JP6882338B2 - リソグラフィ方法及び装置 - Google Patents
リソグラフィ方法及び装置 Download PDFInfo
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- G—PHYSICS
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
- G03F7/70516—Calibration of components of the microlithographic apparatus, e.g. light sources, addressable masks or detectors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
- G03F1/42—Alignment or registration features, e.g. alignment marks on the mask substrates
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G03F7/70725—Stages control
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7019—Calibration
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Multimedia (AREA)
- Health & Medical Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Length Measuring Devices By Optical Means (AREA)
Description
[0001] この出願は、2016年5月4日に出願された欧州特許出願16168284.4の優先権を主張し、参照によりその全体が本明細書に組み込まれる。
Claims (13)
- 各々がリソグラフィ装置の投影システムのマスク側に位置する回折格子と、ディテクタとを備えた複数のディテクタモジュールを備えたマスクセンサ装置を使用して、ターゲット格子の位置を測定する方法であって、前記方法が、
前記マスクセンサ装置が前記ターゲット格子に対して第1の方向に沿って相対的に移動する間に、前記ターゲット格子から回折された回折次数の組み合わせの第1の強度を測定する第1のステップと、
前記マスクセンサ装置を前記ターゲット格子に対して第2の方向に変位させる第2のステップと、
前記マスクセンサ装置が前記ターゲット格子に対して前記第1の方向に沿って相対的に移動する間に、前記ターゲット格子から回折された回折次数の前記組み合わせの第2の強度を測定する第3のステップと、を含む方法。 - 前記第1及び第2の強度を測定するステップが、
複数の放射極を用いて前記回折格子を照明すること、
前記投影システムを介して放射極ごとに少なくとも2つの生成された異なる回折次数を結合すること、及び
前記投影システムを用いて前記回折次数を前記ターゲット格子に投影して、前記回折次数の回折によって1対の組み合わせ回折次数が形成されるようにすること、を含む、請求項1に記載の測定方法。 - 前記第1の方向が前記第2の方向に垂直である、請求項1又は2に記載の測定方法。
- 前記第2のステップ及び前記第3のステップが複数回繰り返される、請求項1から3のいずれかに記載の測定方法。
- 前記第1のステップの前に、アライメントセンサを使用して前記ターゲット格子の位置を決定することをさらに含む、請求項1から4のいずれかに記載の測定方法。
- 前記ターゲット格子が、前記マスクセンサ装置によって使用可能な第1の部分と、前記アライメントセンサによって使用可能な第2の部分とを含む、請求項5に記載の測定方法。
- 前記ターゲット格子が基板上に設けられる、請求項1から6のいずれかに記載の測定方法。
- 前記ターゲット格子が前記リソグラフィ装置のコンポーネント上に設けられる、請求項1から6のいずれかに記載の測定方法。
- 前記ターゲット格子が前記リソグラフィ装置の基板ステージ上に設けられる、請求項8に記載の測定方法。
- 請求項1から9のいずれかの方法を実行するための手段を備えるリソグラフィ装置。
- デバイスフィーチャ及びターゲット格子がリソグラフィプロセスによって一連の基板上に形成され、1つ以上の処理基板上の前記ターゲット格子の特性が、請求項1から9のいずれかの方法によって測定され、前記測定された特性を使用して、別の基板の処理のために前記リソグラフィプロセスのパラメータを調整する、デバイスを製造する方法。
- 請求項1から9のいずれかの方法で使用可能な少なくとも1つの回折格子を備えるマスクセンサ装置。
- 請求項1から9のいずれかの方法を実行するための1つ以上の機械可読命令シーケンスを含むコンピュータプログラム。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP16168284 | 2016-05-04 | ||
EP16168284.4 | 2016-05-04 | ||
PCT/EP2017/058057 WO2017190905A1 (en) | 2016-05-04 | 2017-04-05 | Lithographic method and apparatus |
Publications (2)
Publication Number | Publication Date |
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JP2019515349A JP2019515349A (ja) | 2019-06-06 |
JP6882338B2 true JP6882338B2 (ja) | 2021-06-02 |
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JP2018557331A Active JP6882338B2 (ja) | 2016-05-04 | 2017-04-05 | リソグラフィ方法及び装置 |
Country Status (4)
Country | Link |
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US (1) | US10444635B2 (ja) |
