a null element including a diffractive optical element, such as measurement of an aspheric surface of a lens or a mirror. Further, the present invention relates to a method of manufacturing a projection optical system to which the method for measuring a depth is applied, a projection optical system manufactured by the method of manufacturing, and a projection exposure apparatus equipped with the projection optical system.
  • a null element including a diffractive optical element such as measurement of an aspheric surface of a lens or a mirror.
  • the measurement light flux emitted by the interferometer is almost reflected on the test surface in order to observe interference fringes that accurately reflect the unevenness at each position on the test surface. It is necessary to be incident in the same phase vertically.
  • the measurement light beam emitted from the shape measurement interferometer is generally a parallel light beam
  • the parallel light beam may be directly incident on the test surface.
  • the optimal wavefront spherical wavefront or aspherical surface
  • a null element is used for this conversion.
  • the null element include an element formed of a diffractive optical element such as a zone plate, and an element formed by combining a diffractive optical element and a refractive lens.
  • a null element is arranged between a Fizeau member having a reference surface and a surface to be measured.
  • the diffractive optical element generates a desired wavefront by each diffracted light generated at each position of the diffractive surface.
  • the diffracted light of a required order (this is generally a first-order diffracted light. , "Signal beam”.)
  • the extra diffracted light this Is generally higher order diffracted light of the second and higher orders. ) Is generated.
  • the extra diffracted light has a low intensity and travels in a different direction from the signal beam, so it has been said that it does not affect the measurement results until now.
  • the diffracted light can be a light beam (hereinafter, referred to as a “noise light beam”) that affects the measurement result by being superimposed on the signal light beam.
  • the measurement accuracy decreases.
  • An object of the present invention is to provide an interference measurement method capable of improving the measurement accuracy of interference measurement using a diffractive optical element.
  • Another object of the present invention is to provide an interference measuring device suitable for performing the interference measuring method.
  • Another object of the present invention is to provide a method of manufacturing a projection optical system capable of manufacturing a high-performance projection optical system, a high-performance projection optical system, and a high-performance projection exposure apparatus.
  • the interference measurement method of the present invention converts a measurement light beam emitted from a light source into an optimal wavefront shape by a null element including a diffractive optical element, and then projects the light beam onto an object, and after passing through the object, A light beam returning to the diffractive optical element interferes with a reference light beam, and an interference fringe generated by the interference is detected as characteristic data of the test object.
  • an operation procedure for acquiring the characteristic data in which an error due to an excessively diffracted light beam is avoided.
  • the characteristic data detected in the unrestricted state is not missing, but in this state, extra diffracted light of the light beam is generated in the diffractive optical element, and the characteristic data is attributed to the light beam. The error is superimposed.
  • the detection is performed for each of different regions.
  • the region is a ring-shaped or circular region, or a fan-shaped region corresponding to a part of the ring or the circle in the circumferential direction.
  • each of the extra diffracted lights emitted from the diffractive optical element can be efficiently limited.
  • a mask portion in which a light-restricted area is formed on a wedge-plane glass substrate is combined with a deflection angle adjustment portion that is a wedge-plane glass substrate different from the mask portion.
  • the light beam is restricted by inserting the mask into the measurement light beam, and in detecting the interference fringe at the time of the insertion, the rotation angle of the deflection angle adjustment unit around the optical axis is adjusted. This suppresses the deflection angle of the measurement light beam due to the insertion.
  • An interference measurement apparatus includes: an interference optical system that projects a measurement light beam emitted from a light source to a test object and causes a light beam that returns after passing through the test object to interfere with a reference light beam; A detector for detecting an interference fringe to be detected as characteristic data of the test object, a null element supporting means for supporting a null element including a diffractive optical element in a state inserted in the measurement light beam, A mask that supports a mask that restricts a light beam passing through a partial area of the diffractive optical element so that the mask can be removed from the measurement light beam JP03 / 00306
  • Such an interference measurement device is suitable for performing the interference measurement method of the present invention.
  • the method of manufacturing a projection optical system according to the present invention includes a step of measuring the characteristics of at least one of the optical surfaces or any of the optical elements in the projection optical system by the interference measurement method of the present invention. According to the interference measurement method of the present invention, high-precision measurement is possible, and according to such a method of manufacturing a projection optical system, a high-performance projection optical system can be manufactured.
