WO2002045465A1 - Chauffage ceramique, et pate de resistance de chauffage ceramique - Google Patents
Chauffage ceramique, et pate de resistance de chauffage ceramique Download PDFInfo
- Publication number
- WO2002045465A1 WO2002045465A1 PCT/JP2000/008551 JP0008551W WO0245465A1 WO 2002045465 A1 WO2002045465 A1 WO 2002045465A1 JP 0008551 W JP0008551 W JP 0008551W WO 0245465 A1 WO0245465 A1 WO 0245465A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- particles
- resistor
- ceramic heater
- ceramic
- noble metal
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/10—Heater elements characterised by the composition or nature of the materials or by the arrangement of the conductor
- H05B3/12—Heater elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material
- H05B3/14—Heater elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material the material being non-metallic
- H05B3/141—Conductive ceramics, e.g. metal oxides, metal carbides, barium titanate, ferrites, zirconia, vitrous compounds
- H05B3/143—Conductive ceramics, e.g. metal oxides, metal carbides, barium titanate, ferrites, zirconia, vitrous compounds applied to semiconductors, e.g. wafers heating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67103—Apparatus for thermal treatment mainly by conduction
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/10—Heater elements characterised by the composition or nature of the materials or by the arrangement of the conductor
- H05B3/12—Heater elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/20—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater
- H05B3/22—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible
- H05B3/26—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible heating conductor mounted on insulating base
- H05B3/265—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible heating conductor mounted on insulating base the insulating base being an inorganic material, e.g. ceramic
Definitions
- the present invention relates to a ceramic heater and a resistor paste for a ceramic heater used in a manufacturing process of a semiconductor product.
- Japanese Patent Application Laid-Open No. H11-140330 proposes a heater in which a heating element is formed on the surface of a ceramic substrate.
- an alumina substrate has been used as a substrate for such a heater.
- a substrate made of aluminum nitride which has excellent electrical insulation properties, high thermal conductivity, and low thermal expansion coefficient, has attracted attention.
- a resistor paste for providing a heating element on such aluminum nitride As a resistor paste for providing a heating element on such aluminum nitride, a resistor paste in which noble metal particles are mixed as a conductive substance is conventionally known. Among precious metals, silver has excellent heat resistance and excellent adhesion to aluminum nitride, and silver is considered to be a preferable material from this point of view. However, when a resistor paste containing only silver is used, there is a disadvantage that the resistance value of the resistor is reduced.
- a resistor for an aluminum nitride heater described in Japanese Patent Application Laid-Open Publication No. Hei 4 (1991) -4949 includes one or more metal powders selected from platinum, palladium, silver, and gold, and a crystallization temperature of 7 or more.
- 0 0 consists as ° C or more Garasufuri' bets (such as Z N_ ⁇ one B 2 0 3 -S i 0 2 based glass).
- the area resistivity of the resistor after firing is 0.5 ⁇ square or more and 10 ⁇ / square or less, and the resistor is 4.5 kgf / 2 mm square to 7.0 kgf with respect to the aluminum nitride substrate.
- a main object of the present invention is to provide a ceramic heater in which a resistor is more firmly bonded to a non-oxide ceramic substrate such as an aluminum nitride substrate or a silicon carbide substrate.
- a second object is to provide a resistor paste for a ceramic heater by which a resistor having excellent adhesive strength can be obtained by firing.
- an improved ceramic heater and a ceramic heater resistor paste are provided.
- the present inventors have conducted intensive research to solve the above-mentioned problems. As a result, it was found that a mixture of at least two or more types of noble metal particles and ruthenium dioxide was made into a paste, which was baked on an aluminum nitride substrate or silicon carbide substrate to form a resistor with excellent adhesive strength. Obtained. The present inventors have completed the present invention based on this finding.
- the present invention relates to a ceramic heater in which a resistor is provided on a ceramic substrate, wherein the resistor comprises at least two or more kinds of noble metal particles, ruthenium dioxide, and glass frit.
- the present invention relates to a precious metal particle, ruthenium dioxide, glass frit,
- the present invention relates to a ceramic paste resistor paste made of a vehicle.
- ruthenium such as Ru 2 P b 2 ⁇ 6 or Ru 2 B i 2 0 7, a composite compound composed of glass frit and oxygen present at the interface between the aluminum nitride substrate resistor (sintered metal)
- ruthenium such as Ru 2 P b 2 ⁇ 6 or Ru 2 B i 2 0 7
- the bonding strength of the resistor to the aluminum nitride substrate is about 14 kgf / "2 mm square to about 17 kgf / '" 2 mm square, which is lower than that of the conventional technology. It has been confirmed that the size becomes extremely large.