JP (1) | JP6882338B2 (ja) |
NL (1) | NL2018651A (ja) |
WO (1) | WO2017190905A1 (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
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CN108776406B (zh) * | 2018-05-29 | 2021-06-01 | 武汉华星光电技术有限公司 | 一种彩色滤光片的制备基板及彩色滤光片基板的制造方法 |
CN110727169B (zh) * | 2018-07-17 | 2021-04-06 | 上海微电子装备(集团)股份有限公司 | 一种掩模装置、曝光设备及曝光方法 |
CN109834664B (zh) * | 2019-01-28 | 2022-03-22 | 上海交通大学 | 适用于长方形工作台的自校准方法 |
US11275312B1 (en) | 2020-11-30 | 2022-03-15 | Waymo Llc | Systems and methods for verifying photomask cleanliness |
Family Cites Families (12)
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JPS62172203A (ja) * | 1986-01-27 | 1987-07-29 | Agency Of Ind Science & Technol | 相対変位測定方法 |
JPH0453220A (ja) * | 1990-06-20 | 1992-02-20 | Nikon Corp | 投影光学装置 |
WO1997035234A1 (en) * | 1996-03-15 | 1997-09-25 | Philips Electronics N.V. | Alignment device and lithographic apparatus provided with such a device |
JP2000089483A (ja) | 1998-09-14 | 2000-03-31 | Nikon Corp | 基板処理方法および基板処理装置並びに露光装置 |
TW497013B (en) * | 2000-09-07 | 2002-08-01 | Asm Lithography Bv | Method for calibrating a lithographic projection apparatus and apparatus capable of applying such a method |
FR2825150B1 (fr) * | 2001-05-28 | 2003-09-26 | Univ Jean Monnet | Dispositif de caracterisation de reseaux optiques et procede de fabrication de reseaux optiques avec une frequence spatiale predefinie |
EP2131245A3 (en) * | 2008-06-02 | 2012-08-01 | ASML Netherlands BV | Lithographic apparatus and its focus determination method |
US8149420B2 (en) * | 2008-07-25 | 2012-04-03 | Agilent Technologies, Inc. | Interferometer calibration system and method |
NL2009345A (en) | 2011-09-28 | 2013-04-02 | Asml Netherlands Bv | Method of applying a pattern to a substrate, device manufacturing method and lithographic apparatus for use in such methods. |
WO2014044477A1 (en) * | 2012-09-18 | 2014-03-27 | Asml Netherlands B.V. | Stage system and lithographic apparatus comprising such stage system |
US9989864B2 (en) * | 2014-07-16 | 2018-06-05 | Asml Netherlands B.V. | Lithographic method and apparatus |
JP6654251B2 (ja) * | 2015-11-30 | 2020-02-26 | エーエスエムエル ネザーランズ ビー.ブイ. | リソグラフィ方法およびリソグラフィ装置 |
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2017
- 2017-04-05 US US16/098,350 patent/US10444635B2/en active Active
- 2017-04-05 WO PCT/EP2017/058057 patent/WO2017190905A1/en active Application Filing
- 2017-04-05 JP JP2018557331A patent/JP6882338B2/ja active Active
- 2017-04-05 NL NL2018651A patent/NL2018651A/en unknown
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US20190163072A1 (en) | 2019-05-30 |
NL2018651A (en) | 2017-11-07 |
US10444635B2 (en) | 2019-10-15 |
JP2019515349A (ja) | 2019-06-06 |
WO2017190905A1 (en) | 2017-11-09 |
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