  • a projection optical system according to the present invention is manufactured by the method for manufacturing a projection optical system according to the present invention. This projection optical system has high performance.
  • a projection optics comprising the projection optical system according to the first aspect.
  • This projection exposure apparatus has high performance.
  • FIG. 1 is a diagram showing a configuration of an interference measurement device 10 used in the interference measurement of the present embodiment.
  • FIG. 2 is a diagram schematically showing a state of a light beam near Z P5.
  • FIGS. 3 (a) and 3 (b) are diagrams illustrating a phenomenon in which a noise ray is generated.
  • FIG. 3 (c) is a diagram for explaining the tread measurement in the first embodiment.
  • FIG. 4 is a diagram illustrating the interference measurement according to the first embodiment.
  • FIG. 5 is a diagram illustrating the interference measurement according to the second embodiment.
  • FIG. 6 is a diagram illustrating another example of the interference measurement according to the second embodiment.
  • FIG. 7 is a diagram illustrating a mask suitable for each embodiment.
  • FIG. 8 is a view for explaining another example of the null element.
  • FIG. 9 is a schematic configuration diagram of a projection exposure apparatus according to the third embodiment. BEST MODE FOR CARRYING OUT THE INVENTION
  • FIG. 1 is a diagram showing a configuration of an interference measurement device 10 used in the interference measurement of the present embodiment.
  • the present invention can be similarly applied to both the measurement of the transmitted wavefront of the test object and the measurement of the test surface of the test object. The latter will be described below.
  • the interferometer 10 includes an interferometer 9 and support means (not shown) for supporting each optical element (test object 6, ZP 5, etc.) required for measurement.
  • the interferometer 9 includes a light source unit 1, a collimator lens 2, a polarizing beam splitter (hereinafter referred to as “PBS”) 3, a quarter-wave plate 4, a beam expander 7, a two-dimensional image detector 8, and the like.
  • PBS polarizing beam splitter
  • test object 6 On the side from which the measurement light beam (a parallel light beam) L is emitted in the interferometer 9, the test object 6 has its test surface 6a (this is a surface whose design shape is an aspheric surface). It is placed facing the 9 side.
  • ZP 5 a zone plate (hereinafter, referred to as “ZP”) 5 as a null element is inserted between the test object 6 and the interferometer 9 (ZP 5 corresponds to the diffractive optical element in the claims). I do.)
  • ZP 5 corresponds to the diffractive optical element in the claims. I do.
  • the diffraction pattern of the diffraction surface 5a of ZP5 is designed according to the design shape of the test surface 6a.
  • the measurement light beam L incident on the ZP 5 from the interferometer 9 is diffracted on the diffraction surface 5a, and a light beam composed of a predetermined order of diffracted light (hereinafter referred to as a transmitted first-order diffracted light) is Thus, an aspherical wave is incident on the surface 6a to be detected arranged at a predetermined position substantially perpendicularly and substantially in phase.
  • Each ray of the light beam has substantially the same path at the time of incidence and the path at the time of emission with respect to the test surface 6a.
  • each of these rays is diffracted again on the diffraction surface 5a, and returns to the interferometer 9 as a parallel light beam.
  • the luminous flux which is incident on the surface 6a to be inspected substantially perpendicularly and substantially in the same phase and returns to the interferometer 9 through almost the same path as that at the time of the incidence, is transmitted to the surface 6a to be inspected. It becomes “tested light beam LM” including the shape information.
  • the present invention can be applied to any type of interference measurement such as the Twyman Green type and Fizeau type, but the following description will be made assuming that the latter is the latter type.
  • a reference surface (Fizeau surface) is arranged in the optical path of the measurement light beam L incident on the test object 6, but in the interference measurement device 10 of the present embodiment, a null element is used.
  • the diffraction plane 5a of the inserted ZP 5 can be used as a reference plane (hereinafter, ZP 5 is used as a reference plane).
  • the light beam composed of the 0th-order diffracted light reflected on the diffraction surface 5a of ZP5 becomes the “reference light beam LR”.