- the resistance value of the resistor can be increased.
- FIG. 1 is a plan view showing a ceramic heater in which a resistor is formed on a ceramic substrate.
- FIG. 2 is a partially omitted cross-sectional view taken along the line 11 in FIG.
- FIG. 3A is a diagram showing a bonding state between a resistor containing ruthenium dioxide and a ceramic substrate.
- FIG. 3B is a diagram showing a bonding state between a resistor not containing ruthenium dioxide and a ceramic substrate.
- FIG. 4 is a table showing the compositions of the pastes of the reference examples and the comparative examples, and the test results when these pastes were used.
- the resistor paste for a ceramic heater according to the present embodiment is composed of noble metal particles mainly composed of silver or gold, ruthenium dioxide, glass frit, and an organic vehicle.
- noble metal particles at least one selected from silver particles, gold particles, platinum particles, and palladium particles, or at least two or more types are used.
- a mixture of each noble metal particle or an alloy particle of each noble metal may be used.
- the average particle size of the noble metal particles is preferably about 0.1 ⁇ m to 10 / m. If the average particle size is too small, the noble metal particles easily oxidize. If the average particle size is too large, sintering of the paste becomes difficult, and the resistance value of the obtained resistor 2 increases.
- the shape of the noble metal particles is not particularly limited, spherical particles, flaky particles, a mixture of spherical particles and flaky particles, or the like can be used. Among these, it is preferable to select flaky particles from the viewpoint of good adhesion to aluminum nitride.
- noble metal particles contained in the paste generally, only one kind of silver particles may be used. This is advantageous in terms of cost and the like.
- noble metals other than silver that is, noble metal particles selected from gold particles, platinum particles, and palladium particles, are mixed into the paste in an appropriate ratio. I'll do it. The mixing ratio at this time may be determined as appropriate.
- a small amount of base metal particles such as nickel ', copper, and zinc may be mixed with the noble metal particles as long as the effects of the present invention are not impaired.
- the ruthenium dioxide reacts with the oxide contained in the paste to produce nitrogen gas. It plays a role in suppressing the occurrence of heat.
- Garasufuri' Bok for example, S i O 2 - B 2 O 3 - Z N_ ⁇ 2 based glass can be used primarily.
- Garasufuri' Bok there is no particular limitation on the composition of Garasufuri' Bok, for example, S i 0 2 1 wt% to 30 wt% relative to Furitsuto total amount, 8 2 0 3 is 5 wt% to 50 wt%, Z N_ ⁇ 2 2 0 % By weight to 70% by weight.
- the glass frit is preferably an amorphous body.
- the glass softening point of the glass frit is preferably 300 ° C to 650 ° C. If this temperature is too low, bleeding will occur when the resistor 2 is baked, causing a short circuit between the patterns. If the temperature is too high, sufficient adhesion strength cannot be obtained.
- the organic vehicle serves to paste the mixture such as metal particles into the ceramic substrate 1 in order to apply the mixture to the ceramic substrate 1.
- Known organic vehicles can be used.
- Examples of such an organic vehicle include those composed of a resin binder such as ethyl cellulose, methyl cellulose, and an acrylic resin, and a solvent such as ⁇ -terbineol and butyl carbitol.
- the mixing ratio of each substance constituting the paste is not particularly limited. However, 55% to 80% by weight of noble metal particles, 0.5% to 10% by weight of ruthenium dioxide, and 5% by weight of glass frit, based on the total amount of the paste. /. 20% by weight, 1 weight of resin binder. /. It is preferable that the solvent be contained in the range of 10 to 30% by weight and the solvent be contained in the range of 10 to 30% by weight.
- FIG. 1 for example, as shown in FIG. It is applied in a predetermined shape by a technique.
- This resistor paste is fired at about 700 ° C to 900 ° C in a nitrogen atmosphere. It adheres to the ceramic substrate 1 As a result, a ceramic heater in which the resistor 2 (heating element) is formed on the ceramic substrate 1 is manufactured.
- a metal layer made of a non-oxidizing metal such as gold, silver, palladium, platinum, and nickel.
- the ceramic substrate 1 is, for example, an aluminum nitride substrate 1
- aluminum nitride reacts with an oxide in the glass frit to generate alumina.
- the aluminum nitride substrate 1 partially dissolves, and alumina enters the recesses formed by the dissolution. Therefore, this reaction itself basically contributes to improving the adhesion between the aluminum nitride substrate 1 and the resistor 2.
