WO2002029869A1 - Aligneur de projection et procede de fabrication de dispositif utilisant cet aligneur - Google Patents

Aligneur de projection et procede de fabrication de dispositif utilisant cet aligneur Download PDF

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Publication number
WO2002029869A1
WO2002029869A1 PCT/JP2001/008722 JP0108722W WO0229869A1 WO 2002029869 A1 WO2002029869 A1 WO 2002029869A1 JP 0108722 W JP0108722 W JP 0108722W WO 0229869 A1 WO0229869 A1 WO 0229869A1
Authority
WO
WIPO (PCT)
Prior art keywords
wafer
aligner
optical system
detecting
projection optical
Prior art date
Application number
PCT/JP2001/008722
Other languages
English (en)
Japanese (ja)
Inventor
Yoko Kimura
Masaya Nakajima
Original Assignee
Nikon Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corporation filed Critical Nikon Corporation
Priority to JP2002533351A priority Critical patent/JPWO2002029869A1/ja
Publication of WO2002029869A1 publication Critical patent/WO2002029869A1/fr

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70941—Stray fields and charges, e.g. stray light, scattered light, flare, transmission loss

Abstract

L'invention concerne un aligneur de projection comprenant les éléments suivants: dispositif d'illumination optique pour l'illumination d'un réticule (R) établi selon une configuration spécifique par le biais d'une source lumineuse; système de projection optique (PL) pour la projection de l'image à configuration spécifique du réticule sur une plaquette (W); système de mise au point automatique à incidence oblique (AF1, AF2) décelant un faisceau qui émane de la plaquette, par application d'un faisceau de détection de mise au point sur la plaquette selon une orientation oblique, le but étant de déceler un état de correspondance entre la surface de formation d'image du système de projection optique et la plaquette; et élément de blindage (S1) établi dans un espace entre le trajet optique de détection de mise au point du système de mise au point automatique à incidence oblique et le système de projection optique, ce qui permet d'éviter la pénétration de lumière parasite émanant du système de projection optique dans la plaquette.
PCT/JP2001/008722 2000-10-04 2001-10-03 Aligneur de projection et procede de fabrication de dispositif utilisant cet aligneur WO2002029869A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002533351A JPWO2002029869A1 (ja) 2000-10-04 2001-10-03 投影露光装置及びこの装置を用いたデバイスの製造方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2000-304891 2000-10-04
JP2000304891 2000-10-04

Publications (1)

Publication Number Publication Date
WO2002029869A1 true WO2002029869A1 (fr) 2002-04-11

Family

ID=18785856

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2001/008722 WO2002029869A1 (fr) 2000-10-04 2001-10-03 Aligneur de projection et procede de fabrication de dispositif utilisant cet aligneur

Country Status (2)

Country Link
JP (1) JPWO2002029869A1 (fr)
WO (1) WO2002029869A1 (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014143445A (ja) * 2005-06-02 2014-08-07 Carl Zeiss Smt Gmbh マイクロリソグラフィ投影対物レンズ
JP2018060001A (ja) * 2016-10-04 2018-04-12 東京エレクトロン株式会社 補助露光装置及び露光量分布取得方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09320951A (ja) * 1996-05-28 1997-12-12 Nikon Corp 投影露光装置
US5774205A (en) * 1995-07-21 1998-06-30 Canon Kabushiki Kaisha Exposure and method which tests optical characteristics of optical elements in a projection lens system prior to exposure
EP0990993A1 (fr) * 1998-07-28 2000-04-05 Bull S.A. Compteur d'évènements

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5774205A (en) * 1995-07-21 1998-06-30 Canon Kabushiki Kaisha Exposure and method which tests optical characteristics of optical elements in a projection lens system prior to exposure
JPH09320951A (ja) * 1996-05-28 1997-12-12 Nikon Corp 投影露光装置
EP0990993A1 (fr) * 1998-07-28 2000-04-05 Bull S.A. Compteur d'évènements

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014143445A (ja) * 2005-06-02 2014-08-07 Carl Zeiss Smt Gmbh マイクロリソグラフィ投影対物レンズ
US9097984B2 (en) 2005-06-02 2015-08-04 Carl Zeiss Smt Gmbh Microlithography projection objective
JP2017138632A (ja) * 2005-06-02 2017-08-10 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影対物レンズ
JP2017201430A (ja) * 2005-06-02 2017-11-09 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影対物レンズ
US10281824B2 (en) 2005-06-02 2019-05-07 Carl Zeiss Smt Gmbh Microlithography projection objective
JP2018060001A (ja) * 2016-10-04 2018-04-12 東京エレクトロン株式会社 補助露光装置及び露光量分布取得方法

Also Published As

Publication number Publication date
JPWO2002029869A1 (ja) 2004-02-19

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