  • the light propagation path in the interference measurement device 10 is as follows. That is, the light (linearly polarized light) emitted from the light source unit 1 shown in FIG. 1 is converted into a parallel light flux by the collimator lens 2 and enters the PBS 3.
  • the polarization direction of the parallel light beam is selected so as to be deflected in the PBS 3 in the direction of the test object 6.
  • the parallel light beam traveling in the direction of the test object 6 is rotated by 45 degrees in the quarter-wave plate 4 and enters the ZP 5 (measurement light beam L).
  • a part of the measurement light beam L incident on the ZP 5 becomes a reference light beam LR returning to the interferometer 9 on the diffraction surface 5a, and another part becomes a test light beam LM on the diffraction surface 5a. Proceed in the direction of 6.
  • test light beam LM is reflected by the test object 6, passes through ZP5, and is incident on the PBS3 with the polarization direction rotated by 45 degrees by the quarter-wave plate 4.
  • This test light beam LM passes through the quarter-wave plate 4 twice, and its polarization direction is rotated 90 °, so that it passes through the PBS 3.
  • test light beam LM transmitted through the PBS 3 is incident on the two-dimensional image detector 8 via the beam expander 7.
  • the reference light beam LR also passes through the 1 / 4-wavelength plate 4 twice like the test light beam LM, it passes through the PBS 3 and then passes through the beam expander 7 to the two-dimensional image detector. It is incident on 8.
  • test light beam LM and the reference light beam LR form interference fringes on the imaging surface 8a of the two-dimensional image detector 8.
  • the reflected zero-order diffracted light generated by the light beam L r ′ becomes a light beam L R r ′ (a signal light beam) forming the reference light beam LR.
  • the transmitted light + first-order diffracted light generated by the light beam L r ′ becomes a light beam LMr ′ (a signal light beam) forming the test light beam LM.
  • the light beam L r ′ also generates light other than these signal light beams LMr, LR r ′, for example, higher-order (second-order and higher) transmitted diffracted light. For example, it is a light ray LN r ′ emitted at an angle indicated by a dotted line in FIG.
  • the angle of incidence is not perpendicular to the surface 6a to be inspected. Therefore, the light beam LN r, after being reflected by the surface 6a to be inspected, returns along the path different from that at the time of incidence in the direction of ZP5, and enters another position r on the diffraction surface 5a.
  • the light ray LN r ′ becomes a light ray parallel to the optical axis and proceeds toward the interferometer 9 (see the dotted line in FIG. 3A).
  • the light beam Lr incident on the position r of the measurement light beam L is the same as the above-mentioned light beams at the position r ′, and the test light beam LM and the reference light beam LR The signal beams LMr and LR r to be generated are generated.
  • the light beam LN r travels in the same way as when such signal light beams LMr, LR r return in the direction of the interferometer 9, and is superimposed on the signal light beams LMr, LR r, and finally, as shown in FIG.
  • the light enters the two-dimensional image detector 8 and affects the measurement result.
  • this ray LN r 'force S is a "noise ray" (the above is the phenomenon in which a noise ray occurs).
  • Each optical system in the interferometer 10 has a rotationally symmetrical shape around the optical axis, so that the noise light beam from the same radial position as the position r ′ on the diffraction surface 5a is obtained.
  • a noise ray similar to LN r ' is emitted.
  • each optical system in the interferometer 10 has a continuous shape in the radial direction. Accordingly, noise rays similar to the above-described noise light LN r ′ are emitted from positions radially adjacent to the position r ′ on the diffraction surface 5a.
  • the position r 'that generates the noise ray LN r' is distributed in the annular zone Er 'centered on the optical axis as shown in Fig. 3 (b), and this position is on the diffraction surface 5a.
  • the position r where the noise ray is superimposed is also distributed in the annular zone Er around the optical axis.
  • the arrangement of these areas E r ′ and E r is determined by ray tracing based on the data of the test surface 6 a and ZP 5 (at least each ray passing through each position in the radial direction of the diffraction surface 5 a). Tracking).
  • Whether or not the noise ray generated in each area is negligible can be obtained in advance by ray tracing.