- this reaction generates a large amount of nitrogen gas. For this reason, the nitrogen gas pushes up the resistor 2 from the inside, causing a large separation of the resistor 2 as shown in FIG. 3B.
- the silicon carbide reacts with the oxide in the glass frit to generate silica.
- silicon carbide substrate 1 partially dissolves, and silica enters into the recesses formed by the dissolution. Therefore, this reaction itself basically contributes to the improvement of the adhesion between the silicon carbide substrate 1 and the resistor 2c.
- this reaction generates a large amount of carbon monoxide gas. For this reason, the carbon monoxide gas pushes up the resistor 2 from the inside, which also causes large separation of the resistor 2 as shown in FIG. 3B.
- the adhesion between the ceramic substrate 1 and the resistor 2 is improved as shown in FIG. 3A by controlling the addition of ruthenium oxide so as not to generate a large amount of the gas.
- each paste is as shown in the table in Fig. 4.
- the noble metal particles scaly ones having an average particle size of 4.5 / im and used.
- the composition is shown as a weight ratio to the total amount of the paste.
- the pastes of the respective reference examples differ in their composition, they are all suitable for use with non-oxide ceramics such as aluminum aluminum and silicon carbide.
- Alcohol is added to 100 parts by weight of aluminum nitride powder (average particle size: 1.0 ⁇ ), 4 parts by weight of yttria (average particle size: 0.4 ⁇ ), and 12 parts by weight of acrylic resin binder.
- the mixture was kneaded, and a granular powder was obtained by a spray dryer method. This granular powder was put into a molding die and molded into a flat plate to obtain a molded product.
- a through hole for inserting a semiconductor wafer support pin and a recess for embedding a thermocouple were drilled in this molded body by drilling. Thereafter, the compact was hot-pressed under the condition of about 180 ° C.
- the sintered body was cut into a circular shape having a diameter of 21 O mm to obtain an aluminum nitride substrate 1 for a disk-shaped heater.
- the pastes of Reference Examples 1 to 4 and Comparative Example were applied to this aluminum nitride substrate 1 by a screen printing method so as to have the shape of the resistor 2 shown in FIG. Then, the substrate 1 was baked in a nitrogen atmosphere at 850 ° C., and the paste was baked. Then, the aluminum nitride heater 1 thus obtained was used as a test body of Reference Examples 1 to 4 and Comparative Example. In Examples 1 to 4 and Comparative Example, a paste containing the largest amount of silver in the composition was used.
- a molded product was obtained as described above using, as a starting material, a product obtained by adding 0.5 parts by weight of carbon to 100 parts by weight of silicon carbide powder (average particle size: 1.1 ⁇ ). Then, after drilling the compact, hot pressing was performed under the condition of 190 ° C. and 200 kg Z cm 2 to obtain a silicon carbide sintered body having a thickness of 3 mm. Was.
- a glass layer serving as an insulating layer was formed on the surface of the silicon carbide sintered body by applying a glass paste to the surface of the silicon carbide sintered body and heating the paste to 800 ° C. .
- the paste of Reference Example 5 was screen-printed on the surface of the glass layer, and the silicon carbide substrate 1 was fired at 850 ° C. in a nitrogen atmosphere to obtain a silicon carbide heater 1 of Reference Example 5.
- a paste containing the largest amount of gold in the composition specifically, an Au—Pt paste
- the resistor 2 had a thickness of about 5 to 1 ⁇ and a width of about 2.4 mm.
- the tensile strength of the resistor 2 was measured for each specimen. Specifically, a 90-degree peel test was performed on a resistor 2 formed in a 2 mm square size as a test piece. The peel test used an "Autograph" manufactured by Shimadzu Corporation. In this peel test, the pulling speed was set to 5 mm.
- the sheet resistivity of the resistor 2 was measured for each test piece. Specifically, the resistance of a resistor 2 formed to a thickness of 1.0 ⁇ m, a width of 5 mm, and a length of 5 cm is measured with a multimeter, and the area resistivity is calculated based on the measurement results. did. Table 1 shows the results of the above tests.
- the resistor 2 is extremely firmly bonded to the aluminum nitride substrate 1 or the silicon carbide substrate 1. Therefore, it becomes a ceramic heater having excellent durability and reliability, and its industrial value is improved.
- the resistor paste for a ceramic heater according to the present invention comprises a ceramic-based resistor paste.
- the heat resistance can be improved and the material cost can be reduced.