  • the light beam L r ′ When the light beam L r ′ superimposes the noise light beam LN r, on the light beam L r, the light beam L r often also superimposes the noise light beam LN r on the light beam L r ′. That is, in many systems, the two regions on the diffractive surface 5a superimpose a noise ray on each other.
  • FIG. 3C is a diagram illustrating the interference measurement according to the present embodiment.
  • the light beam L r ′ passing through the region E r ′ is restricted (light shielding or dimming. Light shielding is preferable, but the intensity of the noise light beam LNr ′ is sufficiently increased. If it can be reduced to a small value, the light may be dimmed.)
  • a mask Mr ′ is prepared, and a mask Mr that restricts the light beam Lr passing through the region Er is provided.
  • the mask Mr ' has no restriction on the light ray Lr, and the mask Mr has no restriction on the light ray Lr'.
  • the positions where the masks Mr ′ and Mr in the interferometer 10 are inserted are, as shown in FIG. 1, in a parallel light beam (for example, interferometer 9 and ZP). And 5 in the measurement light flux L).
  • the shape (mask pattern) of the light limiting area of the mask Mr ' is almost the same as the area of the diffraction plane 5 &
  • the mask pattern of the mask Mr is almost the same as the area Er of the diffraction plane 5a. It has the same shape.
  • the mask patterns of the masks Mr 'and Mr are larger than the regions Er' and Er in order to facilitate the alignment at the time of mask insertion.
  • the interference fringe data D r 'and Dr output from the two-dimensional image detector' 8 are not shown in each state where the masks Mr and are individually input. It is captured by a computer or other computing device such as a control circuit (see Fig. 4).
  • the test object in which the error caused by the noise light beams LNr 'and LNr is avoided is obtained.
  • the interference fringe data D for the entire area of the surface 6a can be obtained.
  • the interference fringe data obtained for the same test object may have different values due to the arrangement relationship of the optical system in the interferometer 10 and environmental changes. It may be off.
  • the two interference fringe data D r ′ and the interference fringe data D r are overlapped with each other in an overlapping area (here, an area other than the areas Er and Er). Compensate based on the data and then purify. So, Such steps and inclinations are eliminated.
  • the mask patterns of the masks Mr 'and Mr are slightly larger than the regions E r' and E r in order to facilitate the alignment. Requires the data of the overlap area in this way, the mask patterns of the masks Mr and Mr 'are selected so that the area not restricted by any of the masks Mr and Mr is sufficiently secured. Is preferred.
  • FIG. 1 A second embodiment of the present invention will be described with reference to FIG. 1, FIG. 5, and FIG.
  • FIG. 5 is a diagram illustrating the interference measurement according to the present embodiment.
  • the case where the light beams L r ′ and L r passing through the different radial positions r and r 5 overlap the noise light beam with each other has been described.
  • FIG. As shown, the light beams L r ⁇ ′ and L r ⁇ passing through two positions r 0 ′ and r ⁇ at the same radial position r (these are the target positions based on the optical axis) are mutually noise noises LNr.
  • the interference measurement when 0 ′ and LN r0 are superimposed will be described. .
  • such a noise ray LN r 6, (LN r ⁇ ) is a higher order (L r 0) of the ray L r 0 ′ (L r 0) incident on the position r ⁇ ′ (r 6) of the diffraction surface 5 a. (2nd and subsequent orders) are transmitted diffracted light rays that enter the vertex 6a0 of the test surface 6a and then return to the diffraction surface 5a.
  • the interference fringe data D r ′ and Dr output from the two-dimensional image detector 8 are not shown in each state where the masks Mr ⁇ ′ and Mr ⁇ are introduced.
  • Computer and control devices such as control circuits.
  • the mask pattern of the mask is not limited to one that is a part of the annular zone as shown in FIG. 5B.
  • the mask pattern may be a part of a circle as shown in FIGS. 6A and 6B as long as the mask pattern restricts a part of the region Er in the circumferential direction.
  • FIG. 7 is a diagram illustrating a mask suitable for each embodiment.
  • FIG. 7 shows the masks Mr 'and Mr in the first embodiment ((a) is the former, and (b) is the latter). Further, the description of the masks Mr 'and Mr described below and the first embodiment is similarly applied to other masks and other embodiments.
  • the mask pattern Mr b 'of the mask Mr is formed on the wedge flat glass substrate Mr a'.
  • the mask Mr When used, the mask Mr, has the mask pattern Mr b, formed on ZP5 (see Fig. 1). ) Is inserted into the measurement light beam L in a state facing.
  • the reason why the wedge flat glass is used instead of the parallel flat glass is that the reflected light of the measurement light beam L on the surface on which the mask pattern M rb ′ is not formed becomes stray light and enters the two-dimensional image detector 8. This is to avoid doing so.
  • the wedge flat glass substrate Mr a ′ has a drawback that the measurement beam L is deflected due to the insertion. .
  • the mask Mr is provided with another wedge flat glass substrate Mr c 'in addition to the wedge flat glass substrate Mr a'.
  • the wedge flat glass substrate Mr c ′ is arranged adjacent to the wedge flat glass substrate Mr a ′, and the wedge angle is almost the same as that of the wedge flat glass substrate Mr a ′.
  • the wedge flat glass substrate Mr c, in the mask Mr 'can rotate around the optical axis, and the rotation finely adjusts the declination of the measurement light beam L, and the declination can be performed with + minute accuracy.
  • both glass substrates can be combined at various rotation angles. This is because an arbitrary argument can be set in the range of ( ⁇ 0 1), ⁇ (2 ⁇ + ⁇ 1).
  • the propagation path of the light beam to ZP5 when both are inserted individually can be made the same. Therefore, the synthesis of the interference fringe data obtained using the masks M r ′ and M r (see FIG. 4) is performed without error, and the measurement accuracy of the first embodiment is improved.
  • a light-shielding plate (attenuator) formed in the same manner as the mask pattern can be placed on the surface opposite to the diffraction surface 5a of ZP5. Therefore, it is not necessary to form a mask pattern on a glass substrate.
  • Interference fringe data can be obtained for the entire area.
  • the mask pattern of the mask to be used at the time of acquisition it is preferable to select a mask pattern that efficiently limits each area that causes noise light rays, such as a pattern that simultaneously limits a plurality of types of areas. By using such a mask, the number of times of acquiring interference fringe data can be reduced.
  • the null element consists of ZP5 and lens 25 ', Not only reflected light but also reflected light on the refracting surface of the lens 25 '(for example, the surface indicated by reference numeral 25a') generates an extra light beam that becomes a noise light beam (reference numeral LNr 'in FIG. 8). (Note that such a noise ray can be examined by considering the data of the lens 25 in the ray tracing.)
  • the case where the surface (the surface to be inspected 6a) is measured has been described.
  • the case where the wavefront (transmitted wavefront) of a light beam formed by transmitting an object such as a lens is measured is also described.
  • the present invention can be applied if a diffractive optical element is used.
  • the interference measurement device 10 shown in FIG. 1 may be configured so that the interference measurement of each of the above embodiments is performed efficiently.
  • a mechanism that supports two types of masks Mr and Mr ′ and that individually inserts them into the measurement light beam L is provided.
  • An arithmetic unit such as a control circuit or a computer may be configured to drive a part or all of the computer.
  • the measuring light beam L may be provided with a mechanism for rotating the ⁇ mask the interference measuring apparatus 1 0 c also previously
  • the interference measurement device 10 may be configured to be able to flexibly adapt to the interference measurement of various test objects 6.
  • an arithmetic unit such as a control circuit or a computer may be configured to automatically select a mask according to the design shape of the test object 6.
  • each mechanism in the interference measuring device 10 is driven by a computing device such as a control circuit or a computer, and the interference fringe data acquired by the two-dimensional image detector 8 is combined by the computing device to perform the entire interference measurement. It may be automated.
  • FIG. 9 is a schematic configuration diagram of a projection exposure apparatus according to the present embodiment.
  • At least one optical element constituting the projection optical system L mounted on the projection exposure apparatus has, during its manufacture, its surface shape and Z or its transmitted wavefront measured by any one of the interference measurements according to the above embodiments. Have been.
  • At least one surface of the projection optical system L is processed and / or adjusted according to the measurement result.