Description
Claims
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP00978080A EP1339258A4 (en) | 2000-12-01 | 2000-12-01 | CERAMIC HEATING ELEMENT AND RESISTANCE PASTE FOR CERAMIC HEATING ELEMENT |
JP2002546467A JPWO2002045465A1 (ja) | 2000-12-01 | 2000-12-01 | セラミックヒータ及びセラミックヒータ用抵抗体ペースト |
US10/182,009 US20030000938A1 (en) | 2000-12-01 | 2000-12-01 | Ceramic heater, and ceramic heater resistor paste |
PCT/JP2000/008551 WO2002045465A1 (fr) | 2000-12-01 | 2000-12-01 | Chauffage ceramique, et pate de resistance de chauffage ceramique |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2000/008551 WO2002045465A1 (fr) | 2000-12-01 | 2000-12-01 | Chauffage ceramique, et pate de resistance de chauffage ceramique |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2002045465A1 true WO2002045465A1 (fr) | 2002-06-06 |
Family
ID=11736757
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2000/008551 WO2002045465A1 (fr) | 2000-12-01 | 2000-12-01 | Chauffage ceramique, et pate de resistance de chauffage ceramique |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP1339258A4 (ja) |
JP (1) | JPWO2002045465A1 (ja) |
WO (1) | WO2002045465A1 (ja) |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0917232A (ja) * | 1995-06-30 | 1997-01-17 | Tanaka Kikinzoku Internatl Kk | 導体ペースト組成物 |
JPH10335108A (ja) * | 1997-06-05 | 1998-12-18 | Tanaka Kikinzoku Kogyo Kk | 厚膜抵抗ペースト |
JPH1140330A (ja) * | 1997-07-19 | 1999-02-12 | Ibiden Co Ltd | ヒーターおよびその製造方法 |
JPH1166955A (ja) * | 1997-08-11 | 1999-03-09 | Hitachi Chem Co Ltd | 導電ペースト |
JP2000077167A (ja) * | 1998-08-31 | 2000-03-14 | Kyocera Corp | 面状発熱体 |
JP2000231980A (ja) * | 1999-02-10 | 2000-08-22 | Ibiden Co Ltd | ホットプレート用窒化アルミニウム基材 |
JP2000311767A (ja) * | 1999-02-24 | 2000-11-07 | Ibiden Co Ltd | セラミック基材 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3553109A (en) * | 1969-10-24 | 1971-01-05 | Du Pont | Resistor compositions containing pyrochlore-related oxides and noble metal |
GB2104058A (en) * | 1981-08-03 | 1983-03-02 | Avx Corp | Silver-filled glass metallizing paste |
ATE49335T1 (de) * | 1987-06-10 | 1990-01-15 | Degussa | Verwendung einer edelmetallhaltigen paste zur herstellung von braeunungsgeschirr fuer mikrowellenoefen. |
WO1999063553A1 (en) * | 1998-05-29 | 1999-12-09 | E.I. Du Pont De Nemours And Company | Thick film resistor compositions for making heat-transfer tapes and use thereof |
-
2000
- 2000-12-01 EP EP00978080A patent/EP1339258A4/en not_active Withdrawn
- 2000-12-01 JP JP2002546467A patent/JPWO2002045465A1/ja active Pending
- 2000-12-01 WO PCT/JP2000/008551 patent/WO2002045465A1/ja not_active Application Discontinuation
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0917232A (ja) * | 1995-06-30 | 1997-01-17 | Tanaka Kikinzoku Internatl Kk | 導体ペースト組成物 |
JPH10335108A (ja) * | 1997-06-05 | 1998-12-18 | Tanaka Kikinzoku Kogyo Kk | 厚膜抵抗ペースト |
JPH1140330A (ja) * | 1997-07-19 | 1999-02-12 | Ibiden Co Ltd | ヒーターおよびその製造方法 |
JPH1166955A (ja) * | 1997-08-11 | 1999-03-09 | Hitachi Chem Co Ltd | 導電ペースト |
JP2000077167A (ja) * | 1998-08-31 | 2000-03-14 | Kyocera Corp | 面状発熱体 |
JP2000231980A (ja) * | 1999-02-10 | 2000-08-22 | Ibiden Co Ltd | ホットプレート用窒化アルミニウム基材 |
JP2000311767A (ja) * | 1999-02-24 | 2000-11-07 | Ibiden Co Ltd | セラミック基材 |
Non-Patent Citations (1)
Title |
---|
See also references of EP1339258A4 * |
Also Published As
Publication number | Publication date |
---|---|
EP1339258A4 (en) | 2005-07-20 |
EP1339258A1 (en) | 2003-08-27 |
JPWO2002045465A1 (ja) | 2004-04-08 |
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