  • the projection optical system L Since the measurement according to each of the above embodiments is highly accurate, the projection optical system L has high performance even if the processing (and / or adjustment) method is the same as the conventional method. Therefore, this projection exposure apparatus having the projection optical system L has high performance.
  • this projection exposure apparatus includes a wafer stage 108, a stage control system 107, a light source 101, an illumination optical system 102, and a reticle exchange system 104.
  • a reticle stage 105, a main control unit 109, and the like are provided.
  • the projection optical system L is arranged between an object plane P1 on which a reticle (mask) R is arranged and an image plane P2 which is made to coincide with the surface of the wafer W.
  • the substrate (wafer) W coated with the photosensitive agent is placed on the surface 108 a of the wafer stage 108.
  • the position of the wafer stage 108 is controlled by a stage control system 107.
  • the illumination optical system 102 includes an alignment optical system 103.
  • a reticle R for projecting a pattern on the wafer W is supported by a reticle stage 105.
  • Reticle stage 105 can move parallel to surface 108 a of wafer stage 108.
  • the reticle exchange system 104 exchanges and transports the reticle R set on the reticle stage 105.
  • reticle exchange system 104 includes a stage driver (not shown) for moving reticle stage 105 parallel to surface 108 a of wafer stage 108.
  • the main control unit 109 controls each unit with respect to a series of processes from the alignment to the exposure.
  • the measurement precision of the interference measurement using a diffractive optical element can be improved.
  • an interference measurement device suitable for performing such an interference measurement method is realized.
  • a method for manufacturing a projection optical system capable of manufacturing a high-performance projection optical system, a high-performance projection optical system, and a high-performance projection exposure apparatus are realized.
  • the present invention contributes to the development of a technology using a projection exposure apparatus, for example, a semiconductor manufacturing technology.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

L'invention concerne un procédé de mesure précis pour une mesure d'interférence faisant appel à un élément optique de diffraction. L'invention concerne un procédé de mesure d'interférence consistant à convertir un flux lumineux à mesurer émis à partir d'une source lumineuse en une forme de surface d'onde optimale au moyen d'un élément Nul, comprenant un élément optique de diffraction pour une projection sur un objet à examiner, à permettre à un flux lumineux qui est renvoyé sur l'élément optique de diffraction, après être passé à travers l'objet à examiner, de créer une interférence avec un flux lumineux de référence, et de détecter une frange d'interférence produites par l'interférence en tant que donnée caractéristique de l'objet à examiner. Le procédé de mesure consiste à détecter une frange d'interférence au moyen d'un flux lumineux passant sur certaines zones d'un élément optique de diffraction, et y compris dans un flux lumineux de mesure, à la fois restreint et non restreint, et à acquérir la donnée caractéristique mentionnée ci-dessus, exempte d'erreurs qui pourraient être causées par une lumière de diffraction excessive dans un flux lumineux mentionné ci-dessous, en fonction de chaque frange d'interférence détectée dans de telles conditions.
PCT/JP2003/000306 2002-01-25 2003-01-16 Procede de mesure d'interference, dispositif de mesure d'interference, methode de production pour systeme optique de projection, systeme optique de projection, et aligneur de projection WO2003064966A1 (fr)

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JP2002-017251 2002-01-25
JP2002017251A JP2003214814A (ja) 2002-01-25 2002-01-25 干渉測定方法、干渉測定装置、及び投影光学系の製造方法、投影光学系、並びに投影露光装置

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JP4311739B2 (ja) * 2004-09-24 2009-08-12 フジノン株式会社 干渉計装置用光量比調整フィルタ、干渉計装置および光干渉測定方法

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Publication number Priority date Publication date Assignee Title
JP2000097617A (ja) * 1998-09-22 2000-04-07 Nikon Corp 干渉計
JP2002333305A (ja) * 2001-05-08 2002-11-22 Nikon Corp 干渉測定装置および横座標計測方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000097617A (ja) * 1998-09-22 2000-04-07 Nikon Corp 干渉計
JP2002333305A (ja) * 2001-05-08 2002-11-22 Nikon Corp 干渉測定装置および横座標計測方法

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